JP6723831B2 - Exposure equipment - Google Patents

Exposure equipment Download PDF

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JP6723831B2
JP6723831B2 JP2016110392A JP2016110392A JP6723831B2 JP 6723831 B2 JP6723831 B2 JP 6723831B2 JP 2016110392 A JP2016110392 A JP 2016110392A JP 2016110392 A JP2016110392 A JP 2016110392A JP 6723831 B2 JP6723831 B2 JP 6723831B2
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exposure
substrate
long substrate
unit
stage
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JP2017215535A (en
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典夫 橋本
典夫 橋本
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Orc Manufacturing Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

本発明は、供給リールから繰り出されて巻取リールに巻き取られる長尺基板の搬送中に、その長尺基板の両面にパターンを描画する露光装置に関する。 The present invention relates to an exposure apparatus that draws a pattern on both surfaces of a long substrate while it is being fed from a supply reel and wound on a take-up reel.

一般的に、携帯電話やモバイル機器等に用いられる電子回路基板（プリント回路基板）のベース素材として、例えば、厚みが０．１ｍｍ以下で長さが５００ｍｍ以上（例えば１００ｍ）の長尺基板（感光性長尺フィルム）をロール状にしたものが使用される。近年、このような長尺基板に対して、転写マスクを使わず描画光を直接基板に照射してパターンを描画するダイレクト露光装置（マスクレス露光装置）が求められている。 Generally, as a base material for an electronic circuit board (printed circuit board) used in a mobile phone, a mobile device, etc., for example, a long substrate (photosensitive layer) having a thickness of 0.1 mm or less and a length of 500 mm or more (eg, 100 m) is used. Long film is used in the form of a roll. In recent years, there has been a demand for a direct exposure apparatus (maskless exposure apparatus) for irradiating a drawing light directly onto a substrate without using a transfer mask to draw a pattern on such a long substrate.

長尺基板にパターンを描画するダイレクト露光装置としては、例えば特許文献１のような露光装置が知られているが、このような露光装置では、長尺基板の片面にしかパターンを露光できず、露光が終わった基板のロールを取り外し、投入側に再設置して露光工程をもう１度行う必要があり、生産性が低い。一方で、ダイレクト露光装置を用いて長尺基板の両面に電子回路を形成するために、特許文献２にあるように基板の両面に対して描画光を照射してパターンを形成する露光装置が検討されている。 As a direct exposure apparatus that draws a pattern on a long substrate, for example, an exposure apparatus as disclosed in Patent Document 1 is known. However, with such an exposure apparatus, the pattern can be exposed only on one side of the long substrate, Since it is necessary to remove the roll of the substrate after the exposure and re-install it on the input side to perform the exposure process again, the productivity is low. On the other hand, in order to form an electronic circuit on both sides of a long substrate using a direct exposure apparatus, an exposure apparatus that irradiates drawing light on both sides of the substrate to form a pattern as described in Patent Document 2 is under consideration. Has been done.

特開２００６−１０２９９１号公報JP, 2006-102991, A 特開２００５−１２１９５９号公報JP, 2005-121959, A

特許文献２の露光装置は、基板の両面に描画光を照射するという構造上、露光範囲をカバーするサイズの露光ステージを設けることができないという問題がある。露光ステージは基板の送り量を高精度に測定する、また、基板の平面性を高める、という役割を持ち、露光ステージなしでは基板に高精度なパターンを描画することは困難である。 The exposure apparatus of Patent Document 2 has a problem in that it is not possible to provide an exposure stage having a size that covers the exposure range because of the structure in which both sides of the substrate are irradiated with drawing light. The exposure stage has a role of measuring the feed amount of the substrate with high accuracy and also improving the flatness of the substrate, and it is difficult to draw a highly accurate pattern on the substrate without the exposure stage.

本発明は、以上の課題に基づき、長尺基板に対し、基板の送り量を高精度に測定し、更に、基板の平面性を確保した状態で基板の両面にパターンを描画するダイレクト露光装置を得ることを目的とする。 Based on the above problems, the present invention provides a direct exposure apparatus that measures a substrate feed amount with respect to a long substrate with high accuracy and further draws a pattern on both surfaces of the substrate in a state where the flatness of the substrate is ensured. The purpose is to get.

