JP5145530B2 - Photomask and exposure method using the same - Google Patents

Description

  The present invention relates to a photomask that forms an exposure pattern by transferring an image of a mask pattern provided on a light-shielding film formed on one surface of a transparent base material to a substrate coated with a photosensitive resin. The present invention relates to a photomask for improving the overlay accuracy of an exposure pattern with respect to a formed reference pattern and an exposure method using the photomask.

A conventional photomask includes a mask pattern in which a linear portion of a pattern transferred to a substrate coated with a photosensitive resin is formed short, and an alignment mark for aligning with a substrate at a predetermined position ( For example, see Patent Document 1). In the exposure using such a photomask, the alignment mark and the alignment mark on the substrate are aligned before the start of exposure, and then the exposure light is applied to the substrate through the photomask and the photomask. A light irradiation device for irradiating is relatively moved or stopped in a biaxial direction in a plane parallel to the surface of the substrate within a predetermined area including the substrate, and the photomask is moving relative to the substrate or Exposure light was irradiated when stopped to form an exposure pattern extending linearly on the substrate. As a result, a linear exposure pattern can be efficiently formed on the substrate even with a small photomask.
Japanese Patent Laid-Open No. 11-237744

However, in such a conventional photomask, the alignment between the mask pattern and the reference pattern previously formed on the substrate is performed indirectly by the alignment mark of the photomask itself and the alignment mark of the substrate. However, the mask pattern cannot be positioned with respect to the reference pattern while directly observing the reference pattern formed on the substrate. Therefore, the overlay accuracy of the exposure pattern and the reference pattern of the substrate is determined by the formation accuracy between the mask pattern of the photomask and the alignment mark and the formation accuracy between the reference pattern of the substrate and the alignment mark. When the formation accuracy was not sufficient, the overlay accuracy was also deteriorated. In particular, when the substrate is large, the formation accuracy between the alignment marks and the patterns is more severe, and the alignment is more difficult.

In addition, the conventional photomask described above aligns the alignment mark of the photomask itself and the alignment mark of the substrate before the start of exposure, and aligns both alignment marks during exposure execution. I could not. Therefore, if the alignment before the start of exposure is insufficient, the alignment accuracy between the exposure pattern and the reference pattern also deteriorates. Furthermore, since the positional shift due to the movement error of the substrate cannot be corrected, the alignment accuracy cannot be improved.

  Accordingly, the present invention addresses such problems, and a photomask that attempts to improve the overlay accuracy of an exposure pattern with respect to a reference pattern previously formed on a substrate coated with a photosensitive resin, and an exposure method using the photomask The purpose is to provide.

To achieve the above object, the photomask according to the first invention, Ri Do light shielding film formed on one surface of the transparent substrate and the transparent substrate, alignable relative to the substrate being transported in a predetermined direction a photomask that is configured to be formed on the light-shielding film side by side in a direction perpendicular to the transport direction of the substrate, a plurality of mask patterns the exposure light passes, the substrate transfer direction before the previous SL plurality of mask patterns the light-shielding film side, the plurality of formed longer extend parallel to the arrangement direction of the mask pattern is obtained by providing a viewing window, a to allow observation of the surface of the substrate to be transported to face.

With such a configuration, the light-shielding film formed on one surface of the transparent base material passes through a viewing window formed long and extending in parallel to the arrangement direction of a plurality of mask patterns formed in a direction perpendicular to the substrate transport direction. By observing the surface of the substrate conveyed oppositely , the substrate is aligned with the substrate being conveyed, and then the substrate is irradiated with exposure light through the plurality of mask patterns.

Further, a wavelength selective film that transmits visible light and reflects or absorbs ultraviolet rays is formed on at least one surface of the transparent substrate so as to cover the viewing window. Thereby, visible light is transmitted through a wavelength selective film formed on at least one surface of the transparent substrate so as to cover the viewing window, and ultraviolet rays are reflected or absorbed .

