JP3601174B2 - Exposure apparatus and an exposure method - Google Patents

Exposure apparatus and an exposure method Download PDF

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JP3601174B2
JP3601174B2 JP8580996A JP8580996A JP3601174B2 JP 3601174 B2 JP3601174 B2 JP 3601174B2 JP 8580996 A JP8580996 A JP 8580996A JP 8580996 A JP8580996 A JP 8580996A JP 3601174 B2 JP3601174 B2 JP 3601174B2
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beam
light beam
illuminance
light
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JPH09251208A (en
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智弘 勝目
典彦 原
政光 柳原
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株式会社ニコン
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Description

【0001】 [0001]
【発明の属する技術分野】 BACKGROUND OF THE INVENTION
本発明は露光装置及び露光方法に関し、例えば液晶表示装置を製造するための感光基板に大面積のパターンを露光する際に適用し得る。 The present invention is applicable when exposing relates exposure apparatus and an exposure method, for example, a pattern of large area photosensitive substrate for manufacturing a liquid crystal display device.
【0002】 [0002]
【従来の技術】 BACKGROUND OF THE INVENTION
従来、感光基板に大面積のパターンを露光する際には、所望の面積に達するまで部分パターンを繰り返し露光していた。 Conventionally, when exposing a pattern of a large area on the photosensitive substrate, it was exposed repeatedly to the partial pattern until the desired area. 一方、液晶表示装置を製造するための感光基板は、近年大面積化が所望されている。 On the other hand, a photosensitive substrate for manufacturing a liquid crystal display device has recently large area is desired. このため露光装置に対しては、単位時間当たりの露光領域の拡大が望まれていた。 For this reason the exposure apparatus, the expansion of the exposure area per unit time has been desired. この単位時間当たりの露光領域を拡大するため、複数の投影光学系を備えた走査型露光装置が提案されている。 To enlarge the exposure area per unit time, the scanning exposure apparatus has been proposed which includes a plurality of projection optical systems.
【0003】 [0003]
この走査型露光装置は、複数の照明光学系が設けられており、それぞれの照明光学系から射出された光束でマスク上の異なる小領域(照明領域)をそれぞれ照明する。 The scanning exposure apparatus, a plurality of illumination optical system is provided to illuminate different small areas on the mask with light beams emitted from each of the illumination optical system (illumination area), respectively. 因みに、この走査型露光装置の照明光学系は、光源から射出されフライアイレンズ等を含む光学系を介して光量を均一化した光束を視野絞りによつて所望の形状に整形してマスクのパターン面上を照明する。 Incidentally, the illumination optical system of the scanning type exposure apparatus, to shape the light beam homogenizing the light intensity through the optical system including a emitted from the light source fly-eye lens or the like by connexion desired shape field stop mask pattern to illuminate the Menjo.
続いてこの走査型露光装置は、照明されたマスク上のパターン像を複数の投影光学系のそれぞれを介して感光基板上の異なる投影領域に投影して結像する。 Then the scanning exposure apparatus, forms an image by projecting each of the different projection regions on the photosensitive substrate through the pattern image on the illuminated mask plurality of projection optical systems. この走査型露光装置は、マスクと感光基板とを同期して、照明光学系及び投影光学系に対して走査して、マスク上のパターン領域の全面を感光基板上に転写する。 The scanning exposure apparatus, in synchronism with the mask and the photosensitive substrate, by scanning with respect to the illumination optical system and the projection optical system to transfer the entire surface of the pattern area on the mask onto the photosensitive substrate.
【0004】 [0004]
【発明が解決しようとする課題】 [Problems that the Invention is to Solve
ところで、感光基板にマスク上のパターンを転写する際のレジストの露光量には適正値がある。 Meanwhile, there is a proper value in the resist exposure amount at the time of transferring the pattern on the mask onto a photosensitive substrate. 露光量は光源から射出された光束の照度と露光時間との積すなわち露光量=基板面上の露光照度×露光時間で表される。 Exposure is represented by the exposure intensity × exposure time on the product i.e. exposure amount = substrate surface between the illuminance and exposure time of the light beam emitted from the light source. 光源から射出された光束の照度は光源の輝度に比例して増減する。 Illuminance of the light flux emitted from the light source is increased or decreased in proportion to the luminance of the light source. また光源の輝度は、使用初期に最大であり使用時間に応じて減少する。 The luminance of the light source is reduced in accordance with the maximum and is used time used initially.
このため光源の輝度が大きい場合、上述の走査型露光装置は、露光時間を短くするため、マスク及び基板の走査速度を上げる必要がある。 If the luminance of this for the light source is large, the above scanning exposure apparatus, in order to shorten the exposure time, it is necessary to increase the mask and scanning speed of the substrate. これに対して、光源の輝度が小さくなると、上述の走査型露光装置は、感光基板上のレジストに対して一定露光量を得るように走査速度を下げる必要が有る。 In contrast, when the luminance of the light source is small, the above-described scanning exposure apparatus, should there to lower the scanning speed to obtain a constant exposure of a resist on the photosensitive substrate.
【0005】 [0005]
ところが、光源の輝度は製造誤差により一般的に不均一である。 However, the brightness of the light source is generally non-uniform due to a manufacturing error. また照明光学系及び投影光学系に対するマスク及び基板の走査速度は、制御系の特性により一般に上限が有る。 The scanning speed of the mask and the substrate relative to the illumination optical system and the projection optical system is generally the upper limit is present due to the characteristics of the control system. すなわち走査速度だけの制御によつて露光時間を短くするには限界が有る。 That limitation is present to reduce the by connexion exposure time control only the scanning speed.
