WO2017158943A1 - Dispositif de formation de motif et procédé de fabrication d'élément électroluminescent organique - Google Patents

Dispositif de formation de motif et procédé de fabrication d'élément électroluminescent organique Download PDF

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Publication number
WO2017158943A1
WO2017158943A1 PCT/JP2016/085369 JP2016085369W WO2017158943A1 WO 2017158943 A1 WO2017158943 A1 WO 2017158943A1 JP 2016085369 W JP2016085369 W JP 2016085369W WO 2017158943 A1 WO2017158943 A1 WO 2017158943A1
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Prior art keywords
light
mask
organic
light irradiation
irradiance
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PCT/JP2016/085369
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English (en)
Japanese (ja)
Inventor
新藤　博之
尚裕 奥村
森川　雅弘
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コニカミノルタ株式会社
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Priority to JP2018505246A priority Critical patent/JPWO2017158943A1/ja
Publication of WO2017158943A1 publication Critical patent/WO2017158943A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

Definitions

  • the present invention relates to a patterning apparatus and a method for manufacturing an organic electroluminescence element. More specifically, the present invention relates to a patterning apparatus and the like that can significantly reduce the patterning time of an organic electroluminescence element.
  • organic electroluminescence (hereinafter also referred to as “organic EL”) element is irradiated with ultraviolet rays (UV), the luminous efficiency of the irradiated region is reduced and patterning can be performed (for example, Patent Document 1). reference.).
  • This phenomenon has reciprocity failure characteristics, and it is known that the higher the irradiation power density (irradiance) is, the faster the reaction is, even with the same integrated light quantity. Therefore, when patterning an organic EL element, the patterning time can be significantly shortened when the irradiance is set high, and as a result, the tact time can be shortened and productivity can be improved.
  • the irradiation light be as close to parallel light as possible. Therefore, a light irradiation device having high irradiance with substantially parallel light is desired.
  • the irradiation light is substantially parallel light (about a collimation half angle of about 2 °) because it is a surface light source. ) Requires a large number of beam shaping optical components and a large amount of light vignetting occurs, making it difficult to increase the irradiance as shown in Patent Document 2.
  • Patent Document 3 describes a very high irradiance of 6 W / cm 2 , but since the collimation half angle is not controlled, it is estimated that the collimation half angle is about 80 ° of the LED radiation angle and can be used for patterning. There was no problem.
  • Patent Document 4 describes an example in which the collimation half angle is 14 ° and the irradiance is increased to 0.6 W / cm 2, but the irradiance is still insufficient for patterning the organic EL element. Patent Document 4 does not describe a technique for further increasing the irradiance.
  • the present invention has been made in view of the above-described problems and situations, and a problem to be solved is to provide a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element. .
  • the present inventor can achieve a high irradiance of 4 W / cm 2 or more if the collimation half angle is allowed to 45 ° in the process of studying the cause of the above-mentioned problems.
  • the present inventors have found that a patterning apparatus and a method for manufacturing an organic electroluminescence element that can significantly reduce the patterning time of the luminescence element can be provided. That is, the said subject which concerns on this invention is solved by the following means.
  • a patterning apparatus for forming a light emission pattern by irradiating light through a mask to an organic electroluminescence element, A light irradiating unit that irradiates light having a wavelength of 100 to 410 nm with an irradiance of 1 W / cm 2 or more; The irradiance of light within the wavelength range in the light irradiation area is within a range of ⁇ 10% with respect to the average value of the irradiance in the light irradiation area, The patterning apparatus according to claim 1, wherein a collimation half angle of light within the wavelength range in the light irradiation area is 45 ° or less.
  • a pattern forming body mounting table on which the organic electroluminescence element is mounted 2.
  • the patterned object mounting table is as follows. A cooling water is introduced from one side of the pattern forming body mounting table, and a plurality of water channels are provided to flow the cooling water in one direction through the pattern forming body mounting table and discharge the cooling water to the other.
  • the patterning device according to item.
  • the irradiated light be as close to parallel light as possible, but it is difficult to make parallel light while increasing the irradiance.
  • the light emission pattern of the organic EL element is visually appealing, and submicron resolution is not required as in a semiconductor. Therefore, the present inventor can form a light emission pattern with a sufficiently high resolution while achieving a high irradiance of 2 W / cm 2 or more by shifting the irradiation light from the parallel light and allowing the collimation half angle to 30 °. I thought.
  • Schematic diagram of organic EL sheet Schematic diagram of mask Schematic diagram of an example of light irradiation area
  • Schematic which shows an example of the cooling function of a to-be-patterned body mounting base 1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (X-axis direction perspective view).
  • FIG. 1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (Y-axis direction perspective view). Operation flow diagram of an example of patterning method of the present invention
  • FIG. 1 is an overall configuration diagram of an example of a patterning apparatus of the present invention (Y-axis direction perspective view).
  • Operation flow diagram of an example of patterning method of the present invention Cross-sectional view of an example of an organic EL element Explanatory drawing which shows irradiance distribution in the edge part vicinity of a mask light shielding film
  • a graph showing the irradiance distribution near the edge of the mask light-shielding film The graph which shows the characteristic with respect to the integrated irradiation time of the luminance ratio of the organic EL element which concerns on an Example
  • the patterning apparatus of the present invention is a patterning apparatus that forms a light emission pattern by irradiating light through a mask to an organic electroluminescence element, and irradiances light having a wavelength in the range of 100 to 410 nm to 1 W / cm 2 or more.
  • the light irradiance of irradiating light in the light irradiation area within the range of the wavelength in the light irradiation area is within ⁇ 10% of the average value of the irradiance in the light irradiation area,
  • the collimation half angle of the light within the wavelength range in the light irradiation area is 45 ° or less.
  • a pattern forming body mounting table on which the organic electroluminescence element is mounted is provided, and the pattern forming body mounting table has a cooling function. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
  • the pattern forming body mounting table introduces cooling water from one of the pattern forming body mounting tables, and the cooling water is unidirectionally passed through the pattern forming body mounting table. It is preferable to provide a plurality of water channels that flow and discharge to the other. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
  • a mask holding mechanism for holding the mask by an elastic force of an elastic body.
  • the present invention it is preferable to provide a gas flow generation unit that blows gas onto the mask. Thereby, the influence of the heat accompanying the case where it is set as high irradiance can be reduced.
  • the patterning apparatus of the present invention can be suitably employed in a method for manufacturing an organic electroluminescent element that manufactures an organic electroluminescent element having a light emitting pattern.
  • the present invention can be suitably used in a method for manufacturing an organic electroluminescence device, wherein the edge portion of the light emission pattern has a luminance distribution within a range of 10 to 300 ⁇ m.
  • ⁇ is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
  • the patterning apparatus of the present invention is a patterning apparatus that forms a light emission pattern by irradiating light through a mask to an organic electroluminescence element, and irradiances light having a wavelength in the range of 100 to 410 nm to 1 W / cm 2 or more.
  • the light irradiance of irradiating light in the light irradiation area within the range of the wavelength in the light irradiation area is within ⁇ 10% of the average value of the irradiance in the light irradiation area,
  • the collimation half angle of the light within the wavelength range in the light irradiation area is 45 ° or less.
  • FIG. 1A is a schematic diagram of an organic EL sheet.
