WO2013039100A1

WO2013039100A1 - Film exposure device

Info

Publication number: WO2013039100A1
Application number: PCT/JP2012/073318
Authority: WO
Inventors: 敏成新井; 和重橋本; 敬行佐藤
Original assignee: 株式会社ブイ・テクノロジー
Priority date: 2011-09-16
Filing date: 2012-09-12
Publication date: 2013-03-21

Abstract

An alignment film having alignment material film applied to a film substrate is fed into a winding device for alignment exposure film after being wound around a back roll. The alignment film is held by the back roll, thereby smoothing out any wrinkles, and a mask and slit mask are disposed in the area of movement of the alignment film. An exposure light of clockwise circular polarized light from an exposure light source illuminates almost the entire surface of the alignment film through an opening in the mask, and an exposure light of counter-clockwise circular polarized light from the exposure light source illuminates strips of the alignment film through a plurality of slits on the slit mask. Lowered formation precision from an exposure unit due to vertical vibration of the thin alignment film is thereby prevented, as well as wrinkle generation, and it is possible to obtain polarizing film formed with high precision by the exposure unit.

Description

Film exposure equipment

The present invention relates to a photo-alignment film or an optical film for a wide viewing angle of a polarizing film used in an FPR (Film Patterned Retarder) system, that is, a three-dimensional (3D) image display device of a film polarization system. The present invention relates to a film exposure apparatus used for the formation of the like.

In FPR 3D technology, a polarizing film that changes the direction of the light beam for each scanning line is placed on the screen of a display device such as a liquid crystal display device, and the display device is for the right eye and the left eye for each scanning line. The polarizing film stretched on the polarizing glasses allows only the light for the right eye to pass through the light that should be incident on the right eye, and the polarizing film for the left eye allows only light that should enter the left eye to pass through, A parallax is generated in an image incident on the right eye and the left eye, thereby enabling stereoscopic display.

FIG. 50 is a schematic diagram showing an FPR type polarizing film 1. The polarizing film 1 includes a band-shaped left-eye polarizing unit 1a having a width corresponding to one horizontal scanning line of the display device, and a band-shaped right-eye having a width corresponding to one horizontal scanning line of the display device. The polarizing parts 1b are applied on a transparent substrate so as to be alternately arranged in the vertical direction. The polarizing unit 1a for the left eye has -45 ° linearly polarized light or CW (clockwise) circularly polarized light that is polarized clockwise. On the other hand, the polarizing unit 1b for the right eye has + 45 ° linearly polarized light or CCW (counter clockwise) circularly polarized light that is polarized counterclockwise. The polarizing film 1 has its polarizing portion 1a and polarizing portion 1b corresponding to the scanning lines of the liquid crystal display device, and the left-eye polarizing portion 1a coincides with the scanning line of the left-eye signal of the liquid crystal display device. The polarizing part 1b is pasted on the screen of the liquid crystal display device so that it matches the scanning line of the signal for the right eye of the liquid crystal display device. If it does so, the display light radiate | emitted from the scanning line for left eyes of the screen of a liquid crystal display device will permeate | transmit the polarizing part 1a for left eyes of the polarizing film 1, and permeate | transmit the polarizing film for left eyes stretched on the lens for left eyes of polarizing glasses. The display light incident on the left eye and emitted from the right-eye scanning line on the screen of the liquid crystal display device is transmitted through the right-eye polarizing portion 1b of the polarizing film 1 and is passed through the right-eye polarizing film stretched on the right-eye lens of the polarizing glasses. Transmits and enters the right eye. Thereby, the right eye and the left eye can see an image having parallax, and a three-dimensional image can be visually recognized.

FIG. 51 is a schematic diagram showing an exposure apparatus for this conventional polarizing film 1. An alignment film 10 in which an alignment material film is coated on the surface of a transparent film base is unwound from a roll 100, and its movement trajectory is regulated via the

rolls

102 and 103 so that the

exposure light sources

104 and 105 are disposed. Is wound around the roll 101. The alignment film 10 travels horizontally between the

rolls

102 and 103, and

slit masks

106 and 107 are arranged along the moving direction above the horizontal movement area of the alignment film 10.

Exposure light sources

104 and 105 are disposed above 107, and exposure light from the

exposure light sources

104 and 105 is applied to the alignment material film on the surface of the alignment film 10 through the

slit masks

106 and 107.

Cameras

108 and 109 for observing the alignment marks are installed above one end of the

slit masks

106 and 107, that is, on the sides of the

exposure light sources

104 and 105. On the upstream side of the slit mask 106 in the moving direction of the alignment film 10, a laser marker 110 for forming an alignment mark on the side of the alignment film 10 is provided.

In this conventional exposure apparatus, as shown in FIG. 52, an alignment mark 111 is formed on the side of the alignment film 10 by a laser marker 110 with respect to the alignment film 10 moving between the

rolls

102 and 103. The camera 108 observes the mark 111 from the opening 106 b provided at one end of the slit mask 106, and adjusts the position in the direction perpendicular to the moving direction of the alignment film 10 of the slit mask 106 with respect to the mark 111. Also in the slit mask 107, the camera 109 observes the mark 111 from the opening 107 b provided at one end of the slit mask 107 and adjusts the position of the slit mask 107 in the direction perpendicular to the moving direction of the alignment film 10. Then, the exposure light from the exposure light source 104 passes through the slit 106a of the slit mask 106 and is applied to the alignment material film on the surface of the alignment film 10, and the alignment film 10 is continuously in the direction indicated by the white arrow. Since it is conveyed, the strip-shaped exposure part 10a oriented in the same direction is formed in the alignment material film. Further, the exposure light from the exposure light source 105 passes through the slit 107a of the slit mask 107 and is irradiated onto the alignment material film on the surface of the alignment film 10, so that an exposure portion 10b is formed between the exposure portions 10a. The strip-

shaped exposure portions

10a and 10b are spaced apart from each other with an interval corresponding to one scanning line, and, for example, by applying liquid crystal on the alignment exposure film 11 after exposure, The polarizing portions 1a and 1b in which liquid crystal molecules are arranged in different directions are formed. Thereby, as shown in FIG. 50, the polarizing film 1 from which a polarization direction differs between adjacent strip | belt-shaped polarizing parts can be manufactured.

Patent Documents

1 and 2 are related to a method for producing an optical film or the like used in these liquid crystal display devices.

In the manufacturing process of the polarizing film 1 used for a liquid crystal display device or the like, the alignment film 10 coated with the alignment material film is easily deformed due to a temperature change or the like, for example, easily deformed with respect to a temperature change during exposure. End up. For example, the alignment film 10 easily expands due to heating during exposure, and easily contracts due to cooling during conveyance. In particular, when the alignment film 10 is deformed in the width direction orthogonal to the moving direction of the alignment film 10, the width of the formed strip-

shaped exposure portions

10a and 10b cannot correspond to the width of the pixels or picture elements of the display device, A display defect occurs due to a difference in width between the two.

A technique for preventing a display defect of a display device caused by such deformation of the film has been proposed. For example, in Patent Document 3, in a manufacturing method of a display device in which a reflective material that diffuses and reflects external light is formed on a film to be attached to a glass substrate of the display device, the film is washed or dried. A technique for preventing warping of a film accompanying expansion and contraction of a film and curing of a reflective material is disclosed, and a reflective material is provided on a glass substrate, and the film is bonded thereon via an adhesive layer.

Moreover, in patent document 4, in the manufacturing method of the color filter which apply | coats the photosensitive resin composition for color filters on a film base material, and this exposes, develops, and thermosets, and forms a pixel, As described above, a film composed of a norbornene compound addition polymer is used, and the oxygen concentration in the thermosetting treatment is set to 10000 ppm or less to prevent thermal deformation of the film itself.

In the film exposure apparatus that determines the alignment direction of the alignment film by exposing the film as described above, conventionally, the inspection of the exposure quality at the time of film production is performed after the film is completed. As shown in FIG. 52, in the film exposure using the two

slit masks

106 and 107, the exposure line widths of the strip-

shaped exposure portions

10a and 10b and the polarization direction are confirmed by exposing the entire length of the alignment film 10. After the process is completed and a series of film exposure steps are completed, the exposure line width and the polarization direction are inspected as inspections for the product.

As shown in FIG. 53, for example, when the slit mask 106 for forming the exposure portion 10a is configured by connecting two small slit masks 106-1 and 106-2, the slit mask It is also necessary to confirm the joint between 106-1 and 106-2, which is also performed as an inspection for the product.

JP 2010-250172 A JP 2007-114563 A JP 2002-189219 A JP 2009-157006 A

However, in the above-described prior art, since the alignment material film on the alignment film 10 is exposed in a state where the alignment film 10 is stretched between the

rolls

102 and 103, the vertical vibration of the alignment film 10 when the alignment film 10 is conveyed is exposed. As a result, the distance between the

slit masks

106 and 107 and the alignment film 10 fluctuates, and it is difficult to form the exposed

portions

10a and 10b with high accuracy. Further, the alignment film 10 stretched between the

rolls

102 and 103 is likely to be wrinkled, and this also makes it difficult to form the exposed

portions

10a and 10b with high accuracy.

Moreover, in the above-mentioned conventional technology, after the polarizing film 1 is completed, the exposure line width, the polarization direction and the mask joint are confirmed in the product inspection, so a problem is found in their quality. In such a case, the entire product lot becomes a defective product, and the entire product lot has to be discarded, resulting in a problem of poor yield.

In the conventional film exposure apparatus shown in FIG. 51, when it is attempted to inspect the exposure line width and the like on the alignment exposure film 11 exposed by the CW circularly polarized light from the exposure light source 104 and the CCW circularly polarized light from the exposure light source 105, As shown in FIG. 54, for example, illumination light is emitted from the inspection illumination light source 123 disposed below the alignment exposure film 11 that is stretched between the

rolls

102 and 103 and moves in the direction of the arrow. For example, the illumination light is irradiated onto the alignment exposure film 11 via the linearly polarizing plate 122a in the first direction (for example, p-polarized light), and the illumination light transmitted through the alignment exposure film 11 is irradiated with the λ / 4 plate 121 and the first light. The light is incident on the inspection camera 120 through the linear polarizing plate 122b in two directions (for example, s-polarized light). Thereby, the inspection camera 120 can capture the

exposure portions

10a and 10b, and the width (line width) and position (joint position) of the

exposure portions

10a and 10b and the orientation direction can be confirmed.

However, in this case, since the alignment exposure film 11 is inspected by illumination light having a polarization direction while being stretched between the

rolls

102 and 103, the alignment exposure film 11 has a vertical direction. Therefore, it is difficult to detect the width and position (joint position) of the

exposure units

10a and 10b and the orientation direction thereof with high accuracy.

Moreover, the technique of patent document 3 moves the reflecting material which causes a film deformation | transformation on a glass substrate, and cannot be used when it is necessary to form the above-mentioned orientation material film on a film. . Patent Document 4 is a technique for preventing thermal deformation of the film itself, and does not perform high-precision exposure in response to the deformed film.

When the alignment film 10 is deformed in the width direction orthogonal to the moving direction of the alignment film 10 due to thermal deformation or the like, it is conceivable to replace the mask in accordance with the width of the alignment film 10 after deformation. That is, as shown in FIG. 55, the alignment film 10 expands in a direction orthogonal to the moving direction of the alignment film 10, for example, by heating during exposure, and contracts to a width before expansion by cooling during conveyance. . Therefore, it is conceivable to perform exposure by replacing the

masks

106 and 107 with

masks

150 and 160 provided with slits in consideration of the expansion coefficient in the width direction of the alignment film 10, respectively. However, in this case, it is necessary to prepare a plurality of types of masks in accordance with the expansion coefficient of the alignment film 10, and there is a problem that the manufacturing cost of the polarizing film increases.

Furthermore, in the conventional exposure apparatus, there is a problem in that exposure cannot be performed by correcting both the meandering of the film and the thermal expansion and contraction of the film with high accuracy.

Furthermore, as described above, when manufacturing a three-dimensional (3D) image display device using polarized glasses (FPR method), a film patterned retarder (FPR) in which the polarization direction is changed for each scanning line is used. To do. When manufacturing this FPR, two (FIG. 52) or three slits having a scanning line width formed on the alignment film in which an alignment material film is coated on a film substrate are formed at a pitch of the scanning line width. Using the mask of FIG. 53, each mask is irradiated with exposure light having two different polarization directions. In this exposure, alignment of the exposure position of two or three masks is necessary, and if the accuracy of the exposure position is low, one or two masks arranged on the upstream side in the moving direction of the alignment film The band-shaped exposed part due to the mask and the band-shaped exposed part by the mask arranged on the downstream side in the moving direction of the alignment film partially overlap, or the position of the scanning line and the exposed part are shifted. .

An object of the present invention is to obtain a polarizing film in which the formation accuracy of an exposed portion due to vertical vibration of a thin alignment film is prevented and the occurrence of wrinkles can be prevented, and the exposed portion is formed with high accuracy. An object of the present invention is to provide a film exposure apparatus that can perform the above process.

Another object of the present invention is to provide a highly accurate alignment film without changing the mask even when the alignment film to be exposed is deformed or biased in the width direction due to thermal expansion and contraction of the alignment film and meandering. It is an object of the present invention to provide an exposure apparatus capable of exposing at a predetermined position.

Still another object of the present invention is to provide an exposure apparatus and an FPR manufacturing device capable of aligning each exposure unit with high accuracy when exposing the strip-shaped exposure unit at different positions of the first exposure unit and the second exposure unit. It is to provide a method.

The film exposure apparatus according to the present invention comprises:
An alignment film in which an alignment material film is applied on one surface of a transparent film substrate is wound with the alignment material film outside, and the alignment film is supported along the peripheral surface while supporting the alignment film on the peripheral surface. And back roll to move
A first slit mask disposed so as to face the alignment film wound around the back roll and formed with a plurality of first slits parallel to a moving direction of the alignment film; A first exposure unit comprising: a first exposure light source that exposes the alignment material film of the alignment film through a slit mask;
On the downstream side of the first slit mask in the moving direction of the alignment film, a plurality of second films are arranged so as to face the alignment film wound around the back roll and parallel to the moving direction of the alignment film. A second exposure unit comprising: a second slit mask in which two slits are formed; and a second exposure light source that exposes the alignment material film of the alignment film through the second slit mask. ,
Have
The second slits of the second slit mask are arranged at the same pitch as the arrangement pitch of the first slits of the first slit mask,
The first slit and the second slit are biased in the width direction of the alignment film by a half pitch of the arrangement pitch of the first and second slits in the width direction of the alignment film. Further, the first slit mask and the second slit mask are arranged.

Another film exposure apparatus according to the present invention is:
An alignment film in which an alignment material film is applied on one surface of a transparent film substrate is wound with the alignment material film outside, and the alignment film is supported along the peripheral surface while supporting the alignment film on the peripheral surface. And back roll to move
A first slit mask disposed so as to face the alignment film wound around the back roll and formed with a plurality of first slits parallel to a moving direction of the alignment film; A first exposure unit comprising: a first exposure light source that exposes the alignment material film of the alignment film through a slit mask;
An opening extending in the width direction of the alignment film is formed on the downstream side of the first slit mask in the moving direction of the alignment film so as to face the alignment film wound on the back roll. A second exposure unit comprising: a third mask; and a third exposure light source that exposes the alignment material film of the alignment film through the third mask;
It is characterized by having.

Still another film exposure apparatus according to the present invention is:
An alignment film in which an alignment material film is applied on one surface of a transparent film substrate is wound with the alignment material film outside, and the alignment film is supported along the peripheral surface while supporting the alignment film on the peripheral surface. And back roll to move
A first slit mask disposed so as to face the alignment film wound around the back roll and formed with a plurality of first slits parallel to a moving direction of the alignment film; A first exposure unit comprising: a first exposure light source that exposes the alignment material film of the alignment film through a slit mask;
An opening extending in the width direction of the alignment film is formed on the upstream side of the first slit mask in the moving direction of the alignment film so as to face the alignment film wound on the back roll. A second exposure unit comprising: a fourth mask; and a fourth exposure light source that exposes the alignment material film of the alignment film through the fourth mask;
It is characterized by having.

The exposure light source may be configured such that one is for irradiating the alignment film with CW circularly polarized exposure light, and the other is for irradiating the alignment film with CCW circularly polarized exposure light, In addition, the exposure light source irradiates the alignment film with exposure light that is incident on the alignment film so that the alignment film is inclined by 40 ° in the moving direction of the alignment film. The alignment film may be configured to irradiate the alignment film with exposure light incident so as to be inclined by −40 ° in the moving direction of the alignment film.

The exposure apparatus includes, for example, a cooling member that is provided on the upstream side of the back roll in the traveling direction of the alignment film and cools the alignment film.

The exposure apparatus is disposed downstream of the second exposure unit in the moving direction of the alignment film, and includes an exposure unit irradiated with exposure light in the alignment exposure film after irradiation of exposure light to the alignment film. An inspection unit that inspects, and the inspection unit winds the alignment exposure film and rotates with the alignment exposure film, and is installed on the peripheral surface of the inspection roll or inside the roll for inspection. A light source that emits the illumination light, and a light receiving unit that is installed to face the roll and detects the illumination light after passing through the alignment exposure film. Exposes the alignment material film to alternately form strip-shaped first exposure portions and strip-shaped second exposure portions in the width direction of the alignment material film, thereby forming the alignment exposure film. To form, The inspection unit is installed on the roll, and is installed so as to face the roll with a first polarizing plate that imparts polarized light in a first direction to the illumination light from the light source. A second polarizing plate that provides polarized light in a direction perpendicular to the first direction with respect to incident light; and a λ / 4 plate provided on the optical axis of the illumination light. Also good.

Furthermore, the exposure unit forms the first exposure unit by an exposure light source that irradiates the alignment film with CW circularly polarized exposure light, and the exposure light source that irradiates the alignment film with CCW circularly polarized exposure light. The exposure unit may be configured to form a second exposure part, and the exposure unit exposes the alignment material film on the alignment film to thereby form a band-shaped first exposure part, Are formed alternately in the width direction of the alignment material film to form the alignment exposure film, and the light receiving unit of the inspection unit transmits the alignment exposure film. A first light receiving portion provided in the first alignment direction by the first exposure portion of the illumination light, and a second alignment direction by the second exposure portion of the illumination light transmitted through the alignment exposure film. You may be comprised from the 2nd light-receiving part.

Furthermore, the exposure unit forms the first exposure portion by an exposure light source that makes exposure light incident on the alignment film so as to be inclined by 40 ° in the moving direction of the alignment film. The second exposure portion may be formed by an exposure light source that receives exposure light so as to be inclined by −40 ° in the moving direction of the alignment film. A transparent scale member disposed on the axis, extending in a width direction of the alignment exposure film, and having a scale formed in the width direction of the first exposure portion or the second exposure portion on the alignment exposure film; You may comprise.

In addition, the film exposure apparatus has a second inspection unit arranged in the transport area of the alignment exposure film before or after the inspection by the inspection unit,
The second inspection unit includes
A second light source that emits inspection light, a third polarizing plate that imparts linearly polarized light in a first direction to the inspection light from the second light source, and the third polarizing plate that passes through the third polarizing plate. A second λ / 4 plate that changes inspection light transmitted through the alignment exposure film and provided with circularly polarized light in the first direction to linearly polarized light in the second direction, and inspection of linearly polarized light in the second direction A fourth polarizing plate that transmits light, a second light receiving unit that detects inspection light transmitted through the fourth polarizing plate,
A third light source for emitting inspection light, a fifth polarizing plate for imparting linearly polarized light in the first or second direction to the inspection light from the third light source, and the third polarizing plate. A third λ / 4 plate that changes the inspection light transmitted through the alignment exposure film and provided with the circularly polarized light in the second direction to the linearly polarized light in the second or first direction; and the second or A sixth polarizing plate that transmits the linearly polarized inspection light in the first direction; a third light receiving unit that detects the inspection light transmitted through the sixth polarizing plate;
You may comprise so that it may have.

An exposure apparatus according to the present invention includes a transport device that moves an alignment film to be exposed in a first direction;
A pair of alignment markers that form a film alignment mark on both sides of the alignment film as an index of the amount of expansion and contraction of the alignment film;
A light source that emits exposure light;
A mask having a plurality of slits arranged in a second direction orthogonal to the first direction and spaced apart from each other, and mask alignment marks formed at both ends in the second direction. When,
An opening extending in the second direction and intersecting all the slits is formed, and a light shielding member that transmits the exposure light at a portion where the opening and the slit intersect,
A detection unit for detecting the film alignment mark together with the mask alignment mark;
A control unit that controls a relative position of the light shielding member and the mask in the first direction;
The width of the slit changes linearly with respect to the first direction, and the interval between the slits is the same as the width of the slit when viewed in the second direction;
The controller controls the relative position in the first direction between the mask and the light shielding member so that the positional relationship between the mask alignment mark and the film alignment mark detected by the detector is a predetermined relationship. It is characterized by controlling.

In the above-described exposure apparatus, for example, the pair of mask alignment marks may be arranged at one side edge in the width direction of the closest slit among slits provided at both ends in the second direction or in the width direction of the slit. The control unit is provided in parallel with the center line so that the distance between the film alignment mark and the mask alignment mark in the second direction is constant at the position of the opening of the light shielding member. The relative position in the first direction between the mask and the light shielding member may be controlled, and the film alignment mark is observed on the mask outside the slit in the second direction. A pair of observation windows is provided, the mask alignment mark is provided on the observation window, and the detection unit With Rye placement marks, it may be configured to detect the film alignment mark through the pair of the observation window.