このため、上限の走査速度によつて対応できない程に光源の輝度が大き過ぎると、上限の走査速度による露光時間と適正露光に必要な走査速度による露光時間との差分が過剰露光時間となつて、マスクのパターンを感光基板に正確に転写できなくなるという問題があつた。 Therefore, such the luminance of the light source is too large to the extent that can not be due connexion corresponding to the scanning speed of the upper limit, the difference is excessive exposure time and exposure time by the scanning speed required exposure time and proper exposure by the scanning speed of the upper connexion , a problem that the pattern of the mask can not be accurately transferred to the photosensitive substrate has been made.
【0006】 [0006]
本発明は以上の点を考慮してなされたもので、照明光学系に対する感光基板の走査速度の制御だけで露光量を適切値に調節できない程に光源の輝度が過大であつても、感光基板に適正な露光量を与え得る露光装置及び露光方法を提案しようとするものである。 The present invention has been made in view of the above, even if the brightness of the light source is filed excessive enough not to adjust the exposure to the appropriate value by controlling the scanning speed of the photosensitive substrate relative to the illumination optical system, a photosensitive substrate is intended to propose an exposure apparatus and an exposure method can provide a proper exposure amount.
【0007】 [0007]
【課題を解決するための手段】 In order to solve the problems]
かかる課題を解決するために、一実施例を表す図2に対応付けて説明すると、請求項1に記載の露光装置では、複数の超高圧水銀ランプ10からそれぞれ射出された複数の光束L6 〜L8 を光ガイド14によつて集光した後に光ガイド14によつて分割して得た複数の光束L1 〜L5 によつて、パターンが形成されたマスク上の互いに異なる複数の照明領域M1〜M5をそれぞれ照明する照明光学系2と、複数の照明領域M1〜M5に対応して配置された複数の投影光学系4A〜4Eとを有し、複数の照明領域M1〜M5のそれぞれの像を複数の投影光学系4A〜4Eのそれぞれを介して感光基板5上に投影する露光装置において、複数の超高圧水銀ランプ10が射出したそれぞれの光束L6 〜L8 を開口率で規制する複数のシヤツタ1 In order to solve such a problem, one will be described in association with FIG. 2 illustrates an embodiment, in an exposure apparatus according to claim 1, a plurality of light beams L6 emitted from a plurality of ultra-high pressure mercury lamp 10 through L8 Yotsute a into a plurality of light beams L1 ~L5 obtained by by connexion divided into the light guide 14 after have been conducted under condensing the light guide 14, a plurality of illumination regions M1~M5 different from each other on a mask on which a pattern is formed an illumination optical system 2 for illuminating each of a plurality of projection optical systems 4A~4E arranged corresponding to the plurality of illumination regions M1 to M5, each of images of the plurality of illumination regions M1 to M5 more in an exposure apparatus for projecting onto the photosensitive substrate 5 through the respective projection optical systems 4A - 4E, a plurality of shutter 1 which regulates multiple of each ultra-high pressure mercury lamp 10 is emitted a light beam L6 through L8 by an aperture と、光束L1 〜L5 の照度を検出する光検出素子21と、照度信号S1〜S5に基づいて、複数のシヤツタ12によるそれぞれの開口率と、複数の光束L1 〜L5 の照度とを対応付けて照度データS6として記憶するメモリ23と、メモリ23に記憶した照度データS6に基づいて、 光束L 〜L の照度が所定値となるように、光束L 〜L 中の任意の光束成分を射出している超高圧水銀ランプ10が射出する光束L 〜L を開口率で規制するようにシヤツタ12を制御する制御部22とを設けるようにする。 When a photodetector element 21 for detecting the illuminance of the light beam L1 ~L5, based on the illumination signal S1-S5, in association with each of the opening ratio of a plurality of shutter 12, and a luminance of the plurality of light beams L1 ~L5 a memory 23 for storing the luminance data S6, based on the illuminance data S6 which is stored in the memory 23, as the illuminance of the light beam L 1 ~L 5 becomes a predetermined value, any light beam components in the light beam L 1 ~L 5 injection to have extra-high pressure mercury lamp 10 to be provided and a control unit 22 for controlling the shutter 12 to regulate the light beam L 6 ~L 8 for emitting at the opening rate.
【0008】 [0008]
請求項2に記載の露光装置では、光ガイド14は、複数の光フアイバを束ねて構成されている。 In the exposure apparatus according to claim 2, the light guide 14 is constituted by bundling a plurality of optical fibers.
請求項3に記載の露光装置では、シヤツタ12は、光束L 〜L を通過させる開口部の開口率を制御して、光束L 〜L を規制する。 In the exposure apparatus according to claim 3, shutter 12 controls the opening ratio of the opening for passing the light beam L 6 ~L 8, to regulate the luminous flux L 6 ~L 8.
請求項4に記載の露光装置では、複数の投影光学系4A〜4Eの一部4A、4C及び4Eは、光軸がY方向に沿つて一列に配置されており、複数の投影光学系4A〜4Eの他の一部4B及び4Dは、光軸が複数の投影光学系の一部4A、4C及び4Eと平行に、かつ所定間隔をおいて一列に配置されており、Y方向とほぼ直交し、かつ感光基板5の面内方向にマスク3と感光基板5とを同期して走査する。 In the exposure apparatus according to claim 4, a part of the plurality of projection optical system 4A - 4E 4A, 4C and 4E, the optical axis is disposed along connexion a line in the Y direction, the plurality of projection optical system 4A~ another portion 4B and 4D of 4E, a portion the optical axis of the plurality of projection optical system 4A, parallel to 4C and 4E, and are arranged in a line at predetermined intervals, and substantially perpendicular to the Y direction and scanning in the plane direction of the photosensitive substrate 5 in synchronization with the mask 3 and the photosensitive substrate 5.
