WO2016114178A1 - Exposure device - Google Patents

Exposure device Download PDF

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Publication number
WO2016114178A1
WO2016114178A1 PCT/JP2016/050148 JP2016050148W WO2016114178A1 WO 2016114178 A1 WO2016114178 A1 WO 2016114178A1 JP 2016050148 W JP2016050148 W JP 2016050148W WO 2016114178 A1 WO2016114178 A1 WO 2016114178A1
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WO
WIPO (PCT)
Prior art keywords
workpiece
photomask
positional relationship
work
imaging
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Application number
PCT/JP2016/050148
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French (fr)
Japanese (ja)
Inventor
松岡尚弥
渡邉智也
山根茂樹
Original Assignee
株式会社村田製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 株式会社村田製作所 filed Critical 株式会社村田製作所
Priority to JP2016569312A priority Critical patent/JP6296174B2/en
Priority to CN201680003247.6A priority patent/CN107077080B/en
Publication of WO2016114178A1 publication Critical patent/WO2016114178A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits

Definitions

  • the present invention relates to an exposure apparatus for performing an exposure process on a strip-shaped workpiece.
  • the photomask 140 is arranged such that the alignment mark A2 of the photomask 140 is positioned outside the outer edge in the width direction of the workpiece 1. And the work 1 are arranged to face each other. Then, while irradiating light from the photomask 140 side with the illuminating means 170, the alignment mark A2 of the photomask 140 and the alignment mark A1 of the workpiece 1 are respectively confirmed by the cameras 160a and 160b.
  • the midpoint of the two alignment marks A2 of the photomask 140, the midpoint of the two alignment marks A1 of the workpiece 1 and the center EP of the exposure light of the exposure apparatus 110 are overlapped.
  • alignment is performed by moving the photomask 140 or the work 1.
  • the present invention solves the above problems, and provides an exposure apparatus capable of performing exposure processing with high accuracy without requiring a complicated process when performing exposure processing on a strip-shaped workpiece. With the goal.
  • the exposure apparatus of the present invention comprises: A work transport means for transporting a strip-shaped work to be exposed; An exposure light source that is disposed to face one main surface of the workpiece and generates exposure light to be irradiated to the workpiece; A photomask disposed between the work transported by the work transporting means and the exposure light source, which is disposed at a position facing an end in the width direction of the work and transmits light.
  • a photomask having a plurality of transmission windows; The plurality of transmission windows of the photomask are arranged so as to face one main surface or the other main surface of the work, and the end portions of the work are located in respective regions of the transmission windows.
  • Imaging means for imaging in an aspect A position adjusting means for relatively adjusting the positional relationship between the work and the photomask; From the relationship between the position of the transmission window obtained by imaging with the imaging means and the position of the end of the workpiece recognized from the transmission window, the positional relationship between the workpiece and the photomask is a target.
  • the positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask so that the positional relationship is satisfied.
  • the photomask includes a plurality of transmission windows facing each of the pair of end portions in the width direction of the workpiece
  • the position adjusting means is configured to be able to relatively adjust the positional relationship of the workpiece and the photomask in the width direction of the workpiece, From the relationship between the positions of the plurality of transmission windows obtained by imaging with the imaging means and the positions of the pair of end portions of the workpiece recognized from the plurality of transmission windows, the workpiece and the photomask
  • the positional adjustment means can relatively adjust the positional relationship in the width direction of the work and the photomask so that the positional relationship in the width direction becomes a target positional relationship. Preferably it is.
  • the photomask includes a plurality of transmission windows facing one end of the pair of end portions in the width direction of the workpiece
  • the position adjusting means is configured to be able to relatively adjust the positional relationship between the workpiece and the photomask in the rotational direction parallel to the main surface of the workpiece, From the relationship between the positions of the plurality of transmission windows obtained by imaging with the imaging means and the positions of the one side end portions of the workpiece recognized from the plurality of transmission windows, the workpiece and the photomask
  • the positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask in the rotational direction so that the positional relationship in the rotational direction becomes the target positional relationship. Preferably it is.
  • Adjust the positional relationship between the workpiece and the photomask in the rotation direction to be the target positional relationship based on the relationship between the position of the multiple transmission windows and the position of one end of the workpiece recognized from the multiple transmission windows.
  • the position adjusting means is configured to adjust at least one of the position of the photomask and the position of the workpiece.
  • the position adjustment means that is configured to adjust the position of either the photomask or the workpiece, the positional relationship can be reliably adjusted without complicating the apparatus configuration.
  • the present invention can be made more effective.
  • it may be configured to adjust the positions of both the photomask and the workpiece.
  • the work when the work is exposed, the work is sucked to hold the work in a predetermined position, and when the work is transported, gas is ejected to float and transport the work. It is preferable to provide a work holding means.
  • the positional relationship between the workpiece and the photomask is determined based on the relationship between the position of the transmission window obtained by imaging with the imaging unit and the position of the end of the workpiece recognized from the transmission window. Since the positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask so that the positional relationship of the belt-shaped workpiece can be obtained. Position adjustment can be performed, and it is not necessary to form an alignment mark on the workpiece, and it is possible to perform exposure processing with high accuracy and efficiency. As a result, it is possible to efficiently manufacture products such as electronic components manufactured through a process of performing exposure processing on a strip-shaped workpiece.
  • FIG. 1 is a schematic plan view of an exposure apparatus according to an embodiment of the present invention.
  • FIG. 2 is a front view (AA sectional view) of the exposure apparatus shown in FIG. 2 is a side view (BB sectional view) of the exposure apparatus shown in FIG. 1.
  • FIG. It is a figure at the time of seeing the workpiece
  • an exposure apparatus 10 includes an exposure processing unit 11 that is an area for performing an exposure process and a strip-shaped work 1 that is an exposure process target in the longitudinal direction of the work 1. And a workpiece conveying means 20 for conveying in the (X direction).
  • the workpiece conveying means 20 is intermittently driven, so that a predetermined region (that is, the photomask 40 of the photomask 40) is subjected to an exposure process in the exposure processing unit 11 for the area pn + 1 to be subjected to the next exposure process.
  • the exposure light is passed through to an area 41p corresponding to the exposure pattern portion 41 for exposing the work 1 and exposed to the exposure pattern portion 41.
  • the conducted region p n are configured to discharge to the outside of the area p n-1 of the exposure processing section 11.
  • a plurality of conveying rollers are used as the workpiece conveying means 20.
  • the exposure processing unit 11 is provided with a work holding means 25.
  • the work holding means 25 includes a suction hole 26 for sucking the work 1.
  • the work holding means 25 sucks from the suction hole 26 to hold the work 1 in a predetermined position. It is configured so that gas can be ejected from the suction hole 26 and the work 1 can be lifted and conveyed. With this configuration, since the workpiece 1 is not conveyed while being rubbed against the workpiece holding means 25, the workpiece 1 can be conveyed smoothly without being damaged.
  • the suction hole 26 is connected to an electromagnetic valve (not shown) that can switch the suction ON / OFF state. However, when there is no concern that the workpiece 1 is damaged, the workpiece 1 does not need to be lifted and transported, and it is not necessary to configure to inject gas from the suction hole 26 of the workpiece holding means 25.
  • the workpiece 1 that is the subject of the exposure processing in this embodiment is, for example, a sheet in which a resin layer, a metal layer, and a photosensitive layer are laminated in order on a PET film.
  • the workpiece 1 is not formed with an alignment mark for alignment.
  • An exposure light source 30 that generates exposure light for irradiating the work 1 is disposed on one main surface 1h side (upper side in FIG. 2) of the work 1 conveyed to the exposure processing unit 11.
  • a light source that generates a wavelength (for example, 200 nm to 600 nm) capable of exposing the photosensitive layer of the workpiece 1 is used.
  • a photomask 40 is disposed between the work 1 and the exposure light source 30 so as to be parallel to the main surface 1 h of the work 1.
  • the interval between the main surface 1h of the work 1 and the photomask 40 is, for example, 0.01 mm to 0.2 mm, and is set at an interval that is a proximity exposure condition.
  • the photomask 40 is formed by applying a light-shielding film 40b that blocks light in a predetermined pattern to a translucent mask main body 40a. That is, the photomask 40 includes a mask body 40a made of a translucent material, and a light shielding film 40b formed on one main surface (the lower surface in this embodiment) of the mask body 40a. an exposure pattern portion 41 for forming a pattern (regions corresponding to the above region p n), provided in the mask periphery portion 45 that is located outside of the exposure pattern unit 41, a plurality of transmitting light (this embodiment 3) transmission windows 42a, 42b, and 42c.
  • the transmission windows 42a to 42c are provided with a light shielding film 40b that blocks light on the mask main body 40a in the mask outer peripheral portion 45 in a predetermined manner (the light shielding film 40b does not exist in the regions that become the transmission windows 42a to 42c). It is formed by giving in aspect.
  • the two transmission windows 42a and 42b are opposed to a pair of end portions (one side end portion 1a and the other side end portion 1b) in the width direction (Y direction) of the work 1, respectively. It is arranged at the position to do.
  • the two transmission windows 42 a and 42 c are arranged at positions facing one end 1 a of the pair of ends 1 a and 1 b of the work 1.
