WO2007049640A1

WO2007049640A1 - Exposure method and exposure apparatus

Info

Publication number: WO2007049640A1
Application number: PCT/JP2006/321259
Authority: WO
Inventors: Ken Miyake; Ken Imanishi
Original assignee: San Ei Giken Inc.
Priority date: 2005-10-25
Filing date: 2006-10-25
Publication date: 2007-05-03
Also published as: JP5117672B2; JP2007121425A; TW200720855A

Abstract

A substrate, a first photomask and a second photomask are highly accurately aligned. Three alignment marks (22, 25, 26) at corresponding positions on the flexible substrate (10), the first photomask (11) and the second photomask (12) are read at the same time by a CCD camera. Based on the mark position information from the read images, a relative position between the flexible substrate (10) and the first photomask (11) and that between the flexible substrate (10) and the second photomask (12) are adjusted and alignment is performed.

Description

Specification

Exposure method and exposure apparatus

Technical field

TECHNICAL FIELD [0001] The present invention relates to an exposure method and an exposure apparatus in which a pair of photomasks are arranged on both sides of a belt-shaped substrate conveyance path, and a pattern is transferred to both surfaces of the belt-shaped substrate by the pair of photomasks. The present invention relates to an alignment technique between a material and a pair of photomasks.

Background art

Conventionally, a wiring pattern such as an electric circuit is formed on a flexible substrate, which is a belt-shaped base material, using a photomask, by a circuit formation technique including an exposure process, a development process, an etching process, and the like. ing. In this exposure process, it is necessary to accurately align the flexible substrate and the photomask. For this alignment, for example, an alignment mark is provided on each of the flexible substrate and the photomask; both alignment marks are read by a CCD camera. That is, the relative position between the flexible substrate and the photomask is adjusted based on the mark position information from the image read by the CCD camera (see, for example, Patent Document 1).

[0003] In recent years, flexible boards, like hard printed boards that can be manufactured simply as flat cables, can be mounted with high-precision, high-definition patterns and multilayers that can mount electronic components such as semiconductor devices. Is being sought. Along with this, the pattern transfer accuracy on the front and back of the substrate as well as the pattern transfer accuracy on the flexible substrate is required in the exposure, that is, the two photomasks are aligned with respect to the substrate with high accuracy and the two photomasks are aligned with each other. It has become necessary to align each other with high accuracy.

[0004] Hereinafter, an example of a conventional alignment method when performing double-sided exposure will be described. In FIGS. 1 and 2, the flexible substrate 100, which is a strip-shaped material, is transported in the longitudinal direction T by the transport means. Photosensitive material (photoresist) is applied to both surfaces of the flexible substrate 100. In the flexible substrate 100, a planned exposure range 101 is set substantially continuously along the longitudinal direction.

[0005] In the four positions outside the four corners of each planned exposure area 101, there are translucent alignment marks. 102 are provided. The first photomask 103 and the second photomask 104 are arranged to face each other on both sides of the flexible substrate 100 to be transported. As shown in FIG. 2, the first photomask 103 is provided with a first pattern portion 103a. Non-transparent alignment marks 105 are provided at two locations outside the diagonal position of the first pattern portion 103a. As shown in FIG. 2, the second photomask 104 is provided with a second pattern portion 104a. Non-transparent alignment marks 106 are provided at two positions outside the diagonal position of the first photomask 103 and outside the diagonal position of the second pattern portion 104a. .

[0006] It should be noted that the pair of alignment marks 105, 105 and the alignment marks 106, 106 provided on the first photomask and the second photomask in this way are arranged at different diagonal positions. The alignment marks 105 and 106 are non-transparent marks with the same circular shape, and it is difficult to identify which mark when reading with a CCD camera. It was a force that had to be provided at different positions so that it was not necessary.

[0007] The first photomask 103 and the second photomask 104 are vertically adjusted with respect to the flexible substrate 100 by position adjusting means (not shown).

The CCD camera 107 is disposed at a position farther from the first photomask 103 with respect to the flexible substrate 100 and is set to be movable in the surface direction of the flexible substrate 100.

[0009] In the above configuration, when the flexible substrate 100 is transported by a predetermined distance by the transport means, the exposure range 101 of the flexible substrate 100 is disposed substantially opposite to the first and second photomasks 103 and 104. Then, the positions of the four alignment marks 102, 105, 106 on the flexible substrate 100 are read by the CCD camera 107. Based on the position information of the mark obtained as a result, the positions of the first photomask 103 and the second photomask 104 with respect to the flexible substrate 100 are adjusted to perform alignment.

[0010] When the position adjustment of the first and second photomasks 103 and 104 with respect to the flexible substrate 100 is completed, the irradiation lights LI and L2 are irradiated to both surfaces of the flexible substrate 100 through the first and second photomasks 103 and 104, respectively. Then, the pattern is transferred to both sides of the flexible substrate 100. Patent Document 1: Japanese Patent Application Laid-Open No. 2004-347964

Disclosure of the invention

However, in the above-described conventional alignment method during exposure, the first photomask 103 and the second photomask 104 are aligned with reference to different alignment marks 102 on the flexible substrate 100. Therefore, if there are variations in the positioning accuracy, image recognition accuracy, etc. of each alignment mark 102, the first photomask 103 and the second photomask 104 will be placed in a standing position under the influence of the variation. become. Therefore, the force between the flexible substrate 100 and the first and second photomasks 103 and 104 is aligned with high accuracy. The force between the first photomask 103 and the second photomask 104 can be aligned with high accuracy. There is no problem. If the first photomask 103 and the second photomask 104 are not aligned with high accuracy, the positions of the patterns on both sides of the flexible substrate 100 are shifted.

[0012] Therefore, the present invention solves the above-mentioned problems, and an exposure method and an exposure method capable of aligning not only between the belt-shaped substrate and the first and second photomasks but also between the first photomask and the second photomask with high accuracy. And an exposure apparatus.

[0013] The invention according to the first aspect of the present invention is an exposure method, wherein a belt-like substrate having a photosensitive material formed on both sides is intermittently fed along the longitudinal direction thereof to an exposure processing position. The first photomask and the second photomask are arranged so as to face both surfaces of the belt-shaped substrate, respectively, and light is transmitted through the first photomask and the second photomask to both surfaces of the belt-shaped substrate. The exposure method transfers the pattern drawn on each of the first photomask and the second photomask onto both surfaces of the belt-like substrate by irradiating the belt-like substrate, and the belt-like substrate and the first photomask And the second photomask is provided with a plurality of alignment marks at opposite positions to align the belt-shaped substrate, the first photomask and the second photomask with each other. A single CCD camera simultaneously aligns three alignment marks, the alignment mark provided on the strip-shaped substrate at the position and the alignment mark provided on each of the first photomask and the second photomask. And at least one of the first photomask and the second photomask is moved in the X, Y, and 0 directions based on the data obtained as a result. The gist of the present invention is that the band-shaped substrate, the first photomask, and the second photomask are arranged in a standing manner.

[0014] The invention according to the second aspect of the present invention is an exposure apparatus, wherein a predetermined exposure range is set continuously along the longitudinal direction, and alignment marks are provided at a plurality of positions for each predetermined exposure range. The belt-shaped base material, the base material transporting means for transporting the belt-shaped base material in the longitudinal direction, and the belt-shaped base material transport path are arranged at positions sandwiching the belt-shaped base material, and alignment marks are provided at a plurality of positions, respectively. The first and second photomasks and a CCD camera are provided, and the alignment marks at the plurality of positions of the first and second photomasks are respectively arranged at positions corresponding to the same alignment marks on the belt-shaped substrate. The CCD camera can simultaneously read three alignment marks at the corresponding positions of the belt-shaped substrate, the first photomask, and the second photomask. Based on the data obtained as a result, the first and second photomasks can be read simultaneously. 2 Position adjustment means for aligning the belt-shaped substrate, the first photomask, and the second photomask by moving at least one of the masks in the X, Y, and 0 directions is provided, and the first mask and the second photomask are aligned with respect to both surfaces of the belt-shaped substrate. The gist is to transfer the patterns drawn on the first and second photomasks onto both sides of the belt-like substrate by irradiating light through the first and second photomasks. Brief Description of Drawings

FIG. 1 is a view showing the arrangement of a conventional flexible substrate and a first photomask.

[FIG. 2] FIG. 2 is a sectional view taken along line II-II in FIG.

FIG. 3 is a schematic block diagram of an exposure apparatus according to an embodiment of the present invention.

[FIG. 4] FIG. 4 is a diagram showing the arrangement of the flexible substrate and the first photomask as seen in the direction of arrow A in FIG.

FIG. 5 is a cross-sectional view taken along line V—V in FIG.

[FIG. 6] FIG. 6 is an enlarged view of a main part of part C of FIG.

FIG. 7 is a view of the first photomask side force shown in FIG. 6 and shows the state of three alignment marks at an accurate alignment position.

[FIG. 8] FIG. 8 is an enlarged view of a main part showing three alignment marks of the first modification.

[Fig. 9] Fig. 9 is a view of the first photomask side force shown in Fig. 8, and shows a state of three alignment marks at an accurate alignment position of the first modified example. FIG. 10 is a diagram showing an arrangement of a flexible substrate and a first photomask of a second modified example.

FIG. 11 is a cross-sectional view taken along the line XI-XI in FIG.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, details of an exposure method and an exposure apparatus according to an embodiment of the present invention will be described with reference to the drawings.

1 to 5 show an embodiment of the present invention, FIG. 3 is a schematic block diagram of an exposure apparatus, and FIG. 4 is an arrangement of a flexible substrate and a first photomask viewed from the direction of arrow A in FIG. Fig. 5 is a cross-sectional view taken along the line V-V in Fig. 4, Fig. 6 is an enlarged view of the main part of section C in Fig. 5, and Fig. 7 is a diagram showing the state of three alignment marks at the alignment position. is there.

As shown in FIG. 3, the exposure apparatus 1 includes a base plate 2 and a housing 3 installed on the base plate 2. In the housing 3, a dark room 3a is formed.

[0019] The base material conveying means 4 includes a reel 5 for feeding installed on one base plate 2 outside the casing 3, and a take-up reel installed on the other base plate 2 outside the casing 3. 6, a plurality of guide rolls 7a to 7n for forming a predetermined conveyance path between the feeding reel 5 and the take-up reel 6 and a flexible substrate 10 which is a belt-shaped substrate. With roll 8. Most of the transfer path is arranged in the dark room 3a. Between the guide roll 7f at the lower position and the guide roll 7h at the upper position in the dark room 3a, it is regarded as a vertical conveyance section for conveying the flexible substrate 10 in the vertical direction.

[0020] The flexible substrate 10 that is a belt-like base material is wound around the feeding reel 5 and the take-up reel 6 at both ends, and is arranged along the transport path of the base material transport means 4. ing. The flexible substrate 10 is transported by the base material transport means 4 with its longitudinal direction as the transport direction T. A photosensitive material is applied to both surfaces of the flexible substrate 10.

The first photomask 11 and the second photomask 12 are arranged to face each other on both sides of the flexible substrate 10 in the vertical conveyance section of the base material conveyance means 4. The first and second photomasks 11 and 12 have first and second pattern portions 11a and 12a on which desired patterns are drawn, respectively. [0022] The first photomask 11 is held by a support. This support is supported by the first frame 14 via the first position adjusting means 13. Therefore, the first photomask 11 is moved by the position adjusting means 13 in the Χ, Υ, θ (rotation direction of the ridge surface) direction parallel to the surface of the flexible substrate 10 and is positioned relative to the flexible substrate 10. It can be adjusted.

