CN106773552A - Without the real-time micro-nano stamp system of mask - Google Patents
Without the real-time micro-nano stamp system of mask Download PDFInfo
- Publication number
- CN106773552A CN106773552A CN201710064032.1A CN201710064032A CN106773552A CN 106773552 A CN106773552 A CN 106773552A CN 201710064032 A CN201710064032 A CN 201710064032A CN 106773552 A CN106773552 A CN 106773552A
- Authority
- CN
- China
- Prior art keywords
- base materials
- fpc base
- real
- stamp
- fpc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses one kind without the real-time micro-nano stamp system of mask, the system includes a continuous laser direct-writing exposure device that laser micro/nano stamp is carried out to FPC base materials, volume to volume handling equipment and real-time stamp monitoring reponse system, by said structure do not need mask plate any given position can carry out micro-nano stamp on the FPC base materials of entire volume, and real-time monitoring can be carried out to each stamp figure, the reliability of raising system, the system does not need mask plate, contacted also without with FPC base materials, the coding of completion that just can be quickly to each array pattern on FPC base materials, base material does not have the possibility of the secondary destruction such as scratch, improve the quality of product, substantially increase the efficiency of production, reduce the cost of production.
Description
Technical field
The present invention relates to one kind without mask direct write digital optical lithography, particularly one kind is without the real-time micro-nano stamp system of mask
System.
Background technology
In flexible PCB（FPC）Manufacture field, traditional Exposure mode is to need that project file first is produced on into one
On block mask plate, the FPC base materials that then will scribble photoresists are attached on mask plate, and the irradiation of certain hour is carried out using ultraviolet light
It is exposed, by being graphically displayed on FPC for project file, this Exposure mode is time-consuming, complex procedures, and in existing FPC
During manufacture, some need to carry out stamp numbering to the engineering pattern of each display arrangement on entire volume FPC base materials, each volume
Can not number repeat, but every piece of mask plate figure is fixed, therefore be difficult to realize according to traditional Exposure mode.
The content of the invention
In order to overcome the deficiencies in the prior art, present invention offer is a kind of continuously to carry out laser micro/nano stamp to FPC base materials
Laser direct-writing exposure device.
The technical solution adopted for the present invention to solve the technical problems is：
One kind is without the real-time micro-nano stamp system of mask, it is characterised in that：Including:
Stamp data generating server, according to fixed coding rule, the engineering pattern to diverse location on FPC base materials comes real-time
Encoded, and generated some specific coded graphics not repeated mutually；
Light engine mechanism, for the coded graphics Real-Time Optical of real-time generation to be engraved in into FPC base materials；
Positioning mechanism, is used for the mark point for determining coded graphics position, so that light engine mechanism for recognizing on FPC base materials
At the mark point that coded graphics light can be engraved on FPC base materials, and the positioning mechanism recognizes a group echo point, stamp data
Generation server is one group of corresponding coded graphics of generation, and the coded graphics light is engraved in FPC base materials by light engine mechanism at once
On；
Reel-to-reel charging and discharging mechanism, conveying and collection for realizing FPC base materials, it is included for FPC base materials to be sent into optics
What the FPC base materials for involving in feed mechanism and completing stamp that engine mechanism carries out stamp were reclaimed rolls out shedding mechanism,
From monitoring feedback mechanism, for detecting whether the coded graphics on FPC base materials is accurate,
Precision movement platform, the accurate movement for controlling light engine mechanism and positioning mechanism,
The light engine mechanism is installed on precision movement platform by substrate, and below the optical lens of light engine mechanism
Spectroscope is provided with, spectroscope lower section is provided with illumination circular lamp.
It is described to include First look device, the second sighting device and spectroscope, the First look from monitoring system device
Device and the second sighting device are respectively arranged at spectroscope both sides, and the spectroscope is located at the optical lens of light engine mechanism
On optical axis, and the coded graphics generated from data server is recognized by First look device；Recognized by the second sighting device
Light is engraved in the coded graphics on FPC base materials.
The FPC base materials of the guaranteed entire volume of reel-to-reel charging and discharging mechanism band do not occur lateral inclined during loading and unloading
Move deviation correcting device.
