JP2012103361A - Exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately adjusting the position of a mask with respect to an exposure object member by changing an alignment mark for mask position adjustment corresponding to the meandering of the exposure object member even when the exposure object member is continuously supplied, and capable of highly accurately and stably performing exposure.SOLUTION: An exposure device 1 is provided in which an alignment mark forming part 13 is disposed on the upstream side from an irradiation position of exposure light and an alignment mark 2a in which an intermittent index is applied in the moving direction of an exposure object member 2 is formed. A detection part 14 detects a position in the index position of the alignment mark 2a in the direction crossing the moving direction of the exposure object member 2. Then, a meandering amount of the alignment mark 2a is calculated from the detection results of the detection part 14 to move the alignment mark forming part 13. Alternatively, the position of a mask 12 is adjusted when the detection part 14 is disposed so as to correspond to the irradiation position of exposure light.

Description

  The present invention relates to an exposure apparatus that increases the exposure accuracy of an exposure target member that is continuously conveyed, and in particular, even when the exposure target member meanders in a direction perpendicular to the movement direction, an alignment mark for mask position adjustment. The present invention relates to an exposure apparatus that can adjust the position of the mask with respect to the exposure target member with high accuracy by changing the exposure according to the meandering of the exposure target member, and can perform stable exposure.

  Conventionally, when an alignment film or the like is formed on a glass substrate such as a liquid crystal display, a glass substrate having a material film such as an alignment material film formed on the surface is supplied to an exposure apparatus to expose the alignment material film. Thus, photoalignment is performed in a predetermined direction.

  In this exposure apparatus, the exposure light emitted from the exposure light source through a predetermined optical system is irradiated through the pattern of the light transmission region of the mask, and the glass substrate to be exposed is, for example, on a movable stage. Is moved to the exposure light irradiation region by moving the stage. A predetermined exposure region is formed on the glass substrate by exposing the material film formed on the glass substrate in correspondence with the mask pattern.

  As described above, in an exposure target member such as a glass substrate conveyed by a conveyance device such as a stage, the formation region of the alignment film or the like greatly depends on the positional accuracy of the conveyance device or the mask. Therefore, various techniques for exposing a predetermined region of the exposure target member with high accuracy have been proposed.

  For example, Patent Document 1 discloses a film exposure apparatus in which a pair of rectangular markings are provided on both sides of a film side portion outside an exposure target area of a film. Then, in a state in which the conveyance of the film is stopped, exposure light is irradiated to a predetermined region of the film by optically detecting the alignment marking shape in a direction perpendicular to the moving direction and the moving direction of the film. The position of the mask is adjusted.

  When the exposure target member is a film, for example, a pair of rollers 80 and 81 as shown in FIGS. 9 and 10 are used as a transport device that continuously supplies the film to the exposure apparatus. That is, as shown in FIG. 9 and FIG. 10, the film 2 to be exposed is wound and conveyed in a roll shape between each process until the film 2 is processed into a film as a product. When the film is supplied to the exposure apparatus, a roll of film is coaxially attached to the supply-side roller 80, and the film 2 is sequentially taken up by the take-up side roller 81 from the leading end. Then, as shown in FIG. 9, between the supply side roller 80 and the take-up side roller 81, the exposure apparatus is passed through, for example, exposure light is continuously applied to the alignment material film formed on the surface of the film. And exposing a predetermined exposure area of the film along the moving direction of the film. This method is called a roll-to-roll method.

  When the film is exposed by the roll-to-roll method, as shown in FIG. 10, while the film 2 is being fed from the supply-side roller 80 to the take-up-side roller 81, for example, a roller of a transport device The film 2 may meander in a direction perpendicular to the moving direction due to a gap between the rolls 80 and 81 and the roll of the film or an error in winding the film onto the roll. There is a problem that it decreases.

  Therefore, for example, as disclosed in Patent Documents 2 and 3, various techniques for correcting the meandering of the film have been proposed. The technique disclosed in Patent Document 2 is provided with a detector that detects the edge position of a web such as a film, and the roller on the supply side is moved in the axial direction by a cylinder or the like according to the detection result of the detector. This corrects the meandering of the web in the vertical direction.

  In Patent Document 3, when a long workpiece such as a film is exposed in two portions, a pattern is formed on the workpiece at the time of the first exposure, and for each predetermined pattern length. Disclosed is a technique for intermittently marking the alignment and imaging the alignment mark during the second exposure so as to detect the displacement and inclination of the workpiece and correct the mask position and inclination. Yes.

  FIG. 11 shows, as an example, a conventional exposure apparatus of a type in which exposure light sources 11 that emit exposure light are arranged to face each other corresponding to one mask 12 and irradiate exposure light from different directions. FIG. Such a type of exposure apparatus is used for exposure of an alignment material film when forming an alignment film on a glass substrate such as a liquid crystal display or a film substrate such as a polarizing film. That is, when an alignment film is formed by exposure by this exposure apparatus, an exposure target member having an alignment material film formed on the surface is supplied into the exposure apparatus, and exposure light is irradiated from different directions for each predetermined region. Thus, an alignment film oriented in different directions is formed. According to this exposure apparatus, for example, an area corresponding to one picture element of the film is divided and exposed in the width direction, or the film is divided and exposed in the width direction for each area corresponding to the pixel. An alignment film having a different alignment direction can be formed for each divided region. Due to the characteristics of the alignment direction of the alignment film, the operation at the time of voltage application of the liquid crystal molecules sandwiched between the glass substrates can be varied according to the alignment direction of the alignment film, thereby widening the viewing angle of the display device, In addition, the produced film can be used as a polarizing film such as a 3D (Three Dimensional) display. Recently, the exposure technique for such a film has been attracting attention.

  When the film is exposed by such an exposure apparatus, the film is likely to be wavy during conveyance, thereby causing a problem of deviation of the exposure position. In order to reduce the influence of the deviation of the exposure position, for example, in an exposure apparatus in which a plurality of light sources are juxtaposed in the moving direction of the film as described above, for example, as shown in FIGS. The plurality of masks 12 are used, and the masks 12 are arranged in a staggered pattern so as to be aligned in the moving direction of the exposure target member and the width direction perpendicular thereto. Is provided for each mask to perform exposure. Then, the exposure light from the exposure light source 11 is transmitted through each of the masks 121 to 124, and as shown in FIG. 12, the film is formed by the masks 121 and 122 that are spaced apart from each other on the upstream side where the film is supplied. 2 is exposed in the exposure areas A and C, the area B between the exposure areas A and C is exposed with the mask 123 on the downstream side, and the area D adjacent to the exposure area C is exposed with the mask 124. ing. Thereby, the pattern which carried out orientation division | segmentation on the substantially whole surface of the film 2 can be formed with sufficient precision.