  • a plurality of organic EL elements 12 are formed on the organic EL sheet 11, and organic EL sheet alignment marks 13 are formed at four corners. This alignment mark is used for alignment of a film formation mask when forming an electrode or an organic layer in the manufacture of an organic EL element.
  • FIG. 1B is a schematic diagram of a mask.
  • a predetermined light irradiation pattern 15 (character A in the example in the figure) is formed on the mask 14 at a position corresponding to each organic EL element 12, and a mask alignment mark corresponding to the position of the alignment mark 13 on the organic EL sheet 11 is formed. 16 is formed.
  • the blackened portion shields the ultraviolet rays by the light shielding film.
  • the organic EL element 12 is irradiated with ultraviolet light in a light emitting area other than the letter A and does not emit light, and only the letter A emits light as the organic EL element 12.
  • the mask base material is preferably quartz glass or heat-resistant glass (for example, Tempax Float (registered trademark) manufactured by Schott), and the light-shielding film is preferably a chromium film or a chromium oxide film having a low ultraviolet absorption rate.
  • the organic EL sheet 11 is cut for each organic EL element 12 after the patterning is completed. Each individual organic EL element thus cut is used to be individually loaded into a display device or the like.
  • FIG. 2 is a schematic diagram showing a light irradiation area.
  • the dotted line portion in the figure is a plurality of light irradiation areas, and in the case of FIG. 2, the case where it is divided into four light irradiation areas (P1 to P4) is illustrated.
  • a case where light irradiation is performed by rotating around these four light irradiation areas with one pulse light irradiation will be exemplified. First, one pulse of light is irradiated in the light irradiation area P1, and then one pulse of light is irradiated in the light irradiation area P2. Subsequently, the light irradiation areas P3 and P4 are each irradiated with one pulse light.
  • the one-pulse light irradiation is sequentially repeated such that the light irradiation area P1 is again irradiated with one pulse light.
  • a waiting time can be provided before the light irradiation area P1 is again irradiated with light.
  • the light irradiation area P1 is cooled by this waiting time. In this case, heat accumulation in the mask and the organic EL sheet can be suppressed.
  • the number of light irradiation areas to be divided is not particularly limited, but is preferably 9 or less, and preferably 4 or less from the viewpoint of shortening the tact time.
  • a circular pattern of the light irradiation area for example, a case of repeating (light irradiation area P1 ⁇ light irradiation area P2 ⁇ light irradiation area P1 ⁇ light irradiation area P2) can be cited, but light is emitted again in at least one light irradiation area. Any irradiation pattern may be used as long as irradiation is performed. For example, there may be a light irradiation area where no additional light irradiation is performed, such as (light irradiation area P1 ⁇ light irradiation area P2 ⁇ light irradiation area P1).
  • the order of light irradiation may be different from the order of light irradiation in the first round.
  • the ultraviolet absorption rate of an organic layer has distribution within a sheet
  • a light irradiation unit including a plurality of light sources, a step moving unit that changes a relative position between the position of the light irradiation unit and the pattern forming body mounting table, and an integrated light amount in each of the plurality of light irradiation areas,
  • a control unit that controls the light irradiation unit so as to be a predetermined amount in the light irradiation area of the plurality of light irradiation areas, wherein the step moving unit is configured to emit pulsed light in at least one of the plurality of light irradiation areas (A).
  • the light irradiation part or the pattern forming body is placed at a position where pulse light irradiation is performed in at least one light irradiation area (B) of the light irradiation areas other than the light irradiation area (A). , And after irradiating the light irradiation area (B) with the pulsed light, the light irradiating part or the pattern forming body mounting table is moved to a position where the light irradiation area (A) is again irradiated with the pulsed light.
  • a patterning device for an organic EL element which is a step moving unit is preferable.
  • the patterning device 31 is a mask for irradiating the organic EL sheet 11 by patterning the light irradiation unit 32 including the light source unit 300, the cover 39, and the gas flow generation unit 40, and the irradiation light 38 from the light irradiation unit 32. 14 and a pattern forming body mounting table 43.
  • the light source unit 300 includes a light source 35 that emits ultraviolet light (for example, a UV-LED having a wavelength of 365 nm or 385 nm) and a light source substrate 34 in which the light source 35 is arranged two-dimensionally (planar). A driving current is supplied to 35.
  • the light source unit 300 further includes a heat radiating plate 33 that releases heat generated by the light source 35 to the outside, and prevents a decrease in light emission efficiency of the light source 35. More preferably, a cooling pipe is provided inside the heat radiating plate 33 and the cooling water is circulated to cool the light source 35 with water.
  • the divergent light emitted from the light source unit 300 is used as the irradiation light 38 shaped into a light beam having a predetermined divergence angle by the lens array 37.
  • the lens array 37 is fixed to the light source unit 300 by the lens array support 36.
  • the irradiation light 38 is confined by a cover 39 whose inner surface is a reflection surface to prevent the light amount from decreasing, and the organic EL sheet 11 is irradiated with light with a uniform light amount through the mask 14 to form a light emission pattern.
  • the light emitted from the light source 35 is preferably ultraviolet light that has a fast deactivation reaction rate of the organic functional layer due to light irradiation from the viewpoint of reducing the tact time.
  • the emitted light is preferably pulsed light.
  • the pulsed light irradiation performed in one light irradiation step is irradiation with one pulsed light. It is preferable that If necessary, multi-pulse light irradiation may be performed with a turn-off time between a plurality of pulse light irradiations.
  • the gap 42 between the lower end of the cover 39 and the mask 14 should be as narrow as possible, and preferably about 5 mm. If it is this space
  • the light source 35 LED is irradiated with pulsed light by being controlled by a light source control unit, which will be described later, to be turned on and off, and to have an irradiation output and irradiation time at the time of lighting.
  • the organic EL sheet 11 is placed on the pattern forming body placing table 43, and the mask 14 is adjusted to a predetermined relative position with the organic EL sheet 11 and placed on the sheet.
  • the organic EL sheet 11 is preferably fixed by adsorption.
  • the pattern forming body mounting table 43 shown in FIG. 3 has a water channel 44b provided therein as a cooling function to be described later, and cools heat generated in the mask 14 and the organic EL sheet by ultraviolet irradiation.
  • a gas blows out from the gas flow generation unit 40 to cool the surface of the mask 14.
  • the light irradiation unit 32 irradiates the first light irradiation area P ⁇ b> 1 of the organic EL sheet 11 with the pulsed light
  • the light irradiation unit 32 and the pattern forming body mounting table 43 move stepwise. Then, the next light irradiation area P2 is irradiated with pulsed light.
  • Such a patterning device 31 is preferable because it can prevent deformation of the mask 14 due to heat and deterioration of performance (for example, color balance) due to heat of the organic EL sheet 11, and can perform accurate patterning. Further, the time tact for patterning can be shortened, and the productivity can be further improved.
  • a pattern forming body mounting table for mounting an organic EL sheet provided with a plurality of organic EL elements, and a plurality of light sources for irradiating a plurality of light irradiation areas of the organic EL sheet
  • an organic EL sheet patterning device comprising a control unit for controlling the plurality of light sources, wherein the positions of the plurality of light sources are fixed, and the plurality of light irradiation areas are any of the plurality of light sources.
