JP7175149B2 - Exposure device and exposure method - Google Patents

Description

The present invention relates to an exposure apparatus that transports a long substrate (workpiece) such as a flexible printed circuit board by a roll to roll carrier (hereinafter referred to as RtoR transport system).

In an exposure apparatus equipped with an RtoR transport system, a supply reel (unwinding roll) is arranged upstream of the exposure stage and a take-up reel (winding roll) is arranged downstream of the exposure stage to supply a long board such as a printed wiring board. After being wound around the reel and the take-up reel, exposure is performed while conveying from the upstream side to the downstream side.

Specifically, while the exposure stage that sucks and supports the back surface of the long substrate is moved along the long substrate transport direction, the exposure head installed above the long substrate moves to the position of the projection area (exposure target area). A corresponding pattern light is projected. When the exposure stage moves to the exposure completion position, the exposure stage descends and returns to the initial exposure position. By repeating the same exposure operation, a pattern is formed on the entire long substrate (see Patent Documents 1 and 2, for example).

JP 2015-222370 A JP 2009-276522 A

An exposure apparatus equipped with an RtoR transport system requires a space in the substrate feeding direction due to the structure of the transport system. This is because a large number of rollers, such as guide rollers, dancer rollers, and nip rollers, need to be arranged to maintain tension and support the substrate. However, it is extremely difficult to secure a vast space for the exposure apparatus installed in the printed wiring board manufacturing line, as the space for the entire manufacturing line is physically limited. lower the

Therefore, it is required to configure an exposure apparatus of an RtoR transport system in which the installation space is reduced.

The exposure apparatus of the present invention comprises an exposure stage that holds at least one elongated substrate, at least one reel pair that is arranged to face the exposure stage and conveys the elongated substrate, and exposes the elongated substrate. and an exposure unit. For example, the exposure stage can reciprocate along the substrate transport direction.

The present invention includes a relative movement means for relatively moving the exposure stage and the reel pair with respect to the exposure section along the direction orthogonal to the substrate transfer direction. The exposure unit exposes the long substrate when the exposure stage moves relatively. The direction of relative movement here is not strictly limited to the direction orthogonal to the substrate transfer direction, but also includes the direction approximately orthogonal to it. For example, a first movement mechanism is provided for moving the reel pair and the exposure stage relative to the apparatus base along a direction perpendicular to the substrate transfer direction.

For example, a plurality of alignment cameras used during alignment adjustment of the long substrate detect the position of the long substrate. In this case, the alignment cameras can be arranged in parallel along the substrate transport direction. Also, the camera scale section for obtaining the positional information of the alignment camera can be installed in the vicinity of the side surface of the exposure stage along the substrate transfer direction.

An exposure apparatus according to another aspect of the present invention includes an exposure stage that holds at least one long substrate, at least one reel pair that is arranged to face the exposure stage and transports the long substrate, and a long substrate. an exposure section that exposes the substrate, and a relative movement section that relatively moves the exposure stage and the reel pair with respect to the exposure section in a direction along the substrate transfer direction and in a direction perpendicular to the substrate transfer direction. It has The exposure unit exposes the long substrate during the relative movement of the exposure stage.

For example, the relative movement section includes a second movement mechanism that moves the exposure stage and the reel pair with respect to the apparatus base along the substrate transfer direction, and the exposure section with respect to the apparatus base in a direction orthogonal to the substrate transfer direction. and a third moving mechanism for moving along.

An exposure method according to another aspect of the present invention moves an exposure stage and a reel pair relative to an exposure section along a direction orthogonal to a substrate transport direction, and during the relative movement of the exposure stage by the exposure section, Exposure of a long substrate.

An exposure method, which is another aspect of the present invention, moves an exposure stage and a reel pair relative to an exposure unit along a direction along a substrate transfer direction and a direction perpendicular to the substrate transfer direction,
The exposure section exposes the long substrate during the relative movement of the exposure stage.

According to the present invention, it is possible to configure an exposure apparatus of an R-to-R transport system that requires less installation space.

