JP5804511B2 - Exposure equipment - Google Patents

Description

  The present invention relates to an exposure apparatus, and more particularly to an exposure apparatus that adjusts the position of a photomask using an image sensor.

  2. Description of the Related Art Conventionally, an exposure apparatus that adjusts the position of a substrate for a liquid crystal panel that is an object to be conveyed and a mask that transmits exposure light is known. For example, a CCD (Charge Coupled Device Image Sensor) simultaneously focuses on existing patterns such as various wirings and black matrix previously formed on the substrate and a photomask reference mark (shielding line that shields transmitted light). A technique relating to an exposure apparatus that performs image collation and performs control so as to correct a mask shift with respect to the existing pattern is proposed in Patent Document 1.

Republished WO2007 / 113933

  Such an exposure apparatus includes a high-precision CCD because an existing pattern becomes small when a substrate for a small liquid crystal screen such as a portable device (for example, a mobile phone, a portable personal computer, etc.) is exposed. Otherwise, it is difficult to collate the existing pattern. Further, since it is necessary to make the reference mark small in the same manner, there is a problem that it is difficult to collate the existing pattern unless a high-precision CCD is provided.

  SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide an exposure apparatus that can hold an accurate mask position with respect to a predetermined pattern without increasing the accuracy of the CCD of the exposure apparatus.

An exposure apparatus of the present invention includes a substrate transport unit capable of transporting a substrate having a regularly arranged pattern in a matrix corresponding to each color pixel displayed on an image display screen, and exposing the substrate. Acquires image information of the substrate, and a mask part composed of a photomask having an exposure window for irradiating light and a light-transmitting window for observing the pattern of the substrate and having a shielding line in the light-transmitting window In order to do so, an image detection light source unit that irradiates the mask unit with transmitted light and an image sensor unit that converts the transmitted light acquired through the transmission window of the mask unit into image information, In the converted image information, the width of the shielding line of the mask portion covers a pattern positioned between patterns corresponding to adjacent pixels of the same color displayed on the image display screen, which transmits predetermined transmitted light, Supports adjacent pixels of the same color That pattern is what is set so as to partially cover each.
The “translucent window” is a viewing window for observing the pattern of the substrate, and may be a window observed with a line CCD, for example.
The “substrate provided with a regularly arranged pattern corresponding to each color pixel displayed on the image display screen in a matrix” may be, for example, a color filter substrate or an array substrate. In addition, the “pattern corresponding to adjacent pixels of the same color displayed on the image display screen” is a pattern that is pre-colored on the color filter substrate, and is adjacent to the image displayed on the image display screen. Adjacent same color pattern arranged at a position corresponding to the arrangement position of matching pixels of the same color, and on the array substrate, at the arrangement position of adjacent pixels of the same color displayed on the image display screen. It is the pattern arranged in the corresponding position. The “width of the masking line of the mask portion” may be a pixel pitch width that is the distance between the centers of the patterns corresponding to adjacent pixels of the same color when converted into image information. Good.

  The exposure apparatus of the present invention further includes an image detection unit that performs image detection processing from image information, and an exposure unit that can irradiate exposure light from above the mask unit, and the image detection units are adjacent to each other. Edges corresponding to each side of the pattern corresponding to pixels of the same color are detected, the mask part moves relatively on the substrate based on the detected edge information, and the mask part moves in the exposure part. Then, exposure light may be irradiated.

  The exposure apparatus of the present invention further includes an image detection unit that performs image detection processing from image information, and an exposure unit that can irradiate exposure light from above the mask unit. In addition, an alignment mark is provided for each substrate component to be cut at a predetermined interval, the image detection unit detects the alignment mark, and the mask unit is based on the detected alignment mark information. The substrate may be moved relatively on the substrate, and the exposure unit may irradiate the exposure light after the mask unit has moved.

  The exposure apparatus of the present invention further includes an image detection unit that performs image detection processing from image information, and an exposure unit that can irradiate exposure light from above the mask unit. In addition, an alignment line is provided so as to divide the substrate component to be cut at a predetermined interval, the image detection unit detects the alignment line, and the mask unit includes information on the detected alignment line. Based on this, the substrate may be moved relatively, and the exposure unit may irradiate the exposure light after the mask unit has moved. Further, the exposure apparatus of the present invention may be provided with a predetermined non-pattern area parallel to the alignment line.