The control unit may be configured such that a central position in the second direction between the pair of mask alignment marks detected by the detection unit coincides with a central position in the second direction between the pair of film alignment marks. As described above, the mask may be configured to adjust the position of the mask in the second direction, and the light source, the light shielding member, and the mask are arranged in two sets at positions separated in the first direction, The slits of one mask may be arranged so as to be deviated by the arrangement pitch of the slits in the second direction with respect to the slits of the other mask. You may comprise so that the strip | belt-shaped exposure part from which an orientation direction mutually differs may be alternately formed in a 2nd direction by the exposure by a light source.

Another exposure apparatus according to the present invention is:
A transport device for moving the alignment film to be exposed in the first direction;
A pair of alignment markers that form film alignment marks that serve as indicators of the amount of expansion and contraction of the alignment film on both sides of the alignment film;
A light source that emits exposure light;
A plurality of slits arranged in the second direction perpendicular to the first direction with a space between each other is formed, and a pair of observation windows for observing the pair of film alignment marks is provided, A mask having a mask alignment mark formed in each observation window;
An opening extending in the second direction and intersecting all the slits is formed, and a light shielding member that transmits the exposure light at a portion where the opening and the slit intersect,
A detection unit for detecting the mask alignment mark and the film alignment mark in each observation window;
A control unit that adjusts a relative positional relationship in the first direction between the light shielding member and the mask based on a detection result of the detection unit;
The slit has a first slit at one end in the second direction parallel to the first direction, and a second slit at the other end inclined at a maximum inclination with respect to the first direction, The slit between one slit and the second slit is inclined so that the inclination angle gradually increases from the first slit toward the second slit,
The slits vary linearly with respect to the first direction, and the spacing between the slits is the same as the width of the slits with respect to the second direction;
The first mask alignment mark on the first slit side extends in the first direction, and the second mask alignment mark on the second slit side is one side edge in the width direction of the second slit or the center in the width direction. It is characterized by extending parallel to the line.

In the exposure apparatus according to the present invention, the control unit sets a reference value A of a distance between the first mask alignment mark and the corresponding first film alignment mark, and a second corresponding to the second mask alignment mark. The reference value B of the distance between the two film alignment marks was set, and the distance between the first mask alignment mark and the first film alignment mark varied from the reference value A during the exposure of the alignment film. In this case, the mask is moved in the second direction so that the distance between the first mask alignment mark and the first film alignment mark is adjusted to a reference value A, and then the second mask alignment is performed. When the distance between the mark and the second film alignment mark varies from the reference value B, the mask is moved to the first film alignment mark. Is moved in the direction, it may be configured to adjust the distance between the second film alignment mark and the second alignment mark to the reference value B.

Still another exposure apparatus according to the present invention provides:
A moving device for moving the alignment film in which the alignment material film is formed on the film substrate in one direction;
A plurality of strip-shaped exposure portions provided in a moving region of the alignment film, extending in the one direction and spaced from each other in a direction perpendicular to the one direction, on the alignment material film on the alignment film; A first exposure unit for forming a first exposure pattern comprising:
The first exposure pattern is disposed downstream of the first exposure unit in the moving direction of the alignment film, extends in the one direction on the alignment material film on the alignment film, and extends in the direction orthogonal to the one direction. A second exposure unit for forming a second exposure pattern composed of a plurality of strip-shaped exposure portions in a region between the exposure portions;
An inspection unit provided in a moving region of the alignment film between the first exposure unit and the second exposure unit, and detecting an exposure unit of the first exposure pattern;
A control unit for controlling the exposure position of the second exposure pattern in the second exposure unit based on the position of the exposure unit of the first exposure pattern detected by the inspection unit;
It is characterized by having.

In the exposure apparatus, for example, the first exposure unit includes a first exposure light source and a first mask provided with a band-shaped slit corresponding to the first exposure pattern. The exposure light is shaped by the slit of the first mask and irradiated to the alignment material film. The second exposure unit has a second exposure light source and a belt-like shape corresponding to the second exposure pattern. A second mask provided with a slit, the exposure light from the second exposure light source is shaped by the slit of the second mask and irradiated to the alignment material film, the control unit, The position of the second exposure unit in the direction orthogonal to the one direction may be adjusted based on the position of the exposure portion of the first exposure pattern, and the moving device , And wound around the alignment layer on the back roll is moved,
The first exposure unit, the inspection unit, and the second exposure unit may be configured to be installed at a position facing the alignment film on the back roll.

The inspection unit is installed so as to face the back roll, irradiates inspection light toward the alignment film on the back roll, and a camera that detects reflected light reflected by the back roll; And a polarizer that filters the inspection light incident on the alignment film or the reflected light incident on the camera with a polarization direction filter, and the inspection unit includes the back roll. An inspection light source that is embedded in the peripheral surface and irradiates inspection light toward the alignment film on the back roll, and a camera that is installed to face the inspection light light source and detects transmitted light that has passed through the alignment film And a polarizer that filters the inspection light incident on the alignment film or the transmitted light incident on the camera with a polarization direction filter.

The moving device defines a moving area of the alignment film by spanning the alignment film on a plurality of transport rolls, and the first exposure unit, the inspection unit, and the second exposure unit include the transport rolls. It may be configured to be installed at a position facing the alignment film in between, and the inspection unit is installed on one surface side of the alignment film between the transport rolls to inspect the inspection light. An inspection light source that irradiates the film, a reflection unit that is installed on the other surface side of the alignment film and reflects the light transmitted through the alignment film, a camera that detects the reflected light reflected by the reflection unit, You may comprise so that it may have a polarizer which filters each of the inspection light which injects into the alignment film, and the reflected light which injects into the camera in a polarization direction.

The inspection unit is installed on one surface side of the alignment film between the transport rolls and irradiates inspection light toward the alignment film, and the alignment light is installed on the other surface side of the alignment film. A camera that detects transmitted light that has passed through the film, and a polarizer that filters each of the inspection light incident on the alignment film and the transmitted light incident on the camera in a polarization direction. Well, the second mask is formed such that the plurality of slits are linearly increased in the first direction with respect to the slits adjacent to each other in the direction orthogonal to the first direction. The second exposure unit includes a light shielding member formed with an opening extending in a direction perpendicular to the first direction so as to intersect all the slits of the second mask, and the control unit includes a light shielding member of the light shielding member. Pair with the second mask It may be configured to adjust the position of said first direction that.

Furthermore, the FPR manufacturing method according to the present invention moves the alignment film in which the alignment material film is formed on the film substrate in one direction,
The first exposure unit provided in the moving region of the alignment film allows the alignment material film on the alignment film to extend in the one direction and be spaced apart from each other in a direction perpendicular to the one direction. A first exposure step of forming a first exposure pattern comprising a strip-shaped exposure portion of
A direction extending in the one direction and perpendicular to the one direction on the alignment material film on the alignment film by a second exposure unit installed on the downstream side of the first exposure unit in the moving direction of the alignment film. A second exposure step of forming a second exposure pattern comprising a plurality of strip-shaped exposure portions in a region between the exposure portions of the first exposure pattern in
An inspection step of detecting an exposed portion of the first exposure pattern between the first exposure step and the second exposure step;
Have
The exposure position of the second exposure pattern by the second exposure unit in the second exposure step is controlled based on the position of the exposure portion of the first exposure pattern detected in the inspection step.

In the present invention, an alignment film formed by applying an alignment material film on a film substrate is used as an alignment exposure film, and an alignment exposure film is formed by exposing the alignment film. The coated one is called a polarizing film.

According to the present invention, the alignment film having the alignment material film formed on the surface is wound around the back roll, and the exposure light is emitted from the first and second exposure light sources in a state where the back surface is supported by the back roll. The alignment material film is irradiated through the first and second slit masks. Therefore, the alignment film is supported by the back roll, and wrinkles during conveyance are extended, and exposure is performed in a state where the distance between the first and second slit masks and the alignment film is set with high accuracy. Therefore, the accuracy of formation of the exposed portion becomes extremely high. Therefore, according to the present invention, it is possible to form a strip-shaped exposed portion with high accuracy.

It is a schematic diagram which shows the film exposure apparatus of 1st Embodiment of this invention. Similarly, it is a figure which expands and shows alignment film near the back roll and slit mask. It is a schematic diagram which shows the film exposure apparatus of 2nd Embodiment of this invention. Similarly, it is a figure which expands and shows alignment film near the back roll and slit mask. It is a schematic diagram which shows the film exposure apparatus of 3rd Embodiment of this invention. Similarly, it is a figure which expands and shows alignment film near the back roll and slit mask. It is a schematic diagram which shows the film exposure apparatus of 4th Embodiment of this invention. Similarly, it is a figure which expands and shows alignment film near the back roll and slit mask. It is a schematic diagram which shows the film exposure apparatus of 5th Embodiment of this invention. Similarly, it is a figure which expands and shows alignment film near the back roll and slit mask. It is a figure which shows the manufacturing method of the polarizing film of a FPR system which uses a back roll. It is a typical perspective view which shows an air turn bar. It is a figure which shows the film exposure apparatus which uses a back roll. Similarly, it is a figure which expands and shows alignment film near the back roll and slit mask. It is a top view which shows the test | inspection part of the film exposure apparatus of 6th Embodiment of this invention. It is the front sectional drawing similarly. It is a schematic diagram which shows a polarization direction. It is front sectional drawing which shows the test | inspection part of the film exposure apparatus of 7th Embodiment of this invention. It is a top view which shows the test | inspection part of the film exposure apparatus of 8th Embodiment of this invention. Similarly, it is the front sectional view. It is a top view which shows the test | inspection part of the film exposure apparatus of 9th Embodiment of this invention. Similarly, it is the front sectional view. Similarly, it is the operation explanatory view. (A) is a side view showing the entire configuration of an exposure apparatus according to the tenth embodiment of the present invention, (b) is a plan view showing a mask, and (c) is a plan view showing the aperture. (A), (b) is a figure which shows the relative positional relationship of an aperture and a mask with an alignment film, when exposing the alignment film from which the width | variety which should be exposed differs. (A), (b) is a figure which shows adjustment of the mask position by a film alignment mark and a mask alignment mark as an example. It is a figure which shows the exposure aspect when the alignment film is thermally deformed in the exposure apparatus which concerns on 10th Embodiment of this invention. It is a top view which shows the modification of a mask in the exposure apparatus which concerns on 10th Embodiment of this invention. (A), (b) is a figure which shows the exposure process by the exposure apparatus which concerns on 11th Embodiment of this invention. It is a top view which shows the mask and aperture of the exposure apparatus which concern on 12th Embodiment of this invention. It is a figure which shows the laser marker which forms an alignment mark in alignment film. It is a figure which shows the bifocal camera which detects an alignment mark. It is a figure which shows operation | movement of 12th Embodiment of this invention. It is a figure which shows operation | movement of 12th Embodiment of this invention. It is a figure which shows operation | movement of 12th Embodiment of this invention. It is a figure which shows operation | movement of 12th Embodiment of this invention. It is a figure which shows the exposure apparatus of 13th Embodiment of this invention. It is a figure which shows the 1st exposure part and 2nd exposure part which are formed with the 1st exposure unit and the 2nd exposure unit. It is a figure which shows the modification of the exposure apparatus of 13th Embodiment of this invention. It is a figure which shows the exposure apparatus of 14th Embodiment of this invention. It is a figure which shows the modification of the exposure apparatus of 14th Embodiment of this invention. It is a figure which shows the exposure apparatus of 15th Embodiment of this invention. It is a figure which shows the exposure apparatus of 16th Embodiment of this invention. It is a figure which shows the method of detecting a 1st exposure part. It is a figure which shows the polarization aspect of the inspection light by a polarizing plate. Regarding the adjustment of the exposure position in the second exposure unit, (a) is a diagram showing a modification of the mask, and (b) is a diagram showing an aperture. It is a figure which shows this adjustment method of an exposure position, (a) is a figure which shows the relative positional relationship of a mask and an aperture when expansion | swelling has generate | occur | produced in alignment film, (a) when there is no expansion | swelling in alignment film. is there. Similarly, it is a figure which shows the adjustment method of an exposure position, (a) is a figure which shows the relative positional relationship of a mask and an aperture when expansion | swelling generate | occur | produces in an alignment film, when (a) has no expansion | swelling in an alignment film. It is. It is a figure which shows the modification of a mask. It is a schematic diagram which shows the polarizing film of a FPR system. It is a schematic diagram which shows the exposure method of the conventional polarizing film. Similarly, it is a top view which shows the exposure method by the slit mask. It is a top view which shows the film exposure method which similarly joined the small slit mask. It is a schematic diagram which shows an exposure test | inspection part. In the conventional exposure apparatus, it is a figure which shows the exposure aspect when an alignment film is thermally deformed as an example.

Hereinafter, embodiments of the present invention will be specifically described with reference to the accompanying drawings. FIG. 1 is a schematic diagram showing a film exposure apparatus according to an embodiment of the present invention, and FIG. 2 is a diagram showing an expanded alignment film 10 in the vicinity of a back roll. On the surface of the film substrate, an alignment material film is applied by an appropriate application device, and the alignment film 10 to which this alignment material film is applied is fed as it is to the position where the back roll 5 is disposed, or FIG. After being wound once as a roll 100 as shown at 51, the roll 100 is unwound and fed to the back roll 5.

In the back roll 5, the alignment film 10 is wound on approximately half (lower half) of the peripheral surface, the back surface of the alignment film 10 contacts the back roll 5, and the surface of the alignment film 10, that is, the alignment material film. Facing outward. The

masks

7 and 17 are placed facing the alignment material film with a slight distance (about 200 μm) from the alignment film 10 so as to face each other with the back roll 5 interposed therebetween.

Exposure light sources

6 and 16 are installed behind the

masks

7 and 17. As a result, the alignment film 10 having the alignment material film coated on the surface is in contact with the peripheral surface of the back roll 5, and the wrinkles are stretched by a slight tension when the alignment film 10 is conveyed. Supported. Then, the alignment film 10 is continuously conveyed in the direction of the white arrow, and the exposure light is continuously irradiated from the

exposure light sources

6 and 16, whereby the exposure light is transmitted through the openings 7a and the slits 17a of the

masks

7 and 17. Then, the alignment film 10 is irradiated. Thereby, the alignment exposure film 11 after the exposure is wound around the winding roller 101 (see FIG. 51) or the like.

The back roll 5 is a water-cooled roll whose inside is water-cooled, and is rotatable around its central axis. And this back roll 5 can rotate freely, and it rotates so that the peripheral speed becomes the same as the movement speed of the alignment film 10 with the movement of the alignment film 10. Thereby, the alignment film 10 is supported in a state where there is no relative speed difference on the peripheral surface of the back roll 5. Therefore, wrinkles are prevented from being generated on the peripheral surface of the back roll 5 in the alignment film 10 that is conveyed by applying an appropriate tension.

A mask 7 is disposed in the vicinity of the start end of the portion around which the alignment film 10 is wound on the peripheral surface of the back roll 5 so as to face the back roll 5. A light source 6 of exposure light for exposing the alignment film 10 through the mask 7 is disposed. In addition, a slit mask 17 is disposed in the vicinity of the rear end portion of the peripheral surface of the back roll 5 where the alignment film 10 is wound so as to face the back roll 5. Behind 17, a light source 16 of exposure light for exposing the alignment film 10 through the slit mask 17 is disposed. The mask 7 has openings 7 a extending in the width direction of the alignment film 10 and opening in almost the entire width direction of the alignment film 10, and the slit mask 17 has a plurality of rectangular shapes slightly longer in the moving direction of the alignment film 10. The slits 17 a are arranged in the width direction of the alignment film 10. The arrangement pitch of the slits 17a corresponds to two scanning lines corresponding to the FPR type 3D liquid crystal display device.

For example, the exposure light from the exposure light source 6 is clockwise polarized light (CW (clockwise) circularly polarized light), and the exposure light from the exposure light source 16 is circularly polarized light counterclockwise. (CCW (counter clockwise) circularly polarized light). As shown by the white arrow, the alignment film 10 is irradiated with the exposure light of the exposure light source 6 from the opening 7a of the mask 7 to the alignment film 10 moving in one direction. Except for the portion of the portion, the entire surface is irradiated with exposure light. Further, by irradiating the alignment film 10 with the exposure light of the exposure light source 16 from the slit 17a of the slit mask 17, the portion on the alignment film 10 corresponding to the slit 17a is overwritten by the exposure light from the exposure light source 16. Is done.

A reversible alignment material film is formed on the surface of the alignment film 10. First, the entire area of the alignment material film on the surface of the alignment film 10 is exposed by CW circularly polarized exposure light through the opening 7 a of the mask 7. Is done. Next, a strip-shaped region corresponding to the slit 17 a is exposed by CCW circularly polarized exposure light from the slit 17 a of the slit mask 17. Then, the strip-shaped exposed portion (CCW circularly polarized light) corresponding to the slit 17a becomes the exposed portion 10b, and the strip-shaped portion (CW circularly polarized light) corresponding to the portion between the slits 17a becomes the exposed portion 10a.

Next, the operation of the film exposure apparatus of this embodiment configured as described above will be described. The alignment film 10 is coated with an alignment material film on its surface. For example, the width is 1500 mm, the thickness is 100 μm, and the film length of one roll 100 is 2 km, for example, usually at a speed of 2 to 10 m / min. Be transported. For example, the material of this base material is a COP (cycloolefin polymer) or TAC (triacetyl cellulose) film. This alignment film 10 is fed to the position where the back roll 5 is disposed, and is wound around and supported by the back roll 5. The alignment material film of the alignment film 10 is irradiated with CW circularly polarized exposure light from the exposure light source 6 through the opening 7 a of the mask 7 over almost the entire area of the alignment film 10. CCW circularly polarized exposure light is irradiated in a band shape through the slit 17a of the mask 17, and the portion of the alignment film 10 corresponding to the slit 17a overwrites the CCW circularly polarized exposed portion from the CW circularly polarized exposed portion. Exposed. At this time, the alignment material film of the alignment film 10 is a reversible material, and substantially the entire surface of the alignment film 10 is aligned by irradiation of the entire alignment film 10 with exposure light of CW circularly polarized light. The band-shaped portion of the alignment film 10 is aligned by the band-shaped irradiation of the exposure light. Thereby, the exposure part 10b (refer FIG. 50) by CCW circularly polarized light is formed in the part corresponding to the slit 17a of the alignment film 10. FIG. On the other hand, an exposed portion 10a by CW circularly polarized light is formed in the band-like portion between the exposed portions 10b. In this way, it is possible to manufacture an FPR type polarizing film in which the exposing

portions

10a and 10b are alternately formed and the polarizing portions 1a and 1b are formed corresponding to one scanning line.

In this case, since the thin alignment film 10 is supported by the back roll 5 and is exposed through the slits 17a of the slit mask 17 in a state where the wrinkles are stretched, wrinkles and vibrations of the alignment film 10 are prevented. Thus, the exposed

portions

10a and 10b can be formed with high accuracy. In addition, since the exposure through the mask 7 is performed on the entire area of the alignment film 10 in the width direction, the alignment between the mask 7 and the slit mask 17 is unnecessary, and there is an alignment defect. In this respect, the exposed

portions

10a and 10b can be formed with high accuracy. And in this invention, since it exposes twice with respect to one back roll 5, it is not necessary to use an expensive back roll for every exposure, and can reduce the manufacturing cost of a FPR polarizing film.

Next, a second embodiment of the present invention will be described with reference to FIGS. In the present embodiment, the alignment film 10 is first irradiated with CW circularly polarized exposure light from the exposure light source 6 via the slit mask 17 having the slits 17a, and then exposed to the exposure light source via the mask 7 having the openings 7a. 16 is different from the first embodiment in that it receives CCW circularly polarized exposure light from 16, and the other components are the same as those in the first embodiment. Detailed description is omitted. As shown in FIG. 4, the strip-shaped exposed portion 10a is formed by exposing CW circularly polarized exposure light from the exposure light source 6 to the alignment material film on the alignment film 10 through the slits 17a. At this time, the alignment material film on the alignment film 10 is an irreversible material, and the alignment material film in this portion is aligned by irradiation of the CW circularly polarized exposure light. Next, CCW circularly polarized exposure light from the exposure light source 16 is exposed to the alignment material film on the alignment film 10 through the opening 7a, so that the entire surface of the alignment film 10 is irradiated with CCW circularly polarized exposure light. . At this time, since the exposure unit 10a is oriented by CW circularly polarized light using an irreversible material, the orientation does not change even when irradiated with CCW circularly polarized exposure light. Then, the unexposed portion of the exposure light source 6 between the exposure portions 10a receives the exposure light of CCW circularly polarized light from the exposure light source 16, and this portion becomes the exposure portion 10b corresponding to the CCW circularly polarized light. Thereby, as shown in FIG. 50, the polarizing film 1 in which the polarizing portions 1a and the polarizing portions 1b are alternately positioned corresponding to one line of the scanning lines can be manufactured.

In this way, in the present embodiment, after the strip-shaped exposure part 10a is formed by the CW circularly polarized light, the exposure part 10b is formed between the exposure parts 10a by the entire exposure of the CCW circularly polarized exposure light. As in the embodiment, alignment between the mask 7 and the slit mask 17 is not necessary. Further, in the present embodiment, similarly to the first embodiment, the alignment film 10 is prevented from being vibrated and wrinkled, and the exposed

portions

10a and 10b can be formed with high accuracy. Thereby, the FPR polarizing film 1 which has the polarization | polarized-light parts 1a and 1b matched to the scanning line 1 line with high precision can be manufactured.

