WO2013179977A1 - Dispositif d'éclairage, dispositif de traitement et procédé de fabrication de tels dispositifs - Google Patents

Dispositif d'éclairage, dispositif de traitement et procédé de fabrication de tels dispositifs Download PDF

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Publication number
WO2013179977A1
WO2013179977A1 PCT/JP2013/064228 JP2013064228W WO2013179977A1 WO 2013179977 A1 WO2013179977 A1 WO 2013179977A1 JP 2013064228 W JP2013064228 W JP 2013064228W WO 2013179977 A1 WO2013179977 A1 WO 2013179977A1
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WIPO (PCT)
Prior art keywords
light source
light
illumination
source unit
unit
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PCT/JP2013/064228
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English (en)
Japanese (ja)
Inventor
武利 根岸
福井　達雄
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株式会社ニコン
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Application filed by 株式会社ニコン filed Critical 株式会社ニコン
Priority to JP2014518406A priority Critical patent/JPWO2013179977A1/ja
Priority to KR20147033207A priority patent/KR20150027741A/ko
Priority to CN201380037678.0A priority patent/CN104471486B/zh
Publication of WO2013179977A1 publication Critical patent/WO2013179977A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Definitions

  • the present invention relates to an illumination apparatus, a processing apparatus, and a device manufacturing method.
  • a processing apparatus such as an exposure apparatus is used.
  • a liquid crystal display panel is manufactured by forming various film patterns such as a transparent thin film electrode on a glass plate using a lithography technique using an exposure apparatus, an etching technique, and the like.
  • a lithography technique a technique has been proposed in which an image of a mask pattern is projected and exposed onto a sheet-like substrate wound in a roll shape instead of a glass plate (see, for example, Patent Document 1 below).
  • a processing apparatus such as an exposure apparatus is expected to widen the processing range from the viewpoint of making it possible to manufacture a device efficiently.
  • the illumination apparatus used in such a processing apparatus has a moving direction of an object to be processed. It is expected to expand the irradiation range of light in the direction perpendicular to.
  • An aspect of the present invention aims to provide an illumination device, a processing device, and a device manufacturing method that can expand a processing range.
  • the first light source unit, the second light source unit having a light emission direction different from that of the first light source unit, the light from the first light source unit and the first light source unit.
  • a deflecting unit that deflects at least a part of the light so as to align the traveling direction of the light from the two light source units, and each of the first light source unit and the second light source unit includes each light source.
  • an illuminating device that is arranged at a different position in the predetermined direction so that the illumination areas that are emitted from the unit and incident through the deflecting unit are continuously arranged in the predetermined direction.
  • a processing apparatus for transferring a pattern formed on a mask pattern onto a substrate having a sensitive layer, the illumination apparatus according to the first aspect for illuminating the mask pattern,
  • a processing apparatus comprising: a moving device that relatively moves a mask pattern and the substrate in a direction perpendicular to the predetermined direction.
  • the processing apparatus continuously transfers the pattern to the substrate while relatively moving the mask pattern and the substrate, and the pattern is transferred. Performing a subsequent process using a change in the sensitive layer of the substrate, and a device manufacturing method.
  • FIG. 1 is a diagram illustrating a configuration example of a device manufacturing system SYS (flexible display manufacturing line).
  • the flexible substrate P sheet, film, etc. drawn out from the supply roll FR1 is sequentially passed through n processing devices U1, U2, U3, U4, U5,. The example until it winds up to FR2 is shown.
  • the XYZ orthogonal coordinate system is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the direction (width direction) orthogonal to the transport direction (long direction) of the substrate P is Y. It shall be set in the axial direction.
  • the Z-axis direction is set to the vertical direction
  • the X-axis direction and the Y-axis direction are set to the horizontal direction.
  • a diagram viewed from the X-axis direction is a front view
  • a diagram viewed from the Y-axis direction is a side view
  • a Z-axis direction is a side view
  • the view seen from above is sometimes referred to as a top view.
  • the substrate P wound around the supply roll FR1 is pulled out by the nipped drive roller DR1, and sent to the processing device U1 while being positioned in the Y direction by the edge position controller EPC1.
  • the processing device U1 continuously or selects a photosensitive functional liquid (photoresist, photosensitive coupling material, UV curable resin liquid, etc.) on the surface of the substrate P by a printing method with respect to the transport direction (long direction) of the substrate P. It is the coating device which coats automatically.
  • a coating mechanism Gp1 including a letterpress or intaglio plate cylinder roller for selectively applying the liquid, a drying mechanism Gp2 for rapidly removing the solvent or moisture contained in the photosensitive functional liquid applied to the substrate P, and the like are provided. It has been.
  • the processing device U2 heats the substrate P conveyed from the processing device U1 to a predetermined temperature (for example, about several tens to 120 ° C.) to stably fix the photosensitive functional layer applied on the surface.
  • a predetermined temperature for example, about several tens to 120 ° C.
  • the processing device U3 as an exposure device includes an exposure device that irradiates the photosensitive functional layer of the substrate P conveyed from the processing device U2 with ultraviolet patterning light corresponding to a circuit pattern or a wiring pattern for display. .
  • an edge position controller EPC2 that controls the center of the substrate P in the Y direction (width direction) to a fixed position, a nipped drive roller DR4, and the back surface of the substrate P that is conveyed in the X direction with a predetermined tension
  • a substrate stage ST substrate support member that supports the substrate P with a plane or cylindrical curved surface with an air bearing layer, and two sets of driving rollers DR6 and DR7 for giving a predetermined slack (play) DL to the substrate P, etc. Is provided.
  • a sheet-like mask substrate (hereinafter referred to as a mask pattern M) is wound around the outer peripheral surface, and the rotating drum 14 rotates around a center line parallel to the Y direction.
  • An illumination device IU that irradiates the wound mask pattern M with slit-shaped exposure illumination light extending in the Y direction to transfer the pattern of the mask pattern M to a portion of the substrate P supported in a planar shape by the substrate stage ST.
  • an alignment microscope AM for detecting an alignment mark or the like formed in advance on the substrate P is provided.
  • the processing apparatus U3 in FIG. 1 includes a so-called proximity-type exposure apparatus, and uses a rotating drum 14 around which a mask pattern M is wound as a mask body, and a predetermined gap (within several tens of ⁇ m) between the mask body and the substrate P. Then, the pattern on the mask body is transferred to the substrate P.
  • the pattern transfer method by the processing apparatus U3 is not limited, and may be a method in which an image of a mask pattern is projected by a projection optical system, or a contact method in which the substrate P is wound around the outer periphery of a cylindrical mask body.
  • the rotary drum 14 and the mask pattern M may be releasable or may not be releasable.
  • the mask body may have a mask pattern M formed on the surface of the rotary drum 14.
  • the processing apparatus U4 is a wet processing apparatus that performs at least one of various wet processes such as a wet development process and an electroless plating process on the photosensitive functional layer of the substrate P conveyed from the process apparatus U3. It is.
  • the processing apparatus U5 is a heating and drying apparatus that warms the substrate P transported from the processing apparatus U4 and adjusts the moisture content of the substrate P wetted by the wet process to a predetermined value, but the details are omitted. Thereafter, the substrate P that has passed through several processing devices and passed through the last processing device Un of the series of processes is wound up on the collection roll FR2 via the nipped drive roller DR9 and the edge position controller EPC3. *
  • the host control device CONT controls the operation of each processing device U1 to Un constituting the production line, and monitors the processing status and processing status in each processing device U1 to Un, and the substrate P between the processing devices. It also monitors the conveyance status, and performs feedback correction and feedforward correction based on the results of prior and subsequent inspections and measurements.
  • the substrate P used in the present embodiment is, for example, a foil (foil) made of a metal or an alloy such as a resin film or stainless steel.
  • the material of the resin film is, for example, one of polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, and vinyl acetate resin. Or two or more.
  • the thermal expansion coefficient may be set smaller than a threshold corresponding to the process temperature or the like, for example, by mixing an inorganic filler with a resin film.
  • the inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide or the like.
  • the substrate P may be a single layer of ultrathin glass having a thickness of about 100 ⁇ m manufactured by a float process or the like, or a laminate in which the above resin film, foil, etc. are bonded to the ultrathin glass. It may be.
  • the substrate P may be a substrate whose surface is modified and activated in advance by a predetermined pretreatment, or a substrate having a fine partition structure (uneven structure) for precise patterning.
  • the device manufacturing system SYS in FIG. 1 repeatedly or continuously executes various processes for manufacturing a device (display panel or the like) on the substrate P.
  • the substrate P that has been subjected to various types of processing is divided (diced) for each device to form a plurality of devices.
