JP2008102241A - Pattern drawing device, pattern drawing system, and pattern drawing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To easily irradiate a non-drawing region around a drawing region on a substrate with light. <P>SOLUTION: In a pattern drawing device 1, the pixel pattern of a liquid crystal display device is drawn in a drawing region by relatively moving an irradiation region by light from a first light irradiation unit 4 with respect to a substrate 9 having a negative photosensitive material formed on the main surface. A portion of the drawing region except for a projection pattern for controlling the liquid crystal alignment is irradiated with light by replacing apertures of the first light irradiation unit 4, and irradiating a substrate 9 having a positive photosensitive material formed on the main surface with instantaneous light each time the irradiation region coincides with a division region prepared by equally dividing the drawing region along the main scanning direction, while relatively moving the irradiation region with respect to the substrate 9. A second irradiation unit 5 irradiates only a non-drawing region with light by changing a region that blocks light irradiation in the irradiation region while relatively moving the irradiation region intersecting the drawing region and the non-drawing region with respect to the substrate. Thereby, the non-drawing region is easily irradiated with light. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a technique for drawing a pattern on a photosensitive material on a substrate using light.

  Conventionally, a pattern is drawn by irradiating light onto a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for a plasma display device or a liquid crystal display device (hereinafter referred to as “substrate”). It has been broken.

  For example, in Patent Document 1, a pattern is drawn by irradiating light on a negative photosensitive resin layer through a photomask, and a non-exposed portion is removed in a development process, whereby a photo spacer of a liquid crystal display device is removed. A forming technique is disclosed. In Patent Document 2, the alignment control protrusion of the liquid crystal display device is formed of a photoresist. However, in the drawing method for transferring the mask pattern as in Patent Document 1, when the substrate to be drawn becomes large, the mask becomes large and the manufacturing cost of the drawing apparatus increases.

Therefore, as a drawing method that does not use a large mask of the same size as the substrate, as shown in Patent Document 3, pulsed light is applied to the photosensitive material on the substrate through a relatively small mask in which a plurality of openings are formed. And a method of drawing a pattern on a photosensitive material by repeating irradiation of pulsed light while moving the substrate has been proposed. In Patent Document 3, a pattern drawn on a negative photosensitive material on a substrate becomes a black matrix pattern on a color filter substrate of a liquid crystal display device by development processing.
JP 2002-98824 A JP 2005-173037 A JP 2006-145745 A

  In recent years, in the manufacture of a color filter substrate or the like for a liquid crystal display device, a plurality of color filter substrates may be manufactured from a single glass substrate (so-called multi-sided processing is performed). In this case, a plurality of drawing areas on which a pattern is drawn are set on the main surface of one substrate, and areas around the plurality of drawing areas are non-drawing areas on which no pattern is drawn (that is, light on the photosensitive material). This is a region that should not be irradiated. In the drawing apparatus of Patent Document 3, light is irradiated only to the drawing area while avoiding the non-drawing area.

  By the way, in the drawing apparatus of Patent Document 3, drawing is performed on a positive type photosensitive material in addition to the negative type photosensitive material. In this case, light is irradiated to a region other than the portion corresponding to the pattern in the drawing region through a mask having a light shielding portion corresponding to the pattern to be drawn. Here, when drawing a pattern on a positive type photosensitive material, it is necessary to irradiate light to the entire non-drawing area where the pattern is not drawn. Since the light irradiation area is restricted only within the drawing area, it is difficult to irradiate the non-drawing area located outside the drawing area.

  The present invention has been made in view of the above problems, and has an object to easily irradiate light to a non-drawing area.

  The invention according to claim 1 is a pattern drawing apparatus that draws a pattern on a photosensitive material on a substrate by using light, and is a positive pattern that becomes a periodic pattern by being partially removed in a subsequent process. A substrate holding portion for holding a substrate in which a photosensitive material of a mold is formed in a layer, and a drawing region set as a rectangle having sides facing the first direction and the second direction perpendicular to each other on the photosensitive material A first light irradiating unit that irradiates light other than a portion corresponding to the pattern, and a second light irradiating unit that irradiates light to a non-drawing region around the drawing region on the photosensitive material, The first light irradiating unit has the first light source and one of a plurality of divided regions obtained by equally dividing the drawing region with respect to the first direction in accordance with the periodicity of the pattern, and the first direction has the same length. In one irradiation area, the pattern A first mask for guiding light from the first light source to a region other than the corresponding portion, and a first movement for moving the first irradiation region in the first direction relative to the drawing region; By controlling the mechanism and the first light source and / or the first mask portion, the first irradiation area moves to the divided areas with respect to the first direction while moving the first irradiation area. A first control unit that irradiates light to the first irradiation region through the first mask unit every time they match, the second light irradiation unit including a second light source and the photosensitive material on the photosensitive material A second mask portion that extends in a second direction and guides light from the second light source to a second irradiation region that crosses the drawing region and the non-drawing region; and the second irradiation region in the first direction Second moving relative to the photosensitive material When the moving mechanism and the second irradiation region pass through the drawing region and the non-drawing region, the second mask unit is controlled to change a region of the second irradiation region where light irradiation is blocked. And a second control unit that irradiates light only to the non-drawing region.