Next, a third embodiment of the present invention will be described with reference to FIGS. 5 and 6 (a) and 6 (b). The first and second embodiments described above relate to the formation of an FPR polarizing film, but the present embodiment relates to the formation of a photo-alignment film. In the present embodiment, as in the first embodiment, the alignment film 10 contacts the back roll 5 and moves along with the driven rotation of the back roll 5, that is, the start end of the moving region of the alignment film 10, that is, the back roll 5. A mask 7 having an opening 7a is disposed in the vicinity of the start end portion of the peripheral surface where the alignment film 10 is wound, and a mask 17 having a slit 17a is disposed at the rear end portion of the moving area. This embodiment is different from the first embodiment in that the exposure light from the exposure light source 6 is incident on the mask 7 at an inclination angle of 40 °, for example, and the exposure light from the exposure light source 16 is the slit mask. For example, the incident angle is 17 ° with an inclination angle of −40 °.

In this embodiment, the alignment film 10 on which the reversible alignment material film is formed is irradiated with exposure light inclined at 40 ° in the transport direction of the alignment film 10 over almost the entire area of the alignment film 10, and then the alignment film 10 is aligned. Exposure light inclined at −40 ° in the transport direction of the film 10 is applied to the band-shaped region (exposure portion 10d) corresponding to the slit 17a, and this region is overwritten by exposure at −40 °. In the present embodiment as well, as in the first embodiment, the

exposure portions

10c and 10d are formed by two exposures. In the exposure portion 10d, the exposure at −40 ° oblique incidence by the second exposure is performed. The alignment direction is determined by light, and in the exposure unit 10c, the alignment direction is determined by exposure light incident at an angle of 40 ° by the first exposure. Thereby, the photo-alignment film | membrane which has the

exposure parts

10c and 10d from which a photo-alignment direction differs alternately can be obtained, and it can be used in order to expand a viewing angle as a photo-alignment film of a liquid crystal display device. Also in the present embodiment, there is no vibration and wrinkles of the alignment film 10, and the exposed

portions

10c and 10d can be formed with high accuracy. In addition, alignment between the mask 7 and the slit mask 17 is unnecessary.

Next, a fourth embodiment of the present invention will be described with reference to FIGS. This embodiment relates to the formation of the photo-alignment film, as in the third embodiment, but the difference from the third embodiment is that the alignment material film on the alignment film 10 is an irreversible material, The first exposure of the alignment film 10 is performed by irradiating the alignment film 10 with exposure light having an incident angle of 40 ° from the exposure light source 6 using the slit mask 17 having the slits 17a. The alignment film 10 is irradiated with exposure light having an incident angle of −40 ° from the exposure light source 16 using the mask 7 having 7a.

In the present embodiment, first, exposure light inclined at 40 ° with respect to the traveling direction of the alignment film 10 is made incident on the alignment film 10 through the slits 17 a, and the strip-shaped exposure unit 10 c with respect to the alignment film 10. Form. With this 40 ° tilted incident light, the strip-shaped exposed portion 10c is oriented so that its orientation direction is tilted by 40 °. Next, exposure light inclined at −40 ° with respect to the traveling direction of the alignment film 10 is incident on the alignment film 10 through the opening 7a, and the entire surface is irradiated with exposure light inclined at −40 °. At this time, since the exposure unit 10c is oriented using an irreversible material, the orientation direction does not change even when irradiated with -40 ° tilted exposure light, and exposure from the exposure light source 6 is performed. An unexposed portion of light is irradiated with −40 ° tilt exposure light, and the alignment direction is aligned with this direction. As a result, it is possible to obtain a photo-alignment film in which the exposed portions 10c inclined by 40 ° and the exposed portions 10d inclined by −40 ° are alternately formed. Also in the present embodiment, there are no vibrations and wrinkles of the alignment film 10, and the exposed

portions

It should be noted that the present invention is not limited to the above embodiments, and various modifications can be made. For example, in each of the embodiments described above, the slit mask 17 having the slits 17a and the mask 7 having the openings 7a are used, and the alignment between the mask 7 and the slit mask 17 is not required. As described above, the laser marker 110 is used to form the mark 111 on the alignment film 10, and the mark 111 is observed with a camera or the like at the position where the mask 7 and the slit mask 17 are disposed, and the position is detected. If the mask 7 and the slit mask 17 are aligned using the mark 111 as an index, a slit mask having a slit can be used for both as shown in FIG. That is, the

exposure portions

10a and 10b or the

exposure portions

10c and 10d can be formed by two slit masks. In this case, the slits of one slit mask are formed at the same pitch as the slit arrangement pitch of the other slit mask, and one slit mask is 1 / of the slit arrangement pitch with respect to the other slit mask. The pitch of 2 is arranged in a biased manner in the width direction of the alignment film 10. In the third embodiment and the fourth embodiment, the incident light incident inclination angles are 40 ° and −40 °. However, the exposure light incident inclination angle is not limited to this, and various angles are adopted. can do.

Next, a fifth embodiment of the present invention will be described. In the present embodiment, a cooling member for cooling the alignment film is provided on the upstream side of the back roll in the traveling direction of the alignment film. Hereinafter, a fifth embodiment of the present invention will be specifically described with reference to FIGS. 9 and 10. Although the first to fourth embodiments described above can prevent the formation accuracy of the exposed portion from being lowered due to the vertical vibration of the alignment film 10, there is generally still another problem in the method for manufacturing a polarizing film. FIG. 11 is a schematic view showing a method for producing an FPR type polarizing film 1 using this back roll. The transparent film substrate 12 is coated with an alignment material film on the surface (the lower surface in the drawing) in the coating apparatus 2. The alignment film 10 to which the alignment material film is applied has its travel locus defined by the air turn bars 3 and 4, is fed to the winding roll 100 (see FIG. 51), and is wound. Thereafter, the film is fed to the back roll 5 and once wound around the surface of the back roll 5, then the polarizing film 1 is obtained through an exposure process, a liquid crystal coating process, and a post-baking process. To be sent to. In this case, the alignment film 10 has its surface coated with the alignment material film, and its travel trajectory is regulated by the air turn bars 3 and 4, and the surface side of the alignment film 10 coated with the alignment material film is the air turn bar 3. , 4 side, the air turn bars 3 and 4 are provided with a large number of air discharge holes 31 on the surface thereof, as shown in FIG. 12, and by discharging air from the discharge holes 31, The alignment film 10 does not come into contact with the air turn bars 3 and 4. That is, the alignment trajectory of the alignment film 10 is regulated while being floated from the air turn bars 3 and 4.

In the back roll 5, the alignment film 10 is wound, the back surface of the alignment film 10 contacts the back roll 5, and the surface of the alignment film 10, that is, the alignment material film faces the outer surface. Slit masks 7b and 17 are placed at a slight distance (about 200 μm) from the alignment film 10 so as to face each other with the back roll 5 interposed therebetween. Behind the slit masks 7b and 17,

exposure light sources

6 and 16 are installed. As a result, as shown in FIG. 13, the alignment film 10 with the alignment material film applied to the surface is in contact with the peripheral surface of the back roll 5, and the wrinkles are stretched by a slight tension during the conveyance of the alignment film 10. In the state, it is supported by the back roll 5. Then, as shown in FIG. 14, the alignment film 10 is continuously conveyed in the direction of the white arrow, and the exposure light is continuously irradiated from the

exposure apparatuses

6 and 16, so that the exposure light is transmitted to the slit masks 7 b and 17. Then, the alignment film 10 is irradiated through the

slits

7c and 17a to form the strip-shaped exposed

portions

10a and 10b aligned in the same direction on the alignment material film. The strip-shaped

exposure portions

10a and 10b are spaced apart from each other with an interval corresponding to one scanning line, and are oriented in different directions.

However, as shown in FIG. 11, the alignment film 10 is formed on the surface of the air turn bars 3 and 4 so as not to contact the air turn bars 3 and 4 because the alignment material film is applied on the surface. Air is discharged from the discharged discharge holes 31. For this reason, the alignment film 10 is heated by the discharge air, and the slit masks 7b and 17 and the back roll 5 are shown in FIG. , The alignment film 10 expands in the width direction. Further, the expansion of the alignment film 10 also occurs due to pre-baking before exposure. For example, the base material is a COP (cycloolefin polymer) or TAC (triacetyl cellulose) film, the alignment film 10 has a width of 1500 mm, a thickness of 100 μm, and a length of 2 km. carried in 10 m / min. for example, the thermal expansion of the alignment film 10, the width _{D 0} is sometimes stretched 15 ~ 20μm (= 2ΔD) degree. Thus, with respect to the width D ₀ at the normal temperature of the alignment layer 10, when it reaches the slit mask 7b, the both widthwise end edges of the alignment film 10 is expanded by each [Delta] D, the alignment layer 10 that the inflated When the exposure is performed through the slit masks 7b and 17a of the predetermined pitch, the alignment exposure film 11 is cooled and then returned to room temperature, so that the elongation margin 2ΔD becomes 0. The

pitches

10a and 10b are reduced accordingly, and the band-shaped polarizing portions 1a and 1b having a desired pitch cannot be obtained. For this reason, conventionally, the arrangement pitch of the slits of the slit masks 7b and 17 is set to a value obtained by adding an expansion amount including thermal expansion to the interval of one scanning line, and cooling the alignment exposure film 11 to room temperature. A predetermined pitch is set later. However, the amount of thermal expansion of the alignment film 10 differs depending on the material of the alignment film 10 and the conveyance speed, and it is complicated to prepare the slit masks 7b and 17 in consideration of the amount of thermal expansion in advance. It was not easy to form 1b with high accuracy.

The alignment film 10 is also heated during exposure by the exposure light source 6. For this reason, the interior of the back roll 5 is hollow, and this interior is filled with cooling water and is cooled with water. Therefore, although the alignment film 10 is cooled in contact with the back roll 5, the alignment film 10 is in contact with the peripheral surface of the back roll 5 and receives a certain frictional force, and remains constrained in the width direction. Even if the alignment film 10 is cooled in contact with the back roll 5, the alignment film 10 does not shrink rapidly in the width direction, and the alignment film 10 remains expanded in the width direction during exposure as shown in FIG. Then, after leaving the back roll 5, the temperature is lowered by being cooled by the back roll 5, and the width at the normal temperature is restored. Therefore, even if the back roll 5 is cooled, the obtained polarizing film 1 still has a shift in the line width of the polarizing portions 1a and 1b.

For this reason, the fifth embodiment is intended to obtain a polarizing film in which the exposed portions can be formed at predetermined intervals regardless of the thermal expansion of the alignment film 10 and the polarizing portions are formed with high accuracy. To do. FIG. 9 is a schematic view showing a film exposure apparatus according to the fifth embodiment. As in the past, after the alignment material film is applied to the surface of the alignment film 10 by the coating device 2, it is conveyed to the back roll 5 via the air turn bars 3 and 4 (see FIG. 11). Then, the alignment film 10 is wound around the back roll 5 by approximately half (lower half) of the peripheral surface thereof, and is conveyed to a winding device for the alignment exposure film 11. The back roll 5 is a water-cooled roll whose inside is water-cooled, and is rotatable around its central axis. And this back roll 5 can rotate freely, and it rotates so that the peripheral speed becomes the same as the movement speed of the alignment film 10 with the movement of the alignment film 10. Thereby, the alignment film 10 is supported in a state where there is no relative speed difference on the peripheral surface of the back roll 5. Therefore, wrinkles are prevented from being generated on the peripheral surface of the back roll 5 in the alignment film 10 that is conveyed by applying an appropriate tension.

A slit mask 7b is arranged in the vicinity of the start end portion of the peripheral surface of the back roll 5 where the alignment film 10 is wound, so as to face the back roll 5, and behind the slit mask 7b. Is provided with a light source 6 of exposure light for exposing the alignment film 10 through a slit mask 7b. In addition, a slit mask 17 is disposed in the vicinity of the rear end portion of the peripheral surface of the back roll 5 where the alignment film 10 is wound so as to face the back roll 5. Behind 17, a light source 16 of exposure light for exposing the alignment film 10 through the slit mask 17 is disposed. Although the light source 6 and the light source 16 depend on the material of the alignment material film, for example, the polarization directions of the exposure light to be irradiated are different from each other or the alignment film 10 is irradiated with the exposure light from different directions. By doing so, as shown in FIGS. 2, 4, 6, and 8, the exposed

portions

10a, 10b or the exposed

portions

10c, 10d oriented in different directions can be alternately formed.

A cooling roll 8 is disposed on the upstream side of the back roll 5 in the traveling direction of the alignment film 10 so as to be rotatable around its central axis. The cooling roll 8 is a water-cooled roll whose inside is cooled with water. In the moving region of the alignment film 10, the cooling roll 8 rolls and rotates to the alignment film 10 to cool the alignment film 10. .

FIG. 10 is a schematic diagram showing the alignment film 10 developed in the vicinity of the back roll 5 and the slit masks 7 b and 17. A plurality of

slits

7c and 17a are formed in the slit masks 7b and 17, respectively, and the arrangement pitch of the

slits

7c and 17a corresponds to two scanning lines corresponding to the FPR type 3D liquid crystal display device. Equivalent to. The slit masks 7b and 17 are arranged by one scanning line so that the unexposed portion between the strip-shaped exposed portions by the slit 7c of the slit mask 7b is exposed by the slit 17a of the slit mask 17. The film 10 is shifted in the width direction. In other words, the slits 17a of the slit mask 17 are arranged at the same pitch as the arrangement pitch of the slits 7c of the slit mask 7b, and the slit mask 17 is oriented by a half of the arrangement pitch of the

slits

7c and 17a. The film 10 is arranged so as to be biased in the width direction.

Next, the operation of the film exposure apparatus of the present embodiment configured as described above will be described. An alignment material film is applied to the surface of the alignment film 10, and the movement trajectory is regulated in a state where air is blown from the air turn bars 3 and 4 to float and the film is conveyed to the back roll 5. At this time, the blown air is heated to a temperature, for example, 0 to 3 ° C. higher than the normal temperature in the process of discharging from the air turn bars 3 and 4, and the temperature also varies. Therefore, the alignment film 10 extends in width by 2ΔD (for example, 15 to 20 μm) rather than the width D ₀ (for example, 1500 mm) at normal temperature, and arrives at the position where the cooling roll 8 is disposed. The cooling roll 8 rolls to the back surface of the alignment film 10 to cool the alignment film 10, and the alignment film 10 gradually cools and contracts in the middle from the cooling roll 8 to the slit mask 7 b. , Its width gradually decreases. When the alignment film 10 reaches the position where the slit mask 7b is disposed, the width of the alignment film 10 returns to the width at room temperature before heating by the air turn bars 3, 4 or the like. Exposure light from the exposure light source 6 is received through the slit mask 7b at the position where the mask 7b is disposed.

That is, the alignment film 10 with the alignment material film coated on the surface is in contact with the lower half of the peripheral surface of the back roll 5, and wrinkles are stretched on the peripheral surface of the back roll 5 due to the tension during conveyance of the alignment film 10. It is supported in the state. Then, the alignment film 10 is continuously conveyed in the direction of the white arrow, and the exposure light is continuously irradiated from the exposure light source 6 at the start end portion of the portion supported by the back roll 5, so that the exposure light is slit mask. The alignment film 10 is irradiated through the slit 7c of 7b, and a strip-shaped exposed portion 10a aligned in the same direction is formed on the alignment material film. The strip-shaped exposure portions 10a are spaced apart from each other with an interval corresponding to one scanning line, and are formed at a pitch of two scanning lines.

Next, since the alignment film 10 moves to the position where the slit mask 17 is disposed at the rear end portion of the support portion by the back roll 5, the alignment film 10 is irradiated with exposure light from the exposure light source 16 through the slit mask 17. . Then, the unexposed portion by the slit 7c is exposed to the exposure light from the exposure light source 16 via the slit 17a of another slit mask 17 shifted in the width direction of the alignment film 10 by one scanning line with respect to the slit mask 7b. Receive irradiation. Thereby, the strip-shaped exposure parts 10b oriented in the same direction are formed between the exposure parts 10a, and the strip-shaped

exposure parts

10a, 10b are alternately formed. The exposure unit 10a is −45 ° linearly polarized light, the exposure unit 10b is + 45 ° linearly polarized light, or the exposure unit 10a is CW circularly polarized light, and the exposure unit 10b is a CCW circularly polarized film. Thereby, an FPR type polarizing film can be manufactured.

In this case, the alignment film 10 is heated by exposure light exposure at the time of exposure, but the alignment film 10 is not heated by being cooled by the water-cooled back roll 5. Therefore, the alignment layer 10, while being supported in contact with the back roller 5, always has a constant temperature, it is not that the width D ₀ is varied by heat. Therefore, the

exposure portions

10a and 10b corresponding to the respective lines of the scanning line can be formed on the alignment film 10 with high accuracy and the positions of the respective lines of the scanning line.

As described above, according to the present embodiment, the alignment film 10 is cooled by the cooling member before reaching the back roll. Therefore, when the alignment film 10 is wound around the back roll, for example, it is at normal temperature and is effective at normal temperature. By using a simple slit mask, it is possible to form a strip-shaped exposed portion with high accuracy.

Further, the present invention is not limited to the above embodiment, and various modifications can be made. The cooling member is not limited to the cooling roll 8, and a low-temperature object may be used in non-contact with the alignment film 10. That is, by passing the alignment film 10 in the vicinity of a low-temperature object, the alignment film 10 can be cooled by radiant heat transfer.

Further, the present invention is not limited to the manufacture of FPR type polarizing films, and can be applied to the formation of alignment films for expanding the viewing angle, for example.

Next, a sixth embodiment of the present invention will be described. In this embodiment, an inspection unit is arranged on the downstream side of the exposure unit in the moving direction of the alignment exposure film that is exposed to the alignment film, and the exposure unit irradiated with the exposure light in the alignment exposure film is inspected. is there. The inspection unit winds the alignment exposure film and rotates with the alignment exposure film, and a light source that emits illumination light for inspection installed on a peripheral surface of the inspection roll or inside the roll, And a light receiving unit that is disposed so as to face the roll and detects illumination light transmitted through the alignment exposure film.

FIG. 15 is a plan view showing an inspection unit of the film exposure apparatus according to the embodiment of the present invention, and FIG. 16 is a front sectional view of the same. Since the configuration of the exposure unit of the present embodiment is the same as that shown in FIGS. 1 and 2 of the first embodiment, a detailed description thereof will be omitted. As shown in FIGS. 1 and 2, an alignment material film is applied on the surface of the film substrate by an appropriate application apparatus, and the alignment film 10 to which the alignment material film is applied is left as it is. 51, or once wound up as a roll 100 as shown in FIG. 51, then unwound from the roll 100 and fed to the back roll 5. After the alignment film 10 is exposed by the back roll 5 to form an exposure part, the alignment exposure film 11 on which the exposure part is formed is sent to an inspection part to be described later.

Next, the inspection unit will be described with reference to FIGS. 15 and 16. The alignment exposure film 11 is fed as it is to the roll 20 of the inspection section, wound around the roll 20, and then wound around the winding roller 101 (see FIG. 51). A groove 20a extending in the roll axis direction is formed on the peripheral surface of the roll 20 of the inspection unit, and a rod-shaped inspection illumination light source 21 extending in the roll axis direction is disposed in the groove 20a. Further, a linearly polarizing plate 22 in a first direction (for example, p-polarized light) extending in the roll axis direction is disposed above the light source 21 in the groove 20a. The alignment exposure film 11 is wound around the roll 20 so as to move at least in contact with the upper portion thereof, and an inspection camera 25 that detects illumination light is directly above the roll axis of the roll 20. Has been placed. The inspection camera 25 is a line sensor that extends in the axial direction of the roll 20, or an area sensor that detects light in a horizontally-long rectangular two-dimensional region in the axial direction of the roll 20. A lower λ / 4 plate 23 and an upper linear polarizing plate 24 in the second direction (for example, s-polarized light) are disposed between the inspection camera and the roll axis. The roll 20 is freely rotatable around its axis. When the alignment exposure film 11 is wound around the roll 20 and moved, the roll 20 is moved by the frictional force between the alignment exposure film 11 and the roll 20. The peripheral speed rotates in the same state as the moving speed of the alignment exposure film 11. When the groove 20a of the roll 20 is rotated to the upper end of the roll, the light source 21 and the camera 25 face each other on the vertical optical axis.

FIG. 17 is a schematic diagram showing the polarization state of light by the linear polarizing plate 61, the

film portions

62a and 62b corresponding to the

exposure portions

10a and 10b, and the λ / 4 plate 63. The λ / 4 plate that converts linearly polarized light incident at 45 ° to the optical axis into CW circularly polarized light is a CW circularly polarizing plate, and linearly polarized light incident at 45 ° to the optical axis is converted to CCW circularly polarized light. The λ / 4 plate to be used is a CCW circularly polarizing plate. In addition, among the incident light, a polarization component that is converted into CW circular polarization by the CW circular polarization plate is p polarization, a polarization component perpendicular to the p polarization is s polarization, and a linear polarization plate that transmits only p polarization is a p polarization plate. A linearly polarizing plate that transmits only s-polarized light is referred to as an s-polarizing plate. As shown in the upper diagram of FIG. 17, the illumination light emitted from the light source 60 is converted into p-polarized light by the p-polarizing plate 61. This p-polarized light is transmitted through the film portion 62a corresponding to the CW circularly polarized first exposure portion 10a and converted to CW circularly polarized light. When this CW circularly polarized light passes through the CW circularly polarizing plate 63, it is converted into s-polarized light. On the other hand, as shown in the lower diagram of FIG. 17, the illumination light emitted from the light source 60 is converted into p-polarized light by the p-polarizing plate 61, and then the film portion corresponding to the CCW circularly-polarized second exposure unit 10b. When the light passes through 62b, it is converted into CCW circularly polarized light. When this CCW circularly polarized light passes through the CW circularly polarizing plate 63, it is converted into p-polarized light.

