WO2017158943A1 - Patterning device and organic electroluminescent element manufacturing method - Google Patents

Patterning device and organic electroluminescent element manufacturing method Download PDF

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Publication number
WO2017158943A1
WO2017158943A1 PCT/JP2016/085369 JP2016085369W WO2017158943A1 WO 2017158943 A1 WO2017158943 A1 WO 2017158943A1 JP 2016085369 W JP2016085369 W JP 2016085369W WO 2017158943 A1 WO2017158943 A1 WO 2017158943A1
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Prior art keywords
light
mask
organic
light irradiation
irradiance
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PCT/JP2016/085369
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French (fr)
Japanese (ja)
Inventor
新藤　博之
尚裕 奥村
森川　雅弘
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コニカミノルタ株式会社
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Priority to JP2018505246A priority Critical patent/JPWO2017158943A1/en
Publication of WO2017158943A1 publication Critical patent/WO2017158943A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/16—Electron transporting layers
    • H10K50/166—Electron transporting layers comprising a multilayered structure

Definitions

  • the present invention relates to a patterning apparatus and a method for manufacturing an organic electroluminescence element. More specifically, the present invention relates to a patterning apparatus and the like that can significantly reduce the patterning time of an organic electroluminescence element.
  • organic electroluminescence (hereinafter also referred to as “organic EL”) element is irradiated with ultraviolet rays (UV), the luminous efficiency of the irradiated region is reduced and patterning can be performed (for example, Patent Document 1). reference.).
  • This phenomenon has reciprocity failure characteristics, and it is known that the higher the irradiation power density (irradiance) is, the faster the reaction is, even with the same integrated light quantity. Therefore, when patterning an organic EL element, the patterning time can be significantly shortened when the irradiance is set high, and as a result, the tact time can be shortened and productivity can be improved.
  • the irradiation light be as close to parallel light as possible. Therefore, a light irradiation device having high irradiance with substantially parallel light is desired.
  • the irradiation light is substantially parallel light (about a collimation half angle of about 2 °) because it is a surface light source. ) Requires a large number of beam shaping optical components and a large amount of light vignetting occurs, making it difficult to increase the irradiance as shown in Patent Document 2.
  • Patent Document 3 describes a very high irradiance of 6 W / cm 2 , but since the collimation half angle is not controlled, it is estimated that the collimation half angle is about 80 ° of the LED radiation angle and can be used for patterning. There was no problem.
  • Patent Document 4 describes an example in which the collimation half angle is 14 ° and the irradiance is increased to 0.6 W / cm 2, but the irradiance is still insufficient for patterning the organic EL element. Patent Document 4 does not describe a technique for further increasing the irradiance.
  • the present invention has been made in view of the above-described problems and situations, and a problem to be solved is to provide a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element. .
  • the present inventor can achieve a high irradiance of 4 W / cm 2 or more if the collimation half angle is allowed to 45 ° in the process of studying the cause of the above-mentioned problems.
  • the present inventors have found that a patterning apparatus and a method for manufacturing an organic electroluminescence element that can significantly reduce the patterning time of the luminescence element can be provided. That is, the said subject which concerns on this invention is solved by the following means.
  • a patterning apparatus for forming a light emission pattern by irradiating light through a mask to an organic electroluminescence element, A light irradiating unit that irradiates light having a wavelength of 100 to 410 nm with an irradiance of 1 W / cm 2 or more; The irradiance of light within the wavelength range in the light irradiation area is within a range of ⁇ 10% with respect to the average value of the irradiance in the light irradiation area, The patterning apparatus according to claim 1, wherein a collimation half angle of light within the wavelength range in the light irradiation area is 45 ° or less.
  • a pattern forming body mounting table on which the organic electroluminescence element is mounted 2.
  • the patterned object mounting table is as follows. A cooling water is introduced from one side of the pattern forming body mounting table, and a plurality of water channels are provided to flow the cooling water in one direction through the pattern forming body mounting table and discharge the cooling water to the other.
  • the patterning device according to item.
  • the irradiated light be as close to parallel light as possible, but it is difficult to make parallel light while increasing the irradiance.
  • the light emission pattern of the organic EL element is visually appealing, and submicron resolution is not required as in a semiconductor. Therefore, the present inventor can form a light emission pattern with a sufficiently high resolution while achieving a high irradiance of 2 W / cm 2 or more by shifting the irradiation light from the parallel light and allowing the collimation half angle to 30 °. I thought.
  • Schematic diagram of organic EL sheet Schematic diagram of mask Schematic diagram of an example of light irradiation area
  • Schematic which shows an example of the cooling function of a to-be-patterned body mounting base 1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (X-axis direction perspective view).
  • FIG. 1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (Y-axis direction perspective view). Operation flow diagram of an example of patterning method of the present invention
  • FIG. 1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (Y-axis direction perspective view).
  • Operation flow diagram of an example of patterning method of the present invention Cross-sectional view of an example of an organic EL element Explanatory drawing which shows irradiance distribution in the edge part vicinity of a mask light shielding film
  • a graph showing the irradiance distribution near the edge of the mask light-shielding film The graph which shows the characteristic with respect to the integrated irradiation time of the luminance ratio of the organic EL element which concerns on an Example
  • the patterning apparatus of the present invention is a patterning apparatus that forms a light emission pattern by irradiating light through a mask to an organic electroluminescence element, and irradiances light having a wavelength in the range of 100 to 410 nm to 1 W / cm 2 or more.
  • the light irradiance of irradiating light in the light irradiation area within the range of the wavelength in the light irradiation area is within ⁇ 10% of the average value of the irradiance in the light irradiation area,
  • the collimation half angle of the light within the wavelength range in the light irradiation area is 45 ° or less.
  • a pattern forming body mounting table on which the organic electroluminescence element is mounted is provided, and the pattern forming body mounting table has a cooling function. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
  • the pattern forming body mounting table introduces cooling water from one of the pattern forming body mounting tables, and the cooling water is unidirectionally passed through the pattern forming body mounting table. It is preferable to provide a plurality of water channels that flow and discharge to the other. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
  • a mask holding mechanism for holding the mask by an elastic force of an elastic body.
  • the present invention it is preferable to provide a gas flow generation unit that blows gas onto the mask. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
  • the patterning apparatus of the present invention can be suitably employed in a method for manufacturing an organic electroluminescent element that manufactures an organic electroluminescent element having a light emitting pattern.
  • the present invention can be suitably used in a method for manufacturing an organic electroluminescence device, wherein the edge portion of the light emission pattern has a luminance distribution within a range of 10 to 300 ⁇ m.
  • ⁇ is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
  • the patterning apparatus of the present invention is a patterning apparatus that forms a light emission pattern by irradiating light through a mask to an organic electroluminescence element, and irradiances light having a wavelength in the range of 100 to 410 nm to 1 W / cm 2 or more.
  • the light irradiance of irradiating light in the light irradiation area within the range of the wavelength in the light irradiation area is within ⁇ 10% of the average value of the irradiance in the light irradiation area,
  • the collimation half angle of the light within the wavelength range in the light irradiation area is 45 ° or less.
  • FIG. 1A is a schematic diagram of an organic EL sheet.
  • a plurality of organic EL elements 12 are formed on the organic EL sheet 11, and organic EL sheet alignment marks 13 are formed at four corners. This alignment mark is used for alignment of a film formation mask when forming an electrode or an organic layer in the manufacture of an organic EL element.
  • FIG. 1B is a schematic diagram of a mask.
  • a predetermined light irradiation pattern 15 (character A in the example in the figure) is formed on the mask 14 at a position corresponding to each organic EL element 12, and a mask alignment mark corresponding to the position of the alignment mark 13 on the organic EL sheet 11 is formed. 16 is formed.
  • the blackened portion shields the ultraviolet rays by the light shielding film.
  • the organic EL element 12 is irradiated with ultraviolet light in a light emitting area other than the letter A and does not emit light, and only the letter A emits light as the organic EL element 12.
  • the mask base material is preferably quartz glass or heat-resistant glass (for example, Tempax Float (registered trademark) manufactured by Schott), and the light-shielding film is preferably a chromium film or a chromium oxide film having a low ultraviolet absorption rate.
  • the organic EL sheet 11 is cut for each organic EL element 12 after the patterning is completed. Each individual organic EL element thus cut is used to be individually loaded into a display device or the like.
  • FIG. 2 is a schematic diagram showing a light irradiation area.
  • the dotted line portion in the figure is a plurality of light irradiation areas, and in the case of FIG. 2, the case where it is divided into four light irradiation areas (P1 to P4) is illustrated.
  • a case where light irradiation is performed by rotating around these four light irradiation areas with one pulse light irradiation will be exemplified. First, one pulse of light is irradiated in the light irradiation area P1, and then one pulse of light is irradiated in the light irradiation area P2. Subsequently, the light irradiation areas P3 and P4 are each irradiated with one pulse light.
  • the one-pulse light irradiation is sequentially repeated such that the light irradiation area P1 is again irradiated with one pulse light.
  • a waiting time can be provided before the light irradiation area P1 is again irradiated with light.
  • the light irradiation area P1 is cooled by this waiting time. In this case, heat accumulation in the mask and the organic EL sheet can be suppressed.
  • the number of light irradiation areas to be divided is not particularly limited, but is preferably 9 or less, and preferably 4 or less from the viewpoint of shortening the tact time.
  • a circular pattern of the light irradiation area for example, a case of repeating (light irradiation area P1 ⁇ light irradiation area P2 ⁇ light irradiation area P1 ⁇ light irradiation area P2) can be cited, but light is emitted again in at least one light irradiation area. Any irradiation pattern may be used as long as irradiation is performed. For example, there may be a light irradiation area where no additional light irradiation is performed, such as (light irradiation area P1 ⁇ light irradiation area P2 ⁇ light irradiation area P1).
  • the order of light irradiation may be different from the order of light irradiation in the first round.
  • the ultraviolet absorption rate of an organic layer has distribution within a sheet
  • a light irradiation unit including a plurality of light sources, a step moving unit that changes a relative position between the position of the light irradiation unit and the pattern forming body mounting table, and an integrated light amount in each of the plurality of light irradiation areas,
  • a control unit that controls the light irradiation unit so as to be a predetermined amount in the light irradiation area of the plurality of light irradiation areas, wherein the step moving unit is configured to emit pulsed light in at least one of the plurality of light irradiation areas (A).
  • the light irradiation part or the pattern forming body is placed at a position where pulse light irradiation is performed in at least one light irradiation area (B) of the light irradiation areas other than the light irradiation area (A). , And after irradiating the light irradiation area (B) with the pulsed light, the light irradiating part or the pattern forming body mounting table is moved to a position where the light irradiation area (A) is again irradiated with the pulsed light.
  • a patterning device for an organic EL element which is a step moving unit is preferable.
  • the patterning device 31 is a mask for irradiating the organic EL sheet 11 by patterning the light irradiation unit 32 including the light source unit 300, the cover 39, and the gas flow generation unit 40, and the irradiation light 38 from the light irradiation unit 32. 14 and a pattern forming body mounting table 43.
  • the light source unit 300 includes a light source 35 that emits ultraviolet light (for example, a UV-LED having a wavelength of 365 nm or 385 nm) and a light source substrate 34 in which the light source 35 is arranged two-dimensionally (planar). A driving current is supplied to 35.
  • the light source unit 300 further includes a heat radiating plate 33 that releases heat generated by the light source 35 to the outside, and prevents a decrease in light emission efficiency of the light source 35. More preferably, a cooling pipe is provided inside the heat radiating plate 33 and the cooling water is circulated to cool the light source 35 with water.
  • the divergent light emitted from the light source unit 300 is used as the irradiation light 38 shaped into a light beam having a predetermined divergence angle by the lens array 37.
  • the lens array 37 is fixed to the light source unit 300 by the lens array support 36.
  • the irradiation light 38 is confined by a cover 39 whose inner surface is a reflection surface to prevent the light amount from decreasing, and the organic EL sheet 11 is irradiated with light with a uniform light amount through the mask 14 to form a light emission pattern.
  • the light emitted from the light source 35 is preferably ultraviolet light that has a fast deactivation reaction rate of the organic functional layer due to light irradiation from the viewpoint of reducing the tact time.
  • the emitted light is preferably pulsed light.
  • the pulsed light irradiation performed in one light irradiation step is irradiation with one pulsed light. It is preferable that If necessary, multi-pulse light irradiation may be performed with a turn-off time between a plurality of pulse light irradiations.
  • the gap 42 between the lower end of the cover 39 and the mask 14 should be as narrow as possible, and preferably about 5 mm. If it is this space
  • the light source 35 LED is irradiated with pulsed light by being controlled by a light source control unit, which will be described later, to be turned on and off, and to have an irradiation output and irradiation time at the time of lighting.
  • the organic EL sheet 11 is placed on the pattern forming body placing table 43, and the mask 14 is adjusted to a predetermined relative position with the organic EL sheet 11 and placed on the sheet.
  • the organic EL sheet 11 is preferably fixed by adsorption.
  • the pattern forming body mounting table 43 shown in FIG. 3 has a water channel 44b provided therein as a cooling function to be described later, and cools heat generated in the mask 14 and the organic EL sheet by ultraviolet irradiation.
  • a gas blows out from the gas flow generation unit 40 to cool the surface of the mask 14.
  • the light irradiation unit 32 irradiates the first light irradiation area P ⁇ b> 1 of the organic EL sheet 11 with the pulsed light
  • the light irradiation unit 32 and the pattern forming body mounting table 43 move stepwise. Then, the next light irradiation area P2 is irradiated with pulsed light.
  • Such a patterning device 31 is preferable because it can prevent deformation of the mask 14 due to heat and deterioration of performance (for example, color balance) due to heat of the organic EL sheet 11, and can perform accurate patterning. Further, the time tact for patterning can be shortened, and the productivity can be further improved.
  • a pattern forming body mounting table for mounting an organic EL sheet provided with a plurality of organic EL elements, and a plurality of light sources for irradiating a plurality of light irradiation areas of the organic EL sheet
  • an organic EL sheet patterning device comprising a control unit for controlling the plurality of light sources, wherein the positions of the plurality of light sources are fixed, and the plurality of light irradiation areas are any of the plurality of light sources.
  • the control unit controls a plurality of light sources to irradiate pulse light in at least one light irradiation area (A), and then, the light irradiation area other than the light irradiation area (A). After irradiating pulsed light in at least one light irradiation area (B), irradiating pulsed light in the light irradiation area (B), irradiating the light irradiation area (A) again with pulsed light. Align, accumulated light quantity of a plurality of light irradiation area is preferably a respective patterning apparatus of the organic EL element and controls the light source so that the predetermined amount in the transmission area.
  • FIG. 4 is a perspective view of another example (second embodiment) of the light irradiation unit in the patterning apparatus of the present invention.
  • a plurality of light sources 35 (LEDs) more than the number of light sources in the first embodiment are two-dimensionally arranged, and an irradiation area of light emitted from the entire light irradiation unit 32 is the organic EL element 12 in the organic EL sheet 11. It is an area that can cover the entire area where the. That is, when all the light sources 35 are turned on, the light irradiation area covers all the light irradiation areas P1, P2, P3, and P4 in FIG.
  • the light sources 35 can be controlled for each group.
  • the first light irradiation step only the LED light sources of the first group are turned on, and the irradiation light 38 that irradiates the light irradiation area P1 in FIG. 2 is emitted. . Thereafter, in the next light irradiation step, irradiation light 38 for irradiating the light irradiation area P2 in FIG. 2 is emitted. In this way, by turning on each group and irradiating around light, it is possible to eliminate the movement time of the light irradiation unit in the first embodiment of the patterning apparatus, and to reduce the tact time. In the example shown in FIG.
  • the light sources 35 in one light irradiation unit 32 are sequentially turned on, but a plurality of (for example, four) light irradiation units 32 in the first embodiment of the patterning device described above are arranged, Each light irradiation unit 32 may be caused to emit light sequentially in accordance with light irradiation in each light irradiation area (P1 to P4).
  • a mask has a role which changes the light quantity irradiated to an organic EL element.
  • the mask has a two-layer configuration (not shown) of a glass substrate and a light shielding film, and is mounted on the mask holding mechanism 200 so that the light shielding film is on the mask frame 202 side.
  • a mask having a negative pattern on a glass substrate can be prepared using a known material that can change the amount of transmitted UV light, but the UV absorption rate is particularly compared to a quartz substrate with a low linear expansion coefficient.
  • a low-chromium light-shielding film provided with a pattern is preferable in that thermal deformation can be suppressed.
  • the “pattern” means a design (pattern or pattern in the figure), characters, images, etc. displayed by the organic EL element. “Patterning” refers to providing these pattern display functions.
  • the “light emission pattern” refers to light emitted from an organic EL element that emits light with varying light emission intensity (luminance) depending on the position of the light emitting surface, based on a predetermined design (pattern or pattern in the figure), characters, images, etc. A source having a function of displaying a predetermined design (design or pattern in the figure), characters, images, etc. formed (applied) in advance on the organic EL element to emit light.
  • the organic EL sheet is placed on a pattern forming body placing table having a cooling function, the mask is positioned at a predetermined relative position with the organic EL element, and is placed in close contact with the element. It is preferable. This is because the cooling effect of the mask light-shielding film serving as a heat source can be enhanced by light irradiation. Specifically, it is preferable that the mask light-shielding film is in close contact with the organic EL element.
  • Glass substrate As a glass substrate, it does not specifically limit as a raw material, for example, the well-known glass raw material used for optics and a board
  • substrate can be used. Specifically, glass ceramics such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, crystallized glass, phosphate glass or lanthanum glass Etc.
  • glass ceramics such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, crystallized glass, phosphate glass or lanthanum glass Etc.
  • Quartz glass or heat-resistant glass can be preferably used.
  • the thickness of the mask is not particularly limited, but a mask having a thickness of 3 to 10 mm can be used.
  • the patterning apparatus of the present invention preferably includes a mask holding mechanism that holds the mask by an elastic force of an elastic body. Thereby, even if a mask expand
  • FIG. 5 is a schematic view of the mask holding mechanism and the mask as viewed from the light irradiation unit side.
  • the mask holding mechanism 200 according to the present invention includes an elastic body 204 provided on each side of a rectangular mask frame 202 having an opening at the center and disposed opposite to each other. And fixing means 206 for fixing the body 204.
  • the elastic body 204 is placed on the mask frame 202 and presses and fixes the mask 14 from the side by making surface contact with the mask 14.
  • the fixing means 206 is fixed to the mask frame 202.
  • the elastic body 204 is fixed in contact with the fixing means 206 at the surface opposite to the surface in contact with the mask 14 and the upper surface of the elastic body 204.
  • the mask 14 is disposed on the mask frame 202 so as to contact each elastic body 204.
  • the elastic body 204 is preferably fixed in surface contact with the mask 14.
  • the shape of the elastic body 204 is not particularly limited.
  • the elastic body 204 when the mask is expanded by light irradiation, the elastic body 204 is a spherical viscoelastic body that presses and fixes the mask by point contact or surface contact. Also good. By fixing with the elastic body, it is possible to prevent the mask from cracking starting from the contact portion.
  • the mask holding mechanism 200 can hold the mask 14 with a predetermined pressure, it can be a movable mask holding mechanism with an arbitrary side of the mask frame 202 as a rotation axis. .
  • the mask can be swung to be retracted from the organic EL element, and the organic EL element or the like to be patterned can be easily carried in and out.
  • the elastic body 204 (and the fixing means 206) are arranged to face each side of the mask frame 202 in two or more pairs.
  • the number of installed elastic bodies 204 can be appropriately adjusted according to the size of the mask 14, that is, the length of each side of the mask frame 202.
  • the mask holding mechanism 200 can be movable as described above, at least a pair of mask detachment prevention restricting plates 208 are disposed to face each other on a pair of opposing sides of the mask frame 202. It is preferable to make it. At this time, the rotation axis is one side of the mask frame 202.
  • Mask frame As a material of the mask frame according to the present invention, a conventionally known material can be used. For example, aluminum can be used.
  • the material constituting the elastic body is not particularly limited, but is preferably a viscoelastic body.
  • fluorine rubber chlorobrene rubber, nitrile rubber, ethylene
  • examples of the rubber include propylene rubber, silicone rubber, butyl rubber, and urethane rubber.
  • fluororubber is preferable because of its high durability against ultraviolet rays.
  • the hardness of the viscoelastic body is preferably in the range of A50 to A80. If the hardness of the viscoelastic body is A50 or more, the thermal expansion of the mask can be effectively prevented, and if it is A80 or less, the mask holding mechanism can be prevented from being displaced by its own weight when the mask holding mechanism is movable. Can do.
  • the hardness of the viscoelastic body is a value measured according to JIS K 6253.
  • the contact area between the viscoelastic body and the mask is preferably 104.5 mm 2 or more, whereby the mask can be stably fixed.
  • the pressure with respect to the mask of the viscoelastic body in the said contact part exists in the range of 430000 +/- 56000N / m ⁇ 2 >. If the pressure is within the range, thermal expansion and displacement of the mask can be prevented.
  • the amount of deviation in the plane direction of the mask is preferably 50 ⁇ m or less.
  • the fixing means is fixed to the mask frame with screws or the like.
  • the material of the fixing means is not particularly limited, and for example, aluminum can be used.
  • the light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm (hereinafter also referred to as “ultraviolet rays” or “irradiation light”) with an irradiance of 1 W / cm 2 or more.
  • a light source that emits ultraviolet rays is attached to the light irradiation unit.
  • the light source is not particularly limited as long as it is a light source that emits a desired amount of ultraviolet light.
  • Ultraviolet light in the wavelength region can be used.
  • the integrated dose for patterning depends on the layer structure, film thickness, size, and the like of the organic EL element, but irradiation with an integrated light amount of 200 to 5000 J / cm 2 is highly productive, This is preferable from the viewpoint of accurate patterning. Further, it is preferable that one pulse of ultraviolet irradiation time is in the range of 1 to 300 seconds.
  • the light irradiation unit will be further described with a specific example.
  • the light irradiation unit for example, UV-LEDs having a wavelength of 385 nm are used as the light source, these are arranged two-dimensionally, and the diverging light emitted from the LEDs is shaped to have a predetermined collimation half angle by the lens array.
  • the light emitted from each lens of the lens array is overlapped on the irradiation surface, and as a result, a wide irradiation area can be obtained and a uniform illuminance distribution can be obtained.
  • LED turns on and off the irradiation output at the time of lighting and the irradiation time are controlled by a controller (not shown), and emits pulsed light.
  • a controller not shown
  • the light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm with an irradiance of 1 W / cm 2 or more.
  • the irradiance in order to perform high-speed patterning with a high irradiance, the irradiance must be 2 W / cm 2 or more.
  • 4 W / cm 2 or more is more preferable.
  • a light irradiation area of 5000 cm 2 or more and an irradiance of 4 W / cm 2 are preferable in that the tact time of patterning can be greatly shortened and the number of pick-ups can be increased. As a result, productivity can be remarkably improved.
  • the irradiance of light having a wavelength in the range of 100 to 410 nm in the light irradiation area is relative to the average value of the irradiance in the light irradiation area (desired region where light is actually irradiated). It is within the range of ⁇ 10%.
  • the irradiance of light within the wavelength range in the light irradiation area (hereinafter also simply referred to as “irradiance”) is ⁇ 10% of the average value of the irradiance in the light irradiation area. Is within the range.
  • the irradiance can be measured with a known measuring instrument. For example, when the wavelength range is 300 to 410 nm, the UV integrated light meter “C9536-02” and the sensor head “H9958-02” (manufactured by Hamamatsu Photonics) Can be measured by measuring at intervals of 1 to 10 mm in the vertical and horizontal directions of the light irradiation area. From the irradiance distribution in the light irradiation area measured as described above, the average of the irradiance of light within the wavelength range according to the present invention in the light irradiation area can be calculated.
  • the collimation half angle of the light within the range of 100 to 410 nm in the light irradiation area is 45 ° or less.
  • the collimation half-angle refers to the maximum angle ⁇ among the angles ⁇ formed by the perpendicular R to the mask and the irradiation light L shown in FIG.
  • the collimation half angle can be adjusted by shaping divergent light emitted from the light source unit with a lens or the like.
  • a lens array 37 as shown in FIG. 3 can be used, but is not limited to this.
  • a compound parabola shown in FIG. A condensing mirror 37a such as a surface concentrator may be used.
  • a compound parabolic concentrator is preferable because the component cost can be reduced.
  • a rod-shaped cylindrical lens 37b or a rod lens as shown in FIGS. 7A and 7B is arranged in each column of the LED array, and then a rod-shaped cylindrical lens or a rod lens is arranged in an orthogonal direction to collimate in a two-dimensional direction. Angle shaping may be performed.
  • FIG. 7A and 7B are schematic views showing an example of the arrangement of the rod-shaped cylindrical lenses
  • FIG. 7A is a schematic view showing a cross section orthogonal to the X direction
  • FIG. 7B is a cross section orthogonal to the Y direction.
  • FIG. This is preferable because it is sufficient to adjust the optical axis in only one direction, and the adjustment man-hour can be suppressed.
  • the method for measuring the collimation half angle is not particularly limited, and a known method can be used. An example of a specific measurement method is shown below.
  • the pattern forming body mounting table is retracted from the light irradiation unit, the pinhole is disposed at the same height as the surface on which the organic EL sheet of the pattern forming body mounting table is mounted, and irradiation light is irradiated to the pinhole To do.
  • the light beam that has passed through the pinhole is observed with a CCD camera, and the radius r of the light beam is measured.
  • the collimation half angle can be calculated as tan ⁇ 1 (r / D).
  • the diameter of the pinhole is preferably ⁇ 0.5 mm or less.
  • the light irradiation area refers to a desired region where light is actually irradiated in the patterned body (organic EL sheet) according to the present invention.
  • the area of the light irradiation area is not particularly limited, but is preferably 5000 cm 2 or more. The reason for this is as follows.
