CN103744271A - Laser direct-writing system and photolithography method - Google Patents

Laser direct-writing system and photolithography method Download PDF

Info

Publication number
CN103744271A
CN103744271A CN201410042111.9A CN201410042111A CN103744271A CN 103744271 A CN103744271 A CN 103744271A CN 201410042111 A CN201410042111 A CN 201410042111A CN 103744271 A CN103744271 A CN 103744271A
Authority
CN
China
Prior art keywords
exposure
lens
carved
objective
focometry
Prior art date
Application number
CN201410042111.9A
Other languages
Chinese (zh)
Other versions
CN103744271B (en
Inventor
朱鹏飞
浦东林
胡进
陈林森
朱鸣
魏国军
Original Assignee
苏州苏大维格光电科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 苏州苏大维格光电科技股份有限公司 filed Critical 苏州苏大维格光电科技股份有限公司
Priority to CN201410042111.9A priority Critical patent/CN103744271B/en
Publication of CN103744271A publication Critical patent/CN103744271A/en
Application granted granted Critical
Publication of CN103744271B publication Critical patent/CN103744271B/en

Links

Abstract

The invention relates to a laser direct-writing system and a photolithography method. The laser direct-writing system comprises a focal length measurement system and an exposure system, wherein the focal length measurement system adopts an offline way to measure the three-dimensional shape information of the surface of a whole object to be etched, then converts the three-dimensional shape information into focusing information and sends the focusing information to the exposure system; according to the focusing information, in the process that the surface of the object to be etched is photoetched, the exposure system regulates the focal length so as to suit the concave and convex degree of the surface of the object to be etched, and an exposure point always focuses on the surface of the photoetched object.

Description

A kind of laser direct writing system and photoetching method

Technical field

Patent of the present invention relates to laser lithography field, especially a kind of laser direct writing system and method with three-dimensional navigation focusing function, can be used for accurate mask manufacture, mems device making, semiconductor mask-free photolithography, the fields such as large format micro-nano graph manufacture.

Background technology

It is a kind of emerging without mask micro-nano processing method that laser direct-write photoetching technology belongs to.Be widely used in mask manufacture, semiconductor devices is made and micro-nano graph is made field.The substrate of laser direct-writing processing may be relatively smooth wafer, mask plate, and also likely poor Sapphire Substrate or even the surface of flatness for example scribbles the yielding material of photoresist: organic glass etc.

Existing laser direct writing system generally has focus controlling module.For example: Chinese patent application CN102385261A announces the coaxial focusing mechanism of a kind of litho machine and focusing method, Chinese patent CN101477306B has mentioned a kind of laser direct writing system that utilizes 4 quadrant detector to detect as focal length.Chinese patent CN101846890B announces a kind of parallel light etching system.The focusing detecting method that said apparatus and system are announced is different, but in the control method of focal length, has all adopted on-line real time monitoring focusing mode.The control of this mode focusing in low speed inscription and the more smooth situation of substrate self is no problem, but inscription speed is being promoted, and upwards, obvious hysteresis has just appearred to platform movement velocity 100mm/s in focus controlling, the poor robustness of system.

Analyzing its reason mainly exists following some problem to be difficult to overcome:

1. in out of focus detection method, relate to ccd image collection and analysis, normal CCD transmission frame number is less than 100 frames, and after inscription speed gets on, sample frequency does not reach, and causes the sampled data for analyzing inadequate.

2. although adopt hypervelocity camera, but after obtaining image information, need to convert thereof into the electric signal of actuating motor, this link relates to image recognition processing and servosignal conversion, postpones if having time, causes focus controlling to lag behind.

3. adopt quadrant detector as out of focus detection means, but it is limited that it surveys stroke, and some substrates exist buckling deformation, from substrate, a bit move quickly into more in addition, if the focal length before both differs by more than measurement range, be easy to cause focusing axle to run and fly phenomenon.

In addition, need on-line real time monitoring and deal with data to require also corresponding raising to hardware configuration, cause equipment cost to rise.

Summary of the invention

In view of this, the object of the present invention is to provide a kind of laser direct writing method and system with navigation focusing function.Solve existing laser direct writing system focus controlling and cannot meet the needs that high speed is inscribed, the overall performance of improving laser straight-writing system.

A kind of laser direct writing system proposing according to object of the present invention, comprise focometry system and exposure system, after the mode of described focometry system employing off-line is measured the three-dimensional appearance information of body surface whole to be carved, described three-dimensional appearance information is converted into focusing information and sends to described exposure system, described exposure system is according to described focusing information, body surface described to be carved is being carried out in photoetching process, focus the concavo-convex degree of body surface to be carved described in being applicable to, make exposure station focus on all the time the surface of described photoetching object.

Corresponding relation between the defocusing amount △ Z of horizontal coordinate X, Y value and this point that preferably, described focusing information is body surface each point.

Preferably, the described focometry system integration is in described exposure system, and this focometry system and described exposure system are at least shared same object lens and same objective table, object to be carved described in placing on described objective table.

Preferably, described laser direct writing system also comprises the first drive motor of controlling object lens and moving up and down, drives described object lens and described objective table to do the second drive motor that relative level moves, and central controller, by moving up and down of described object lens and moving horizontally of relative objective table, described focometry system completes the measuring three-dimensional morphology to body surface whole to be carved, and calculates by described central controller the described focusing information that obtains.

