CN104503203A - Mask plate and production method thereof and display panel frame sealing adhesive curing method - Google Patents
Mask plate and production method thereof and display panel frame sealing adhesive curing method Download PDFInfo
- Publication number
- CN104503203A CN104503203A CN201510020570.1A CN201510020570A CN104503203A CN 104503203 A CN104503203 A CN 104503203A CN 201510020570 A CN201510020570 A CN 201510020570A CN 104503203 A CN104503203 A CN 104503203A
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- China
- Prior art keywords
- mask plate
- photosensitive resin
- display panel
- contraposition
- resin film
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Abstract
The invention discloses a mask plate and a production method thereof and a display panel frame sealing adhesive curing method. The mask plate comprises a transparent base plate and a position alignment mark arranged on the transparent base plate. The position alignment mark is used for aligning the mask plate with a display panel to be treated in ultraviolet curing and made of a photosensitive resin material. According to the technical scheme, the position alignment mark is made of the photosensitive resin, so that the position alignment mark made of the photosensitive resin material can be produced only through the steps of photosensitive resin coating, exposure and developing. Compared with the prior art, the steps of metal material deposition, etching and photoresist stripping can be omitted in the technical scheme, namely, the steps of position alignment mark production process are reduced, so that the production process of the mask plate is simplified and the cost is saved.
Description
Technical field
The present invention relates to display technique field, particularly the curing of mask plate and preparation method thereof and sealed plastic box in display panel.
Background technology
The production run of display panels is roughly as follows.First dispenser method and sealed plastic box on array base palte or color membrane substrates, then undertaken two substrates box, then sealed plastic box be cured.Wherein, the effect of sealed plastic box is bonding array base palte and color membrane substrates, and the liquid crystal in the middle of protection is not by outside air and water mitigation.
At present, the mode of ultra-violet curing is often adopted to be cured sealed plastic box, need to use corresponding mask plate in the process of carrying out ultra-violet curing process, wherein this mask plate comprises at least one contraposition mark be formed on transparency carrier, and this contraposition mark is used for the aligning graph corresponding to display panel and carries out mating the contraposition realizing mask plate and display panel.In the prior art, the material of this contraposition mark is metal material, therefore needs when preparing this contraposition mark at least through metallic material film deposition procedures, photoresist coating operation, exposure (mask) operation, developing procedure, etching procedure and photoresist lift off operation.
From foregoing, need to carry out various operation when the contraposition of prior art in the mask plate preparing this ultra-violet curing identifies.
Summary of the invention
The invention provides a kind of mask plate and preparation method thereof and the curing of sealed plastic box in display panel, effectively can be reduced at operation quantity required when the contraposition prepared in mask plate identifies.
For achieving the above object, the invention provides a kind of mask plate, comprise: transparency carrier and the contraposition mark be positioned on described transparency carrier, described contraposition mark is used for described mask plate and treats that the display panel of ultra-violet curing process carries out contraposition, it is characterized in that, the material of described contraposition mark is photosensitive resin.
Alternatively, the light transmission rate of described photosensitive resin is less than or equal to 80%.
Alternatively, described contraposition mark is positioned at the neighboring area of described transparency carrier.
Alternatively, also comprise: be arranged at multiple rectangle shading graph on described transparency carrier and corresponding with the viewing area on described display panel, the material of described rectangle shading graph is light screening material.
Alternatively, described light screening material is metal material.
Alternatively, described rectangle shading graph is positioned at the zone line of described transparency carrier.
For achieving the above object, the present invention also provides a kind of preparation method of mask plate, and described preparation method comprises:
Form contraposition mark on the transparent substrate, described contraposition mark is used for described mask plate and treats that the described display panel of ultra-violet curing process carries out contraposition, and the material of described contraposition mark is photosensitive resin.
Alternatively, the described step forming contraposition mark on the transparent substrate comprises:
Photosensitive resin film is formed above described transparency carrier;
Corresponding mask substrate is utilized to carry out exposure-processed to described photosensitive resin film;
The figure that development treatment obtains described contraposition mark is carried out to the described photosensitive resin film after exposure-processed.
Alternatively, described photosensitive resin film can be photo-crosslinking type photosensitive resin film or light breakdown type photosensitive resin film or photo-polymerization type photosensitive resin film.
Alternatively, described preparation method also comprises:
Described transparency carrier forms the multiple rectangle shading graph corresponding with the viewing area on described display panel, and the material of described shading graph is light screening material.
Alternatively, described light screening material is metal material.
For achieving the above object, the present invention also provides the curing of sealed plastic box in a kind of display panel, it is characterized in that, adopts above-mentioned mask plate to carry out mask when carrying out ultra-violet curing process to described sealed plastic box.
The present invention has following beneficial effect:
The invention provides the curing of a kind of mask plate and preparation method thereof and sealed plastic box in display panel, wherein this mask plate is used for carrying out mask when carrying out ultra-violet curing process to the sealed plastic box in display panel, this mask plate comprises: transparency carrier and the contraposition mark be positioned on transparency carrier, contraposition mark is used for mask plate and treats that the display panel of ultra-violet curing process carries out contraposition, and the material of contraposition mark is photosensitive resin.Technical scheme of the present invention is by being set to photosensitive resin by the material of contraposition mark in mask plate, thus when preparing the contraposition mark that this is made up of photosensitive resin, only need the preparation that can complete contraposition mark through photosensitive resin thin film coated operation (photoresist coating operation can be equivalent to), exposure process and developing procedure.With prepare contraposition in prior art and identify up to needing less to apply compared with operation, exposure process, developing procedure, etching procedure and photoresist lift off operation through metallic material film deposition procedures, photoresist, technical scheme of the present invention can save metal material deposition procedures, etching procedure and photoresist lift off operation, namely technical solution of the present invention can make to prepare operation quantity minimizing required in contraposition identification procedure, simplify the technological process making mask plate, save cost.
Accompanying drawing explanation
The vertical view of the mask plate that Fig. 1 provides for the embodiment of the present invention one;
Fig. 2 is the schematic diagram when mask plate shown in Fig. 1 and display panel carry out contraposition;
Fig. 3 is contraposition mark in mask plate and the schematic diagram mated bit image in display panel;
The process flow diagram of the preparation method of a kind of mask plate that Fig. 4 provides for the embodiment of the present invention two;
The process flow diagram of the preparation method of another mask plate that Fig. 5 provides for the embodiment of the present invention two.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with accompanying drawing, the curing of sealed plastic box in mask plate provided by the invention and preparation method thereof and display panel is described in detail.
For achieving the above object, the vertical view of the mask plate that Fig. 1 provides for the embodiment of the present invention one, Fig. 2 is the schematic diagram when mask plate shown in Fig. 1 and display panel carry out contraposition, Fig. 3 is contraposition mark in mask plate and the schematic diagram mated bit image in display panel, as shown in Figure 1 to Figure 3, this mask plate 4 is for carrying out mask when carrying out ultra-violet curing process to the sealed plastic box 5 in display panel 8, this mask plate 4 comprises: transparency carrier 1 and the contraposition mark 2 be positioned on transparency carrier 1, contraposition mark 2 for by mask plate 4 with treat that the display panel 8 of ultra-violet curing process carries out contraposition, the material of contraposition mark 2 is photosensitive resin.
It should be noted that, due to photosensitive resin can directly and light carry out photo-crosslinking or photolysis reactions or photopolymerization reaction, therefore photosensitive resin can be used for preparing photoresist.In the present embodiment, when preparing this contraposition be made up of photosensitive resin and identifying 2, only need the preparation that can complete contraposition mark 2 through photosensitive resin thin film coated operation (photoresist coating operation can be equivalent to), exposure process and developing procedure.Therefore, at least need when identifying 2 with the contraposition prepared in prior art in mask plate 4 through metallic material film deposition procedures, photoresist coating operation, exposure process, developing procedure, etching procedure and photoresist lift off operation are compared, when preparing the contraposition in the mask plate 4 that the present embodiment provides and identifying 2, metallic material film deposition procedures can be saved, etching procedure and photoresist lift off operation, namely the technical scheme that the present embodiment provides can make to prepare contraposition and identify operation quantity minimizing required in 2 processes, simplify the technological process making mask plate, save cost.