露光装置が、光変調素子アレイを備え、長尺基板の第１面に光変調素子アレイにより変調したパターン光を照射する第１露光部と、長尺基板の長さ方向の一部を平面状に保持する第１露光ステージと、長尺基板の長さ方向に、第１露光部と第１露光ステージとを相対移動させる第１相対移動手段と、長尺基板の搬送経路を折返す折返し手段と、光変調素子アレイを備え、長尺基板の第２面に光変調素子アレイにより変調したパターン光を照射する第２露光部と、長尺基板の長さ方向の一部を平面状に保持する第２露光ステージと、長尺基板の長さ方向に、第２露光部と第２露光ステージとを相対移動させる第２相対移動手段と、を備える。このような露光装置とすることで、露光ステージを用いて長尺基板の両面を露光することができる。また、第１露光部と第２露光部とが、それぞれ下方向にパターン光を照射するので、長尺基板の両面に同じ条件でパターンを露光することができる。 The exposure apparatus includes a light modulation element array, and irradiates the first surface of the long substrate with the pattern light modulated by the light modulation element array, and a part of the long substrate in the length direction in a planar shape. And a first relative movement means for relatively moving the first exposure section and the first exposure stage in the lengthwise direction of the long substrate, and a folding means for folding back the conveyance path of the long substrate. And a second exposure section that includes a light modulation element array and irradiates the second surface of the long substrate with the pattern light modulated by the light modulation element array, and holds a part of the long substrate in the length direction in a planar shape. And a second relative movement unit that relatively moves the second exposure unit and the second exposure stage in the length direction of the long substrate. By using such an exposure apparatus, it is possible to expose both surfaces of the long substrate using the exposure stage. Further, since the first exposure section and the second exposure section each irradiate the pattern light downward, it is possible to expose the pattern on both surfaces of the long substrate under the same conditions.

また、第１相対移動手段と第２相対移動手段とが、第１露光ステージと第２露光ステージとを、同期して長尺基板の長さ方向に沿った相反する方向にそれぞれ移動させるとともに、第１露光部と第２露光部とが、第１露光ステージと第２露光ステージの移動に応じて、長尺基板に照射するパターン光をそれぞれ変調する。更に、長尺基板を送り出す基板供給手段を備え、基板供給手段が、第１露光ステージの移動に同期して長尺基板を送り出す速度を調整し、同様に、長尺基板を巻取る基板巻取り手段を備え、基板巻取り手段が、第２露光ステージの移動に同期して長尺基板を巻取る速度を調整する。これによって、基板のバッファ部を設けなくとも長尺基板を搬送できるので、ロールエンド付近等の長尺基板の両面にパターンを露光できない無駄な領域を少なくすることができる。 Further, the first relative movement means and the second relative movement means move the first exposure stage and the second exposure stage synchronously in opposite directions along the length direction of the long substrate, respectively, The first exposure unit and the second exposure unit respectively modulate the pattern light with which the long substrate is irradiated according to the movement of the first exposure stage and the second exposure stage. Further, a substrate supply means for sending out the long substrate is provided, and the substrate supply means adjusts the speed for sending out the long substrate in synchronization with the movement of the first exposure stage, and similarly, the substrate winding for winding the long substrate. The substrate winding means adjusts the speed of winding the long substrate in synchronization with the movement of the second exposure stage. As a result, the long substrate can be transported without providing a buffer portion for the substrate, so that it is possible to reduce a wasteful area where a pattern cannot be exposed on both surfaces of the long substrate such as near the roll end.

また、基板供給手段と基板巻取り手段とが露光装置の同一サイドに設けられているので、ロールチェンジ等の段取り作業の効率が向上する。 Further, since the substrate supply means and the substrate winding means are provided on the same side of the exposure apparatus, the efficiency of setup work such as roll change is improved.

また、第１相対移動手段と第２相対移動手段とが同じ高さに設けられているいるので、装置の高さを抑えることができ、コンパクトな露光装置を実現できる。 Further, since the first relative moving means and the second relative moving means are provided at the same height, the height of the apparatus can be suppressed and a compact exposure apparatus can be realized.

本発明の露光装置によれば、長尺基板に対し、基板の送り量を高精度に測定するとともに、基板の平面性を確保した状態で基板の両面にパターンを描画することができる。 According to the exposure apparatus of the present invention, it is possible to measure the substrate feed amount with respect to a long substrate with high accuracy and to draw a pattern on both surfaces of the substrate while ensuring the flatness of the substrate.

本発明による露光装置の全体構成を示す正面図である。It is a front view showing the whole composition of the exposure device by the present invention. 本発明による露光装置の全体構成を示す平面図である。It is a top view showing the whole composition of the exposure device by the present invention. 本発明によるダイレクト露光装置の露光ヘッドの構成を示す正面図である。FIG. 3 is a front view showing the configuration of the exposure head of the direct exposure apparatus according to the present invention.

