TW201702758A - Maskless exposure device and exposure method capable of exposing a continuous elongated pattern precisely without producing disconnection or meandering of lines of a pattern on an elongated substrate - Google Patents

Abstract

Provided is a maskless exposure device. The maskless exposure device is configured to expose a continuous elongated pattern precisely without producing disconnection or meandering of lines of a pattern on an elongated substrate. The maskless exposure device includes: an exposure means containing an optical modulator array; a substrate holding means for holding a part of the elongated substrate along a longitudinal direction as a planar shape; a relatively-moving means for driving the exposure means and the substrate holding means to move relatively along the longitudinal direction of the elongated substrate; a data storage means for storing divided exposure pattern data which is obtained by dividing elongated exposure pattern data of the elongated substrate along the longitudinal direction of the elongated substrate; and an exposure control means for allowing the exposure means to expose the elongated substrate according to the divided exposure pattern data stored in the data storage means when the exposure means and the substrate holding means are driven to move relatively by the relatively-moving means.

Description

Coverless exposure device and exposure method

The present invention relates to a coverless exposure apparatus and an exposure method which form a long pattern without directly using a photomask.

In a large-scale machine such as a car, an electric device unit (control circuit board, etc.) is installed in plural places. In the signal line or the power supply line between the electric device units, a plurality of bundled electric wires (covered electric wires) are often used in the past. On the other hand, since the weight of the covered electric wire is heavy, it is attempted to use the wiring of the FPC board instead of the covered electric wire. In the case of the FPC board, a plurality of wirings are concentrated in a predetermined planar shape, the thickness is thinner than the covered electric wires, and since the bending is free, the degree of freedom of wiring increases.

[Prior patent documents] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2000-227661

[Patent Document 2] Japanese Patent Laid-Open Publication No. 2005-300804

However, compared with the small-sized FPC substrate, the exposure apparatus of the large-sized FPC substrate, particularly the elongated FPC substrate, has difficulty. Especially, use In the contact exposure apparatus of the photomask, it is necessary to prepare a photomask corresponding to the entire surface of the strip pattern. Since it is necessary to perform exposure while replacing a plurality of masks, there is a problem that the exposure apparatus becomes large or has low productivity.

On the other hand, as a device for exposing a pattern to an FPC substrate without using a photomask, there is known a roll-to-roller-less exposure device having a DMD (Digital Micro-mirror Device) in an exposure portion. Wait for the array of light modulation elements. In the case of such a coverless exposure apparatus, in order to obtain the exposure accuracy, the exposure stage is generally exposed while maintaining the plane of the long substrate (Patent Document 1). Patent Document 1 discloses a roll-to-roller-less exposure apparatus for adsorbing and fixing a long substrate (workpiece) on an exposure table, and exposing an exposed portion to an optical axis of a long workpiece surface. While maintaining the constant value, the pattern modulation light is projected onto the photosensitive layer on the surface of the elongated workpiece while the optical modulation element array is moved relative to the long workpiece. However, in the roll-to-roll exposure apparatus shown in Patent Document 1, since the long pattern exceeding the size of the table cannot be exposed, the maximum size of the exposable FPC substrate is limited by the size of the table.

On the other hand, Patent Document 2 is a coverless exposure apparatus that does not use a roll-to-roller of a table. Since the long workpieces that are mounted on the two rolls and are continuously conveyed are continuously exposed during transportation, the maximum size of the FPC board is not limited by the size of the table. However, in the non-cover exposure apparatus which does not have an exposure stage as shown in patent document 2, since it is difficult to carry out exposure in the state which maintains the planarity of a workpiece, it has a problem in exposure precision.

The present invention is based on the above problems, and an object thereof is to obtain a coverless exposure apparatus and an exposure method, the coverless exposure apparatus being a long strip base The board does not cause breakage or meandering of the pattern line, and can expose the continuous strip pattern with high precision.

