JP6554330B2 - Maskless exposure apparatus and exposure method - Google Patents

Description

  The present invention relates to an exposure apparatus and an exposure method for directly drawing and forming a long pattern without using a mask.

  Large machines such as automobiles are provided with electrical parts (control circuit boards, etc.) at a plurality of locations. Conventionally, a plurality of coated electric wires (coated electric wires) have often been bundled and used for signal lines and power supply lines between electrical components. On the other hand, since the covered electric wire is heavy, there is an attempt to use wiring by an FPC board instead of the covered electric wire. In the case of an FPC board, a large number of wirings can be gathered into a predetermined plane shape, the thickness is thinner than that of the covered electric wire, and it can be bent freely.

JP, 2000-227661, A JP 2005-300804 A

  However, the exposure apparatus for large-sized FPC boards, particularly long-sized FPC boards, has problems compared to small-sized FPC boards. In particular, a contact exposure apparatus using a mask needs to prepare a photomask corresponding to the entire surface of a long pattern, and exposure must be performed while exchanging several photomasks. , There was a problem that productivity is low.

  On the other hand, there is known a roll-to-roll type maskless exposure apparatus provided with a light modulation element array such as DMD (Digital Micro-mirror Device) in the exposure section as an apparatus for exposing a pattern on an FPC substrate without using a mask. It is done. In the case of such a maskless exposure apparatus, in order to obtain exposure accuracy, exposure is generally performed using an exposure stage while maintaining a flat surface of a long substrate (Patent Document 1). In Patent Document 1, the light modulation element array and the long work are held in a state where the long substrate (work) is suctioned and fixed to the exposure stage and the distance between the exposure unit and the long work surface is kept constant. A roll-to-roll type maskless exposure apparatus is disclosed that projects pattern light onto a photosensitive agent layer on a long work surface while making relative movement. However, in the roll-to-roll type maskless exposure apparatus as in Patent Document 1, since a long pattern exceeding the size of the stage cannot be exposed, the maximum size of the FPC substrate that can be exposed with the size of the stage is regulated. It will

  On the other hand, Patent Document 2 is a roll-to-roll maskless exposure apparatus that does not use a stage. Since the long workpiece which is stretched by two rollers and continuously transported is continuously exposed during transportation, the size of the stage does not restrict the maximum size of the FPC board. However, the maskless exposure apparatus having no exposure stage as in Patent Document 2 has a problem in terms of exposure accuracy because it is difficult to perform exposure while maintaining the flatness of the workpiece.

  Based on the above problem awareness, the present invention provides a maskless exposure apparatus and exposure method capable of accurately exposing a continuous long pattern to a long substrate without causing disconnection or meandering of pattern lines. The purpose is to get.

  In the present invention, when a long pattern is exposed on a long substrate held by a substrate holding means (exposure stage), the remaining part (or long length) of the long pattern is determined according to the position of a part of the long pattern already exposed. By adjusting the exposure position of the remaining part of the scale pattern), it has been completed based on the viewpoint of forming a continuously connected pattern.

In the maskless exposure apparatus of the present invention, an exposure unit including a light modulation element array, a substrate holding unit for holding a part of the long substrate in a longitudinal direction in a planar shape, and a longitudinal direction of the long substrate. A relative moving means for relatively moving the exposure means and the substrate holding means; and a data storage means for storing long exposure pattern data for exposing the long substrate.
The exposure unit and the substrate holding unit are moved relative to each other by the relative movement unit and a divided exposure pattern data generation unit that generates divided exposure pattern data divided in the length direction of the long substrate from the long exposure pattern data And an exposure control unit that causes the exposure unit to expose the long substrate in accordance with the divided exposure pattern data created by the divided exposure pattern data creation unit , the exposure control unit including the exposure control unit according to the transport of the long substrate. It is characterized in that the divided exposure pattern data to be exposed by the exposure means is switched .

In a preferred embodiment, the exposure control means performs the unexposed switching which is subsequently exposed on the basis of the position of the divided pattern exposed on the long substrate by the exposure means based on one of the divided exposure pattern data. The exposure position of the obtained divided exposure pattern data is adjusted, and a continuous pattern continuously formed on the long substrate is formed.

