JP5688637B2 - Exposure method and exposure position confirmation method - Google Patents

Description

  The present invention relates to an exposure method such as a glass substrate and a polarizing film used in a display device such as a liquid crystal display and a method for confirming an exposure position. The present invention relates to an exposure method for easily confirming an exposure position and a method for confirming an exposure position when exposing the exposure pattern forming region simultaneously or successively.

  Conventionally, when an alignment film or the like is formed on a glass substrate or film substrate such as a liquid crystal display, an exposure target member such as a glass substrate or film on which a material film such as an alignment material film is formed on the surface is exposed. By supplying to an apparatus and exposing an alignment material film, photo-alignment is performed in a predetermined direction.

  In this exposure apparatus, the exposure light emitted from the exposure light source through a predetermined optical system is irradiated through the pattern of the light transmission region of the mask. When the exposure target member is a glass substrate, for example, glass The substrate is placed on a movable stage, and is transported to the exposure light irradiation region by moving the stage. Then, the alignment material film formed on the glass substrate is photo-aligned by exposure corresponding to the mask pattern to form a predetermined exposure region. Alternatively, when the exposure target member is a flexible member such as a film, exposure by a roll-to-roll method as shown in FIG. 6 is performed, for example. That is, as shown in FIG. 6, the film to be exposed is wound and conveyed in a roll shape between each process until the film is processed into a film as a product. When the film is supplied to the exposure apparatus 10, a film roll is coaxially attached to the supply-side roller 80, and the film is sequentially wound from the leading end by the winding-side roller 81. Then, as shown in FIG. 6, between the supply side roller 80 and the take-up side roller 81, the exposure apparatus 10 is passed through, for example, exposure light is applied to the alignment material film formed on the surface of the film. Continuous irradiation is performed to expose a predetermined exposure area of the film along the moving direction of the film. The film is stretched around, for example, a transport roller 9 and is transported between the devices by the rotation of the transport roller.

  Recently, a display device such as a 3D (Three Dimensional) liquid crystal display has been attracting more and more attention. On the surface of an exposure target member 2 such as a glass substrate or a polarizing film used in this display device. When forming an alignment film, for example, a region corresponding to one pixel or one picture element is divided into, for example, two in the width direction, and an alignment film having a different alignment direction is formed for each divided region. Accordingly, display light having two types of pretilt angles can be transmitted in an area corresponding to the same pixel or picture element, and the viewing angle of the display device can be widened. It can be used as display light for the right eye and left eye. In this way, an exposure apparatus that divides an exposure target region and aligns the alignment films formed in different directions is called an alignment division method.

  FIG. 7 shows, as an example, a conventional exposure apparatus of a type in which exposure light sources 11 that emit exposure light are arranged to face each other corresponding to one mask 12 and irradiate exposure light from different directions. FIG. As described above, in the alignment division type exposure apparatus, one alignment region is divided, and the alignment material film is aligned in different directions by irradiating each division region with exposure light from different directions. Can do.

  FIG. 8A is a view showing, as an example, the arrangement of exposure target members and masks when a conventional alignment division type exposure apparatus is used, and FIG. 8B is a mask used in this alignment division type exposure apparatus. It is a figure which shows as an example. As shown in FIG. 8A, a plurality of glass substrates or polarizing films are manufactured from one exposure target member 2, and a plurality of (for example, 3 rows × 3 columns) are formed on the substrate. An alignment material film 21 is formed in the exposure pattern formation region. The mask 12 is provided in such a size as to cover a region to be a plurality of (for example, 2 rows × 3 columns) glass substrates or polarizing films. As shown in FIG. 8B, the pattern forming portion 125 of the mask 12 is provided with a plurality of light transmission region patterns 125a extending in one direction in parallel with each other. Areas corresponding to a plurality of glass substrates or polarizing films are exposed simultaneously. Each pattern 125a is formed to be spaced from each other at intervals corresponding to pixels or picture elements, and each pattern 125a is formed to have a width corresponding to half of one pixel or half of one pixel. Yes. As shown in FIG. 8A, in this exposure apparatus, after exposing a region of one pixel or half of one picture element, irradiation of exposure light is temporarily stopped, and an unexposed portion of the exposure target member 2 is exposed. After the mask 12 is moved so that the exposure light is irradiated, the exposure light is irradiated again from different irradiation angles for exposure. Thereby, alignment films 21a having different alignment directions can be formed so as to be adjacent to each other (FIG. 9A). In the drawing, the oblique lines in the alignment film 21a indicate the alignment directions of the alignment film 21a. When a plurality of glass substrates or polarizing films are manufactured from a single exposure target member 2, the region where the alignment film 21a is formed is aligned in the width direction and / or the length direction of the exposure target member 2. (FIG. 10). A region between each exposure pattern formation region is a non-pattern formation region where a material film is not formed or is not exposed.

