JP5762903B2 - Exposure equipment - Google Patents

Description

  The present invention relates to an exposure apparatus that irradiates a film with exposure light through a plurality of slits provided in a mask while transporting a film to be exposed in one direction to form a strip-shaped exposure area on the film. In particular, the present invention relates to an exposure apparatus capable of exposing a film without exchanging a mask when the film width changes due to thermal expansion, cooling shrinkage, or the like.

  Recently, display devices such as a 3D (Three Dimensional) liquid crystal display have been receiving increasing attention. Then, when forming an alignment film on the surface of the polarizing film used in this display device, for example, an area on the film corresponding to one pixel or one picture element is divided into, for example, two in the width direction, and each divided area is divided. An alignment film having a different alignment direction is formed. Thereby, in a region corresponding to the same pixel or picture element, display light having two kinds of pretilt angles can be transmitted to the polarizing film, and the viewing angle of the display device can be widened, or two kinds of display light can be For example, they can be used as display light for the right eye and the left eye, respectively.

  Fig.6 (a) is a figure which shows the polarizing film used for such a 3D liquid crystal display. As shown in FIG. 6 (a), linearly polarized light having a polarization direction of −45 ° or circularly polarized light having a polarization direction of CW (Clock Wise) is transmitted through the region a on the film 1 serving as a polarizing film. An alignment film is formed, and an alignment film that transmits linearly polarized light with a polarization direction of + 45 ° or circularly polarized light with a polarization direction of CCW (Counter Clock Wise) is formed in the region b. Then, by sticking such a polarizing film to a glass substrate or the like of a 3D liquid crystal display, the display light transmitted through the region a and the region b can be used as display light for the right eye and the left eye, respectively.

  Thus, in order to change the orientation direction for each adjacent strip-shaped exposure area on the film, for example, an exposure apparatus as shown in FIG. 6B is used. In the conventional exposure apparatus shown in FIG. 6B, a transport device (not shown) for moving the film in one direction is provided, and two masks 20 and 21 are provided so as to be aligned in the film moving direction. The exposure light having different polarization directions is irradiated by the light sources provided corresponding to the masks 20 and 21, respectively. As shown in FIG. 6C, each of the masks 20 and 21 is provided with a plurality of slits 2b on the base 2a made of a light-shielding material so as to correspond to the width of the exposure region formed on the film. ing. Moreover, the opening part 1c for detecting the alignment mark 1a formed in the side part of the film 1, for example is provided in the side part of the masks 20 and 21, and the alignment mark 1a is detected through the opening 1c. For example, when the film 1 meanders with conveyance, the position of the mask can be corrected. Further, by detecting the alignment mark 1a and correcting the position of the mask, the relative alignment between the two masks 20 and 21 can be performed with high accuracy. That is, in the exposure apparatus shown in FIG. 6B, the slits 2b are adjacent to each other between the two masks 20 and 21 aligned in the film moving direction when viewed from the direction orthogonal to the film moving direction. Are arranged to be. Therefore, when exposure light having a different polarization direction is irradiated to each of the two masks 20 and 21, the exposure light transmitted through the slits 2 b of each mask is irradiated onto the film 1. Alignment films having different alignment directions between adjacent exposure regions are formed in a strip shape in the film movement direction.

  Such a film 1 used for a liquid crystal display device or the like is easily deformed by a temperature change or the like, and for example, is easily deformed by a temperature change at the time of exposure. For example, the film 1 easily expands due to heating during exposure, and easily contracts due to cooling during conveyance. In particular, when the film is deformed in the width direction orthogonal to the film moving direction, the width of the formed strip-shaped alignment film cannot correspond to the width of the pixels or picture elements of the display device, and the display is caused by the difference in width between them. Defects will occur.

  Techniques have been proposed for preventing display defects of display devices caused by such film deformation. For example, in Patent Document 1, in a manufacturing method of a display device in which a reflective material that diffuses and reflects external light is formed on a film to be attached to a glass substrate of the display device, the film is washed or dried. A technique for preventing warping of a film accompanying expansion and contraction of a film and curing of a reflective material is disclosed, and a reflective material is provided on a glass substrate, and the film is bonded thereon via an adhesive layer.