1 is a schematic configuration diagram of an exposure apparatus according to the present embodiment; FIG. 1 is a perspective view schematically showing part of an exposure device; FIG. 1 is a schematic block diagram of an exposure apparatus; FIG. FIG. 4 is a diagram showing the positions of the exposure stage and the transport system at the start of exposure and at the end of exposure; FIG. 10 is a schematic plan view of an exposure apparatus according to a second embodiment viewed from above; FIG. 5 is a schematic plan view of an exposure apparatus according to a second embodiment viewed from the side; FIG. 4 is a schematic block diagram of an exposure apparatus that is a second embodiment; 3 is a schematic block diagram of an exposure apparatus that is a third embodiment; FIG. It is the figure which showed the exposure operation|movement of the exposure apparatus which is 3rd Embodiment. It is the figure which showed the exposure operation|movement of the exposure apparatus which is 3rd Embodiment.

Embodiments of the present invention are described below with reference to the drawings.

FIG. 1 is a schematic configuration diagram of an exposure apparatus according to this embodiment. FIG. 2 is a perspective view schematically showing part of the exposure device. FIG. 3 is a schematic block diagram of an exposure apparatus.

The exposure apparatus 10 is an exposure apparatus having an RtoR transport system that performs an exposure operation while transporting a long substrate W wound in a roll, and includes a substrate supply device 20, a substrate winding device 30, and an exposure unit 40. . The long substrate W is formed in a roll shape by winding a long sheet-like substrate in which a copper thin film layer is formed on a long film and a photosensitive material such as a photoresist is applied (or attached). It is As shown in FIG. 2, the long substrate W is composed of two strips (a pair) of substrates W1 and W2 having the same width.

The exposure stage (table) 15 sucks the back surface of the long substrate W to hold it flat, and can move up and down in the Z direction between a back surface adsorption position and a predetermined spaced position away from the back surface, not shown. It goes up and down by the raising and lowering mechanism. The exposure stage 15 is supported by a stage moving mechanism 50 as will be described later, and is movable along the X direction. In the following description, the direction along the transport direction M of the long substrate W is "X", the direction orthogonal to the transport direction M (substrate width direction) is "Y", and the direction perpendicular to X and Y (vertical direction) is denoted by "Z". Also, the transport direction M is defined including the -X direction.

The exposure unit 40 is arranged at a predetermined distance in the Z direction from the long substrates W1 and W2, and is fixed to the base (pedestal) 10B via a frame (not shown). As shown in FIG. 3, the exposure unit 40 includes a light source 41 such as a semiconductor laser, an illumination optical system 42, a DMD (Digital Micro-mirror Device) 43 having a plurality of micromirrors arranged in a matrix, and an imaging optical system. 44 and the like, and an exposure area along the transport direction M is defined for each exposure head. The light source 41 is driven by the light source controller 110 .

The DMD of each exposure head positions the attitude of the micromirror based on the drawing data (raster data) corresponding to the exposure area position sent from the exposure control unit 120, and thereby the pattern light is projected onto the long substrates W1 and W2. projected onto. By switching the posture of the micromirror according to the relative movement of the long substrates W1 and W2 with respect to the exposure unit 40, the photosensitive material of the long substrates W1 and W2 is exposed (such as multiple exposure), thereby forming a pattern. be done. A controller 100 (see FIG. 3) controls the entire exposure operation of the exposure apparatus 10 . It should be noted that it is also possible to configure an exposure unit using a mask.

The substrate supply device 20 includes supply reels 22A and 22B arranged upstream of the exposure stage 15, a support roller 24, and a driving mechanism (not shown) that rotates the supply reels 22A and 22B. The drive mechanism is composed of, for example, a stepping motor. The supply reels 22A and 22B, which are cantilever-supported by the substrate supply device 20, hold and fix the unexposed portions of the long substrates W1 and W2 in a rolled state, respectively, and axially rotate to move the unexposed portions of the substrates W1 and W2 to the downstream side. The long substrate W can be sent out toward. The side of the supply reels 22A and 22B as viewed from the exposure stage 15 is referred to as the "upstream side", and the side of the take-up reels 32A and 32B is referred to as the "downstream side".