Further, the photomask according to the second invention, Ri Do light shielding film formed on one surface of the transparent substrate and the transparent substrate, a photomask that is configured to be able to align the substrate being transported in a predetermined direction a is formed on the light-shielding film side by side in a direction perpendicular to the transport direction of the substrate, a plurality of mask patterns the exposure light passes, the light shielding film of the substrate transport direction front side of the front Symbol plurality of mask patterns the plurality of formed longer extend parallel to the arrangement direction of the mask pattern, perpendicular to the viewing window to allow observation of the surface of the substrate to be conveyed to face the sight in the window, or to the transport direction of the substrate It is formed with at least one a predetermined positional relationship among the plurality of mask patterns on one end side in the direction of the viewing window to mask side alignment mer for alignment of the said substrate When, in which the provided.

With such a configuration, the light-shielding film formed on one surface of the transparent base material passes through a viewing window formed long and extending in parallel to the arrangement direction of a plurality of mask patterns formed in a direction perpendicular to the substrate transport direction. By observing the surface of the substrate conveyed oppositely, it is formed in the sight window or at one end side of the sight window with a predetermined positional relationship with at least one of the plurality of mask patterns. after being aligned with respect to the substrate in the mask side alignment marks is irradiated with exposure light onto the substrate through the plurality of mask patterns.

Furthermore, a wavelength selective film that transmits visible light and reflects or absorbs ultraviolet rays is formed on at least one surface of the transparent substrate so as to cover the viewing window and the mask side alignment mark. Thus, visible light is transmitted through the wavelength selective film formed on at least one surface of the transparent substrate so as to cover the viewing window and the mask side alignment mark, and ultraviolet light is reflected or absorbed .

Furthermore, an exposure method according to a third invention is formed by arranging in one direction on a light-shielding film formed on one surface of a transparent substrate, and intersects with a plurality of mask patterns through which exposure light passes and a direction in which the plurality of mask patterns are arranged. A photo window provided on the light-shielding film on the side to be extended, extending in parallel with the direction in which the plurality of mask patterns are arranged, and facing the surface of the substrate being conveyed in a predetermined direction. An exposure method performed using a mask, the photomask being arranged such that the viewing window is on the front side in the substrate transport direction with respect to the plurality of mask patterns, and the arrangement of the plurality of mask patterns a method for transporting a substrate a photosensitive resin is applied in a direction crossing the direction, the surface of the substrate through the viewing window is captured by the imaging means, with respect to the reference pattern formed on the substrate A step of detecting a reference position of a substrate set in a predetermined positional relationship, and a horizontal distance between the detected reference position of the substrate and any one of a plurality of mask patterns of the photomask becomes a predetermined value. And moving the photomask in a direction crossing the substrate transport direction to align the substrate with the photomask.

With such a configuration, the photomask is arranged in such a way that a viewing window formed long and extending in parallel with the arrangement direction of the plurality of mask patterns is on the front side in the substrate transport direction with respect to the plurality of mask patterns. A substrate coated with a photosensitive resin is conveyed in a direction crossing the alignment direction of the mask pattern, and the surface of the substrate is imaged through the viewing window by the imaging means, and a predetermined position with respect to a reference pattern formed on the substrate A reference position set in a relationship is detected, and the photomask is placed on the substrate such that a horizontal distance between the detected reference position of the substrate and any one of a plurality of mask patterns of the photomask becomes a predetermined value. The substrate and the photomask are aligned by moving in a direction intersecting with the transfer direction.

In addition, an exposure method according to a fourth aspect of the present invention is formed by arranging in one direction on a light-shielding film formed on one surface of a transparent substrate, and intersects with a plurality of mask patterns through which exposure light passes and a direction in which the plurality of mask patterns are arranged. A viewing window formed on the light-shielding film on the side to be extended in parallel with the arrangement direction of the plurality of mask patterns, and capable of observing the surface of the substrate being conveyed in a predetermined direction opposite to the viewing window; Or formed on the side of one end portion of the viewing window in a direction intersecting the transport direction of the substrate and having a predetermined positional relationship with at least one of the plurality of mask patterns, and aligns with the substrate. And a mask side alignment mark for exposing the photomask to the plurality of mask patterns with respect to the plurality of mask patterns. The step of arranging in such a way, the step of transporting a substrate coated with a photosensitive resin in a direction intersecting the direction of arrangement of the plurality of mask patterns, and imaging the surface of the substrate through the viewing window by an imaging means, Detecting a reference position set in a predetermined positional relationship with respect to a reference pattern formed on the substrate; and detecting a position of the photomask by imaging a mask side alignment mark of the photomask; The photomask is moved in a direction intersecting the substrate transport direction so that a horizontal distance between the detected reference position of the substrate and the mask-side alignment mark of the photomask becomes a predetermined value. Aligning with the mask.