  Moreover, in patent document 2, in the manufacturing method of the color filter which apply | coats the photosensitive resin composition for color filters on a film base material, and exposes, develops, and thermosets this, and forms a pixel, As described above, a film composed of a norbornene compound addition polymer is used, and the oxygen concentration in the thermosetting treatment is set to 10000 ppm or less to prevent thermal deformation of the film itself.

JP 2002-189219 A JP 2009-157006 A

  However, the technique of Patent Document 1 is the one in which the cause of film deformation is moved onto a glass substrate, and cannot be used when it is necessary to form an alignment film as described above on the film. Further, Patent Document 2 is a technique for preventing thermal deformation of the film itself, and does not perform high-precision exposure corresponding to the deformed film.

  When the film 1 is deformed in the width direction orthogonal to the film moving direction due to thermal deformation or the like, it is conceivable to replace the mask in accordance with the film width after deformation. That is, as shown in FIG. 7, the film 1 expands, for example, in the direction orthogonal to the film moving direction, for example, by heating during exposure, and contracts to the width before expansion by cooling during conveyance. Therefore, it is conceivable to perform exposure by replacing the masks 20 and 21 with the masks 200 and 210 provided with slits in consideration of the expansion coefficient in the width direction of the film 1, respectively. However, in this case, it is necessary to prepare a plurality of types of masks in accordance with the expansion coefficient of the film 1, and there is a problem that the manufacturing cost of the polarizing film increases.

  The present invention has been made in view of such problems, and an object of the present invention is to provide an exposure apparatus that can perform exposure without replacing the mask even when the film to be exposed is deformed in the width direction.

In an exposure apparatus according to the present invention, a transport device that moves a film to be exposed in a first direction, a light source that emits exposure light, and a slit that extends in a direction inclined in the first direction are orthogonal to the first direction. A plurality of arrays in the second direction, a mask for irradiating the film with the exposure light through the slits, and an opening that overlaps the mask and extends in the second direction and intersects all the slits are formed. A light shielding member, and a controller that controls a relative position of the light shielding member and the mask in the first direction,
The width of the slit changes linearly with respect to the first direction, and the interval between the slits is the same as the width of the slit when viewed in the second direction;
The control unit controls a relative position between the mask and the light shielding member in accordance with an extension in the width direction of the film.

  In the exposure apparatus according to the present invention, for example, two sets of the light source, the light blocking member, and the mask are arranged along the first direction, and the slit of one mask is the second of the slit of the other mask. It arrange | positions so that only the arrangement pitch of the said slit may deviate in the direction. In this case, for example, by exposure with the two light sources, strip-shaped polarizing portions having different polarization directions are alternately formed in the second direction.

  In the present invention, the mask has a plurality of slits extending in the second direction perpendicular to the first direction, the slits extending in the direction inclined in the first direction of the movement direction of the film. It changes linearly with respect to the direction, and the interval between the slits is the same as the width of the slits when viewed in the second direction. A light shielding member that extends in the second direction and has openings that intersect all the slits is provided so as to overlap the mask. Thereby, in this invention, the exposure light which permeate | transmitted the slit of the light shielding member extended in a 2nd direction and the slit of a mask is irradiated to a film. And a control part can adjust the width | variety of the irradiation area | region of the exposure light with respect to a film by controlling the relative position in the 1st direction of a light shielding member and a mask according to the expansion of the width direction of a film. it can. Therefore, even when the film to be exposed is deformed in the width direction, exposure can be performed without replacing the mask.

(A) is a side view showing the overall configuration of an exposure apparatus according to an embodiment of the present invention, (b) is a plan view showing a mask, and (c) is a plan view showing the aperture. (A), (b) is a figure which shows the relative positional relationship of an aperture and a mask with a film, when exposing the film from which the width | variety which should be exposed differs. In the exposure apparatus which concerns on embodiment of this invention, it is a figure which shows the exposure aspect when a film is thermally deformed. In the exposure apparatus which concerns on embodiment of this invention, it is a top view which shows the modification of a mask. (A), (b) is a figure which shows the exposure process by the exposure apparatus which concerns on 2nd Embodiment of this invention. (A) is a figure which shows the film in which the alignment film from which a polarization direction mutually differs between adjacent strip | belt-shaped exposure areas was formed, (b) is a figure which shows the conventional exposure aspect as an example, (c) is the conventional exposure. It is a top view which shows the mask in an apparatus. In the conventional exposure apparatus, it is a figure which shows the exposure aspect when a film is thermally deformed as an example.

