JP2005326550A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide products of uniform quality, by eliminating harmful effects by the sagging of a belt-like substrate by self weight in exposure and aligning the belt-like substrate and photomasks to high dimensional accuracy. <P>SOLUTION: In an exposure device, a belt-like substrate 1 is exposed for each predetermined length region while intermittently sending the belt-like substrate 1 along its longitudinal direction. The flexible belt-like substrate 1 having sensitive material stuck surfaces to be exposed is moved by a drive unit 19 between a feeding reel 14 and a take-up reel 15. A vertical path, in which the belt-like substrate 1 becomes a vertical state is formed between the feeding reel 14 and the take-up reel 15. An exposure section is located in the vertical path. The exposure section has photomasks 21, 22. Patterns drawn in the photomasks 21, 22 are transferred to the surfaces of the belt-like substrate 1 to be exposed by the lights from light sources. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an exposure apparatus for transferring a pattern drawn on a photomask to the substrate by irradiating the substrate with light through the photomask. More specifically, the present invention exposes a flexible strip substrate to which a photosensitive material is attached. The present invention relates to an exposure apparatus.

  While feeding the strip substrate intermittently along the longitudinal direction between the reel for feeding the flexible strip substrate wound in a cylindrical shape and the take-up reel winding the strip substrate in a cylindrical shape, An exposure apparatus for exposing a belt-like substrate for each region having a predetermined length is known. An exposure surface to which a photosensitive material is attached is formed on at least one surface of the belt-like substrate. By irradiating the exposure surface with light through the photomask, a pattern such as an electric circuit drawn on the photomask is transferred onto the substrate. In such a conventional exposure apparatus, the strip-shaped substrate is exposed in a horizontal state.

  In the conventional exposure apparatus described above, the horizontal strip substrate tends to bend downward due to its own weight. This bending has caused a big problem in performing exposure. When the strip substrate is intermittently sent in the longitudinal direction, and when the photomask is aligned with the strip substrate, or when the photomasks are aligned with each other, the strip substrate and the photomask are not in contact with each other. A gap is formed in. However, at the time of alignment, it is necessary to read the alignment mark formed on the belt-shaped substrate and the photomask or both photomasks simultaneously with one CCD camera, so the above gap is within the focal depth of the CCD camera. It needs to be a small distance. For this reason, in the exposure unit, a large tension in the longitudinal direction is applied to the strip substrate so that the flexure of the strip substrate due to its own weight is reduced. However, the strip substrate is elongated in the longitudinal direction due to the large tension in the longitudinal direction, and there is no tension. A dimensional change occurs compared to the state. Since alignment is performed in this state, it has been difficult to provide a uniform quality product by accurately aligning the belt-shaped substrate and the photomask.

  Another problem in the conventional exposure apparatus is the adhesion of dust. Dust easily adheres to the horizontal belt-like substrate. When exposure was performed with dust adhering to the exposure surface of the strip substrate, exposure failure was likely to occur. In addition, dust that has fallen from the belt-shaped substrate tends to accumulate on a photomask or a light source reflecting mirror disposed below the belt-shaped substrate. Such accumulated dust has been a major cause of many poorly exposed products.

In order to solve the above-mentioned conventional problems, according to the present invention,
In an exposure apparatus for exposing the band-shaped substrate for each predetermined length region while intermittently feeding the band-shaped substrate along its longitudinal direction,
A feeding reel in which a flexible strip-shaped substrate having an exposure surface on which at least one photosensitive material is attached is wound in a cylindrical shape;
A take-up reel for winding the belt-like substrate into a cylindrical shape, and a take-up reel provided at a predetermined distance from the supply reel;
A driving device for intermittently sending the belt-shaped substrate from the feeding reel to the take-up reel;
An exposure unit provided between the feeding reel and the take-up reel, and an exposure unit having at least one photomask that is close to or in contact with the exposure surface;
A light source for transferring the pattern drawn on the photomask to the exposure surface of the strip substrate,
Between the feeding reel and the take-up reel, a vertical path is formed where the strip substrate is in a vertical state,
The exposure unit is provided in the vertical path;
An exposure apparatus is provided.