Alternatively, in the present embodiment, the light transmission rate of photosensitive resin is less than or equal to 80%, now can ensure that producers easily and clearly can observe contraposition mark 2 in mask plate 4, thus can guarantee that mask plate 4 and display panel 8 can carry out contraposition fast and accurately.
Alternatively, this contraposition mark 2 is arranged at the neighboring area of transparency carrier 1.Due to neighboring area bit patterns 6 being arranged at often to display panel 8 on display panel 8, for ease of the contraposition mark 2 in mask plate 4 and mating bit patterns 6 in display panel 8, the contraposition in mask plate 4 can be identified the neighboring area that 2 correspondences are arranged on transparency carrier 1.See Fig. 3, contraposition mark 2 in mask plate 4 is shaped as frame, the situation being circle to bit patterns 6 in display panel 8 is that example is described, when the contraposition presenting shaped as frame identifies the central point of 2 with when presenting the circular point coincides to bit patterns 6, namely illustrate that contraposition mark 2 has been mated with to bit patterns 6, correspondingly, mask plate 4 and display panel 8 contraposition complete.
It should be noted that, contraposition mark 2 in mask plate 4 is shaped as frame, in display panel 8 is that circular situation only plays exemplary effect to bit patterns 6, this can't produce restriction to the technical scheme of the application, contraposition mark 2 and can also be other shapes to bit patterns 6 in the present embodiment, will not enumerate herein.
Alternatively, also comprise: be arranged at multiple rectangle shading graph 3 on transparency carrier 1 and corresponding with the viewing area 7 on display panel 8, this rectangle shading graph 3 is positioned at the zone line of transparency carrier 1, the material of this rectangle shading graph 3 is light screening material.In the present embodiment, this rectangle shading graph 3 for blocking the ultraviolet light of the viewing area 7 of directive display panel 8 in ultra-violet curing processing procedure, thus avoid ultraviolet light to cause damage to viewing area 7 inner part, guaranteeing that this rectangle shading graph 3 must be strict is for this reason light tight.In the present embodiment, this light screening material is specially metal material, thus effectively can ensure that rectangle shading graph 3 is light tight.
The embodiment of the present invention also provides a kind of preparation method of mask plate, in order to prepare the mask plate in above-described embodiment one.The process flow diagram of the preparation method of a kind of mask plate that Fig. 4 provides for the embodiment of the present invention two, as shown in Figure 4, the preparation method of this mask plate comprises:
Step S1: form contraposition mark on the transparent substrate, contraposition mark is used for mask plate and treats that the display panel of ultra-violet curing process carries out contraposition, and the material of contraposition mark is photosensitive resin.
In step sl, specifically comprise:
Step S11: form photosensitive resin film above transparency carrier;
Step S12: utilize corresponding mask substrate to carry out exposure-processed to photosensitive resin film;
Step S13: the figure that development treatment obtains contraposition mark is carried out to the photosensitive resin film after exposure-processed.
It should be noted that, in the present embodiment, this photosensitive resin film can be photo-crosslinking type photosensitive resin film or light breakdown type photosensitive resin film or photo-polymerization type photosensitive resin film.
When this photosensitive resin is photo-crosslinking type photosensitive resin, above-mentioned steps S11 ~ step 13 can specifically correspond to following step 101 ~ step 103.
Step 101: form photo-crosslinking type photosensitive resin film above transparency carrier.
In a step 101, coating method can be adopted to form photo-crosslinking type photosensitive resin film above transparency carrier.
Step 102: utilize the first mask substrate to carry out exposure-processed to photo-crosslinking type photosensitive resin film, first mask substrate comprises: the first lightproof area and the first transmission region, and the first transmission region is corresponding with the region that contraposition to be formed on photo-crosslinking type photosensitive resin film identifies.
In a step 102, exposure device and the first mask substrate is utilized to carry out exposure-processed to photo-crosslinking type photosensitive resin film, now on photo-crosslinking type photosensitive resin film, the region of contraposition mark to be formed is irradiated by light, concurrent third contact of a total solar or lunar eclipse cross-linking reaction, thus make the region of corresponding contraposition mark to be formed on photo-crosslinking type photosensitive resin film have corrosion resistivity.
Step 103: the figure that development treatment obtains contraposition mark is carried out to the photo-crosslinking type photosensitive resin film after exposure-processed.
In step 103, carry out development treatment by corresponding developer solution to the photo-crosslinking type photosensitive resin film after exposure-processed, now on this photo-crosslinking type photosensitive resin film, the region of corresponding contraposition mark to be formed is retained, and namely forms contraposition mark.
When photosensitive numeral is photo-polymerization type photosensitive resin, form the process of the contraposition mark be made up of photo-polymerization type photosensitive resin, the process that the contraposition be made up of photo-crosslinking type photosensitive resin with above-mentioned formation identifies is similar, detailed process see the description of above-mentioned steps 101 ~ step 103, can repeat no more herein.
When photosensitive resin is light breakdown type photosensitive resin, above-mentioned steps S11 ~ step 13 can specifically correspond to following step 201 ~ step 203.
Step 201: form light breakdown type photosensitive resin film above transparency carrier.
In step 201, the mode of coating can be adopted to form light breakdown type photosensitive resin film above transparency carrier.
Step 202: utilize the second mask substrate to carry out exposure-processed to light breakdown type photosensitive resin film, second mask substrate comprises: the second lightproof area and the second transmission region, and the second lightproof area is corresponding with the region that contraposition to be formed on light breakdown type photosensitive resin film identifies.
In step 202., exposure device and the second mask substrate is utilized to carry out exposure-processed to light breakdown type photosensitive resin film, on this time breakdown type photosensitive resin film, the region of contraposition mark to be formed is not irradiated by light, concurrent third contact of a total solar or lunar eclipse decomposition reaction is irradiated by light in other regions on light breakdown type photosensitive resin film, thus makes other regions on light breakdown type photosensitive resin film have solubility.
Step 203: the figure that development treatment obtains contraposition mark is carried out to the light breakdown type photosensitive resin film after exposure-processed.
In step 203, by corresponding developer solution, development treatment is carried out to the light breakdown type photosensitive resin film after exposure-processed, now on this light breakdown type photosensitive resin film, the region of corresponding contraposition mark to be formed is retained, and other regions are removed, and namely form contraposition mark.
By above-mentioned steps 101 ~ step 103 or step 201 ~ step 203 visible, when preparing the contraposition mark that this is made up of photosensitive resin, only need the preparation that can complete contraposition mark through photosensitive resin thin film deposition operation (photoresist coating operation can be equivalent to), exposure process and developing procedure.Compared with prior art, the technical scheme of the present embodiment can save metal material deposition procedures, etching procedure and photoresist lift off operation, namely the technical scheme that the present embodiment provides can make to prepare operation quantity required in contraposition identification procedure and reduce, simplify the technological process making mask plate, save cost.
As another possibility that the present embodiment provides, the process flow diagram of the preparation method of another mask plate that Fig. 5 provides for the embodiment of the present invention two, as shown in Figure 5, also comprises after step S1:
Step S2: form the multiple rectangle shading graph corresponding with the viewing area on display panel on the transparent substrate, the material of rectangle shading graph is metal material.