The substrate take-up device 30 includes take-up reels 32A and 32B, a support roller 34 arranged downstream of the exposure stage 15, and a driving mechanism (not shown) for axially rotating the take-up reels 32A and 32B. there is The take-up reels 32A and 32B respectively hold and fix the exposed portions of the long substrates W1 and W2 in a rolled state, and can take up the long substrates W1 and W2 by axial rotation. can. The winding process of the long substrates W1 and W2 by the substrate supply device 20 and the substrate winding device 30 is controlled by the transport controller 130 (see FIG. 3).

Support rollers 24 and 34 respectively arranged between the supply reels 22A and 22B and the take-up reels 32A and 32B and the exposure stage 15 support the long substrates W1 and W2, and the long substrates W1 and W2 are conveyed. It is configured as a free roller that rotates on its axis. The support rollers 24, 34 are adjusted in height so that the long substrates W1, W2 move downstream at the exposure surface height or at a position slightly lower than the exposure surface height. It is cantilevered by the substrate winding device 30 . Appropriate tension is applied to the long substrates W1 and W2 in the bridge portion of the section T (see FIG. 1) between the support rollers 24 and 34, and the long substrates W1 and W2 are conveyed without wrinkling or stretching. It will be done.

Supply reels 22A, 22B and take-up reels 32A, 32B include well-known drive mechanisms 26A, 26B and 36A, 36B that secure the rolled wound portions of substrates W1, W2 during substrate loading. Further, the driving mechanisms of the substrate supply device 20 and the substrate winding device 30 synchronously rotate the supply reel 22A and the take-up reel 32A, and the supply reel 22B and the take-up reel 32B, respectively, to rotate the long substrates W1 and W2 to predetermined positions. It is intermittently conveyed by length.

The stage moving mechanism 50 includes a moving member 52 equipped with an elevating mechanism (not shown) for cantilevering the exposure stage 15, a pair of guide rails 54A and 54B and an actuator 55 installed on the base 10B. A pair of guide rails 54A, 54B extend along the X direction, and the moving member 52 is movable in the X direction and its reverse direction along the guide rails 54A, 54B. The actuator 55 is composed of, for example, a ball screw.

The transfer section moving mechanism 60 includes a plate-shaped moving member 62, a pair of guide rails 64A and 64B installed on the base 10B, and an actuator 65. As shown in FIG. The substrate supply device 20 and the substrate winding device 30 are mounted on the moving member 62 and move together (interlocked). A pair of guide rails 64A, 64B extend along the X direction, and the moving member 62 is movable in the X direction and its reverse direction along the guide rails 64A, 64B.

A movement control unit 70 provided on the base 10B controls the driving of the actuators 55 and 65, and maintains the relative positional relationship between the transport system (the substrate supply device 20 and the substrate winding device 30) and the exposure stage 15. That is, the movement of the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 is feedback-controlled so that the relative distance interval is constant.

A relative distance between the exposure stage 15 and the substrate supply device 20 (substrate take-up device 30 ) along the transport direction M is maintained by synchronous control of servo motors built in the actuators 55 and 65 . In order to monitor this relative distance, a position detection photosensor 90 is arranged on the side of the substrate supply device 20 facing the exposure stage 15 (see FIG. 2). The position detection photosensor 90 incorporates a light source such as an LED and illuminates the side surface of the exposure stage 15 . The side surface of the exposure stage 15 is formed so that the light irradiation position has a light amount difference between the reference position and other positions. The movement control unit 70 monitors whether an appropriate relative distance interval is maintained depending on the amount of detected light during movement of the exposure stage 15 and the substrate supply device 20 .