The vertical path may be provided so as to extend vertically along the moving direction of the strip substrate.
In the exposure unit, a pair of the photomasks are arranged so as to face the exposure surfaces on both sides of the belt-like substrate,
The pair of photomasks have alignment marks at positions facing each other.
At least one CCD camera for reading the alignment mark and at least one of the photomasks in the X, Y, and θ directions in the plane based on the reading data of the alignment mark by the CCD camera A moving mechanism for moving and aligning the position may be further provided.

  In order to perform alignment between the strip substrate and the photomask, alignment marks that can be aligned with alignment marks provided on the photomask can be formed on the strip substrate.

  The alignment mark formed on the strip substrate can be replaced by a side edge of the strip substrate.

According to the exposure apparatus of the present invention, the strip substrate is exposed in the vertical path where the strip substrate is in a vertical state, so that the strip substrate does not bend due to its own weight. Therefore, since it is not necessary to apply a large tension to the belt-like substrate in order to reduce the deflection, there is no problem associated with the dimensional change due to the elongation of the belt-like substrate.
In addition, since the belt-like substrate in the vertical state in the vertical path can maintain sufficient flatness with a slight tension, it can obtain good parallelism to the photomask, and as a result, the alignment accuracy between the two Will improve.

  Furthermore, dust is less likely to adhere to the vertical belt-like substrate than the horizontal belt-like substrate. Further, since the photomask and the light source reflecting mirror can be provided in a vertical state in terms of structure, it is possible to greatly reduce exposure failures caused by dust adhering to or accumulating on the belt-like substrate, the photomask and the light source reflecting mirror.

  In addition, since the light from the light source is emitted in the horizontal direction, not in the vertical direction, it is easy to ensure a long optical path in the facility. When a long optical path is used, the light quality of parallel light is improved and the resolution is improved, so that the pattern drawn on the photomask can be faithfully transferred to the belt-like substrate.

  As a result, according to the present invention, it is possible to obtain much higher quality and productivity than the related art with respect to exposure of the strip-shaped substrate.

  FIG. 1 is a schematic longitudinal sectional view showing an embodiment of an exposure apparatus according to the present invention. The exposure apparatus includes a base 18 and a housing 26 provided on the base 18. A feeding reel 14 is provided at the right end of the base 18. A flexible belt-like substrate 1 is wound around the feeding reel 14 in the shape of a cylinder 12. On the other hand, a take-up reel 15 is provided at the left end of the base 18.

  A feed driving roller 19 is provided between the feeding reel 14 and the take-up reel 15. The feed driving roller 19 intermittently pulls out the belt-like substrate 1 wound on the feeding reel 14 by a predetermined length. The belt-like substrate 1 drawn out from the feeding reel 14 enters the vertical path through the guide rollers 16, 17, 27, and 28 and enters a vertical state. An area where the belt-like substrate 1 is in a vertical state is an exposure portion. The belt-like substrate 1 that has passed through the exposure portion in the vertical state is wound up in the shape of a cylinder 13 on the take-up reel 15 through the guide rollers 29 and 30 and the feed driving roller 19. Such intermittent feed along the longitudinal direction of the belt-like substrate 1 is performed by a feed drive roller 19 as a drive device.

  In the middle of the path of the belt-like substrate 1, a work table 20 used when performing the joining work of the belt-like substrate 1 or an adhesive roller for removing dust on the surface of the belt-like substrate 1 may be provided. Furthermore, it is preferable to provide a meandering prevention device for the belt-like substrate 1 on at least one of the feeding reel 14, the take-up reel 15 and the guide roller.

