JP2013195468A - Substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enable accurate setting of a position of a mask of an exposure device even when substrate components are ones for a small liquid crystal product for a mobile device or else.SOLUTION: A substrate comprising substrate components used for a liquid crystal screen of a mobile device by being conveyed and exposed by an exposure device comprises: a plurality of substrate components arranged in the form of a matrix; a non-substrate-component region where the substrate components are not arranged on the substrate; and alignment lines which are set so as to extend in the conveyance direction of the substrate and pass between the substrate components.

Description

  The present invention relates to a substrate, and more particularly to a substrate that is transported and exposed by an exposure apparatus.

  2. Description of the Related Art Conventionally, an exposure apparatus that adjusts the position of a substrate for a liquid crystal panel that is an object to be conveyed and a mask that transmits exposure light is known. For example, a CCD (Charge Coupled Device Image Sensor) simultaneously focuses on existing patterns such as various wirings and black matrix previously formed on the substrate and a photomask reference mark (shielding line that shields transmitted light). A technique relating to an exposure apparatus that performs image collation and performs control so as to correct a mask shift with respect to the existing pattern is proposed in Patent Document 1.

Republished WO2007 / 113933

  Such an exposure apparatus includes a high-precision CCD because an existing pattern becomes small when a substrate for a small liquid crystal screen such as a portable device (for example, a mobile phone, a portable personal computer, etc.) is exposed. Otherwise, it is difficult to collate the existing pattern. Further, since it is necessary to make the reference mark small in the same manner, there is a problem that it is difficult to collate the existing pattern unless a high-precision CCD is provided.

  SUMMARY OF THE INVENTION In view of the above circumstances, an object of the present invention is to provide a substrate that allows an exposure apparatus to collate existing patterns on the substrate without increasing the accuracy of the CCD of the exposure apparatus.

  In the substrate of the present invention, a plurality of substrate components arranged in a matrix on a substrate and a substrate component on the substrate are not arranged, which are used for a liquid crystal screen for portable equipment conveyed and exposed by an exposure apparatus. A non-substrate component region and an alignment line set to pass between the substrate components in the substrate transport direction on the non-substrate component region.

  The alignment line of the present invention is detected by the image detection unit of the exposure apparatus, and is for acquiring position information between the substrate parts to be irradiated with exposure light based on the detected alignment line information. It may be. The alignment line may be a straight line or a broken line.

  The substrate of the present invention may further include an alignment mark corresponding to each substrate component at a predetermined interval in the substrate transport direction on the non-substrate component region. The substrate is parallel to the alignment line and has a predetermined patternless region.

  The alignment mark of the present invention is detected by the image detection unit of the exposure apparatus, and is used for acquiring position information between the substrate parts to be irradiated with the exposure light based on the detected alignment mark information. The alignment mark may be in contact with the corresponding board component.

  The “board component” is used for a liquid crystal screen for each portable device. Specifically, liquid crystal substrates for mobile phones and portable personal computers can be cited.

  The substrate of the present invention includes a non-board component area on which no board components are arranged, and an alignment line that is set to pass between the board components in the substrate transport direction on the non-board component area. By providing, it is possible to follow the position of the substrate with reference to the alignment line, so even if it is a substrate component for a portable device having a small liquid crystal product screen for portable devices, Accurate alignment between the substrate and the mask portion can be set, and accurate exposure can be performed.

  When the substrate of the present invention is further provided with alignment marks corresponding to each substrate component in the substrate transport direction at a predetermined interval on the non-substrate component region, the position of the substrate is determined based on the alignment mark. Therefore, even if it is a board component for a portable device having a small liquid crystal product screen like that for a portable device, the alignment of the substrate and the mask part is set with reference to the alignment mark. , Accurate exposure can be performed.