JP-A-5-323621 JP-A-8-301495 JP 2009-216861 A

  However, the above prior art has the following problems. The technique of Patent Document 1 is not suitable when a workpiece is continuously supplied by a conveying device or the like. That is, in the exposure apparatus of Patent Document 1, the alignment mark detection and the mask position correction are performed in a state where the conveyance of the workpiece is stopped. In particular, when the film is supplied and exposed by the roll-to-roll method, the film may meander in the direction perpendicular to the moving direction as described above, and the conveyance of the workpiece is stopped every time the mask position is corrected. There is a need. Therefore, for example, when the exposure region is continuously formed in a strip shape, the productivity is extremely low. In the technique of Patent Document 3 as well, alignment marks are installed only at predetermined intervals, and in order to improve exposure accuracy, the conveyance of the workpiece is stopped and the mask position is corrected to detect the alignment marks. Need to be low and productivity is low.

  In addition, even when the film transport apparatus disclosed in Patent Document 2 is used, the meandering of the film in the direction perpendicular to the moving direction as shown in FIG. 10 occurs periodically. And the technique of patent document 2 aims at elimination of the meandering of the film with respect to a conveying apparatus, and does not consider the exposure precision by exposure apparatus. Therefore, it is not possible to eliminate a decrease in exposure accuracy due to the meandering of the film.

  Furthermore, the technique of Patent Document 3 is suitable when the second exposure area is relatively aligned with the first exposure area. However, as in Patent Document 1, detection of an alignment mark and masking are performed. The position correction is performed in a state in which the conveyance of the workpiece is stopped, and the productivity is low when the film is continuously exposed. And the technique of patent document 3 performs exposure in two steps, and its productivity is extremely low.

  In the exposure apparatus of the type that irradiates the exposure light for each mask 12 with a plurality of masks 12 as shown in FIGS. 11 and 12, the part having the exposure light source 11 built therein as shown in FIG. (Case portion of the exposure light source 11) has a length of about 2 m in the moving direction of the film for each light source, for example, exposure areas A and C and exposure areas B and D as shown in FIG. The distance between the two is at least about 4 m. Therefore, there is a problem in that the film easily undulates during conveyance from the upstream exposure areas A and C to the downstream exposure areas B and D and easily shifts in the width direction perpendicular to the moving direction. Therefore, in the exposure area downstream of the moving direction of the film, there is a problem that an already exposed area is exposed due to a positional deviation in the width direction of the film, and an unexposed area is also generated. .

  The present invention has been made in view of such problems. Even when the exposure target member is continuously supplied, the alignment mark for adjusting the mask position is changed according to the meandering of the exposure target member, and the exposure target is changed. An object of the present invention is to provide an exposure apparatus capable of accurately adjusting the position of a mask with respect to a member and capable of highly accurate and stable exposure.

  The exposure apparatus according to the present invention is configured to irradiate the exposure pattern forming area of the exposure target member continuously conveyed by the conveying apparatus with the exposure light emitted from the exposure light source through the mask. In an exposure apparatus that exposes a mask pattern in a region, the exposure target member is disposed upstream of the exposure light irradiation position in the movement direction of the exposure target member, and an intermittent index is attached to the exposure target member in the movement direction. An alignment mark forming portion for forming the alignment mark, and the alignment mark in a direction intersecting the moving direction of the exposure target member, which is arranged to correspond to the irradiation position of the exposure light in the moving direction of the exposure target member. A first detector for detecting a position at the index position; and a front at the index position detected by the first detector A first meandering computation unit that computes the meandering amount of the alignment mark based on the position of the alignment mark, and in the moving direction of the exposure target member according to the meandering amount of the alignment mark obtained by the first meandering computation unit And a first controller that adjusts the position of the mask in a vertical direction.

  Another exposure apparatus according to the present invention irradiates, through a mask, exposure light emitted from an exposure light source onto an exposure pattern forming region of an exposure target member that is continuously transported by a transport device, thereby exposing the exposure pattern. In an exposure apparatus that exposes a mask pattern in a formation region, the exposure apparatus is arranged to be movable in a direction perpendicular to the movement direction of the exposure target member upstream of the exposure light irradiation position in the movement direction of the exposure target member. , An alignment mark forming portion for forming an alignment mark with an intermittent index attached to the exposure target member in the moving direction, and the alignment mark forming portion in the moving direction of the exposure target member and irradiation of the exposure light The index position of the alignment mark in a direction that is arranged between the position and the direction of movement of the exposure target member A second meandering unit for detecting the position of the alignment mark; a second meandering computing unit for computing the meandering amount of the alignment mark based on the position of the alignment mark at the index position detected by the second detecting unit; And a second control unit that moves the alignment mark forming unit so as to cancel the meandering amount of the alignment mark obtained by the meandering calculation unit.

  The exposure apparatus is disposed, for example, on the downstream side of the second detection unit in the movement direction of the exposure target member, and detects the position of the alignment mark at the index position in a direction crossing the movement direction of the exposure target member. A third detection unit, a third meandering calculation unit for calculating the meandering amount of the alignment mark based on the position of the alignment mark at the index position detected by the third detection unit, and the third meandering calculation unit And a third control unit that adjusts the position of the mask in a direction perpendicular to the moving direction of the exposure target member in accordance with the amount of meandering of the alignment mark.

  In the exposure apparatus according to the present invention, for example, the alignment mark is a band-shaped mark that is intermittently formed in the movement direction of the exposure target member and forms two rows, and is seen from a direction intersecting the movement direction. The front and rear end portions of the two rows of belt-shaped marks are arranged so as to overlap each other, and the index is the front and rear ends of the marks.

  Alternatively, for example, the alignment mark is formed by intermittently forming a band-shaped mark that is inclined in the same direction with respect to the moving direction of the exposure target member, and the indicators are the front end and the rear end of each mark. .

  Alternatively, for example, the alignment mark may be formed continuously, and the index may be provided intermittently on the alignment mark.

  The exposure apparatus according to the present invention includes an alignment mark forming unit and an index position of an alignment mark in a direction that intersects with the movement direction of the exposure target member and is arranged to correspond to the irradiation position of the exposure light in the movement direction of the exposure target member. A first detection unit that detects a position at the first detection unit, and a first meandering calculation unit calculates a meandering amount of the alignment mark based on the position of the alignment mark at the index position detected by the first detection unit, The control unit adjusts the position of the mask in the direction perpendicular to the moving direction of the exposure target member according to the amount of meandering of the alignment mark obtained by the first meandering calculation unit. As a result, when the exposure target member is continuously supplied and meanders in a direction crossing the moving direction, the alignment mark also meanders to follow the meander of the exposure target member. Therefore, the mask position can be adjusted with high accuracy, and the exposure target member can be continuously exposed with high accuracy and stability.