The feed mechanism that involves in includes that volume has the feeding disk roller of FPC base materials and is tensioned for being tensioned the feeding of FPC base materials
Power adjusts disk roller and compresses the feeding compression disk roller of FPC base materials；Roll out shedding mechanism and include the FPC bases that code is accomplished fluently for winding
The discharging disk roller of material and for be tensioned FPC base materials discharging tensile force adjust disk roller and compress FPC base materials discharging hold-down roller
Wheel.
The positioning mechanism include two sets of contraposition CCD components being installed in the Y-axis moving mechanism of precision movement platform and
Motion control device, and contraposition CCD components, respectively positioned at the both sides of light engine mechanism, the contraposition CCD components are by right
The motion control device answered controls it in the movement perpendicular to FPC substrate transports direction.
The First look device and the second sighting device include industrial CCD, optical amplifier camera lens and lighting source, its
The focal plane of middle First look device is located at spectroscopical minute surface, and the focal plane of the second sighting device is consistent with the focal plane of optical lens.
The beneficial effects of the invention are as follows：The system includes a continuous laser straight that laser micro/nano stamp is carried out to FPC base materials
Write exposure device, volume to volume handling equipment and real-time stamp monitoring reponse system do not need the mask plate to be by said structure
Any given position micro-nano stamp can be carried out on the FPC base materials of entire volume, and each stamp figure can be carried out in real time
Monitoring, improves the reliability of system, and the system does not need mask plate, it is not required that contacted with FPC base materials, it is possible to quickly
The coding to each array pattern on FPC base materials is completed, base material does not have the possibility of the secondary destruction such as scratch, improves the matter of product
Amount, substantially increases the efficiency of production, reduces the cost of production.
Brief description of the drawings
The present invention is further described with reference to the accompanying drawings and examples.
Fig. 1 is the front schematic view of the system；
Fig. 2 is the schematic top plan view of precision movement platform and the mechanism moved by precision movement platform；
The schematic perspective view of Tu3Shi light engines mechanism；
Fig. 4 is the schematic top plan view of FPC base materials；
Fig. 5 is the real-time stamp control system schematic diagram of mask-free photolithography of the present invention；
Fig. 6 is the real-time stamp operational flowchart of mask-free photolithography for the present invention.
Specific embodiment
Referring to figs. 1 to Fig. 6, the reel-to-reel charging and discharging mechanism 1 of the present embodiment includes being involved in feed mechanism and rolls out unloader
Structure 3, and maskless lithography system 2 is arranged between winding in and out mechanism, real-time micro-nano stamp and certainly monitoring feedback mechanism
Device be arranged on maskless lithography system 2 device in, be involved in feed mechanism include volume have FPC base materials 4 feeding disk roller 101,
And the feeding compression disk roller 103 of disk roller 102 and compression FPC base materials 4 is adjusted for being tensioned the feeding tensile force of FPC base materials 4；Roll out
Shedding mechanism 3 includes the discharging disk roller 301 for winding the FPC base materials 4 for accomplishing fluently code and the discharging for being tensioned FPC base materials 4
Tensile force adjusts disk roller 302 and compresses the discharging compression disk roller 303 of FPC base materials 4, also has the motor that drive roller wheel is rotated certainly,
By above-mentioned setting, FPC base materials 4 can not only be guided to move, and FPC base materials 4 is kept tensile force, due to FPC base materials 4
, it is necessary to by maskless lithography system 2 and light engine mechanism, intermediate span is larger, and this is accomplished by from feeding end to discharging end
Ensure that FPC base materials 4 are constantly in tensioning state, will not be produced because of Action of Gravity Field larger sagging, it is ensured that FPC base materials 4 are covered with
The face of photoresists is constantly in the focal plane of mask-free photolithography system optical lens 503, improves the quality of stamp litho pattern.
Also include deviation correcting device 104 in institute reel-to-reel charging and discharging mechanism 1, deviation correcting device 104 includes feeding deviation-correcting function
With blanking deviation-correcting function, ensure the disk roller of reel-to-reel mechanism and do not occur perpendicular to motion when carrying out loading and unloading to the traction of FPC base materials 4
The deviation in direction, can so ensure the reference marker point 401-404 of pre-production on FPC base materials 4 all the time in positioning mechanism
In contraposition CCD components visual field, ensure the validity of contraposition, will not be made because contraposition CCD components lose mark point 401-404
Reporting an error for integral system, influences operating efficiency, while can also ensure that the edge of FPC base materials 4 will not be because of perpendicular to loading and unloading
The deviation in direction, and extruded with disk roller and be deformed.