図１は、本発明によるロールトゥロール方式のダイレクト露光装置である露光装置１の全体構成を示す正面図である。また、図２は露光装置１の全体構成を示す平面図である。なお、図２では長尺基板（ワーク）Ｗの一部を透視し（波線部）、本来は長尺基板Ｗに隠れる部分が見えるように描かれている。 FIG. 1 is a front view showing the overall configuration of an exposure apparatus 1 which is a roll-to-roll type direct exposure apparatus according to the present invention. 2 is a plan view showing the overall configuration of the exposure apparatus 1. Note that, in FIG. 2, a part of the long substrate (work) W is seen through (a wavy line portion), and a portion that is originally hidden by the long substrate W is visible.

露光装置１は、長尺基板Ｗの搬送経路に沿って順に、長尺基板Ｗの供給と巻取りをするリール駆動部１０と、長尺基板Ｗの第１面にパターンを露光して電子回路を形成する第１露光処理部２０と、搬送経路を折返す折返し部３０と、長尺基板Ｗの第２面にパターンを露光して電子回路を形成する第２露光処理部４０とを備えている。ここで長尺基板Ｗの第１面とはリール駆動部１０の供給リール１１から巻き出された基板の上面側を意味し、第２面とは供給リール１１から巻き出された基板の下面側を意味する。 The exposure apparatus 1 exposes a pattern on the first surface of the long substrate W and a reel drive unit 10 for supplying and winding the long substrate W in order along the transport path of the long substrate W to expose an electronic circuit. A first exposure processing unit 20 for forming a substrate, a turnback unit 30 for turning back the transport path, and a second exposure processing unit 40 for exposing a pattern on the second surface of the long substrate W to form an electronic circuit. There is. Here, the first surface of the long substrate W means the upper surface side of the substrate unwound from the supply reel 11 of the reel driving unit 10, and the second surface thereof the lower surface side of the substrate unwound from the supply reel 11. Means

長尺基板Ｗはフォトレジストなどの感光材料が塗布された銅張積層板などによるシート状の基板であり、数十〜数百メートルの長さを有する。露光後に現像やエッチング、裁断等の工程を経ることで、ＦＰＣ基板の基材となる。 The long substrate W is a sheet-shaped substrate made of a copper clad laminate coated with a photosensitive material such as photoresist, and has a length of several tens to several hundreds of meters. After the exposure, the base material of the FPC board is obtained by passing through processes such as development, etching, and cutting.

リール駆動部１０は、供給リール（基板供給部）１１、巻取りリール（基板巻取り手段）１２、ガイドローラ１３を備え、不図示の駆動系を用いて供給リール１１および巻き取りリール１２を回転駆動させる。それ以外にも、長尺基板Ｗの端面位置を検知するセンサや、長尺基板Ｗに掛かるテンションを調整する機構等を備えてもよい。 The reel drive unit 10 includes a supply reel (substrate supply unit) 11, a take-up reel (substrate take-up means) 12, and a guide roller 13, and rotates the supply reel 11 and the take-up reel 12 using a drive system (not shown). Drive it. Other than that, a sensor that detects the end surface position of the long substrate W, a mechanism that adjusts the tension applied to the long substrate W, and the like may be provided.

リール駆動部１０と第１露光処理部２０の間には、長尺基板Ｗの搬送方向を９０°変更するガイドローラ１４、基板を制動（保持）する基板制動ローラ１６、基板端面を検知するエッジセンサ２１、長尺基板Ｗの搬送方向を９０°変更するとともにエッジセンサ２１の出力に従って基板端面位置を調整する補正ローラ１５、が設けられている。 Between the reel drive unit 10 and the first exposure processing unit 20, a guide roller 14 that changes the transport direction of the long substrate W by 90°, a substrate braking roller 16 that brakes (holds) the substrate, and an edge that detects the substrate end surface. A sensor 21 and a correction roller 15 that changes the conveying direction of the long substrate W by 90° and adjusts the substrate end surface position according to the output of the edge sensor 21 are provided.

第１露光処理部２０は、露光ステージ２４（第１露光ステージ）、一対のアライメントカメラ２２（図２参照）及び第１露光ユニット（露光部）２３を備え、長尺基板の第１面にパターンを露光する。ここで、露光処理部２０における長尺基板Ｗの移動方向（搬送方向）をＸ方向、長尺基板Ｗと直交する方向（厚さ方向）をＺ方向、Ｘ方向及びＺ方向に直交する方向をＹ方向と定義する。 The first exposure processing unit 20 includes an exposure stage 24 (first exposure stage), a pair of alignment cameras 22 (see FIG. 2), and a first exposure unit (exposure unit) 23, and a pattern is formed on the first surface of a long substrate. To expose. Here, the moving direction (conveying direction) of the long substrate W in the exposure processing section 20 is the X direction, the direction orthogonal to the long substrate W (thickness direction) is the Z direction, and the direction orthogonal to the X direction and the Z direction. It is defined as the Y direction.