  • the width of the roll is generally about 1 m.
  • this is cut into a length of about 600 mm in the roll winding direction to form a sheet having a plurality of organic EL elements in a planar shape, and the plurality of organic EL elements are collectively irradiated with light. It is preferable to do.
  • a plurality of organic EL elements are arranged in an area of 90 cm ⁇ 54 cm on the inner side.
  • light can be irradiated to one organic EL sheet within a total of 9 steps and 10 steps of 3 steps in the x direction and 3 steps in the y direction.
  • the light irradiation area By setting the light irradiation area in such a large area, light irradiation in the state of the organic EL sheet can be performed, and a plurality of organic EL elements can be patterned at a time, thereby improving the throughput.
  • Such a large-area light irradiation area can be realized, for example, by increasing the number of LEDs and expanding the light emission area of the light source unit.
  • the patterning apparatus of the present invention also has a cooling function. It is preferable. As a result, even if the total amount of light emitted once is very high, heat generation of the light shielding film of the mask can be suppressed.
  • the above-mentioned light irradiation area is planar. Thereby, irradiation can be performed in the form of a sheet on which a plurality of organic EL elements are formed, and throughput can be improved.
  • the patterning apparatus of the present invention preferably includes a pattern forming body mounting table on which the organic electroluminescence element is mounted.
  • the pattern forming body mounting table is not particularly limited as long as it can mount an organic electroluminescence element and does not impair the effects of the present invention, and can adsorb and fix an organic EL sheet. It is preferable.
  • an acrylic ester, methacrylic ester, polybutylene terephthalate, polycarbonate (abbreviation: PC), polyethylene terephthalate (abbreviation: PET), polyethylene naphthalate (abbreviation: PEN), or the like is used as the substrate of the organic EL element, organic The EL sheet is easily deformed, such as curling.
  • the material of a to-be-patterned body mounting base is not specifically limited. However, when the pattern forming body mounting table has a water channel 44b, which will be described later, the pattern forming body mounting table is a cooling table. Therefore, the material is preferably a light metal with high thermal conductivity. Aluminum can be used.
  • the to-be-patterned body mounting table has a cooling function. Thereby, it is possible to suppress the occurrence of thermal deformation in the mask, and in turn, it is possible to prevent the light irradiation pattern from being shifted and the heat-sensitive organic layer from being damaged by heat and degrading the performance.
  • the cooling function is not particularly limited as long as it can cool the mask, and specific examples include a water cooling method and blowing a gas such as air onto the mask.
  • the patterning apparatus according to the present invention includes a water channel inside the pattern forming body mounting table as a water-cooling cooling function, and introduces cooling water from one of the pattern forming body mounting tables, thereby forming the pattern forming It is preferable to provide a plurality of water channels that allow the cooling water to flow in one direction through the water channel in the body mounting table and to be discharged to the other.
  • the material of the pattern forming body mounting table is preferably one having high thermal conductivity. For example, aluminum can be used.
  • FIG. 8 shows a specific example of the water channel provided inside the pattern forming body mounting table.
  • a plurality of water channels 44b through which cooling water supplied from the water pipe 44a flows are formed in one direction from one side of the pattern forming body mounting table to the other inside the pattern forming body mounting table.
  • Cooling water flows in one direction through this water channel, and cools the heat generated in the mask and the organic EL element by ultraviolet irradiation.
  • the water that has absorbed heat at the pattern forming body mounting table is discharged from the water channel 44c and sent to the chiller unit 45, where heat is exchanged inside the chiller unit 45, and the cooling water whose temperature has been lowered is supplied to the pattern forming body mounting table. Will be supplied again.
  • the cooling water circulates inside the chiller unit and the pattern forming body mounting table.
  • a plurality of chiller units may be used according to the cooling capacity of the chiller.
  • the “chiller” refers to a device that circulates a heat medium and keeps the target part at a constant temperature.
  • the water temperature introduced to the pattern forming body mounting table is preferably 30 ° C. or less as long as the organic EL element and the mask are not condensed. 10 to 20 ° C. is more preferable.
  • the cooling water flowing through the water channel 44b is one-way, the cooling water that has absorbed heat and has risen in temperature can be discharged to the outside of the pattern forming body mounting table at the shortest distance. This is preferable because the cooling effect is higher than when reciprocating in the mounting table.
  • the patterning apparatus preferably includes a gas flow generation unit that blows gas onto the mask.
  • the gas flow generation unit 40 is arranged at a position facing the upper surface of the mask 14 such that a gas such as air is blown in parallel to the mask 14 and toward the center of the mask 14 through the gap WD between the mask 14 and the cover 39. ing.
  • the gas blown by the gas flow generator is not particularly limited as long as it can cool the mask and does not impair the effects of the present invention.
  • air, nitrogen gas, etc. Can be suitably used.
  • the gas flow generating unit 40 Since the gas flow generating unit 40 is disposed at a position facing the upper surface of the mask 14, the gas flow 41 can be blown in parallel with the mask 14, and as a result, the blown gas flow 41 travels on the mask 14 without unevenness and the center of the mask. It is possible to join at the part.
  • spraying in parallel means spraying at an angle within ⁇ 2 ° with respect to the plane of the mask 14.
  • the gas blown to the mask merges at the center of the mask 14. By joining at the center, the mask 14 can be cooled without unevenness. For this reason, it is preferable that the gas flow generation part 40 is arrange
  • the gap 42 between the cover 39 and the gas flow generating unit 40 is not particularly limited as long as the gas is efficiently blown onto the mask, but is preferably within a range of 10 to 200 mm. More preferably, it is in the range of 50 to 100 mm.
  • the length of the gas flow generating part is preferably the same as or larger than the width of the cover on the side to be sprayed.
  • the pair of gas flow generation units 40 is disposed at a symmetrical position with respect to the central portion of the mask 14.
  • the gas flow generation unit 40 includes a slit-shaped or nozzle-shaped sprayed portion. It is more preferable to have a slit-shaped spraying part. Furthermore, it is more preferable that the slit-like spraying part is one that blows gas in a line shape and cools the mask surface. This is because the mask can be cooled uniformly when the gas blown out is in a line shape.
  • a nozzle provided with a nozzle-like spraying part can be used instead of the slit-like spraying part.
  • the number of nozzles should be large, and the number of nozzles may be one at intervals of 5 to 20 mm. preferable.
  • the size of the nozzle diameter can be adjusted as appropriate.
  • a commercial product can be used as the gas flow generating part provided with the slit-like spraying part used for the spraying part.
  • a layered airflow generator 750 type manufactured by Sanwa Enterprise, a blower knife air nozzle manufactured by Spraying System Japan, or the like can be used.
  • the air volume blown from the pair of blowing parts is the same.
  • the air volume can be 1000 to 4000 L / min.
  • the gas flow generator is preferably connected to an air compressor. According to the irradiation light quantity of an ultraviolet-ray, it can adjust to a desired air volume and a wind speed suitably.
  • a known air compressor can be used.
  • the gas to be blown is temperature-adjusted. If necessary, the cooling effect can be enhanced by using a gas whose temperature is adjusted to about 5 to 15 ° C., for example.
  • having such a gas flow generation unit can efficiently cool the organic EL sheet and the mask by blowing gas on the mask, and has high irradiance. Since the influence of the heat accompanying a case can be reduced suitably, it is preferable.
  • the cover has a function of preventing a reduction in the amount of ultraviolet light emitted from the light source unit and irradiating the mask with a uniform amount of light. Therefore, it is preferable that the inner surface is covered with a reflective material. Since the reflective material is resistant to heat and durable, a metal material can be used. For example, aluminum is preferably used because it is lightweight.
  • the height and the bottom area are not particularly limited, and the size of the organic EL sheet that irradiates ultraviolet rays is not limited. It can be set accordingly.
  • the bottom surface of the cover is preferably larger than the entire area where the pattern is formed in the organic EL sheet.
  • a plurality of organic EL elements (for example, 100 organic EL elements in a total of 10 vertical columns and 10 horizontal rows) may be arranged to form one pattern.
  • the plurality of organic EL elements form different patterns, and operate as an organic EL panel that displays one pattern as a whole.
  • the height of the cover can be adjusted as appropriate based on the amount of ultraviolet light and unevenness in the amount of irradiation light. For example, it can be about 0.5 to 5 m.
  • the light irradiation area of the organic EL sheet is divided into a plurality of light irradiation areas and sequentially irradiated with pulsed light, and then the same region is repeatedly irradiated with pulsed light. Irradiation is repeated until the integrated dose is reached. Therefore, it is preferable to control the light irradiation area so as to go around.
  • FIG. 9 is an overall configuration diagram (X-axis direction perspective view) of an example of the patterning apparatus of the present invention (first form of the patterning apparatus).
  • FIG. 10 is an overall configuration diagram (Y-axis direction perspective view) of an example of the patterning apparatus of the present invention (first mode of the patterning apparatus).
  • the pattern forming body mounting table 43 moves in the X-axis direction along the linear guide 64.
  • the screw shaft 66 is rotated by the motor 67, and the rotational movement is converted into the straight movement by the ball screw 65 attached to the bottom surface of the pattern forming body mounting table 43.
  • a reference position is determined by a position sensor (not shown), and the amount of movement is controlled by the number of rotations of the motor 67 therefrom.
  • the light irradiation unit 32 is moved in the Y-axis direction by the linear guide 68.
  • the linear guide 68 of the light irradiation unit is installed on a base on which a support is placed.
  • the operation unit 52 has a built-in memory, and stores light irradiation conditions such as irradiance per light irradiation at each position, light irradiation time, number of times of light irradiation, coordinates of each light irradiation position, and movement order. ing.
  • a desired light irradiation condition is selected by the operation unit 52, and the control unit 53 controls the following mechanisms according to the condition.
  • the control unit 53 includes a mask alignment control unit 54, a movement mechanism control unit 55, a light source control unit 56, and a gas flow control unit 57.
  • the light source control unit 56 controls the irradiance, light irradiation time, number of times of light irradiation, and the like of the light source unit.
  • the movement mechanism control unit 55 controls the positions of the pattern forming body mounting table 43 and the light irradiation unit 32 via the motor 67 and the motor 61.
  • the mask alignment control unit 54 controls the mask alignment mechanism unit 69 in a state where the pattern forming body mounting table 43 is in the retracted position, and the organic EL sheet 11 and the predetermined position on the pattern forming body mounting table 43.
  • the mask 14 is installed.
  • the gas flow control unit 57 controls on / off of the operation of the gas flow generation unit 40.
  • FIG. 11 shows an operation flow of an example of a patterning method according to the present invention (using the first embodiment of the patterning apparatus and the organic EL sheet 11 and the mask 14 shown in FIG. 1 and having four light irradiation areas).
  • FIG. When the power supply 51 of the patterning apparatus is turned on, the operation of the chiller unit 58 is started, and the cooling water continues to circulate in the pattern forming body mounting table 43.
  • step S101 light irradiation conditions are selected. Light irradiation conditions are selected using a touch panel (not shown) of the operation unit 52. Further, the ID number of the organic EL sheet 11 is input.
  • step S102 the process proceeds to step S102.
  • step S ⁇ b> 102 the organic EL sheet 11 is placed on the pattern forming body placement table 43.
  • the pattern forming body mounting table 43 is in a position retracted from the light irradiation unit 32, and the organic EL sheet 11 is mounted and collected at this position.
  • a suction start button is pressed on a touch panel (not shown) of the operation unit 52, and the organic EL sheet 11 is sucked and fixed by a suction hole (not shown) provided on the pattern forming body mounting base 43.
  • step S103 mask alignment is performed, and the mask 14 is placed at a predetermined position.
  • the support body of the mask alignment mechanism unit 69 that supports the mask frame 202 on which the mask 14 is mounted is lowered, and the mask 14 is in close contact with the organic EL sheet 11. Stop just before.
  • a plurality of mask alignment cameras (not shown) move right above each mask alignment mark 16, and the center of the mask alignment mark 16 comes to the center of the cross-shaped organic EL sheet alignment mark 13.
  • X, Y, and ⁇ are adjusted by the mask alignment mechanism 69.
  • the camera is retracted, the mask frame 202 is further lowered, and the mask 14 is brought into close contact with the organic EL sheet 11.
  • step S104 circular step light irradiation is performed.
  • the pattern forming body mounting table 43 moves to the light irradiation position.
  • the movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P1.
  • the gas flow control unit 57 operates the gas flow generation unit 40 to start air cooling.
  • the movement mechanism control unit 55 moves the light irradiation unit 32 through the ball screw 63 so as to be a predetermined place in the light irradiation area P1.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P2.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the movement mechanism control unit 55 moves the light irradiation unit 32 through the ball screw 63 so as to be a predetermined place in the light irradiation area P3.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P4.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the controller 53 determines whether or not a predetermined number of times of light irradiation has been performed. If the predetermined number of times of light irradiation has not been performed, the light irradiation area P1 is moved and light irradiation is repeated. When it is determined that the predetermined number of times of light irradiation has been performed, the process proceeds to the next step S105.
  • step S105 the gas flow control unit 57 stops the operation of the gas flow generation unit 40 and ends the air cooling.
  • the process proceeds to step S106.
  • step S106 the pattern forming body mounting table 43 moves to the retracted position.
  • step S107 the mask 14 is separated from the organic EL sheet (mask withdrawal).
  • step S108 the adsorption of the pattern forming body mounting table 43 is completed, and the organic EL sheet is collected.
  • the step movement of the irradiating light can be performed immediately by controlling the light emission of the plurality of light sources (LEDs) 35 by the light source controller 56. Therefore, the tact time can be shortened by the time required for the step movement as compared with the first embodiment. Other processes can be performed in the same manner as in the second embodiment.
  • the organic EL device includes one or a plurality of organic functional layers between at least a pair of electrodes.
  • the organic functional layer in the present invention refers to a layer containing an organic compound. Examples thereof include a hole injection layer, a hole transport layer, a light emitting layer (including a blue light emitting layer, a green light emitting layer, and a red light emitting layer), an electron transport layer, and an electron injection layer.
  • the organic EL element according to the present invention can take various configurations, and an example is shown in FIG. In FIG. 12, the aspect ratio is not accurate for explanation.
  • the organic EL element 12 is provided on a substrate 113, and is configured by using a first electrode 71 (transparent electrode), an organic material, and the like in order from the substrate 113 side.
  • the functional layer group 73 and the second electrode 75a (counter electrode) are stacked in this order.
  • An extraction electrode 116 is provided at the end of the first electrode 71 (consisting of the base layer 71a and the electrode layer 71b).
  • the first electrode 71 and an external power source (not shown) are electrically connected via the extraction electrode 116.
  • the organic EL element 12 shows a configuration example in which generated light (emitted light h) is extracted from at least the substrate 113 side. That is, the case where the first electrode 71 is a transparent electrode and the second electrode 75a is a non-transparent electrode is shown.
  • the layer structure constituting the organic EL element 12 to be applied is not limited, and may be a general layer structure.
  • the first electrode 71 functions as an anode (anode) and the second electrode 75a functions as a cathode (cathode).
  • the organic functional layer group 73 has a structure in which the hole injection layer 73a / hole transport layer 73b / light emitting layer 73c / electron transport layer 73d / electron injection are sequentially arranged from the first electrode 71 side which is an anode.
  • stacked the layer 73e is illustrated, it is essential to have the light emitting layer 73c containing a luminescent compound at least among these.
  • the hole injection layer 73a and the hole transport layer 73b may be provided as a hole transport injection layer.
  • the electron transport layer 73d and the electron injection layer 73e may be provided as an electron transport injection layer.
  • the organic functional layer group 73 may be laminated with a hole blocking layer, an electron blocking layer, and the like in necessary portions in addition to these constituent layers.
  • the light emitting layer 73c may have a structure in which each color light emitting layer that generates light emitted in each wavelength region is laminated, and each of these color light emitting layers is laminated via a non-light emitting intermediate layer.
  • the intermediate layer may function as a hole blocking layer and an electron blocking layer.
  • the second electrode 75a serving as the cathode may also have a laminated structure as necessary. In such a configuration, only a portion where the organic functional layer group 73 is sandwiched between the first electrode 71 and the second electrode 75 a becomes a light emitting region in the organic EL element 12.
  • the auxiliary electrode 115 may be provided in contact with the electrode layer 71 b of the first electrode 71 for the purpose of reducing the resistance of the first electrode 71.
  • the organic EL element 12 having the above configuration is sealed with a sealing member 117 on the substrate 113 for the purpose of preventing deterioration of the organic functional layer group 73 configured using an organic material or the like due to harmful gas. It has been stopped.
  • This sealing member 117 is fixed to the substrate 113 side via an adhesive 119.
  • the extraction electrode 116 of the first electrode 71 and the terminal portion of the second electrode 75a are exposed from the sealing member 117 while being insulated from each other by the organic functional layer group 73 on the substrate 113. Is provided.
  • the patterning apparatus of the present invention can be suitably used in a method for manufacturing an organic electroluminescent element that manufactures an organic electroluminescent element in which a light emitting pattern is formed.
  • the present invention can be suitably employed in a method for manufacturing an organic electroluminescence element, wherein the edge portion of the light emission pattern has a luminance distribution within a range of 10 to 300 ⁇ m.
  • Such an organic EL element having a luminance distribution with an edge portion of the light emission pattern within a range of 10 to 300 ⁇ m can be manufactured by patterning the organic EL element using the patterning device of the present invention. it can.
  • the edge part of the light emission pattern refers to the side of the light emission pattern formed by the light shielding part in the mask.
  • ⁇ is a collimation half angle
  • t is an air conversion length from the light shielding film to the organic layer
  • t ts / n. Due to the irradiance distribution in the vicinity of the edge portion E of the light shielding film, the edge portion of the light emission pattern of the organic EL element irradiated with light is also inclined such that the luminance decreases as it goes from the light emitting portion to the non-light emitting portion, for example.
  • the luminance distribution has. Since the width of the inclination determines the resolution of the light emission pattern, it is preferable to design the apparatus with a collimation half angle at which a desired resolution can be obtained.
  • the resolution can be increased as the base material of the organic EL element is thinner and the collimation half angle of the irradiation light is smaller.
  • the collimation half angle is reduced, the irradiance cannot be increased.
  • an irradiance of at least 1 W / cm 2 is preferable, and the collimation half angle is made as small as possible with this irradiance.
  • the collimation half angle can be reduced to 23 °.
  • the tact time is prioritized and the increase of the collimation half angle is allowed
  • the collimation half angle ⁇ that can secure 4 W / cm 2 is 45 ° and the substrate thickness is 500 ⁇ m
  • the above ⁇ is 294 ⁇ m
  • the half pitch is 0 .3mm is the resolution limit.
  • the slope of the luminance distribution at the edge is preferably 10 to 300 ⁇ m.
  • the collimation half angle ⁇ is 45 ° and the thickness of the substrate is 130 ⁇ m, ⁇ is 76 ⁇ m, and it is considered that the half pitch 0.1 mm can be sufficiently resolved.
  • an organic EL element having a luminance distribution within a range of 10 to 300 ⁇ m is manufactured by patterning the organic EL element using the patterning apparatus of the present invention. I think you can.
  • the luminance distribution can be measured with a known luminance meter.
  • the luminance distribution can be measured using CA-2000 (manufactured by Konica Minolta), which is a two-dimensional color luminance meter, but is not limited thereto.
  • each of the evaporation crucibles is filled with a hole injection material, a hole transport material, a host compound and a dopant for the light emitting layer, an electron transport material, and an electron injection material in an optimum amount for device fabrication.
  • the evaporation crucible containing the hole injection material is energized and heated to deposit the hole injection material on the substrate to provide a hole injection layer.
  • the evaporation crucible containing the hole transport material is energized and heated to deposit the hole transport material on the hole injection layer, thereby providing a hole transport layer.
  • the deposition crucible containing the host compound and dopant of the light emitting layer is energized and heated, and the host compound and dopant of the light emitting layer are co-deposited on the hole transport layer to provide a light emitting layer.
  • the deposition crucible containing the hole blocking material is energized and heated to deposit the hole blocking material on the light emitting layer, thereby providing a hole blocking layer.
  • the deposition crucible containing the electron transport material is energized and heated to deposit the electron transport material on the hole blocking layer, thereby providing an electron transport layer.
  • the deposition crucible containing the electron injection material is energized and heated to deposit the electron injection material on the electron transport layer to provide an electron injection layer.
  • an organic functional layer can be formed.
  • an organic EL element can be produced. Such an organic EL element is cut into a predetermined size during patterning. The patterning of the organic EL element can be performed as described above. Moreover, the manufacturing method of an organic EL element is not limited to the said method, A well-known method can be used.
  • FIG. 5 shows an example in which the viscoelastic body is in contact with the fixing means on two surfaces as an example of the mask holding mechanism, but is not particularly limited as long as the viscoelastic body can be fixed.
  • the first surface the surface opposite to the viscoelastic mask
  • FIG. 5 all the viscoelastic bodies are fixed by the fixing means, but at least one of the pair of viscoelastic bodies arranged to face each other may be fixed by the fixing means.
  • the fixing means may have a mask detachment preventing function. That is, by making the viscoelastic body higher than the mask and extending the upper surface of the fixing means for fixing the viscoelastic body to the mask side, the fixing means can have a function of preventing the mask from coming off.
  • an aspect in which one side of each side of the mask is positioned and fixed as a fixing pin may be used. Even with such a mask holding mechanism, the same effect as the mask holding mechanism according to the present invention can be obtained. A similar effect can be obtained with a mechanism in which a viscous material having an area (for example, a viscoelastic body (rubber) thin plate) is provided in a portion in contact with the mask and a constant pressure is applied to the member with a hook elastic body via a rigid body. be able to.
  • a viscous material having an area for example, a viscoelastic body (rubber) thin plate
  • the present invention is not limited to this, and continuous light may be irradiated.
  • segments a light irradiation area and irradiates light sequentially with respect to the divided light irradiation area was demonstrated, this invention is not limited to this, A light irradiation area is not divided
  • the patterning apparatus has been described as having a cover, the patterning apparatus may not have a cover.
  • TDAH 1,6-diaminohexane
  • the coating solution obtained above was formed on the PET substrate with a spin coater so that the thickness after modification was 250 nm, left for 2 minutes, and then heat-treated for 1 minute on an 80 ° C. hot plate. And a polysilazane coating film was formed.
  • the substrate was gradually cooled to 25 ° C., and the coating surface was subjected to modification treatment by irradiation with vacuum ultraviolet rays in a vacuum ultraviolet irradiation apparatus.
  • a vacuum ultraviolet irradiation apparatus As a light source of the vacuum ultraviolet irradiation device, an Xe excimer lamp having a double tube structure for irradiating vacuum ultraviolet rays of 172 nm was used.
  • a UV curable resin OPSTAR (registered trademark) Z7527 manufactured by JSR Corporation was applied to a resin substrate so as to have a dry layer thickness of 2 ⁇ m, dried at 80 ° C., and then using a high-pressure mercury lamp in the air. Then, curing was performed under the condition of an irradiation energy amount of 0.5 J / cm 2 .
  • the substrate has an oxygen permeability measured by a method according to JIS K 7126-1987 of 1 ⁇ 10 ⁇ 3 mL / m 2 ⁇ 24 h ⁇ atm or less, and a water vapor permeability of 1 ⁇ 10 ⁇ 4 g / m. it was confirmed that the following gas-barrier substrate 2 ⁇ 24h.
  • a nitrogen-containing compound N-1 represented by the following structural formula was formed in a thickness of 25 nm in a vacuum deposition apparatus, and then silver was formed to a thickness of 10 nm as an anode using a film-forming mask. The film was formed.
  • CuPc copper phthalocyanine
  • N, N′-Di (1-naphthyl) -N, N′-diphenylbenzidine ( ⁇ -NPD) green as a hole transport material 4,4'-Bis (N-carbazolyl) -1,1'-biphenyl (CBP) as the host compound of the light emitting layer
  • Ir (ppy) 3 the dopant of the green light emitting layer
  • tris (8-hydroxyquinolinato) aluminum (Alq 3 ) as an electron transport material
  • LiF as an electron injection material
  • the deposition crucible containing CuPc was energized and heated, and CuPc was deposited on the silver electrode side of the resin substrate at a deposition rate of 0.1 nm / second, A hole injection layer having a layer thickness of 15 nm was provided.
  • the deposition crucible containing ⁇ -NPD is energized and heated, and ⁇ -NPD is deposited on the hole injection layer at a deposition rate of 0.1 nm / second to provide a hole transport layer having a thickness of 25 nm. It was.
  • the evaporation crucible containing 5% by mass of Ir (ppy) 3 and CBP was energized and heated, and Ir (ppy) 3 and CBP were added to the hole transport layer at a total deposition rate of 0.1 nm / second. Co-evaporated on top, a green light emitting layer with a layer thickness of 10 nm was provided.
  • the deposition crucible containing BAlq was energized and heated, and BAlq was deposited on the green light emitting layer at a deposition rate of 0.1 nm / second to provide a hole blocking layer having a layer thickness of 15 nm.
  • the crucible for vapor deposition containing Alq 3 was energized and heated, and Alq 3 was vapor-deposited on the hole blocking layer at a vapor deposition rate of 0.1 nm / second to provide an electron transport layer having a layer thickness of 30 nm.
  • the deposition crucible containing LiF was energized and heated, LiF was deposited on the electron transport layer at a deposition rate of 0.1 nm / second, and an electron injection layer having a thickness of 1 nm was provided. In this way, an organic functional layer was formed.
  • an organic EL element 101 having a size of 6 cm ⁇ 15 cm was produced.
  • an organic EL sheet in which organic EL elements 101 are arranged in 7 rows ⁇ 5 rows was used.
  • the size of the sheet is 70 cm ⁇ 100 cm.
  • ⁇ Preparation of patterned organic EL panel 101 [UV irradiation]
  • the organic EL element 101 was patterned by using the patterning apparatus shown in FIG. The patterning conditions are shown below.