With such a configuration, the photomask is arranged in such a way that a viewing window formed long and extending in parallel with the arrangement direction of the plurality of mask patterns is on the front side in the substrate transport direction with respect to the plurality of mask patterns. A substrate coated with a photosensitive resin is conveyed in a direction crossing the alignment direction of the mask pattern, and the surface of the substrate is imaged through the viewing window by the imaging means, and a predetermined position with respect to a reference pattern formed on the substrate The reference position set in the relationship is detected, and the imaging means images the mask-side alignment mark formed on the photomask so as to have a predetermined positional relationship with at least one of the plurality of mask patterns. The photo-detection is performed so that a horizontal distance between the detected reference position of the substrate and the position of the mask-side alignment mark of the photo-mask becomes a predetermined value. The disk moves in the direction intersecting the transport direction of the substrate to align the substrate and the photomask.

Further, the step of detecting the reference position of the substrate and the step of detecting the position of the mask side alignment mark of the photomask are performed simultaneously. Thus, detection and detect the reference position of the substrate, and the position of the mask side alignment marks of the photomask at the same time.

  Further, the substrate is formed by forming a substrate-side alignment mark for alignment with the mask-side alignment mark of the photomask at one end thereof with a predetermined positional relationship with the reference pattern. As a result, the substrate side alignment mark and the mask side alignment mark of the photomask, which are formed at one end of the substrate and have a predetermined positional relationship with the reference pattern, are aligned.

Furthermore, the base plate has an end portion formed with the substrate side alignment mark is shall be sent transportable as a conveying direction leading side. As a result, the substrate is transported with the end portion on which the substrate-side alignment mark is formed leading.

Then, while transporting the substrate, prior to the step of aligning the substrate and the photomask, the horizontal distance between the position of the front Kimoto plate side alignment mark and the position of the mask side alignment marks of said photomask move the front notated Otomasuku to a predetermined value in a direction intersecting the transport direction of the substrate is to the coarse adjustment of the alignment of the substrate and the photomask. Accordingly, while conveying the substrate, first, it intersects the horizontal distance between the conveying direction of the base plate a full Otomasu click to a predetermined value of the position of the mask side alignment marks position and the photomask substrate side alignment mark To adjust the alignment of the substrate and the photomask, and then move the photomask so that the horizontal distance between the reference position of the substrate and the position of the mask-side alignment mark becomes a predetermined value. And align the photomask .

According to the first aspect of the present invention, it is possible to directly observe the reference pattern formed in advance on the substrate through the viewing window at a position close to the plurality of mask patterns. Therefore, by detecting the deviation between the reference pattern reference position and the plurality of mask patterns preset in down through the sight glass, can the amount of deviation is corrected to a predetermined value, said plurality The mask pattern can be aligned with the reference pattern of the substrate. Thereby, the alignment accuracy of both patterns can be improved. In particular, according to the present invention, since the viewing window is formed on the side of the arrangement direction of the plurality of mask patterns, the viewing window faces the substrate so that the viewing window is positioned on the front side in the substrate transport direction. With this arrangement, the reference pattern of the substrate can be observed through the viewing window and the mask pattern and the reference pattern of the substrate can be aligned even during the execution of exposure while transporting the substrate in a predetermined direction. Accordingly, it is possible to improve the overlay accuracy between the exposure pattern based on the mask pattern and the reference pattern of the substrate by correcting the movement error of the substrate.

  Moreover, according to the invention which concerns on Claim 2, it can prevent that an ultraviolet-ray irradiates a board | substrate through a viewing window. Therefore, it is possible to prevent the viewing window from being exposed on the exposure pattern on the substrate.

Furthermore, according to the third aspect of the present invention, the overlay accuracy between the exposure pattern and the reference pattern of the substrate can be improved, as in the first aspect of the present invention. In particular, since the mask-side alignment mark is formed in the viewing window or on the side of one end of the viewing window, if the substrate-side alignment mark is formed at the leading end of the substrate transport direction, it is observed through the viewing window. Based on the substrate-side alignment mark and the mask-side alignment mark , coarse adjustment of alignment between the substrate and the photomask can be performed. Therefore, the overlay accuracy between the exposure pattern and the reference pattern of the substrate can be further improved.