第１露光ユニット２３は、複数の露光ヘッド（図示せず）を備え、長尺基板Ｗから所定距離だけ鉛直上方に離れた場所に規則的に配置されている。 The first exposure unit 23 is provided with a plurality of exposure heads (not shown), and is regularly arranged at a position separated vertically above the long substrate W by a predetermined distance.

図３は１つの露光ヘッドの構成を示す概略図である。光源（水銀ランプ等）ＯＰ１から出た光は、照明光学系ＯＰ２及び折り返しミラーＯＰ３を介して平行光となって光変調素子アレイＯＰ４に入射する。光変調素子アレイＯＰ４は、例えば複数のマイクロミラーを２次元配列させたＤＭＤ（Digital Micro-mirror Device）である。光変調素子アレイＯＰ４で変調された光（ＵＶ）は、結像光学系ＯＰ５によって長尺基板上に結像する。また、露光ヘッドは光軸方向に沿って結像位置を調整する合焦光学系ＯＰ６を備えている。 FIG. 3 is a schematic view showing the structure of one exposure head. The light emitted from the light source (mercury lamp or the like) OP1 becomes parallel light through the illumination optical system OP2 and the folding mirror OP3 and enters the light modulation element array OP4. The light modulation element array OP4 is, for example, a DMD (Digital Micro-mirror Device) in which a plurality of micro mirrors are two-dimensionally arranged. The light (UV) modulated by the light modulation element array OP4 forms an image on the long substrate by the image forming optical system OP5. The exposure head is also provided with a focusing optical system OP6 that adjusts the image forming position along the optical axis direction.

ＤＭＤを用いてパターンを多重露光する技術は、例えば特開２００３−０８４４４４号公報に開示され、広汎に実用化されている周知技術である。また、複数ヘッドを用いて１つのパターンを描画する技術は、例えば特開２００３−１９５５１２号公報に開示され、広汎に実用化されている周知技術である。 The technique of multiple exposure of a pattern using DMD is a well-known technique which is disclosed in, for example, Japanese Patent Application Laid-Open No. 2003-084444 and is widely put to practical use. Further, a technique of drawing one pattern using a plurality of heads is a well-known technique which is disclosed in, for example, Japanese Unexamined Patent Publication No. 2003-195512 and has been widely put into practical use.

露光ステージ２４は、長尺基板Ｗの裏面を吸着（例えば真空吸着）して平面状に保持するもので、Ｘ方向及びＺ方向に自在に移動可能である。すなわち、架台ＢＦ上に、Ｘ方向に延びるガイドレールに移動自在に支持されたステージ移動部（第１相対移動手段）２５が設けられ、露光ステージ２４を昇降させる昇降部２６が支持されている。ステージ移動部２５にはリニアスケールやレーザ変位計等のステージ移動部２５の位置を測定する手段（図示せず）が設けられており、露光ステージ２４の移動量（すなわち長尺基板Ｗの送り量）を正確に測定することができる。 The exposure stage 24 holds the back surface of the long substrate W by suction (for example, vacuum suction) and holds it in a planar shape, and is freely movable in the X and Z directions. That is, a stage moving unit (first relative moving unit) 25 movably supported by a guide rail extending in the X direction is provided on the pedestal BF, and an elevating unit 26 that raises and lowers the exposure stage 24 is supported. The stage moving unit 25 is provided with means (not shown) for measuring the position of the stage moving unit 25, such as a linear scale or a laser displacement meter, and the moving amount of the exposure stage 24 (that is, the feed amount of the long substrate W). ) Can be accurately measured.

露光ステージ２４は、昇降部２６によって、長尺基板Ｗの裏面に接触する上端位置と、長尺基板Ｗの裏面と離間する下端位置との間を昇降する。ステージ移動部２５は、Ｘ方向に正逆（下流方向と上流方向）に移動可能である。ステージ移動部２５は、長尺基板Ｗの長さ方向に露光ステージ２４と露光ユニット２３を相対移動させる相対移動手段を構成している。露光ステージ２４が一度に長尺基板Ｗを吸着保持可能な範囲（面積）は、例えば６２０（Ｘ）×５２０（Ｙ）ｍｍである。 The exposure stage 24 is moved up and down by an elevating unit 26 between an upper end position in contact with the back surface of the long substrate W and a lower end position separated from the back surface of the long substrate W. The stage moving unit 25 can move forward and backward in the X direction (downstream direction and upstream direction). The stage moving unit 25 constitutes a relative moving unit that relatively moves the exposure stage 24 and the exposure unit 23 in the length direction of the long substrate W. The range (area) in which the exposure stage 24 can suck and hold the long substrate W at one time is, for example, 620 (X)×520 (Y) mm.

