CN106773552B - Without the real-time micro-nano stamp system of exposure mask - Google Patents
Without the real-time micro-nano stamp system of exposure mask Download PDFInfo
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- CN106773552B CN106773552B CN201710064032.1A CN201710064032A CN106773552B CN 106773552 B CN106773552 B CN 106773552B CN 201710064032 A CN201710064032 A CN 201710064032A CN 106773552 B CN106773552 B CN 106773552B
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- fpc substrate
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- light engine
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of no real-time micro-nano stamp systems of exposure mask, this system includes a laser direct-writing exposure device that laser micro/nano stamp is continuously carried out to FPC substrate, roll-to-roll handling equipment and real-time stamp monitor feedback system, not needing mask plate by above structure any given position can carry out micro-nano stamp on the FPC substrate of entire volume, and real-time monitoring can be carried out to each stamp figure, the reliability of raising system, this system does not need mask plate, it does not need to contact with FPC substrate yet, it cracking can complete to the coding of each array pattern on FPC substrate, substrate does not have the possibility of the secondary destructions such as scratch, improve the quality of product, substantially increase the efficiency of production, reduce the cost of production.
Description
Technical field
The present invention relates to a kind of no exposure mask direct write digital optical lithographies, especially a kind of no exposure mask real-time micro-nano stamp system
System.
Background technique
In the manufacturing field of flexible circuit board (FPC), traditional Exposure mode is to need that project file is first produced on one
On block mask plate, then the FPC substrate for being coated with photoresists is attached on mask plate, the irradiation of certain time is carried out using ultraviolet light
It is exposed, by being graphically displayed on FPC for project file, this Exposure mode is time-consuming, complex procedures, and in existing FPC
During manufacture, some need the engineering pattern to display arrangement each on entire volume FPC substrate to carry out stamp number, Mei Gebian
It number cannot repeat, but every piece of mask pattern is fixed, therefore is difficult to realize according to traditional Exposure mode.
Summary of the invention
For overcome the deficiencies in the prior art, the present invention provides a kind of continuously to FPC substrate progress laser micro/nano stamp
Laser direct-writing exposure device.
The technical solution adopted by the present invention to solve the technical problems is:
A kind of real-time micro-nano stamp system of no exposure mask, it is characterised in that: include:
Stamp data generating server carrys out the engineering pattern of different location on FPC substrate according to fixed coding rule
Real-time perfoming coding, and generate several specific mutually not duplicate coded graphics；
Light engine mechanism, the coded graphics Real-Time Optical for that will generate in real time are engraved in FPC substrate；
Positioning mechanism, for identification for determining the mark point of coded graphics position on FPC substrate, to make light engine
Mechanism can be by coded graphics photoetching at the mark point on FPC substrate, and the positioning mechanism identifies a group echo point, stamp
Data generating server generates one group of corresponding coded graphics, and light engine mechanism is at once by the coded graphics photoetching in FPC
On substrate；
Reel-to-reel charging and discharging mechanism, for realizing the conveying and collection of FPC substrate comprising for FPC substrate to be sent into
Light engine mechanism carry out stamp involve in feed mechanism and by stamp complete FPC substrate recycling roll out shedding mechanism,
It is whether accurate for detecting the coded graphics on FPC substrate from monitoring feedback mechanism,
Precision movement platform, for controlling the accurate movement of light engine mechanism and positioning mechanism,
The light engine mechanism is installed on precision movement platform by substrate, and the optical lens of light engine mechanism
Lower section is equipped with spectroscope, and illumination circular lamp is equipped with below spectroscope.
It is described from monitoring system device include First look device, the second sighting device and spectroscope, the First look
Device and the second sighting device are respectively arranged at spectroscope two sides, and the spectroscope is located at the optical lens of light engine mechanism
On optical axis, and the coded graphics generated from data server is identified by First look device；It is identified by the second sighting device
Coded graphics of the photoetching on FPC substrate.
The FPC substrate of the guaranteed entire volume of reel-to-reel charging and discharging mechanism band does not occur lateral inclined during loading and unloading
Move deviation correcting device.
The feed mechanism that involves in includes that volume has the feeding roller of FPC substrate and the feeding tensioning for being tensioned FPC substrate
Power adjusts roller and compresses the feeding compression roller of FPC substrate；Rolling out shedding mechanism includes for winding the FPC base for accomplishing fluently code
The discharging pressing roller of the discharging roller of material and discharging tensile force adjusting roller and compression FPC substrate for being tensioned FPC substrate
Wheel.
The positioning mechanism include two sets of contraposition CCD components being installed in the Y-axis moving mechanism of precision movement platform and
Motion control device, and align CCD component and be located at the two sides of light engine mechanism, the contraposition CCD component pass through pair
The motion control device answered controls it in the movement perpendicular to FPC substrate transport direction.
The First look device and the second sighting device include industrial CCD, optical amplifier camera lens and lighting source,
The focal plane of middle First look device is located at spectroscopical mirror surface, and the focal plane of the second sighting device and the focal plane of optical lens are consistent.
The beneficial effects of the present invention are: this system includes one continuously straight to the laser of FPC substrate progress laser micro/nano stamp
Exposure device is write, roll-to-roll handling equipment and real-time stamp monitor feedback system, do not need mask plate i.e. by above structure
Any given position micro-nano stamp can be carried out on the FPC substrate of entire volume, and each stamp figure can be carried out real-time
Monitoring, improves the reliability of system, this system does not need mask plate, does not need to contact with FPC substrate, so that it may cracking yet
The coding to each array pattern on FPC substrate is completed, substrate does not have the possibility of the secondary destructions such as scratch, improves the matter of product
Amount, substantially increases the efficiency of production, reduces the cost of production.
Detailed description of the invention
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is the front schematic view of this system；
Fig. 2 is precision movement platform and the schematic top plan view by the mobile mechanism of precision movement platform；
Fig. 3 is the stereoscopic schematic diagram of light engine mechanism；
Fig. 4 is the schematic top plan view of FPC substrate；
Fig. 5 is the real-time stamp control system schematic diagram of mask-free photolithography of the present invention；
Fig. 6 is that the present invention is the real-time stamp operational flowchart of mask-free photolithography.
Specific embodiment
Referring to figs. 1 to Fig. 6, the reel-to-reel charging and discharging mechanism 1 of the present embodiment includes being involved in feed mechanism and rolling out unloader
Structure 3, and maskless lithography system 2 is mounted between winding in and out mechanism, real-time micro-nano stamp and certainly monitoring feedback mechanism
Device is mounted in the device of maskless lithography system 2, be involved in feed mechanism include volume have FPC substrate 4 feeding roller 101,
And the feeding tensile force for being tensioned FPC substrate 4 adjusts roller 102 and compresses the feeding compression roller 103 of FPC substrate 4；It rolls out
Shedding mechanism 3 includes the discharging roller 301 for winding the FPC substrate 4 for accomplishing fluently code and the discharging for being tensioned FPC substrate 4
Tensile force adjusting roller 302 and the discharging compression roller 303 for compressing FPC substrate 4, the motor of certain also drive roller wheel rotation,
By above-mentioned setting, it is mobile that FPC substrate 4 can not only be guided, and FPC substrate 4 is made to keep tensile force, due to FPC substrate 4
From feeding end to discharging end, need by maskless lithography system 2 and light engine mechanism, intermediate span is larger, this is just needed
Guarantee FPC substrate 4 be constantly in tensioning state, will not be generated because of gravity it is larger sagging, guarantee FPC substrate 4 be covered with
The face of photoresists is constantly in the focal plane of mask-free photolithography system optical lens 503, improves the quality of stamp litho pattern.
It also include deviation correcting device 104 in institute's reel-to-reel charging and discharging mechanism 1, deviation correcting device 104 includes feeding deviation-correcting function
With blanking deviation-correcting function, guarantee not occurring when the roller of reel-to-reel mechanism draws to FPC substrate 4 and carries out loading and unloading perpendicular to movement
The deviation in direction can guarantee the reference marker point 401-404 of pre-production on FPC substrate 4 always in positioning mechanism in this way
It aligns in CCD component visual field, guarantees the validity of contraposition, mark point 401-404 will not be lost because of contraposition CCD component and make
Integral system reports an error, and influences working efficiency, while can also guarantee that the edge of FPC substrate 4 will not be because of perpendicular to loading and unloading
The deviation in direction, and squeeze and be deformed with roller.