【0009】 [0009]
請求項5に記載の露光装置では、第1及び第2の超高圧水銀ランプ10からそれぞれ射出された光束L 及びL を光ガイド14によつて集光した後に光ガイド14によつて分割して得た第1及び第2の光束L 及びL によつて、パターンが形成されたマスク5上の互いに異なる第1及び第2の照明領域M1及びM2をそれぞれ照明し、第1及び第2の照明領域M1及びM2のそれぞれの像を第1及び第2の投影光学系4A及び4Bをそれぞれ介して感光基板5上に投影する露光方法において、第1の超高圧水銀ランプ10から射出された光束L を開口率で規制する第1のシヤツタ12による光束L に対する開口率毎に、第1及び第2の光束L 及びL の照度を検出する第1の処理と、第2の超高圧水銀ランプ10から射出さ In the exposure apparatus according to claim 5, by connexion divided into the light guide 14 after the first and second light fluxes emitted respectively from the ultra-high pressure mercury lamp 10 L 6 and L 7 and by connexion condensing the light guide 14 Yotsute the light beam L 1 and L 2 the first and second obtained by the first and second illumination areas M1 and M2 differ from each other on the mask 5 in which a pattern is formed by illuminating each first and the exposure method for projecting a respective image of the second illumination region M1 and M2 of the first and second projection optical systems 4A and 4B onto the photosensitive substrate 5 via respectively emitted from the first ultra-high pressure mercury lamp 10 for each opening ratio for the light flux L 6 of the first shutter 12 to regulate the light beam L 6, which is by an aperture, a first processing for detecting the first and second illumination intensity of the light beam L 1 and L 2, the injection of ultra-high pressure mercury lamp 10 of 2 た光束L を開口率で規制する第2のシヤツタ12による光束L に対する開口率毎に、第1及び第2の光束L 及びL の照度を検出する第2の処理と、第1及び第2の処理による照度信号S1及びS2に基づいて、第1及び第2のシヤツタ12によるそれぞれの開口率と、第1及び第2の光束L 及びL の照度とを対応付けて照度データS6として記憶する第3の処理と、パターンを感光基板5上に投影する際に、第1及び第2の光束L 及びL の照度を均一にするよう、第3の処理による照度データS6に基づいて、第1及び第2のシヤツタ12を制御する第4の処理とを設ける。 And for each opening with respect to light flux L 7, second process of detecting the first and second illumination intensity of the light beam L 1 and L 2 of the second shutter 12 to the light beam L 7 is regulated by the aperture rate, the first and on the basis of the illuminance signals S1 and S2 according to the second process, the illumination in association with each of the opening ratio of the first and second shutters 12, and first and second light beams L 1 and L 2 illuminance a third process of storing as data S6, when projecting the pattern onto the photosensitive substrate 5, so as to equalize the first and second illumination intensity of the light beam L 1 and L 2, the illuminance data of the third process based on S6, providing a fourth process of controlling the first and second shutter 12.
【0010】 [0010]
【発明の実施の形態】 DETAILED DESCRIPTION OF THE INVENTION
以下図面について、本発明の一実施例を詳述する。 For it is described with reference to the accompanying drawings an embodiment of the present invention.
【0011】 [0011]
図1は全体として走査型露光装置1を示し、大面積のパターンを一次元の走査だけで露光する。 Figure 1 shows a scanning exposure apparatus 1 as a whole, to expose a pattern having a large area with only scan one-dimensional. 走査型露光装置1は、照明光学系2から照度を均一化した5つの光束L 〜L を射出し、この光束L 〜L によつてマスク3上のそれぞれ異なる小さな照明領域M1〜M5を照明する。 Scanning exposure apparatus 1, the five light beams L 1 ~L 5 that uniform illumination from the illumination optical system 2 is injected, different small illumination area M1~ on Yotsute mask 3 on the light beam L 1 ~L 5 M5 to illuminate the. 走査型露光装置1は、マスク3を透過した複数の光束をそれぞれ異なる投影光学系4A〜4Eを介して、液晶表示装置を製造するための感光基板5上に投影して、異なる5つの投影領域P1〜P5に照明領域M1〜M5のパターン像を結像させる。 Scanning exposure apparatus 1 via a different projection optical system 4A~4E a plurality of light beams passing through the mask 3, are projected onto the photosensitive substrate 5 for manufacturing a liquid crystal display device, five different projection region P1~P5 to image the pattern image of the illuminated region M1~M5 to.
【0012】 [0012]
因に、感光基板5上の投影領域P1〜P5は、隣り合う投影領域(例えばP1とP2、P2とP3)がX方向に互いに所定距離隔てられていると共に、隣り合う投影領域の端部同士がX方向と直交したY方向に重複するように配置されている。 In this connection, the projected region P1~P5 on the photosensitive substrate 5, together with the projection region adjacent (e.g. P1 and P2, P2 and P3) are separated a predetermined distance from one another in the X direction, the end portion of the projection area adjacent to each other There are arranged to overlap in the Y direction orthogonal to the X direction. このため、投影光学系4A〜4Eもそれぞれの投影領域P1〜P5の配置に対応してX方向に所定距離隔てられていると共に、Y方向に重複して配置されている。 Therefore, the are separated a predetermined distance in the X direction corresponding projection optical system 4A~4E to the arrangement of each of the projection area P1 to P5, it is arranged overlapping in the Y direction.
【0013】 [0013]
投影光学系4A〜4Eはいずれも等倍正立系であり、その配置はマスク3上の照明領域M1〜M5と同じ配置となる。 Projection optics 4A~4E are both equal magnification erect system, their arrangement is the same arrangement as the illumination region M1~M5 on the mask 3. 従つて、照明領域M1〜M5のパターン像が結像される投影領域P1〜P5の配置は照明領域M1〜M5と同様である。 Accordance connexion, the arrangement of the projection area P1~P5 which the pattern image of the illuminated region M1 to M5 is imaged is the same as the illumination region M1 to M5. 照明光学系2の光束L 〜L の光軸の平面配置は、マスク3上の照明領域M1〜M5と同様に配置されている。 Planar arrangement of the optical axis of the light beam L 1 ~L 5 of the illumination optical system 2 is arranged similarly to the illumination area M1~M5 on the mask 3.
