WO2017158934A1 - Masque de formation de motif d'émission de lumière, et procédé de fabrication d'un élément électroluminescent organique - Google Patents

Masque de formation de motif d'émission de lumière, et procédé de fabrication d'un élément électroluminescent organique Download PDF

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Publication number
WO2017158934A1
WO2017158934A1 PCT/JP2016/084891 JP2016084891W WO2017158934A1 WO 2017158934 A1 WO2017158934 A1 WO 2017158934A1 JP 2016084891 W JP2016084891 W JP 2016084891W WO 2017158934 A1 WO2017158934 A1 WO 2017158934A1
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Prior art keywords
light
mask
organic
pattern
light irradiation
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PCT/JP2016/084891
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English (en)
Japanese (ja)
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新藤　博之
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コニカミノルタ株式会社
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/16—Electron transporting layers
    • H10K50/166—Electron transporting layers comprising a multilayered structure

Definitions

  • the present invention relates to a light emitting pattern forming mask and a method for manufacturing an organic electroluminescence element.
  • the present invention relates to a light emitting pattern forming mask and the like capable of patterning with high dimensional accuracy.
  • organic light emitting panels are attracting attention as thin light emitting devices.
  • an organic light emitting device (hereinafter also referred to as “organic EL device”) using electroluminescence (EL) of an organic material is a thin film type complete light emitting device capable of emitting light at a low voltage of about several volts to several tens of volts. It is a solid panel, can obtain high brightness with low power, has excellent features such as visibility, response speed, life and power consumption, and can be made thin and light.
  • various displays using organic EL elements as panels, backlights thereof, display boards such as signboards and emergency lights, and surface light emitters such as illumination light sources have attracted attention in recent years.
  • an organic EL panel for a display application, as a method for producing a patterned organic EL element, the organic functional layer of the organic EL element laminated on the substrate is irradiated with ultraviolet rays to deteriorate the irradiated portion.
  • a method of manufacturing an organic EL panel that forms a light-emitting pattern having a non-light-emitting region has been disclosed (for example, see Patent Document 1).
  • This phenomenon has reciprocity failure characteristics as described in International Publication No. 2014/175135, and it is known that the higher the irradiation power density (irradiance), the faster the reaction, even with the same integrated light quantity. .
  • Patent Document 2 and Patent Document 3 disclose a correction method for performing accurate patterning, but since it is complicated, a simpler method is required.
  • JP-A-8-259938 Japanese Unexamined Patent Publication No. 4-136683 Japanese Patent Laid-Open No. 57-22240
  • the present invention has been made in view of the above problems and situations, and a problem to be solved is to provide a mask for forming a light emitting pattern with high dimensional accuracy and a method for manufacturing an organic electroluminescence element having a light emitting pattern.
  • the position of the light-shielding part of the light-emitting pattern forming mask has a distance ⁇ satisfying a predetermined relationship from the size of the pattern to be formed
  • a light emission pattern forming mask for irradiating light through a mask to an organic functional layer of an organic electroluminescence element to form a light emission pattern of a light emitting part When the collimation half angle of the light irradiation device used for the light irradiation is ⁇ , the position of the end of the light shielding portion of the mask in the in-plane direction of the mask satisfies the following formula (I) from the size of the pattern to be formed A mask for forming a light emitting pattern, which is uniformly spread at the position of ⁇ .
  • a method for producing an organic electroluminescent element wherein a light emitting pattern is formed on the organic functional layer of the organic electroluminescent element by light irradiation using the light emitting pattern forming mask described in item 1.
  • the means of the present invention it is possible to provide a light emitting pattern forming mask with high dimensional accuracy and a method for producing an organic electroluminescent element having a light emitting pattern.
  • the expression mechanism or action mechanism of the effect of the present invention is not clear, but is presumed as follows.
  • non-parallel light it is possible to irradiate light with higher illuminance than parallel light.
  • light with an incident angle larger than 0 ° enters under the light-shielding part of the mask, resulting in pattern shift.
  • the light emission pattern of the organic EL element only needs to be several tens ⁇ m or more of the visual level, it is not necessary to consider the influence of diffraction, and the light emission pattern forming mask can be designed with a simple correction rule. It is assumed that sufficient pattern accuracy could be secured.
  • the light-emitting pattern forming mask of the present invention is a light-emitting pattern forming mask for irradiating light to the organic functional layer of the organic electroluminescence element through the mask to form a light-emitting pattern of the light-emitting portion, and is used for the light irradiation.