Particularly, in step s 2, corresponding rectangle shading graph 3 can be obtained through metallic material film deposition procedures, photoresist coating operation, exposure (mask) operation, developing procedure, etching procedure and photoresist lift off operation.
It should be noted that, above-mentioned steps S2 also can perform before step S1, and concrete condition no longer describes herein.
The embodiment of the present invention three also provides the curing of sealed plastic box in a kind of display panel, and particularly, the mask plate adopting above-described embodiment one to provide when carrying out ultra-violet curing process to sealed plastic box carries out mask.
Be understandable that, the illustrative embodiments that above embodiment is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (12)
1. a mask plate, comprise: transparency carrier and the contraposition mark be positioned on described transparency carrier, described contraposition mark is used for described mask plate and treats that the display panel of ultra-violet curing process carries out contraposition, it is characterized in that, the material of described contraposition mark is photosensitive resin.
2. mask plate according to claim 1, is characterized in that, the light transmission rate of described photosensitive resin is less than or equal to 80%.
3. mask plate according to claim 1 and 2, is characterized in that, described contraposition mark is positioned at the neighboring area of described transparency carrier.
4. mask plate according to claim 3, is characterized in that, also comprises: be arranged at multiple rectangle shading graph on described transparency carrier and corresponding with the viewing area on described display panel, and the material of described rectangle shading graph is light screening material.
5. mask plate according to claim 4, is characterized in that, described light screening material is metal material.
6. mask plate according to claim 4, is characterized in that, described rectangle shading graph is positioned at the zone line of described transparency carrier.
7. a preparation method for mask plate, is characterized in that, described preparation method comprises:
Form contraposition mark on the transparent substrate, described contraposition mark is used for described mask plate and treats that the described display panel of ultra-violet curing process carries out contraposition, and the material of described contraposition mark is photosensitive resin.
8. the preparation method of mask plate according to claim 7, is characterized in that, the described step forming contraposition mark on the transparent substrate comprises:
Photosensitive resin film is formed above described transparency carrier;
Corresponding mask substrate is utilized to carry out exposure-processed to described photosensitive resin film;
The figure that development treatment obtains described contraposition mark is carried out to the described photosensitive resin film after exposure-processed.
9. the preparation method of mask plate according to claim 8, is characterized in that, described photosensitive resin film can be photo-crosslinking type photosensitive resin film or light breakdown type photosensitive resin film or photo-polymerization type photosensitive resin film.
10. the preparation method of mask plate according to claim 7, is characterized in that, described preparation method also comprises:
Described transparency carrier forms the multiple rectangle shading graph corresponding with the viewing area on described display panel, and the material of described shading graph is light screening material.
The preparation method of 11. mask plates according to claim 10, is characterized in that, described light screening material is metal material.
In 12. 1 kinds of display panels, the curing of sealed plastic box, is characterized in that, adopts when arbitrary described mask plate carries out ultra-violet curing process to described sealed plastic box in claim 1-6 and carries out mask.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510020570.1A CN104503203A (en) | 2015-01-15 | 2015-01-15 | Mask plate and production method thereof and display panel frame sealing adhesive curing method |