In this way, the light transmitted through the first exposure portion 10a (CW circular polarization portion) of the alignment exposure film 11 exits the CW circular polarization plate as s-polarized light, and the second exposure portion 10b ( The light transmitted through the CCW circularly polarized light portion is emitted from the CW circularly polarizing plate as p-polarized light. For this reason, when an s polarizing plate is installed between the CW circularly polarizing plate and the camera, light transmitted through the CW circularly polarizing part of the alignment exposure film 11 enters the camera and is detected as a bright part, and the alignment exposure film 11 is detected. The light that has passed through the CCW circularly polarized light portion is not incident on the camera and is detected as a dark portion. On the other hand, when a p-polarizing plate is installed between the CW circularly polarizing plate and the camera, the light transmitted through the CCW circularly polarizing portion of the alignment exposure film 11 enters the camera and is detected as a bright portion. The light transmitted through the CW circularly polarized light does not enter the camera and is detected as a dark part. Therefore, by combining the linearly polarizing plate and the λ / 4 plate, the strip-shaped exposed portion on the alignment exposure film 11 can be detected.

Next, the operation of the film exposure apparatus of this embodiment configured as described above will be described. The alignment film 10 is coated with an alignment material film on its surface. For example, the width is 1500 mm, the thickness is 100 μm, and the film length of one roll 100 is 2 km, for example, usually at a speed of 2 to 10 m / min. Be transported. For example, the material of this base material is a COP (cycloolefin polymer) or TAC (triacetyl cellulose) film. This alignment film 10 is fed to the position where the back roll 5 is disposed, and is wound around and supported by the back roll 5. The alignment material film of the alignment film 10 is irradiated with CW circularly polarized exposure light from the exposure light source 6 through the opening 7 a of the mask 7 over almost the entire area of the alignment film 10. CCW circularly polarized exposure light is irradiated in a band shape through the slit 17a of the mask 17, and the portion of the alignment film 10 corresponding to the slit 17a overwrites the CCW circularly polarized exposed portion from the CW circularly polarized exposed portion. Exposed. At this time, the alignment material film of the alignment film 10 is a reversible alignment material film, and substantially the entire surface of the alignment film 10 is aligned by irradiation of the entire alignment film 10 with CW circularly polarized exposure light. The band-shaped portion in the alignment film 10 is aligned by irradiation with the band-shaped irradiation light of circularly polarized light. Thereby, the exposure part 10b (refer FIG. 2) by CCW circularly polarized light is formed in the part corresponding to the slit 17a of the alignment film 10. FIG. On the other hand, an exposed portion 10a by CW circularly polarized light is formed in the band-like portion between the exposed portions 10b. In this way, it is possible to manufacture an FPR type polarizing film in which the exposing

portions

10a and 10b can be formed with high accuracy. Further, since the exposure through the mask 7 is performed on the entire area in the width direction of the alignment film 10, the alignment between the mask 7 and the slit mask 17 is unnecessary, and there is no alignment defect. Even in this respect, the exposed

portions

Then, the exposed alignment exposure film 11 is conveyed as it is to the roll 20 of the inspection section, wound around the roll 20, and then wound around the winding roll 101 (see FIG. 51). In this inspection section, the alignment exposure film 11 moves at the same moving speed as the peripheral speed of the roll 20 as the roll 20 rotates. Then, when the light source 21 in the groove 20 a of the roll 20 rotates upward, the light source 21 and the camera 25 face each other, and illumination light from the light source 21 enters the camera 25. At this time, the optical axes of the light source 21 and the camera 25 coincide with each other, and the p polarizing plate 22, the λ / 4 plate 23, and the s polarizing plate 24 are positioned on the optical axis. The illumination light from the light source 21 is given a p-polarization polarization axis by the p-polarizing plate 22, and this illumination light passes through the alignment exposure film 11 and becomes CW circularly polarized light or CCW circularly polarized light λ. / 4 plate 23, and this λ / 4 plate 23 converts the circularly polarized light transmitted through the alignment exposure film 11 into linearly polarized light, and thereafter, only the light having the s-polarized polarization axis is inspected by the s polarizing plate 24. Incident on the camera 25. In this case, when the exposure part 10a on the alignment exposure film 11 has CW circular polarization and the exposure part 10b on the alignment exposure film 11 has CCW circular polarization, it is converted into linearly polarized light by the λ / 4 plate 23. As for the transmitted light, only the transmitted light having the s-polarized polarization axis is incident on the camera 25, and the transmitted light having the p-polarized polarization axis is not incident on the camera 25. Thereby, in the camera 25, only the light transmitted through either the exposure unit 10a or the exposure unit 10b is brightly detected, and the width (line width) of the exposure unit 10a or the exposure unit 10b can be detected. When the alignment direction of the exposure unit 10a or the exposure unit 10b is incorrect, the contrast of transmitted light detected by the camera 25 is small, and the alignment direction can be detected. If there is an orientation abnormality in the joint portion when a small mask is used, it can be detected as an abnormality in the width of the exposed portion or an incorrect orientation direction.

Thus, in this embodiment, every time the roll 20 makes one rotation, the line width, the alignment direction, the state of the joint portion, etc. of the alignment exposure film 11 can be inspected. That is, the exposed portion can be inspected with respect to the alignment exposure film 11 for each peripheral length of the roll 20. Therefore, when an abnormality is found by the inspection of the exposed portion, the exposure can be stopped and the subsequent useless film exposure can be avoided, thereby improving the yield. In this case, since the alignment exposure film 11 is supported on the peripheral surface of the roll 20, the alignment exposure film 11 is thin and hollow, and the alignment exposure film 11 does not vibrate, and the alignment exposure film 11 is inspected with high accuracy. be able to. The alignment exposure film 11 is bent horizontally at the edge of the groove 20a of the roll 20, but if the edge of the groove 20a is processed smoothly, the edge is scratched on the alignment exposure film 11. I won't be confused.

Next, a seventh embodiment of the present invention will be described with reference to FIG. In the present embodiment, the roll 26 of the inspection unit is formed of a transparent material such as transparent glass, and the light source 21 and the p polarizing plate 22 are embedded in the roll 26. That is, the groove 26a is formed on the peripheral surface of the transparent roll 26, and after the light source 21 and the p-polarizing plate 22 are installed in the groove 26a, the upper portion of the groove 26a is closed with the transparent lid 26b. The upper surface of the lid 26b is curved with the same curvature as the circumferential surface of the roll 26, and the roll 26 has a smooth cylindrical circumferential surface with the lid 26b installed. Therefore, in the present embodiment, the alignment exposure film 11 is not bent at the groove 26a. In this embodiment, since the roll 26 and the lid 26b are made of a transparent material, the illumination light is emitted to the outside of the roll, passes through the alignment exposure film 11, and finally enters the camera 25.

Furthermore, the number of grooves is not limited to one as in the above embodiments, and a plurality of grooves may be provided. Thereby, the pitch of the test | inspection location in the orientation exposure film | membrane 11 can be shortened, and it can test | inspect frequently. In the present invention, the λ / 4 plate 23 may be a CW circularly polarizing plate or a CCW circularly polarizing plate. In addition, the λ / 4 plate 23 is not limited to being installed above the roll, but can also be installed inside the

grooves

20a and 26a of the

rolls

20 and 26. Furthermore, the p polarizing plate 22 and the s polarizing plate 24 may be disposed upside down.

The present invention also applies to the exposure apparatus of the second embodiment shown in FIGS. 3 and 4, the exposure apparatus of the third embodiment shown in FIGS. 5 and 6, and the exposure apparatus of the fourth embodiment shown in FIGS. Can be applied. The first embodiment of FIGS. 1 and 2 and the second embodiment of FIGS. 3 and 4 relate to the formation of the FPR polarizing film, but the third embodiment of FIGS. 5 and 6 and FIGS. The fourth embodiment of FIG. 8 relates to the formation of a photo-alignment film.

Next, an eighth embodiment of the present invention will be described with reference to FIGS. The exposure unit of the eighth embodiment is different from the exposure unit of the sixth embodiment shown in FIGS. 15 and 16 in the vicinity of the roll 20 between the λ / 4 plate 23 and the roll 20 and the width of the alignment exposure film 11. The difference is that a scale member 30 extending in the direction is provided. The scale member 30 is provided with a scale as a scale in the longitudinal direction (the width direction of the alignment exposure film 11), and the camera 25 is provided with the first exposure unit 10a or the second exposure unit 10b on the alignment exposure film 11. At the same time, the scale (scale) of the scale member 30 is detected.

In the present embodiment, the first polarizing plate 22, the second polarizing plate 24, and the λ / 4 plate 23 make the image of the first exposure unit 10a incident on the camera 25 and the image of the second exposure unit 10b. Overlapping and the scale image of the scale member 30 also enters the camera 25, unlike the sixth embodiment, the line widths of the first exposure unit 10a and the second exposure unit 10b can be directly measured by the scale.

In the present invention, in addition to the inspection unit of the above embodiment, a second inspection unit may be disposed in the transport area of the alignment exposure film before or after the inspection by the inspection unit. The second inspection unit includes: a second light source that emits inspection light; a third polarizing plate that imparts linearly polarized light in a first direction to the inspection light from the second light source; and A second λ / 4 plate that changes the inspection light transmitted through the polarizing plate 3 and further through the alignment exposure film and provided with the circularly polarized light in the first direction into linearly polarized light in the second direction; A fourth polarizing plate that transmits the linearly polarized inspection light in the direction 2, a second light receiving unit that detects the inspection light transmitted through the fourth polarizing plate, and a third light source that emits the inspection light. , A fifth polarizing plate that imparts linearly polarized light in the first or second direction to the inspection light from the third light source, and the third polarizing plate that passes through the alignment exposure film. A third λ / 4 plate for converting the inspection light given the circularly polarized light in the second direction into the linearly polarized light in the second or first direction, and the second or first direction A sixth polarizing plate that transmits linearly polarized inspection light; and a third light receiving unit that detects the inspection light transmitted through the sixth polarizing plate.

Next, a ninth embodiment of the present invention will be described with reference to FIGS. In the present embodiment, in addition to the eighth embodiment shown in FIGS. 19 and 20, foreign matters or scratches on the surface of the alignment exposure film 11 are inspected. In the present embodiment, the alignment exposure film 11 wound around the roll 20 is further wound around the roll 40 and wound around a winding roll (not shown). The alignment exposure film 11 moves, for example, horizontally between the roll 20 and the roll 40, and in the moving area of the alignment exposure film 11 between the

rolls

20 and 40, a light source 31a, a third polarizing plate 32a, The second λ / 4 plate 33a, the fourth polarizing plate 34a, and the camera 35a are arranged with the alignment exposure film 11 sandwiched between the third polarizing plate 32a and the second λ / 4 plate 33a. Furthermore, the light source 31b, the fifth polarizing plate 32b, the third λ / 4 plate 33b, the sixth polarizing plate 34b, and the camera 35b are provided with the fifth polarizing plate 32b and the third λ / 4 plate 33b. The alignment exposure film 11 is interposed therebetween.

In the present embodiment, as in the eighth embodiment, after the line widths of the first exposure unit 10a and the second exposure unit 10b are directly measured by the scale member 30, the alignment exposure film 11 is formed between the camera 35a and the camera 35b. The installation position is reached. Then, as shown in FIG. 23, the inspection light from the light source 31a becomes p-polarized light by the third polarizing plate 32a which is a p-polarizing plate, and the CW circularly polarized light (first circularly polarized light) of the alignment exposure film 11 is obtained. 1 is transmitted through the exposure unit 10a and converted into CW circularly polarized light, and then converted into s-polarized light by the second λ / 4 plate 33a which is a CW circularly polarizing plate (see the upper diagram of FIG. 17), p It does not pass through the fourth polarizing plate 34a, which is a polarizing plate, and does not enter the camera 35a. Therefore, the part of the first exposure unit 10a is detected by the camera 35a as a dark part. On the other hand, the light that has passed through the second exposure unit 10b that is CCW circularly polarized light is converted to p-polarized light by the second λ / 4 plate 33a that is a CW circularly polarizing plate (see the lower diagram in FIG. 17), and is a p polarizing plate. Since the light passes through the fourth polarizing plate 34a and enters the camera 35a, the camera 35a detects this portion as a bright portion. In this case, when the ridge 51 (or peeling) is present on the first exposure part 10a, this part is not converted into CW circularly polarized light, and thus is detected as a bright part in the band of the dark part. In addition, when the foreign matter 52 is present on the second exposure unit 10b, the portion of the foreign matter 52 does not transmit light, and therefore, in the band portion of the second exposure unit 10b detected as a bright portion by the camera 35a, It is detected as a dark part.

In the inspection unit in which the light source 31b and the camera 35b are arranged, the inspection light transmitted through the second exposure unit 10b of CCW circularly polarized light (second circularly polarized light) is a CCW circularly polarizing plate, contrary to the above. The third λ / 4 plate 33b is converted into s-polarized light, does not pass through the sixth polarizing plate 34b, which is a p-polarizing plate, and does not enter the camera 35b. Therefore, this portion is detected by the camera 35b as a dark part. The inspection light transmitted through the portion of the first exposure unit 10a of CW circularly polarized light (first circularly polarized light) is converted into CW circularly polarized light, and then the third λ / 4 plate 33b, which is a CCW circularly polarizing plate, Since it is converted into p-polarized light, passes through the sixth polarizing plate 34b, which is a p-polarizing plate, and enters the camera 35b, the camera 35b detects this portion as a bright portion. Therefore, in the camera 35b, the eyelid 51 (or peeling) on the second exposure unit 10b is detected as a bright part in the dark part band, and the foreign matter 52 on the first exposure part 10a is in the bright part band. It is detected as a dark part. In this way, defects such as the foreign matter 52 or the ridge 51 on the alignment exposure film 11 are detected by either the

camera

35a or 35b. That is, the eyelid 51 on the first exposure unit 10a is detected by the camera 35a, and the foreign matter 52 is detected by the camera 35b. The eyelids 51 on the second exposure unit 10b are detected by the camera 35b, and the foreign matter 52 is detected by the camera 35a.

According to the present invention, the alignment film 10 is exposed while the exposure film 10 is moving, and the alignment exposure film 11 is wound around a roll during the movement of the exposed alignment exposure film 11. Then, the illumination light for inspection is emitted from the light source arranged inside the roll, and the alignment exposure film 11 is irradiated with the illumination light while being wound around the roll. And the illumination light which permeate | transmitted the alignment exposure film 11 is received by the light-receiving part arrange | positioned outside the roll, and the alignment exposure film 11 is test | inspected. As a result, when the light source rotates to the light receiving unit along with the rotation of the roll, the illumination light transmitted through the alignment exposure film 11 is detected by the light receiving unit, the exposure quality is inspected, and the alignment exposure film 11 moves. In the meantime, the exposure quality is inspected at the same interval as the circumference of the roll. As a result, if there is a problem in exposure quality, film exposure can be stopped immediately after the problem has been detected, and the mask exposure can be adjusted and then restarted, so unnecessary exposure can be avoided. In forming a polarizing film, the yield can be improved. Moreover, in the present invention, since the alignment exposure film 11 wound around the roll is inspected, the inspection accuracy does not decrease due to the vibration of the alignment exposure film 11 in the hollow state, and the high accuracy. Can be inspected.

Next, a tenth embodiment of the present invention will be described. The exposure apparatus of this embodiment is a pair of a transport device that moves an alignment film to be exposed in a first direction and a film alignment mark that forms an index of the amount of expansion / contraction of the alignment film on both sides of the alignment film. The alignment marker, a light source that emits exposure light, and a plurality of slits arranged at intervals in a second direction orthogonal to the first direction are formed in the second direction. A mask having mask alignment marks formed at both ends thereof, and an opening extending in the second direction and intersecting all the slits, and the exposure light is formed at a portion where the opening and the slit intersect. A light shielding member that transmits light, a detection unit that detects the film alignment mark together with the mask alignment mark, and the light shielding member and the mask in the first direction. A control unit that controls a relative position, and the slit has a width that linearly changes with respect to the first direction, and an interval between the slits when viewed in the second direction. It is the same as the width of the slit, and the control unit is arranged between the mask and the light shielding member so that the positional relationship between the mask alignment mark and the film alignment mark detected by the detection unit is a predetermined relationship. The relative position in the first direction is controlled.

24A is a side view showing the overall configuration of the exposure apparatus according to the embodiment of the present invention, FIG. 24B is a plan view showing a mask, and FIG. 24C shows an aperture as a light shielding member. It is a top view. As shown in FIG. 24A, the exposure apparatus according to the present embodiment is continuously supplied with the alignment film 201 to be exposed from, for example, a roll-shaped supply reel 241 and wound on the take-up reel 244. In the meantime, for example, an alignment material film is applied, exposed, and dried. In FIG. 24A, only the exposure process for the alignment film 201 is shown. For example, the supply reel 241 and the take-up reel 244 are rotationally driven by a driving device such as a motor so that the alignment film 201 is continuously supplied into the exposure apparatus and is provided on the front surface side or the back surface side of the alignment film 201. The alignment film 201 is supported in a tension state by the

transport rollers

242, 243 and the like. In the exposure apparatus, the alignment film 201 is moved in one direction by the rotational driving force of the supply reel 241 and the take-up reel 244. In the present embodiment, two sets of a light source, a mask, and an aperture are provided above the alignment film 201 between the two

transport rollers

242 and 243. Then, the exposure light beams having different polarization directions are emitted from the light sources 205A and 205B, respectively, and the alignment material film formed on the surface of the alignment film 201 is irradiated with the exposure light transmitted through the apertures 203A and 203B and the masks 202A and 202B. Thus, an exposed portion having a different orientation direction for each exposure light is formed in a strip shape. That is, for example, exposure light a emitted from the light source 205A forms an exposure part a that transmits linearly polarized display light having a polarization direction of −45 ° or circularly polarized light having a polarization direction of CW (Clock Wise), and the light source 205B. The exposure portion b that transmits linearly polarized light having a polarization direction of + 45 ° or circularly polarized light having a polarization direction of CCW (Counter Clock Wise) is formed by the exposure light emitted from.

On the upstream side in the moving direction of the alignment film 201, linear film alignment marks 201a are formed on both sides of the alignment film 201 at positions where the alignment film 201 is not thermally deformed by heating during exposure or cooling during conveyance. An alignment marker 206 to be formed is provided. The film alignment mark 201 a may be formed on the film base material of the alignment film 201 or may be formed on the alignment material film of the alignment film 201.

As shown in FIG. 24B, the mask 202 has a plurality of slits 202b in a direction (second direction) orthogonal to the moving direction (first direction) of the alignment film 201, on a base portion 202a made of a light-shielding material. The slits 202b are arranged so that the width thereof changes linearly with respect to the longitudinal direction, and the interval between the slits is the width of the slit with respect to the direction orthogonal to the moving direction of the alignment film 201. Is the same. That is, in the mask shown in FIG. 24B, the width of each slit 202b is narrowest at the top, and is widened as it goes downward along the longitudinal direction of the slit. Each slit 202b extends in an inclined manner in the moving direction of the alignment film 201. The inclination of the slit 202b is larger on the side side than the center of the mask 202 in the direction orthogonal to the moving direction of the alignment film 201. For example, the length of each slit 202b in the moving direction of the alignment film 201 is 300 mm. In this case, the edge of the slit on the most side of the mask 202 is provided such that the end portion in the moving direction of the alignment film 201 is offset by about 500 μm in the direction orthogonal to the moving direction of the alignment film 201.

On the side of the mask 202, for example, an observation window 202d for detecting the film alignment mark 201a formed on the side of the alignment film 201 by the alignment marker 206 has the same length as the slit in the moving direction of the alignment film 201, for example. The mask alignment mark 202e is provided in the observation window 202d so as to be inclined with respect to the moving direction of the alignment film 201. The mask alignment mark 202e is a linear mark parallel to the side edges of the slits 202b located at both ends in a direction orthogonal to the moving direction of the alignment film 201, for example. As shown in FIG. 24A, a camera 207 (reference numerals 207A and 207B in FIG. 24) is provided above the mask 202, and is observed together with the mask alignment mark 202e by the camera 207 (207A and 207B). The film alignment mark 201a can be detected through the window 202d.

The aperture 203 is a light-shielding plate material made of, for example, SUS, and as shown in FIG. 24C, an opening 203b having a width of, for example, 20 to 30 mm so as to extend in one direction is formed at the center of the base portion 203a. Is provided. And it arrange | positions between the light source 205 and the mask 202 so that the longitudinal direction of this opening 203b may be orthogonal to the moving direction of the alignment film 201. FIG. Therefore, a part of the exposure light emitted from the light source 205 is shielded by the aperture 203, and only the exposure light transmitted through the opening 203 b of the aperture 203 is irradiated to the mask 202. Therefore, the control unit controls the relative position between the mask 202 and the light shielding member 203 in the moving direction of the alignment film 201, so that the irradiation position of the exposure light on the mask 202 moves in the moving direction of the alignment film 201, The irradiation position of the exposure light that passes through the slit 202b of the mask 202 and is irradiated onto the alignment film 201 moves in the moving direction of the alignment film 201, and the width of the exposure light irradiation area changes.