  • the transmission windows 42a to 42c in this embodiment are rectangular and have a pair of edges e parallel to the width direction of the workpiece 1 and a pair of edges f orthogonal to the width direction of the workpiece 1 ( (See FIG. 4).
  • the photomask 40 is sucked and held by mask holding means 47 having a suction function (see FIG. 3).
  • the mask holding unit 47 includes a position adjusting unit 51 in the width direction that can adjust the position of the photomask 40 in the width direction (Y direction) of the work 1 via the support member 48, and the main surface of the work 1. It is attached to a position adjustment means 52 in the rotation direction capable of adjusting the position of the photomask 40 in the rotation direction ( ⁇ direction) parallel to 1h.
  • the photomask 40 is configured to be able to adjust the position in the width direction (Y direction) and the rotation direction ( ⁇ direction).
  • a uniaxial robot is used as the position adjustment unit 51 in the width direction
  • a rotation type uniaxial table is used as the position adjustment unit 52 in the rotation direction.
  • a plurality of imaging units 60a, 60b are provided at positions facing the transmission windows 42a, 42b, 42c of the photomask 40. , 60c.
  • a CCD camera or the like is used for the imaging means 60a to 60c, and each of the imaging means 60a to 60c is configured to image each of the transmission windows 42a to 42c.
  • each of the pair of end portions 1a and 1b of the work 1 is configured to be able to take an image in a mode positioned in the respective regions 43a, 43b and 43c of the transmission windows 42a, 42b and 42c.
  • the exposure apparatus 10 includes the positions of the transmission windows 42a and 42b and the positions of the pair of end portions 1a and 1b of the workpiece 1 recognized from the transmission windows 42a and 42b, which are obtained by imaging with the imaging units 60a and 60b. Is provided with a control means (not shown) for obtaining a positional relationship in the width direction (Y direction) between the workpiece 1 and the photomask 40 and controlling the relationship to a target positional relationship. Then, the position adjustment means 51 in the width direction is driven by the command from the control means, and the photomask 40 is moved in the Y direction so that the position relation between the workpiece 1 and the photomask 40 in the width direction becomes a target position relation. The positional relationship between the workpiece 1 and the photomask 40 in the width direction (Y direction) can be relatively adjusted.
  • control means includes the positions of the transmission windows 42a and 42c and the position of the one end 1a of the workpiece 1 recognized from the transmission windows 42a and 42c, which are obtained by imaging with the imaging means 60a and 60c. From the relationship, the positional relationship in the rotation direction ( ⁇ direction) of the work 1 and the photomask 40 is obtained, and control can be performed so that the relationship becomes the target positional relationship. Then, in this exposure apparatus 10, the position adjustment means 52 in the rotation direction is driven by a command from this control means, so that the positional relationship in the rotation direction between the workpiece 1 and the photomask 40 becomes the target positional relationship. By rotating the photomask 40 in the ⁇ direction, the positional relationship between the workpiece 1 and the photomask 40 in the rotation direction ( ⁇ direction) can be relatively adjusted.
  • a plurality of illumination units 70a, 70b, and 70c are disposed above the photomask 40 at positions facing the imaging units 60a, 60b, and 60c, respectively.
  • the illumination means 70a to 70c are provided on the exposure light source 30 side with respect to the light emitting part 71 disposed close to the photomask 40, and the exposure light of the exposure light source 30 irradiated to the imaging means 60a to 60c.
  • a light shielding portion 72 for shielding the light.
  • a light-emitting body that generates a wavelength (for example, 400 nm to 800 nm) that can appropriately image the ends 1a and 1b of the workpiece 1 and the transmission windows 42a to 42c by the imaging means 60a to 60c is used. It is done. In addition, when it overlaps with the wavelength which can sensitize the photosensitive layer of the workpiece
  • a cut filter for example, 400 nm to 800 nm
  • the workpiece 1 is sucked and held by the workpiece holding means 25 while the belt-like workpiece 1 is transferred in the longitudinal direction (X direction) by the workpiece transfer means 20 and is positioned in the exposure processing unit 11.
  • the transmission windows 42a to 42c of the photomask 40 are respectively imaged by the imaging means 60a to 60c.
  • the illumination means 70a to 70c irradiate the transmission windows 42a to 42c with illumination light.
  • the workpiece 1 and the photomask The positional relationship between the workpiece 1 and the photomask 40 is relatively adjusted so that the positional relationship 40 becomes the target positional relationship.
  • the positional relationship is adjusted by the following method.
  • the respective distances y1 obtained for the transmission windows 42a and 42b arranged adjacent to each other in the width direction (Y direction) ( The position adjustment means 51 in the width direction is driven so that y1a, y1b) are equal (or the difference in distance is within a predetermined range), and the position of the photomask 40 in the width direction (Y direction) with respect to the workpiece 1 Adjust. Further, the distances y1 (y1a, y1c) obtained for the transmission windows 42a, 42c disposed adjacent to each other in the longitudinal direction (X direction) so that the one end 1a of the work 1 can be recognized at two places. So as to be equal (or so that the distance difference is within a predetermined range), the position adjustment means 52 in the rotation direction is driven to adjust the position of the photomask 40 in the rotation direction ( ⁇ direction) relative to the workpiece 1.
  • the exposure light source 30 irradiates the work 1 with exposure light.
  • the workpiece 1 After performing the exposure process, the workpiece 1 is transported in the longitudinal direction, the area pn where the exposure process of the workpiece 1 is performed is discharged from the exposure processing unit 11, and the area where the exposure process is to be performed next to the workpiece 1 pn + 1 is conveyed to the exposure processing unit 11.
  • the work 1 is transported in a state of being lifted from the work holding means 25 by ejecting gas from the suction hole 26 of the work holding means 25. At this time, if there is a possibility that the workpiece 1 may come into contact with the illumination means 70a to 70c and be damaged, as shown in FIG. 5, the vertical movement means 53 for moving the photomask 40 and the illumination means 70a to 70c up and down. After the photomask 40 and the illuminating means 70a to 70c are retracted upward, gas can be ejected from the suction hole 26 of the work holding means 25, and the work 1 can be lifted and conveyed. is there.
  • the exposure process can be sequentially performed by repeating the above-described steps.
  • the above-described exposure apparatus is based on the relationship between the position of the transmission window obtained by imaging with the imaging unit and the position of the end of the workpiece recognized from the transmission window. Since the positional adjustment means adjusts the positional relationship between the work and the photomask so that the positional relationship becomes the target positional relationship, the strip-shaped workpiece and the photomask are not dependent on the alignment mark of the workpiece. Can be adjusted.
  • the mode in which the photomask 40 side is moved in order to adjust the relative positional relationship between the workpiece 1 and the photomask 40 has been described.
  • a mode in which the workpiece 1 side is moved is also possible. is there. That is, as shown in FIG. 6, the position adjusting means 51 in the width direction and the position adjusting means 52 in the rotational direction are attached to the work holding means 25, and the work 1 held by the work holding means 25 is moved to move the work 1 It is also possible to adjust the relative positional relationship between the photomask 40 and the photomask 40. Even in this case, the same effects as those in the above-described embodiment can be obtained.
  • the imaging means 60a to 60c are arranged on the other main surface 1i side of the work 1.
  • the imaging means 60a to 60c are arranged on the one main surface 1h side of the work 1. It is also possible to set up and image (see FIG. 6).
  • arranging the imaging means so as to oppose one or the other main surface of the workpiece means arranging the imaging means main body including a lens or a sensor so as to oppose one or the other main surface of the workpiece. This is a wide concept including not only the case but also a case where members such as a mirror and a prism constituting the imaging means are arranged to face one or the other main surface of the workpiece.
  • the positional relationship (relationship between the positions of the transmission windows 42a to 42c and the positions of the end portions 1a and 1b in the width direction of the workpiece 1) obtained by imaging with the imaging units 60a to 60c is used.
  • the position of the photomask 40 is adjusted with respect to the work 1 conveyed to the exposure processing unit 11, and then the exposure process is performed.
  • the positional relationship information obtained by imaging is used. It can also be used when performing exposure processing in the next shot. That is, when the region pn + 1 of the work 1 to be subjected to the next exposure process is transported to the exposure processing unit 11, the positional relationship in the exposure processing unit 11 is set in advance so as to become the target positional relationship.
  • the exposure process can be performed without adjusting the position. Even in this case, the same effects as those in the above-described embodiment can be obtained.
  • the interval between the regions where the exposure processing is performed be as small as possible.
  • the interval between the above regions can be set to 0 mm to 4 mm, for example.
  • the shape of the transmission windows 42a to 42c of the photomask 40 in the present invention is not particularly limited, and may be polygonal, circular, or elliptical.
  • the distance y1 (y1a, y1b, y1c) with respect to f is obtained for each of the transmission windows 42a to 42c. If the position is opposite to the end in the width direction of the workpiece, the rectangular transmission windows 42a to 42c are used.
  • a distance from a predetermined portion of the photomask 40 other than the edge f orthogonal to the width direction (Y direction) may be obtained.
  • the workpiece 1 is a multilayer sheet composed of a plurality of layers
  • a predetermined layer of the plurality of layers is used. Can be set as an imaging target.
  • a circuit pattern can be formed on the workpiece and an alignment mark can be formed by using exposure light when performing an exposure process.