  According to the fourth aspect of the present invention, it is possible to prevent the viewing window and the mask-side alignment mark from being exposed on the substrate so as to overlap the exposure pattern.

  According to the invention of claim 5, even during exposure execution while transporting the substrate in a predetermined direction, the reference pattern of the substrate is observed through the viewing window, and the alignment of the mask pattern and the reference pattern of the substrate is performed. Can be performed. Accordingly, it is possible to improve the overlay accuracy between the exposure pattern based on the mask pattern and the reference pattern of the substrate by correcting the movement error of the substrate.

  Furthermore, according to the invention which concerns on Claim 6, alignment with a board | substrate and a photomask can be performed based on a mask side alignment mark. Therefore, the overlay accuracy between the exposure pattern by the mask pattern and the reference pattern of the substrate can be further improved.

Moreover, according to the invention which concerns on Claim 7, the alignment process speed can be improved .

  Further, according to the inventions according to claims 8 to 10, before the alignment between the mask pattern of the photomask and the reference pattern of the substrate, the photomask and the substrate can be roughly adjusted, and exposure by the mask pattern is performed. The overlay accuracy between the pattern and the reference pattern of the substrate can be further improved.

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. 1 is a plan view showing an embodiment of a photomask according to the present invention, FIG. 2 is a sectional view taken along line XX of FIG. 1, and FIG. 3 is a sectional view taken along line YY of FIG. The photomask 1 enables alignment of the mask pattern and the reference pattern of the substrate even during exposure execution performed while moving the substrate in a predetermined direction. The photomask 1 includes a transparent base material 2, a light-shielding film 3, and a mask. a pattern 4, a sight glass 5, that is configured by a mask side alignment marks 12. Hereinafter, a case where the substrate is a color filter substrate will be described.

The said transparent base material 2 is a transparent glass base material which permeate | transmits an ultraviolet-ray and visible light with high efficiency, for example, consists of quartz glass.
As shown in FIG. 2 or FIG. 3, a light shielding film 3 is formed on one surface 2 a of the transparent substrate 2. The light-shielding film 3 is to shield the exposure light, and is formed with a thin film of opaque example chromium (Cr).

As shown in FIG. 1, a plurality of mask patterns 4 are formed on the light shielding film 3 in one direction. The plurality of mask patterns 4 is an opening of a predetermined shape through exposure light, and allows exposure light to the color filter substrate 6 shown in FIG. 4 which is conveyed to face, is formed on the color filter substrate 6 The reference pattern is transferred onto the pixels 8 of the black matrix 7. For example, the pixel 8 has a width substantially equal to the width of the pixels 8 and has a long rectangular shape in a direction orthogonal to the arrangement direction, and is formed at intervals corresponding to the three pitch intervals of the pixels 8. Further, as shown in FIG. 1, for example, the left edge portion of the mask pattern 4a located in the center is preset as the reference position S1.

  In addition, as shown in FIG. 2, an ultraviolet antireflection film 10 is formed on an area 9 (see FIG. 1) corresponding to the area where the mask pattern 4 is formed on the other surface 2b of the transparent substrate 2, and exposure light is formed. The transmission efficiency of the ultraviolet component contained in is improved.

A viewing window 5 is formed in the light shielding film 3 at a position close to the plurality of mask patterns 4 on the side crossing the arrangement direction. The viewing window 5 is for observing the surface of the color filter substrate 6 shown in FIG. 4 conveyed oppositely, and the position of the substrate-side alignment mark 11 and the black matrix by an imaging unit (not shown). 7, for example, as shown in FIG. 4, a reference position S2 set in advance at the upper left corner of the pixel 8a located at the center can be detected. Then, as shown in FIG. 1, it is formed in a rectangular shape extending from the central side toward one end 2c in parallel with the arrangement direction of the plurality of mask patterns 4.