A position sensor 80 is provided on the support roller 24 side of the exposure stage 15 to detect the edge position of each of the long substrates W1 and W2. The position sensor 80 can be composed of, for example, a transmissive photosensor such as a line sensor. The substrate supply device 20 and substrate take-up device 30 are provided with mechanisms (not shown) for controlling the axial positions of the supply reels 22A and 22B and the take-up reels 32A and 32B, respectively. It is possible to adjust the axial position of the reel by pressing to correct meandering travel.

FIG. 4 is a diagram showing the positions of the exposure stage and transport system at the start of exposure and at the end of exposure.

Before the start of exposure, the exposure stage 15 sucks and holds the long substrates W1 and W2, and the supply reels 22A and 22B and the take-up reels 32A and 32B are in a stationary state because they are not driven. With the start of exposure, the exposure stage 15 moves along the X direction at a predetermined speed. At this time, the substrate supply device 20 and the substrate take-up device 30 move along with the movement of the exposure stage 15 .

That is, it starts moving in synchronization with the exposure stage 15 and moves in the X direction at the same speed as the exposure stage 15 so as to maintain the relative positional relationship between the substrate supply device 20 and the substrate winding device 30 and the exposure stage 15 . run side by side. Therefore, long substrates W1 and W2 are not sent downstream and are stationary with respect to exposure stage 15 before movement of exposure stage 15 and during movement of exposure stage 15 . While the exposure stage 15 is moving, pattern light corresponding to the exposure area position of each exposure head is projected from the exposure section 40 .

When the exposure stage 15, the substrate supply device 20 and the substrate take-up device 30 reach the exposure completion position, the exposure stage 15 releases the long substrates W1 and W2 from the suction support and descends. Then, the supply reels 22A, 22B and the take-up reels 32A, 32B rotate synchronously, and the long substrates W1, W2 are taken up by the take-up reels 32A, 32B by a predetermined length.

When winding onto the winding reels 32A and 32B ends, the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 are synchronously moved to return to the exposure start position. During this time, the supply reels 22A, 22B and the take-up reels 32A, 32B are stationary because they are not driven. By repeating the exposure operation described above, a pattern is formed on the entire long substrates W1 and W2.

As described above, according to this embodiment, in the exposure apparatus 10 having the RtoR transport system for transporting the long substrates W1 and W2, the substrate supply reels 22A and 22B provided upstream of the exposure stage 15 hold the supply reels 22A and 22B. A device 20 and a substrate winding device 30 holding take-up reels 32A and 32B provided downstream are provided. During the exposure operation, the stage moving mechanism 50 moves the exposure stage 15 in the X direction, and at the same time, the substrate supply device 20 and the substrate take-up device 30 move together in the X direction by the transfer section moving mechanism 60 .

Since the substrate transport system (substrate supply device 20, substrate winding device 30) moves together with the exposure stage 15, the long substrates W1 and W2 are not sent downstream before and during the movement of the exposure stage 15. . Therefore, meandering travel during exposure, which occurs in a conventional transport system, is suppressed, and warpage due to exposure position shift or wrinkling of the substrate due to meandering travel does not occur. Further, by constructing such a substrate transfer system, it is possible to construct the substrate transfer system with a simple structure without the need to provide a mechanism such as a dancer roller.

The substrate supply device 20 and the substrate take-up device 30 only have to feed the long substrate W in one direction downstream during exposure, and there is no need to rewind it. Therefore, it is possible to realize pattern exposure in which meandering of the long substrate W is suppressed. In particular, it is suitable for an exposure apparatus that transports two strips of long substrates W1 and W2 that are difficult to adjust for meandering.

Since the board transfer system moves, the board transfer length (the length of the board between the supply reels 22A, 22B and the take-up reels 32A, 32B) can be shortened. By shortening the substrate transfer length, wrinkles and stretches of the long substrates W1 and W2 are less likely to occur, and patterns can be formed with high accuracy. In particular, only one support roller 24, 34 can be provided to constitute a transport system for sending out the long substrates W1, W2.

Further, after the exposure operation is completed, the long substrates W1 and W2 are sent downstream and wound up while the long substrates W1 and W2 are not being sucked and supported by the exposure stage 15, so winding can be performed smoothly. . At this time, since the board transfer length is short, winding can be performed in a short time.