The figure for demonstrating the structure of the exposure apparatus in embodiment of this invention The figure which showed the arrangement | positioning relationship between the alignment line and cell on a board | substrate in embodiment of this invention The figure which showed the arrangement | positioning relationship between the alignment mark and cell on the board | substrate in embodiment of this invention The figure which showed the arrangement | positioning relationship with the alignment line, alignment mark, and cell on the board | substrate in embodiment of this invention The figure which showed typically the structure of the mask part and board | substrate in embodiment of this invention. The figure which showed typically the double focus structure of the image sensor part in embodiment of this invention The figure which showed the example of the image information which shows the relationship between the existing pattern on the board | substrate which the image sensor part in embodiment of this invention image | photographed, and a shielding line The figure which showed the image information of the shielding line and the existing pattern in embodiment of this invention

A substrate according to a first embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a view showing the configuration of the exposure apparatus 100. The detailed configuration of the exposure apparatus 100 will be described later. The exposure apparatus 100 includes an image detection unit 55 that performs image detection processing based on image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. As shown in FIG. In the substrate 5 including substrate components (cells) that are transported and exposed from the apparatus 100 and used for a liquid crystal screen for portable devices, a plurality of substrate components (c1... Cn :) arranged in a matrix on the substrate. n> 1), a non-substrate component area on which no substrate component is arranged on the substrate 5, and an alignment set in the conveyance direction of the substrate 5 and passing between the substrate components on the non-substrate component region A line L is provided. Specifically, the substrate 5 is provided with an alignment line L so as to divide the substrate components to be cut at a predetermined interval in the conveyance direction of the substrate 5, and the image detection unit 55 includes the alignment line. L is detected, the mask unit 35 moves relatively on the substrate 5 based on the detected information of the alignment line L, and the exposure unit 50 irradiates the exposure light after the mask unit 35 moves.

  The alignment line L is detected by the image detection unit 20 of the exposure apparatus 100, and is used to acquire position information between the substrate components to be irradiated with the exposure light based on the detected alignment line L information. is there. The alignment line is a straight line. Alternatively, the alignment line may be a broken line.

  FIG. 2 shows an arrangement relationship between the alignment lines L on the substrate 5 and the cells. As shown in FIG. 2, the substrate 5 includes an alignment line L between substrate components (cells c 1, 2 or c 4, 5) in the conveyance direction of the substrate 5, and the image detection unit 55 uses the alignment line L as a mask unit 35. And the relative position of the substrate 5 can be tracked, and exposure can be performed with increased substrate transfer accuracy between cells. In addition, a predetermined patternless region R is provided on the substrate 5 in parallel with the alignment line L.

By providing this alignment line L, a non-pattern area R between the board components and at the edge of the board 5, the image detection unit 55 can easily follow from the beginning to the end in the transport direction of the board 5, The relative positional accuracy between the mask portion 35 and the substrate 5 can be increased. The above-described substrate component (cell) is used for a liquid crystal screen of a portable device.
Next, the board | substrate used as 2nd embodiment of this invention is demonstrated.

As shown in FIGS. 1 and 3, the exposure apparatus 100 includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The substrate 5 is provided with an alignment mark M for each of the substrate components (cells c1 to c4, c11 to c14, other cells cn: n> 1) to be cut at predetermined intervals in the conveyance direction of the substrate 5. The image detection unit 55 detects the alignment mark M, the mask unit 35 relatively moves on the substrate based on the detected information of the alignment mark M, and the exposure unit 50 Exposure light is irradiated after the part 35 moves. The alignment mark M is detected by the image detection unit 20 of the exposure apparatus 100, and is used to acquire position information between the substrate parts to be irradiated with the exposure light based on the detected information of the alignment mark M. .
FIG. 3 shows the positional relationship between alignment marks M and cells on the substrate. As shown in FIG. 3, the substrate 5 includes alignment marks M1 to M4 and M11 to M14 (between the substrate components (cells c1 to c4, c11 to c14, other cells cn: n> 1)) in the conveyance direction of the substrate 5 ( The image detection unit 55 follows the relative positions of the mask unit 35 and the substrate 5 with the alignment mark M, and exposes the substrate with higher accuracy in conveying the substrate between cells. be able to.

  By arranging the alignment marks M at short intervals, the relative positional accuracy of the mask portion 35 and the substrate 5 can be increased without following within the active area of exposure. Further, as shown in FIG. 4, the substrate 5 may include both the alignment line L and the alignment mark M. The exposure apparatus 100 uses the substrate 5 having both the alignment line L and the alignment mark M, thereby tracking the relative positions of the mask portion 35 and the substrate 5 using the alignment line L and the alignment mark M. It is possible to perform exposure while increasing the substrate conveyance accuracy between cells.