  • the dimension of the substrate P for example, the dimension in the width direction (short Y-axis direction) is about 10 cm to 2 m, and the dimension in the length direction (long X-axis direction) is 10 m or more.
  • FIG. 2 is a side view of an exposure apparatus EX as the processing apparatus U3
  • FIG. 3 is a front view of the exposure apparatus EX.
  • the exposure apparatus EX shown in FIG. 2 is a so-called scanning exposure apparatus, which moves the substrate P (photosensitive sheet) and the mask pattern M relative to each other, and scans the substrate P with the exposure light from the mask pattern M.
  • the exposure pattern formed on M is transferred to the substrate P.
  • the transport direction of the substrate P on the substrate stage ST is substantially the same as the direction in which the exposure light emitted from the mask pattern M scans on the substrate P (scanning direction).
  • the exposure apparatus EX is a proximity type exposure apparatus, and the mask pattern M is illuminated by the illumination light L from the illumination apparatus IU while the substrate P and the mask pattern M are brought close to each other. By irradiating the substrate P with exposure light emitted from the mask pattern M, the exposure pattern is transferred to the substrate P without passing through the projection optical system.
  • the exposure apparatus EX relatively moves the substrate P and the mask pattern M, the illumination apparatus IU that illuminates the mask pattern M, and the relative alignment of the transferred exposure pattern and the substrate P.
  • An alignment microscope AM alignment optical system
  • an illuminance monitor device 11 measuring device that detects the illuminance (light intensity) of the illumination light L applied to the substrate P from the illumination device IU, and each part of the exposure apparatus EX are controlled.
  • a control device 12 a control device 12.
  • the moving device 10 includes a transport unit 13 that transports the substrate P, a rotary drum 14 that can rotate while holding the mask pattern M, and a drive unit 15 that rotationally drives the rotary drum 14.
  • the transport unit 13 includes the driving roller DR4 and the driving roller DR6 shown in FIG. 1, and moves the substrate P linearly on the substrate stage ST.
  • the position of the substrate P being transported is detected by the position detection sensor 16.
  • the control device 12 controls the position of the substrate P being transported by the transport unit 13 by controlling the transport unit 13 based on the detection result of the position detection sensor 16.
  • the rotary drum 14 has a cylindrical outer peripheral surface (hereinafter also referred to as a cylindrical surface 14a), and holds the transmissive mask pattern M curved in a cylindrical surface along the cylindrical surface 14a.
  • the cylindrical surface is a surface curved with a predetermined radius around a predetermined center line, and is, for example, at least a part of an outer peripheral surface of a column or a cylinder.
  • the rotating drum 14 is arranged so that the tangent plane of the cylindrical surface 14a is substantially parallel to the substrate P on the substrate stage ST.
  • the rotary drum 14 is provided so as to be rotatable around a predetermined rotation center axis AX1.
  • the rotation center axis AX1 of the rotary drum 14 is set, for example, so as to be substantially orthogonal to the movement direction of the substrate P when being transported on the substrate stage ST (so as to be substantially parallel to the width direction of the substrate P). .
  • the driving unit 15 rotates the rotating drum 14 around the rotation center axis AX1.
  • the rotation position of the rotary drum 14 is detected by a rotation detection sensor 17.
  • the control device 12 controls the rotational position of the rotary drum 14 rotated by the drive unit 15 by controlling the drive unit 15 based on the detection result of the rotation detection sensor 17.
  • the moving device 10 is controlled by the control device 12 to drive the substrate P and the mask pattern M synchronously.
  • the control device 12 controls the transport unit 13 and the drive unit 15 so that the moving speed (transport speed) of the substrate P and the moving speed (circumferential speed) of the mask pattern M held on the rotary drum 14 are substantially the same. Control.
  • the moving device 10 can also adjust the relative position between the substrate P on the substrate stage ST and the rotating drum 14 in one or both of the Y-axis direction and the Z-axis direction.
  • the illumination device IU is disposed inside the rotating drum 14 and illuminates a part of the mask pattern M (illumination region IR) with the illumination light L from the inside of the rotating drum 14.
  • the illumination area IR is, for example, a band-shaped area whose longitudinal direction is a direction orthogonal to the transport direction of the substrate P on the substrate stage ST. That is, the illumination device IU irradiates the mask pattern M with slit-shaped illumination light L (line light) whose longitudinal direction is substantially parallel to the rotation center axis AX1 of the rotary drum 14.
  • the emission direction of the illumination light L from the illumination device IU is set, for example, in the radial direction of the rotary drum 14.
  • the illumination device IU irradiates the rotary drum 14 with the illumination light L from the substantially normal direction of the mask pattern M to the mask pattern M along the outer peripheral surface.
  • the illumination device IU irradiates the mask pattern M with illumination light L that can be regarded as substantially parallel light, for example.
  • an aperture member 18 is provided in the optical path between the rotary drum 14 (mask pattern M) and the substrate stage ST (substrate P).
  • the diaphragm member 18 is a so-called field diaphragm, and defines an incident range of light on the substrate P by defining a passing range of light emitted from the illumination device IU and passing through the mask pattern M.
  • the alignment microscope AM is provided on one side (+ Y side) and the other side ( ⁇ Y side) of the rotation center axis AX1, for example, below the substrate stage ST.
  • alignment marks are provided on the rotary drum 14 (mask pattern M) and the substrate stage ST (substrate P) on the + Y side and the ⁇ Y side.
  • the alignment microscope AM detects at least one of a position in the X-axis direction, a position in the Y-axis direction, and a rotational position around the Z-axis by detecting these alignment marks.
  • the illuminance monitor device 11 is arranged, for example, below the substrate stage ST so that the illumination light L emitted from the illumination device IU enters.
  • the illuminance monitor device 11 can measure the illuminance distribution in the illumination area IR.
  • the illuminance monitor device 11 measures the illuminance distribution in the direction parallel to the rotation center axis AX1 by measuring the illuminance in a part of the illumination area IR while moving in a direction parallel to the rotation center axis AX1. To do.
  • the illuminating device IU includes a plurality of illumination modules 20, and illuminates each illumination module 20 with an illumination area having a predetermined direction as a longitudinal direction by joining the illumination areas in a predetermined direction (Y-axis direction) orthogonal to the transport direction of the substrate P. Illuminate the IR.
  • the illumination area for each illumination module 20 is appropriately referred to as a partial illumination area IRa.
  • the plurality of illumination modules 20 are arranged so as to be aligned in a predetermined direction (Y-axis direction) when viewed from the transport direction (X-axis direction) of the substrate P.
  • the illumination modules 20 are arranged close to each other in a predetermined direction so that the end portions of the partial illumination regions IRa overlap the end portions of the partial illumination regions IRa of the other illumination modules 20.
  • the illumination module 20 includes a light source unit 21 that emits the illumination light L and a deflection unit 22 that deflects the illumination light L emitted from the light source unit 21.
  • the plurality of light source units 21 are arranged so that spots (partial illumination regions IRa) of the illumination light L emitted from the deflection unit 22 are continuous in a predetermined direction.
  • the plurality of light source units 21 are close to each other in a predetermined direction (Y-axis direction) so that a part of the partial illumination region IRa overlaps. Therefore, as shown in FIG. 2, the plurality of light source units 21 are transported in the substrate P (Y-axis direction) so that at least a part of the light source unit 21 does not interfere (physical collision) with other light source units 21. ) Are shifted in position.
  • the first light source unit 21a included in the first illumination module 20a is a second light source included in the second illumination module 20b disposed next to the first illumination module 20a when viewed from the transport direction of the substrate P. The position of the substrate P in the transport direction is shifted from the portion 21b.
  • the emission direction of the light L is set in a plurality of directions intersecting each other when viewed from a predetermined direction.
  • the emission directions of the illumination light L from the plurality of light source units 21 are two directions, and the light source unit 21 from which the illumination light L is emitted in the first direction of the two directions is the first light source unit 21.
  • the light source unit 21a and the light source unit 21 from which the illumination light L is emitted in the second direction out of the two directions are referred to as a second light source unit 21b.
  • the first light source unit 21a and the second light source unit 21b are arranged symmetrically with respect to the YZ plane.
  • the light source unit 21 of the illumination module 20 in which the arrangement order from one end to the other end is an odd number is viewed from a predetermined direction.
  • the light source unit 21 of the illumination module 20 in which the arrangement order is an even number is arranged, for example, at the position of the second light source unit 21b illustrated in FIG. 2 when viewed from a predetermined direction.
  • the even-numbered illumination modules 20 in this arrangement order are arranged so that, for example, the principal ray of the illumination light L (beam) from the light source unit 21 has an angle of + ⁇ with respect to the normal direction of the substrate P.