  • post-processes such as stacking, bonding, and mounting processes based on the alignment marks formed using the exposure apparatus.

Abstract

[Problem] To provide an exposure device capable of performing exposure processing with good precision without requiring complicated steps in the case in which the exposure processing is performed on a strip-shaped workpiece. [Solution] This exposure device comprises a workpiece conveyance means 20 for conveying a strip-shaped workpiece 1, an exposure light source 30 for generating exposure light, a photomask 40 having transmissive windows 42a-42c positioned at positions opposing ends 1a and 1b in the width direction of the workpiece 1, imaging means 60a-60c for imaging the transmissive windows 42a-42c, and position adjustment means 51 and 52 for adjusting the positional relationship between the workpiece 1 and the photomask 40. The exposure device is configured so as to be capable of adjusting the positional relationship between the workpiece 1 and the photomask 40 in such a way that the positional relationship between the workpiece 1 and the photomask 40 becomes a target positional relationship, on the basis of the relationship between the positions of the transmissive windows 42a-42c obtained by imaging with the imaging means 60a-60c and the positions of the ends 1a and 1b of the workpiece 1 recognized through the transmissive windows 42a-42c.

Description

露光装置Exposure equipment
　本発明は、帯状のワークに露光処理を行うための露光装置に関する。 The present invention relates to an exposure apparatus for performing an exposure process on a strip-shaped workpiece.
　帯状のワークを搬送する場合には、通常、ワークの幅方向に蛇行が生じるので、露光装置で露光処理を行うにあたり、帯状のワークと、ワークに回路パターンを形成するためのフォトマスクとの位置合わせを行うことが必要とされている。
　そのような露光装置として、一般的に、帯状のワークとフォトマスクのそれぞれにアライメントマークを設け、それらのアライメントマークの位置情報に基づいて位置合わせを行う方法が採用されている。
　そして、特許文献１には、そのような露光装置の一例が開示されている。 When transporting a belt-shaped workpiece, meandering usually occurs in the width direction of the workpiece. Therefore, when performing exposure processing with an exposure apparatus, the position of the belt-shaped workpiece and a photomask for forming a circuit pattern on the workpiece There is a need to match.
As such an exposure apparatus, a method is generally employed in which alignment marks are provided on each of a belt-like workpiece and a photomask, and alignment is performed based on positional information of these alignment marks.
Patent Document 1 discloses an example of such an exposure apparatus.
　この特許文献１に開示されている露光装置１１０は、図７に示すように、まず、フォトマスク１４０のアライメントマークＡ２が、ワーク１の幅方向の外縁の外側に位置するように、フォトマスク１４０とワーク１とを対向させて配置するようにしている。
　そして、フォトマスク１４０側から照明手段１７０で光を照射しながら、フォトマスク１４０のアライメントマークＡ２とワーク１のアライメントマークＡ１を、カメラ１６０ａ、１６０ｂでそれぞれ確認するようにしている。 In the exposure apparatus 110 disclosed in Patent Document 1, as shown in FIG. 7, first, the photomask 140 is arranged such that the alignment mark A2 of the photomask 140 is positioned outside the outer edge in the width direction of the workpiece 1. And the work 1 are arranged to face each other.
Then, while irradiating light from the photomask 140 side with the illuminating means 170, the alignment mark A2 of the photomask 140 and the alignment mark A1 of the workpiece 1 are respectively confirmed by the cameras 160a and 160b.
　次に、位置合わせを行う場合は、フォトマスク１４０の２つのアライメントマークＡ２の中点と、ワーク１の２つのアライメントマークＡ１の中点と、露光装置１１０の露光光の中心ＥＰとが重なり合うように、フォトマスク１４０又はワーク１移動させることで位置合わせを行うようにしている。 Next, when alignment is performed, the midpoint of the two alignment marks A2 of the photomask 140, the midpoint of the two alignment marks A1 of the workpiece 1 and the center EP of the exposure light of the exposure apparatus 110 are overlapped. In addition, alignment is performed by moving the photomask 140 or the work 1.
特開２００１－２３５８７７号公報JP 2001-235877 A
　しかし、特許文献１に開示されたような露光装置１１０を用いる場合は、露光処理の前に、ワーク１にアライメントマークＡ１を形成する工程が必要となり、製造工程が多くなるという問題点がある。 However, when the exposure apparatus 110 disclosed in Patent Document 1 is used, there is a problem that a process for forming the alignment mark A1 on the work 1 is required before the exposure process, and the manufacturing process is increased.
　本発明は、上記課題を解決するものであり、帯状のワークに露光処理を施す場合に、複雑な工程を必要とすることなく、精度よく露光処理を施すことが可能な露光装置を提供することを目的とする。 The present invention solves the above problems, and provides an exposure apparatus capable of performing exposure processing with high accuracy without requiring a complicated process when performing exposure processing on a strip-shaped workpiece. With the goal.
　上記課題を解決するため、本発明の露光装置は、
　露光処理対象である帯状のワークを搬送するワーク搬送手段と、
　前記ワークの一方の主面に対向するように配設され、前記ワークに照射する露光光を発生させる露光光源と、
　前記ワーク搬送手段により搬送される前記ワークと、前記露光光源との間に配設されるフォトマスクであって、前記ワークの幅方向の端部と対向する位置に配置された、光を透過させる複数の透過窓を有するフォトマスクと、
　前記ワークの一方の主面または他方の主面に対向するように配設され、前記フォトマスクの複数の前記透過窓を、前記ワークの前記端部が前記透過窓のそれぞれの領域内に位置する態様で撮像する撮像手段と、
　前記ワークと前記フォトマスクの位置関係を相対的に調整する位置調整手段と
　を備え、
　前記撮像手段で撮像することにより得られる、前記透過窓の位置と、前記透過窓から認識される前記ワークの前記端部の位置との関係から、前記ワークと前記フォトマスクの位置関係が目標とする位置関係になるように、前記位置調整手段により、前記ワークと前記フォトマスクの位置関係を相対的に調整することができるように構成されていること
　を特徴としている。　 In order to solve the above problems, the exposure apparatus of the present invention comprises:
A work transport means for transporting a strip-shaped work to be exposed;
An exposure light source that is disposed to face one main surface of the workpiece and generates exposure light to be irradiated to the workpiece;
A photomask disposed between the work transported by the work transporting means and the exposure light source, which is disposed at a position facing an end in the width direction of the work and transmits light. A photomask having a plurality of transmission windows;
The plurality of transmission windows of the photomask are arranged so as to face one main surface or the other main surface of the work, and the end portions of the work are located in respective regions of the transmission windows. Imaging means for imaging in an aspect;
A position adjusting means for relatively adjusting the positional relationship between the work and the photomask;
From the relationship between the position of the transmission window obtained by imaging with the imaging means and the position of the end of the workpiece recognized from the transmission window, the positional relationship between the workpiece and the photomask is a target. The positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask so that the positional relationship is satisfied.
　本発明の露光装置においては、前記フォトマスクが、前記ワークの幅方向の一対の端部のそれぞれと対向する透過窓を複数備えているとともに、
　前記位置調整手段が、前記ワークと前記フォトマスクの、前記ワークの幅方向の位置関係を相対的に調整することができるように構成されており、
　前記撮像手段で撮像することにより得られる、複数の前記透過窓の位置と、複数の前記透過窓から認識される前記ワークの前記一対の端部の位置との関係から、前記ワークと前記フォトマスクの幅方向における位置関係が目標とする位置関係になるように、前記位置調整手段により、前記ワークと前記フォトマスクの前記幅方向の位置関係を相対的に調整することができるように構成されていることが好ましい。 In the exposure apparatus of the present invention, the photomask includes a plurality of transmission windows facing each of the pair of end portions in the width direction of the workpiece,
The position adjusting means is configured to be able to relatively adjust the positional relationship of the workpiece and the photomask in the width direction of the workpiece,
From the relationship between the positions of the plurality of transmission windows obtained by imaging with the imaging means and the positions of the pair of end portions of the workpiece recognized from the plurality of transmission windows, the workpiece and the photomask The positional adjustment means can relatively adjust the positional relationship in the width direction of the work and the photomask so that the positional relationship in the width direction becomes a target positional relationship. Preferably it is.
　複数の透過窓の位置と、複数の透過窓から認識されるワークの一対の端部の位置との関係から、ワークとフォトマスクの幅方向における位置関係が目標とする位置関係になるように調整することができるように構成した場合には、ワークとフォトマスクの幅方向の位置関係について、より精度の高い位置合わせを行うことが可能になる。 Adjust the positional relationship in the width direction between the workpiece and the photomask so that it becomes the target positional relationship based on the relationship between the position of the multiple transmission windows and the position of the pair of ends of the workpiece recognized from the multiple transmission windows. When configured to be able to do so, it is possible to perform more accurate alignment with respect to the positional relationship between the workpiece and the photomask in the width direction.