  A plurality of mask-side alignment marks 12 are formed on the light-shielding film 3 so as to be arranged on the side of one end portion of the viewing window 5 from the center side toward the other end portion 2d. The plurality of mask side alignment marks 12 are used to align the reference position S1 preset in the mask pattern 4 and the reference position S2 preset in the pixel 8 as the reference pattern of the color filter substrate 6. And is formed corresponding to the plurality of mask patterns 4. Further, the formation position is such that the left side edge of the mask alignment mark 12 in FIG. 1 coincides with the left side edge of the corresponding mask pattern 4. For example, the mask side alignment mark 12 formed on the center side of the light shielding film 3 is set in advance as the reference mark 12a. As a result, the reference mark 12a and the substrate-side alignment mark 11 of the color filter substrate 6 are positioned so as to have a predetermined positional relationship, whereby the reference position S1 of the mask pattern 4 and the color filter substrate 6 are aligned. The reference position S2 can be aligned. Note that one mask-side alignment mark 12 may be formed, for example, having a predetermined positional relationship with the reference mark 12a among the plurality of mask patterns 4. Further, the reference position S2 of the color filter substrate 6 is not limited to that formed in the pixel 8, and may be set anywhere as long as the pixel 8 has a predetermined positional relationship.

  As shown in FIG. 3, visible light is transmitted through a region 13 (see FIG. 1) corresponding to the formation region of the viewing window 5 and the mask side alignment mark 12 on the other surface 2 b of the transparent substrate 2. Then, a wavelength selective film 14 that reflects or absorbs ultraviolet rays is formed, and ultraviolet components contained in the exposure light are applied to the color filter substrate 6 by irradiating the color filter substrate 6 through the viewing window 5 and the mask side alignment mark 12. It is possible to prevent the color resist from being exposed.

Next, an exposure method performed using the photomask 1 configured as described above will be described.
Here, the color filter substrate 6 to be used has an opaque film made of Cr or the like formed on one surface of a transparent glass substrate as shown in FIG. 4, and a large number of pixels in the exposure region 15 as shown in FIG. 8 is formed in a matrix. Further, a position shift between a reference position S1 preset on the photomask 1 and a reference position S2 preset on the color filter substrate 6 is corrected at a substantially central portion on the one end 15a side of the exposure area 15. In order to achieve alignment, one elongated substrate-side alignment mark 11 having a predetermined positional relationship with the pixel 8 is formed. In addition, on the side of the substrate-side alignment mark 11, a plurality of alignment confirmation marks 16 aligned from the center toward one end 6 a correspond to the pixels 8 and coincide with the three pitch intervals of the array of the pixels 8. It is formed at intervals. The substrate side alignment mark 11 and the alignment confirmation mark 16 are formed such that the left side edge of each mark and the left side edge of the corresponding pixel 8 in FIG.

  The color filter substrate 6 thus formed is coated with a predetermined color resist as a photosensitive resin on the upper surface, and the end 15a side of the exposure region 15 where the substrate-side alignment mark 11 is formed is indicated by an arrow A in FIG. The paper is transported at a constant speed by a transport means (not shown) positioned on the leading side in the transport direction shown.

  On the other hand, the photomask 1 is transported with the end 2e on the side where the viewing window 5 is formed positioned on the near side in the transport direction indicated by the arrow A in FIG. 1 and the surface 2a on which the light shielding film 3 is formed facing down. The color filter substrate 6 is disposed in close proximity to the upper surface of the color filter substrate 6.

  In this state, the substrate-side alignment mark 11, the alignment confirmation mark 16, and the pixel 8 on the color filter substrate 6 are imaged by an imaging unit (not shown) through the viewing window 5 formed on the photomask 1. Here, the imaging means is a line CCD having a large number of light receiving elements arranged in a straight line in a direction perpendicular to the transport direction in a plane parallel to the color filter substrate 6.

In this case, first, as shown in FIG. 5, the substrate side alignment mark 11 of the color filter substrate 6 and the mask side alignment mark 12 of the photomask 1 are imaged simultaneously. At this time, the cell number of the light receiving element of the image pickup means that has detected the substrate-side alignment mark 11 and the cell number of the light receiving element of the image pickup means that has detected the reference mark 12a of the photomask 1 are read, and an arithmetic unit (not shown) The distance L is calculated. Then, it is compared with a predetermined distance L ₀ set and stored in advance.

Here, as shown in FIG. 5, when the photomask 1 is displaced in the arrow B direction with respect to the color filter substrate 6, as shown in FIG. 6, the substrate-side alignment mark 11 and the reference mark 12a The photomask 1 is moved in the arrow C direction so that the horizontal distance L is L ₀ or L ₀ ± x (x is an allowable value). As a result, the reference position S1 of the photomask 1 and the reference position S2 of the color filter substrate 6 match within a predetermined allowable range.