Preferably, described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described the first light source sends is through optical path, from object lens, incide body surface to be carved, the reflected light that body surface described to be carved sends enters optical path from object lens, astigmatism optical device and the first ccd sensor, during measurement, the incident light that described the first light source sends forms a hot spot at body surface to be carved, described the first ccd sensor is according to this spot size, adjust in real time the focal length of object lens, and at object lens with when carving body surface and do relative level and move, on some selected measurement points, obtain the focusing information of these points.

Preferably, described exposure system also comprises secondary light source, pattern generator and exposure light path, and the incident light that described secondary light source sends, through pattern generator, exposure light path, incides body surface to be carved from object lens and forms exposure figure.

Preferably, described laser direct writing system also comprises an online focusing backup system.

Preferably, each self-separation of described focometry system and described exposure system arranges, this focometry system and described exposure system comprise object lens and an objective table separately, wherein corresponding object lens and the objective table of focometry system is measurement object lens and measurement objective table, the object lens that exposure system is corresponding and objective table are exposure object lens and exposure objective table, and described measurement objective table and exposure objective table are all in order to place object to be carved.

Preferably, described focometry system also comprises the first drive motor that control survey object lens move up and down, drives described measurement object lens and described measurement objective table to do the second drive motor that relative level moves, and central controller, by moving up and down of described measurement object lens and moving horizontally of relative measurement objective table, described focometry system completes the measuring three-dimensional morphology to body surface whole to be carved, and calculates by described central controller the described focusing information that obtains.

Preferably, described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described the first light source sends is through optical path, from measuring object lens, incide body surface to be carved, the reflected light that body surface described to be carved sends enters optical path from measuring object lens, astigmatism optical device and the first ccd sensor, during measurement, the incident light that described the first light source sends forms a hot spot at body surface to be carved, described the first ccd sensor is according to this spot size, adjust in real time the focal length of measuring object lens, and measuring object lens with when carving body surface and do relative level and move, on some selected measurement points, obtain the focusing information of these points.

Preferably, described exposure system also comprises the 3rd drive motor controlling exposure object lens and move up and down, drives described exposure object lens and described exposure objective table to do the 4th drive motor that relative level moves, and central controller, by moving up and down of described exposure object lens and moving horizontally of relative exposure objective table, described exposure system completes treats the photoetching of carving object.

Preferably, described exposure system also comprises secondary light source, pattern generator and exposure light path, and the incident light that described secondary light source sends is through pattern generator, exposure light path, and described in inciding from exposure object lens, body surface to be carved forms exposure figure.

Meanwhile, the invention allows for a kind of photoetching method, this photolithographicallpatterned is used laser direct writing system as above, comprises focometry stage and photoetching stage,

The described focometry stage comprises step:

1) obtain standard light spot size Df and the standard objective focal length Zf at body surface reference point place;

2), according to the size of body surface breadth to be carved, select the sampled measurements point of suitable quantity;

3) start to measure, by the second drive motor, drive between object lens and objective table and relatively move, when object lens move to each sampled measurements point, mobile Z axis, drive object lens move up and down the Df size that makes light spot lock-in arrive step 1), record afterwards the grating scale reading Zi of focus adjusting mechanism now and corresponding XY position coordinates Xi, Yi;

4) repeating step 3) complete the data acquisition of all sampled points;

5) all data in step 4) are processed, are generated required focusing information,

In the described photoetching stage, utilize above-mentioned focusing information, realize the focus controlling of object lens in exposure process.

Preferably, described step 1) can adopt manual adjustments pattern or adjusting pattern automatically to carry out.

Preferably, in described step 5), the processing of data is referred to the data Zi of collection point and Zf do difference, obtain three-dimensional defocusing amount △ Z, then set up the servo algorithm of △ Z and each measurement point horizontal coordinate XY position: △ Z=f (x, y).

Preferably, in the described photoetching stage, can also utilize described online focusing backup system, complete the online auxiliary focusing in exposure process.

Preferably, described online auxiliary focusing comprises: after exposure starts, profit utilizes described the first ccd sensor to detect the size variation of hot spot, analyzes data, calculates in real time out of focus adjustment amount △ Ze, sets up new servo algorithm △ Z '=f (x, y)+△ Ze.

Compared with prior art, laser direct writing system of the present invention and photoetching method have following advantage:

Focusing speed is fast.Owing to adopting offline inspection and the online method combining that detects, off-line pattern detects and eliminates large focusing departure by hardware servo algorithm, online detection is in real time used for eliminating little out of focus deviation, very little by the institutional adjustment amount of real-time processing controls, so system focusing fast response time.

System robustness is strong.Because detecting, off-line focal length obtains in advance three-dimensional appearance data, therefore by three-dimensional appearance data analysis is processed and can be found in advance to eliminate the detection abnormity point on substrate, and detect in real time the focus effect that may will directly have influence on abnormity point position focusing system to only adopting, even occur running flying phenomenon.

System overhead is little, lower than detecting in real time focusing system to hardware requirement.Large focusing deviation by early stage measuring three-dimensional morphology obtain and controlled by hardware servo algorithm, the later stage is online to be detected focusing and just does little deviation adjusting and eliminate the focal length drift of long-play system requirement of real-time is reduced.

