JP5217367B2 - Photomask and method of forming convex pattern using the same - Google Patents

Description

  The present invention relates to a photomask for forming a plurality of types of convex patterns having different heights and a method for forming a convex pattern using the same, and more specifically, the plurality of types of convex patterns having different heights are the same. The present invention relates to a photomask which is simultaneously formed using a material and whose formation process is to be shortened, and a convex pattern forming method using the photomask.

Conventionally, this type of convex pattern forming method is a method of laminating each colored layer deposited on the black matrix as it is when forming each colored layer of red, blue and green in each pixel of the color filter substrate. Thereafter, when forming a pattern (projection) for alignment control of liquid crystal molecules in each pixel, a projection is formed on the colored layer laminated on the black matrix at the same time. A spacer for controlling the cell gap is formed by the protrusions (see, for example, Patent Document 1).
Japanese Patent Laid-Open No. 11-248921

  However, in such a conventional convex pattern forming method, since the spacer is formed of a plurality of layers, it is easily peeled off between the layers and easily broken. Therefore, the spacer collapses due to the pressure applied when the color filter substrate and the semiconductor substrate are joined, and there is a problem that the cell gap cannot be accurately controlled.

  On the other hand, in order to increase the aperture ratio of the color filter substrate, there is an increasing tendency to form the spacer and the alignment control pattern with the same transparent material having a high transmittance with respect to visible light. However, in this case, the spacers having different heights and the alignment control patterns usually have to be formed in separate processes using different photomasks, which increases the number of steps and increases the manufacturing cost of the color filter substrate. There is a problem of becoming higher.

  Therefore, the present invention addresses such problems, and simultaneously forms a plurality of types of convex patterns having different heights using the same material, and a photomask for reducing the formation process thereof. It is an object of the present invention to provide a convex pattern forming method used.

To achieve the above object, the photomask according to the first invention, while transporting at a constant speed of the substrate in one direction, a plurality of kinds of different heights by exposing the applied photosensitive resin on said substrate of A photomask for forming a convex pattern, which is formed in a plurality of opaque films formed so as to cover one surface of a transparent glass substrate, and has a high height among the plurality of types of convex patterns. Corresponding to the first unit mask pattern row formed by aligning the first mask patterns that transmit ultraviolet light in a straight line in the direction intersecting the transport direction of the substrate, and corresponding to the convex pattern having a low height. plural kinds of Ma constructed by arranging a plurality of rows and a second unit mask pattern columns alternately at predetermined intervals a second mask pattern is formed by aligned in a direction intersecting the transport direction of the substrate that transmits ultraviolet light And click pattern, in which and a condenser lens formed on the glass substrate corresponding to the first mask pattern of the plurality of types of mask patterns.

With such a configuration, a plurality of opaque films formed on one surface of a transparent glass substrate are formed, and ultraviolet light is transmitted through a plurality of types of mask patterns having openings corresponding to a plurality of types of convex patterns. UV at first formed on the glass substrate corresponding to the mask pattern condenser lens for forming a plurality of kinds of high have convex pattern of the height of the convex pattern of different heights among species of the mask pattern The ultraviolet light that collects the light and exposes the photosensitive resin applied on the substrate at a depth corresponding to the thickness of the photosensitive resin and transmits the second mask pattern for forming a convex pattern with a low height. The photosensitive resin is exposed at a shallow depth that does not reach its thickness .

Further, the convex pattern forming method according to the second invention, while transporting at a constant speed of the substrate in one direction, and exposing the applied photosensitive resin on said substrate having different heights more convex pattern A plurality of opaque films formed on one surface of a transparent glass substrate, and ultraviolet light corresponding to a high convex pattern among the plurality of convex patterns. A first unit mask pattern row in which first mask patterns that transmit light are aligned in a direction intersecting with the substrate transport direction, and a first mask pattern that transmits ultraviolet light corresponding to a convex pattern having a low height. a plurality of kinds of mask pattern by arranging a plurality of rows alternating with second unit mask pattern columns formed by aligned the second mask pattern in a direction intersecting the transport direction of the substrate at predetermined intervals, the plurality of kinds A condenser lens which corresponds to the first mask pattern formed on the glass substrate of the mask pattern, a photomask having a disposed to face the substrate, a predetermined amount of light from above the photomask Irradiating the photosensitive resin with ultraviolet light for a predetermined time and exposing the photosensitive resin with exposure light having different irradiation energies transmitted through the plurality of types of mask patterns, and developing the exposed photosensitive resin for a predetermined time. And forming a plurality of types of convex patterns having different heights.