  • the collimation half angle was shaped into a predetermined collimation half angle by the lens array. Further, the lens array was adjusted so that the irradiance was within a range of ⁇ 10% with respect to the average value of the irradiance in the light irradiation area.
  • the collimation half angle and irradiance were measured as follows.
  • the pattern forming body mounting table is moved to the retracted position, and the pinhole is disposed at the same height (hereinafter referred to as the irradiation surface) as the surface on which the organic EL sheet of the pattern forming body mounting table is mounted, instead of the CCD camera.
  • a UV photosensitive paper (Fuji Film UV scale) was placed 10 mm below the pinhole. Next, ultraviolet light was irradiated from the light irradiation part to the pinhole at an irradiance of 2 W / cm 2 for 10 minutes, and the UV photosensitive paper was exposed by the light passing through the pinhole. The radius of the area discolored by light exposure was measured, and the collimation half angle was calculated. As a result of carrying out this measurement at the center and four corners of the light irradiation area, the collimation half angle was 41 to 45 °.
  • a quartz glass substrate having a thickness of 5 mm and a size of 81.3 cm ⁇ 137.9 cm, a line and space with a half pitch of 0.3 mm in each light emitting area of the organic EL element 101 (white (transparent) every 0.3 mm)
  • a glass mask was attached to the mask frame and placed on the pattern forming body mounting table, and then the organic EL sheet was placed at a predetermined position on the pattern forming body mounting table with the light emitting surface facing up.
  • patterning was performed by irradiating the organic EL sheet with light in an environment at room temperature of 25 ° C.
  • the organic EL sheet is taken out every 5 minutes of integrated irradiation time, and a current is supplied by applying a probe to the electrode of the organic EL element 101 arranged in the center of the sheet, so that the luminance of the light emitting part is 700 cd / m 2.
  • the luminance of the light emitting part and the non-light emitting part was measured.
  • the luminance was measured using a luminance meter CA-2000. This measurement was performed until the total accumulated irradiation time reached 60 minutes.
  • Light source UV-LED with a wavelength of 385 nm
  • Irradiance 4W / cm 2 (collimation half angle: 45 °)
  • Light irradiation conditions 20 cycles of intermittent irradiation with a period of irradiation time of 15 seconds and a turn-off time of 15 seconds (duty ratio 50%) were performed (total 600 seconds). Total irradiation time is 5 minutes.
  • the spraying part was sprayed with the same air volume from both short side directions to the center direction of the mask using a slit-like layered gas flow generating part.
  • Slit position of spraying part 3mm above glass
  • Angle of spray part of gas flow generation part parallel to mask (0 °)
  • a gap between the gas flow generation part and the cover side face 72 mm, and a pair of gas flow generation parts were attached at positions facing the short side of the cover.
  • a patterned organic EL panel 103 was produced in the same manner except that the irradiance was lowered from 4 W / cm 2 to 1 W / cm 2 in the production of the organic EL panel 101.
  • a luminance ratio “(luminance of the light emitting portion) / (luminance of the non-light emitting portion)” is calculated from the luminance of the light emitting portion and the luminance of the non-light emitting portion measured every 5 minutes of the integrated irradiation time, The characteristics of the luminance ratio with respect to the integrated irradiation time are graphed. The results are shown in FIG.
  • an organic EL panel can be produced with an irradiance of 1 W / cm 2 and an integrated irradiation time of 40 minutes.
  • patterning can be performed at a high speed of 10 minutes with an integrated irradiation time of 10 minutes if the irradiance is 4 W / cm 2 and high irradiance.
  • the patterning time of an organic electroluminescent element can be shortened significantly.
  • the present invention is suitable for providing a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element.

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  • Electroluminescent Light Sources (AREA)

Abstract

The present invention addresses the problem of providing a patterning device that can greatly shorten the amount of patterning time for an organic electroluminescent element. This patterning device, which forms a light-emitting pattern by irradiating an organic electroluminescent element with light via a mask, is characterized by being provided with a light irradiation unit that irradiates light having a wavelength within a specific range at an irradiance of at least 1 W/cm2. The patterning device is further characterized in that the irradiance of light within the wavelength range in a light irradiation area is within ±10% of the average value of said irradiance in the light irradiation area. The patterning device is further characterized in that the collimation half-angle of light within the wavelength range in the light irradiation area does not exceed 45°.

Description

パターニング装置及び有機エレクトロルミネッセンス素子の製造方法PATTERNING APPARATUS AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENCE ELEMENT
　本発明は、パターニング装置及び有機エレクトロルミネッセンス素子の製造方法に関する。より詳しくは、本発明は、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できるパターニング装置等に関する。 The present invention relates to a patterning apparatus and a method for manufacturing an organic electroluminescence element. More specifically, the present invention relates to a patterning apparatus and the like that can significantly reduce the patterning time of an organic electroluminescence element.
　従来、有機エレクトロルミネッセンス（以下、「有機ＥＬ」ともいう。）素子に紫外線（ＵＶ）を照射すると照射された領域の発光効率が低下し、パターニングができることが知られている（例えば、特許文献１参照。）。この現象には相反則不軌特性があり、同じ積算光量でも照射パワー密度（放射照度）が高い方が、反応が高速になることが知られている。
　したがって、有機ＥＬ素子にパターニングを行う場合、高い放射照度にした方がパターニング時間を大幅に短縮でき、この結果、タクトタイムを短縮できるため生産性を向上できる。 Conventionally, it is known that when an organic electroluminescence (hereinafter also referred to as “organic EL”) element is irradiated with ultraviolet rays (UV), the luminous efficiency of the irradiated region is reduced and patterning can be performed (for example, Patent Document 1). reference.). This phenomenon has reciprocity failure characteristics, and it is known that the higher the irradiation power density (irradiance) is, the faster the reaction is, even with the same integrated light quantity.
Therefore, when patterning an organic EL element, the patterning time can be significantly shortened when the irradiance is set high, and as a result, the tact time can be shortened and productivity can be improved.
　ところで、マスクパターンを正確に有機ＥＬ素子に形成するためには、照射光ができるだけ平行光に近いことが望ましい。したがって、略平行光にて高い放射照度の光照射装置が望まれるが、高出力光源であるランプやＬＥＤを用いた場合、面発光光源であるため照射光を略平行光（コリメーション半角２°程度）にするにはビーム整形光学部品を多数要するとともに、光線ケラレが多く発生してしまい、特許文献２に示すように放射照度を高めることが困難である。一方、特許文献３には６Ｗ／ｃｍ２と非常に高い放射照度が記載されているが、コリメーション半角を制御していないためコリメーション半角はＬＥＤ放射角の８０°程度と推測され、パターニングには使えないという問題があった。 By the way, in order to accurately form the mask pattern on the organic EL element, it is desirable that the irradiation light be as close to parallel light as possible. Therefore, a light irradiation device having high irradiance with substantially parallel light is desired. However, when a lamp or LED that is a high output light source is used, the irradiation light is substantially parallel light (about a collimation half angle of about 2 °) because it is a surface light source. ) Requires a large number of beam shaping optical components and a large amount of light vignetting occurs, making it difficult to increase the irradiance as shown in Patent Document 2. On the other hand, Patent Document 3 describes a very high irradiance of 6 W / cm 2 , but since the collimation half angle is not controlled, it is estimated that the collimation half angle is about 80 ° of the LED radiation angle and can be used for patterning. There was no problem.
　また、特許文献４にはコリメーション半角を１４°にし、放射照度０．６Ｗ／ｃｍ２まで高めた実施例が記載されているが、有機ＥＬ素子のパターニングには放射照度がまだ不十分である。特許文献４には更なる高放射照度化の手法が記載されていない。 Further, Patent Document 4 describes an example in which the collimation half angle is 14 ° and the irradiance is increased to 0.6 W / cm 2, but the irradiance is still insufficient for patterning the organic EL element. Patent Document 4 does not describe a technique for further increasing the irradiance.
国際公開第２０１４／１７５１３５号International Publication No. 2014/175135 特開２０１４－１３４６５５号公報JP 2014-134655 A 特開２０１４－６５２１１号公報JP 2014-65211 A 特開２０１５－１１４６３３号公報JP2015-114633 A
　本発明は、上記問題・状況に鑑みてなされたものであり、その解決課題は、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できるパターニング装置及び有機エレクトロルミネッセンス素子の製造方法を提供することである。 The present invention has been made in view of the above-described problems and situations, and a problem to be solved is to provide a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element. .
　本発明者は、上記課題を解決すべく、上記問題の原因等について検討する過程において、コリメーション半角を４５°まで許容すれば４Ｗ／ｃｍ２以上の高い放射照度が達成でき、この結果、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できるパターニング装置及び有機エレクトロルミネッセンス素子の製造方法を提供できることを見いだし本発明に至った。
　すなわち、本発明に係る上記課題は、以下の手段により解決される。 In order to solve the above-mentioned problems, the present inventor can achieve a high irradiance of 4 W / cm 2 or more if the collimation half angle is allowed to 45 ° in the process of studying the cause of the above-mentioned problems. The present inventors have found that a patterning apparatus and a method for manufacturing an organic electroluminescence element that can significantly reduce the patterning time of the luminescence element can be provided.
That is, the said subject which concerns on this invention is solved by the following means.
　１．有機エレクトロルミネッセンス素子にマスクを介して光を照射し発光パターンを形成するパターニング装置であって、
　波長が１００～４１０ｎｍの範囲内の光を１Ｗ／ｃｍ２以上の放射照度で照射する光照射部を備え、
　光照射エリア内における前記波長の範囲内の光の放射照度が、当該光照射エリア内における前記放射照度の平均値に対し±１０％の範囲内であり、
　前記光照射エリア内における前記波長の範囲内の光のコリメーション半角が、４５°以下であることを特徴とするパターニング装置。 1. A patterning apparatus for forming a light emission pattern by irradiating light through a mask to an organic electroluminescence element,
A light irradiating unit that irradiates light having a wavelength of 100 to 410 nm with an irradiance of 1 W / cm 2 or more;
The irradiance of light within the wavelength range in the light irradiation area is within a range of ± 10% with respect to the average value of the irradiance in the light irradiation area,
The patterning apparatus according to claim 1, wherein a collimation half angle of light within the wavelength range in the light irradiation area is 45 ° or less.
　２．前記有機エレクトロルミネッセンス素子を載置する被パターン形成体載置台を備え、
　前記被パターン形成体載置台が、冷却機能を有することを特徴とする第１項に記載のパターニング装置。 2. A pattern forming body mounting table on which the organic electroluminescence element is mounted,
2. The patterning apparatus according to claim 1, wherein the pattern forming body mounting table has a cooling function.
　３．前記被パターン形成体載置台が、前記冷却機能として、
　冷却水を前記被パターン形成体載置台の一方から導入し、前記被パターン形成体載置台内を一方向に前記冷却水を流して他方に排出する複数の水路を備えることを特徴とする第２項に記載のパターニング装置。 3. As the cooling function, the patterned object mounting table is as follows.
A cooling water is introduced from one side of the pattern forming body mounting table, and a plurality of water channels are provided to flow the cooling water in one direction through the pattern forming body mounting table and discharge the cooling water to the other. The patterning device according to item.
　４．弾性体による弾性力により、前記マスクを保持するマスク保持機構を備えることを特徴とする第１項から第３項までのいずれか一項に記載のパターニング装置。 4. The patterning apparatus according to any one of claims 1 to 3, further comprising a mask holding mechanism that holds the mask by an elastic force of an elastic body.
　５．気体を前記マスクに吹き付ける気体流発生部を備えることを特徴とする第１項から第４項までのいずれか一項に記載のパターニング装置。 5. The patterning apparatus according to any one of claims 1 to 4, further comprising a gas flow generation unit that blows gas onto the mask.
　６．第１項から第５項までのいずれか一項に記載のパターニング装置により、発光パターンを形成した有機エレクトロルミネッセンス素子を製造する有機エレクトロルミネッセンス素子の製造方法。
　７．前記発光パターンのエッジ部が、１０～３００μｍの範囲内で輝度分布を有することを特徴とする第６項に記載の有機エレクトロルミネッセンス素子の製造方法。 6). The manufacturing method of the organic electroluminescent element which manufactures the organic electroluminescent element in which the light emission pattern was formed with the patterning apparatus as described in any one of Claim 1 to 5.
7). 7. The method of manufacturing an organic electroluminescence element according to claim 6, wherein an edge portion of the light emitting pattern has a luminance distribution within a range of 10 to 300 μm.
　本発明の上記手段により、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できるパターニング装置及び有機エレクトロルミネッセンス素子の製造方法を提供することができる。
　本発明の効果の発現機構ないし作用機構については、明確にはなっていないが、以下のように考えている。 By the above-mentioned means of the present invention, it is possible to provide a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element.
The expression mechanism or action mechanism of the effect of the present invention is not clear, but is considered as follows.
　本発明者が、メタルハライドランプをＵＶ光源とした光照射器にて、放射照度１００ｍＷ／ｃｍ２でパターニング実験を行ったところ、発光部と非発光部の輝度比の値を２００とするための積算照射時間は、約１２時間と非常に時間がかかってしまう結果であった。一方、波長３８５ｎｍのＵＶ－ＬＥＤを光源とした光照射器にて放射照度２Ｗ／ｃｍ２にて照射した場合には、積算照射時間は３０分で済み、さらに４Ｗ／ｃｍ２では１０分と大幅に短縮できた。また、目標輝度比を１００に抑えた場合には放射照度１Ｗ／ｃｍ２でも４０分と１時間以内で済むことが分かった。 When the inventor conducted a patterning experiment with a light irradiator using a metal halide lamp as a UV light source at an irradiance of 100 mW / cm 2 , an integration for setting the luminance ratio value of the light emitting part and the non-light emitting part to 200 is performed. The result was that the irradiation time was very long, about 12 hours. On the other hand, when irradiance is performed with a irradiance of 2 W / cm 2 using a UV-LED with a wavelength of 385 nm as the light source, the total irradiation time is 30 minutes, and further 4 W / cm 2 is as large as 10 minutes. It was shortened to. Further, it was found that when the target luminance ratio was suppressed to 100, 40 minutes and less than 1 hour were required even with an irradiance of 1 W / cm 2 .
　一般に、マスクパターンを正確に有機ＥＬ素子に形成するためには、照射光ができるだけ平行光に近いことが望ましいが、放射照度を高めつつ、平行光とすることは困難である。
　ここで、有機ＥＬ素子の発光パターンは視覚に訴えるものであり、半導体などのようにサブミクロンの解像度は要求されない。そこで、本発明者は、照射光を平行光からずらし、コリメーション半角を３０°まで許容すれば２Ｗ／ｃｍ２以上の高い放射照度を達成させつつ、視覚的に十分な解像度の発光パターンを形成できると考えた。さらに、鋭意検討の結果、コリメーション半角を４５°まで許容すれば４Ｗ／ｃｍ２以上の高い放射照度が達成できることが分かった。なお、コリメーション半角４５°での有機ＥＬ素子のパターニング解像度はラインアンドスペースのハーフピッチで１００μｍまで可能なことを実験で確認しており、視覚的には十分な解像度が得られる。 In general, in order to accurately form a mask pattern on an organic EL element, it is desirable that the irradiated light be as close to parallel light as possible, but it is difficult to make parallel light while increasing the irradiance.
Here, the light emission pattern of the organic EL element is visually appealing, and submicron resolution is not required as in a semiconductor. Therefore, the present inventor can form a light emission pattern with a sufficiently high resolution while achieving a high irradiance of 2 W / cm 2 or more by shifting the irradiation light from the parallel light and allowing the collimation half angle to 30 °. I thought. Furthermore, as a result of intensive studies, it was found that a high irradiance of 4 W / cm 2 or more can be achieved if the collimation half angle is allowed to 45 °. It has been confirmed by experiments that the patterning resolution of the organic EL element at a collimation half angle of 45 ° is possible up to 100 μm with a line and space half pitch, and a sufficient resolution can be obtained visually.
有機ＥＬシートの模式図Schematic diagram of organic EL sheet マスクの模式図Schematic diagram of mask 光照射エリアの一例の模式図Schematic diagram of an example of light irradiation area 本発明のパターニング装置が有する光照射部の一例の透視図The perspective view of an example of the light irradiation part which the patterning apparatus of this invention has 本発明のパターニング装置が有する光照射部の他の一例の透視図The perspective view of another example of the light irradiation part which the patterning apparatus of this invention has マスク保持機構とマスクとを光照射部側から見た概略図Schematic view of the mask holding mechanism and mask as seen from the light irradiation unit side 複合放物面集光器のような集光ミラーの一例を示す概略図Schematic showing an example of a collector mirror such as a compound parabolic concentrator 棒状シリンドリカルレンズの配置の一例を示す断面概略図Schematic cross section showing an example of arrangement of rod-shaped cylindrical lenses 棒状シリンドリカルレンズの配置の一例を示す断面概略図Schematic cross section showing an example of arrangement of rod-shaped cylindrical lenses 被パターン形成体載置台の冷却機能の一例を示す概略図Schematic which shows an example of the cooling function of a to-be-patterned body mounting base 本発明のパターニング装置の一例の全体構成図（Ｘ軸方向透視図）1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (X-axis direction perspective view). 本発明のパターニング装置の一例の全体構成図（Ｙ軸方向透視図）1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (Y-axis direction perspective view). 本発明のパターニング方法の一例の操作フロー図Operation flow diagram of an example of patterning method of the present invention 有機ＥＬ素子の一例の断面図Cross-sectional view of an example of an organic EL element マスク遮光膜のエッジ部近辺での放射照度分布を示す説明図Explanatory drawing which shows irradiance distribution in the edge part vicinity of a mask light shielding film マスク遮光膜のエッジ部近辺での放射照度分布を示すグラフA graph showing the irradiance distribution near the edge of the mask light-shielding film 実施例に係る有機ＥＬ素子の輝度比の積算照射時間に対する特性を示すグラフThe graph which shows the characteristic with respect to the integrated irradiation time of the luminance ratio of the organic EL element which concerns on an Example
　本発明のパターニング装置は、有機エレクトロルミネッセンス素子にマスクを介して光を照射し発光パターンを形成するパターニング装置であって、波長が１００～４１０ｎｍの範囲内の光を１Ｗ／ｃｍ２以上の放射照度で照射する光照射部を備え、光照射エリア内における前記波長の範囲内の光の放射照度が、当該光照射エリア内における前記放射照度の平均値に対し±１０％の範囲内であり、前記光照射エリア内における前記波長の範囲内の光のコリメーション半角が、４５°以下であることを特徴とする。この特徴は各請求項に係る発明に共通又は対応する技術的特徴である。これにより、本発明は、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できるという効果を得られる。 The patterning apparatus of the present invention is a patterning apparatus that forms a light emission pattern by irradiating light through a mask to an organic electroluminescence element, and irradiances light having a wavelength in the range of 100 to 410 nm to 1 W / cm 2 or more. The light irradiance of irradiating light in the light irradiation area within the range of the wavelength in the light irradiation area is within ± 10% of the average value of the irradiance in the light irradiation area, The collimation half angle of the light within the wavelength range in the light irradiation area is 45 ° or less. This feature is a technical feature common to or corresponding to the claimed invention. Thereby, this invention can acquire the effect that the patterning time of an organic electroluminescent element can be shortened significantly.
　本発明の実施態様としては、前記有機エレクトロルミネッセンス素子を載置する被パターン形成体載置台を備え、前記被パターン形成体載置台が、冷却機能を有することが好ましい。これにより、高い放射照度とした場合に伴う熱の影響を低減できる。 As an embodiment of the present invention, it is preferable that a pattern forming body mounting table on which the organic electroluminescence element is mounted is provided, and the pattern forming body mounting table has a cooling function. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
　本発明においては、前記被パターン形成体載置台が、前記冷却機能として、冷却水を前記被パターン形成体載置台の一方から導入し、前記被パターン形成体載置台内を一方向に前記冷却水を流して他方に排出する複数の水路を備えることが好ましい。これにより、高い放射照度とした場合に伴う熱の影響を低減できる。 In the present invention, as the cooling function, the pattern forming body mounting table introduces cooling water from one of the pattern forming body mounting tables, and the cooling water is unidirectionally passed through the pattern forming body mounting table. It is preferable to provide a plurality of water channels that flow and discharge to the other. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
　本発明においては、弾性体による弾性力により、前記マスクを保持するマスク保持機構を備えることが好ましい。これにより、高い放射照度とした場合に伴う熱の影響を低減できる。 In the present invention, it is preferable to provide a mask holding mechanism for holding the mask by an elastic force of an elastic body. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
　本発明においては、気体を前記マスクに吹き付ける気体流発生部を備えることが好ましい。これにより、高い放射照度とした場合に伴う熱の影響を低減できる。 In the present invention, it is preferable to provide a gas flow generation unit that blows gas onto the mask. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
　本発明のパターニング装置は、発光パターンを形成した有機エレクトロルミネッセンス素子を製造する有機エレクトロルミネッセンス素子の製造方法に好適に採用できる。中でも、前記発光パターンのエッジ部が、１０～３００μｍの範囲内で輝度分布を有することを特徴とする有機エレクトロルミネッセンス素子の製造方法に好適に採用できる。 The patterning apparatus of the present invention can be suitably employed in a method for manufacturing an organic electroluminescent element that manufactures an organic electroluminescent element having a light emitting pattern. In particular, the present invention can be suitably used in a method for manufacturing an organic electroluminescence device, wherein the edge portion of the light emission pattern has a luminance distribution within a range of 10 to 300 μm.
　以下、本発明とその構成要素、及び本発明を実施するための形態・態様について詳細な説明をする。なお、本願において、「～」は、その前後に記載される数値を下限値及び上限値として含む意味で使用する。 Hereinafter, the present invention, its components, and modes and modes for carrying out the present invention will be described in detail. In the present application, “˜” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
　≪パターニング装置の概要≫
　本発明のパターニング装置は、有機エレクトロルミネッセンス素子にマスクを介して光を照射し発光パターンを形成するパターニング装置であって、波長が１００～４１０ｎｍの範囲内の光を１Ｗ／ｃｍ２以上の放射照度で照射する光照射部を備え、光照射エリア内における前記波長の範囲内の光の放射照度が、当該光照射エリア内における前記放射照度の平均値に対し±１０％の範囲内であり、前記光照射エリア内における前記波長の範囲内の光のコリメーション半角が、４５°以下であることを特徴とする。
　パターニング装置は、その光照射エリアによって、後述の第１の形態及び第２の形態が考えられるが、本発明のパターニング装置はこれに限定されない。 ≪Overview of patterning device≫
The patterning apparatus of the present invention is a patterning apparatus that forms a light emission pattern by irradiating light through a mask to an organic electroluminescence element, and irradiances light having a wavelength in the range of 100 to 410 nm to 1 W / cm 2 or more. The light irradiance of irradiating light in the light irradiation area within the range of the wavelength in the light irradiation area is within ± 10% of the average value of the irradiance in the light irradiation area, The collimation half angle of the light within the wavelength range in the light irradiation area is 45 ° or less.
Although the patterning apparatus can consider the 1st form and 2nd form mentioned later by the light irradiation area, the patterning apparatus of this invention is not limited to this.
　図１Ａは、有機ＥＬシートの模式図である。有機ＥＬシート１１には複数の有機ＥＬ素子１２が形成されており、四隅に有機ＥＬシート用アライメントマーク１３が形成されている。このアライメントマークは有機ＥＬ素子の製造において電極や有機層を成膜する際の成膜用マスクのアライメントで使用されるものである。
　図１Ｂは、マスクの模式図である。マスク１４には、各有機ＥＬ素子１２に対応した位置に所定の光照射パターン１５（図の例では文字Ａ）が形成され、有機ＥＬシート１１のアライメントマーク１３の位置に対応したマスク用アライメントマーク１６が形成されている。図で黒塗りした部分が遮光膜で紫外線を遮光する。したがって、有機ＥＬ素子１２には文字Ａ以外の発光エリアに紫外線光が照射され、発光しないことになり、有機ＥＬ素子１２としては文字Ａのみが発光する。マスクの基材としては線膨張係数の小さい石英ガラスや耐熱ガラス（例えば、ショット社製テンパックス　フロート（登録商標））が好ましく、遮光膜は紫外線吸収率の低いクロム膜や酸化クロム膜が望ましい。
　なお、パターニングが終了した後に、有機ＥＬシート１１は有機ＥＬ素子１２ごとに切断される。切断された各個別の有機ＥＬ素子は、それぞれ個別に表示装置等に装填されるために用いられる。 FIG. 1A is a schematic diagram of an organic EL sheet. A plurality of organic EL elements 12 are formed on the organic EL sheet 11, and organic EL sheet alignment marks 13 are formed at four corners. This alignment mark is used for alignment of a film formation mask when forming an electrode or an organic layer in the manufacture of an organic EL element.
FIG. 1B is a schematic diagram of a mask. A predetermined light irradiation pattern 15 (character A in the example in the figure) is formed on the mask 14 at a position corresponding to each organic EL element 12, and a mask alignment mark corresponding to the position of the alignment mark 13 on the organic EL sheet 11 is formed. 16 is formed. In the figure, the blackened portion shields the ultraviolet rays by the light shielding film. Accordingly, the organic EL element 12 is irradiated with ultraviolet light in a light emitting area other than the letter A and does not emit light, and only the letter A emits light as the organic EL element 12. The mask base material is preferably quartz glass or heat-resistant glass (for example, Tempax Float (registered trademark) manufactured by Schott), and the light-shielding film is preferably a chromium film or a chromium oxide film having a low ultraviolet absorption rate.
Note that the organic EL sheet 11 is cut for each organic EL element 12 after the patterning is completed. Each individual organic EL element thus cut is used to be individually loaded into a display device or the like.