  At least one surface of the belt-like substrate 1 is an exposure surface to which a photosensitive material is attached. In the exposure unit, a photomask unit U1 or U2 is disposed at a position corresponding to the exposure surface. In the illustrated embodiment, exposure surfaces are formed on both sides. Therefore, the photomask unit U1 and the photomask unit U2 are arranged on both sides of the exposure unit with the vertical belt-like substrate 1 interposed therebetween. Photomasks 21 and 22 are provided on the photomask unit U1 and the photomask unit U2, respectively, so as to face the exposure surface of the strip substrate 1. A pattern such as an electric circuit is drawn on the photomasks 21 and 22, for example. On the opposite side of the photomasks 21 and 22 from the belt-like substrate 1, a light source (not shown) located at the back of the paper surface of FIG. The reflecting mirrors 11 and 31 for introducing the light from) toward the belt-like substrate 1 are arranged. The light 10 from the light source is irradiated on the exposure surface of the strip substrate 1 through the photomasks 21 and 22 through the reflecting mirrors 11 and 31, whereby the pattern is transferred onto the strip substrate 1. The light 10 is preferably parallel light, and the exposure unit including the reflecting mirror 11 is preferably covered with a casing 26.

  At least one of the photomask units U1 and U2 is attached with a mechanism (not shown) for approaching and separating from the other. The photomask 21 includes a frame-like base plate 6. A frame 3 having a moving mechanism 5 that holds the photomasks 21 and 22 and moves the photomasks 21 and 22 in the X, Y, and θ directions in the plane is attached to the base plate 6. An annular sealing member 4 is provided on the outer peripheral portion of the surface of the frame 3 facing the belt-like substrate 1. The annular sealing member 4 forms a sealed space composed of the frame 3 including the belt-like substrate 1, the sealing member 4, and the photomasks 21 and 22 when the photomask units U1 and U2 are brought close to each other during exposure. be able to. By reducing the pressure in the sealed space, the belt-like substrate 1 and the photomasks 21 and 22 can be brought into close contact with each other.

  At least one of the photomask units U1 and U2 is provided with a CCD camera 7 used for aligning the photomasks 21 and 22 or each photomask and the belt-like substrate. The camera 7 can be moved in the X and Y directions in a plane parallel to the surface of the photomask by moving mechanisms 8 and 9 attached to the frame 3.

  An exposure method using the exposure apparatus according to the present invention will be described with reference to FIG. FIG. 2 is a schematic view showing the relative positions of the strip-shaped substrate 1 and the photomasks 21 and 22 that are in the vertical state in the vertical path in the exposure unit, and is a view seen from the direction of the arrow A in FIG. . The belt-like substrate 1 is exposed for each region 25 having a predetermined length indicated by a two-dot chain line. Therefore, the feed driving roller 19 intermittently feeds the belt-like substrate 1 with the length P including the length of the region 25 as a pitch. While the belt-like substrate 1 is being sent, as shown in FIG. 1, the photomask units U1 and U2 are in the retracted position, and a predetermined gap is formed between the photomasks 21 and 22 and the belt-like substrate 1. Yes.

  When the feeding of the belt-like substrate 1 is stopped at a predetermined position, at least one of the photomask units U1 and U2 is brought closer to the other. As a result, the photomasks 21 and 22 approach the region 25 of the opposing belt-like substrate and enter a position for alignment. Alignment marks 23 and 23 are provided at opposite positions of the photomasks 21 and 22, respectively. The alignment marks 23 and 23 are located at positions deviating from the belt-like substrate 1. The positions of the alignment marks 23 and 23 are read by the CCD camera 7, and at least one of the photomasks 21 and 22 is moved in the X, Y, and θ directions based on the read data. Perform position alignment.

  The belt-like substrate 1 includes those having the alignment mark 24 thereon and those not having the alignment mark 24 thereon. When the belt-shaped substrate 1 has the alignment mark 24, the alignment marks (not shown) provided on the photomasks 21 and 22 at positions facing the alignment mark 24, and the position of the belt-shaped substrate 1. The position of the alignment mark 24 may be simultaneously read by the CCD camera 7 and the alignment between the photomasks 21 and 22 and the strip substrate 1 may be performed based on the read data.

  When the band-shaped substrate 1 does not have the alignment mark 24 on the band-shaped substrate 1, alignment marks (not shown) of the photomasks 21 and 22 provided at the side edge of the band-shaped substrate 1 and the position opposite thereto. And the position of the belt-like substrate 1 and the photomasks 21 and 22 may be aligned based on the relative relationship between the two. In this case, the side edge of the belt-like substrate 1 is replaced by the alignment mark 24.