  Next, as shown in FIG. 6, the alignment confirmation mark 16 of the color filter substrate 6 and the mask side alignment mark 12 of the photomask 1 are simultaneously imaged by the imaging means through the viewing window 5 of the photomask 1. Then, the cell number of the light receiving element that detects each alignment confirmation mark 16 and the cell number of the light receiving element that detects each mask side alignment mark 12 of the photomask 1 are read, and an average value of each cell number is calculated by the calculation unit. Is done. The average value is compared with the cell number of the light receiving element of the imaging means that has detected the substrate-side alignment mark 11 of the color filter substrate 6 immediately after alignment adjustment, and if both coincide with each other within a predetermined allowable range, alignment is performed. The photomask 1 is irradiated with exposure light because it is determined that the above has been performed reliably. As a result, the image of the mask pattern 4 of the photomask 1 is transferred onto the pixels 8 of the color filter substrate 6. If the average value and the cell number do not match, it is determined that the color filter substrate 6 is of a different type or a defective product of the black matrix 7, for example. In this case, the exposure is stopped and an alarm is given. .

Thereafter, the image data picked up by the image pickup means is compared with the look-up table (LUT) of the reference position S2 of the color filter substrate 6 stored in the storage unit, and the reference position S2 is detected. Then, as shown in FIG. 7, the cell number of the light receiving element of the imaging means that detects the reference position S2 is compared with the cell number of the light receiving element that detects the reference mark 12a of the photomask 1, and the horizontal distance between the two is compared. The photomask 1 is finely moved in the directions of arrows B and C so that L becomes L ₀ or L ₀ ± x. Further, the photomask 1 is rotated and adjusted with the center of the surface as the central axis as necessary. As a result, even if the color filter substrate 6 is conveyed while swinging in a direction orthogonal to the conveyance direction indicated by the arrow A, the photomask 1 moves following the movement, and an image of the mask pattern 4 of the photomask 1 is formed at the target position. It will be transferred with high accuracy.

  In this case, since the antireflection film 10 of the ultraviolet component contained in the exposure light is formed in the region 9 corresponding to the formation region of the mask pattern 4 on the other surface 2b of the transparent substrate 2 of the photomask 1. The ultraviolet rays are reflected by the antireflection film 10 and pass through the mask pattern 4 of the photomask 1 efficiently. Then, the color resist on the color filter substrate 6 is efficiently exposed.

On the other hand, a wavelength-selective film 14 that transmits visible light and reflects or absorbs ultraviolet rays is formed in a region 13 corresponding to the formation region of the viewing window 5 and the mask-side alignment mark 12 on the other surface 2b of the photomask 1. Therefore, the ultraviolet component of the exposure light irradiated on the viewing window 5 and the mask-side alignment mark 12 is reflected or absorbed by the wavelength selective film 14. Therefore, not be irradiated to the color filter substrate 6 through the sight glass 5 and the mask side alignment marks 12 are ultraviolet component of the exposure light.

  Therefore, even if the viewing window 5 and the mask-side alignment mark 12 are formed in the vicinity of the mask pattern 4 and preceded in the transport direction, the image of the viewing window 5 and the mask-side alignment mark 12 is exposed to the color filter substrate 6. There is no transfer to the region 15.

  On the other hand, visible light passes through the wavelength selective film 14, so that the substrate side alignment mark 11, alignment confirmation mark 16 and pixel 8 of the color filter substrate 6 can be observed through the viewing window 5. Accordingly, the positions of the substrate-side alignment marks 11 and the pixels 8 of the color filter substrate 6 are confirmed through the viewing window 5 at a position close to the mask pattern 4 while the color filter substrate 6 is being conveyed, and the reference position S1 of the photomask 1 and the color Alignment with the reference position S2 of the filter substrate 6 can be performed, and the alignment accuracy of both can be improved as compared with the conventional case.

In the above embodiment, the mask-side alignment marks 12, the substrate side alignment marks 11 and the alignment check mark 16 has been be one formed in a shape extending in an elongated shape in the direction of arrow A, the present invention is to It is not limited, and may be rectangular or linear as long as it can be detected by the light receiving element of the imaging means, or may be formed to have a width substantially equal to the width of the pixel 8 of the color filter substrate 6. In the above description, the case where there is one substrate-side alignment mark 11 has been described. However, the present invention is not limited to this, and a plurality of substrate-side alignment marks 11 may be formed at predetermined intervals.