  An exposure apparatus using shielding lines (mask slits) according to a third embodiment of the present invention will be described in detail with reference to the drawings.

  FIG. 1 is a view showing the configuration of the exposure apparatus 100. FIG. 5 is a diagram schematically showing the configuration of the mask portion and the substrate. As shown in FIGS. 1 and 5, the exposure apparatus 100 can carry a substrate 5 having a regularly arranged pattern 4 corresponding to each color pixel displayed on the image display screen in a matrix. A substrate transport unit 10, an exposure window 22 for irradiating the substrate 5 with exposure light, and a translucent window 23 for observing the pattern of the substrate 5, and a shielding line 45 is provided on the translucent window 23. A mask unit 35 composed of a photomask, an image detection light source unit 20 that emits a plurality of types of transmitted light from below the substrate 5 in order to obtain image information of the substrate 5, and a light transmission of the mask unit 35. And an image sensor unit 25 that converts the transmitted light acquired through the window 23 into image information. In the converted image information, the width of the shielding line 45 of the mask unit 35 is a predetermined transmitted light. Is displayed on the image display screen. Covering the pattern located between the patterns corresponding to the same color adjacent pixels, the respective patterns corresponding to the same color adjacent pixels sides are those set without covering. A substrate provided with a regularly arranged pattern in a matrix corresponding to each color pixel of the image display screen described above is, for example, a color filter substrate or an array substrate. In addition, the pattern corresponding to adjacent pixels of the same color displayed on the image display screen described above is a colored pattern in advance when the color filter substrate is used, and is adjacent to the pattern displayed on the image display screen. Adjacent same color pattern arranged at a position corresponding to the arrangement position of matching pixels of the same color, and on the array substrate, at the arrangement position of adjacent pixels of the same color displayed on the image display screen. It is the pattern arranged in the corresponding position. Hereinafter, the substrate 5 will be described using a color filter substrate as an example, but the substrate 5 may be an array substrate (for example, a TFT circuit). The exposure apparatus 100 may be configured to include an image detection light source unit (not shown) that emits a plurality of types of transmitted light from above the substrate. In this case, the exposure apparatus 100 may include an image sensor unit that irradiates an image detection light source unit (not shown) disposed above the substrate and converts the light into image information above the substrate. Good.

  Specifically, the exposure apparatus 100 converts the light transmitted from the substrate transport unit 10 capable of transporting the substrate 5, the mask unit 35 formed of a photomask, and the light transmission window 23 of the mask unit 35 into image information. An image sensor unit 25 that converts the image sensor unit 25 into an image sensor unit 25. The image sensor unit 55 performs an image detection process from image information acquired from the image sensor unit 25 that has received light that has been transmitted excluding the shielding line; An exposure unit 50 that can irradiate exposure light from above the mask unit 35, an image detection light source unit 20 that irradiates light from below the mask unit 35 to obtain image information of the mask unit 35, and a mask unit 35. The exposure unit 50 is disposed between the image sensor unit 25 that receives light from the image detection light source unit 20 and acquires image information, the substrate transport unit 10, and the exposure unit 50. Exposure A mask portion 35 having an exposure window 22 that transmits part of the light, a light transmission window 23 that transmits part of light emitted from the image detection light source unit 20, and a mask portion position adjustment unit 70. It is. The exposure apparatus 100 may include an exposure control unit 60 that can control the exposure position / exposure output of the exposure unit 50.

  The board | substrate conveyance part 10 conveys a board | substrate. For example, as illustrated in FIG. 1, the substrate transport unit 10 is configured to place the substrate 5 and transport the substrate 5 in a predetermined transport direction. A plurality of unit stages having suction holes are juxtaposed in the transport direction of the substrate 5, and the substrate 5 is floated on the plurality of unit stages by a predetermined amount due to the balance between gas ejection and suction by the transport rollers. The both ends of the substrate 5 are supported and conveyed.

  The exposure part 50 irradiates ultraviolet rays, for example, an exposure wavelength range is 280-400 nm. The exposure unit 50 irradiates ultraviolet rays, and specifically is a laser oscillator, a xenon flash lamp, or the like. Further, a photo integrator (not shown) may be mounted on the exposure unit 50, and the luminance distribution in the cross section of the exposure light irradiated from the exposure unit 50 is made uniform. The photo integrator may be a fly-eye lens, a rod lens, a light pipe, or the like. In addition, a condenser lens (not shown) mounted on the exposure unit 50 irradiates the mask unit 35 with exposure light as parallel light. The exposure unit 50 performs exposure in accordance with a control command from the exposure control unit 60.

  FIG. 5 is a diagram schematically showing the configuration of the mask portion 35 and the substrate 5. The mask part 35 has a light shielding part 21 and an exposure window 22 formed in a predetermined pattern on the surface of a transparent substrate made of quartz glass or the like. FIG. 5 is an external perspective view schematically showing an example of the configuration of the mask portion 35. An arrow “a” in the figure indicates the transport direction of the substrate 5. The mask portion 35 has a configuration in which, for example, vertically long slit-shaped exposure windows 22 are formed in parallel at a predetermined pitch along the direction perpendicular to the substrate transport direction a. In FIG. 5, the area subjected to the light shielding process represents the light shielding portion 21, and the area not subjected to the light shielding process represents the exposure window 22. On the transfer start side of the mask part 35 with respect to the substrate 5, a horizontally long slit-shaped light transmission window 23 is formed. A shielding wire 45 is formed on the mask portion 35 in the transparent window 23. The light shielding unit 21 is shielded by, for example, chromium. The shielding wire 45 is also made of a shielding material such as chrome.

  The image sensor unit 25 photographs an existing pattern formed in advance on the substrate 5, for example, a gate bus line, a source bus line, or a black matrix, through the transparent window 23 of the mask unit 35. At this time, the image sensor unit 25 performs photographing for detecting an image from the start end to the other end end of the existing pattern 4 that extends in the drawing in the vertical direction in the drawing formed in parallel with the transport direction a of the substrate 5. The image sensor unit 25 detects an image of the existing pattern 4 that moves so as to flow in a strip shape under the light transmission window 23 by photographing the image sensor unit 25. For example, the image sensor unit 25 may be a line CCD capable of multiple focusing.

  If the existing pattern 4 moving under the light transmission window 23 shifts in a direction perpendicular to the moving direction a of the substrate 5 during shooting, the image sensor unit 25 A displacement amount is calculated, and a movement for aligning the mask 35 according to the displacement amount is performed. Thus, alignment adjustment is performed by movement control of the mask part 35 following the existing pattern 4. As a result, the exposure unit 50 performs accurate exposure on the position along the existing pattern 4.

  The image sensor unit 25 captures the existing pattern 4 that moves under the light transmission window 23 and also captures the shielding line 45 formed on the light transmission window 23. While the image sensor unit 25 is photographing, the mask unit 35 for correcting the shift as described above is moved, and the shielding line 45 being photographed is also moved. The amount of movement of the shielding wire 45 at this time is calculated, and it is determined whether or not the movement for alignment of the mask portion 35 has been made accurately. Depending on the determination result, for example, when the movement of the mask unit 35 is not performed or the movement amount is too large compared to the calculated displacement amount, this correction is always performed during the substrate movement until the substrate movement is completed. Done.

  The image sensor unit 25 is provided in pairs with the mask unit 35. The image sensor unit 25 can be moved independently by a moving unit (not shown) different from the moving unit used for moving the mask unit 35. The moving means provided in the image sensor unit 25 is used for alignment with the mask unit 35 before the start of exposure.

  The image sensor unit 25 is a multi-focus camera. For example, a dual focus camera having two focal points as shown in FIG. 6 may be used. Specifically, each of the existing pattern 4 and the shielding line 45 on the substrate 5 can be focused, and both can be photographed clearly. As shown in the drawing, an optical path length adjusting plate 25a is interposed in the half field of view of the image sensor unit 25, so that the existing pattern 4 on the substrate having a different focal length and the shielding line 45 of the mask unit 35 are simultaneously focused. ing.

  The image detection unit 55 stores a reference image used for alignment of the mask unit 35, and also stores an image of the existing pattern 4 captured by the image sensor unit 25 and an image of the shielding line 45 of the mask unit 35. Can do.

  The image detection unit 55 detects edge information of the existing pattern 4 from the image of the existing pattern 4 on the substrate 5 photographed by the image sensor unit 25 and actually irradiates the irradiated surface of the substrate 5 with light energy. It is possible to calculate the amount of deviation of the position of the mask portion 35 with respect to the position of the existing pattern 4 and the position where the light energy should be irradiated.

  The mask portion position adjustment unit 70 moves and corrects the position of the mask portion 35 based on the shift amount calculated by the image detection portion 55.

  The exposure control unit 60 can actually irradiate light energy to the range where the light energy of the irradiated surface of the substrate 5 should be irradiated according to the correction result of the mask position adjustment unit 70.

  Further, the image detection unit 55 includes the image of the shielding line 45 of the mask unit 35 taken by the image sensor unit 25 before the position of the mask unit 35 is corrected by the mask unit position adjustment unit 70 and the image sensor after the correction. The image of the shielding line 45 of the mask unit 35 taken by the unit 25 is compared to calculate the actual amount of movement of the mask unit 35 at the time of movement correction, and whether or not the position correction of the mask unit 35 has been performed accurately Determine.

  As described above, the alignment of the mask portion 35 following the existing pattern 4 is adjusted while moving the substrate 5 to irradiate light energy, and exposure processing is performed when the mask portion 35 moves from the start end to the end end of the existing pattern 4. Ends.

In this way, by using the images of the existing pattern 4 and the shielding lines 45 of the mask unit 35 captured by the image sensor unit 25 and monitoring the positional relationship during exposure, the mask unit 35 with respect to the existing pattern 4 is monitored. The accuracy of alignment can be improved.
The light transmission window (a viewing window for observing the pattern of the substrate, specifically, a line CCD observation window) 23 transmits light emitted from the image detection light source unit 20.
Here, the relationship between the shielding line 45 and the existing pattern 4 will be described. FIG. 7 is image information showing the relationship between the existing pattern 4 on the substrate and the shielding line 45 taken by the image sensor unit 25. Since the existing pattern 4 and the shielding line 45 shown in FIG. 7 are the existing pattern and shielding line of the image information, they are referred to as an existing pattern 4 ′ and a shielding line 45 ′.

  The existing pattern 4 ′ shown in FIG. 7 is an RGB dye (R: red, G: green, B: blue) pattern. For example, the existing pattern 4′a is an R dye, and the existing pattern 4′b is a G dye. The existing pattern 4′c is a B dye, the existing pattern 4′d is an R dye, the existing pattern 4′e is a G dye, and the existing pattern 4′f is a B dye.

  As described above, the image sensor unit 25 photographs the substrate 5 and the mask unit 35 at the same time, and observes the shielding line 45 and the existing pattern 4 on the substrate 5. Specifically, as shown in FIG. 7, the image sensor unit 25 captures the shielding wire 45 and the substrate 5, and the image detection unit 55 is arranged at the approximate center on the existing pattern 4 ′ e based on the image information. The center line C1 of the shielding line 45 ′ is detected, and the center lines C2 on both sides of the existing pattern 4′b that is the same pigment are obtained. Then, the image sensor 25 recognizes the distance between C1 and C2, calculates the amount of positional deviation between the substrate 5 and the mask part 35, and monitors so that it can be corrected.

  However, in a high-definition liquid crystal screen substrate for portable devices (for example, cellular phones and portable personal computers), the pixel size becomes very small, and the existing pattern 4′e is also extremely small (for example, about 15 μm). It is assumed that it becomes narrower). Then, the image sensor unit 25 needs to include an imaging unit having a high resolution function, and it is assumed that a sufficient image for observing the existing pattern 4 cannot be acquired.

  The image detection unit 55 detects the relative positions of the mask unit 35 and the substrate 5 from the image information of the existing patterns 4′b and 4′e that are the same pigment. The image sensor unit 25 passes through only the existing pattern which is one type of RGB dye of the existing pattern 4 depending on the type of transmitted light irradiated by the image detection light source unit 20, and the transmitted light is emitted from the transmitted light. Obtaining image information.

  FIG. 8 is a diagram showing image information of the shielding line 45 and the existing pattern 4 unique to the present invention. Note that the existing pattern and shielding line 45 shown in FIG. 8 are the existing pattern and shielding line 45 ′ of the image information, and are therefore referred to as existing pattern 4 ′ and shielding line 45 ′.

  The exposure apparatus 100 includes a substrate transport unit 10 capable of transporting a substrate 5 provided with a regularly arranged pattern in a matrix corresponding to each color pixel displayed on the image display screen, and a translucent window. 23, a mask part 35 composed of a photomask having a shielding line 45 in the image 23, an image detection light source part 20 for irradiating a plurality of types of transmitted light from below the substrate 5 in order to acquire image information of the substrate 5, And an image sensor unit 25 that converts the transmitted light acquired through the light transmission window 23 of the mask unit 35 into image information. In the converted image information as shown in FIG. The width of the shielding line 45 covers a pattern of another color that is transmitted between predetermined patterns and that is located between patterns corresponding to adjacent pixels of the same color that are displayed on the image display screen. Corresponding to color pixels And setting the respective pattern partially cover. As shown in FIG. 8, the width of the shielding line 45 ′ is such that, for example, the transmitted light is transmitted through the existing patterns 4 ′ b and 4 ′ e of the G dye and another color positioned between the adjacent G color patterns. The R and B dye patterns (existing patterns 4′c to 4′d) are covered, and the adjacent G-color patterns 4′b and 4′e are partially covered. Specifically, the width of the shielding line 45 of the mask portion 35 is such that when it is converted into image information, the width between the centers of adjacent patterns that are the same dye is the pixel pitch width. . By arranging the shielding lines 45 to have a pixel pitch width (for example, 45 to 100 μm), the shielding lines 45 ′ are arranged so as to straddle two existing patterns on the substrate 5. Thereby, the image detection unit 55 is a substrate for a high-definition liquid crystal screen for portable devices (for example, a mobile phone and a portable personal computer), and even when the pixel size is extremely small, The position adjustment of the mask part 35 and the board | substrate 5 can be easily performed by each detecting the one side edge (side) which is a pattern of the same color which matches. In this way, the shielding line 45 has a pixel pitch width, thereby preventing erroneous attachment (misplacement) of the mask portion 35.

  In the above-described embodiments, the G light pattern has been described as the example where the transmitted light is transmitted. However, when the transmitted light is transmitted through the B color pattern, the shielding line 45 ′ When the R color pattern is covered and the R color pattern is transmitted, the shielding line 45 ′ is arranged so as to cover the G color and B color patterns.

  Thus, the exposure apparatus 100 includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The image detection unit 55 includes: Then, an edge corresponding to each side of the pattern corresponding to adjacent pixels of the same color is detected, and the mask unit 35 relatively moves on the substrate 5 based on the detected edge information, and the exposure unit 50 Irradiates exposure light after the mask part 35 moves.

  The substrate 5 includes a non-substrate component region where no substrate component is arranged on the substrate, and an alignment line L set to pass between the substrate components in the substrate transport direction on the non-substrate component region. Thus, since the position of the substrate can be tracked with reference to the alignment line L, even if it is a substrate component for a portable device having a small liquid crystal product screen for portable devices, the alignment line L is used as a reference. Accurate alignment between the substrate and the mask portion can be set, and accurate exposure can be performed.

  When the substrate 5 is further provided with alignment marks M corresponding to each substrate component at a predetermined interval in the substrate transport direction on the non-substrate component region, the position of the substrate is determined with reference to the alignment mark M. Therefore, accurate alignment between the substrate 5 and the mask portion 35 can be performed using the alignment mark M as a reference even in the case of a substrate component for a portable device having a small liquid crystal product screen like that for a portable device. Set and perform accurate exposure.

