JP2007310209A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To normally perform exposure transfer, without causing adjacent exposure pattern to overlap with each other, nor extremely separating exposure patterns from each other, even if a belt-like material to be exposed is sent out, while meandering. <P>SOLUTION: A controller 22 computes sending quantity errors (errors in a send-out direction of a work 2) ΔX1,ΔX2 and a breadthwise deviation quantities (movement errors of the work 2 along the width), based on pieces of image information on images photographed by cameras 16a, 16b, and 18, and drives and controls a frame-driving mechanism 14 and an indexer according to the computation results so that exposure patterns, successively exposed and transferred to the work 2, do not overlap with each other, and exposure patterns does not adjoin a gap left therebetween. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that feeds a strip-shaped exposed material by a predetermined amount so as to face a mask and continuously exposes and transfers the pattern of the mask adjacent to the longitudinal direction of the exposed material.

  As an exposure apparatus that produces TV shadow masks, IC lead frames, and the like in large quantities, for example, as disclosed in Patent Document 1, a strip-shaped exposed material is sent between a front mask and a back mask by a predetermined amount. That exposes the mask pattern of the front and back masks simultaneously on both the front and back surfaces of the exposed material by irradiating the mask with the light from a parallel light source arranged on the outside of each mask and irradiating each mask with the exposure. The device is known.

In Patent Document 1, reference holes are provided at equal intervals on the line parallel to the edge line of the exposed material in accordance with the pitch between exposures, and either the front mask or the back mask is made to correspond to these reference holes. The alignment mark for material alignment is formed at two locations at the same pitch, and the camera (referred to as a two-dimensional sensor in Patent Document 1) uses the alignment mark for material alignment of the mask corresponding to the reference hole of the exposed material. The relative position information of the material to be exposed and the mask is obtained by reading the superimposed state. Then, based on the obtained position information, the mask position adjusting mechanism relatively moves the mask so that the reference hole and the material alignment mark are aligned, so that the exposed material, the front mask, and the back mask By performing alignment with one of these, an exposure pattern can be formed at a predetermined position based on the edge line of the material to be exposed. The front mask and the back mask are aligned using dedicated index marks provided separately.
Japanese Patent Laid-Open No. 08-160542

However, since the actual edge line of the material to be exposed is not completely straight, and there is a slight bend, the apparatus of Patent Document 1 uses the edge line with the bend of the belt-shaped material to be exposed as a reference. By performing exposure transfer, adjacent exposure patterns may be inclined, overlapping defective portions, and adjacent exposure patterns may be extremely separated from each other, and there is a problem in the yield of the exposed material.
Therefore, the present invention has been made in view of the above circumstances, and even if a strip-shaped exposed material is sent while meandering, adjacent exposure patterns do not overlap with each other and the exposure patterns do not extremely separate from each other. It is an object of the present invention to provide an exposure apparatus that can be transferred by exposure to light and can improve the yield of the exposed material.

In order to solve the above-described problems, an exposure apparatus according to the present invention sends a strip-shaped exposed material by a predetermined amount so as to face the mask, and the mask pattern is continuously adjacent to the longitudinal direction of the exposed material. In an exposure apparatus that performs exposure transfer in an automatic manner, meandering detection means for detecting the meandering of the exposed material that has been sent out, alignment means for aligning the pattern of the mask with the exposure position of the exposure material, and The mask by the alignment means based on the detection result of the meandering detection means so that the exposure patterns continuously exposed and transferred to the exposed material do not overlap and the exposure patterns are not adjacent to each other with a gap. Alignment adjusting means for adjusting alignment of the exposed position.
Here, the meandering detecting means and the alignment means include an exposed material side mark formed at a predetermined interval in a longitudinal direction of the exposed material, a mask side mark formed on the mask, and the exposed material side. A configuration including an imaging unit that obtains information on the overlapping state of the mark and the mask side mark is preferable.

  According to the exposure apparatus of the present invention, the alignment adjustment means detects the meandering so that the exposure patterns continuously exposed and transferred to the exposed material do not overlap each other and the exposure patterns are not adjacent to each other with a gap. Since the alignment of the mask and the exposure position by the alignment unit is adjusted based on the detection result of the unit, even if the strip-shaped exposed material is sent while meandering, it can be normally exposed and transferred, and the yield of the exposed material Can be improved.

An exposure apparatus according to the present invention will be described below with reference to the drawings.
(Overall configuration of exposure apparatus)
First, the overall configuration of the exposure apparatus according to the present invention will be described with reference to FIG. Reference numeral 1 in FIG. 1 denotes an unwinding device for unwinding the belt-like workpiece 2 by tact feed, and reference numeral 3 denotes a winding device that is arranged on the downstream side of the exposure unit P and winds up the exposed workpiece 2.

  In the vicinity of the exposure part P, two support rolls 4a and 4b that reduce the deflection of the work 2 as much as possible are arranged so as to sandwich the exposure part P. Fixing clamps 5a and 5b for fixing the workpiece 2 of the exposure part P are arranged outside the support rolls 4a and 4b. The upstream fixing clamp 5b is provided with a back tension roll 6 for applying a back tension to the workpiece 2 located in the exposure part P. The downstream fixing clamp 5a is provided on the winding device 3 side. An indexer 7 is provided that feeds a predetermined amount to the winding device 3 side in a state where the workpiece 2 is clamped, and then returns to the original position after releasing the clamped state.

The unwinding device 1 unwinds the workpiece 2 and the winding device 3 winds the workpiece 2 in accordance with the feed amount of the indexer 7. Reference numeral 2a denotes a work feed buffer portion provided on the unwinding device 1 side and the winding device 3 side.
A mask 8 having a predetermined transfer pattern is disposed on the surface side of the workpiece 2 in the exposure part P.

  Then, after the alignment of the workpiece 2 and the mask 8 is adjusted in the exposure part P, exposure is performed from the parallel light source 10 disposed above the mask 8 toward the mask with the mask 8 in close contact with the surface of the workpiece 2. The pattern of the mask 8 is exposed and transferred onto the surface of the work 2 by irradiation. When this exposure transfer is completed, the indexer 7 performs an operation of feeding a predetermined amount of the work 2 to the winding device 3 side. After the delivery of the work 2 is completed, the work 2 sent to the exposure position P is fixed by the downstream fixing clamp 5a or the fixing clamps 5a, 5b on both sides, and a new process is performed in the same manner as described above. Exposure transfer.

(First embodiment)
Next, FIG. 2 shows a specific configuration of the workpiece 2 and the mask 8 of the first embodiment according to the present invention, and FIG. 3 shows a configuration of the exposure unit P of the second embodiment.
As shown in FIG. 2, a predetermined pattern PT1 such as a circuit pattern is formed on the mask 8 of this embodiment, and a pair of masks is provided on the side corresponding to one edge in the width direction of the workpiece 2. Alignment marks M1a and M1b are formed at predetermined intervals in the longitudinal direction of the workpiece 2. The pair of mask alignment marks M1a and M1b are circular marks in a light-transmitting region, for example, non-light-transmitting and smaller than reference holes 40a, 40b, 40c, 40d.

  Further, a plurality of circular reference holes 40 a, 40 b, 40 c, 40 d... Are formed at one edge portion in the width direction of the work 2 by a drilling machine 42. After the workpiece 2 is fed by the indexer 7 to the winding device 3 side by a predetermined amount, the drilling machine 42 is moved to the workpiece 2 by a pair of edge positioning sensors 42a and 42b that are spaced apart from each other in the length direction of the workpiece 2. After detecting the position of the edge line and adjusting the two edge lines to predetermined positions by actuators (not shown) provided corresponding to the sensors 42a and 42b, the reference holes 40a, 40b, 40c, 40d are sequentially formed. The interval between the reference holes 40a, 40b, 40c, 40d,... Is set to be the same as the interval between the pair of mask alignment marks M1a, M1b.

  In the exposure part P, as shown in FIG. 3, the mask 8 is held by vacuum suction by a mask holding frame 12. The mask holding frame 12 can be finely controlled in the XYθ direction by the frame drive mechanism 14 (the XY plane is a plane parallel to the exposed surface of the work 2 and θ is a rotation direction around an axis perpendicular to the XY plane. Defined). In this figure, a mechanism for moving the mask holding frame 12 in the vertical direction and bringing the mask 8 into close contact with the surface of the workpiece 2 is omitted.

Two cameras 16a and 16b are arranged at positions facing the mask alignment marks M1a and M1b formed on the mask 8 from above, and these cameras 16a and 16b hold the mask holding frame 12 or the mask holding frame 12. It is fixed to a mask stage (not shown).
Further, one camera 18 is arranged further forward in the workpiece feeding direction than the camera 16a arranged in front of the workpiece feeding direction, and this camera 18 is also not shown in the figure, but the mask holding frame 12 or the mask. It is fixed to a mask stage (not shown) that holds the holding frame 12.

These three cameras 16a, 16b, and 18 are arranged on a straight line along the workpiece feeding direction, and the interval between the cameras 16a and 16b and the interval between the cameras 16a and 18 are the same (per time by the indexer 7). (Predetermined delivery amount).
The cameras 16a, 16b, and 18 include an optical system (not shown) including a plurality of lenses, a half mirror, a two-dimensional image sensor, and a focus adjustment mechanism.

In addition, illuminators 20a, 20b, and 20c are arranged at positions facing the three reference holes 40a, 40b, and 40c formed in the work 2 from below. The illuminators 20a, 20b, and 20c are configured by a condensing lens and a light projecting element such as a light emitting diode, although not shown.
The cameras 16 a, 16 b, 18, the frame driving mechanism 14, the indexer 7, and the punching machine 42 described above are connected to the controller 22.
The controller 22 is configured by a computer system having a display device such as a keyboard and a display screen. The controller 22 can control focusing of the cameras 16a, 16b, and 18 by key operation and the like, and can also control the frame driving mechanism 14 and the indexer. 7 and the drilling machine 42 can be controlled.

Next, the exposure procedure of the first embodiment will be described with reference to FIG.
First, as shown in FIG. 4A, the controller 22 sends a drive signal to the drilling machine 42, and the drilling machine 42 forms the first reference hole 40 a at one edge in the width direction of the workpiece 2. To do.
Next, as shown in FIG. 4B, the controller 22 sends a drive signal to the indexer 7 and the drilling machine 42, and the workpiece 2 is driven by the indexer 7 so that the workpiece 2 is a specified feed amount (a preset feed amount). ) And the drilling machine 42 forms a second reference hole 40b at one edge in the width direction of the workpiece 2.

  Next, as shown in FIG. 4 (c), the controller 22 sends a drive signal to the indexer 7 and the drilling machine 42, and the work 2 is sent out by the specified feed amount by driving the indexer 7, and the drilling machine 42 forms a third reference hole 40c at one edge of the workpiece 2 in the width direction. Next, the controller 22 determines the relative shift amount between the first reference hole 40a and the mask alignment mark M1a and the second reference hole 40b and the mask alignment mark based on the image information captured by the cameras 16a and 16b. The amount of displacement relative to M1b is calculated, and the frame drive mechanism 14 is driven and controlled so that the amount of displacement decreases. As a result, the frame driving mechanism 14 slightly moves the mask holding frame 12 holding the mask 8 in the XYθ direction to align the workpiece 2 and the mask 8.

Then, in a state where the mask 8 is in close contact with the surface of the work 2, exposure is applied to the mask 8 from the parallel light source 10 disposed above the mask 8, and the pattern of the mask 8 is exposed and transferred onto the surface of the work 2. .
Next, as shown in FIG. 4 (d), the controller 22 sends a drive signal to the indexer 7, and the work 2 is sent out by a specified feed amount. Further, the controller 22 sends a drive signal to the drilling machine 42 to form the fourth reference hole 40d at one edge in the width direction of the workpiece 2.

  The controller 22 also includes image information of the first reference hole 40a imaged by the camera 18, image information of the second reference hole 40b imaged by the camera 16a, and a third reference imaged by the camera 16b. Based on the image information of the hole 40c, the width direction deviation amount ΔY of the workpiece 2 is calculated. At this time, a deviation amount between the center of the reference hole 40b and the center of the reference hole 40c and the center of the reference hole 40a in the Y-axis direction (width direction) is ΔY.

  Next, as shown in FIG. 4E, the controller 22 drives the frame driving mechanism 14 based on the calculated width direction deviation amount ΔY of the work 2 and the image information captured by the cameras 16a and 16b. Control. That is, the controller 22 considers the width direction deviation amount ΔY of the work 2 and the relative deviation amount between the second reference hole 40b and the mask alignment mark M1a, and the third reference hole 40c and the mask alignment mark M1b. The frame drive mechanism 14 is driven and controlled so that the amount of relative deviation from the angle decreases. That is, the reference hole 40b and the mask alignment mark M1a are adjusted so that the centers thereof are aligned, but the alignment between the reference hole 40c and the mask alignment mark M1b is performed for the first time in consideration of the width direction deviation amount ΔY of the workpiece 2. The exposure pattern and the pattern to be exposed from now on are arranged so as to be connected with no inclination.

When exposure is performed toward the mask 8 from the parallel light source 10 disposed above the mask 8 in a state where the mask 8 is in close contact with the surface of the work 2, it overlaps the exposure pattern already exposed and transferred to the work 2. In addition, a new exposure pattern is exposed and transferred without providing a gap with the exposure pattern.
Next, although not shown, the controller 22 sends a drive signal to the indexer 7 and the work 2 is sent out by a specified feed amount. Then, a new exposure pattern is exposed and transferred to the work 2 in the same procedure as in FIG.

  The workpiece 2 corresponds to the material to be exposed of the present invention. Reference holes 40a, 40b, 40c, 40d... Formed in the workpiece 2, mask alignment marks M1a, M1b and cameras 16a, 16b, 18 formed in the mask 8 are provided. The mask alignment marks M1a and M1b and the cameras 16a and 16b correspond to the alignment means of the present invention, and the controller 22, the frame drive mechanism 14 and the indexer 7 correspond to the alignment adjustment means of the present invention. The reference holes 40a, 40b, 40c, 40d... Correspond to the exposed material side mark of the present invention, the mask alignment marks M1a, M1b correspond to the mask side mark of the present invention, and the cameras 16a, 16b, 18 The width direction deviation amount ΔY corresponds to the meandering amount of the present invention.

According to the present embodiment, the controller 22 calculates the width direction deviation amount ΔY based on the image information taken by the cameras 16a, 16b, and 18, and continuously exposes and transfers the workpiece 2 to the workpiece 2 based on these calculation results. Since the frame drive mechanism 14 and the indexer 7 are driven and controlled so that the exposed patterns do not overlap with each other and the exposed patterns are not adjacent to each other with a gap, the exposure transfer is normally performed even if the work 2 is sent while meandering. And the yield of the workpiece 2 can be improved.
Further, means for detecting meandering of the workpiece 2 are the reference holes 40a, 40b, 40c, 40d... Formed in the workpiece 2, the mask alignment marks M1a, M1b formed in the mask 8, and the cameras 16a, 16b, 18. Therefore, a simple apparatus configuration can be obtained.

(Second Embodiment)
Next, FIG. 5 shows a specific configuration of the workpiece 2 and the mask 8 of the second embodiment according to the present invention, and FIG. 4 shows an exposure procedure of the second embodiment. In addition, the same code | symbol is attached | subjected to the component same as the structure of 1st Embodiment shown in FIGS. 2-4, and the description is abbreviate | omitted.
As shown in FIG. 5, a pair of mask alignment marks M1a and M1b are formed on the mask 8 of the present embodiment as in the first embodiment, and correspond to the other edge in the width direction of the workpiece 2. A pair of mask alignment marks M2a and M2b are formed on the side to be processed. The pair of mask alignment marks M2a and M2b are also circular marks which are non-translucent and smaller than reference holes 41a, 41b, 41c and 41d, which will be described later, in the translucent region.

  Moreover, the drilling machine 42 is arrange | positioned at the both edges of the width direction of the workpiece | work 2, respectively, One drilling machine 42 forms the reference holes 40a, 40b, 40c, 40d ..., and the other drilling. The machine 42 forms reference holes 41a, 41b, 41c, 41d. The reference holes 41a, 41b, 41c, 41d... Are formed at the same position in the workpiece feeding direction with respect to the reference holes 40a, 40b, 40c, 40d.

Further, the present embodiment is different from the exposure portion P of the first embodiment in that the camera is positioned at a position facing the mask alignment marks M2a and M2b formed on the mask 8 from above as shown in FIG. 17a and 17b are arranged, and the camera 18 is not arranged in front of the workpiece feeding direction as in the first embodiment.
Therefore, in this embodiment, four cameras 16a, 16b, 17a, and 17b are fixed to the mask holding frame 12 at positions facing the mask alignment marks M1a, M1b, M2a, and M2b formed on the mask 8 from above. It is arranged in the state.
The four cameras 16a, 16b, 17a, and 17b are connected to the controller 22.

Next, the exposure procedure of the second embodiment will be described with reference to FIG.
First, as shown in FIG. 6A, the controller 22 sends a drive signal to the two drilling machines 42, and the two drilling machines 42 are arranged in one row at both edges in the width direction of the workpiece 2. Eye reference holes 40a and 41a are formed.
Next, as shown in FIG. 6 (b), the controller 22 sends a drive signal to the indexer 7 and the two drilling machines 42, and the work 2 is sent out at a specified feed amount by driving the indexer 7, Two drilling machines 42 form reference holes 40 b and 41 b in the second row at both edges in the width direction of the work 2.

  Next, as shown in FIG. 6C, the controller 22 sends a drive signal to the indexer 7 and the two drilling machines 42, and the work 2 is sent out at a specified feed amount by driving the indexer 7, Two drilling machines 42 form reference holes 40 c and 41 c in the third row at both edges in the width direction of the work 2. Next, based on the image information captured by the cameras 16b and 17b, the controller 22 makes a relative shift amount between the reference holes 40b in the second row and the mask alignment mark M1b, and the reference holes 41b in the second row and the mask. A relative shift amount with respect to the alignment mark M2b is calculated, and the frame drive mechanism 14 is driven and controlled so that the shift amount is reduced. As a result, the frame driving mechanism 14 slightly moves the mask holding frame 12 holding the mask 8 in the XYθ direction to align the workpiece 2 and the mask 8. In this state, the controller 22 calculates the feed amount error ΔX1 based on the image information of the first row of reference holes 40a captured by the camera 16a and the mask alignment mark M1a. More preferably, at the same time, the camera 17a may obtain the feed amount error ΔX2 based on the image information of the reference hole 41a and the mask alignment mark M2a and use the average value of both for the correction feed described later.

  Next, as shown in FIG. 6D, the controller 22 sends a drive signal based on the calculated feed amount error ΔX1 (or the average value of the feed amount errors ΔX1 and ΔX2) to the indexer 7, and the workpiece 2 Feeding is performed with a corrected feed amount that corrects the feed amount error ΔX1 (or the average value of the feed amount errors ΔX1 and ΔX2). In addition, the controller 22 sends a drive signal to the two drilling machines 42 to form the fourth row of reference holes 40 d and 41 d at both edges in the width direction of the workpiece 2.

Further, the controller 22 calculates the relative displacement between the reference hole 40b and the mask alignment mark M1a and the relative displacement between the reference hole 41b and the mask alignment mark M2a based on image information captured by the cameras 16a and 17a. Then, the frame drive mechanism 14 is driven and controlled so that the amount of deviation decreases. Thereby, the workpiece 2 and the mask 8 are aligned. Next, the controller 22 in this state captures the image information of the third row of reference holes 40c and the mask alignment mark M1b captured by the camera 16b and the third row of reference holes 41c and the mask alignment mark M2b captured by the camera 17b. 6 on the one side in the width direction of the workpiece 2, the amount of deviation ΔY2 on the other side in the width direction, and the amounts of deviation ΔX1, ΔX2 in the feed direction of the workpiece 2 (shown in FIG. 6D). And is stored in a storage unit (not shown).
Then, in a state where the mask 8 is in close contact with the surface of the work 2, exposure is applied to the mask 8 from the parallel light source 10 disposed above the mask 8, and the pattern of the mask 8 is exposed and transferred onto the surface of the work 2. .

  Next, as shown in FIG. 6E, the controller 22 outputs a drive signal based on the feed amount error ΔX1 (or the average value of the feed amount errors ΔX1 and ΔX2) obtained in FIG. And the workpiece 2 is fed at the corrected feed amount to form the fifth row of reference holes 40e and 41e. Next, the frame drive mechanism 14 is driven and controlled based on the image information captured by the cameras 16a and 17a while taking into account the previously stored feed amount errors ΔX1 and ΔX2 and the width direction displacement amounts ΔY1 and ΔY2. In other words, the controller 22 determines that the relative shift amount between the reference hole 40c in the third row and the mask alignment mark M1a is the previously stored feed amount error ΔX1, the width direction shift amount ΔY1, and the reference hole 41c in the third row. The slam drive mechanism 14 is driven and controlled so that the relative displacement amount with respect to the mask alignment mark M2a coincides with the previously stored feed amount error ΔX2 and width direction displacement amount ΔY2. Further, in this state, the feed amount error ΔX11 between the fourth row of reference holes 40d and the mask alignment mark M1b, the width direction deviation amount ΔY11, and the feed amount error ΔX22 of the fourth row of reference holes 41d and the mask alignment mark M2b, The width direction deviation amount ΔY22 is acquired by the cameras 16b and 17b, and the calculation results of ΔX1-ΔX11, ΔX2-ΔX22, ΔY1-ΔY11, and ΔY2-ΔY22 are stored in the storage unit.

When exposure is performed toward the mask 8 from the parallel light source 10 disposed above the mask 8 in a state where the mask 8 is in close contact with the surface of the work 2, it overlaps the exposure pattern already exposed and transferred to the work 2. In addition, a new exposure pattern is exposed and transferred without providing a gap with the exposure pattern.
Next, although not shown, the controller 22 sends a drive signal based on the calculated feed amount error (ΔX1-ΔX11 (or an average value of ΔX1-ΔX11 and ΔX2-ΔX22) in FIG. 6E) to the indexer 7. Then, the workpiece 2 is fed out with a correction feed amount that corrects the feed amount error, and a new exposure pattern is exposed and transferred to the workpiece 2 in the same procedure as in FIG. Go.

  It should be noted that reference holes 40a, 40b, 40c, 40d..., 41a, 41b, 41c, 41d..., Mask alignment marks M1a, M1b, M2a, M2b formed on the mask 8 and cameras 16a, Reference numerals 16b, 17a, and 17b correspond to the meandering detection means of the present invention, the mask alignment marks M1a and M2a and the cameras 16a and 17a correspond to the alignment means of the present invention, and the controller 22, the frame drive mechanism 14 and the indexer 7 are the present invention. The reference holes 40a, 40b, 40c, 40d..., 41a, 41b, 41c, 41d... Correspond to the exposed material side marks of the present invention, and the mask alignment marks M1a, M1b, M2a, M2b. Corresponds to the mask side mark of the present invention, and the cameras 16a, 16b, 17a, 7b corresponds to the imaging means of the present invention, the feed amount error .DELTA.X1, .DELTA.X2 and width deviation amount [Delta] Y1, [Delta] Y2 is equivalent to the amount of meandering of the present invention.

  According to the present embodiment, the controller 22 calculates the feed amount errors ΔX1, ΔX2, the width direction deviation amounts ΔY1, ΔY2, and the like based on the image information captured by the cameras 16a, 16b, 17a, 17b, and the calculation results thereof. Therefore, the frame drive mechanism 14 and the indexer 7 are driven and controlled so that the exposure patterns continuously exposed and transferred to the workpiece 2 do not overlap with each other and the exposure patterns are not adjacent to each other with a gap. Can be normally transferred by exposure even if it is sent while meandering, and the yield of the work 2 can be improved.

Further, means for detecting the meandering of the work 2 include reference holes 40 a, 40 b, 40 c, 40 d..., 41 a, 41 b, 41 c, 41 d ... formed in the work 2, and mask alignment marks M 1 a, M 1 b, formed on the mask 8. Since M2a and M2b and the cameras 16a, 16b, 17a and 17b are used, a simple apparatus configuration can be obtained.
In each of the above embodiments, the case of single-sided exposure has been described. However, the present invention can also be applied to a double-sided exposure apparatus such as Patent Document 1.

It is a schematic block diagram which shows the exposure apparatus which concerns on this invention. It is a perspective view which shows the mask and the to-be-exposed material arrange | positioned at the exposure part of 1st Embodiment of the exposure apparatus which concerns on this invention. It is a schematic block diagram which shows the exposure part of 1st Embodiment. It is a figure which shows the operation | movement until exposure transfer by the exposure part of 1st Embodiment. It is a perspective view which shows the mask and exposure material which are arrange | positioned at the exposure part of 2nd Embodiment of the exposure apparatus which concerns on this invention. It is a figure which shows the operation | movement until exposure transfer by the exposure part of 2nd Embodiment.

Explanation of symbols

  2 ... Work, 7 ... Indexer, 8 ... Mask, 10 ... Light source, 12 ... Mask holding frame, 14 ... Frame drive mechanism, 16a, 16b, 17a, 17b, 18 ... Camera, 22 ... Controller, 40a, 40b, 40c, 40d, 41a, 41b, 41c, 41d... Reference hole, M1a, M1b, M2a, M2b... Mask alignment mark, .DELTA.X1, .DELTA.X2... Feed amount error, .DELTA.Y, .DELTA.Y1, .DELTA.Y2.

Claims (2)

In an exposure apparatus that sends a strip-shaped exposed material by a predetermined amount so as to face the mask, and continuously exposes and transfers the mask pattern in the longitudinal direction of the exposed material,
Meander detection means for detecting the amount of meander of the exposed material that has been sent,
Alignment means for aligning the pattern of the mask with the exposed position of the exposed material;
The mask by the alignment means based on the detection result of the meandering detection means so that the exposure patterns continuously exposed and transferred to the exposed material do not overlap and the exposure patterns are not adjacent to each other with a gap. And an alignment adjusting means for adjusting the alignment of the exposure position.   The meandering detecting means and the alignment means include an exposed material side mark formed at a predetermined interval in the longitudinal direction of the exposed material, a mask side mark formed on the mask, and the exposed material side mark and the mask. The exposure apparatus according to claim 1, further comprising an imaging unit that obtains information on a superimposed state of the side mark.

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