  • the control unit controls a plurality of light sources to irradiate pulse light in at least one light irradiation area (A), and then, the light irradiation area other than the light irradiation area (A). After irradiating pulsed light in at least one light irradiation area (B), irradiating pulsed light in the light irradiation area (B), irradiating the light irradiation area (A) again with pulsed light. Align, accumulated light quantity of a plurality of light irradiation area is preferably a respective patterning apparatus of the organic EL element and controls the light source so that the predetermined amount in the transmission area.
  • FIG. 4 is a perspective view of another example (second embodiment) of the light irradiation unit in the patterning apparatus of the present invention.
  • a plurality of light sources 35 (LEDs) more than the number of light sources in the first embodiment are two-dimensionally arranged, and an irradiation area of light emitted from the entire light irradiation unit 32 is the organic EL element 12 in the organic EL sheet 11. It is an area that can cover the entire area where the. That is, when all the light sources 35 are turned on, the light irradiation area covers all the light irradiation areas P1, P2, P3, and P4 in FIG.
  • the light sources 35 can be controlled for each group.
  • the first light irradiation step only the LED light sources of the first group are turned on, and the irradiation light 38 that irradiates the light irradiation area P1 in FIG. 2 is emitted. . Thereafter, in the next light irradiation step, irradiation light 38 for irradiating the light irradiation area P2 in FIG. 2 is emitted. In this way, by turning on each group and irradiating around light, it is possible to eliminate the movement time of the light irradiation unit in the first embodiment of the patterning apparatus, and to reduce the tact time. In the example shown in FIG.
  • the light sources 35 in one light irradiation unit 32 are sequentially turned on, but a plurality of (for example, four) light irradiation units 32 in the first embodiment of the patterning device described above are arranged, Each light irradiation unit 32 may be caused to emit light sequentially in accordance with light irradiation in each light irradiation area (P1 to P4).
  • a mask has a role which changes the light quantity irradiated to an organic EL element.
  • the mask has a two-layer configuration (not shown) of a glass substrate and a light shielding film, and is mounted on the mask holding mechanism 200 so that the light shielding film is on the mask frame 202 side.
  • a mask having a negative pattern on a glass substrate can be prepared using a known material that can change the amount of transmitted UV light, but the UV absorption rate is particularly compared to a quartz substrate with a low linear expansion coefficient.
  • a low-chromium light-shielding film provided with a pattern is preferable in that thermal deformation can be suppressed.
  • the “pattern” means a design (pattern or pattern in the figure), characters, images, etc. displayed by the organic EL element. “Patterning” refers to providing these pattern display functions.
  • the “light emission pattern” refers to light emitted from an organic EL element that emits light with varying light emission intensity (luminance) depending on the position of the light emitting surface, based on a predetermined design (pattern or pattern in the figure), characters, images, etc. A source having a function of displaying a predetermined design (design or pattern in the figure), characters, images, etc. formed (applied) in advance on the organic EL element to emit light.
  • the organic EL sheet is placed on a pattern forming body placing table having a cooling function, the mask is positioned at a predetermined relative position with the organic EL element, and is placed in close contact with the element. It is preferable. This is because the cooling effect of the mask light-shielding film serving as a heat source can be enhanced by light irradiation. Specifically, it is preferable that the mask light-shielding film is in close contact with the organic EL element.
  • Glass substrate As a glass substrate, it does not specifically limit as a raw material, for example, the well-known glass raw material used for optics and a board
  • substrate can be used. Specifically, glass ceramics such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, crystallized glass, phosphate glass or lanthanum glass Etc.
  • glass ceramics such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, crystallized glass, phosphate glass or lanthanum glass Etc.
  • Quartz glass or heat-resistant glass can be preferably used.
  • the thickness of the mask is not particularly limited, but a mask having a thickness of 3 to 10 mm can be used.
  • the patterning apparatus of the present invention preferably includes a mask holding mechanism that holds the mask by an elastic force of an elastic body. Thereby, even if a mask expand
  • FIG. 5 is a schematic view of the mask holding mechanism and the mask as viewed from the light irradiation unit side.
  • the mask holding mechanism 200 according to the present invention includes an elastic body 204 provided on each side of a rectangular mask frame 202 having an opening at the center and disposed opposite to each other. And fixing means 206 for fixing the body 204.
  • the elastic body 204 is placed on the mask frame 202 and presses and fixes the mask 14 from the side by making surface contact with the mask 14.
  • the fixing means 206 is fixed to the mask frame 202.
  • the elastic body 204 is fixed in contact with the fixing means 206 at the surface opposite to the surface in contact with the mask 14 and the upper surface of the elastic body 204.
  • the mask 14 is disposed on the mask frame 202 so as to contact each elastic body 204.
  • the elastic body 204 is preferably fixed in surface contact with the mask 14.
  • the shape of the elastic body 204 is not particularly limited.
  • the elastic body 204 when the mask is expanded by light irradiation, the elastic body 204 is a spherical viscoelastic body that presses and fixes the mask by point contact or surface contact. Also good. By fixing with the elastic body, it is possible to prevent the mask from cracking starting from the contact portion.
  • the mask holding mechanism 200 can hold the mask 14 with a predetermined pressure, it can be a movable mask holding mechanism with an arbitrary side of the mask frame 202 as a rotation axis. .
  • the mask can be swung to be retracted from the organic EL element, and the organic EL element or the like to be patterned can be easily carried in and out.
  • the elastic body 204 (and the fixing means 206) are arranged to face each side of the mask frame 202 in two or more pairs.
  • the number of installed elastic bodies 204 can be appropriately adjusted according to the size of the mask 14, that is, the length of each side of the mask frame 202.
  • the mask holding mechanism 200 can be movable as described above, at least a pair of mask detachment prevention restricting plates 208 are disposed to face each other on a pair of opposing sides of the mask frame 202. It is preferable to make it. At this time, the rotation axis is one side of the mask frame 202.
  • Mask frame As a material of the mask frame according to the present invention, a conventionally known material can be used. For example, aluminum can be used.
  • the material constituting the elastic body is not particularly limited, but is preferably a viscoelastic body.
  • fluorine rubber chlorobrene rubber, nitrile rubber, ethylene
  • examples of the rubber include propylene rubber, silicone rubber, butyl rubber, and urethane rubber.
  • fluororubber is preferable because of its high durability against ultraviolet rays.
  • the hardness of the viscoelastic body is preferably in the range of A50 to A80. If the hardness of the viscoelastic body is A50 or more, the thermal expansion of the mask can be effectively prevented, and if it is A80 or less, the mask holding mechanism can be prevented from being displaced by its own weight when the mask holding mechanism is movable. Can do.
  • the hardness of the viscoelastic body is a value measured according to JIS K 6253.
  • the contact area between the viscoelastic body and the mask is preferably 104.5 mm 2 or more, whereby the mask can be stably fixed.
  • the pressure with respect to the mask of the viscoelastic body in the said contact part exists in the range of 430000 +/- 56000N / m ⁇ 2 >. If the pressure is within the range, thermal expansion and displacement of the mask can be prevented.
  • the amount of deviation in the plane direction of the mask is preferably 50 ⁇ m or less.
  • the fixing means is fixed to the mask frame with screws or the like.
  • the material of the fixing means is not particularly limited, and for example, aluminum can be used.
  • the light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm (hereinafter also referred to as “ultraviolet rays” or “irradiation light”) with an irradiance of 1 W / cm 2 or more.