Light engine mechanism 5, positioned at the top of FPC substrate 4, the coded graphics photoetching for that will generate is in FPC substrate 4
On；
Positioning mechanism 6, for identification for determining the mark point 401-404 of coded graphics position on FPC substrate 4, thus
Enable light engine mechanism 5 by coded graphics photoetching at the stamp position 405-410 on FPC substrate 4；Positioning mechanism 6 is wrapped
The contraposition CCD component 601-602 and motion control device that two sets are installed in the Y-axis moving mechanism of precision movement platform are included, and
Contraposition CCD component 601-602 is located at the two sides of light engine mechanism 5, and the contraposition CCD component 601-602 passes through pair
The motion control device answered controls it in the movement perpendicular to 4 direction of motion of FPC substrate.
It include First look device 501, the second sighting device 502, spectroscope 505 and illumination annular from monitoring feedback mechanism
Lamp 506, the First look device 501 and the second sighting device 502 are respectively arranged at 505 two sides of spectroscope, the spectroscope
505 are located on the optical axis of the optical lens 503 of light engine mechanism 5, and are identified by First look device 501 from data service
The coded graphics that device generates；Coded graphics of the photoetching on FPC substrate 4, First look dress are identified by the second sighting device 502
Setting the 501, second sighting device 502 also is image to be acquired using CCD component, and pass through the light splitting in light engine mechanism 5
The coded image that mirror 505 makes First look device 501 identify that data server produces, and the second sighting device 502 is then directly known
Figure on other FPC substrate 4, then passes the figure of identification back main control computer, whether judges coded graphics by main control computer
Correctly, if the figure of identification is correct coding, main control computer then executes next cloth order, if there is mistake in identification,
Main control computer will control reel-to-reel charging and discharging mechanism 1 and precision movement platform stop motion, and light engine mechanism 5 stops exposure,
It avoids subsequent mistake that more scrap of the product is caused to go to execute from monitoring feedback using two groups of vision systems, can accurately sentence
The reason of generating error coded on disconnected FPC substrate 4, if the volume that First look device 501 and the second sighting device 502 recognize
Code is all wrong, then illustrating that the coded graphics that data server generates is wrong, if First look device 501 identifies
Image be correctly, and the second sighting device 502 identification figure be it is wrong, explanation is that optical engine system occurs asking
Topic.
First look device 501, the second sighting device 502 are by camera, and optical amplifier microscope group and lighting system form,
Its optical axis is aligned by spectroscope 505 with light engine mechanism 5, and the spectroscope is nearly transparent to exposed laser, and to vision system
The lighting source of system is that half reflection is translucent, and focal plane position is identical as light engine mechanism 5.
Precision movement platform, for controlling the accurate movement of light engine mechanism 5 and positioning mechanism 6, precision movement platform
Including X-axis mobile mechanism, Y-axis moving mechanism, Z axis mobile mechanism, thus enable light engine mechanism 5 and positioning mechanism 6 into
The accurate movement of row three-dimensional space, X-axis mobile mechanism 201, Y-axis moving mechanism 202, Z axis mobile mechanism 203 are using servo
Motor combination precise guide rail screw rod realizes precise motion, and above structure is existing general technology, thus specific structure is not described in detail.
The loading and unloading of this system, mask-free photolithography exposure and the control (as shown in Figure 5) for monitoring feedback procedure certainly in real time, institute
Some control is all executed by a main control computer, and the loading and unloading process removes control reel-to-reel or more by main control computer
Expect the PLC of mechanism 1, then feed mechanism is involved in by PLC control and rolls out the speed that shedding mechanism 3 draws FPC substrate 4, draws material
Tensile force and starting stopping etc.;The movement of precision movement platform is also to be controlled by main control computer, and light engine mechanism 5 passes through base
Plate 504 is connect with precision movement platform, to realize the precise motion of light engine mechanism 5, stamp image passes through light engine
The disposable photoetching of mechanism 5 is completed, it is ensured that the position precision of photoetching, and improve the efficiency of stamp photoetching.
In this system, maskless lithography system 2, deviation correcting device 104, contraposition CCD component, light engine mechanism 5, first are regarded
Feel that device 501, the second sighting device 502 are existing technology manufactures, thus its specific structure again this be not described in detail, FPC base
Material is flexible circuit board substrate.
The working principle of this system is as follows: the idler wheel for having wound FPC substrate 4 is mounted on reel-to-reel mechanism feeding end,
Then pull FPC substrate 4 by the lower section of laser direct-writing optical lens 503, then winding is rolled onto the discharging rolling of reel-to-reel mechanism
On wheel, then whole system is initialized, the CCD of positioning mechanism 6 can be captured on FPC substrate 4 for crawl reel-to-reel mechanism
First mark point 401-404, then start to entire volume FPC substrate 4 carry out photoetching stamp.
The specific work steps of the present embodiment is as shown in Figure 6, and specific process is described as follows:
1. positioning mechanism 6 identifies FPC substrate 4 first after precision movement platform and reel-to-reel charging and discharging mechanism 1 initialize
The reference marker point 401-404 of block graphics；
2. stamp data generating server is generated according to specific coding rule and encoded, and is converted into figure, then will give birth to
At figure light engine mechanism 5 is passed to by optical fiber；
3. the X-axis mobile mechanism 201 of precision movement platform is controlled, by optics according to the stamp position that main control computer calculates
Engine mechanism 5 is moved to the position that FPC substrate 4 needs photoetching stamp, then controls 201 movement velocity of X-axis mobile mechanism and FPC
4 movement velocity of substrate is consistent, keeps the opposing stationary of the two；
4. the Z axis mobile mechanism 203 of precision movement platform drives light engine mechanism 5 to go up and down and makes light engine mechanism 5
In light engine camera lens auto-focusing, after the completion of focusing, the mobile Y-axis moving mechanism 202 of precision movement platform is to every group echo
The reference position of point 401-404 carries out stamp；
5. while stamp, distinguish since the First look device 501, the second sighting device 502 of monitoring feedback mechanism
It identifies from laser direct-writing exposure cameras and lays the figure come, and the figure of identification is input to main control computer, main control computer is pressed
Judge whether coding is correct according to specific encoding of graphs rule, is executed if code error and stop reel-to-reel mechanism and accurate fortune
There is error reason in moving platform, lookup, if correctly continuing the contraposition and stamp operation of next block graphics；
6. the contraposition CCD component of positioning mechanism 6 is moved to next block graphics by precision movement platform X-axis mobile mechanism 201
The position mark point 401-404, contraposition CCD identification FPC substrate 4 on mark point 401-404, circulation start 1 to 5 the step of.
The entire real-time stamp system of mask-free photolithography carries out photoetching stamp according to circulation the step of appeal, until entire volume FPC
4 photoetching stamp of substrate is completed;
The present invention is not needing mask plate, does not need to contact with FPC substrate 4 yet, so that it may which cracking completion is to FPC base
The coding of each array pattern on material 4, substantially increases the efficiency of production, reduces the cost of production.
It is provided for the embodiments of the invention a kind of real-time micro-nano stamp system of no exposure mask above, is described in detail,
Used herein a specific example illustrates the principle and implementation of the invention, and the explanation of above embodiments is only used
In facilitating the understanding of the method and its core concept of the invention；At the same time, for those skilled in the art, according to the present invention
Thought, there will be changes in the specific implementation manner and application range, in conclusion the content of the present specification should not be construed as
Limitation of the present invention.
Claims (5)
1. a kind of real-time micro-nano stamp system of no exposure mask, it is characterised in that: include:
Stamp data generating server carrys out the engineering pattern of different location on FPC substrate real-time according to fixed coding rule
It is encoded, and generates several specific mutually not duplicate coded graphics；
Light engine mechanism, the coded graphics Real-Time Optical for that will generate in real time are engraved in FPC substrate；
Positioning mechanism, for identification for determining the mark point of coded graphics position on FPC substrate, to make light engine mechanism
Can be by coded graphics photoetching at the mark point on FPC substrate, and the positioning mechanism identifies a group echo point, stamp data
It generates server and generates one group of corresponding coded graphics, light engine mechanism is at once by the coded graphics photoetching in FPC substrate
On；
Reel-to-reel charging and discharging mechanism, for realizing the conveying and collection of FPC substrate comprising for FPC substrate to be sent into optics
Engine mechanism carry out stamp involve in feed mechanism and by stamp complete FPC substrate recycling roll out shedding mechanism,
It is whether accurate for detecting the coded graphics on FPC substrate from monitoring feedback mechanism,
Precision movement platform, for controlling the accurate movement of light engine mechanism and positioning mechanism,
The light engine mechanism is installed on precision movement platform by substrate, and below the optical lens of light engine mechanism
Equipped with spectroscope, illumination circular lamp is equipped with below spectroscope,
It is described from monitoring system device include First look device, the second sighting device and the spectroscope, the First look
Device and the second sighting device are respectively arranged at spectroscope two sides, and the spectroscope is located at the optical lens of light engine mechanism
On optical axis, and the coded graphics generated from data server is identified by First look device；It is identified by the second sighting device
Coded graphics of the photoetching on FPC substrate.