  • the collimation half angle of the irradiation apparatus is ⁇
  • the position of the end of the light shielding part of the mask in the in-plane direction of the mask is uniformly set to a position of the distance ⁇ satisfying the formula (I) from the size of the pattern to be formed. It is characterized by being expanded. This feature is a technical feature common to or corresponding to the claimed invention.
  • the method for producing an organic electroluminescent element of the present invention is characterized in that a light emitting pattern is formed by light irradiation on an organic functional layer of an organic electroluminescent element using a light emitting pattern forming mask. Thereby, the organic electroluminescent element which has a light emission pattern with high dimensional accuracy can be provided.
  • the end of the light emission pattern of the light emitting portion of the organic electroluminescence element has a luminance distribution within a range of 10 to 300 ⁇ m. It is preferable in that it can be performed.
  • the light-emitting pattern forming mask of the present invention (hereinafter also simply referred to as “mask”) is used for forming a light-emitting pattern for forming a light-emitting pattern of a light-emitting portion by irradiating light to the organic functional layer of the organic electroluminescence element through the mask.
  • the collimation half angle of the light irradiation device used for the light irradiation is ⁇
  • the position of the end of the light shielding portion of the mask in the in-plane direction of the mask is calculated from the size of the pattern to be formed by the following formula ( It is characterized by being uniformly spread at a distance ⁇ satisfying I).
  • t represents the air conversion length from a mask to an organic functional layer.
  • the mask of the present invention can be produced using a known mask material that can change the amount of transmitted light of ultraviolet rays or visible light. By using this to irradiate the organic EL element with light, an organic EL panel having a light emission pattern can be produced.
  • the light emission pattern (bright portion) after light irradiation is a pattern whose edge is shifted inward by ⁇ from the edge position of the mask light shielding portion, and the pattern width is 2 ⁇ narrower. turn into.
  • the mask pattern (the portion where the light shielding part of the mask is pasted) is produced in the same size as the desired pattern (original drawing), the actual pattern formed on the organic EL element is the desired pattern size.
  • the light shielding part edge position is widened by ⁇ from the edge position of the original drawing and the width of the light shielding part is set to w + 2 ⁇ , the width of the light emission pattern can be set to the same width w as the original drawing (see FIG. 1B).
  • the amount of light entering at an incident angle ⁇ can be considered as t ⁇ tan ⁇ from geometrical optics.
  • Formula (II): ⁇ t ⁇ tan ⁇
  • t is an air-converted length from the light shielding portion to the organic functional layer, and can be obtained using the following formula (III) when the thickness of the substrate is t s and the refractive index is n.
  • Formula (III): t t s / n
  • FIG. 2 shows a photomicrograph of the light emission pattern of the organic EL element actually produced. This represents a case where an organic EL element produced by using a mask that has not been corrected for a pattern having a length of 2 mm with a line and space with a half pitch of 0.3 mm is emitted. That is, it is a light emission pattern in which three light shielding portions having a width of 0.3 mm are arranged at a pitch of 0.6 mm.
  • the collimation half angle ⁇ of the light irradiation apparatus used at this time was 45 °, and light irradiation was performed with an irradiance of 4 W / cm 2 and an integrated light irradiation time of 6 minutes.
  • the relative luminance distribution in the x direction of this light emission pattern is shown in FIG. 3A.
  • the end portion (edge portion) of the light emission pattern has an inclined luminance distribution due to light irradiation with non-parallel light, and the line width is 0.26 mm when the line width of the light emitting portion is defined by a relative luminance of 0.5.
  • the actual thinning amount ⁇ is 20 ⁇ m and less than half.
  • the relative luminance of the dark part has not dropped to near 0, and the accumulated light irradiation time is insufficient and the reaction is not yet sufficient.
  • FIG. 3B shows a case where light irradiation is performed with an integrated light irradiation time of 10 minutes.
  • the amount ⁇ of the bright portion was 30 ⁇ m, and the width of the light emitting portion was further reduced.
  • the relative luminance of the dark portion has dropped to near 0, and is almost in a non-light emitting state.
  • the correction amount ⁇ changes depending on where the contrast (brightness ratio) between the target bright part and dark part is set.
  • ⁇ may be small, and as the target luminance ratio increases, ⁇ approaches t ⁇ tan ⁇ . Therefore, it is preferable to set appropriately in the range of 0 ⁇ ⁇ t ⁇ tan ⁇ .
  • the light shielding portion of the mask absorbs ultraviolet light or visible light and generates heat, causing thermal deformation of the mask.