  • a light source that emits ultraviolet rays is attached to the light irradiation unit.
  • the light source is not particularly limited as long as it is a light source that emits a desired amount of ultraviolet light.
  • Ultraviolet light in the wavelength region can be used.
  • the integrated dose for patterning depends on the layer structure, film thickness, size, and the like of the organic EL element, but irradiation with an integrated light amount of 200 to 5000 J / cm 2 is highly productive, This is preferable from the viewpoint of accurate patterning. Further, it is preferable that one pulse of ultraviolet irradiation time is in the range of 1 to 300 seconds.
  • the light irradiation unit will be further described with a specific example.
  • the light irradiation unit for example, UV-LEDs having a wavelength of 385 nm are used as the light source, these are arranged two-dimensionally, and the diverging light emitted from the LEDs is shaped to have a predetermined collimation half angle by the lens array.
  • the light emitted from each lens of the lens array is overlapped on the irradiation surface, and as a result, a wide irradiation area can be obtained and a uniform illuminance distribution can be obtained.
  • LED turns on and off the irradiation output at the time of lighting and the irradiation time are controlled by a controller (not shown), and emits pulsed light.
  • a controller not shown
  • the light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm with an irradiance of 1 W / cm 2 or more.
  • the irradiance in order to perform high-speed patterning with a high irradiance, the irradiance must be 2 W / cm 2 or more.
  • 4 W / cm 2 or more is more preferable.
  • a light irradiation area of 5000 cm 2 or more and an irradiance of 4 W / cm 2 are preferable in that the tact time of patterning can be greatly shortened and the number of pick-ups can be increased. As a result, productivity can be remarkably improved.
  • the irradiance of light having a wavelength in the range of 100 to 410 nm in the light irradiation area is relative to the average value of the irradiance in the light irradiation area (desired region where light is actually irradiated). It is within the range of ⁇ 10%.
  • the irradiance of light within the wavelength range in the light irradiation area (hereinafter also simply referred to as “irradiance”) is ⁇ 10% of the average value of the irradiance in the light irradiation area. Is within the range.
  • the irradiance can be measured with a known measuring instrument. For example, when the wavelength range is 300 to 410 nm, the UV integrated light meter “C9536-02” and the sensor head “H9958-02” (manufactured by Hamamatsu Photonics) Can be measured by measuring at intervals of 1 to 10 mm in the vertical and horizontal directions of the light irradiation area. From the irradiance distribution in the light irradiation area measured as described above, the average of the irradiance of light within the wavelength range according to the present invention in the light irradiation area can be calculated.
  • the collimation half angle of the light within the range of 100 to 410 nm in the light irradiation area is 45 ° or less.
  • the collimation half-angle refers to the maximum angle ⁇ among the angles ⁇ formed by the perpendicular R to the mask and the irradiation light L shown in FIG.
  • the collimation half angle can be adjusted by shaping divergent light emitted from the light source unit with a lens or the like.
  • a lens array 37 as shown in FIG. 3 can be used, but is not limited to this.
  • a compound parabola shown in FIG. A condensing mirror 37a such as a surface concentrator may be used.
  • a compound parabolic concentrator is preferable because the component cost can be reduced.
  • a rod-shaped cylindrical lens 37b or a rod lens as shown in FIGS. 7A and 7B is arranged in each column of the LED array, and then a rod-shaped cylindrical lens or a rod lens is arranged in an orthogonal direction to collimate in a two-dimensional direction. Angle shaping may be performed.
  • FIG. 7A and 7B are schematic views showing an example of the arrangement of the rod-shaped cylindrical lenses
  • FIG. 7A is a schematic view showing a cross section orthogonal to the X direction
  • FIG. 7B is a cross section orthogonal to the Y direction.
  • FIG. This is preferable because it is sufficient to adjust the optical axis in only one direction, and the adjustment man-hour can be suppressed.
  • the method for measuring the collimation half angle is not particularly limited, and a known method can be used. An example of a specific measurement method is shown below.
  • the pattern forming body mounting table is retracted from the light irradiation unit, the pinhole is disposed at the same height as the surface on which the organic EL sheet of the pattern forming body mounting table is mounted, and irradiation light is irradiated to the pinhole To do.
  • the light beam that has passed through the pinhole is observed with a CCD camera, and the radius r of the light beam is measured.
  • the collimation half angle can be calculated as tan ⁇ 1 (r / D).
  • the diameter of the pinhole is preferably ⁇ 0.5 mm or less.
  • the light irradiation area refers to a desired region where light is actually irradiated in the patterned body (organic EL sheet) according to the present invention.
  • the area of the light irradiation area is not particularly limited, but is preferably 5000 cm 2 or more. The reason for this is as follows.
  • the width of the roll is generally about 1 m.
  • this is cut into a length of about 600 mm in the roll winding direction to form a sheet having a plurality of organic EL elements in a planar shape, and the plurality of organic EL elements are collectively irradiated with light. It is preferable to do.
  • a plurality of organic EL elements are arranged in an area of 90 cm ⁇ 54 cm on the inner side.
  • light can be irradiated to one organic EL sheet within a total of 9 steps and 10 steps of 3 steps in the x direction and 3 steps in the y direction.
  • the light irradiation area By setting the light irradiation area in such a large area, light irradiation in the state of the organic EL sheet can be performed, and a plurality of organic EL elements can be patterned at a time, thereby improving the throughput.
  • Such a large-area light irradiation area can be realized, for example, by increasing the number of LEDs and expanding the light emission area of the light source unit.
  • the patterning apparatus of the present invention also has a cooling function. It is preferable. As a result, even if the total amount of light emitted once is very high, heat generation of the light shielding film of the mask can be suppressed.
  • the above-mentioned light irradiation area is planar. Thereby, irradiation can be performed in the form of a sheet on which a plurality of organic EL elements are formed, and throughput can be improved.
  • the patterning apparatus of the present invention preferably includes a pattern forming body mounting table on which the organic electroluminescence element is mounted.
  • the pattern forming body mounting table is not particularly limited as long as it can mount an organic electroluminescence element and does not impair the effects of the present invention, and can adsorb and fix an organic EL sheet. It is preferable.
  • an acrylic ester, methacrylic ester, polybutylene terephthalate, polycarbonate (abbreviation: PC), polyethylene terephthalate (abbreviation: PET), polyethylene naphthalate (abbreviation: PEN), or the like is used as the substrate of the organic EL element, organic The EL sheet is easily deformed, such as curling.
  • the material of a to-be-patterned body mounting base is not specifically limited. However, when the pattern forming body mounting table has a water channel 44b, which will be described later, the pattern forming body mounting table is a cooling table. Therefore, the material is preferably a light metal with high thermal conductivity. Aluminum can be used.
  • the to-be-patterned body mounting table has a cooling function. Thereby, it is possible to suppress the occurrence of thermal deformation in the mask, and in turn, it is possible to prevent the light irradiation pattern from being shifted and the heat-sensitive organic layer from being damaged by heat and degrading the performance.
  • the cooling function is not particularly limited as long as it can cool the mask, and specific examples include a water cooling method and blowing a gas such as air onto the mask.
  • the patterning apparatus according to the present invention includes a water channel inside the pattern forming body mounting table as a water-cooling cooling function, and introduces cooling water from one of the pattern forming body mounting tables, thereby forming the pattern forming It is preferable to provide a plurality of water channels that allow the cooling water to flow in one direction through the water channel in the body mounting table and to be discharged to the other.