[0023] The second photomask 12 is held by a support. This support is supported by the second frame 16 via the second position adjusting means 15. Therefore, the second photomask 12 can be adjusted to a relative position with respect to the flexible substrate 10 by being moved in the X, Υ, and Θ directions parallel to the surface of the flexible substrate 10 by the position adjusting means 15. And

[0024] By irradiating light through the first photomask 11 and the second photomask 12 by a light irradiation means 17 comprising a light source (not shown) and first and second mirrors 18 and 19, both surfaces of the flexible substrate 10 are irradiated. The patterns drawn on the first photomask 11 and the second photomask are transferred.

[0025] The CCD camera 20 serving as a mark reading means is arranged at a position farther from the first photomask 11 with respect to the flexible substrate 10, and is movable in the X and Y directions on a plane parallel to the surface of the flexible substrate 10. Is provided.

[0026] Based on the image data from the CCD camera 20, an image processing device (not shown) is used for calculation, and alignment is performed based on the calculation result.

As shown in FIG. 4 to FIG. 6, in the longitudinal direction of the flexible substrate 10, an exposure exposure range 21 (shown in FIG. 4) is set through a certain interval (or may be continuous), and each Alignment marks 22 (shown in FIGS. 4 to 6) are provided at four locations for each exposure range 21. Four alignment marks 22 are provided at four positions outside the four corners of the planned exposure area 21. Each alignment mark 22 has a translucent circular shape, and its peripheral portion is formed of a non-translucent member.

[0028] There are four alignment marks 25 and 26 (shown in FIGS. 4 to 6) on the outer positions of the first and second pattern portions 11a and 12a of the first and second photomasks 11 and 12, respectively. It is provided. The four alignment marks 25 of the first photomask 11 are provided at positions corresponding to all of the four alignment marks 22 of the flexible substrate 10. 1st photomask 1 Each alignment mark 25 of 1 has a non-translucent annular shape. The peripheral portion of each alignment mark 25 of the first photomask 11 is formed of a translucent member. Similarly to the first photomask 25, the four alignment marks 26 of the second photomask 12 are provided at positions corresponding to the four alignment marks 22 of the flexible substrate 10. Each alignment mark 26 of the second photomask 12 is a non-transparent circle. A peripheral portion of each alignment mark 26 of the second photomask 12 is formed of a translucent member.

Further, as shown in detail in FIGS. 6 and 7, the annular alignment mark 25 of the first photomask 11 in which the outer diameter of the alignment mark 22 of the flexible substrate 10 is the largest is the second largest. 2 The circular alignment mark 26 of the photomask 12 is set smaller than the smallest circular inner circumference.

The operation of the exposure apparatus 1 will be described with reference to FIG.

First, the flexible substrate 10 is transported by a predetermined distance by the substrate transport means 4, and the planned exposure range 21 of the flexible substrate 10 is disposed substantially opposite to the first and second photomasks 11 and 12.

Next, the peripheral position of the flexible substrate 10 is read with the CCD camera 20 around the four alignment marks 22. Here, since the flexible substrate 10 is positioned at a predetermined position with respect to the first and second photomasks 11 and 12 by the transport of the base material transport means 4, the CCD camera 20 has three positions. The alignment marks 22, 25 and 26 can be read simultaneously.

[0033] The amount of positional deviation between the flexible substrate 10 and the first and second photomasks 11 and 12 is calculated using at least two of the four mark image data. Based on the positional deviation amounts of the first photomask 11 and the second photomask 12, the position of the first photomask 11 is set by the first position adjusting means 13, and the position of the second photomask 12 is set by the second position adjusting means. Adjust by 15 respectively.

[0034] Next, when the position adjustment is completed, the CCD camera 20 reads the three alignment marks 22, 25, and 26 again, and confirms that the position is an accurate alignment position. Confirmation work may be omitted. At the correct alignment position, the three alignment marks 22, 25 and 26 are in the state shown in FIG. In Fig. 7, areas with low brightness levels are hatched. Show.