  Hereinafter, embodiments of the present invention will be specifically described with reference to the accompanying drawings. FIG. 1A is a side view showing the overall configuration of an exposure apparatus according to an embodiment of the present invention, FIG. 1B is a plan view showing a mask, and FIG. 1C is a plan view showing the aperture. . As shown in FIG. 1A, for example, the exposure target film 1 is continuously supplied from a roll-shaped supply reel 41 to the exposure apparatus according to the present embodiment, and is taken up by a take-up reel 44. In the meantime, for example, an alignment film material is applied, exposed, dried, and the like. In FIG. 1A, only the exposure process for the film 1 is shown. For example, the supply reel 41 and the reel 44 are rotationally driven by a driving device such as a motor so that the film 1 is continuously supplied into the exposure device, and the transport roller 42 provided on the front surface side or the back surface side of the film 1. , 43, etc., the film 1 is supported in a tension state. In the exposure apparatus, the film 1 is moved in one direction by the rotational driving force of the supply reel 41 and the reel 44. In the present embodiment, two sets of a light source, a mask and an aperture are provided above the film 1 between the two transport rollers 42 and 43. Then, exposure light having different polarization directions is emitted from the light sources 5A and 5B, respectively, and the alignment material film formed on the surface of the film 1 is irradiated with the exposure light transmitted through the apertures 3A and 3B and the masks 2A and 2B. Thus, an alignment film (polarization portion in the present invention) having a different polarization direction for each exposure light is formed in a band shape. That is, for example, an alignment film a that transmits linearly polarized light having a polarization direction of −45 ° or circularly polarized light having a polarization direction of CW (Clock Wise) is formed by exposure light emitted from the light source 5A, and the light source 5B. The alignment film b that transmits linearly polarized display light having a polarization direction of + 45 ° or circularly polarized light having a polarization direction of CCW (Counter Clock Wise) is formed by the exposure light emitted from.

  An alignment marker that forms a linear film alignment mark 1a on both sides of the film at a position where the film 1 is not thermally deformed by heating during exposure or cooling during conveyance, etc. on the upstream side in the moving direction of the film 1 6 is provided.

  On the back side of the mask 2, for example, a camera 7 (reference numerals 7A and 7B in FIG. 1) for detecting a pair of film alignment marks 1a formed on the side of the film 1 is provided. The width of the film 1 before exposure is calculated by, for example, a calculation unit (not shown) based on the position of the film alignment mark 1a. For example, the width of the film 1 before exposure and the width after thermal deformation of the film 1 An expansion coefficient is calculated.

  As shown in FIG. 1B, the mask 2 has a plurality of slits 2b arranged in a direction perpendicular to the moving direction of the film 1 on a base 2a made of a light-shielding material. Is provided such that the width thereof changes linearly, and the interval between the slits is the same as the width of the slits when viewed from the direction perpendicular to the film moving direction. That is, in the mask shown in FIG. 1B, the width of each slit 2b is the narrowest at the top, and is widened as it goes downward along the longitudinal direction of the slit. And each slit 2b is inclined and extended in the moving direction of the film 1. The inclination of the slit 2b is larger on the side portion side than the center of the mask 2 in the direction orthogonal to the film moving direction. For example, when the length of each slit 2b in the film moving direction is 300 mm, the mask 2 The edge portion of the slit on the most side portion is provided by being displaced by about 100 μm in the direction perpendicular to the film moving direction between the end portions in the film moving direction.