  The adjacent divided exposure pattern data preferably have overlapping end portions in the lengthwise direction of the long substrate.

  The exposure control means preferably includes mark position detection means for detecting the position of the pattern alignment mark formed by the exposure means on the long substrate.

The exposure control means preferably further comprises a substrate end face detection means for detecting the position of at least one end face along the relative movement direction of the long substrate.

Then, the exposure control means includes an imaging means which doubles as the mark position detection means and the substrate end face detection means by capturing the pattern alignment mark and the substrate end face in the same field of view.

According to the present invention, an exposure means including a light modulation element array, a substrate holding means for holding a part of the longitudinal direction of the long substrate in a planar shape, the exposure means and the substrate in the longitudinal direction of the long substrate What is claimed is: 1. A maskless exposure method for forming a long pattern continuously connected on the long substrate by a maskless exposure apparatus comprising: a relative movement means for moving the holding means relative to the long substrate, the maskless exposure method comprising: Creating a plurality of divided exposure pattern data obtained by dividing the long exposure pattern data in the length direction of the long substrate; and moving the exposure means and the substrate holding means relative to each other by the relative moving means. comprising the steps of any one of the divided exposure pattern data exposure to the long substrate, following the transfer of the long substrate, the divided exposure pattern data said exposure means exposes A step of changing Ri, based on the position of the division pattern that is exposed to the long substrate by the exposure means on the basis of said one of the divided exposure pattern data, followed by the switched unexposed said exposing divided exposure pattern Adjusting the exposure position of the data to form an elongated pattern continuously connected on the elongated substrate.

  Also in this maskless exposure method, it is preferable that the adjacent divided exposure pattern data have overlapping end portions in the longitudinal direction of the long substrate.

  According to the maskless exposure apparatus and exposure method of the present invention, a continuous long pattern can be accurately exposed on the long substrate without disconnection or meandering of the lines of the pattern.

It is a front view which shows one Embodiment of the exposure apparatus of the roll to roll system to which the maskless exposure apparatus by this invention is applied. It is a top view of the part containing the alignment camera and exposure stage of the exposure apparatus of FIG. It is a top view containing the exposure unit and alignment camera of the exposure apparatus of FIG. 1 is a block diagram of a maskless exposure apparatus according to the present invention. It is a top view which shows an example of the elongate exposure pattern data drawn on a elongate board | substrate using the maskless exposure apparatus by this invention. FIG. 6 is a plan view showing divided exposure pattern data obtained by dividing the long exposure pattern data of FIG. 5 into five in the length direction of the long substrate. (1), (2), (3), (4), (5), (6), when you execute the divided exposure to long substrate by divided divided exposure pattern data as shown in FIG. 6 It is a top view which shows the operation example of the board | substrate with respect to an exposure unit and an alignment camera, and an exposure stage.

  FIG. 1 shows a basic configuration of a roll-to-roll type exposure apparatus 1 to which a maskless exposure apparatus according to the present invention is applied. The exposure apparatus 1 exposes a pattern on the surface of the long substrate W and a supply unit 10 that supplies the long substrate W in order from the upstream side to the downstream side in the transport direction M of the long substrate (workpiece) W. The exposure unit 30 forms an electronic circuit, and the winding unit 20 collects the exposed long substrate W.

  The long substrate W is a sheet-like substrate made of a copper-clad laminate coated with a photosensitive material such as a photoresist, and has a length of several tens to several hundreds of meters. By performing steps such as development, etching, and cutting after exposure, the substrate of the FPC board is obtained.

  The supply unit 10 sequentially supplies the supply reel 11, the guide roller 12, the supply-side dancer roller 13, the guide roller 14, the supply-side braking roller 15, and the front and rear in order from the upstream side to the downstream side in the transport direction M of the long substrate W. An end position sensor 16 is provided, and a work supply system for supplying the long substrate W to the exposure unit 30 is configured. The winding unit 20 includes a winding side braking roller 25, a guide roller 24, a winding side dancer roller 23, a guide roller 22, and a winding unit in order from the upstream side to the downstream side in the transport direction M of the long substrate W. A reel 21 is provided to constitute a work winding system for winding the long substrate W exposed by the exposure unit 30.