　また、前記フォトマスクが、前記ワークの幅方向の一対の端部のうちの一方側端部と対向する透過窓を複数備えているとともに、
　前記位置調整手段が、前記ワークと前記フォトマスクの、前記ワークの主面に平行な回転方向の位置関係を相対的に調整することができるように構成されており、
　前記撮像手段で撮像することにより得られる、複数の前記透過窓の位置と、複数の前記透過窓から認識される前記ワークの前記一方側端部の位置との関係から、前記ワークと前記フォトマスクの回転方向における位置関係が目標とする位置関係になるように、前記位置調整手段により、前記ワークと前記フォトマスクの前記回転方向の位置関係を相対的に調整することができるように構成されていることが好ましい。 In addition, the photomask includes a plurality of transmission windows facing one end of the pair of end portions in the width direction of the workpiece,
The position adjusting means is configured to be able to relatively adjust the positional relationship between the workpiece and the photomask in the rotational direction parallel to the main surface of the workpiece,
From the relationship between the positions of the plurality of transmission windows obtained by imaging with the imaging means and the positions of the one side end portions of the workpiece recognized from the plurality of transmission windows, the workpiece and the photomask The positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask in the rotational direction so that the positional relationship in the rotational direction becomes the target positional relationship. Preferably it is.
　複数の透過窓の位置と、複数の透過窓から認識されるワークの一方側端部の位置との関係から、ワークとフォトマスクの回転方向における位置関係が目標とする位置関係になるように調整することができるように構成した場合には、ワークとフォトマスクの回転方向の位置関係について、より精度の高い位置合わせを行うことが可能になる。 Adjust the positional relationship between the workpiece and the photomask in the rotation direction to be the target positional relationship based on the relationship between the position of the multiple transmission windows and the position of one end of the workpiece recognized from the multiple transmission windows. When configured to be able to do so, it is possible to perform more accurate alignment with respect to the positional relationship in the rotation direction of the workpiece and the photomask.
　また、前記位置調整手段が、前記フォトマスクの位置、および、前記ワークの位置の少なくとも一方を調整するように構成されていることが好ましい。 Further, it is preferable that the position adjusting means is configured to adjust at least one of the position of the photomask and the position of the workpiece.
　位置調整手段として、フォトマスクおよびワークのいずれか一方の位置を調整するように構成されたものを用いることにより、装置構成の複雑化を招くことなく、確実に上記位置関係を調整することが可能になり、本発明をより実効あらしめることができる。
　ただし、場合によっては、フォトマスクおよびワークの両方の位置を調整するように構成することも可能である。 By using the position adjustment means that is configured to adjust the position of either the photomask or the workpiece, the positional relationship can be reliably adjusted without complicating the apparatus configuration. Thus, the present invention can be made more effective.
However, in some cases, it may be configured to adjust the positions of both the photomask and the workpiece.
　また、前記ワークへの露光時には、前記ワークを吸引して所定位置に前記ワークを保持し、前記ワークの搬送時には、気体を噴出して前記ワークを浮かせて搬送することができるように構成されたワーク保持手段を備えていることが好ましい。 In addition, when the work is exposed, the work is sucked to hold the work in a predetermined position, and when the work is transported, gas is ejected to float and transport the work. It is preferable to provide a work holding means.
　上記構成を備えることにより、ワークがワーク保持手段と擦れながら搬送されることがなくなるため、ワークにダメージを与えることなく円滑に搬送することが可能な信頼性の高い露光装置を提供することができる。 With the above configuration, since the workpiece is not conveyed while rubbing against the workpiece holding means, it is possible to provide a highly reliable exposure apparatus that can be conveyed smoothly without damaging the workpiece. .
　本発明の露光装置は、撮像手段で撮像することにより得られる、透過窓の位置と、透過窓から認識されるワークの端部の位置との関係から、ワークとフォトマスクの位置関係が目標とする位置関係になるように、位置調整手段により、ワークとフォトマスクの位置関係を相対的に調整することができるように構成されているので、ワークのアライメントマークを用いずに、帯状のワークの位置調整を行うことができ、ワークにアライメントマークを形成することを不要にして、効率よく精度の高い露光処理を行うことが可能になる。その結果、帯状のワークに露光処理を行う工程を経て製造される電子部品などの製品を効率よく製造することが可能になる。 In the exposure apparatus of the present invention, the positional relationship between the workpiece and the photomask is determined based on the relationship between the position of the transmission window obtained by imaging with the imaging unit and the position of the end of the workpiece recognized from the transmission window. Since the positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask so that the positional relationship of the belt-shaped workpiece can be obtained. Position adjustment can be performed, and it is not necessary to form an alignment mark on the workpiece, and it is possible to perform exposure processing with high accuracy and efficiency. As a result, it is possible to efficiently manufacture products such as electronic components manufactured through a process of performing exposure processing on a strip-shaped workpiece.
本発明の実施形態にかかる露光装置の概略平面図である。1 is a schematic plan view of an exposure apparatus according to an embodiment of the present invention. 図１に示した露光装置の正面図（Ａ－Ａ断面図）である。FIG. 2 is a front view (AA sectional view) of the exposure apparatus shown in FIG. 図１に示した露光装置の側面図（Ｂ－Ｂ断面図）である。2 is a side view (BB sectional view) of the exposure apparatus shown in FIG. 1. FIG. 図２に示した露光装置のワークとフォトマスクを矢印Ｃ（図２）側からみた場合の図である。It is a figure at the time of seeing the workpiece | work and photomask of the exposure apparatus shown in FIG. 2 from the arrow C (FIG. 2) side. 本発明の実施形態にかかる露光装置にて、ワークを搬送するときの状態を示す図である。It is a figure which shows a state when conveying a workpiece | work with the exposure apparatus concerning embodiment of this invention. 本発明の実施形態にかかる露光装置の変形例を示す図である。It is a figure which shows the modification of the exposure apparatus concerning embodiment of this invention. 従来の露光装置を示す図であり、（ａ）は平面図、（ｂ）は側面図である。It is a figure which shows the conventional exposure apparatus, (a) is a top view, (b) is a side view.
　次に、本発明の実施形態を示して本発明をさらに詳しく説明する。 Next, the present invention will be described in more detail by showing embodiments of the present invention.
　本発明の実施形態にかかる露光装置１０は、図１～３に示すように、露光処理を行う領域である露光処理部１１と、露光処理対象である帯状のワーク１を、ワーク１の長手方向（Ｘ方向）に搬送するワーク搬送手段２０とを備えている。 As shown in FIGS. 1 to 3, an exposure apparatus 10 according to an embodiment of the present invention includes an exposure processing unit 11 that is an area for performing an exposure process and a strip-shaped work 1 that is an exposure process target in the longitudinal direction of the work 1. And a workpiece conveying means 20 for conveying in the (X direction).
　ワーク搬送手段２０は、間欠駆動することで、ワーク１の、次に露光処理が行われるべき領域ｐn+1を露光処理部１１において露光処理を行う所定の領域（すなわち、フォトマスク４０の、露光光を通過させてワーク１への露光を行うための露光パターン部４１に対応する領域）４１ｐに搬送するとともに、ワーク１の、露光パターン部４１に対応する領域４１ｐに搬送され、露光処理が行われた領域ｐnを、露光処理部１１の外側の領域ｐn-1に排出するように構成されている。ワーク搬送手段２０としては、例えば、複数の搬送ローラなどが用いられる。 The workpiece conveying means 20 is intermittently driven, so that a predetermined region (that is, the photomask 40 of the photomask 40) is subjected to an exposure process in the exposure processing unit 11 for the area pn + 1 to be subjected to the next exposure process. The exposure light is passed through to an area 41p corresponding to the exposure pattern portion 41 for exposing the work 1 and exposed to the exposure pattern portion 41. the conducted region p n, are configured to discharge to the outside of the area p n-1 of the exposure processing section 11. As the workpiece conveying means 20, for example, a plurality of conveying rollers are used.
　露光処理部１１には、ワーク保持手段２５が配設されている。
　ワーク保持手段２５は、ワーク１を吸引するための吸引孔２６を備えており、ワーク１への露光時には、吸引孔２６から吸引して所定位置にワーク１を保持し、ワーク１の搬送時には、吸引孔２６から気体を噴出してワーク１を浮かせて搬送することができるように構成されている。この構成により、ワーク１がワーク保持手段２５と擦れながら搬送されることがなくなるため、ワーク１にダメージを与えることなく円滑に搬送することが可能となる。
　なお、吸引孔２６は、吸引ＯＮ／ＯＦＦの状態を切り替えることのできる電磁弁（図示せず）に接続されている。
　ただし、ワーク１が損傷する懸念のないような場合には、ワーク１を浮かせて搬送する必要はなく、ワーク保持手段２５の吸引孔２６から気体を噴射させるように構成する必要もない。 The exposure processing unit 11 is provided with a work holding means 25.
The work holding means 25 includes a suction hole 26 for sucking the work 1. When the work 1 is exposed, the work holding means 25 sucks from the suction hole 26 to hold the work 1 in a predetermined position. It is configured so that gas can be ejected from the suction hole 26 and the work 1 can be lifted and conveyed. With this configuration, since the workpiece 1 is not conveyed while being rubbed against the workpiece holding means 25, the workpiece 1 can be conveyed smoothly without being damaged.
The suction hole 26 is connected to an electromagnetic valve (not shown) that can switch the suction ON / OFF state.
However, when there is no concern that the workpiece 1 is damaged, the workpiece 1 does not need to be lifted and transported, and it is not necessary to configure to inject gas from the suction hole 26 of the workpiece holding means 25.