  Another exposure apparatus according to the present invention forms an alignment mark on the exposure target member that is intermittently marked with respect to the movement direction upstream of the exposure light irradiation position in the movement direction of the exposure target member. An alignment mark forming unit, and a second detection unit that detects a position of the alignment mark at the index position in a direction crossing the moving direction of the exposure target member. The second meandering operation unit is detected by the second detection unit. The alignment mark forming unit calculates the meandering amount of the alignment mark based on the position of the alignment mark at the index position, and the second control unit cancels the meandering amount of the alignment mark obtained by the second meandering calculation unit. Move. Thereby, even when the exposure target member is continuously supplied and meanders in a direction crossing the moving direction, the relative formation position of the alignment mark with respect to the exposure target member is constant. Therefore, the mask position can be accurately adjusted using this alignment mark, and the exposure target member can be continuously exposed stably with high accuracy.

In the exposure apparatus which concerns on 1st Embodiment of this invention, it is a top view which shows correction | amendment of the mask position by an alignment mark. (A) thru | or (c) is a figure which shows the formation aspect of an alignment mark as an example in the exposure apparatus which concerns on embodiment of this invention. In the exposure apparatus which concerns on embodiment of this invention, it is a figure which shows the detection method of the meander of an alignment mark as an example. It is a figure which shows a mask as an example. It is a figure which shows as an example the control apparatus which controls the position of an alignment mark formation part, and a mask position. FIGS. 5A to 5C are schematic views showing correction of the alignment mark formation position in the exposure apparatus according to the second embodiment of the present invention, and FIG. 4D is the alignment mark formation when the position of the laser marker is not corrected. It is a schematic diagram which shows. In the exposure apparatus which concerns on 2nd Embodiment of this invention, it is a top view which shows the alignment mark formation part, a detection part, and a mask. It is a figure which shows correction | amendment of the mask position by the exposure apparatus which concerns on 2nd Embodiment of this invention. It is a schematic diagram which shows the exposure of the film by the conventional roll toe roll system as an example. It is a schematic diagram which shows the meandering of the film of the direction perpendicular | vertical to the moving direction of a film in the conventional roll to roll type film conveyance apparatus. It is a perspective view which shows the exposure apparatus of an orientation division system as an example. It is a figure which shows as an example the exposure apparatus of the structure which has arrange | positioned several light sources in the moving direction of a film. (A) And (b) is a figure which shows the exposure area | region of the film by the conventional exposure apparatus as an example.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. First, the structure of the exposure apparatus of the film which concerns on embodiment of this invention is demonstrated. FIG. 1 is a plan view showing correction of a mask position by an alignment mark in the exposure apparatus according to the first embodiment of the present invention, and FIGS. 2A to 2C are exposure apparatuses according to the embodiment of the present invention. FIG. 2 is a diagram showing an example of how alignment marks are formed. The exposure apparatus 1 according to the present embodiment is similar to the conventional exposure apparatus shown in FIGS. 9 to 12 in that the exposure light source 11 that emits exposure light, the mask 12, and the exposure light emitted from the exposure light source through the mask 12. Through an optical system that irradiates the exposure target member 20 such as a glass substrate or a film, and a transport device that transports the exposure target member 20, for example, by an optical system such as a collimator lens and / or a reflecting mirror, The exposure light emitted from the exposure light source is irradiated to the exposure target member 20 of the glass substrate or film 2 on the surface of which the exposure material film is formed through the mask 12, and corresponding to the mask pattern, for example, an alignment material film or the like The exposure material film is photo-aligned to form an alignment film. When the exposure target member is a glass substrate, the exposure material film on the surface of the glass substrate is masked by placing the glass substrate on a movable transfer device such as a transfer stage and transferring it. The pattern is exposed sequentially and sequentially. Alternatively, when the exposure target member is the film 2, the film 2 supplied from the supply-side roller 80 is maintained in the tension state of the film 2 by the take-up roller 81 by the roll-to-roll method, as in the conventional case. While winding, the exposure material film on the film surface is irradiated with exposure light, and the exposure material film is successively exposed. In the transport device for the film 2, for example, one or more transport rollers 9 for transporting the film 2 are disposed between the two rollers 80 and 81, and each transport roller 9 is driven by a motor, for example. Has been. In the present embodiment, the case where the film 2 is used as the exposure target member 20 will be described. However, even when the exposure target member 20 is a glass substrate, the configuration is the same as that of the present embodiment except for the configuration of the transport device.

  In the present embodiment, similarly to the conventional exposure apparatus 10 as shown in FIG. 9, the film 2 to be exposed is unwound from, for example, a roll 80 on the supply side of a roll-to-roll system and supplied into the exposure apparatus 1. In the meantime, the film is supplied to the slit coater 4, and a predetermined exposure material, for example, a photo-alignment material is applied in the form of a film on the surface of the film substrate 20 by the slit coater 4. The applied exposure material is dried or baked by the drying device 5, and a predetermined exposure material film is formed on the surface of the film substrate 20. The exposure apparatus 1 is supplied with a film 2 having an exposure material film formed on the surface thereof. In this embodiment, the case where the exposure material film 21 formed on the surface of the film 2 is an alignment material film will be described.

  In the exposure apparatus 1 of the present embodiment, as shown in FIG. 1, the alignment laser marker 13 (at the fixed position upstream of the exposure light irradiation position (mask pattern formation position) in the moving direction of the film 2 is provided. When an alignment mark forming portion is provided and the laser beam emitted from the alignment laser marker 13 is used in an area outside the exposure pattern forming area on the film 2, for example, a display device such as a liquid crystal display, an image is displayed. An alignment mark 2a for mask position adjustment is formed in an area that does not become a display area. The position of the mask 12 is adjusted by detecting the position of the alignment mark 2a in the direction intersecting the moving direction of the film with the line CCD 14 arranged so as to be aligned with the moving direction of the mask 12 and the film. As an area that does not become an image display area (an area for forming an alignment mark), for example, as shown in FIG. . Alternatively, as shown in FIG. 13B, in the case of manufacturing a plurality of polarizing films or the like by dividing one film 2 in the width direction perpendicular to the moving direction, for example, between regions to be polarizing films Since these areas are unused areas, the alignment marks 2a are formed in the unused areas between the exposure target areas. In this embodiment, as shown in FIG. 1, the case where the alignment mark 2a is formed in the side part of the film 2 is demonstrated.