Light engine mechanism 5, positioned at the top of FPC base materials 4, for the coded graphics light of generation to be engraved in into FPC base materials 4
On；
Positioning mechanism 6, is used for the mark point 401-404 for determining coded graphics position, so that light for recognizing on FPC base materials 4
Learn at the stamp position 405-410 that can be engraved in coded graphics light on FPC base materials 4 by engine mechanism 5；Positioning mechanism 6 includes two
Set is installed on contraposition CCD components 601-602 and motion control device in the Y-axis moving mechanism of precision movement platform, and contraposition
, respectively positioned at the both sides of light engine mechanism 5, the contraposition CCD components 601-602 is by corresponding for CCD components 601-602
Motion control device controls it in the movement perpendicular to the direction of motion of FPC base materials 4.
Include First look device 501, the second sighting device 502, spectroscope 505 and illumination annular from monitoring feedback mechanism
Lamp 506, the sighting device 502 of the First look device 501 and second is respectively arranged at the both sides of spectroscope 505, the spectroscope
505 are located on the optical axis of the optical lens 503 of light engine mechanism 5, and are recognized from data, services by First look device 501
The coded graphics of device generation；Recognize that light is engraved in the coded graphics on FPC base materials 4, First look dress by the second sighting device 502
It is also that image is gathered using CCD components to put the 501, second sighting device 502, and by the light splitting in light engine mechanism 5
Mirror 505 makes the coded image that the identification data server of First look device 501 is produced, and the second sighting device 502 is then directly known
Figure on other FPC base materials 4, then passes the figure of identification back main control computer, and whether coded graphics is judged by main control computer
Correctly, if the figure of identification is correct coding, main control computer then performs next cloth order, if there is mistake in identification,
Main control computer will control reel-to-reel charging and discharging mechanism 1 and precision movement platform stop motion, and light engine mechanism 5 stops exposure,
Avoid follow-up mistake from causing more product rejection to go to perform from monitoring feedback using two groups of vision systems, can accurately sentence
The reason for error coded being produced on disconnected FPC base materials 4, if the volume that the sighting device 502 of First look device 501 and second is recognized
Code is all wrong, then the coded graphics that explanation data server is produced is wrong, if First look device 501 is recognized
Image be correct, and the figure of the identification of the second sighting device 502 is wrong, and explanation is that optical engine system is occurred in that and asked
Topic.
First look device 501, the second sighting device 502 are that, by camera, optical amplifier microscope group and illuminator are constituted,
Its optical axis is alignd by spectroscope 505 with light engine mechanism 5, and the spectroscope is nearly transparent to exposed laser, and to vision system
The lighting source of system is translucent half reflection, and its focal plane position is identical with light engine mechanism 5.
Precision movement platform, the accurate movement for controlling light engine mechanism 5 and positioning mechanism 6, precision movement platform
Including X-axis travel mechanism, Y-axis moving mechanism, Z axis travel mechanism, so that light engine mechanism 5 and positioning mechanism 6 can be entered
The accurate movement of row three dimensions, X-axis travel mechanism 201, Y-axis moving mechanism 202, Z axis travel mechanism 203 are to use servo
Motor combination precise guide rail screw mandrel realizes precise motion, and said structure is existing current techique, thus concrete structure do not describe in detail.
The loading and unloading of the system, in real time mask-free photolithography exposure and the control of monitoring feedback procedure certainly（As shown in Figure 5）, institute
Some control is all performed by a main control computer, and described loading and unloading process goes control reel-to-reel upper and lower by main control computer
Expect the PLC of mechanism 1, then feed mechanism is involved in by PLC controls and the speed that shedding mechanism 3 draws FPC base materials 4 is rolled out, draw material
Tensile force and startup stopping etc.;The movement of precision movement platform is also that, by main control computer control, light engine mechanism 5 passes through base
Plate 504 is connected with precision movement platform, and so as to realize the precise motion of light engine mechanism 5, stamp image passes through light engine
The disposable photoetching of mechanism 5 is completed, it is ensured that the positional precision of photoetching, and improves the efficiency of stamp photoetching.