The method, in conjunction with ultraviolet pulse light source (time shutter 10-100 nanosecond), can realize the high-quality graphics exposure under motion state, and can not make the quality deterioration of figure photoetching, can support meter level movement velocity.This pattern and current acoustooptic modulation technology, continuous light source stepping exposure mode make a marked difference, and efficiency improves greatly.

Accompanying drawing explanation

In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.

Fig. 1 is the module diagram of the laser direct-write photoetching system of first embodiment of the invention.

Fig. 2 is the driving device structure schematic diagram of object lens part in Fig. 1

Fig. 3 is how much analysis diagrams of body surface to be carved.

Fig. 4 is the module diagram of the laser direct-write photoetching system of second embodiment of the invention.

Embodiment

As described in the background art, in existing laser direct-write photoetching technology, owing to adopting the mode of online focusing, easily be limited to the processing power of instrument and equipment, in some are inscribed at a high speed, occur that image acquisition pixel is inadequate, response lag and the problems such as axle race flies of focusing, make existing laser direct-write photoetching technology cannot on the substrate of some rough surfaces, carry out high speed and inscribe.

Therefore, the present invention proposes a kind of new laser direct-write photoetching technology, its total mentality of designing is first to obtain the three-dimensional appearance information of body surface whole to be carved, then this three-dimensional information is converted into the focusing information that can be exposed light path identification, so, exposure system, treating when carving body surface and exposing, only needs can complete and treat the accurate exposure of carving each point of body surface according to above-mentioned focusing information.Figure is obtained and minute in two steps, completed with focusing, can avoid producing the problems such as response lag in focusing process online.According to above-mentioned mentality of designing, the concrete laser direct-write photoetching system of the present invention comprises focometry system and exposure system, after the mode of described focometry system employing off-line is measured the three-dimensional appearance information of body surface whole to be carved, described three-dimensional appearance information is converted into focusing information and sends to described exposure system, described exposure system is according to described focusing information, body surface described to be carved is being carried out in photoetching process, focus the concavo-convex degree of body surface to be carved described in being applicable to, make exposure station focus on all the time the surface of described photoetching object.

Below, will to laser direct-write photoetching technology of the present invention, describe by specific embodiment.

Refer to Fig. 1, Fig. 1 is the module diagram of the laser direct-write photoetching system of first embodiment of the invention.As shown in the figure, in the present embodiment, take mode that focometry system and exposure system are integrated,, on a board equipment, have focometry system 10 and exposure system 20 concurrently simultaneously.This embodiment, its advantage is on a station, to complete the off-line measurement of body surface information and exposure work afterwards, has saved the shared space of equipment, and the cost of whole production line.Its shortcoming is in becoming to produce in batches, must be according to every a slice substrate be carried out to first off-line measurement, and the operation of post-exposure is carried out, and efficiency does not reach optimization.

Continue referring to Fig. 1, in this laser direct-write photoetching system, focometry system 10 is integrated in exposure system 20, now, the part parts of this focometry system 10 and exposure system 20 are shared, such as two systems in diagram share object lens 111 and objective table 30 etc.

Particularly, focometry system 10 comprises the first light source 101, optical path 110, astigmatism optical device 120 and the first ccd sensor 121.Wherein the first light source 101 is preferably LASER Light Source, such as the infrared semiconductor laser of 650nm wavelength.The light that optical path 110 is used for that the first light source 101 is sent is delivered to the surface of object to be carved, and forms a hot spot.This optical path can feed back to this hot spot in the first ccd sensor 121 by astigmatism device 120 simultaneously.In order to realize this function, this optical path 110 at least comprises two half-reflecting half mirrors 112 and 113, the light that first half-reflecting half mirror 112 is used for the first light source 101 to send is toward object lens 111 directions reflections, simultaneously again by the light feeding back from object toward the first ccd sensor 121 direction transmissions; Second half-reflecting half mirror 113 guides in object lens 111 and the light that object is reflected guides to the first ccd sensor 121 except the light that the first light source 101 is sent, in this embodiment, this second half-reflecting half mirror 113 is also taken into account the light guiding in exposure system 20 simultaneously.During measurement, the incident light that this first light source 101 sends is through optical path 110, from object lens 111, incide body surface to be carved, the reflected light that body surface described to be carved sends enters optical path 110 from object lens 111, astigmatism optical device 120 and the first ccd sensor 121, the incident light that described the first light source sends forms a hot spot at body surface to be carved, described the first ccd sensor is according to this spot size, adjust in real time the focal length of object lens, and at object lens with when carving body surface and do relative level and move, on some selected measurement points, obtain the focusing information of these points.

Exposure system 20 comprises secondary light source 201, pattern generator 202 and exposure light path 210, this secondary light source 201 can be LASER Light Source or mercury lamp light source, be preferably laser pulse light source, this pattern generator 202 adopts DMD spatial light modulator, after the convergent-divergent of the figure producing in this pattern generator 202 through follow-up exposure light path 210, at body surface to be carved, form exposure figure.Exposure light path 210 adopts the micro imaging system of double telecentric structure, in this exposure light path 210, at least comprise a half-reflecting half mirror shared with above-mentioned optical path 110 (i.e. half-reflecting half mirror 113 in diagram), and some optical mirror slips that is directed into object lens 111 in order to the light that secondary light source 201 is sent.Between secondary light source 201 and pattern generator 202, the optical mirror slip that some are used for collimation and/or expand can also be set.The incident light that this secondary light source 201 sends, through pattern generator 202, exposure light path 210, incides body surface to be carved from object lens 111 and forms exposure figure.