  The exposure light source 11 is, for example, a light source that emits ultraviolet light. For example, a mercury lamp, a xenon lamp, an excimer lamp, an ultraviolet LED, or the like, and a light source that emits continuous light or pulsed laser light is used. In the present embodiment, an optical system such as a collimator lens and / or a reflecting mirror is disposed on the optical path of the exposure light emitted from the exposure light source. For example, for pattern formation on the exposure material film on the film 2 The alignment material film (exposure material film 21) formed in the region is configured to be irradiated with exposure light with a predetermined amount of light. The exposure light source is configured to be able to adjust the emission direction of the exposure light, for example, by a control device (not shown), thereby adjusting the incident angle of the exposure light to the film 2. The exposure apparatus 1 of this embodiment is arranged so that two exposure light sources face each other with respect to one exposure area and are aligned in the moving direction of the film 2. Thereby, the alignment material film (exposure material film 21) is irradiated to the alignment material film (exposure material film 21) through the mask 12 with two exposure lights having different pretilt angles respectively emitted from the exposure light sources, and the alignment material film in the width direction perpendicular to the moving direction. Divided and exposed, and different alignment films are formed on the film substrate in divided regions where the alignment directions are adjacent. Such a method of the exposure apparatus is called an alignment division method. Thus, for example, when a voltage is applied to a display device in which a liquid crystal is sandwiched between alignment films using an alignment film in which a region to be a picture element is divided into two in the width direction, the orientation of liquid crystal molecules at the time of voltage application Is two directions within one picture element according to the alignment direction of the alignment film, and can widen the viewing angle of a liquid crystal display or the like. In addition, a film in which an alignment film having a different alignment direction is formed for each region serving as a pixel adjacent in the width direction can be used as a polarizing film such as a 3D (Three Dimensional) display. Note that the number of exposure light sources is not limited to two for one exposure region, and three or more exposure light sources may be provided. For example, alignment film materials may be aligned in three or more directions by exposure light from different directions. Further, for example, one exposure light source is provided for one exposure region, and the exposure light emitted from the exposure light source is divided into two or more by a polarizing plate or the like, and the divided exposure light is irradiated from different directions. It may be configured. For example, by using a polarizing plate, exposure light can be divided into P-polarized linearly-polarized exposure light and S-polarized linearly-polarized exposure light and irradiated from different directions.

  As shown in FIG. 4, the mask 12 includes, for example, a frame body 120 and a pattern formation portion 125 at the center thereof, and a pattern 125 a of a predetermined light transmission region is formed in the pattern formation portion 125. That is, in the pattern forming portion 125, an opening that transmits exposure light is formed corresponding to the pattern shape formed on the film 2, or a light transmissive member is installed. For example, in an alignment division type exposure apparatus, a mask pattern is exposed to the alignment material film on the surface of the film 2 by the transmitted light of the pattern forming unit 125. In the present embodiment, a pair of exposure light sources is arranged for each mask 12, and exposure light having different incident angles is emitted. Therefore, in this embodiment, the pattern 125a is provided with a plurality of rectangular opening patterns on the upstream side and the downstream side in the moving direction of the film, corresponding to two exposure lights having different incident angles. The upstream and downstream light transmission region groups are formed apart from each other so that the irradiation regions of the exposure light do not overlap each other. Further, for example, the upstream pattern and the downstream pattern are formed in a zigzag pattern along the width direction so that the exposure areas of the upstream pattern and the downstream pattern are adjacent to each other.

  In the present embodiment, the mask 12 has a width of about 300 μm and a length so as to extend in the width direction perpendicular to the moving direction of the film 2 on the upstream side (upper side in FIG. 4) of the pattern 125a. A viewing window 12a for a line CCD of about 250 mm is provided, and a line-shaped light shielding pattern 12b having a width of, for example, about 15 μm is provided in the middle of the viewing window 12a in the longitudinal direction. Below the mask 12, for example, a line CCD 15 for detecting the mask position is provided. The line CCD 15 detects the position of the light shielding pattern 12b and uses it to adjust the position of the mask 12. Note that the positions and shapes of the viewing window 12a and the light shielding pattern 12b in the present embodiment are merely examples, and the present invention is not limited to these positions and shapes as long as the mask 12 can be accurately positioned. Absent. For example, the positions of the viewing window 12a and the light shielding pattern 12b may be provided in a region between the patterns 125a formed so as to be arranged in two rows. For example, instead of the light shielding pattern 12b, each other (for example, N-type) A plurality of intersecting slits may be provided.

  For example, a portion of the frame 120 is supported by a mask stage 17 as shown in FIG. 11, and the mask 12 is configured so that the entire mask 12 can be moved by the movement of the mask stage 17. The mask stage 17 is connected to a control device 30 as shown in FIG. 5, for example, and the position thereof is controlled, for example, in the horizontal direction (the film width direction or the film width direction and the film length) under the control of the control device 30. Direction). Thereby, the exposure position of the film 2 by the mask 12 can be adjusted to a horizontal direction. The mask stage 17 can be moved in the vertical direction, for example, and can be adjusted so that, for example, the alignment film material on the film 2 is exposed to a predetermined size.

  In the present embodiment, the alignment laser marker 13 includes a laser light source that irradiates, for example, an Nd: YAG laser or ultraviolet light, and emits pulsed laser light from a pulse light source such as a xenon flash lamp. In the present embodiment, the alignment laser marker 13 divides the laser beam emitted from the light source by an optical system such as a semi-transmissive mirror or a laser beam splitter, and the divided laser beam is divided into two portions on the side of the film 2. Irradiation is possible so that they are aligned in the width direction of the film. Then, with each laser beam, two rows of alignment marks 2a having a width of, for example, 20 μm and a length of 15 mm are formed at regular intervals on a side portion within, for example, 25 mm from the edge of the film 2. In this embodiment, the alignment laser marker 13 is formed such that two rows of alignment marks 2a are arranged in a staggered manner as shown in FIG. And the front-end | tip part and rear-end part of each strip | belt-shaped alignment mark 2a of 2 rows are formed so that it may mutually overlap seeing from the direction which cross | intersects the moving direction of the film 2. FIG. In the present embodiment, the front and rear ends of the alignment mark 2a are used as indices for detecting the meander of the alignment mark 2a. When the alignment mark 2a is formed so as to overlap each other when viewed from the direction crossing the moving direction of the film 2, as shown in FIG. 2a may be formed in one row so as to be inclined in the same direction with respect to the moving direction of the film, and the leading end and the trailing end of each mark may be used as an index for detecting the meandering of the alignment mark 2a. Alternatively, as shown in FIG. 2C, the alignment mark 2a may be formed continuously so as to extend in the moving direction of the film, for example, an intermittent index in a direction crossing the moving direction of the film. May be provided.

  In the present embodiment, the alignment CCD detection line CCD 14 is provided so as to be aligned in the width direction of the mask 12 and the film at a position corresponding to the position of the mask 12 in the moving direction of the film 2. The line CCD 14 is disposed above or below the film 2 and is configured to detect the position of the alignment mark 2 a at a position corresponding to the mask 12. That is, the film 2 may meander in a direction perpendicular to the moving direction due to, for example, a gap between the rollers 80 and 81 of the conveying device and the roll of the film or a winding error of the film on the roll. is there. In this case, the meandering in the direction perpendicular to the moving direction of the film 2 is gradually transmitted to the upstream side due to the meandering on the downstream side near the roll 81 on the winding side. As a result, while the film 2 is conveyed from the alignment mark forming unit 13 to the line CCD 14, meandering in a direction perpendicular to the moving direction occurs. In this embodiment, as shown in FIG. 1, the alignment mark detection line CCD 14 is positioned at the position corresponding to the viewing window 12a of the mask 12, for example, of the alignment mark 2a in the direction intersecting the moving direction of the film 2. Detect position. For example, if the film 2 meanders in the width direction while moving, the alignment mark 2a is also shifted in the width direction of the film 2 by the same meandering amount, but the alignment mark detection line CCD 14 is The position of the alignment mark 2a shifted in the width direction is detected.