　図２は、光照射エリアを表した模式図である。
　図の点線部が複数の光照射エリアで、図２の場合は４個の光照射エリア（Ｐ１～Ｐ４）に区分されている場合を例示している。
　この４個の光照射エリアを、１パルス光照射で周回して光照射する場合を例示する。まず、光照射エリアＰ１で１パルス光照射後、次いで光照射エリアＰ２にて１パルス光照射する。続いて光照射エリアＰ３及びＰ４についても各々１パルス光照射する。その後、光照射エリアＰ１について再度１パルス光照射する、といったように、１パルス光照射を順次繰り返す。このように周回して光を照射することで、光照射エリアＰ１を再度光照射するまでに待ち時間を設けることができ、この結果、この待ち時間で光照射エリアＰ１が冷却されるため、パターニングの際におけるマスクや有機ＥＬシートでの熱蓄積を抑えることができる。
　この周回光照射方式の場合、分割される光照射エリアの個数に特に制限はないが、タクトタイムを短くする観点から、９個以下であることが好ましく、４個以下であることが好ましい。更に好ましくは２個に分割されることである。
　光照射エリアの周回パターンとしては、例えば、（光照射エリアＰ１→光照射エリアＰ２→光照射エリアＰ１→光照射エリアＰ２）と繰り返されるケースが挙げられるが、少なくとも一つの光照射エリアで再度光照射が行われれば、いずれの光照射パターンであっても良い。
　例えば、（光照射エリアＰ１→光照射エリアＰ２→光照射エリアＰ１）のように追加の光照射が行われない光照射エリアがあってもよい。
　また（光照射エリアＰ１→光照射エリアＰ２→光照射エリアＰ３→光照射エリアＰ４→光照射エリアＰ３→光照射エリアＰ２→光照射エリアＰ１→光照射エリアＰ４）のように、２周目の光照射の順番が１周目の光照射の順番と異なっていても良い。
　なお、有機層の紫外線吸収率がシート面内で分布を持つ場合には、各ポジションで照度や１パルス光の照射時間を変えても良い。 FIG. 2 is a schematic diagram showing a light irradiation area.
The dotted line portion in the figure is a plurality of light irradiation areas, and in the case of FIG. 2, the case where it is divided into four light irradiation areas (P1 to P4) is illustrated.
A case where light irradiation is performed by rotating around these four light irradiation areas with one pulse light irradiation will be exemplified. First, one pulse of light is irradiated in the light irradiation area P1, and then one pulse of light is irradiated in the light irradiation area P2. Subsequently, the light irradiation areas P3 and P4 are each irradiated with one pulse light. Thereafter, the one-pulse light irradiation is sequentially repeated such that the light irradiation area P1 is again irradiated with one pulse light. By irradiating with light in this way, a waiting time can be provided before the light irradiation area P1 is again irradiated with light. As a result, the light irradiation area P1 is cooled by this waiting time. In this case, heat accumulation in the mask and the organic EL sheet can be suppressed.
In this circulating light irradiation method, the number of light irradiation areas to be divided is not particularly limited, but is preferably 9 or less, and preferably 4 or less from the viewpoint of shortening the tact time. More preferably, it is divided into two.
As a circular pattern of the light irradiation area, for example, a case of repeating (light irradiation area P1 → light irradiation area P2 → light irradiation area P1 → light irradiation area P2) can be cited, but light is emitted again in at least one light irradiation area. Any irradiation pattern may be used as long as irradiation is performed.
For example, there may be a light irradiation area where no additional light irradiation is performed, such as (light irradiation area P1 → light irradiation area P2 → light irradiation area P1).
In addition, as shown in (light irradiation area P1 → light irradiation area P2 → light irradiation area P3 → light irradiation area P4 → light irradiation area P3 → light irradiation area P2 → light irradiation area P1 → light irradiation area P4) The order of light irradiation may be different from the order of light irradiation in the first round.
In addition, when the ultraviolet absorption rate of an organic layer has distribution within a sheet | seat surface, you may change illumination intensity and irradiation time of 1 pulsed light in each position.
　＜パターニング装置の第１の形態＞
　本発明のパターニング装置としては、複数の有機ＥＬ素子が備えられた有機ＥＬシートが載置される被パターン形成体載置台と、前記有機ＥＬシートの複数の光照射エリアに光照射をする少なくとも１個の光源を備えた光照射部と、前記光照射部の位置と前記被パターン形成体載置台との相対位置を変化させるステップ移動部と、前記複数の光照射エリアでの積算光量が、それぞれの光照射エリアで所定量となるように光照射部を制御する制御部を備え、前記ステップ移動部は、前記複数の光照射エリアのうち、少なくとも一つの光照射エリア（Ａ）でパルス光の照射を行った後に、前記光照射エリア（Ａ）以外の光照射エリアのうちの少なくとも一つの光照射エリア（Ｂ）でパルス光の照射を行う位置に光照射部又は被パターン形成体載置台を移動させ、前記光照射エリア（Ｂ）でパルス光の照射を行った後に、光照射エリア（Ａ）に再度パルス光の照射を行う位置に光照射部又は被パターン形成体載置台を移動させるステップ移動部である有機ＥＬ素子のパターニング装置であることが好ましい。
　図３は、本発明のパターニング装置の一例（第１の形態）の透視図である。
　パターニング装置３１は光源部３００、カバー３９、気体流発生部４０で構成される光照射部３２、前記光照射部３２からの照射光３８をパターン化して有機ＥＬシート１１に光照射するためのマスク１４及び被パターン形成体載置台４３から成る。
　光源部３００は紫外線を発光する光源３５（例えば、波長３６５ｎｍや３８５ｎｍのＵＶ－ＬＥＤ）と光源３５を２次元状（平面状）に配置した光源基板３４から構成されており、光源基板３４から光源３５へ駆動電流を供給する。光源部３００は、さらに光源３５で発生した熱を外部に逃がす放熱板３３を備えており、光源３５の発光効率の低下を防止する。放熱板３３の内部に冷却管を備え、冷却水を循環させ光源３５を水冷することがより好ましい。光源部３００から出射した発散光はレンズアレイ３７で所定の広がり角の光束に整形された照射光３８とされる。レンズアレイ３７はレンズアレイ支持体３６により光源部３００に固定される。照射光３８は内面が反射面となっているカバー３９で閉じ込められ光量の低下を防ぎ、かつ均一な光量でマスク１４を介して有機ＥＬシート１１に対し光を照射し発光パターンを形成する。 <First Patterning Apparatus>
As the patterning apparatus of the present invention, at least one for irradiating light on a pattern forming body mounting table on which an organic EL sheet provided with a plurality of organic EL elements is mounted, and a plurality of light irradiation areas of the organic EL sheet. A light irradiation unit including a plurality of light sources, a step moving unit that changes a relative position between the position of the light irradiation unit and the pattern forming body mounting table, and an integrated light amount in each of the plurality of light irradiation areas, A control unit that controls the light irradiation unit so as to be a predetermined amount in the light irradiation area of the plurality of light irradiation areas, wherein the step moving unit is configured to emit pulsed light in at least one of the plurality of light irradiation areas (A). After the irradiation, the light irradiation part or the pattern forming body is placed at a position where pulse light irradiation is performed in at least one light irradiation area (B) of the light irradiation areas other than the light irradiation area (A). , And after irradiating the light irradiation area (B) with the pulsed light, the light irradiating part or the pattern forming body mounting table is moved to a position where the light irradiation area (A) is again irradiated with the pulsed light. A patterning device for an organic EL element which is a step moving unit is preferable.
FIG. 3 is a perspective view of an example (first embodiment) of the patterning apparatus of the present invention.
The patterning device 31 is a mask for irradiating the organic EL sheet 11 by patterning the light irradiation unit 32 including the light source unit 300, the cover 39, and the gas flow generation unit 40, and the irradiation light 38 from the light irradiation unit 32. 14 and a pattern forming body mounting table 43.
The light source unit 300 includes a light source 35 that emits ultraviolet light (for example, a UV-LED having a wavelength of 365 nm or 385 nm) and a light source substrate 34 in which the light source 35 is arranged two-dimensionally (planar). A driving current is supplied to 35. The light source unit 300 further includes a heat radiating plate 33 that releases heat generated by the light source 35 to the outside, and prevents a decrease in light emission efficiency of the light source 35. More preferably, a cooling pipe is provided inside the heat radiating plate 33 and the cooling water is circulated to cool the light source 35 with water. The divergent light emitted from the light source unit 300 is used as the irradiation light 38 shaped into a light beam having a predetermined divergence angle by the lens array 37. The lens array 37 is fixed to the light source unit 300 by the lens array support 36. The irradiation light 38 is confined by a cover 39 whose inner surface is a reflection surface to prevent the light amount from decreasing, and the organic EL sheet 11 is irradiated with light with a uniform light amount through the mask 14 to form a light emission pattern.
　光源３５から出射される光は、タクトタイム低減の観点から、光照射による有機機能層の失活反応速度が速い紫外線であることが好ましい。また、出射する光はパルス光であることが好ましく、タクトタイムの低減及び有機ＥＬシートの正確なパターニングを行う観点から、１回の光照射ステップで行われるパルス光照射は、１パルス光の照射であることが好ましい。必要に応じ複数のパルス光の照射の間に、消灯時間を入れたマルチパルス光の照射にしてもよい。 The light emitted from the light source 35 is preferably ultraviolet light that has a fast deactivation reaction rate of the organic functional layer due to light irradiation from the viewpoint of reducing the tact time. The emitted light is preferably pulsed light. From the viewpoint of reducing the tact time and accurately patterning the organic EL sheet, the pulsed light irradiation performed in one light irradiation step is irradiation with one pulsed light. It is preferable that If necessary, multi-pulse light irradiation may be performed with a turn-off time between a plurality of pulse light irradiations.
　光照射エリア周辺部の光量を確保するためには、カバー３９下端とマスク１４の間隙４２はできるだけ狭い方が良く、５ｍｍ程度が望ましい。この間隔であれば、気体流発生部４０により、マスク１４に層状の気体を一様に吹き付けることができる。
　光源３５（ＬＥＤ）は、後述の光源制御部により点灯、消灯や点灯時の照射出力、照射時間が制御されパルス光の照射を行う。 In order to secure the amount of light in the periphery of the light irradiation area, the gap 42 between the lower end of the cover 39 and the mask 14 should be as narrow as possible, and preferably about 5 mm. If it is this space | interval, the gas flow generation | occurrence | production part 40 can spray layered gas on the mask 14 uniformly.
The light source 35 (LED) is irradiated with pulsed light by being controlled by a light source control unit, which will be described later, to be turned on and off, and to have an irradiation output and irradiation time at the time of lighting.
　有機ＥＬシート１１は、被パターン形成体載置台４３に載置され、マスク１４が有機ＥＬシート１１と所定の相対位置に調整され、シートの上に載置される。有機ＥＬシート１１は、吸着固定されることが好ましい。 The organic EL sheet 11 is placed on the pattern forming body placing table 43, and the mask 14 is adjusted to a predetermined relative position with the organic EL sheet 11 and placed on the sheet. The organic EL sheet 11 is preferably fixed by adsorption.
　図３に示す被パターン形成体載置台４３は、後述の冷却機能として、内部に水路４４ｂがはり巡らされており、紫外線照射によりマスク１４や有機ＥＬシートで発生した熱を冷却する。
　気体流発生部４０からは気体が吹き出し、マスク１４の表面を冷却する。
　図３のパターニング装置３１の場合には、光照射部３２が、有機ＥＬシート１１の最初の光照射エリアＰ１をパルス光照射した後、光照射部３２及び被パターン形成体載置台４３がステップ移動し、次の光照射エリアＰ２をパルス光照射する。このようにして全光照射エリアが照射された後、再度光照射エリアＰ１が照射される。
　このようなパターニング装置３１により、マスク１４の熱による変形や、有機ＥＬシート１１の熱による性能（例えば、色バランス）の劣化を防止でき、正確なパターニングが行えるため好ましい。また、パターニングにかかるタイムタクトを短くすることができ、生産性をより向上できる。 The pattern forming body mounting table 43 shown in FIG. 3 has a water channel 44b provided therein as a cooling function to be described later, and cools heat generated in the mask 14 and the organic EL sheet by ultraviolet irradiation.
A gas blows out from the gas flow generation unit 40 to cool the surface of the mask 14.
In the case of the patterning apparatus 31 of FIG. 3, after the light irradiation unit 32 irradiates the first light irradiation area P <b> 1 of the organic EL sheet 11 with the pulsed light, the light irradiation unit 32 and the pattern forming body mounting table 43 move stepwise. Then, the next light irradiation area P2 is irradiated with pulsed light. After the entire light irradiation area is irradiated in this way, the light irradiation area P1 is irradiated again.
Such a patterning device 31 is preferable because it can prevent deformation of the mask 14 due to heat and deterioration of performance (for example, color balance) due to heat of the organic EL sheet 11, and can perform accurate patterning. Further, the time tact for patterning can be shortened, and the productivity can be further improved.
　＜パターニング装置の第２の形態＞
　本発明のパターニング装置としては、複数の有機ＥＬ素子が備えられた有機ＥＬシートを載置する被パターン形成体載置台と、前記有機ＥＬシートの複数の光照射エリアに光照射をする複数の光源と、前記複数の光源を制御する制御部を備える有機ＥＬシートのパターニング装置であって、前記複数の光源の位置が固定されており、前記複数の光照射エリアは、前記複数の光源のいずれかに対応付けられており、前記制御部は、複数の光源を制御して少なくとも一つの光照射エリア（Ａ）でパルス光の照射を行った後に、前記光照射エリア（Ａ）以外の光照射エリアのうちの少なくとも一つの光照射エリア（Ｂ）でパルス光の照射を行い、前記光照射エリア（Ｂ）でパルス光の照射を行った後に、光照射エリア（Ａ）に再度パルス光の照射を行わせ、複数の光照射エリアでの積算光量が、それぞれの光照射エリアで所定量となるように光源を制御することを特徴とする有機ＥＬ素子のパターニング装置であることが好ましい。 <Second Patterning Apparatus>
As the patterning apparatus of the present invention, a pattern forming body mounting table for mounting an organic EL sheet provided with a plurality of organic EL elements, and a plurality of light sources for irradiating a plurality of light irradiation areas of the organic EL sheet And an organic EL sheet patterning device comprising a control unit for controlling the plurality of light sources, wherein the positions of the plurality of light sources are fixed, and the plurality of light irradiation areas are any of the plurality of light sources. The control unit controls a plurality of light sources to irradiate pulse light in at least one light irradiation area (A), and then, the light irradiation area other than the light irradiation area (A). After irradiating pulsed light in at least one light irradiation area (B), irradiating pulsed light in the light irradiation area (B), irradiating the light irradiation area (A) again with pulsed light. Align, accumulated light quantity of a plurality of light irradiation area is preferably a respective patterning apparatus of the organic EL element and controls the light source so that the predetermined amount in the transmission area.
　図４は、本発明のパターニング装置における光照射部の他の一例（第二の形態）の透視図である。
　第一の形態における光源数よりも多い、複数の光源３５（ＬＥＤ）が２次元状に配置され、光照射部３２全体から出射される光の照射エリアは有機ＥＬシート１１中の有機ＥＬ素子１２が配置されている領域全面をカバーできるエリアとなっている。即ち、光源３５を全て点灯させた場合には、図２における光照射エリアＰ１、Ｐ２、Ｐ３及Ｐ４の領域を全てカバーする光照射エリアとなっている。光源３５はグループごとに制御可能となっており、最初の光照射ステップで、第１のグループのＬＥＤ光源のみが点灯され、図２におけるＰ１の光照射エリアを照射する照射光３８が発光される。この後に、次の光照射ステップで、図２におけるＰ２の光照射エリアを照射する照射光３８が発光される。このようにグループごとに点灯させて周回光照射を行うことにより、パターニング装置の第１の形態における光照射部の移動時間を無くすことができ、タクトタイムを低減できる。
　なお、図４に示す例では、１台の光照射部３２内の光源３５を順次点灯させるが、前述のパターニング装置の第１の形態における光照射部３２を複数（例えば４台）配置し、各光照射エリア（Ｐ１～Ｐ４）の光照射に応じて順次各光照射部３２を発光させてもよい。 FIG. 4 is a perspective view of another example (second embodiment) of the light irradiation unit in the patterning apparatus of the present invention.
A plurality of light sources 35 (LEDs) more than the number of light sources in the first embodiment are two-dimensionally arranged, and an irradiation area of light emitted from the entire light irradiation unit 32 is the organic EL element 12 in the organic EL sheet 11. It is an area that can cover the entire area where the. That is, when all the light sources 35 are turned on, the light irradiation area covers all the light irradiation areas P1, P2, P3, and P4 in FIG. The light sources 35 can be controlled for each group. In the first light irradiation step, only the LED light sources of the first group are turned on, and the irradiation light 38 that irradiates the light irradiation area P1 in FIG. 2 is emitted. . Thereafter, in the next light irradiation step, irradiation light 38 for irradiating the light irradiation area P2 in FIG. 2 is emitted. In this way, by turning on each group and irradiating around light, it is possible to eliminate the movement time of the light irradiation unit in the first embodiment of the patterning apparatus, and to reduce the tact time.
In the example shown in FIG. 4, the light sources 35 in one light irradiation unit 32 are sequentially turned on, but a plurality of (for example, four) light irradiation units 32 in the first embodiment of the patterning device described above are arranged, Each light irradiation unit 32 may be caused to emit light sequentially in accordance with light irradiation in each light irradiation area (P1 to P4).
　次に、パターニング装置の各構成部について説明する。 Next, each component of the patterning apparatus will be described.
　［マスク］
　マスクは、有機ＥＬ素子に照射する光量を変える役割を有する。
　マスクは、一例として、ガラス基板と遮光膜との２層構成（図示略）となっており、遮光膜がマスクフレーム２０２側となるように、マスク保持機構２００に装着される。
　紫外線の透過光量を変えることができる公知の材料を用いて、ガラス基板上にネガ状のパターンを有するマスクを作製することができるが、特に、線膨張率の低い石英基板に紫外線吸収率が比較的低いクロム遮光膜をパターン付与したものが、熱変形を抑制できる点で好ましい。このようなマスクを用い、有機ＥＬ素子に紫外線照射することにより、発光パターンを有する有機ＥＬ素子を作製することができる。 [mask]
A mask has a role which changes the light quantity irradiated to an organic EL element.
As an example, the mask has a two-layer configuration (not shown) of a glass substrate and a light shielding film, and is mounted on the mask holding mechanism 200 so that the light shielding film is on the mask frame 202 side.
A mask having a negative pattern on a glass substrate can be prepared using a known material that can change the amount of transmitted UV light, but the UV absorption rate is particularly compared to a quartz substrate with a low linear expansion coefficient. A low-chromium light-shielding film provided with a pattern is preferable in that thermal deformation can be suppressed. By using such a mask and irradiating the organic EL element with ultraviolet rays, an organic EL element having a light emission pattern can be manufactured.
　なお、ここでいう「パターン」とは、有機ＥＬ素子により表示される図案（図の柄や模様）、文字、画像等をいう。「パターニング」とは、これらのパターン表示機能を持たせることをいう。
　また、「発光パターン」とは、有機ＥＬ素子が発光する際、所定の図案（図の柄や模様）、文字、画像等に基づいて、発光面の位置により発光強度（輝度）を変えて光を発光させるためにあらかじめ当該有機ＥＬ素子に形成（付与）される所定の図案（図の柄や模様）、文字、画像等を表示させる機能を有する発生源をいう。 Here, the “pattern” means a design (pattern or pattern in the figure), characters, images, etc. displayed by the organic EL element. “Patterning” refers to providing these pattern display functions.
The “light emission pattern” refers to light emitted from an organic EL element that emits light with varying light emission intensity (luminance) depending on the position of the light emitting surface, based on a predetermined design (pattern or pattern in the figure), characters, images, etc. A source having a function of displaying a predetermined design (design or pattern in the figure), characters, images, etc. formed (applied) in advance on the organic EL element to emit light.
　本発明においては、有機ＥＬシートが、冷却機能を有する被パターン形成体載置台に載置され、マスクが有機ＥＬ素子と所定の相対位置に位置決めされて、素子の上に密着して載置されることが好ましい。これは、光が照射されることで発熱源となるマスク遮光膜の冷却効果を高めることができるためであり、具体的には、マスク遮光膜を有機ＥＬ素子に密着させることが好ましい。 In the present invention, the organic EL sheet is placed on a pattern forming body placing table having a cooling function, the mask is positioned at a predetermined relative position with the organic EL element, and is placed in close contact with the element. It is preferable. This is because the cooling effect of the mask light-shielding film serving as a heat source can be enhanced by light irradiation. Specifically, it is preferable that the mask light-shielding film is in close contact with the organic EL element.
　（ガラス基板）
　ガラス基板としては、素材として、特に限定されることがなく、例えば、光学用や基板用に用いられる公知のガラス素材を用いることができる。具体的には、アルミノシリケートガラス、ソーダライムガラス、ソーダアルミノケイ酸ガラス、アルミノボロシリケートガラス、ボロシリケートガラス、石英ガラス、チェーンシリケートガラス、結晶化ガラス等のガラスセラミック、リン酸系ガラス又はランタン系ガラス等を挙げることができる。 (Glass substrate)
As a glass substrate, it does not specifically limit as a raw material, For example, the well-known glass raw material used for optics and a board | substrate can be used. Specifically, glass ceramics such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, crystallized glass, phosphate glass or lanthanum glass Etc.
　これらの中では、熱膨張率の低いものが好ましい。石英ガラスや耐熱ガラス（テンパクッスなど）を、好ましく用いることができる。マスクの厚さは特に制限はないが、３～１０ｍｍのものを用いることができる。 Of these, those having a low coefficient of thermal expansion are preferred. Quartz glass or heat-resistant glass (such as tempax) can be preferably used. The thickness of the mask is not particularly limited, but a mask having a thickness of 3 to 10 mm can be used.
　＜マスク保持機構＞
　本発明のパターニング装置は、弾性体による弾性力により、前記マスクを保持するマスク保持機構を備えることが好ましい。これにより、マスクが照射光により膨張しても、その膨張による歪みを弾性体が吸収するため、マスクが割れることを防止できる。
　図５は、マスク保持機構とマスクとを光照射部側から見た概略図である。
　図５に示すように、本発明に係るマスク保持機構２００は、中央に開口部を有する、四角形状のマスクフレーム２０２の各辺上に設けられ、対向して配置された弾性体２０４と、弾性体２０４を固定する固定手段２０６と、を備えて構成されている。
　弾性体２０４は、マスクフレーム２０２上に載置され、マスク１４と面接触することによりマスク１４を側方から押圧して固定する。
　固定手段２０６は、マスクフレーム２０２に固定されている。
　弾性体２０４は、マスク１４と接触している面とは反対側の面と、弾性体２０４の上面とで固定手段２０６に当接して固定されている。
　マスク１４は、上述したように、各弾性体２０４に接触するようにしてマスクフレーム２０２上に配置される。 <Mask holding mechanism>
The patterning apparatus of the present invention preferably includes a mask holding mechanism that holds the mask by an elastic force of an elastic body. Thereby, even if a mask expand | swells with irradiation light, since the elastic body absorbs the distortion by the expansion | swelling, it can prevent that a mask is cracked.
FIG. 5 is a schematic view of the mask holding mechanism and the mask as viewed from the light irradiation unit side.
As shown in FIG. 5, the mask holding mechanism 200 according to the present invention includes an elastic body 204 provided on each side of a rectangular mask frame 202 having an opening at the center and disposed opposite to each other. And fixing means 206 for fixing the body 204.
The elastic body 204 is placed on the mask frame 202 and presses and fixes the mask 14 from the side by making surface contact with the mask 14.
The fixing means 206 is fixed to the mask frame 202.
The elastic body 204 is fixed in contact with the fixing means 206 at the surface opposite to the surface in contact with the mask 14 and the upper surface of the elastic body 204.
As described above, the mask 14 is disposed on the mask frame 202 so as to contact each elastic body 204.
　弾性体２０４は、マスク１４と面接触して固定することが好ましい。このような弾性体２０４の形状は特に限定されず、例えば、光照射によりマスクが膨張した場合に、当該マスクを点接触又は、面接触により押圧・固定するような球状の粘弾性体であってもよい。弾性体によって固定することにより、接触部を起点として、マスクにひび割れが発生することを防止できる。 The elastic body 204 is preferably fixed in surface contact with the mask 14. The shape of the elastic body 204 is not particularly limited. For example, when the mask is expanded by light irradiation, the elastic body 204 is a spherical viscoelastic body that presses and fixes the mask by point contact or surface contact. Also good. By fixing with the elastic body, it is possible to prevent the mask from cracking starting from the contact portion.
　また、本発明に係るマスク保持機構２００は、マスク１４を所定の圧力で保持することができることから、マスクフレーム２０２の任意の辺を回動軸として、可動式のマスク保持機構とすることができる。可動式とすることにより、後述するパターニング装置に適用した際、マスクを旋回させて有機ＥＬ素子から退避させることができ、パターニングする有機ＥＬ素子等の搬入及び搬出を容易にすることができる。 Further, since the mask holding mechanism 200 according to the present invention can hold the mask 14 with a predetermined pressure, it can be a movable mask holding mechanism with an arbitrary side of the mask frame 202 as a rotation axis. . By adopting the movable type, when applied to a patterning apparatus to be described later, the mask can be swung to be retracted from the organic EL element, and the organic EL element or the like to be patterned can be easily carried in and out.
　弾性体２０４（及び固定手段２０６）は、マスクフレーム２０２の各辺に二対以上対向して配置されていることが好ましい。弾性体２０４の設置数は、マスク１４の大きさ、すなわち、マスクフレーム２０２の各辺の長さによって適宜調整することができる。 It is preferable that the elastic body 204 (and the fixing means 206) are arranged to face each side of the mask frame 202 in two or more pairs. The number of installed elastic bodies 204 can be appropriately adjusted according to the size of the mask 14, that is, the length of each side of the mask frame 202.