【0014】 [0014]
マスク3と感光基板5とは互いに対面した状態でステージ保持台6に一体に保持されている。 They are held together on the stage holding table 6 in a state of facing each other with the mask 3 and the photosensitive substrate 5. これによりマスク3と感光基板5とは、相互の位置が一定となるように機械的に結合されていることになる。 Thus the mask 3 and the photosensitive substrate 5, so that the mutual positions are mechanically coupled so as to be constant. ステージ保持台6には、走査方向(X方向)に長ストロークで駆動する駆動装置が設けられている。 The stage holding table 6, the scanning direction (X direction) drive is provided for driving a long stroke.
走査のとき走査型露光装置1は、この駆動装置によつてステージ保持台6をX方向へ駆動して、マスク3及び感光基板5を照明光学系2及び投影光学系4A〜4Eに対して一次元に同期走査させる。 Scanning exposure apparatus 1 when the scanning is primary with respect to drive the Yotsute stage holding table 6 in the X direction with the driving unit, the mask 3 and the photosensitive substrate 5 the illumination optical system 2 and the projection optical system 4A~4E to scan synchronization to the original. この同期走査によつてマスク3におけるパターン領域3Aの全面の像を感光基板5の感光面5Aに転写することができる。 The entire image of the pattern area 3A in by connexion mask 3 to the synchronous scanning can be transferred to the photosensitive surface 5A of the photosensitive substrate 5.
【0015】 [0015]
マスク3はステージ保持台6上に配置されたマスクステージ7に支持されており、複数の微動アクチユエータ(図示せず)によつてマスク3の面内方向の任意の位置に位置決めされる。 Mask 3 is supported by the mask stage 7 disposed on the stage holding table 6, is positioned at an arbitrary position in the plane direction of Yotsute mask 3 into a plurality of fine movement actuator (not shown). これにより、走査型露光装置1は、この微動アクチユエータで位置決めして、投影光学系4A〜4Eに対するステージ保持台6の傾きに起因したパターン像の位置ずれを補正することができる。 Accordingly, the scanning type exposure apparatus 1 is positioned at this fine motion actuator, the positional deviation of the pattern image due to the inclination of the stage holding table 6 with respect to the projection optical system 4A~4E can be corrected.
【0016】 [0016]
図2に示すように、照明光学系2は、例えば3つの超高圧水銀ランプ10が配設されており、この超高圧水銀ランプ10からそれぞれ射出された光束L 〜L を楕円鏡11、シヤツタ12、レンズ系13を介して、複数の光フアイバを束ねて構成された光ガイド14に入射して集光する。 As shown in FIG. 2, the illumination optical system 2, for example, three ultra-high pressure mercury lamp 10 is disposed, the ultra-high pressure mercury light beam emitted from each lamp 10 L 6 ~L 8 the elliptical mirror 11, shutter 12, through a lens system 13, for focusing incident on the plurality of light guide 14 that is configured by bundling optical fibers.
照明光学系2は、集光した光束L 〜L を光ガイド14によつて5つの光束L 〜L に分割し、分割して得たそれぞれの光束L 〜L を射出部内のフライアイレンズ(図示せず)によつて照度を均一化して射出させる。 The illumination optical system 2, the light beam L 6 ~L 8 condensed divided into the light guide 14 to Yotsute five light beams L 1 ~L 5, the injection portion of each of the light beams L 1 ~L 5 obtained by dividing homogenizing the by connexion illuminance fly-eye lens (not shown) of it is emitted.
因みに、シャッタ12は通常の照明光学系の構成でも使用されており、部品点数を増加させることはない。 Incidentally, the shutter 12 is also used in the normal illumination optical system configuration does not increase the number of parts.
【0017】 [0017]
続いて、照明光学系2は、例えば光束L をハーフミラー15、コンデンサレンズ16を介して視野絞り17に照射し、この視野絞り17によつて光束L を所望の形状にそれぞれ整形する。 Subsequently, the illumination optical system 2, for example, a half mirror 15 the light beam L 1, irradiated to the field stop 17 through a condenser lens 16, the O connexion beam L 1 to the field stop 17 shapes each into a desired shape. 照明光学系2は、整形した光束L をリレーレンズ18及び19を介してマスク3のパターン面上に照射して視野絞り17の像を形成する。 The illumination optical system 2, the light beam L 1 that is shaped by irradiating on the pattern surface of the mask 3 through the relay lens 18 and 19 to form an image of the field stop 17.
【0018】 [0018]
照明光学系2は、光ガイド14の出射端とコンデンサレンズ16との間にハーフミラー15が設けられており、光束L の一部を光検出素子21に入射する。 The illumination optical system 2, a half mirror 15 is provided between the exit end and the condenser lens 16 of the light guide 14, enters the portion of the light beam L 1 to the light detecting element 21. 照明光学系2は、光束L 〜L も光束L と同様に処理してマスク3のパターン面上に照射すると共に、それぞれの光束L 〜L の一部を光検出素子21に入射する。 The illumination optical system 2, the light beam L 2 ~L 5 be treated in the same manner as the light beam L 1 is irradiated on the pattern surface of the mask 3, a portion of each of the light beams L 2 ~L 5 to the light detection element 21 incident.
【0019】 [0019]
照明光学系2は、ハーフミラー15、レンズ系20を介して光検出素子21に与えた一部の光束のそれぞれの照度に応じて照度信号S1〜S5を光検出素子21に生成させ、この照度信号S1〜S5を制御部22に与える。 The illumination optical system 2, a half mirror 15, to produce a luminance signal S1~S5 to the light detecting element 21 in response to each of the illuminance of a part of the light beam applied to the light detecting element 21 via the lens system 20, the illumination providing a signal S1~S5 to the control unit 22. 照明光学系2は、照度信号S1〜S5に基づいて、それぞれの光束L 〜L の照度を制御部22で求め、それぞれのシヤツタ12の開口率と対応付けて生成した照度データS6をメモリ23に記憶する。 The illumination optical system 2, based on the illumination signal S1-S5, the illuminance of the respective light beams L 1 ~L 5 determined by the control unit 22, the illuminance data S6 generated in association with the opening ratio of each of the shutters 12 memory and stored in 23.