  FIG. 11A is a view showing the arrangement of exposure target members and masks when another alignment division type exposure apparatus is used. In this exposure apparatus, two masks 12 are provided for each region to be a glass substrate or a polarizing film. That is, as shown in FIG. 11A, each mask 12 is provided with a size that covers a region that becomes one glass substrate or a polarizing film in the column direction. A plurality of mask patterns 125a are formed with a width corresponding to half of one pixel or half of one picture element, and are separated from each other at intervals corresponding to one pixel or one picture element. The mask 12 is arranged so that the pattern formed by one mask 121 is adjacent to the pattern formed by the other mask 122, and is different from the exposure light source 11 provided corresponding to each mask 12. The exposure light having an angle is emitted, and the exposure light is transmitted through the respective masks 12 from different directions. Then, the exposure target member 2 is continuously supplied to the irradiation region of the exposure light and continuously exposed to form a pattern in a strip shape along the moving direction of the exposure target member 2. Thus, as in the above case, alignment films 21a having different alignment directions can be formed adjacent to each other (FIG. 11B).

  FIG. 12 is a view showing the arrangement of exposure target members and masks when still another alignment division type exposure apparatus is used. Also in this exposure apparatus, the exposure object member 2 is continuously supplied into the exposure apparatus. Two masks 12 are arranged on each of the upstream side and the downstream side in the moving direction of the exposure target member 2. As described above, the arrangement in which a plurality of masks 12 are arranged on the upstream side and the downstream side in the moving direction of the exposure target member 2 cannot make the size of the mask 12 larger than the area to be a glass substrate or a polarizing film. This is suitable when the exposure target member 2 is a member such as a film that undulates during conveyance. That is, by configuring so that the position of each mask 12 can be adjusted according to the undulation of the film or the like, the influence of the deviation of the exposure position due to the undulation can be reduced. FIG. 13 shows a modification of the exposure apparatus shown in FIG. As shown in FIG. 13, in this exposure apparatus, masks 121 and 122 and masks 123 and 124 are arranged on the upstream side and the downstream side in the moving direction of the exposure target member 2, respectively, and are arranged apart from each other. The film 2 is exposed in the exposure areas A and C with the upstream masks 121 and 122, and the area B between the exposure areas A and C is exposed with the mask 123 on the downstream side, and the area D adjacent to the exposure area C Is exposed by a mask 124. Thereby, the pattern which carried out the orientation division | segmentation can be accurately formed in the substantially whole surface of the area | region used as the glass substrate of the exposure object member 2, a polarizing film, etc.

  In the above-described conventional exposure apparatus, the alignment film 21a is formed by exposure at most twice (in the case of step exposure as shown in FIG. 8) in an area that becomes a glass substrate or a polarizing film for a single display device. be able to. On the other hand, for example, Patent Document 1 discloses a technique in which exposure is performed while shifting one mask 12 on which a periodic pattern is formed by shifting the pattern interval, and the exposure light is divided several times by dividing the irradiation energy. It is disclosed that the joint formed at the boundary between adjacent patterns can be made inconspicuous by irradiation.

JP 2000-208410 A

  However, the above prior art has the following problems. In the technique of Patent Document 1, it is necessary to perform exposure at least as many times as the number of patterns on one exposure target member 2, and productivity is extremely low.

  In addition, since the exposure target member 2 and the alignment film are usually formed of a material having a very high light transmittance, for example, due to a shift of the mask position, FIG. 9B, FIG. 11C, and FIG. As shown in FIG. 12 (c), it is difficult to visually recognize when the adjacent exposure regions are overlapped and exposed and when an unexposed portion remains. Therefore, it is not possible to confirm the overlap of the exposed areas or the presence or absence of the unexposed areas until the glass substrate or the polarizing film is assembled into a liquid crystal display to be modularized and the liquid crystal is actually driven. In addition, when there is a poorly exposed region, there is a problem that the entire modularized display device is wasted.

  The present invention has been made in view of such problems, and when exposing an exposure pattern forming region in a plurality of times, or when exposing a plurality of exposure pattern forming regions simultaneously or continuously, It is an object of the present invention to provide an exposure method and an exposure position confirmation method in which the exposure position can be easily confirmed.

An exposure method according to the present invention irradiates an exposure target member having an exposure pattern formation region and at least a part of a non-pattern formation region around the exposure pattern formation region through a mask. In the exposure method for exposing the mask pattern on the mask to the exposure pattern formation region, a plurality of the exposure pattern formation regions are formed on the exposure target member. The non-pattern forming region is formed, and a photochromic material that changes color by irradiation of the exposure light is applied to a region on the extension of the exposure pattern in the non-pattern forming region, or the color is changed by irradiation of the exposure light. When the exposure target member is irradiated with the exposure light transmitted through the mask, the exposure pattern forming region is attached. Besides, characterized in that also discolor it by irradiating the photochromic material or the photochromic member.

  It is preferable that the photochromic material or the photochromic member has a different degree of color change depending on, for example, the number of irradiation times and / or the irradiation time of the exposure light.

  For example, when simultaneously exposing two or more exposure pattern forming regions of the exposure target member, the photochromic material or the photochromic member is applied to a non-pattern forming region between the exposure pattern forming regions to be exposed.

  Alternatively, in the above-described exposure method, for example, a plurality of exposure pattern forming regions arranged in the moving direction of the exposure target member by moving the exposure target member in one direction while continuously transmitting the exposure light through the mask. In this exposure method, the photochromic material or the photochromic member is applied to a non-pattern forming region between the pattern forming regions arranged in the moving direction of the exposure target member.

