JP5382899B2 - Exposure equipment - Google Patents

Description

  The present invention provides a predetermined exposure pattern sequence through a photomask for a plurality of exposure areas set at predetermined intervals along the transport direction on the surface of the exposure target while transporting the exposure target in the predetermined direction. In particular, the present invention relates to an exposure apparatus that attempts to prevent a portion between exposure areas adjacent to each other outside the plurality of exposure areas from being exposed.

A conventional exposure apparatus exposes a mask pattern for one layer to each of a plurality of exposure regions of the substrate by relatively moving a stage on which the substrate is placed and a photomask corresponding to a layer to be exposed. , the position of the stage with respect to the photomask during exposure to the plurality of exposure regions while measured for each region, based on the photomask in a state of being positioned to a predetermined position recognition marks on the substrate, Means for acquiring a relative position of the stage at the time of exposure with respect to the plurality of exposure areas; and positioning the photomask by detecting the position recognition mark, and the acquired relative position with reference to the photomask at that time Means for moving the stage and the photomask relative to each other while measuring the position of the stage relative to the photomask When the first layer pattern is exposed and formed by moving the stage and the photomask relative to each other and positioning them with respect to the plurality of exposure areas on the substrate, another exposure is performed based on the one exposure area. The relative position data of the area is stored, and when the pattern of the second layer is formed by exposure, the stage and the photomask are relatively moved and positioned based on the relative position data for exposure. (For example, refer to Patent Document 1).

  However, in such a conventional exposure apparatus, the mask pattern of the photomask is exposed by stepping the substrate and switching the plurality of exposure areas set on the substrate one by one. In other words, the plurality of exposure areas are not exposed while the substrates disposed in close proximity to each other are transported at a constant speed in a direction perpendicular to the arrangement direction of the plurality of mask patterns formed on the photomask.

On the other hand, in the case of an exposure apparatus that exposes a plurality of exposure areas while transporting the substrate at a constant speed in a direction orthogonal to the arrangement direction of the plurality of mask patterns formed on the photomask, FIG. As shown, for example, portions 3a and 2 between the first exposure region 2a and the second exposure region 2b among the plurality of exposure regions 2 set in the transport direction (arrow A direction) of the color filter substrate 1. th the portion 3b between the exposure area 2b and the third exposure area 2c even will be exposed pattern row 4 by the plurality of mask pattern is formed, there is a risk of lowering the appearance quality of the product.

  In view of the above, the present invention addresses such problems and exposes a portion between exposure regions adjacent to each other outside a plurality of exposure regions set along the conveyance direction of the object to be exposed. It is an object of the present invention to provide an exposure apparatus that attempts to prevent this.

In order to achieve the above object, an exposure apparatus according to a first aspect of the present invention places an object to be exposed, on which a plurality of exposure areas are arranged in at least one line, on a top surface, and is constant in the setting direction of the plurality of exposure areas. A stage that conveys the object to be exposed at a speed; a mask stage that is disposed above the stage and that holds a photomask formed with a mask pattern having a predetermined shape in close proximity to the object to be exposed; and A light source that is constantly lit during an exposure period for an object to be exposed and irradiates exposure light onto the mask pattern of the photomask held on the mask stage, and is disposed between the mask stage and the light source, and is disposed on the photomask. An exposure apparatus comprising: a condensing lens that illuminates exposure light to be collimated; and disposed between the light source and the condensing lens. An imaging lens that forms an image on the front side, a plurality of slits and a plurality of light-shielding regions are alternately arranged, and is disposed in the vicinity of the imaging position of the image of the light source by the imaging lens, The exposure area is stopped during exposure, the exposure area is irradiated with exposure light through one of the plurality of slits, and adjacent to each other outside the plurality of exposure areas by transport of the exposed object. The portion between the exposure areas moves in a direction opposite to the conveyance direction of the object to be exposed in synchronization with passing under the mask pattern, and is located downstream of the one slit in the movement direction. a shutter for blocking the the exposure light irradiated on a portion between the exposure region the adjacent by the light blocking region, in which example Bei a.