  • the material of the pattern forming body mounting table is preferably one having high thermal conductivity. For example, aluminum can be used.
  • FIG. 8 shows a specific example of the water channel provided inside the pattern forming body mounting table.
  • a plurality of water channels 44b through which cooling water supplied from the water pipe 44a flows are formed in one direction from one side of the pattern forming body mounting table to the other inside the pattern forming body mounting table.
  • Cooling water flows in one direction through this water channel, and cools the heat generated in the mask and the organic EL element by ultraviolet irradiation.
  • the water that has absorbed heat at the pattern forming body mounting table is discharged from the water channel 44c and sent to the chiller unit 45, where heat is exchanged inside the chiller unit 45, and the cooling water whose temperature has been lowered is supplied to the pattern forming body mounting table. Will be supplied again.
  • the cooling water circulates inside the chiller unit and the pattern forming body mounting table.
  • a plurality of chiller units may be used according to the cooling capacity of the chiller.
  • the “chiller” refers to a device that circulates a heat medium and keeps the target part at a constant temperature.
  • the water temperature introduced to the pattern forming body mounting table is preferably 30 ° C. or less as long as the organic EL element and the mask are not condensed. 10 to 20 ° C. is more preferable.
  • the cooling water flowing through the water channel 44b is one-way, the cooling water that has absorbed heat and has risen in temperature can be discharged to the outside of the pattern forming body mounting table at the shortest distance. This is preferable because the cooling effect is higher than when reciprocating in the mounting table.
  • the patterning apparatus preferably includes a gas flow generation unit that blows gas onto the mask.
  • the gas flow generation unit 40 is arranged at a position facing the upper surface of the mask 14 such that a gas such as air is blown in parallel to the mask 14 and toward the center of the mask 14 through the gap WD between the mask 14 and the cover 39. ing.
  • the gas blown by the gas flow generator is not particularly limited as long as it can cool the mask and does not impair the effects of the present invention.
  • air, nitrogen gas, etc. Can be suitably used.
  • the gas flow generating unit 40 Since the gas flow generating unit 40 is disposed at a position facing the upper surface of the mask 14, the gas flow 41 can be blown in parallel with the mask 14, and as a result, the blown gas flow 41 travels on the mask 14 without unevenness and the center of the mask. It is possible to join at the part.
  • spraying in parallel means spraying at an angle within ⁇ 2 ° with respect to the plane of the mask 14.
  • the gas blown to the mask merges at the center of the mask 14. By joining at the center, the mask 14 can be cooled without unevenness. For this reason, it is preferable that the gas flow generation part 40 is arrange
  • the gap 42 between the cover 39 and the gas flow generating unit 40 is not particularly limited as long as the gas is efficiently blown onto the mask, but is preferably within a range of 10 to 200 mm. More preferably, it is in the range of 50 to 100 mm.
  • the length of the gas flow generating part is preferably the same as or larger than the width of the cover on the side to be sprayed.
  • the pair of gas flow generation units 40 is disposed at a symmetrical position with respect to the central portion of the mask 14.
  • the gas flow generation unit 40 includes a slit-shaped or nozzle-shaped sprayed portion. It is more preferable to have a slit-shaped spraying part. Furthermore, it is more preferable that the slit-like spraying part is one that blows gas in a line shape and cools the mask surface. This is because the mask can be cooled uniformly when the gas blown out is in a line shape.
  • a nozzle provided with a nozzle-like spraying part can be used instead of the slit-like spraying part.
  • the number of nozzles should be large, and the number of nozzles may be one at intervals of 5 to 20 mm. preferable.
  • the size of the nozzle diameter can be adjusted as appropriate.
  • a commercial product can be used as the gas flow generating part provided with the slit-like spraying part used for the spraying part.
  • a layered airflow generator 750 type manufactured by Sanwa Enterprise, a blower knife air nozzle manufactured by Spraying System Japan, or the like can be used.
  • the air volume blown from the pair of blowing parts is the same.
  • the air volume can be 1000 to 4000 L / min.
  • the gas flow generator is preferably connected to an air compressor. According to the irradiation light quantity of an ultraviolet-ray, it can adjust to a desired air volume and a wind speed suitably.
  • a known air compressor can be used.
  • the gas to be blown is temperature-adjusted. If necessary, the cooling effect can be enhanced by using a gas whose temperature is adjusted to about 5 to 15 ° C., for example.
  • having such a gas flow generation unit can efficiently cool the organic EL sheet and the mask by blowing gas on the mask, and has high irradiance. Since the influence of the heat accompanying a case can be reduced suitably, it is preferable.
  • the cover has a function of preventing a reduction in the amount of ultraviolet light emitted from the light source unit and irradiating the mask with a uniform amount of light. Therefore, it is preferable that the inner surface is covered with a reflective material. Since the reflective material is resistant to heat and durable, a metal material can be used. For example, aluminum is preferably used because it is lightweight.
  • the height and the bottom area are not particularly limited, and the size of the organic EL sheet that irradiates ultraviolet rays is not limited. It can be set accordingly.
  • the bottom surface of the cover is preferably larger than the entire area where the pattern is formed in the organic EL sheet.
  • a plurality of organic EL elements (for example, 100 organic EL elements in a total of 10 vertical columns and 10 horizontal rows) may be arranged to form one pattern.
  • the plurality of organic EL elements form different patterns, and operate as an organic EL panel that displays one pattern as a whole.
  • the height of the cover can be adjusted as appropriate based on the amount of ultraviolet light and unevenness in the amount of irradiation light. For example, it can be about 0.5 to 5 m.
  • the light irradiation area of the organic EL sheet is divided into a plurality of light irradiation areas and sequentially irradiated with pulsed light, and then the same region is repeatedly irradiated with pulsed light. Irradiation is repeated until the integrated dose is reached. Therefore, it is preferable to control the light irradiation area so as to go around.
  • FIG. 9 is an overall configuration diagram (X-axis direction perspective view) of an example of the patterning apparatus of the present invention (first form of the patterning apparatus).
  • FIG. 10 is an overall configuration diagram (Y-axis direction perspective view) of an example of the patterning apparatus of the present invention (first mode of the patterning apparatus).
  • the pattern forming body mounting table 43 moves in the X-axis direction along the linear guide 64.
  • the screw shaft 66 is rotated by the motor 67, and the rotational movement is converted into the straight movement by the ball screw 65 attached to the bottom surface of the pattern forming body mounting table 43.
  • a reference position is determined by a position sensor (not shown), and the amount of movement is controlled by the number of rotations of the motor 67 therefrom.
  • the light irradiation unit 32 is moved in the Y-axis direction by the linear guide 68.
  • the linear guide 68 of the light irradiation unit is installed on a base on which a support is placed.
  • the operation unit 52 has a built-in memory, and stores light irradiation conditions such as irradiance per light irradiation at each position, light irradiation time, number of times of light irradiation, coordinates of each light irradiation position, and movement order. ing.
  • a desired light irradiation condition is selected by the operation unit 52, and the control unit 53 controls the following mechanisms according to the condition.
  • the control unit 53 includes a mask alignment control unit 54, a movement mechanism control unit 55, a light source control unit 56, and a gas flow control unit 57.