In this embodiment, the exposure stage 15 and the substrate transfer system (substrate supply device 20, substrate take-up device 30) are separately driven by a stage moving mechanism 50 and a transfer section moving mechanism 60, respectively. Regarding the long substrates W1 and W2, the winding diameters of the roll-shaped portions of the supply reels 22A and 22B and the roll-shaped portions of the take-up reels 32A and 32B are The weight balance is not constant because it changes gradually in the process of being worn.

However, by providing the transport unit moving mechanism 60 different from the stage moving mechanism 50, even if there is a change in the weight balance of the long substrates W1 and W2, it is possible to prevent the movement control of the exposure stage 15 from being affected. Further, it is possible to construct a transport system while using a conventional stage moving mechanism.

On the other hand, the substrate supply device 20 and the substrate winding device 30 are fixedly supported by the same moving member 62 and move together. Since the substrate supply device 20 and the substrate take-up device 30 are interlocked, the relative positional relationship between the substrate supply device 20 and the substrate take-up device 30 does not change, and the relative maintenance relationship with the exposure stage 15 is maintained. It becomes easier to let In addition, the conveying unit moving mechanism 60 can be combined with one drive system.

On the other hand, the movement control unit 70 drives and controls the actuators 55 and 65 so as to maintain the relative positional relationship between the exposure stage 15 and the substrate supply device 20 and the substrate winding device 30 while the exposure stage 15 is moving. there is As a result, the supply reels 22A and 22B and the take-up reels 32A and 32B approach the exposure stage 15, thereby suppressing the elongated substrates W1 and W2 from being stretched or warped, and also preventing exposure position deviation.

Note that the movement control unit 70 may control the movement speed and acceleration when the distance becomes equal to or greater than a threshold. Alternatively, the supply reels 22A, 22B and/or the take-up reels 32A, 32B may be controlled to rotate axially to adjust the long substrates W1, W2 to be appropriately tensioned.

In addition to the two strips of long substrates W1 and W2, it is also possible to arrange a larger number of long substrates in parallel and transport them at the same time. The substrate supply device 20 and the substrate winding device 30 may be moved by separate moving mechanisms without being mechanically connected. Further, the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 may be moved by the same movement mechanism.

In the above embodiment, the substrate supply device 20 is provided on the upstream side of the exposure stage 15, and the substrate winding device 30 is provided on the downstream side thereof. Although the take-up reels 32A and 32B are driven, the long substrates W1 and W2 may be moved in opposite directions.

That is, two pairs of reels are provided on both sides of the exposure stage 15, and the supply reel and the take-up reel are installed so that one reel pair is wound in the X direction, while the other reel pair is oriented in the -X direction. It is possible to provide a supply reel and a take-up reel so as to take up the film. In this case, a pair of transfer devices, which combine the functions of the substrate supply device and the substrate winding device, are moved with respect to the exposure stage. When the long substrates W1 and W2 are configured to move in opposite directions in this way, it is possible to reduce the change in the weight balance of the long substrates between the upstream side and the downstream side of the exposure stage.

Next, an exposure apparatus according to a second embodiment will be described with reference to FIGS. 5 to 7. FIG. In the second embodiment, both the exposure stage and the transport system move along the direction (Y) orthogonal to the transport direction (M).

FIG. 5 is a schematic top view of the exposure apparatus in the second embodiment, and FIG. 6 is a schematic side view of the exposure apparatus in the second embodiment. FIG. 7 is a schematic block diagram of an exposure apparatus in the second embodiment.

The exposure apparatus 10 ′ includes an exposure section 140 and a substrate supply/winding section 150 . The exposure section 140 is composed of six exposure heads 140A to 140F, which are arranged in a staggered manner along the transport direction M. As shown in FIG. Light from the light source 41 is guided to each exposure head, and pattern light is projected from each exposure head onto a determined exposure area.