　この実施形態の露光処理対象であるワーク１は、例えば、ＰＥＴフィルムに樹脂層、金属層、感光層が順に積層形成されたシートである。このワーク１には、位置合わせをするためのアライメントマークは形成されていない。 The workpiece 1 that is the subject of the exposure processing in this embodiment is, for example, a sheet in which a resin layer, a metal layer, and a photosensitive layer are laminated in order on a PET film. The workpiece 1 is not formed with an alignment mark for alignment.
　露光処理部１１に搬送されたワーク１の一方の主面１ｈ側（図２における上方）には、ワーク１に照射する露光光を発生させる露光光源３０が配設されている。露光光源３０としては、ワーク１の感光層を感光させることのできる波長（例えば、２００ｎｍ～６００ｎｍ）を発生する光源が用いられる。 An exposure light source 30 that generates exposure light for irradiating the work 1 is disposed on one main surface 1h side (upper side in FIG. 2) of the work 1 conveyed to the exposure processing unit 11. As the exposure light source 30, a light source that generates a wavelength (for example, 200 nm to 600 nm) capable of exposing the photosensitive layer of the workpiece 1 is used.
　ワーク１と露光光源３０の間には、ワーク１の主面１ｈと平行になるようにフォトマスク４０が配設されている。
　ワーク１の主面１ｈとフォトマスク４０の間隔は、例えば、０．０１ｍｍ～０．２ｍｍであり、プロキシミティー露光条件となる間隔で設定されている。 A photomask 40 is disposed between the work 1 and the exposure light source 30 so as to be parallel to the main surface 1 h of the work 1.
The interval between the main surface 1h of the work 1 and the photomask 40 is, for example, 0.01 mm to 0.2 mm, and is set at an interval that is a proximity exposure condition.
　フォトマスク４０は、透光性を有するマスク本体４０ａに、光を遮断する遮光膜４０ｂを所定のパターンで付与することにより形成されている。
　すなわち、フォトマスク４０は、透光性材料からなるマスク本体４０ａと、マスク本体４０ａの一方側主面（この実施形態では下面）に形成された遮光膜４０ｂとを備えており、ワーク１に回路パターンを形成するための露光パターン部４１（上述の領域ｐnに対応する領域）と、該露光パターン部４１の外側に位置するマスク外周部４５に設けられた、光を透過させる複数（この実施形態では３つ）の透過窓４２ａ，４２ｂ，４２ｃとを有している。
　なお、透過窓４２ａ～４２ｃは、マスク外周部４５において、マスク本体４０ａに、光を遮断する遮光膜４０ｂを所定の態様（透過窓４２ａ～４２ｃとなる領域には遮光膜４０ｂを存在させないような態様）で付与することにより形成されている。 The photomask 40 is formed by applying a light-shielding film 40b that blocks light in a predetermined pattern to a translucent mask main body 40a.
That is, the photomask 40 includes a mask body 40a made of a translucent material, and a light shielding film 40b formed on one main surface (the lower surface in this embodiment) of the mask body 40a. an exposure pattern portion 41 for forming a pattern (regions corresponding to the above region p n), provided in the mask periphery portion 45 that is located outside of the exposure pattern unit 41, a plurality of transmitting light (this embodiment 3) transmission windows 42a, 42b, and 42c.
It should be noted that the transmission windows 42a to 42c are provided with a light shielding film 40b that blocks light on the mask main body 40a in the mask outer peripheral portion 45 in a predetermined manner (the light shielding film 40b does not exist in the regions that become the transmission windows 42a to 42c). It is formed by giving in aspect.
　３つの透過窓４２ａ～４２ｃのうち、２つの透過窓４２ａ，４２ｂは、ワーク１の幅方向（Ｙ方向）の一対の端部（一方側端部１ａ，他方側端部１ｂ）のそれぞれと対向する位置に配置されている。
　また、３つの透過窓４２ａ～４２ｃのうち、２つの透過窓４２ａ，４２ｃは、ワーク１の一対の端部１ａ，１ｂのうちの一方側端部１ａと対向する位置に配置されている。 Of the three transmission windows 42a to 42c, the two transmission windows 42a and 42b are opposed to a pair of end portions (one side end portion 1a and the other side end portion 1b) in the width direction (Y direction) of the work 1, respectively. It is arranged at the position to do.
Of the three transmission windows 42 a to 42 c, the two transmission windows 42 a and 42 c are arranged at positions facing one end 1 a of the pair of ends 1 a and 1 b of the work 1.
　この実施形態における透過窓４２ａ～４２ｃは、方形であり、ワーク１の幅方向に平行な一対の縁部ｅと、ワーク１の幅方向に直交する一対の縁部ｆとを有している（図４参照）。 The transmission windows 42a to 42c in this embodiment are rectangular and have a pair of edges e parallel to the width direction of the workpiece 1 and a pair of edges f orthogonal to the width direction of the workpiece 1 ( (See FIG. 4).
　フォトマスク４０は、吸引機能を備えたマスク保持手段４７により吸引保持されている（図３参照）。マスク保持手段４７は、支持部材４８を介して、ワーク１の幅方向（Ｙ方向）に、フォトマスク４０の位置を調整することが可能な幅方向の位置調整手段５１と、ワーク１の主面１ｈに平行な回転方向（θ方向）に、フォトマスク４０の位置を調整することが可能な回転方向の位置調整手段５２に取り付けられている。
　これにより、フォトマスク４０は、幅方向（Ｙ方向）と回転方向（θ方向）の位置を調整することができるように構成されている。
　なお、幅方向の位置調整手段５１としては、例えば、一軸ロボットが用いられ、回転方向の位置調整手段５２としては、例えば、回転型一軸テーブルが用いられる。 The photomask 40 is sucked and held by mask holding means 47 having a suction function (see FIG. 3). The mask holding unit 47 includes a position adjusting unit 51 in the width direction that can adjust the position of the photomask 40 in the width direction (Y direction) of the work 1 via the support member 48, and the main surface of the work 1. It is attached to a position adjustment means 52 in the rotation direction capable of adjusting the position of the photomask 40 in the rotation direction (θ direction) parallel to 1h.
Thereby, the photomask 40 is configured to be able to adjust the position in the width direction (Y direction) and the rotation direction (θ direction).
For example, a uniaxial robot is used as the position adjustment unit 51 in the width direction, and a rotation type uniaxial table is used as the position adjustment unit 52 in the rotation direction.
　露光処理部１１に搬送されたワーク１の他方の主面１ｉ側（図２における下方）には、フォトマスク４０の透過窓４２ａ，４２ｂ，４２ｃに対向する位置に、複数の撮像手段６０ａ，６０ｂ，６０ｃが配設されている。撮像手段６０ａ～６０ｃには、例えば、ＣＣＤカメラなどが用いられており、各撮像手段６０ａ～６０ｃが、透過窓４２ａ～４２ｃのそれぞれを撮像するように構成されている。
　そして、図４に示すように、ワーク１の一対の端部１ａ，１ｂのそれぞれを、透過窓４２ａ，４２ｂ，４２ｃのそれぞれの領域内４３ａ，４３ｂ，４３ｃに位置する態様で撮像できるように構成されている。 On the other main surface 1i side (downward in FIG. 2) of the workpiece 1 conveyed to the exposure processing unit 11, a plurality of imaging units 60a, 60b are provided at positions facing the transmission windows 42a, 42b, 42c of the photomask 40. , 60c. For example, a CCD camera or the like is used for the imaging means 60a to 60c, and each of the imaging means 60a to 60c is configured to image each of the transmission windows 42a to 42c.
Then, as shown in FIG. 4, each of the pair of end portions 1a and 1b of the work 1 is configured to be able to take an image in a mode positioned in the respective regions 43a, 43b and 43c of the transmission windows 42a, 42b and 42c. Has been.
　この露光装置１０は、撮像手段６０ａ，６０ｂで撮像することにより得られる、透過窓４２ａ，４２ｂの位置と、透過窓４２ａ，４２ｂから認識されるワーク１の一対の端部１ａ，１ｂの位置との関係から、ワーク１とフォトマスク４０の幅方向（Ｙ方向）における位置関係を求め、その関係が目標とする位置関係になるよう制御する制御手段（図示せず）を備えている。
　そして、この制御手段からの指令によって、幅方向の位置調整手段５１が駆動され、ワーク１とフォトマスク４０の幅方向における位置関係が目標とする位置関係となるように、フォトマスク４０をＹ方向に移動させることにより、ワーク１とフォトマスク４０の幅方向（Ｙ方向）の位置関係を相対的に調整することができるように構成されている。 The exposure apparatus 10 includes the positions of the transmission windows 42a and 42b and the positions of the pair of end portions 1a and 1b of the workpiece 1 recognized from the transmission windows 42a and 42b, which are obtained by imaging with the imaging units 60a and 60b. Is provided with a control means (not shown) for obtaining a positional relationship in the width direction (Y direction) between the workpiece 1 and the photomask 40 and controlling the relationship to a target positional relationship.
Then, the position adjustment means 51 in the width direction is driven by the command from the control means, and the photomask 40 is moved in the Y direction so that the position relation between the workpiece 1 and the photomask 40 in the width direction becomes a target position relation. The positional relationship between the workpiece 1 and the photomask 40 in the width direction (Y direction) can be relatively adjusted.