  • the light source control unit 56 controls the irradiance, light irradiation time, number of times of light irradiation, and the like of the light source unit.
  • the movement mechanism control unit 55 controls the positions of the pattern forming body mounting table 43 and the light irradiation unit 32 via the motor 67 and the motor 61.
  • the mask alignment control unit 54 controls the mask alignment mechanism unit 69 in a state where the pattern forming body mounting table 43 is in the retracted position, and the organic EL sheet 11 and the predetermined position on the pattern forming body mounting table 43.
  • the mask 14 is installed.
  • the gas flow control unit 57 controls on / off of the operation of the gas flow generation unit 40.
  • FIG. 11 shows an operation flow of an example of a patterning method according to the present invention (using the first embodiment of the patterning apparatus and the organic EL sheet 11 and the mask 14 shown in FIG. 1 and having four light irradiation areas).
  • FIG. When the power supply 51 of the patterning apparatus is turned on, the operation of the chiller unit 58 is started, and the cooling water continues to circulate in the pattern forming body mounting table 43.
  • step S101 light irradiation conditions are selected. Light irradiation conditions are selected using a touch panel (not shown) of the operation unit 52. Further, the ID number of the organic EL sheet 11 is input.
  • step S102 the process proceeds to step S102.
  • step S ⁇ b> 102 the organic EL sheet 11 is placed on the pattern forming body placement table 43.
  • the pattern forming body mounting table 43 is in a position retracted from the light irradiation unit 32, and the organic EL sheet 11 is mounted and collected at this position.
  • a suction start button is pressed on a touch panel (not shown) of the operation unit 52, and the organic EL sheet 11 is sucked and fixed by a suction hole (not shown) provided on the pattern forming body mounting base 43.
  • step S103 mask alignment is performed, and the mask 14 is placed at a predetermined position.
  • the support body of the mask alignment mechanism unit 69 that supports the mask frame 202 on which the mask 14 is mounted is lowered, and the mask 14 is in close contact with the organic EL sheet 11. Stop just before.
  • a plurality of mask alignment cameras (not shown) move right above each mask alignment mark 16, and the center of the mask alignment mark 16 comes to the center of the cross-shaped organic EL sheet alignment mark 13.
  • X, Y, and ⁇ are adjusted by the mask alignment mechanism 69.
  • the camera is retracted, the mask frame 202 is further lowered, and the mask 14 is brought into close contact with the organic EL sheet 11.
  • step S104 circular step light irradiation is performed.
  • the pattern forming body mounting table 43 moves to the light irradiation position.
  • the movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P1.
  • the gas flow control unit 57 operates the gas flow generation unit 40 to start air cooling.
  • the movement mechanism control unit 55 moves the light irradiation unit 32 through the ball screw 63 so as to be a predetermined place in the light irradiation area P1.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P2.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the movement mechanism control unit 55 moves the light irradiation unit 32 through the ball screw 63 so as to be a predetermined place in the light irradiation area P3.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the movement mechanism control unit 55 moves the pattern forming body mounting table 43 through the ball screw 65 so as to be a predetermined place in the light irradiation area P4.
  • the light source control unit 56 operates the light source unit to perform predetermined one-pulse irradiation.
  • the controller 53 determines whether or not a predetermined number of times of light irradiation has been performed. If the predetermined number of times of light irradiation has not been performed, the light irradiation area P1 is moved and light irradiation is repeated. When it is determined that the predetermined number of times of light irradiation has been performed, the process proceeds to the next step S105.
  • step S105 the gas flow control unit 57 stops the operation of the gas flow generation unit 40 and ends the air cooling.
  • the process proceeds to step S106.
  • step S106 the pattern forming body mounting table 43 moves to the retracted position.
  • step S107 the mask 14 is separated from the organic EL sheet (mask withdrawal).
  • step S108 the adsorption of the pattern forming body mounting table 43 is completed, and the organic EL sheet is collected.
  • the step movement of the irradiating light can be performed immediately by controlling the light emission of the plurality of light sources (LEDs) 35 by the light source controller 56. Therefore, the tact time can be shortened by the time required for the step movement as compared with the first embodiment. Other processes can be performed in the same manner as in the second embodiment.
  • the organic EL device includes one or a plurality of organic functional layers between at least a pair of electrodes.
  • the organic functional layer in the present invention refers to a layer containing an organic compound. Examples thereof include a hole injection layer, a hole transport layer, a light emitting layer (including a blue light emitting layer, a green light emitting layer, and a red light emitting layer), an electron transport layer, and an electron injection layer.
  • the organic EL element according to the present invention can take various configurations, and an example is shown in FIG. In FIG. 12, the aspect ratio is not accurate for explanation.
  • the organic EL element 12 is provided on a substrate 113, and is configured by using a first electrode 71 (transparent electrode), an organic material, and the like in order from the substrate 113 side.
  • the functional layer group 73 and the second electrode 75a (counter electrode) are stacked in this order.
  • An extraction electrode 116 is provided at the end of the first electrode 71 (consisting of the base layer 71a and the electrode layer 71b).
  • the first electrode 71 and an external power source (not shown) are electrically connected via the extraction electrode 116.
  • the organic EL element 12 shows a configuration example in which generated light (emitted light h) is extracted from at least the substrate 113 side. That is, the case where the first electrode 71 is a transparent electrode and the second electrode 75a is a non-transparent electrode is shown.
  • the layer structure constituting the organic EL element 12 to be applied is not limited, and may be a general layer structure.
  • the first electrode 71 functions as an anode (anode) and the second electrode 75a functions as a cathode (cathode).
  • the organic functional layer group 73 has a structure in which the hole injection layer 73a / hole transport layer 73b / light emitting layer 73c / electron transport layer 73d / electron injection are sequentially arranged from the first electrode 71 side which is an anode.
  • stacked the layer 73e is illustrated, it is essential to have the light emitting layer 73c containing a luminescent compound at least among these.
  • the hole injection layer 73a and the hole transport layer 73b may be provided as a hole transport injection layer.
  • the electron transport layer 73d and the electron injection layer 73e may be provided as an electron transport injection layer.
  • the organic functional layer group 73 may be laminated with a hole blocking layer, an electron blocking layer, and the like in necessary portions in addition to these constituent layers.
  • the light emitting layer 73c may have a structure in which each color light emitting layer that generates light emitted in each wavelength region is laminated, and each of these color light emitting layers is laminated via a non-light emitting intermediate layer.
  • the intermediate layer may function as a hole blocking layer and an electron blocking layer.
  • the second electrode 75a serving as the cathode may also have a laminated structure as necessary. In such a configuration, only a portion where the organic functional layer group 73 is sandwiched between the first electrode 71 and the second electrode 75 a becomes a light emitting region in the organic EL element 12.
  • the auxiliary electrode 115 may be provided in contact with the electrode layer 71 b of the first electrode 71 for the purpose of reducing the resistance of the first electrode 71.
  • the organic EL element 12 having the above configuration is sealed with a sealing member 117 on the substrate 113 for the purpose of preventing deterioration of the organic functional layer group 73 configured using an organic material or the like due to harmful gas. It has been stopped.
  • This sealing member 117 is fixed to the substrate 113 side via an adhesive 119.