Next, the light irradiation means 17 irradiates the flexible substrate 10 with the first irradiation light Ll and the second irradiation light L2 through the first photomask 11 and the second photomask 12, respectively. As a result, desired patterns are respectively transferred to both surfaces of the flexible substrate 10. By repeating the above process, the pattern is continuously transferred to the exposure range 21 of the flexible substrate 10.

As described above, according to the present invention, the first photomask 11 and the second photomask 12 are both aligned based on the Cf alignment mark 22 of the flexible substrate 10 in the above-described alignment step. Even if an error occurs in the position accuracy and image recognition accuracy of the alignment mark 22 of the flexible substrate 10, it is not easily affected by the error. Accordingly, not only the flexible substrate 10 and the first and second photomasks 11 and 12 but also the first photomask 11 and the second photomask 12 can be aligned with high accuracy.

In this embodiment, a sensor for detecting the end face of the belt-like substrate is provided in front of the exposure unit, and the front and back photomasks or substrates are moved in the X direction based on the end face position information detected by the sensor. By correcting the deviation from the normal position, the three alignment marks 22, 25, and 26 can be reliably photographed with the CCD camera without the three marks deviating greatly.

[0038] In this embodiment, the alignment mark 22 of the flexible substrate 10 is a translucent circular shape, and the alignment mark 25 of the first photomask 11 is a non-translucent annular shape, The alignment mark 26 of the second photomask 12 is a non-transparent circle having a smaller diameter than the annular inner circumferential circle. The size of each of the alignment marks 22, 25, 26 of the flexible substrate 10, the first photomask 11, and the second photomask 12 is the largest outer diameter of the alignment mark 22 of the flexible substrate 10. 1 The circular alignment mark 25 of the second photomask 12 with the next largest annular alignment mark 25 of the photomask 11 is set to the smallest size, so the three alignment marks 22, 25 and 26 are read simultaneously. be able to.

In contrast to this embodiment, the first photomask 11 may be provided with a circular alignment mark, and the second photomask 12 may be provided with an annular alignment mark!

[0040] In this embodiment, the base material conveyance path is formed along the vertical direction of the flexible substrate 10. Since the first and second photomasks 11 and 12 are opposed to each other in the vertical conveyance section, the flexible substrate 10 does not get caught by its own weight. It is easy to maintain the flatness of the flexible substrate 10 without increasing the tension more than necessary. For this reason, the flexible substrate 10 can be aligned with high accuracy with a small dimensional change. In addition, dust hardly adheres to the flexible substrate 10 and the first and second photomasks 11 and 12. Furthermore, since a long optical path can be secured as compared with the case where the exposed portion is in the horizontal portion, faithful transfer with higher-quality parallel light is possible.

[0041] (First modification of alignment mark)

8 and 9 show a first modified example of the alignment mark, FIG. 8 is an enlarged view of a main part showing three alignment marks, and FIG. 9 shows three alignment marks at accurate alignment positions. It is a figure which shows the state of.

As shown in FIGS. 8 and 9, the alignment mark 30 of the flexible substrate 10 is a transparent circle, and its peripheral portion is formed of a non-transmissive member. The alignment mark 31 of the first photomask 11 is a non-transparent annular shape. A peripheral portion of each alignment mark 31 of the first photomask 11 is formed of a translucent member. The alignment mark 32 of the second photomask 12 is a non-transparent circle. The peripheral portion of each alignment mark 32 of the second photomask 12 is formed of a translucent member. The size of the alignment marks 30, 31, 32 of the flexible substrate 10, the first photomask 11, and the second photomask 12 is the largest in the annular alignment mark 31 of the first photomask 11. The circular alignment mark 32 of the second photomask 12 with the next largest alignment mark 30 on the flexible substrate 10 is set to the smallest size.