With such a configuration, a plurality of opaque films formed on one surface of a transparent glass substrate are formed, and among a plurality of types of convex patterns having different heights, an ultraviolet ray corresponding to a high convex pattern is formed. Ultraviolet light is transmitted corresponding to a first unit mask pattern row formed by aligning a first mask pattern that transmits light in a straight line in a direction crossing the substrate transport direction, and a convex pattern having a low height. A plurality of types of mask patterns configured by alternately arranging a plurality of second unit mask pattern rows formed by arranging a second mask pattern in a straight line in a direction intersecting the transport direction of the substrate; constant speed and the condenser lens formed on the glass substrate corresponding to the first mask pattern, a photomask having a disposed to face the substrate, the substrate in one direction of the mask pattern While conveying, the ultraviolet light is irradiated for a predetermined time at a predetermined amount from above the photomask, exposing the photosensitive resin applied on the substrate by the exposure light of a plurality of types of mask patterns different irradiation energy transmitted through the The exposed photosensitive resin is developed for a predetermined time to form a plurality of types of convex patterns having different heights.

Moreover, the in step of exposing the photosensitive resin, the exposure light pre division setting a plurality of exposed regions in the direction of movement before Symbol substrate surface in synchronism to sequentially pass through the lower side of the photomask Is irradiated. Thus, a plurality of exposed regions which are previously divided set to the moving direction of the board surface to expose the photosensitive resin is irradiated in synchronization with the exposure light to sequentially pass under side of the photomask.

The exposure light amount and the irradiation time are such that the curing reaction of the portion corresponding to the first mask pattern of the photosensitive resin sufficiently proceeds and the curing reaction of the portion corresponding to the second mask pattern. It is set so that progress is insufficient. As a result, the amount of exposure light so that the curing reaction of the portion corresponding to the first mask pattern of the photosensitive resin is sufficiently advanced and the progress of the curing reaction of the portion corresponding to the second mask pattern is insufficient. The photosensitive resin is exposed by setting the irradiation time and a plurality of convex patterns having different heights are formed in the same process.

Then, the substrate is a color filter substrate, the plurality of kinds of high have convex pattern of the height of the convex pattern is a spacer for controlling the cell gap, low convex pattern of said height liquid crystal molecules This is an orientation control rib for controlling the orientation of the film. Thus, to form a tall spacers, which control a cell gap of the color filter substrate at a first mask pattern of the photomask, for a low orientation control height of controlling the orientation of liquid crystal molecules in the second mask pattern Ribs are formed.

According to the invention concerning Claim 1 and 2 , the irradiation energy of the exposure light which permeate | transmitted the multiple types of mask pattern can be varied. Accordingly, the curing reaction of each part corresponding to the plurality of types of mask patterns of the photosensitive resin can be made different. Thereby, a plurality of types of convex patterns having different heights can be simultaneously formed using the same material, and the forming process can be shortened.

Also, the invention according to claim 3, may be the substrate in succession can perform exposure while supplying, to further shorten the plurality of kinds of convex pattern forming step for different heights .

Furthermore, the invention according to claim 4, it is possible to reliably form a plurality of kinds of convex patterns having different heights.

According to the fifth aspect of the present invention, the spacer for controlling the cell gap of the color filter substrate and the alignment control rib for controlling the alignment of the liquid crystal molecules can be simultaneously formed using the same material. The formation process can be shortened. Therefore, the manufacturing cost of the color filter substrate can be reduced.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a plan view showing a first embodiment of a photomask according to the present invention, where (a) shows the whole, and (b) shows an enlarged part. FIG. 2 is a sectional view taken along line XX of FIG. The photomask 1 is for exposing a photosensitive resin applied on a substrate to form a plurality of types of convex patterns having different heights. The photomask 1 includes a glass substrate 2, an opaque film 3, a first film It consists of a mask pattern 4, a second mask pattern 5, and a condenser lens 6. Hereinafter, a case where the substrate is a color filter substrate will be described.