【0020】 [0020]
照明光学系2は、メモリ23に記憶した照度データS6を制御部22に読み出し、この照度データS6に基づいて制御部22で生成した制御信号S7〜S9をそれぞれシヤツタ制御部24〜26に与える。 The illumination optical system 2 reads the illuminance data S6 which is stored in the memory 23 to the control unit 22 provides control signals S7~S9 generated by control unit 22 based on the illuminance data S6 each shutter control unit 24 to 26.
これにより、照度が適正値を越えるとき、照明光学系2は、制御部22によつて3つのシヤツタ12のそれぞれの開口率を調節して、光束L 〜L の照度を適正値まで減少させると共に、光束L 〜L の相互間の照度を均一化させる。 Thus, when the illuminance exceeds a proper value, the illumination optical system 2, by adjusting the respective aperture ratio of Yotsute three shutter 12 to the control unit 22, reducing the illuminance of the light beam L 1 ~L 5 to the proper value together is, making uniform the illuminance of mutual light beam L 2 ~L 5.
【0021】 [0021]
ここで、照度データS6を得る際、照明光学系2は、例えば図3に示す照度データ獲得手順に従つて動作する。 Here, when obtaining the illuminance data S6, the illumination optical system 2 is accordance connexion operate illuminance data acquisition procedure shown in FIG. 3, for example. すなわち照明光学系2は、ステツプSP0から入り、ステツプSP1においてパラメータMをクリアしてステツプSP2に移る。 That illuminating optical system 2 enters the step SP0, it proceeds to step SP2 to clear the parameter M at step SP1. ステツプSP2において、照明光学系2は、N(ここでは3)個の光源すなわち超高圧水銀ランプ10の全シヤツタ12を全開して開口率を 100%に設定し、ステツプSP3に移る。 In step SP2, the illumination optical system 2, N (here 3) pieces of the light source that is, fully open all shutter 12 of the ultra-high pressure mercury lamp 10 to set the aperture ratio of 100%, and then proceeds to step SP3.
【0022】 [0022]
ステツプSP3において、照明光学系2は、この設定での光束L 〜L の照度を検出すると、ステツプSP4に移り、このときの光束L 〜L のそれぞれの照度を3つのシヤツタ12の開口率と対応付けて記憶する。 In step SP3, the illumination optical system 2 detects the illuminance of the light beam L 1 ~L 5 in this setting, it proceeds to step SP4, the light beam L 1 ~L each of the three shutter 12 the illumination of 5 at this time association with aperture ratio stored. 続いて、照明光学系2は、ステツプSP5に移り、パラメータMをM+1にインクリメントしてステツプSP6に移る。 Subsequently, the illumination optical system 2 proceeds to the step SP5, proceeds to step SP6 to increment the parameter M to M + 1. ステツプSP6において、照明光学系2は、M(ここでは1)番目の超高圧水銀ランプ10のシヤツタ12を閉じて開口率を0%に設定してステツプSP7に移る。 In step SP6, the illumination optical system 2 proceeds to M (here 1) th closing the shutter 12 of the ultra-high pressure mercury lamp 10 by setting the aperture ratio to 0% step SP7.
【0023】 [0023]
ステツプSP7において、照明光学系2は、光束L 〜L の照度を検出すると、ステツプSP8に移りこのときの光束L 〜L のそれぞれの照度を3つのシヤツタ12の開口率と対応付けて記憶する。 In step SP7, the illumination optical system 2 detects the illuminance of the light beam L 1 ~L 5, the correspondence with the aperture ratio of the light beam L 1 ~L 3 single shutter 12 each illuminance 5 when this moves to step SP8 and stores Te. 続いて、照明光学系2は、ステツプSP9に移りパラメータMがM=Nを満たすか否かを判断する。 Subsequently, the illumination optical system 2, the parameters M proceeds to step SP9 to determine whether they meet the M = N.
ステツプSP9において否定結果を得ると、照明光学系2は、全ての超高圧水銀ランプ10のシヤツタ12の開口率に対応した照度を検出していないと判断してステツプSP10に移る。 If a negative result is obtained at step SP9, the illumination optical system 2 proceeds to step SP10 it is judged that not detected illuminance corresponding to the opening ratio of the shutter 12 of all the ultra-high pressure mercury lamp 10. ステツプSP10において、照明光学系2は、M(ここでは1)番目の超高圧水銀ランプ10のシヤツタ12の開口率を再び 100%に設定してステツプSP5に戻り、上述の手順を繰り返す。 In step SP10, the illumination optical system 2, M (here 1) th aperture ratio of shutter 12 of ultra-high pressure mercury lamp 10 is set again to 100 percent returns to step SP5, repeat the above steps.
【0024】 [0024]
やがて、ステツプSP9において肯定結果を得ると、照明光学系2は、全ての超高圧水銀ランプ10のシヤツタ12の開口率に対応した照度を検出したと判断して、ステツプSP11に移り、照度データ獲得手順を終了する。 Eventually, when an affirmative result is obtained at step SP9, the illumination optical system 2, it is determined that the detected illuminance corresponding to the opening ratio of the shutter 12 of all the ultra-high pressure mercury lamp 10 proceeds to the step SP11, the illuminance data acquisition to end the procedure.
このようにして得た開口率 100%のときの光束L 〜L の照度と、開口率0%のときの光束L 〜L の照度との差分を総合することによつて、照明光学系2は、開口率を制御したシヤツタ12に対応した超高圧水銀ランプ10が射出した光束L 〜L のそれぞれの照度を検出することができる。 Yotsute to total such as illuminance of the light beam L 1 ~L 5 when the opening ratio of 100% thus obtained, a difference between the illuminance of the light beam L 1 ~L 5 when the opening ratio of 0%, lighting optical system 2 can be ultra-high pressure mercury lamp 10 corresponding to the shutters 12 that controls the opening ratio detecting each of intensity of the light beam L 6 ~L 8 emitted.