  FIG. 3 is a view showing, as an example, a method for detecting the meandering amount of the alignment mark 2a in the exposure apparatus of the present embodiment. FIG. 3 shows the movement locus of one alignment mark 2a when the film 2 meanders in a direction perpendicular to the movement direction. In the present embodiment, as shown in FIG. 3, the line CCD 14 uses the front end and rear end of each alignment mark 2a as indices, and the positions of the front end and rear end of the alignment mark 2a in the direction crossing the film moving direction. Is detected.

  In the present embodiment, a fixed interval is formed between the alignment marks 2a, and when the alignment marks 2a are intermittently formed in one line in the moving direction of the film 2, the line CCD 14 cannot measure. There is a section. Therefore, when the film 2 meanders while the section where the alignment mark 2a is not formed passes through the line CCD 14, the amount of meandering cannot be detected, and detection errors are gradually accumulated. It will be. However, in the present embodiment, two rows of alignment marks 2a are arranged in a staggered manner, and the leading and trailing ends of the two rows of strip-like alignment marks 2a intersect the moving direction of the film 2. From the perspective, they are formed so as to overlap each other. That is, in this embodiment, there is no section in which the alignment mark 2a cannot be measured by the line CCD 14, and the detection accuracy of the meandering amount of the alignment mark 2a is high.

  The line CCD 14 is connected to a control device 30 as shown in FIG. Then, the detected position of the alignment mark 2 a in the film width direction is transmitted to the control device 30. The control device 30 is configured to adjust the position of each mask 12 based on the position of the alignment mark 2 a transmitted from the line CCD 14. Thereby, the exposure apparatus 1 according to the present embodiment can form the alignment mark 2a and adjust the position of the mask 12 by the amount of meandering.

  FIG. 5 is a diagram illustrating an example of the configuration of the control device 30 that controls the mask position. As shown in FIG. 5, the control device 30 is connected to, for example, a control unit of a motor provided on a mask stage driving unit and a roll 81 (see FIG. 9) on the film winding side. As shown in FIG. 5, the control device 30 includes a first image processing unit 31 connected to the meandering amount detection line CCD 14 of the alignment mark 2 a and a mask position detection line CCD 15 provided below the mask 12. A second image processing unit 32, a calculation unit 34, a memory 35, a motor drive control unit 36, a laser marker drive control unit 37, a mask stage drive control unit 38, and a control unit 39 are provided. . Further, as in a second embodiment to be described later, a meandering detection line CCD 14 of the alignment mark 2a is provided between the alignment laser marker 13 and the exposure light irradiation region, and the detection result of the line CCD 14 determines the alignment mark 2a. When the position of the alignment laser marker 13 is adjusted so as to cancel the meandering, and the alignment mark 2a is detected by another line CCD 16 provided at a position corresponding to the mask 12, the mask position is corrected. The third image processing unit 33 connected to the line CCD 16 is also provided.

  The first image processing unit 31 performs image processing of the alignment mark 2a picked up by the line CCD 14 for detecting the meandering amount of the alignment mark 2a, and intersects the moving direction of the film at the tip and end of each alignment mark 2a. Detect the position of the direction. The second image processing unit 32 performs image processing of the light shielding pattern 12b of the mask 12 imaged by the line CCD 15 for detecting the mask position, and detects the position of the light shielding pattern 12b in the direction intersecting the film moving direction. Based on these detection results, the calculation unit 34 calculates the displacement or meandering amount in the direction crossing the moving direction of each detection target film. In other words, in the present embodiment, the calculation unit 34 calculates the amount of the alignment mark 2a meandering in the direction intersecting the film moving direction at the position of the line CCD 14 based on the detection result of the first image processing unit 31. Based on the detection results of the first image processing unit 31 and the second image processing unit 32, the distance between the two is calculated from the position of the alignment mark 2 a and the position of the mask 12. The deviation from the distance between the two to be set is calculated based on the target positional relationship and the actual relative positional relationship between the two. The memory 35 stores, for example, the detection results of the first image processing unit 31, the second image processing unit 32, and the third image processing unit 33 and the calculation results of the calculation unit 34. The motor drive control unit 36 controls, for example, the rotation speed when the motor of the roll 81 on the film winding side is driven or stopped, or being driven. When the third image processing unit 33 is provided, the third image processing unit 33 performs image processing of the alignment mark 2 a captured by the line CCD 16 provided at a position corresponding to the position of the mask 12. The position of the alignment mark 2a in the direction intersecting the moving direction of the film at the tip and end is detected.

  The laser marker drive control unit 37 controls the drive of the alignment laser marker 13. For example, when the alignment laser marker 13 is configured to be movable as in a second embodiment described later, the laser marker drive control unit 37 follows the guide member 13 a. The movement direction and movement amount of the alignment laser marker 13 are controlled. The mask stage drive control unit 38 controls the drive of the mask stage 17, and can adjust the mask position by controlling the movement direction and the movement amount of the mask stage 17, for example. The control unit 39 controls the first to third image processing units 31, 32 and 33, the calculation unit 34, the memory 35, the motor drive control unit 36, the laser marker drive control unit 37, and the mask stage drive control unit 38. Thereby, the exposure apparatus 1 adjusts the position of the mask 12 (for example, the position of the alignment laser marker 13 in the second embodiment) in a direction that intersects the moving direction of the film, or rolls on the winding side, for example. The rotational speed of the motor provided at 81 can be controlled.

  Thereby, in this embodiment, for example, as shown in FIG. 1, when the film 2 meanders in a direction intersecting the moving direction, the line CCD 14 has the leading end portion and the terminal end portion for each alignment mark 2 a. The position in the direction crossing the film moving direction is detected. Then, the control device 30 calculates the meandering amount of the alignment mark 2a in the direction crossing the moving direction of the film based on the detection result, and corrects the position of the mask 12 so as to cancel the meandering based on the calculation result. To do. Therefore, in the present embodiment, even when the film meanders, the relative position of the mask 12 can be accurately determined with reference to the position of the alignment mark 2a, and the exposure target member can be continuously stably with high accuracy. Can be exposed. Further, the alignment mark 2a is formed without interruption in the moving direction of the film, and there is no section that cannot be measured by the line CCD 14, so that the accuracy of detecting the meandering amount of the alignment mark 2a is high.

  In the present embodiment, for example, a baking material, a photo-curable material, or ink is applied in a liquid or pasty state to an area used for film feeding or the like on the side of the film, and the side coating film 22 is applied. May be formed. As the baking material to be the side coating film 22, a material capable of forming a baking film on the film substrate 20 by baking (baking), for example, red, green for commonly used optical color filters, Blue and / or black resist materials can be suitably used. However, since the side coating film in the present invention is used only for the formation of alignment marks for detecting film meandering, in the case of forming the side coating film with a resist material, the steps such as development are performed. Not particularly necessary. Moreover, as a photocurable material, photocurable resin can be used, for example. Alternatively, when ink is applied to the material of the side coating film 22, all liquid or paste-like ink containing pigments and / or dyes can be used, and the solvent component is volatilized by the drying device 5. Thus, an ink capable of forming a film, for example, an oil-based ink can be preferably used. When the side coating film 22 is formed of a baking material or a photocurable material, the baking material or the photocurable material may be applied simultaneously with the exposure material by the slit coater 4 for applying the exposure material. It may be applied by a slit coater. In the case where the side coating film 22 is formed of ink, the film substrate is formed by a coating device provided upstream or downstream of the slit coater 4 in the moving direction of the film 2, that is, upstream of the drying device 5. Ink is applied to 20 sides. As the coating apparatus, for example, ink is permeated into a coating portion formed of a material having moderate flexibility, for example, a felt-like fiber, and exposure of the side portion of the film substrate 20 fed to the coating portion is performed. What is necessary is just to use the thing of the structure which apply | coats ink to a film | membrane form by making it contact to the area | region which does not apply | coat material.

In addition, it is preferable that these baking materials, photocurable materials, or inks are colored materials. That is, the side coating film 22 formed of colored ink, a colored photo-curable material, or a color filter resist material has a laser beam absorptivity when irradiated with laser light having a wavelength of 532 nm, for example. 90 to 98%, which is extremely higher than the film base material and the alignment film material (the absorption rate of the laser light is approximately 0% for both the film base material and the alignment film material), and the laser light from the alignment laser marker 13 Are easily marked by exposure or laser processing. Therefore, compared with the case where marking is performed by irradiating a colorless and transparent film substrate with laser light, marking with the laser light is easy, and the alignment mark 2a can be easily formed. For example, in the case where marking is performed on a film substrate, for example, when the laser light to be used is ultraviolet light having a wavelength of 266 nm, the irradiation energy of the laser light must be extremely large, for example, 8 J / cm ² . Formation is difficult. Further, when laser marking is performed on the alignment material film, the irradiation energy of the laser beam can be reduced as compared with the case of using only the film base material, but the alignment material film around the alignment mark 2a is also colorless and transparent. For example, it is necessary to use a detection apparatus such as an SEM, the cost of the exposure apparatus is slightly high, and the size of the apparatus is also slightly increased. However, when the side coating film 22 is formed of, for example, colored ink, for example, when the laser beam to be used is ultraviolet light having a wavelength of 532 nm, the laser beam irradiation energy is reduced to about 0.6 J / cm ^2. be able to. For example, when the side coating film 22 is formed of a color filter resist material, the laser beam irradiation energy can be reduced to about 1.0 J / cm ² . Therefore, by forming the side coating film 22 with a colored material as described above, marking with a laser beam is easy, and a colored coating film remains around the formed alignment mark 2a. Even when an inexpensive and small detection device such as a CCD camera is used, the formed alignment mark 2a can be detected easily and accurately. Therefore, since the alignment mark 2a formed with high accuracy can detect the meandering of the film 2 and adjust the position of the mask 12 with high accuracy, the film can be stably exposed.

  Next, the operation of the exposure apparatus of this embodiment will be described. First, before the film 2 is supplied to the exposure apparatus 1, an exposure material to be an alignment film (exposure material film 21) is applied to the center of the film substrate 20 by the slit coater 4 shown in FIG. . In the case where the side coating film 22 is formed on the side of the film 2, a baking material or a photocurable material is also applied as the material. Alternatively, when ink is applied as the material of the side coating film 22, the film base is formed by a coating device provided on the upstream side or the downstream side (upstream side of the drying device 5) of the slit coater 4 in the moving direction of the film. Ink is applied to at least one of both side edges (area from the edge to 25 mm) of the material. When the ink is applied, for example, the ink is applied to the surface of the film substrate 20 by bringing the ink infiltrated into an application portion formed of felt fiber or the like into contact with the surface of the film substrate 20. Apply in film form. As a result, a liquid or paste exposure material, and a resist material, a photocurable material, or an ink that becomes the side coating film 22 are applied to the surface of the film substrate 20 in a film form. These materials for forming the side coating film 22 are, for example, colored materials.

  Next, the film 2 is conveyed to the drying device 5, and the liquid or paste-like exposure material on the surface is dried. When a material to be a coating film is applied to the side portion of the film 2, each material is also dried (volatilization of a solvent component), photocured, and / or baked (by a drying device 5) according to the characteristics thereof. Bake). Thereby, the exposure material film 21 (alignment material film) and the side coating film 22 are formed on the surface of the film base. That is, a predetermined alignment material film is formed at the center in the width direction of the film substrate, and when the side coating film 22 is formed on the side part from the edge of the film substrate to 25 mm, On the side portion, an alignment mark and a meandering detection mark forming resist, a photocurable material, or a material film made of ink are formed. Then, the film 2 on which the one or two kinds of material films are formed is supplied into the exposure apparatus 1 from the front end portion thereof by, for example, the transport roller 9.

  The side of the film 2 supplied into the exposure apparatus 1 reaches below the alignment laser marker 13 by being conveyed by a conveying roller or the like. When the side portion of the film 2 reaches below the alignment laser marker 13, the formation of the alignment mark 2 a is started by irradiating laser light from the alignment laser marker 13. At this time, when the side coating film 22 such as a resist film is formed on the side of the film 2, the marking by the laser beam irradiation easily proceeds, and the alignment mark 2 a is also clearly and accurately formed. Therefore, it is preferable because detection in a later process becomes easy. The alignment mark 2a is formed on the film base material by the irradiation of the laser beam. The side portion of the film 2 is an area that is conventionally used for feeding the film 2, and is an image display area of the display device. Since this is an area that is not used, there is no problem.

  The film 2 on which the alignment mark 2a is formed reaches below the line CCD 14 for detecting the meandering of the alignment mark by conveyance. As shown in FIG. Due to the gap between the rollers 80 and 81 and the roll of the film, or the winding error of the film on the roll, etc., it may meander in the direction perpendicular to the moving direction exclusively on the downstream side of the moving direction. Then, the meandering on the downstream side in the moving direction of the film 2 is gradually transmitted to the upstream side. However, in the present embodiment, the position of the alignment mark 2a in the direction intersecting the moving direction of the film 2 is detected at the index position by the line CCD 14 arranged so as to extend in the direction perpendicular to the moving direction of the film 2, The control device 30 corrects the position of the mask 12 based on the detection signal. That is, the alignment mark position and mask position signals detected by the meandering detection line CCD 14 and the mask position detection line CCD 15 of the alignment mark 2a are transmitted to the control device 30, and each image processing unit (first image) is detected. After receiving processing by the processing unit 31, the second image processing unit 32), the calculation unit 34, the control unit 39, and the like, the mask stage 17 is driven under the control of the mask stage drive control unit 38, whereby the alignment mark 2a. The mask position is adjusted with reference to the position. Thus, in this embodiment, when the film 2 is continuously supplied and meanders in the direction perpendicular to the moving direction, the alignment mark 2a also meanders to follow the meandering of the film 2. The position of the mask 12 is directly adjusted by the amount of meandering. For example, as shown in FIG. 1, when the alignment mark 2a meanders to the left in FIG. 1, the control device 30 corrects the position of the mask 12 to the left in FIG. 1 so as to cancel this meandering amount.

  When the alignment mark 2a is detected by the line CCD 14, for example, as shown in FIG. 3, the line CCD 14 positions each alignment mark 2a in the direction intersecting the film moving direction of the leading end and the trailing end serving as an index. Is detected. At this time, depending on the arrangement of the alignment mark 2a, there may be a section that cannot be measured by the line CCD 14. However, for example, as shown in FIG. 2, two rows of alignment marks 2 a are arranged in a staggered manner, and the leading and trailing ends of the two rows of strip-shaped alignment marks 2 a intersect the moving direction of the film 2. If they are formed so as to overlap each other as seen from the direction in which they are formed, there is no section in which the alignment mark 2a cannot be measured by the line CCD 14, and detection accuracy of the meandering amount of the alignment mark 2a is increased.

  Thereafter, the film 2 reaches below the pattern 125 a of the mask 12. At this time, the alignment film material (exposure material film 21) on the surface of the film 2 is aligned in a predetermined direction by irradiation of exposure light emitted from the exposure light source and transmitted through the pattern 125a of the mask 12. Thereby, an exposure pattern is formed on the film 2. Then, by continuously transporting the film 2 while emitting continuous light from the exposure light source, an exposure pattern is formed on the film 2 so as to extend in a strip shape along the moving direction of the film. In the present embodiment, even when the film 2 is continuously exposed, even if the film 2 meanders, the position of the mask 12 is corrected by using the alignment mark 2a meandering following the meandering. Even when the film is continuously supplied, the alignment film material (exposure material film 21) can be continuously exposed stably with high accuracy.

  In the present embodiment, the exposure using one mask 12 has been described. However, like the conventional exposure apparatus 10 shown in FIGS. 11 and 12, the exposure apparatus 1 is provided with a plurality of masks 12. May be. That is, if a configuration for detecting the position of the alignment mark 2a such as a line CCD is provided at a position corresponding to each mask 12, and the configuration is such that the position of each mask 12 is adjusted based on this detection result, Similarly, highly accurate and stable continuous exposure can be performed. For example, as shown in FIG. 12, in the case where a plurality of masks 12 are arranged so as to be aligned in the moving direction of the film 2, for example, the exposure area by the upstream mask and the exposure area by the downstream mask are adjacent to each other. And an exposure pattern can be formed so that both may not overlap.

  Next, an exposure apparatus according to the second embodiment of the present invention will be described. FIGS. 6A to 6C are schematic diagrams showing correction of the alignment mark formation position in the exposure apparatus according to the second embodiment of the present invention, and FIG. 6D is a case where the position of the laser marker is not corrected. It is a schematic diagram which shows formation of the alignment mark in. FIG. 7 is a plan view showing an alignment mark forming part, a detecting part and a mask in the exposure apparatus according to the second embodiment of the present invention.

  In the first embodiment, the alignment laser marker 13 is provided at a fixed position. However, in this embodiment, the alignment laser marker 13 is perpendicular to the moving direction of the film 2 as shown in FIG. It is supported by a guide member 13a extending in a certain direction so as to be movable in a direction perpendicular to the moving direction of the film 2. The alignment laser marker 13 is configured to be able to appropriately adjust the formation position of the alignment mark 2a on the film 2 by being moved along the guide member 13a.

  In the present embodiment, the line CCD 14 is disposed between the alignment laser marker 13 and the irradiation region of the exposure light. Then, the amount of meandering in the direction intersecting the film moving direction of the alignment mark 2 a formed by the alignment laser marker 13 is detected by the line CCD 14. That is, also in this embodiment, as in the first embodiment, the line CCD 14 arranged so as to extend in the direction perpendicular to the moving direction of the film 2 uses the front end portion and the rear end portion of the alignment mark 2a as index positions. The position of the alignment mark 2a at this index position is detected. The line CCD 14 is connected to a control device 30 to be described later, and the meandering amount of the alignment mark 2a is calculated based on the position of the alignment mark 2a detected by the line CCD 14 in the control device 30. This embodiment is different from the first embodiment in that the control device 30 adjusts the position of the alignment laser marker 13 so as to cancel the meandering of the alignment mark 2a. Accordingly, in the present embodiment, as shown in FIG. 6B, when the alignment mark 2a meanders along with the meandering of the film 2, the position of the alignment laser marker 13 is set so as to cancel the meandering amount. In order to correct, the relative formation position of the alignment mark 2a with respect to the film 2 can be fixed as shown in FIG.

  That is, in the exposure apparatus that does not have a configuration for correcting the position of the laser marker as in the first embodiment, when the film meanders, as shown in FIG. And meandering relatively. On the other hand, in the present embodiment, even when the film meanders, the alignment mark 2a is formed relatively linear with respect to the film 2, so that the mask 12 is formed on the basis of the alignment mark 2a. By adjusting the position, it is possible to prevent meandering of the exposure region with respect to the film 2, and the exposure accuracy is further improved as compared with the first embodiment. However, it is necessary to provide a configuration such as an alignment mark detection line CCD 16 corresponding to each mask.

  Next, the operation of the exposure apparatus of this embodiment will be described. However, since the process up to the formation of the alignment mark 2a is the same as that of the first embodiment, the description is omitted. In the present embodiment, the film 2 on which the alignment mark 2a is formed reaches the lower side of the meander detection line CCD 14 by conveyance, but as it is conveyed, as shown in FIG. The film 2 meanders in the direction perpendicular to the moving direction, for example, on the downstream side in the moving direction due to a gap between the rollers 80 and 81 of the transport device and the roll of the film or an error in winding the film on the roll. There is a case. Then, the meandering on the downstream side in the moving direction of the film 2 is gradually transmitted to the upstream side. However, in the present embodiment, the position of the alignment mark 2a in the direction intersecting the moving direction of the film 2 is detected at the index position by the line CCD 14 arranged so as to extend in the direction perpendicular to the moving direction of the film 2, Based on the detection signal, the control device 30 corrects the position of the alignment laser marker 13. That is, when the alignment mark 2a meanders upward in FIG. 6B, the control device 30 corrects the position of the alignment laser marker 13 upward in FIG. 6B so as to cancel this meandering amount. Thereby, as shown in FIG. 6C, the alignment mark 2 a is formed so as not to move relative to the film 2.