The glass substrate 2 is made of, for example, transparent quartz glass that easily transmits ultraviolet rays.
On one surface 2a of the glass substrate 2, and an opaque film 3 is formed. The opaque film 3 blocks ultraviolet light transmission and is, for example, a thin film of chromium (Cr).

  A first mask pattern 4 is formed on the opaque film 3. The first mask pattern 4 is used to form a spacer that controls the cell gap with the highest height among a plurality of types of convex patterns having different heights of the color filter substrate. As shown in FIG. 1A, the first unit mask pattern row 7 in which dot-like patterns (openings) are arranged in a straight line at a predetermined interval is provided as an interval. A plurality of columns are arranged in L.

  A second mask pattern 5 is formed on the opaque film 3. The second mask pattern 5 is used to form alignment control ribs that are lower in height than the spacers and control the alignment of liquid crystal molecules among the plurality of convex patterns having different heights on the color filter substrate. As shown in FIG. 1 (a), a pattern (opening) bent at the center is substantially straight at a predetermined interval in the bending direction. A plurality of second unit mask pattern rows 8 arranged in a row are arranged in a plurality of rows at intervals L alternately with the first unit mask pattern row 7.

  The specific shape of the second unit mask pattern row 8 includes a first pattern 9a bent at the central portion and a bent portion at the central portion, as partially enlarged in FIG. And a plurality of sets of a second pattern 9b having a piece protruding from the bent portion in a direction opposite to the bending direction and a third pattern 9c substantially similar to the second pattern 9b. Are arranged in a line.

  As shown in FIG. 2, the surface 2 a on which the first mask pattern 4 is formed on one surface of the glass substrate 2 is collected corresponding to the dot-like pattern (opening) of the first mask pattern 4. An optical lens 6 is provided. This condensing lens 6 is for condensing ultraviolet light and generating exposure light having higher irradiation energy than the exposure light transmitted through the second mask pattern 5. Can be formed.

  FIG. 3 is a cross-sectional view taken along the line XX of FIG. This photomask 1 has a condensing lens corresponding to the dot-like pattern (opening) of the first mask pattern 4 on the surface 2b opposite to the surface 2a on which the first mask pattern 4 is formed on one surface of the glass substrate 2. 6 is formed.

Next, an exposure apparatus using the photomask 1 of the present invention will be described with reference to FIG.
As shown in FIG. 4, the exposure apparatus includes a transport unit 10, a mask stage 11, a light source 12, a condenser lens 13, an imaging unit 14, and an illumination unit 15.

  The transport means 10 is for placing the color filter substrate 16 coated with a negative photosensitive resin on the upper surface of the stage 17 and transporting it at a constant speed in the direction indicated by the arrow A in FIG. And a speed sensor for detecting the moving speed of the stage 17. The stage 17 is provided with an opening having a size corresponding to the exposure area of the color filter substrate 16 at the center thereof, and the color filter substrate 16 can be illuminated from the back surface by the illumination means 15 described later.

  A mask stage 11 is disposed above the transfer means 10 so as to be close to and opposed to the upper surface of the color filter substrate 16 to be transferred. This mask stage 11 holds the photomask 1 of the present invention, and forms an opening corresponding to the mask pattern formation region 18 (see FIG. 5) of the photomask 1 in the center portion. The exposure light transmitted through the second mask patterns 4 and 5 can reach the surface of the color filter substrate 16 that passes thereunder. Then, it is controlled by a control means (not shown) and can be displaced in a direction substantially perpendicular to the conveyance direction indicated by an arrow A. As shown in FIG. 1, the photomask 1 of the present invention has a mask stage in which the first and second unit mask pattern rows 7 and 8 are substantially orthogonal to the conveyance direction (arrow A direction) of the color filter substrate 16. 11 is held.