  When the alignment between the photomasks 21 and 22 and between the photomasks 21 and 22 and the belt-like substrate 1 is completed, the photomask units U1 and U2 are brought closer to each other, the frame 3 including the belt-like substrate 1 and the sealing A sealed space composed of the member 4 and the photomasks 21 and 22 is formed. By reducing the pressure of the sealed space with a pressure reducing device (not shown), the photomasks 21 and 22 and the strip substrate 1 can be brought into close contact with each other under reduced pressure.

  Next, the light 10 from the light source is irradiated onto the region 25 of the belt-like substrate 1 through the photomasks 21 and 22 through the reflecting mirrors 11 and 31. As a result, the pattern drawn on the photomasks 21 and 22 is transferred onto the region 25 of the belt-like substrate 1.

The light 10 may be applied to both sides of the belt-like substrate 1 at the same time, or may be applied one side at a time.
When one exposure is completed, the decompressed state of the sealed space is released, the photomask units U1 and U2 are separated, and a predetermined gap is formed between the photomasks 21 and 22 and the strip substrate 1 as shown in FIG. Form. Thereafter, the strip substrate 1 is intermittently sent by the length P and the exposure operation is repeated.

  In the illustrated embodiment, the belt-like substrate 1 is configured to move from bottom to top in the vertical path, but may be configured to move from top to bottom.

1 is a schematic longitudinal sectional view showing an embodiment of an exposure apparatus according to the present invention. It is the schematic which shows the relative position of the strip | belt-shaped board | substrate and photomask which are in the perpendicular | vertical state in an exposure part, Comprising: The figure seen from the direction of arrow A in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Band-shaped board | substrate, 3 Frame for photomasks, 4 Sealing member, 5 Moving mechanism, 6 Base plate, 7 CCD camera, 8 Moving mechanism, 9 Moving mechanism, 10 Parallel light, 11 Reflecting mirror, 12 Cylinder, 13 Cylinder, 14 Reel, 15 take-up reel, 16 guide roller, 17 guide roller, 18 base, 19 feed drive roller, 20 work table, 21 photomask, 22 photomask, 23 photomask alignment mark, 24 strip substrate Alignment mark, 25 exposure area, 26 housing, 27 guide roller, 28 guide roller, 29 guide roller, 30 guide roller, 31 reflector, U1 photomask unit, U2 photomask unit, P pitch.

Claims (5)

In an exposure apparatus for exposing the band-shaped substrate for each predetermined length region while intermittently feeding the band-shaped substrate along its longitudinal direction,
A feeding reel in which a flexible strip-shaped substrate having an exposure surface on which at least one photosensitive material is attached is wound in a cylindrical shape;
A take-up reel for winding the belt-like substrate into a cylindrical shape, and a take-up reel provided at a predetermined distance from the supply reel;
A driving device for intermittently sending the belt-shaped substrate from the feeding reel to the take-up reel;
An exposure portion provided between the feeding reel and the take-up reel, and an exposure portion having at least one photomask that is close to or in contact with the exposure surface;
A light source for transferring the pattern drawn on the photomask to the exposure surface of the strip substrate,
Between the feeding reel and the take-up reel, a vertical path is formed where the strip substrate is in a vertical state,
The exposure unit is provided in the vertical path;
Exposure device. The exposure apparatus according to claim 1, wherein the vertical path is provided so as to extend vertically along a moving direction of the belt-like substrate. In the exposure unit, a pair of the photomasks are arranged so as to face the exposure surfaces on both sides of the belt-shaped substrate,
The pair of photomasks have alignment marks at positions facing each other,
At least one CCD camera for reading the alignment mark and at least one of the photomasks in the X, Y, and θ directions in the plane based on the reading data of the alignment mark by the CCD camera A moving mechanism for moving and aligning,
The exposure apparatus according to claim 1 or 2. 4. An alignment mark that can be aligned with an alignment mark provided on the photomask is formed on the belt-shaped substrate so as to align the belt-shaped substrate and the photomask. An exposure apparatus according to any one of the above. The exposure apparatus according to claim 4, wherein the alignment mark formed on the belt-shaped substrate is replaced by a side edge of the belt-shaped substrate.

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