【0025】 [0025]
またこの光束L 〜L のそれぞれの照度が分かると、照明光学系2は、この光束L 〜L を分割して得た2次光束である光束L 〜L への光束L 〜L のそれぞれの分割率を上述した差分に基づいて検出することができる。 Further, when each of the illuminance of the light beam L 6 ~L 8 is seen, the illumination optical system 2, the light beam L to the optical beam L 1 ~L 5 is a secondary light beam which is obtained by dividing the light beam L 6 ~L 8 each division ratio of 6 ~L 8 can be detected based on the difference described above. この分割率は、光ガイド14の構成を変更しない限り一定であることが明らかである。 The division ratio, it is clear that a constant unless changed the configuration of the light guide 14.
【0026】 [0026]
以上の構成において、照明光学系2は、例えば1ロツトの感光基板5を露光する前やランプ交換直後に、それぞれの3つの超高圧水銀ランプ10に対応した照度データS6を得てメモリ23に記憶しておく。 In the above configuration, the illumination optical system 2, for example 1 a photosensitive substrate 5 Rotsuto immediately before or lamp replacement for exposing, to give each of the three illumination data S6 corresponding to ultra-high pressure mercury lamp 10 stored in the memory 23 keep.
照明光学系2は、照度データS6を得る際に、光束L 〜L のいずれかの照度が所定値を越えていることを検出すると、いずれかの超高圧水銀ランプ10の輝度が過大であると判断して、光束L 〜L の照度を校正する。 The illumination optical system 2, when obtaining the illuminance data S6, when any one of the illuminance of the light beam L 1 ~L 5 detects that exceeds a predetermined value, the luminance of any of the ultra-high pressure mercury lamp 10 is excessively large it is determined that there is, calibrating the illuminance of the light beam L 1 ~L 5.
【0027】 [0027]
すなわち、照明光学系2は、露光直前に獲得した照度データS6をメモリ23から読み出し、3つの超高圧水銀ランプ10が射出する光束L 〜L の照度と、3つのシヤツタ12の開口率と、光束L 〜L への光束L 〜L のそれぞれの分割率とに基づいて、3つのシヤツタ12に対する最適な開口率の組合せを設定する。 That is, the illumination optical system 2 reads the illuminance data S6 acquired immediately before exposure from the memory 23, the illuminance of the light beam L 6 ~L 8 three ultra-high pressure mercury lamp 10 is emitted, the aperture ratio of the three shutters 12 , based on the respective division of the light beam L 6 ~L 8 to the light beam L 1 ~L 5, sets the optimum combination of aperture ratio for the three shutter 12.
【0028】 [0028]
これにより、いずれかの超高圧水銀ランプ10の輝度が過大であつて、かつ走査速度の調整だけで露光量を適切値に調節することが困難である状態でも、感光基板5の全面に亘つて均一な照度の光束で照明して適正露光量で感光基板5に露光できることになる。 Thus, any of that mediation excessive brightness of the ultra-high pressure mercury lamp 10, and even when it is difficult to adjust the amount of exposure to the appropriate value by the adjustment of the scanning speed, Wataru connexion on the entire surface of the photosensitive substrate 5 would be exposed on the photosensitive substrate 5 at a proper exposure amount is illuminated with light beams having a uniform illuminance.
【0029】 [0029]
以上の構成によれば、複数の超高圧水銀ランプ10から射出されたそれぞれの光束L 〜L を規制するシヤツタ12の開口率と、光束L 〜L を光ガイド14によつて集光及び分割して得た光束L 〜L の照度とを対応付けてメモリ23に記憶した照度データS6に基づいて、露光前に3つのシヤツタ12に最適な開口率の組合せを設定することにより、照明光学系2に対する感光基板の走査速度の制御だけで露光量を適切値に調節できない程に超高圧水銀ランプ10の輝度が過大であつても、感光基板5に適正な露光量を与えることができる。 According to the above configuration, the aperture ratio of the shutter 12 to regulate the respective light beams L 6 ~L 8 emitted from a plurality of ultra-high pressure mercury lamp 10, by connexion condensing the light beam L 6 ~L 8 to the light guide 14 based in association with the illuminance of the light beam L 1 ~L 5 obtained by light and dividing the illuminance data S6 which is stored in the memory 23, it sets the optimum combination of aperture ratio three shutter 12 before exposure be Accordingly, even it shall apply excessive brightness of the ultra-high pressure mercury lamp 10 to the extent that can not adjust the amount of exposure to the appropriate value only by controlling the scanning speed of the photosensitive substrate relative to the illumination optical system 2, provide a proper exposure amount on the photosensitive substrate 5 be able to.
【0030】 [0030]
なお上述の実施例においては、液晶表示装置を製造するための感光基板5に露光する場合について述べたが、本発明はこれに限らず、任意の感光基板、例えば半導体素子を製造するための感光基板に露光する場合にも適用し得る。 Incidentally, in the aforementioned embodiment, it has dealt with the case of exposing a photosensitive substrate 5 for manufacturing a liquid crystal display device, the present invention is not limited to this, any photosensitive substrate, for example a photosensitive for manufacturing a semiconductor device also applicable in the case of exposure to the substrate.
【0031】 [0031]
また上述の実施例においては、本発明を5つの投影光学系4A〜4Eを有する走査型露光装置に適用する場合について述べたが、本発明はこれに限らず、投影光学系を5つ以外の任意の数だけ配置した露光装置にも適用し得る。 Also in the embodiment described above has dealt with the case of applying the present invention to a scanning exposure apparatus having five projection optical system 4A - 4E, the present invention is not limited to this, other than the five projection optical system also applicable to an exposure apparatus arranged any number.