　また、この制御手段は、撮像手段６０ａ，６０ｃで撮像することにより得られる、透過窓４２ａ，４２ｃの位置と、透過窓４２ａ，４２ｃから認識されるワーク１の一方側端部１ａの位置との関係から、ワーク１とフォトマスク４０の回転方向（θ方向）における位置関係を求め、その関係が目標とする位置関係になるように制御することができるように構成されている。
　そして、この露光装置１０は、この制御手段からの指令によって、回転方向の位置調整手段５２が駆動され、ワーク１とフォトマスク４０の回転方向における位置関係が目標とする位置関係となるように、フォトマスク４０をθ方向に回転させることにより、ワーク１とフォトマスク４０の回転方向（θ方向）の位置関係を相対的に調整することができるように構成されている。 In addition, the control means includes the positions of the transmission windows 42a and 42c and the position of the one end 1a of the workpiece 1 recognized from the transmission windows 42a and 42c, which are obtained by imaging with the imaging means 60a and 60c. From the relationship, the positional relationship in the rotation direction (θ direction) of the work 1 and the photomask 40 is obtained, and control can be performed so that the relationship becomes the target positional relationship.
Then, in this exposure apparatus 10, the position adjustment means 52 in the rotation direction is driven by a command from this control means, so that the positional relationship in the rotation direction between the workpiece 1 and the photomask 40 becomes the target positional relationship. By rotating the photomask 40 in the θ direction, the positional relationship between the workpiece 1 and the photomask 40 in the rotation direction (θ direction) can be relatively adjusted.
　なお、この露光装置１０は、フォトマスク４０の上方で、撮像手段６０ａ，６０ｂ，６０ｃに対向する位置に、複数の照明手段７０ａ，７０ｂ，７０ｃがそれぞれ配設されている。
　照明手段７０ａ～７０ｃは、フォトマスク４０に近接して配置された発光部７１と、発光部７１よりも露光光源３０側に設けられ、撮像手段６０ａ～６０ｃに照射される露光光源３０の露光光を遮る遮光部７２とを有している。発光部７１としては、撮像手段６０ａ～６０ｃによって、ワーク１の端部１ａ，１ｂや透過窓４２ａ～４２ｃを適切に撮像することができる波長（例えば、４００ｎｍ～８００ｎｍ）を発生する発光体が用いられる。なお、ワーク１の感光層を感光させることのできる波長と重なる場合は、カットフィルタの追加などにより、発光部７１の光で露光されてしまわないような措置を取ることが好ましい。 In the exposure apparatus 10, a plurality of illumination units 70a, 70b, and 70c are disposed above the photomask 40 at positions facing the imaging units 60a, 60b, and 60c, respectively.
The illumination means 70a to 70c are provided on the exposure light source 30 side with respect to the light emitting part 71 disposed close to the photomask 40, and the exposure light of the exposure light source 30 irradiated to the imaging means 60a to 60c. And a light shielding portion 72 for shielding the light. As the light-emitting unit 71, a light-emitting body that generates a wavelength (for example, 400 nm to 800 nm) that can appropriately image the ends 1a and 1b of the workpiece 1 and the transmission windows 42a to 42c by the imaging means 60a to 60c is used. It is done. In addition, when it overlaps with the wavelength which can sensitize the photosensitive layer of the workpiece | work 1, it is preferable to take measures so that it may not be exposed with the light of the light emission part 71 by addition of a cut filter.
　次に、上述の露光装置１０を用いてワーク１に露光処理を行う方法について説明する。 Next, a method for performing an exposure process on the workpiece 1 using the above-described exposure apparatus 10 will be described.
　まず、ワーク搬送手段２０によって、帯状のワーク１を長手方向（Ｘ方向）に搬送し、露光処理部１１に位置させた状態で、ワーク保持手段２５によって、ワーク１を吸引保持する。 First, the workpiece 1 is sucked and held by the workpiece holding means 25 while the belt-like workpiece 1 is transferred in the longitudinal direction (X direction) by the workpiece transfer means 20 and is positioned in the exposure processing unit 11.
　次に、撮像手段６０ａ～６０ｃによって、フォトマスク４０の透過窓４２ａ～４２ｃをそれぞれ撮像する。その際、照明手段７０ａ～７０ｃで、透過窓４２ａ～４２ｃに照明光を照射する。 Next, the transmission windows 42a to 42c of the photomask 40 are respectively imaged by the imaging means 60a to 60c. At this time, the illumination means 70a to 70c irradiate the transmission windows 42a to 42c with illumination light.
　そして、撮像することにより得られた、透過窓４２ａ～４２ｃの位置と、透過窓４２ａ～４２ｃから認識されるワーク１の一対の端部１ａ，１ｂの位置との関係から、ワーク１とフォトマスク４０の位置関係が目標とする位置関係になるように、ワーク１とフォトマスク４０の位置関係を相対的に調整する。 Then, from the relationship between the positions of the transmission windows 42a to 42c and the positions of the pair of end portions 1a and 1b of the workpiece 1 recognized from the transmission windows 42a to 42c obtained by imaging, the workpiece 1 and the photomask The positional relationship between the workpiece 1 and the photomask 40 is relatively adjusted so that the positional relationship 40 becomes the target positional relationship.
　具体的には、以下に示す方法によって位置関係を調整する。 Specifically, the positional relationship is adjusted by the following method.
　まず、制御手段によって、撮像して得られたワーク１の幅方向の端部１ａ，１ｂと、方形状の透過窓４２ａ～４２ｃの幅方向（Ｙ方向）に直交する縁部ｆとの距離ｙ１（ｙ１ａ，ｙ１ｂ，ｙ１ｃ）を、それぞれの透過窓４２ａ～４２ｃについて求める。 First, the distance y1 between the widthwise ends 1a and 1b of the workpiece 1 obtained by imaging by the control means and the edge f perpendicular to the width direction (Y direction) of the rectangular transmission windows 42a to 42c. (Y1a, y1b, y1c) is obtained for each of the transmission windows 42a to 42c.
　次に、ワーク１の幅方向の一対の端部１ａ，１ｂをそれぞれ認識できるように、幅方向（Ｙ方向）に隣り合って配設された透過窓４２ａ，４２ｂについて求めたそれぞれの距離ｙ１（ｙ１ａ，ｙ１ｂ）が等しくなるように（または距離の差が所定範囲内になるように）、幅方向の位置調整手段５１を駆動させ、ワーク１に対するフォトマスク４０の幅方向（Ｙ方向）の位置を調整する。
　また、ワーク１の一方側端部１ａを２箇所において認識できるように、長手方向（Ｘ方向）に隣り合って配設された透過窓４２ａ，４２ｃについて求めたそれぞれの距離ｙ１（ｙ１ａ，ｙ１ｃ）が等しくなるように（または距離の差が所定範囲内になるように）、回転方向の位置調整手段５２を駆動させ、ワーク１に対するフォトマスク４０の回転方向（θ方向）の位置を調整する。 Next, in order to recognize the pair of end portions 1a and 1b in the width direction of the work 1, the respective distances y1 obtained for the transmission windows 42a and 42b arranged adjacent to each other in the width direction (Y direction) ( The position adjustment means 51 in the width direction is driven so that y1a, y1b) are equal (or the difference in distance is within a predetermined range), and the position of the photomask 40 in the width direction (Y direction) with respect to the workpiece 1 Adjust.
Further, the distances y1 (y1a, y1c) obtained for the transmission windows 42a, 42c disposed adjacent to each other in the longitudinal direction (X direction) so that the one end 1a of the work 1 can be recognized at two places. So as to be equal (or so that the distance difference is within a predetermined range), the position adjustment means 52 in the rotation direction is driven to adjust the position of the photomask 40 in the rotation direction (θ direction) relative to the workpiece 1.
　そして、ワーク１に対するフォトマスク４０の位置調整が終了した後、露光光源３０によりワーク１に露光光を照射する。 Then, after the position adjustment of the photomask 40 with respect to the work 1 is finished, the exposure light source 30 irradiates the work 1 with exposure light.
　露光処理を行った後、ワーク１を長手方向に搬送し、ワーク１の露光処理が行われた領域ｐnを露光処理部１１から排出するとともに、ワーク１の次に露光処理が行われるべき領域ｐn+1を露光処理部１１に搬送する。 After performing the exposure process, the workpiece 1 is transported in the longitudinal direction, the area pn where the exposure process of the workpiece 1 is performed is discharged from the exposure processing unit 11, and the area where the exposure process is to be performed next to the workpiece 1 pn + 1 is conveyed to the exposure processing unit 11.
　なお、ワーク１は、ワーク保持手段２５の吸引孔２６から気体が噴出されることにより、ワーク保持手段２５から浮上した状態で搬送される。
　このとき、ワーク１が照明手段７０ａ～７０ｃに接触して損傷するおそれがある場合には、図５に示すように、フォトマスク４０と照明手段７０ａ～７０ｃを上下移動させるための上下移動手段５３を設け、フォトマスク４０と照明手段７０ａ～７０ｃを上方に退避させた後、ワーク保持手段２５の吸引孔２６から気体を噴出して、ワーク１を浮かせて搬送するように構成することも可能である。 The work 1 is transported in a state of being lifted from the work holding means 25 by ejecting gas from the suction hole 26 of the work holding means 25.