  The exposure unit 30 is disposed between the supply-side braking roller 15 and the take-up-side braking roller 25. The moving direction (conveying direction M) of the long substrate W moving between the supply-side braking roller 15 and the winding-side braking roller 25 is X direction, and the direction (thickness direction) orthogonal to the long substrate W is Z direction, A direction orthogonal to the X direction and the Z direction is defined as a Y direction. The exposure unit 30 includes an exposure stage (substrate holding unit) 31, a pair of alignment cameras 41 (see FIG. 2), and an exposure unit (exposure unit) 51.

  The exposure unit 51 includes a plurality of exposure heads (not shown), and is regularly arranged at a position away from the long substrate W by a predetermined distance vertically upward. A light source and an illumination optical system (not shown) are arranged for each exposure head, and light emitted from the light source is guided to the corresponding exposure head via the corresponding illumination optical system. Each exposure head includes a DMD (Digital Micro-mirror Device) in which a plurality of micro mirrors are two-dimensionally arranged, and an imaging optical system for imaging an image of the DMD on a long substrate. The exposure unit 51 can expose an image within the exposure range AE (see FIG. 3).

  A technique for multiple exposure of a pattern using DMD is a well-known technique which is disclosed, for example, in Japanese Patent Application Laid-Open No. 2003-084444 and is widely put to practical use. Further, a technique for drawing one pattern using a plurality of heads is a well-known technique disclosed in, for example, Japanese Patent Application Laid-Open No. 2003-195512 and widely used.

  The exposure unit (exposure means) 51 creates divided exposure pattern data in which the long exposure pattern data to be exposed on the long substrate W is divided into a plurality of pieces in the lengthwise direction of the long substrate W, and then the divided exposure pattern Data are sequentially exposed on the long substrate W. FIG. 5 shows a specific example of the long exposure pattern data P. FIG. 6 shows divided exposure pattern data DPn (n = n) obtained by dividing the long exposure pattern data P into five in the length direction of the long substrate W. 1 to 5) are shown. The long exposure pattern data P is a wiring pattern having a size of, for example, 2000 (X) × 250 (Y) mm as shown in the figure. The wiring width or spacing is, for example, 2 mm. Further, although the drawing exemplifies the pattern of only the wiring, an electric circuit pattern or the like for mounting the electric component may be provided in the long pattern.

  As shown in FIG. 6, the divided exposure pattern data DP1 to DP5 have an overlap section AO1 to an overlap section AO4. A pair of pattern alignment marks MP is included on both sides in the Y direction of the line drawing pattern PL extending in the vertical direction.

  The exposure stage 31 sucks (for example, vacuum sucks) the back surface of the long substrate W and holds it in a flat shape, and is freely movable in the X direction and the Z direction. That is, on the gantry 2, a guide rail 33 extending in the X direction is provided, and a lifting unit 34 for lifting the exposure stage 31 is supported by a stage moving unit 32 movably supported by the guide rail 33. . The exposure stage 31 is moved up and down between the upper end position contacting the back surface of the long substrate W and the lower end position spaced apart from the back surface of the long substrate W by the lifting unit 34. The stage moving unit 32 can move forward and backward (downstream and upstream) in the X direction. A movable locus 31M of the exposure stage 31 is shown by a two-dot chain line in FIG. The stage moving unit 32 constitutes relative moving means for relatively moving the exposure stage 31 and the exposure unit 51 in the length direction of the long substrate W. The range (area) in which the exposure stage 31 can suction and hold the long substrate W at one time is, for example, 620 (X) × 520 (Y) mm.

  FIG. 2 is a view of the state in which the exposure stage 31 holds the long substrate W by suction as seen from the substrate surface side. The code DE indicates an area which can be exposed in one exposure step (that is, one area of the divided exposure pattern data DP1 to DP5). Reference numeral A denotes an exposure start position in the first exposure step, and reference numeral B denotes an exposure end position in the first exposure step.