  • the odd numbered illumination modules 20 are arranged such that, for example, the principal ray of the illumination light L from the light source unit 21 has an angle of ⁇ with respect to the normal direction of the substrate P.
  • the first light source unit 21a and the second light source unit 21b are configured such that the emission directions of the illumination light L intersect each other so that the illumination light L is incident on substantially the same region when viewed from a predetermined direction. Is set.
  • the first light source unit 21a is provided to emit the illumination light L from the ⁇ X side to the + X side with respect to the YZ plane
  • the second light source unit 21b is from the + X side to the ⁇ X side with respect to the YZ plane. It is provided so that the illumination light L is emitted toward.
  • the deflecting unit 22 deflects the illumination light L so that the traveling direction of the illumination light L emitted from the first light source unit 21a is aligned with the traveling direction of the illumination light L emitted from the second light source unit 21b.
  • the deflecting unit 22 is an intersection of the traveling direction of the illumination light L from the first light source unit 21a and the traveling direction of the illumination light L of the second light source unit 21b. Located in the vicinity.
  • the lighting device IU (lighting module 20) will be described in more detail.
  • the first lighting module 20a and the second lighting module 20b shown in FIG. 2 have the same configuration and are arranged symmetrically with respect to the YZ plane. Therefore, here, the first illumination module 20a will be described as a representative of the plurality of illumination modules 20.
  • FIG. 4A is a side view of the first illumination module 20a as viewed from the direction of the rotation center axis AX1 (Y-axis direction), and FIG. 4B is a view of the first illumination module 20a from the transport direction (X-axis direction) of the substrate P.
  • FIG. 4A is a side view of the first illumination module 20a as viewed from the direction of the rotation center axis AX1 (Y-axis direction)
  • FIG. 4B is a view of the first illumination module 20a from the transport direction (X-axis direction) of the substrate P.
  • Each of the plurality of illumination modules 20 includes a light source unit 21 that emits the illumination light L, and a deflection member 22a that deflects the illumination light L emitted from the light source unit 21.
  • a plurality of deflection members 22a are arranged in a predetermined direction (Y-axis direction), and the deflection unit 22 is constituted by a plurality of deflection members 22a.
  • the deflecting member 22a is made of quartz or the like having a high transmittance for light in the ultraviolet region.
  • the light source unit 21 includes a light source 23 that emits illumination light L, a line generator 24 (optical member) that spreads the illumination light L (beam) emitted from the light source 23 in a predetermined direction (Y-axis direction), and a line generator 24.
  • a collimator 25 (a collimating member) that collimates the spread illumination light L.
  • the light source 23 includes, for example, a solid light source such as a laser diode and a light emitting diode (LED), an excimer laser light source, and a lamp light source.
  • Illumination light L emitted from the light source 23 is, for example, far ultraviolet light (DUV light) such as KrF excimer laser light (wavelength 248 nm), ArF excimer laser light (wavelength 193 nm), or an emission region in the ultraviolet region (g Line, h line, i line).
  • DUV light far ultraviolet light
  • the light source unit 21 may be configured to guide the light from the light source 23 to the line generator 24 via a light guide member such as an optical fiber.
  • the light source 23 may be disposed on the outer side of the rotating drum 14 or may be disposed on the inner side.
  • the light source unit 21 may be configured to guide light to the line generator 24 after collimating light from the emission end face of the optical fiber with a collimator or the like.
  • the line generator 24 extends the beam from the light source 23 in one direction (predetermined direction).
  • the illumination light L that has passed through the line generator 24 has a larger spread angle (radiation angle) in a predetermined direction (Y-axis direction) as shown in FIG. 4B and spreads in a direction orthogonal to the predetermined direction as shown in FIG. 4A.
  • the corner hardly changes.
  • the line generator 24 includes, for example, a Powell lens as described in US Pat. No. 4,826,299, US Pat. No. 5,283,694, and the like.
  • the Powell lens for example, spatially divides a light beam from the light source 23 in a predetermined direction, and spreads each of the divided light beams in a predetermined direction.
  • the Powell lens deflects each of the divided light beams so that portions with relatively low illuminance among the divided light beams are superimposed on each other.
  • the Powell lens divides the light beam with the vicinity of the peak of the illuminance distribution as a boundary, and splits the light beam corresponding to the bottom of the Gaussian distribution. Deflects the emitted light beam. Therefore, the illumination light L formed by the Powell lens has a so-called top hat type illuminance distribution, and the illuminance distribution in a predetermined direction is made uniform.
  • the line generator 24 may be configured to widen the beam by a cylindrical lens, for example.
  • the light source unit 21 may include an optical member for making the illuminance distribution of the illumination light L emitted from the line generator 24 uniform.
  • the line generator 24 may include a diffractive optical element, and may be configured to expand the beam by diffraction.
  • the line generator 24 may include a reflecting member such as a convex mirror, and may be configured to expand the beam by reflection.
  • the collimator 25 collimates the light beam spreading in a predetermined direction (Y-axis direction).
  • the light beam emitted from the line generator 24 spreads in the Y-axis direction as shown in FIG. 4B, and hardly spreads in the plane orthogonal to the Y-axis direction as shown in FIG. 4A.
  • the collimator 25 is configured by an optical member that has power in a plane including a predetermined direction (Y-axis direction), for example, and has no power in a plane orthogonal to the plane, such as a cylindrical lens.
  • the collimator 25 shown in FIG. 4B has a symmetric shape with respect to a symmetry plane substantially parallel to the XZ plane.
  • the principal ray of the beam (illumination light L) emitted from the light source unit 21 propagates substantially parallel to the symmetry plane.
  • the illumination light L emitted from the light source 23 is spread in a predetermined direction by the line generator 24 and then collimated by the collimator 25, so that the spot when entering the deflecting member 22a has a predetermined direction. It becomes a strip with a long length.
  • the deflection member 22a shown in FIGS.
  • the deflecting member 22a deflects the illumination light L from the light source unit 21 by refraction at the interface 26a.
  • the illumination light L incident on the interface 26a passes (transmits) through the deflection member 22a, exits from the deflection member 22a, and enters the illumination region IR (mask pattern M).
  • the deflecting member 22a deflects the illumination light L so that the illumination light L is incident on the illumination region IR on the mask pattern M from a substantially normal direction.
  • the traveling direction see FIGS.
  • the light source unit 21 is inclined to the ⁇ X side from the Z-axis direction (normal direction of the substrate P), and the illumination light L from the light source unit 21 is changed to the Z-axis direction.
  • the interface 26a of the deflecting member 22a is set so that the normal direction thereof is inclined to the + X side from the Z-axis direction.
  • the deflection member 22a bends the traveling direction of the illumination light L emitted from the light source unit 21 in the XZ plane orthogonal to the predetermined direction (Y-axis direction), and as shown in FIG. It is provided so that the traveling direction of the illumination light L is not substantially changed in the direction (Y-axis direction).
  • FIG. 5 is a perspective view showing the deflecting unit 22.
  • the deflection section 22 shown in FIG. 5 has a structure in which deflection members 22a are arranged in a predetermined direction (Y-axis direction).
  • the plurality of deflection members 22a are integrated by, for example, being bonded to each other.
  • the interfaces (interface 26a and interface 26b, first surface and second surface) where the illumination light L is incident on the deflection unit 22 are such that the emission direction of the illumination light L is the first light source unit 21a and the second light source unit 21b. Since they are different, they are inclined in different directions depending on the posture of the light source unit 21 from which the light incident on the interfaces 26a and 26b is emitted.
  • the deflecting unit 22 includes an interface 26a on which the illumination light L is incident from the first light source unit 21a and an interface 26b on which the illumination light L is incident from the second light source unit 21b.
  • the deflection member 22a is provided in a one-to-one correspondence with the light source unit 21, and the interface 26a is a deflection member corresponding to the first light source unit 21a.
  • the interface 26b is an interface of the deflection member 22a corresponding to the second light source unit 21b.
  • the normal direction of the interface 26a is a direction inclined to the + X side from the Z-axis direction (normal direction of the substrate P), and the normal direction of the interface 26b is ⁇ from the Z-axis direction (normal direction of the substrate P) ⁇
  • the direction is inclined to the X side.
  • the interface 26c is, for example, disposed in substantially the same plane (substantially flush) with the plurality of deflection members 22a, and is disposed substantially perpendicular to the normal direction of the substrate P.
  • deviation part 22 is comprised, for example so that the illumination light L may not be deflected by the interface 26c, you may deflect the illumination light L by the interface 26c.
  • FIG. 6 is a top view showing the deflecting unit 22.
  • each of the interface 26a and the interface 26b has a trapezoidal shape and is disposed adjacent to a predetermined direction (Y-axis direction).