一対のアライメントカメラ２２は、露光ユニット２３より上流側に設置され、長尺基板Ｗに設けられたアライメントマーク（図示せず）を撮像する。各アライメントカメラ２２が撮像した画像は、画像処理部（図示せず）によって画像処理され、長尺基板Ｗと露光ユニット２３との位置合わせ時の補正量算出に用いられる。 The pair of alignment cameras 22 are installed on the upstream side of the exposure unit 23 and capture an image of an alignment mark (not shown) provided on the long substrate W. The image captured by each alignment camera 22 is subjected to image processing by an image processing unit (not shown) and used for calculating a correction amount when aligning the long substrate W and the exposure unit 23.

折返し部（折返し手段）３０には、ガイドローラ３１および３３と、基板を制動する基板制動ローラ３２とが設けられる。ガイドローラ３１および３３が長尺基板Ｗを９０°ずつ折り曲げるので、折返し部３０の前後では長尺基板Ｗの搬送方向が１８０°反転する。それに伴い、折返し部３０以降は長尺基板Ｗの第１面が下面側となり、第２面が上面側となる。 The folding part (folding means) 30 is provided with guide rollers 31 and 33 and a substrate braking roller 32 for braking the substrate. Since the guide rollers 31 and 33 bend the long substrate W by 90°, the transport direction of the long substrate W is reversed by 180° before and after the folding section 30. Along with this, the first surface of the long substrate W becomes the lower surface side and the second surface becomes the upper surface side after the folded portion 30.

折返し部３０と露光処理部４０の間では、長尺基板Ｗは架台（ベース部）ＢＦの内部に設けられた通路を通って搬送される。また、折返し部３０と露光処理部４０との間には、ガイドローラ１６と、長尺基板Ｗの搬送方向を９０°変更し基板を制動するガイドローラ１７と、基板端面を検知するエッジセンサ４１と、長尺基板Ｗの搬送方向を９０°変更するとともにエッジセンサ２１の出力に従って基板端面位置を調整する補正ローラ１５、が設けられる。 Between the folding section 30 and the exposure processing section 40, the long substrate W is transported through a passage provided inside the pedestal (base section) BF. Further, between the folding section 30 and the exposure processing section 40, a guide roller 16, a guide roller 17 that changes the transport direction of the long substrate W by 90° to brake the substrate, and an edge sensor 41 that detects the substrate end surface. And a correction roller 15 for changing the conveying direction of the long substrate W by 90° and adjusting the substrate end face position according to the output of the edge sensor 21.

第２露光処理部４０は、露光ステージ４４（第２露光ステージ）、一対のアライメントカメラ４２（図２参照）及び第２露光ユニット（露光部）４３を備え、長尺基板の第２面にパターンを露光する。 The second exposure processing unit 40 includes an exposure stage 44 (second exposure stage), a pair of alignment cameras 42 (see FIG. 2), and a second exposure unit (exposure unit) 43, and a pattern is formed on the second surface of the long substrate. To expose.

アライメントカメラ４２、第２露光ユニット４３、露光ステージ４４、ステージ移動部４５、昇降部４６は、それぞれ第１露光処理部２０のアライメントカメラ２２、第１露光ユニット２３、露光ステージ２４、ステージ移動部２５、昇降部２６と同様の機能を持っている。一方で、第１露光処理部２０と第２露光処理部４０とは、長尺基板の搬送方向が相違している。 The alignment camera 42, the second exposure unit 43, the exposure stage 44, the stage moving unit 45, and the elevating unit 46 are the alignment camera 22, the first exposure unit 23, the exposure stage 24, and the stage moving unit 25 of the first exposure processing unit 20, respectively. , Has the same function as the elevating part 26. On the other hand, the first exposure processing unit 20 and the second exposure processing unit 40 are different in the transport direction of the long substrate.

すなわち、第１露光処理部２０と第２露光処理部４０は、Ｘ方向に相反するように対称な配置であり、Ｘ方向に相反するように動作する。例えば図１を用いて説明すると、第１露光処理部２０の露光ステージ２４が左方向に移動しながら長尺基板Ｗの第１面に走査露光を行う際に、第２露光処理部４０の露光ステージ４４は右方向に移動しながら長尺基板Ｗの第２面に走査露光を行う。 That is, the first exposure processing unit 20 and the second exposure processing unit 40 are symmetrically arranged so as to be opposite to each other in the X direction, and operate so as to be opposite to each other in the X direction. For example, referring to FIG. 1, when the exposure stage 24 of the first exposure processing unit 20 moves to the left while performing scanning exposure on the first surface of the long substrate W, the exposure of the second exposure processing unit 40. The stage 44 performs scanning exposure on the second surface of the long substrate W while moving to the right.

