CN104471486A - Illumination device, processing device, and device manufacturing method - Google Patents

Illumination device, processing device, and device manufacturing method Download PDF

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Publication number
CN104471486A
CN104471486A CN201380037678.0A CN201380037678A CN104471486A CN 104471486 A CN104471486 A CN 104471486A CN 201380037678 A CN201380037678 A CN 201380037678A CN 104471486 A CN104471486 A CN 104471486A
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CN
China
Prior art keywords
light source
light
source portion
illumination
substrate
Prior art date
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Granted
Application number
CN201380037678.0A
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Chinese (zh)
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CN104471486B (en
Inventor
根岸武利
福井达雄
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Nikon Corp
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Nikon Corp
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Application filed by Nikon Corp filed Critical Nikon Corp
Priority to CN201610291349.4A priority Critical patent/CN105892237B/en
Priority to CN201710648005.9A priority patent/CN107315323B/en
Priority to CN201710983508.1A priority patent/CN107741685A/en
Publication of CN104471486A publication Critical patent/CN104471486A/en
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Publication of CN104471486B publication Critical patent/CN104471486B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An illumination device (IU) comprises: a first light source unit (21a); a second light source unit (21b) with a light emission direction which differs from that of the first light source unit; and a deflector unit (22) which deflects at least a portion of light such that a progress direction of light from the first light source unit and of light from the second light source unit are collected. The first light source unit and the second light source unit are positioned in different locations in prescribed directions such that illumination regions into which light enters which is emitted from each light source unit and transits the deflection unit are aligned contiguously in the prescribed directions.

Description

Lighting device, treating apparatus and device making method
Technical field
The present invention relates to lighting device, treating apparatus and device making method.
The application based on U.S. Provisional Application 61/652, No. 719 CLAIM OF PRIORITY on May 29th, 2012, and quotes its content at this.
Background technology
In recent years, as the display device of televisor etc., mostly use the flat-panel monitors such as such as display panels.In the manufacture of the such various devices of flat-panel monitor, utilize the treating apparatus such as exposure device.Such as, utilize the photoetching method, etching technique etc. that realize based on exposure device, form the various film figures such as transparent membrane electrode on a glass, manufacture display panels thus.As photoetching method, proposition has replacement glass plate and the picture of mask pattern is carried out to the method (patent documentation 1 for example, referring to following) of projection exposure on the plate shape substrates of wound into rolls.
Prior art document
Patent documentation
Patent documentation 1: Japanese Laid-Open 2007-114385 publication
Summary of the invention
Expect that the treating apparatus such as exposure device expand process range for the viewpoint that can manufacture device etc. efficiently, in the lighting device for such treating apparatus, expect the range of exposures of the light expanded on the direction vertical with the moving direction of treated object.
The object of the present invention program is, provides a kind of lighting device, treating apparatus and the device making method that can expand process range.
According to the 1st scheme of the present invention, a kind of lighting device is provided, has: the 1st light source portion; 2nd light source portion, the injection direction of its light is different from above-mentioned 1st light source portion; And deflector, it is to make from the light of the above-mentioned 1st light source portion mode consistent with the direct of travel of the light from above-mentioned 2nd light source portion, make the deflection at least partially of this light, the mode that above-mentioned 1st light source portion and above-mentioned 2nd light source portion arrange in the prescribed direction continuously to make the field of illumination injected from each light source portion injection and via the light of above-mentioned deflector, afore mentioned rules direction is configured in diverse location.
According to the 2nd scheme of the present invention, provide a kind for the treatment of apparatus, be transferred to by the pattern being formed as mask pattern and have on the substrate of inductive layer, this treating apparatus has: to the lighting device of the 1st scheme that above-mentioned mask pattern throws light on; With the mobile device making above-mentioned mask pattern and aforesaid substrate along the direction relative movement vertical with afore mentioned rules direction.
According to the 3rd scheme of the present invention, a kind of device making method is provided, comprises: by the treating apparatus of the 2nd scheme, above-mentioned pattern is transferred on aforesaid substrate by above-mentioned mask pattern and aforesaid substrate relative movement continuously; Utilize and implement subsequent treatment transferred with the change of the inductive layer of the aforesaid substrate of above-mentioned pattern.
Invention effect
According to mode of the present invention, a kind of lighting device, treating apparatus and the device making method that expand process range can be provided.
Accompanying drawing explanation
Fig. 1 is the figure of the example representing device inspection apparatus.
Fig. 2 is the side view of the treating apparatus (exposure device) representing the 1st embodiment.
Fig. 3 is the front view of the treating apparatus (exposure device) representing the 1st embodiment.
Fig. 4 A is the figure of the lighting module representing the 1st embodiment.
Fig. 4 B is the figure of the lighting module representing the 1st embodiment.
Fig. 5 is the stereographic map of the deflector representing the 1st embodiment.
Fig. 6 is the vertical view of the deflector representing the 1st embodiment.
Fig. 7 is the figure of the example representing Illumination Distribution and optical filter.
Fig. 8 is the figure of other examples representing Illumination Distribution and optical filter.
Fig. 9 is the side view of the treating apparatus (exposure device) representing the 2nd embodiment.
Figure 10 is the stereographic map of the lighting device representing the 2nd embodiment.
Figure 11 is the vertical view of the lighting device representing the 2nd embodiment.
Figure 12 is the vertical view of the light source of the lighting device representing the 2nd embodiment.
Figure 13 A is the figure of the optics rod unit of the lighting device representing the 2nd embodiment.
Figure 13 B is the figure of the optics rod unit of the lighting device representing the 2nd embodiment.
Figure 14 is the vertical view of the relay lens of the lighting device representing the 2nd embodiment.
Figure 15 is the figure of the deflector of the lighting device representing the 2nd embodiment.
Figure 16 is the figure of the diaphragm parts of the lighting device representing the 2nd embodiment.
Figure 17 is the side view of the treating apparatus (exposure device) representing the 3rd embodiment.
Figure 18 is the vertical view of the treating apparatus (exposure device) representing the 3rd embodiment.
Figure 19 is the side view of the treating apparatus (exposure device) representing the 4th embodiment.
Figure 20 is the front view of the treating apparatus (exposure device) representing the 4th embodiment.
Figure 21 is the front view of the deflector of the lighting device representing the 4th embodiment.
Figure 22 is the process flow diagram of the example representing device making method.
Embodiment
[the 1st embodiment]
Fig. 1 is the figure of the structure example representing device inspection apparatus SYS (flexible display production line).At this, show from supply volume FR1 draw flexible substrate P (sheet, film etc.) successively via n platform treating apparatus U1, U2, U3, U4, U5 ... Un and be wound to reclaim volume FR2 till example.
In FIG, XYZ orthogonal coordinate system be set to, the surface (or back side) of substrate P is set to vertical with XZ face, and the direction (Width) orthogonal with the conveyance direction (length direction) of substrate P is set to Y direction.Z-direction is set to such as vertical, and X-direction and Y direction are set to horizontal direction.In addition, for convenience of explanation, sometimes the figure observed from X-direction (downstream of conveyance direction) is called front view, the figure observed from Y direction (direction of rotary middle spindle) is called side view, the figure observed from Z-direction (top of vertical) is called vertical view.
The substrate P be wound on supply volume FR1 is drawn by the driven roller DR1 of clamping, is located in the Y direction by marginal position controller EPC1 and is carried to treating apparatus U1.
Treating apparatus U1 is the applying device with mode of printing, photonasty functional liquid (photoresists, photonasty coupling material, UV cured resin liquid etc.) being coated on continuously or optionally substrate P surface along the conveyance direction (length direction) of substrate P.Applying mechanism Gp1 and drier Gp2 etc. is provided with in treating apparatus U1, wherein, this applying mechanism Gp1 comprises the pressure roller DR2 of winding substrate P, the forme roller etc. for the painting application roller or the relief printing plate optionally applied by photonasty functional liquid or intaglio plate that photonasty functional liquid are coated on equably substrate P surface on this pressure roller DR2, and drier Gp2 is used for removing rapidly the solvent or moisture that the photonasty functional liquid that is applied to substrate P comprises.
Treating apparatus U2 is heating arrangement, makes the photonasty functional layer being applied to surface stably fix for the substrate P moved from treating apparatus U1 being heated to set point of temperature (such as, several 10 DEG C to about 120 DEG C).Be provided with in treating apparatus U2 for substrate P is turned back conveyance multiple roller and air diverts bar (air turn bar), cooling chamber portion HA2, clamping driven roller DR3 etc.
Treating apparatus U3 as exposure device comprises exposure device, and this exposure device irradiates the ultraviolet patterned light corresponding with the circuit pattern of display and wiring pattern to the photonasty functional layer of the substrate P moved from treating apparatus U2.Be provided with in treating apparatus U3 the center of the Y-direction of substrate P (Width) is controlled in fixed position marginal position controller EPC2, the driven roller DR4 of clamping, the substrate-placing platform ST (substrate supporting parts) back side of the substrate P transported in X direction supported with the flexure plane of plane or cylindrical shape with regulation tension force by air bearing layer and two groups of driven rollers DR6, DR7 etc. for lax (enough and to spare) DL of substrate P being given to regulation.
And be also provided with in treating apparatus U3: swing roller 14, it is wound with the mask substrate (hereinafter referred to as mask pattern M) of sheet and rotates around the center line parallel with Y-direction on outer peripheral face; Lighting device IU, it irradiates the exposure illumination light of the slit-shaped extended along Y-direction to the mask pattern M be wound on this swing roller 14 and is transferred to by the pattern of mask pattern M by substrate-placing platform ST with in a part for the substrate P of plane supporting; And aligming microscope AM, it is in order to make the pattern contraposition (aligning) relative to substrate P that be transferred and detect the alignment mark etc. be previously formed in substrate P.
The treating apparatus U3 of Fig. 1 comprises the so-called exposure device close to (proximity) mode, to the swing roller 14 of mask pattern M be wound with as mask body, make mask body and substrate P close with specified gap (within tens of μm), and the pattern in mask body to be transferred in substrate P.Being not limited to the transfer modes of the pattern realized based on treating apparatus U3, also can be to the mode that projects of picture of mask pattern or the way of contact that substrate P is wound on the periphery of cylindric mask body by projection optical system.In addition, about mask body, swing roller 14 can be separated with mask pattern M, also can be separated.Such as, mask body can form mask pattern M and forms on the surface of swing roller 14.
Treating apparatus U4 is wet type processing device, carries out based at least one in the such various wet processed of the development treatment, electroless plating process etc. of wet type the photonasty functional layer of the substrate P moved from treating apparatus U3.
Treating apparatus U5 is heat drying apparatus, heats the substrate P moved from treating apparatus U4, and the moisture of substrate P wetting in wet process is adjusted to setting, but detailed.Then, by through some treating apparatus and by the substrate P after the last treating apparatus Un of series of process via clamping driven roller DR9 and marginal position controller EPC3 and be wound to reclaim volume FR2.
The unified running controlling each treating apparatus U1 to Un forming production line of higher level's control device CONT, also carries out feedback modifiers or feedforward correction etc. based on the monitoring of the conveyance state of the substrate P between the supervision of the treatment situation of each treating apparatus U1 to Un and treatment state, treating apparatus, the result of in advance/inspection/measurement afterwards.
The substrate P used in present embodiment is such as resin molding, the paper tinsel (foil) etc. that is made up of metal or alloy such as stainless steels.The material of resin molding comprise in such as polyvinyl resin, acrylic resin, vibrin, ethylene-vinyl copolymer resin, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene resin, vinyl acetate resin one or more.
Expect that substrate P selects the material that thermal expansivity is little, thus essence can ignore the deflection caused because being heated in various treatment process.Thermal expansivity can be set to and is less than the threshold value corresponding to technological temperature etc. by being such as mixed in resin molding by inorganic filler.Inorganic filler can be such as titanium dioxide, zinc paste, aluminium, monox etc.In addition, the individual layers of substrate P can be the thickness manufactured with floating system (float) method etc. the be very thin glass of about 100 μm also can be the duplexer of above-mentioned resin molding, paper tinsel etc. of fitting on this very thin glass.In addition, substrate P can in advance by the pre-treatment of regulation by its surface modification activate or fine next door structure (sag and swell) that is formed from the teeth outwards for precise pattern.
The device inspection apparatus SYS of Fig. 1 repeats or performs the various process for the manufacture of device (display panel etc.) to substrate P continuously.Be performed the substrate P after various process and split (cutting) by each device, and become multiple device.About the size of substrate P, such as, Width (Y direction as minor face) is of a size of about 10cm to 2m, and length direction (X-direction as long limit) is of a size of more than 10m.
Then, the structure for the treatment of apparatus U3 is described in detail.Fig. 2 is the side view of the exposure device EX as treating apparatus U3, and Fig. 3 is the front view of this exposure device EX.
Exposure device EX shown in Fig. 2 is so-called scanning-exposure apparatus, make substrate P (sensitive film) and mask pattern M relative movement and with the exposure light from mask pattern M, substrate P scanned, thus the exposing patterns being formed at mask pattern M being transferred in substrate P.The conveyance direction of the substrate P on substrate-placing platform ST is roughly the same with the direction (direction of scanning) that the exposure light penetrated from mask pattern M scans in substrate P.
In addition, exposure device EX is the exposure device close to mode, make under substrate P and mask pattern M state close to each other, with the illumination light L from lighting device IU, mask pattern M is thrown light on, and make the exposure light penetrated from illuminated mask pattern M be irradiated to substrate P, thus, via projection optical system, exposing patterns is not transferred in substrate P.
Exposure device EX has: the mobile device 10 making substrate P and mask pattern M relative movement; To the lighting device IU that mask pattern M throws light on; For making the aligming microscope AM (alignment optical system) of the exposing patterns contraposition relative to substrate P be transferred; Detect the illumination monitoring device 11 (measuring device) of the illumination (light intensity) of irradiating the illumination light L in substrate P from lighting device IU; With the control device 12 controlled each several part of exposure device EX.
Mobile device 10 has: the conveying unit 13 of conveyance substrate P; Keep mask pattern M and the swing roller 14 that can rotate; With the drive division 15 swing roller 14 being carried out to rotary actuation.
Conveying unit 13 comprises the driven roller DR4 shown in Fig. 1, driven roller DR6 etc., and substrate P is moved linearly on substrate-placing platform ST.Detected by position-detection sensor 16 by the position of the substrate P transported.The testing result of control device 12 position-based detecting sensor 16 controls conveying unit 13, controls the position of the substrate P transported by conveying unit 13 thus.
Swing roller 14 has the outer peripheral face (following, also referred to as barrel surface 14a) of cylinder planar, keeps to make the mask pattern M of transmission-type be bent to cylinder planar along the mode of barrel surface 14a.Barrel surface is around regulation center line with the bending face of predetermined radius, such as, be the outer peripheral face of cylinder or cylinder at least partially.
Swing roller 14 configures in the mode that the substrate P on the tangent plane of barrel surface 14a and substrate-placing platform ST is almost parallel.Swing roller 14 is arranged to rotate around the rotary middle spindle AX1 of regulation.The rotary middle spindle AX1 of swing roller 14 is set to such as roughly orthogonal with the moving direction of substrate P when transporting on substrate-placing platform ST (almost parallel with the Width of substrate P).
Drive division 15 makes swing roller 14 rotate around rotary middle spindle AX1.The position of rotation of swing roller 14 is detected by rotation sensor 17.Control device 12 controls drive division 15 based on the testing result of rotation sensor 17, is controlled the position of rotation of the swing roller 14 in rotation thus by drive division 15.
Mobile device 10 is controlled by control device 12, synchronously drives substrate P and mask pattern M.Control device 12 controls conveying unit 13 and drive division 15, to make the translational speed of substrate P (conveyance speed) roughly the same with the translational speed (linear velocity) of the mask pattern M being held in swing roller 14.In addition, mobile device 10 also can raise the relative position of substrate P on whole substrate-placing platform ST and swing roller 14 in one or both of Y direction and Z-direction.
Lighting device IU is configured in the inner side of swing roller 14, throws light on from the part (field of illumination IR) of inner side to mask pattern M for swing roller 14 with illumination light L.Field of illumination IR is such as using the belt-like zone of the direction orthogonal with the conveyance direction of the substrate P on substrate-placing platform ST as length direction.That is, the illumination light L (linear light) that the direction almost parallel with the rotary middle spindle AX1 with swing roller 14 is the shape of slit on long limit by lighting device IU irradiates in mask pattern M.
Injection direction setting from the illumination light L of lighting device IU is the radial direction of such as swing roller 14.In this case, illumination light L is irradiated the mask pattern M along outer peripheral face in swing roller 14 from the roughly normal direction of mask pattern M by lighting device IU.The illumination light L being such as regarded as almost parallel light irradiates in mask pattern M by lighting device IU.
In exposure device EX, the light path between swing roller 14 (mask pattern M) and substrate-placing platform ST (substrate P) is provided with diaphragm parts 18.Diaphragm parts 18 are so-called field stops, by regulation from lighting device IU penetrate and via the light after mask pattern M by scope, that carrys out the light in regulation substrate P injects scope.
As shown in Figure 3, aligming microscope AM is located at side (+Y side) and the opposite side (-Y side) of rotary middle spindle AX1 in the below of such as substrate-placing platform ST.On swing roller 14 (mask pattern M) and substrate-placing platform ST (substrate P), be provided with alignment mark in such as+Y side and-Y side.Aligming microscope AM detects the position of the X-direction of substrate P, the position of Y direction, at least one in the position of rotation of Z axis by detecting these alignment marks.
Illumination monitoring device 11 is configured in the below of such as substrate-placing platform ST, injects to make the illumination light L penetrated from lighting device IU.Illumination monitoring device 11 can measure the Illumination Distribution in the IR of field of illumination.Illumination monitoring device 11 direction that such as an edge is parallel with rotary middle spindle AX1 is moved, the illumination in a part of region of measurement field of illumination IR, the Illumination Distribution on the direction that measurement is parallel with rotary middle spindle AX1 thus.
Lighting device IU has multiple lighting module 20, by making the field of illumination of each lighting module 20 dock along the prescribed direction (Y direction) orthogonal with the conveyance direction of substrate P, and throws light on to the field of illumination IR being long limit with prescribed direction.In the following description, suitably the field of illumination of each lighting module 20 is called local lighting region IRa.
Multiple lighting module 20 is configured to arrange along prescribed direction (Y direction) when the conveyance direction (X-direction) of substrate P is observed.Lighting module 20 closely configures in the prescribed direction in the mode that the end of its local lighting region IRa is overlapping with the end of the local lighting region IRa of another lighting module 20.
As shown in Figure 2, lighting module 20 has the light source portion 21 of injection illumination light L and makes the deflector 22 of the illumination light L deflection penetrated from light source portion 21.Multiple light source portion 21 (with reference to Fig. 3) with make the luminous point (local lighting region IRa) of the illumination light L penetrated from deflector 22 in the prescribed direction continuous print mode arrange.
Multiple light source portion 21 is to make the mode of the part overlap of local lighting region IRa upper close to each other in prescribed direction (Y direction).Therefore, as shown in Figure 2, multiple light source portion 21, to make the mode not interfering (physics conflicts) at least partially with other light sources portion 21 of light source portion 21, makes the position in the conveyance direction (Y direction) of substrate P stagger and configure.Such as, the 2nd light source portion 21b that the 2nd lighting module 20b that the 1st light source portion 21a that 1st lighting module 20a has is configured at the 1st lighting module 20a side when observing relative to the conveyance direction from substrate P has, staggers in the position in the conveyance direction of substrate P.
In order to the position of multiple light source portion 21 can be made to stagger in the conveyance direction (direction of scanning of the substrate P realized based on illumination light L) of substrate P and local lighting region IRa can be made to connect, be multiple directions intersected with each other when observing from prescribed direction by the injection direction setting of the illumination light L from multiple light source portion 21.At this, for convenience of explanation, the injection direction of the illumination light L from multiple light source portion 21 is set to both direction, light source portion 21 towards the 1st direction injection illumination light L in this both direction is set to the 1st light source portion 21a, the light source portion 21 towards the 2nd direction injection illumination light L in this both direction is set to the 2nd light source portion 21b.
At this, the 1st light source portion 21a and the 2nd light source portion 21b configures symmetrically relative to YZ face.In the arrangement of the lighting module 20 (with reference to Fig. 3) observed from the conveyance direction of substrate P, from one end towards the light source portion 21 of the lighting module 20 being odd number that puts in order of the other end, when observing from prescribed direction, be configured in the position of the 1st light source portion 21a such as shown in Fig. 2.In addition, the light source portion 21 of its lighting module 20 being even number that puts in order, when observing from prescribed direction, is configured in the position of the 2nd light source portion 21b such as shown in Fig. 2.
It puts in order is that the lighting module 20 of even number is configured to such as to make the chief ray from the illumination light L (light beam) of light source portion 21 to have the angle of+θ relative to the normal direction of substrate P.In addition, it puts in order is that the lighting module 20 of odd number is configured to such as to make the chief ray from the illumination light L of light source portion 21 to have the angle of-θ relative to the normal direction of substrate P.
The 1st light source portion 21a like this and the 2nd light source portion 21b, to make illumination light L be injected into the mode in roughly the same region when prescribed direction is observed, is set to that the injection direction of illumination light L intersects mutually.Such as, the 1st light source portion 21a is arranged to be arranged to relative to YZ face from+X side towards-X side injection illumination light L from-X side towards+X side injection illumination light L, the 2nd light source portion 21b relative to YZ face.
Deflector 22 is to make, from the direct of travel of the illumination light L of the 1st light source portion 21a injection mode consistent with the direct of travel of the illumination light L from the 2nd light source portion 21b injection, to make illumination light L deflect.When observing from prescribed direction (Y direction), deflector 22 is configured in near the direct of travel of the illumination light L of the 1st light source portion 21a and the point of crossing from the direct of travel of the illumination light L of the 2nd light source portion 21b.
Then, illumination apparatus IU (lighting module 20) is described in more detail.The 1st lighting module 20a shown in Fig. 2 and the 2nd lighting module 20b has identical structure, configures symmetrically relative to YZ face.Therefore, in this as the representative of multiple lighting module 20, the 1st lighting module 20a is described.
Fig. 4 A is the side view that the direction from rotary middle spindle AX1 (Y direction) of the 1st lighting module 20a is observed, and Fig. 4 B is the front view that the conveyance direction from substrate P (X-direction) of the 1st lighting module 20a is observed.
Multiple lighting module 20 has the light source portion 21 of injection illumination light L respectively and makes the deflection component 22a of the illumination light L deflection penetrated from light source portion 21.At this, deflection component 22a is arranged with multiple along prescribed direction (Y direction), and deflector 22 is made up of multiple deflection component 22a.The quartz etc. that deflection component 22a has high-transmission rate by the light relative to ultraviolet region is made.
The shape that it is long limit that light source portion 21 shown in Fig. 4 A and 4B is configured to make the luminous point of illumination light L when injecting to deflection component 22a become with prescribed direction (Y direction).Light source portion 21 has: the light source 23 of injection illumination light L; Make line segment maker (line generator) 24 (optics) that the illumination light L (light beam) penetrated from light source 23 spreads in prescribed direction (Y direction); With the collimating apparatus 25 (parallelization component) of the illumination light L parallelization making to be spread by line segment maker 24.
Light source 23 comprises such as solid light source, quasi-molecule laser source, the lamp source such as laser diode, light emitting diode (LED).The illumination light L sent from light source 23 can be the bright line (g line, h line, i line) of the ultraviolet region of the such as injection such as the extreme ultraviolet light such as KrF excimer laser (wavelength 248nm), ArF excimer laser (wavelength 193nm) (DUV light), mercury vapor lamp.
In addition, light source portion 21 also can be the structure guided to line segment maker 24 via light guide members such as optical fiber by the light from light source 23.In this case, light source 23 can be configured in the outside of swing roller 14, also can be configured in inner side.In addition, light source portion 21 also can be the structure guided to line segment maker 24 after by parallelizations such as collimating apparatuss by the light of the injection end face from optical fiber.
Light beam from light source 23 elongates along a direction (prescribed direction) by line segment maker 24.As shown in Figure 4 B, the spread angle (radiation angle) in prescribed direction (Y direction) becomes large to the illumination light L passed through from line segment maker 24, and as shown in Figure 4 A, spread angle is almost constant in the direction orthogonal to the prescribed direction.
Line segment maker 24 comprises such as No. 4826299th, United States Patent (USP), No. 5283694th, United States Patent (USP) etc. and records such Bao Weier lens.As shown in Figure 4 B, Bao Weier lens by the light beam compartition in the prescribed direction from such as light source 23, and make the light beam after segmentation spread along prescribed direction respectively.In addition, Bao Weier lens, in the overlapped mode of the part making the illumination in the light beam after segmentation relatively low, make the light beam after segmentation deflect respectively.Such as, when making to defer to Gaussian distribution from the Illumination Distribution of the light of light source 23, Bao Weier lens to be split by light beam for border near the peak value of Illumination Distribution, and to make the mode of the light beam overlap be equivalent to bottom Gaussian distribution, make the beam deflection after segmentation.Therefore, become the Illumination Distribution of so-called top-hat type by the illumination light L of Bao Weier lens forming, the Illumination Distribution homogenising in prescribed direction.
Line segment maker 24 can be the structure being made beam spread by such as cylindrical lens.In this case, light source portion 21 can comprise the optics of the Illumination Distribution homogenising for making the illumination light L penetrated from line segment maker 24.In addition, line segment maker 24 can comprise diffraction optical element, also can be the structure being made beam spread by diffraction.In addition, line segment maker 24 can comprise the reflection parts such as convex mirror, also can be the structure being made beam spread by reflection.
Collimating apparatus 25 makes the light beam parallelization of spreading along prescribed direction (Y direction).At this, the light beam penetrated from line segment maker 24 spreads along Y direction as shown in Figure 4 B, and spreads hardly in the face orthogonal with Y direction as shown in Figure 4 A.Therefore, collimating apparatus 25 is the opticses having function (power) and do not have function in the face such as comprising prescribed direction (Y direction) in the face orthogonal with this face, is made up of such as cylindrical lens etc.Collimating apparatus 25 shown in Fig. 4 B is the shape of symmetry relative to the plane of symmetry almost parallel with XZ face.The chief ray of light beam (illumination light L) penetrated from light source portion 21 and the plane of symmetry are propagated substantially in parallel.
Like this, the illumination light L penetrated from light source 23 is passing through line segment maker 24 after prescribed direction diffusion, and by collimating apparatus 25, by parallelization, thus, luminous point when injecting to deflection component 22a becomes with the band shape of prescribed direction for long limit.
Deflection component 22a shown in Fig. 4 A and 4B plays function as optical prism, has the interface 26a of the inclination injected from light source portion 21 for illumination light L.Deflection component 22a makes to deflect from the illumination light L of light source portion 21 by the refraction on the 26a of this interface.Incide the illumination light L on the 26a of interface to be penetrated from deflection component 22a by (transmission) from the inside of deflection component 22a, and incide field of illumination IR (mask pattern M).Deflection component 22a is such as to make illumination light L to the mode of the field of illumination IR incidence mask pattern M, make illumination light L deflect from roughly normal direction.At this, direct of travel when direct of travel (with reference to Fig. 2 and Fig. 3) when illumination light L injects to mask pattern M is injected to substrate P (exposure area) with the illumination light L (exposure light) penetrated from mask pattern M is roughly the same, almost parallel with Z-direction.
In the lighting module 20 shown in Fig. 4 A, light source portion 21 rolls tiltedly from Z-direction (normal direction of substrate P) to-X, in order to make the illumination light L from such light source portion 21 advance along the direction almost parallel with Z-direction, the interface 26a of deflection component 22a is set to that its normal direction rolls from Z-direction to+X tiltedly.
Deflection component 22a is arranged to, as shown in Figure 4 A, make direct of travel warpage in the XZ face orthogonal with prescribed direction (Y direction) of the illumination light L penetrated from light source portion 21, and make the direct of travel of illumination light L almost constant in prescribed direction (Y direction) as shown in Figure 4 B.
Fig. 5 is the stereographic map representing deflector 22.Deflector 22 shown in Fig. 5 is structures that deflection component 22a is arranged along prescribed direction (Y direction).In deflector 22, multiple deflection component 22a is integrated by such as mutually boning.
In the 1st light source portion 21a with the 2nd light source portion 21b, the injection direction of illumination light L is different, thus, the posture of the light source portion 21 of the light that the interface (interface 26a and interface 26b, the 1st and the 2nd face) injected for illumination light L in deflector 22 is injected to each interface 26a, 26b according to injection, and tilt to different directions.
Specifically, deflector 22 has the interface 26a injected from the 1st light source portion 21a for illumination light L and the interface 26b injected from the 2nd light source portion 21b for illumination light L.At this, in each lighting module 20 (with reference to Fig. 4 A and 4B), deflection component 22a and light source portion 21 are arranged correspondingly, and interface 26a is the interface of the deflection component 22a corresponding with the 1st light source portion 21a, and interface 26b is the interface of the deflection component 22a corresponding with the 2nd light source portion 21b.The normal direction of interface 26a rolls oblique direction from Z-direction (normal direction of substrate P) to+X, and the normal direction of interface 26b rolls oblique direction from Z-direction (normal direction of substrate P) to-X.
Deflector 22 shown in Fig. 5 has the interface 26c that illumination light L is penetrated towards mask pattern M.Interface 26c is such as configured in roughly same plane (roughly concordant) in multiple deflection component 22a, generally perpendicularly configures relative to the normal direction of substrate P.Like this, deflector 22 is configured to such as to make illumination light L deflect on the 26c of interface, but illumination light L also can be made at interface 26c upper deflecting.
Fig. 6 is the vertical view representing deflector 22.As shown in Figure 6, interface 26a and interface 26b is respectively trapezoidal shape, is adjacent to configuration along prescribed direction (Y direction).Interface 26a and interface 26b is roughly the same shape, but to be configured to relative to YZ face be the relation of reversing each other.That is, be configured to the minor face of the long limit of interface 26a and interface 26b side by side, similarly, be configured to the minor face of the long limit of interface 26b and interface 26a side by side.
Like this, deflector 22 is configured to, when the injection direction (Z-direction) of the always illumination light L of self-bias transfer part 22 is observed, the border 27 (trapezoidal hypotenuse) of interface 26a and interface 26b non-vertically intersects with prescribed direction (Y direction).In other words, the part 27a of deflection component 22a adjacent with border 27 in the 26a of interface and the part 27b of deflection component 22a adjacent with border 27 in the 26b of interface is overlapping when observing from X-direction, and the position of part 27a in prescribed direction (Y direction) is roughly the same with part 27b.That is, across border 27, part 27a, the part 27b of deflection component 22a adjacent one another are become identical drift angle in XY face.
Therefore, from the illumination light L that the 1st light source portion 21a incides the illumination light L the part 27a of interface 26a and incides from the 2nd light source portion 21b the part 27b of interface 26b, the region incidence that the position to the Y direction in the IR of field of illumination is roughly the same.That is, this region becomes the region (being called repeat region) that the local lighting region IRa (with reference to Fig. 3) thrown light on based on the illumination light L via interface 26a and the local lighting region IRa thrown light on based on the illumination light L via interface 26b repeats.This repeat region by the part by the illumination light L from the 1st light source portion 21a and the optical illumination that mixes from a part of the illumination light L of the 2nd light source portion 21b, the mixing ratio of its light quantity according to border 27 relative to the inclination of prescribed direction and consecutive variations.Its result is, even if the brightness of illumination light L is different in the 1st light source portion 21a with the 2nd light source portion 21b, also can suppress the situation that the Illumination Distribution that field of illumination IR occurs changes in the prescribed direction discontinuously.
In addition, lighting device IU is by arranging multiple by lighting module 20 along the prescribed direction (Y direction) substantially vertical with the direction of scanning (X-direction) of substrate P, and the exposed width of the pattern transferring in the prescribed direction vertical with direction of scanning can be increased, but the unevenness of the Illumination Distribution in the prescribed direction vertical with direction of scanning may be produced.Therefore, the lighting device IU shown in Fig. 2 (Fig. 3) is configured to, and by the optical filter 28 for adjusting the Illumination Distribution realized based on the illumination light L penetrated from deflector 22, guarantees the homogeneity of the Illumination Distribution in prescribed direction.
To be the figure of the example representing Illumination Distribution in the prescribed direction in the IR of field of illumination and optical filter 28, Fig. 8 be Fig. 7 represents the figure of other examples of Illumination Distribution in the prescribed direction in the IR of field of illumination and optical filter 28.The vertical view (figure top) observed from the injection direction of illumination light L of deflector 22 is associatedly shown in Fig. 7 and Fig. 8 respectively, represents the curve map (figure bottom) of the curve map (figure middle part) of simulating the result obtained from the Illumination Distribution of the illumination light L of deflector 22 injection the structure that optical filter 28 is not set and the transmissivity representing optical filter 28.Emphasize the change of illumination and the Illumination Distribution of illumination light L is schematically shown.
In Fig. 7 and Fig. 8, transverse axis represents the position of prescribed direction (Y direction).In addition, Reference numeral 30a represents the Illumination Distribution of illumination light L on the IR of field of illumination from the 1st light source portion 21a, Reference numeral 30b represents the Illumination Distribution of illumination light L on the IR of field of illumination from the 2nd light source portion 21b, Reference numeral 30c represents the illumination light L from the 1st light source portion 21a and the Illumination Distribution of illumination light L on the IR of field of illumination from the 2nd light source portion 21b, and Reference numeral 30d represents the transmissivity distribution of the optical filter 28 on the direction corresponding with prescribed direction.
In the example shown in Fig. 7, based on the illumination light L of each light source portion 21 and the Illumination Distribution (Illumination Distribution 30a and Illumination Distribution 30b) realized is respectively the distribution of so-called top-hat type.The end that multiple light source portion 21 is configured to local lighting region IRa is overlapping with the end of adjacent local lighting region IRa, and local lighting region IRa has the non-duplicate region IRc that the end of adjacent local lighting region IRa overlapped repeat region IRb and adjacent local lighting region Ira does not overlap each other.
In the IRc of non-duplicate region, Illumination Distribution 30c is roughly the same with the Illumination Distribution 30a realized based on the illumination light L from the 1st light source portion 21a or the 2nd light source portion 21b or Illumination Distribution 30b, roughly even in this illumination.
In addition, in repeat region IRb, Illumination Distribution 30c distributes in the mode be added by Illumination Distribution 30a and Illumination Distribution 30b.The illumination of the Illumination Distribution 30c in spacing Py (distance between centers) the larger then repeat region IRb in the prescribed direction (Y direction) of local lighting region IRa is lower, and the illumination of the Illumination Distribution 30c in the narrower then repeat region IRb of this spacing Py is higher.Spacing Py in the prescribed direction (Y direction) of local lighting region IRa can be adjusted by the spacing in the prescribed direction of such as light source portion 21, and the spacing Py in the prescribed direction of the narrower then local lighting region IRa of the spacing in the prescribed direction of light source portion 21 is also narrower.
Like this, the illumination of the Illumination Distribution 30c in repeat region IRb can be adjusted to the degree identical with the illumination of the Illumination Distribution 30c in the IRc of non-duplicate region by the spacing Py of adjustment local lighting region IRa, but can produce the difference of such as a few % degree relative to the illumination in the IRc of non-duplicate region.Such as, in the example shown in Fig. 7, illumination minimizing compared with the IRc of non-duplicate region in the docking section (repeat region IRb) of lighting module 20, in the example shown in Fig. 8, illumination is increase compared with the IRc of non-duplicate region in repeat region IRb.
The unevenness (deviation) of such illumination being in the situation in such as corresponding to the purposes of lighting device IU allowed band etc. and can not revising, but is revised for the viewpoint improving exposure accuracy etc. at this.
As the optical filter 28 of the Illumination Distribution homogenising made in prescribed direction as described above, as long as the transmissivity in the light path of the light injected in the region relatively high to the illumination in the IR of field of illumination sets relatively low, transmissivity in the light path of light injected in the region relatively low to the illumination in the IR of field of illumination sets relatively high.
Such as, in the example shown in Fig. 7, because the illumination of the repeat region IRb in the IRa of local lighting region is lower than the illumination of non-duplicate region IRc, so the transmissivity distribution 30d of optical filter 28 is set as, the transmissivity in the light path that the transmissivity in the light path that the light injected to repeat region IRb passes through is passed through than the light injected to non-duplicate region IRc is high.
In addition, in the example shown in Fig. 8, because the illumination of the repeat region IRb in the IRa of local lighting region is higher than the illumination of non-duplicate region IRc, so the transmissivity distribution 30d of optical filter 28 is set as, the transmissivity in the light path that the transmissivity in the light path that the light injected to repeat region IRb passes through is passed through than the light injected to non-duplicate region IRc is low.
In addition, as the producing cause of the unevenness of Illumination Distribution, the deviation (the 3rd reason) etc. of the illumination in the deviation (the 1st reason) of the light quantity of such as each lighting module 20 (light source portion 21), the deviation (the 2nd reason) of light quantity at the docking section place of lighting module 20 (deflector 22), each lighting module 20 can be enumerated.In order to alleviate or eliminate the unevenness of Illumination Distribution, can process by the kind of these reasons.In addition, as the method making Illumination Distribution homogenising, except using optical filter 28, also there is the method for the shape of adjustment component, configuration etc.Below, about the disposal route of the unevenness to Illumination Distribution, be described by the producing cause of the unevenness of Illumination Distribution.
1st reason comprises manufacturing tolerance of the inscape (such as light source 23) due to lighting module 20 etc. and causes the illumination penetrating illumination light L from each light source portion 21 multiple light source portion 21, produce the essential factor of deviation etc.Lighting device IU shown in Fig. 2 and Fig. 3, has as optical filter 28 the light quantity correction optical filter 28a be configured between light source 23 and line segment maker 24, is reduced the deviation of the illumination light L of each light source 23 by light quantity correction optical filter 28a.
The part place that light quantity correction optical filter 28a such as injects at the illumination light L from the relatively high light source 23 of the output relative with regulation electric power in multiple light source 23 makes transmissivity relatively low, and the part injected at the illumination light L from the relatively low light source 23 of the output relative with regulation electric power in multiple light source 23 makes transmissivity relatively high.
In addition, the deviation of the light quantity of the illumination light L of each light source 23 also can be reduced by the driving method of light source 23.Such as, also in multiple light source 23, to make the mode that the light quantity of illumination light L is consistent, the electric power to exporting relatively high light source 23 supply can being made relatively low, making the electric power to exporting relatively low light source 23 supply relatively high.Such driving method can realize by arranging electric filter on driving circuit etc., also can be realized by the program for driving light source 23 etc.
The unevenness of the Illumination Distribution produced by the 2nd reason can be alleviated by the spacing Py (spacing of lighting module 20) of the prism shape of adjustment deflection component 22a, adjustment local lighting region IRa, the width (size in the prescribed direction of luminous point) etc. that increases the illumination light L spread by line segment maker 24 or be eliminated.But the inclination of the end of local lighting region IRa is from linear situation about departing from etc. in Illumination Distribution 30b, the Illumination Distribution 30c of each light source portion 21, the residual of the unevenness of Illumination Distribution may be had.Lighting device IU shown in Fig. 2 and Fig. 3 have be configured in light source portion 21 and swing roller 14 barrel surface 14a (mask pattern M) between docking section revise optical filter 28b, revise optical filter 28b by docking section and revise in the mode of the illumination difference reducing non-duplicate region IRc and repeat region IRb.
The 3rd reason aberration comprised in such as lighting module 20 remains, cause the deviation of Illumination Distribution along prescribed direction expansion etc. owing to being made illumination light L spread by line segment maker 24.The size of the latter in the prescribed direction such as maintaining field of illumination IR under reducing situation of the quantity of lighting module 20 etc., the width of the illumination light L spread by line segment maker 24 more greatly and more easily produces.In other words, the unevenness of the Illumination Distribution produced by the 3rd reason can by increase in lighting module 20 optics reducing aberration, increase the width etc. of the illumination light L that the quantity etc. of lighting module 20 is spread by line segment maker 24 with reduction and alleviate or eliminate.
Lighting device IU shown in Fig. 2 and Fig. 3 have be configured in light source portion 21 and swing roller 14 barrel surface 14a (mask pattern M) between Illumination Distribution correction optical filter 28c, made the Illumination Distribution homogenising in each lighting module 20 by Illumination Distribution correction optical filter 28c.Illumination Distribution correction optical filter 28c is such as arranged by each lighting module 20.When using such Illumination Distribution correction optical filter 28c, such as, can improve the homogeneity of Illumination Distribution while the quantity maintaining lighting module 20, also can maintain the homogeneity of Illumination Distribution in addition while the quantity reducing lighting module 20.
The transmissivity of various optical filter as described above can be fixing also can be variable.The optical filter of transmission-variable can by such as arranging transmissivity in a scanning direction along the optical filter that direction of scanning (X-direction) changes and realizing in advance movably.Lighting device IU such as can adjust the Illumination Distribution of field of illumination IR by making the optical filter of transmission-variable move.Such as, lighting device IU based on the Illumination Distribution measured to by the illumination monitoring device 11 shown in Fig. 2 and Fig. 3, can carry out inching to make Illumination Distribution homogenising.In addition, such Illumination Distribution adjustment also can the time dependent situation of characteristic of such as lighting module 20, change (such as the light source portion 21) at least partially of lighting module 20 situation etc. under carry out.
The lighting device IU of present embodiment as described above passes through by multiple lighting module 20 along prescribed direction arrangement and by the local lighting region IRa of lighting module 20 along prescribed direction continuous arrangement, and can be by the dimension enlargement in the prescribed direction of field of illumination IR the value expected.Therefore, treating apparatus U3 (exposure device EX) can expand the width on the direction vertical with direction of scanning of pattern transferring, such as, can process large stretch of substrate efficiently.Its result is, device inspection apparatus can manufacture the devices such as large-scale flat-panel monitor efficiently, and large stretch of layout substrate can be used to manufacture device efficiently.
In addition, the multiple light source portion 21 staggered in position on direction of scanning by lighting device IU configure in the mode making the injection direction of illumination light L when observing from prescribed direction and intersect, and to make the mode from the direct of travel of the illumination light L of multiple light source portion 21 is consistent, illumination light L are deflected by deflector 22.Therefore, the configuration degree of freedom of multiple light source portion 21 improves, such as, can avoid the interference (conflict) of multiple light source portion 21.
In addition, light source portion 21 penetrates in deflector 22 with the illumination light L of prescribed direction for the luminous point of the shape on long limit, therefore, while the quantity maintaining lighting module 20, field of illumination IR can be expanded along prescribed direction, the quantity of lighting module 20 can be reduced while the size maintaining field of illumination IR.
In addition, lighting device IU also can be following structure: by carrying out illumination light L (light beam) to make the spread angle of illumination light L upper different with the prescribed direction vertical from direction of scanning (Y direction) in the direction of scanning (X-direction) of substrate P to the distortion that a direction is elongated.In the structure shown here, when the live width of the pattern be transferred on mask pattern M is consistent, the live width of the pattern be transferred in substrate P is different on direction of scanning and prescribed direction.Consistent for the live width of the pattern making to be transferred in substrate P, such as, as long as consider that the live width on the mask pattern M corresponding to the anisotropy of the spread angle of illumination light L carrys out designed mask pattern M.In addition, lighting device IU also can be configured to make the spread angle of illumination light L be above isotropy in the direction of scanning (X-direction) of substrate P and prescribed direction (Y direction).
In addition, illumination monitoring device 11 can be set to a part of lighting device IU, also one or both of illumination monitoring device 11 and aligming microscope AM can be configured in the inner side of swing roller 14.In addition, the outside being configured in swing roller 14 at least partially of the lamp optical system be made up of multiple lighting module 20 can also be made.
[the 2nd embodiment]
Then, the 2nd embodiment is described.In the present embodiment, sometimes identical Reference numeral marked to the structure identical with above-mentioned embodiment and to simplify or the description thereof will be omitted.
Fig. 9 is the side view of the treating apparatus U3 (exposure device EX) representing present embodiment, and Figure 10 is the stereographic map representing lighting device IU, and Figure 11 is the vertical view representing lighting device.The structure of the substrate supporting parts (swing roller 35) of the supporting substrates P of the exposure device EX shown in Fig. 9 is different from the 1st embodiment with the structure of lighting device IU.
Exposure device EX shown in Fig. 9 replaces the substrate-placing platform ST shown in Fig. 2 and has swing roller 35, and by swing roller 35 supporting substrates P.Swing roller 35 is arranged to rotate around rotary middle spindle AX2.The rotary middle spindle AX2 of swing roller 35 is set to the rotary middle spindle AX1 of swing roller 14 almost parallel.Swing roller 35 is driven in rotation by omitting illustrated drive division, and supporting substrates P and rotating, transport substrate P thus.
Lighting device IU has multiple lighting modules 20 such shown in Figure 10 etc., but representatively a lighting module 20 is shown in Fig. 9.The field of illumination IR of lighting device IU be set in swing roller 14 with the immediate part of swing roller 35 near.
Exposure device EX, by such as control device 12 as shown in Figure 2, makes swing roller 14 and swing roller 35 synchronously rotate, while throw light on to the mask pattern M be held on swing roller 14 with the illumination light L from lighting device IU.Thus, the illumination light L be injected on mask pattern M becomes the light (exposure light) corresponding to the pattern be transferred, and this exposure light scans the substrate P transported by swing roller 35.Exposure light to the region (exposure area PR) of substrate P incidence be set in swing roller 35 with the immediate part of swing roller 14 near.The direction that exposure light scans substrate P is substantially vertical with the rotary middle spindle AX2 (Y direction) of swing roller 35, is the direction (X-direction) almost parallel with the tangent plane of exposure area PR.
Then, illumination apparatus IU is described in more detail.Lighting device IU shown in Figure 10 and Figure 11 is the structure that multiple lighting module 20 is arranged along prescribed direction (Y direction).Multiple lighting module 20 is identical structure, but is configured to the order by arranging along Y direction, and alternately reverses relative to the posture in YZ face.
The deflection component 22a that lighting module 20 shown in Fig. 9 has the 1st light source portion 21a and arranges correspondingly with light source portion 21.Light source portion 21 has the light source 23 of injection illumination light L, the optics rod unit 36 supplying the illumination light L from light source 23 to inject and the relay lens 37 supplying the illumination light L passed through from optics rod unit 36 to inject and relay lens 38.
Light source portion 21 is from the direction injection illumination light L that the normal direction (Z-direction) relative to field of illumination IR tilts.Such as, as shown in Figure 10, the 1st light source portion 21a of the 1st lighting module 20a rolls oblique direction injection illumination light L from the normal direction (Z-direction) from field of illumination IR to-X.In addition, when the direction of scanning (X-direction) of exposure light is observed, be configured at the 2nd light source portion 21b of the 2nd lighting module 20b (with reference to Figure 11) on the 1st lighting module 20a side, roll oblique direction injection illumination light L from the normal direction from field of illumination IR to+X.
Like this, the 1st lighting module 20a and the 2nd lighting module 20b is configured to the injection direction intersection of the light from light source portion 21 when observing from prescribed direction.Thus, the light source portion 21 of the 1st lighting module 20a is configured to mutually non-interference with the light source portion 21 of the 2nd lighting module 20b.
Such as, as shown in figure 11, the maximum parts of size in prescribed direction in light source portion 21 are relay lens 38, multiple light source portion 21 is configured to, stagger in the position of the relay lens 38 of light source portion 21 adjacent during by making to observe from X-direction, relay lens 38 can not interfere with the relay lens 38 in other light sources portion 21 in prescribed direction (Y direction).
Then, lighting module 20 is described in more detail.Figure 12 is the vertical view representing light source 23, and Figure 13 A and 13B is the figure representing optics rod unit 36, Figure 14 is the vertical view representing relay lens 38, and Figure 15 is the side view representing deflection component 22a, and Figure 16 is the vertical view representing diaphragm parts 42.Figure 13 A shows the figure observed from Z-direction, and Figure 13 B shows the figure observed from Y direction.
The light guide member 41 that light source 23 shown in Figure 12 has multiple solid light source 40 and is arranged on each solid light source 40.Solid light source 40 is such as laser diode.Light guide member 41 is such as optical fiber, is guided by the illumination light L from solid light source 40 to optics rod unit 36 (with reference to Figure 11).Multiple light guide member 41 boundling fasciculation, and there is an injection end face 41a.The spread angle of the illumination light L passed through from optical fiber by optical fiber diameter ( ) determine, be the light isotropically spread.
Optics rod unit 36 shown in Figure 13 A and 13B is formed by such as quartz glass etc., has: that injects for the illumination light L from light source 23 injects end face 36a; Make to be injected into the inner face 36b of the illumination light L reflection injected on end face 36a; With the injection end face 36c of the illumination light L injection making to reflect on inner face 36b.In light source 23, on the injection end face 41a of multiple light guide member 41, be formed with light source picture by each light guide member 41, the Illumination Distribution of illumination light L becomes uneven on injection end face 41a.Such illumination light L makes the diffusibleness equalization in spread angle by repeated reflection on the inner face 36b of optics rod unit 36, thus the Illumination Distribution homogenising on injection end face 36c.Illumination light L when penetrating from optics rod unit 36 is compared with before injecting to optics rod unit 36, and spread angle is almost constant, is the light isotropically spread.
Like this, because on the injection end face 36c of optics rod unit 36, Illumination Distribution becomes even, so the injection end face 36c that lighting module 20 is configured to field of illumination IR and optics rod unit 36 becomes conjugation.Therefore, the injection end face 36c of optics rod unit 36 is set to such as identical with local lighting region IRa shape.At this, injection end face 36c is set to that the size in the Y direction corresponding with prescribed direction is greater than the size in the Z-direction corresponding with direction of scanning.That is, light source portion 21 is configured to local lighting region IRa length compared with direction of scanning in the prescribed direction.
In Figure 13 A and 13B, on the position that the illumination light L of the injection end face 36c from optics rod unit 36 injects, be provided with diaphragm parts 42.Diaphragm parts 42 are so-called field stops, for specifying the shape of local lighting region IRa.Diaphragm parts 42 have the opening 42a passed through for illumination light L.Flat shape about opening 42a will be described later.
The relay optical system comprising the relay lens 37 shown in Fig. 9 and relay lens 38 forms the picture of the injection end face 36c of optics rod unit 36.The position in the face that the picture that field of illumination IR is set in the injection end face 36c of optics rod unit 36 is formed or its near.The relay optical system comprising relay lens 37 and relay lens 38 sets multiplying power in the mode of the spread angle such as adjusting illumination light L when penetrating from light source portion 21.Such as, the spread angle of illumination light L when injecting to mask pattern M sets according to live width of pattern etc., sets the multiplying power of the relay optical system comprising relay lens 37 and relay lens 38 in the mode becoming such spread angle.
Relay lens 38 (with reference to Figure 14), when from the direction top view of its optical axis, is formed as the shape that prescribed direction (Y direction) is longer than the direction orthogonal with prescribed direction.Relay lens 38 is configured to such as suitably omit the shape of the part 38b not having illumination light L to pass through, namely corresponding to local lighting region IRa shape from around its optical axis rotational symmetric lens shape 38a.Thereby, it is possible to avoid the interference between relay lens 38 and other textural elements.
As shown in FIG. 9 and 10, diaphragm parts 43 are being configured with from the light path of relay lens 37 to relay lens 38.Diaphragm parts 43 are so-called opening diaphragm (σ diaphragms), the spread angle (so-called numerical aperture NA) of restriction illumination light L.Diaphragm parts 43 have the opening passed through for illumination light L, set the diameter of opening in the mode making the spread angle of the illumination light L passed through from relay lens 37 and relay lens 38 become setting.
In addition, catoptron 44 is being configured with from the light path of relay lens 37 to relay lens 38.Catoptron 44 is so-called warpage catoptrons, makes the illumination light L deflection penetrated from relay lens 37.As shown in Figure 10, advancing from the direction almost parallel with X-direction, illumination light L edge that light source 23 penetrates and reflect at mirror 44, advancing to rolling oblique direction than Z-direction to-X side or+X.Thereby, it is possible to make light source portion 21 reduce, thus such as easy inner side light source portion 21 being configured in swing roller 14.
From the illumination light L that multiple light source portion 21 as described above penetrates, as shown in Figure 10, inject to deflector 22, deflected by deflector 22, make direct of travel consistent thus.Deflector 22 comprises the multiple deflection component 22a along prescribed direction arrangement.Multiple deflection component 22a is identical shape, but is configured to alternately reverse (with reference to Figure 10 and Figure 11) relative to the posture in YZ face by the order arranged along Y direction.
Deflection component 22a (with reference to Figure 15) has the interface 26a injected for illumination light L and the interface 26c that illumination light L is penetrated.At this, interface 26a and interface 26c tilts relative to the normal direction (Z-direction) of field of illumination IR respectively.That is, deflection component 22a makes illumination light L deflect by making illumination light L reflect on interface 26a and interface 26c respectively.
As shown in Figure 10, the illumination light L penetrated from deflection component 22a (lighting module 20) injects to local lighting region IRa, multiple local lighting region IRa connects along prescribed direction, and thus, lighting device IU throws light on to the field of illumination IR being long limit with prescribed direction.
In addition, illustrated by with reference to Fig. 7 and Fig. 8, there is uneven situation in the Illumination Distribution in the prescribed direction of field of illumination IR.At this, deflector 22 (with reference to Figure 11) is arranged to the border 27 along a pair adjacent deflection component 22a of prescribed direction is intersected obliquely relative to prescribed direction.Thereby, it is possible to alleviate or eliminate the unevenness of the Illumination Distribution in the prescribed direction in the IR of field of illumination.
In addition, the unevenness of such Illumination Distribution also can be alleviated by the shape adjusting the opening that pass through for illumination light L in the diaphragm parts 42 shown in Figure 13 A and 13B or be eliminated.In the example shown in Fig. 7, because the illumination of repeat region IRb is lower than the illumination of non-duplicate region IRc, so the unevenness in order to reduce such illumination, such as, the light quantity increasing the illumination light L injected to repeat region IRb or the light quantity etc. reducing the illumination light L injected to non-duplicate region IRc are effective.In order to realize such light quantity adjustment, diaphragm parts 42 (with reference to Figure 13 A and 13B) are set with the shape of the opening 42a passed through for illumination light L.
The opening 42a of the diaphragm parts 42 shown in Figure 16 has: feed to the part 1 42b that light that the repeat region IRb in local lighting region IRa (with reference to Fig. 7) injects passes through; The part 2 42c that the light injected with the non-duplicate region IRc fed in the IRa of local lighting region passes through.Because the position of repeat region IRb and non-duplicate region IRc is upper different in prescribed direction (Y direction), so part 1 42b and part 2 42c is configured in diverse location on the direction (Y direction) corresponding with prescribed direction.Part 1 42b and part 2 42c by making the size in the direction (Z-direction) on the diaphragm parts 42 corresponding from the direction perpendicular to prescribed direction different in the IR of field of illumination, and make the light quantity of the illumination light L passed through from the region of the unit length of respective Y direction different.
Diaphragm parts 42 shown in Figure 16 suppose the Illumination Distribution that illumination is relatively low in repeat region IRb as shown in Figure 7.In the Z-direction orthogonal with Y direction, when the inside dimension of part 1 42b being set to h1, when the inside dimension of part 2 42c is set to h2, the inside dimension h1 of part 1 is greater than the inside dimension h2 of part 2.Therefore, the light amount ratio part 2 42c of the illumination light L that the region of the unit length from Y direction of part 1 42b is passed through is many, and its result is, the Illumination Distribution homogenising in the prescribed direction in the IR of field of illumination.Such as, the illumination of repeat region IRb reduces by 5% relative to the illumination of non-duplicate region IRc.In this case, the inside dimension h1 of part 1 42b is such as set as 102.5% relative to the inside dimension h2 of part 2.
At this, the inside dimension that the opening 42a of diaphragm parts 42 is formed as in X-direction changes continuously between part 1 42b and part 2 42c.Therefore, illumination discontinuous change in repeat region IRb and non-duplicate region IRc is suppressed.
Then, an example of each key element of lighting device IU is described.
Light source 23 shown in Figure 12 can use 20 laser diodes penetrating the laser of the ultraviolet region that wavelength is 403nm as multiple solid light source 40.In addition, as light guide member 41, can use for the optical fiber of 0.125mm, it can be made to become with 20 boundlings for the bundle of 0.65mm.In this case, the spread angle of illumination light L when penetrating from light guide member 41 is 0.2 NA converts.
Optics rod unit 36 shown in Figure 13 A and 13B, such as, X-direction is of a size of 100mm, and Y direction is of a size of 10mm, and Z-direction is of a size of 1.4mm.Roughly the same with the spread angle of the illumination light L penetrated from light guide member 41 from the spread angle of the illumination light L of optics rod unit 36 injection, be 0.2 under NA converts.
About the diaphragm parts 42 shown in Figure 16, such as, the injection end face 36c identical (1.4mm) of the outside dimension in Z-direction and optics rod unit 36.About the size of the opening 42a of diaphragm parts 42, such as, Y direction is of a size of 10mm, and the inside dimension h1 of part 1 is 1mm, and the inside dimension h2 of part 2 is 1.025mm.
At this, when injecting to mask pattern M, the spread angle of illumination light L is set as 0.04 under NA converts.The spread angle of illumination light L penetrated from optics rod unit 36 is 0.2, and the picture of the injection end face 36c of optics rod unit 36 is amplified 5 times and be projected on field of illumination IR by relay lens 37 and relay lens 38.Therefore, the spread angle of illumination light L when injecting to field of illumination IR being converted into NA and the value obtained, for the spread angle of the illumination light L penetrated from optics rod unit 36 being converted into NA and 1/5 times of the value (0.2) obtained, being 0.04.The focal length (f1) of relay lens 37 is set as such as 20mm, and the focal length (f2) of relay lens 38 is set as such as 100mm.In addition, the opening of diaphragm parts 43 diameter ( ) be set as 8mm, to make the spread angle of the illumination light L passed through from relay lens 37 and relay lens 38 NA converts for 0.04.
The deflection component 22a quartz etc. that transmissivity is high by the light relative to ultraviolet region shown in Figure 15 is made, and such as, be set to that drift angle δ 1 is 20.51 °, bottom surface corner δ 2 is 80 °, and bottom surface corner δ 3 is 79.49 °.At this, the optical axis of relay lens 38 and Z-direction angulation θ are such as 10 °.From the intersection point of the optical axis of relay lens 38 and deflection component 22a to the distance S (with reference to Fig. 9) of field of illumination IR (mask pattern M) be such as 16mm.
In the local lighting region IRa realized based on so each lighting module 20, X-direction is of a size of about 5mm, and Y direction is of a size of about 50mm.Such lighting module 20 is arranged 5 groups by lighting device IU, and the X-direction of field of illumination IR is of a size of about 5mm, and Y direction is of a size of about 250mm.At this, the light quantity power of each laser diode of light source 23 is 0.5W, and the transmissivity of optical fiber is 0.7, and the utilization ratio based on the light of diaphragm parts 42 realization is 1/1.4, is 0.8 from the transmissivity of optics rod unit 36 to deflection component 22a.In this case, the light quantity power of each lighting module 20 is 4W, and when the local lighting region IRa of lighting module 20 is of a size of 5mm × 50mm, illumination is estimated as 1600mW/cm 2.
In addition, the spread angle of illumination light L when injecting to field of illumination IR (mask pattern M) is such as 2.3 ° (NA is 0.04 under converting), produces the dislocation of about 0.6mm in the IR of field of illumination relative to Z axis.This magnitude of misalignment is very little compared with the width (5mm) of the field of illumination IR on direction of scanning, can ignore after carrying out exposure-processed.In addition, when calculating with this condition, the astigmatism on the IR of field of illumination is 0.84mm.Thereby, it is possible to the mode making focus face consistent with the position in the Z-direction relative to the light beam imaging in XZ face, design and manufacture lighting device IU in advance.Due to this astigmatism, the light beam in YZ face has the diffusibleness of about 0.07mm on focal position, if but this degree, then can ignore after carrying out exposure-processed.Each key element of lighting device IU shown here is an example, certainly can suitably change.
The lighting device IU of present embodiment as described above can throw light on to field of illumination IR with the illumination light L isotropically spread, the live width of the pattern be transferred becomes isotropy with the ratio of the live width of the sub-image be transferred, therefore, it is possible to reduce the design cost of such as mask pattern M.
[the 3rd embodiment]
Then, the 3rd embodiment is described.Sometimes identical Reference numeral marked to the structure identical with above-mentioned embodiment in the present embodiment and to simplify or the description thereof will be omitted.
Figure 17 is the side view of the treating apparatus U3 (exposure device EX) representing present embodiment, and Figure 18 is the vertical view representing exposure device EX.The structure of the deflector 22 of the lighting device IU shown in Figure 17 and Figure 18 is different from the 1st embodiment.Deflector 22 shown in Figure 17 and Figure 18 comprises the multiple catoptrons 45 (deflection component) along Y direction arrangement, by making the illumination light L from light source portion 21 reflect on catoptron 45, illumination light L is deflected.
At this, when the normal direction of field of illumination IR being set to Z-direction, when the injection direction of the illumination light L from light source portion 21 observed from prescribed direction (Y direction) and Z-direction angulation are set to α, catoptron 45 only configures with the angular slope of α/2 relative to Z-direction.In the example shown in Figure 17, α is 90 °, and normal direction and the Z-direction angulation of catoptron 45 are set as 45 °.
It is the reflecting surface of trapezoidal shape that catoptron 45 comprises such as profile.Catoptron 45 shown in Figure 18 is configured to, and the border 46 of a pair catoptron 45 adjacent in the Y-axis direction intersects obliquely relative to the direction of scanning scanned substrate P with illumination light L (X-direction).Thereby, it is possible to make the Illumination Distribution homogenising in the prescribed direction of field of illumination IR.In addition, lighting device IU owing to being the structure of being undertaken reflecting by deflector 22 and making light deflect, so the loss etc. of such as light can be reduced.
[the 4th embodiment]
Then, the 4th embodiment is described.Sometimes identical Reference numeral marked to the structure identical with above-mentioned embodiment in the present embodiment and to simplify or the description thereof will be omitted.
Figure 19 is the side view of the treating apparatus U3 (exposure device EX) representing present embodiment, and Figure 20 is the vertical view representing exposure device EX, and Figure 21 is the light chart representing deflector 22.
The structure of the deflector 22 of the lighting device IU shown in Figure 19 and Figure 20 is different from the 1st embodiment.Deflector 22 shown in Figure 19 is configured to, and the illumination light L from the 1st light source portion 21a is passed through, and the illumination light L from the 2nd light source portion 21b is reflected, and makes the direct of travel of illumination light L consistent thus.At this, the 1st light source portion 21a is configured in the normal direction (Z-direction) of field of illumination IR, and the illumination light L from the 1st light source portion 21a is obstructed, and overshoot portion 22 deflects, but injects from normal direction to field of illumination IR.In addition, the 2nd light source portion 21b is configured to, and when observing from prescribed direction (Y direction), β angled with Z-direction, the illumination light L from the 2nd light source portion 21b is deflected by deflector 22, injects from normal direction to field of illumination IR.In Figure 19, angle beta is set as 90 °, as long as but angle beta absolute value is greater than 0 ° and the angle being less than 180 ° just can set arbitrarily.
Deflector 22 shown in Figure 21 has: the passage 46 passed through for the illumination light L from the 1st light source portion 21a; With the reflecting part 47 making to reflect from the illumination light L of the 2nd light source portion 21b.Passage 46 and reflecting part 47 alternately repeatedly configure along prescribed direction (Y direction).At this, in passage 46, the transmissivity of light roughly evenly (gradient of the transmissivity in Y direction is roughly 0), and in reflecting part 47, light reflectance roughly evenly (in Y direction, the gradient of reflectivity is roughly 0).
Pars intermedia 48 is configured with between passage 46 and reflecting part 47.Pars intermedia 48 is set to, the reflectivity of illumination light L is higher compared with passage 46, and the reflectivity of illumination light L is lower compared with reflecting part 47.At this, the reflectivity of the illumination light L in pars intermedia 48 is set to, uprises continuously or stepsly along with trending towards reflecting part 47 side from passage 46 side.In addition, the transmissivity of the illumination light L in pars intermedia 48 is set to, compared with passage 46 low and compared with reflecting part 47 height.At this, the transmissivity of the illumination light L in pars intermedia 48 is set to, reduces continuously or stepsly along with trending towards reflecting part 47 side from passage 46 side.
Illumination light L from the 1st light source portion 21a injects to passage 46 and two pars intermedias 48 adjacent with this passage 46.In addition, the illumination light L from the 2nd light source portion 21b injects to reflecting part 47 and two pars intermedias 48 adjacent with this reflecting part 47.Therefore, on pars intermedia 48, illumination light L injects from the 1st light source portion 21a and the 2nd light source portion 21b respectively.That is, pars intermedia 48 has the function of being synthesized by the illumination light L from the 1st light source portion 21a and the illumination light L from the 2nd light source portion 21b.
The illumination in region (the repeat region IRb of Fig. 7) that the illumination light L penetrated from pars intermedia 48 in the IR of field of illumination injects, becomes the illumination of a part of the illumination light L from the 1st light source portion 21a and the illumination that is added from the illumination of a part of the illumination light L of the 2nd light source portion 21b.Therefore, it is possible to avoid the illumination of the illumination of the repeat region IRb shown in Fig. 7 and non-duplicate region IRc discontinuous.
Such deflector 22 (light beam combining unit) is such as formed by a prism 49 (with reference to Figure 19) joint that will be length direction with prescribed direction (Y direction).The cross section orthogonal to the longitudinal direction of this prism 49 is right-angle triangle, has the hypotenuse 49a with angle at 45 °, mutually orthogonal both sides.A pair prism 49 is by being bonded with each other the inclined-plane comprising hypotenuse 49a and length direction of prism 49 and being formed as the prism of prism-shaped.By vapour deposition method etc. and film forming has the reflecting materials such as such as aluminium on the inclined-plane of prism 49, form reflectance coating thus.The reflectivity of passage 46, reflecting part 47 and pars intermedia 48 is adjusted by the Density Distribution of such as reflectance coating etc.
The density of reflectance coating represents with the ratio of the area coverage shared by the reflectance coating on such as unit area region, can using region relatively high for the density of the reflectance coating in prism as reflecting part 47, using region low for the density ratio reflecting part of reflectance coating as pars intermedia 48, using region low for the density ratio pars intermedia 48 of reflectance coating as passage 46.
As the formation method of deflector 22, such as, following methods can be enumerated: on the inclined-plane of prism, remove reflectance coating by local such as etchings after film forming reflectance coating, will the part of reflectance coating be eliminated as passage 46 or pars intermedia 48, will not remove the part of reflectance coating as reflecting part 47.In the formation method of such deflector 22, can by making etching condition such as etching period different Density Distribution realizing reflectance coating as described above in passage 46 and pars intermedia 48.
In addition, as other formation methods of deflector 22, such as following methods can be enumerated: on the inclined-plane of prism, partial film forming is carried out to reflectance coating, film forming be had the part of reflectance coating as reflecting part 47 or pars intermedia 48, will the part of film forming reflectance coating be there is no as passage 46.In the formation method of such deflector 22, can by making the membrance casting condition of reflectance coating such as film formation time different Density Distribution realizing reflectance coating as described above in reflecting part 47 and pars intermedia 48.
The lighting device IU of present embodiment as described above, owing to making local lighting region IRa connect, so the Illumination Distribution homogenising in the prescribed direction of field of illumination IR can be made by arranging pars intermedia 48 between passage 46 with reflecting part 47 in deflector 22.
In addition, the present invention is not limited to above-mentioned embodiment.Such as, there is the situation omitting the more than one key element illustrated in above-mentioned embodiment.In addition, the key element that can illustrate in appropriately combined above-mentioned embodiment.In addition, in allowed by law scope, quote the disclosure of whole Publication and the United States Patent (USP) quoted in above-mentioned embodiment and be a part described herein.
In addition, in the 1st embodiment, using the substrate-placing platform ST of supporting substrates P in planar fashion as substrate supporting parts, but such substrate supporting parts also can be suitable in other embodiments.In addition, in the 2nd embodiment using swing roller 35 as substrate supporting parts, but such substrate supporting parts also can be applicable to other embodiments.
In addition, cylindric mask pattern M is employed in above-mentioned each embodiment, but also can use the mask pattern M of such as so-called ring-band shape, can also use plane mask pattern M, the mode of mask holding member suitably can change according to the mode of mask pattern M.
In addition, in the 1st embodiment, the light source portion 21 of lighting device IU makes beam spread by line segment maker 24, but such light source portion 21 also can be applicable to other embodiments.In addition, in the 2nd embodiment, the light source portion 21 of lighting device IU makes the Illumination Distribution homogenising of each lighting module 20 by optics rod unit 36, but such light source portion 21 also can be applicable to other embodiments.
In addition, in the 3rd embodiment, the deflector 22 of lighting device IU makes illumination light L deflect by reflection, but such deflector 22 also can be applicable to other embodiments.The direction that deflector 22 enables illumination light L deflect suitably is changed according to the injection direction of the illumination light L from light source portion 21.
In addition, in the above-described embodiment, injection direction setting from the illumination light L of multiple light source portion 21 is both direction, but also can be set as more than three directions from the injection direction of the illumination light L of multiple light source portion 21, in this case, the direction that deflector 22 enables illumination light L deflect suitably is changed.
In addition, exposure device EX can be the projection type exposure device of poly-lens mode or microlens array mode, lighting device IU as described above can be applicable at least one in multiple lamp optical system in this case.
In addition, also group the lighting device IU of present embodiment can be entered in mirror projection (mirror projection) type scanning-exposure apparatus, wherein, in mirror projection type scanning-exposure apparatus, by the pattern of plane mask via have arc-shaped perspective view offner type catoptric projection optical system and be projected on plane sensitive substrate, and make mask and sensitive substrate mobile relative to catoptric projection optical system scanning.In this situation, such as, replace and make multiple deflection component 22a along Y-direction with the configuration of line spread (joint) shown in Fig. 5, Fig. 6, Figure 10, and make multiple deflection component 22a arrange deviously to make the field of illumination IR on mask be similar to the perspective view of arc-shaped.For this reason, in figure 6, as long as the drift angle in the XY face of the part 27a of the side end face on the border 27 of the deflection component 22a making formation adjacent one another are, 27b is different.
In addition, in the above-described embodiment, lighting device IU is applicable to exposure device EX, but lighting device IU also can be applicable to such as annealing device etc.
[device making method]
Then, device making method is described.Figure 22 is the process flow diagram of the device making method representing present embodiment.
In the device making method shown in Figure 22, first, the function/performance design (step 201) of the such as device such as display panels, organic EL display panel is carried out.Then, based on the design of device, mask pattern M (step 202) is made.In addition, hyaline membrane as device substrate or the substrate (step 203) such as sheet or very thin metal forming is prepared in advance by purchase or manufacture etc.
Then, ready substrate is dropped into the production line of rolling, batch, form TFT base plate (backplane) layer of electrode and wiring, dielectric film, the semiconductor film etc. forming device on the substrate, become organic EL luminescent layer (step 204) in pixel portion.In step 204, the operation film on substrate being formed corrosion-resisting pattern and the operation for mask, above-mentioned film etched with this corrosion-resisting pattern is typically included in.Following operation is implemented: operation etchant resist adequate relief being formed in substrate surface in the formation of corrosion-resisting pattern; According to the respective embodiments described above with the operation that the etchant resist of exposure light to substrate of patterning exposes via mask pattern M; The operation that the etchant resist of the sub-image being formed with mask pattern develops is made by this exposure.
When using the flexible device of printing technology etc. to manufacture at the same time, implement the operation being formed functional photographic layer (photonasty silane coupling material etc.) on the surface of the substrate by coating type, according to above-mentioned each embodiment by via mask pattern M, the exposure light of patterning irradiates the operation forming the part of hydrophiling and the part of hydrophobization according to pattern form in functional photographic layer on functional photographic layer, coating plating end liquid etc. in the part that the water wettability of functional photographic layer is high also separate out the operation etc. forming metallic pattern by electroless plating.
Then, according to the device manufactured, such as, embodiment is as such as having the operation of the colored filter or thin glass substrate etc. of the sheet of sealing function with other substrates that other operations manufacture by substrate cut or cut-out, laminating, thus assembly device (step 205).Then, the subsequent treatment (step 206) checking device etc. is carried out.Can by manufacturing device above.
Description of reference numerals
10 ... mobile device, 21 ... light source portion, 21a ... 1st light source portion, 21b ... 2nd light source portion, 22 ... deflector, 23 ... light source, 24 ... line segment maker, 25 ... collimating apparatus, 28 ... optical filter, 35 ... swing roller, 36 ... optics rod unit, 37,38 ... relay lens, 42 ... diaphragm parts, 45 ... catoptron, 46 ... passage, 47 ... reflecting part, 48 ... pars intermedia, EX ... exposure device, IU ... lighting device, L ... illumination light, M ... mask pattern, P ... substrate, S ... distance, U3 ... treating apparatus

Claims (27)

1. a lighting device, is characterized in that, has:
1st light source portion;
2nd light source portion, the injection direction of its light is different from described 1st light source portion; With
Deflector, it is to make, from the light of the described 1st light source portion mode consistent with the direct of travel of the light from described 2nd light source portion, to make the deflection at least partially of this light,
The mode that described 1st light source portion and described 2nd light source portion arrange in the prescribed direction continuously to make the field of illumination injected from each light source portion injection and via the light of described deflector, described prescribed direction is configured in diverse location.
2. lighting device as claimed in claim 1, is characterized in that,
There are the multiple light source portion comprising described 1st light source portion and described 2nd light source portion,
Described 1st light source portion, in described multiple light source portion, is configured in described 2nd light source portion side when observing from the direction vertical with described prescribed direction.
3. lighting device as claimed in claim 1 or 2, is characterized in that,
Described 1st light source portion and described 2nd light source portion are configured to, and the end in the described prescribed direction of described field of illumination is overlapped.
4. the lighting device according to any one of claims 1 to 3, is characterized in that,
Described 1st light source portion and described 2nd light source portion are configured in different positions when described prescribed direction is observed.
5. the lighting device according to any one of Claims 1 to 4, is characterized in that,
Described 1st light source portion is arranged relative to the face parallel with described prescribed direction symmetrically with described 2nd light source portion.
6. lighting device as claimed in claim 5, is characterized in that,
Described parallel face is parallel with the injection direction of the light from described deflector.
7. the lighting device according to any one of claim 1 ~ 6, is characterized in that,
Described deflector has:
For the 1st that the light from described 1st light source portion is injected; With
Towards the 2nd that injects from described 1st different direction and for the light from described 2nd light source portion.
8. lighting device as claimed in claim 7, is characterized in that,
When observing from the injection direction of the light from described deflector, described 1st non-vertically intersects with described prescribed direction with the border of described 2nd.
9. lighting device as claimed in claim 7 or 8, is characterized in that,
Described deflector makes to deflect from the light of described light source portion by the refraction in one or both in described 1st and described 2nd.
10. lighting device as claimed in claim 7 or 8, is characterized in that,
Described deflector makes to deflect from the light of described light source portion by the reflection in one or both in described 1st and described 2nd.
11. lighting devices as claimed in claim 7 or 8, is characterized in that,
A face in described 1st and described 2nd makes the light from described light source portion pass through to described deflector, and makes the light reflection from described light source portion on the other surface and deflect.
12. lighting devices as claimed in claim 11, is characterized in that,
Described deflector has:
Passage, it comprises the part in a described face, and the light from described 1st light source portion is passed through;
Reflecting part, it comprises the part in another face described, and the light from described 2nd light source portion is reflected; With
Pars intermedia, it is configured between described passage and described reflecting part, and reflectivity is higher compared with described passage, and reflectivity is lower compared with described reflecting part.
13. lighting devices according to any one of claim 1 ~ 12, is characterized in that,
The mode that described deflector is injected to described field of illumination from normal direction with the light made from described deflector, makes light deflect.
14. lighting devices according to any one of claim 1 ~ 13, is characterized in that,
The luminous point of the light penetrated from described light source portion is set to the shape of described prescribed direction for long limit.
15. lighting devices as claimed in claim 14, is characterized in that,
Described light source portion has:
Light source;
By the optics that the light penetrated from described light source spreads along described prescribed direction; With
Make the parallelization component of the described parallel light spread by described optics.
16. lighting devices according to any one of claim 1 ~ 14, is characterized in that,
Described light source portion has:
Light source;
Optics rod unit, it has injects end face for what inject from the light of described light source and injects the light injection of end face described in making to be injected into and the direction corresponding with described prescribed direction is the injection end face on long limit; With
Relay lens, itself and described injection end face form conjugate plane.
17. lighting devices as claimed in claim 16, is characterized in that,
Have diaphragm parts, these diaphragm parts are fixed in the enterprising professional etiquette in the direction vertical with described prescribed direction by scope by the light from described optics rod unit injection, to make the Illumination Distribution homogenising in the described prescribed direction of described field of illumination.
18. lighting devices according to any one of claim 1 ~ 17, is characterized in that,
There is the optical filter of the Illumination Distribution for adjusting described field of illumination.
19. lighting devices as claimed in claim 18, is characterized in that,
Described optical filter comprises for making light quantity comprise the 1st optical filter consistent in multiple light source portion of described 1st light source portion and described 2nd light source portion.
20. lighting devices as described in claim 18 or 19, is characterized in that,
The repeat region that the described field of illumination corresponding with described 1st light source portion comprises and the described field of illumination corresponding with described 2nd light source portion is overlapping and the non-duplicate region do not overlapped,
Described optical filter comprises for making the 2nd optical filter that illumination is consistent in described repeat region with described non-duplicate region.
21. lighting devices according to any one of claim 18 ~ 20, is characterized in that,
The repeat region that the described field of illumination corresponding with described 1st light source portion comprises and the described field of illumination corresponding with described 2nd light source portion is overlapping and the non-duplicate region do not overlapped,
Described optical filter comprises the 3rd optical filter for making illumination consistent in the mode of the Illumination Distribution homogenising making described non-duplicate region.
22. lighting devices according to any one of claim 17 ~ 21, is characterized in that,
At least one of described optical filter, the transmissivity of its light is variable.
23. lighting devices as claimed in claim 22, is characterized in that,
At least one of described optical filter, the transmissivity of its light is spatial variations, and the light path be arranged to relative to the light injected to described field of illumination and can moving.
24. lighting devices according to any one of claim 1 ~ 23, is characterized in that,
Also there is the measuring device measured the Illumination Distribution in the described prescribed direction of described field of illumination.
25. 1 kinds for the treatment of apparatus, are transferred to the pattern being formed as mask pattern and have on the substrate of inductive layer, it is characterized in that having:
Lighting device according to any one of the claim 1 ~ 24 that described mask pattern is thrown light on; With
Make described mask pattern and the mobile device of described substrate along the direction relative movement vertical with described prescribed direction.
26. treating apparatus as claimed in claim 25, is characterized in that,
Described mobile device has mask holding member, and this mask holding member keeps described mask pattern and can rotate around the center line parallel with described prescribed direction.
27. 1 kinds of device making methods, is characterized in that, comprising:
By the treating apparatus described in claim 25 or 26, described mask pattern and described substrate relative movement is made to be transferred on described substrate continuously by described pattern;
Utilize and implement subsequent treatment transferred with the change of the inductive layer of the described substrate of described pattern.
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CN201710648005.9A CN107315323B (en) 2012-05-29 2013-05-22 Scanning-exposure apparatus
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