  The method for confirming the exposure position according to the present invention is a method for confirming the exposure position in the exposure target member exposed by the above-described exposure method, wherein the photochromic material or the photochromic member changed in color by irradiation with the exposure light. The exposure position in the exposure pattern formation region is confirmed by the color change.

  The exposure method according to the present invention uses an exposure target member having an exposure pattern formation region and a non-pattern formation region in at least a part of its periphery, and extends the exposure pattern in the non-pattern formation region of the exposure target member. When a photochromic material that changes color by irradiation of exposure light is applied to a certain area, or a photochromic member that changes color by irradiation of exposure light is applied, and the exposure light transmitted through the mask is irradiated to the exposure target member, In addition to the exposure pattern formation region, the photochromic material or photochromic member is also irradiated to change the color. Therefore, the exposure position in the exposure pattern forming region can be easily confirmed by the color change of the photochromic material or the photochromic member.

  Therefore, the exposure position confirmation method according to the present invention facilitates confirmation of the exposure position.

  In addition, according to the exposure method and the exposure region confirmation method of the present invention, the overlapping of exposure positions can be achieved without actually assembling a glass substrate or a polarizing film on a display device such as a liquid crystal display and actually driving the liquid crystal. Alternatively, the presence or absence of exposure failure such as an unexposed area can be confirmed, and the display device is not wasted.

(A) is a diagram showing an exposure method according to the first embodiment of the present invention, (b) is an enlarged view of part A in FIG. 1 (a), and (c) is a case where overlapping exposure positions and unexposed areas occur. FIG. It is a figure which shows a mask as an example. It is a figure which shows as an example the control apparatus which controls the position of an alignment mark formation part, and a mask position. (A) is a diagram showing an exposure method according to the second embodiment of the present invention, (b) is an enlarged view of part B of FIG. 4 (a), and (c) is a case where overlapping exposure positions and unexposed areas occur. FIG. In the exposure apparatus which concerns on 2nd Embodiment of this invention, it is a figure which shows correction | amendment of a mask position as an example. It is a schematic diagram which shows the exposure of the film by the conventional roll toe roll system as an example. It is a figure which shows as an example the exposure apparatus of the structure which has arrange | positioned several light sources in the moving direction of a film. (A) is a figure which shows as an example the arrangement | positioning of the exposure object member and mask at the time of using the conventional alignment division type exposure apparatus, (b) shows the mask used with this alignment division type exposure apparatus as an example. FIG. (A) is a figure which shows the alignment film formed with the mask of FIG.8 (b), (b) is a schematic diagram which shows the alignment film when the overlap of an exposure position and an unexposed area generate | occur | produce. (A) And (b) is a figure which shows the exposure area | region of the film by an exposure apparatus as an example. (A) is a figure which shows as an example the arrangement | positioning of an exposure object member and a mask at the time of using the other conventional exposure apparatus of orientation division | segmentation system, (b) shows the alignment film formed with the mask of Fig.11 (a). FIG. 4C is a schematic diagram showing an alignment film when an overlap of exposure positions and an unexposed area occur. (A) is a figure which shows as an example the arrangement | positioning of an exposure object member and a mask at the time of using the other conventional exposure apparatus of orientation division | segmentation system, (b) shows the alignment film formed with the mask of Fig.12 (a). FIG. 4C is a schematic diagram showing an alignment film when an overlap of exposure positions and an unexposed area occur. It is a figure which shows the modification of the exposure apparatus of FIG.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the first embodiment, two or more exposure pattern forming regions of the exposure target member 2 are simultaneously exposed. FIG. 1A is a view showing an exposure method according to the first embodiment of the present invention, FIG. 1B is an enlarged view of a portion A in FIG. 1A, and FIG. It is the A section enlarged view which shows the case where an exposure area | region generate | occur | produces. FIG. 2 is a diagram showing an example of a mask in the present embodiment. As shown in FIG. 1A, in this embodiment, an alignment material film 21 is formed in an exposure pattern forming region of 3 rows × 3 columns on the surface of the exposure target member 2, and the mask 12 is The light transmitting region pattern 125a of the mask 12 is provided in a size that covers the region where the alignment material film 21 of 2 rows × 3 columns is formed, and a plurality of patterns 125a extend in the row direction of the exposure pattern formation region. The books are formed so as to be parallel to each other. Then, the alignment material film 21 of 2 rows × 3 columns is simultaneously exposed by the mask 12. In the present invention, a photochromic material that changes color by irradiation of exposure light is applied to an area on the extension of an exposure pattern in a non-pattern formation area, or a photochromic member that changes color by irradiation of exposure light is attached to light. When forming the color changing region 22 and irradiating the exposure target member with the exposure light, in addition to the exposure pattern forming region, the light changing region 22 is also irradiated to change the color. In the present embodiment, the photochromic region 22 is formed in a non-pattern forming region between rows of the alignment material film 21 arranged in three columns. That is, the photochromic region 22 is formed in a region between the alignment material films 21 that are simultaneously exposed by at least one pattern 125a, and the color is changed by irradiation of exposure light transmitted through the pattern 125a to confirm the exposure position. Used for. FIG. 1A shows the case where the alignment film 21a is formed only in the region of one pixel or one pixel in the column direction among the exposure regions exposed by the mask 12. FIG.