In the above embodiment, the case where the substrate side alignment mark 11 and the alignment confirmation mark 16 are formed on the color filter substrate 6 has been described. However, the present invention is not limited to this, and the substrate side alignment mark 11 and the alignment confirmation mark are formed. 16 is not necessary. In this case, before the color filter substrate 6 is transported, another alignment mark is formed at a predetermined position on both sides of the exposure area 15 in the transport direction, and correspondingly, alignment marks are also formed at both ends of the photomask 1. The alignment may be coarsely adjusted with both alignment marks, and during exposure, the reference position S2 of the pixel 8 may be detected through the viewing window 5 by the imaging means, and alignment may be performed by the method described above.

Furthermore, in the said embodiment, although the case where the mask side alignment mark 12 was formed side by side by the one end part side of the observation window 5 was demonstrated , this invention is not limited to this, and the observation window 5 is made of the transparent base material 2. Alternatively, the mask side alignment mark 12 may be formed in a long shape extending from one end 2c side to the other end 2d side. In this case, the mask alignment mark 12 is an opaque film, for example, formed in an elongated shape.

  Further, the mask side alignment mark 12 may be omitted. In this case, the light receiving element of the imaging means having a predetermined positional relationship with the reference position S1 of the mask pattern 12 is determined in advance as a reference light receiving element, and the reference light receiving element and the reference of the substrate side alignment mark 11 or the color filter substrate 6 are defined. If alignment is performed such that the distance from the light receiving element that has detected the position S2 is a predetermined distance, alignment between the photomask 1 and the color filter substrate 6 is possible.

Further, in the above description, the case where the exposure light irradiates the mask pattern 4, the viewing window 5, and the mask side alignment mark 12 has been described. However, the present invention is not limited to this, and the viewing light 5 is narrowed down by exposing the exposure light. The mask side alignment mark 12 may not be irradiated with exposure light. In this case, the wavelength selective film 14 that transmits visible light and reflects or absorbs ultraviolet light may not be formed to cover the viewing window 5 and the mask side alignment mark 12.

In the above description, the case where the substrate is the color filter substrate 6 has been described. However, the present invention is not limited to this, and any substrate may be used as long as it forms a striped exposure pattern.

It is a top view which shows embodiment of the photomask by this invention. It is the XX sectional view taken on the line of FIG. It is the YY sectional view taken on the line of FIG. It is a top view which shows one structural example of the color filter substrate conveyed facing the said photomask. It is a figure explaining position alignment with the said photomask and a color filter board | substrate, and is explanatory drawing which shows the state before adjustment. It is a figure explaining the position alignment with the said photomask and a color filter board | substrate, and is explanatory drawing which shows the state after adjustment. It is a figure explaining position alignment with the said photomask and a color filter board | substrate, and is explanatory drawing which shows the fine adjustment during exposure execution.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Photomask 2 ... Transparent base material 2a ... One side 2b ... The other side 3 ... Light-shielding film 4 ... Mask pattern 5 ... Viewing window 6 ... Color filter board | substrate (board | substrate)
8 ... Pixel (reference pattern)
DESCRIPTION OF SYMBOLS 10 ... Antireflection film 11 ... Substrate side alignment mark 12 ... Mask side alignment mark 14 ... Wavelength selective film S1 ... Reference position of photomask S2 ... Reference position of color filter substrate

Claims (10)