また、本発明の露光装置では、各部の長尺基板Ｗの搬送速度を合わせて露光動作を行なう。例えば、供給リール１１は露光ステージ２４の移動と同期して基板の巻出しを行う。これは供給リール１１の長尺基板Ｗの残量に応じて、リール回転速度を常時調整することで実現する。露光ステージ４４の移動と巻取りリール１２の巻出しとの関係も同様である。更に、露光ステージ２４と露光ステージ４４も同様に同期して動作する。 Further, in the exposure apparatus of the present invention, the exposure operation is performed by adjusting the conveyance speed of the long substrate W of each part. For example, the supply reel 11 unwinds the substrate in synchronization with the movement of the exposure stage 24. This is realized by constantly adjusting the reel rotation speed according to the remaining amount of the long substrate W on the supply reel 11. The relationship between the movement of the exposure stage 44 and the unwinding of the take-up reel 12 is the same. Further, the exposure stage 24 and the exposure stage 44 also operate in synchronization with each other.

このように搬送速度を合わせ、各部が同期して長尺基板Ｗを搬送することにより、長尺基板Ｗのロールエンド付近に発生する、基板両面にパターン露光をすることができない領域（段取りのための捨て領域）を短くすることができる。 As described above, the conveyance speeds are adjusted so that the respective portions synchronously convey the long substrate W, so that an area where pattern exposure cannot be performed on both surfaces of the substrate that occurs near the roll end of the long substrate W (for setup) Area can be shortened.

また、本発明の露光装置では同一の架台ＢＦに設けられた同じ高さのベース上にステージ移動部２５とステージ移動部４５を設置している。このような構成にしたことにより、露光装置の構成がシンプルとなり、露光装置がコンパクトになる。 Further, in the exposure apparatus of the present invention, the stage moving unit 25 and the stage moving unit 45 are installed on the bases of the same height provided on the same frame BF. With this structure, the structure of the exposure apparatus becomes simple and the exposure apparatus becomes compact.

また、本発明の露光装置では折返し部３０を設ける構造上、供給リール１１と巻取りリール１２とが露光装置の同じサイド（図１では露光装置の右端部）に配置される。このような配置により、リールの交換が容易になり、生産性が向上する。 Further, in the exposure apparatus of the present invention, the supply reel 11 and the take-up reel 12 are arranged on the same side of the exposure apparatus (the right end portion of the exposure apparatus in FIG. 1) due to the structure in which the folding section 30 is provided. With such an arrangement, the reels can be easily replaced and the productivity is improved.

次に、本発明の露光装置の動作について説明する。露光装置１の動作は、長尺基板Ｗを搬送する搬送ステップと、長尺基板Ｗの搬送を停止し次の搬送ステップの準備を行う準備ステップとを交互に実施する。 Next, the operation of the exposure apparatus of the present invention will be described. The operation of the exposure apparatus 1 alternately executes a carrying step for carrying the long substrate W and a preparing step for stopping the carrying of the long substrate W and preparing for the next carrying step.

搬送ステップでは、リール駆動部が供給リール１１と巻取りリール１２の回転速度を制御し、所定の速度で長尺基板Ｗの送り出しと巻取りを行う。また、露光ステージ２４と４４が長尺基板Ｗを吸着した状態でＸ方向に移動しながら、準備ステップでのアライメント結果に従って補正した描画データを用いて、第１露光ユニット２３と第２露光ユニット４３が長尺基板の第１面と第２面にパターンを露光する。なお、搬送ステップ中は基板制動ローラ１６と３２は制動を解除する。 In the carrying step, the reel driving unit controls the rotation speeds of the supply reel 11 and the take-up reel 12, and sends out and winds the long substrate W at a predetermined speed. Further, while the exposure stages 24 and 44 are moving in the X direction while adsorbing the long substrate W, the first exposure unit 23 and the second exposure unit 43 are used by using the drawing data corrected according to the alignment result in the preparation step. Exposes a pattern on the first and second sides of the elongated substrate. The substrate braking rollers 16 and 32 release the braking during the carrying step.