  The aperture 3 is a light-shielding plate material made of, for example, SUS. As shown in FIG. 1C, an opening 3b having a width of, for example, 20 to 30 mm is provided at the center of the base portion 3a so as to extend in one direction. Is provided. And it arrange | positions between the light source 5 and the mask 2 so that the longitudinal direction of this opening 3b may be orthogonal to the moving direction of the film 1. FIG. Therefore, a part of the exposure light emitted from the light source 5 is shielded by the aperture 3, and only the exposure light transmitted through the opening 3 b of the aperture 3 is irradiated to the mask 2. Therefore, the relative position between the mask 2 and the light shielding member 3 in the film moving direction is controlled by the control unit, so that the exposure light irradiation position on the mask 2 moves in the film moving direction, and the slit 2b of the mask 2 is moved. The irradiation position of the exposure light that is transmitted and irradiated onto the film 1 moves in the film moving direction, and the width of the exposure light irradiation area changes.

  As shown in FIG. 2, the mask 2 is configured to be movable in the film moving direction relative to the aperture 3 by an actuator or the like (not shown), for example. The relative position in the film moving direction is controlled by a control unit (not shown). The relative position of the aperture 3 and the mask 2 in the film movement direction is controlled by the control unit according to the elongation in the width direction of the film 1, so that the exposure light irradiation position on the mask 2 is in the film movement direction. Moving.

  As described above, in the present embodiment, the plurality of slits 2 b provided in the mask 2 extend while inclining in the moving direction of the film 1, and the width of each slit 2 b is along the moving direction of the film 1. The distance between the slits is the same as the width of the slits when viewed from the direction orthogonal to the film moving direction. Therefore, as shown in FIGS. 2A and 2B, when the mask 2 is moved relative to the aperture 3 in the film movement direction, the aperture 3b of the aperture 3 is transmitted along with this. Then, the irradiation position of the exposure light irradiated onto the mask 2 moves in the film moving direction, and the width of the irradiation area of the exposure light transmitted through the slit 2b and irradiated onto the film 1 changes. Thereby, even when the film 1 expands due to, for example, a high temperature during exposure, the width of the strip-shaped exposure region formed on the film 1 can be adjusted in accordance with the width of the film 1 after deformation. it can. In this embodiment, the control unit moves the mask 2 relative to the aperture 3 in the film movement direction based on the film expansion coefficient calculated by the calculation unit based on the position of the film alignment mark 1 a detected by the camera 7. Move to. Thereby, even when the film 1 expand | swells in the width direction, based on the expansion | extension of the width direction of the film 1, the width | variety of the exposure area | region on a film can be adjusted.

  Next, the operation of the exposure apparatus of the present embodiment configured as described above will be described. The film 1 to be exposed is continuously supplied from, for example, a roll-shaped supply reel 41 and is wound on the take-up reel 44. For example, the alignment film material is applied, exposed, and dried. Applied. That is, the alignment material is applied in the form of a film on the surface of the film 1 supplied into the exposure apparatus.

  As shown in FIG. 3, in the present embodiment, first, linear film alignment marks 1a are formed continuously or intermittently on the side portions of the film 1 supplied into the exposure apparatus by the alignment marker 6. . At the time of forming the film alignment mark 1a, the film 1 is not thermally deformed. The film 1 on which the film alignment mark 1a is formed is continuously supplied into the exposure apparatus by the rotational driving force of the supply reel 41 and the reel 44, for example, and is supported by the transport rollers 42 and 43 in the exposure apparatus. Then, the exposure apparatus is moved in one direction. At this time, for example, the film 1 expands due to a high temperature during exposure. While the film is being transported by the transport rollers 42, 43, etc., the film 1 is particularly easily deformed in the width direction perpendicular to the moving direction, and the width of the film 1 is increased by expansion due to heating.

  The film 1 which has been thermally expanded before the exposure is conveyed to the exposure light irradiation position by the conveyance rollers 42 and 43 and the like. In the film 1 after the expansion, the positions of the film alignment marks 1a provided on both sides are detected by the camera 7A. The detection result by the camera 7A is transmitted to, for example, a calculation unit (not shown), and the expansion coefficient of the film 1 is calculated. And the expansion coefficient of the calculated film 1 is transmitted to the control part which is not shown in figure. Then, the control unit moves the position of the mask 2 in the film moving direction relative to the aperture 3 in the film moving direction based on the expansion coefficient of the film 1, so that the opening 3 b of the aperture 3 is changed to the slit of the mask 2. It corresponds to a wide area of 2b.