　本発明に係るマスク保持機構２００は、上述したように可動式とすることができることから、マスクフレーム２０２の対向する１組の辺上に、少なくとも一対のマスク外れ防止規制板２０８を対向して配置させることが好ましい。このとき、回動軸は、マスクフレーム２０２のいずれかの一辺となる。 Since the mask holding mechanism 200 according to the present invention can be movable as described above, at least a pair of mask detachment prevention restricting plates 208 are disposed to face each other on a pair of opposing sides of the mask frame 202. It is preferable to make it. At this time, the rotation axis is one side of the mask frame 202.
　（マスクフレーム）
　本発明に係るマスクフレームの材質としては、従来公知のものを使用することができる。例えば、アルミニウムを用いることができる。 (Mask frame)
As a material of the mask frame according to the present invention, a conventionally known material can be used. For example, aluminum can be used.
　（弾性体）
　本発明に係るマスク保持機構においては、弾性体を構成する材料は特に限定されないが、粘弾性体であることが好ましく、具体的には、例えば、フッ素ゴム、クロロブレンゴム、ニトリルゴム、エチレン・プロピレンゴム、シリコーンゴム、ブチルゴム、ウレタンゴム等のゴムが挙げられる。中でも、紫外線に対する耐久性が高いことから、フッ素ゴムであることが好ましい。 (Elastic body)
In the mask holding mechanism according to the present invention, the material constituting the elastic body is not particularly limited, but is preferably a viscoelastic body. Specifically, for example, fluorine rubber, chlorobrene rubber, nitrile rubber, ethylene Examples of the rubber include propylene rubber, silicone rubber, butyl rubber, and urethane rubber. Among these, fluororubber is preferable because of its high durability against ultraviolet rays.
　粘弾性体の硬度は、Ａ５０～Ａ８０の範囲内であることが好ましい。粘弾性体の硬度がＡ５０以上であれば、マスクの熱膨張を効果的に防止することができ、Ａ８０以下であればマスク保持機構を可動式とした際のマスクの自重によるズレを防止することができる。なお、本発明において、粘弾性体の硬度は、ＪＩＳ　Ｋ　６２５３に準拠して測定される値である。 The hardness of the viscoelastic body is preferably in the range of A50 to A80. If the hardness of the viscoelastic body is A50 or more, the thermal expansion of the mask can be effectively prevented, and if it is A80 or less, the mask holding mechanism can be prevented from being displaced by its own weight when the mask holding mechanism is movable. Can do. In the present invention, the hardness of the viscoelastic body is a value measured according to JIS K 6253.
　粘弾性体とマスクとの接触面積は、１０４．５ｍｍ２以上であることが好ましく、これにより、マスクを安定して固定することができる。 The contact area between the viscoelastic body and the mask is preferably 104.5 mm 2 or more, whereby the mask can be stably fixed.
　また、当該接触部における粘弾性体のマスクに対する圧力は、４３００００±５６０００Ｎ／ｍ２の範囲内であることが好ましい。圧力が当該範囲内であれば、マスクの熱膨張や位置ズレを防止することができる。 Moreover, it is preferable that the pressure with respect to the mask of the viscoelastic body in the said contact part exists in the range of 430000 +/- 56000N / m < 2 >. If the pressure is within the range, thermal expansion and displacement of the mask can be prevented.
　また、マスクの平面方向のズレ量は、５０μｍ以下であることが好ましい。 Further, the amount of deviation in the plane direction of the mask is preferably 50 μm or less.
　（固定手段）
　固定手段は、ネジ等によりマスクフレームに固定されている。
　固定手段の材質は特に制限されないが、例えば、アルミニウムなどを用いることができる。 (Fixing means)
The fixing means is fixed to the mask frame with screws or the like.
The material of the fixing means is not particularly limited, and for example, aluminum can be used.
　［光照射部］
　光照射部は、波長が１００～４１０ｎｍの範囲内の光（以下、「紫外線」又は「照射光」ともいう。）を１Ｗ／ｃｍ２以上の放射照度で照射する。 [Light irradiation part]
The light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm (hereinafter also referred to as “ultraviolet rays” or “irradiation light”) with an irradiance of 1 W / cm 2 or more.
　光照射部には、紫外線を発光する光源が取り付けられている。光源としては、所望の紫外線光量を発光する光源であれば、特に制限はない。例えば、超高圧水銀灯、高圧水銀灯、低圧水銀灯、カーボンアーク、メタルハライドランプ、キセノンアークランプ、カーボンアークランプ、エキシマランプ、ＵＶ光レーザー等から発せられる１００～４１０ｎｍの範囲、好ましくは２００～４１０ｎｍの範囲の波長領域の紫外線を用いることができる。中でも、波長が３５０～４１０ｎｍのＬＥＤを複数備えていることが特に好ましい。これは、波長が３５０～４１０ｎｍの光は、有機ＥＬ素子の発光効率低下の感度が高い紫外線帯域の波長の光であるため、タクトタイムをより短縮できるからである。 A light source that emits ultraviolet rays is attached to the light irradiation unit. The light source is not particularly limited as long as it is a light source that emits a desired amount of ultraviolet light. For example, ultra high pressure mercury lamp, high pressure mercury lamp, low pressure mercury lamp, carbon arc, metal halide lamp, xenon arc lamp, carbon arc lamp, excimer lamp, UV light laser, etc. Ultraviolet light in the wavelength region can be used. In particular, it is particularly preferable to provide a plurality of LEDs having a wavelength of 350 to 410 nm. This is because the light having a wavelength of 350 to 410 nm is light in the ultraviolet band having a high sensitivity for lowering the luminous efficiency of the organic EL element, and therefore the tact time can be further shortened.
　なお、パターニングを行うための積算照射量としては、有機ＥＬ素子の層構成、膜厚、サイズ等にもよるが、２００～５０００Ｊ／ｃｍ２の積算光量で照射することが、生産性が高く、正確なパターニングが行える観点から好ましい。また、１パルスの紫外線照射時間は、１～３００秒の範囲内であることが好ましい。 Note that the integrated dose for patterning depends on the layer structure, film thickness, size, and the like of the organic EL element, but irradiation with an integrated light amount of 200 to 5000 J / cm 2 is highly productive, This is preferable from the viewpoint of accurate patterning. Further, it is preferable that one pulse of ultraviolet irradiation time is in the range of 1 to 300 seconds.
　光照射部について、具体例を挙げて更に説明する。
　光照射部としては、例えば、光源として、波長３８５ｎｍのＵＶ－ＬＥＤを使用し、これらを２次元状に配置し、ＬＥＤから出射した発散光をレンズアレイで所定のコリメーション半角となるように整形することで、レンズアレイの各レンズから出射した光が照射面で重なり合い、この結果、面状の広い照射面積にでき、かつ、一様な照度分布とすることができる。
　なお、ＬＥＤは不図示のコントローラにより点灯、消灯や点灯時の照射出力、照射時間が制御され、パルス光を照射するものであることが好ましい。マルチパルス光の場合には、１パルス光を照射してから次のパルス光を照射するまでの消灯時間も制御するものが好ましい。 The light irradiation unit will be further described with a specific example.
As the light irradiation unit, for example, UV-LEDs having a wavelength of 385 nm are used as the light source, these are arranged two-dimensionally, and the diverging light emitted from the LEDs is shaped to have a predetermined collimation half angle by the lens array. Thus, the light emitted from each lens of the lens array is overlapped on the irradiation surface, and as a result, a wide irradiation area can be obtained and a uniform illuminance distribution can be obtained.
In addition, it is preferable that LED turns on and off, the irradiation output at the time of lighting and the irradiation time are controlled by a controller (not shown), and emits pulsed light. In the case of multi-pulse light, it is preferable to control the turn-off time from irradiation of one pulse light to irradiation of the next pulse light.
　［放射照度］
　光照射部は、波長が１００～４１０ｎｍの範囲内の光を１Ｗ／ｃｍ２以上の放射照度で照射するが、高放射照度で高速パターニングを行うためには、放射照度は２Ｗ／ｃｍ２以上が好ましく、４Ｗ／ｃｍ２以上がより好ましい。さらに光照射エリア５０００ｃｍ２以上でかつ、放射照度４Ｗ／ｃｍ２が、パターニングのタクトタイムの大幅な短縮と取り数を増大させることが可能となり、この結果、生産性を著しく向上できる点で好ましい。
　本発明において、光照射エリア内における前記波長が１００～４１０ｎｍの範囲内の光の放射照度が、当該光照射エリア（実際に光を照射する所望の領域）内における前記放射照度の平均値に対し±１０％の範囲内である。 [Irradiance]
The light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm with an irradiance of 1 W / cm 2 or more. However, in order to perform high-speed patterning with a high irradiance, the irradiance must be 2 W / cm 2 or more. Preferably, 4 W / cm 2 or more is more preferable. Further, a light irradiation area of 5000 cm 2 or more and an irradiance of 4 W / cm 2 are preferable in that the tact time of patterning can be greatly shortened and the number of pick-ups can be increased. As a result, productivity can be remarkably improved.
In the present invention, the irradiance of light having a wavelength in the range of 100 to 410 nm in the light irradiation area is relative to the average value of the irradiance in the light irradiation area (desired region where light is actually irradiated). It is within the range of ± 10%.
　＜放射照度の分布＞
　本発明においては、光照射エリア内における前記波長の範囲内の光の放射照度（以下、単に「放射照度」ともいう。）が、当該光照射エリア内における放射照度の平均値に対し±１０％の範囲内である。 <Distribution of irradiance>
In the present invention, the irradiance of light within the wavelength range in the light irradiation area (hereinafter also simply referred to as “irradiance”) is ± 10% of the average value of the irradiance in the light irradiation area. Is within the range.
　（放射照度の分布の測定方法）
　放射照度は、公知の測定器で測定することができ、例えば、波長範囲が３００～４１０ｎｍの場合、紫外線積算光量計「Ｃ９５３６－０２」とセンサヘッド「Ｈ９９５８－０２」（浜松ホトニクス株式会社製）を使用して、光照射エリアの縦、横に１～１０ｍｍの範囲内の間隔ずつで測定するなどして、測定できる。
　上述のようにして測定された、光照射エリア内における放射照度の分布から、光照射エリア内の本発明に係る波長の範囲内の光の放射照度の平均を計算することができる。 (Measurement method of irradiance distribution)
The irradiance can be measured with a known measuring instrument. For example, when the wavelength range is 300 to 410 nm, the UV integrated light meter “C9536-02” and the sensor head “H9958-02” (manufactured by Hamamatsu Photonics) Can be measured by measuring at intervals of 1 to 10 mm in the vertical and horizontal directions of the light irradiation area.
From the irradiance distribution in the light irradiation area measured as described above, the average of the irradiance of light within the wavelength range according to the present invention in the light irradiation area can be calculated.
　＜コリメーション半角＞
　本発明において、前記光照射エリア内における前記波長が１００～４１０ｎｍの範囲内の光のコリメーション半角が、４５°以下である。なお、１Ｗ／ｃｍ２以上の放射照度を実現するためには、２３°以上のコリメーション半角を有する光を含むことが好ましい。 <Collimation half-width>
In the present invention, the collimation half angle of the light within the range of 100 to 410 nm in the light irradiation area is 45 ° or less. In order to realize an irradiance of 1 W / cm 2 or more, it is preferable to include light having a collimation half angle of 23 ° or more.
　コリメーション半角とは、図３に示す、マスクに対する垂線Ｒと照射光Ｌとがなす角θのうち、最大のものをいう。コリメーション半角は、光源部から出射した発散光をレンズなどで整形することで調整できる。 The collimation half-angle refers to the maximum angle θ among the angles θ formed by the perpendicular R to the mask and the irradiation light L shown in FIG. The collimation half angle can be adjusted by shaping divergent light emitted from the light source unit with a lens or the like.
　（レンズ）
　コリメーション半角を調整するための、レンズとしては、図３のようなレンズアレイ３７を用いることができるが、これに限定されず、例えば、レンズアレイの代わりに、例えば、図６に示す複合放物面集光器のような集光ミラー３７ａを用いてもよい。複合放物面集光器であれば、部品コストを抑えることができるため好ましい。また、その他図７Ａ及び図７Ｂに示すような棒状シリンドリカルレンズ３７ｂ若しくはロッドレンズをＬＥＤアレイの各列に配置し、続いて直交する方向に棒状シリンドリカルレンズやロッドレンズを配置して２次元方向のコリメーション角整形を行ってもよい。なお、図７Ａ及び図７Ｂは棒状シリンドリカルレンズの配置の一例を示す概略図であり、図７ＡはＸ方向に対し直交する断面を示す概略図であり、図７ＢはＹ方向に対し直交する断面を示す概略図である。このようにすれば、光軸調整を各々一方向だけ行えばよく、調整工数を抑制できるため好ましい。 (lens)
As a lens for adjusting the collimation half angle, a lens array 37 as shown in FIG. 3 can be used, but is not limited to this. For example, instead of the lens array, for example, a compound parabola shown in FIG. A condensing mirror 37a such as a surface concentrator may be used. A compound parabolic concentrator is preferable because the component cost can be reduced. In addition, a rod-shaped cylindrical lens 37b or a rod lens as shown in FIGS. 7A and 7B is arranged in each column of the LED array, and then a rod-shaped cylindrical lens or a rod lens is arranged in an orthogonal direction to collimate in a two-dimensional direction. Angle shaping may be performed. 7A and 7B are schematic views showing an example of the arrangement of the rod-shaped cylindrical lenses, FIG. 7A is a schematic view showing a cross section orthogonal to the X direction, and FIG. 7B is a cross section orthogonal to the Y direction. FIG. This is preferable because it is sufficient to adjust the optical axis in only one direction, and the adjustment man-hour can be suppressed.
　（コリメーション半角の測定方法）
　コリメーション半角の測定方法としては、特に限定されず、公知の方法を使用できる。
　具体的な測定方法の例を以下に示す。
　まず、被パターン形成体載置台を光照射部から退避させ、ピンホールを被パターン形成体載置台の有機ＥＬシートを載置する面と同じ高さに配置し、照射光を前記ピンホールに照射する。次に、前記ピンホールを通り抜けた光束をＣＣＤカメラで観測し、その光束の半径ｒを計測する。ピンホールとＣＣＤ素子との間隔をＤとしたとき、コリメーション半角はｔａｎ－１（ｒ／Ｄ）として算出することができる。なお、前記ピンホールの径はφ０．５ｍｍ以下が望ましい。 (Measurement method of collimation half-width)
The method for measuring the collimation half angle is not particularly limited, and a known method can be used.
An example of a specific measurement method is shown below.
First, the pattern forming body mounting table is retracted from the light irradiation unit, the pinhole is disposed at the same height as the surface on which the organic EL sheet of the pattern forming body mounting table is mounted, and irradiation light is irradiated to the pinhole To do. Next, the light beam that has passed through the pinhole is observed with a CCD camera, and the radius r of the light beam is measured. When the distance between the pinhole and the CCD element is D, the collimation half angle can be calculated as tan −1 (r / D). The diameter of the pinhole is preferably φ0.5 mm or less.
　［光照射エリア］
　光照射エリアとは、本発明に係る被パターン形成体（有機ＥＬシート）において、実際に光を照射する所望の領域をいう。
　光照射エリアの面積は、特に限定されないが、５０００ｃｍ２以上であることが好ましい。この理由は次のとおりである。 [Light irradiation area]
The light irradiation area refers to a desired region where light is actually irradiated in the patterned body (organic EL sheet) according to the present invention.
The area of the light irradiation area is not particularly limited, but is preferably 5000 cm 2 or more. The reason for this is as follows.
　ロール・ｔｏ・ロール方式で有機ＥＬ素子を製造する場合、一般的にロールの幅は１ｍ程度ある。パターニングする際は、これをロール巻き方向に６００ｍｍ程度の長さにカットして、複数の有機ＥＬ素子を平面状に備えるシート状にして、これら複数の有機ＥＬ素子に対し、まとめて光を照射することが好ましい。例えば、ｘ方向のサイズが１００ｃｍでありｙ方向のサイズが６０ｃｍのサイズの有機ＥＬシートに対して、複数の有機ＥＬ素子が内側９０ｃｍ×５４ｃｍの領域に配置される。光照射エリアを３０ｃｍ×１８ｃｍ（＝５４０ｃｍ２）とすれば、ｘ方向に３ステップ、ｙ方向に３ステップの合計９ステップと１０ステップ以内で一つの有機ＥＬシートに光を照射できる。このように大面積の光照射エリアとすることにより有機ＥＬシートの状態での光照射が可能となり、複数の有機ＥＬ素子を一度にパターニングでき、スループットを向上できる。有機ＥＬシートの全面を一括で光照射する場合には、９０ｃｍ×５４ｃｍ＝４８６０ｃｍ２以上の光照射エリアが必要であることから、５０００ｃｍ２以上の光照射エリアであることが好ましい。 When manufacturing an organic EL element by a roll-to-roll method, the width of the roll is generally about 1 m. When patterning, this is cut into a length of about 600 mm in the roll winding direction to form a sheet having a plurality of organic EL elements in a planar shape, and the plurality of organic EL elements are collectively irradiated with light. It is preferable to do. For example, with respect to an organic EL sheet having a size in the x direction of 100 cm and a size in the y direction of 60 cm, a plurality of organic EL elements are arranged in an area of 90 cm × 54 cm on the inner side. If the light irradiation area is 30 cm × 18 cm (= 540 cm 2 ), light can be irradiated to one organic EL sheet within a total of 9 steps and 10 steps of 3 steps in the x direction and 3 steps in the y direction. By setting the light irradiation area in such a large area, light irradiation in the state of the organic EL sheet can be performed, and a plurality of organic EL elements can be patterned at a time, thereby improving the throughput. In the case where the entire surface of the organic EL sheet is irradiated with light at once, a light irradiation area of 90 cm × 54 cm = 4860 cm 2 or more is necessary, so that the light irradiation area of 5000 cm 2 or more is preferable.
　このような大面積の光照射エリアは、例えば、ＬＥＤの数を増やし、光源部の発光面積を拡大すれば実現可能であるが、この場合、本発明のパターニング装置は、冷却機能を併せて備えていることが好ましい。これにより、１回の照射総光量が非常に高くなったとしても、マスクの遮光膜の発熱を抑えることができる。 Such a large-area light irradiation area can be realized, for example, by increasing the number of LEDs and expanding the light emission area of the light source unit. In this case, the patterning apparatus of the present invention also has a cooling function. It is preferable. As a result, even if the total amount of light emitted once is very high, heat generation of the light shielding film of the mask can be suppressed.
　なお、上述の光照射エリアは面状であることが好ましい。これにより、複数の有機ＥＬ素子が形成されたシート状にて照射が可能となり、スループットを向上できる。 In addition, it is preferable that the above-mentioned light irradiation area is planar. Thereby, irradiation can be performed in the form of a sheet on which a plurality of organic EL elements are formed, and throughput can be improved.
　［被パターン形成体載置台］
　本発明のパターニング装置は、有機エレクトロルミネッセンス素子を載置する被パターン形成体載置台を備えることが好ましい。 [Pattern forming body mounting table]
The patterning apparatus of the present invention preferably includes a pattern forming body mounting table on which the organic electroluminescence element is mounted.
　被パターン形成体載置台は、有機エレクトロルミネッセンス素子を載置できるものであり、かつ、本発明の効果を阻害しないものであればよく、特に限定されないが、有機ＥＬシートを吸着固定できるものであることが好ましい。一般に、有機ＥＬ素子の基板としてアクリル酸エステル、メタクリル酸エステル、ポリブチレンテレフタレート、ポリカーボネート（略称：ＰＣ）、ポリエチレンテレフタレート（略称：ＰＥＴ）やポリエチレンナフタレート（略称：ＰＥＮ）などを用いた場合、有機ＥＬシートはカールするなど変形しやすいが、有機ＥＬシートを吸着固定できる被パターン形成体載置台であれば、シート全面を吸着することにより、平面性よく被パターン形成体載置台に固定でき、パターニングの光照射ボケを防止できる。
　なお、被パターン形成体載置台の材質は、特に限定されない。ただし、被パターン形成体載置台が後述の水路４４ｂを有する場合、被パターン形成体載置台は冷却台となるため、その材質は軽量で熱伝導率の高い金属が好ましく、具体的には、例えば、アルミニウムが使用できる。 The pattern forming body mounting table is not particularly limited as long as it can mount an organic electroluminescence element and does not impair the effects of the present invention, and can adsorb and fix an organic EL sheet. It is preferable. In general, when an acrylic ester, methacrylic ester, polybutylene terephthalate, polycarbonate (abbreviation: PC), polyethylene terephthalate (abbreviation: PET), polyethylene naphthalate (abbreviation: PEN), or the like is used as the substrate of the organic EL element, organic The EL sheet is easily deformed, such as curling. However, if the pattern forming object mounting table can adsorb and fix the organic EL sheet, the entire surface of the sheet can be adsorbed and fixed to the pattern forming object mounting table with good flatness. Can prevent blurring of light irradiation.
In addition, the material of a to-be-patterned body mounting base is not specifically limited. However, when the pattern forming body mounting table has a water channel 44b, which will be described later, the pattern forming body mounting table is a cooling table. Therefore, the material is preferably a light metal with high thermal conductivity. Aluminum can be used.
　なお、複数の有機ＥＬ素子が備えられた有機ＥＬ素子シートに光を照射する場合には、被パターン形成体載置台が大型となり、かつ冷却水も流れるため質量が増してしまう。このため、被パターン形成体載置台をＸ、Ｙ、ψ（ＸＹ平面における回転角）調整してマスクとの位置決めを行うと被パターン形成体載置台の移動機構への負荷が大きくなってしまう。そのため、マスクとシートのアライメントはマスクが載置されたマスクフレームをＸ、Ｙ、ψ調整して行うことが好ましい。 In addition, when irradiating light to the organic EL element sheet | seat provided with the some organic EL element, since a to-be-patterned body mounting base becomes large sized and cooling water also flows, mass will increase. For this reason, if the pattern forming body mounting table is adjusted with respect to the mask by adjusting X, Y, and ψ (rotation angles in the XY plane), the load on the moving mechanism of the pattern forming body mounting table is increased. Therefore, it is preferable that the alignment between the mask and the sheet is performed by adjusting the mask frame on which the mask is placed by adjusting X, Y, and ψ.
　＜冷却機能＞
　有機ＥＬ素子のパターニングを高速で行うために２Ｗ／ｃｍ２以上の非常に高い放射照度で光を照射した場合、マスクの遮光膜（クロムの薄膜など）が紫外線を吸収し温度が上昇する。このため、被パターン形成体載置台が、冷却機能を有することが好ましい。これにより、マスクに熱変形が生じることを抑制でき、ひいては、光照射パターンのずれ発生や熱に弱い有機層が熱ダメージを受け性能が劣化することを防止できる。 <Cooling function>
When light is irradiated with an extremely high irradiance of 2 W / cm 2 or more in order to perform patterning of the organic EL element at a high speed, the light shielding film (such as a chromium thin film) of the mask absorbs ultraviolet rays and the temperature rises. For this reason, it is preferable that the to-be-patterned body mounting table has a cooling function. Thereby, it is possible to suppress the occurrence of thermal deformation in the mask, and in turn, it is possible to prevent the light irradiation pattern from being shifted and the heat-sensitive organic layer from being damaged by heat and degrading the performance.
　冷却機能としては、マスクを冷却できるものであればよく、特に限定されず、具体的には、例えば、水冷方式や、空気などの気体をマスクに吹き付けることなどが挙げられる。中でも、本発明のパターニング装置は、水冷方式の冷却機能として、前記被パターン形成体載置台の内部に水路を備え、冷却水を前記被パターン形成体載置台の一方から導入し、前記被パターン形成体載置台内の水路の中を一方向に前記冷却水を流して他方に排出する複数の水路を備えることが好ましい。被パターン形成体載置台の材質は熱伝導率の高いものが好ましい。例えば、アルミニウムなどを用いることができる。 The cooling function is not particularly limited as long as it can cool the mask, and specific examples include a water cooling method and blowing a gas such as air onto the mask. Among them, the patterning apparatus according to the present invention includes a water channel inside the pattern forming body mounting table as a water-cooling cooling function, and introduces cooling water from one of the pattern forming body mounting tables, thereby forming the pattern forming It is preferable to provide a plurality of water channels that allow the cooling water to flow in one direction through the water channel in the body mounting table and to be discharged to the other. The material of the pattern forming body mounting table is preferably one having high thermal conductivity. For example, aluminum can be used.
　図８に、被パターン形成体載置台内部に備えられた水路の具体的な一例を示す。図８の例では、被パターン形成体載置台内部には、水管４４ａから供給される冷却水が流れる複数の水路４４ｂが、被パターン形成体載置台の一方から他方に向けて一方向に貫通形成されている。この水路を一方向に冷却水が流れ、紫外線照射によりマスクや有機ＥＬ素子で発生した熱を冷却する。被パターン形成体載置台で熱を吸収した水は水路４４ｃから排出されてチラーユニット４５に送られ、チラーユニット４５内部にて熱交換され、水温を下げた冷却水が被パターン形成体載置台に再び供給される。このように図８の例では、冷却水はチラーユニットと被パターン形成体載置台内部を循環する。チラーユニットは、チラーの冷却能力に応じて複数台用いてもよい。ここで「チラー」とは、熱媒体を循環させて対象部を一定の温度に保つ装置をいう。
　なお、装置作動中は常時冷却機能を動作させておくことが好ましい。
　また、被パターン形成体載置台に導入される水温は有機ＥＬ素子やマスクが結露しない範囲で３０℃以下が好ましい。１０～２０℃がより好ましい。 FIG. 8 shows a specific example of the water channel provided inside the pattern forming body mounting table. In the example of FIG. 8, a plurality of water channels 44b through which cooling water supplied from the water pipe 44a flows are formed in one direction from one side of the pattern forming body mounting table to the other inside the pattern forming body mounting table. Has been. Cooling water flows in one direction through this water channel, and cools the heat generated in the mask and the organic EL element by ultraviolet irradiation. The water that has absorbed heat at the pattern forming body mounting table is discharged from the water channel 44c and sent to the chiller unit 45, where heat is exchanged inside the chiller unit 45, and the cooling water whose temperature has been lowered is supplied to the pattern forming body mounting table. Will be supplied again. As described above, in the example of FIG. 8, the cooling water circulates inside the chiller unit and the pattern forming body mounting table. A plurality of chiller units may be used according to the cooling capacity of the chiller. Here, the “chiller” refers to a device that circulates a heat medium and keeps the target part at a constant temperature.