  The pair of alignment cameras 41 are disposed upstream of the exposure unit 51 and pick up an image of the pattern alignment mark MP formed on the long substrate W by exposure. The image captured by each alignment camera 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and the position information of the pattern alignment mark MP is acquired by the mark position detecting means 60b.

  In the present embodiment, the alignment camera 41 is provided with a substrate end face detection means 60c that senses not only the pattern alignment mark MP but also the substrate end face EW as a kind of mark and detects the position of the end face. If the pattern alignment mark MP and the substrate end face EW simultaneously enter the field of view AC of the alignment camera 41, imaging of the pattern alignment mark MP and the substrate end face EW is possible without moving the alignment camera 41 in the Y direction. (FIG. 5) may move the alignment camera 41 in the Y direction to image the pattern alignment mark MP and the substrate end face EW. Here, the alignment camera 41, the image processing unit 60a, and the substrate end face detection means 60c constitute a substrate end face detection means for detecting the position of at least one end face along the relative movement direction of the long substrate W. The alignment camera 41 constitutes an imaging unit that serves as both the mark position detection unit 60b and the substrate end surface detection unit 60c by capturing the pattern alignment mark MP and the substrate end surface EW in the same visual field CA.

  Image processing unit 60a (mark position detection means) acquires positional information of substrate end face EW, thereby twisting (merging) the exposed divided exposure pattern data DP1 to DP5, and obliquely exposing divided exposure pattern data DP1 to DP5 It is possible to prevent the outside of the work from being pushed out. Specifically, for example, when determining the exposure positions of the divided exposure pattern data DP1 to DP5, the X direction correction amount of the divided exposure pattern data DP1 to DP5 is at least one pattern alignment mark MP of the pair of pattern alignment data MP. The Y direction correction amount is determined based on the position information of at least one of the substrate end faces EW or the position information of at least one of the pattern alignment marks MP.

  The substrate end face detection means 60c (and the mark position detection means 60b) can detect an angle formed by the substrate end face EW (longitudinal direction of the long substrate W) with respect to the X direction as a θ direction correction amount. For example, the case where the substrate end face EW (longitudinal direction of the long substrate W) is parallel to the X direction is detected as 0 °. The detected θ direction correction amount can be adjusted by changing the drawing timing of the exposure unit 51 (DMD) in the Y direction.

  FIG. 4 is a control block diagram of the maskless exposure apparatus according to the present invention. The exposure apparatus 1 further includes a supply unit 10, a winding unit 20, and an exposure unit 30, and an exposure apparatus control unit 60 that controls them overall. The exposure apparatus control unit 60 generates divided exposure pattern data for actual exposure from the image processing unit 60a, data storage means 60e storing long exposure pattern data, and the long exposure pattern data. A pattern data creation unit 60d is provided. The image processing unit 60a has a function of detecting pattern position information (X-direction position, Y-direction position and inclination θ of the divided pattern DPn) from image data captured by the alignment camera 41. The exposure apparatus 1 (exposure unit 30) further includes a monitor 61 that displays image data taken by the alignment camera 41. The user can recognize the alignment by looking at the display on the monitor 61.

  The exposure apparatus 1 includes a supply reel drive unit 11a for driving and controlling the supply reel 11 on the supply unit 10 side and a brake roller drive unit 15a for driving and controlling the supply side brake roller 15, and a winding unit 20 on the winding unit 20 side. A take-up reel drive unit 21 a that drives and controls the reel 21 and a braking roller drive unit 25 a that drives and controls the take-up side braking roller 25 are provided. The exposure apparatus control unit 60 applies forward and reverse rotational forces to the supply reel 11 and the take-up reel 21 via the supply reel drive unit 11a and the take-up reel drive unit 12a, and moves the long substrate W forward and backward. . The exposure device control unit 60 holds the long substrate W by the pair of supply side braking rollers 15 and the pair of take-up side braking rollers 25 via the braking roller drive units 15 a and 25 b to move the long substrate W in the X direction. Generates a braking force (load). Further, the pair of supply side braking rollers 15 and the pair of winding side braking rollers 25 are separated from the long substrate W to release the braking force (load). The exposure apparatus control unit 60 detects the front and rear ends of the long substrate W in the X direction (longitudinal direction) and the passage of these from the output of the front and rear end position sensor 16.