  A light source 12 is provided so that the photomask 1 of the mask stage 11 can be irradiated with ultraviolet light P1. The light source 12 is controlled by a control means (not shown) to intermittently emit ultraviolet light P1, and is a flash lamp, a laser light source, or the like.

  A condenser lens 13 is provided between the mask stage 11 and the light source 12. The condenser lens 13 irradiates the photomask 1 with the ultraviolet light P1 emitted from the light source 12 as parallel light.

  An exposure optical system 19 is configured including the light source 12, the condenser lens 13, and the mask stage 11.

An imaging unit 14 is provided above the transport unit 10. This imaging means 14 is upstream of the exposure position of the exposure optical system 19, that is, the transport direction (arrow A direction) of the color filter substrate 16 with respect to the center line orthogonal to the arrow A of the photomask 1 shown in FIG. A line in which a large number of light receiving elements 20 are arranged in a straight line in a direction substantially orthogonal to the arrow A direction in a plane parallel to the top surface of the stage 17 of the transport unit 10. It is a CCD camera. For example, a fine alignment mark 22 (see FIG. 6) parallel to the arrow A direction, a fine exposure start reference mark 23 (see FIG. 6) perpendicular to the arrow A direction, and pixels provided on the color filter substrate 16. And the like, and the image information is sent to a control means (not shown) so that the alignment of the photomask 1 and the color filter substrate 16 by the control means and the emission timing of the ultraviolet light P1 by the light source 12 can be controlled. Yes. Further, as shown in the figure, the imaging means 14 is positioned and set in advance so that the center position thereof coincides with the center line parallel to the arrow A direction of the photomask 1 held on the mask stage 11. It is controlled by the omitted control means and can be displaced in a direction substantially orthogonal to the arrow A integrally with the mask stage 11.

  As shown in FIG. 4, an illumination unit 15 is provided below the stage 17 of the transport unit 10 so as to face the imaging unit 14. This illumination means 15 irradiates visible light to the imaging position of the imaging means 14, and is a halogen lamp etc., for example. In this case, it is preferable that an ultraviolet cut filter is provided in front of the illumination direction of the illumination unit 15 to block ultraviolet rays to prevent the photosensitive resin of the color filter substrate 16 from being exposed to illumination light of the illumination unit 15.

  In the exposure apparatus, the imaging unit 14 and the illumination unit 15 may be arranged upside down. Further, the exposure apparatus is not limited to the one described above, and any exposure apparatus may be used as long as exposure can be performed while the color filter substrate is conveyed in one direction at a constant speed.

Next, a method of forming a convex pattern using the photomask 1 of the present invention thus configured will be described. Here, the case where the exposure of the convex pattern is performed using the exposure apparatus will be described.
First, the first and second unit mask pattern rows 7 and 8 are in the transport direction of the color filter substrate 16 (arrow A) with the surface of the photomask 1 on which the condensing lens 6 is formed on the mask stage 11 of the exposure apparatus. Arranged and fixed so as to be substantially orthogonal to the direction).

  Next, the curing reaction of the portion corresponding to the first mask pattern 4 of the photomask 1 of the photosensitive resin sufficiently proceeds, and the progress of the curing reaction of the portion corresponding to the second mask pattern 5 is insufficient. The light amount (power) and irradiation time of the light source 12 and the moving speed of the color filter substrate 16 confirmed through experiments in advance are set by input means (not shown).

  Further, a color filter substrate 16 having a negative photosensitive resin coated on the surface by a known means is prepared. As shown in FIG. 6, the color filter substrate 16 is obtained by dividing the entire exposure area into a first exposure area 21a, a second exposure area 21b, and a third exposure area 21c. In this case, the first to third exposure regions 21a to 21c have a width D3 corresponding to the width D3 (see FIG. 5) in the arrow A direction of the mask pattern formation region 18 of the photomask 1, and the width direction Is set at an interval D3. Further, on one end side of the alignment direction of the first to third exposure regions 21a to 21c on the center line of the color filter substrate 16, the elongated alignment mark 22 substantially parallel to the same direction and substantially orthogonal to the same direction. An elongated exposure start reference mark 23 is formed.