  • a light shielding part having a high reflectance of ultraviolet light or visible light when used, multiple reflection occurs between the light shielding part and the metal electrode of the organic EL element as shown in FIG. Will further increase. If the internal reflection at the light-shielding portion is twice or more, the irradiance is not enough to form a pattern due to attenuation, so it is necessary to consider even one reflection.
  • the correction amount ⁇ is 3 ⁇ t ⁇ tan ⁇ at the maximum. Therefore, the range of ⁇ is 0 ⁇ ⁇ 3 ⁇ t ⁇ tan ⁇ .
  • the mask pattern may be obtained by extending the edge portion of a desired pattern (original drawing) by ⁇ in any direction. For example, as shown in FIG. 5, a large number of centers of circles with a radius ⁇ may be arranged at the edges of the original diagram indicated by dotted lines in the drawing, and the portions surrounded by the outer envelope of these circles may be used as the light shielding portion of the mask. .
  • the collimation half-angle varies depending on the direction in the mask surface, it is necessary to change the correction amount ⁇ depending on the direction according to the in-plane distribution shape.
  • the ray angle distribution in the mask surface is rectangular as shown in FIG. If the x and y collimation half angles are ⁇ x and ⁇ y, respectively, and the correction amounts are ⁇ x and ⁇ y , respectively, the rectangles in the x and y directions are 2 ⁇ x and 2 ⁇ y as shown in FIG. Is arranged at the edge of the original drawing pattern, and its outer envelope is used as the correction pattern.
  • the design limit of the resolution of the light irradiation pattern is determined by the width of the inclined part.
  • the width of the inclined portion is d
  • the state where the upper end of the right inclination and the left inclination are in contact is the resolution limit of the bright portion
  • the state where the lower end is in contact is the resolution limit of the dark portion.
  • the width is defined at a relative luminance of 50%
  • the resolution limit width is d for both bright and dark areas.
  • the resolution can be improved as the base material of the organic EL element is thinner and the collimation half angle is smaller.
  • the collimation half angle is reduced, the irradiance cannot be increased.
  • an illuminance of 1 W / cm 2 or more is preferable.
  • the collimation half angle is as small as 23 °. I understood that I could do it.
  • the light irradiation apparatus 1 shown in FIG. 8 mainly includes a light irradiation unit 2 and a pattern forming body mounting table 43.
  • the light irradiation unit 2 preferably includes a light source unit 6, a lens array 7, a cover 9, and the like.
  • the light source unit 6 includes, for example, UV-LEDs having emission wavelengths of 365 nm and 385 nm arranged in parallel on the light source substrate 4 as a light source (LED) 5 that emits ultraviolet rays.
  • the lens array 7 shapes the light beam into a predetermined divergence angle, and irradiates the sheet-like organic EL element (organic EL sheet) 100 through a cover 9 that reflects and guides light through a mask 14 positioned below the cover 9.
  • the organic EL sheet is held on the pattern forming body mounting table 43.
  • the lens array 7 is fixed to the light source unit by a lens array support 8.
  • the irradiation light L emitted from the lens array 7 is confined in the cover whose inner surface is a reflection surface, prevents the light amount from decreasing, and is irradiated onto the mask 14 with a uniform light amount.
  • the gap (WD) between the lower end of the cover and the mask is preferably as narrow as possible, and is preferably about 5 mm. With this gap, the layered fluid can be sprayed uniformly on the mask.
  • the light source 5 is turned on, turned off, and the irradiation output at the time of lighting and the irradiation time are controlled by a controller (not shown) to perform intermittent light irradiation.
  • the lens array 7 is used for divergence angle shaping, but a condensing mirror such as a compound parabolic concentrator may be used.
  • a heat radiating plate 3 for releasing heat generated by light emission of the light source 5 to the outside is provided on the light source substrate 4. By installing such a heat sink 3, the temperature rise of the light source part 6 can be suppressed.
  • the irradiation area of the light (irradiation light L) emitted from the entire light irradiation unit 2 is an area that can cover the entire area where the organic EL element of the organic EL sheet is disposed. That is, when all the light sources 5 are turned on, all the organic EL elements can be patterned at once.
  • the light source unit 6 has a plurality of LED light sources, lighting may be controlled in a plurality of groups according to the size of the organic EL sheet, and the light irradiation area of the organic EL sheet may be controlled. The lighting control may be performed by selecting a plurality of groups of light sources according to the light irradiation area.
  • the thermal deformation of the mask can be further suppressed by reducing the light irradiation area.