  In this embodiment, the slit 2b provided in the mask 2 has a length of 300 mm in the film moving direction, and the edge of the slit 2b on the most side of the mask 2 is between the end portions in the film moving direction. It is provided so as to be displaced by about 100 μm (200 μm on both sides of the mask 2) in a direction orthogonal to the film moving direction. Thus, for example, when the distance between the mask alignment marks 1a increases by 20 μm as the film grows, the control unit moves the position of the mask 2 from the position corresponding to the state where the film 1 is not expanded. Control is made to move 30 mm in the moving direction, and the width of the exposure light irradiation area on the film 1 is increased. That is, the exposure light emitted from the light sources 5A and 5B passes through the opening 3b of the aperture 3 and is irradiated onto the mask 2, but the relative position of the mask 2 with respect to the aperture 3 is moved in the film moving direction. As a result, the irradiation position of the exposure light that passes through the opening 3b of the aperture 3 and is applied to the mask 2 moves in the film moving direction. In the present invention, the plurality of slits 2b provided in the mask 2 extend while inclining in the film moving direction, and the width of each slit 2b changes linearly along the moving direction of the film 1. Is provided. Therefore, when the exposure light irradiation position on the mask 2 moves in the film moving direction as the mask 2 moves, the width of the exposure light irradiation region that is transmitted through the slit 2b and irradiated onto the film 1 changes. Thus, in the present embodiment, even when the film 1 expands and extends in the width direction, the strip-shaped exposure region formed on the film 1 in correspondence with the width of the film 1 after deformation. The width can be adjusted. Therefore, in this embodiment, even when the film 1 is deformed in the width direction orthogonal to the moving direction, exposure can be performed without replacing the mask 2.

  The alignment material applied on the film 1 by photoirradiation with the exposure light is photoaligned according to the polarization direction of the irradiation light to form an alignment film. For example, the alignment film a that transmits linearly polarized display light having a polarization direction of −45 ° or circularly polarized light having a polarization direction of CW (Clock Wise) is formed by the exposure light emitted from the light source 5A. On the other hand, since the exposure light is not transmitted between the slits 2b of the mask 2, an unexposed area remains between the alignment films a. Since the interval between the slits 2b of the mask 2 is the same as the width of the slit 2b, the unexposed region between the alignment films a has the same width as the alignment film a. In the present embodiment, this unexposed area is exposed by the light source 5B, the mask 2B, and the aperture 3B provided on the downstream side in the film moving direction.

  Even in this case, for example, the position of the film alignment mark 1a provided on both sides of the film 1 is detected by the camera 7B. Then, the detection result by the camera 7B is transmitted to, for example, a calculation unit (not shown), the expansion coefficient of the film 1 is calculated, and the calculated expansion coefficient of the film 1 is transmitted to a control unit (not illustrated). Then, similarly to the formation process of the alignment film a, the control unit controls the position of the mask 2 in the film moving direction relative to the aperture 3 based on the expansion coefficient of the film 1, and the aperture 3 b of the aperture 3. Is made to correspond to an area of a predetermined width of the slit 2b. Therefore, the width of the strip-shaped exposure area formed on the film 1 can be adjusted corresponding to the width of the film 1 also on the downstream side in the film moving direction, and the width direction in which the film 1 is orthogonal to the moving direction. Even when deformed, the exposure can be performed without replacing the mask 2.

  Then, by irradiation with exposure light emitted from the light source 5B, linearly polarized light having a polarization direction of + 45 ° or a polarization direction of CCW (Counter Clock Wise) so that an unexposed region between the alignment films a is adjacent to the alignment film a. ) Of the circularly polarized display light is transmitted.