  The color filter substrate 16 formed in this manner is placed on the stage 17 of the transport means 10 with the end 16a on the side where the alignment mark 22 and the exposure start reference mark 23 are formed being the leading side in the transport direction. And it is conveyed at a fixed speed in the direction of arrow A shown in FIG. At the same time, the illumination unit 15 is turned on and imaging by the imaging unit 14 is started.

  When the color filter substrate 16 reaches the lower side of the image pickup means 14, the image pickup means 14 picks up each pattern such as an alignment mark 22, an exposure start reference mark 23, and a pixel on the color filter substrate 16. In this case, the alignment mark 22 is first imaged, and the position of the alignment mark 22 in the direction substantially orthogonal to the arrow A is detected based on the luminance change of the captured image. Then, a distance between a reference position set in advance in the imaging means 14, for example, the center position and the detection position of the alignment mark 22, is calculated, and the imaging means 14 and the mask stage 11 are integrated so that the distance becomes a predetermined value. In general, it is displaced in a direction substantially perpendicular to the conveying direction indicated by arrow A. Thereby, the color filter substrate 16 and the photomask 1 are aligned.

Further , when the color filter substrate 16 is moved and the exposure start reference mark 23 is picked up by the image pickup means 14, for example, the edge of the exposure start reference mark 23 on the leading side in the transport direction is detected from the luminance change of the picked-up image. The At the same time, the position of the stage 17 is detected based on the output of the position sensor provided in the transport means 10, and the measurement of the movement distance of the stage 17 based on the position is started.

When the color filter substrate 16 is moved by a distance (D1 + D2) after being picked up by the image pickup means 14 and the leading edge in the transport direction of the exposure start reference mark 23 is detected, the first exposure region 21a of the color filter substrate 16 is detected. Coincides with the mask pattern forming region 18 on the lower side of the photomask 1. At this time, the light source 12 is turned on for a predetermined time by being controlled by a control means (not shown), and ultraviolet light P1 is emitted from the light source 12.

  The ultraviolet light P1 is applied to the upper surface of the photomask 1 as shown in FIG. At this time, as shown in FIG. 6A, the ultraviolet light P1 irradiated to the first mask pattern 4 is collected at a predetermined position on, for example, the black matrix 24 of the color filter substrate 16 by the condenser lens 6 and exposed. The photosensitive resin 25 at this position is exposed as light P2.

  On the other hand, as shown in FIG. 7B, the ultraviolet light P1 irradiated to the second mask pattern 5 passes through the second mask pattern 5 as it is and corresponds to the second mask pattern 5 as exposure light P2. The photosensitive resin 25 on the pixel 26 to be exposed is exposed.

  In this case, since the exposure light P2 transmitted through the first mask pattern 4 is condensed by the condenser lens 6, the irradiation energy is higher than that of the exposure light P2 transmitted through the second mask pattern 5 as it is. high. In other words, the exposure light P <b> 2 that has passed through the second mask pattern 5 has lower irradiation energy than the exposure light P <b> 2 that has passed through the first mask pattern 4. Therefore, even when the curing reaction of the portion corresponding to the first mask pattern 4 of the photosensitive resin 25 has sufficiently progressed, the curing reaction of the portion corresponding to the second mask pattern 5 is insufficient. Become.

  Subsequently, when the color filter substrate 16 moves in the direction of arrow A by the distance D3, the second exposure region 21b coincides with the mask pattern formation region 18 below the photomask 1. At this time, the light source 12 is turned on for a predetermined time by being controlled by a control means (not shown), and the ultraviolet light P1 is emitted from the light source 12. In the same manner as described above, the portion corresponding to the first mask pattern 4 and the portion corresponding to the second mask pattern 5 of the photosensitive resin 25 are exposed.

  Furthermore, when the color filter substrate 16 moves in the direction of arrow A by the distance D3, the third exposure region 21c matches the mask pattern formation region 18 below the photomask 1, and the first exposure region 21c has the first exposure region 21c. The portions of the photosensitive resin 25 corresponding to the mask pattern 4 and the portion corresponding to the second mask pattern 5 are exposed.