準備ステップでは、リール駆動部が供給リール１１と巻取りリール１２を停止し、基板制動ローラ１６と３２とを制動状態にする。露光ステージ２４と４４の基板吸着を解除し、昇降部を下降、させて露光ステージと長尺基板Ｗとを離間させる。次に、露光ステージ２４、４４を走査開始位置まで戻し、昇降部を上昇させる。基板制動ローラ１６と３２が制動を解除するとともに、露光ステージ２４、４４が長尺基板Ｗの吸着を行う。露光ステージとリール駆動部を駆動させながらアライメントカメラ２２と４２がアライメントマークの撮像し、描画データの位置補正処理を行う。その後、長尺基板Ｗがパターン露光開始位置に来るように露光ステージ２４、４４の位置を調整する。 In the preparation step, the reel drive unit stops the supply reel 11 and the take-up reel 12 and puts the substrate braking rollers 16 and 32 into a braking state. The substrate suction of the exposure stages 24 and 44 is released, and the elevating part is lowered to separate the exposure stage from the long substrate W. Next, the exposure stages 24 and 44 are returned to the scanning start position, and the elevating unit is raised. The substrate braking rollers 16 and 32 release the braking, and the exposure stages 24 and 44 attract the long substrate W. The alignment cameras 22 and 42 capture an image of the alignment mark while driving the exposure stage and the reel drive unit, and perform position correction processing of the drawing data. After that, the positions of the exposure stages 24 and 44 are adjusted so that the long substrate W comes to the pattern exposure start position.

以上の２つのステップを繰り返すことで、長尺基板Ｗの両面にパターンを形成することができる。 By repeating the above two steps, patterns can be formed on both surfaces of the long substrate W.

以上の実施形態では図１を用いて説明したが、図１と基板の搬送方向が異なる場合でも本発明を適用する事ができる。例えば、第１露光処理部２０と第２露光処理部４０とを入れ替え、長尺基板Ｗの搬送方向を反転させてもよい。その場合、供給リール１１と巻取りリール１２の役割も入れ替えればよい。あるいは、リール駆動部１０が露光装置の左端部に来るように、図１の鏡像関係となる構成としてもよい。 Although the above embodiment has been described with reference to FIG. 1, the present invention can be applied even when the substrate transfer direction is different from that in FIG. For example, the first exposure processing unit 20 and the second exposure processing unit 40 may be replaced with each other and the transport direction of the long substrate W may be reversed. In that case, the roles of the supply reel 11 and the take-up reel 12 may be exchanged. Alternatively, the reel drive unit 10 may be in the mirror image relationship of FIG. 1 so that it comes to the left end of the exposure apparatus.

また、以上の実施形態では、第１露光処理部と第２露光処理部を同一高さとして説明したが、露光装置のＸ方向長さを短縮するために露光処理部がＺ方向に一部重なるように配置してもよい。 Further, in the above embodiment, the first exposure processing unit and the second exposure processing unit are described as having the same height, but the exposure processing units partially overlap in the Z direction in order to reduce the length of the exposure apparatus in the X direction. You may arrange so.

また、長尺基板の搬送経路の各部に、必要に応じてダンサーローラ等の基板バッファを設けてもよい。この場合、長尺基板のロールエンド付近の両面露光できない領域が大きくなるが、各部の同期に関して条件を緩和する事ができ、搬送エラー要因を減らすことができる。 In addition, a substrate buffer such as a dancer roller may be provided in each part of the conveyance path of the long substrate, if necessary. In this case, the area where double-sided exposure cannot be performed in the vicinity of the roll end of the long substrate becomes large, but the conditions regarding the synchronization of each part can be relaxed, and the cause of transport error can be reduced.

以上に説明したように、本発明に係る露光装置によれば、長尺基板に対し、露光ステージを用いることで、基板の送り量を高精度に測定し、また、基板の平面性を確保した状態で基板の両面にパターンを描画する露光装置を得ることができる。 As described above, according to the exposure apparatus of the present invention, by using the exposure stage for a long substrate, the substrate feed amount is measured with high accuracy, and the flatness of the substrate is ensured. It is possible to obtain an exposure apparatus that draws a pattern on both surfaces of the substrate in this state.

１ 露光装置
１０ リール駆動部
１１ 供給リール
１２ 巻取りリール
２０ 第１露光処理部
２２ アライメントカメラ
２３ 第１露光ユニット
２４ 露光ステージ
３０ 折返し部
４０ 第２露光処理部
４２ アライメントカメラ
４３ 第２露光ユニット
４４ 露光ステージ
ＢＦ 架台
Ｗ 長尺基板 DESCRIPTION OF SYMBOLS 1 exposure apparatus 10 reel drive section 11 supply reel 12 take-up reel 20 first exposure processing section 22 alignment camera 23 first exposure unit 24 exposure stage 30 folding section 40 second exposure processing section 42 alignment camera 43 second exposure unit 44 exposure Stage BF Stand W Long board

Claims (5)