At this time, if there is a possibility that the workpiece 1 may come into contact with the illumination means 70a to 70c and be damaged, as shown in FIG. 5, the vertical movement means 53 for moving the photomask 40 and the illumination means 70a to 70c up and down. After the photomask 40 and the illuminating means 70a to 70c are retracted upward, gas can be ejected from the suction hole 26 of the work holding means 25, and the work 1 can be lifted and conveyed. is there.
　以降、上述したような工程を繰り返すことにより、露光処理を順次行うことができる。 Thereafter, the exposure process can be sequentially performed by repeating the above-described steps.
　本発明の一実施形態にかかる上述の露光装置は、撮像手段で撮像することにより得られる透過窓の位置と、透過窓から認識されるワークの端部の位置との関係から、ワークとフォトマスクの位置関係が目標とする位置関係になるように、位置調整手段により、ワークとフォトマスクの位置関係を調整するようにしているので、ワークのアライメントマークに依存することなく帯状のワークとフォトマスクの位置関係を調整することができる。 The above-described exposure apparatus according to an embodiment of the present invention is based on the relationship between the position of the transmission window obtained by imaging with the imaging unit and the position of the end of the workpiece recognized from the transmission window. Since the positional adjustment means adjusts the positional relationship between the work and the photomask so that the positional relationship becomes the target positional relationship, the strip-shaped workpiece and the photomask are not dependent on the alignment mark of the workpiece. Can be adjusted.
　したがって、ワークにアライメントマークを形成することを不要にして、効率よく精度の高い露光処理を行うことが可能になる。
　そして、その結果、帯状のワークに露光処理を行う工程を経て製造される電子部品などの製品を効率よく製造することが可能になる。 Accordingly, it becomes unnecessary to form alignment marks on the workpiece, and the exposure process can be performed efficiently and with high accuracy.
As a result, it is possible to efficiently manufacture products such as electronic components manufactured through a process of performing exposure processing on the strip-shaped workpiece.
　なお、上記実施形態では、ワーク１とフォトマスク４０との相対位置関係を調整するために、フォトマスク４０側を移動させる態様を示したが、ワーク１側を移動させる態様とすることも可能である。
　すなわち、図６に示すように、ワーク保持手段２５に幅方向の位置調整手段５１と回転方向の位置調整手段５２を取り付け、ワーク保持手段２５に保持されたワーク１を移動させることで、ワーク１とフォトマスク４０との相対位置関係を調整することも可能である。この場合においても、上述した実施形態における効果と同様の効果を得ることができる。 In the above embodiment, the mode in which the photomask 40 side is moved in order to adjust the relative positional relationship between the workpiece 1 and the photomask 40 has been described. However, a mode in which the workpiece 1 side is moved is also possible. is there.
That is, as shown in FIG. 6, the position adjusting means 51 in the width direction and the position adjusting means 52 in the rotational direction are attached to the work holding means 25, and the work 1 held by the work holding means 25 is moved to move the work 1 It is also possible to adjust the relative positional relationship between the photomask 40 and the photomask 40. Even in this case, the same effects as those in the above-described embodiment can be obtained.
　また、上記実施形態では、撮像手段６０ａ～６０ｃをワーク１の他方の主面１ｉ側に配設するような構成としたが、撮像手段６０ａ～６０ｃをワーク１の一方の主面１ｈ側に配設して撮像することも可能である（図６参照）。
　なお、本発明において、撮像手段をワークの一方または他方の主面に対向するように配置するとは、レンズやセンサを含む撮像手段本体をワークの一方または他方の主面に対向するように配置する場合に限らず、撮像手段を構成するミラーやプリズムなどの部材を、ワークの一方または他方の主面に対向するように配置する場合も含む広い概念である。 In the above embodiment, the imaging means 60a to 60c are arranged on the other main surface 1i side of the work 1. However, the imaging means 60a to 60c are arranged on the one main surface 1h side of the work 1. It is also possible to set up and image (see FIG. 6).
In the present invention, arranging the imaging means so as to oppose one or the other main surface of the workpiece means arranging the imaging means main body including a lens or a sensor so as to oppose one or the other main surface of the workpiece. This is a wide concept including not only the case but also a case where members such as a mirror and a prism constituting the imaging means are arranged to face one or the other main surface of the workpiece.
　また、上記実施形態では、撮像手段６０ａ～６０ｃで撮像することにより得られた位置関係（透過窓４２ａ～４２ｃの位置と、ワーク１の幅方向の端部１ａ，１ｂの位置との関係）を用いて、露光処理部１１に搬送されたワーク１に対してフォトマスク４０の位置調整を行い、その後、露光処理を行う態様を示したが、撮像することにより得られた上記位置関係の情報を、次のショットで露光処理を行う際に、使用することも可能である。
　すなわち、ワーク１の、次の露光処理が行われるべき領域ｐn+1を、露光処理部１１に搬送する際に、露光処理部１１における上記位置関係が目標とする位置関係になるように事前にフォトマスク４０の位置調整を行い、上記領域ｐn+1が露光処理部１１に搬送された後は、位置調整を行わずに露光処理を実行するように構成することも可能である。この場合においても、上述した実施形態における効果と同様の効果を得ることができる。 In the above embodiment, the positional relationship (relationship between the positions of the transmission windows 42a to 42c and the positions of the end portions 1a and 1b in the width direction of the workpiece 1) obtained by imaging with the imaging units 60a to 60c is used. In the embodiment, the position of the photomask 40 is adjusted with respect to the work 1 conveyed to the exposure processing unit 11, and then the exposure process is performed. However, the positional relationship information obtained by imaging is used. It can also be used when performing exposure processing in the next shot.
That is, when the region pn + 1 of the work 1 to be subjected to the next exposure process is transported to the exposure processing unit 11, the positional relationship in the exposure processing unit 11 is set in advance so as to become the target positional relationship. Alternatively, after the position of the photomask 40 is adjusted and the region pn + 1 is conveyed to the exposure processing unit 11, the exposure process can be performed without adjusting the position. Even in this case, the same effects as those in the above-described embodiment can be obtained.
　また、ワーク１のロスを少なくして、コストの低減を図る見地からは、露光処理が行われる各領域の間隔は、できるだけ小さくすることが好ましい。
　なお、具体的には、上記の各領域の間隔を、例えば、０ｍｍ～４ｍｍとすることが可能である。 Further, from the viewpoint of reducing the loss of the work 1 and reducing the cost, it is preferable that the interval between the regions where the exposure processing is performed be as small as possible.
Specifically, the interval between the above regions can be set to 0 mm to 4 mm, for example.
　また、本発明におけるフォトマスク４０の透過窓４２ａ～４２ｃの形状に特別の制約はなく、多角形、円形または楕円形とすることも可能である。
　また、上記実施形態では、制御手段によって、撮像して得られたワーク１の幅方向の端部１ａ，１ｂと、方形状の透過窓４２ａ～４２ｃの幅方向（Ｙ方向）に直交する縁部ｆとの距離ｙ１（ｙ１ａ，ｙ１ｂ，ｙ１ｃ）を、それぞれの透過窓４２ａ～４２ｃについて求めているが、ワークの幅方向の端部と対向する位置であれば、方形状の透過窓４２ａ～４２ｃの幅方向（Ｙ方向）に直交する縁部ｆ以外のフォトマスク４０の所定の箇所との距離を求めてもよい。 In addition, the shape of the transmission windows 42a to 42c of the photomask 40 in the present invention is not particularly limited, and may be polygonal, circular, or elliptical.
Further, in the above-described embodiment, the edges 1a and 1b in the width direction of the workpiece 1 obtained by imaging by the control means and the edges perpendicular to the width direction (Y direction) of the rectangular transmission windows 42a to 42c. The distance y1 (y1a, y1b, y1c) with respect to f is obtained for each of the transmission windows 42a to 42c. If the position is opposite to the end in the width direction of the workpiece, the rectangular transmission windows 42a to 42c are used. A distance from a predetermined portion of the photomask 40 other than the edge f orthogonal to the width direction (Y direction) may be obtained.
　また、本発明において、ワーク１が複数層により構成される多層シートである場合に、撮像手段６０ａ～６０ｃでワーク１の端部１ａ，１ｂを撮像する際は、複数層のうちの所定の層を撮像対象とすることが可能である。 In the present invention, when the workpiece 1 is a multilayer sheet composed of a plurality of layers, when imaging the end portions 1a and 1b of the workpiece 1 with the imaging means 60a to 60c, a predetermined layer of the plurality of layers is used. Can be set as an imaging target.
　なお、本発明の露光装置では、露光処理を行うときの露光光を用いて、ワークに回路パターンを形成するとともに、アライメントマークを形成することもできる。その場合、この露光装置を用いて形成したアライメントマークを基準に、例えば、積層、接合、実装工程などの後工程を実行することが可能になる。 In the exposure apparatus of the present invention, a circuit pattern can be formed on the workpiece and an alignment mark can be formed by using exposure light when performing an exposure process. In that case, it becomes possible to execute post-processes such as stacking, bonding, and mounting processes based on the alignment marks formed using the exposure apparatus.
　本発明はさらにその他の点においても上記の実施形態に限定されるものではなく、発明の範囲内において種々の応用、変形を加えることが可能である。 The present invention is not limited to the above embodiment in other respects, and various applications and modifications can be made within the scope of the invention.