According to the present invention, when the long strip pattern is exposed to the long substrate held by the substrate holding means (exposure table), the strip is adjusted according to the position of one of the exposed strip patterns. The exposure position of the remaining portion of the pattern (or the remaining portion of the strip pattern) thereby forming a pattern of continuous connections.

The coverless exposure apparatus of the present invention is characterized in that it comprises: an exposure means including an array of light modulation elements; and a substrate holding means for holding a part of the length direction of the long substrate in a planar shape; and the relative moving means is attached to the strip The length direction of the substrate moves the exposure means and the substrate holding means relative to each other; and the data memory means stores the divided exposure pattern data of the long exposure pattern data of the long substrate in the longitudinal direction of the long substrate; and the exposure The control means causes the exposure means to expose the long substrate based on the divided exposure pattern data stored by the data storage means by moving the exposure means and the substrate holding means by the relative movement means.

The exposure control means is a preferred embodiment. According to a method for dividing the exposure pattern, the exposure means exposes the position of the division pattern exposed on the long substrate as a reference, and adjusts the unexposed exposure image which is exposed after exposure. The exposure position of the data is formed on the long substrate by a continuous strip pattern.

Adjacent to the divided exposure pattern data, the end portions of the long substrate in the longitudinal direction are preferably overlapped.

Preferably, the exposure control means is provided with a mark position detecting means for detecting that the exposure means exposes a position of the pattern alignment mark formed on the long substrate.

Preferably, the exposure position control means further includes a substrate end face detecting means for detecting a position of at least one end face of the long substrate along a relative moving direction.

Further, the exposure position control means includes an imaging means for capturing the pattern alignment mark and the end surface of the substrate in the same field of view, and the mark position detecting means and the substrate end face detecting means.

The data memory means actually switches the divided exposure pattern data exposed by the split exposure means according to the conveyance of the long substrate.

The maskless exposure method of the present invention forms a continuously connected strip pattern on the long substrate by a maskless exposure device, and the maskless exposure device includes: an exposure means for containing a light modulation element for generating an exposure pattern The substrate holding means is for holding a part of the length direction of the long substrate in a planar shape; and the relative moving means is for moving the exposure means and the substrate holding means relative to each other in the longitudinal direction of the long substrate; The exposure method is characterized in that: a forming step is to form a plurality of divided exposure pattern materials for dividing the long exposure pattern data of the long substrate in the longitudinal direction of the long substrate; and the exposing step is by means of the relative movement And moving the exposure means to the substrate holding means to expose the selected one of the plurality of divided exposure pattern materials to the long substrate; and the exposing step of dividing the exposure pattern data according to the selected one By using the exposure means to expose the position of the division pattern of the long substrate as a reference, adjusting the exposure without exposure Division exposure pattern data At the exposure position, the continuously connected strip pattern is exposed on the elongated substrate.

In the no-cover exposure method, the segmented exposure pattern data adjacent to the elongated substrate preferably overlaps the end portions of the elongated substrate in the longitudinal direction.

According to the coverless exposure apparatus and the exposure method of the present invention, the line of the pattern is not broken or meandered, and the continuous strip pattern can be accurately exposed.

1‧‧‧Exposure device

2‧‧‧ 座座

10‧‧‧Supply Department

11‧‧‧Supply reel

12, 14‧‧ ‧ guide roller

13‧‧‧Supply side tension roller

15‧‧‧Supply side brake roller

16‧‧‧ front and rear position sensor

20‧‧‧Winding Department

21‧‧‧Winding reel

22, 24‧‧ ‧ guide roller

23‧‧‧Winding side tension roller

25‧‧‧Winding side brake roller

30‧‧‧Exposure Department

31‧‧‧Exposure Workbench (Substrate Holder)

32‧‧‧Workbench moving department (relative moving means)

33‧‧‧rails

34‧‧‧ Lifting Department

41‧‧‧Aligning the camera

51‧‧‧Exposure unit (exposure means)

52‧‧‧Exposure unit drive unit

60‧‧‧Exposure Device Control Department

60a‧‧‧Image Processing Department

60b‧‧‧Marking position detection means

60c‧‧‧Substrate end face detection means

60d‧‧‧Split exposure data production department

60e‧‧‧data memory means

60f‧‧‧Exposure control

61‧‧‧Monitor

W‧‧‧Long substrate (photosensitive substrate)

The first exposure start position (point A) on the long substrate W of A‧‧‧

The first exposure start position on the long substrate W of A1‧‧‧ (point A1)

B‧‧‧End of exposure position on the long substrate W (point B)

DE‧‧‧ exposed area (area that can be exposed in one exposure step)

P‧‧‧Long exposure pattern data

DP1~DP5‧‧‧Split exposure pattern data

AO1~AO4‧‧‧ overlap interval

MP‧‧‧ pattern alignment mark

AC‧‧‧ aligns with the field of view of the camera 41

Exposure range of AE‧‧ exposure unit 51

EW‧‧‧ substrate end face

PL‧‧‧Drawing line pattern (split pattern)

Fig. 1 is a front elevational view showing an embodiment of a roll-to-roll type exposure apparatus to which the coverless exposure apparatus of the present invention is applied.

Fig. 2 is a plan view showing a portion of an alignment camera and an exposure stage of the exposure apparatus of Fig. 1.

Fig. 3 is a plan view showing an exposure unit including an exposure apparatus of Fig. 1 and a portion aligned with the camera.

Figure 4 is a block diagram of the maskless exposure apparatus of the present invention.

Fig. 5 is a plan view showing an example of a long exposure pattern data drawn on a long substrate using the coverless exposure apparatus of the present invention.

Fig. 6 is a plan view showing the divided exposure pattern data in which the long exposure pattern data of Fig. 5 is divided into five portions in the longitudinal direction of the long substrate.

Fig. 7 (1), (2), (3), (4), (5), (6) are exposures when the long substrate is divided and exposed according to the divided exposure pattern data divided as shown in Fig. 6. A plan view of an operation example of a unit and a substrate and an exposure stage aligned with the camera.

Fig. 1 shows the basic configuration of a roll-to-roll type exposure apparatus 1 to which the coverless exposure apparatus of the present invention is applied. The exposure apparatus 1 includes, in order from the upstream side to the downstream side of the transport direction M of the long substrate (work) W, the supply unit 10, which supplies the long substrate W, and the exposure unit 30 exposes the pattern to the long substrate. An electronic circuit is formed on the surface of W; and the winding portion 20 recovers the elongated substrate W that has been exposed.

The long substrate W is a sheet-like substrate such as a copper-clad laminate to which a photosensitive material such as a photoresist is applied, and has a length of several tens to several hundreds of meters. The substrate of the FPC substrate is formed by a step of developing, etching, cutting, or the like after the exposure.

The supply unit 10 constitutes a workpiece supply system that sequentially includes a supply reel 11, a guide roller 12, a supply-side tension roller 13, and a guide roller 14 from the upstream side to the downstream side in the conveyance direction M of the long substrate W. The supply side brake roller 15 and the front and rear end position sensors 16 are used to supply the elongated substrate W to the exposure portion 30. The winding unit 20 constitutes a workpiece winding system that sequentially includes the winding side brake roller 25, the guide roller 24, and the winding side tension from the upstream side to the downstream side in the conveying direction M of the long substrate W. The roller 23, the guide roller 22, and the winding reel 21 are used to wind the long substrate W exposed by the exposure portion 30.

The exposure unit 30 is disposed between the supply-side brake roller 15 and the winding-side brake roller 25 . The moving direction (transport direction M) of the long substrate W moving between the supply-side brake roller 15 and the winding-side brake roller 25 is defined as the X direction, and the direction (thickness direction) orthogonal to the long substrate W is defined. In the Z direction, the direction orthogonal to the X direction and the Z direction is defined as the Y direction. The exposure unit 30 includes an exposure stage (substrate holding means) 31, a pair of alignment cameras 41 (see FIG. 2), and Exposure unit (exposure means) 51.

The exposure unit 51 includes a plurality of exposure heads (not shown), and is regularly disposed at a position spaced apart from the long substrate W by a predetermined distance from the vertical substrate W. A light source and an illumination optical system (not shown) are disposed on each of the exposure heads, and the light emitted from the light source is guided to the corresponding exposure head via the corresponding illumination optical system. Each of the exposure heads includes a DMD (Digital Micro-mirror Device) in which a plurality of micromirrors are two-dimensionally arranged, and an imaging optical system that images an image of the DMD on a long substrate. The exposure unit 51 can perform exposure on the exposure range AE (see Fig. 3).

A technique for performing multiple exposure of a pattern by using a DMD is disclosed in, for example, Japanese Laid-Open Patent Publication No. 2003-084444, which is widely known. In addition, a technique for drawing a case using a plurality of heads is disclosed in Japanese Laid-Open Patent Publication No. 2003-195512, and is a well-known technique widely used.

The exposure unit (exposure means) 51 is formed by dividing the long exposure pattern data exposed on the long substrate W into a plurality of divided exposure pattern data in the longitudinal direction of the long substrate W, and then subjecting the divided exposure pattern data to The sequence is exposed on the long substrate W. Fig. 5 shows a specific example of the long exposure pattern data P, and Fig. 6 shows the divided exposure pattern data DPn (n = 1 to 5) which divides the long exposure pattern data P into five portions in the longitudinal direction of the long substrate W. ). The long exposure pattern data P is, for example, a wiring pattern having a size of 2000 (X) × 250 (Y) mm as shown in the drawing. The width or interval of the wiring is, for example, 2 mm. The figure shows an example of only the wiring pattern, but a circuit pattern or the like for assembling the electrical component may be provided in the strip pattern.

The split exposure pattern data DP1 to DP5 are as shown in Fig. 6, The overlapping section AO1 to the overlapping section AO4 includes a pair of pattern alignment marks MP on both sides of the drawing line pattern PL extending in the longitudinal direction of the long substrate W in each of the overlapping sections AO1 to AO4.

The exposure stage 31 adsorbs (for example, vacuum-adsorbs) the back surface of the long substrate W, and is held in a planar shape, and is movable in the X direction and the Z direction. In other words, the pedestal 2 includes a guide rail 33 extending in the X direction, and the elevating portion 34 for elevating and lowering the exposure table 31 is supported by the table moving portion 32, and the table moving portion 32 is supported by the guide rail 33 so as to be movable. . The exposure stage 31 is moved up and down between the upper end position in contact with the back surface of the long substrate W and the lower end position separated from the back surface of the long substrate W by the lifting portion 34. The table moving portion 32 is movable in the forward and reverse directions (the downstream direction and the upstream direction) in the X direction. The movable trajectory 31M of the exposure stage 31 is indicated by a two-dot chain line in Fig. 1. The table moving unit 32 constitutes a relative moving means for relatively moving the exposure stage 31 and the exposure unit 51 in the longitudinal direction of the long substrate W. The range (area) at which the exposure table 31 can adsorb and hold the long substrate W at a time is, for example, 620 (X) × 520 (Y) mm.

Fig. 2 is a view showing a state in which the exposure stage 31 adsorbs and holds the long substrate W as seen from the surface side of the substrate. The symbol DE indicates an area which can be exposed at one exposure step (i.e., an area in which the exposure pattern data DP1 to DP5 are divided). The symbol A is at the exposure start position of the first exposure step, and the symbol B is at the exposure end position of the first exposure step.

A pair of alignment cameras 41 are disposed on the upstream side of the exposure unit 51, and photograph the pattern alignment marks MP exposed to be formed on the elongated substrate W. The image captured by each of the alignment cameras 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and then the pattern alignment detecting means 60b obtains the pattern alignment mark. MP location information.

In the present embodiment, the alignment camera 41 not only captures the pattern alignment mark MP but also views the substrate end surface EW as a mark, and includes a substrate end surface detecting means 60c that detects the position of the end surface. If the pattern alignment mark MP and the substrate end surface EW enter the alignment field AC of the alignment camera 41 at the same time, the alignment alignment lens 41 is not moved in the Y direction, and the pattern alignment mark MP and the substrate end surface EW (Fig. 5) can be photographed, but The alignment camera 41 can also be moved in the Y direction to capture the pattern alignment mark MP and the substrate end face EW. Here, the alignment camera 41, the image processing unit 60a, and the substrate end surface detecting means 60c constitute a substrate end surface detecting means for detecting the position of the end surface of the long substrate W along at least one of the relative moving directions. The alignment camera 41 forms an imaging means having both the mark position detecting means 60b and the substrate end face detecting means 60c by capturing the pattern alignment mark MP and the substrate end face EW in the same field of view CA.

By acquiring the positional information of the substrate end face EW by the image processing unit 60a (marking position detecting means), it is possible to prevent the distortion (snake) of the exposed divided exposure pattern data DP1 to DP5 or the split exposure pattern data DP1 to DP5 from being obliquely exposed. Exceeded outside the workpiece. Specifically, for example, when determining the exposure positions of the divided exposure pattern data DP1 to DP5, the X-direction correction amount of the divided exposure pattern data DP1 to DP5 is based on the pattern alignment mark MP of at least one of the pair of pattern alignment marks MP. The positional information determines that the Y-direction correction amount is determined based on the position information of at least one of the substrate end faces EW or the position information of at least one of the pattern alignment marks MP.

The substrate end face detecting means 60c (and the mark position detecting means 60b) can detect the substrate end face EW (the length direction of the long substrate W) in the X direction. The angle is the amount of correction in the θ direction. For example, the case where the substrate end surface EW (the longitudinal direction of the long substrate W) is parallel to the X direction is detected as 0°. The detected θ direction correction amount can be adjusted by changing the drawing timing of the Y direction of the exposure unit 51 (DMD).

Figure 4 is a control block diagram of the maskless exposure apparatus of the present invention. The exposure apparatus 1 further includes a supply unit 10, a winding unit 20, an exposure unit 30, and an exposure device control unit 60 that collectively controls these members. The exposure device control unit 60 includes a video processing unit 60a, a data memory means 60e for storing the long exposure pattern data, and a divided exposure data creating unit 60d for generating the divided exposure pattern data required for the actual exposure from the long exposure pattern data. The image processing unit 60a has a function of detecting image position information (the X-direction position, the Y-direction position, and the tilt angle θ of the divided exposure pattern data DPn) from the image data captured by the camera 41. The exposure device 1 (exposure unit 30) further includes a monitor 61 that displays the image data captured by the camera 41. The user can view the display of the monitor 61 to identify the alignment.

The exposure apparatus 1 includes a supply reel drive unit 11a that drives and controls the supply reel 11 and a brake roller drive unit 15a that drives and controls the supply-side brake roller 15 on the supply unit 10 side, and includes the brake roller drive unit 15a on the winding unit 20 side. The winding reel driving portion 21a that drives and controls the winding reel 21 and the braking roller driving portion 25a that drives and controls the winding side braking roller 25. The exposure device control unit 60 applies the positive or negative rotational force to the supply reel 11 and the winding reel 21 via the supply reel drive unit 11a and the winding reel drive unit 12a, and moves the long substrate W forward and backward. The exposure device control unit 60 sandwiches the long substrate by the pair of supply side brake rollers 15 and the pair of winding side brake rollers 25 via the brake roller drive units 15a and 25ba. W, and moving in the X direction of the long substrate W generates a braking force (load). Moreover, the pair of supply-side brake rollers 15 and the pair of winding-side brake rollers 25 are separated from the long substrate W, and the braking force (load) is released. The exposure device control unit 60 detects the front end and the rear end of the long substrate W in the X direction (longitudinal direction) and passes through the front and rear ends from the output of the front and rear end position sensors 16.