  • the extraction electrode 116 of the first electrode 71 and the terminal portion of the second electrode 75a are exposed from the sealing member 117 while being insulated from each other by the organic functional layer group 73 on the substrate 113. Is provided.
  • the patterning apparatus of the present invention can be suitably used in a method for manufacturing an organic electroluminescent element that manufactures an organic electroluminescent element in which a light emitting pattern is formed.
  • the present invention can be suitably employed in a method for manufacturing an organic electroluminescence element, wherein the edge portion of the light emission pattern has a luminance distribution within a range of 10 to 300 ⁇ m.
  • Such an organic EL element having a luminance distribution with an edge portion of the light emission pattern within a range of 10 to 300 ⁇ m can be manufactured by patterning the organic EL element using the patterning device of the present invention. it can.
  • the edge part of the light emission pattern refers to the side of the light emission pattern formed by the light shielding part in the mask.
  • ⁇ is a collimation half angle
  • t is an air conversion length from the light shielding film to the organic layer
  • t ts / n. Due to the irradiance distribution in the vicinity of the edge portion E of the light shielding film, the edge portion of the light emission pattern of the organic EL element irradiated with light is also inclined such that the luminance decreases as it goes from the light emitting portion to the non-light emitting portion, for example.
  • the luminance distribution has. Since the width of the inclination determines the resolution of the light emission pattern, it is preferable to design the apparatus with a collimation half angle at which a desired resolution can be obtained.
  • the resolution can be increased as the base material of the organic EL element is thinner and the collimation half angle of the irradiation light is smaller.
  • the collimation half angle is reduced, the irradiance cannot be increased.
  • an irradiance of at least 1 W / cm 2 is preferable, and the collimation half angle is made as small as possible with this irradiance.
  • the collimation half angle can be reduced to 23 °.
  • the tact time is prioritized and the increase of the collimation half angle is allowed
  • the collimation half angle ⁇ that can secure 4 W / cm 2 is 45 ° and the substrate thickness is 500 ⁇ m
  • the above ⁇ is 294 ⁇ m
  • the half pitch is 0 .3mm is the resolution limit.
  • the slope of the luminance distribution at the edge is preferably 10 to 300 ⁇ m.
  • the collimation half angle ⁇ is 45 ° and the thickness of the substrate is 130 ⁇ m, ⁇ is 76 ⁇ m, and it is considered that the half pitch 0.1 mm can be sufficiently resolved.
  • an organic EL element having a luminance distribution within a range of 10 to 300 ⁇ m is manufactured by patterning the organic EL element using the patterning apparatus of the present invention. I think you can.
  • the luminance distribution can be measured with a known luminance meter.
  • the luminance distribution can be measured using CA-2000 (manufactured by Konica Minolta), which is a two-dimensional color luminance meter, but is not limited thereto.
  • each of the evaporation crucibles is filled with a hole injection material, a hole transport material, a host compound and a dopant for the light emitting layer, an electron transport material, and an electron injection material in an optimum amount for device fabrication.
  • the evaporation crucible containing the hole injection material is energized and heated to deposit the hole injection material on the substrate to provide a hole injection layer.
  • the evaporation crucible containing the hole transport material is energized and heated to deposit the hole transport material on the hole injection layer, thereby providing a hole transport layer.
  • the deposition crucible containing the host compound and dopant of the light emitting layer is energized and heated, and the host compound and dopant of the light emitting layer are co-deposited on the hole transport layer to provide a light emitting layer.
  • the deposition crucible containing the hole blocking material is energized and heated to deposit the hole blocking material on the light emitting layer, thereby providing a hole blocking layer.
  • the deposition crucible containing the electron transport material is energized and heated to deposit the electron transport material on the hole blocking layer, thereby providing an electron transport layer.
  • the deposition crucible containing the electron injection material is energized and heated to deposit the electron injection material on the electron transport layer to provide an electron injection layer.
  • an organic functional layer can be formed.
  • an organic EL element can be produced. Such an organic EL element is cut into a predetermined size during patterning. The patterning of the organic EL element can be performed as described above. Moreover, the manufacturing method of an organic EL element is not limited to the said method, A well-known method can be used.
  • FIG. 5 shows an example in which the viscoelastic body is in contact with the fixing means on two surfaces as an example of the mask holding mechanism, but is not particularly limited as long as the viscoelastic body can be fixed.
  • the first surface the surface opposite to the viscoelastic mask
  • FIG. 5 all the viscoelastic bodies are fixed by the fixing means, but at least one of the pair of viscoelastic bodies arranged to face each other may be fixed by the fixing means.
  • the fixing means may have a mask detachment preventing function. That is, by making the viscoelastic body higher than the mask and extending the upper surface of the fixing means for fixing the viscoelastic body to the mask side, the fixing means can have a function of preventing the mask from coming off.
  • an aspect in which one side of each side of the mask is positioned and fixed as a fixing pin may be used. Even with such a mask holding mechanism, the same effect as the mask holding mechanism according to the present invention can be obtained. A similar effect can be obtained with a mechanism in which a viscous material having an area (for example, a viscoelastic body (rubber) thin plate) is provided in a portion in contact with the mask and a constant pressure is applied to the member with a hook elastic body via a rigid body. be able to.
  • a viscous material having an area for example, a viscoelastic body (rubber) thin plate
  • the present invention is not limited to this, and continuous light may be irradiated.
  • segments a light irradiation area and irradiates light sequentially with respect to the divided light irradiation area was demonstrated, this invention is not limited to this, A light irradiation area is not divided
  • the patterning apparatus has been described as having a cover, the patterning apparatus may not have a cover.
  • TDAH 1,6-diaminohexane
  • the coating solution obtained above was formed on the PET substrate with a spin coater so that the thickness after modification was 250 nm, left for 2 minutes, and then heat-treated for 1 minute on an 80 ° C. hot plate. And a polysilazane coating film was formed.
  • the substrate was gradually cooled to 25 ° C., and the coating surface was subjected to modification treatment by irradiation with vacuum ultraviolet rays in a vacuum ultraviolet irradiation apparatus.
  • a vacuum ultraviolet irradiation apparatus As a light source of the vacuum ultraviolet irradiation device, an Xe excimer lamp having a double tube structure for irradiating vacuum ultraviolet rays of 172 nm was used.
  • a UV curable resin OPSTAR (registered trademark) Z7527 manufactured by JSR Corporation was applied to a resin substrate so as to have a dry layer thickness of 2 ⁇ m, dried at 80 ° C., and then using a high-pressure mercury lamp in the air. Then, curing was performed under the condition of an irradiation energy amount of 0.5 J / cm 2 .
  • the substrate has an oxygen permeability measured by a method according to JIS K 7126-1987 of 1 ⁇ 10 ⁇ 3 mL / m 2 ⁇ 24 h ⁇ atm or less, and a water vapor permeability of 1 ⁇ 10 ⁇ 4 g / m. it was confirmed that the following gas-barrier substrate 2 ⁇ 24h.
  • a nitrogen-containing compound N-1 represented by the following structural formula was formed in a thickness of 25 nm in a vacuum deposition apparatus, and then silver was formed to a thickness of 10 nm as an anode using a film-forming mask. The film was formed.