  The film 1 may meander in the direction orthogonal to the moving direction with conveyance. However, as in this embodiment, in an exposure apparatus of a type in which two sets of light sources 5, masks 2 and apertures 3 are provided and irradiates two types of exposure light having different polarization directions, two types of alignment materials are photo-aligned. The relative alignment of the irradiation positions of the exposure light is important. For example, if the irradiation position of the exposure light is shifted in the width direction of the film 1, an unexposed area remains or an overlapping exposure area occurs, resulting in an exposure failure. However, in this embodiment, since the film alignment mark 1a is formed on both sides of the film 1, for example, in the direction orthogonal to the film moving direction, the center position of the mask 2 and the pair of film alignment marks 1a The exposure failure can be prevented by controlling the position of the mask 2 in the direction orthogonal to the film moving direction, for example, by the control unit so that the center position matches. In this case, the 2nd control part which controls the position of the mask 2 in the direction orthogonal to a film moving direction may be provided. Thereby, for example, even when the film 1 meanders with movement, the alignment film a and the alignment film b can be alternately formed so as to be adjacent to each other.

  The film on which the alignment film a and the alignment film b are formed by exposure light irradiation is cooled by conveyance and eventually contracts to the width before expansion. Therefore, the alignment film a and the alignment film b formed wide have a predetermined width as the film 1 contracts, and a polarizing film as shown in FIG. 6 is manufactured.

  As described above, in this embodiment, even when the film 1 expands in the width direction by heating, the mask is replaced by the slit shape provided in the mask 2, the configuration of the aperture 3, and the control by the control unit. Without exposure.

  In the present embodiment, the case where the film 1 is expanded by heating has been described. However, even when the film 1 is cooled and contracted, for example, before exposure, the control unit supports the contraction rate of the film 1. Then, by controlling the relative positions of the mask 2 and the aperture 3 in the film moving direction, the polarizing film can be accurately manufactured without replacing the mask.

  In the present embodiment, two sets of the light source 5, the mask 2 and the aperture 3 are arranged along the moving direction of the film, and the light sources 5A and 5B each emit exposure light having different polarization directions, and the alignment film a and Although the case where the alignment film b is formed in a series of steps has been described, the exposure apparatuses that form the alignment film a and the alignment film b may use different exposure apparatuses. Alternatively, by aligning the irradiation direction of the exposure light on the film, alignment films having different polarization directions can be formed by one exposure apparatus.

  Further, in the present embodiment, the case where the aperture 3 is disposed between the light source 5 and the mask 2 has been described. However, in the present invention, the irradiation region of the exposure light on the film 1 is defined as the slit 2b of the mask 2 and What is necessary is just to be able to regulate by the opening 3b of the aperture 3, and the aperture 3 may be arrange | positioned between the mask 2 and the film 1, for example.

  Furthermore, as the mask 2, a mask 2C having slits 2b as shown in FIG. 4 can be used. Also in this mask 2C, the width of the plurality of slits 2b changes linearly with respect to the film moving direction, and the interval between the slits is the width of the slit 2b when viewed from the direction perpendicular to the film moving direction. Is the same. In the mask 2C shown in FIG. 4, among the slits provided at both ends of the mask 2C, the slit 2b provided at one end has a side edge provided parallel to the moving direction of the film 1, The plurality of slits 2b extend while being inclined in the moving direction of the film 1, and the inclination of the slit 2b is gradually increased from one end side to the other end side in the direction orthogonal to the film moving direction. Is provided. Even when such a mask 2C is used, the relative position between the mask 2 and the aperture 3 is controlled by the expansion coefficient of the film 1 according to the expansion in the width direction of the film 1, for example. The effect of can be obtained.

  Furthermore, in the present embodiment, even if an alignment material film made of an exposure material whose amount of curing changes upon exposure to exposure light is formed on the film 1, the orientation direction is uniquely determined by exposure to exposure light. Further, an alignment material film made of an exposure material that does not change the alignment direction even when exposed to exposure light may be formed.

  Next, an exposure apparatus according to the second embodiment of the present invention will be described. FIG. 5 is a view showing an exposure process by the exposure apparatus according to the second embodiment. In the present embodiment, the film 1 is formed with an alignment material film made of an exposure material whose amount of curing changes when irradiated with exposure light. A mask 2D is provided instead of the mask 2A in the first embodiment. The mask 2D is provided with an opening 2e whose width changes in the film moving direction instead of the slit 2b. And it is comprised so that exposure light can be irradiated to the whole exposure object area | region of the film 1 through the opening 3b of the aperture 3, and the opening of the mask 2D. Other configurations are the same as those of the first embodiment.