  A second aspect of the present invention is the pattern drawing apparatus according to the first aspect, wherein the second mask portion includes a liquid crystal shutter.

  A third aspect of the present invention is the pattern drawing apparatus according to the first or second aspect, wherein, in the substrate holding portion, in place of the substrate on which the positive photosensitive material is formed, in a subsequent process. It is possible to hold a substrate in which a negative photosensitive material that has a periodic pattern by being partially removed is formed in layers, and the first light irradiation unit includes the first mask unit and / or the first mask. By changing the control by one control unit, light is applied only to a portion corresponding to the pattern in a drawing area set as a rectangle having sides facing the first direction and the second direction on the photosensitive material. Irradiate.

  Invention of Claim 4 is the pattern drawing apparatus of Claim 1 or 2, Comprising: On the said photosensitive material, several drawing area | regions containing the drawing area | region and the drawing area of the same shape as the said drawing area | region are included. , The first direction and / or the second direction are spaced apart from each other, the substrate is a substrate that is to be multi-faced according to the plurality of drawing regions, the first light irradiation unit, Irradiating light to a portion other than the portion corresponding to the pattern in the plurality of drawing regions, the second light irradiation unit irradiates light to a non-drawing region other than the plurality of drawing regions on the photosensitive material, The first control unit controls the first light source and / or the first mask unit so that the first irradiation region moves while moving the first irradiation region with respect to each of the plurality of drawing regions. Regarding the first direction The light is irradiated to the first irradiation area through the first mask portion every time the plurality of divided areas coincide with each other, the second irradiation area extends in the second direction, and the photosensitive material is When traversing and the second irradiation region passes through the photosensitive material, light is irradiated only to the non-drawing region under the control of the second mask unit by the second control unit.

  According to a fifth aspect of the present invention, in the pattern drawing apparatus according to the fourth aspect of the present invention, in the substrate holding portion, the substrate on which the positive photosensitive material is formed is partially replaced in a subsequent step. It is possible to hold a substrate on which a negative type photosensitive material having a periodic pattern is formed in a layer shape by being removed, and the first light irradiating unit is formed by the mask unit and / or the first control unit. By changing the control, light is irradiated only to a portion corresponding to the pattern among a plurality of drawing regions set in the same manner as the positive type photosensitive material.

  A sixth aspect of the present invention is the pattern drawing apparatus according to the third or fifth aspect, wherein the substrate is a color filter substrate for a liquid crystal display device, and the color filter substrate is formed by the negative photosensitive material. The pattern formed above is a pixel pattern.

  A seventh aspect of the present invention is the pattern drawing apparatus according to any one of the first to sixth aspects, wherein the substrate is a glass substrate for a liquid crystal display device, and the glass is formed by the positive photosensitive material. The pattern formed on the substrate is a projection pattern for controlling liquid crystal alignment.

  The invention according to claim 8 is a pattern drawing system that draws a pattern on a photosensitive material on a substrate using light, and is a positive pattern that becomes a periodic pattern by being partially removed in a later step. Corresponds to the pattern in a drawing area set as a rectangle having sides that face the first direction and the second direction perpendicular to each other on the photosensitive material in a substrate on which the photosensitive material of the mold is formed in layers A first light irradiation device that irradiates light to a portion other than the portion to be irradiated; a second light irradiation device that irradiates light to a non-drawing region around the drawing region on the photosensitive material; the first light irradiation device; A transport mechanism that transports the substrate between the two light irradiation devices, the first light irradiation device according to the periodicity of the first substrate holding unit that holds the substrate, the first light source, and the pattern. The drawing area in the first direction The first light source is guided to a region other than the portion corresponding to the pattern in the first irradiation region having the same length in the first direction as one of the plurality of equally divided regions. Controlling one mask portion, a first moving mechanism that moves the first irradiation region in the first direction relative to the drawing region, and the first light source and / or the first mask portion. Thus, each time the first irradiation region coincides with each of the plurality of divided regions with respect to the first direction while moving in the first irradiation region, the first irradiation region is moved to the first irradiation region via the first mask portion. A first control unit for irradiating light, and the second light irradiation device extends in the second direction on the photosensitive material, a second substrate holding unit for holding the substrate, a second light source, and Traverse the drawing area and the non-drawing area A second mask portion for guiding light from the second light source to the second irradiation region; and a second moving mechanism for moving the second irradiation region relative to the photosensitive material in the first direction. When the second irradiation region passes through the drawing region and the non-drawing region, the second mask unit is controlled to change the region of the second irradiation region where light irradiation is blocked, A second control unit that irradiates light only to the non-drawing region.