  • the interface 26a and the interface 26b have substantially the same shape, but are arranged so as to be in an inverted relationship with respect to the YZ plane. That is, the long side of the interface 26a is arranged to be aligned with the short side of the interface 26b, and similarly, the long side of the interface 26b is arranged to be aligned with the short side of the interface 26a.
  • the boundary 27 (the trapezoid hypotenuse) between the interface 26a and the interface 26b is in a predetermined direction (Y-axis direction). And are configured to intersect non-vertically.
  • the portion 27a of the polarizing member 22a adjacent to the boundary 27 at the interface 26a overlaps the portion 27b of the polarizing member 22a adjacent to the boundary 27 at the interface 26b when viewed from the X-axis direction, and is in a predetermined direction (Y-axis direction).
  • the illumination light L incident on the portion 27a of the interface 26a from the first light source portion 21a is the Y-axis direction of the illumination light L incident on the portion 27b of the interface 26b from the second light source portion 21b and the illumination region IR.
  • this area is an area where the partial illumination area IRa (see FIG. 3) by the illumination light L passing through the interface 26a overlaps with the partial illumination area IRa by the illumination light L passing through the interface 26b (referred to as an overlap area).
  • This overlapping region is illuminated with light obtained by mixing a part of the illumination light L from the first light source unit 21a and a part of the illumination light L from the second light source unit 21b.
  • the mixing ratio continuously changes as the boundary 27 is inclined with respect to the predetermined direction. As a result, even if the brightness of the illumination light L is different between the first light source unit 21a and the second light source unit 21b, the illuminance distribution of the illumination region IR may change discontinuously in the predetermined direction. It is suppressed.
  • the illuminating device IU arranges a plurality of illumination modules 20 in a predetermined direction (Y-axis direction) substantially perpendicular to the scanning direction (X-axis direction) of the substrate P, thereby exposing a transfer pattern in a predetermined direction perpendicular to the scanning direction.
  • Y-axis direction substantially perpendicular to the scanning direction (X-axis direction) of the substrate P
  • X-axis direction scanning direction
  • the illumination device IU shown in FIG. 2 uses the filter 28 for adjusting the illuminance distribution by the illumination light L emitted from the deflecting unit 22 so as to ensure the uniformity of the illuminance distribution in a predetermined direction. It is configured.
  • FIG. 7 is a diagram illustrating an example of the illuminance distribution in the predetermined direction in the illumination region IR and an example of the filter 28, and FIG. 8 is a diagram illustrating another example of the illuminance distribution in the predetermined direction in the illumination region IR and the filter 28.
  • the illuminance distribution of the illumination light L is schematically shown by emphasizing the change in illuminance. It was shown to.
  • the horizontal axis indicates a position in a predetermined direction (Y-axis direction).
  • Reference numeral 30a represents the illuminance distribution in the illumination area IR of the illumination light L from the first light source section 21a
  • reference numeral 30b represents the illuminance distribution in the illumination area IR of the illumination light L from the second light source section 21b.
  • 30c is the illuminance distribution in the illumination region IR by the illumination light L from the first light source unit 21a and the illumination light L from the second light source unit 21b
  • 30d is the filter 28 in the direction corresponding to the predetermined direction.
  • the transmittance distribution is shown.
  • the illuminance distribution (illuminance distribution 30a and illuminance distribution 30b) by the illumination light L for each light source unit 21 is a so-called top-hat type distribution.
  • the plurality of light source units 21 are arranged so that the end of the partial illumination region IRa overlaps the end of the adjacent partial illumination region IRa, and the partial illumination regions IRa are arranged such that the ends of the adjacent partial illumination regions IRa are mutually connected. It has an overlapping region IRb that overlaps and a non-overlapping region IRc where adjacent partial illumination regions IRa do not overlap each other.
  • the illuminance distribution 30c is substantially the same as the illuminance distribution 30a or the illuminance distribution 30b by the illumination light L from the first light source unit 21a or the second light source unit 21b.
  • the illuminance is substantially uniform. is there.
  • the illuminance distribution 30c is a distribution obtained by adding the illuminance distribution 30a and the illuminance distribution 30b.
  • the illuminance of the illuminance distribution 30c in the overlapping area IRb decreases as the pitch Py (center distance) in the predetermined direction (Y-axis direction) of the partial illumination area IRa increases, and increases as the pitch Py decreases.
  • the pitch Py in the predetermined direction (Y-axis direction) of the partial illumination region IRa can be adjusted by, for example, the pitch of the light source unit 21 in the predetermined direction.
  • the pitch Py in the predetermined direction is also narrowed.
  • the illuminance of the illuminance distribution 30c in the overlapping region IRb can be adjusted to the same level as the illuminance of the illuminance distribution 30c in the non-overlapping region IRc by adjusting the pitch Py of the partial illumination region IRa. For example, a difference of about several percent may occur with respect to the illuminance in the overlapping region IRc.
  • the illuminance is smaller than the non-overlapping region IRc at the joint portion (overlapping region IRb) of the illumination module 20. In the example shown in FIG. It is higher than IRc.
  • Such non-uniformity (variation) in illuminance need not be corrected, for example, when it falls within an allowable range according to the use of the illumination device IU, but here is corrected from the viewpoint of increasing exposure accuracy. Shall.
  • the transmittance in the optical path of light incident on a relatively high illuminance area in the illumination area IR is set to be relatively low, and the illumination area IR Among them, the transmittance in the optical path of the light incident on the region where the illuminance is relatively low may be made relatively high.
  • the transmittance distribution 30d of the filter 28 passes light incident on the overlapping area IRb.
  • the transmittance in the optical path is set higher than the transmittance in the optical path through which the light incident on the non-overlapping region IRc passes.
  • the transmittance distribution 30d of the filter 28 passes light incident on the overlapping region IRb.
  • the transmittance in the optical path is set lower than the transmittance in the optical path through which the light incident on the non-overlapping region IRc passes.
  • the cause of the non-uniformity of the illuminance distribution is, for example, the variation in the amount of light for each illumination module 20 (light source unit 21) (first cause), and the amount of light at the junction of the illumination module 20 (deflection unit 22). Variations (second cause), variations in illuminance within each illumination module 20 (third cause), and the like can be mentioned. To alleviate or eliminate the non-uniformity of the illuminance distribution, it is possible to deal with each type of these causes. In addition to using the filter 28 as a method for making the illuminance distribution uniform, there is a method for adjusting the shape and arrangement of members. Hereinafter, a countermeasure against the non-uniformity of the illuminance distribution will be described for each cause of the non-uniformity of the illuminance distribution.
  • the first cause includes factors such that the illuminance of the illumination light L emitted from each light source unit 21 varies among the plurality of light source units 21 due to manufacturing tolerances of components of the illumination module 20 (for example, the light source 23).
  • the illumination device IU shown in FIGS. 2 and 3 includes a light amount correction filter 28a disposed between the light source 23 and the line generator 24 as a filter 28, and the light amount correction filter 28a causes variations in the illumination light L for each light source 23. Reduced.
  • the light amount correction filter 28 a has a relatively low transmittance at a portion where the illumination light L from the light source 23 having a relatively high output with respect to a predetermined power among the plurality of light sources 23 is incident.
  • the transmittance is relatively high in the portion where the illumination light L from the light source 23 having a relatively low output with respect to the predetermined power is incident.
  • the variation in the amount of illumination light L for each light source 23 can be reduced by the driving method of the light source 23.
  • the power supplied to the light source 23 having a relatively high output is relatively low and the power supplied to the light source 23 having a relatively low output is set so that the amount of the illumination light L is uniform. It may be relatively high.
  • Such a driving method may be realized by providing an electric filter in a driving circuit or the like, or may be realized by a program for driving the light source 23 or the like.
  • the non-uniformity of the illuminance distribution due to the second cause is that the illumination light spread by the line generator 24 is adjusted by adjusting the prism shape of the deflecting member 22a, adjusting the pitch Py of the partial illumination region IRa (the pitch of the illumination module 20). It can be alleviated or eliminated by increasing the width of L (the dimension of the spot in a predetermined direction). However, when the inclination of the end of the partial illumination region IRa is deviated from linear in the illuminance distribution 30b and the illuminance distribution 30c for each light source unit 21, unevenness in the illuminance distribution may remain.
  • 2 and 3 includes a joint correction filter 28b disposed between the light source unit 21 and the cylindrical surface 14a (mask pattern M) of the rotating drum 14, and the non-contact by the joint correction filter 28b. Correction is performed so as to reduce the difference in illuminance between the overlapping region IRc and the overlapping region IRb.
  • the third cause includes, for example, that the aberration in the illumination module 20 remains, and that the variation of the illuminance distribution is expanded in a predetermined direction by expanding the illumination light L by the line generator 24.
  • the latter is more likely to occur as the width of the illumination light L spread by the line generator 24 is increased, for example, when the number of illumination modules 20 is reduced while maintaining the dimension of the illumination area IR in a predetermined direction.
  • the non-uniformity of the illuminance distribution due to the third cause is that the illumination light L spread by the line generator 24 by increasing the number of the optical members, increasing the number of the illumination modules 20, etc. in the illumination module 20. It can be alleviated or eliminated by reducing the width.
  • the 2 and 3 includes an illuminance distribution correction filter 28c disposed between the light source unit 21 and the cylindrical surface 14a (mask pattern M) of the rotary drum 14, and the illuminance distribution correction filter 28c allows each of the illuminance distribution correction filters 28c.
  • the illuminance distribution in the illumination module 20 is made uniform.
  • the illuminance distribution correction filter 28c is provided for each illumination module 20, for example. By using such an illuminance distribution correction filter 28c, for example, the uniformity of the illuminance distribution can be improved while maintaining the number of illumination modules 20, and the uniformity of the illuminance distribution can be improved while reducing the number of illumination modules 20. It can also be maintained.
  • the transmittance of various filters as described above may be fixed or variable.
  • a filter with variable transmittance can be realized, for example, by providing a filter whose transmittance changes in the scanning direction (X-axis direction) so as to be movable in the scanning direction.
  • the illumination device IU can adjust the illuminance distribution of the illumination region IR by moving a filter having a variable transmittance.
  • the illumination device IU can finely adjust the illuminance distribution to be uniform based on the illuminance distribution measured by the illuminance monitor device 11 shown in FIGS. Further, such adjustment of the illuminance distribution may be performed, for example, when the characteristics of the illumination module 20 change over time, or when at least a part of the illumination module 20 (for example, the light source unit 21) is replaced.
  • the illumination device IU arranges a plurality of illumination modules 20 in a predetermined direction, and continuously arranges the partial illumination areas IRa of the illumination modules 20 in a predetermined direction, whereby the predetermined illumination area IR is determined.
  • the dimension in the direction can be expanded to a desired value. Therefore, the processing device U3 (exposure device EX) can widen the width of the transfer pattern in the direction perpendicular to the scanning direction, and can efficiently process a large substrate, for example.
  • the device manufacturing system can efficiently manufacture a device such as a large flat panel display, and can efficiently manufacture a device using a large-sized multi-sided substrate.
  • the illumination device IU arranges the plurality of light source units 21 whose positions in the scanning direction are shifted so that the emission directions of the illumination light L viewed from a predetermined direction intersect, and the illumination light L from the plurality of light source units 21
  • the illumination light L is deflected by the deflecting unit 22 so as to align the traveling direction of. For this reason, the degree of freedom of arrangement of the plurality of light source units 21 is increased, and for example, interference (collision) of the plurality of light source units 21 can be avoided.
  • the illumination region IR is expanded in the predetermined direction while maintaining the number of illumination modules 20, and the illumination region It is possible to reduce the number of lighting modules 20 while maintaining the size of IR.
  • the illuminating device IU performs a deformation in which the illuminating light L (beam) is stretched in one direction, so that the spread angle of the illuminating light L is a predetermined direction perpendicular to the scanning direction (X-axis direction) of the substrate P and the scanning direction.
  • Different configurations in the Y-axis direction
  • the line width of the transferred pattern on the mask pattern M is uniform, the line width of the transferred pattern on the substrate P is different between the scanning direction and the predetermined direction.
  • the mask pattern M is designed in consideration of the line width on the mask pattern M according to the anisotropy of the spread angle of the illumination light L. do it.
  • the illumination device IU may be configured such that the divergence angle of the illumination light L is isotropic between the scanning direction (X-axis direction) of the substrate P and a predetermined direction (Y-axis direction).
  • the illuminance monitor device 11 may be installed as a part of the illumination device IU, or one or both of the illuminance monitor device 11 and the alignment microscope AM may be arranged inside the rotating drum 14. In addition, at least a part of the illumination optical system including the plurality of illumination modules 20 may be disposed outside the rotary drum 14.
  • FIG. 9 is a side view showing the processing apparatus U3 (exposure apparatus EX) according to the present embodiment
  • FIG. 10 is a perspective view showing the illumination apparatus IU
  • FIG. 11 is a top view showing the illumination apparatus.
  • the exposure apparatus EX shown in FIG. 9 differs from the first embodiment in the configuration of the substrate support member (rotary drum 35) that supports the substrate P and the configuration of the illumination device IU.
  • An exposure apparatus EX shown in FIG. 9 includes a rotating drum 35 instead of the substrate stage ST shown in FIG.
  • the rotary drum 35 is provided to be rotatable around the rotation center axis AX2.
  • the rotation center axis AX2 of the rotation drum 35 is set substantially parallel to the rotation center axis AX1 of the rotation drum 14.
  • the rotary drum 35 is rotationally driven by a drive unit (not shown), and conveys the substrate P by supporting and rotating the substrate P.
  • the lighting device IU includes a plurality of lighting modules 20 as shown in FIG. 10 and the like, but one lighting module 20 is representatively shown in FIG.
  • the illumination area IR of the illumination device IU is set in the vicinity of the portion of the rotary drum 14 that is closest to the rotary drum 35.
  • the exposure apparatus EX controls the mask pattern M held on the rotating drum 14 from the illumination apparatus IU while rotating the rotating drum 14 and the rotating drum 35 in synchronization with the control apparatus 12 as shown in FIG. Illuminate with illumination light L.
  • the illumination light L incident on the mask pattern M becomes light (exposure light) corresponding to the pattern to be transferred, and the exposure light scans the substrate P transported to the rotary drum 35.
  • the region where the exposure light is incident on the substrate P (exposure region PR) is set near the portion of the rotating drum 35 that is closest to the rotating drum 14.
  • the scanning direction of the exposure light with respect to the substrate P is substantially perpendicular to the rotation center axis AX2 (Y-axis direction) of the rotary drum 35 and substantially parallel to the tangential plane of the exposure region PR (X-axis direction).
  • the illumination device IU shown in FIGS. 10 and 11 has a configuration in which a plurality of illumination modules 20 are arranged in a predetermined direction (Y-axis direction).
  • the plurality of illumination modules 20 have the same configuration, but are arranged so that the postures about the YZ plane are alternately reversed in the order in which they are arranged in the Y-axis direction.
  • the illumination module 20 shown in FIG. 9 includes a first light source unit 21a and a deflection member 22a provided in a one-to-one correspondence with the light source unit 21.
  • the light source unit 21 includes a light source 23 that emits illumination light L, an optical rod member 36 that receives illumination light L from the light source 23, a relay lens 37 and a relay lens that receive illumination light L that has passed through the optical rod member 36. 38.
  • the light source unit 21 emits the illumination light L from a direction inclined with respect to the normal direction (Z-axis direction) of the illumination region IR.
  • the first light source unit 21a of the first illumination module 20a emits the illumination light L from a direction inclined to the ⁇ X side from the normal direction (Z-axis direction) of the illumination region IR.
  • the second light source unit 21b of the second illumination module 20b (see FIG. 11) arranged next to the first illumination module 20a when viewed from the scanning direction of the exposure light (X-axis direction) is an illumination region.
  • the illumination light L is emitted from a direction inclined to the + X side from the normal direction of the IR.
  • the first lighting module 20a and the second lighting module 20b are arranged so that the light emission directions from the light source unit 21 when viewed from a predetermined direction intersect.
  • the light source part 21 of the 1st illumination module 20a and the light source part 21 of the 2nd illumination module 20b are arrange
  • the member having the largest dimension in the predetermined direction among the light source units 21 is the relay lens 38, and the plurality of light source units 21 are adjacent to each other when viewed from the X-axis direction.
  • the relay lens 38 is displaced so that the relay lens 38 does not interfere with the relay lens 38 of the other light source unit 21 in a predetermined direction (Y-axis direction).
  • FIG. 12 is a top view showing the light source 23
  • FIGS. 13A and 13B are views showing the optical rod member 36
  • FIG. 14 is a plan view showing the relay lens 38
  • FIG. 15 is a side view showing the deflecting member 22a
  • FIG. FIG. 13A is a diagram viewed from the Z-axis direction
  • FIG. 13B is a diagram viewed from the Y-axis direction.
  • the light source 23 shown in FIG. 12 includes a plurality of solid light sources 40 and a light guide member 41 provided in each of the solid light sources 40.
  • the solid light source 40 is, for example, a laser diode.
  • the light guide member 41 is, for example, an optical fiber, and guides the illumination light L from the solid light source 40 to the optical rod member 36 (see FIG. 11).
  • the plurality of light guide members 41 are bundled in a bundle shape and have one emission end face 41a.
  • the illumination light L that has passed through the optical fiber is an isotropic light whose spread angle is determined by the diameter ( ⁇ ) of the optical fiber.
  • the optical rod member 36 shown in FIGS. 13A and 13B is formed of, for example, quartz glass, and the like.
  • the incident end surface 36a on which the illumination light L is incident from the light source 23 the inner surface 36b on which the illumination light L incident on the incident end surface 36a is reflected, And an emission end face 36c from which the illumination light L reflected by the inner face 36b is emitted.
  • a light source image is formed for each light guide member 41 on the emission end surfaces 41a of the plurality of light guide members 41, and the illuminance distribution of the illumination light L is nonuniform on the emission end surfaces 41a.
  • Such illumination light L is repeatedly reflected by the inner surface 36b of the optical rod member 36, whereby the spread within the spread angle is averaged, and the illuminance distribution on the exit end face 36c is made uniform.
  • the illumination light L emitted from the optical rod member 36 is light that spreads isotropically with the divergence angle almost unchanged from that before entering the optical rod member 36.
  • the illumination module 20 is configured such that the illumination region IR is conjugate with the exit end face 36c of the optical rod member 36. Therefore, the emission end surface 36c of the optical rod member 36 is set to have the same shape as the partial illumination region IRa, for example.
  • the output end face 36c is set such that the dimension in the Y-axis direction corresponding to the predetermined direction is larger than the dimension in the Z-axis direction corresponding to the scanning direction. That is, the light source unit 21 is configured such that the partial illumination region IRa is longer in the predetermined direction than in the scanning direction.
  • a diaphragm member 42 is provided at a position where the illumination light L from the emission end face 36c of the optical rod member 36 enters.
  • the diaphragm member 42 is a so-called field diaphragm, and defines the shape of the partial illumination region IRa.
  • the diaphragm member 42 has an opening 42a through which the illumination light L passes. The planar shape of the opening 42a will be described later.
  • the relay optical system including the relay lens 37 and the relay lens 38 forms an image of the emission end face 36 c of the optical rod member 36.
  • the illumination area IR is set at or near the position of the surface on which the image of the emission end face 36c of the optical rod member 36 is formed.
  • the magnification is set so as to adjust the spread angle of the illumination light L when emitted from the light source unit 21.
  • the spread angle of the illumination light L when entering the mask pattern M is set according to the line width of the pattern, and the relay optical system including the relay lens 37 and the relay lens 38 so as to have such a spread angle. Is set.
  • the relay lens 38 (see FIG. 14) has a predetermined direction (Y-axis direction) longer than the orthogonal direction when viewed in plan from the direction of the optical axis.
  • the relay lens 38 is set, for example, to a shape corresponding to the partial illumination region IRa by appropriately omitting a portion 38b through which the illumination light L does not pass from a lens shape 38a that is rotationally symmetric about its optical axis. Thereby, interference with the relay lens 38 and other components can be avoided.
  • a diaphragm member 43 is disposed in the optical path from the relay lens 37 to the relay lens 38.
  • the diaphragm member 43 is a so-called aperture diaphragm ( ⁇ diaphragm), and limits the spread angle (so-called numerical aperture NA) of the illumination light L.
  • the aperture member 43 has an opening through which the illumination light L passes, and the diameter of the opening is set so that the spreading angle of the illumination light L that has passed through the relay lens 37 and the relay lens 38 becomes a predetermined value.
  • a mirror 44 is disposed in the optical path from the relay lens 37 to the relay lens 38.
  • the mirror 44 is a so-called bending mirror and deflects the illumination light L emitted from the relay lens 37.
  • the illumination light L emitted from the light source 23 travels in a direction substantially parallel to the X-axis direction, is reflected by the mirror 44, and is tilted to the ⁇ X side or + X side with respect to the Z-axis direction. Proceed to.
  • the light source part 21 can be made compact, for example, it becomes easy to arrange the light source part 21 inside the rotating drum 14.
  • the illumination light L emitted from the plurality of light source units 21 as described above is incident on the deflection unit 22 and deflected by the deflection unit 22 as shown in FIG.
  • the deflection unit 22 includes a plurality of deflection members 22a arranged in a predetermined direction.
  • the plurality of deflecting members 22a have the same shape, but are arranged so that their postures with respect to the YZ plane are alternately reversed in the order in which they are arranged in the Y-axis direction (see FIGS. 10 and 11).
  • the deflection member 22a (see FIG. 15) has an interface 26a on which the illumination light L is incident and an interface 26c on which the illumination light L is emitted.
  • the interface 26a and the interface 26c are each inclined with respect to the normal direction (Z-axis direction) of the illumination region IR. That is, the deflecting member 22a deflects the illumination light L by refracting the illumination light L at the interface 26a and the interface 26c.
  • the illumination light L emitted from the deflecting member 22a enters the partial illumination region IRa, and the plurality of partial illumination regions IRa are connected in a predetermined direction, whereby the illumination device IU The illumination area IR whose longitudinal direction is a predetermined direction is illuminated.
  • the illuminance distribution in the predetermined direction of the illumination region IR may be non-uniform.
  • the deflection unit 22 (see FIG. 11) is provided such that a boundary 27 between a pair of deflection members 22a adjacent in a predetermined direction obliquely intersects the predetermined direction.
  • the non-uniformity of the illuminance distribution in the predetermined direction in the illumination region IR is alleviated or eliminated.
  • such non-uniformity of the illuminance distribution can be alleviated or eliminated by adjusting the shape of the aperture through which the illumination light L passes in the diaphragm member 42 shown in FIGS. 13A and 13B.
  • the illumination light L incident on the overlapping region IRb is used. It is effective to increase the amount of light and decrease the amount of illumination light L incident on the non-overlapping region IRc.
  • the aperture member 42 (see FIGS. 13A and 13B) has a shape of the opening 42a through which the illumination light L passes.
  • the aperture 42a of the diaphragm member 42 shown in FIG. 16 has a first portion 42b through which light incident on the overlapping region IRb passes in the partial illumination region IRa (see FIG. 7) and a non-overlapping region IRc in the partial illumination region IRa. And a second portion 42c through which incident light passes. Since the positions of the overlapping region IRb and the non-overlapping region IRc are different in the predetermined direction (Y-axis direction), the first portion 42b and the second portion 42c are different positions in the direction corresponding to the predetermined direction (Y-axis direction). Is arranged.
  • the first portion 42b and the second portion 42c have different dimensions in the direction (Z-axis direction) on the diaphragm member 42 corresponding to the direction perpendicular to the predetermined direction in the illumination region IR.
  • the amount of illumination light L passing through the unit length region is different.
  • the diaphragm member 42 shown in FIG. 16 assumes an illuminance distribution with relatively low illuminance in the overlapping region IRb as shown in FIG.
  • the inner dimension h1 of the first part 42b and the inner dimension h2 of the second part 42c are set, the inner dimension h1 of the first part is larger than the inner dimension h2 of the second part. ing. Therefore, in the first portion 42b, the amount of illumination light L passing through the unit length region in the Y-axis direction is larger than that in the second portion 42c, and as a result, the illuminance distribution in the predetermined direction in the illumination region IR is made uniform.
  • the illuminance of the overlapping region IRb is 5% lower than the illuminance of the non-overlapping region IRc.
  • the inner dimension h1 of the first part 42b is set to 102.5% with respect to the inner dimension h2 of the second part, for example.
  • the opening 42a of the aperture member 42 is formed so that the inner dimension in the X-axis direction continuously changes between the first portion 42b and the second portion 42c. Therefore, it is possible to suppress the illuminance from changing discontinuously between the overlapping region IRb and the non-overlapping region IRc.
  • the light source 23 shown in FIG. 12 can use 20 laser diodes that emit laser light in the ultraviolet region having a wavelength of 403 nm as the plurality of solid light sources 40. Further, as the light guide member 41, an optical fiber having a diameter of 0.125 mm can be used, and 20 of these can be bundled to form a bundle having a diameter of 0.65 mm. In this case, the spread angle of the illumination light L when emitted from the light guide member 41 is 0.2 in terms of NA.
  • the optical rod member 36 shown in FIGS. 13A and 13B has, for example, a dimension in the X-axis direction of 100 mm, a dimension in the Y-axis direction of 10 mm, and a dimension in the Z-axis direction of 1.4 mm.
  • the spread angle of the illumination light L emitted from the optical rod member 36 is substantially the same as the spread angle of the illumination light L emitted from the light guide member 41, and is 0.2 in terms of NA.
  • the outer dimension in the Z-axis direction is the same (1.4 mm) as the emission end face 36c of the optical rod member 36.
  • the dimensions of the aperture 42a of the aperture member 42 are, for example, a dimension in the Y-axis direction of 10 mm, an internal dimension h1 of the first part of 1 mm, and an internal dimension h2 of the second part of 1.025 mm.
  • the divergence angle of the illumination light L when entering the mask pattern M is set to 0.04 in terms of NA.
  • the divergence angle of the illumination light L emitted from the optical rod member 36 is 0.2, and the relay lens 37 and the relay lens 38 enlarge the image of the emission end surface 36c of the optical rod member 36 five times to increase the illumination region IR. Project to. Therefore, the value obtained by converting the divergence angle of the illumination light L when entering the illumination region IR into NA is 1 of the value (0.2) obtained by converting the divergence angle of the illumination light L emitted from the optical rod member 36 into NA. / 5 times, 0.04.
  • the focal length (f1) of the relay lens 37 is set to 20 mm, for example, and the focal length (f2) of the relay lens 38 is set to 100 mm, for example.
  • the aperture member 43 has an aperture diameter ( ⁇ ) of 8 mm so that the divergence angle of the illumination light L that has passed through the relay lens 37 and the relay lens 38 is equivalent to 0.04 in terms of NA.
  • the deflecting member 22a shown in FIG. 15 is made of quartz or the like having a high transmittance for light in the ultraviolet region.
  • the apex angle ⁇ 1 is 20.51 °
  • the base angle ⁇ 2 is 80 °
  • the base angle ⁇ 3 is 79.49. Set to °.
  • the angle ⁇ formed by the optical axis of the relay lens 38 and the Z-axis direction is, for example, 10 °.
  • a distance S (see FIG. 9) from the intersection of the optical axis of the relay lens 38 and the deflection member 22a to the illumination region IR (mask pattern M) is, for example, 16 mm.
  • the partial illumination region IRa by the illumination module 20 having such specifications has a dimension in the X-axis direction of about 5 mm and a dimension in the Y-axis direction of about 50 mm.
  • the illumination device IU includes five sets of such illumination modules 20, and the illumination region IR has a dimension in the X-axis direction of about 5 mm and a dimension in the Y-axis direction of about 250 mm.
  • the light power per laser diode of the light source 23 is 0.5 W
  • the transmittance of the optical fiber is 0.7
  • the light utilization efficiency by the diaphragm member 42 is 1 / 1.4
  • the light is deflected from the optical rod member 36.
  • the transmittance up to the member 22a is set to 0.8. In this case, when the light intensity power per illumination module 20 is 4 W and the size of the partial illumination region IRa of the illumination module 20 is 5 mm ⁇ 50 mm, the illuminance is estimated to be 1600 mW / cm 2 .
  • the spread angle of the illumination light L when entering the illumination area IR is, for example, 2.3 ° (NA conversion 0.04), and about 0.6 mm from the Z axis in the illumination area IR. Misalignment occurs. This positional deviation amount is sufficiently smaller than the width (5 mm) of the illumination area IR in the scanning direction, and can be ignored when performing the exposure process. Further, when calculated under this condition, the astigmatism in the illumination region IR is 0.84 mm. Therefore, the illumination device IU can be designed and manufactured so that the focus plane matches the position in the Z-axis direction where the light beam in the XZ plane forms an image.
  • the light beam in the YZ plane has a spread of about 0.07 mm at the focus position, but this level can be ignored in performing the exposure process. It is needless to say that the specifications of the illumination device IU shown here are merely examples and can be changed as appropriate.
  • the illumination device IU of the present embodiment as described above can illuminate the illumination region IR with the illumination light L that isotropically spread, and the line width of the transferred pattern and the line width of the transferred latent image Since the ratio is isotropic, for example, the design cost of the mask pattern M can be reduced.
  • FIG. 17 is a side view showing the processing apparatus U3 (exposure apparatus EX) according to this embodiment
  • FIG. 18 is a top view showing the exposure apparatus EX.
  • the illumination device IU shown in FIGS. 17 and 18 is different from the first embodiment in the configuration of the deflecting unit 22. 17 and 18 includes a plurality of mirrors 45 (deflection members) arranged in the Y-axis direction, and the illumination light L from the light source unit 21 is reflected by the mirror 45 so that the illumination light L is deflected. To do.
  • the normal direction of the illumination region IR is the Z-axis direction
  • the angle between the emission direction of the illumination light L from the light source unit 21 and the Z-axis direction viewed from the predetermined direction (Y-axis direction) is ⁇
  • the mirror 45 is disposed to be inclined by an angle ⁇ / 2 from the Z-axis direction.
  • ⁇ is 90 °
  • the angle formed by the normal direction of the mirror 45 and the Z-axis direction is set to 45 °.
  • Mirror 45 includes a reflective surface having a trapezoidal outer shape, for example.
  • the mirror 45 shown in FIG. 18 has a boundary 46 between a pair of adjacent mirrors 45 in the Y-axis direction so as to cross obliquely with respect to the scanning direction (X-axis direction) in which the substrate P is scanned with the illumination light L. Has been placed. Thereby, the illumination distribution in the predetermined direction of the illumination area IR can be made uniform.
  • the illuminating device IU has a configuration in which the deflecting unit 22 deflects by reflection, for example, light loss can be reduced.
  • FIG. 19 is a side view showing the processing apparatus U3 (exposure apparatus EX) according to the present embodiment
  • FIG. 20 is a top view showing the exposure apparatus EX
  • FIG. 21 is an illumination view showing the deflecting unit 22.
  • 19 and 20 is different from the first embodiment in the configuration of the deflection unit 22 in the illumination device IU shown in FIGS. 19 deflects the illumination light L from the first light source unit 21a and reflects the illumination light L from the second light source unit 21b so that the traveling direction of the illumination light L is aligned. It is configured.
  • the first light source unit 21a is arranged in the normal direction (Z-axis direction) of the illumination region IR, and the illumination light L from the first light source unit 21a is not deflected by the deflecting unit 22, It enters the illumination area IR from the normal direction.
  • the second light source unit 21b is arranged so as to form an angle ⁇ with the Z-axis direction when viewed from a predetermined direction (Y-axis direction), and the illumination light L from the second light source unit 21b is The light is deflected by the deflecting unit 22 and enters the illumination area IR from the normal direction.
  • the angle ⁇ is set to 90 °, but the angle ⁇ can be arbitrarily set as long as the absolute value is greater than 0 ° and smaller than 180 °.
  • the 21 includes a passing part 46 through which the illumination light L from the first light source part 21a passes and a reflection part 47 from which the illumination light L from the second light source part 21b is reflected.
  • the passing portions 46 and the reflecting portions 47 are alternately and repeatedly arranged in a predetermined direction (Y-axis direction).
  • the light transmittance at the passage portion 46 is substantially uniform (the transmittance gradient in the Y-axis direction is substantially zero), and the light reflectance at the reflection portion 47 is substantially uniform (in the Y-axis direction).
  • the gradient of the reflectance is almost 0).
  • An intermediate part 48 is arranged between the passing part 46 and the reflecting part 47.
  • the intermediate portion 48 is set so that the reflectance of the illumination light L is higher than that of the passage portion 46 and the reflectance of the illumination light L is lower than that of the reflection portion 47.
  • the reflectance of the illumination light L in the intermediate portion 48 is set to increase continuously or stepwise from the passing portion 46 side toward the reflecting portion 47 side.
  • the transmittance of the illumination light L in the intermediate portion 48 is set lower than that of the passing portion 46 and higher than that of the reflecting portion 47.
  • the transmittance of the illumination light L in the intermediate portion 48 is set to decrease continuously or stepwise from the passing portion 46 side toward the reflecting portion 47 side.
  • the illumination light L from the first light source unit 21 a is incident on the passing part 46 and the two intermediate parts 48 adjacent to the passing part 46.
  • the illumination light L from the second light source unit 21 b is incident on the reflection unit 47 and the two intermediate units 48 adjacent to the reflection unit 47. Therefore, the illumination light L enters the intermediate portion 48 from each of the first light source unit 21a and the second light source unit 21b.
  • the intermediate unit 48 has a function of combining the illumination light L from the first light source unit 21a and the illumination light L from the second light source unit 21b.
  • a region where the illumination light L emitted from the intermediate portion 48 is incident (overlapping region IRb in FIG. 7) is an illuminance caused by part of the illumination light L from the first light source unit 21a and the second light source.
  • the illuminance is obtained by adding the illuminance of a part of the illumination light L from the portion 21b. Therefore, the illuminance of the overlapping region IRb shown in FIG. 7 can be prevented from being discontinuous with the illuminance of the non-overlapping region IRc.
  • Such a deflecting unit 22 (beam combining unit) is joined by, for example, one triangular prism 49 (see FIG. 19) whose longitudinal direction is a predetermined direction (Y-axis direction).
  • the triangular prism 49 has a right-angled triangle in cross section perpendicular to the longitudinal direction, and has a hypotenuse 49a that forms an angle of 45 ° with two sides perpendicular to each other.
  • the pair of triangular prisms 49 is formed into a prismatic prism by joining the oblique side 49a of the triangular prism 49 and the inclined surface including the longitudinal direction to each other.
  • a reflective material such as aluminum is formed by vapor deposition or the like to form a reflective film.
  • the reflectivities of the passing portion 46, the reflecting portion 47, and the intermediate portion 48 are adjusted by, for example, the density distribution of the reflecting film.
  • the density of the reflective film is expressed, for example, by the ratio of the coating area of the reflective film to the area of the unit area, and the region having a relatively high density of the reflective film among the triangular prisms is defined as the reflective portion 47 and is reflected more than the reflective portion.
  • the region where the density of the film is low may be the intermediate portion 48, and the region where the density of the reflective film is lower than that of the intermediate portion 48 may be the passing portion 46.
  • the deflecting unit 22 As a method for forming the deflecting unit 22, for example, after forming a reflective film on the slope of the triangular prism, the reflective film is partially removed by etching or the like, and the part from which the reflective film has been removed is passed through part 46 or intermediate part 48. A method in which a portion where the reflective film is not removed is used as the reflective portion 47 is exemplified. In the method of forming such a deflecting portion 22, the density distribution of the reflection film as described above can be realized by making the etching conditions such as the etching time different between the passage portion 46 and the intermediate portion 48.
  • a reflective film is partially formed on the slope of the triangular prism, and the reflective film is formed on the reflective film 47 or the intermediate part 48, and the reflective film is formed on the reflective film.
  • a portion where no film is formed is used as the passage portion 46.
  • the reflection film density distribution as described above can be realized by making the film formation conditions of the reflection film, for example, the film formation time, different between the reflection unit 47 and the intermediate unit 48.
  • the intermediate portion 48 is provided between the passage portion 46 and the reflection portion 47 in the deflection portion 22 so as to succeed the partial illumination region IRa.
  • the illuminance distribution in the direction can be made uniform.
  • the present invention is not limited to the above-described embodiment.
  • one or more of the elements described in the above embodiments may be omitted.
  • the elements described in the above embodiments can be combined as appropriate.
  • the disclosures of all published publications and US patents cited in the above-described embodiments are incorporated as part of the description of the text.
  • the substrate stage ST that supports the substrate P in a plane is used as the substrate support member.
  • a substrate support member can also be applied to other embodiments.
  • the rotary drum 35 is used as a substrate support member.
  • such a substrate support member can also be applied to other embodiments.
  • the cylindrical mask pattern M is used.
  • a so-called endless belt-like mask pattern M may be used, or a planar mask pattern M may be used.
  • the form of the mask holding member can be appropriately changed according to the form of the mask pattern M.
  • the light source unit 21 of the illumination device IU spreads the beam by the line generator 24.
  • a light source unit 21 can be applied to other embodiments.
  • the light source part 21 of the illuminating device IU equalizes the illumination intensity distribution of each illumination module 20 with the optical rod member 36, such a light source part 21 is also in other embodiment. Applicable.
  • the deflecting unit 22 of the illumination device IU deflects the illumination light L by reflection, but other embodiments can be applied to such a deflecting unit 22.
  • the direction in which the deflecting unit 22 deflects the illumination light L can be appropriately changed according to the emission direction of the illumination light L from the light source unit 21.
  • the emission directions of the illumination light L from the plurality of light source units 21 are set to two directions, but the emission directions of the illumination light L from the plurality of light source units 21 are three or more directions. In this case, the direction in which the deflecting unit 22 deflects the illumination light L is appropriately changed.
  • the exposure apparatus EX may be a multi-lens or microlens array projection exposure apparatus.
  • the above-described illumination apparatus IU is applied to at least one of a plurality of illumination optical systems. it can.
  • the illumination device IU of this embodiment can also be incorporated into a mirror projection type scanning exposure apparatus that scans and moves. In that case, for example, instead of arranging the plurality of deflecting members 22a shown in FIGS.
  • the illumination area IR on the mask is in an arc-shaped projection field of view. What is necessary is just to curve and arrange so that it may approximate.
  • the apex angles in the XY plane of the side end face portions 27a and 27b forming the boundary 27 between the deflection members 22a adjacent to each other may be different.
  • the illumination device IU is applied to the exposure apparatus EX.
  • the illumination device IU can be applied to, for example, an annealing apparatus.
  • FIG. 22 is a flowchart showing the device manufacturing method of this embodiment.
  • step 201 function / performance design of a device such as a liquid crystal display panel or an organic EL display panel is performed (step 201).
  • step 202 a mask pattern M is manufactured based on the device design (step 202).
  • a substrate such as a transparent film or sheet, which is a base material of the device, or an ultrathin metal foil is prepared by purchasing or manufacturing (step 203).
  • Step 204 typically includes a step of forming a resist pattern on a film on the substrate and a step of etching the film using the resist pattern as a mask.
  • a step of uniformly forming a resist film on the substrate surface a step of exposing the resist film of the substrate with exposure light patterned through the mask pattern M according to each of the above embodiments, A step of developing the resist film on which the latent image of the mask pattern is formed by the exposure is performed.
  • a process of forming a functional photosensitive layer (photosensitive silane coupling material, etc.) on the substrate surface by a coating method, via the mask pattern M according to each of the above embodiments The step of irradiating the functional photosensitive layer with patterned exposure light to form a hydrophilic portion and a water-repellent portion according to the pattern shape on the functional photosensitive layer, the hydrophilicity of the functional photosensitive layer
  • a step of applying a plating base solution or the like to a high portion and depositing and forming a metallic pattern by electroless plating is performed.
  • the substrate is diced or cut, or another substrate manufactured in a separate process, for example, a sheet-like color filter having a sealing function or a thin glass substrate is attached.
  • the combining process is performed to assemble the device (step 205).
  • post-processing such as inspection is performed on the device (step 206).
  • a device can be manufactured as described above.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Un dispositif d'éclairage (IU) comprend : une première unité source de lumière (21a) ; une seconde unité source de lumière (21b) ayant une direction d'émission de lumière qui diffère de celle de la première unité source de lumière ; et une unité de déviation (22) qui dévie au moins une partie de la lumière de telle manière qu'une direction de progression de la lumière provenant de la première unité source de lumière et une direction de progression de la lumière provenant de la seconde unité source de lumière sont collectées. Les première et seconde unités sources de lumière sont positionnées en différents emplacements dans des directions prescrites de telle manière que des régions d'éclairage, dans lesquelles une lumière qui est émise par chaque unité source de lumière entre puis transite par l'unité de déviation, sont alignées de manière contiguë dans les directions prescrites.
PCT/JP2013/064228 2012-05-29 2013-05-22 Dispositif d'éclairage, dispositif de traitement et procédé de fabrication de tels dispositifs WO2013179977A1 (fr)

Priority Applications (3)

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JP2014518406A JPWO2013179977A1 (ja) 2012-05-29 2013-05-22 照明装置、処理装置、及びデバイス製造方法
KR20147033207A KR20150027741A (ko) 2012-05-29 2013-05-22 조명 장치, 처리 장치, 및 디바이스 제조 방법
CN201380037678.0A CN104471486B (zh) 2012-05-29 2013-05-22 照明装置、处理装置及器件制造方法

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US201261652719P 2012-05-29 2012-05-29
US61/652,719 2012-05-29

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CN109116685B (zh) * 2018-09-14 2020-11-20 重庆惠科金渝光电科技有限公司 一种曝光方法及其曝光装置
CN109884860B (zh) * 2019-03-22 2020-12-04 上海微电子装备（集团）股份有限公司 多工位柔性卷带曝光装置及曝光方法

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KR20150027741A (ko) 2015-03-12
JPWO2013179977A1 (ja) 2016-01-21
CN104471486A (zh) 2015-03-25
CN105892237A (zh) 2016-08-24
HK1247672A1 (zh) 2018-09-28
CN104471486B (zh) 2017-11-24
CN105892237B (zh) 2018-05-29
CN107315323B (zh) 2019-08-13
CN107315323A (zh) 2017-11-03
TW201409184A (zh) 2014-03-01
CN107741685A (zh) 2018-02-27

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