  In the present embodiment, an alignment material film made of an exposure material whose amount of curing is changed by exposure to exposure light is formed on the surface of the film 1. In the present embodiment, first, as shown in FIG. 5A, the entire area of the alignment material film formed on the surface of the film 1 is exposed to a predetermined first curing amount by the exposure light emitted from the light source 5A. Exposure until Then, as shown in FIG. 5B, the alignment material film is irradiated with the exposure light emitted from the light source 5B so as to correspond to the opening of the aperture 3B and the slit of the mask 2B. It exposes until it becomes the big 2nd hardening amount. Thereby, an alignment film similar to that of the first embodiment is formed. For example, when the alignment film is formed in a predetermined polarization direction and the amount of curing is 100% when the polarization direction does not change even when exposure light is further irradiated, the alignment is performed by exposure with the exposure light emitted from the light source 5A. The material film is cured until the amount of curing reaches 50%. After that, the alignment material film is cured by exposure with the exposure light emitted from the light source 5B so as to correspond to the opening of the aperture 3B and the slit having a predetermined width of the mask 2B until the curing amount becomes 100%. At this time, in the region where the exposure light from the light source 5B is not irradiated, the amount of curing remains 50%. For example, post-baking is performed after exposure (thermal curing at a temperature higher than the drying (pre-baking) temperature after material application). By curing, the orientation direction is fixed by curing until the curing amount becomes 100%.

  Also in this embodiment, even when the film 1 expands and expands in the width direction due to heating by exposure, the control unit controls the relative position of the mask 2 and the aperture 3 in the film moving direction. Thus, the width of the strip-shaped exposure area formed on the film 1 can be adjusted, and exposure can be performed without replacing the mask 2.

  In the exposure apparatus of the first embodiment, instead of the downstream mask 2B in the film moving direction, a mask 2D as in the second embodiment is arranged, and the exposure light emitted from the upstream light source 5A is used. By exposure, the alignment material film is cured corresponding to the opening of the aperture 3B and the slit of the predetermined width of the mask 2B until the curing amount becomes 100%, and by exposure with the exposure light emitted from the light source 5B on the downstream side, Even in the case where the entire surface of the exposure target region is exposed, an alignment film similar to that in the first and second embodiments can be formed. Even in this case, the width of the strip-shaped exposure region formed on the film 1 is adjusted by relatively controlling the relative positions of the mask 2 and the aperture 3 in the film moving direction by the control unit. And exposure can be performed without replacing the mask 2.

1: film, 1a: film alignment mark, 2, 20, 21, 200, 210, 2A, 2B, 2C, 2D: mask, 2a: base, 2b: slit, 2e: opening, 3, 3A, 3B: aperture, 3a: base, 3b: opening, 41: supply reel, 42, 43: transport roll, 44: reel (on the winding side), 5: light source, 6: alignment marker, 7: camera

Claims (3)

A transport device for moving the film to be exposed in the first direction;
A light source that emits exposure light;
A plurality of slits extending in a second direction perpendicular to the first direction, the mask extending to the film with the exposure light through the slit;
A light shielding member that is superimposed on the mask and has an opening that extends in the second direction and intersects all the slits;
A control unit that controls a relative position of the light shielding member and the mask in the first direction;
The width of the slit changes linearly with respect to the first direction, and the interval between the slits is the same as the width of the slit when viewed in the second direction;
The said control part controls the relative position of the said mask and the said light-shielding member according to the expansion of the width direction of the said film, The exposure apparatus characterized by the above-mentioned. The light source, the light shielding member, and the mask are arranged in two sets along the first direction, and the slits of one mask are displaced by the arrangement pitch of the slits in the second direction with respect to the slits of the other mask. The exposure apparatus according to claim 1, wherein the exposure apparatus is arranged as described above. The exposure apparatus according to claim 2, wherein the strip-shaped polarization portions having different polarization directions are alternately formed in the second direction by exposure with the two light sources.

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