As shown in FIG. 25, the mask 202 is configured to be movable in the moving direction of the alignment film 201 relative to the aperture 203 by an actuator or the like (not shown), for example. A relative position in the moving direction of the alignment film 201 with respect to 202 is controlled by a control unit (not shown). Then, the relative position between the mask 202 and the light shielding member 203 in the moving direction of the alignment film 201 is, for example, as follows so that the positional relationship between the mask alignment mark 202e and the film alignment mark 201a becomes a predetermined relationship by the control unit. Controlled.

As described above, in the present embodiment, the plurality of slits 202b provided in the mask 202 extend while being inclined in the moving direction of the alignment film 201, and the width of each slit 202b is the moving direction of the alignment film 201. The distance between the slits is the same as the width of the slits when viewed from the direction orthogonal to the moving direction of the alignment film 201. Therefore, as shown in FIGS. 25A and 25B, when the mask 202 is moved in the moving direction of the alignment film 201 relative to the aperture 203, the aperture 203 opens accordingly. The irradiation position of the exposure light irradiated to the mask 202 through 203b is moved in the moving direction of the alignment film 201, and the width of the irradiation area of the exposure light transmitted to the alignment film 201 through the slit 202b is changed. To do. Thereby, for example, even when the alignment film 201 expands due to a high temperature at the time of exposure, the width of the strip-shaped exposed portion formed on the alignment film 201 is adjusted in accordance with the width of the alignment film 201 after deformation. can do. In the present embodiment, for example, the control unit separates the mask alignment mark 202e detected by the camera and the film alignment mark 201a from each other by a certain distance (for example, 10 mm) in a direction orthogonal to the moving direction of the alignment film 201. As described above, the mask 202 is moved in the moving direction of the alignment film 201. Thus, even when the alignment film 201 expands in the width direction, the width of the exposed portion on the alignment film 201 can be adjusted based on the amount of elongation of the alignment film 201 in the width direction.

The method for controlling the width of the exposure portion by this control portion will be described in detail with reference to FIG. FIG. 26 is a diagram illustrating adjustment of the mask position by the film alignment mark and the mask alignment mark as an example. FIG. 26A is a diagram illustrating a state in which the alignment film is not deformed in the width direction, and FIG. ) Is a view showing a state in which the alignment film is expanded in the width direction. In FIG. 26, reference numeral 271 indicates a detection area by the camera 207. For example, the width of the detection area 271 in the moving direction of the alignment film 201 is the same as the opening 203b of the aperture 203. The alignment mark 201a and the mask alignment mark 202e are detected at positions aligned in the movement direction of the opening 203b and the alignment film 201. As shown in FIG. 26A, when the alignment film 201 is not deformed in the width direction, the distance between the film alignment mark 201a and the mask alignment mark 202e in the detection region 271 is, for example, 10 mm. Here, when the alignment film 201 expands in the width direction due to, for example, heating during exposure, as shown in FIG. 26B, the position of the film alignment mark 201a is outside (see FIG. 26) in the observation window 202d. The distance to the mask alignment mark 202e increases. Therefore, when the exposure is continued with the position of the aperture 203 shown in FIG. 26A, the alignment film 201 is cooled and contracted by subsequent conveyance, for example, and returned to the original width that has not expanded. The width of the exposed portion is reduced. Accordingly, the widths of the exposure part a and the exposure part b formed on the alignment exposure film 201c after exposure are smaller than, for example, the width of pixels or picture elements of the display device, and the exposure part a, the exposure part b, and the display device. A deviation of the width occurs between the pixel or the picture element and causes a display defect.

In this embodiment, the control unit controls the position of the mask 202 in the moving direction of the alignment film 201, for example, so as to maintain a certain distance between the film alignment mark 201a and the mask alignment mark 202e. That is, as shown in FIG. 26B, the control unit places the mask 202 in the aperture 203 so that the distance between the film alignment mark 201a and the mask alignment mark 202e is 10 mm in the detection area 271 by the camera 207. On the other hand, the alignment film 201 is moved in the moving direction so that the opening 203b of the aperture 203 corresponds to the wide area of the slit 202b of the mask 202. Therefore, in the present embodiment, the width of the exposed portion on the alignment exposure film 201c can be widely adjusted based on the amount of elongation in the width direction of the alignment film 201. Thereby, in this embodiment, even when the alignment exposure film 201c is cooled and contracted by subsequent conveyance, for example, and returns to the original width that has not expanded, the exposed portion formed on the alignment exposure film 201c. The width of a and the exposure part b can be made to correspond with the width of the pixel or picture element of the display device with high accuracy, and display defects can be prevented.

In addition, the mask slit 202b and the film alignment mark 201a are actually separated by, for example, about 30 mm, but the mask alignment mark 202e is perpendicular to the moving direction of the alignment film 201 as in this embodiment. By configuring parallel to the side edges of the slit 202b located at both ends, the mask alignment mark 202e can be regarded as the side edge of the slit 202b provided at the end in the direction orthogonal to the moving direction of the alignment film 201. For example, alignment can be performed within a narrow range of about 10 mm, and the width of the exposed portion can be adjusted.

In FIG. 26, for convenience of illustration, only one side of the alignment film 201 and the mask 202 is shown. However, the mask position is controlled by the film alignment marks 201a on both sides of the alignment film 201. This is performed between the mask alignment marks 202e on both sides of the mask 202. That is, the distance between the film alignment mark 201a on one side of the alignment film 201 and the mask alignment mark 202e and the distance between the film alignment mark 201a on the other side of the alignment film 201 and the mask alignment mark 202e are: , Both are, for example, 10 mm.

However, if the alignment film 201 meanders while moving between the

transport rollers

242, 243, the center position of the mask 202 and the center position of the alignment film 201 in the direction orthogonal to the moving direction of the alignment film 201 are shifted, and the alignment film 201 The distance between the film alignment mark 201a and the mask alignment mark 202e on one side is different from the distance between the film alignment mark 201a and the mask alignment mark 202e on the other side. In order to solve this problem, in the present embodiment, the control unit determines that the center position of the pair of mask alignment marks detected by the camera 207 is a pair of film alignments in a direction orthogonal to the moving direction of the alignment film 201. The position of the mask 202 in the direction perpendicular to the moving direction of the alignment film 201 is adjusted so as to coincide with the center position of the mark 201a, and thereby the center position of the mask 202 and the center position of the alignment film 201 can be aligned. It is configured as follows. That is, even if meandering occurs, the distance between the film alignment mark 201a on one side of the alignment film 201 and the mask alignment mark 202e, the film alignment mark 201a on the other side of the alignment film 201, and the mask alignment mark 202e Is controlled to be 10 mm, for example.

Next, the operation of the exposure apparatus of the present embodiment configured as described above will be described. The alignment film 201 to be exposed is continuously supplied from, for example, a roll-shaped supply reel 241 and is wound on the take-up reel 244. For example, the alignment material film is applied, exposed, dried, and the like. Is given. That is, the alignment material is applied in the form of a film on the surface of the alignment film 201 supplied into the exposure apparatus.

As shown in FIG. 27, in this embodiment, first, a linear film alignment mark 201a is formed continuously or intermittently on the side of the alignment film 201 supplied into the exposure apparatus by the alignment marker 206. To do. At the time of forming the film alignment mark 201a, the alignment film 201 is not thermally deformed. The alignment film 201 on which the film alignment mark 201a is formed is continuously supplied into the exposure apparatus by the rotational driving force of the supply reel 241 and the reel 244, for example, and in the exposure apparatus, by the

transport rollers

242, 243, etc. It is supported and moved in one direction in the exposure apparatus. At this time, for example, the alignment film 201 expands due to a high temperature during exposure. While the alignment film 201 is being transported by the

transport rollers

242, 243, etc., in particular, the alignment film 201 is easily deformed in the width direction orthogonal to the moving direction thereof, and the width of the alignment film 201 is increased by expansion due to heating. Become.

The alignment film 201 that has been thermally expanded before the exposure is transported to the exposure light irradiation position by transport by the

transport rollers

242, 243 and the like. In the expanded alignment film 201, the film alignment mark 201 a is not extended in the width direction. As shown in FIG. 26B, the film alignment mark 201 a is outside (left side in FIG. 26) in the observation window 202 d. Has moved. The camera 207 detects the film alignment mark 201a through the observation window 202d together with the mask alignment mark 202e, and the detection result is transmitted to a control unit (not shown). Then, the control unit moves the mask 202 with respect to the aperture 203 by, for example, an actuator or the like so that the distance between the film alignment mark 201a and the mask alignment mark 202e is 10 mm in the detection region 271 by the camera 207. The aperture 203b of the aperture 203 is made to correspond to the wide area of the slit 202b of the mask 202.

In the present embodiment, the slit 202 b provided in the mask 202 has a length of 300 mm in the moving direction of the alignment film 201, and the edge of the slit 202 b on the most side of the mask 202 moves the alignment film 201. The distance between the end portions in the direction is set to be displaced by about 500 μm (1000 μm on both sides of the mask 2) in the direction orthogonal to the moving direction of the alignment film 201. Therefore, for example, when the film alignment mark 201a moves to the side by 50 μm along with the elongation of the alignment film 201, the control unit corresponds to the state where the alignment film 201 is not expanded. Control is performed so as to move 30 mm in the moving direction of the alignment film 201 from the position, and the width of the exposure light irradiation region on the alignment film 201 is widened. That is, the exposure light emitted from the light sources 205A and 205B passes through the opening 203b of the aperture 203 and is irradiated onto the mask 202, but the relative position of the mask 202 with respect to the aperture 203 moves in the moving direction of the alignment film 201. As a result, the irradiation position of the exposure light that passes through the opening 203 b of the aperture 203 and is irradiated on the mask 202 moves in the moving direction of the alignment film 201. In the present invention, the plurality of slits 202b provided in the mask 202 extend while being inclined in the moving direction of the alignment film 201, and the width of each slit 202b is linear along the moving direction of the alignment film 201. It is provided to change. Therefore, when the irradiation position of the exposure light on the mask 202 moves in the movement direction of the alignment film 201 with the movement of the mask 202, the width of the exposure light irradiation region that is transmitted through the slit 202b and irradiated onto the alignment film 201 is increased. Change. As described above, in the present embodiment, even when the alignment film 201 expands and extends in the width direction, the alignment film 201 is formed on the alignment exposure film 201c after exposure so as to correspond to the width of the alignment film 201 after deformation. The width of the strip-shaped exposed portion can be adjusted. Therefore, in the present embodiment, exposure can be performed without replacing the mask 202 even when the alignment film 201 is deformed in the width direction orthogonal to the moving direction thereof.

The alignment material film applied on the alignment film 201 by the exposure light irradiation is photo-aligned in accordance with the polarization direction of the irradiation light to form the alignment exposure film 201c. For example, the exposure light a emitted from the light source 205A forms an exposure part a that transmits linearly polarized display light having a polarization direction of −45 ° or circularly polarized light having a polarization direction of CW (Clock Wise). On the other hand, since the exposure light is not transmitted between the slits 202b of the mask 202A, an unexposed part remains between the exposed parts a. Since the interval between the slits 202b of the mask 202A is the same as the width of the slit 202b, the unexposed portion between the exposed portions a has the same width as the exposed portion a. In the present embodiment, this unexposed portion is exposed by the light source 205B, the mask 202B, and the aperture 203B provided on the downstream side in the moving direction of the alignment film 201.

Also in this case, for example, the camera 207 detects the positions of the film alignment mark 201a and the mask alignment mark 202e, and the detection result is transmitted to a control unit (not shown). Then, similarly to the formation process of the exposure part a, the control part makes the mask 202 and the light shielding member 203 in the moving direction of the alignment film 201 so that the positional relation between the film alignment mark 201a and the mask alignment mark 202e becomes a predetermined relation. Control the relative position with For example, the mask 202 is controlled to move in the moving direction of the alignment film 201 relative to the aperture 203. Therefore, also on the downstream side of the alignment film 201 in the moving direction, the width of the strip-shaped exposed portion formed on the alignment exposure film 201c can be adjusted in accordance with the width of the alignment film 201. Even in the case of deformation in the width direction orthogonal to the moving direction, exposure can be performed without replacing the mask 202.

Then, by irradiation with exposure light emitted from the light source 205B, linearly polarized light having a polarization direction of + 45 ° or a polarization direction of CCW (Counter Clock Wise) so that an unexposed portion between the exposed portions a is adjacent to the exposed portion a. The exposure portion b that transmits the circularly polarized display light is formed.

The alignment film 201 may meander in a direction orthogonal to the moving direction thereof as it is conveyed. However, as in the present embodiment, in an exposure apparatus in which two sets of light sources 205, masks 202, and apertures 203 are provided and irradiates two types of exposure light having different polarization directions, the alignment material film is photo-aligned 2 The relative alignment of the irradiation positions of the types of exposure light is important. For example, if the irradiation position of the exposure light is shifted in the width direction of the alignment film 201, an unexposed region remains or an overexposed region is generated, resulting in an exposure failure. However, in this embodiment, the film alignment marks 201a are formed on both sides of the alignment film 201, and the control unit detects a pair of mask alignments detected by the camera 207 in the direction orthogonal to the moving direction of the alignment film 201. The position of the mask 202 in the direction orthogonal to the moving direction of the alignment film 201 is controlled so that the center position of the mark 202e coincides with the center position of the pair of film alignment marks 201a. That is, even if meandering occurs, the distance between the film alignment mark 201a on one side of the alignment film 201 and the mask alignment mark 202e, the film alignment mark 201a on the other side of the alignment film 201, and the mask alignment mark 202e Is controlled to be 10 mm, for example. Therefore, even when the alignment film 201 meanders with movement, the exposure failure can be prevented by adjusting the position of the mask 202 in the direction orthogonal to the movement direction of the alignment film 201.

The alignment exposure film 201c in which the exposure part a and the exposure part b are formed by irradiation with exposure light is cooled by conveyance and eventually shrinks to a width before expansion. Therefore, the exposure part a and the exposure part b formed wide have a predetermined width as the alignment exposure film 201c contracts, and a polarizing film as shown in FIG. 50 is manufactured.

As described above, in this embodiment, even when the alignment film 201 expands in the width direction due to heating, the mask is replaced by the slit shape provided in the mask 202, the configuration of the aperture 203, and control by the control unit. Can be exposed without any problem.

In the present embodiment, the case where the alignment film 201 expands due to heating has been described. However, even when the alignment film 201 is cooled and contracted, for example, before exposure, the controller aligns the mask alignment mark 202e. By controlling the relative position in the movement direction of the alignment film 201 between the mask 202 and the aperture 203 so that the positional relationship with the film alignment mark 201a becomes a predetermined relationship, the polarizing film 1 can be accurately adjusted without replacing the mask. Can be manufactured well.

Further, in this embodiment, two sets of the light source 205, the mask 202, and the aperture 203 are arranged along the moving direction of the alignment film 201, and the light sources 205A and 205B each emit exposure light having different polarization directions, and the exposure unit Although the case where a and the exposure part b are formed in a series of steps has been described, the exposure apparatuses that form the exposure part a and the exposure part b may use different exposure apparatuses. Alternatively, the alignment exposure film 201c having a different alignment direction can be formed by one exposure apparatus by polarizing the irradiation direction of the exposure light to the alignment film 201.

Further, in the present embodiment, the case where the aperture 203 is disposed between the light source 205 and the mask 202 has been described. However, in the present invention, the irradiation region of the exposure light with respect to the alignment film 201 is defined as the slit 202b of the mask 202. The aperture 203 may be disposed between the mask 202 and the alignment film 201, for example, as long as it can be regulated by the opening 203b of the aperture 203.

Furthermore, in this embodiment, the case where the camera 207 is provided above the mask 202 and the observation window 202d for detecting the film alignment mark 201a is provided on the side of the mask 202 has been described. In the present invention, for example, the detection unit such as the camera 207 may be provided below the alignment film 201. In this case, the observation window 202d may not be provided, and the mask alignment mark 202e is provided on the lower surface of the mask 202, for example, and the film alignment mark 201a and the mask alignment mark 202e are moved from below the alignment film 201 by the camera 207 You may comprise so that it can detect.

Furthermore, as the mask 202, a mask 202C having a slit 202b as shown in FIG. 28 can be used. Also in this mask 202C, the width of the plurality of slits 202b changes linearly with respect to the moving direction of the alignment film 201, and the interval between the slits is as viewed from the direction orthogonal to the moving direction of the alignment film 201. Further, it is the same as the width of the slit 202b. In the mask 202C shown in FIG. 28, among the slits provided at both ends of the mask 202C, the slit 202b provided at one end has a side edge provided in parallel with the moving direction of the alignment film 201. The other plurality of slits 202b extend while being inclined in the movement direction of the alignment film 201, and the inclination of the slit 202b is from one end side to the other end side in the direction orthogonal to the movement direction of the alignment film 201. It is provided to gradually increase. When such a mask 202C is used, the position of the mask 202 can be controlled with reference to the slit 202b at one end having a side edge parallel to the moving direction of the alignment film 201. For example, the slit 202b at the other end having the largest inclination with respect to the moving direction of the alignment film 201 has a length in the moving direction of the alignment film 201 of 300 mm, and its side edge is orthogonal to the moving direction of the alignment film 201 When the distance between the film alignment marks 201a is increased by 100 μm as the alignment film 201 is stretched, the control unit moves the mask 202 to the alignment film 201. Control is performed to move 100 μm outward in a direction orthogonal to the movement direction, and control is performed to move 30 mm in the movement direction of the alignment film 201. As a result, the positional relationship between the mask alignment mark 202e and the film alignment mark 201a is the same as when the alignment film 201 is not stretched, and the alignment film can be replaced without replacing the mask 202C as in the first embodiment. The width of the exposure light irradiation region with respect to 201 can be adjusted.

Furthermore, in this embodiment, a reversible alignment material film or a non-reversible alignment material film may be formed on the alignment film 201.

Next, an eleventh embodiment of the present invention will be described. FIG. 29 is a diagram showing an exposure process by the exposure apparatus according to the eleventh embodiment of the present invention. In the present embodiment, a reversible alignment material film is formed on the alignment film 201. A mask 202D is provided instead of the mask 202A in the tenth embodiment. The mask 202D is provided with an opening 202f whose width changes in the moving direction of the alignment film 201, not the slit 202b. The exposure light can be irradiated to the entire exposure target region of the alignment film 201 through the opening 203b of the aperture 203 and the opening of the mask 202D. Other configurations are the same as those of the first embodiment.

In this embodiment, the alignment film 201 has a reversible alignment material film formed on the surface thereof. In the present embodiment, first, as shown in FIG. 29A, the entire area of the alignment material film formed on the surface of the alignment film 201 is exposed by the exposure light emitted from the light source 205A. Then, as shown in FIG. 29B, the alignment material film is irradiated with the exposure light emitted from the light source 205B so as to correspond to the opening of the aperture 203B and the slit of the mask 202B. In this embodiment, since a reversible alignment material film is used, the alignment direction of the portion irradiated by the second exposure is changed from the alignment direction of the portion irradiated by the first exposure. Therefore, also in this embodiment, an alignment exposure film similar to that in the tenth embodiment is formed.

Also in this embodiment, even when the alignment film 201 expands in the width direction due to heating by exposure and extends in the width direction, the relative position between the mask 202 and the aperture 203 in the moving direction of the alignment film 201 is controlled by the control unit. By controlling the width, the width of the strip-shaped exposure portion formed on the alignment film 201 can be adjusted, and exposure can be performed without replacing the mask 202.

In the exposure apparatus according to the tenth embodiment, when an irreversible alignment material film is formed on the surface of the alignment film 201, the present mask is used instead of the mask 202B on the downstream side in the moving direction of the alignment film 201. The mask 202D as in the eleventh embodiment is arranged, and the alignment material film is aligned corresponding to the opening of the aperture 203A and the slit of the predetermined width of the mask 202A by exposure with the exposure light emitted from the upstream light source 205A. Even when the entire surface of the exposure target region is exposed by exposure with the exposure light emitted from the light source 205B on the downstream side, an alignment film similar to that in the tenth and eleventh embodiments can be formed. it can. Even in this case, the width of the strip-shaped exposed portion formed on the alignment film 201 is adjusted by controlling the relative position between the mask 202 and the aperture 203 in the moving direction of the alignment film 201 by the control unit. And exposure can be performed without replacing the mask 202.

Next, a twelfth embodiment of the present invention will be described. An exposure apparatus according to a twelfth embodiment of the present invention forms a transport apparatus that moves an alignment film to be exposed in a first direction, and film alignment marks that serve as indicators of the amount of expansion and contraction of the alignment film on both sides of the alignment film. A pair of alignment markers, a light source that emits exposure light, and a plurality of slits arranged at intervals in a second direction orthogonal to the first direction. A pair of observation windows for observing the alignment mark is provided, and a mask in which a mask alignment mark is formed in each observation window, and an opening extending in the second direction and intersecting all the slits are formed. A light-shielding member that transmits the exposure light at a portion where the opening and the slit intersect, the mask alignment mark in each observation window, and the film alignment And a control unit for adjusting a relative positional relationship in the first direction between the light shielding member and the mask based on a detection result of the detection unit, In the slit, a first slit at one end in the second direction is parallel to the first direction, and a second slit at the other end is inclined at a maximum inclination with respect to the first direction. A slit between one slit and the second slit is inclined so that an inclination angle gradually increases from the first slit toward the second slit, and the width of the slit is related to the first direction. The distance between the slits is linearly the same as the width of the slits in the second direction, and the first mask alignment mark on the first slit side extends in the first direction, 2nd slit side Mask alignment marks are those which extends parallel to the center line of one side edge or the width direction of the width direction of the second slit.