  In this way, when the exposure of all the exposure areas of the color filter substrate 16 is completed, the photosensitive resin 25 of the color filter substrate 16 is developed for a predetermined time with a predetermined developer. At this time, assuming that the irradiation energy of the second mask pattern 5 with respect to the irradiation energy of the first mask pattern 4 is 1 / m (m is a positive number of 1 or more), the exposure amount of the first mask pattern 4 is The exposure amount of the second mask pattern 5 is 1 / m. Therefore, due to the characteristics of the photosensitive resin 25, as shown in FIG. 8, the portion corresponding to the first mask pattern 4 in which the curing reaction of the photosensitive resin 25 has sufficiently progressed is hardly dissolved in the developer, and the coating film A spacer 27 having a height substantially equal to the thickness is formed. In addition, the portion corresponding to the second mask pattern 5 in which the progress of the curing reaction of the photosensitive resin 25 is insufficient is partly dissolved in the developer according to the progress of the curing reaction, and is higher than the spacer 27. A low orientation control rib 28 is formed.

FIG. 9 is a plan view showing a second embodiment of the photomask 1 of the present invention.
In the photomask 1, second unit mask pattern rows 8 are formed at intervals of 3L between rows of a plurality of first unit mask pattern rows 7 arranged at intervals of L.

  In the exposure using the photomask 1 of the second embodiment configured as described above, the color filter substrate 16 is arranged facing the photomask 1 and is constant in the direction intersecting the first unit mask pattern row 7. Each time the color filter substrate 16 moves at a speed equal to the distance L equal to the column interval L of the first unit mask pattern column 7, ultraviolet light P1 is emitted from the light source 12, and the color filter substrate 16 is irradiated with the exposure light P2. And do it.

  Accordingly, for example, in the photomask 1 shown in FIG. 9, the first unit mask pattern row 7 is subjected to multiple exposure 14 times, and the second unit mask pattern row 8 is subjected to multiple exposure five times. It will be. In this case, if the irradiation energy of the second unit mask pattern array 8 with respect to the irradiation energy of the first unit mask pattern array 7 is 1 / m (m is a positive number of 1 or more), the first unit mask pattern array The exposure amount of the second unit mask pattern row 8 with respect to the exposure amount of 7 is 5 / (14 m), and the difference between the exposure amounts can be made larger than in the first embodiment. Therefore, the orientation control rib 28 having a lower height can be formed.

  It should be noted that the height of the orientation control ribs 28 can be set almost arbitrarily by appropriately setting the numbers of the first unit mask pattern row 7 and the second unit mask pattern row 8. In this case, the height of the spacer 27 is determined by the coating film thickness of the photosensitive resin 25.

  In the second embodiment, the case where the second unit mask pattern rows 8 are formed at intervals of 3 L between the first unit mask pattern rows 7 arranged at intervals of L has been described. However, the second unit mask pattern row 8 only needs to be formed at an interval nL (n is an integer of 2 or more). Alternatively, the second unit mask pattern rows 8 do not have to be formed at regular intervals, and may be formed at least between the first unit mask pattern rows 7.

  In the above description, the case where the color filter substrate 16 is transported at a constant speed in the direction of the arrow A has been described, but the present invention is not limited to this, and in the exposure using the photomask 1 of the first embodiment, The color filter substrate 16 and the photomask 1 are moved relative to each other by a predetermined distance in a plane parallel to the surface of the color filter substrate 16 to sequentially expose a plurality of exposure areas set in advance on the surface of the color filter substrate 16. You may make it do. In the exposure using the photomask 1 of the second embodiment, the color filter substrate 16 is positioned relative to the photomask 1 in a plane parallel to the surface of the photomask 1. It is also possible to sequentially move by a distance equal to the column interval L of the first unit mask pattern column 7 in the direction intersecting the pattern column 7, and to irradiate the exposure light each time.

  In the above description, the case where the substrate is the color filter substrate 16 has been described. However, the present invention is not limited to this, and any substrate can be used as long as it is intended to form a plurality of types of convex patterns having different heights. It may be a thing.