  • the case where the light sources 5 in one light irradiation unit 2 are turned on simultaneously or sequentially with respect to the pattern forming body mounting table 43 has been described, but it is smaller than the light irradiation unit 2.
  • the light irradiation unit may be moved stepwise on each light irradiation area, or a plurality of small light irradiation units may be arranged to sequentially cause each light irradiation unit 2 to emit light according to the light irradiation of each light irradiation area.
  • a mask has a role which changes the light quantity irradiated to an organic EL element.
  • the mask 14 has a two-layer structure of a base material 14b and a light shielding part 14a, and is preferably attached to the mask alignment mechanism part 20 so that the light shielding part is on the mask frame 22 side.
  • the mask alignment mechanism unit 20 fixes, for example, a rectangular mask frame 22 having an opening in the center, an elastic body 24 provided on each side of the mask frame 22, and an elastic body 24 arranged to face each other. And fixing means 26 to be configured.
  • the elastic body 24 is placed on the mask frame 22 and presses and fixes the mask 14 from the side by making surface contact with the side surface of the mask 14.
  • a mask with a negative pattern on the substrate can be produced. It is preferable that a low-chromium light-shielding portion is provided with a pattern in that thermal deformation can be suppressed.
  • a mask and irradiating the organic EL element with ultraviolet rays an organic EL element having a light emission pattern can be manufactured.
  • the organic EL element is placed on a pattern forming body mounting table having a cooling function, and the mask of the present invention is positioned at a predetermined relative position to the organic EL element and is placed in close contact with the element. It is preferable. This is because it is possible to enhance the cooling effect of the light-shielding part serving as a heat source when irradiated with light. Specifically, it is preferable that the light-shielding part is in close contact with the organic EL element.
  • Base material As a base material, it does not specifically limit as a raw material, the well-known glass raw material used for optical uses or a base material can be used. Specifically, glass ceramics such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, crystallized glass, phosphate glass or lanthanum glass Etc. Of these, those having a low coefficient of thermal expansion are preferred. Heat-resistant glass such as quartz glass, glass ceramic and borosilicate glass (for example, Tempax Float (registered trademark) manufactured by Schott) can be preferably used.
  • the thickness of the mask is not particularly limited, but a mask having a thickness of 3 to 10 mm can be used.
  • the light-shielding part is not particularly limited as long as it shields the irradiation light from the light irradiation device.
  • a thin film using, for example, chromium (Cr) is preferable as the light shielding portion having a high reflectance of ultraviolet light.
  • the reflectivity is about 50%, but the structure is such that pure Cr is sandwiched between chromium oxide (CrO), and by optimizing each film thickness, while suppressing the absorption rate of ultraviolet light, the organic EL element side Therefore, it is desirable to select a light shielding portion of such a mask.
  • the light irradiation unit preferably irradiates light having a wavelength in the range of 100 to 410 nm with an irradiance of 1 W / cm 2 or more.
  • a light source that emits ultraviolet rays is attached to the light irradiation unit.
  • the light source is not particularly limited as long as it is a light source that emits a desired amount of ultraviolet light.
  • Ultraviolet light and visible light in the wavelength region can be used.
  • the integrated dose for patterning depends on the layer structure, film thickness, size, and the like of the organic EL element, but irradiation with an integrated light amount of 200 to 5000 J / cm 2 is highly productive, This is preferable from the viewpoint of accurate patterning.
  • the irradiation time at the time of one pulse irradiation in the intermittent light irradiation is preferably in the range of 1 to 300 seconds.
  • the light irradiation unit for example, UV-LEDs having a wavelength of 385 nm are used as a light source, these are arranged two-dimensionally, and the irradiation light emitted from the LEDs is shaped by the lens array 7 so as to have a predetermined collimation half angle. By doing so, the light emitted from each lens of the lens array 7 overlaps on the irradiation surface, and as a result, it is possible to irradiate a wide area of the organic EL sheet and to obtain a uniform illuminance distribution.
  • the LED performs intermittent light irradiation of pulsed light whose lighting output, irradiation time, and irradiation time are controlled by a controller (not shown).
  • the light irradiation unit irradiates light having a wavelength in the range of 100 to 410 nm with an irradiance of 1 W / cm 2 or more.
  • the irradiance is preferably 2 W / cm 2 or more. 4 W / cm 2 or more is more preferable.
  • a light irradiation area of 5000 cm 2 or more and an irradiance of 4 W / cm 2 are preferable in that the tact time of patterning can be greatly shortened and the number of pick-ups can be increased. As a result, productivity can be remarkably improved.