Next, a twelfth embodiment of the present invention will be described with reference to FIGS. In this embodiment, high-precision exposure is performed in response to both meandering of the alignment film and deformation due to thermal expansion and contraction of the alignment film. FIG. 30A is a plan view showing a mask 220 of this embodiment, and FIG. 30B is a plan view showing an aperture 230 of this embodiment. In the mask 220, a plurality of slits 220b are arranged on a base 220a made of a light-shielding material in a direction (second direction) orthogonal to the moving direction of the alignment film 210 (first direction: indicated by a hollow arrow). Each slit 220b is provided such that the width thereof linearly changes in the longitudinal direction, and the interval between the slits is the same as the width of the slit 220b in the direction orthogonal to the moving direction of the alignment film 210. It is. That is, in the mask 220 shown in FIG. 30A, the width of each slit 220b is the narrowest at the top, and is widened as it goes downward along the longitudinal direction of the slit. And among each slit 220b, the slit 220b arrange | positioned at the one end part of the width direction of the alignment film 210 is extended in parallel with the moving direction of the alignment film 210, and the length is y. In addition, among the slits 220b, the slit 220b disposed at the other end in the width direction of the alignment film 210 extends while being inclined in the moving direction of the alignment film 210, and a distance y is set in the moving direction of the alignment film 210. The alignment film 210 is inclined so as to be biased by x in the width direction. The slit 220b between the non-inclined slit 220b (parallel slit) at one end of the alignment film 210 and the slit 220b (maximum inclined slit) at the other end is directed from the parallel slit to the maximum inclined slit. Thus, the inclination angle is gradually increased. For example, y is 300 mm and x is 1 mm.

FIGS. 31A and 31B are diagrams showing a laser marker 250 for forming an alignment mark on the alignment film 210. FIG. The laser marker 250 irradiates the alignment film 210 fed from the film unwinding roll 245 with laser light on both sides of the alignment film 210 to form

alignment marks

210a and 210b. Note that when the alignment film 210 is irradiated with laser light from the laser marker 250, the lower surface of the alignment film 210 is supported by the roll 246, and the surface of the alignment film 210 is made constant.

On both sides of the mask 220, observation windows 220d for detecting the film alignment marks 210a and 210b are provided, for example, with the same length as the slits 220b in the moving direction of the alignment film 210. Mask alignment marks 220e and 220f are provided on the window 220d. The mask alignment mark 220f extends in parallel to the moving direction of the alignment film 210, and is provided in the observation window 220d on one end side where a slit 220b (parallel slit) parallel to the moving direction of the alignment film 210 in the mask 220 is formed. . On the other hand, the mask alignment mark 220e is provided in the observation window 220d on the other end side in the width direction of the alignment film 210, and extends in parallel with the side edge of the maximum inclined slit 220b provided on the other end side.

The aperture 230 is a light-shielding plate made of, for example, SUS, and as shown in FIG. 30B, an opening 230b having a width of, for example, 20 to 30 mm so as to extend in one direction is formed at the center of the base 230a. Is provided. The opening 230b has a length extending over the entire region where the slit 220b of the mask 220 is provided. Then, the opening 230 b is disposed above the mask 220 so that the longitudinal direction of the opening 230 b is orthogonal to the moving direction of the alignment film 210. That is, as shown in FIG. 32A, a mask 220 is installed in the middle of the moving area of the alignment film 210, and the aperture 230 is arranged above the mask 220. An exposure light source 270 is disposed above the aperture 230, and the exposure light emitted from the exposure light source 270 irradiates the aperture 230, a part of which is shielded by the aperture 230, and passes through the opening 230b in the exposure light. The exposed portion is irradiated onto the mask 220, and the exposure light transmitted through the slit 220 b of the mask 220 is irradiated onto the alignment film 210.

The control unit controls the relative position of the mask 220 and the light shielding member 230 in the moving direction of the alignment film 210. That is, as shown in FIGS. 33 to 36, for example, the control unit moves the relative position of the mask 220 with respect to the aperture 230 in a state where the position of the aperture 230 is fixed. The irradiation position on the alignment film 210 of the exposure light that passes through the overlapping region is adjusted.

As shown in FIG. 32 (a), a bifocal line camera 260 is disposed above the observation window 220d in the mask 220, and the bifocal line camera 260 has

film alignment marks

210a, 210b and mask alignment marks 220f and 220e are observed in the detection region 271.

Next, the operation of the exposure apparatus of this embodiment will be described together with the control mode of the control unit. As shown in FIG. 32B, a mask alignment mark 220f extending in the moving direction (first direction) of the alignment film 210 is used as a first mask alignment mark 220f, and the observation is performed in the observation window 220d together with the first mask alignment mark 220f. The film alignment mark 210b to be used is a first film alignment mark 210b. Further, a mask alignment mark 220e extending obliquely in the moving direction (first direction) of the alignment film 210 is used as a second mask alignment mark 220e, and the film alignment mark observed in the observation window 220d together with the second mask alignment mark 220e. Let 210a be the second film alignment mark 210a. Further, in the following operation, the aperture 230 does not move.

At the start of exposure, as shown in FIG. 33, the distance between the first film alignment mark 210b and the first mask alignment mark 220f in the detection area 271 observed by the camera 260 is A, and the second film alignment mark Assuming that the distance between 210a and the second mask alignment mark 220e is B, the control unit uses this distance A as a reference for the distance between the first film alignment mark 210b and the first mask alignment mark 220f. The distance B is set as a reference value for the distance between the second film alignment mark 210a and the second mask alignment mark 220e.

Then, as shown in FIG. 34A, when the alignment film 210 meanders and the alignment film 210 deviates in the second direction (the width direction of the alignment film 210) with respect to the position of the mask 220 at the beginning of exposure, In the detection region 271, the distance between the first film alignment mark 210 b and the first mask alignment mark 220 f varies from the reference value A. Therefore, as shown in FIG. 34 (b), the control unit adjusts and moves the mask 220 in the second direction (indicated by a white arrow), so that the first film alignment mark 210b and the first mask alignment mark 220f are moved. The distance between them is made to coincide with the reference value A. When the alignment film 210 is not thermally expanded or contracted, the distance between the second film alignment mark 210a and the second mask alignment mark 220e also matches the reference value B. Accordingly, as shown in FIG. 32B, the exposure light is transmitted through a region where the opening 230b of the aperture 230 and the slit 220b of the mask 220 overlap, and the alignment film 210 that moves in the first direction has many parallels. A linear exposure part is formed. Since the exposure unit adjusts and moves the mask 220 in the second direction in accordance with the meandering of the alignment film 210, the exposure unit starts from the position on the alignment film 210 at the beginning of exposure (the position on the alignment film 210 when there is no meandering). Does not fluctuate.

Next, as shown in FIG. 35A, when the alignment film 210 is thermally expanded, for example, the first film alignment mark 210b and the first mask alignment mark 220f are detected based on the observation result in the detection region 71 of the camera 260. Although the distance between the two coincides with the reference value A, it is detected that the distance between the second film alignment mark 210a and the second mask alignment mark 220e is smaller than the reference value B. Then, the control unit adjusts and moves the mask 220 relative to the aperture 230 in the direction indicated by the white arrow in FIG. 35B (the moving direction of the alignment film 210 in the embodiment shown in FIG. 32). . Then, the exposure light transmitted through the overlapping portion of the aperture 230b of the aperture 230 and the slit 220b of the mask 220 is adjusted so that the aperture 230 does not move and the mask 220 is opposite to the direction of the white arrow shown in FIG. Since it moves, the slit 220b is transmitted through a portion having a wider width and a larger interval, and the linear exposed portion in the alignment exposure film 210c after the exposure has a wider width and a larger interval. As a result, even if the alignment exposure film 210c is thermally expanded to increase the width, the exposed portion on the alignment exposure film 210c expands in the width direction of the alignment exposure film 210c. Therefore, when the alignment exposure film 210c cools down and returns to the temperature at the start of exposure, the linear exposure portion exposed in the exposure process in FIG. 35 has the width and interval of the exposure portion at the start of exposure. It becomes the state which corresponded and the influence of the thermal expansion of the alignment film 210 can be eliminated.

Next, FIG. 36 shows an example in which meandering and thermal expansion occur in the alignment film 210. As shown in FIG. 36 (a), the distance between the first film alignment mark 210b and the first mask alignment mark 220f in the detection region 271 observed by the camera 260 varies from the reference value A, and further, the second film alignment. The interval between the mark 210a and the second mask alignment mark 220e varies from the reference value B. Then, the controller first adjusts and moves the mask 220 in the second direction as shown in FIG. 36 (b), and sets the distance between the first film alignment mark 210b and the first mask alignment mark 220f. Match with the reference value A. Thereafter, in the detection region 271 of the camera 260, the distance between the second film alignment mark 210a and the second mask alignment mark 220e is detected, and when this does not match the reference value B, the control unit As shown in (c), the mask 220 is adjusted and moved in the first direction. In the case of the example shown in FIG. 36 (c), the exposure light transmitted through the overlapping portion of the opening 230b and the slit 220b is wider than the slit 220b and is more spaced apart as in the case of FIG. 35 (b). Since the light passes through a wide portion, the exposed portion on the alignment exposure film 210c after exposure becomes wider and wider than the initial exposure in accordance with the thermal expansion of the alignment film 210. . Therefore, when the alignment exposure film 210c cools down and returns to room temperature, it becomes the same as the width and interval of the exposed portion at the beginning of exposure. Thus, even when both the meandering of the alignment film 210 and the thermal expansion of the alignment film 210 occur, the exposed portion on the alignment exposure film 210c coincides with the start of exposure (or set as a reference value). It is possible to form a highly accurate exposure portion.

In each of the above embodiments, the mask alignment mark is formed so that the side edge on the mask alignment mark side of the slit closest to the mask alignment mark is parallel to the mask alignment mark. The invention is not limited to this, and the mask alignment mark may be formed so that the side edge opposite to the mask alignment mark of the slit closest to the mask alignment mark is parallel to the mask alignment mark, Further, the mask alignment mark may be formed so that the center line in the width direction of the slit closest to the mask alignment mark is parallel to the mask alignment mark. Furthermore, in the present invention, the mask alignment mark is formed when the mask alignment mark is formed using the side edge on the mask alignment mark side of the slit closest thereto, the side edge on the opposite side, or the width center line of the slit as a reference line. The distance from the reference line may be set by taking into account the amount of change in which the width of the closest slit linearly changes in the first direction. That is, the mask alignment mark and the slit closest thereto can be determined so that they are not parallel and the distance between them changes linearly in the first direction in consideration of the expansion and contraction of the alignment film. As the linear change amount of the distance between the mask alignment mark and the slit closest thereto, the linear change amount in the first direction of the width of the closest slit can be used.

In the present invention, the mask has a plurality of slits arranged in a second direction perpendicular to the first direction of the alignment film movement with a space between each other. It changes linearly in one direction, and the interval between the slits is the same as the width of the slits when viewed in the second direction. A light shielding member extending in the second direction and having openings that intersect all the slits is provided so as to overlap the mask. Thereby, in this invention, the exposure light which permeate | transmitted the slit of the mask and the opening of the light shielding member extended in a 2nd direction is irradiated to an alignment film. And a detection part detects a film alignment mark with the mask alignment mark provided in the mask, and a control part makes the positional relationship of the mask alignment mark and film alignment mark which the detection part detected become a predetermined relation, The relative position of the mask and the light shielding member in the first direction is controlled. Thereby, in the present invention, the relative position between the slit of the mask and the opening of the light shielding member is adjusted, and the width of the irradiation region of the exposure light with respect to the alignment film is accurately adjusted based on the width after deformation. Can do. Therefore, even when the alignment film to be exposed is deformed in the width direction, exposure can be performed without replacing the mask.

In another exposure apparatus of the present invention, the first slit at one end in the second direction is parallel to the first direction, and a first mask alignment mark is formed in parallel to the first slit. By adjusting and moving the mask in the second direction so that the distance between the first mask alignment mark and the film alignment mark becomes a predetermined reference value A, fluctuations in the exposure position due to the meandering of the alignment film can be prevented. Can do. In addition, the mask is adjusted and moved in the first direction so that the distance between the second slit at the other end in the second direction and the second mask alignment mark becomes a predetermined reference value B. Variations in the exposure position due to thermal expansion or contraction can be prevented.

Next, a thirteenth embodiment of the present invention will be described. The exposure apparatus of this embodiment includes a moving device that moves an alignment film in which an alignment material film is formed on a film substrate in one direction, and the alignment material on the alignment film that is provided in a moving area of the alignment film. A first exposure unit that forms a first exposure pattern that includes a plurality of strip-shaped exposure portions extending in the one direction and spaced apart from each other in a direction orthogonal to the one direction; The exposure part of the first exposure pattern in the direction perpendicular to the one direction and extending in the one direction on the alignment material film on the alignment film is installed on the downstream side of the first exposure unit in the moving direction of A second exposure unit for forming a second exposure pattern composed of a plurality of strip-shaped exposure portions in a region between the first exposure unit and the movement region of the alignment film between the first exposure unit and the second exposure unit Provided in The exposure position of the second exposure pattern in the second exposure unit is determined based on the position of the inspection unit that detects the exposure unit of the first exposure pattern and the position of the exposure unit of the first exposure pattern detected by the inspection unit. And a control unit for controlling.

In this case, when the exposure apparatus of the present invention is applied to an FPR manufacturing method, the FPR manufacturing method moves the alignment film in which an alignment material film is formed on a film base material in one direction while moving the alignment film. The first exposure unit provided in the moving area of the plurality of strips extending in the one direction and spaced apart from each other in the direction orthogonal to the one direction on the alignment material film on the alignment film. The alignment on the alignment film by a first exposure process for forming a first exposure pattern comprising an exposure unit and a second exposure unit installed downstream of the first exposure unit in the moving direction of the alignment film. A second exposure pattern comprising a plurality of strip-shaped exposure portions is formed on the material film in a region between the exposure portions of the first exposure pattern in a direction orthogonal to the one direction while extending in the one direction. A second exposure step, and an inspection step for detecting an exposed portion of the first exposure pattern between the first exposure step and the second exposure step, the first detected in the inspection step Based on the position of the exposure part of the exposure pattern, the exposure position of the second exposure pattern by the second exposure unit in the second exposure step is controlled.

FIG. 37 is a view showing an exposure apparatus according to the thirteenth embodiment of the present invention, and FIG. 38 is a view showing an exposure portion formed on the alignment exposure film 310a. The alignment film 310 having the alignment material film deposited on the surface is conveyed to the back roll 315 by a moving device (not shown), wound around the back roll 315, and then unloaded from the back roll 315. It has become. The first exposure unit 320 is arranged on the most upstream side in the moving region of the alignment film 310 in which the alignment film 310 contacts the back roll 315 and the back surface thereof is supported by the back roll 315, and the most downstream side thereof. A second exposure unit 321 is disposed on the side, and an inspection unit 330 is disposed at a position between the first exposure unit 320 and the second exposure unit 321.

The first exposure unit 320 includes, for example, an exposure light source 322 that irradiates CW circularly polarized exposure light toward the mask 323, and the exposure light from the exposure light source 322 passes through the mask 323 on the alignment film 310. Irradiate the alignment material film. The second exposure unit 321 includes, for example, an exposure light source 324 that irradiates CCW circularly polarized exposure light toward the mask 325, and the exposure light from the exposure light source 324 is on the alignment film 310 via the mask 325. The alignment material film is irradiated. As shown in FIG. 38, the

masks

323 and 325 are formed with elongated

rectangular slits

323a and 325a extending in the moving direction 309 of the alignment film 310, respectively. The widths of these

slits

323a and 325a are the width of one scanning line, and the interval between the

slits

323a and 325a is also the width of one scanning line. The slits 323a of the mask 325 and the slits 325a of the mask 325 correspond to scanning lines adjacent to each other, and the

slits

323a and 325a are alternately arranged in a direction perpendicular to the moving direction 309 of the alignment film 310.

Masks

323 and 325 are arranged so as to be. Therefore, the arrangement pitch of the

slits

323a and 325a corresponds to two scanning lines corresponding to the FPR 3D liquid crystal display device.

In the back roll 315, the alignment film 310 is wound around approximately half (lower half) of the peripheral surface, the back surface of the alignment film 310 contacts the back roll 315, and the surface of the alignment film 310, that is, the alignment material film. Facing outward. The

masks

323 and 325 face the alignment material film with a slight distance (about 200 μm) from the alignment film 310 so as to face each other with the back roll 315 interposed therebetween. Exposure

light sources

322 and 324 are installed behind 323 and 325. As a result, the alignment film 310 with the alignment material film applied to the surface is in contact with the peripheral surface of the back roll 315, and the wrinkles are stretched by a slight tension during the conveyance of the alignment film 310. Supported. Then, the alignment film 310 is continuously conveyed in the moving direction 309, and exposure light is continuously irradiated from the exposure

light sources

322 and 324, whereby the exposure light passes through the

slits

323a and 325a of the

masks

323 and 325. The alignment film 310 is irradiated.

The back roll 315 is a water-cooled roll whose inside is water-cooled, and is rotatable around its central axis. The back roll 315 can rotate freely, and rotates with the movement of the alignment film 310 so that its peripheral speed is the same as the movement speed of the alignment film 310. Thereby, the alignment film 310 is supported in a state where there is no relative speed difference on the peripheral surface of the back roll 315. Accordingly, wrinkles are prevented from being generated on the peripheral surface of the back roll 315 in the alignment film 310 that is conveyed by applying an appropriate tension.

The exposure light from the exposure light source 322 is CW circularly polarized light, and the exposure light from the exposure light source 324 is CCW circularly polarized light. Then, as shown in FIG. 38, while the alignment film 310 moves in the movement direction 309, each exposure light passes through the

slits

323a and 325a of the

masks

323 and 325 to form an alignment material film on the alignment film 310. The exposed exposure unit corresponding to the slit 323a is, for example, the left-eye CW circular polarization exposure unit 301a, and the exposure unit corresponding to the slit 325a is, for example, the right-eye CCW circular polarization exposure unit 301b.

The inspection unit 330 is installed above the back roll 315 with the camera 331 installed with the detection direction directly below, the half mirror 334 installed below the camera 331, and further installed below the half mirror 334. A linear polarizing plate 332 and an inspection light source 333 that irradiates the half mirror 334 with inspection light are provided. Thereby, the inspection light from the inspection light source 333 is reflected by the half mirror 334, passes through the linear polarizing plate 332, is irradiated on the alignment film 310 on the back roll 315, and is reflected light reflected on the back roll 315. Passes through the linearly polarizing plate 332 and enters the camera 331 through the half mirror 334.

45 (a) and 45 (b) are diagrams for explaining the principle of the present invention, and are schematic diagrams showing the polarization state of light by a combination of a linearly polarizing plate and a λ / 4 plate. As shown in the upper diagram of FIG. 45, the illumination light emitted from the light source 360 is converted into p-polarized light by the p-polarizing plate 361. The p-polarized light is converted into CW circularly-polarized light by the CW circularly polarizing plate 362. The CW circularly polarized light is converted into s-polarized light by the CW circularly polarizing plate 363. On the other hand, as shown in the lower diagram of FIG. 45, the illumination light emitted from the light source 360 is converted to p-polarized light by the p-polarizing plate 361 and then converted to CW-polarized light by the CW circularly polarizing plate 362. Thereafter, the light is converted into p-polarized light by the CCW circularly polarizing plate 364. The first exposure portion 301a of the alignment exposure film 310a after exposing the alignment film 310 has a function of converting linearly polarized light in a specific direction into CW circularly polarized light. That is, an optical axis equivalent to that of the CW circularly polarizing plate can be defined.

That is, as shown in FIG. 44A, when the CW circularly polarizing plate 336 and the s polarizing plate 337 are disposed between the camera 331 and the alignment exposure film 310a, the inspection light emitted from the light source 333 is The light is converted into p-polarized light by the p-polarizing plate 332 and enters the alignment exposure film 310a. The light that has passed through the first exposure portion 301a (CW circular polarization portion) of the alignment exposure film 310a is converted into s-polarized light by the CW circularly polarizing plate 336, and non-exposure between the first exposure portions 301a of the alignment exposure film 310a. The light transmitted through the portion (non-polarized portion) is converted into CW circularly polarized light by the CW circularly polarizing plate 336. For this reason, the light transmitted through the CW circularly polarized portion of the alignment exposure film 310a is transmitted through the s polarizing plate 337, is incident on the camera 331, and is detected as a bright portion, while it is transmitted through the non-exposure portion of the alignment exposure film 310a. Since light cannot pass through the s polarizing plate 337 and does not enter the camera 331, it is detected as a dark part. In addition, as shown in FIG. 44B, when a CCW circularly polarizing plate 338 and a p-polarizing plate 332 are disposed between the camera 331 and the alignment exposure film 310a, the first alignment exposure film 310a has a first structure. The light transmitted through the exposure unit 301a (CW circular polarization unit) is converted into p-polarized light by the CCW circularly polarizing plate 338, and the non-exposure unit (non-polarization unit) between the first exposure units 301a of the alignment exposure film 310a. The transmitted light is converted into CCW circularly polarized light by the CCW circularly polarizing plate 338. Therefore, the light transmitted through the CW circularly polarized portion of the alignment exposure film 310a is transmitted through the p-polarizing plate 332, is incident on the camera 331, and is detected as a bright portion, while it is transmitted through the non-exposure portion of the alignment exposure film 310a. Light cannot be transmitted through the p-polarizing plate 332 and does not enter the camera 331, so that it is detected as a dark part. Therefore, by combining the linearly polarizing plate and the λ / 4 plate, the strip-shaped exposed portion on the alignment exposure film 310a can be detected.