In the system, maskless lithography system 2, deviation correcting device 104, contraposition CCD components, light engine mechanism 5, first regard
Feel that device 501, the second sighting device 502 are existing technology manufactures, thus its specific structure again this do not describe in detail, FPC bases
Material is FPC base material.
The operation principle of the system is as follows：The roller that FPC base materials 4 will have been wound is arranged on reel-to-reel mechanism feeding end,
Then pull FPC base materials 4 by the lower section of laser direct-writing optical lens 503, be then around being rolled onto the discharging rolling of reel-to-reel mechanism
On wheel, then whole system is initialized, crawl reel-to-reel mechanism, the CCD of positioning mechanism 6 can be captured on FPC base materials 4
First mark point 401-404, then start to carry out photoetching stamp to entire volume FPC base materials 4.
As shown in Figure 6, specific flow is described as follows the specific works step of the present embodiment：
1. after precision movement platform and reel-to-reel charging and discharging mechanism 1 are initialized, the identification FPC 4 first groups of figures of base material of positioning mechanism 6
The reference marker point 401-404 of shape；
2. stamp data generating server is generated according to specific coding rule and encoded, and is converted into figure, then by generation
Figure passes to light engine mechanism 5 by optical fiber；
3. the stamp position for being calculated according to main control computer, controls the X-axis travel mechanism 201 of precision movement platform, by light engine
Mechanism 5 moves to FPC base materials 4 needs the position of photoetching stamp, then controls the movement velocity of X-axis travel mechanism 201 and FPC base materials
4 movement velocitys are consistent, keep both geo-stationaries；
4. during the Z axis travel mechanism 203 of precision movement platform drives light engine mechanism 5 to lift and makes light engine mechanism 5
Light engine camera lens auto-focusing, after the completion of focusing, precision movement platform movement Y-axis moving mechanism 202 pairs is per group echo point
The reference position of 401-404 carries out stamp；
5. while stamp, since monitoring feedback mechanism First look device 501, the second sighting device 502 recognize respectively
The figure for coming is laid from laser direct-writing exposure cameras, and the figure of identification is input to main control computer, main control computer is according to tool
Whether the encoding of graphs rule judgment coding of body is correct, stopping reel-to-reel mechanism is performed if code error and precise motion is flat
There is error reason in platform, lookup, if correctly proceeding the contraposition and stamp operation of next block graphics；
6. the contraposition CCD components of positioning mechanism 6 are moved to the mark of next block graphics for precision movement platform X-axis travel mechanism 201
The step of note point 401-404 positions, the mark point 401-404 on contraposition CCD identification FPC base materials 4, circulation beginning 1 to 5.
The step of whole real-time stamp system of mask-free photolithography is according to appeal circulation carries out photoetching stamp, until entire volume FPC
The photoetching stamp of base material 4 is completed;
The present invention is not needing mask plate, it is not required that contacted with FPC base materials 4, it is possible to which completion quickly is to FPC base materials 4
The coding of upper each array pattern, substantially increases the efficiency of production, reduces the cost of production.
The one kind for being provided the embodiment of the present invention above is described in detail without the real-time micro-nano stamp system of mask,
Specific case used herein is set forth to principle of the invention and implementation method, and the explanation of above example is use
Understand the method for the present invention and its core concept in help；Simultaneously for those of ordinary skill in the art, according to of the invention
Thought, will change in specific embodiments and applications, and in sum, this specification content should not be construed as
Limitation of the present invention.