  • the irradiance of light having a wavelength in the range of 100 to 410 nm in the light irradiation area is within a range of ⁇ 10% with respect to the average value of the irradiance in the light irradiation area.
  • the irradiance of light within the wavelength range in the light irradiation area is the average value of the irradiance in the light irradiation area. On the other hand, it is within a range of ⁇ 10%.
  • the irradiance can be measured with a known measuring instrument. For example, when the wavelength range is 300 to 410 nm, the UV integrated light meter “C9536-02” and the sensor head “H9958-02” (manufactured by Hamamatsu Photonics) Can be measured at 1-10 mm intervals in the vertical and horizontal directions of the light irradiation area. From the irradiance distribution in the light irradiation area measured as described above, the average of the irradiance of light within the wavelength range in the light irradiation area can be calculated.
  • the collimation half angle of light within the range of 100 to 410 nm in the light irradiation area is 45 ° or less. In order to realize an irradiance of 1 W / cm 2 or more, it is preferable to include light having a collimation half angle of 23 ° or more.
  • the collimation half angle refers to the maximum one of the angles ⁇ formed by the perpendicular R to the mask and the irradiation light L (see FIG. 8). The collimation half angle can be adjusted by shaping the light emitted from the light source unit with a lens or the like.
  • the lens for adjusting the collimation half angle is not particularly limited.
  • a condensing mirror such as a compound parabolic concentrator may be used instead of the lens array.
  • a compound parabolic concentrator is preferable because the component cost can be reduced.
  • a rod-shaped cylindrical lens or rod lens is arranged in each column of the LED array, and then a rod-shaped cylindrical lens or rod lens is arranged in an orthogonal direction to perform two-dimensional collimation angle shaping. May be. This is preferable because it is sufficient to adjust the optical axis in only one direction, and the adjustment man-hour can be suppressed.
  • the pattern forming object mounting table is retracted from the light irradiation unit, the pinhole is disposed at the same height as the surface on which the organic EL sheet of the pattern forming object mounting table is mounted, the irradiation light is irradiated to the pinhole, and the pin
  • the light beam that has passed through the hole is observed with a CCD camera or irradiated with ultraviolet photosensitive paper disposed under the pinhole to change the color, and the radius M of the light beam (discolored portion) is measured.
  • the collimation half angle is calculated by tan ⁇ 1 (M / D), where D is the distance between the pinhole and the CCD element or the ultraviolet photosensitive paper.
  • the diameter of the pinhole is desirably ⁇ 0.5 mm or less.
  • the light irradiation area is a region of light irradiated by the light irradiation device used in the present invention.
  • the area of the light irradiation area is not particularly limited, but is preferably 5000 cm 2 or more. The reason for this is as follows.
  • the width of the roll is generally about 1 m.
  • this is cut into a length of about 600 mm in the roll winding direction to form a sheet having a plurality of organic EL elements in a planar shape, and the plurality of organic EL elements are collectively irradiated with light. It is preferable to do.
  • a plurality of organic EL elements are arranged in an area of 90 cm ⁇ 54 cm on the inner side.
  • light can be irradiated to one organic EL sheet within a total of 9 steps and 10 steps of 3 steps in the x direction and 3 steps in the y direction.
  • the light irradiation area By setting the light irradiation area in such a large area, light irradiation in the state of the organic EL sheet can be performed, and a plurality of organic EL elements can be patterned at a time, thereby improving the throughput.
  • Such a large-area light irradiation area can be realized, for example, by increasing the number of LEDs and expanding the light-emitting area of the light source unit.
  • the light irradiation device used in the present invention has a cooling function. It is preferable to provide it together. As a result, even if the total amount of light emitted once is very high, the heat generation of the light shielding portion of the mask can be suppressed.
  • the light irradiation apparatus 1 used in the present invention includes a pattern forming body mounting table 43 on which an organic electroluminescence element is mounted.
  • the pattern forming body mounting table is not particularly limited as long as it can mount the organic electroluminescence element and does not impair the effects of the present invention.
  • the organic EL sheet 100 can be adsorbed and fixed. It is preferable.
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • the material of a to-be-patterned body mounting base is not specifically limited. However, when the pattern forming body mounting table has a water channel 44b described later, the pattern forming body mounting table is a cooling table, and therefore, the material is preferably a metal having high thermal conductivity. Can be used.
  • the alignment between the mask and the sheet is preferably adjusted by the coordinates (X, Y, ⁇ ) in the plane of the pattern forming body mounting table on the mask frame on which the mask is mounted.