  According to the exposure apparatus 100, a substrate transport unit 10 capable of transporting a substrate 5 having a regularly arranged pattern in a matrix corresponding to each color pixel displayed on the image display screen, and the substrate 5 has an exposure window 22 for irradiating exposure light and a light transmission window 23 for observing the pattern of the substrate 5, and the light transmission window 23 has a shielding line 45 (approximately the center position of the light transmission window 23). In order to acquire image information of the substrate 5 and a mask portion 35 constituted by a photomask provided with a), the image detection light source portion 20 that irradiates a plurality of types of transmitted light from below the substrate 5 and the transmission of the mask portion 35. And an image sensor unit 25 that converts the transmitted light acquired through the optical window 23 into image information. In the converted image information, the width of the shielding line 45 of the mask unit 35 is set to a predetermined value. Displayed on the image display screen that transmits light It is set so as to cover a pattern located between patterns corresponding to adjacent pixels of the same color and partially cover each pattern corresponding to adjacent pixels of the same color. By detecting only the sides of the pattern corresponding to matching pixels of the same color, it is possible to set an accurate alignment of the mask portion for accurate exposure even for small liquid crystal product substrate parts for portable devices. be able to. In the first embodiment of the present invention, an embodiment in which the shielding line 45 is a mask slit having a pixel pitch width will be described. In the second embodiment, an embodiment in which an alignment mark M is provided on the substrate will be described. In the third embodiment, the embodiment in which the alignment line L is provided on the substrate has been described. These embodiments may be implemented in combination, or may be implemented by combining two or more embodiments, or may be implemented independently. Good.

  The exposure apparatus 100 further includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The image detection unit 55 includes: An edge corresponding to each side of the pattern corresponding to adjacent pixels of the same color is detected, the mask unit 35 moves relatively on the substrate based on the detected edge information, and the exposure unit 50 When irradiating exposure light after the mask has moved, the exact position of the mask for accurate exposure, even for mobile device substrate parts with small liquid crystal product screens, such as those for mobile devices The alignment can be set and accurate exposure can be performed.

  The exposure apparatus 100 further includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The substrate 5 includes: An alignment mark is provided for each substrate component to be cut at a predetermined interval in the conveyance direction of the substrate 5. The image detection unit 50 detects the alignment mark and the mask unit 35 detects the alignment mark. Based on the information of the alignment mark, it moves relatively on the substrate, and the exposure unit can follow the position of the substrate with the alignment mark as a reference when irradiating the exposure light after the mask unit 35 moves. Therefore, even if it is a board component for a portable device having a small liquid crystal product screen like that for a portable device, the substrate and the mask portion are accurately aligned with reference to the alignment mark. Set, it is possible to make an accurate exposure.

  The exposure apparatus 100 further includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. An alignment line is provided so as to divide each substrate component to be cut at a predetermined interval in the conveyance direction of the image, the image detection unit 55 detects the alignment line, and the mask unit is detected. The exposure unit 50 moves relative to the substrate 5 based on the alignment line information, and the exposure unit 50 follows the position of the substrate with reference to the alignment line when irradiating the exposure light after the mask unit 35 is moved. Therefore, even if it is a board component for a portable device having a small liquid crystal product screen for a portable device, the substrate and the mask part can be accurately Set the location alignment, it is possible to make an accurate exposure.

  As mentioned above, although embodiment of this invention was described in detail, this invention is not limited to these embodiment.

c Cell C Center line L Alignment line M Alignment mark R Region 4 Pattern 5 Substrate 10 Substrate transport unit 20 Image detection light source unit 21 Shading unit 22 Exposure window 23 Translucent window 25 Image sensor unit 35 Mask unit 45 Masking line 50 Exposure unit 55 Image detection unit 60 Exposure control unit 70 Mask unit position adjustment unit 100 Exposure apparatus

Claims (5)

In a substrate provided with a substrate component used for a liquid crystal screen for portable equipment, which is conveyed and exposed by an exposure apparatus,
A plurality of substrate components arranged in a matrix on the substrate;
A non-board component area in which the board component is not disposed on the board;
A substrate comprising an alignment line that is set on the non-substrate component region so as to pass between the substrate components in a direction in which the substrate is conveyed.   The alignment line is detected by an image detection unit of the exposure apparatus, and is used for acquiring position information between the substrate parts to be irradiated with exposure light based on the information of the detected alignment line. The substrate according to claim 1.   The substrate according to claim 1, wherein the alignment line is a straight line or a broken line.   4. The substrate according to claim 3, further comprising an alignment mark for each substrate component at a predetermined interval in the transport direction of the substrate on the non-substrate component region. The alignment mark is detected by an image detection unit of the exposure apparatus, and is used for acquiring position information between the substrate components to be irradiated with exposure light based on the information of the detected alignment mark. The substrate according to claim 4.

Images