With such a configuration, the exposure object having a plurality of exposure areas arranged in a row on the upper surface of the stage is placed on the upper surface, and the exposure object is moved at a constant speed in the setting direction of the plurality of exposure areas. The photomask, which is transported by the mask stage and formed with a mask pattern with a predetermined shape on the mask stage, is held in close proximity to the object to be exposed, and is held on the mask stage by a light source that is always lit during the exposure period for the object to be exposed. Exposure light is irradiated to the mask pattern of the mask. At that time, an image of the light source is formed on the front side of the condenser lens by the imaging lens, and the exposure light applied to the photomask by the condenser lens is made parallel light. At this time, the shutter disposed in the vicinity of the imaging position of the image of the light source by the imaging lens, which has a plurality of slits and a plurality of light shielding areas alternately, stops during the exposure of the exposure area of the object to be exposed. The exposure area is irradiated with exposure light, and a portion between the exposure areas adjacent to each other outside the plurality of exposure areas passes through the lower side of the mask pattern by conveying the object to be exposed. Go to the conveying direction of the body in opposite directions, blocking the exposure light irradiated on a portion between the light shielding region by exposure regions said adjacent positioned downstream of the one slit in the direction of movement.

An exposure apparatus according to a second aspect of the present invention is configured to place an object to be exposed, in which a plurality of exposure areas are arranged in at least one line, on an upper surface, and to expose the object at a constant speed in a setting direction of the plurality of exposure areas. A mask stage that is disposed above the stage and holds a photomask having a mask pattern with an opening having a predetermined shape in close proximity to the object to be exposed, and an exposure period for the object to be exposed A light source that is constantly lit and irradiates the mask pattern of the photomask held on the mask stage with exposure light, and a brightness of the exposure light that is disposed between the mask stage and the light source and that irradiates the photomask. A photo integrator that makes the distribution uniform, and is arranged between the mask stage and the photo integrator, and the exposure light that irradiates the photo mask is parallel. A condensing lens that is disposed between the photo integrator and the condensing lens, and forms an end face image of the photo integrator on the front side of the condensing lens. An image lens, a plurality of slits, and a plurality of light-shielding regions are alternately arranged and disposed near the imaging position of the end face image of the photo integrator by the imaging lens, and exposure of the exposure object to the exposure region During execution, the exposure area is irradiated with exposure light through one of the plurality of slits, and the exposure object is transported between the exposure areas adjacent to each other outside the plurality of exposure areas. The light-blocking region is moved in the direction opposite to the conveying direction of the object to be exposed in synchronization with the passage of the portion below the mask pattern, and is located downstream of the one slit in the moving direction. By those that example Bei and a shutter for blocking the exposure light irradiated portion between the adjacent exposed areas.

With such a configuration, the exposure object having a plurality of exposure areas arranged in a row on the upper surface of the stage is placed on the upper surface, and the exposure object is moved at a constant speed in the setting direction of the plurality of exposure areas. The photomask, which is transported by the mask stage and formed with a mask pattern with a predetermined shape on the mask stage, is held in close proximity to the object to be exposed, and is held on the mask stage by a light source that is always lit during the exposure period for the object to be exposed. Exposure light is irradiated to the mask pattern of the mask. At that time, the brightness distribution of the exposure light applied to the photomask with the photo integrator is made uniform, the end face image of the photo integrator is formed on the front side of the condenser lens with the imaging lens, and the photo mask is irradiated with the condenser lens. The exposure light to be converted into parallel light. At this time, the shutter disposed in the vicinity of the imaging position of the image of the light source by the imaging lens, which has a plurality of slits and a plurality of light shielding areas alternately, stops during the exposure of the exposure area of the object to be exposed. The exposure area is irradiated with exposure light through one of the plurality of slits, and the portion between the exposure areas adjacent to each other outside the plurality of exposure areas is transferred to the lower side of the mask pattern. synchronously to pass through to move in the opposite direction to the transporting direction of the object to be exposed, by the light shielding region located downstream of the first slit in the moving direction in the portion between the adjacent exposed areas The exposure light to be irradiated is blocked.

Further, the shutter is movable in the direction opposite to the conveying direction of the object to be exposed, and has the same number of slits as the plurality of exposure areas of the object to be exposed along the moving direction. As a result, the shutter in which the same number of slits as the plurality of exposure areas of the object to be exposed is moved in the moving direction in the direction opposite to the conveying direction of the object to be exposed, and a plurality of exposures are performed by moving the object to be exposed by the shutter. the part between the exposed regions adjacent to each other at the outside of the area movement in synchronism with the going out through the lower photomask, to shield cross the exposure light irradiated portion between the adjacent exposed areas The

  According to the first aspect of the present invention, the portions between the adjacent exposure areas are exposed outside the plurality of exposure areas set in a line along the transport direction on the object to be exposed. Can be prevented. Therefore, the appearance quality of the product can be improved. Further, since the shutter is disposed in the vicinity of the imaging position of the image of the light source by the imaging lens, the shutter can be made small, and interference with peripheral components can be avoided.

  According to the invention of claim 2, the portion between the adjacent exposure areas is exposed outside the plurality of exposure areas set in a line along the transport direction on the object to be exposed. Can be prevented. Therefore, the appearance quality of the product can be improved. Further, since the shutter is disposed in the vicinity of the imaging position of the end face image of the photo integrator by the imaging lens, the shutter can be made small, and interference with surrounding components can be avoided.

  Furthermore, according to the invention which concerns on Claim 3, irradiation of exposure light is enabled to the exposure area | region of a to-be-exposed body in the part of a slit, and exposure light is interrupted | blocked in the part between adjacent slits, and it adjoins to-be-exposed body It can prevent that exposure light is irradiated to the part between the exposure area | regions to perform.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a front view showing a schematic configuration of an embodiment of an exposure apparatus according to the present invention. This exposure apparatus is configured to transfer a predetermined exposure pattern via a photomask to a plurality of exposure areas set at predetermined intervals along the transfer direction on the surface of the exposure target while transferring the exposure target in a predetermined direction. It forms a row, and comprises a stage 5, a mask stage 6, a light source 7, a photo integrator 8, a condenser lens 9, an imaging lens 10, a shutter 11, and an imaging means 12. In the following description, the case where the object to be exposed is the color filter substrate 1 coated with a color resist will be described.

The stage 5, as shown in FIG. 2, the color filter substrate a plurality of exposure regions 2 are set side by side in at least one row at intervals G1 1 (shown in two rows in the figure) on the upper surface 5a The color filter substrate 1 is placed and transported in the setting direction of the plurality of exposure areas 2, and is moved at a constant speed (V) in the direction indicated by the arrow A in FIG. It has become. In FIG. 2, reference numeral 2a represents the first exposure area, reference numeral 2b represents the second exposure area, and reference numeral 2c represents the third exposure area. Further, reference numeral 3a is the first and the second exposure area 2a, a portion between the 2b shows a (hereinafter referred to as "first non-exposed area"), the second is the code 3b and third A portion between the exposure areas 2b and 2c (hereinafter referred to as “second non-exposure area”) is shown.

  A mask stage 6 is disposed above the stage 5. The mask stage 6 holds the photomask 14 in close proximity to the color filter substrate 1 via a predetermined gap, for example, a gap of 100 to 300 μm.

  Here, the photomask 14 is for transferring a mask pattern formed thereon by irradiation of exposure light to a color resist on the color filter substrate 1, and as shown in FIG. It consists of a light shielding film 16, a mask pattern 17, a viewing window 18, and a mask side alignment mark 19.

The said transparent base material 15 is a transparent glass base material which permeate | transmits an ultraviolet-ray and visible light with high efficiency, for example, consists of quartz glass.
As shown in FIG. 1, a light shielding film 16 is formed on one surface 15 a of the transparent substrate 15. The light shielding film 16 is to shield the exposure light, and is formed with a thin film of opaque example chromium (Cr).

  As shown in FIG. 3, the light shielding film 16 has a plurality of mask patterns 17 arranged in one direction. The plurality of mask patterns 17 are openings having a predetermined shape that allow exposure light to pass through. The plurality of mask patterns 17 are formed on the color filter substrate 1 shown in FIG. It is transferred onto the pick cell 21 of the black matrix 20. For example, it has a width substantially equal to the width of the pick cells 21 and has a long rectangular shape in a direction orthogonal to the arrangement direction, and is formed at intervals corresponding to the three pitch intervals of the pick cells 21. Further, as shown in FIG. 3, for example, the left edge portion of the mask pattern 17a located in the center is preset as the reference position R1.

  As shown in FIG. 3, a viewing window 18 is formed in the light shielding film 16 in the vicinity of the plurality of mask patterns 17 and laterally in the arrangement direction. The viewing window 18 is for observing the substrate-side alignment mark 22 and the pick cell 21 of the black matrix 20 formed on the color filter substrate 1 shown in FIG. Thus, the position of the substrate side alignment mark 22 and the reference position R2 preset in the upper left corner of the pick cell 21a located at the center of the black matrix 20 as shown in FIG. 4 can be detected. Then, as shown in FIG. 3, it is formed in a rectangular shape extending from the center side toward one end portion 14a in parallel with the arrangement direction of the plurality of mask patterns 17.

  As shown in FIG. 3, a plurality of mask-side alignment marks 19 are formed on the light-shielding film 16 so as to be arranged on the side of one end portion of the viewing window 18 from the center side toward the other end portion 14 b. The plurality of mask side alignment marks 19 are for aligning a reference position R1 preset in the mask pattern 17 with a reference position R2 preset in the pick cell 21 of the color filter substrate 1. , Corresponding to the mask pattern 17. Further, the formation position is such that the left side edge of the mask side alignment mark 19 in FIG. 3 coincides with the left side edge of the corresponding mask pattern 17. For example, a mask side alignment mark 19 formed on the central side of the light shielding film 16 is set in advance as a reference mark 19a. As a result, the reference mark 19a and the substrate-side alignment mark 22 of the color filter substrate 1 are positioned so as to have a predetermined positional relationship, whereby the reference position R1 of the mask pattern 17 and the color filter substrate 1 are The reference position R2 can be aligned.

  As shown in FIG. 1, the photomask 14 is held on the mask stage 6 with the side on which the light shielding film 16 is formed facing down.

  A light source 7 is disposed above the mask stage 6. The light source 7 is always lit during the exposure period for the color filter substrate 1 and irradiates the photomask 14 held on the mask stage 6 with exposure light. The light source 7 emits exposure light including ultraviolet rays. A high-pressure mercury lamp, a xenon lamp or an ultraviolet light emitting laser.

A photo integrator 8 is disposed between the mask stage 6 and the light source 7. The photo integrator 8 makes the luminance distribution of the exposure light applied to the photo mask 14 uniform, and is a kaleidoscope or a fly-eye lens, for example. In the present embodiment, a kaleidoscope is used, and the shape of the end face 8a is formed in a rectangular shape so that the exposure light is irradiated only on the plurality of mask pattern 17 formation regions of the photomask 14. When a filter that reflects or absorbs ultraviolet rays and transmits visible light is formed so as to cover the viewing window 18 and the mask side alignment mark 19 of the photomask 14, the exposure light may irradiate the entire photomask 14. Good.

  A condenser lens 9 is disposed between the mask stage 6 and the photo integrator 8. The condenser lens 9 has its front focal point positioned in the vicinity of the image forming position of the image of the end face 8a of the photo integrator 8 by the image forming lens 10 described later to make the exposure light parallel light and irradiate the photo mask 14 vertically. This is a condensing lens.

  An imaging lens 10 is disposed between the photo integrator 8 and the condenser lens 9. The imaging lens 10 is a convex lens that forms an end face image of the photo integrator 8 once on the front side of the condenser lens 9.

A shutter 11 is provided in the vicinity of the imaging position of the end face image of the photo integrator 8 by the imaging lens 10. The shutter 11 stops during exposure of the exposure region 2 of the color filter substrate 1 to irradiate the exposure region 2 with exposure light, and is adjacent to each other outside the plurality of exposure regions 2 by the movement of the color filter substrate 1. portion between the exposure region 2 move in synchronism with the going out through the lower side of the mask pattern 17, be a shall which to shield cross the exposure light irradiated portion between the adjacent exposure regions 2 The first and second non-exposure areas 3a and 3b of the adjacent color filter substrate 1 are moved and stopped in the direction opposite to the direction of movement of the color filter substrate 1 indicated by the arrow A in FIG. It is possible to prevent the exposure light from being irradiated. As shown in FIG. 5, the same number of slits 23 as the first to third exposure regions 2 a to 2 c of the color filter substrate 1 are formed along the movement direction indicated by the arrow B. The slits 23 corresponding to the first to third exposure regions 2a to 2c of the color filter substrate 1 are the first slit 23a, the second slit 23b, and the third slit 23c, respectively. . A portion between the first and second slits 23a and 23b corresponding to the first and second non-exposure areas is the first light shielding area 30a, and the second and third slits 23b. , 23c is the second light shielding region 30b.

In this case, the size (w × d) of the slit 23 of the shutter 11 shown in FIG. 5 is such that the magnification of the condenser lens 9 is M, the total width of the plurality of mask patterns 17 of the photomask 14 shown in FIG. When the length of the mask pattern 17 is D, the mask pattern 17 is formed at least w = W / M and d = D / M. Further, the gap G2 between the adjacent slits 23 is set to G2 = G1 / M, where G1 is the distance between the adjacent exposure regions 2 of the color filter substrate 1 shown in FIG. The moving speed v of the shutter 11 in the arrow B direction is v = V / M, where V is the transport speed of the color filter substrate 1. In FIG. 5, the hatched area is an exposure light irradiation area 31.

  The exposure optical system 24 includes the light source 7, the photo integrator 8, the imaging lens 10, the condenser lens 9, the mask stage 6, and the shutter 11.

  An imaging unit 12 is disposed above the stage 5. The imaging means 12 captures and images the substrate-side alignment mark 22 formed on the color filter substrate 1 and the mask-side alignment mark 19 formed on the photomask 14 within the same field of view via a mirror 25. A line CCD 26 having a large number of light receiving elements arranged in a straight line, and a substrate-side alignment mark 22 disposed on the front side of the color filter substrate 1 and formed on the pick cell 21 and the photomask 14. And an imaging lens 27 that forms an image of the mask-side alignment mark 19 on the line CCD 26, respectively.

  Further, as shown in FIG. 1, an optical distance correction unit 28 is disposed between the line CCD 26 and the imaging lens 27 on the optical path of the imaging unit 12. The optical distance correcting means 28 substantially matches the optical distance between the line CCD 26 of the imaging means 12 and the color filter substrate 1 and the optical distance between the line CCD 26 of the imaging means 12 and the photomask 14. It consists of a transparent member having a predetermined refractive index larger than the refractive index of air, for example, a glass plate. Specifically, the optical distance correction means 28 is disposed on the optical path connecting the line CCD 26 of the image pickup means 12 and the color filter substrate 1 through the viewing window 18 formed in the photomask 14. As a result, the image of the substrate side alignment mark 22 of the color filter substrate 1 and the image of the mask side alignment mark 19 of the photomask 14 which are shifted in the optical axis direction of the imaging means 12 and the image of the mask side alignment mark 19 of the photomask 14 are simultaneously connected on the line CCD 26. Can be imaged.

Next, the operation of the exposure apparatus configured as described above will be described.
Here, as shown in FIG. 4, the color filter substrate 1 to be used has an opaque film made of chromium (Cr) or the like formed on one surface of a transparent glass substrate. As shown in FIG. A large number of pick cells 21 are formed in a matrix. Further, alignment is performed by correcting a positional deviation between a reference position R1 preset on the photomask 14 and a reference position R2 preset on the color filter substrate 1 at a substantially central portion on the one end 1a side. Therefore, one elongated substrate-side alignment mark 22 is formed. Further, on the side of the substrate-side alignment mark 22, a plurality of alignment confirmation marks 29 are arranged from the center side toward one side end 1 b so as to correspond to the pick cells 21 and coincide with the three pitch intervals of the arrangement of the pick cells 21. Formed at intervals. The substrate side alignment mark 22 and the alignment confirmation mark 29 are formed so that the left side edge of each mark and the left side edge of the corresponding pick cell 21 in FIG.

  The color filter substrate 1 thus formed is coated with a predetermined color resist on the upper surface, and the end 1a side where the substrate-side alignment mark 22 is formed is positioned on the leading side in the transport direction indicated by arrow A in FIG. Then, it is placed on the upper surface 5a of the stage 5 and is conveyed in the direction of arrow A at a constant speed V by the conveying means 13.

  On the other hand, as shown in FIG. 3, the photomask 14 has the end portion 14c side on which the viewing window 18 is formed positioned on the front side in the transport direction indicated by the arrow A, and forms a light shielding film 16 as shown in FIG. It is held on the mask stage 6 with the finished surface down. And it is made to oppose and adjoin to the upper surface of the color filter board | substrate 1 conveyed.

  In this state, the imaging means 12 images the substrate side alignment mark 22, the alignment confirmation mark 29, and the pick cell 21 on the color filter substrate 1 through the viewing window 18 formed in the photomask 14. In this case, an optical distance correction means 28 is disposed on the optical path connecting the line CCD 26 of the image pickup means 12 and the color filter substrate 1 through the viewing window 18 formed in the photomask 14, and the optical distance is determined by the image pickup means. Since the optical distances between the 12 line CCDs 26 and the photomask 14 are substantially matched, the substrate-side alignment marks 22 on the color filter substrate 1 and the like that are shifted in the optical axis direction of the image pickup means 12 are used. The image and the image of the mask side alignment mark 19 of the photomask 14 are simultaneously formed on the line CCD 26 of the imaging means 12. Therefore, the image of the substrate side alignment mark 22 and the like and the image of the mask side alignment mark 19 that are simultaneously imaged by the imaging unit 12 are simultaneously processed by an image processing unit (not shown).

Here, first, the substrate side alignment mark 22 of the color filter substrate 1 and the mask side alignment mark 19 of the photomask 14 which are observed by the imaging unit 12 through the viewing window 18 of the photomask 14 as shown in FIG. Images are taken simultaneously. At this time, the cell number of the light receiving element of the line CCD 26 that has detected the substrate-side alignment mark 22 and the cell number of the light receiving element of the line CCD 26 that has detected the reference mark 19a of the photomask 14 are read, and an arithmetic unit not shown in the figure. The distance L is calculated. Then, it is compared with a predetermined distance L ₀ set and stored in advance.

Then, as shown in FIG. 6, the photomask 14 is moved in the directions of arrows X and Y so that the distance L between the substrate side alignment mark 22 and the reference mark 19a is L ₀ or L ₀ ± x (x is an allowable value). Moved. As a result, the reference position R1 of the photomask 14 and the reference position R2 of the color filter substrate 1 match within a predetermined allowable range.

  Next, the alignment confirmation mark 29 on the color filter substrate 1 is imaged by the imaging means 12 through the viewing window 18 of the photomask 14. Then, the cell number of the light receiving element of the line CCD 26 that detected each alignment confirmation mark 29 and the cell number of the light receiving element of the line CCD 26 that detected each mask side alignment mark 19 of the photomask 14 are read, and each cell is read by the calculation unit. The average number is calculated. The average value is compared with the cell number of the light receiving element of the line CCD 26 that has detected the substrate-side alignment mark 22 of the color filter substrate 1 immediately after alignment adjustment, and if both coincide with each other within a predetermined allowable range, the alignment is performed. The photomask 14 is irradiated with exposure light because it is determined that the above has been performed reliably. As a result, the image of the mask pattern 17 of the photomask 14 is transferred onto the pick cell 21 of the color filter substrate 1. If the average value and the cell number do not match, it is determined that the color filter substrate 1 is of a different type or a defective product of the black matrix 20, for example. In this case, the exposure is stopped and an alarm is given. .

Thereafter, the image data picked up by the image pickup means 13 is compared with a look-up table (LUT) of the reference position R2 of the color filter substrate 1 stored in a storage unit (not shown), and the reference position R2 is detected. Then, the cell number of the light receiving element of the line CCD 26 detecting the reference position R2 is compared with the cell number of the light receiving element of the line CCD 26 detecting the reference mark 19a of the photomask 14, and the distance L between them is L ₀ or The photomask 14 is finely moved in the directions of arrows X and Y so that L ₀ ± x. Further, as necessary, the photomask 14 is rotated with the center of the surface as the central axis. Accordingly, the photomask 14 be a color filter substrate 1 is fed transportable to indicate to how direction by the arrow A while yawing moves to follow it. Thus, the mask pattern 17 of the photomask 14 is transferred to the color filter substrate 1 being conveyed, and the stripe-shaped exposure pattern row 4 is accurately formed on the predetermined pick cell 21 of the color filter substrate 1. .

Next, an exposure procedure performed using the exposure apparatus of the present invention will be described with reference to the flowchart of FIG.
First, the shutter 11 shown in FIG. 5 is stopped with the center of the first slit 23a aligned with the optical axis center of the exposure light. At this time, the light source 7 is turned off. In such a state, the color filter substrate 1 is placed on the upper surface 5a of the stage 5 and conveyed at a predetermined speed V in the direction of arrow A shown in FIG.

  Then, when the substrate side alignment mark 22 of the color filter substrate 1 reaches the lower side of the viewing window 18 of the photomask 14, the imaging unit 12 detects the substrate side alignment mark 22 in step S1.

  Next, in step S2, when the substrate-side alignment mark 22 is detected, a timer (not shown) is activated to trigger the time t1.

  In step S3, as shown in FIG. 8B, the light source 7 is turned on when t1 time elapses after the substrate side alignment mark 22 is detected. Thereby, exposure light is irradiated to the photomask 14 through the 1st slit 23a of the shutter 11, and exposure is started. It should be noted that the transport direction (in the direction of arrow A) of the first exposure region 2a of the color filter substrate 1 is the transport direction of the mask pattern 17 of the photomask 14 after the elapse of time t1 after the substrate side alignment mark 22 is detected. (Arrow A direction) If the conveyance speed V is set so as to substantially match the leading end, the first exposure region 2a of the color filter substrate 1 is located in the photomask 14 as shown in FIG. The exposure can be started in time with passing under the mask pattern 17.

  In step S4, the elapsed time t2 after the start of exposure is counted by a timer. At this time, if the time t2 is appropriately set, the first exposure region is moved by the movement of the color filter substrate 1 in the direction of arrow A as shown in FIG. The rear end portion in the transport direction 2a substantially coincides with the rear end portion in the transport direction of the mask pattern 17 of the photomask 14. Further, at the same time when the first exposure area 2a and the rear end of the mask pattern 17 in the transport direction match, the shutter 11 starts moving in the arrow B direction at the speed v.

  In step S5, whether or not the exposure to the last exposure region 2, for example, the third exposure region 2c in FIG. 2, is completed is illustrated based on the elapsed time after the substrate-side alignment mark 22 is detected. It is determined by the omitted determination unit. Here, for example, when the exposure for the first exposure area 2a has only been completed, the determination is “NO” and the process proceeds to step S6.

  In step S6, as shown in FIGS. 8C and 8D, the first non-exposed region 3a between the first exposed region 2a and the second exposed region 2b is a mask of the photomask 14. The shutter 11 moves at a speed v in the direction of arrow B shown in FIG. 9B as it passes under the pattern 17. Thereby, as shown in the figure, the first light-shielding region 30a between the first slit 23a and the second slit 23b of the shutter 11 is replaced by the first non-exposure region 3a of the color filter substrate 1. It moves in synchronization with the movement in the direction of the arrow A, and the exposure light is blocked by the first light shielding region 30a, thereby preventing the first non-exposure region 3a from being exposed.

In step S7, the elapsed time t3 from the start of the movement of the shutter 11 is counted by a timer. In this case, when the time t3 elapses, as shown in FIG. 9C, the shutter 11 further moves in the arrow B direction, and the center of the second slit 23b is positioned at the optical axis center of the exposure light. At the same time, the color filter substrate 1 is transported in the direction of arrow A, the first non-exposure area 3a passes under the mask pattern 17 of the photomask 14, and the leading end of the second exposure area 2b in the transport direction is This coincides with the leading end of the mask pattern 17 in the carrying direction.

In step S8, as shown in FIG. 8D, the movement of the shutter 11 is stopped, and the process returns to step S4 to execute the exposure for the second exposure region 2b . Then, steps S4 to S8 are repeatedly executed, and exposure is performed on all exposure regions 2 set in the transport direction of the color filter substrate 1.

  When the exposure for the last exposure area 2 is completed as described above, “YES” determination is made in step S5, and the process proceeds to step S9.

In step S9, as shown in FIG. 8 (b) , the light source 7 is turned on when exposure to the last exposure area 2, for example, the third exposure area 2c is completed (see FIG. 8C). Turns off. Thereby, the exposure of the exposure region 2 for one row set in the conveyance direction of the color filter substrate 1 is completed.

Incidentally, in a plane parallel to the upper surface 5a of the stage 5, if disposed an exposure optical system 24 for example two side by side in a direction perpendicular to the conveying direction (arrow A direction), 1st to 3 th exposure region Exposure is performed simultaneously on the exposure area 2 adjacent to 2a to 2c, and the exposure pattern row 4 can be formed for all the exposure areas 2 as shown in FIG.

  In the above description, the case where the photo integrator 8 is disposed between the light source 7 and the imaging lens 10 has been described. However, the present invention is not limited to this, and the photo integrator 8 may not be provided. In this case, the imaging lens 10 may be disposed so as to form an image of the light source 7 at a position on the near side of the condenser lens 9.

Moreover, Te above described odor, before start of exposure, the shutter 11 is stopped in this state where the center was aligned with the optical axis center of the exposure light of the first slit 23a, the light source 7 is turned off, the case has been described where the subsequent source 7 is started the exposure is illuminated, the present invention is not limited thereto, the light source 7 is set to remain lit before starting the exposure, the shutter 11 is exposed before the start of Waso are stopped while blocking the optical path of the exposure light in the light shielding region in the moving direction leading side of the first slit 23a, the subsequent substrate side alignment mark 22 of the color filter substrate 1 is detected by the imaging means 11 It starts moving, the center of the 1st slit 23a may also be exposed and positioned in the optical axis center of the exposure light is started.

Furthermore, in the above description, the case where the shutter 11 has the same number of slits 23 as the plurality of exposure regions 2 of the color filter substrate 1 along the moving direction has been described, but the present invention is not limited thereto. is not, the exposure region 2 multiple may be one that opens and closes in synchronism to pass repeatedly under the photomask 14.

  In the above description, the case where the object to be exposed is the color filter substrate 1 has been described. However, the present invention is not limited to this, and any substrate can be used as long as it forms the stripe-shaped exposure pattern row 4 in the plurality of exposure regions 2. It may be a thing.