【0032】 [0032]
さらに上述の実施例においては、本発明を1次元にだけ走査して露光する露光装置1に適用する場合について述べたが、本発明はこれに限らず、2次元に走査して露光する露光装置にも適用できる。 Further, in the aforementioned embodiments, it has dealt with the case of applying to the exposure apparatus 1 exposes by scanning the present invention only in one dimension, the present invention is not limited to this, the scanning to exposure to an exposure apparatus in a two-dimensional in can also be applied.
【0033】 [0033]
さらに上述の実施例においては、露光前に2次光束である光束L 〜L の照度を校正する場合について述べたが、本発明はこれに限らず、露光中に1次光束を規制して、2次光束の照度を制御する場合にも適用できる。 Further, in the aforementioned embodiments have dealt with the case of calibrating the illuminance of the light beam L 1 ~L 5 is a secondary light beam before the exposure, the present invention is not limited thereto, to regulate the primary light beam during exposure Te, it can be applied to a case of controlling the illumination of the secondary light beam.
【0034】 [0034]
さらに上述の実施例においては、光束L 〜L を規制するため、シヤツタ12の開口率を制御する場合について述べたが、本発明はこれに限らず、光束を規制する光束規制手段は任意の構成のもので良い。 Further, in the aforementioned embodiments, for regulating the light beam L 6 ~L 8, has dealt with the case of controlling the opening ratio of the shutter 12, the present invention is not limited to this, the light beam restriction means for restricting a light flux optionally it may be of the configuration.
【0035】 [0035]
さらに上述の実施例においては、光ガイド14によつて光束を集光及び分割する場合について述べたが、本発明はこれに限らず、任意の構成の光学系によつて光束を集光及び分割する場合にも適用できる。 Further, in the aforementioned embodiments have dealt with the case of condensing and dividing the I connexion beam into the light guide 14, the present invention is not limited thereto, the condenser and splits the I connexion light beam to the optical system of any configuration It can also be applied in the case of.
【0036】 [0036]
【発明の効果】 【Effect of the invention】
上述のように、本発明によれば、複数の光源から射出されたそれぞれの1次光束を規制する光束規制手段の規制状態と、1次光束を光伝送路によつて集光及び分割して得た2次光束の照度とを対応付けて記憶手段に記憶した記憶結果に基づいて、複数の光束規制手段に最適な規制状態の組合せを設定することにより、照明光学系に対する感光基板の走査速度の制御だけで露光量を適切値に調節できない程に光源の輝度が過大であつても、感光基板に適正な露光量を与え得る露光装置及び露光方法を実現することができる。 As described above, according to the present invention, the regulating state of the light beam regulating means for regulating each of the primary light beams emitted from a plurality of light sources, primary light bundle and by connexion condenser and split the optical transmission line the resulting secondary light beam in association with illuminance based on the stored stored results in the storage means, by setting the optimum combination of restricted state to a plurality of beam restricting means, the scanning speed of the photosensitive substrate relative to the illumination optical system be filed in the control only by excessive brightness of the light source to the extent that can not be adjusted to the appropriate value exposure quantity, it is possible to realize an exposure apparatus and an exposure method can provide a proper exposure amount on the photosensitive substrate.
【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS
【図1】本発明による露光装置及び露光方法の一実施例による走査型露光装置を示す斜視図である。 1 is a perspective view showing a scanning type exposure apparatus according to an embodiment of an exposure apparatus and an exposure method according to the present invention.
【図2】実施例による照明光学系の構成の説明に供する略線図である。 2 is a schematic diagram illustrating configuration of an illumination optical system according to Example.
【図3】実施例による照度データ獲得手順の説明に供するフローチヤートである。 3 is a flow chart for explaining the illuminance data acquisition procedure according to Example.
【符号の説明】 DESCRIPTION OF SYMBOLS
1……走査型露光装置、2……照明光学系、3……マスク、3A……パターン領域、4A〜4E……投影光学系、5……感光基板、5A……感光面、6……ステージ保持台、7……マスクステージ、10……超高圧水銀ランプ、11……楕円鏡、12……シヤツタ、13……レンズ系、14……光ガイド、15……ハーフミラー、16……コンデンサレンズ、17……視野絞り、18、19……リレーレンズ、20……レンズ系、21……光検出素子、22……制御部、23……メモリ、24〜26……シヤツタ制御部、L 〜L ……光束、P1〜P5……投影領域、M1〜M5……照明領域。 1 ...... scanning exposure apparatus, 2 ...... illumination optical system, 3 ...... mask, 3A ...... pattern region, 4A - 4E ...... projection optical system, 5 ...... photosensitive substrate, 5A ...... photosensitive surface, 6 ...... stage holder, 7 ...... mask stage, 10 ...... ultra-high pressure mercury lamp, 11 ...... elliptical mirror, 12 ...... shutters, 13 ...... lens system, 14 ...... light guide, 15 ...... half mirror, 16 ...... condenser lens, 17 ...... field stop, 18, 19 ...... relay lens, 20 ...... lens system, 21 ...... photodetector, 22 ...... controller, 23 ...... memory, 24 to 26 ...... shutter control unit, L 1 ~L 8 ...... beam, P1~P5 ...... projection area, M1~M5 ...... illumination area.