　１　　　　　　　ワーク
　１ａ　　　　　　ワークの幅方向の端部（一方側端部）
　１ｂ　　　　　　ワークの幅方向の端部（他方側端部）
　１ｈ　　　　　　ワークの一方の主面
　１ｉ　　　　　　ワークの他方の主面
　１０　　　　　　露光装置
　１１　　　　　　露光処理部
　２０　　　　　　ワーク搬送手段
　２５　　　　　　ワーク保持手段
　２６　　　　　　吸引孔
　３０　　　　　　露光光源
　４０　　　　　　フォトマスク
　４１　　　　　　露光パターン部
　４１ｐ　　　　　露光光を通過させてワークへの露光を行うための露光パターン部に対応する領域
　４２ａ，４２ｂ，４２ｃ　フォトマスクの透過窓
　４３ａ，４３ｂ，４３ｃ　フォトマスクの透過窓の領域内
　４５　　　　　　マスク外周部
　４７　　　　　　マスク保持手段
　４８　　　　　　支持部材
　５１　　　　　　幅方向の位置調整手段
　５２　　　　　　回転方向の位置調整手段
　６０ａ，６０ｂ，６０ｃ　撮像手段
　７０ａ，７０ｂ，７０ｃ　照明手段
　７１　　　　　　発光部
　７２　　　　　　遮光部
　ｅ　　　　　　　フォトマスクの透過窓の縁部
　ｆ　　　　　　　フォトマスクの透過窓の縁部
　ｐn-1　　　　　 ワークの、露光処理部の外側の領域
　ｐn　　　　　　 ワークの、露光処理が行われる領域（所定の領域）
　ｐn+1　　　　　 ワークの、次に露光処理が行われるべき領域
　Ｘ　　　　　　　ワークの長手方向
　Ｙ　　　　　　　ワークの幅方向
　Ｚ　　　　　　　ワークの長手方向と幅方向に垂直な方向
　θ　　　　　　　ワークの主面に平行な回転方向
　ｙ１（ｙ１ａ，ｙ１ｂ，ｙ１ｃ）　ワークの幅方向の端部と、透過窓の縁部ｆとの距離 1 Workpiece 1a Workpiece width direction end (one side end)
1b End of the workpiece in the width direction (end on the other side)
1h One main surface of the work 1i The other main surface of the work 10 Exposure apparatus 11 Exposure processing unit 20 Work transfer means 25 Work holding means 26 Suction hole 30 Exposure light source 40 Photomask 41 Exposure pattern part 41p Regions 42a, 42b, 42c corresponding to the exposure pattern portion for performing exposure on the photomask transmission window 43a, 43b, 43c In the transmission window region of the photomask 45 Mask outer peripheral portion 47 Mask holding means 48 Support member 51 Width Position adjustment means 52 Direction adjustment means 60a, 60b, 60c Imaging means 70a, 70b, 70c Illumination means 71 Light emitting part 72 Light shielding part e Edge of transmission window of photomask f Edge of transmission window of photomask p n -1 Work area outside the exposure processing section pn Work area where the exposure process is performed (predetermined area)
p n + 1 area of the workpiece to be exposed next X longitudinal direction of the workpiece Y transverse direction of the workpiece Z longitudinal direction of the workpiece and the direction perpendicular to the width direction θ rotating direction parallel to the main surface of the workpiece y1 ( y1a, y1b, y1c) The distance between the end in the width direction of the workpiece and the edge f of the transmission window

Claims (5)

  1. 　露光処理対象である帯状のワークを搬送するワーク搬送手段と、
    　前記ワークの一方の主面に対向するように配設され、前記ワークに照射する露光光を発生させる露光光源と、
    　前記ワーク搬送手段により搬送される前記ワークと、前記露光光源との間に配設されるフォトマスクであって、前記ワークの幅方向の端部と対向する位置に配置された、光を透過させる複数の透過窓を有するフォトマスクと、
    　前記ワークの一方の主面または他方の主面に対向するように配設され、前記フォトマスクの複数の前記透過窓を、前記ワークの前記端部が前記透過窓のそれぞれの領域内に位置する態様で撮像する撮像手段と、
    　前記ワークと前記フォトマスクの位置関係を相対的に調整する位置調整手段と
    　を備え、
    　前記撮像手段で撮像することにより得られる、前記透過窓の位置と、前記透過窓から認識される前記ワークの前記端部の位置との関係から、前記ワークと前記フォトマスクの位置関係が目標とする位置関係になるように、前記位置調整手段により、前記ワークと前記フォトマスクの位置関係を相対的に調整することができるように構成されていること
    　を特徴とする露光装置。     A work transport means for transporting a strip-shaped work to be exposed;
    An exposure light source that is disposed to face one main surface of the workpiece and generates exposure light to be irradiated to the workpiece;
    A photomask disposed between the work transported by the work transporting means and the exposure light source, which is disposed at a position facing an end in the width direction of the work and transmits light. A photomask having a plurality of transmission windows;
    The plurality of transmission windows of the photomask are arranged so as to face one main surface or the other main surface of the work, and the end portions of the work are located in respective regions of the transmission windows. Imaging means for imaging in an aspect;
    A position adjusting means for relatively adjusting the positional relationship between the work and the photomask;
    From the relationship between the position of the transmission window obtained by imaging with the imaging means and the position of the end of the workpiece recognized from the transmission window, the positional relationship between the workpiece and the photomask is a target. An exposure apparatus configured to be able to relatively adjust the positional relationship between the work and the photomask so that the positional relationship is achieved.
  2. 　前記フォトマスクが、前記ワークの幅方向の一対の端部のそれぞれと対向する透過窓を複数備えているとともに、
    　前記位置調整手段が、前記ワークと前記フォトマスクの、前記ワークの幅方向の位置関係を相対的に調整することができるように構成されており、
    　前記撮像手段で撮像することにより得られる、複数の前記透過窓の位置と、複数の前記透過窓から認識される前記ワークの前記一対の端部の位置との関係から、前記ワークと前記フォトマスクの幅方向における位置関係が目標とする位置関係になるように、前記位置調整手段により、前記ワークと前記フォトマスクの前記幅方向の位置関係を相対的に調整することができるように構成されていること
    　を特徴とする請求項１記載の露光装置。     The photomask includes a plurality of transmission windows facing each of the pair of end portions in the width direction of the workpiece,
    The position adjusting means is configured to be able to relatively adjust the positional relationship of the workpiece and the photomask in the width direction of the workpiece,
    From the relationship between the positions of the plurality of transmission windows obtained by imaging with the imaging means and the positions of the pair of end portions of the workpiece recognized from the plurality of transmission windows, the workpiece and the photomask The positional adjustment means can relatively adjust the positional relationship in the width direction of the work and the photomask so that the positional relationship in the width direction becomes a target positional relationship. The exposure apparatus according to claim 1, wherein:
  3. 　前記フォトマスクが、前記ワークの幅方向の一対の端部のうちの一方側端部と対向する透過窓を複数備えているとともに、
    　前記位置調整手段が、前記ワークと前記フォトマスクの、前記ワークの主面に平行な回転方向の位置関係を相対的に調整することができるように構成されており、
    　前記撮像手段で撮像することにより得られる、複数の前記透過窓の位置と、複数の前記透過窓から認識される前記ワークの前記一方側端部の位置との関係から、前記ワークと前記フォトマスクの回転方向における位置関係が目標とする位置関係になるように、前記位置調整手段により、前記ワークと前記フォトマスクの前記回転方向の位置関係を相対的に調整することができるように構成されていること
    　を特徴とする請求項１または２記載の露光装置。     The photomask includes a plurality of transmission windows facing one end of the pair of end portions in the width direction of the workpiece,
    The position adjusting means is configured to be able to relatively adjust the positional relationship between the workpiece and the photomask in the rotational direction parallel to the main surface of the workpiece,
    From the relationship between the positions of the plurality of transmission windows obtained by imaging with the imaging means and the positions of the one side end portions of the workpiece recognized from the plurality of transmission windows, the workpiece and the photomask The positional adjustment means can relatively adjust the positional relationship between the workpiece and the photomask in the rotational direction so that the positional relationship in the rotational direction becomes the target positional relationship. The exposure apparatus according to claim 1 or 2, wherein:
  4. 　前記位置調整手段が、前記フォトマスクの位置、および、前記ワークの位置の少なくとも一方を調整するように構成されていることを特徴とする請求項１～３のいずれかに記載の露光装置。 4. The exposure apparatus according to claim 1, wherein the position adjusting means is configured to adjust at least one of the position of the photomask and the position of the workpiece.
  5. 　前記ワークへの露光時には、前記ワークを吸引して所定位置に前記ワークを保持し、前記ワークの搬送時には、気体を噴出して前記ワークを浮かせて搬送することができるように構成されたワーク保持手段を備えていることを特徴とする請求項１～４のいずれかに記載の露光装置。 A workpiece holding unit configured to suck the workpiece and hold the workpiece in a predetermined position when exposing the workpiece, and to eject the gas to float and convey the workpiece when conveying the workpiece. 5. The exposure apparatus according to claim 1, further comprising means.
PCT/JP2016/050148 2015-01-15 2016-01-05 Exposure device WO2016114178A1 (en)

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