It is pointed out that object lens 111, as optical mirror slip or optical mirror slip group, can be used as a part for optical path 110, also can be used as a part for exposure light path 210.In addition, each light path in diagram, although drawn the optical mirror slip of each position, yet in actual applications, corresponding light channel structure can be done some corresponding adjustment or replacement, as long as can guarantee the conduct direction of light roughly as described herein, to any feasible light path, do not do exhaustive herein.

Except above-mentioned optical module, laser direct writing system of the present invention is also provided with controls the mechanical component of these optical module motions and the electric assembly (not shown) of these mechanical components being carried out to order control.Particularly, this laser direct writing system comprises the first drive motor of controlling object lens and moving up and down, drives described object lens and described objective table to do the second drive motor that relative level moves, and controls the central controller that all parts carry out work.

Object lens are arranged on this first drive motor, as shown in Figure 2.This first drive motor adopts the fast motor of high precision corresponding speed, such as voice coil motor etc.Grating scale is also set on this first drive motor simultaneously, can reads object lens at the coordinate of Z axis by grating scale like this, reflect the focusing situation of object lens.Under the cooperation of the first drive motor and the second drive motor, by moving up and down of described object lens and moving horizontally of relative objective table, described focometry system completes the measuring three-dimensional morphology to body surface whole to be carved, and calculates by described central controller the described focusing information that obtains.

In to the control of exposure figure, by this first drive motor, drive object lens to move up and down, realize the adjusting of exposure light path focal length, reach the effect of optimum exposure.

When using above-mentioned laser direct writing system to carry out photoetching operation, first object to be carved is fixed to objective table, consider pinpoint problem, some aligning structure can be set on objective table, such as the alignment mark that can coordinate with object edge to be carved, or the limiting component that can design for contour of object to be carved etc.Each drive motor initialization, corresponds to object lens the reference position of body surface to be carved.Then enter the focometry stage, utilize focometry system to test the three-dimensional appearance of body surface, obtain body surface three-dimensional topographic data, and be converted into corresponding focusing information.This focometry stage specifically comprises that step is as follows:

1) obtain standard light spot size and the standard objective focal length at body surface reference point place.This step can adopt manual adjustments pattern or adjusting pattern automatically to carry out.If manual adjustments pattern, the image of coming by eye-observation object lens feedback, now, need to increase second ccd sensor that can take object lens feedback image, the second ccd sensor 220 as shown in FIG., these the second ccd sensor 220 exposure systems can share exposure light path, now can be by increase a half-reflecting half mirror 213 and some suitable optical mirror slips in exposure light path, the exposure figure that body surface to be carved is formed enters exposure light path 210 from object lens 111, and enter optical mirror slip from half-reflecting half mirror 213, finally enter described the second ccd sensor 220.Human eye is by observing the image in this second ccd sensor 220, the most clearly time (being under focusing state), open the first light source, utilize the first ccd sensor to measure and record the hot spot that now projects body surface to be carved, spot diameter is recorded as to Df, and object lens herein of record are at the Z axis coordinate Zf of vertical direction, this Zf can regard as the objective focal length of standard.If automatically regulate pattern, need to rely on a third-party image processing software, utilize this image processing software to obtain from the image in the first ccd sensor (can be also the second above-mentioned ccd sensor), and while setting size when a CCD spot size equals first prefocusing or the 2nd CCD figure notify under focometry system log (SYSLOG) spot size Df and objective focal length Zf now the most clearly time.This reference point can be selected from the point that body surface flatness is relatively high, also can directly select the starting point that object lens are corresponding as a reference point.

2), according to the size of body surface breadth to be carved, select the sampled measurements point of suitable quantity.Because whole focometry process need is considered the problem of overall efficiency, so generally according to the quantity of measurement point, select to the rule that breadth size is directly proportional.But also can be according to the height of body surface flatness to be carved, or photoetching process increases or reduces measurement point to the requirement of measuring accuracy.It should be noted that these measurement points must cover the surface of object whole to be carved, and preferably can keep homogeneity between points.

3) start to measure, by the second drive motor, drive between object lens and objective table and relatively move, when object lens move to each sampled measurements point, mobile Z axis is as Fig. 2, drive object lens move up and down the Df size that makes light spot lock-in arrive step 1), record afterwards the grating scale reading Zi of focus adjusting mechanism now and corresponding XY position coordinates Xi, Yi, wherein i represents i point.

4) repeating step 3) complete the data acquisition of all sampled points.

5) all data in step 4) are processed, generated required focusing information.The processing here refers to first does difference by the data Zi of each collection point and Zf, obtains three-dimensional defocusing amount △ Z, then sets up the servo algorithm of △ Z and each measurement point horizontal coordinate XY position: △ Z=f (x, y), schematic diagram is as Fig. 3.And so-called focusing information refer to the relation between the defocusing amount △ Z of horizontal coordinate X, Y value and this point of body surface each point.

In above-mentioned each step, allly the measurements and calculations of data are all relied on to central controller carry out.And central controller is after obtaining final focusing information, according to this focusing information, set up the focusing control program to exposure system.

After completing above work, enter the photoetching stage, utilize above-mentioned focusing information, realize the focus controlling of object lens in exposure process.Particularly, corresponding Z axis amount of movement is exported in the XY position that central controller can move to according to object current to be carved, and the numerical value of this amount of movement equals the size of the defocusing amount △ Z that corresponding XY orders.

Further, in this embodiment, can, using focometry system simultaneously as online focusing backup system, complete the online auxiliary focusing in exposure process.Particularly, after exposure starts, this first ccd sensor 121 starts to detect the size variation of hot spot, analyzes data, calculates in real time out of focus adjustment amount △ Ze, sets up new servo algorithm △ Z '=f (x, y)+△ Ze.

In addition, this backup system of focusing online can also use existing other technology to realize the online focal length auxiliary adjustment in exposure process, such as Astigmatism methord, knife-edge method, critical angle prism method or quadrant detector mensuration.

Except the laser direct writing system in embodiment one, the present invention also provides the second embodiment.Refer to Fig. 4, Fig. 4 is the laser direct writing system structural representation under second embodiment of the invention.As shown in the figure, in this second embodiment, described focometry system and each self-separation of described exposure system, the benefit arranging is like this can be in batch production, can to the object to be carved of different batches, carry out the measurement of photoetching and focal length simultaneously, improve production efficiency.Shortcoming is to need two complete equipments simultaneously, has increased cost.

Particularly, this focometry system 10 ' comprises object lens and an objective table separately with exposure system 20 ', wherein corresponding object lens and the objective table of focometry system 10 ' is measurement object lens 111 ' and measurement objective table 30 ', the object lens that exposure system 20 ' is corresponding and objective table are exposure object lens 211 and exposure objective table 30 ", described measurement objective table 30 ' and exposure objective table 30 " all in order to place object to be carved, and, this measurement objective table 30 ' and exposure objective table 30 " preferably there is identical specification and size, so, can be so that the reference position of focometry and exposure process has the effect of exactitude position.

Identical with the first embodiment, this focometry system 10 ' also comprises the first light source 101 ', optical path 110 ', astigmatism optical device 120 ' and the first ccd sensor 121 '.The incident light that this first light source 101 ' sends is through optical path 110 ', from object lens 111 ', incide body surface to be carved, the reflected light that body surface described to be carved sends enters optical path 110 ' from object lens 111 ', astigmatism optical device 120 ' and the first ccd sensor 121 ', the incident light that described the first light source sends forms a hot spot at body surface to be carved, described the first ccd sensor is according to this spot size, adjust in real time the focal length of object lens, and at object lens with when carving body surface and do relative level and move, on some selected measurement points, obtain the focusing information of these points.

With respect to the first embodiment, in the second embodiment, optical path 110 ' only needs to consider the distribution to incident light and reflected light two-way light beam, the setting that therefore can save optical mirror slip in light path, as shown in FIG., can be only with a half-reflecting half mirror 112 '.

Exposure system 20 ' also comprises secondary light source 201 ', pattern generator 202 ' and exposure light path 210 ', the incident light that this secondary light source 201 ' sends, through pattern generator 202 ', exposure light path 210 ', incides body surface to be carved from exposure object lens 211 and forms exposure figure.

In this second embodiment, the central controller that is used for controlling all parts mechanical motion can be same, as shown in Figure 4, also can separate a central controller is set separately separately, then between each central controller by data transfer means, such as wire communication, radio communication or third party's data storage carrier reach the object of swap data.In the embodiment of independent setting separately, focometry system 10 ' also comprises the first drive motor that control survey object lens 111 ' move up and down, drives described measurement object lens 111 ' and described measurement objective table 30 ' to do the second drive motor that relative level moves, and central controller, by moving up and down of described measurement object lens and moving horizontally of relative measurement objective table, described focometry system completes the measuring three-dimensional morphology to body surface whole to be carved, and calculates by described central controller the described focusing information that obtains.Exposure system 20 ' also comprises the 3rd drive motor controlling exposure object lens 211 and move up and down, drives described exposure object lens 211 and described exposure objective table 30 " do the 4th drive motor that relative level moves; and central controller; by moving up and down of described exposure object lens and moving horizontally of the relative objective table that exposes, described exposure system completes the photoetching for the treatment of object at quarter.

Further, in this second embodiment, also can comprise an online focusing backup system, online focusing backup system can be to use light path setting as same in focometry system, can be also some other system that can detect the spot size in exposure process, does not repeat them here.

Certainly, this second embodiment also can increase the 2nd CCD220 ' in exposure system, and its effect of playing is also in measurement or exposure process, allows human eye can observe the focusing situation of current object lens.

In this second embodiment, the method for carrying out photoetching, basic identical with the first embodiment, repeat no more herein.But, for focometry stage and photoetching stage, at two different boards, carry out respectively.Now some transloading equipments need to be increased between two stages, such as the transport tape on streamlined production line or mechanical arm etc.In addition, in the embodiment arranging separately at two central controllers, also increase the operation of a step data transmission.

Above-mentioned explanation to the disclosed embodiments, makes professional and technical personnel in the field can realize or use the present invention.To the multiple modification of these embodiment, will be apparent for those skilled in the art, General Principle as defined herein can, in the situation that not departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention will can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.

Claims (17)

1. a laser direct writing system, it is characterized in that: comprise focometry system and exposure system, after the mode of described focometry system employing off-line is measured the three-dimensional appearance information of body surface whole to be carved, described three-dimensional appearance information is converted into focusing information and sends to described exposure system, described exposure system is according to described focusing information, body surface described to be carved is being carried out in photoetching process, focus the concavo-convex degree of body surface to be carved described in being applicable to, make exposure station focus on all the time the surface of described photoetching object.
2. laser direct writing system as claimed in claim 1, is characterized in that: the corresponding relation between the defocusing amount △ Z of the horizontal coordinate X that described focusing information is body surface each point, Y value and this point.
3. laser direct writing system as claimed in claim 1, it is characterized in that: the described focometry system integration is in described exposure system, this focometry system and described exposure system are at least shared same object lens and same objective table, object to be carved described in placing on described objective table.
4. laser direct writing system as claimed in claim 3, it is characterized in that: described laser direct writing system also comprises the first drive motor of controlling object lens and moving up and down, drives described object lens and described objective table to do the second drive motor that relative level moves, and central controller, by moving up and down of described object lens and moving horizontally of relative objective table, described focometry system completes the measuring three-dimensional morphology to body surface whole to be carved, and calculates by described central controller the described focusing information that obtains.
5. laser direct writing system as claimed in claim 4, it is characterized in that: described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described the first light source sends is through optical path, from object lens, incide body surface to be carved, the reflected light that body surface described to be carved sends enters optical path from object lens, astigmatism optical device and the first ccd sensor, during measurement, the incident light that described the first light source sends forms a hot spot at body surface to be carved, described the first ccd sensor is according to this spot size, adjust in real time the focal length of object lens, and at object lens with when carving body surface and do relative level and move, on some selected measurement points, obtain the focusing information of these points.
6. laser direct writing system as claimed in claim 4, it is characterized in that: described exposure system also comprises secondary light source, pattern generator and exposure light path, the incident light that described secondary light source sends, through pattern generator, exposure light path, incides body surface to be carved from object lens and forms exposure figure.
7. laser direct writing system as claimed in claim 6, is characterized in that: described laser direct writing system also comprises an online focusing backup system.
8. laser direct writing system as claimed in claim 1, it is characterized in that: each self-separation of described focometry system and described exposure system arranges, this focometry system and described exposure system comprise object lens and an objective table separately, wherein corresponding object lens and the objective table of focometry system is measurement object lens and measurement objective table, the object lens that exposure system is corresponding and objective table are exposure object lens and exposure objective table, and described measurement objective table and exposure objective table are all in order to place object to be carved.
9. laser direct writing system as claimed in claim 8, it is characterized in that: described focometry system also comprises the first drive motor that control survey object lens move up and down, drives described measurement object lens and described measurement objective table to do the second drive motor that relative level moves, and central controller, by moving up and down of described measurement object lens and moving horizontally of relative measurement objective table, described focometry system completes the measuring three-dimensional morphology to body surface whole to be carved, and calculates by described central controller the described focusing information that obtains.
10. laser direct writing system as claimed in claim 9, it is characterized in that: described focometry system also comprises the first light source, optical path, astigmatism optical device and the first ccd sensor, the incident light that described the first light source sends is through optical path, from measuring object lens, incide body surface to be carved, the reflected light that body surface described to be carved sends enters optical path from measuring object lens, astigmatism optical device and the first ccd sensor, during measurement, the incident light that described the first light source sends forms a hot spot at body surface to be carved, described the first ccd sensor is according to this spot size, adjust in real time the focal length of measuring object lens, and measuring object lens with when carving body surface and do relative level and move, on some selected measurement points, obtain the focusing information of these points.
11. laser direct writing systems as claimed in claim 8, it is characterized in that: described exposure system also comprises the 3rd drive motor controlling exposure object lens and move up and down, drives described exposure object lens and described exposure objective table to do the 4th drive motor that relative level moves, and central controller, by moving up and down of described exposure object lens and moving horizontally of relative exposure objective table, described exposure system completes treats the photoetching of carving object.
12. laser direct writing systems as claimed in claim 8, it is characterized in that: described exposure system also comprises secondary light source, pattern generator and exposure light path, the incident light that described secondary light source sends is through pattern generator, exposure light path, and described in inciding from exposure object lens, body surface to be carved forms exposure figure.
13. 1 kinds of photoetching methods, this photolithographicallpatterned is used the laser direct writing system as described in claim 1-12 any one, comprises focometry stage and photoetching stage, it is characterized in that:
The described focometry stage comprises step:
1) obtain standard light spot size Df and the standard objective focal length Zf at body surface reference point place;
2), according to the size of body surface breadth to be carved, select the sampled measurements point of suitable quantity;
3) start to measure, by the second drive motor, drive between object lens and objective table and relatively move, when object lens move to each sampled measurements point, mobile Z axis, drive object lens move up and down the Df size that makes light spot lock-in arrive step 1), record afterwards the grating scale reading Zi of focus adjusting mechanism now and corresponding XY position coordinates Xi, Yi;
4) repeating step 3) complete the data acquisition of all sampled points;
5) all data in step 4) are processed, are generated required focusing information,
In the described photoetching stage, utilize above-mentioned focusing information, realize the focus controlling of object lens in exposure process.
14. photoetching methods as claimed in claim 13, is characterized in that: described step 1) can adopt manual adjustments pattern or adjusting pattern automatically to carry out.
15. photoetching methods as claimed in claim 13, it is characterized in that: in described step 5), the processing of data is referred to the data Zi of collection point and Zf do difference, obtain three-dimensional defocusing amount △ Z, then set up the servo algorithm of △ Z and each measurement point horizontal coordinate XY position: △ Z=f (x, y).
16. photoetching methods as claimed in claim 13, is characterized in that: in the described photoetching stage, can also utilize described focometry system as online focusing backup system, complete the online auxiliary focusing in exposure process.
17. photoetching methods as claimed in claim 16, it is characterized in that: described online auxiliary focusing comprises: after exposure starts, utilize described the first ccd sensor to detect the size variation of hot spot, analyze data, calculate in real time out of focus adjustment amount △ Ze, set up new servo algorithm △ Z '=f (x, y)+△ Ze.
CN201410042111.9A 2014-01-28 2014-01-28 A kind of laser direct writing system and photoetching method CN103744271B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410042111.9A CN103744271B (en) 2014-01-28 2014-01-28 A kind of laser direct writing system and photoetching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410042111.9A CN103744271B (en) 2014-01-28 2014-01-28 A kind of laser direct writing system and photoetching method

Publications (2)

Publication Number Publication Date
CN103744271A true CN103744271A (en) 2014-04-23
CN103744271B CN103744271B (en) 2015-10-28

Family

ID=50501301

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410042111.9A CN103744271B (en) 2014-01-28 2014-01-28 A kind of laser direct writing system and photoetching method

Country Status (1)

Country Link
CN (1) CN103744271B (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104238285A (en) * 2014-09-10 2014-12-24 中国电子科技集团公司第四十五研究所 Laser direct writing type photoetching system capable of dynamically focusing
CN104298080A (en) * 2014-11-06 2015-01-21 苏州苏大维格光电科技股份有限公司 Maskless laser direct writing stacking exposure method
CN104570624A (en) * 2014-09-28 2015-04-29 江苏影速光电技术有限公司 Focusing system for laser direct writing type lithography machine and control method thereof
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment
CN104972232A (en) * 2015-06-26 2015-10-14 吉林大学 Alignment assembly and method for aligning rotating shaft of rotating table type laser direct writing device to direct writing optical axis
CN106094448A (en) * 2016-07-29 2016-11-09 胡煜塨 Etching system
CN106527053A (en) * 2016-11-25 2017-03-22 天津津芯微电子科技有限公司 LDI automatic focusing control method and system
CN106527057A (en) * 2016-12-30 2017-03-22 江苏九迪激光装备科技有限公司 Laser direct writing system and method suitable for curved mobile phone glass
CN106681106A (en) * 2017-03-31 2017-05-17 苏州苏大维格光电科技股份有限公司 Mixed lithographic system and mixed lithographic method
CN106773538A (en) * 2016-11-25 2017-05-31 天津津芯微电子科技有限公司 Active Focusing mechanism, light path system and laser direct-write photoetching machine
WO2018120481A1 (en) * 2016-12-31 2018-07-05 江苏友迪激光科技有限公司 Direct-write screen platemaking apparatus and use method therefor
CN108303858A (en) * 2018-03-09 2018-07-20 中山新诺科技股份有限公司 A kind of maskless lithography system and its exposure method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1457828A2 (en) * 2003-03-10 2004-09-15 ASML Netherlands B.V. Focus spot monitoring in a lithographic projection apparatus
WO2010029860A1 (en) * 2008-09-09 2010-03-18 Nikon Corporation Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
CN101846890A (en) * 2010-05-13 2010-09-29 苏州苏大维格光电科技股份有限公司 Parallel photoetching write-through system
JP2011040547A (en) * 2009-08-10 2011-02-24 Canon Inc Measurement apparatus, exposure apparatus, and method of manufacturing device
CN102236270A (en) * 2011-07-29 2011-11-09 中国科学院光电技术研究所 Focus detection device applicable to double workpiece table projection lithography machine
CN102736422A (en) * 2011-03-31 2012-10-17 上海微电子装备有限公司 Proximity field exposure device and method
CN103091992A (en) * 2011-11-02 2013-05-08 上海微电子装备有限公司 Workpiece position correction device and correction method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1457828A2 (en) * 2003-03-10 2004-09-15 ASML Netherlands B.V. Focus spot monitoring in a lithographic projection apparatus
EP1457828A3 (en) * 2003-03-10 2009-04-22 ASML Netherlands B.V. Focus spot monitoring in a lithographic projection apparatus
WO2010029860A1 (en) * 2008-09-09 2010-03-18 Nikon Corporation Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
JP2011040547A (en) * 2009-08-10 2011-02-24 Canon Inc Measurement apparatus, exposure apparatus, and method of manufacturing device
CN101846890A (en) * 2010-05-13 2010-09-29 苏州苏大维格光电科技股份有限公司 Parallel photoetching write-through system
CN102736422A (en) * 2011-03-31 2012-10-17 上海微电子装备有限公司 Proximity field exposure device and method
CN102236270A (en) * 2011-07-29 2011-11-09 中国科学院光电技术研究所 Focus detection device applicable to double workpiece table projection lithography machine
CN103091992A (en) * 2011-11-02 2013-05-08 上海微电子装备有限公司 Workpiece position correction device and correction method

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104238285A (en) * 2014-09-10 2014-12-24 中国电子科技集团公司第四十五研究所 Laser direct writing type photoetching system capable of dynamically focusing
CN104238285B (en) * 2014-09-10 2017-02-08 中国电子科技集团公司第四十五研究所 Laser direct writing type photoetching system capable of dynamically focusing
CN104570624A (en) * 2014-09-28 2015-04-29 江苏影速光电技术有限公司 Focusing system for laser direct writing type lithography machine and control method thereof
CN104298080B (en) * 2014-11-06 2016-08-31 苏州苏大维格光电科技股份有限公司 A kind of without mask laser direct-writing superposition exposure method
CN104298080A (en) * 2014-11-06 2015-01-21 苏州苏大维格光电科技股份有限公司 Maskless laser direct writing stacking exposure method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment
CN104972232A (en) * 2015-06-26 2015-10-14 吉林大学 Alignment assembly and method for aligning rotating shaft of rotating table type laser direct writing device to direct writing optical axis
CN106094448A (en) * 2016-07-29 2016-11-09 胡煜塨 Etching system
CN106094448B (en) * 2016-07-29 2019-06-07 苏州亿拓光电科技有限公司 Lithography system
CN106527053A (en) * 2016-11-25 2017-03-22 天津津芯微电子科技有限公司 LDI automatic focusing control method and system
CN106773538A (en) * 2016-11-25 2017-05-31 天津津芯微电子科技有限公司 Active Focusing mechanism, light path system and laser direct-write photoetching machine
CN106527057A (en) * 2016-12-30 2017-03-22 江苏九迪激光装备科技有限公司 Laser direct writing system and method suitable for curved mobile phone glass
WO2018120481A1 (en) * 2016-12-31 2018-07-05 江苏友迪激光科技有限公司 Direct-write screen platemaking apparatus and use method therefor
CN106681106A (en) * 2017-03-31 2017-05-17 苏州苏大维格光电科技股份有限公司 Mixed lithographic system and mixed lithographic method
CN106681106B (en) * 2017-03-31 2018-10-19 苏州苏大维格光电科技股份有限公司 Mix lithography system and mixing photolithography method
CN108303858A (en) * 2018-03-09 2018-07-20 中山新诺科技股份有限公司 A kind of maskless lithography system and its exposure method

Also Published As

Publication number Publication date
CN103744271B (en) 2015-10-28

Similar Documents

Publication Publication Date Title
US10852639B2 (en) Exposure apparatus and exposure method, and device manufacturing method
CN107346059B (en) Variable focal length imaging system
CN101852992B (en) Apparatus and method for optical position assessment
US10451559B2 (en) Illumination source for an inspection apparatus, inspection apparatus and inspection method
JP4416758B2 (en) Lithographic apparatus and device manufacturing method using FPD chuck Z position measurement
US5153916A (en) Method and apparatus for detecting focal plane
TWI594081B (en) Substrate processing apparatus, processing apparatus and device manufacturing method
TWI413869B (en) A holding means, a position detecting means and an exposure means, a moving method, a position detecting method, an exposure method, a adjusting method of the detecting system, and an element manufacturing method
CN101107558B (en) Tracking auto focus system
EP1355350B1 (en) Chip scale marker and marking method
DE69631260T2 (en) Scanning exposure apparatus, exposure method using the same, and method of manufacturing the device
TW201715198A (en) Metrology methods, radiation source, metrology apparatus and device manufacturing method
CN102754035B (en) Lithographic apparatus and device manufacturing method
CN102163001B (en) Method and apparatus for controlling a lithographic apparatus
JP5498243B2 (en) Exposure apparatus, exposure method, and device manufacturing method
JP2015109459A5 (en)
US20070247640A1 (en) Exposure Apparatus, Exposure Method and Device Manufacturing Method, and Surface Shape Detection Unit
KR100898848B1 (en) Method for a multiple exposure beams lithopraphy tool
JPWO2007043535A1 (en) Optical characteristic measuring method, exposure method, device manufacturing method, inspection apparatus and measuring method
TWI646400B (en) Photolithography device, component manufacturing method and related data processing device and computer program product
US4538914A (en) Transfer apparatus for compensating for a transfer error
US20020067477A1 (en) Patten inspection apparatus, and exposure apparatus control system using same
JPH07270122A (en) Displacement detection device, aligner provided with said displacement detection device and manufacture of device
CN103309169B (en) The method of pick-up unit, exposure device and manufacture device
JP2012094902A5 (en) Exposure method, exposure apparatus, and device manufacturing method

Legal Events

Date Code Title Description
PB01 Publication
C06 Publication
SE01 Entry into force of request for substantive examination
C10 Entry into substantive examination
GR01 Patent grant
C14 Grant of patent or utility model
CP01 Change in the name or title of a patent holder

Address after: 215123 No. 478 South Street, Suzhou Industrial Park, Jiangsu, China

Patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd.

Address before: 215123 No. 478 South Street, Suzhou Industrial Park, Jiangsu, China

Patentee before: SVG OPTRONICS, Co.,Ltd.

CP01 Change in the name or title of a patent holder