The exposure unit 30 includes an exposure unit drive unit 52 that drives the exposure unit 51 based on the divided exposure pattern data generated by the divided exposure data creation unit 60d. The exposure unit 30 includes a table movement driving unit 32a that drives the table moving unit 32, a lifting unit driving unit 34a that drives the elevation table 34 to move up and down, and an exposure unit under the control of the exposure device control unit 60. The surface of the stage 31 adsorbs or releases the adsorption driving portion 31a of the long substrate W.

The divided exposure data creating unit 60d creates the divided exposure pattern data DPn required for the exposure step of the primary portion in accordance with the long exposure pattern data P stored in the data storage means 60e. Here, n is a positive integer of 2 or more, and the maximum value is the number of divisions of the long exposure pattern data P. When the divided exposure pattern data DP is created from the long exposure pattern data P, the divided exposure data creation unit 60d creates the divided exposure pattern data DPn so that the exposure patterns are overlapped in the overlap section AO. The exposure unit driving unit 52 drives the exposure unit 51 based on the divided exposure pattern data DPn, and exposes the divided exposure pattern to the long substrate W.

The exposure device control unit 60 includes an exposure control means 60f (fourth diagram) for performing an exposure operation a plurality of times under the switching of the divided exposure pattern data DPn, thereby continuously connecting one strip The drawing line pattern PL is exposed to the long substrate W. The exposure device control unit 60 (exposure control means 60f) is connected to the above drive units 11a and 15a, 21a and 25a, 31a. 32a and 34a drive control of each component of the supply unit 10, the winding unit 20, and the exposure unit 30.

The pattern alignment mark MP on the drawing data may also include the long exposure pattern data P in advance, or may be automatically added to the pattern alignment mark MP when the divided exposure pattern data DPn is produced.

The pattern alignment mark MP is indicated by a circular mark on the drawing, but may be a well-known position alignment mark such as a cross.

Next, an example of the exposure operation of the unmasked exposure apparatus and the exposure method according to the present invention will be described based on Fig. 7. In Fig. 7, the left direction of the X direction is defined as the downstream direction, and the right direction is defined as the upstream direction.

Step 1: The exposure table 31 at the preparation position is raised from the lowered position to the holding position of the long substrate W, and the back surface of one portion of the long substrate W is suction-fixed (Fig. 7 (1)). The supply-side brake roller 15 and the winding-side brake roller 25 are separated from the long substrate W to release the braking force for the movement of the long substrate W. In this state, the exposure stage 31 moves in the downstream direction to the exposure unit 51, and the exposure unit 51 draws (exposures) the line drawing pattern (divided pattern) PL on the long substrate W based on the divided exposure pattern data DPn (DP1). The pattern alignment mark MP is exposed on both sides near the upstream side end portion of the line drawing pattern PL. In this manner, when the exposure of the divided exposure pattern data DPn (DP1) and the pattern alignment mark MP is completed, the exposure stage 31 is stopped at the X-direction exposure end position (Fig. 7 (2)). The pattern alignment mark MP that has been exposed is formed into a photographic image by self-coloring action of the photoresist.

The timing at which the exposure unit 51 draws (exposures) the divided exposure pattern data DPn (DP1) is in the downstream direction from the start position according to the exposure stage 31. The distance moved is controlled. The exposure start point (the exposure start line orthogonal to the conveyance direction M of the substrate W) A is the first exposure start position on the long substrate W, and the exposure end point (same) is the B-length on the long substrate W. One exposure end position B.