2. the real-time micro-nano stamp system of no exposure mask according to claim 1, it is characterised in that: the reel-to-reel charging & discharging machine
Lateral offset deviation correcting device does not occur during loading and unloading for the FPC substrate of the guaranteed entire volume of structure band.
3. the real-time micro-nano stamp system of no exposure mask according to claim 2, it is characterised in that: described to involve in feed mechanism packet
Including volume has the feeding roller of FPC substrate and the feeding tensile force for being tensioned FPC substrate to adjust roller and compress FPC substrate
Feeding compresses roller；Rolling out shedding mechanism includes discharging roller for winding the FPC substrate for accomplishing fluently code and for being tensioned
The discharging tensile force of FPC substrate adjusts roller and compresses the discharging compression roller of FPC substrate.
4. the real-time micro-nano stamp system of no exposure mask according to claim 1, it is characterised in that: the positioning mechanism includes two
The contraposition CCD component and motion control device being installed in the Y-axis moving mechanism of precision movement platform are covered, and aligns CCD component
The two sides of light engine mechanism are located at, the contraposition CCD component passes through corresponding motion control device and controls it vertical
Directly in the movement in FPC substrate transport direction.
5. the real-time micro-nano stamp system of no exposure mask according to claim 1, it is characterised in that: the First look device and
Second sighting device includes industrial CCD, optical amplifier camera lens and lighting source, and wherein the focal plane of First look device, which is located at, divides
The mirror surface of light microscopic, the focal plane of the second sighting device and the focal plane of optical lens are consistent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710064032.1A CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710064032.1A CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
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| Publication Number | Publication Date |
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| CN106773552A CN106773552A (en) | 2017-05-31 |
| CN106773552B true CN106773552B (en) | 2019-01-22 |
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Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2002052620A1 (en) * | 2000-12-22 | 2004-04-30 | 株式会社ニコン | Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice |
| JP2005326550A (en) * | 2004-05-13 | 2005-11-24 | Sanee Giken Kk | Exposure device |
| CN100492179C (en) * | 2007-07-10 | 2009-05-27 | 上海微电子装备有限公司 | Interferometer |
| CN202693995U (en) * | 2012-06-01 | 2013-01-23 | 中山新诺科技有限公司 | Visual system |
| CN102722304B (en) * | 2012-06-21 | 2015-09-16 | 中山新诺科技有限公司 | A kind of joint way prepares the method for touch-screen |
| CN103246177B (en) * | 2013-05-03 | 2015-06-03 | 中山新诺科技有限公司 | Continuous mask-free photoetching method for flexible panel and device for method |
| CN104865800A (en) * | 2015-05-27 | 2015-08-26 | 中山新诺科技股份有限公司 | Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system |
| CN106324996B (en) * | 2015-06-15 | 2017-10-20 | 中国科学院上海光学精密机械研究所 | Litho machine original position multi channel imaging quality detection device and method |
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Effective date of registration: 20201030 Address after: Room 4606, block B, China Resources Building, 1366 Qianjiang Road, Jianggan District, Hangzhou City, Zhejiang Province Patentee after: Hangzhou Xinnuo Microelectronics Co.,Ltd. Address before: 518000 Incubator No. 8, Huajing Park, Tongji Group, 28 Langshan Road, Xili Street, Nanshan District, Shenzhen City, Guangdong Province (1-A) Patentee before: SHENZHEN YOUSHENG TECHNOLOGY Co.,Ltd. |
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Denomination of invention: Maskless real-time micro nano coding system Effective date of registration: 20210901 Granted publication date: 20190122 Pledgee: Bank of Jiangsu Limited by Share Ltd. Hangzhou branch Pledgor: Hangzhou Xinnuo Microelectronics Co.,Ltd. Registration number: Y2021330001333 |
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Date of cancellation: 20220914 Granted publication date: 20190122 Pledgee: Bank of Jiangsu Limited by Share Ltd. Hangzhou branch Pledgor: Hangzhou Xinnuo Microelectronics Co.,Ltd. Registration number: Y2021330001333 |