However, in the present invention, the first CW circularly polarized light formed by the first exposure unit 320 can be used without using such an optical system in which a plurality of linearly polarizing plates and λ / 4 plates are combined. The exposure unit 301a can be detected. That is, the inspection light emitted from the light source 333 is converted into p-polarized light by the p-polarizing plate 332 and enters the alignment exposure film 310a. Of the light incident on the alignment exposure film 310a, the light incident on the first exposure portion 301a is converted into CW circularly polarized light. The CW circularly polarized light is reflected by the back roll 315, is incident on the first exposure unit 301a again, and is converted into s-polarized light as in the case of transmitting through the CW circularly polarizing plate. Thereafter, the s-polarized light enters the p-polarizing plate 332 again, but cannot pass through the p-polarizing plate 332 and is detected by the camera 331 as a dark part. On the other hand, of the light incident on the alignment exposure film 310a, the light incident on the non-exposure portion (non-polarization portion) between the first exposure portions 301a passes through the non-exposure portion as p-polarized light and is back-rolled. The light is reflected at 315, passes through the non-exposed portion as p-polarized light again, passes through the p-polarizing plate 332, and enters the camera 331. The camera 331 detects this as a bright portion. Therefore, the inspection light transmitted through the first exposure unit 301a (CW circular polarization unit) is detected as a dark part by the camera 331, and the inspection light transmitted through the non-exposure part between the first exposure units 301a is detected by the camera 331. It is detected as a bright part.

Thus, the position (width and interval) of the first exposure unit 301a (CW circular polarization unit) formed by the first exposure unit 320 is detected by the inspection unit 330. Therefore, the control unit (not shown) controls the exposure in the second exposure unit 321 based on the detection result of the position (width and interval) of the first exposure unit 301a. Specifically, the second exposure unit 301b to be formed by the second exposure unit 321 at a position perpendicular to the transport direction of the alignment film 310 of the second mask 325 in the second exposure unit 321 is the first exposure unit. Adjustment is made so as not to overlap with the boundary of 301a and so as not to cause a gap between the first exposure unit 301a and the second exposure unit 301b.

If the width of the first exposure portion 301a is enlarged or reduced more than a specified value due to expansion or reduction of the alignment film 310, the first mask 325 is adjusted only by adjusting the position of the second mask 325. Since the exposure unit 301a and the second exposure unit 301b do not overlap and a gap cannot be formed, the second exposure unit 301b needs to be enlarged or reduced as described later.

Next, the operation of the thirteenth embodiment of the present invention will be described. In the first exposure unit 320, for example, a first exposure unit 301a (CW circular polarization unit) of CW circular polarization for the left eye is formed. The alignment film 310 on which the first exposure unit 301 a is formed arrives at the inspection unit 330 along with the rotation of the back roll 315, and the position (width and interval) of the first exposure unit 301 a is detected by the camera 331. Then, the control unit determines whether or not the first exposure unit 301a is formed at a predetermined design position based on the detection result, and the position of the first exposure unit 301a is shifted from the predetermined design position. If so, the position of the second mask 325 of the second exposure unit 321 is adjusted accordingly, the formation position of the second exposure unit 301b is changed from the initial setting value, and the first exposure unit 301a and the second exposure unit The second exposure unit 321 is controlled so that the portion 301b does not overlap and a non-exposed portion is not formed.

As described above, since the position (width and interval) of the first exposure unit 301 a is detected by the inspection unit 330, the first exposure actually formed by the first exposure unit 320 is used in the second exposure unit 321. Exposure can be controlled in accordance with the state of the part 301a, and the second exposure part 301b can be formed.

Next, a modification of the present embodiment will be described with reference to FIG. In this modification, the optical axis of the inspection light emitted from the light source 333 and the optical axis of the reflected light detected by the camera 3331 intersect at the surface of the back roll 315, and the inspection light passes through the alignment film 310. After being transmitted, the light is reflected by the surface of the back roll 315, and the reflected light is detected by the camera 331. The inspection light emitted from the light source 333 is converted to p-polarized light by the p-polarizing plate 332, and the reflected light from the back roll 315 is incident on the camera 331 as the light transmitted through the s-polarizing plate 337.

In the exposure apparatus configured as described above, the inspection light emitted from the light source 333 is converted into p-polarized light by the p-polarizing plate 332 and enters the alignment film 310. Of the light incident on the alignment film 310, the light incident on the first exposure unit 301 a is converted into CW circularly polarized light, reflected by the back roll 315, and again on the first exposure unit 301 a of the alignment film 310. Incident light is converted into s-polarized light, passes through the s-polarizing plate, and is detected by the camera 331 as a bright portion. On the other hand, of the light incident on the alignment film 310, the light incident on the non-exposure part (non-polarization part) between the first exposure parts 301a is transmitted through the non-exposure part as p-polarized light, and the back roll. The light is reflected at 315, passes through the non-exposed portion as p-polarized light again, and cannot pass through the s polarizing plate 37, and the camera 331 detects the non-exposed portion as a dark portion. Therefore, the inspection light transmitted through the first exposure unit 301a (CW circular polarization unit) is detected as a bright part by the camera 331, and the inspection light transmitted through the non-exposure part between the first exposure units 301a is detected by the camera 331. Since it is detected as a dark part, the position (width and interval) of the first exposure part 301a can be detected.

Next, a fourteenth embodiment of the present invention will be specifically described with reference to FIG. In the present embodiment, the inspection light source 333 of the inspection unit 330 is incorporated in the back roll 315. A groove 317 extending in the roll axis direction is formed on the peripheral surface of the back roll 315, and a rod-shaped inspection illumination light source 333 extending in the roll axis direction is disposed in the groove 317. Further, a p-polarizing plate 332 extending in the roll axis direction is disposed in the groove 317 above the light source 333. Similar to the first embodiment, the alignment film 310 is wound around the back roll 315 and moves with the rotation thereof. The inspection film detects inspection light in the region directly above the roll axis of the back roll 315. A camera 331 is disposed. The inspection camera 331 is a line sensor that extends in the axial direction of the back roll 315 or is an area sensor that detects light in a horizontally-long rectangular two-dimensional region of the back roll 315 in the axial direction. A CW circularly polarizing plate 336 and an s polarizing plate 337 thereabove are disposed between the inspection camera 331 and the alignment film 310. As in the first embodiment, the back roll 315 is freely rotatable around its axis. When the alignment film 310 is wound around the back roll 315 and moved, the back roll 315 is rotated around its circumference. The rotation speed is the same as the moving speed of the alignment film 310. When the groove 317 of the back roll 315 rotates to the upper end of the roll, the light source 333 and the camera 331 face each other on the vertical optical axis.

In the inspection unit 330 of this embodiment, when the groove 317 is rotated to the uppermost end, that is, when the light source 333 in the groove 317 faces the camera 331, the inspection light emitted from the light source 333 is p-polarized light. The light passes through the plate 332, further passes through the alignment film 310, further passes through the CW circularly polarizing plate 336, passes through the s polarizing plate 337, and then enters the camera 331. The inspection light from the light source 333 is converted into p-polarized light by the p-polarizing plate 332 and enters the alignment film 310. Of the light incident on the alignment film 310, the light incident on the first exposure unit 301 a is converted into CW circularly polarized light, converted into s polarized light by the CW circularly polarizing plate 336, and then the s polarizing plate 337 is used. The light passes through and is detected by the camera 331 as a bright portion. On the other hand, of the light incident on the alignment film 310, the light incident on the non-exposure part (non-polarization part) between the first exposure parts 301a passes through the non-exposure part as p-polarized light, and is CW circularly polarized light. The light is converted into CW circularly polarized light by the plate 336, cannot pass through the s polarizing plate 337, and is detected as a dark part by the camera 331. Therefore, the inspection light transmitted through the first exposure unit 301a (CW circular polarization unit) is detected as a bright part by the camera 331, and the inspection light transmitted through the non-exposure part between the first exposure units 301a is detected by the camera 331. Since it is detected as a dark part, the position (width and interval) of the first exposure part 301a can be detected. Therefore, this embodiment has the same effect as the first embodiment.

When the CCW circularly polarizing plate 338 is disposed at the position of the CW circularly polarizing plate 336, the inspection light transmitted through the first exposure unit 301a and the CCW circularly polarizing plate 338 is converted into p-polarized light, and the s polarizing plate 337 cannot be transmitted. Therefore, the camera 331 detects the first exposure unit 301a as a dark part. If it does so, since the light which permeate | transmitted the non-exposure part (non-polarization part) between the 1st exposure parts 301a will be detected as a dark part with the camera 331, the 1st exposure part 301a and a non-exposure part cannot be distinguished. Therefore, in the case of the CCW circularly polarizing plate 338, it is necessary to use the p polarizing plate 332 instead of the s polarizing plate 337 as shown in FIG. Thereby, the camera 331 detects the 1st exposure part 301a as a bright part.

In addition, since the back roll 315 of this embodiment has the groove 317, the alignment film 310 moves across the groove 317. For this reason, in order to make the position of the alignment film 310 in the optical axis direction of the camera 331 constant with high accuracy, a glass lid whose upper surface is curved with the same radius of curvature as the back roll 315 is provided above the groove 317. The entire circumference of the back roll 315 may be a uniform circumferential surface.

Next, a modified example of the fourteenth embodiment of FIG. 40 will be described with reference to FIGS. In this modification, the structure of the back roll 340 is different from the back roll 315 of FIG. The back roll 340 according to the present modification includes a core portion 342 having a substantially columnar shape, and a cylindrical surface portion 341 into which the core portion 342 is fitted. Although the core part 342 does not rotate, the surface part 341 is provided coaxially with the core part 342, and can rotate with this axis as a rotation axis. Similar to the back roll 315, the surface portion 341 is driven and rotated by rolling of the alignment film 310. The surface portion 341 is formed of a transparent material such as glass or acrylic, for example. A groove 343 extending in the axial direction of the core part 342 is formed at the upper end of the core part 342, and a light source 333 and a p-polarizing plate 332 are installed in the groove 343. The exposure operation of this modification is the same as the exposure operation of the fourteenth embodiment shown in FIG. 40. However, in this modification, the light source 332 and the p-polarizing plate 332 do not move. There is an advantage that the exposure state of the alignment film 310 across the optical axis to be connected can be always inspected and monitored.

Next, a fifteenth embodiment of the present invention is described with reference to FIG. In the present embodiment, the alignment film 310 is conveyed in one direction by a roll 311, and the first exposure unit 320, the inspection unit 330, and the second exposure unit 321 are arranged in this order in the moving area of the alignment film 310. It is. The inspection unit 330 includes a camera 331 provided to face the alignment film 310 moving in the horizontal direction, and an s polarizing plate provided on the optical axis of the camera 331 between the camera 331 and the alignment film 310. 337, a half mirror 334 provided below the s polarizing plate 337, a reflection plate 341 below the alignment film 310 on the optical axis of the camera 331, and coaxial with the optical axis of the camera 331 via the half mirror 334. A light source 333 for irradiating the alignment film 310 with inspection light and a p-polarizing plate 332 provided between the light source 333 and the half mirror 334 are provided.

Thereby, in the first exposure unit 320, the alignment film 310 on which the CW circularly polarized first exposure part 301a is formed moves to the inspection part 330. The inspection light from the light source 333 is converted into p-polarized light by the p-polarizing plate 332 and enters the alignment film 310 via the half mirror 334. Of the light incident on the alignment film 310, the light incident on the first exposure unit 301a is converted into CW circularly polarized light, reflected by the reflector 341, and then incident on the first exposure unit 301a again. The light is converted into s-polarized light, passes through the half mirror 334, passes through the s polarizing plate 337, and is detected as a bright portion by the camera 331. On the other hand, of the light incident on the alignment film 310, the light incident on the non-exposed portion (non-polarized portion) between the first exposure portions 301 a is transmitted through the non-exposed portion as p-polarized light and is reflected by the reflector 341. And is incident on the s-polarizing plate 336, cannot pass through the s-polarizing plate 336 and is detected by the camera 331 as a dark part. Therefore, this embodiment also has the same effect as the thirteenth embodiment and the fourteenth embodiment.

Next, a sixteenth embodiment of the present invention will be described with reference to FIG. In this embodiment, the inspection light source 333 is installed below the alignment film 310. In the present embodiment, a CW circularly polarizing plate 336 and an s polarizing plate 337 are installed between the camera 331 and the alignment film 310. A p-polarizing plate 332 is installed between the light source 333 and the alignment film 310, and the inspection light emitted from the light source 333 is converted into p-polarized light by the p-polarizing plate 332 and enters the alignment film 310. To do. Of the light incident on the alignment film 310, the light transmitted through the first exposure unit 301 a is converted into CW circularly polarized light, and is converted into s polarized light by the CW circularly polarizing plate 336. The light is transmitted and detected by the camera 331 as a bright portion. On the other hand, the light incident on the non-exposure part between the first exposure parts 301a is transmitted through the non-exposure part as p-polarized light, converted into CW circularly-polarized light by the CW circularly polarizing plate 336, and s-polarized light. Since it is incident on the plate 337, it is detected by the camera 331 as a dark part. Therefore, this embodiment also has the same effect as the thirteenth to fifteenth embodiments.

The alignment film 310 expands or contracts or the alignment film 310 meanders, and the position (width and interval) and size of the first exposure unit 1a formed by the first exposure unit 320 deviate from predetermined design values. In this case, it is preferable that the formation of the second exposure unit 301b in the second exposure unit 321 also takes into account variations such as the size of the first exposure unit 301a.

FIG. 46 is a view showing the mask 325 of the second exposure unit 321 when such factors as the expansion of the alignment film 310 are taken into consideration. FIG. 46A is a plan view showing the mask 325, and FIG. 46B is a plan view showing the aperture 326.

As shown in FIG. 46A, the mask 325 includes, for example, a plurality of slits in a direction perpendicular to the moving direction 309 of the alignment film 310 in a base portion 302a made of a light-shielding material provided on a transparent plate. 302b is arranged, and each slit 302b is provided so that the width thereof linearly changes in the longitudinal direction, and the interval between the slits is the same as the width of the slit in the direction orthogonal to the moving direction 309. It is. That is, in the mask 325 shown in FIG. 46 (a), the width of each slit 302b is the narrowest at the top, and is widened downward along the longitudinal direction of the slit. Each slit 302b extends in a slanting direction in the moving direction 309. The inclination of the slit 302b is larger on the side than the center of the mask 325 in the direction orthogonal to the moving direction 309. For example, when the length of each slit 302b in the moving direction 309 is 300 mm, the mask 325 is inclined. The edge portion of the slit on the most side is provided with a gap of about 500 μm between the end portions in the moving direction 309 in a direction orthogonal to the moving direction 309.

On the side of the mask 325, for example, an observation window 302d for detecting a film alignment mark 301c (see FIG. 48) formed on the side of the alignment film 310 by an alignment marker (not shown), for example, a moving direction 309 The slit 302b is approximately the same length as the slit 302b. Note that the film alignment mark 301c shown in FIG. 48 indicates a state of being observed through the observation window 302d. A mask alignment mark 302e is provided in the observation window 302d so as to be inclined with respect to the moving direction 309. The mask alignment mark 302e is a linear mark parallel to the side edge of the slit 302b located at both ends in a direction orthogonal to the moving direction 309, for example. A camera (not shown) is provided above the mask 325 so that the camera can detect the film alignment mark 301c on the alignment film 310 through the observation window 302d together with the mask alignment mark 302e. It is configured.

The aperture 326 is a light-shielding plate made of, for example, SUS. As shown in FIG. 46B, an opening 303b having a width of, for example, 20 to 30 mm is provided at the center of the base portion 303a so as to extend in one direction. Is provided. The opening 303 b is disposed between the light source 324 and the mask 325 so that the longitudinal direction of the opening 303 b is orthogonal to the moving direction 309. Therefore, a part of the exposure light emitted from the light source 324 is shielded by the aperture 326, and only the exposure light transmitted through the opening 303b of the aperture 326 is irradiated to the mask 325. Accordingly, the relative position between the mask 325 and the aperture 326 in the movement direction 309 is controlled by a control unit (not shown), so that the strip-shaped irradiation position of the exposure light with respect to the mask 325 moves along the movement direction 309. Then, the irradiation position of the exposure light that passes through the slit 302b of the mask 325 and is irradiated on the alignment film 310 moves in the movement direction 309, and the width of the exposure light irradiation area changes.

As shown in FIG. 47, the mask 325 is configured to be movable in the moving direction 309 relative to the aperture 326 by, for example, an actuator or the like (not shown), and the movement between the aperture 326 and the mask 325 is performed. The relative position in the direction 309 is controlled by a control unit (not shown). Then, the relative position between the mask 325 and the aperture 326 in the moving direction 309 is controlled by this control unit so that the positional relationship between the mask alignment mark 302e and the film alignment mark 301c becomes a predetermined relationship, for example, as follows. The

In other words, as described above, in the present embodiment, the plurality of slits 302 b provided in the mask 325 extend while being inclined in the movement direction 309, and the width of each slit 302 b is linear along the movement direction 309. The distance between the slits is the same as the width of the slits when viewed from the direction orthogonal to the moving direction 309. Therefore, as shown in FIGS. 47A and 47B, when the mask 325 is moved relative to the aperture 326 in the moving direction 309, the aperture 303b of the aperture 326 is transmitted along with this movement. Then, the irradiation position of the exposure light irradiated on the mask 325 moves in the moving direction 309, and the width of the irradiation area of the exposure light irradiated on the alignment film 310 through the slit 302b changes. Thereby, for example, even when the alignment film 310 expands due to a high temperature at the time of exposure, for example, a strip-shaped exposure part (polarizing part) formed on the alignment exposure film 310a corresponding to the width of the alignment film 310 after deformation. ) Width can be adjusted.

In the present embodiment, as shown in FIG. 48, the control unit, for example, has a constant distance (for example, in the direction in which the mask alignment mark 302e and the film alignment mark 301c detected by the camera are orthogonal to the moving direction 309). 10 mm), the mask 325 is moved along the moving direction 309 so as to be separated from each other. Thereby, even when the alignment film 310 expands in the width direction, the width of the exposed portion on the alignment exposure film 310a can be adjusted based on the amount of elongation of the alignment film 310 in the width direction.

48A shows a state where the alignment film 310 is not deformed in the width direction, and FIG. 48B shows a state where the alignment film 310 has expanded in the width direction. In FIG. 12, reference numeral 371 denotes a detection area by the camera. For example, the width of the detection area 371 in the moving direction 309 is the same as that of the opening 303b of the aperture 326, and the camera has a film alignment mark 301c and a mask. The alignment mark 302e is detected at a position aligned with the opening 303b and the movement direction 309. As shown in FIG. 48A, when the alignment film 310 is not deformed in the width direction, the distance between the film alignment mark 301c and the mask alignment mark 302e in the detection region 371 is, for example, 10 mm. Here, when the alignment film 310 expands in the width direction due to, for example, heating during exposure, as shown in FIG. 48B, the position of the film alignment mark 301c is outside (see FIG. 48) in the observation window 302d. To the left side) and the distance to the mask alignment mark 302e increases.

After the alignment film 310 is not expanded in the first exposure unit 320 and the first exposure portion 301a is formed according to a predetermined design value, the alignment film 310 is formed in the second exposure unit 321 as described above. When the expansion occurs, in this state, when the second exposure unit 301b tries to expose the second exposure unit 301b according to a predetermined design value, it is between the first exposure unit 301a and the second exposure unit 301b. Shifts and causes display defects. That is, when the alignment film 310 reaches the second exposure unit 321, the width and interval of the strip-shaped first exposure part 301 a are increased by the expansion of the alignment film 310. If the second exposed portion 301b is formed in the same manner, the first exposed portion 301a and the second exposed portion 301b overlap with each other, or a gap is generated, and an unexposed portion is generated.

Therefore, in this embodiment, for example, the relative position of the mask 325 with respect to the aperture 326 in the moving direction 309 is adjusted so as to maintain a constant distance between the film alignment mark 301c and the mask alignment mark 302e. That is, as shown in FIG. 48B, in the detection area 371 by the camera, the mask 325 moves in the moving direction 309 with respect to the aperture 326 so that the distance between the film alignment mark 301c and the mask alignment mark 302e is 10 mm. The aperture 303b of the aperture 326 is made to correspond to the wide region of the slit 302b of the mask 325. Therefore, in the present embodiment, the width of the exposed portion on the alignment exposure film 310a can be widely adjusted based on the amount of elongation in the width direction of the alignment film 310. Thereby, in the present embodiment, even when the alignment film 310 is cooled and contracted by subsequent conveyance, for example, and returns to the original width that has not expanded, the strip-shaped film formed on the alignment exposure film 310a. For example, the width and interval of the second exposure unit 301b can be accurately matched to the width and interval of pixels or picture elements of the display device, and display defects can be prevented.

In addition, the slit 302b of the mask 325 and the film alignment mark 301c are actually separated by, for example, about 30 mm. The mask alignment mark 302e can be regarded as the side edge of the slit 302b provided at the end in the direction orthogonal to the moving direction 309, for example, about 10 mm. Alignment can be performed within a narrow range, and the width of the exposed portion can be adjusted.

48, for convenience of illustration, only one side of the alignment film 310 and the mask 325 is shown. However, the mask position is controlled by the film alignment marks 301c on both sides of the alignment film 310. This is performed between the mask alignment marks 302e on both sides of the mask 325. That is, the distance between the film alignment mark 301c on one side of the alignment film 310 and the mask alignment mark 302e and the distance between the film alignment mark 301c on the other side of the alignment film 310 and the mask alignment mark 302e are: , Both are, for example, 10 mm.