第１露光処理部と、第２露光処理部と、長尺基板の搬送経路を折返す折返し手段とを備えた露光装置であって、
前記第１露光処理部は、
光変調素子アレイを備え、長尺基板の第１面に前記光変調素子アレイにより変調したパターン光を照射する第１露光部と、
前記長尺基板の長さ方向の一部を平面状に保持する第１露光ステージと、
前記長尺基板の長さ方向に、前記第１露光部と前記第１露光ステージとを相対移動させる第１相対移動手段と、
前記長尺基板に設けられたアライメントマークを撮像するアライメントカメラと、
を備え、
前記第2露光処理部は、
光変調素子アレイを備え、前記長尺基板の第２面に前記光変調素子アレイにより変調したパターン光を照射する第２露光部と、
前記長尺基板の長さ方向の一部を平面状に保持する第２露光ステージと、
前記長尺基板の長さ方向に、前記第２露光部と第２露光ステージとを相対移動させる第２相対移動手段と、
前記長尺基板に設けられたアライメントマークを撮像するアライメントカメラと、
を備え、
前記第１露光処理部と前記第２露光処理部は、前記長尺基板の長さ方向に相反するように対称な配置であり、
前記第１相対移動手段と前記第２相対移動手段とが、前記第１露光ステージと前記第２露光ステージとを、同期して前記長尺基板の長さ方向に沿った相反する方向にそれぞれ移動させるとともに、
前記第１露光部と前記第２露光部とが、前記第１露光ステージと前記第２露光ステージの移動に応じて、前記長尺基板に照射するパターン光をそれぞれ変調することを特徴とする露光装置。 An exposure apparatus comprising a first exposure processing section, a second exposure processing section, and a folding means for folding back a conveyance path of a long substrate,
The first exposure processing unit,
A first exposure unit including a light modulation element array, and irradiating the first surface of the long substrate with the pattern light modulated by the light modulation element array;
A first exposure stage that holds a part of the long substrate in the length direction in a planar shape;
A first relative movement unit that relatively moves the first exposure unit and the first exposure stage in a length direction of the long substrate;
An alignment camera for capturing an image of an alignment mark provided on the long substrate,
Equipped with
The second exposure processing unit,
A second exposure unit comprising a light modulation element array, and irradiating the second surface of the elongated substrate with the pattern light modulated by the light modulation element array;
A second exposure stage for holding a part of the long substrate in the length direction in a flat shape;
Second relative movement means for relatively moving the second exposure unit and the second exposure stage in the length direction of the long substrate;
An alignment camera for capturing an image of an alignment mark provided on the long substrate,
Equipped with
The first exposure processing unit and the second exposure processing unit are symmetrically arranged so as to be opposite to each other in the length direction of the long substrate,
The first relative movement means and the second relative movement means move the first exposure stage and the second exposure stage synchronously in opposite directions along the length direction of the long substrate. And let
An exposure characterized in that the first exposure unit and the second exposure unit respectively modulate pattern light with which the long substrate is irradiated according to movements of the first exposure stage and the second exposure stage. apparatus. 前記第１露光ステージと前記第２露光ステージの間にダンサーローラがないことを特徴とする請求項１に記載の露光装置。The exposure apparatus according to claim 1, wherein there is no dancer roller between the first exposure stage and the second exposure stage. 前記長尺基板を送り出す基板供給手段と、A substrate supply means for sending out the long substrate,
前記長尺基板を巻取る基板巻取り手段と、Substrate winding means for winding the long substrate,
を備え、Equipped with
前記第１および第２露光ステージが前記長尺基板を吸着した状態で同期して移動するとともに、前記基板供給手段と前記基板巻取り手段とが前記第１および第２露光ステージの移動と同期して前記長尺基板の送り出しと巻取りを行うことで前記長尺基板を搬送する搬送ステップと、The first and second exposure stages move in synchronism with the long substrate suctioned, and the substrate supply means and the substrate winding means move in synchronization with the movement of the first and second exposure stages. And a carrying step of carrying the long substrate by feeding and winding the long substrate,
前記長尺基板の搬送を停止し次の搬送ステップの準備を行う準備ステップとを交互に実施することを特徴とする請求項１又は２に記載の露光装置。The exposure apparatus according to claim 1 or 2, wherein a transporting step of the long substrate and a preparatory step of preparing for the next transport step are alternately performed. 前記基板供給手段と前記基板巻取り手段とが露光装置の同一サイドに設けられていることを特徴とする請求項３に記載の露光装置。 The exposure apparatus according to claim 3 , wherein the substrate supply unit and the substrate winding unit are provided on the same side of the exposure apparatus. 前記第１相対移動手段と前記第２相対移動手段とが同じ高さのベース部に設けられていることを特徴とする請求項１乃至４のいずれかに記載の露光装置。 An apparatus according to any one of claims 1 to 4, characterized in that the first relative moving means and the second relative moving means is provided in the base portion of the same height.
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