In addition, it is preferable to always operate the cooling function during operation of the apparatus.
In addition, the water temperature introduced to the pattern forming body mounting table is preferably 30 ° C. or less as long as the organic EL element and the mask are not condensed. 10 to 20 ° C. is more preferable.
　図８に示すように、水路４４ｂを流れる冷却水を一方通行とすれば、熱を吸収し温度上昇した冷却水を最短距離で被パターン形成体載置台の外部に排出でき、被パターン形成体載置台内で往復させた場合に比べ冷却効果が高いため好ましい。 As shown in FIG. 8, if the cooling water flowing through the water channel 44b is one-way, the cooling water that has absorbed heat and has risen in temperature can be discharged to the outside of the pattern forming body mounting table at the shortest distance. This is preferable because the cooling effect is higher than when reciprocating in the mounting table.
　［気体流発生部］
　本発明に係るパターニング装置は、気体を前記マスクに吹き付ける気体流発生部を備えることが好ましい。 [Gas flow generator]
The patterning apparatus according to the present invention preferably includes a gas flow generation unit that blows gas onto the mask.
　気体流発生部４０は、マスク１４上面の対向する位置に、マスク１４とカバー３９との間隙ＷＤを通して、空気などの気体がマスク１４と平行に、かつマスク１４の中央方向に吹き付けられるよう配置されている。
　なお、本発明において、気体流発生部が吹き付ける気体は、マスクを冷却できるものであり、かつ、本発明の効果発現を阻害しないものであれば特に限定されず、例えば、空気や、窒素ガスなどを好適に使用できる。 The gas flow generation unit 40 is arranged at a position facing the upper surface of the mask 14 such that a gas such as air is blown in parallel to the mask 14 and toward the center of the mask 14 through the gap WD between the mask 14 and the cover 39. ing.
In the present invention, the gas blown by the gas flow generator is not particularly limited as long as it can cool the mask and does not impair the effects of the present invention. For example, air, nitrogen gas, etc. Can be suitably used.
　気体流発生部４０はマスク１４上面の対向する位置に配置されることで、マスク１４と平行に気体を吹き付けることができ、この結果、吹き付けられる気体流４１はムラなくマスク１４上を進みマスク中央部で合流することができる。ここで、平行に吹き付けるとは、マスク１４の平面に対し±２°以内の角度で吹き付けることをいう。
　マスクに吹き付けられた気体は、マスク１４の中央部で合流する。中央で合流することで、マスク１４をムラなく冷却することができる。このため気体流発生部４０は、マスク１４上面の対向する位置に平行に配置されることが好ましい。 Since the gas flow generating unit 40 is disposed at a position facing the upper surface of the mask 14, the gas flow 41 can be blown in parallel with the mask 14, and as a result, the blown gas flow 41 travels on the mask 14 without unevenness and the center of the mask. It is possible to join at the part. Here, spraying in parallel means spraying at an angle within ± 2 ° with respect to the plane of the mask 14.
The gas blown to the mask merges at the center of the mask 14. By joining at the center, the mask 14 can be cooled without unevenness. For this reason, it is preferable that the gas flow generation part 40 is arrange | positioned in parallel with the position which the mask 14 upper surface opposes.
　カバー３９と気体流発生部４０との間隙４２は、気体が効率よくマスクに吹き付けられれば特に制約はないが１０～２００ｍｍの範囲内であることが好ましい。より好ましくは５０～１００ｍｍの範囲内である。また、気体流発生部の長さは、吹き付ける側のカバーの幅と同じか、それより大きいほうが好ましい。 The gap 42 between the cover 39 and the gas flow generating unit 40 is not particularly limited as long as the gas is efficiently blown onto the mask, but is preferably within a range of 10 to 200 mm. More preferably, it is in the range of 50 to 100 mm. The length of the gas flow generating part is preferably the same as or larger than the width of the cover on the side to be sprayed.
　また、一対の気体流発生部４０は、マスク１４の中央部に対して対称の位置に配置されることが好ましい。 Further, it is preferable that the pair of gas flow generation units 40 is disposed at a symmetrical position with respect to the central portion of the mask 14.
　（吹き付け部）
　カバー３９内部の空気循環を行い、効率よくマスクやカバーを冷却するためには、気体流発生部４０が、スリット状又はノズル状の吹き付け部を備えたものであることが好ましい。スリット状の吹き付け部を備えたものであることが、より好ましい。さらには、スリット状の吹き付け部は、ライン状に気体を吹き出し、マスク表面を冷却するものであることがより好ましい。吹きだされる気体が、ライン状であると、マスクを一様に冷却できるためである。 (Blowing part)
In order to circulate the air inside the cover 39 and efficiently cool the mask and the cover, it is preferable that the gas flow generation unit 40 includes a slit-shaped or nozzle-shaped sprayed portion. It is more preferable to have a slit-shaped spraying part. Furthermore, it is more preferable that the slit-like spraying part is one that blows gas in a line shape and cools the mask surface. This is because the mask can be cooled uniformly when the gas blown out is in a line shape.
　また、スリット状の吹き付け部の代わりに、ノズル状の吹き付け部を備えたものも使用できるが、その場合ノズルの数は多いほうが良く、ノズルの数は５～２０ｍｍの間隔で１個あることが好ましい。ノズル径の大きさは、適宜調整することができる。 Further, instead of the slit-like spraying part, a nozzle provided with a nozzle-like spraying part can be used. In that case, the number of nozzles should be large, and the number of nozzles may be one at intervals of 5 to 20 mm. preferable. The size of the nozzle diameter can be adjusted as appropriate.
　吹き付け部に用いるスリット状の吹き付け部を備えた気体流発生部は市販品のものを使用することができる。例えば、サンワエンタープライズ社製の、層状空気流発生装置７５０型やスプレーイングシステムジャパン社製のブロアナイフエアーノズルなどを用いることができる。 A commercial product can be used as the gas flow generating part provided with the slit-like spraying part used for the spraying part. For example, a layered airflow generator 750 type manufactured by Sanwa Enterprise, a blower knife air nozzle manufactured by Spraying System Japan, or the like can be used.
　一対の吹き付け部から吹き付けられる風量は同じであることが好ましい。風量としては１０００～４０００Ｌ／ｍｉｎであることができる。気体流発生部は、エアコンプレッサーに接続されていることが好ましい。紫外線の照射光量に応じて、適宜所望の風量、風速に調節することができる。エアコンプレッサーは公知のものを使用できる。 It is preferable that the air volume blown from the pair of blowing parts is the same. The air volume can be 1000 to 4000 L / min. The gas flow generator is preferably connected to an air compressor. According to the irradiation light quantity of an ultraviolet-ray, it can adjust to a desired air volume and a wind speed suitably. A known air compressor can be used.
　また、吹き付けられる気体が、温度調整されたものであることが好ましい。必要に応じて、例えば、５～１５℃程度に温度調整した気体を用いることで冷却効果を上げることができる。 Moreover, it is preferable that the gas to be blown is temperature-adjusted. If necessary, the cooling effect can be enhanced by using a gas whose temperature is adjusted to about 5 to 15 ° C., for example.
　なお、上述の被パターン形成体載置台の冷却機能とともに、このような気体流発生部を有することが、マスクに気体を吹き付けることにより有機ＥＬシートとマスクを効率よく冷却でき、高い放射照度とした場合に伴う熱の影響を好適に低減できるため好ましい。 In addition to the cooling function of the above-described pattern forming body mounting table, having such a gas flow generation unit can efficiently cool the organic EL sheet and the mask by blowing gas on the mask, and has high irradiance. Since the influence of the heat accompanying a case can be reduced suitably, it is preferable.
　［カバー］
　カバーは、光源部から照射された紫外線の光量の低下を防ぎ、かつ均一な光量でマスクに照射させる機能を有している。そのために、内面が反射材料で覆われていることが好ましい。反射材料は、熱に対して耐性があり、耐久性もあることから、金属材料を用いることができる。例えば、軽量でもあることから、アルミニウムを好ましく使用できる。 [cover]
The cover has a function of preventing a reduction in the amount of ultraviolet light emitted from the light source unit and irradiating the mask with a uniform amount of light. Therefore, it is preferable that the inner surface is covered with a reflective material. Since the reflective material is resistant to heat and durable, a metal material can be used. For example, aluminum is preferably used because it is lightweight.
　カバーは、その上部に光源部が取り付けられ、その下端にマスクとの間隙を有していれば、その高さや、底面積は、特に制限がなく、紫外線を照射する有機ＥＬシートの大きさに応じて設定することができる。カバーの底面は、有機ＥＬシートにおいてパターンが形成されるエリア全体より大きいことが好ましい。 If the light source part is attached to the upper part of the cover and has a gap with the mask at the lower end, the height and the bottom area are not particularly limited, and the size of the organic EL sheet that irradiates ultraviolet rays is not limited. It can be set accordingly. The bottom surface of the cover is preferably larger than the entire area where the pattern is formed in the organic EL sheet.
　本発明によれば、寸法精度の高いパターニングが可能であることから、同一のパターンを有する複数の有機ＥＬパネルを１回の紫外線照射で作製することで、生産性を高めることもできる。
　なお、パターンを形成させる場合には、複数の有機ＥＬ素子（例えば縦１０列、横１０列の全体で１００個の有機ＥＬ素子）で一つのパターンを形成させるように配列させてもよい。その場合は、複数の有機ＥＬ素子がそれぞれ異なるパターンを形成し、全体で一つのパターンを表示する有機ＥＬパネルとして作動する。 According to the present invention, since patterning with high dimensional accuracy is possible, productivity can be improved by producing a plurality of organic EL panels having the same pattern by one ultraviolet irradiation.
In the case of forming a pattern, a plurality of organic EL elements (for example, 100 organic EL elements in a total of 10 vertical columns and 10 horizontal rows) may be arranged to form one pattern. In that case, the plurality of organic EL elements form different patterns, and operate as an organic EL panel that displays one pattern as a whole.
　カバーの高さは、紫外線の光量、照射光量のムラなどから、適宜調整できる。例えば、０．５～５ｍ程度にすることができる。 The height of the cover can be adjusted as appropriate based on the amount of ultraviolet light and unevenness in the amount of irradiation light. For example, it can be about 0.5 to 5 m.
　＜周回光照射機構＞
　本発明では、有機ＥＬシートの光照射エリアを複数の光照射エリアに区分して順次パルス光の照射を行ったのち、再度同じ領域にパルス光の照射を繰り返し、それぞれの光照射エリアで所定の積算照射量となるまで照射を繰り返す。したがって、光照射エリアを周回するよう制御するものであることが好ましい。 <Circular light irradiation mechanism>
In the present invention, the light irradiation area of the organic EL sheet is divided into a plurality of light irradiation areas and sequentially irradiated with pulsed light, and then the same region is repeatedly irradiated with pulsed light. Irradiation is repeated until the integrated dose is reached. Therefore, it is preferable to control the light irradiation area so as to go around.
　以下、図９及び、図１０に基づいて、パターニング装置の第１の形態の場合の、周回光照射機構の例について説明する。
　図９は、本発明のパターニング装置の一例（パターニング装置の第１の形態）の全体構成図（Ｘ軸方向透視図）である。
　図１０は、本発明のパターニング装置の一例（パターニング装置の第１の形態）の全体構成図（Ｙ軸方向透視図）である。
　被パターン形成体載置台４３はリニアガイド６４に沿ってＸ軸方向に移動する。
　移動はモーター６７によりネジ軸６６を回転させ、被パターン形成体載置台４３の底面に取り付けられたボールネジ６５にて回転運動を直進運動に変換させ、移動させる。
　不図示の位置センサにより基準位置が決まり、そこからモーター６７の回転数により移動量を制御する。
　光照射部３２も同様にリニアガイド６８によってＹ軸方向に移動する。光照射部のリニアガイド６８は支柱載置されたベース上に設置されている。
　操作部５２にはメモリが内蔵されており、各ポジションにおける光照射１回当たりの放射照度、光照射時間、光照射回数や、各光照射ポジションの座標や移動順序などの光照射条件が記憶されている。
　操作部５２にて所望の光照射条件を選定し、その条件に従って制御部５３が、下記の諸機構を制御する。制御部５３には、マスクアライメント制御部５４、移動機構制御部５５、光源制御部５６及び気体流制御部５７が備えられている。
　光源制御部５６は、光源部の放射照度、光照射時間、光照射回数などを制御する。移動機構制御部５５は、モーター６７及びモーター６１を介して、被パターン形成体載置台４３及び光照射部３２の位置を制御する。マスクアライメント制御部５４は、被パターン形成体載置台４３が退避位置にある状態で、マスクアライメント機構部６９を制御して、被パターン形成体載置台４３上の所定の位置に有機ＥＬシート１１とマスク１４を設置させる。
　気体流制御部５７は、気体流発生部４０の作動のオン／オフを制御する。 Hereinafter, based on FIG. 9 and FIG. 10, an example of the circulating light irradiation mechanism in the case of the first embodiment of the patterning device will be described.
FIG. 9 is an overall configuration diagram (X-axis direction perspective view) of an example of the patterning apparatus of the present invention (first form of the patterning apparatus).
FIG. 10 is an overall configuration diagram (Y-axis direction perspective view) of an example of the patterning apparatus of the present invention (first mode of the patterning apparatus).
The pattern forming body mounting table 43 moves in the X-axis direction along the linear guide 64.
For the movement, the screw shaft 66 is rotated by the motor 67, and the rotational movement is converted into the straight movement by the ball screw 65 attached to the bottom surface of the pattern forming body mounting table 43.
A reference position is determined by a position sensor (not shown), and the amount of movement is controlled by the number of rotations of the motor 67 therefrom.
Similarly, the light irradiation unit 32 is moved in the Y-axis direction by the linear guide 68. The linear guide 68 of the light irradiation unit is installed on a base on which a support is placed.
The operation unit 52 has a built-in memory, and stores light irradiation conditions such as irradiance per light irradiation at each position, light irradiation time, number of times of light irradiation, coordinates of each light irradiation position, and movement order. ing.
A desired light irradiation condition is selected by the operation unit 52, and the control unit 53 controls the following mechanisms according to the condition. The control unit 53 includes a mask alignment control unit 54, a movement mechanism control unit 55, a light source control unit 56, and a gas flow control unit 57.
The light source control unit 56 controls the irradiance, light irradiation time, number of times of light irradiation, and the like of the light source unit. The movement mechanism control unit 55 controls the positions of the pattern forming body mounting table 43 and the light irradiation unit 32 via the motor 67 and the motor 61. The mask alignment control unit 54 controls the mask alignment mechanism unit 69 in a state where the pattern forming body mounting table 43 is in the retracted position, and the organic EL sheet 11 and the predetermined position on the pattern forming body mounting table 43. The mask 14 is installed.
The gas flow control unit 57 controls on / off of the operation of the gas flow generation unit 40.
　＜パターニングプロセス＞
　図１１は、本発明に係るパターニング方法の一例（パターニング装置の第１の形態と図１に示す有機ＥＬシート１１及びマスク１４を使用し、光照射エリアが４個の場合）の操作の流れを示すフロー図である。
　パターニング装置の電源５１が投入されると、チラーユニット５８の動作が開始され、被パターン形成体載置台４３の中を冷却水が循環し続ける。
　最初にステップＳ１０１において、光照射条件の選定が行われる。操作部５２の図示しないタッチパネルにて光照射条件を選定する。また有機ＥＬシート１１のＩＤ番号を入力する。次いでステップＳ１０２に進む。
　ステップＳ１０２では、有機ＥＬシート１１が被パターン形成体載置台４３に載置される。この時点では被パターン形成体載置台４３は、光照射部３２から退避した位置にあり、この位置で有機ＥＬシート１１の載置、回収を行う。載置後、操作部５２の図示しないタッチパネルにて吸着開始ボタンを押し、有機ＥＬシート１１を、被パターン形成体載置台４３に設けられた図示しない吸着穴で吸着固定する。次いでステップＳ１０３に進む。
　ステップＳ１０３では、マスクアライメントが行われ、マスク１４が所定の位置に設置される。操作部５２の図示しないタッチパネルにて光照射開始ボタンを押すと、マスク１４を搭載したマスクフレーム２０２を支持するマスクアライメント機構部６９の支持体が下降し、マスク１４が有機ＥＬシート１１に密着する寸前で停止する。次いで、不図示のマスクアライメント用の複数のカメラが各マスク用アライメントマーク１６の真上に移動し、マスク用アライメントマーク１６の中心が、相対する十字の有機ＥＬシート用アライメントマーク１３の中心に来るように、マスクアライメント機構部６９によりＸ、Ｙ、ψ調整される。マスクアライメント終了後、カメラが退避して、マスクフレーム２０２がさらに下降し、マスク１４を有機ＥＬシート１１に密着させる。次いでステップＳ１０４に進む。
　ステップＳ１０４では、周回ステップ光照射が行われる。
　周回ステップ光照射が、開始されると、まず被パターン形成体載置台４３が光照射位置に移動する。
　移動機構制御部５５が、ボールネジ６５を介して被パターン形成体載置台４３を、光照射エリアＰ１の所定場所になるように移動させる。
　気体流制御部５７が、気体流発生部４０を稼働させ空冷を開始させる。
　移動機構制御部５５が、ボールネジ６３を介して光照射部３２を、光照射エリアＰ１の所定場所になるように移動させる。
　光源制御部５６が、光源部を稼働させ所定の１パルス照射を行わせる。
　移動機構制御部５５が、ボールネジ６５を介して被パターン形成体載置台４３を、光照射エリアＰ２の所定場所になるように移動させる。
　光源制御部５６が、光源部を稼働させ所定の１パルス照射を行わせる。
　移動機構制御部５５が、ボールネジ６３を介して光照射部３２を、光照射エリアＰ３の所定場所になるように移動させる。
　光源制御部５６が、光源部を稼働させ所定の１パルス照射を行わせる。
　移動機構制御部５５が、ボールネジ６５を介して被パターン形成体載置台４３を、光照射エリアＰ４の所定場所になるように移動させる。
　光源制御部５６が、光源部を稼働させ所定の１パルス照射を行わせる。
　制御部５３が、所定の回数の光照射が行われたかどうかの判定を行う。所定回数の光照射が行われていなければ、光照射エリアＰ１に移動を行い、光照射を繰り返す。
　所定回数の光照射が行われたと判定された場合は、次のステップＳ１０５に進む。
　ステップＳ１０５では、気体流制御部５７が、気体流発生部４０の稼働を止め空冷を終了させる。次いでステップＳ１０６に進む。
　ステップＳ１０６では、被パターン形成体載置台４３が退避位置に移動する。次いでステップＳ１０７に進む。
　ステップＳ１０７では、マスク１４が有機ＥＬシートから離される（マスク退避）。次いでステップＳ１０８に進む。
　ステップＳ１０８では、被パターン形成体載置台４３の吸着が終了され有機ＥＬシートの回収が行われる。
　パターニング装置の第２の形態の場合は、周回光照射のステップ移動を、複数の光源（ＬＥＤ）３５の発光を光源制御部５６で制御するにことより即座に行うことができる。
　したがって、第１の形態に比べ、ステップ移動の時間分タクトタイムの短縮が可能となる。その他のプロセスは、前記第２の形態の場合と同様にして行うことができる。 <Patterning process>
FIG. 11 shows an operation flow of an example of a patterning method according to the present invention (using the first embodiment of the patterning apparatus and the organic EL sheet 11 and the mask 14 shown in FIG. 1 and having four light irradiation areas). FIG.
When the power supply 51 of the patterning apparatus is turned on, the operation of the chiller unit 58 is started, and the cooling water continues to circulate in the pattern forming body mounting table 43.
First, in step S101, light irradiation conditions are selected. Light irradiation conditions are selected using a touch panel (not shown) of the operation unit 52. Further, the ID number of the organic EL sheet 11 is input. Next, the process proceeds to step S102.
In step S <b> 102, the organic EL sheet 11 is placed on the pattern forming body placement table 43. At this time, the pattern forming body mounting table 43 is in a position retracted from the light irradiation unit 32, and the organic EL sheet 11 is mounted and collected at this position. After the placement, a suction start button is pressed on a touch panel (not shown) of the operation unit 52, and the organic EL sheet 11 is sucked and fixed by a suction hole (not shown) provided on the pattern forming body mounting base 43. Next, the process proceeds to step S103.
In step S103, mask alignment is performed, and the mask 14 is placed at a predetermined position. When a light irradiation start button is pressed on a touch panel (not shown) of the operation unit 52, the support body of the mask alignment mechanism unit 69 that supports the mask frame 202 on which the mask 14 is mounted is lowered, and the mask 14 is in close contact with the organic EL sheet 11. Stop just before. Next, a plurality of mask alignment cameras (not shown) move right above each mask alignment mark 16, and the center of the mask alignment mark 16 comes to the center of the cross-shaped organic EL sheet alignment mark 13. Thus, X, Y, and ψ are adjusted by the mask alignment mechanism 69. After the mask alignment is completed, the camera is retracted, the mask frame 202 is further lowered, and the mask 14 is brought into close contact with the organic EL sheet 11. Next, the process proceeds to step S104.
In step S104, circular step light irradiation is performed.
When the circular step light irradiation is started, first, the pattern forming body mounting table 43 moves to the light irradiation position.
The movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P1.
The gas flow control unit 57 operates the gas flow generation unit 40 to start air cooling.
The movement mechanism control unit 55 moves the light irradiation unit 32 through the ball screw 63 so as to be a predetermined place in the light irradiation area P1.
The light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
The movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P2.
The light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
The movement mechanism control unit 55 moves the light irradiation unit 32 through the ball screw 63 so as to be a predetermined place in the light irradiation area P3.
The light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
The movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P4.
The light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
The controller 53 determines whether or not a predetermined number of times of light irradiation has been performed. If the predetermined number of times of light irradiation has not been performed, the light irradiation area P1 is moved and light irradiation is repeated.
When it is determined that the predetermined number of times of light irradiation has been performed, the process proceeds to the next step S105.
In step S105, the gas flow control unit 57 stops the operation of the gas flow generation unit 40 and ends the air cooling. Next, the process proceeds to step S106.
In step S106, the pattern forming body mounting table 43 moves to the retracted position. Next, the process proceeds to step S107.
In step S107, the mask 14 is separated from the organic EL sheet (mask withdrawal). Next, the process proceeds to step S108.
In step S108, the adsorption of the pattern forming body mounting table 43 is completed, and the organic EL sheet is collected.
In the case of the second form of the patterning device, the step movement of the irradiating light can be performed immediately by controlling the light emission of the plurality of light sources (LEDs) 35 by the light source controller 56.
Therefore, the tact time can be shortened by the time required for the step movement as compared with the first embodiment. Other processes can be performed in the same manner as in the second embodiment.
　［有機エレクトロルミネッセンス素子］
　本発明に係る有機ＥＬ素子は、少なくとも一対の電極間に一つ又は複数の有機機能層を備えている。本発明における有機機能層とは、有機化合物を含有する層をいう。例えば、正孔注入層、正孔輸送層、発光層（青色発光層、緑色発光層、赤色発光層を含む）電子輸送層、電子注入層を挙げることができる。 [Organic electroluminescence device]
The organic EL device according to the present invention includes one or a plurality of organic functional layers between at least a pair of electrodes. The organic functional layer in the present invention refers to a layer containing an organic compound. Examples thereof include a hole injection layer, a hole transport layer, a light emitting layer (including a blue light emitting layer, a green light emitting layer, and a red light emitting layer), an electron transport layer, and an electron injection layer.
　本発明に係る有機ＥＬ素子は、種々の構成を採り得るが、一例を図１２に示す。なお図１２は説明のため縦横比は正確ではない。 The organic EL element according to the present invention can take various configurations, and an example is shown in FIG. In FIG. 12, the aspect ratio is not accurate for explanation.
　図１２に示すとおり、本発明に係る有機ＥＬ素子１２は、基板１１３上に設けられており、基板１１３側から順に、第１電極７１（透明電極）、有機材料等を用いて構成された有機機能層群７３、及び第２電極７５ａ（対向電極）をこの順に積層して構成されている。第１電極７１（下地層７１ａと電極層７１ｂからなる。）の端部には、取り出し電極１１６が設けられている。第１電極７１と外部電源（不図示）とは、取り出し電極１１６を介して、電気的に接続される。有機ＥＬ素子１２は、発生させた光（発光光ｈ）を、少なくとも基板１１３側から取り出す構成例を示している。すなわち、第１電極７１が透明電極で、第２電極７５ａが非透明電極のケースを示してある。 As shown in FIG. 12, the organic EL element 12 according to the present invention is provided on a substrate 113, and is configured by using a first electrode 71 (transparent electrode), an organic material, and the like in order from the substrate 113 side. The functional layer group 73 and the second electrode 75a (counter electrode) are stacked in this order. An extraction electrode 116 is provided at the end of the first electrode 71 (consisting of the base layer 71a and the electrode layer 71b). The first electrode 71 and an external power source (not shown) are electrically connected via the extraction electrode 116. The organic EL element 12 shows a configuration example in which generated light (emitted light h) is extracted from at least the substrate 113 side. That is, the case where the first electrode 71 is a transparent electrode and the second electrode 75a is a non-transparent electrode is shown.
　また、適用する有機ＥＬ素子１２を構成する層構造は限定されることはなく、一般的な層構造であって良い。ここでは、第１電極７１がアノード（陽極）として機能し、第２電極７５ａがカソード（陰極）として機能する例を示してある。図１２では、一例として、有機機能層群７３の構成としては、アノードである第１電極７１側から順に正孔注入層７３ａ／正孔輸送層７３ｂ／発光層７３ｃ／電子輸送層７３ｄ／電子注入層７３ｅを積層した構成を例示してあるが、このうち、少なくとも発光性化合物を含有する発光層７３ｃを有することが必須である。正孔注入層７３ａ及び正孔輸送層７３ｂは、正孔輸送注入層として設けても良い。同様に、電子輸送層７３ｄ及び電子注入層７３ｅは、電子輸送注入層として設けても良い。 Further, the layer structure constituting the organic EL element 12 to be applied is not limited, and may be a general layer structure. Here, an example is shown in which the first electrode 71 functions as an anode (anode) and the second electrode 75a functions as a cathode (cathode). In FIG. 12, as an example, the organic functional layer group 73 has a structure in which the hole injection layer 73a / hole transport layer 73b / light emitting layer 73c / electron transport layer 73d / electron injection are sequentially arranged from the first electrode 71 side which is an anode. Although the structure which laminated | stacked the layer 73e is illustrated, it is essential to have the light emitting layer 73c containing a luminescent compound at least among these. The hole injection layer 73a and the hole transport layer 73b may be provided as a hole transport injection layer. Similarly, the electron transport layer 73d and the electron injection layer 73e may be provided as an electron transport injection layer.
　また、有機機能層群７３は、これらの各構成層の他にも、正孔阻止層や電子阻止層等を、必要に応じて必要な箇所に積層されていても良い。さらに、発光層７３ｃは、各波長領域の発光光を発生させる各色発光層を有し、これらの各色発光層を、非発光性の中間層を介して積層させた構造としても良い。中間層は、正孔阻止層、電子阻止層として機能しても良い。さらに、カソードである第２電極７５ａも、必要に応じ積層構造であっても良い。このような構成において、第１電極７１と第２電極７５ａとで有機機能層群７３が挟持された部分のみが、有機ＥＬ素子１２における発光領域となる。 Moreover, the organic functional layer group 73 may be laminated with a hole blocking layer, an electron blocking layer, and the like in necessary portions in addition to these constituent layers. Further, the light emitting layer 73c may have a structure in which each color light emitting layer that generates light emitted in each wavelength region is laminated, and each of these color light emitting layers is laminated via a non-light emitting intermediate layer. The intermediate layer may function as a hole blocking layer and an electron blocking layer. Furthermore, the second electrode 75a serving as the cathode may also have a laminated structure as necessary. In such a configuration, only a portion where the organic functional layer group 73 is sandwiched between the first electrode 71 and the second electrode 75 a becomes a light emitting region in the organic EL element 12.
　また、以上のような層構成においては、第１電極７１の低抵抗化を図ることを目的として、第１電極７１の電極層７１ｂに接して補助電極１１５が設けられていても良い。 In the layer configuration as described above, the auxiliary electrode 115 may be provided in contact with the electrode layer 71 b of the first electrode 71 for the purpose of reducing the resistance of the first electrode 71.
　以上のような構成の有機ＥＬ素子１２は、有機材料等を用いて構成された有機機能層群７３の有害ガス等による劣化を防止することを目的として、基板１１３上に封止部材１１７で封止されている。この封止部材１１７は、接着剤１１９を介して、基板１１３側に固定されている。ただし、第１電極７１の取り出し電極１１６及び第２電極７５ａの端子部分は、基板１１３上において、有機機能層群７３によって互いに絶縁性を保った状態で、封止部材１１７から露出させた状態で設けられている。 The organic EL element 12 having the above configuration is sealed with a sealing member 117 on the substrate 113 for the purpose of preventing deterioration of the organic functional layer group 73 configured using an organic material or the like due to harmful gas. It has been stopped. This sealing member 117 is fixed to the substrate 113 side via an adhesive 119. However, the extraction electrode 116 of the first electrode 71 and the terminal portion of the second electrode 75a are exposed from the sealing member 117 while being insulated from each other by the organic functional layer group 73 on the substrate 113. Is provided.
　なお、有機ＥＬ素子を構成する各層に用いられている材料は、公知のものを用いることができる。 In addition, a well-known thing can be used for the material used for each layer which comprises an organic EL element.
　≪有機エレクトロルミネッセンス素子の製造方法≫
　本発明のパターニング装置は、発光パターンを形成した有機エレクトロルミネッセンス素子を製造する有機エレクトロルミネッセンス素子の製造方法に好適に採用できる。中でも、発光パターンのエッジ部が、１０～３００μｍの範囲内で輝度分布を有することを特徴とする有機エレクトロルミネッセンス素子の製造方法に好適に採用できる。
　このような、発光パターンのエッジ部が、１０～３００μｍの範囲内で輝度分布を有する有機ＥＬ素子は、上記本発明のパターニング装置を使用して有機ＥＬ素子のパターニングすることで、製造することができる。
　ここで、発光パターンのエッジ部とは、マスクにおける遮光部で形成された発光パターンの辺を指す。 ≪Method for manufacturing organic electroluminescence element≫
The patterning apparatus of the present invention can be suitably used in a method for manufacturing an organic electroluminescent element that manufactures an organic electroluminescent element in which a light emitting pattern is formed. In particular, the present invention can be suitably employed in a method for manufacturing an organic electroluminescence element, wherein the edge portion of the light emission pattern has a luminance distribution within a range of 10 to 300 μm.
Such an organic EL element having a luminance distribution with an edge portion of the light emission pattern within a range of 10 to 300 μm can be manufactured by patterning the organic EL element using the patterning device of the present invention. it can.
Here, the edge part of the light emission pattern refers to the side of the light emission pattern formed by the light shielding part in the mask.
　なお、本発明のパターニング装置を用いるような、非平行光で光を照射する場合、図１３Ａに示すようにマスク入射角が０°でない斜光線はマスクの遮光膜の下側に潜り込む。この場合、遮光膜Ｃのエッジ部Ｅ近辺では放射照度が０にはならず、図１３Ｂに示すように傾斜を持った放射照度分布となる。この潜り込み量δはｔ×ｔａｎ（θ）となる。ここで、θはコリメーション半角、ｔは遮光膜から有機層までの空気換算長で、有機ＥＬ素子の基材の厚さをｔｓ、屈折率をｎとした場合、ｔ＝ｔｓ／ｎとなる。この遮光膜のエッジ部Ｅ近辺の放射照度分布により、光を照射した有機ＥＬ素子の発光パターンのエッジ部も、例えば、発光部から非発光部へと向かうにしたがって輝度が低下するような傾斜を有する輝度分布になる。この傾斜の幅が発光パターンの解像度を決めるので、所望の解像度が得られるコリメーション半角で装置を設計することが好ましい。 When irradiating light with non-parallel light as in the case of using the patterning apparatus of the present invention, as shown in FIG. 13A, oblique rays whose mask incident angle is not 0 ° enter under the light shielding film of the mask. In this case, the irradiance does not become zero in the vicinity of the edge portion E of the light shielding film C, and the irradiance distribution has an inclination as shown in FIG. 13B. This amount of dive δ is t × tan (θ). Here, θ is a collimation half angle, t is an air conversion length from the light shielding film to the organic layer, and when the thickness of the base material of the organic EL element is ts and the refractive index is n, t = ts / n. Due to the irradiance distribution in the vicinity of the edge portion E of the light shielding film, the edge portion of the light emission pattern of the organic EL element irradiated with light is also inclined such that the luminance decreases as it goes from the light emitting portion to the non-light emitting portion, for example. The luminance distribution has. Since the width of the inclination determines the resolution of the light emission pattern, it is preferable to design the apparatus with a collimation half angle at which a desired resolution can be obtained.
　一般に、有機ＥＬ素子の基材の厚さが薄く、照射光のコリメーション半角が小さいほど解像度を高めることができる。
　しかし、コリメーション半角を小さくすると放射照度を上げることができなくなってしまう。
　これについて、本発明者らは、下記のように考えている。 Generally, the resolution can be increased as the base material of the organic EL element is thinner and the collimation half angle of the irradiation light is smaller.
However, if the collimation half angle is reduced, the irradiance cannot be increased.
The present inventors consider this as follows.
　有機ＥＬ素子の相反則不軌特性を利用して、パターニングのための光の照射時間を短縮するには、最低でも１Ｗ／ｃｍ２の放射照度が好ましく、この放射照度でコリメーション半角をできるだけ小さくなるように設計した結果、コリメーション半角は２３°まで小さくできることが分かった。このコリメーション半角で、有機ＥＬ素子の基材厚を例えば２５μｍ（ｎ＝１．７）まで薄型化した場合には、上記δは６μｍとなり、かなりの解像度を確保できる。一方、タクトタイム優先とし、コリメーション半角の増大を許容した場合、例えば４Ｗ／ｃｍ２を確保できるコリメーション半角θは４５°で基材厚さ５００μｍの場合には、上記δが２９４μｍとなり、ハーフピッチ０．３ｍｍが解像限界となる。ハーフピッチ０．３ｍｍ程度の解像度であれば、視感に訴える大抵の発光パターンは再現できるので、エッジ部の輝度分布の傾斜幅は１０～３００μｍが好ましい。なお、コリメーション半角θが４５°で基材の厚さを１３０μｍとした場合には、上記δは７６μｍとなり、ハーフピッチ０．１ｍｍを十分解像できると考える。また、このような理由から、本発明のパターニング装置を使用して有機ＥＬ素子のパターニングすることで、発光パターンのエッジ部が、１０～３００μｍの範囲内で輝度分布を有する有機ＥＬ素子を製造することができると考える。 In order to shorten the light irradiation time for patterning using the reciprocity failure characteristic of the organic EL element, an irradiance of at least 1 W / cm 2 is preferable, and the collimation half angle is made as small as possible with this irradiance. As a result, it was found that the collimation half angle can be reduced to 23 °. When the substrate thickness of the organic EL element is reduced to, for example, 25 μm (n = 1.7) at this collimation half angle, δ is 6 μm, and a considerable resolution can be secured. On the other hand, when the tact time is prioritized and the increase of the collimation half angle is allowed, for example, when the collimation half angle θ that can secure 4 W / cm 2 is 45 ° and the substrate thickness is 500 μm, the above δ is 294 μm, and the half pitch is 0 .3mm is the resolution limit. Since most light emission patterns appealing to visual sensation can be reproduced with a resolution of about half pitch 0.3 mm, the slope of the luminance distribution at the edge is preferably 10 to 300 μm. When the collimation half angle θ is 45 ° and the thickness of the substrate is 130 μm, δ is 76 μm, and it is considered that the half pitch 0.1 mm can be sufficiently resolved. For this reason, an organic EL element having a luminance distribution within a range of 10 to 300 μm is manufactured by patterning the organic EL element using the patterning apparatus of the present invention. I think you can.
　（輝度分布の測定）
　輝度分布は、公知の輝度計で計測することができ、例えば、２次元色彩輝度計であるＣＡ－２０００（コニカミノルタ社製）を用いて測定できるが、これに限定されない。 (Measurement of luminance distribution)
The luminance distribution can be measured with a known luminance meter. For example, the luminance distribution can be measured using CA-2000 (manufactured by Konica Minolta), which is a two-dimensional color luminance meter, but is not limited thereto.
　（有機エレクトロルミネッセンス素子の製造方法の具体例）
　以下に本発明に係る有機エレクトロルミネッセンス素子の製造方法について、具体例を述べる。 (Specific example of manufacturing method of organic electroluminescence device)
Specific examples of the method for producing an organic electroluminescence element according to the present invention are described below.
　まず、基板上に、成膜用マスクを使用して陽極を成膜する。
　次に、蒸着用るつぼの各々に、正孔注入材料、正孔輸送材料、発光層のホスト化合物及びドーパント、電子輸送材料、電子注入材料を各々素子作製に最適の量を充填する。 First, an anode is formed on a substrate using a film formation mask.
Next, each of the evaporation crucibles is filled with a hole injection material, a hole transport material, a host compound and a dopant for the light emitting layer, an electron transport material, and an electron injection material in an optimum amount for device fabrication.
　次いで、減圧した後、正孔注入材料の入った前記蒸着用るつぼに通電して加熱し、正孔注入材料を基板に蒸着し正孔注入層を設ける。 Next, after reducing the pressure, the evaporation crucible containing the hole injection material is energized and heated to deposit the hole injection material on the substrate to provide a hole injection layer.
　次いで、正孔輸送材料の入った前記蒸着用るつぼに通電して加熱し、正孔輸送材料を正孔注入層上に蒸着し、正孔輸送層を設ける。 Next, the evaporation crucible containing the hole transport material is energized and heated to deposit the hole transport material on the hole injection layer, thereby providing a hole transport layer.
　次いで、発光層のホスト化合物及びドーパントの入った前記蒸着用るつぼに通電して加熱し、発光層のホスト化合物及びドーパントを正孔輸送層上に共蒸着し、発光層を設ける。 Next, the deposition crucible containing the host compound and dopant of the light emitting layer is energized and heated, and the host compound and dopant of the light emitting layer are co-deposited on the hole transport layer to provide a light emitting layer.
　次いで、正孔阻止材料の入った前記蒸着用るつぼに通電して加熱し、正孔阻止材料を発光層上に蒸着し、正孔阻止層を設ける。 Next, the deposition crucible containing the hole blocking material is energized and heated to deposit the hole blocking material on the light emitting layer, thereby providing a hole blocking layer.
　次いで、電子輸送材料の入った前記蒸着用るつぼに通電して加熱し、電子輸送材料を正孔阻止層上に蒸着し、電子輸送層を設ける。 Next, the deposition crucible containing the electron transport material is energized and heated to deposit the electron transport material on the hole blocking layer, thereby providing an electron transport layer.
　更に、電子注入材料の入った前記蒸着用るつぼに通電して加熱し、電子注入材料を電子輸送層上に蒸着し、電子注入層を設ける。このようにして有機機能層を形成できる。 Further, the deposition crucible containing the electron injection material is energized and heated to deposit the electron injection material on the electron transport layer to provide an electron injection layer. Thus, an organic functional layer can be formed.
　最後に、アルミニウムなどを電子注入層上に蒸着し、陰極を設ける。この後、前記蒸着面側をエポキシ樹脂などの封止部材で覆い、更に、アルミニウム箔で覆って保護膜を形成した後、硬化させる。なお、ここまでの操作は全て、素子を大気に接触させることなく、窒素雰囲気下のグローブボックス（純度９９．９９９％以上の高純度窒素ガスの雰囲気下）内で行われることが好ましい。 Finally, aluminum or the like is deposited on the electron injection layer and a cathode is provided. Thereafter, the vapor deposition surface side is covered with a sealing member such as an epoxy resin, further covered with an aluminum foil to form a protective film, and then cured. Note that all the operations up to here are preferably performed in a glove box (in an atmosphere of high-purity nitrogen gas having a purity of 99.999% or more) in a nitrogen atmosphere without bringing the element into contact with the air.
　このようにして有機ＥＬ素子を作製できる。
　このような有機ＥＬ素子は、パターニングに際し、所定の大きさにカットする。なお、有機ＥＬ素子についてのパターニングは、上述したとおりに行うことができる。
　また、有機ＥＬ素子の製造方法は、上記方法に限定されず、公知の方法を使用することができる。 Thus, an organic EL element can be produced.
Such an organic EL element is cut into a predetermined size during patterning. The patterning of the organic EL element can be performed as described above.
Moreover, the manufacturing method of an organic EL element is not limited to the said method, A well-known method can be used.
　なお、本発明を適用可能な実施形態は、上述した実施形態に限定されることなく、本発明の趣旨を逸脱しない範囲で適宜変更可能である。 Note that embodiments to which the present invention can be applied are not limited to the above-described embodiments, and can be appropriately changed without departing from the spirit of the present invention.
　例えば、図５では、マスク保持機構の一例として、粘弾性体が固定手段と２面で当接した例を示しているが、粘弾性体を固定することができれば特にこれに限定されず、例えば、１面（粘弾性のマスクとは反対側の面）で当接して固定するようにしてもよい。また、図５では、全ての粘弾性体は固定手段により固定されているが、対向して配置されている一対の粘弾性体のうち、少なくとも一方が固定手段により固定されていればよい。 For example, FIG. 5 shows an example in which the viscoelastic body is in contact with the fixing means on two surfaces as an example of the mask holding mechanism, but is not particularly limited as long as the viscoelastic body can be fixed. Alternatively, the first surface (the surface opposite to the viscoelastic mask) may be contacted and fixed. In FIG. 5, all the viscoelastic bodies are fixed by the fixing means, but at least one of the pair of viscoelastic bodies arranged to face each other may be fixed by the fixing means.
　また、マスク外れ防止規制板を粘弾性体及び固定手段と別途設けた例を示したが、固定手段にマスク外れ防止機能を持たせてもよい。すなわち、粘弾性体をマスクよりも高くなるようにし、当該粘弾性体を固定する固定手段の上面をマスク側に延在させることにより、固定手段にマスク外れ防止機能を持たせることができる。 In addition, although an example in which the mask detachment prevention restricting plate is provided separately from the viscoelastic body and the fixing means is shown, the fixing means may have a mask detachment preventing function. That is, by making the viscoelastic body higher than the mask and extending the upper surface of the fixing means for fixing the viscoelastic body to the mask side, the fixing means can have a function of preventing the mask from coming off.
　さらに、マスク保持機構のその他の態様として、マスクの各辺のうち一辺を固定ピンとして、位置決め配置され固定する態様であってもよい。このような態様のマスク保持機構であっても、本発明に係るマスク保持機構と同様の効果を得ることができる。
　また、マスクと接触する部分に面積のある粘性物（例えば、粘弾性体（ゴム）薄板）を設け、その部材を、剛体を介してフック弾性体で一定圧力を加える機構でも同様の効果を得ることができる。 Furthermore, as another aspect of the mask holding mechanism, an aspect in which one side of each side of the mask is positioned and fixed as a fixing pin may be used. Even with such a mask holding mechanism, the same effect as the mask holding mechanism according to the present invention can be obtained.
A similar effect can be obtained with a mechanism in which a viscous material having an area (for example, a viscoelastic body (rubber) thin plate) is provided in a portion in contact with the mask and a constant pressure is applied to the member with a hook elastic body via a rigid body. be able to.
　また、例えば、上記パターニング装置による光照射の例として、パルス光を用いる例を説明したが、本発明はこれに限定されず、連続的な光を照射することとしてもよい。また、光照射エリアを分割し、分割された光照射エリアに対して順次光を照射する例を説明したが、本発明はこれに限定されず、光照射エリアを分割せず、光照射部内の光源を一括点灯させることでパターニングを行ってもよい。 For example, as an example of light irradiation by the patterning device, an example using pulsed light has been described. However, the present invention is not limited to this, and continuous light may be irradiated. Moreover, although the example which divides | segments a light irradiation area and irradiates light sequentially with respect to the divided light irradiation area was demonstrated, this invention is not limited to this, A light irradiation area is not divided | segmented, but in a light irradiation part Patterning may be performed by turning on the light sources at once.
　また、例えば、上記パターニング装置は、カバーを有するものとして説明したが、カバーを有していないパターニング装置であってもよい。 For example, although the patterning apparatus has been described as having a cover, the patterning apparatus may not have a cover.
　以下、実施例を挙げて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。なお、実施例において「部」又は「％」の表示を用いるが、特に断りがない限り「質量部」又は「質量％」を表す。 Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. In addition, although the display of "part" or "%" is used in an Example, unless otherwise indicated, "mass part" or "mass%" is represented.
　［有機ＥＬ素子の作製］
　＜基板の作製＞
　〈ガスバリアーフィルムの作製〉
　厚さ７５μｍのポリエステルフィルム（帝人デュポンフィルム株式会社製、極低熱収ＰＥＴ　Ｑ８３；分光光度計にて測定した、波長３８５ｎｍにおける紫外線の透過率８４％、分光光度計（日立ハイテクノロジーズ社製Ｕ－３３００使用）を基材として用いて、ポリシラザン塗膜を形成した後、下記の方法にしたがって、真空紫外線照射処理を施して厚さ２５０ｎｍのガスバリアー層を形成し、これを４回繰り返し、総厚さ１０００ｎｍのガスバリアー層を有するガスバリアーフィルムを作製した。 [Production of organic EL element]
<Production of substrate>
<Production of gas barrier film>
Polyester film with a thickness of 75 μm (manufactured by Teijin DuPont Films Ltd., ultra low heat yield PET Q83; UV transmittance at a wavelength of 385 nm measured with a spectrophotometer, 84%, spectrophotometer (U-made by Hitachi High-Technologies Corporation) 3300) as a base material, and after forming a polysilazane coating film, a vacuum ultraviolet ray irradiation treatment was performed according to the following method to form a gas barrier layer having a thickness of 250 nm, which was repeated four times to obtain a total thickness. A gas barrier film having a gas barrier layer having a thickness of 1000 nm was produced.
　（ポリシラザン含有塗布液の調製）
　無触媒のパーヒドロポリシラザンを２０質量％含むジブチルエーテル溶液（ＡＺエレクトロニックマテリアルズ株式会社製、アクアミカ（登録商標）ＮＮ１２０－２０）と、アミン触媒（Ｎ，Ｎ，Ｎ′，Ｎ′－テトラメチル－１，６－ジアミノヘキサン（ＴＭＤＡＨ））５質量％を含むパーヒドロポリシラザン２０質量％のジブチルエーテル溶液（ＡＺエレクトロニックマテリアルズ株式会社製、アクアミカ（登録商標）ＮＡＸ１２０－２０）とを、４：１の割合で混合し、さらにジブチルエーテルと２，２，４－トリメチルペンタンとの質量比が６５：３５となるように混合した溶媒で、塗布液の固形分が５質量％になるように、塗布液を希釈調製した。 (Preparation of polysilazane-containing coating solution)
Dibutyl ether solution containing 20% by mass of non-catalytic perhydropolysilazane (manufactured by AZ Electronic Materials, Aquamica (registered trademark) NN120-20) and amine catalyst (N, N, N ′, N′-tetramethyl-) Perhydropolysilazane 20 mass% dibutyl ether solution (AZ Electronic Materials Co., Ltd., Aquamica (registered trademark) NAX120-20) containing 5 mass% of 1,6-diaminohexane (TMDAH) 4: 1 In a solvent mixed so that the mass ratio of dibutyl ether and 2,2,4-trimethylpentane was 65:35, the coating solution was mixed so that the solid content of the coating solution was 5% by mass. Was diluted and prepared.
　上記で得られた塗布液を、スピンコーターにて上記ＰＥＴ基材上に改質後の厚さが２５０ｎｍになるよう成膜し、２分間放置した後、８０℃のホットプレートで１分間加熱処理を行い、ポリシラザン塗膜を形成した。 The coating solution obtained above was formed on the PET substrate with a spin coater so that the thickness after modification was 250 nm, left for 2 minutes, and then heat-treated for 1 minute on an 80 ° C. hot plate. And a polysilazane coating film was formed.
　乾燥後、基材を２５℃まで徐冷し、真空紫外線照射装置内で、塗布面に真空紫外線照射による改質処理を行った。真空紫外線照射装置の光源としては、１７２ｎｍの真空紫外線を照射する二重管構造を有するＸｅエキシマランプを用いた。 After drying, the substrate was gradually cooled to 25 ° C., and the coating surface was subjected to modification treatment by irradiation with vacuum ultraviolet rays in a vacuum ultraviolet irradiation apparatus. As a light source of the vacuum ultraviolet irradiation device, an Xe excimer lamp having a double tube structure for irradiating vacuum ultraviolet rays of 172 nm was used.
　（改質処理装置）
　株式会社エム・ディ・コム製エキシマ照射装置ＭＯＤＥＬ：ＭＥＣＬ－Ｍ－１－２００、光波長１７２ｎｍ、ランプ封入ガス　Ｘｅ (Modification equipment)
Excimer irradiation device MODEL: MECL-M-1-200, light wavelength 172 nm, lamp filled gas Xe
　（改質処理条件）
　エキシマ光強度　３Ｊ／ｃｍ２（１７２ｎｍ）
　ステージ加熱温度　１００℃
　照射装置内の酸素濃度　１０００ｐｐｍ
　次に、基材のガスバリアー層を形成した側の面とは反対側の面に厚さ２μｍのクリアハードコート層を以下のようにして形成した。 (Reforming treatment conditions)
Excimer light intensity 3J / cm 2 (172nm)
Stage heating temperature 100 ° C
Oxygen concentration in the irradiation device 1000ppm
Next, a clear hard coat layer having a thickness of 2 μm was formed as follows on the surface of the substrate opposite to the surface on which the gas barrier layer was formed.
　ＪＳＲ株式会社製、ＵＶ硬化型樹脂オプスター（登録商標）Ｚ７５２７を、乾燥層厚が２μｍになるように樹脂基材に塗布した後、８０℃で乾燥し、その後、空気下、高圧水銀ランプを用いて照射エネルギー量０．５Ｊ／ｃｍ２の条件で硬化を行った。 A UV curable resin OPSTAR (registered trademark) Z7527 manufactured by JSR Corporation was applied to a resin substrate so as to have a dry layer thickness of 2 μm, dried at 80 ° C., and then using a high-pressure mercury lamp in the air. Then, curing was performed under the condition of an irradiation energy amount of 0.5 J / cm 2 .