However, if the alignment film 310 meanders while moving between the transport rollers 311, the center position of the mask 325 and the center position of the alignment film 310 in the direction orthogonal to the moving direction 309 are shifted, and the alignment film 310 is moved on one side of the alignment film 310. The distance between the film alignment mark 301c and the mask alignment mark 302e is different from the distance between the film alignment mark 301c and the mask alignment mark 302e on the other side. In order to solve this problem, in the present embodiment, the center position of the pair of mask alignment marks 302e detected by the camera in the direction orthogonal to the moving direction 309 is the same as the center position of the pair of film alignment marks 301c. The position of the mask 325 in the direction orthogonal to the moving direction 309 is adjusted so as to match, and thereby the center position of the mask 325 and the center position of the alignment film 310 may be aligned. That is, even if the alignment film 310 meanders, the distance between the film alignment mark 301c on one side of the alignment film 310 and the mask alignment mark 302e, and the film alignment mark 301c on the other side of the alignment film 310 and the mask The distance between the alignment mark 302e and the alignment mark 302e may be controlled to be, for example, 10 mm.

As a mask for the second exposure unit 321, a mask 325A having a slit 302b as shown in FIG. 49 can be used. Also in this mask 325A, the width of the plurality of slits 302b linearly changes with respect to the moving direction 309, and the interval between the slits is the width of the slit 302b when viewed from the direction orthogonal to the moving direction 309. Is the same. In the mask 325A shown in FIG. 49, among the slits provided at both ends of the mask 325A, the slit 302b provided at one end has a side edge provided in parallel with the moving direction 309, and other plural The slit 302b is inclined and extends in the movement direction 309, and the inclination of the slit 302b is provided so as to gradually increase from one end side to the other end side in the direction orthogonal to the movement direction 309. Yes. When such a mask 325A is used, the position of the mask 302 can be controlled with reference to the slit 302b at one end having a side edge parallel to the moving direction 309. For example, the slit 302b at the other end having the greatest inclination with respect to the moving direction 309 has a length of 300 mm in the moving direction 309 and is provided so that its side edge is deviated by about 1000 μm in a direction perpendicular to the moving direction 309. In the case where the distance between the film alignment marks 301c is increased by 100 μm along with the elongation of the alignment film 310, the control unit moves the mask 302 outward by 100 μm in the direction orthogonal to the moving direction 309. And control to move 30 mm in the moving direction 309. As a result, the positional relationship between the mask alignment mark 302e and the film alignment mark 301c is the same as when the alignment film 310 is not stretched, and the width of the exposure light irradiation region with respect to the alignment film 310 can be changed without replacing the mask 325A. Can be adjusted.

In the case where the alignment film 310 has already expanded in the first exposure unit 320, the first mask 323 of the first exposure unit 320 also has an inclined slit and an aperture, like the second mask 325. Similarly, it is preferable to increase the width and interval of the strip-shaped exposed portion of the first exposed portion to be formed according to the amount of expansion of the alignment film 310. Accordingly, when the alignment exposure film 310a is naturally cooled past the exposure unit, the first exposure unit 301a and the second exposure unit 301b can be made to coincide with each scanning line of the display device with high accuracy.

Further, not only the expansion of the alignment film 310 but also when the alignment film 310 is reduced, a mask having an inclined slit 302b and an aperture 326 having an opening 303b extending in the width direction of the alignment film 310 are used. Thus, the exposure position and width can be adjusted in accordance with the reduction amount of the alignment film 310.

In the exposure apparatus and the FPR manufacturing method according to the present invention, after forming a first exposure pattern composed of a plurality of strip-shaped exposure parts exposed by the first exposure unit, the inspection part exposes the first exposure pattern. And the controller adjusts the position of the exposure part of the second exposure pattern exposed by the second exposure unit based on the position of the exposure part of the first exposure pattern. For example, the control unit adjusts the position of the second mask of the second exposure unit in the direction orthogonal to the moving direction of the alignment film based on the position of the exposure unit of the first exposure pattern. Thereby, the exposure positions of the first exposure pattern by the first exposure unit and the second exposure pattern by the second exposure unit are controlled to a predetermined position on the alignment film with high accuracy. Therefore, the first exposure pattern and the second exposure pattern do not overlap at the boundary or unexposed portions are not formed, and the 3D display image does not deteriorate.

The present invention can manufacture an FPR type polarizing film, a photo-alignment film, and the like with high accuracy, and contributes to high definition of a 3D or 2D type liquid crystal display device.

1: Polarizing film 1a, 1b: Polarizing part 5: Back roll 6, 16: Exposure light source 7: Mask 7a: Opening 10:

Alignment film

10a, 10b, 10c, 10d: Exposure part 11: Alignment exposure film 12: Film substrate 17: Slit mask 17a: Slit 201, 210: Alignment film 201c, 210c:

Alignment exposure films

201a, 210a, 210b: Alignment marks 202, 220, 221, 150, 160, 202A, 202B, 202C, 202D: Mask, 202a: Base 202b, 220b: slit, 202c:

opening

202d, 220d: observation window 202e, 220e, 220f: mask alignment mark 202f: opening 203, 203A, 203B, 230: aperture 203a: base 203b, 230b: opening 241: supply reel 242 , 243: Feed roll 244: Reel 205 (winding side): Light source 206, 250: Alignment marker 207, 270: Camera 271: Detection area 301a, 301b: Exposure unit 301c: Film alignment mark 315: Back rolls 322, 324: Exposure light source 323, 325: Mask 310: Alignment film 310a: Alignment exposure film

Claims

An alignment film in which an alignment material film is applied on one surface of a transparent film substrate is wound with the alignment material film outside, and the alignment film is supported along the peripheral surface while supporting the alignment film on the peripheral surface. And back roll to move
A first slit mask disposed so as to face the alignment film wound around the back roll and formed with a plurality of first slits parallel to a moving direction of the alignment film; A first exposure unit comprising: a first exposure light source that exposes the alignment material film of the alignment film through a slit mask;
On the downstream side of the first slit mask in the moving direction of the alignment film, a plurality of second films are arranged so as to face the alignment film wound around the back roll and parallel to the moving direction of the alignment film. A second exposure unit comprising: a second slit mask in which two slits are formed; and a second exposure light source that exposes the alignment material film of the alignment film through the second slit mask. ,
Have
The second slits of the second slit mask are arranged at the same pitch as the arrangement pitch of the first slits of the first slit mask,
The first slit and the second slit are biased in the width direction of the alignment film by a half pitch of the arrangement pitch of the first and second slits in the width direction of the alignment film. Further, the film exposure apparatus is characterized in that the first slit mask and the second slit mask are arranged.
An alignment film in which an alignment material film is applied on one surface of a transparent film substrate is wound with the alignment material film outside, and the alignment film is supported along the peripheral surface while supporting the alignment film on the peripheral surface. And back roll to move
A first slit mask disposed so as to face the alignment film wound around the back roll and formed with a plurality of first slits parallel to a moving direction of the alignment film; A first exposure unit comprising: a first exposure light source that exposes the alignment material film of the alignment film through a slit mask;
An opening extending in the width direction of the alignment film is formed on the downstream side of the first slit mask in the moving direction of the alignment film so as to face the alignment film wound on the back roll. A second exposure unit comprising: a third mask; and a third exposure light source that exposes the alignment material film of the alignment film through the third mask;
A film exposure apparatus comprising:
An alignment film in which an alignment material film is applied on one surface of a transparent film substrate is wound with the alignment material film outside, and the alignment film is supported along the peripheral surface while supporting the alignment film on the peripheral surface. And back roll to move
A first slit mask disposed so as to face the alignment film wound around the back roll and formed with a plurality of first slits parallel to a moving direction of the alignment film; A first exposure unit comprising: a first exposure light source that exposes the alignment material film of the alignment film through a slit mask;
An opening extending in the width direction of the alignment film is formed on the upstream side of the first slit mask in the moving direction of the alignment film so as to face the alignment film wound on the back roll. A second exposure unit comprising: a fourth mask; and a fourth exposure light source that exposes the alignment material film of the alignment film through the fourth mask;
A film exposure apparatus comprising:
2. The exposure light source, one of which irradiates the alignment film with CW circularly polarized exposure light and the other of which irradiates the alignment film with CCW circularly polarized exposure light. 4. The film exposure apparatus according to any one of items 1 to 3.
The exposure light source irradiates the alignment film with one of the exposure light incident so that one of the alignment film is inclined by 40 ° in the moving direction of the alignment film with respect to the alignment film, and the other is applied to the alignment film. 4. The film exposure apparatus according to claim 1, wherein the alignment film is irradiated with exposure light incident so as to be inclined by −40 ° in the moving direction of the alignment film.
6. The film exposure apparatus according to claim 1, further comprising a cooling member provided on an upstream side of the back roll in a traveling direction of the alignment film and cooling the alignment film.
An inspection unit that is disposed downstream of the second exposure unit in the moving direction of the alignment film and inspects an exposed portion irradiated with the exposure light in the alignment exposure film after irradiation of the exposure light to the alignment film; Have
The inspection unit winds the alignment exposure film and rotates together with the alignment exposure film, a light source that emits inspection illumination light installed on a peripheral surface of the inspection roll or inside the roll, and The film exposure apparatus according to claim 1, further comprising: a light receiving unit that is installed so as to face the roll and detects illumination light after passing through the alignment exposure film.
The exposure unit exposes the alignment material film on the alignment film to alternately form a strip-shaped first exposure portion and a strip-shaped second exposure portion in the width direction of the alignment film. , Which forms the alignment exposure film,
The inspection unit is installed on the roll, and is installed so as to face the roll with a first polarizing plate that imparts polarized light in a first direction to illumination light from the light source, and on the light receiving unit. A second polarizing plate that imparts polarized light in a direction orthogonal to the first direction with respect to incident light, and a λ / 4 plate provided on the optical axis of the illumination light. The film exposure apparatus according to claim 7.
The exposure unit forms the first exposure unit by an exposure light source that irradiates the alignment film with CW circularly polarized exposure light, and the exposure light source that irradiates the alignment film with CCW circularly polarized exposure light. The film exposure apparatus according to claim 8, wherein the exposure part is formed.
The exposure unit exposes the alignment material film on the alignment film to alternately form a strip-shaped first exposure portion and a strip-shaped second exposure portion in the width direction of the alignment film. , Which forms the alignment exposure film,
The light receiving unit of the inspection unit includes a first light receiving unit provided in a first alignment direction by a first exposure unit of illumination light transmitted through the alignment exposure film, and illumination light transmitted through the alignment exposure film. The film exposure apparatus according to claim 7, further comprising: a second light receiving portion provided in a second alignment direction by the second exposure portion.
The exposure unit forms the first exposure portion with an exposure light source that exposes exposure light so that the alignment film is inclined by 40 ° in the moving direction of the alignment film, and the alignment film is aligned with the alignment film. 11. The film exposure apparatus according to claim 10, wherein the second exposure part is formed by an exposure light source that receives exposure light so as to be inclined by −40 ° in the moving direction of the film.
A transparent film disposed on the optical axis of the light receiving portion, extending in the width direction of the alignment exposure film, and having a scale formed in the width direction of the first exposure portion or the second exposure portion on the alignment exposure film. The film exposure apparatus according to claim 8, further comprising a scale member.
Having a second inspection unit arranged in the transport area of the alignment exposure film before or after inspection by the inspection unit;
The second inspection unit includes
A second light source that emits inspection light, a third polarizing plate that imparts linearly polarized light in a first direction to the inspection light from the second light source, and the third polarizing plate that passes through the third polarizing plate. A second λ / 4 plate that changes inspection light transmitted through the alignment exposure film and provided with circularly polarized light in the first direction to linearly polarized light in the second direction, and inspection of linearly polarized light in the second direction A fourth polarizing plate that transmits light, a second light receiving unit that detects inspection light transmitted through the fourth polarizing plate,
A third light source for emitting inspection light, a fifth polarizing plate for imparting linearly polarized light in the first or second direction to the inspection light from the third light source, and the third polarizing plate. A third λ / 4 plate that changes the inspection light transmitted through the alignment exposure film and provided with the circularly polarized light in the second direction to the linearly polarized light in the second or first direction; and the second or A sixth polarizing plate that transmits the linearly polarized inspection light in the first direction; a third light receiving unit that detects the inspection light transmitted through the sixth polarizing plate;
The film exposure apparatus according to claim 7, wherein the film exposure apparatus includes:
A transport device for moving the alignment film to be exposed in the first direction;
A pair of alignment markers that form a film alignment mark on both sides of the alignment film as an index of the amount of expansion and contraction of the alignment film;
A light source that emits exposure light;
A mask having a plurality of slits arranged in a second direction orthogonal to the first direction and spaced apart from each other, and mask alignment marks formed at both ends in the second direction. When,
An opening extending in the second direction and intersecting all the slits is formed, and a light shielding member that transmits the exposure light at a portion where the opening and the slit intersect,
A detection unit for detecting the film alignment mark together with the mask alignment mark;
A control unit that controls a relative position of the light shielding member and the mask in the first direction;
The width of the slit changes linearly with respect to the first direction, and the interval between the slits is the same as the width of the slit when viewed in the second direction;
The controller controls the relative position in the first direction between the mask and the light shielding member so that the positional relationship between the mask alignment mark and the film alignment mark detected by the detector is a predetermined relationship. An exposure apparatus that controls the exposure.
The pair of mask alignment marks is provided in parallel with one side edge in the width direction of the closest slit among the slits provided at both ends in the second direction or the center line in the width direction of the slit. And
The controller controls the first direction between the mask and the light shielding member so that the distance between the film alignment mark and the mask alignment mark in the second direction is constant at the position of the opening of the light shielding member. The exposure apparatus according to claim 14, wherein the relative position of the exposure apparatus is controlled.
The mask is provided with a pair of observation windows for observing the film alignment mark outside the slit in the second direction, and the mask alignment mark is provided in the observation window,
The exposure apparatus according to claim 14, wherein the detection unit detects the film alignment mark together with the mask alignment mark through the pair of observation windows.
The control unit is configured such that a center position in the second direction between the pair of mask alignment marks detected by the detection unit coincides with a center position in the second direction between the pair of film alignment marks. The exposure apparatus according to claim 14, wherein the position of the mask in the second direction is adjusted.
Two sets of the light source, the light shielding member, and the mask are arranged at positions separated from each other in the first direction, and the slit of one mask is arranged in the second direction with respect to the slit of the other mask. 18. The exposure apparatus according to claim 14, wherein the exposure apparatus is arranged so as to be deviated only by the amount.
19. The exposure apparatus according to claim 18, wherein the strip-shaped exposure portions having different orientation directions are alternately formed in the second direction by the exposure by the two light sources.
A transport device for moving the alignment film to be exposed in the first direction;
A pair of alignment markers that form film alignment marks that serve as indicators of the amount of expansion and contraction of the alignment film on both sides of the alignment film;
A light source that emits exposure light;
A plurality of slits arranged in the second direction perpendicular to the first direction with a space between each other is formed, and a pair of observation windows for observing the pair of film alignment marks is provided, A mask having a mask alignment mark formed in each observation window;
An opening extending in the second direction and intersecting all the slits is formed, and a light shielding member that transmits the exposure light at a portion where the opening and the slit intersect,
A detection unit for detecting the mask alignment mark and the film alignment mark in each observation window;
A control unit that adjusts a relative positional relationship in the first direction between the light shielding member and the mask based on a detection result of the detection unit;
The slit has a first slit at one end in the second direction parallel to the first direction, and a second slit at the other end inclined at a maximum inclination with respect to the first direction, The slit between one slit and the second slit is inclined so that the inclination angle gradually increases from the first slit toward the second slit,
The slits vary linearly with respect to the first direction, and the spacing between the slits is the same as the width of the slits with respect to the second direction;
The first mask alignment mark on the first slit side extends in the first direction, and the second mask alignment mark on the second slit side is one side edge in the width direction of the second slit or the center in the width direction. An exposure apparatus characterized by extending in parallel with a line.
The controller sets a reference value A for the distance between the first mask alignment mark and the corresponding first film alignment mark, and between the second mask alignment mark and the corresponding second film alignment mark. A distance reference value B is set, and when the distance between the first mask alignment mark and the first film alignment mark varies from the reference value A during exposure of the alignment film, the mask is The distance between the first mask alignment mark and the first film alignment mark is adjusted to a reference value A by moving in two directions, and then the second mask alignment mark and the second film alignment mark When the distance from the reference value B fluctuates from the reference value B, the mask is moved in the first direction, and the second alarm is moved. An apparatus according to claim 20, characterized in that adjusting the distance between the the instrument mark second film alignment mark to the reference value B.
A moving device for moving the alignment film in which the alignment material film is formed on the film substrate in one direction;
A plurality of strip-shaped exposure portions provided in a moving region of the alignment film, extending in the one direction and spaced from each other in a direction perpendicular to the one direction, on the alignment material film on the alignment film; A first exposure unit for forming a first exposure pattern comprising:
The first exposure pattern is disposed downstream of the first exposure unit in the moving direction of the alignment film, extends in the one direction on the alignment material film on the alignment film, and extends in the direction orthogonal to the one direction. A second exposure unit for forming a second exposure pattern composed of a plurality of strip-shaped exposure portions in a region between the exposure portions;
An inspection unit provided in a moving region of the alignment film between the first exposure unit and the second exposure unit, and detecting an exposure unit of the first exposure pattern;
A control unit for controlling the exposure position of the second exposure pattern in the second exposure unit based on the position of the exposure unit of the first exposure pattern detected by the inspection unit;
An exposure apparatus comprising:
The first exposure unit includes a first exposure light source and a first mask provided with a band-shaped slit corresponding to the first exposure pattern, and the exposure light from the first exposure light source is the first exposure light. It is shaped by the slit of the mask and irradiated to the alignment material film,
The second exposure unit includes a second exposure light source and a second mask provided with a strip-shaped slit corresponding to the second exposure pattern, and the exposure light from the second exposure light source is the second exposure light. It is shaped by the slit of the mask and irradiated to the alignment material film,
The control unit adjusts the position of the second exposure unit in a direction orthogonal to the one direction based on the position of the exposure unit of the first exposure pattern. The exposure apparatus described in 1.
The moving device winds the alignment film around a back roll, moves the alignment film,
24. The exposure apparatus according to claim 22 or 23, wherein the first exposure unit, the inspection unit, and the second exposure unit are installed at positions facing the alignment film on the back roll.
The inspection unit is installed so as to face the back roll, irradiates inspection light toward the alignment film on the back roll, and a camera that detects reflected light reflected by the back roll; 25. The exposure apparatus according to claim 24, further comprising: a polarizer that filters the inspection light incident on the alignment film or the reflected light incident on the camera with a polarization direction filter.
The inspection section is embedded in the peripheral surface of the back roll and irradiates inspection light toward the alignment film on the back roll, and the inspection section is disposed so as to face the inspection light source. 25. The camera according to claim 24, further comprising: a camera that detects transmitted light that has been transmitted; and a polarizer that filters inspection light incident on the alignment film or transmitted light incident on the camera. The exposure apparatus described.
The moving device defines the moving area of the alignment film by spanning the alignment film on a plurality of transport rolls,
24. The exposure apparatus according to claim 22 or 23, wherein the first exposure unit, the inspection unit, and the second exposure unit are installed at positions facing the alignment film between the transport rolls.
The inspection unit is installed on one surface side of the alignment film between the transport rolls and irradiates inspection light toward the alignment film, and the alignment light is installed on the other surface side of the alignment film. Reflecting means for reflecting the light transmitted through the film, a camera for detecting the reflected light reflected by the reflecting means, and a filter in the polarization direction for the inspection light incident on the alignment film and the reflected light incident on the camera, respectively. An exposure apparatus according to claim 27, further comprising a polarizer.
The inspection unit is installed on one surface side of the alignment film between the transport rolls and irradiates inspection light toward the alignment film, and the alignment light is installed on the other surface side of the alignment film. A camera that detects transmitted light that has passed through the film, and a polarizer that filters each of the inspection light incident on the alignment film and the transmitted light incident on the camera in a polarization direction. Item 28. The exposure apparatus according to Item 27.
The second mask is formed such that the plurality of slits are linearly increased in the first direction between the slits adjacent to each other in a direction orthogonal to the first direction.
The second exposure unit includes a light shielding member having an opening extending in a direction orthogonal to the first direction so as to intersect all the slits of the second mask.
30. The exposure apparatus according to claim 22, wherein the control unit adjusts a position of the light shielding member in the first direction with respect to the second mask.
While moving the alignment film in which the alignment material film is formed on the film substrate in one direction,
The first exposure unit provided in the moving region of the alignment film allows the alignment material film on the alignment film to extend in the one direction and be spaced apart from each other in a direction perpendicular to the one direction. A first exposure step of forming a first exposure pattern comprising a strip-shaped exposure portion of
A direction extending in the one direction and perpendicular to the one direction on the alignment material film on the alignment film by a second exposure unit installed on the downstream side of the first exposure unit in the moving direction of the alignment film. A second exposure step of forming a second exposure pattern comprising a plurality of strip-shaped exposure portions in a region between the exposure portions of the first exposure pattern in
An inspection step of detecting an exposed portion of the first exposure pattern between the first exposure step and the second exposure step;
Have
An FPR that controls the exposure position of the second exposure pattern by the second exposure unit in the second exposure step based on the position of the exposure portion of the first exposure pattern detected in the inspection step. Production method.