  • the light shielding portion (such as chromium) of the mask absorbs ultraviolet rays and the temperature rises.
  • the to-be-patterned body mounting table has a cooling function.
  • the cooling function is not particularly limited as long as it can cool the mask, and specific examples include a water cooling method and blowing a gas such as air onto the mask.
  • the light irradiation apparatus used in the present invention has a water channel inside the pattern formation object mounting table as a water-cooling cooling function, introduces cooling water from one of the pattern formation object mounting tables, and It is preferable that a cooling function is provided with a plurality of water channels that flow the cooling water in one direction through the pattern forming body mounting table and discharge it to the other.
  • FIG. 9 shows a specific example of the water channel provided inside the pattern forming body mounting table.
  • a plurality of water channels 44b through which cooling water supplied from the water channel 44a flows are formed in one direction from one side of the pattern forming body mounting table to the other inside the pattern forming body mounting table.
  • Cooling water flows in one direction through this water channel, and cools the heat generated in the mask and the organic EL element by ultraviolet irradiation.
  • the water that has absorbed heat at the pattern forming body mounting table is discharged from the water channel 44c and sent to the chiller unit 45, where heat is exchanged inside the chiller unit 45, and the cooling water whose temperature has been lowered is supplied to the pattern forming body mounting table. Will be supplied again.
  • the cooling water circulates inside the chiller unit and the pattern forming body mounting table.
  • a plurality of chiller units may be provided according to the cooling capacity of the chiller.
  • the water temperature introduced to the pattern forming body mounting table is preferably 30 ° C. or less as long as the organic EL element and the mask are not condensed. A range of 10 to 20 ° C. is more preferable.
  • the cooling water flowing through the water channel 44b is made one-way, the cooling water that has absorbed heat and has risen in temperature can be discharged to the outside of the pattern forming body mounting table at the shortest distance. This is preferable because the cooling effect is higher than when reciprocating in the mounting table.
  • the light irradiation device used in the present invention preferably includes a gas flow generation unit that blows gas onto the mask.
  • the gas flow generation unit 10 is arranged at a position facing the upper surface of the mask 14 so that a gas such as air is blown in parallel to the mask 14 and toward the center of the mask 14 through the gap WD between the mask 14 and the cover 9. ing.
  • the gas blown by the gas flow generator is not particularly limited as long as it can cool the mask and does not impair the effects of the present invention.
  • air, nitrogen gas, etc. Can be suitably used.
  • the gas flow generation unit 10 is arranged at a position opposite to the upper surface of the mask 14 so that the gas can be blown in parallel with the mask 14, and as a result, the blown gas flow 11 travels on the mask 14 without unevenness and the center of the mask. It is possible to join at the part.
  • spraying in parallel means spraying at an angle within ⁇ 2 ° with respect to the plane of the mask 14.
  • the air blown to the mask merges at the center of the mask 14.
  • the gas flow generation part 10 is arrange
  • the gap 12 between the cover 9 and the gas flow generating unit 10 is not particularly limited as long as air is efficiently blown onto the mask, but is preferably within a range of 10 to 200 mm. More preferably, it is in the range of 50 to 100 mm.
  • the length of the gas flow generating part is preferably the same as or larger than the width of the cover on the side to be sprayed.
  • the pair of gas flow generation units 10 is preferably disposed at a symmetrical position with respect to the central portion of the mask 14.
  • the gas flow generation unit 10 includes a slit-shaped or nozzle-shaped sprayed portion. It is more preferable to have a slit-shaped spraying part. Furthermore, it is more preferable that the slit-like spraying part is one that blows gas in a line shape and cools the mask surface. This is because the mask can be cooled uniformly when the gas blown out is in a line shape.
  • a nozzle provided with a nozzle-like spraying part can be used instead of the slit-like spraying part.
  • the number of nozzles should be large, and the number of nozzles may be one at intervals of 5 to 20 mm. preferable.
  • the size of the nozzle diameter can be adjusted as appropriate.
  • a commercially available product can be used as the slit-shaped spraying part used for the spraying part.
  • a layered airflow generator 750 manufactured by Sanwa Enterprise Co., Ltd. or a blower knife air nozzle manufactured by Spraying Systems Japan, Inc. can be used.
  • the amount of air blown from the pair of blowing parts is preferably the same.
  • the air volume can be 1000 to 4000 L / min.
  • the gas flow generator is preferably connected to an air compressor. According to the irradiation light quantity of an ultraviolet-ray, it can adjust to a desired air volume and a wind speed suitably.
  • a known air compressor can be used.
