TW200506543A - Double-sided projection exposure device of belt-shape workpieces - Google Patents
Double-sided projection exposure device of belt-shape workpiecesInfo
- Publication number
- TW200506543A TW200506543A TW093104462A TW93104462A TW200506543A TW 200506543 A TW200506543 A TW 200506543A TW 093104462 A TW093104462 A TW 093104462A TW 93104462 A TW93104462 A TW 93104462A TW 200506543 A TW200506543 A TW 200506543A
- Authority
- TW
- Taiwan
- Prior art keywords
- work
- belt
- tension
- double
- exposure device
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
- B43K—IMPLEMENTS FOR WRITING OR DRAWING
- B43K29/00—Combinations of writing implements with other articles
- B43K29/08—Combinations of writing implements with other articles with measuring, computing or indicating devices
- B43K29/093—Combinations of writing implements with other articles with measuring, computing or indicating devices with calculators
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06C—DIGITAL COMPUTERS IN WHICH ALL THE COMPUTATION IS EFFECTED MECHANICALLY
- G06C1/00—Computing aids in which the computing members form at least part of the displayed result and are manipulated directly by hand, e.g. abacuses or pocket adding devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Computer Hardware Design (AREA)
- Computing Systems (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention is to simultaneously expose both faces of a belt-like work for a pattern and to prevent an out-of-focus state or vibration even when the work thermally expands during exposure. The belt-like work W released from a unwinding roll 1 is sent to an exposure section 5, subjected to the tension in the traveling direction and in the direction perpendicular thereto by a first tension imparting method 11 and a second tension imparting method (not shown in the figure) to such a degree to compensate the estimated thermal expansion during exposure, and held with the tension applied by a work holding method 6. A mask M1 and an alignment mark on the top face of the work W, and a mask M2 and an alignment mark on the back face of the work W are detected and aligned. After completing the alignment, the top face and the back face of the belt-like work W are simultaneously exposed by irradiating with exposure light from irradiation parts 41, 42 via the masks M1, M2 and projection lenses 31, 32.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003146392A JP4218418B2 (en) | 2003-05-23 | 2003-05-23 | Double-sided projection exposure system for belt-like workpieces |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200506543A true TW200506543A (en) | 2005-02-16 |
TWI278724B TWI278724B (en) | 2007-04-11 |
Family
ID=33533257
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093104462A TWI278724B (en) | 2003-05-23 | 2004-02-23 | Double-sided projection exposure device of belt-shape workpieces |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4218418B2 (en) |
KR (1) | KR100665165B1 (en) |
CN (1) | CN100468199C (en) |
TW (1) | TWI278724B (en) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5117672B2 (en) * | 2005-10-25 | 2013-01-16 | サンエー技研株式会社 | Exposure method and exposure apparatus |
KR100806843B1 (en) * | 2006-08-30 | 2008-02-22 | 스템코 주식회사 | Apparatus and method for exposuring board material |
JP4888002B2 (en) * | 2006-09-25 | 2012-02-29 | 凸版印刷株式会社 | Film fixing and positioning device for alignment |
JP2010014939A (en) * | 2008-07-03 | 2010-01-21 | Nikon Corp | Manufacturing apparatus and manufacturing method for circuit element |
JP5451175B2 (en) * | 2009-05-15 | 2014-03-26 | サンエー技研株式会社 | Exposure equipment |
US8379186B2 (en) * | 2009-07-17 | 2013-02-19 | Nikon Corporation | Pattern formation apparatus, pattern formation method, and device manufacturing method |
JP5630113B2 (en) * | 2009-07-17 | 2014-11-26 | 株式会社ニコン | Pattern forming apparatus, pattern forming method, and device manufacturing method |
US8235695B2 (en) * | 2009-07-17 | 2012-08-07 | Nikon Corporation | Pattern forming device, pattern forming method, and device manufacturing method |
JP5477862B2 (en) * | 2010-09-06 | 2014-04-23 | 株式会社ブイ・テクノロジー | Film exposure apparatus and film exposure method |
CN102944978B (en) * | 2011-08-15 | 2014-08-06 | 中山新诺科技股份有限公司 | Exposure system, calibration system, optical engines, exposure method, and production method |
KR101849508B1 (en) * | 2011-12-20 | 2018-05-28 | 가부시키가이샤 니콘 | Substrate processing device, device manufacturing system and device manufacturing method |
JP6200224B2 (en) * | 2012-09-13 | 2017-09-20 | 日本メクトロン株式会社 | Photomask, photomask set, exposure apparatus and exposure method |
CN102968000A (en) * | 2012-11-21 | 2013-03-13 | 京东方科技集团股份有限公司 | Dual-sided processing method and exposure device |
JP6510768B2 (en) * | 2014-05-23 | 2019-05-08 | 株式会社オーク製作所 | Exposure device |
JP6723831B2 (en) * | 2016-06-01 | 2020-07-15 | 株式会社オーク製作所 | Exposure equipment |
CN107966881B (en) | 2017-03-15 | 2018-11-23 | 上海微电子装备(集团)股份有限公司 | Lithographic equipment and method |
JP7412872B2 (en) * | 2017-10-31 | 2024-01-15 | 株式会社アドテックエンジニアリング | Double-sided exposure device |
JP7234426B2 (en) * | 2017-11-30 | 2023-03-07 | 株式会社アドテックエンジニアリング | Mask pairs and double-sided exposure equipment |
TW202021887A (en) * | 2018-12-03 | 2020-06-16 | 由田新技股份有限公司 | Inspection apparatus for reel tape workpiece |
CN109884860B (en) * | 2019-03-22 | 2020-12-04 | 上海微电子装备(集团)股份有限公司 | Multi-station flexible tape exposure device and exposure method |
CN111752109A (en) * | 2020-07-21 | 2020-10-09 | 杭州新诺微电子有限公司 | Substrate exposure device and method for roll-to-roll double-sided digital photoetching |
CN112822858B (en) * | 2021-02-09 | 2024-08-06 | 珠海微图科技有限公司 | Printed wiring board processing equipment |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2892079B2 (en) * | 1990-02-21 | 1999-05-17 | ウシオ電機株式会社 | Film exposure equipment |
KR200187015Y1 (en) * | 1997-12-29 | 2000-08-01 | 유무성 | In-line type two faces exposure apparatus |
-
2003
- 2003-05-23 JP JP2003146392A patent/JP4218418B2/en not_active Expired - Fee Related
-
2004
- 2004-02-23 TW TW093104462A patent/TWI278724B/en not_active IP Right Cessation
- 2004-03-13 KR KR1020040017123A patent/KR100665165B1/en not_active IP Right Cessation
- 2004-05-24 CN CNB2004100475702A patent/CN100468199C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI278724B (en) | 2007-04-11 |
JP4218418B2 (en) | 2009-02-04 |
CN100468199C (en) | 2009-03-11 |
JP2004347964A (en) | 2004-12-09 |
KR100665165B1 (en) | 2007-01-04 |
CN1573559A (en) | 2005-02-02 |
KR20040100870A (en) | 2004-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |