HK1247672A1 - 照明裝置及曝光裝置 - Google Patents

照明裝置及曝光裝置

Info

Publication number
HK1247672A1
HK1247672A1 HK18106992.5A HK18106992A HK1247672A1 HK 1247672 A1 HK1247672 A1 HK 1247672A1 HK 18106992 A HK18106992 A HK 18106992A HK 1247672 A1 HK1247672 A1 HK 1247672A1
Authority
HK
Hong Kong
Prior art keywords
exposure
illumination
illumination device
exposure device
Prior art date
Application number
HK18106992.5A
Other languages
English (en)
Inventor
根岸武利
福井達雄
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1247672A1 publication Critical patent/HK1247672A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK18106992.5A 2012-05-29 2018-05-29 照明裝置及曝光裝置 HK1247672A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201261652719P 2012-05-29 2012-05-29

Publications (1)

Publication Number Publication Date
HK1247672A1 true HK1247672A1 (zh) 2018-09-28

Family

ID=49673178

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18106992.5A HK1247672A1 (zh) 2012-05-29 2018-05-29 照明裝置及曝光裝置

Country Status (6)

Country Link
JP (1) JPWO2013179977A1 (zh)
KR (1) KR20150027741A (zh)
CN (4) CN107741685A (zh)
HK (1) HK1247672A1 (zh)
TW (1) TW201409184A (zh)
WO (1) WO2013179977A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2017158943A1 (ja) * 2016-03-18 2019-01-24 コニカミノルタ株式会社 パターニング装置及び有機エレクトロルミネッセンス素子の製造方法
CN109116685B (zh) 2018-09-14 2020-11-20 重庆惠科金渝光电科技有限公司 一种曝光方法及其曝光装置
CN109884860B (zh) * 2019-03-22 2020-12-04 上海微电子装备（集团）股份有限公司 多工位柔性卷带曝光装置及曝光方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4923779A (en) * 1989-01-09 1990-05-08 The Mead Corporation Color-correcting exposure system for a photosensitive media
JP3707060B2 (ja) * 1994-06-29 2005-10-19 株式会社ニコン 照明光学装置
JPH08330212A (ja) * 1995-05-31 1996-12-13 Nikon Corp 露光装置
JP3627355B2 (ja) * 1996-02-22 2005-03-09 ソニー株式会社 スキャン式露光装置
JP2002258489A (ja) * 2000-04-20 2002-09-11 Nikon Corp 露光装置および露光方法
DE10130175A1 (de) * 2001-06-22 2003-01-02 Bacher Graphische Geraete Gmbh Verlaufsfilter
KR100471427B1 (ko) * 2001-12-31 2005-03-08 엘지전자 주식회사 이중램프 노광장치
JP4497382B2 (ja) * 2004-03-02 2010-07-07 住友重機械工業株式会社 レーザ照射装置
JP2006085071A (ja) * 2004-09-17 2006-03-30 Fuji Photo Film Co Ltd マルチビーム露光装置
US7638780B2 (en) * 2005-06-28 2009-12-29 Eastman Kodak Company UV cure equipment with combined light path
JP4989180B2 (ja) * 2006-10-13 2012-08-01 キヤノン株式会社 照明光学系および露光装置
JP5092914B2 (ja) * 2008-06-12 2012-12-05 ウシオ電機株式会社 光照射装置
JP2011033907A (ja) * 2009-08-04 2011-02-17 Nikon Corp 照明装置、露光装置、照明方法、露光方法及びデバイス製造方法
JPWO2011129369A1 (ja) * 2010-04-13 2013-07-18 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
JP5251994B2 (ja) * 2010-08-06 2013-07-31 ウシオ電機株式会社 光照射装置および光照射方法
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置

Also Published As

Publication number Publication date
CN107315323A (zh) 2017-11-03
CN104471486B (zh) 2017-11-24
CN105892237B (zh) 2018-05-29
JPWO2013179977A1 (ja) 2016-01-21
CN105892237A (zh) 2016-08-24
WO2013179977A1 (ja) 2013-12-05
CN107315323B (zh) 2019-08-13
CN104471486A (zh) 2015-03-25
TW201409184A (zh) 2014-03-01
CN107741685A (zh) 2018-02-27
KR20150027741A (ko) 2015-03-12

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