  • the air to be blown is temperature-adjusted. If necessary, the cooling efficiency can be increased by using air whose temperature is adjusted to about 5 to 15 ° C., for example.
  • having such a gas flow generation unit can efficiently cool the organic EL sheet and the mask by blowing gas on the mask, and has high irradiance. Since the influence of the heat accompanying a case can be reduced suitably, it is preferable.
  • the cover has a function of preventing a reduction in the amount of ultraviolet light emitted from the light source unit and irradiating the mask with a uniform amount of light. Therefore, it is preferable that the inner surface is covered with a reflective material. Since the reflective material is resistant to heat and durable, a metal material can be used. For example, aluminum is preferably used because it is lightweight. If the light source part is attached to the upper part of the cover and has a gap with the mask at the lower end, the height and the bottom area are not particularly limited, and the size of the organic EL sheet that irradiates ultraviolet rays is not limited. It can be set accordingly. The bottom surface is preferably larger than the pattern formation area to be fabricated. The height of the cover can be adjusted as appropriate based on the amount of ultraviolet light, unevenness in the amount of irradiation light, and the like. For example, it can be about 0.5 to 5 m.
  • the organic EL device includes one or a plurality of organic functional layers between at least a pair of electrodes.
  • the organic functional layer in the present invention refers to a layer containing an organic compound. Examples thereof include a hole injection layer, a hole transport layer, a light emitting layer (including a blue light emitting layer, a green light emitting layer, and a red light emitting layer), an electron transport layer, and an electron injection layer.
  • the organic EL element according to the present invention can take various configurations, and an example is shown in FIG. Note that the aspect ratio is not accurate for the sake of illustration in FIG.
  • the organic EL element 100 includes an organic functional layer unit 117 (a hole injection layer 117a, a hole transport layer 117b, a light emitting layer) having a light emitting layer on the first electrode 116 serving as an anode.
  • 117c, an electron transport layer 117d, an electron injection layer 117e), and a second electrode 118 serving as a cathode are laminated, and further, a base material 102, a hard coat layer 103, a first gas barrier layer 104, and a second gas barrier layer 105 are formed.
  • the gas barrier film 101 including the sealing resin layer 119 and the sealing member 120 are solid-sealed.
  • the 1st electrode 116 used as an anode is comprised as a translucent electrode.
  • the organic functional layer unit 117 is sandwiched between the first electrode 116 and the second electrode 118 becomes a light emitting region in the organic EL element 100.
  • the organic EL element 100 is configured as a bottom emission type in which generated light (hereinafter also referred to as “light emission light h”) is extracted from at least the gas barrier film 101 side.
  • a sealing member 120 is bonded on one surface of the gas barrier film 101 via a sealing resin layer 119 that covers the first electrode 116, the organic functional layer unit 117, and the second electrode 118. By doing so, it is solid-sealed.
  • an uncured resin material is applied to the bonding surface of the sealing member 120 or a plurality of locations of the second gas barrier layer 105 and the second electrode 118 of the gas barrier film 101.
  • the gas barrier film 101 and the sealing member 120 are integrated by thermocompression bonding with the resin material interposed therebetween.
  • the organic EL element 100 according to the present invention is not limited to the bottom emission type, and may be a top emission type configuration in which light is extracted from the second electrode 118 side or a dual emission type configuration in which light is extracted from both sides. . If the organic EL element 100 is a top emission type, a transparent material is used for the second electrode 118 and the emitted light h is extracted from the second electrode 118 side. Further, when the organic EL element 100 is a double-sided light emitting type, a transparent material is used for the second electrode 118 and the emitted light h is extracted from both sides. In addition, a well-known thing can be used for the material used for each layer which comprises an organic EL element.
  • the method for producing an organic electroluminescence element of the present invention is a method for producing an organic electroluminescence element for producing a pattern-formed organic electroluminescence element, wherein an edge (edge part) of the pattern is in the range of 10 to 300 ⁇ m. It can employ
  • the brightness of the pattern edge portion moves from the center side of the light emitting portion toward the non-light emitting portion within a range of 10 to 300 ⁇ m. It is possible to manufacture an organic EL element having a luminance distribution in which the brightness decreases.
  • the edge part of the light emission pattern refers to the side of the light emission pattern formed by the light shielding part in the mask.
  • anode is formed on a substrate using a mask.
  • each of the evaporation crucibles is filled with a hole injection material, a hole transport material, a host compound and a dopant for the light emitting layer, an electron transport material, and an electron injection material in an optimum amount for device fabrication.