  In the exposure apparatus 1 according to the present embodiment, the exposure light source 11 that emits exposure light, the mask 12, and the exposure light emitted from the exposure light source 11 are masked 12 as in the conventional exposure apparatus shown in FIGS. And an optical system for irradiating the film 2 through the film 2 and a film transport unit such as a transport roller for transporting the film 2, and the exposure light source 11 by an optical system such as a collimator lens and / or a reflecting mirror. The exposure light emitted from is irradiated to the exposure target member 2 of the glass substrate or film on which the alignment material film 21 is formed through the mask 12, and the alignment material film 21 is photo-aligned corresponding to the mask pattern. Thus, the alignment film 21a is formed. When the exposure target member 2 is a glass substrate, the glass substrate is placed on a movable transfer device such as a transfer stage and transferred, and the alignment material film 21 in the pattern formation region is arranged at the exposure light irradiation position. In the exposure, the conveyance is stopped. Alternatively, when the exposure target member is a film, the film 2 supplied from the supply-side roller 80 is wound while maintaining the tension state of the film by the take-up roller 81 by the roll-to-roll method, as in the conventional case. In the meantime, the alignment material film 21 in the pattern formation region is formed at the exposure light irradiation position, and the conveyance is stopped during the exposure. As the film transport device, for example, one or more film transport rollers 9 are disposed between the two rollers 80 and 81, and each of the transport rollers 9 is driven by a motor, for example. . In the present embodiment, the case where the exposure target member 2 is a glass substrate will be described, but even when the exposure target member 2 is a film, the configuration is the same as that of the present embodiment except for the configuration of the transport device.

  The exposure light source 11 is, for example, a light source that emits ultraviolet light. For example, a mercury lamp, a xenon lamp, an excimer lamp, an ultraviolet LED, or the like, and a light source that emits continuous light or pulsed laser light is used. In the present embodiment, an optical system such as a collimator lens and / or a reflecting mirror is disposed on the optical path of the exposure light emitted from the exposure light source 11, for example, forming an exposure pattern on the glass substrate 20 to be exposed. The alignment material film 21 formed in the use region is configured to be irradiated with exposure light with a predetermined light amount. The exposure light source 11 can adjust the emission direction of the exposure light by, for example, a control device (not shown), and can thereby adjust the incident angle of the exposure light with respect to the exposure target member 2.

  As shown in FIG. 2, the mask 12 includes, for example, a frame body 120 and a pattern forming portion 125 at the center thereof, and a pattern 125 a of a predetermined light transmission region is formed in the pattern forming portion 125. That is, in the pattern forming portion 125, an opening that transmits exposure light is formed corresponding to the pattern shape formed on the film 2, or a light transmissive member is installed. This pattern 125a is composed of a plurality of light transmission regions extending in the row direction of the exposure pattern forming region, for example, as in the conventional mask, and each pattern 125a is mutually spaced at intervals corresponding to pixels or picture elements. The patterns 125a are spaced apart from each other and have a width corresponding to half the width of one pixel or half of one picture element. Then, the mask pattern is exposed to the alignment material film 21 on the surface of the exposure target member 2 by the transmitted light of the pattern 125a. As described above, in this embodiment, the alignment material film 21 of 2 rows × 3 columns is simultaneously exposed by one mask 12.

  In the present embodiment, the mask 12 is provided with a viewing window 12a for a line CCD having a width of about 300 μm and a length of about 250 mm at a position different from the pattern 125a, and the longitudinal direction of the viewing window 12a. A linear light shielding pattern 12b having a width of, for example, about 15 μm is provided in the middle of the light. Under the mask 12, for example, a line CCD 15 for detecting the mask position is provided. The position of the light shielding pattern 12b can be detected by the line CCD 15 and used for position adjustment of the mask 12. Note that the positions and shapes of the viewing window 12a and the light shielding pattern 12b in the present embodiment are examples, and the present invention is not limited by these positions and shapes. For example, instead of the light shielding pattern 12b, a plurality of slits that intersect with each other (for example, in an N-type) may be provided. Further, as long as the position adjustment of the mask 12 can be performed with high accuracy, these configurations may not be provided.

  For example, a portion of the frame 120 of the mask 12 is supported by a mask stage 17 (see FIG. 7), and the entire mask 12 is configured to be movable by the movement of the mask stage 17. The mask stage 17 is connected to a control device 30 as shown in FIG. 3, for example, and the position thereof is controlled, for example, in the horizontal direction (the row direction of the glass substrate 20 or the row direction of the glass substrate 20). And in the row direction). Thereby, the exposure position of the alignment material film 21 by the mask 12 can be adjusted in the horizontal direction. The mask stage 17 is movable in the vertical direction, for example, and is configured to be adjusted so that the alignment material film 21 on the glass substrate 20 is exposed with a predetermined size.

  FIG. 3 is a diagram showing an example of the configuration of the control device 30 that controls the mask position. As shown in FIG. 3, the control device 30 is connected to, for example, a mask stage driving unit and a motor control unit provided on a roller 81 on the film winding side. The control device 30 detects the position of the first image processing unit 31 connected to the mask CCD 15 for detecting the mask position provided below the mask 12 and the alignment mark 2a described later in the modification of the second embodiment. A second image processing unit 32 connected to the line CCD 14, a motor drive control unit 33, a calculation unit 34, a memory 35, a mask stage drive control unit 36, and a control unit 37 are provided.