The exposure condition of the first divided exposure pattern data DPn (DP1) is because the pattern alignment mark MP is not formed on the substrate, so the pattern alignment mark MP is not photographed by the alignment camera 41 before the exposure. Alternatively, the end face EW of the long substrate W is taken, and the drawing exposure position (Y and θ coordinates) of the divided exposure pattern data DP1 is determined.

Step 2: The supply side brake roller 15 and the winding side brake roller 25 sandwich the long substrate W, the exposure table 31 releases the suction and the lowering of the long substrate W, and the supply reel 11 winds the long substrate W, and The long substrate W moves in the upstream direction. Then, in a state where the alignment camera 41 captures the pattern alignment mark MP in its field of view CA, the supply reel 11 is stopped, and the supply side brake roller 15 and the winding side brake roller 25 sandwich the long substrate W, and the restriction is performed ( The movement of the long substrate W is stopped. After the exposure stage 31 returns to the exposure start position in the X direction, it rises to the position where the long substrate W is held, and adsorbs and holds the back surface of one portion of the stopped long substrate W (Fig. 7 (3)).

The image alignment mark MP (and the substrate end surface EW) is imaged by the alignment camera 41, and the image processing unit 60a detects the position of the pattern alignment mark MP formed on the long substrate W based on the captured image data, and sets the connection. The connection position (matching connection position) of the newly exposed divided exposure pattern data DPn+1 (DP2) and the exposed divided exposure pattern data DPn (DP1). The set matching connection position includes the overlap interval AOn (AO1) (Fig. 6).

Step 3: Release the supply side brake roller 15 and the winding side brake roller 25 The nip of the long substrate W is moved to the exposure unit 51 in the downstream direction while the exposure stage 31 is adsorbing the long substrate W. The exposure unit 51 separates the exposure pattern data DPn+1 (DP2) from the divided exposure pattern data DPn (DP1) via the overlap section AOn (overlap section AO1), and divides the line drawing pattern (divided pattern) of the exposure pattern data DP2. The PL is drawn (exposed) on the long substrate W, and a pair of pattern alignment marks MP are exposed on both sides near the upstream end of the line drawing pattern PL, and the exposure stage 31 is stopped at the exposure stop position (Fig. 7 (Fig. 7 ( 4)). The divided exposure pattern data DPn (DP1) and DPn+1 (DP2) are connected via the overlap section AOn (AO1).

The timing at which the exposure unit 51 draws (exposures) the divided exposure pattern data DPn+1 (DP2) is based on the connection position matched in step 2 and the divided exposure pattern data DPn+1 (DP2), and is started from the exposure stage 31. The distance the position moves in the downstream direction is controlled. The second and subsequent exposure start positions on the A1 dot long substrate W coincide with the downstream end points of the overlap section AOn (AO1) on the long substrate W. The exposure end position on the B-point strip substrate W coincides with the upstream end point of the divided exposure pattern data DPn+1 (DP2) on the long substrate W. The downstream end point of the overlap section AOn (AO2) is the end point of the downstream side of the divided exposure pattern data DPn+1 (DP2), which coincides with the point A1 which is the exposure start position on the long substrate W, and divides the exposure pattern data DPn. The upstream end point of +1 (DP2) coincides with point B which is the exposure end position on the long substrate W.

Thereafter, steps 2 and 3 are repeatedly performed in sequence to expose the terminals of the long exposure pattern (Fig. 7 (5), (6)).

In the above embodiment, the exposure pattern data is sequentially divided The DPn performs exposure, but the present invention may not expose the split exposure pattern data DPn sequentially, and the shift order may be, for example, the order may be changed, or the order may be reversed, or the same split exposure pattern data DPn may be exposed. Multiple times.