The substrate supply/winding unit 150 includes a supply reel 22, a take-up reel 32, and support rollers 24 and 34, and feeds and winds up the long substrate W in the same manner as in the first embodiment. The substrate supply/winding unit 15053 and the exposure stage 15 are both installed on the intermediate base 170 .

The stage/conveyance section moving mechanism (first movement mechanism) 160 is a mechanism for moving the exposure stage and the substrate supply/winding section 150 in a direction intersecting the conveyance direction M. As shown in FIG. The first moving mechanism 160 includes guide rails 162A and 162B extending in a direction perpendicular to the transport direction M, and an actuator (for example, a linear motor) not shown. The intermediate base 170 can be reciprocated in a direction Y perpendicular to the transport direction M by a stage/transport unit moving mechanism 160 installed on the base 10B.

By moving the intermediate base 170 with respect to the base 10B of the exposure apparatus 10′, the exposure stage 15 and the substrate supply/transport section 20 including the supply reel 22 and the take-up reel 32 are moved relative to the exposure section 40. to move. The exposure unit 40 projects pattern light while the exposure stage 15 is relatively moving.

A plurality of alignment cameras 82 are arranged near the end surface of the exposure stage 15 along the transport direction M, and detect the exposure position of the long substrate W. As shown in FIG. In addition, a camera scale unit 84 having a camera scale provided with a measurement mark for the camera reference position and a sensor unit for measuring an error in the exposure position of the exposure head and correcting the drawing data is also arranged in the transport direction M of the exposure stage 15. It is arranged near the end face along the

After the exposure starts, the intermediate base 170 moves relative to the exposure unit 140, and when the exposure ends, the intermediate base 170 returns to its original position. Then, when the long substrate W is conveyed by a predetermined length, the exposure operation is started. This is repeated to form a pattern on the long substrate W. FIG.

As described above, according to the present embodiment, in the exposure apparatus 10′ including the exposure unit 140 and the substrate supply/winding unit 150, the substrate supply/winding unit 150 and the exposure stage 15 are integrated to transport the substrate. It reciprocates along a direction orthogonal to the direction M. The exposure unit 140 exposes the long substrate W according to the relative movement of the exposure stage 15 .

Since the exposure unit 130 scans in the direction orthogonal to the substrate transport direction M in this manner, the exposure apparatus 10' can be made compact. Further, since the exposure section 140 is not installed above the exposure stage 15, the configuration of the exposure section 140 can be freely set. Further, since the alignment camera 82 is not installed above the long substrate W, the length of the exposure stage 15 in the transport direction can be shortened. Furthermore, it is not necessary to arrange the camera scale part 84 above the long substrate W, and there is no need to provide a U-shaped path for retracting the long substrate W, so that the long substrate W is not stressed.

In the second embodiment, the exposure stage 15 and the substrate supply/conveyance unit 150 are moved to achieve relative movement between the long substrate W and the exposure unit 140 for exposure. It may be fixed and the exposure unit 40 may be moved in a direction orthogonal to the transport direction M by a moving device (not shown). Also, the long substrate W may be composed of two strips of substrates as in the first embodiment. In this case, the exposure section 40 exposes two substrates at the same time.

Next, a third embodiment will be described with reference to FIGS. 8 and 9. FIG. In the third embodiment, the transport system moves along the substrate transport direction, and the exposure unit moves along the direction orthogonal to the substrate transport direction.

FIG. 8 is a block diagram of an exposure apparatus according to the third embodiment. The exposure apparatus 10″ is an exposure apparatus that exposes two long substrates W1 and W2, and includes an exposure unit 240 and a substrate supply/winding unit 250. The exposure unit 240 here includes four substrates. The exposure heads 240A to 240D are arranged in a zigzag arrangement along the transport direction M. As shown in FIG.

The substrate supply/winding unit 220 includes a supply reel 22, a take-up reel 32, and support rollers 24 and 34, and feeds and winds the long substrates W1 and W2 in the same manner as in the first embodiment. The substrate supply/winding unit 220 and the exposure stage 15 are both installed on the intermediate base 270 .