  The first image processing unit 31 performs image processing of the light shielding pattern 12b of the mask 12 imaged by the line CCD 15 for detecting the mask position, and detects the position of the light shielding pattern 12b in the column direction of the exposure pattern forming region. The second image processing unit 32 performs image processing of the alignment mark 2a picked up by the alignment mark detection line CCD 14, and detects the position of the alignment mark 2a in the column direction of the exposure pattern forming region. For example, when the exposure target member 2 is a film, the motor drive control unit 33 controls the rotation speed when the motor of the roll 81 on the winding side is driven or stopped, or is driven. The calculation unit 34 calculates the displacement or meandering amount of each detection target based on the mask position detected by each line CCD, or the mask position and the position of the alignment mark 2a. That is, the calculation unit 34 calculates the deviation from the position where the mask 12 should be set, based on the detection result of the first image processing unit 31. When the alignment mark 2 a is formed on the exposure target member 2, the calculation unit 34 determines the relative value between the two to be set based on the detection results of the first image processing unit 31 and the second image processing unit 32. The deviation from the distance to be set is calculated based on the positional relationship and the actual relative positional relationship between the two. For example, the memory 35 stores the detection results of the first image processing unit 31 and the second image processing unit 32 and the calculation result of the calculation unit 34.

  The mask stage drive control unit 36 controls the driving of the mask stage 17 and can adjust the mask position by controlling the moving direction and the moving amount of the mask stage 17, for example. The control unit 37 controls the first and second image processing units 31 and 32, the motor drive control unit 33, the calculation unit 34, the memory 35, and the mask stage drive control unit 36. Thereby, the exposure apparatus 1 adjusts the position of the mask 12, for example, in the column direction of the exposure pattern formation region, or the motor provided on the roller 81 on the take-up side when the exposure target member 2 is a film. It is comprised so that rotation speed etc. of this can be controlled.

  In this embodiment, the glass substrate 20 to be exposed is supplied to, for example, the slit coater 4 before being supplied to the exposure apparatus 10, and the slit coater 4 has a photo-alignment property in a predetermined region on the surface of the glass substrate 20. The material is applied in the form of a film. The glass substrate 20 to which the material is applied is supplied to, for example, the drying device 5, and the photo-alignment material is dried or baked by the drying device 5. Thereby, an alignment material film 21 is formed in a predetermined region on the surface of the glass substrate 20.

  Further, in the present embodiment, the slit coater 4 is configured such that the photochromic region 22 can be formed by applying a photochromic material to the non-pattern forming region between the rows of the alignment material films 21 arranged in three columns, for example. Yes. Alternatively, the photochromic material is applied by another application device different from the slit coater 4 that applies the photo-alignment material. When the photochromic region 22 is formed by pasting a photochromic member that changes color by exposure light exposure, the photochromic member is pasted by, for example, a pasting device before being supplied to the exposure apparatus.

  In the present embodiment, as the photochromic material constituting the photochromic region 22, for example, a general photochromic material can be used. Examples of the photochromic material include azobenzene and diarylethene. Then, a liquid or paste-like material containing these components is applied to the non-pattern forming region between the alignment material films. When the photochromic region 22 is formed of a photochromic member, a tape or sheet-like member such as a UV label that changes color by irradiation with exposure light such as ultraviolet light can be used as the photochromic member. In the non-pattern forming region, by forming the photo-discoloring region 22 that changes color by exposure light exposure, an unexposed region in the pattern forming region can be confirmed. That is, in the present embodiment, the photochromic region 22 is formed in a region between the alignment material films 21 that are simultaneously exposed by at least one pattern 125a, and therefore corresponds to a region where the photochromic region 22 is not discolored. It can be determined that the alignment material film 21 in the pattern forming region to be unexposed.

  As the photochromic material and the photochromic member, it is preferable to use materials having different degrees of discoloration depending on the number of exposure light irradiations and / or the irradiation time. That is, when exposure light is irradiated to the photochromic region 22 a plurality of times, it can be visually recognized that the degree of color change is different, so that the overlapping of exposure positions, the number of exposures, and the like can be determined.

  Next, the operation of the exposure apparatus of this embodiment will be described. First, before the glass substrate 20 to be exposed is supplied to the exposure apparatus 1, an alignment material film 21 is formed, and a photochromic material that becomes the photochromic region 22 is applied, or a photochromic member is formed. Affixed. That is, the glass substrate 20 is supplied to the slit coater 4 in a state where no exposure material film is applied on the surface, and a material to be the alignment material film 21 is applied by the slit coater 4. In the present embodiment, the slit coater 4 applies the material to be the alignment material film 21 in three rows in the row direction by conveying the glass substrate 20, and intermittently repeats this three times to thereby apply the material application region. Are formed in three rows in the row direction. In addition, when the slit coater 4 is configured to be able to apply a liquid or paste-like photochromic material, the slit coater 4 is provided with a photochromic material in a non-pattern forming region between rows of alignment film materials arranged in three columns. Also apply.

  Alternatively, when the coating device for the photochromic material is provided separately from the slit coater 4, the coating device is used to coat the photochromic material in the non-pattern forming region between the rows of the alignment film materials arranged in three columns. . Thereby, a liquid or paste-like alignment film material and a photochromic material are applied to the surface of the glass substrate 20.