| PCT/CN2015/081525 WO2016112636A1 (en) | 2015-01-15 | 2015-06-16 | Mask plate and preparation method therefor, and method for curing sealant in display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510020570.1A CN104503203A (en) | 2015-01-15 | 2015-01-15 | Mask plate and production method thereof and display panel frame sealing adhesive curing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104503203A true CN104503203A (en) | 2015-04-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510020570.1A Pending CN104503203A (en) | 2015-01-15 | 2015-01-15 | Mask plate and production method thereof and display panel frame sealing adhesive curing method |
Country Status (2)
| Country | Link |
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| CN (1) | CN104503203A (en) |
| WO (1) | WO2016112636A1 (en) |
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| CN105093806A (en) * | 2015-08-19 | 2015-11-25 | 京东方科技集团股份有限公司 | Ultraviolet (UV) mask and exposure method thereof |
| WO2016112636A1 (en) * | 2015-01-15 | 2016-07-21 | 京东方科技集团股份有限公司 | Mask plate and preparation method therefor, and method for curing sealant in display panel |
| CN106707682A (en) * | 2017-01-05 | 2017-05-24 | 京东方科技集团股份有限公司 | Mask plate, exposure device and method for carrying out exposure by exposure device |
| CN106773417A (en) * | 2017-01-17 | 2017-05-31 | 友达光电（昆山）有限公司 | Display device |
| CN108255012A (en) * | 2018-03-26 | 2018-07-06 | 京东方科技集团股份有限公司 | The preparation method of optical mask plate and optical mask substrate based on optical mask plate |
| CN109031713A (en) * | 2018-07-27 | 2018-12-18 | 南京中电熊猫平板显示科技有限公司 | A kind of substrate orientation detection method and its detection device |
| WO2019024193A1 (en) * | 2017-08-01 | 2019-02-07 | 武汉华星光电半导体显示技术有限公司 | Mask |
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| WO2016112636A1 (en) * | 2015-01-15 | 2016-07-21 | 京东方科技集团股份有限公司 | Mask plate and preparation method therefor, and method for curing sealant in display panel |
| CN105093806A (en) * | 2015-08-19 | 2015-11-25 | 京东方科技集团股份有限公司 | Ultraviolet (UV) mask and exposure method thereof |
| CN105093806B (en) * | 2015-08-19 | 2019-12-27 | 京东方科技集团股份有限公司 | UV (ultraviolet) mask plate and exposure method thereof |
| US10353249B2 (en) | 2016-06-01 | 2019-07-16 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Thin film transistor substrate and liquid crystal display panel |
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| CN106773417A (en) * | 2017-01-17 | 2017-05-31 | 友达光电（昆山）有限公司 | Display device |
| CN106773417B (en) * | 2017-01-17 | 2019-04-12 | 友达光电（昆山）有限公司 | Display device |
| WO2019024193A1 (en) * | 2017-08-01 | 2019-02-07 | 武汉华星光电半导体显示技术有限公司 | Mask |
| WO2019105098A1 (en) * | 2017-11-30 | 2019-06-06 | 京东方科技集团股份有限公司 | Alignment mark, substrate and fabrication method therefor, and exposure alignment method |
| US11315882B2 (en) | 2017-11-30 | 2022-04-26 | Ordos Yuansheng Optoelectronics Co., Ltd. | Alignment mark, substrate and manufacturing method therefor, and exposure alignment method |
| WO2019184908A1 (en) * | 2018-03-26 | 2019-10-03 | 京东方科技集团股份有限公司 | Optical mask plate, and method for preparing optical mask substrate based on optical mask plate |
| CN108255012A (en) * | 2018-03-26 | 2018-07-06 | 京东方科技集团股份有限公司 | The preparation method of optical mask plate and optical mask substrate based on optical mask plate |
| CN109031713A (en) * | 2018-07-27 | 2018-12-18 | 南京中电熊猫平板显示科技有限公司 | A kind of substrate orientation detection method and its detection device |
| CN109031713B (en) * | 2018-07-27 | 2020-12-25 | 南京中电熊猫平板显示科技有限公司 | Substrate alignment detection method and detection device thereof |
| CN109856864A (en) * | 2019-04-01 | 2019-06-07 | 福州京东方光电科技有限公司 | A kind of display panel is to cassette method |
| CN112873355A (en) * | 2020-12-24 | 2021-06-01 | 烟台正海科技股份有限公司 | Design method for touch screen OCA (optical clear adhesive) lamination alignment target |
| CN112873355B (en) * | 2020-12-24 | 2023-09-08 | 烟台正海科技股份有限公司 | Touch screen OCA laminating alignment target design method |
| CN112992662A (en) * | 2021-02-26 | 2021-06-18 | 武汉京东方光电科技有限公司 | Display substrate, manufacturing method thereof and display device |
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