  The exposure unit 30 includes an exposure unit drive unit 52 that drives the exposure unit 51 according to the divided exposure pattern data generated by the divided exposure pattern data generation unit 60 d. The exposure unit 30 is controlled by an exposure apparatus control unit 60, a stage movement drive unit 32a that drives the stage movement unit 32, a lift unit drive unit 34a that drives the lift unit 34 to move the exposure stage 31 up and down, An adsorption driving unit 31 a that adsorbs or opens the long substrate W on the surface of the exposure stage 31 is provided.

  Based on the long exposure pattern data P stored in the data storage unit 60e, the divided exposure pattern data generation unit 60d creates divided exposure pattern data DPn for one exposure step. However, n is a positive integer of 2 or more, and the maximum value is the number of divisions of the long exposure pattern data P. When the divided exposure pattern data generation unit 60d generates the divided exposure pattern data DP from the long exposure pattern data P, the divided exposure pattern data generation unit 60d generates the divided exposure pattern data DPn so that the divided exposure patterns overlap in the overlap section AO. The exposure unit drive unit 52 drives the exposure unit 51 based on the divided exposure pattern data DPn to expose the divided exposure pattern onto the long substrate W.

  The exposure apparatus control unit 60 performs exposure operation a plurality of times while switching the divided exposure pattern data DPn to expose one long line drawing pattern PL continuously joined onto the long substrate W. An exposure control means 60f is provided (FIG. 4). The exposure apparatus control unit 60 (exposure control means 60f) is configured by the supply unit 10, the winding unit 20, and the exposure unit 30 via the above-described drive units 11a and 15a, 21a and 25a, and 31a, 32a, and 34a. Drive control.

The pattern alignment mark MP on the drawing data may be included in the long exposure pattern data P in advance, or the pattern alignment mark MP is automatically added when the divided exposure pattern data DPn is created. Also good.
Although the pattern alignment mark MP is shown as a round mark in the drawing, it may be a known alignment mark such as a cross shape.

  Next, an example of the exposure operation by the maskless exposure apparatus and the exposure method of the present invention will be described with reference to FIG. In the figure, the left direction in the X direction is defined as the downstream direction, and the right direction is defined as the upstream direction.

  Step 1: The exposure stage 31 located at the preparation position rises from the lowered position to the holding position of the long substrate W, and suction-holds the rear surface of a part of the long substrate W (FIG. 7 (1)). The supply-side braking roller 15 and the winding-side braking roller 25 separate from the long substrate W and release the braking force to the movement of the long substrate W. In this state, the exposure stage 31 moves in the downstream direction with respect to the exposure unit 51, and the exposure unit 51 draws a line drawing pattern (division pattern) PL on the long substrate W by the division exposure pattern data DPn (DP1) Exposure) and the pattern alignment marks MP are exposed on both sides near the upstream end of the line drawing pattern PL. Thus, when the exposure of the divided exposure pattern data DPn (DP1) and the pattern alignment mark MP is completed, the exposure stage 31 stops at the X-direction exposure end position (FIG. 7 (2)). The exposed pattern alignment mark MP is formed as an image that can be captured by the self-coloring action of the photoresist.

The timing at which the exposure unit 51 draws (exposures) the divided exposure pattern data DPn (DP1) is controlled by the distance by which the exposure stage 31 has moved in the downstream direction from the start position. The exposure start point (exposure start line orthogonal to the transport direction M of the substrate W) A is the first exposure start position on the long substrate W, and the exposure end point (same) B is on the long substrate W This is the first exposure end position.
In the case of the exposure of the first divided exposure pattern data DPn (DP1), since the pattern alignment mark MP is not formed on the substrate, imaging of the pattern alignment mark MP by the alignment camera 41 before exposure is not performed. Instead, the end surface EW of the long substrate W is imaged, and the drawing exposure position (Y and θ coordinates) of the divided exposure pattern DP1 is determined.