Claims (5)

  1. 複数の光源からそれぞれ射出された複数の1次光束を光伝送路によつて集光した後に前記光伝送路によつて分割して得た複数の2次光束によつて、パターンが形成されたマスク上の互いに異なる複数の領域をそれぞれ照明する照明光学系と、該複数の領域に対応して配置された複数の投影光学系とを有し、該複数の領域のそれぞれの像を前記複数の投影光学系のそれぞれを介して感光基板上に投影する露光装置において、 Yotsute, patterns are formed in a plurality of secondary light beams obtained by by connexion divided into the optical transmission line after have been conducted under condensing the plurality of primary beams emitted from the plurality of light sources to the optical transmission path an illumination optical system for illuminating a plurality of different regions on the mask, respectively, and a plurality of projection optical systems arranged corresponding to a region of the plurality of the respective images of the plurality of areas of said plurality in an exposure apparatus for projecting onto the photosensitive substrate through the respective projection optical system,
    前記複数の光源が射出したそれぞれの前記1次光束を規制する複数の光束規制手段と、 A plurality of beam restricting means for restricting the primary light flux of each of said plurality of light sources emitted,
    前記2次光束の照度を検出する照度検出手段と、 An illuminance detecting means for detecting the illuminance of the second light flux,
    前記検出結果に基づいて、前記複数の光束規制手段によるそれぞれの規制状態と、前記複数の2次光束の照度とを対応付けて記憶する記憶手段と、 On the basis of the detection result, each of the restricting state by the plurality of beam restricting means, storage means for storing in association with illumination of the plurality of secondary light beams,
    前記記憶手段に記憶された記憶結果に基づいて、前記2次光束の照度が所定値となるように、該2次光束中の任意の光束成分を射出している前記光源が射出する前記1次光束を規制するように前記光束規制手段を制御する制御手段とを備えることを特徴とする露光装置。 Based on the stored stored results in the storage means, said primary illuminance of the secondary light beam to a predetermined value, the light source that emits any light beam components in the 2 Tsugikotaba is emitted exposure apparatus, characterized in that it comprises a control means for controlling said light beam restriction means to regulate the light flux.
  2. 前記光伝送路は、複数の光フアイバを束ねて構成されていることを特徴とする請求項1に記載の露光装置。 It said optical transmission path, an exposure apparatus according to claim 1, characterized in that it is constituted by bundling a plurality of optical fibers.
  3. 前記光束規制手段は、前記1次光束を通過させる開口部の開口率を制御して、前記1次光束を規制することを特徴とする請求項1に記載の露光装置。 It said light beam restriction means, said controlling the opening ratio of the opening for passing the primary beam exposure apparatus according to claim 1, characterized in that to regulate the primary light beam.
  4. 前記複数の投影光学系の一部は、光軸が第1の方向に沿つて一列に配置されており、 Wherein some of the plurality of projection optical systems, the optical axis is disposed along connexion a row in a first direction,
    前記複数の投影光学系の他の一部は、光軸が前記複数の投影光学系の一部と平行に、かつ所定間隔をおいて一列に配置されており、 The other part of the plurality of projection optical systems, in parallel with some optical axis of the plurality of projection optical systems, and are arranged in a line at predetermined intervals,
    前記第1の方向とほぼ直交し、且つ前記感光基板の面内方向に前記マスクと前記感光基板とを同期して走査することを特徴とする請求項1に記載の露光装置。 It said first substantially perpendicular to the direction, and the exposure apparatus according to claim 1, wherein said mask in-plane direction of the photosensitive substrate a photosensitive substrate and synchronization with the characterized by scanning.
  5. 第1及び第2の光源からそれぞれ射出された1次光束を光伝送路によつて集光した後に前記光伝送路によつて分割して得た第1及び第2の2次光束によつて、パターンが形成されたマスク上の互いに異なる第1及び第2の領域をそれぞれ照明し、該第1及び第2の領域のそれぞれの像を第1及び第2の投影光学系をそれぞれ介して感光基板上に投影する露光方法において、 First and second first and second Yotsute the secondary beams obtained by by connexion divided primary light flux emitted to each of the optical transmission line after have been conducted under the condensing optical transmission path from the light source illuminates the different first and second regions on the mask pattern is formed respectively, each of the images of the first and second regions through the first and second projection optical systems are sensitive the exposure method for projecting on a substrate,
    前記第1の光源から射出された前記1次光束を規制する第1の光束規制手段による該1次光束に対する規制状態毎に、前記第1及び第2の2次光束の照度を検出する第1の処理と、 First detecting the first for each restricted state relative to the primary light beam by the light beam restriction means, the illuminance of the first and second secondary light beam for regulating the primary light flux emitted from the first light source and processing,
    前記第2の光源から射出された前記1次光束を規制する第2の光束規制手段による該1次光束に対する規制状態毎に、前記第1及び第2の2次光束の照度を検出する第2の処理と、 Each restricted state against by said primary light beam the second beam regulating means for regulating the primary light flux emitted from the second light source, the second for detecting the illuminance of the first and second secondary light beam and processing,
    前記第1及び第2の処理による検出結果に基づいて、前記第1及び第2の光束規制手段によるそれぞれの前記規制状態と、前記第1及び第2の2次光束の照度とを対応付けて記憶する第3の処理と、 Based on the detection result of the first and second processing, in association respectively with the restricted state by the first and second beam restricting means and illumination of the first and second secondary light beam a third process of storing,
    前記パターンを前記感光基板上に投影する際に、前記第1及び第2の2次光束の照度を均一にするよう、前記第3の処理による記憶結果に基づいて、前記第1及び第2の光束規制手段を制御する第4の処理とを具えることを特徴とする露光方法。 When projecting the pattern onto the photosensitive substrate, so as to uniform the illuminance of said first and second secondary light beam, based on the stored result by the third processing, the first and second exposure method characterized by comprising a fourth process of controlling the beam restricting means.
JP8580996A 1996-03-14 1996-03-14 Exposure apparatus and an exposure method Expired - Fee Related JP3601174B2 (en)

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JP3472249B2 (en) 2000-08-25 2003-12-02 キヤノン株式会社 Lighting device, the lighting control apparatus and method using multiple light sources, as well as the exposure apparatus
KR101532824B1 (en) 2003-04-09 2015-07-01 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI519819B (en) 2003-11-20 2016-02-01 尼康股份有限公司 Light beam converter, optical illuminating apparatus, exposure device, and exposure method
TWI505329B (en) 2004-02-06 2015-10-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
US7714982B2 (en) 2006-02-16 2010-05-11 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus and device manufacturing method
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