TW200506543A - Double-sided projection exposure device of belt-shape workpieces - Google Patents

Double-sided projection exposure device of belt-shape workpieces

Info

Publication number
TW200506543A
TW200506543A TW093104462A TW93104462A TW200506543A TW 200506543 A TW200506543 A TW 200506543A TW 093104462 A TW093104462 A TW 093104462A TW 93104462 A TW93104462 A TW 93104462A TW 200506543 A TW200506543 A TW 200506543A
Authority
TW
Taiwan
Prior art keywords
work
belt
tension
double
exposure device
Prior art date
Application number
TW093104462A
Other languages
Chinese (zh)
Other versions
TWI278724B (en
Inventor
Hirofumi Takiura
Manabu Gotoh
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200506543A publication Critical patent/TW200506543A/en
Application granted granted Critical
Publication of TWI278724B publication Critical patent/TWI278724B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
    • B43K—IMPLEMENTS FOR WRITING OR DRAWING
    • B43K29/00—Combinations of writing implements with other articles
    • B43K29/08—Combinations of writing implements with other articles with measuring, computing or indicating devices
    • B43K29/093—Combinations of writing implements with other articles with measuring, computing or indicating devices with calculators
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06C—DIGITAL COMPUTERS IN WHICH ALL THE COMPUTATION IS EFFECTED MECHANICALLY
    • G06C1/00—Computing aids in which the computing members form at least part of the displayed result and are manipulated directly by hand, e.g. abacuses or pocket adding devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Computing Systems (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention is to simultaneously expose both faces of a belt-like work for a pattern and to prevent an out-of-focus state or vibration even when the work thermally expands during exposure. The belt-like work W released from a unwinding roll 1 is sent to an exposure section 5, subjected to the tension in the traveling direction and in the direction perpendicular thereto by a first tension imparting method 11 and a second tension imparting method (not shown in the figure) to such a degree to compensate the estimated thermal expansion during exposure, and held with the tension applied by a work holding method 6. A mask M1 and an alignment mark on the top face of the work W, and a mask M2 and an alignment mark on the back face of the work W are detected and aligned. After completing the alignment, the top face and the back face of the belt-like work W are simultaneously exposed by irradiating with exposure light from irradiation parts 41, 42 via the masks M1, M2 and projection lenses 31, 32.
TW093104462A 2003-05-23 2004-02-23 Double-sided projection exposure device of belt-shape workpieces TWI278724B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003146392A JP4218418B2 (en) 2003-05-23 2003-05-23 Double-sided projection exposure system for belt-like workpieces

Publications (2)

Publication Number Publication Date
TW200506543A true TW200506543A (en) 2005-02-16
TWI278724B TWI278724B (en) 2007-04-11

Family

ID=33533257

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093104462A TWI278724B (en) 2003-05-23 2004-02-23 Double-sided projection exposure device of belt-shape workpieces

Country Status (4)

Country Link
JP (1) JP4218418B2 (en)
KR (1) KR100665165B1 (en)
CN (1) CN100468199C (en)
TW (1) TWI278724B (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5117672B2 (en) * 2005-10-25 2013-01-16 サンエー技研株式会社 Exposure method and exposure apparatus
KR100806843B1 (en) * 2006-08-30 2008-02-22 스템코 주식회사 Apparatus and method for exposuring board material
JP4888002B2 (en) * 2006-09-25 2012-02-29 凸版印刷株式会社 Film fixing and positioning device for alignment
JP2010014939A (en) * 2008-07-03 2010-01-21 Nikon Corp Manufacturing apparatus and manufacturing method for circuit element
JP5451175B2 (en) * 2009-05-15 2014-03-26 サンエー技研株式会社 Exposure equipment
US8235695B2 (en) * 2009-07-17 2012-08-07 Nikon Corporation Pattern forming device, pattern forming method, and device manufacturing method
JP5630113B2 (en) * 2009-07-17 2014-11-26 株式会社ニコン Pattern forming apparatus, pattern forming method, and device manufacturing method
US8379186B2 (en) * 2009-07-17 2013-02-19 Nikon Corporation Pattern formation apparatus, pattern formation method, and device manufacturing method
JP5477862B2 (en) * 2010-09-06 2014-04-23 株式会社ブイ・テクノロジー Film exposure apparatus and film exposure method
CN202615113U (en) * 2011-08-15 2012-12-19 中山新诺科技有限公司 Exposure system, calibration system and optical engines
KR101849508B1 (en) * 2011-12-20 2018-05-28 가부시키가이샤 니콘 Substrate processing device, device manufacturing system and device manufacturing method
JP6200224B2 (en) 2012-09-13 2017-09-20 日本メクトロン株式会社 Photomask, photomask set, exposure apparatus and exposure method
CN102968000A (en) * 2012-11-21 2013-03-13 京东方科技集团股份有限公司 Dual-sided processing method and exposure device
JP6510768B2 (en) * 2014-05-23 2019-05-08 株式会社オーク製作所 Exposure device
JP6723831B2 (en) * 2016-06-01 2020-07-15 株式会社オーク製作所 Exposure equipment
CN107966881B (en) 2017-03-15 2018-11-23 上海微电子装备（集团）股份有限公司 Lithographic equipment and method
JP7412872B2 (en) * 2017-10-31 2024-01-15 株式会社アドテックエンジニアリング Double-sided exposure device
JP7234426B2 (en) * 2017-11-30 2023-03-07 株式会社アドテックエンジニアリング Mask pairs and double-sided exposure equipment
TW202021887A (en) * 2018-12-03 2020-06-16 由田新技股份有限公司 Inspection apparatus for reel tape workpiece
CN109884860B (en) * 2019-03-22 2020-12-04 上海微电子装备（集团）股份有限公司 Multi-station flexible tape exposure device and exposure method
CN111752109A (en) * 2020-07-21 2020-10-09 杭州新诺微电子有限公司 Substrate exposure device and method for roll-to-roll double-sided digital photoetching

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2892079B2 (en) * 1990-02-21 1999-05-17 ウシオ電機株式会社 Film exposure equipment
KR200187015Y1 (en) * 1997-12-29 2000-08-01 유무성 In-line type two faces exposure apparatus

Also Published As

Publication number Publication date
JP4218418B2 (en) 2009-02-04
CN100468199C (en) 2009-03-11
JP2004347964A (en) 2004-12-09
KR20040100870A (en) 2004-12-02
KR100665165B1 (en) 2007-01-04
TWI278724B (en) 2007-04-11
CN1573559A (en) 2005-02-02

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees