JP3348476B2 - Scanning exposure apparatus and scanning exposure method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[Table of Contents] The present invention will be described in the following order. Industrial Application Conventional Technology (FIG. 7) Problems to be Solved by the Invention Means for Solving the Problems (FIGS. 1, 3 to 5) Action (FIG. 2) Example (FIGS. 1 to 6) The invention's effect

[0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning exposure apparatus and a scanning exposure method, and is suitably applied to, for example, an apparatus for manufacturing a large liquid crystal display element.

[0003]

2. Description of the Related Art Conventionally, a scanning exposure apparatus of this type has a structure as shown in FIG. This scanning type exposure apparatus 1 uses an ultra-high pressure mercury lamp or the like as a light source 2, and condenses exposure light emitted from the light source 2 by an elliptical mirror 3, and then dichroics the collected exposure light. The light is reflected by the mirror 4 and guided to the wavelength selection filter 5. The wavelength selection filter 5 extracts only light having a wavelength required for exposure, and converts the transmitted light into a light beam having a uniform illuminance distribution by a fly-eye integrator 6.

[0004] This light beam is shaped into a slit shape by a blind 7 having a slit-shaped opening, and only the slit-shaped light beam passing through the opening is reflected toward the condenser lens 9 via the reflection mirror 8. It has been done. The condenser lens 9 forms the slit light beam on a reticle 10 and forms a pattern image on the reticle on a glass plate 12 via a projection lens 11. At this time, what is imaged on the glass plate 12 is a slit-like pattern image.
9 is an image of a part of a reticle pattern formed on 0. Therefore, the scanning type exposure apparatus 1 scans a slit-like light beam with a reticle stage 13 holding the reticle 10 and a plate stage 14 holding the glass plate 12 in synchronization with each other to form a reticle pattern formed on the reticle 10. Is transferred onto the glass plate 12.

[0005]

By the way, the scanning type exposure apparatus 1 has a period after the reticle 10 and the glass plate 12 are accelerated from the stationary state and shift to the uniform velocity movement (after shifting to the synchronous control state). Used for exposure. That is, the reticle 10 moving at a constant speed and the glass plate 1
The reticle stage 13 and the plate stage 14 are controlled so that 2 passes under the slit-like illumination area. After the entire area of the reticle 10 has passed through the lower part of the illumination area and the entire reticle pattern has been transferred to the glass plate 12, the reticle stage 13 and the plate stage 14 have been decelerated from a constant speed and stopped.

[0006] As described above, the acceleration period from the standstill state to the constant speed and the deceleration period from the constant speed to the deceleration state to the stationary state are not conventionally used for exposure, and are wasted for the entire time required for exposure. Time has come. Therefore, there was a problem that work efficiency was low and throughput was low. In addition, it is necessary to secure a distance required for acceleration and deceleration in addition to a distance required for the reticle stage 13 and the plate stage 14 to pass through the illumination area, in addition to a control stroke.

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and it is an object of the present invention to propose a scanning type exposure apparatus and a scanning exposure method which have a higher throughput and a shorter moving stroke which requires a stage. It is.

[0008]

To solve SUMMARY OF THE INVENTION The above problem, a scanning exposure apparatus according to claim 1, the illumination optical system for emitting a light beam and (2～6,8～9), the illumination optical system
(2-6, 8-9) , the original plate of the luminous flux (10)
Area setting means for setting an illumination area (AR) for the object
(21) The illumination area (AR) and the original plate during irradiation of the light beam
(10) and driving means (23) for relatively moving.
An image of the original sheet (10), a scanning exposure apparatus for transferring onto the original plate (10) a photosensitive substrate move synchronously with (12), the illumination area during acceleration and deceleration of the relative movement by drive means (23) An illumination area changing means (22 ) for driving the setting means (21) to change the illumination area (AR) ;
The step (23) and the illumination area changing means (22) are controlled synchronously.
Transfer the image of the original plate (10) onto the photosensitive substrate (12).
Period control means (25). The run according to claim 2
In the inspection type exposure apparatus, the original plate (1) of the photosensitive substrate (12) is used.
The synchronous movement with respect to (0) is different from that of the driving means (23).
The second driving means (24)
You. According to a third aspect of the present invention, there is provided a scanning exposure apparatus comprising:
Projection optical system for reducing and transferring an image to a photosensitive substrate (12)
(11). A scanning exposure apparatus according to claim 4, wherein the pattern of the original plate (10) is exposed on the substrate (12) by scanning the original plate (10) and the substrate (12) . The pattern of the original plate (10) is applied to the substrate (12) during at least one of the scanning acceleration and the deceleration.
Exposure means (21 to 25) for exposing to light ,
In at least one period, the exposure amount for the substrate (12) is
Equipped with exposure amount adjusting means (21, 22) for making it almost constant
I have. Scanning exposure apparatus according to claim 5, wherein the exposure adjustment means (21, 22) is provided with a master plate illumination area setting means variably sets the illumination area (10) (21). Claim
6. The scanning exposure apparatus according to item 6, wherein the original (10) is driven.
1 driving means (23) and a first driving means for driving the substrate (12).
Second driving means (24) different from the driving means (23)
And A scanning exposure apparatus according to a seventh aspect provides
Bright area setting means (21) and first driving means (23)
Control for synchronously controlling the second drive means (24)
Means (25). A scanning exposure method according to claim 8.
Law, pattern of the original plate (10) by scanning the original sheet (10) and the substrate (12) - at least one of a scanning exposure method for exposing a down to the substrate (12), and acceleration of the scanning and deceleration The pattern of the original plate (10) is applied to the substrate (12) during the period
Exposure, and at least one of acceleration and deceleration
The exposure amount to the substrate (12) during the period
Adjusting step. A scanning dew according to claim 9.
In the optical method, the step of adjusting the exposure amount to be almost constant is based on the
Step for scanning the plate (10) and the substrate (12) in synchronization
Includes The scanning exposure method according to claim 10,
The step of adjusting the exposure amount to be substantially constant is performed by the original plate (10).
The irradiation area of the exposure light for irradiating the substrate (10) and the substrate
Includes the step of changing in synchronization with (12)
You.

[0009]

[Action] scanning exposure apparatus according to claim 1, wherein the original plate (1
0) and an illumination area setting means for setting an illumination area (AR) during a period in which the photosensitive substrate (12) is accelerated and decelerated in synchronization with the photosensitive substrate (12).
(21) and the original plate (10) are synchronized by the synchronous control means (25).
By changing the size of the illumination area (AR) by synchronous driving, the original plate (1 ) transferred to the photosensitive substrate (12) is changed.
The exposure amount of the image of 0) can be set the same during acceleration / deceleration regardless of the position of the photosensitive substrate (12) . This makes the original plate
An acceleration / deceleration period, which is a period before and after the period (10) and the photosensitive substrate (12) move at a constant speed, can also be used for exposure, and the time required for exposure can be shortened as a whole. The scanning exposure apparatus according to claim 2, wherein the photosensitive substrate (1
The synchronous driving with the original plate (10) of 2) is performed by driving means (23).
The second driving means (24) different from
You. According to a third aspect of the present invention, there is provided a scanning exposure apparatus comprising:
The image is reduced on the photosensitive substrate (12) by the projection optical system (11).
Small transcription. According to a fourth aspect of the present invention, in the scanning type exposure apparatus, the exposure means (21 to 25) makes the exposure amount to the original plate (10) substantially constant during at least one of the scanning acceleration and the deceleration.
Then, the pattern of the original plate (10 ) is exposed on the substrate (12) . In the scanning exposure apparatus according to the fifth aspect , the illumination area setting means (21) variably sets the illumination area of the original plate (10) . According to a sixth aspect of the present invention, there is provided a scanning exposure apparatus comprising:
The original plate (10) is driven by the moving means (23), and the second drive
The substrate (12) is driven by the moving means (24). Contract
The scanning type exposure apparatus according to claim 7, wherein the synchronous control means (25)
Are the first driving means (23) and the second driving means (24)
Is controlled synchronously. The scanning exposure method according to claim 8 ,
Exposure amount during at least one of scanning acceleration and deceleration
Pattern of substantially constant to the original plate (10) and - down the substrate (1
2) Exposure. The scanning exposure method according to claim 9,
When making the exposure amount on the substrate (12) almost constant,
(10) and the substrate (12) are scanned synchronously.
The scanning exposure method according to claim 10, irradiates the original plate (10).
The illumination area (AR) of the exposure light to be changed
Change in synchronization with (12) to make exposure amount almost constant
I am adjusting.

[0010]

BRIEF DESCRIPTION OF THE DRAWINGS FIG.

In FIG. 1, in which parts corresponding to those in FIG. 7 are assigned the same reference numerals, reference numeral 20 denotes a scanning exposure apparatus as a whole, and the size of the opening of the blind 21 is synchronized with the reticle stage 13 and the plate stage 14. It has the same configuration except that it is movable. Thereby, the scanning type exposure apparatus 20 can use the acceleration period and the deceleration period which have not been used conventionally as the exposure period. In the case of this example, the light source 2, the elliptical mirror 3, the dichroic mirror 4, the wavelength selection filter 5, the fly-eye integrator 6, the reflection mirror 8, the condenser lens 9, and the projection lens 10 form an erecting unity optical system as a whole. are doing.

The blind 21 is driven and controlled by a blind control unit 22. Here, the blind control unit 22 is configured by a control circuit including a drive circuit and a micro computer, in addition to a position measurement digital micrometer, a motor and a drive mechanism. The blind controller 22 sets the opening width of the blind 21 to 0 to the full opening width (in the case of this embodiment,
10 [mm]). An area illuminated by the light beam transmitted through the opening is an illumination area AR.

The reticle stage 13 is driven and controlled by a reticle stage measurement controller 23. Here, the reticle stage measurement control unit 23 has the same configuration as the blind control unit 22 except that the position measurement unit is a position measurement laser interferometer. The plate stage 14 is driven and controlled by a plate stage measurement control unit 24. The plate stage measurement control unit 24 is a reticle stage measurement control unit 2
3 has the same configuration as that of FIG.

The three control units, namely, the blind control unit 22, the reticle stage measurement control unit 23, and the plate stage measurement control unit 24 are controlled by a synchronization control unit 25 constituted by a control circuit composed of, for example, a micro computer. Each is driven synchronously.

In the above configuration, the scanning exposure apparatus 20
Will be described. Here, the scanning exposure apparatus 20 starts exposure simultaneously with the start of acceleration of the reticle stage 13 and the plate stage 14 in a stationary state,
At this time, the blind 21 is driven in the scanning direction at a constant acceleration corresponding to the acceleration of the reticle stage 13 and the plate stage 14 to open the opening. This situation is shown in FIGS.
This will be described with reference to FIG.

Here, FIG. 2 shows the position during a period from when the blind 21 which has started accelerating at the same time as the reticle stage 13 and the plate stage 14 reaches the full open width and stops, and thereafter each point of the reticle 10 and the plate 12 is exposed. This is a schematic representation of the relationship. FIG. 3 shows a point P on the reticle 10 and the glass plate 12 at that time.
0 and the speed and position of, the representative of the speed and position of the points b ₀ on the blind 21 illustrates an each part of the exposure time and the like at the point P0 to P3 on the reticle 10 and glass plate 12.

However, the exposure conditions are controlled so that the exposure time at each point of the glass plate 12 exposed by one exposure operation is 0.1 [second] regardless of the location. Further, the blind 21, the reticle 10, and the glass plate 12 in the initial state are arranged in a positional relationship shown in FIG. That is, the blind 21
Is a state in which the opening is closed, and one end of the reticle 13 and one end of the glass plate 14 are arranged at a position corresponding to immediately below the opening in the closed state.

First, the synchronization control unit 25 is controlled by the blind control unit 2
2. At the same time, an exposure start command is given to the reticle stage measurement control unit 23 and the plate stage measurement control unit 24. However, the drive start timing of the reticle stage 13 and the plate stage 14 is slightly delayed with respect to the blind 21 as long as no error occurs, in order to prevent the danger of the point P0 not being exposed due to the synchronization deviation of the blind 21, the reticle 10 and the glass plate 12. There is a need.

Upon receiving this command, the blind controller 22 controls the blind 21 to move the reticle 1 as shown in FIG.
0 and accelerate at the same constant acceleration as the glass plate 12,
The opening is moved from the closed state to the opening in the scanning direction. Here FIG. 3 (C) is a representation connexion with the time axis a moving speed of the opening-side end point b ₀ of the movable blind of blind 21 on the horizontal axis. As can be seen from the figure, in this example, the end point b ₀ is by connexion accelerated acceleration of 1000 [mm / s ^2]. The vertical axis represents the distance from the initial position of the end point b ₀ of the blind 21 driven in this way, as shown in FIG.
A locus as shown in (D) is drawn.

The reticle stage measurement control unit 23 and the plate stage measurement control unit 24 are, as shown in FIG.
Reticle 10 and glass plate 12 are the same
It accelerates at 1000 [mm / s ² ] while maintaining the synchronous control state, and passes through the illumination area AR. At this time, reticle 1
If the distance from the initial position at 0 and the point P0 on the glass plate 12 is represented on the vertical axis, a locus as shown in FIG. 3B is drawn.

From the start of the exposure, 0.1%
When [sec] has elapsed, the blind 21, the reticle 10
And the glass plate 12 reaches a maximum speed of 100 [mm / s]. At this time, the opening width of the blind is 5 [mm], which is just half of the full opening width (FIG. 2 (B)). After this point,
The reticle 10 and the glass plate 12 travel at a constant speed, and shift to a synchronous control state at a constant speed. On the other hand, after the elapse of 0.1 [sec], the blind 21 has an acceleration characteristic -1000 opposite to the acceleration period (0 [sec] to 0.1 [sec]).
It is decelerated at [mm / s ² ]. And 0.2 from exposure start
It stops when [sec] has elapsed. Blind 2 at this point
The opening width of No. 1 becomes the full opening width (FIG. 2C).

By the way, the exposure amount in each area during these periods is constant irrespective of the positions of the reticle 10 and the glass plate 12 (FIGS. 3E to 3H). Here, the hatched portion in FIG. 3E indicates the time during which the point P0 at the right end of the reticle 10 and the glass plate 12 is irradiated with illumination light and exposed. As can be seen from this figure, the point P0 on the right end is 0.1 mm between the reticle 10 and the glass plate 12.
Until [sec], the illumination light is emitted because it moves at the same acceleration as the blind 21, but thereafter, the blind 21 starts to decelerate, so that the point P0 passes the opening of the blind 21 and the illumination light is It turns out that it is not hit. Therefore, the time of being illuminated by the illumination light is 0.1 [second].

FIG. 3 (F), FIG. 3 (G), FIG. 3 (H)
The shaded areas of the points P1, P2, and P3 located inside 2 mm, 3 mm, and 6 mm from the right ends of the reticle 10 and the glass plate 12, respectively, are irradiated with illumination light. Represents the time being. Exposure of each point starts when each point reaches the end of the fixed blind, and ends when each point overtakes the end of the movable blind. Exposure light is not applied after [sec]. Each point P
It has been confirmed that the exposure amount is the same for all points between P1, P2 and P3.

Assuming that the distance from the right end of the glass plate 12 is x [mm], time t0 at which each point starts exposure.
[Second] is the following formula

(Equation 1) as well as

(Equation 2) Can be obtained by Therefore, in the case of this example, the illumination start time of each point P0, P1, P2, and P3 is obtained from the equation (2).
0 (second), 0.063 (second), 0.077 (second) and 0.11 (second)
It turns out that it is.

After the opening width of the blind 21 reaches the full opening width (10 [mm]), the opening width of the blind 21 is maintained at the full opening width. At this time, since the reticle 10 and the glass plate 12 have already moved at a constant speed of 100 [mm / s], the scanning type exposure apparatus 20 is located at least 5 [mm] inward from the right ends of the reticle 10 and the glass plate 12. Each point of the reticle 10 and the glass plate 12 is 5 mm
In each case, the illumination area AR is set to 0.1
[Second], the exposure light is irradiated during this time.

When a point 15 mm from the left end of the reticle 13 and the glass plate 14 that continues to move at a constant speed reaches the end of the illumination area, the scanning exposure apparatus 20 moves the reticle 10
Then, while maintaining the constant velocity movement of the glass plate 12, the blind 21 starts accelerating in the closing direction (the direction opposite to the constant velocity movement direction) (FIG. 4C). Here, FIG.
4A to FIG. 4D are FIGS. 3A to 3D, respectively.
FIG. 4A shows the moving speed of the point b ₀ on the reticle 10 and the glass plate 12, and FIG.
_It represents the passing position of ₀ . Similarly, FIG. 4C shows the moving speed of the point P0 on the blind 21 and FIG. 4D shows the passing position of the point P0.

Thereafter, when a point 5 mm from the left end of the reticle 10 and the glass plate 12 reaches the end of the illumination area, the scanning exposure apparatus 20 stops moving the reticle 10 and the glass plate 12 at a constant speed. The process shifts to deceleration control at a constant acceleration (FIG. 4A). On the other hand, the blind 2 which reached the highest speed (-100 [mm / s]) by the acceleration in the previous period 2
1 starts deceleration by a constant acceleration at this time. The magnitude of the acceleration at this time is the same for the blind 21, the reticle 10, and the glass plate 12. When the left ends of the reticle 10 and the glass plate 12 reach the ends of the illumination area AR and stop, the blind 21
Is closed.

After the blind 21 starts to close as described above, the relationship between each point of the reticle 10 and the glass plate 12 passing through the illumination area AR and the exposure amount is as shown in FIG. 3 (E) to FIG. 3 (H). It can be considered that the relationship is the same when the axis is viewed in the opposite direction, and the exposure amount at each point is 0.1 [sec].
Thus, during the acceleration period and the deceleration period, the glass plate 12 can be exposed at the same exposure amount as the exposure amount during the constant speed movement.

According to the above configuration, the blind 21 is driven to open and close in synchronization with the reticle 10 and the glass plate 12, and the size of the opening of the blind 21 is controlled to change during exposure. The pattern on the reticle 10 can be transferred onto the glass plate 12 not only during the constant-speed movement of the plate 12 but also during acceleration / deceleration. As a result, the time required for one exposure operation can be reduced as compared with the related art, and the throughput can be further improved. In addition, the distance required for the strokes of the reticle 10 and the glass plate 12 can be further reduced.

In the above-described embodiment, the case where the optical system between the blind 21, the reticle 10, and the glass plate 12 is an erecting equal-magnification optical system has been described. However, the present invention is not limited to this. The present invention is also applicable to the case of optical systems having different magnifications.

In the above-described embodiment, the irradiation time corresponding to the exposure amount is set to 0.1 [second] and the blind 21
Although the case where the full opening width is set to 10 mm is described, the present invention is not limited to this, and the irradiation time may be longer or shorter than 0.1 second, and the full opening width may be wider or narrower than 10 mm. Good. In this case, the acceleration / deceleration time and the maximum speed of each of the blind 21, the reticle 10, and the glass plate 12 may be set according to the conditions.

Further, in the above-mentioned embodiment, a case is described in which the blind 21 is accelerated from a stationary state at a constant acceleration of 1000 [mm / s ² ], and is decelerated at a constant acceleration after reaching the maximum speed. However, the present invention is not limited to this, and the speed of the blind 21 may be controlled based on another acceleration curve. For example, when accelerating the reticle 10 and the glass plate 12 based on a velocity curve as shown in FIG. 5A so that the acceleration changes smoothly, the blind 21 is accelerated with a velocity curve as shown in FIG. 5B. You may. At this time, the acceleration of the blind 21 is set to an acceleration characteristic that is inverted at the time when the opening is opened to half the full opening width. Incidentally, the acceleration characteristic curve of the blind 21 is the same as the acceleration characteristic during the period from when the reticle 10 and the glass plate 12 shift from the stationary state to the constant speed operation.

Further, in the above-described embodiment, the case where the pattern formed on the reticle 10 is transferred onto the glass plate 12 using the scanning exposure apparatus 20 has been described. However, the present invention is not limited to this. The present invention can also be applied to a peripheral exposure apparatus for exposing an unexposed resist remaining in a peripheral portion (a blank portion) of the plate 14. For example, the present invention can be applied to the case where the long side of the rectangular glass plate 30 shown in FIG. 5 is exposed by the spot irradiation areas SP1 and SP2.

Further, in the above-described embodiment, the case where the blind 21 is disposed between the fly-eye integrator 6 and the reflection mirror 7 has been described. However, the present invention is not limited to this, and the reflection mirror 7 and the condenser lens 9 may be disposed. May be arranged in the middle.

[0035]

Effects of the Invention above scanning exposure apparatus according to claim 1, wherein as the driving and the original plate illumination area setting means during acceleration and deceleration of the original plate and the photosensitive substrate in synchronism in the movement by the synchronization control means synchronously <br/> Moving and changing the size of the illumination area, the original image is exposed on the photosensitive substrate with the same exposure amount as during the constant speed movement even during acceleration / deceleration when the original plate and the photosensitive substrate are not moving at a constant speed. be able to. Thereby, the throughput can be further improved. The scanning exposure according to claim 2.
The apparatus has a second configuration in which the synchronous driving of the photosensitive substrate is different from the driving unit.
Of the original plate and the photosensitive substrate
Can be driven by different driving means. Contract
The scanning exposure apparatus according to claim 3, wherein the image of the original plate is formed on a photosensitive substrate.
Since it has a projection optical system that reduces and transfers
Can be reduced and transferred onto the photosensitive substrate. Contract
Scanning exposure apparatus Motomeko 4 described, the exposure adjustment unit to the exposure means at least one period of the acceleration and deceleration of the scan
The exposure amount is adjusted to expose the pattern of the original to the substrate.
The exposure amount during the constant speed movement period with
Come, it is possible to shorten the exposure time. In the scanning exposure apparatus according to the fifth aspect, the illumination area setting means can variably set the illumination area of the original plate. The scanning type according to claim 6.
The exposure apparatus includes a first driving unit and a second driving unit.
Drive the original plate and substrate independently.
Can be. According to a seventh aspect of the present invention, in the scanning type exposure apparatus,
Control means, the first drive means and the second drive means
Means can be controlled synchronously. In the scanning exposure method according to the eighth aspect, the pattern of the original plate is exposed on the substrate while the exposure amount on the substrate is kept substantially constant during at least one of the acceleration and the deceleration of the scanning, so that the exposure time is shortened. be able to. According to a ninth aspect of the present invention, there is provided a scanning exposure method comprising:
Exposure to substrate during at least one of speed and deceleration
The original and substrate are scanned synchronously with the amount almost constant.
Scanning exposure during scanning acceleration / deceleration period.
You. In the scanning exposure method according to the tenth aspect, the original plate is irradiated.
Change the illumination area of the exposure light in synchronization with the original plate and substrate.
At least one of scanning acceleration and deceleration
The exposure amount to the substrate can be adjusted almost constant
You.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing an embodiment of a scanning exposure apparatus according to the present invention.

FIG. 2 is a schematic diagram illustrating a positional relationship between a blind, a reticle, and a glass plate.

FIG. 3 is a schematic diagram illustrating a positional relationship between a blind, a reticle, and a glass plate.

FIG. 4 is a timing chart for explaining acceleration / deceleration characteristics.

FIG. 5 is a characteristic curve diagram for explaining another embodiment.

FIG. 6 is a schematic plan view for explaining another embodiment.

FIG. 7 is a schematic diagram for explaining a conventional scanning type exposure apparatus.

[Explanation of symbols]

1, 20 scanning exposure apparatus, 2 light source, 3 elliptical mirror, 4 dichroic mirror, 5 wavelength selective filter, 6 fly-eye integrator, 7, 21
Blind, 8 Reflecting mirror, 9 Condenser lens, 10 Reticle, 11 Projection lens, 12, 3
0: glass plate, 13: reticle stage, 1
4 ... Plate stage, 22 ... Blind control unit,
23: reticle stage measurement control unit, 24: plate stage measurement control unit, 25: synchronization control unit, AR ...
Illumination area, SP1, SP2 ... Spot irradiation area.

──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-2-65222 (JP, A) JP-A-4-196513 (JP, A) JP-A-3-120712 (JP, A) JP-A-1- 243519 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01L 21/027

Claims (10)

(57) [Claims] An illumination optical system that emits a light beam; an illumination area setting unit that is disposed in the illumination optical system and sets an illumination area of the light beam with respect to an original plate; A driving unit that relatively moves the original plate, and a scanning type exposure apparatus that transfers an image of the original plate onto a photosensitive substrate that moves in synchronization with the original plate, wherein during the acceleration and deceleration of the relative movement by the driving unit, and illumination region changing means for changing the illumination area by driving the illumination area setting means, and said drive means during the acceleration or deceleration and the illumination region changing means
And a synchronous control means for synchronously controlling the transfer of the image of the original plate onto the photosensitive substrate. 2. The synchronous transfer of the photosensitive substrate to the original plate.
The movement is performed by a second driving unit different from the driving unit.
2. The scanning exposure apparatus according to claim 1, wherein the scanning exposure is performed. 3. An image on the original plate is reduced on the photosensitive substrate.
And a projection optical system for transferring the image.
3. The scanning exposure apparatus according to 1 or 2 . 4. The method according to claim 1, wherein the scanning is performed on the original plate and the substrate.
A scanning exposure apparatus for exposing a pattern of an original onto the substrate.
In at least one of the acceleration and deceleration of the scanning,
Exposing means for exposing the pattern of the original onto the substrate; and exposing the substrate during at least one of the acceleration and the deceleration.
Exposure amount adjusting means for making the exposure amount for
A scanning type exposure apparatus characterized in that: 5. An exposure amount adjusting means for illuminating the original plate.
The scanning exposure apparatus according to claim 4, further comprising illumination area setting means for variably setting an area . 6. A first driving means for driving the original plate;
A second driving means different from the first driving means for driving the substrate;
5. The driving means according to claim 4,
Or a scanning exposure apparatus according to 5. 7. An illumination area setting means, comprising:
Synchronous control for synchronously controlling the driving means and the second driving means.
7. The running device according to claim 6, further comprising control means.
Inspection type exposure equipment. 8. The scanning of an original plate and a substrate,
In a scanning exposure method for exposing a pattern of an original plate to a substrate
Te, wherein the at least one period of the acceleration and deceleration of the scanning
Exposing a pattern of an original to the substrate; and exposing the substrate to the substrate during at least one of the acceleration and the deceleration.
Adjusting the exposure dose to be substantially constant.
A scanning exposure method. 9. A step for adjusting the exposure amount to be substantially constant.
A step of scanning the original plate and the substrate in synchronization with each other.
9. The scan of claim 8, wherein the scan includes a tip.
Exposure method. 10. A step for adjusting the exposure amount to be substantially constant.
The illumination area of the exposure light for irradiating the original plate is
Changing in synchronization with the original plate and the substrate
10. The scanning exposure device according to claim 8, wherein
Light method.