  • CuPc copper phthalocyanine
  • N, N′-Di (1-naphthyl) -N, N′-diphenylbenzidine ( ⁇ -NPD) green as a hole transport material 4,4'-Bis (N-carbazolyl) -1,1'-biphenyl (CBP) as the host compound of the light emitting layer
  • Ir (ppy) 3 the dopant of the green light emitting layer
  • tris (8-hydroxyquinolinato) aluminum (Alq 3 ) as an electron transport material
  • LiF as an electron injection material
  • the deposition crucible containing CuPc was energized and heated, and CuPc was deposited on the silver electrode side of the resin substrate at a deposition rate of 0.1 nm / second, A hole injection layer having a layer thickness of 15 nm was provided.
  • the deposition crucible containing ⁇ -NPD is energized and heated, and ⁇ -NPD is deposited on the hole injection layer at a deposition rate of 0.1 nm / second to provide a hole transport layer having a thickness of 25 nm. It was.
  • the evaporation crucible containing 5% by mass of Ir (ppy) 3 and CBP was energized and heated, and Ir (ppy) 3 and CBP were added to the hole transport layer at a total deposition rate of 0.1 nm / second. Co-evaporated on top, a green light emitting layer with a layer thickness of 10 nm was provided.
  • the deposition crucible containing BAlq was energized and heated, and BAlq was deposited on the green light emitting layer at a deposition rate of 0.1 nm / second to provide a hole blocking layer having a layer thickness of 15 nm.
  • the crucible for vapor deposition containing Alq 3 was energized and heated, and Alq 3 was vapor-deposited on the hole blocking layer at a vapor deposition rate of 0.1 nm / second to provide an electron transport layer having a layer thickness of 30 nm.
  • the deposition crucible containing LiF was energized and heated, LiF was deposited on the electron transport layer at a deposition rate of 0.1 nm / second, and an electron injection layer having a thickness of 1 nm was provided. In this way, an organic functional layer was formed.
  • an organic EL element 101 having a size of 6 cm ⁇ 15 cm was produced.
  • an organic EL sheet in which organic EL elements 101 are arranged in 7 rows ⁇ 5 rows was used.
  • the size of the sheet is 70 cm ⁇ 100 cm.
  • ⁇ Preparation of patterned organic EL panel 101 [UV irradiation]
  • the organic EL element 101 was patterned by using the patterning apparatus shown in FIG. The patterning conditions are shown below.
  • the collimation half angle was shaped into a predetermined collimation half angle by the lens array. Further, the lens array was adjusted so that the irradiance was within a range of ⁇ 10% with respect to the average value of the irradiance in the light irradiation area.
  • the collimation half angle and irradiance were measured as follows.
  • the pattern forming body mounting table is moved to the retracted position, and the pinhole is disposed at the same height (hereinafter referred to as the irradiation surface) as the surface on which the organic EL sheet of the pattern forming body mounting table is mounted, instead of the CCD camera.
  • a UV photosensitive paper (Fuji Film UV scale) was placed 10 mm below the pinhole. Next, ultraviolet light was irradiated from the light irradiation part to the pinhole at an irradiance of 2 W / cm 2 for 10 minutes, and the UV photosensitive paper was exposed by the light passing through the pinhole. The radius of the area discolored by light exposure was measured, and the collimation half angle was calculated. As a result of carrying out this measurement at the center and four corners of the light irradiation area, the collimation half angle was 41 to 45 °.
  • a quartz glass substrate having a thickness of 5 mm and a size of 81.3 cm ⁇ 137.9 cm, a line and space with a half pitch of 0.3 mm in each light emitting area of the organic EL element 101 (white (transparent) every 0.3 mm)
  • a glass mask was attached to the mask frame and placed on the pattern forming body mounting table, and then the organic EL sheet was placed at a predetermined position on the pattern forming body mounting table with the light emitting surface facing up.
  • patterning was performed by irradiating the organic EL sheet with light in an environment at room temperature of 25 ° C.
  • the organic EL sheet is taken out every 5 minutes of integrated irradiation time, and a current is supplied by applying a probe to the electrode of the organic EL element 101 arranged in the center of the sheet, so that the luminance of the light emitting part is 700 cd / m 2.
  • the luminance of the light emitting part and the non-light emitting part was measured.
  • the luminance was measured using a luminance meter CA-2000. This measurement was performed until the total accumulated irradiation time reached 60 minutes.
  • Light source UV-LED with a wavelength of 385 nm
  • Irradiance 4W / cm 2 (collimation half angle: 45 °)
  • Light irradiation conditions 20 cycles of intermittent irradiation with a period of irradiation time of 15 seconds and a turn-off time of 15 seconds (duty ratio 50%) were performed (total 600 seconds). Total irradiation time is 5 minutes.
  • the spraying part was sprayed with the same air volume from both short side directions to the center direction of the mask using a slit-like layered gas flow generating part.
  • Slit position of spraying part 3mm above glass
  • Angle of spray part of gas flow generation part parallel to mask (0 °)
  • a gap between the gas flow generation part and the cover side face 72 mm, and a pair of gas flow generation parts were attached at positions facing the short side of the cover.
  • a patterned organic EL panel 103 was produced in the same manner except that the irradiance was lowered from 4 W / cm 2 to 1 W / cm 2 in the production of the organic EL panel 101.
  • a luminance ratio “(luminance of the light emitting portion) / (luminance of the non-light emitting portion)” is calculated from the luminance of the light emitting portion and the luminance of the non-light emitting portion measured every 5 minutes of the integrated irradiation time, The characteristics of the luminance ratio with respect to the integrated irradiation time are graphed. The results are shown in FIG.
  • an organic EL panel can be produced with an irradiance of 1 W / cm 2 and an integrated irradiation time of 40 minutes.
  • patterning can be performed at a high speed of 10 minutes with an integrated irradiation time of 10 minutes if the irradiance is 4 W / cm 2 and high irradiance.
  • the patterning time of an organic electroluminescent element can be shortened significantly.
  • the present invention is suitable for providing a patterning apparatus and a method for manufacturing an organic electroluminescent element that can significantly reduce the patterning time of the organic electroluminescent element.

Abstract

La présente invention traite le problème de fourniture d'un dispositif de formation de motif qui peut raccourcir considérablement la quantité de temps de formation de motif pour un élément électroluminescent organique. Le dispositif de formation de motif de la présente invention, qui forme un motif d'émission de lumière en exposant un élément électroluminescent organique à une lumière par l'intermédiaire d'un masque, est caractérisé en ce qu'il comporte une unité de rayonnement d'une lumière qui rayonne une lumière ayant une longueur d'onde dans une plage spécifique à un éclairement énergétique d'au moins 1 W/cm2. Le dispositif de formation de motif est en outre caractérisé en ce que l'éclairement énergétique de la lumière dans la plage de longueurs d'onde dans une zone de rayonnement de lumière est dans ±10 % de la valeur moyenne dudit éclairement énergétique dans la zone de rayonnement de lumière. Le dispositif de formation de motif est en outre caractérisé en ce que le demi-angle de collimation de la lumière dans la plage de longueurs d'onde dans la zone d'exposition à une lumière ne dépasse pas 45°.
PCT/JP2016/085369 2016-03-18 2016-11-29 Dispositif de formation de motif et procédé de fabrication d'élément électroluminescent organique WO2017158943A1 (fr)

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WO2022181288A1 (fr) 2021-02-26 2022-09-01 富士フイルム株式会社 Élément sensible aux rayonnements uv et kit sensible aux rayonnements uv
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