　当該基板は、ＪＩＳ　Ｋ　７１２６－１９８７に準拠した方法で測定された酸素透過度が、１×１０－３ｍＬ／ｍ２・２４ｈ・ａｔｍ以下、水蒸気透過度が、１×１０－４ｇ／ｍ２・２４ｈ以下のガスバリアー性基板であることを確認した。 The substrate has an oxygen permeability measured by a method according to JIS K 7126-1987 of 1 × 10 −3 mL / m 2 · 24 h · atm or less, and a water vapor permeability of 1 × 10 −4 g / m. it was confirmed that the following gas-barrier substrate 2 · 24h.
　《有機ＥＬ素子１０１の作製》
　上記基板上に、真空蒸着装置内で、下記構造式で表される含窒素化合物Ｎ－１を２５ｎｍの厚さで成膜後、成膜用マスクを使用して陽極として銀を１０ｎｍの厚さで成膜した。 << Production of Organic EL Element 101 >>
On the substrate, a nitrogen-containing compound N-1 represented by the following structural formula was formed in a thickness of 25 nm in a vacuum deposition apparatus, and then silver was formed to a thickness of 10 nm as an anode using a film-forming mask. The film was formed.
　更に、蒸着用るつぼの各々に、正孔注入材料としてＣｕＰｃ（銅フタロシアニン）、正孔輸送材料としてＮ，Ｎ′－Ｄｉ（１－ｎａｐｈｔｈｙｌ）－Ｎ，Ｎ′－ｄｉｐｈｅｎｙｌｂｅｎｚｉｄｉｎｅ（α－ＮＰＤ）、緑色発光層のホスト化合物として４，４′－Ｂｉｓ（Ｎ－ｃａｒｂａｚｏｌｙｌ）－１，１′－ｂｉｐｈｅｎｙｌ（ＣＢＰ）、緑色発光層のドーパントとしてＩｒ（ｐｐｙ）３、正孔阻止材料としてアルミニウム（III）ビス（２－メチル－８－キノリナート）－４－フェニルフェノレート（ＢＡｌｑ）、電子輸送材料としてｔｒｉｓ（８－ｈｙｄｒｏｘｙｑｕｉｎｏｌｉｎａｔｏ）ａｌｕｍｉｎｉｕｍ（Ａｌｑ３）、電子注入材料としてＬｉＦを各々素子作製に最適の量を充填した。蒸着用るつぼはモリブデン製又はタングステン製抵抗加熱用材料で作製されたものを用いた。 Further, in each of the crucibles for vapor deposition, CuPc (copper phthalocyanine) as a hole injection material, N, N′-Di (1-naphthyl) -N, N′-diphenylbenzidine (α-NPD), green as a hole transport material 4,4'-Bis (N-carbazolyl) -1,1'-biphenyl (CBP) as the host compound of the light emitting layer, Ir (ppy) 3 as the dopant of the green light emitting layer, and aluminum (III) bis as the hole blocking material (2-Methyl-8-quinolinato) -4-phenylphenolate (BAlq), tris (8-hydroxyquinolinato) aluminum (Alq 3 ) as an electron transport material, and LiF as an electron injection material are filled in optimal amounts for device fabrication. did. The vapor deposition crucible used was made of molybdenum or tungsten resistance heating material.
　含窒素化合物Ｎ－１、ＣｕＰｃ、α－ＮＰＤ、ＣＢＰ、Ｉｒ（ｐｐｙ）３、ＢＡｌｑ、Ａｌｑ３の各構造式を、それぞれ、以下に示す。 The structural formulas of nitrogen-containing compound N-1, CuPc, α-NPD, CBP, Ir (ppy) 3 , BAlq, and Alq 3 are shown below.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
　次いで、真空度４×１０－４Ｐａまで減圧した後、ＣｕＰｃの入った前記蒸着用るつぼに通電して加熱し、ＣｕＰｃを蒸着速度０．１ｎｍ／秒で樹脂基板の銀電極側に蒸着し、層厚１５ｎｍの正孔注入層を設けた。 Next, after reducing the vacuum to 4 × 10 −4 Pa, the deposition crucible containing CuPc was energized and heated, and CuPc was deposited on the silver electrode side of the resin substrate at a deposition rate of 0.1 nm / second, A hole injection layer having a layer thickness of 15 nm was provided.
　次いで、α－ＮＰＤの入った前記蒸着用るつぼに通電して加熱し、α－ＮＰＤを蒸着速度０．１ｎｍ／秒で正孔注入層上に蒸着し、厚さ２５ｎｍの正孔輸送層を設けた。 Next, the deposition crucible containing α-NPD is energized and heated, and α-NPD is deposited on the hole injection layer at a deposition rate of 0.1 nm / second to provide a hole transport layer having a thickness of 25 nm. It was.
　次いで、５質量％のＩｒ（ｐｐｙ）３とＣＢＰの入った前記蒸着用るつぼに通電して加熱し、Ｉｒ（ｐｐｙ）３とＣＢＰとを合計の蒸着速度０．１ｎｍ／秒で正孔輸送層上に共蒸着し、層厚１０ｎｍの緑色発光層を設けた。 Next, the evaporation crucible containing 5% by mass of Ir (ppy) 3 and CBP was energized and heated, and Ir (ppy) 3 and CBP were added to the hole transport layer at a total deposition rate of 0.1 nm / second. Co-evaporated on top, a green light emitting layer with a layer thickness of 10 nm was provided.
　次いで、ＢＡｌｑの入った前記蒸着用るつぼに通電して加熱し、ＢＡｌｑを蒸着速度０．１ｎｍ／秒で緑色発光層上に蒸着し、層厚１５ｎｍの正孔阻止層を設けた。 Next, the deposition crucible containing BAlq was energized and heated, and BAlq was deposited on the green light emitting layer at a deposition rate of 0.1 nm / second to provide a hole blocking layer having a layer thickness of 15 nm.
　次いで、Ａｌｑ３の入った前記蒸着用るつぼに通電して加熱し、Ａｌｑ３を蒸着速度０．１ｎｍ／秒で正孔阻止層上に蒸着し、層厚３０ｎｍの電子輸送層を設けた。 Subsequently, the crucible for vapor deposition containing Alq 3 was energized and heated, and Alq 3 was vapor-deposited on the hole blocking layer at a vapor deposition rate of 0.1 nm / second to provide an electron transport layer having a layer thickness of 30 nm.
　更に、ＬｉＦの入った前記蒸着用るつぼに通電して加熱し、ＬｉＦを蒸着速度０．１ｎｍ／秒で電子輸送層上に蒸着し、層厚１ｎｍの電子注入層を設けた。このようにして有機機能層を形成した。 Further, the deposition crucible containing LiF was energized and heated, LiF was deposited on the electron transport layer at a deposition rate of 0.1 nm / second, and an electron injection layer having a thickness of 1 nm was provided. In this way, an organic functional layer was formed.
　最後に、アルミニウムを電子注入層上に蒸着し、層厚１１０ｎｍの陰極を設けた。そして、前記蒸着面側を厚さ２００μｍのエポキシ樹脂で覆って封止部材とし、更に、厚さ１２μｍのアルミニウム箔で覆って保護膜とした後、硬化させた。ここまでの操作は全て、素子を大気に接触させることなく、窒素雰囲気下のグローブボックス（純度９９．９９９％以上の高純度窒素ガスの雰囲気下）内で行った。 Finally, aluminum was vapor-deposited on the electron injection layer, and a cathode having a layer thickness of 110 nm was provided. Then, the vapor deposition surface side was covered with an epoxy resin having a thickness of 200 μm to form a sealing member, further covered with an aluminum foil having a thickness of 12 μm to form a protective film, and then cured. All the operations so far were performed in a glove box (in an atmosphere of high-purity nitrogen gas having a purity of 99.999% or more) in a nitrogen atmosphere without bringing the element into contact with the atmosphere.
　このようにしてサイズが６ｃｍ×１５ｃｍの有機ＥＬ素子１０１を作製した。パターニングに際し、有機ＥＬ素子１０１が７列×５列に配列形成された有機ＥＬシートを用いた。シートのサイズは７０ｃｍ×１００ｃｍである。 Thus, an organic EL element 101 having a size of 6 cm × 15 cm was produced. In the patterning, an organic EL sheet in which organic EL elements 101 are arranged in 7 rows × 5 rows was used. The size of the sheet is 70 cm × 100 cm.
　《パターニングされた有機ＥＬパネル１０１の作製》
　［紫外線照射］
　図４に示したパターニング装置を用いて、有機ＥＬ素子１０１をパターニングして有機ＥＬパネル１０１を作製した。パターニングの条件を以下に示す。
　なお、コリメーション半角は、レンズアレイで所定のコリメーション半角に整形した。また、上記レンズアレイを調整し、放射照度は、光照射エリア内における放射照度の平均値に対し±１０％の範囲内となるようにした。
　なお、コリメーション半角及び放射照度の測定は下記のようにして行った。 << Preparation of patterned organic EL panel 101 >>
[UV irradiation]
The organic EL element 101 was patterned by using the patterning apparatus shown in FIG. The patterning conditions are shown below.
The collimation half angle was shaped into a predetermined collimation half angle by the lens array. Further, the lens array was adjusted so that the irradiance was within a range of ± 10% with respect to the average value of the irradiance in the light irradiation area.
The collimation half angle and irradiance were measured as follows.
　（コリメーション半角の測定）
　被パターン形成体載置台を退避位置に移動させ、ピンホールを被パターン形成体載置台の有機ＥＬシートを載置する面と同じ高さ（以下、照射面という）に配置し、ＣＣＤカメラの代わりにＵＶ感光紙（富士フイルム製ＵＶスケール）をピンホールから１０ｍｍ下側に設置した。次いで放射照度２Ｗ／ｃｍ２にて１０分間紫外線を光照射部からピンホールに照射し、ピンホールを通り抜けた光によりＵＶ感光紙を感光させた。感光により変色した領域の半径を測長し、コリメーション半角を算出した。この測定を光照射エリアの中央と四隅の５か所で実施した結果、コリメーション半角は４１～４５°であった。 (Measurement of collimation half-width)
The pattern forming body mounting table is moved to the retracted position, and the pinhole is disposed at the same height (hereinafter referred to as the irradiation surface) as the surface on which the organic EL sheet of the pattern forming body mounting table is mounted, instead of the CCD camera. A UV photosensitive paper (Fuji Film UV scale) was placed 10 mm below the pinhole. Next, ultraviolet light was irradiated from the light irradiation part to the pinhole at an irradiance of 2 W / cm 2 for 10 minutes, and the UV photosensitive paper was exposed by the light passing through the pinhole. The radius of the area discolored by light exposure was measured, and the collimation half angle was calculated. As a result of carrying out this measurement at the center and four corners of the light irradiation area, the collimation half angle was 41 to 45 °.
　（放射照度の測定）
　被パターン形成体載置台を退避位置に移動させ、光照射部の真下に電動ＸＹステージを設置し、浜松ホトニクス製の紫外線積算光量計のセンサヘッドＨ９９５８－０２のヘッド面高さが照射面と同じ高さになるようにＸＹステージに設置した。次いで、放射照度０．１Ｗ／ｃｍ２にて光照射したまま、ＸＹステージを１０ｍｍピッチで移動させ、光照射エリア内の放射照度分布を測定した。平均値に対して最大１０６％、最小９３％と±１０％以内の範囲内であることを確認した。 (Measurement of irradiance)
Move the pattern forming object mounting table to the retreat position, install an electric XY stage directly under the light irradiation unit, and the head surface height of the sensor head H9958-02 of the UV integrated photometer manufactured by Hamamatsu Photonics is the same as the irradiation surface It was installed on the XY stage so that it would be high. Next, the XY stage was moved at a pitch of 10 mm while irradiating light at an irradiance of 0.1 W / cm 2 , and the irradiance distribution in the light irradiation area was measured. It was confirmed that the average value was 106% at the maximum and 93% at the minimum and within the range of ± 10%.
　〈マスク〉
　厚さ５ｍｍ、８１．３ｃｍ×１３７．９ｃｍの大きさの石英ガラス基板に、有機ＥＬ素子１０１の各々の発光エリアにハーフピッチ０．３ｍｍのラインアンドスペース（０．３ｍｍ毎に白（透明）と黒が交互する長さ２ｍｍの線状のパターン）を縦、横、斜め４５°に配した解像度チェック用パターンと輝度比評価用に直径１０ｍｍの透明部パターンをクロムの薄膜で形成したガラスマスクを用いた。 <mask>
A quartz glass substrate having a thickness of 5 mm and a size of 81.3 cm × 137.9 cm, a line and space with a half pitch of 0.3 mm in each light emitting area of the organic EL element 101 (white (transparent) every 0.3 mm) A glass mask in which a black 2 mm long linear pattern) is arranged in a vertical, horizontal and diagonal 45 ° resolution check pattern and a transparent portion pattern 10 mm in diameter with a thin chromium film for luminance ratio evaluation. Using.
　ガラスマスクをマスクフレームに取付け、被パターン形成体載置台に設置し、次いで、有機ＥＬシートを、発光面を上にして被パターン形成体載置台の所定の位置に設置した。 A glass mask was attached to the mask frame and placed on the pattern forming body mounting table, and then the organic EL sheet was placed at a predetermined position on the pattern forming body mounting table with the light emitting surface facing up.
　以下の条件でそれぞれ、室温温度２５℃の環境下、有機ＥＬシートに光照射してパターニングを実施した。積算照射時間５分ごとに有機ＥＬシートを取り出し、シート中央部に配置されている有機ＥＬ素子１０１の電極にプローブを当て電流を供給し、発光部の輝度が７００ｃｄ／ｍ２となるように発光させ、発光部と非発光部の輝度を測定した。輝度の測定は輝度計ＣＡ－２０００を用いた。この測定を積算照射時間の合計が６０分となるまで実施した。 Under the following conditions, patterning was performed by irradiating the organic EL sheet with light in an environment at room temperature of 25 ° C. The organic EL sheet is taken out every 5 minutes of integrated irradiation time, and a current is supplied by applying a probe to the electrode of the organic EL element 101 arranged in the center of the sheet, so that the luminance of the light emitting part is 700 cd / m 2. The luminance of the light emitting part and the non-light emitting part was measured. The luminance was measured using a luminance meter CA-2000. This measurement was performed until the total accumulated irradiation time reached 60 minutes.
　〈カバー〉
　寸法：Ｗ１１５５ｍｍ×Ｄ７８４．５ｍｍ×Ｈ２５００ｍｍ
　材質：アルミ製内壁の反射板（厚さ１．５ｍｍ）／空気層（厚さ５ｍｍ）／アルミ製外壁（厚さ７．５ｍｍ）のアルミニウムサンドイッチ構造を有するカバーを用いた。
　カバーとマスクの間隙：５．０ｍｍ <cover>
Dimensions: W1155mm x D784.5mm x H2500mm
Material: A cover having an aluminum sandwich structure of an aluminum inner wall reflector (thickness 1.5 mm) / air layer (thickness 5 mm) / aluminum outer wall (thickness 7.5 mm) was used.
Cover and mask gap: 5.0 mm
　〈光照射部〉
　光源：波長３８５ｎｍのＵＶ－ＬＥＤ
　放射照度：４Ｗ／ｃｍ２（コリメーション半角：４５°）
　光照射条件：１周期の照射時間１５秒、消灯時間１５秒（デューティ比５０％）の間欠照射を２０サイクル行った（計６００秒）。積算照射時間は５分。 <Light irradiation part>
Light source: UV-LED with a wavelength of 385 nm
Irradiance: 4W / cm 2 (collimation half angle: 45 °)
Light irradiation conditions: 20 cycles of intermittent irradiation with a period of irradiation time of 15 seconds and a turn-off time of 15 seconds (duty ratio 50%) were performed (total 600 seconds). Total irradiation time is 5 minutes.
　〈気体流発生部〉
　吹き付け部がスリット状の層状気体流発生部を用いて、両短辺方向からマスクの中央方向に、同じ風量で吹き付けた。 <Gas flow generator>
The spraying part was sprayed with the same air volume from both short side directions to the center direction of the mask using a slit-like layered gas flow generating part.
　吹き付け部のスリット位置：ガラス上面３ｍｍ
　気体流発生部の吹き付け部の角度：マスクに対して平行（０°）
　気体流発生部とカバー側面の間隙：７２ｍｍとして、カバーの短辺に対向する位置に、一対の気体流発生部を取り付けた。 Slit position of spraying part: 3mm above glass
Angle of spray part of gas flow generation part: parallel to mask (0 °)
A gap between the gas flow generation part and the cover side face: 72 mm, and a pair of gas flow generation parts were attached at positions facing the short side of the cover.
　吹き付ける空気（気体）の温度：２５℃
　圧縮空気圧力：０．３ＭＰａ
　空気消費量：１５００Ｌ／ｍｉｎ Air (gas) temperature to blow: 25 ° C
Compressed air pressure: 0.3 MPa
Air consumption: 1500L / min
　《パターニングされた有機ＥＬパネル１０２の作製》
　有機ＥＬパネル１０１の作製において、放射照度を４Ｗ／ｃｍ２から２Ｗ／ｃｍ２に下げたほかは、有機ＥＬパネル１０１の作製と同様にしてパターニングと輝度測定を実施し、有機ＥＬパネル１０２を作製した。 << Preparation of patterned organic EL panel 102 >>
In the production of the organic EL panel 101, except that the irradiance was lowered from 4 W / cm 2 to 2 W / cm 2 , patterning and luminance measurement were performed in the same manner as the production of the organic EL panel 101 to produce the organic EL panel 102. did.
　《パターニングされた有機ＥＬパネル１０３の作製》
　有機ＥＬパネル１０１の作製において、放射照度を４Ｗ／ｃｍ２から１Ｗ／ｃｍ２に下げたほかは、同様にしてパターニングされた有機ＥＬパネル１０３を作製した。 << Preparation of patterned organic EL panel 103 >>
A patterned organic EL panel 103 was produced in the same manner except that the irradiance was lowered from 4 W / cm 2 to 1 W / cm 2 in the production of the organic EL panel 101.
　＜輝度比の評価＞
　有機ＥＬパネル１０１～１０３について、積算照射時間５分ごとに測定した発光部の輝度と非発光部の輝度から輝度比「（発光部の輝度）／（非発光部の輝度）」を算出し、積算照射時間に対する輝度比の特性をグラフにした。結果を図１４に示す。 <Evaluation of luminance ratio>
For the organic EL panels 101 to 103, a luminance ratio “(luminance of the light emitting portion) / (luminance of the non-light emitting portion)” is calculated from the luminance of the light emitting portion and the luminance of the non-light emitting portion measured every 5 minutes of the integrated irradiation time, The characteristics of the luminance ratio with respect to the integrated irradiation time are graphed. The results are shown in FIG.
　図１４より、目標輝度比１００のアプリケーションに対しては、放射照度１Ｗ／ｃｍ２で積算照射時間４０分にて有機ＥＬパネルを作製できる。また、目標輝度比２００の高コントラストが要求されるアプリケーションに対しては、放射照度４Ｗ／ｃｍ２と高放射照度にすれば、積算照射時間１０分と高速でパターニングができる。
　以上、本発明のパターニング装置によれば、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できることが示された。 As shown in FIG. 14, for an application with a target luminance ratio of 100, an organic EL panel can be produced with an irradiance of 1 W / cm 2 and an integrated irradiation time of 40 minutes. For applications that require a high contrast with a target luminance ratio of 200, patterning can be performed at a high speed of 10 minutes with an integrated irradiation time of 10 minutes if the irradiance is 4 W / cm 2 and high irradiance.
As mentioned above, according to the patterning apparatus of this invention, it was shown that the patterning time of an organic electroluminescent element can be shortened significantly.
　以上のように、本発明は、有機エレクトロルミネッセンス素子のパターニング時間を大幅に短縮できるパターニング装置及び有機エレクトロルミネッセンス素子の製造方法を提供することに適している。 As described above, the present invention is suitable for providing a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element.
　１１　有機ＥＬシート
　１４　マスク
　３１　パターニング装置
　３２　光照射部
　３３　放熱板
　３４　光源基板
　３５　光源（ＬＥＤ）
　３６　レンズアレイ支持体
　３７　レンズアレイ
　３８　照射光
　３９　カバー
　４０　気体流発生部
　４１　気体流
　４２　間隙
　４３　被パターン形成体載置台
　４４ａ　水管
　４４ｂ　水路
　４４ｃ　水路
　４５　チラーユニット
　５１　電源
　５２　操作部
　５３　制御部
　５４　マスクアライメント制御部
　５５　移動機構制御部
　５６　光源制御部
　５７　気体流制御部
　５８　チラーユニット
　６１　モーター
　６３　ボールネジ
　６４　リニアガイド
　６５　ボールネジ
　６６　ネジ軸
　６７　モーター
　６８　リニアガイド
　６９　マスクアライメント機構部
　７１　第１電極
　７１ａ　下地層
　７１ｂ　電極層
　７３　有機機能層群
　７３ａ　正孔注入層
　７３ｂ　正孔輸送層
　７３ｃ　発光層
　７３ｄ　電子輸送層
　７３ｅ　電子注入層
　７５ａ　第２電極
　１１３　基板
　１１５　補助電極
　１１６　取り出し電極１１６
　１１７　封止部材
　１１９　接着剤
　２００　マスク保持機構
　２０２　マスクフレーム
　２０４　弾性体
　２０６　固定手段
　２０８　マスク外れ防止規制板
　３００　光源部 DESCRIPTION OF SYMBOLS 11 Organic electroluminescent sheet 14 Mask 31 Patterning apparatus 32 Light irradiation part 33 Heat sink 34 Light source board 35 Light source (LED)
36 Lens array support body 37 Lens array 38 Irradiation light 39 Cover 40 Gas flow generation part 41 Gas flow 42 Gap 43 Pattern formation object mounting base 44a Water pipe 44b Water path 44c Water path 45 Chiller unit 51 Power supply 52 Operation part 53 Control part 54 Mask alignment Control unit 55 Moving mechanism control unit 56 Light source control unit 57 Gas flow control unit 58 Chiller unit 61 Motor 63 Ball screw 64 Linear guide 65 Ball screw 66 Screw shaft 67 Motor 68 Linear guide 69 Mask alignment mechanism unit 71 First electrode 71a Underlayer 71b Electrode Layer 73 Organic functional layer group 73a Hole injection layer 73b Hole transport layer 73c Light emitting layer 73d Electron transport layer 73e Electron injection layer 75a Second electrode 113 Substrate 115 Auxiliary electrode 116 Extraction electrode 116
117 Sealing member 119 Adhesive 200 Mask holding mechanism 202 Mask frame 204 Elastic body 206 Fixing means 208 Mask removal prevention restricting plate 300 Light source

Claims (7)

  1. 　有機エレクトロルミネッセンス素子にマスクを介して光を照射し発光パターンを形成するパターニング装置であって、
    　波長が１００～４１０ｎｍの範囲内の光を１Ｗ／ｃｍ２以上の放射照度で照射する光照射部を備え、
    　光照射エリア内における前記波長の範囲内の光の放射照度が、当該光照射エリア内における前記放射照度の平均値に対し±１０％の範囲内であり、
    　前記光照射エリア内における前記波長の範囲内の光のコリメーション半角が、４５°以下であることを特徴とするパターニング装置。     A patterning apparatus for forming a light emission pattern by irradiating light through a mask to an organic electroluminescence element,
    A light irradiating unit that irradiates light within a wavelength range of 100 to 410 nm with an irradiance of 1 W / cm 2 or more;
    The irradiance of light within the wavelength range in the light irradiation area is within a range of ± 10% with respect to the average value of the irradiance in the light irradiation area,
    The patterning apparatus according to claim 1, wherein a collimation half angle of light within the wavelength range in the light irradiation area is 45 ° or less.
  2. 　前記有機エレクトロルミネッセンス素子を載置する被パターン形成体載置台を備え、
    　前記被パターン形成体載置台が、冷却機能を有することを特徴とする請求項１に記載のパターニング装置。     A pattern forming body mounting table on which the organic electroluminescence element is mounted,
    The patterning apparatus according to claim 1, wherein the pattern forming body mounting table has a cooling function.
  3. 　前記被パターン形成体載置台が、前記冷却機能として、
    　冷却水を前記被パターン形成体載置台の一方から導入し、前記被パターン形成体載置台内を一方向に前記冷却水を流して他方に排出する複数の水路を備えることを特徴とする請求項２に記載のパターニング装置。     As the cooling function, the patterned object mounting table is as follows.
    The cooling water is introduced from one side of the pattern forming body mounting table, and a plurality of water channels are provided for flowing the cooling water in one direction through the pattern forming body mounting table and discharging the cooling water to the other. 3. The patterning device according to 2.
  4. 　弾性体による弾性力により、前記マスクを保持するマスク保持機構を備えることを特徴とする請求項１から請求項３までのいずれか一項に記載のパターニング装置。 The patterning apparatus according to any one of claims 1 to 3, further comprising a mask holding mechanism that holds the mask by an elastic force of an elastic body.
  5. 　気体を前記マスクに吹き付ける気体流発生部を備えることを特徴とする請求項１から請求項４までのいずれか一項に記載のパターニング装置。 The patterning apparatus according to claim 1, further comprising a gas flow generation unit that blows gas onto the mask.
  6. 　請求項１から請求項５までのいずれか一項に記載のパターニング装置により、発光パターンを形成した有機エレクトロルミネッセンス素子を製造する有機エレクトロルミネッセンス素子の製造方法。 A method for producing an organic electroluminescent element, wherein an organic electroluminescent element having a light emitting pattern formed thereon is produced by the patterning device according to any one of claims 1 to 5.
  7. 　前記発光パターンのエッジ部が、１０～３００μｍの範囲内で輝度分布を有することを特徴とする請求項６に記載の有機エレクトロルミネッセンス素子の製造方法。 The method for producing an organic electroluminescent element according to claim 6, wherein the edge portion of the light emitting pattern has a luminance distribution within a range of 10 to 300 µm.
PCT/JP2016/085369 2016-03-18 2016-11-29 Patterning device and organic electroluminescent element manufacturing method WO2017158943A1 (en)

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