Also in the first modification example, as shown in FIG. 9, at the alignment position of the flexible substrate 10, the first photomask 11 and the second photomask 12, and at least in the vicinity thereof, three alignment marks 30, 31 and 32 can be read simultaneously.

[0044] (Second modification of alignment mark)

10 and 11 show a second modification of the alignment mark, FIG. 10 is a view showing the arrangement of the flexible substrate and the first photomask, and FIG. 11 is a cross-sectional view taken along the line XI-XI in FIG.

[0045] As shown in FIGS. 10 and 11, the flexible substrate 10, the first photomask 11, and the second photo The mask 12 is provided with auxiliary alignment marks 22a, 25a, and 26a in addition to the force provided with the alignment marks 22, 25, and 26 having the same configuration as the embodiment.

That is, the flexible substrate 10 is provided with the auxiliary alignment mark 22a outside the planned exposure range 21 and at an intermediate position between the two alignment marks 22. The first and second photomasks 11 and 12 are provided with auxiliary alignment marks 25a and 26a, respectively, at outer positions that do not face the flexible substrate 10 and at the same position in the longitudinal direction T of the flexible substrate 10. Yes.

[0047] The auxiliary alignment mark 22a of the flexible substrate 10 has a translucent circular shape, and its peripheral portion is formed of a non-translucent member. The auxiliary alignment mark 25a of the first photomask 11 has a non-translucent annular shape. A peripheral portion of the auxiliary alignment mark 25a of the first photomask 11 is formed of a translucent member. The auxiliary alignment mark 26a of the second photomask 12 is a non-translucent circle. The peripheral position of the auxiliary alignment mark 26a of the second photomask 12 is formed of a translucent member.

[0048] Further, as a method of using the auxiliary alignment marks 25a and 26a, there are the following methods. That is, if the positions of the second photomask 12 and the flexible substrate 10 are largely displaced by the alignment marks 22, 25, and 26 as in the above embodiment, the flexible substrate 10 causes the second photomask 12 to The alignment mark 26 is hidden and cannot be read.

In this second modification, even if the alignment mark 26 of the second photomask 12 is hidden by the flexible substrate 10 and cannot be read, the auxiliary alignment mark of the second photomask 12 can be read. 26a is not hidden by the flexible substrate 10.

[0050] Therefore, if the rough alignment between the flexible substrate 10, the first photomask 11, and the second photomask 12 is performed using the three auxiliary alignment marks 22a, 25a, and 26a, then it is ensured. In addition, the CCD camera can read the three alignment marks 22, 25, and 26. Therefore, alignment between the flexible substrate 10, the first photomask 11 and the second photomask 12 can be performed more reliably and smoothly.

[0051] (Other Embodiments) It should not be understood that the description and the drawings, which form part of the disclosure of the above-described embodiments, limit the present invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art.

[0052] For example, in the above-described embodiment and its modifications, the three alignment marks 22, 25, 26 are circular and annular, but are not limited to this. Three alignment marks 1S If the shape can be read by one CCD camera, it can be used as a square and a rectangular frame, or as a polygon and a polygonal frame.

[0053] In the above-described embodiment and its modifications, the band-shaped material is the flexible substrate 10, but a plurality of rigid substrates may be connected in a band shape. Not only a strip-shaped material but also a rigid substrate may be used.

[0054] Further, in the above-described embodiment and each modification thereof, each exposure scheduled range 21 of the flexible substrate 10, the first pattern portion l la of the first photomask 11, and the second of the second photomask 12 are used. Alignment marks 22, 25, and 26 are provided at four locations on the pattern portion 12a, respectively, but at least two locations may be provided. If only two positions are provided, the number of reading positions of the alignment marks 22, 25, and 26 is reduced compared to the conventional example, so that the exposure time is shortened and the manufacturing cost is reduced. However, when more than two locations are provided as in this embodiment, alignment with high accuracy and high reliability is possible.