  • the evaporation crucible containing the hole injecting material is energized and heated to deposit the hole injecting material on the substrate to provide a hole injecting layer.
  • the deposition crucible containing the hole transport material is energized and heated to deposit the hole transport material on the hole injection layer, thereby providing a hole transport layer.
  • the deposition crucible containing the host compound and dopant of the light emitting layer is energized and heated, and the host compound and dopant of the light emitting layer are co-deposited on the hole transport layer to provide a light emitting layer.
  • the deposition crucible containing the hole blocking material is energized and heated to deposit the hole blocking material on the light emitting layer, thereby providing a hole blocking layer.
  • the evaporation crucible containing the electron transport material is energized and heated to deposit the electron transport material on the hole blocking layer, thereby providing an electron transport layer.
  • the deposition crucible containing the electron injection material is energized and heated to deposit the electron injection material on the electron transport layer, thereby providing an electron injection layer.
  • an organic functional layer can be formed.
  • aluminum or the like is deposited on the electron injection layer to provide a cathode.
  • the deposition surface side is covered with a sealing material such as an epoxy resin, and further covered with an aluminum foil to form a protective film, followed by curing. Note that all the operations up to here are preferably performed in a glove box (in an atmosphere of high-purity nitrogen gas having a purity of 99.999% or more) in a nitrogen atmosphere without bringing the element into contact with the air.
  • an organic EL element can be produced. Such an organic EL element is cut into a predetermined size during patterning. The patterning of the organic EL element can be performed as described above. Moreover, the manufacturing method of an organic EL element is not limited to the said method, A well-known method can be used. The embodiments to which the present invention can be applied are not limited to the above-described embodiments, and can be appropriately changed without departing from the spirit of the present invention.
  • the present invention is not limited to this, and continuous light may be irradiated.
  • the said light irradiation apparatus was demonstrated as what has a cover, the light irradiation apparatus which does not have a cover may be sufficient.
  • the method for producing a pattern-formed body of the present invention can suppress deformation of a mask used for patterning, and can be suitably used for patterning a light-emitting body such as an organic EL element.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

La présente invention traite le problème de fourniture d'un masque de formation de motif d'émission de lumière ayant une précision dimensionnelle élevée, et un procédé pour fabriquer un élément électroluminescent organique ayant un motif d'émission de lumière. Le masque de formation de motif d'émission de lumière de la présente invention est destiné à former un motif d'émission de lumière d'une partie d'émission de lumière par irradiation d'une couche fonctionnelle organique d'un élément électroluminescent organique avec une lumière à travers le masque. Le masque de formation de motif d'émission de lumière est caractérisé en ce que, lorsque le demi-angle de collimation d'un dispositif d'irradiation avec une lumière utilisé pour l'irradiation avec une lumière est pris comme θ, la position de l'extrémité d'une partie de blocage de lumière du masque dans la direction dans le plan du masque est uniformément élargie à partir de la taille du motif qui est formé à une position à une distance ε satisfaisant la formule (I) : 0 < ε ≤ 3 x t x tanθ (dans la formule, t représente la longueur convertie en air allant du masque à la couche fonctionnelle organique).
PCT/JP2016/084891 2016-03-18 2016-11-25 Masque de formation de motif d'émission de lumière, et procédé de fabrication d'un élément électroluminescent organique WO2017158934A1 (fr)

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JP2016-054632 2016-03-18
JP2016054632A JP2019079596A (ja) 2016-03-18 2016-03-18 発光パターン形成用マスク及び有機エレクトロルミネッセンス素子の製造方法

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136853A (ja) * 1990-09-28 1992-05-11 Hitachi Ltd プロキシミティ露光用マスク及びその製造方法
JP2008135306A (ja) * 2006-11-29 2008-06-12 Yamagata Promotional Organization For Industrial Technology 有機エレクトロルミネッセンス素子のパターン化方法
WO2014185219A1 (fr) * 2013-05-15 2014-11-20 コニカミノルタ株式会社 Procédé pour fabriquer un élément électroluminescent organique et élément électroluminescent organique

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136853A (ja) * 1990-09-28 1992-05-11 Hitachi Ltd プロキシミティ露光用マスク及びその製造方法
JP2008135306A (ja) * 2006-11-29 2008-06-12 Yamagata Promotional Organization For Industrial Technology 有機エレクトロルミネッセンス素子のパターン化方法
WO2014185219A1 (fr) * 2013-05-15 2014-11-20 コニカミノルタ株式会社 Procédé pour fabriquer un élément électroluminescent organique et élément électroluminescent organique

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