Claims (6)
1. one kind is without the real-time micro-nano stamp system of mask, it is characterised in that：Including:
Stamp data generating server, according to fixed coding rule, the engineering pattern to diverse location on FPC base materials comes real-time
Encoded, and generated some specific coded graphics not repeated mutually；
Light engine mechanism, for the coded graphics Real-Time Optical of real-time generation to be engraved in into FPC base materials；
Positioning mechanism, is used for the mark point for determining coded graphics position, so that light engine mechanism for recognizing on FPC base materials
At the mark point that coded graphics light can be engraved on FPC base materials, and the positioning mechanism recognizes a group echo point, stamp data
Generation server is one group of corresponding coded graphics of generation, and the coded graphics light is engraved in FPC base materials by light engine mechanism at once
On；
Reel-to-reel charging and discharging mechanism, conveying and collection for realizing FPC base materials, it is included for FPC base materials to be sent into optics
What the FPC base materials for involving in feed mechanism and completing stamp that engine mechanism carries out stamp were reclaimed rolls out shedding mechanism,
From monitoring feedback mechanism, for detecting whether the coded graphics on FPC base materials is accurate,
Precision movement platform, the accurate movement for controlling light engine mechanism and positioning mechanism,
The light engine mechanism is installed on precision movement platform by substrate, and below the optical lens of light engine mechanism
Spectroscope is provided with, spectroscope lower section is provided with illumination circular lamp.
2. according to claim 1 without the real-time micro-nano stamp system of mask, it is characterised in that：It is described from monitoring system device
Including First look device, the second sighting device and the spectroscope, the First look device and the second sighting device are distinguished
Spectroscope both sides are arranged at, the spectroscope is located on the optical axis of the optical lens of light engine mechanism, and by First look
Coded graphics of the device identification from data server generation；Recognize that light is engraved in the coding on FPC base materials by the second sighting device
Figure.
3. according to claim 1 without the real-time micro-nano stamp system of mask, it is characterised in that：The reel-to-reel charging ＆ discharging machine
There is no lateral skew deviation correcting device during loading and unloading in the FPC base materials of the guaranteed entire volume of structure band.
4. according to claim 3 without the real-time micro-nano stamp system of mask, it is characterised in that：It is described to involve in feed mechanism bag
Including volume has the feeding disk roller of FPC base materials and for being tensioned the feeding tensile force regulation disk roller of FPC base materials and compressing FPC base materials
Feeding compresses disk roller；Roll out shedding mechanism include for wind accomplish fluently code FPC base materials discharging disk roller and for being tensioned
The discharging of the discharging tensile force regulation disk roller and compression FPC base materials of FPC base materials compresses disk roller.
5. according to claim 1 without the real-time micro-nano stamp system of mask, it is characterised in that：The positioning mechanism includes two
Set is installed on contraposition CCD components and motion control device in the Y-axis moving mechanism of precision movement platform, and contraposition CCD components
Respectively positioned at the both sides of light engine mechanism, the contraposition CCD components control it hanging down by corresponding motion control device
Directly in the movement in FPC substrate transports direction.
6. according to claim 2 without the real-time micro-nano stamp system of mask, it is characterised in that：The First look device and
Second sighting device includes industrial CCD, optical amplifier camera lens and lighting source, and the wherein focal plane of First look device is located at and divides
The minute surface of light microscopic, the focal plane of the second sighting device is consistent with the focal plane of optical lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710064032.1A CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710064032.1A CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106773552A true CN106773552A (en) | 2017-05-31 |
| CN106773552B CN106773552B (en) | 2019-01-22 |
Family
ID=58956579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710064032.1A Active CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106773552B (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030137654A1 (en) * | 2000-12-22 | 2003-07-24 | Nikon Corporation | Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparautus, and method for manufacturing micro device |