  The “board component” is used for a liquid crystal screen for each portable device. Specifically, liquid crystal substrates for mobile phones and portable personal computers can be cited.

  According to the exposure apparatus of the present invention, a substrate transport section capable of transporting a substrate having a regularly arranged pattern in a matrix corresponding to each color pixel displayed on the image display screen, and a substrate A mask portion composed of a photomask having an exposure window for irradiating exposure light on the substrate and a light transmission window for observing the pattern of the substrate, and a shielding line in the light transmission window, and an image of the substrate In order to acquire information, an image detection light source unit that irradiates transmitted light to the mask unit and an image sensor unit that converts the transmitted light acquired through the transparent window of the mask unit into image information In the converted image information, the width of the masking line of the mask portion is located between patterns corresponding to adjacent pixels of the same color displayed on the image display screen that transmit a predetermined transmitted light. Cover the pattern, the same color next to each other By being set so as to partially cover each of the patterns corresponding to the pixels, by detecting only the side of the pattern corresponding to the adjacent pixels of the same color, a small liquid crystal for portable devices Even if it is a substrate part of a product, the mask portion for exposure can be accurately aligned without using a high-precision CCD.

  The exposure apparatus of the present invention further includes an image detection unit that performs image detection processing from image information, and an exposure unit that can irradiate exposure light from above the mask unit, and the image detection units are adjacent to each other. Edges corresponding to each side of the pattern corresponding to pixels of the same color are detected, the mask part moves relatively on the substrate based on the detected edge information, and the mask part moves in the exposure part. After that, when irradiating the exposure light, even if it is a substrate part for a portable device having a small liquid crystal screen like that for a portable device, it is necessary to set an accurate alignment of the mask part for exposure. Exposure can be performed.

  The exposure apparatus of the present invention further includes an image detection unit that performs image detection processing from image information, and an exposure unit that can irradiate exposure light from above the mask unit. In addition, an alignment mark is provided for each substrate component to be cut at a predetermined interval, the image detection unit detects the alignment mark, and the mask unit is based on the detected alignment mark information. When the exposure unit irradiates exposure light after the mask unit moves, the position of the substrate can be tracked with reference to the alignment mark, so that the exposure unit can be used for portable devices. Even if it is a board component for a portable device having a small LCD product screen, it is possible to perform accurate exposure by setting the correct alignment between the board and mask using the alignment mark as a reference. Can.

  The exposure apparatus of the present invention further includes an image detection unit that performs image detection processing from image information, and an exposure unit that can irradiate exposure light from above the mask unit. In addition, an alignment line is provided so as to divide the substrate component to be cut at a predetermined interval, the image detection unit detects the alignment line, and the mask unit includes information on the detected alignment line. Based on the alignment line, the exposure unit can move relative to the substrate, and the exposure unit can follow the position of the substrate with reference to the alignment line when irradiating the exposure light after the mask unit is moved. Even if it is a board component for a portable device with a small LCD product screen like this, the exact alignment between the board and the mask is set based on the alignment line, It can be carried out.

The figure for demonstrating the structure of the exposure apparatus in embodiment of this invention The figure which showed typically the structure of the mask part and board | substrate in embodiment of this invention. The figure which showed typically the double focus structure of the image sensor part in embodiment of this invention The figure which showed the example of the image information which shows the relationship between the existing pattern on the board | substrate which the image sensor part in embodiment of this invention image | photographed, and a shielding line The figure which showed the image information of the shielding line and the existing pattern in embodiment of this invention The figure which showed the arrangement | positioning relationship between the alignment mark and cell on the board | substrate in embodiment of this invention The figure which showed the arrangement | positioning relationship between the alignment line and cell on a board | substrate in embodiment of this invention

  An exposure apparatus using shielding lines (mask slits) according to the first embodiment of the present invention will be described with reference to the drawings.

  FIG. 1 is a view showing the configuration of the exposure apparatus 100. FIG. 2 is a diagram schematically showing the configuration of the mask portion and the substrate. As shown in FIGS. 1 and 2, the exposure apparatus 100 is capable of transporting a substrate 5 provided with a regularly arranged pattern 4 corresponding to each color pixel displayed on the image display screen in a matrix. A substrate transport unit 10, an exposure window 22 for irradiating the substrate 5 with exposure light, and a translucent window 23 for observing the pattern of the substrate 5, and a shielding line 45 is provided on the translucent window 23. In order to acquire image information of the mask unit 35 including the photomask provided, the substrate 5, the image detection light source unit 20 that irradiates the mask unit 35 with transmitted light, and the light transmission window 23 of the mask unit 35. The image sensor unit 25 converts the transmitted light acquired via the image information into image information, and in the converted image information, the width of the shielding line 45 of the mask unit 35 transmits predetermined transmitted light. Next to the image display screen Covering the pattern located between the pattern corresponding to the pixels of the same color to fit, the respective patterns corresponding to the same color adjacent pixels sides are those set without covering. A substrate provided with a regularly arranged pattern in a matrix corresponding to each color pixel of the image display screen described above is, for example, a color filter substrate or an array substrate. In addition, the pattern corresponding to adjacent pixels of the same color displayed on the image display screen described above is a colored pattern in advance when the color filter substrate is used, and is adjacent to the pattern displayed on the image display screen. Adjacent same color pattern arranged at a position corresponding to the arrangement position of matching pixels of the same color, and on the array substrate, at the arrangement position of adjacent pixels of the same color displayed on the image display screen. It is the pattern arranged in the corresponding position. Hereinafter, the substrate 5 will be described using a color filter substrate as an example, but the substrate 5 may be an array substrate (for example, a TFT circuit). As shown in FIG. 1, the image detection light source unit 20 irradiates a plurality of types of transmitted light from below the substrate 5. The image detection light source unit 20 may emit a plurality of types of transmitted light from above the substrate 5, and in that case, the image sensor unit 25 is installed below the substrate 5.

  Specifically, the exposure apparatus 100 converts the light transmitted from the substrate transport unit 10 capable of transporting the substrate 5, the mask unit 35 formed of a photomask, and the light transmission window 23 of the mask unit 35 into image information. An image sensor unit 25 that converts the image sensor unit 25 into an image sensor unit 25. The image sensor unit 55 performs an image detection process from image information acquired from the image sensor unit 25 that has received light that has been transmitted excluding the shielding line; An exposure unit 50 that can irradiate exposure light from above the mask unit 35, an image detection light source unit 20 that irradiates light from below the mask unit 35 to obtain image information of the mask unit 35, and a mask unit 35. The exposure unit 50 is disposed between the image sensor unit 25 that receives light from the image detection light source unit 20 and acquires image information, the substrate transport unit 10, and the exposure unit 50. Exposure A mask portion 35 having an exposure window 22 that transmits part of the light, a light transmission window 23 that transmits part of light emitted from the image detection light source unit 20, and a mask portion position adjustment unit 70. It is. The exposure apparatus 100 may include an exposure control unit 60 that can control the exposure position / exposure output of the exposure unit 50.

  The board | substrate conveyance part 10 conveys a board | substrate. For example, as illustrated in FIG. 1, the substrate transport unit 10 is configured to place the substrate 5 and transport the substrate 5 in a predetermined transport direction. A plurality of unit stages having suction holes are juxtaposed in the transport direction of the substrate 5, and the substrate 5 is floated on the plurality of unit stages by a predetermined amount due to the balance between gas ejection and suction by the transport rollers. The both ends of the substrate 5 are supported and conveyed.

  The exposure part 50 irradiates ultraviolet rays, for example, an exposure wavelength range is 280-400 nm. The exposure unit 50 irradiates ultraviolet rays, and specifically is a laser oscillator, a xenon flash lamp, or the like. Further, a photo integrator (not shown) may be mounted on the exposure unit 50, and the luminance distribution in the cross section of the exposure light irradiated from the exposure unit 50 is made uniform. The photo integrator may be a fly-eye lens, a rod lens, a light pipe, or the like. In addition, a condenser lens (not shown) mounted on the exposure unit 50 irradiates the mask unit 35 with exposure light as parallel light. The exposure unit 50 performs exposure in accordance with a control command from the exposure control unit 60.