  When the alignment mark 2a is detected by the line CCD 14, as in the first embodiment, for example, as shown in FIG. 3, the line CCD 14 has a film at the front and rear ends serving as an index for each alignment mark 2a. A position in a direction crossing the moving direction is detected. At this time, depending on the arrangement of the alignment mark 2a, there may be a section that cannot be measured by the line CCD 14. However, for example, as shown in FIG. 2, two rows of alignment marks 2 a are arranged in a staggered manner, and the leading and trailing ends of the two rows of strip-shaped alignment marks 2 a intersect the moving direction of the film 2. If they are formed so as to overlap each other as seen from the direction in which they are formed, there is no section in which the alignment mark 2a cannot be measured by the line CCD 14, and detection accuracy of the meandering amount of the alignment mark 2a is increased.

  The film 2 on which the alignment mark 2a is formed so that the relative position in the width direction of the film 2 is constant with respect to the film 2 eventually reaches the lower side of the mask 12 by conveyance. As shown in FIG. 8, the film 2 may meander in a direction perpendicular to the moving direction of the film 2 until it is conveyed below the mask. A configuration for correcting is provided. That is, the line CCD 15 is arranged at a position corresponding to the mask viewing window 12 a and the light shielding pattern 12 b so as to extend in the width direction of the film 2, and the line CCD 15 is provided in the middle of the viewing window 12 a of the mask 12. The position of the light shielding pattern 12b is detected as the position of the mask 12. An alignment mark detection line CCD 16 is provided at a position corresponding to the mask 12 viewing window 12a (and the light shielding pattern 12b) in the moving direction of the film 2, and is formed linearly on the side of the film 2. The position of the alignment mark 2a in the direction intersecting the moving direction of the film is detected. Signals of the mask position and alignment mark position detected by these line CCDs 15 and 16 are transmitted to the control device 30, and each image processing unit (second image processing unit 32, third image processing unit 33), calculation unit. 34, the mask position can be adjusted with reference to the position of the alignment mark 2a by driving the mask stage 17 under the control of the mask stage drive control unit 38. That is, in this embodiment, the alignment mark 2a is formed in a straight line relatively to the film 2, but by correcting the mask position with reference to the position of the alignment mark 2a, the mask 12 The position can also be adjusted so as not to move relative to the film 2.

  Thereafter, the film 2 reaches below the pattern 125 a of the mask 12. At this time, the alignment film material (exposure material film 21) on the surface of the film 2 is aligned in a predetermined direction by irradiation of exposure light emitted from the exposure light source and transmitted through the pattern 125a of the mask 12. Thereby, an exposure pattern is formed on the film 2. Then, by continuously transporting the film 2 while emitting continuous light from the exposure light source, an exposure pattern is formed on the film 2 so as to extend in a strip shape along the moving direction of the film. In the present embodiment, when the film 2 is continuously exposed, the meandering of the film 2 is continuously corrected, and the alignment mark 2a can be formed linearly relative to the film 2, Since the alignment mark 2a can be used to adjust the position of the mask 12 with high accuracy, the alignment film material (exposure material film 21) can be made highly accurate and stable even when the film 2 is continuously supplied. Can be continuously exposed, and the exposure area does not meander.

  DESCRIPTION OF SYMBOLS 1,10: Exposure apparatus, 12: Mask, 12a: Viewing window, 12b: Light shielding pattern, 120: Frame body, 121: (First) mask, 122: (Second) mask, 123: (Third ) Mask, 124: (fourth) mask, 125: pattern forming unit, 125a: (mask) pattern, 13: alignment laser marker, 14: (for detecting the meandering amount of the alignment mark) line CCD, 15: (mask position) (For detection) line CCD, 16: (for alignment mark detection) line CCD, 2: film, 2a: alignment mark, 2b: pattern, 20: exposure target member, 21: exposure material film, 22: side coating film, 30 : Control device, 31: first image processing unit, 32: second image processing unit, 33: third image processing unit, 34: calculation unit, 35: memory, 36: motor drive control unit 37: laser marker drive control unit, 38: a mask stage drive control unit, 39: control unit, 100: a region corresponding to the image display area

Claims (6)

Exposure that exposes the mask pattern to the exposure pattern forming area by irradiating the exposure pattern forming area of the exposure target member continuously conveyed by the conveying device through the mask with the exposure light emitted from the exposure light source. In the device
An alignment mark forming section that is disposed upstream of the exposure light irradiation position in the movement direction of the exposure target member and forms an alignment mark on the exposure target member that is intermittently marked with respect to the movement direction; ,
A first detector that is arranged to correspond to the irradiation position of the exposure light in the movement direction of the exposure target member and detects a position of the alignment mark at the index position in a direction intersecting the movement direction of the exposure target member; ,
A first meandering calculation unit for calculating a meandering amount of the alignment mark based on the position of the alignment mark at the index position detected by the first detection unit;
A first controller that adjusts the position of the mask in a direction perpendicular to the moving direction of the exposure target member according to the meandering amount of the alignment mark obtained by the first meandering unit;
An exposure apparatus comprising: Exposure that exposes the mask pattern to the exposure pattern forming area by irradiating the exposure pattern forming area of the exposure target member continuously conveyed by the conveying device through the mask with the exposure light emitted from the exposure light source. In the device
Arranged to be movable in the direction perpendicular to the moving direction of the exposure target member upstream of the exposure light irradiation position in the moving direction of the exposure target member, and intermittent to the moving direction of the exposure target member An alignment mark forming part for forming an alignment mark with a typical index;
The position of the alignment mark at the index position in the direction intersecting the moving direction of the exposure target member is arranged between the alignment mark forming portion in the moving direction of the exposure target member and the irradiation position of the exposure light. A second detector that
A second meandering calculation unit for calculating a meandering amount of the alignment mark based on the position of the alignment mark at the index position detected by the second detection unit;
A second control unit that moves the alignment mark forming unit so as to cancel the meandering amount of the alignment mark obtained by the second meandering calculation unit;
An exposure apparatus comprising: A third detector that is disposed downstream of the second detector in the movement direction of the exposure target member and detects a position of the alignment mark in the index position in a direction intersecting the movement direction of the exposure target member;
A third meandering calculation unit for calculating a meandering amount of the alignment mark based on the position of the alignment mark at the index position detected by the third detection unit;
A third control unit that adjusts the position of the mask in a direction perpendicular to the moving direction of the exposure target member in accordance with the meandering amount of the alignment mark obtained by the third meandering calculation unit;
The exposure apparatus according to claim 2, further comprising: The alignment mark is intermittently formed in the movement direction of the exposure target member, and is formed in two rows of strip marks, as viewed from the direction intersecting the movement direction, 4. The exposure apparatus according to claim 1, wherein rear end portions are arranged so as to overlap each other, and the index is a front end and a rear end of each mark. The alignment mark is formed by intermittently forming a band-shaped mark that is inclined in the same direction with respect to the moving direction of the exposure target member, and the index is a front end and a rear end of each mark. The exposure apparatus according to any one of claims 1 to 3. The exposure apparatus according to claim 1, wherein the alignment mark is formed continuously, and the index is provided intermittently on the alignment mark.

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