[0055] In the above embodiment, the first photomask 11 and the second photomask 12 are disposed opposite to each other on both sides of a region (vertical transport section) in which the flexible substrate 10 is transported in the vertical direction. Of course, a photomask may be disposed opposite to the upper and lower sides of the area in which 10 is conveyed in the horizontal direction.

Industrial applicability

[0056] The present invention is not limited to a circuit forming technique including an exposure process, a development process, an etching process, and the like, in addition to circuit patterns including an exposure process, a development process, an etching process, and the like using a photomask on a flexible substrate. Can be used in industrial fields.

Claims

The scope of the claims

[1] A strip-shaped substrate having a photosensitive material formed on both sides thereof is intermittently fed along the longitudinal direction thereof, and the first photomer is disposed at the exposure processing position so as to face both sides of the strip-shaped substrate. A first photomask and a second photomask, and irradiating light on both sides of the belt-like substrate through the first photomask and the second photomask, whereby the first photomask is applied to both sides of the belt-like substrate. An exposure method for transferring a pattern drawn respectively on a mask and the second photomask,

The band-shaped substrate, the first photomask, and the second photomask include a plurality of positions at opposite positions to align the band-shaped substrate, the first photomask, and the second photomask with each other. Each alignment mark is provided,

Three CCD alignment marks, that is, the alignment mark provided on the belt-like substrate at the opposite positions and the alignment mark provided on each of the first photomask and the second photomask, are simultaneously combined into one CCD. Based on the data obtained by reading with a camera, at least one of the first photomask and the second photomask is moved in the X, Υ, and Θ directions to move the band-shaped substrate and the first photomask. An exposure method comprising: aligning a mask and the second photomask;

[2] The exposure method according to claim 1,

The alignment mark of the band-shaped substrate is a translucent circle, one of the alignment marks of the first photomask and the second photomask is a non-translucent annular shape, and the other is An exposure method characterized by being a non-transparent circle having a smaller diameter than the annular inner circumference.

[3] The exposure method according to claim 2,

The size of each alignment mark of the band-shaped substrate, the first photomask, and the second photomask is that of the first or second photomask in which the outer diameter of the alignment mark of the band-shaped substrate is the largest. An exposure method characterized in that the circular alignment mark of the first or second photomask having the next largest annular alignment mark is set to be the smallest.

[4] The exposure method according to claim 2, The size of each alignment mark of the belt-shaped substrate, the first photomask, and the second photomask is the largest in the annular alignment mark of the first or second photomask. An exposure method, wherein the circular alignment mark of the first or second photomask having the next largest alignment mark is set to be the smallest.

[5] A strip-shaped base material in which a planned exposure range is set continuously along the longitudinal direction, and alignment marks are provided at a plurality of positions for each planned exposure range;

Base material transport means for transporting the belt-shaped base material in the longitudinal direction;

A first photomask and a second photomask which are respectively arranged at positions sandwiching the belt-like substrate in the conveyance path of the belt-like substrate, and are provided with alignment marks at a plurality of positions, respectively.

With a CCD camera,

The alignment marks at a plurality of positions of the first and second photomasks are respectively arranged at positions corresponding to the same alignment marks of the strip-shaped substrate,

The CCD camera can simultaneously read three alignment marks at corresponding positions of the belt-shaped substrate, the first photomask, and the second photomask,

Based on the data obtained as a result, at least one of the first photomask and the second photomask is moved in the X, Y, and 0 directions to move the band-shaped substrate, the first photomask, and the second photomask. Position adjusting means for aligning the photomasks respectively, and by irradiating light on both surfaces of the belt-shaped substrate through the first and second photomasks, the first and second surfaces on both surfaces of the belt-shaped substrate. 2. An exposure apparatus that transfers each pattern drawn on a photomask.

[6] The exposure apparatus according to claim 5,

The base material transport path has a vertical transport section for transporting the belt-shaped base material along a vertical direction, and the first and second photomasks are arranged to face each other in the vertical transport section. Exposure device.