Ri Do a transparent substrate and a light shielding film formed on one surface of the transparent substrate, a photomask that is configured to be able to align the substrate being transported in a predetermined direction,
A plurality of mask patterns formed on the light-shielding film side by side in a direction perpendicular to the transport direction of the substrate, and through which exposure light passes;
The light shielding film above the substrate transport direction front side of the front Symbol plurality of mask patterns, the plurality of formed longer extend parallel to the arrangement direction of the mask pattern, opposing allows observation of the surface of the substrate to be transported and A viewing window,
A photomask characterized by comprising:   2. The photomask according to claim 1, wherein a wavelength selective film that transmits visible light and reflects or absorbs ultraviolet rays is formed on at least one surface of the transparent substrate so as to cover the viewing window. Ri Do a transparent substrate and a light shielding film formed on one surface of the transparent substrate, a photomask that is configured to be able to align the substrate being transported in a predetermined direction,
A plurality of mask patterns formed on the light-shielding film side by side in a direction perpendicular to the transport direction of the substrate, and through which exposure light passes;
The light shielding film above the substrate transport direction front side of the front Symbol plurality of mask patterns, the plurality of formed longer extend parallel to the arrangement direction of the mask pattern, opposing allows observation of the surface of the substrate to be transported and A viewing window,
A predetermined positional relationship with at least one of the plurality of mask patterns is formed in the viewing window or on one side of the viewing window in a direction orthogonal to the transport direction of the substrate. A mask-side alignment mark for alignment;
A photomask characterized by comprising:   4. The photomask according to claim 3, wherein a wavelength selective film that transmits visible light and reflects or absorbs ultraviolet light is formed on at least one surface of the transparent substrate so as to cover the viewing window and the mask side alignment mark. . A plurality of mask patterns formed in one direction on a light shielding film formed on one surface of a transparent substrate, through which exposure light passes, and the light shielding films on the side intersecting with the direction in which the plurality of mask patterns are arranged, An exposure method that uses a photomask provided with a viewing window that extends in parallel with the alignment direction of the mask pattern and is formed to be able to observe the surface of the substrate that is being conveyed in a predetermined direction.
Placing the photomask such that the viewing window is on the front side in the substrate transport direction with respect to the plurality of mask patterns;
Transporting a substrate coated with a photosensitive resin in a direction intersecting with an alignment direction of the plurality of mask patterns;
And detecting the reference position of the substrate which is set in a predetermined positional relationship with a reference pattern by imaging the surface of the substrate through the viewing window, which is formed on the substrate by the imaging means,
The photomask is moved in a direction intersecting the substrate transport direction so that a horizontal distance between the detected reference position of the substrate and any one of the plurality of mask patterns of the photomask becomes a predetermined value. Aligning the substrate and the photomask;
An exposure method characterized by performing: A plurality of mask patterns formed in one direction on a light shielding film formed on one surface of a transparent substrate, through which exposure light passes, and the light shielding films on the side intersecting with the direction in which the plurality of mask patterns are arranged, A viewing window that extends long in parallel with the mask pattern alignment direction and allows the surface of the substrate being conveyed to be opposed to be observed in a predetermined direction, and a direction that intersects the inside of the viewing window or the substrate conveyance direction. A mask-side alignment mark that is formed in a predetermined positional relationship with at least one of the plurality of mask patterns on one side of the viewing window and for aligning with the substrate. An exposure method performed using a photomask,
Placing the photomask such that the viewing window is on the front side in the substrate transport direction with respect to the plurality of mask patterns;
Transporting a substrate coated with a photosensitive resin in a direction intersecting with an alignment direction of the plurality of mask patterns;
Imaging the surface of the substrate through the viewing window by an imaging means, and detecting a reference position set in a predetermined positional relationship with respect to a reference pattern formed on the substrate;
Imaging the mask side alignment mark of the photomask by the imaging means and detecting its position;
The photomask is moved in a direction crossing the substrate transport direction so that a horizontal distance between the detected reference position of the substrate and the mask-side alignment mark of the photomask becomes a predetermined value. The stage of alignment with
An exposure method characterized by performing:   7. The exposure method according to claim 6, wherein the step of detecting the reference position of the substrate and the step of detecting the position of the mask side alignment mark of the photomask are performed simultaneously.   7. The substrate according to claim 6, wherein a substrate side alignment mark for aligning with the mask side alignment mark of the photomask is formed at one end of the substrate with a predetermined positional relationship with the reference pattern. Or the exposure method of 7. The board The exposure method according to claim 8, wherein the end portion formed to the substrate side alignment mark and said Rukoto is sent transportable as a conveying direction leading side. While conveying said substrate, said substrate and before the step of aligning the photomask, the horizontal distance is a predetermined value and the position of the mask-side alignment mark position and the photomask before Kimoto plate side alignment mark the exposure method according to claim 9, wherein the become manner by moving the front notated Otomasuku in a direction intersecting the transport direction of the substrate to the coarse adjustment of the alignment of the substrate and the photomask.

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