A stage/transportation unit moving mechanism (second moving mechanism) 260 includes guide rails 262A and 262B extending along the transportation direction M, and is installed on the base 10B. The intermediate base 270 can be reciprocated along the transport direction M by the stage/transport unit moving mechanism 260 . The exposure unit moving mechanism (third moving mechanism) 250 moves the exposure unit 40 along the direction perpendicular to the transport direction M. As shown in FIG.

9A and 9B are diagrams showing the exposure operation of the exposure apparatus in the third embodiment.

When the intermediate base 270 moves along the transport direction M while the exposure unit 240 is stationary, the exposure unit 240 scans to form a pattern on the area EA1 of the long substrate W1 ((A), (B)). After that, while the intermediate base 270 is stationary, the exposure unit 40 moves along the direction orthogonal to the transport direction M and stops above the long substrate W2 (see (C)).

The intermediate base 270 moves along the direction opposite to the transport direction M this time. During this time, the exposure unit 240 forms a pattern on the exposure area E2 (see (D)). When the exposure unit 40 moves again above the long substrate W1, the intermediate base 270 moves along the transport direction M. As shown in FIG. During that time, the exposure section 340 forms a pattern in the exposure area EA3 (see (E) and (F)).

Subsequently, the exposure unit 240 moves to the long substrate W2, and the intermediate base 20 moves in the direction opposite to the transport direction M. During this time, the exposure unit 240 forms a pattern in the exposure area EA4 (see (G) and (H)). By continuing to repeat such alternate movements of the exposure unit 240 and the intermediate base 270, patterns are sequentially formed on both the long substrates W1 and W2.

As described above, according to the third embodiment, the exposure unit 240 and the exposure stage 15 move in the X and Y directions. Both can be exposed.

Alternatively, the exposure stage 15 and the substrate supply/winding unit 220 may move in a direction orthogonal to the substrate transfer direction M, and the exposure unit 240 may move along the substrate transfer direction M. Further, the substrate supply/winding section 220 may move in the substrate transport direction M and a direction perpendicular thereto, and conversely, the exposure section 240 may move in the substrate transport direction M and a direction perpendicular thereto.

10′ exposure device 10″ exposure device 15 exposure stage 22 supply reel 32 take-up reel 140 exposure unit 150 substrate supply/winding unit 160 stage/conveyance unit moving mechanism (first moving mechanism)
220 substrate supply/winding unit 240 exposure unit 250 exposure unit moving mechanism (third moving mechanism)
260 stage/conveyor movement mechanism (second movement mechanism)

Claims (6)

an exposure stage holding at least one elongated substrate;
at least one reel pair disposed opposite to each other with the exposure stage interposed therebetween for transporting the long substrate;
an exposure unit that exposes the long substrate;
a relative movement unit that relatively moves the exposure stage and the reel pair with respect to the exposure unit along a direction along the substrate transfer direction and a direction perpendicular to the substrate transfer direction during an exposure operation. An exposure apparatus characterized by: 2. The method according to claim 1, wherein the relative moving unit includes a first moving mechanism that moves the reel pair and the exposure stage relative to the base along a direction orthogonal to the substrate transport direction. Exposure equipment. 3. The exposure apparatus according to claim 1, further comprising a plurality of alignment cameras that detect the position of the long substrate and are arranged in parallel along the substrate transfer direction. 4. The exposure according to any one of claims 1 to 3, further comprising a camera scale unit installed near a side surface of the exposure stage along the substrate transport direction for obtaining positional information of the alignment camera. Device. a second moving mechanism that causes the relative moving unit to move the exposure stage and the reel pair with respect to the base along the substrate transport direction;
2. The exposure apparatus according to claim 1 , further comprising: a third moving mechanism that moves the exposure unit relative to the base along a direction orthogonal to the substrate transport direction. moving the exposure stage and the reel pair relative to the exposure unit along a direction along the substrate transfer direction and a direction perpendicular to the substrate transfer direction;
An exposure method, wherein the long substrate is exposed by the exposure unit during the relative movement of the exposure stage.

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