  The glass substrate 20 on which the predetermined exposure material is applied is conveyed to the drying device 5, and the liquid or paste exposure material on the surface is dried. Thereby, an alignment material film 21 and a photochromic region 22 made of a photochromic material are formed on the surface of the glass substrate 20. That is, on the glass substrate 20, an exposure pattern forming region made of the alignment material film 21 is formed in 3 rows × 3 columns, and in the non-pattern forming region between the rows of the alignment material films 21 arranged in 3 columns, the photochromic color is changed. A photochromic region 22 made of a material is formed. Note that the photochromic material may be applied after the alignment film material is dried by the drying device 5 when the photochromic material does not need to be dried and when the photochromic property changes due to drying. In the case where the photochromic region 22 is formed by a photochromic member that changes color by irradiation with exposure light, a tape or sheet-like UV is formed in the non-pattern forming region between the alignment film material rows before being supplied to the exposure apparatus. Affix a member such as a label.

  Then, the glass substrate 20 on the surface of which the exposure pattern forming region composed of the alignment material film 21 of 3 rows × 3 columns and the photochromic region 22 between the rows is formed is placed on a transport device such as a transport stage, for example. It is supplied into the exposure apparatus 1. The glass substrate 20 is disposed below the mask 12 by the conveyance by the conveyance device. In the present embodiment, the mask 12 is formed to have a size covering a region where the alignment material film 21 of 2 rows × 3 columns is formed, and 2 rows × 3 columns on the glass substrate 20 below the mask. The alignment material film 21 is disposed.

  When the glass substrate 20 is transported to a predetermined position, exposure light is emitted from the exposure light source 11, and the exposure light is transmitted through the pattern 125 a of the mask 12 shown in FIG. 2 to irradiate the alignment material film 21 on the glass substrate. , Expose this. In the present embodiment, a photochromic region 22 is formed in a region between the alignment material films 21 that are simultaneously exposed by one pattern, and the transmitted light of the pattern 125a is also irradiated to this photochromic region. Thereby, the alignment material film 21 is photo-aligned in the irradiation region of the exposure light, and the alignment film 21a having a specific alignment direction according to the irradiation angle of the exposure light is formed. Further, the photochromic material or the photochromic member in the photochromic region 22 exhibits a specific color change, for example, depending on the exposure time of the exposure light when irradiated with the exposure light. For example, the photochromic region 22 is composed of a colored photochromic material or a photochromic member, and the color becomes lighter as the exposure light irradiation time is longer. Alternatively, the photochromic region 22 is composed of a colorless photochromic material or a photochromic member, and exhibits a specific color when exposed to exposure light. The longer the exposure light irradiation time, the darker the color. In order to facilitate the confirmation of the exposure region, the material or member constituting the photochromic region 22 preferably has the latter color change characteristic.

  In the present embodiment, once the exposure is performed for a predetermined time, the exposure light exposure is temporarily stopped. Then, for example, by moving the mask stage 17, the mask 12 is moved in the column direction as shown in FIG. In the present embodiment, the patterns 125a of the mask 12 are separated from each other at intervals corresponding to pixels or picture elements, and the width of each pattern 125a corresponds to half of one pixel or half of one picture element. It is formed with a width. Therefore, the alignment film 21a corresponding to the width of one pixel or half of one pixel is formed by the first exposure, and each alignment film 21a is separated by one pixel half or one pixel half. ing. Therefore, the mask 12 is moved in the column direction by a distance corresponding to half of one pixel or half of one picture element. The exposure light source 11 is adjusted so that, for example, the exposure light is emitted from a direction different from the first emission direction. In the present embodiment, the alignment film may be formed so that the alignment direction of the alignment film formed by the first exposure differs from the alignment direction of the alignment film formed by the second exposure. Therefore, as described above, in addition to the aspect in which the emission direction of the exposure light is changed, for example, in each of the first exposure and the second exposure, the exposure light applied to the alignment material film 21 is exposure light having different polarization directions. In this way, alignment films having different alignment directions can be formed. For example, an alignment film similar to that of this embodiment can be obtained without changing the emission direction of exposure light.

  When the movement of the mask 12 and the adjustment of the emission angle of the exposure light are completed, the emission of the exposure light from the exposure light source 11 is resumed, and the exposure light is transmitted through the pattern 125a of the mask 12 shown in FIG. The alignment material film 21 is exposed. At this time, the transmitted light of the pattern 125a is also irradiated to the photochromic region 22 formed in the region between the alignment material films 21 exposed simultaneously by one pattern. Thereby, as shown in FIG.1 (b), the unexposed area | region adjacent to the alignment film 21a formed by the 1st exposure is exposed, and the alignment film 21a orientated in the direction different from the 1st exposure is obtained. It is formed. The photochromic region 22 between the rows of the exposure pattern forming region also changes color at a position corresponding to the alignment film 21a formed in the exposure pattern forming region.