In the above embodiment, the alignment camera 41 photographs not only the pattern alignment mark MP but also the substrate end surface EW as a mark, but it is not necessary to use the substrate end surface EW as a reference. Further, a special pattern alignment mark MP may not be formed (exposed), and a part of the line drawing pattern PL may be used as a pattern alignment mark.

W‧‧‧ long strip substrate

AE‧‧‧Exposure unit

51‧‧‧ exposure range

EW‧‧‧ substrate end face

AC‧‧‧ aligns with the field of view of the camera 41

31‧‧‧Exposure Workbench

41‧‧‧Aligning the camera

51‧‧‧Exposure unit

MP‧‧‧ pattern alignment mark

PL‧‧‧Drawing line pattern (split pattern)

The first exposure start position on the Á‧‧‧ long substrate W (point A)

B‧‧‧End of exposure position on the long substrate W (point B)

AO1‧‧‧ overlap interval

The first exposure start position on the long substrate W of A1‧‧‧ (point A1)

AO2‧‧‧ overlap interval

Claims (9)

A maskless exposure apparatus, comprising: an exposure means comprising an array of light modulation elements; a substrate holding means for holding a part of a length direction of the long substrate in a planar shape; and a relative moving means on the long substrate In the longitudinal direction, the exposure means and the substrate holding means are relatively moved; the data memory means is to divide the divided exposure pattern data of the long exposure pattern data of the long substrate in the longitudinal direction of the long substrate; and the exposure control In the method of moving the exposure means and the substrate holding means by the relative movement means, the exposure means stores the extended substrate based on the divided exposure pattern data stored by the data storage means. The non-cover exposure device of claim 1, wherein the exposure control means adjusts the exposure according to a position of the segmentation pattern exposed to the long substrate by the exposure means. The exposure position of the split exposure pattern data that is not exposed is formed on the long substrate by continuously connecting the strip patterns. A coverless exposure apparatus according to claim 1 or 2, wherein adjacent ones of the divided exposure pattern data in the longitudinal direction of the long substrate overlap. The non-cover exposure device of any one of claims 1 to 3, wherein the exposure control means is provided with a mark position detecting means for detecting that the exposure means is exposed to the strip The pattern of the substrate is aligned with the position of the mark. Such as the uncovered exposure device of claim 4, wherein the exposure position The control means includes a substrate end face detecting means for detecting a position of at least one end face of the long substrate along a relative moving direction. The coverless exposure device of claim 5, wherein the exposure position control means is provided with an imaging means for capturing the pattern alignment mark and the end surface of the substrate by the same field of view, and the mark position detection The measuring means and the end face detecting means of the substrate. The uncovered exposure apparatus according to any one of claims 1 to 6, wherein the data memory means switches the divided exposure pattern data exposed by the split exposure means according to the conveyance of the long substrate. A maskless exposure method for forming a continuously connected strip pattern on a long substrate by a maskless exposure apparatus, the maskless exposure apparatus comprising: an exposure means comprising an array of light modulation elements for generating an exposure pattern The substrate holding means fixes a part of the length direction of the long substrate in a planar shape; and the relative moving means moves the exposure means and the substrate holding means relative to each other in the longitudinal direction of the long substrate; a forming step of forming a plurality of divided exposure pattern data for dividing the long exposure pattern material of the long substrate in a length direction of the long substrate; and exposing the exposure means and the substrate by the relative moving means Holding the selected one of the plurality of divided exposure pattern materials to be exposed to the long substrate while the holding means is relatively moved; and exposing, according to the one selected segmented exposure pattern data, by the exposure means The position of the division pattern of the long substrate is used as a base The exposure position of the unexposed divided exposure pattern data which is then exposed is adjusted, and the continuously connected strip pattern is exposed on the long substrate. The coverless exposure method of claim 8, wherein the adjacent divided exposure pattern data overlaps an end portion of the long substrate in a longitudinal direction.