  FIG. 2 is a diagram schematically showing the configuration of the mask portion 35 and the substrate 5. The mask part 35 has a light shielding part 21 and an exposure window 22 formed in a predetermined pattern on the surface of a transparent substrate made of quartz glass or the like. FIG. 2 is an external perspective view schematically showing an example of the configuration of the mask portion 35. An arrow “a” in the figure indicates the transport direction of the substrate 5. The mask portion 35 has a configuration in which, for example, vertically long slit-shaped exposure windows 22 are formed in parallel at a predetermined pitch along the direction perpendicular to the substrate transport direction a. In FIG. 2, the area subjected to the light shielding process represents the light shielding portion 21, and the area not subjected to the light shielding process represents the exposure window 22. On the transfer start side of the mask part 35 with respect to the substrate 5, a horizontally long slit-shaped light transmission window 23 is formed. A shielding wire 45 is formed on the mask portion 35 in the transparent window 23. The light shielding unit 21 is shielded by, for example, chromium. The shielding wire 45 is also made of a shielding material such as chrome.

  The image sensor unit 25 photographs an existing pattern formed in advance on the substrate 5, for example, a gate bus line, a source bus line, or a black matrix, through the transparent window 23 of the mask unit 35. At this time, the image sensor unit 25 performs photographing for detecting an image from the start end to the other end end of the existing pattern 4 that extends in the drawing in the vertical direction in the drawing formed in parallel with the transport direction a of the substrate 5. The image sensor unit 25 detects an image of the existing pattern 4 that moves so as to flow in a strip shape under the light transmission window 23 by photographing the image sensor unit 25.

  For example, the image sensor unit 25 may be a line CCD capable of multiple focusing.

  If the existing pattern 4 moving under the light transmission window 23 shifts in a direction perpendicular to the moving direction a of the substrate 5 during shooting, the image sensor unit 25 A displacement amount is calculated, and a movement for aligning the mask 35 according to the displacement amount is performed. Thus, alignment adjustment is performed by movement control of the mask part 35 following the existing pattern 4. As a result, the exposure unit 50 performs accurate exposure on the position along the existing pattern 4.

  The image sensor unit 25 captures the existing pattern 4 that moves under the light transmission window 23 and also captures the shielding line 45 formed on the light transmission window 23. While the image sensor unit 25 is photographing, the mask unit 35 for correcting the shift as described above is moved, and the shielding line 45 being photographed is also moved. This mask correction is always executed during the movement of the substrate and is performed until the substrate movement is completed.

  The image sensor unit 25 is provided in pairs with the mask unit 35. The image sensor unit 25 can be moved independently by a moving unit (not shown) different from the moving unit used for moving the mask unit 35. The moving means provided in the image sensor unit 25 is used for alignment with the mask unit 35 before the start of exposure.

  The image sensor unit 25 is a multi-focus camera. For example, a dual focus camera having two focal points as shown in FIG. 3 may be used. Specifically, each of the existing pattern 4 and the shielding line 45 on the substrate 5 can be focused, and both can be photographed clearly. As shown in the drawing, an optical path length adjusting plate 25a is interposed in the half field of view of the image sensor unit 25, so that the existing pattern 4 on the substrate having a different focal length and the shielding line 45 of the mask unit 35 are simultaneously focused. ing.

  The image detection unit 55 stores a reference image used for alignment of the mask unit 35, and also stores an image of the existing pattern 4 captured by the image sensor unit 25 and an image of the shielding line 45 of the mask unit 35. Can do.

  The image detection unit 55 detects edge information of the existing pattern 4 from the image of the existing pattern 4 on the substrate 5 photographed by the image sensor unit 25 and actually irradiates the irradiated surface of the substrate 5 with light energy. It is possible to calculate the amount of deviation of the position of the mask portion 35 with respect to the position of the existing pattern 4 and the position where the light energy should be irradiated.

  The mask portion position adjustment unit 70 moves and corrects the position of the mask portion 35 based on the shift amount calculated by the image detection portion 55.

  The exposure control unit 60 can actually irradiate light energy to the range where the light energy of the irradiated surface of the substrate 5 should be irradiated according to the correction result of the mask position adjustment unit 70.

  Further, the image detection unit 55 includes the image of the shielding line 45 of the mask unit 35 taken by the image sensor unit 25 before the position of the mask unit 35 is corrected by the mask unit position adjustment unit 70 and the image sensor after the correction. The image of the shielding line 45 of the mask unit 35 taken by the unit 25 is compared to calculate the actual amount of movement of the mask unit 35 at the time of movement correction, and whether or not the position correction of the mask unit 35 has been performed accurately Determine.

  As described above, the alignment of the mask portion 35 following the existing pattern 4 is adjusted while moving the substrate 5 to irradiate light energy, and exposure processing is performed when the mask portion 35 moves from the start end to the end end of the existing pattern 4. Ends.

In this way, by using the images of the existing pattern 4 and the shielding lines 45 of the mask unit 35 captured by the image sensor unit 25 and monitoring the positional relationship during exposure, the mask unit 35 with respect to the existing pattern 4 is monitored. The accuracy of alignment can be improved.
The light transmission window (a viewing window for observing the pattern of the substrate, specifically, a line CCD observation window) 23 transmits light emitted from the image detection light source unit 20.

Here, the relationship between the shielding line 45 and the existing pattern 4 will be described. FIG. 4 is image information showing the relationship between the existing pattern 4 on the substrate and the shielding lines 45 taken by the image sensor unit 25. Note that the existing pattern and shielding line 45 shown in FIG. 4 are the existing pattern 4 and shielding line 45 ′ of the image information, and are therefore referred to as existing pattern 4 ′ and shielding line 45 ′.

  The existing pattern 4 ′ shown in FIG. 4 is an RGB dye (R: red, G: green, B: blue) pattern. For example, the existing pattern 4′a is an R dye, and the existing pattern 4′b is a G dye. The existing pattern 4′c is a B dye, the existing pattern 4′d is an R dye, the existing pattern 4′e is a G dye, and the existing pattern 4′f is a B dye.

  As described above, the image sensor unit 25 photographs the substrate 5 and the mask unit 35 at the same time, and observes the shielding line 45 and the existing pattern 4 on the substrate 5. Specifically, as shown in FIG. 4, the image sensor unit 25 captures the shielding wire 45 and the substrate 5, and the image detection unit 55 is arranged at the approximate center on the existing pattern 4 ′ e from the image information. The center line C1 of the shielding line 45 ′ is detected, and the center lines C2 on both sides of the existing pattern 4′b that is the same pigment are obtained. Then, the image sensor 25 recognizes the distance between C1 and C2, calculates the amount of positional deviation between the substrate 5 and the mask part 35, and monitors so that it can be corrected.

  However, in a high-definition liquid crystal screen substrate for portable devices (for example, cellular phones and portable personal computers), the pixel size becomes very small, and the existing pattern 4′e is also extremely small (for example, about 15 μm). It is assumed that it becomes narrower). Then, the image sensor unit 25 needs to include an imaging unit having a high resolution function, and it is assumed that a sufficient image for observing the existing pattern 4 cannot be acquired.

  The image detection unit 55 detects the relative positions of the mask unit 35 and the substrate 5 from the image information of the existing patterns 4′b and 4′e that are the same pigment. The image sensor unit 25 passes through only the existing pattern which is one type of RGB dye of the existing pattern 4 depending on the type of transmitted light irradiated by the image detection light source unit 20, and the transmitted light is emitted from the transmitted light. Obtaining image information.

  FIG. 5 is a diagram showing image information of the shielding line 45 and the existing pattern 4 unique to the present invention. Note that the existing pattern and shielding line 45 shown in FIG. 5 are the existing pattern and shielding line 45 ′ of the image information, and are therefore referred to as existing pattern 4 ′ and shielding line 45 ′.

  The exposure apparatus 100 includes a substrate transport unit 10 capable of transporting a substrate 5 provided with a regularly arranged pattern in a matrix corresponding to each color pixel displayed on the image display screen, and a translucent window. 23, a mask part 35 composed of a photomask having a shielding line 45 in the image 23, an image detection light source part 20 for irradiating a plurality of types of transmitted light from below the substrate 5 in order to acquire image information of the substrate 5, And an image sensor unit 25 that converts transmitted light acquired through the transparent window 23 of the mask unit 35 into image information. In the converted image information as shown in FIG. The width of the shielding line 45 covers a pattern of another color that is transmitted between predetermined patterns and that is located between patterns corresponding to adjacent pixels of the same color that are displayed on the image display screen. Corresponding to color pixels And setting the respective pattern partially cover. As shown in FIG. 5, the width of the shielding line 45 ′ is such that, for example, the transmitted light is transmitted through the existing patterns 4 ′ b and 4 ′ e of the G dye and another color positioned between the adjacent G color patterns. The R and B dye patterns (existing patterns 4′c to 4′d) are covered, and the adjacent G-color patterns 4′b and 4′e are partially covered. Specifically, the width of the shielding line 45 of the mask portion 35 is such that when it is converted into image information, the width between the centers of adjacent patterns that are the same dye is the pixel pitch width. . By arranging the shielding lines 45 to have a pixel pitch width (for example, 45 to 100 μm), the shielding lines 45 ′ are arranged so as to straddle two existing patterns on the substrate 5. Thereby, the image detection unit 55 is a substrate for a high-definition liquid crystal screen for portable devices (for example, a mobile phone and a portable personal computer), and even when the pixel size is extremely small, The position adjustment of the mask part 35 and the board | substrate 5 can be easily performed by each detecting the one side edge (side) which is a pattern of the same color which matches. In this way, the shielding line 45 has a pixel pitch width, thereby preventing erroneous attachment (misplacement) of the mask portion 35.

  In the above-described embodiments, the G light pattern has been described as the example where the transmitted light is transmitted. However, when the transmitted light is transmitted through the B color pattern, the shielding line 45 ′ When the R color pattern is covered and the R color pattern is transmitted, the shielding line 45 ′ is arranged so as to cover the G color and B color patterns.

  Thus, the exposure apparatus 100 includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The image detection unit 55 includes: Then, an edge corresponding to each side of the pattern corresponding to adjacent pixels of the same color is detected, and the mask unit 35 relatively moves on the substrate 5 based on the detected edge information, and the exposure unit 50 Irradiates exposure light after the mask part 35 moves.

  Next, a second embodiment of the present invention will be described. The description of the same part as the exposure apparatus 100 described in the first embodiment is omitted.

  As shown in FIG. 6, the exposure apparatus 100 includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. Is provided with an alignment mark M for each substrate component (cells c1 to c6) to be cut at a predetermined interval in the conveyance direction of the substrate 5, and the image detection unit 55 detects the alignment mark M. The mask unit 35 moves relatively on the substrate based on the detected information of the alignment mark M, and the exposure unit 50 irradiates the exposure light after the mask unit 35 moves.

  FIG. 6 shows the positional relationship between alignment marks M and cells on the substrate. As shown in FIG. 6, the substrate 5 includes alignment marks M1 to M4 (retraction marks or follow-up assisting marks) between the substrate components (cells c1 to c6) in the conveyance direction of the substrate 5, and the image detection unit 55 includes Then, the alignment mark M can follow the relative position of the mask portion 35 and the substrate 5 to increase the substrate conveyance accuracy between the cells and perform exposure.

  By arranging the alignment marks M at short intervals, the relative positional accuracy of the mask portion 35 and the substrate 5 can be increased without following within the active area of exposure.

Next, a third embodiment of the present invention will be described. The description of the same part as the exposure apparatus 100 described in the first embodiment is omitted.
The exposure apparatus 100 includes an image detection unit 55 that performs image detection processing based on image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. As shown in FIG. Reference numeral 5 denotes an alignment line L provided in the conveyance direction of the substrate 5 so as to divide the substrate parts to be cut at predetermined intervals. The image detection unit 55 detects the alignment line L, and masks The part 35 moves relatively on the substrate 5 based on the detected information of the alignment line L, and the exposure part 50 irradiates the exposure light after the mask part 35 moves.

  FIG. 7 shows an arrangement relationship between the alignment lines L on the substrate 5 and the cells. As shown in FIG. 7, the substrate 5 includes an alignment line L between the substrate components (cells c 1, 2 or c 3, 4) in the conveyance direction of the substrate 5. And the relative position of the substrate 5 can be tracked, and exposure can be performed with increased substrate transfer accuracy between cells. In addition, a predetermined patternless region R is provided on the substrate 5 in parallel with the alignment line L.

  By providing the alignment line L and the non-pattern region R, the image detection unit 55 can easily follow the beginning and end of the transport direction of the substrate 5, and the relative relationship between the mask unit 35 and the substrate 5 can be achieved. Position accuracy can be increased. The above-described substrate component (cell) is used for a liquid crystal screen of a portable device.

  According to the exposure apparatus 100, a substrate transport unit 10 capable of transporting a substrate 5 having a regularly arranged pattern in a matrix corresponding to each color pixel displayed on the image display screen, and the substrate 5 has an exposure window 22 for irradiating exposure light and a light transmission window 23 for observing the pattern of the substrate 5, and the light transmission window 23 has a shielding line 45 (approximately the center position of the light transmission window 23). ), A mask portion 35 constituted by a photomask, an image detection light source portion 20 for irradiating the mask portion 35 with transmitted light to obtain image information of the substrate 5, and a light transmission window 23 of the mask portion 35. The image sensor unit 25 converts the transmitted light acquired via the image information into image information, and in the converted image information, the width of the shielding line 45 of the mask unit 35 transmits predetermined transmitted light. Next to the image display screen It is set so as to cover a pattern located between patterns corresponding to matching pixels of the same color and partially cover each pattern corresponding to adjacent pixels of the same color. By detecting only the sides of the pattern corresponding to the color pixels, it is possible to set the exact alignment of the mask part for accurate exposure even for small liquid crystal product substrate parts for portable devices. it can. In the first embodiment of the present invention, an embodiment in which the shielding line 45 is a mask slit having a pixel pitch width will be described. In the second embodiment, an embodiment in which an alignment mark M is provided on the substrate will be described. In the third embodiment, the embodiment in which the alignment line L is provided on the substrate has been described. These embodiments may be implemented in combination, or may be implemented by combining two or more embodiments, or may be implemented independently. Good.

  The exposure apparatus 100 further includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The image detection unit 55 includes: An edge corresponding to each side of the pattern corresponding to adjacent pixels of the same color is detected, the mask unit 35 moves relatively on the substrate based on the detected edge information, and the exposure unit 50 When irradiating exposure light after the mask has moved, the exact position of the mask for accurate exposure, even for mobile device substrate parts with small liquid crystal product screens, such as those for mobile devices The alignment can be set and accurate exposure can be performed.

  The exposure apparatus 100 further includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. The substrate 5 includes: An alignment mark is provided for each substrate component to be cut at a predetermined interval in the conveyance direction of the substrate 5. The image detection unit 50 detects the alignment mark and the mask unit 35 detects the alignment mark. Based on the information of the alignment mark, it moves relatively on the substrate, and the exposure unit can follow the position of the substrate with the alignment mark as a reference when irradiating the exposure light after the mask unit 35 moves. Therefore, even if it is a board component for a portable device having a small liquid crystal product screen like that for a portable device, the substrate and the mask portion are accurately aligned with reference to the alignment mark. Set, it is possible to make an accurate exposure.

  The exposure apparatus 100 further includes an image detection unit 55 that performs image detection processing from image information, and an exposure unit 50 that can irradiate exposure light from above the mask unit 35. An alignment line is provided so as to divide each substrate component to be cut at a predetermined interval in the conveyance direction of the image, the image detection unit 55 detects the alignment line, and the mask unit is detected. The exposure unit 50 moves relative to the substrate 5 based on the alignment line information, and the exposure unit 50 follows the position of the substrate with reference to the alignment line when irradiating the exposure light after the mask unit 35 is moved. Therefore, even if it is a board component for a portable device having a small liquid crystal product screen like that for a portable device, the alignment of the substrate and the mask part can be made with reference to the alignment line. Set the alignment, it is possible to perform accurate exposure.