| JP2005326550A (en) * | 2004-05-13 | 2005-11-24 | Sanee Giken Kk | Exposure device |
| CN101082776A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | Interferometer |
| CN102722304A (en) * | 2012-06-21 | 2012-10-10 | 中山新诺科技有限公司 | Method for preparing touch screen in joint way |
| CN202693995U (en) * | 2012-06-01 | 2013-01-23 | 中山新诺科技有限公司 | Visual system |
| CN103246177A (en) * | 2013-05-03 | 2013-08-14 | 中山新诺科技有限公司 | Continuous mask-free photoetching method for flexible panel and device for method |
| CN104865800A (en) * | 2015-05-27 | 2015-08-26 | 中山新诺科技股份有限公司 | Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system |
| CN106324996A (en) * | 2015-06-15 | 2017-01-11 | 中国科学院上海光学精密机械研究所 | Photoetching machine in-situ multichannel imaging quality detection apparatus and photoetching machine in-situ multichannel imaging quality detection method |
-
2017
- 2017-02-04 CN CN201710064032.1A patent/CN106773552B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030137654A1 (en) * | 2000-12-22 | 2003-07-24 | Nikon Corporation | Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparautus, and method for manufacturing micro device |
| JP2005326550A (en) * | 2004-05-13 | 2005-11-24 | Sanee Giken Kk | Exposure device |
| CN101082776A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | Interferometer |
| CN202693995U (en) * | 2012-06-01 | 2013-01-23 | 中山新诺科技有限公司 | Visual system |
| CN102722304A (en) * | 2012-06-21 | 2012-10-10 | 中山新诺科技有限公司 | Method for preparing touch screen in joint way |
| CN103246177A (en) * | 2013-05-03 | 2013-08-14 | 中山新诺科技有限公司 | Continuous mask-free photoetching method for flexible panel and device for method |
| CN104865800A (en) * | 2015-05-27 | 2015-08-26 | 中山新诺科技股份有限公司 | Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system |
| CN106324996A (en) * | 2015-06-15 | 2017-01-11 | 中国科学院上海光学精密机械研究所 | Photoetching machine in-situ multichannel imaging quality detection apparatus and photoetching machine in-situ multichannel imaging quality detection method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106773552B (en) | 2019-01-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2706611B2 (en) | Stereolithography method and stereolithography device | |
| JP4777682B2 (en) | Scan exposure equipment | |
| KR101706401B1 (en) | Transporting method, transporting apparatus, exposure method, and exposure apparatus | |
| CN1120683A (en) | Exposure method and exposure apparatus | |
| WO2007141852A1 (en) | Exposure method and exposure apparatus | |
| KR101577700B1 (en) | Uv forming apparatus and method for roll to roll alignment | |
| CN107561876A (en) | A kind of new mask-free photolithography system and its technological process | |
| CN102834780B (en) | Exposure method and exposure device | |
| JP4304165B2 (en) | Exposure method and exposure apparatus | |
| CN103744271A (en) | Laser direct-writing system and photolithography method | |
| CN103676500B (en) | Full-automatic exposure machine | |
| CN105388707A (en) | Drawing device | |
| JP2008292915A (en) | Exposure drawing device | |
| CN103412445B (en) | A kind of sealed plastic box solidification equipment | |
| CN206741194U (en) | Without the real-time micro-nano stamp system of mask | |
| CN107664927A (en) | A kind of novel sports platform architecture and workflow based on mask-free photolithography system | |
| WO2011158630A1 (en) | Photomask, and laser annealing device and exposure device which use same | |
| CN106773552A (en) | Without the real-time micro-nano stamp system of mask | |
| CN210348189U (en) | Direct-writing photoetching mechanism | |
| CN111983896B (en) | High-precision alignment method for 3D exposure machine | |
| TWI693478B (en) | Maskless exposure device and exposure method | |
| JPH07164534A (en) | Method and device for optical molding | |
| JP2006084783A (en) | Mask alignment method and mask alignment device for double-face exposure apparatus | |
| US20120249993A1 (en) | Exposure method and exposure apparatus | |
| CN104471486A (en) | Illumination device, processing device, and device manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20201030 Address after: Room 4606, block B, China Resources Building, 1366 Qianjiang Road, Jianggan District, Hangzhou City, Zhejiang Province Patentee after: Hangzhou Xinnuo Microelectronics Co.,Ltd. Address before: 518000 Incubator No. 8, Huajing Park, Tongji Group, 28 Langshan Road, Xili Street, Nanshan District, Shenzhen City, Guangdong Province (1-A) Patentee before: SHENZHEN YOUSHENG TECHNOLOGY Co.,Ltd. |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Maskless real-time micro nano coding system Effective date of registration: 20210901 Granted publication date: 20190122 Pledgee: Bank of Jiangsu Limited by Share Ltd. Hangzhou branch Pledgor: Hangzhou Xinnuo Microelectronics Co.,Ltd. Registration number: Y2021330001333 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20220914 Granted publication date: 20190122 Pledgee: Bank of Jiangsu Limited by Share Ltd. Hangzhou branch Pledgor: Hangzhou Xinnuo Microelectronics Co.,Ltd. Registration number: Y2021330001333 |