It is a top view which shows 1st Embodiment of the photomask by this invention, (a) shows the whole, (b) has expanded and shown a part. It is XX sectional drawing of FIG.1 (b). It is the XX sectional view taken on the line in FIG.1 (b) which shows the other example of a condensing lens with which the said photomask is equipped. It is a front view which shows schematic structure of the exposure apparatus which uses the photomask of this invention. It is explanatory drawing which shows the relationship between a photomask and an imaging means in the said exposure apparatus. It is a schematic diagram of the color filter board | substrate used in the said exposure apparatus. It is explanatory drawing which shows exposure using the photomask of this invention, (a) shows exposure of the 1st mask pattern, (b) has shown exposure of the 2nd mask pattern. It is explanatory drawing shown about the convex-shaped pattern formed as a result of exposure using the photomask of this invention. It is a top view which shows 2nd Embodiment of the photomask of this invention.

Explanation of symbols

1 ... Photomask 2 ... Glass substrate
2a ... one face 3 ... opaque film of the glass substrate 4 ... first mask pattern 5 ... second mask patterns 6 ... converging lens 7 ... first unit mask pattern column 8 ... second unit mask pattern columns 16 ... color filter substrate 25 ... photosensitive resin 27 ... spacer (convex pattern)
28 ... rib for orientation control (convex pattern)

Claims (5)

While transporting at a constant speed of the substrate in one direction, a photomask for forming a plurality of kinds of convex patterns having different heights by exposing the applied photosensitive resin on said substrate,
A first mask pattern that is formed in a plurality of opaque films that cover one surface of a transparent glass substrate, and that transmits ultraviolet light corresponding to a high convex pattern among the plurality of convex patterns. Are arranged in a straight line in a direction crossing the substrate transport direction, and a second mask pattern that transmits ultraviolet light corresponding to a convex pattern having a low height is formed on the substrate. A plurality of types of mask patterns configured by alternately arranging a plurality of second unit mask pattern rows formed in a straight line in a direction intersecting the transport direction at a predetermined interval ; and
A condensing lens formed on the glass substrate corresponding to the first mask pattern among the plurality of types of mask patterns;
A photomask characterized by comprising: While transporting at a constant speed of the substrate in one direction, a method of forming a plurality of kinds of convex patterns having different heights by exposing the applied photosensitive resin on said substrate,
A first mask pattern that is formed in a plurality of opaque films that cover one surface of a transparent glass substrate, and that transmits ultraviolet light corresponding to a high convex pattern among the plurality of convex patterns. Are arranged in a straight line in a direction crossing the substrate transport direction, and a second mask pattern that transmits ultraviolet light corresponding to a convex pattern having a low height is formed on the substrate. A plurality of types of mask patterns configured by alternately arranging a plurality of second unit mask pattern rows formed in a straight line in a direction intersecting the transport direction at predetermined intervals, and the first of the plurality of types of mask patterns . A condensing lens formed on the glass substrate corresponding to the mask pattern of the photomask is disposed to face the substrate, and a predetermined amount of light is applied from above the photomask. The method comprising the ultraviolet light is irradiated for a predetermined time period, exposing the photosensitive resin by exposure light respectively transmitted through the plurality of kinds of mask patterns different irradiation energies,
Developing the exposed photosensitive resin for a predetermined time to form a plurality of types of convex patterns having different heights;
A method of forming a convex pattern, characterized in that Wherein the step of exposing the photosensitive resin is irradiated with the exposure light in synchronism with the advance division setting a plurality of exposed regions in the direction of movement before Symbol substrate surface to sequentially pass through the lower side of the photomask The convex pattern forming method according to claim 2, wherein: The amount of exposure light and the irradiation time are such that the curing reaction of the portion corresponding to the first mask pattern of the photosensitive resin sufficiently proceeds and the curing reaction of the portion corresponding to the second mask pattern proceeds. 4. The convex pattern forming method according to claim 2, wherein the convex pattern forming method is set to be insufficient. The substrate is a color filter substrate, the high have convex pattern of the height of the plurality of kinds of convex pattern with spacers, which control a cell gap, low the height convex pattern alignment of the liquid crystal molecules 5. The convex pattern forming method according to claim 2 , wherein the convex pattern forming method is an orientation control rib for controlling the above.

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