  In this embodiment, the mask 12 is moved between the first exposure and the second exposure. When this position is shifted, the irradiation position of the exposure light transmitted through the pattern 125a of the mask 12 is also shifted. End up. Therefore, as shown in FIG. 1C, overlapping exposure positions and / or unexposed areas occur. Since the exposure target member 2 such as the glass substrate 20 and the alignment film 21a are formed of a material having a very high light transmittance, for example, a mask position shift or the like occurs, and FIG. 9B and FIG. ) And the overlap of exposure positions and / or unexposed areas as shown in FIG. 12C are difficult to visually recognize. In the conventional exposure method, even if such an exposure failure occurs, the exposure target member 2 such as a glass substrate or a polarizing film is assembled into a liquid crystal display, modularized, and the exposure position overlaps or until the liquid crystal is actually driven. There is a problem in that it is impossible to confirm the presence or absence of an unexposed area, and the entire modular display device is wasted. However, in the present embodiment, the photochromic region 22 is formed in the non-pattern forming region between the rows of the exposure pattern forming region, and when the exposure light is irradiated to the exposure target member 2, the exposure pattern forming region In addition, the photo-discoloring region 22 is also irradiated to change the color so as to correspond to the alignment film 21a formed in the exposure pattern forming region. Therefore, for example, when the exposure positions overlap, the number of times of exposure light irradiation and / or the irradiation time increases in the overlapping exposed portions, and the degree of discoloration increases. In addition, the light-discolored region 22 does not change color in the unexposed part. Thus, in this embodiment, the presence or absence of exposure failure can be easily determined by discoloration. Therefore, exposure failure can be confirmed before the exposure target member 2 is assembled to the display device, and the display device is not wasted.

  When simultaneously exposing a plurality of exposure pattern forming regions as in this embodiment, the photochromic region 22 is formed in a region between the alignment material films 21 that are simultaneously exposed by at least one pattern 125a. It only has to be. That is, for the alignment material film 21 in the third region of the third row from the top of the alignment material film 21 shown in FIG. 1A, there is no other alignment material film 21 that is simultaneously exposed by the mask 12. However, in the present invention, the photochromic region 22 is formed in a region on the extension of the exposure pattern in the exposure pattern forming region, and the exposure light is also applied to the photochromic region 22 during the exposure pattern forming region exposure. It is only necessary to change the color by irradiating and confirm the presence or absence of exposure failure. Therefore, for example, with respect to the alignment material film 21 in the third row from the top in FIG. 1A, the upper or lower non-pattern formation region in FIG. 1A corresponds to, for example, each of the alignment material films 21. By forming the photo-discolored region 22 and exposing the alignment material film 21 at the same time, the presence or absence of exposure failure can be determined.

  Next, an exposure apparatus according to the second embodiment of the present invention will be described. In the first embodiment, the step of simultaneously exposing a plurality of exposure pattern forming regions using a single mask has been described as step exposure repeated twice with the movement of the mask interposed therebetween. A case will be described in which the mask 12 (121 to 124) is used and exposure light is continuously transmitted through each mask 12 to continuously expose the exposure pattern forming region. 4A is a view showing an exposure method according to the second embodiment, FIG. 4B is an enlarged view of a portion B in FIG. 4A, and FIG. 4C is an exposure position overlap and unexposed. It is a B section enlarged view showing a case where a region has occurred.

  Also in the present embodiment, the configuration other than the number of masks and the point of continuous exposure is the same as in the first embodiment. The photochromic region 22 is formed so as to correspond to the exposure pattern forming region, and the photochromic region 22 is formed. Is exposed in correspondence with the exposure position of the alignment material film 21. As a result, when no exposure failure occurs, the photochromic member 22 is uniformly discolored as shown in FIG. However, for example, if even one of the plurality of masks 12 is displaced, an overlap of exposure positions and / or an unexposed area occurs as shown in FIG. End up. However, also in this embodiment, the photochromic region 22 is formed in the non-pattern formation region between the rows of the exposure pattern formation region, and when the exposure light is irradiated to the exposure target member, the exposure pattern formation region In addition, the photochromic region 22 is also irradiated to change the color so as to correspond to the alignment film 21a formed in the exposure pattern forming region, so that the presence or absence of exposure failure is easily determined by the color change of the photochromic region 22. can do. Therefore, exposure failure can be confirmed before the exposure target member 2 is assembled to the display device, and the display device is not wasted.

  In the exposure method of the embodiment described above, the arrangement of the mask and the exposure pattern formation region is an example, and the photochromic region 22 is formed so as to correspond to the exposure pattern formation region, and the exposure pattern formation region is exposed. In this case, the present invention can be applied to various modes as long as it can be configured to irradiate the light-changing region 22 with the exposure light to change the color of the light-changing region 22 and thereby check whether there is exposure failure. For example, in the conventional exposure method as shown in FIGS. 11 and 13, the effect of the present invention can be obtained by forming the photochromic region 22 in the region between the rows of the exposure pattern forming region.

  Next, a case where the exposure target member 2 is a film will be described as a modification of the present embodiment. In the case where the exposure target member 2 is a film and is exposed by continuous exposure, the film may meander in a direction perpendicular to the moving direction. Therefore, even if the mask 12 is arranged at a predetermined position, if the film meanders, the exposure position overlaps or an unexposed area occurs.

  In this modification, in order to eliminate the meandering of the film, as shown in FIG. 5, an alignment laser marker 13 for forming a meandering detection alignment mark 2a is provided on the side of the film. For example, a line CCD 14 for detecting an alignment mark is provided at a position corresponding to each mask in the movement direction.