It is a front view which shows schematic structure of embodiment of the exposure apparatus by this invention. It is a top view which shows an example of the several exposure area | region set to the color filter board | substrate used in the said exposure apparatus. It is a top view which shows one structural example of the photomask used in the said exposure apparatus. It is a top view which shows the example of 1 structure of the color filter board | substrate used in the said exposure apparatus. It is a top view which shows one structural example of the shutter used in the said exposure apparatus. It is explanatory drawing which shows position alignment with the said photomask and color filter board | substrate. It is a flowchart explaining the exposure procedure performed using the said exposure apparatus. It is a timing chart explaining operation | movement of the shutter synchronized with the some exposure area | region of the said color filter board | substrate passing sequentially under the photomask. It is explanatory drawing which shows the exposure prevention operation | movement with respect to the 1st non-exposure area | region of a color filter substrate in the exposure operation | movement by the said exposure apparatus. It is a top view which shows the state in which the exposure pattern row | line was formed in the several exposure area | region of the color filter board | substrate by the said exposure apparatus. It is a top view which shows the state in which the exposure pattern row | line | column was formed in the part between the exposure areas which adjoin outside the several exposure area | region set to the conveyance direction of a color filter substrate.

Explanation of symbols

1. Color filter substrate (exposed body)
2 ... exposure region 2 a to 2 c ... 1st to third exposure region 3a ... first unexposed regions 3b ... second unexposed regions 5 ... stage 6 ... mask stage 7 ... light source 8 ... Photo integrator 9 ... Condenser lens (Condenser lens)
10 ... imaging lens 11 ... shutter 14 ... photomask 17 ... mask pattern 23 ... slit 23a to 23c ... 1st to third slits 30a ... first shielding area 30b ... second shielding region

Claims (3)

A stage for placing the exposure object set with a plurality of exposure areas arranged in at least one line on the upper surface, and transporting the exposure object at a constant speed in a setting direction of the plurality of exposure areas;
A mask stage that is disposed above the stage and holds a photomask having a mask pattern with an opening having a predetermined shape in close proximity to the object to be exposed; and
A light source that is constantly lit during an exposure period for the object to be exposed, and that irradiates exposure light onto the mask pattern of a photomask held on the mask stage;
A condensing lens disposed between the mask stage and the light source, which converts the exposure light applied to the photomask into parallel light;
An exposure apparatus comprising:
An imaging lens that is disposed between the light source and the condenser lens and forms an image of the light source on the front side of the condenser lens;
A plurality of slits and a plurality of light-shielding areas are alternately provided and arranged in the vicinity of the imaging position of the image of the light source by the imaging lens, and stopped during execution of the exposure of the object to be exposed to the exposure area. The exposure area is irradiated with exposure light through one of the plurality of slits, and a portion between the exposure areas adjacent to each other outside the plurality of exposure areas is conveyed by the object to be exposed. In the direction opposite to the conveying direction of the object to be exposed in synchronization with the passage of the lower side of the exposure object, and the adjacent light-shielding area located on the downstream side of the one slit in the movement direction. A shutter that blocks exposure light applied to a portion in between;
Exposure apparatus being characterized in that example Bei a. A stage for placing the exposure object set with a plurality of exposure areas arranged in at least one line on the upper surface, and transporting the exposure object at a constant speed in a setting direction of the plurality of exposure areas;
A mask stage that is disposed above the stage and holds a photomask having a mask pattern with an opening having a predetermined shape in close proximity to the object to be exposed; and
A light source that is constantly lit during an exposure period for the object to be exposed, and that irradiates exposure light onto the mask pattern of a photomask held on the mask stage;
A photo integrator that is disposed between the mask stage and the light source and uniformizes a luminance distribution of exposure light applied to the photo mask;
A condensing lens disposed between the mask stage and a photo integrator, which converts exposure light applied to the photo mask into parallel light;
An exposure apparatus comprising:
An imaging lens that is disposed between the photo integrator and the condenser lens, and forms an end face image of the photo integrator on the near side of the condenser lens;
A plurality of slits and a plurality of light-shielding areas are alternately arranged and arranged in the vicinity of the imaging position of the end face image of the photo integrator by the imaging lens, and is stopped during the exposure of the exposure object to the exposure area Then, the exposure area is irradiated with exposure light through one of the plurality of slits, and a portion between the exposure areas adjacent to each other outside the plurality of exposure areas is conveyed by the object to be exposed. The adjacent exposure area is moved in the direction opposite to the conveyance direction of the object to be exposed in synchronization with passing through the lower side of the pattern, and the adjacent light exposure area is located on the downstream side of the one slit in the movement direction. A shutter that blocks exposure light applied to a portion between
Exposure apparatus being characterized in that example Bei a.   The shutter is movable in a direction opposite to a conveying direction of the object to be exposed, and the same number of slits as the plurality of exposure regions of the object to be exposed are formed along the moving direction. 3. The exposure apparatus according to 1 or 2.