  Step 2: The supply-side braking roller 15 and the take-up-side braking roller 25 sandwich the long substrate W, and the exposure stage 31 releases the attraction of the long substrate W and descends, and the supply reel 11 takes the long substrate W It takes up and moves the long substrate W in the upstream direction. Thereafter, the supply reel 11 is stopped with the alignment camera 41 capturing the pattern alignment mark MP in the field of view CA, and the supply-side braking roller 15 and the take-up-side braking roller 25 hold the long substrate W therebetween. The movement of the substrate W is restricted (stopped). After the exposure stage 31 returns to the exposure start position in the X direction, the exposure stage 31 ascends to a position for holding the long substrate W, and suction-holds the back surface of a part of the long substrate W that is being held (see FIG. )).

  The alignment camera 41 images the pattern alignment mark MP (and the substrate end surface EW), and the image processing unit 60a detects the position of the pattern alignment mark MP formed on the long substrate W based on the imaged image data. Then, a connection position (alignment connection position) for connecting the divided exposure pattern data DPn + 1 (DP2) to be newly exposed and the divided exposure pattern data DPn (DP1) that has been exposed is set. The set alignment connection position includes an overlap section AOn (AO1) (FIG. 6).

  Step 3: The supply-side braking roller 15 and the take-up-side braking roller 25 release the holding pressure of the long substrate W, and the exposure stage 31 sucks the long substrate W in the downstream direction. Moving. The exposure unit 51 is configured such that the divided exposure pattern data DPn + 1 (DP2) is connected to the divided exposure pattern data DPn (DP1) on the long substrate W via the overlap section AOn (overlap section AO1). A line drawing pattern (division pattern) PL of data DP2 is drawn (exposed), a pair of pattern alignment marks MP are exposed on both sides near the upstream end of the line drawing pattern PL, and the exposure stage 31 stops at the exposure stop position. (FIG. 7 (4)). The divided exposure pattern data DPn (DP1) and DPn + 1 (DP2) are linked via the overlap section AOn (AO1).

  The timing at which the exposure unit 51 draws (exposeds) the divided exposure pattern data DPn + 1 (DP2) is downstream from the start position of the exposure stage 31 based on the connection position aligned in step 2 and the divided exposure pattern data DPn + 1 (DP2). Controlled by the distance traveled in the direction. The point A1 is the second and subsequent exposure start positions on the long substrate W, and coincides with the downstream end point of the overlap section AOn (AO1) on the long substrate W. Point B is the exposure end position on the long substrate W and coincides with the upstream end point of the divided exposure pattern data DPn + 1 (DP2) on the long substrate W. The downstream end point of the overlap section AOn (AO2) is the downstream end point of the divided exposure pattern data DPn + 1 (DP2), which coincides with the point A1 which is the exposure start position on the long substrate W, and divided exposure pattern data DPn + 1 ( The upstream end point of DP2) coincides with the B point which is the exposure end position on the same long substrate W.

  Subsequently, steps 2 and 3 are sequentially repeated until the end of the long exposure pattern is exposed (FIGS. 7 (5) and (6)).

  In the above embodiment, the divided exposure pattern data DPn are exposed in order, but in the present invention, the divided exposure pattern data DPn may not be exposed in order, and the order may be shifted, for example. The order may be reversed, or the same divided exposure pattern data DPn may be exposed multiple times.

  In the above embodiment, the alignment camera 41 not only the pattern alignment mark MP but the substrate end face EW is regarded as a kind of mark and imaged, but it is not essential to use the substrate end face EW as a reference. Moreover, it is also possible to use a part of the line drawing pattern PL as a pattern alignment mark without forming (exposure) a special pattern alignment mark MP.