  As mentioned above, although embodiment of this invention was described in detail, this invention is not limited to these embodiment.

c Cell C Center line L Alignment line M Alignment mark R Region 4 Pattern 5 Substrate 10 Substrate transport unit 20 Image detection light source unit 21 Shading unit 22 Exposure window 23 Translucent window 25 Image sensor unit 35 Mask unit 45 Masking line 50 Exposure unit 55 Image detection unit 60 Exposure control unit 70 Mask unit position adjustment unit 100 Exposure apparatus

Claims (9)

A substrate transport unit capable of transporting a substrate having a regularly arranged pattern in a matrix corresponding to each color pixel displayed on the image display screen;
A mask portion comprising an exposure window for irradiating the substrate with exposure light, a light transmission window for observing the pattern of the substrate, and a photomask having a shielding line in the light transmission window;
In order to acquire the image information of the substrate, the transmitted light acquired through the light detection window of the image detection light source unit and the mask unit that irradiates the mask unit with a plurality of types of transmitted light is used as the image information. An image sensor unit for conversion,
In the converted image information, the width of the shielding line of the mask portion is a pattern positioned between patterns corresponding to adjacent pixels of the same color displayed on the image display screen that transmits a predetermined transmitted light. An exposure apparatus configured to cover and partially cover each of the patterns corresponding to the adjacent pixels of the same color. The width of the shielding line of the mask portion is such that, when converted into the image information, the interval width between the centers of the patterns corresponding to the adjacent pixels of the same color is the pixel pitch width. The exposure apparatus according to claim 1. The exposure apparatus further includes:
An image detection unit that performs image detection processing from the image information;
Comprising an exposure part that enables exposure light to be irradiated from above the mask part,
The image detection unit detects an edge corresponding to each side of the pattern corresponding to the adjacent pixels of the same color,
The mask portion moves relatively on the substrate based on the detected edge information,
The exposure apparatus according to claim 2, wherein the exposure unit irradiates exposure light after the mask unit has moved. The exposure apparatus further includes:
An image detection unit that performs image detection processing from the image information;
Comprising an exposure part that enables exposure light to be irradiated from above the mask part,
The substrate is provided with an alignment mark for each substrate component to be cut at a predetermined interval in the transport direction of the substrate,
The image detection unit detects the alignment mark,
The mask portion moves relatively on the substrate based on the information of the detected alignment mark,
4. The exposure apparatus according to claim 1, wherein the exposure unit irradiates exposure light after the mask unit is moved. The exposure apparatus further includes:
An image detection unit that performs image detection processing from the image information;
Comprising an exposure part that enables exposure light to be irradiated from above the mask part,
The substrate is provided with an alignment line so as to divide a substrate component to be cut at a predetermined interval in the transport direction of the substrate,
The image detection unit detects the alignment line,
The mask unit moves relatively on the substrate based on the detected alignment line information,
4. The exposure apparatus according to claim 1, wherein the exposure unit irradiates exposure light after the mask unit is moved. The exposure apparatus includes:
6. The exposure apparatus according to claim 5, wherein a predetermined patternless region is provided on the substrate in parallel with the alignment line.   The exposure apparatus according to claim 4, wherein the substrate component is used for a liquid crystal screen of a portable device.   The substrate having a regularly arranged pattern corresponding to each color pixel displayed on the image display screen in a matrix is a color filter substrate or an array substrate. The exposure apparatus according to any one of 1 to 7.   The patterns corresponding to adjacent pixels of the same color displayed on the image display screen are previously colored when the color filter substrate is used, and are adjacent to the same color displayed on the image display screen. Adjacent same color pattern arranged at a position corresponding to the arrangement position of color pixels, and corresponding to the arrangement position of adjacent pixels of the same color displayed on the image display screen in the case of the array substrate 9. The exposure apparatus according to claim 8, wherein the exposure apparatus is a pattern arranged at a position where the exposure is performed.

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