  The alignment laser marker 13 includes a laser light source that irradiates, for example, an Nd: YAG laser or ultraviolet light, and emits pulsed laser light from a pulse light source such as a xenon flash lamp, for example, within 25 mm from the edge of the film. For example, alignment marks 2a having a width of about 20 μm and a length of about 15 mm are intermittently formed on the side portions. Alternatively, the alignment laser marker 13 forms a continuous alignment mark 2a.

  The line CCD 14 detects the position of the alignment mark 2a in a direction intersecting the moving direction of the film at a position corresponding to the viewing window 12a of the mask 12, for example. For example, when the film meanders in the width direction while moving, the alignment mark 2a is also shifted in the width direction of the film by the same meandering amount. However, the alignment mark detection line CCD 14 is shifted in the width direction by meandering. The position of the alignment mark 2a deviated to is detected.

  The line CCD 14 is connected to a control device 30 as shown in FIG. 3, for example. Then, the detected position of the alignment mark 2 a in the film width direction is transmitted to the control device 30. The control device 30 is configured to adjust the position of each mask 12 based on the position of the alignment mark 2 a transmitted from the line CCD 14. Thereby, the exposure apparatus according to the present modification can adjust the position of the mask 12 by the meandering amount of the alignment mark 2a.

  That is, when adjusting the position of the mask 12, the exposure apparatus operates as follows. First, the film on which the alignment mark 2a is formed on the side portion meanders in the width direction perpendicular to the moving direction while being conveyed. A line CCD 15 is arranged at a position corresponding to the mask viewing window 12a and the light shielding pattern 12b so as to extend in the width direction of the film. The line CCD 15 is a light shielding pattern provided in the middle of the viewing window 12a of the mask 12. The position of 12b is detected as the position of the mask 12. In addition, an alignment mark detection line CCD 14 is provided at a position corresponding to the viewing window 12a (and the light shielding pattern 12b) of the mask 12 in the moving direction of the film, and the alignment mark 2a formed on the side of the film. Is detected. Signals of the mask position and the alignment mark position detected by these line CCDs 14 and 15 are transmitted to the control device 30, and each image processing unit (first image processing unit 31, second image processing unit 32), calculation unit. 34, the mask position can be adjusted with reference to the position of the alignment mark 2a by driving the mask stage 17 under the control of the mask stage drive controller 36. In other words, in this modification, by correcting the mask position with reference to the position of the alignment mark 2a, even when the meandering occurs in the film, the position of the mask 12 is adjusted so that the exposure position overlaps and is not detected. Generation of an exposure area can be prevented.

  However, even if an exposure failure such as that described above occurs, the presence or absence of exposure failure can be easily confirmed by the discoloration of the photochromic region 22, and the exposure failure before assembling the exposure target member 2 to the display device. And the display device is not wasted.

  DESCRIPTION OF SYMBOLS 1,10: Exposure apparatus, 12: Mask, 12a: Viewing window, 12b: Light shielding pattern, 120: Frame body, 121: (First) mask, 122: (Second) mask, 123: (Third ) Mask, 124: (fourth) mask, 125: pattern forming unit, 125a: (mask) pattern, 13: alignment laser marker, 14: (alignment mark detection) line CCD, 17: mask stage, 2: exposure Target member, 2a: alignment mark, 20: glass substrate, 21: alignment material film, 22: photochromic region, 30: control device, 31: first image processing unit, 32: second image processing unit, 33: motor drive Control unit, 34: calculation unit, 35: memory, 36: mask stage drive control unit, 37: control unit

Claims (5)

The exposure pattern forming area is formed by irradiating an exposure target member having an exposure pattern forming area and at least a part of the surrounding non-pattern forming area with exposure light emitted from an exposure light source through a mask. In the exposure method of exposing the mask pattern on the mask to,
The exposure target member is formed with a plurality of exposure pattern forming regions, and the non-pattern forming regions are formed between the exposure pattern forming regions,
A photochromic material that changes color by irradiation of the exposure light is applied to an area on the extension of the exposure pattern in the non-pattern formation area, or a photochromic member that changes color by irradiation of the exposure light is applied to the mask. When irradiating the exposure target member with the transmitted exposure light, the exposure is characterized by irradiating the photochromic material or the photochromic member in addition to the exposure pattern forming region to change the color. Method. The exposure method according to claim 1, wherein the photochromic material or the photochromic member has a degree of color change depending on the number of times and / or the irradiation time of the exposure light. And two or more exposure pattern forming region of the exposure target member, according to claim 1 or 2, wherein the photochromic material or wherein the simultaneous exposure child said photochromic member between the exposure pattern forming region Exposure method. In the exposure method, the exposure target member is moved in one direction while the exposure light is continuously transmitted through the mask to continuously expose a plurality of exposure pattern forming regions arranged in the movement direction of the exposure target member. 3. The exposure method according to claim 1, wherein the photochromic material or the photochromic member is applied to a non-pattern forming region between the pattern forming regions arranged in a moving direction of the exposure target member. . A method for confirming an exposure position in an exposure target member exposed by the exposure method according to any one of claims 1 to 4 , wherein the photochromic material or the photochromic member that has been discolored by irradiation with the exposure light An exposure position confirmation method, comprising: confirming an exposure position in the exposure pattern formation region.

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