DESCRIPTION OF SYMBOLS 1 exposure apparatus 2 frame 10 supply unit 11 supply reel 12 14 guide roller 13 supply side dancer roller 15 supply side braking roller 16 front rear end position sensor 20 winding unit 21 winding reel 22 24 guide roller 23 winding side dancer roller 25 winding Take-up braking roller 30, exposure unit 31, exposure stage (substrate holding means)
32 Stage moving part (relative moving means)
33 Guide Rail 34 Lifting Unit 41 Alignment Camera 51 Exposure Unit (Exposure Unit)
52 exposure unit drive unit 60 exposure apparatus control unit 60a image processing unit 60b mark position detection means 60c substrate end face detection means 60d divided exposure data creation unit 60e data storage means 60f exposure control means 61 monitor W elongated substrate (photosensitive substrate)
A First exposure start position on the long substrate W (Point A)
A1 Second and subsequent exposure start positions on the long substrate W (point A1)
B Exposure end position on long substrate W (point B)
DE Exposure area (area that can be exposed in one exposure step)
P Long exposure pattern data DP1 to DP5 Division exposure pattern data AO1 to AO4 Overlap section MP Pattern alignment mark AC Field of view AE of alignment camera 41 Exposure range EW of exposure unit 51 Substrate end face PL Line drawing pattern (division pattern)

Claims (8)

An exposure unit including a light modulation element array;
Substrate holding means for holding a part of the long substrate in the longitudinal direction in a planar shape;
A relative movement means for relatively moving the exposure means and the substrate holding means in the length direction of the long substrate;
Data storage means for storing long exposure pattern data to be exposed on the long substrate;
A divided exposure pattern data generation unit that generates divided exposure pattern data divided in the length direction of the long substrate from the long exposure pattern data;
And exposure control means for exposing the elongate substrate to the exposure means in accordance with the divided exposure pattern data generated by the divided exposure pattern data creation unit while relatively moving the exposure means and the substrate holding means by the relative movement unit, the Equipped
The exposure control means switches the divided exposure pattern data exposed by the exposure means according to the conveyance of the long substrate;
Maskless exposure device according to claim. 2. The maskless exposure apparatus according to claim 1, wherein the exposure control means successively performs exposure based on the position of the divided pattern exposed on the long substrate by the exposure means based on one of the divided exposure pattern data. A maskless exposure apparatus comprising: adjusting an exposure position of the unexposed, switched, divided exposure pattern data to form an elongated pattern continuously connected on the elongated substrate. 3. The maskless exposure apparatus according to claim 1 or 2, wherein the adjacent divided exposure pattern data have overlapping lengthwise ends of a long substrate. The maskless exposure apparatus according to any one of claims 1 to 3, wherein the exposure control means includes mark position detection means for detecting the position of a pattern alignment mark formed by the exposure means on the long substrate. A maskless exposure apparatus characterized in that 5. The maskless exposure apparatus according to claim 4, wherein the exposure control means comprises substrate end face detection means for detecting the position of at least one end face along the relative movement direction of the long substrate. Maskless exposure equipment. 6. The maskless exposure apparatus according to claim 5, wherein the exposure control means combines the mark position detection means and the substrate end face detection means by capturing the pattern alignment mark and the substrate end face in the same view. A maskless exposure apparatus comprising an imaging means. The exposure means including the light modulation element array, the substrate holding means for holding a part of the long substrate in the length direction in plan view, and the exposure means and the substrate holding means in the length direction of the long substrate A maskless exposure method comprising: forming a long pattern continuously connected on the long substrate by a maskless exposure apparatus comprising: a relative movement means for moving;
Creating a plurality of divided exposure pattern data obtained by dividing the long exposure pattern data for the long substrate in the length direction of the long substrate;
Exposing any one of the plurality of divided exposure pattern data onto the long substrate while relatively moving the exposure unit and the substrate holding unit by the relative movement unit;
Switching the divided exposure pattern data to be exposed by the exposure unit as the long substrate is transported;
With reference to the position of the division pattern exposed in the long substrate by the exposure means on the basis of said one of the divided exposure pattern data, followed by the exposure position of the divided exposure pattern data is switched aforementioned unexposed to exposed Adjusting and forming a continuous pattern continuously connected to the long substrate;
A maskless exposure method comprising: 8. The maskless exposure method according to claim 7 , wherein adjacent ones of the divided exposure pattern data are overlapped at an end portion in a longitudinal direction of the long substrate.

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