  A ninth aspect of the present invention is the pattern drawing system according to the eighth aspect, wherein the second mask portion includes a liquid crystal shutter.

  The invention according to claim 10 is the pattern drawing system according to claim 8 or 9, wherein the positive photosensitive material is formed on the first substrate holding portion of the first light irradiation device. Instead of the substrate, it is possible to hold a substrate in which a negative photosensitive material that becomes a periodic pattern by being partially removed in a later process is formed in layers, and the first light irradiation device includes: By changing the control by the first mask unit or the first control unit, the pattern in the drawing area set as a rectangle having sides facing the first direction and the second direction on the photosensitive material. Irradiate only the part corresponding to.

  The invention according to claim 11 is a pattern drawing method for drawing a pattern on a photosensitive material on a substrate using light, and is periodically removed by being partially removed on the substrate in a subsequent process. A positive-type photosensitive material having a simple pattern is formed in layers, and the drawing region is set as a rectangle having sides facing the first direction and the second direction perpendicular to each other on the photosensitive material; A non-drawing area is set around the above drawing area, and the pattern drawing method includes: a) a plurality of divided areas obtained by equally dividing the drawing area with respect to the first direction according to the periodicity of the pattern; Of the first irradiation region having the same length in the first direction as that of the first one, and directing light to a region other than the portion corresponding to the pattern, and moving the first irradiation region in the first direction. In the drawing area And b) in the step a), the first irradiation region is irradiated with light each time the first irradiation region coincides with each of the plurality of divided regions with respect to the first direction. And c) guiding light to a second irradiation region extending in the second direction and crossing the drawing region and the non-drawing region on the photosensitive material, and the second irradiation region to the second irradiation region. A step of moving relative to the photosensitive material in the direction of 1; and d) the second irradiation when the second irradiation region passes through the drawing region and the non-drawing region in step c). A step of irradiating light only to the non-drawing region by changing a region of the region where light irradiation is blocked.

  In the present invention, light can be easily irradiated to the non-drawing area. In the second and ninth aspects of the invention, the length of the second irradiation region in the second direction can be easily changed. In the inventions of claims 3, 5 and 10, the structure of the apparatus can be simplified.

  1 and 2 are a side view and a plan view showing the configuration of the pattern drawing apparatus 1 according to the first embodiment of the present invention. The pattern drawing apparatus 1 is an apparatus that draws a pattern using light on a photosensitive material on a glass substrate 9 (hereinafter simply referred to as “substrate 9”) for a liquid crystal display device.

  FIG. 3 is a plan view showing the substrate 9. On the main surface of the substrate 9, a photosensitive material having a periodic pattern is formed in a layer shape by being partially removed in a later step, and the photosensitive material is perpendicular to each other in FIG. Four rectangular drawing areas 91 (shown with parallel diagonal lines in FIG. 3) having sides facing the X direction and the Y direction are set. The four drawing areas 91 have the same shape and are arranged on the photosensitive material so as to be separated from each other in the X direction and the Y direction.

  On the photosensitive material on the substrate 9, a lattice-shaped region around the drawing region 91 (that is, a region other than the plurality of drawing regions 91) is a non-drawing region 92 where a periodic pattern is not drawn (formed). It has become. In the following description, of the non-drawing area 92 set on the photosensitive material, a portion set over the entire length in the X direction of the substrate 9 is referred to as a “first non-drawing area 921”, and the other portions. (That is, a portion adjacent to the drawing area 91 in the X direction) is referred to as a “second non-drawing area 922”. In FIG. 3, the first non-drawing area 921 and the second non-drawing area 922 are each indicated by a two-dot chain line.

  The substrate 9 is a substrate that is to be multi-faced according to the four drawing regions 91, and the four substrates obtained from one substrate 9 are finally subjected to MVA (Multi-domain Vertical Alignment) through a subsequent process. : Multi-domain vertical alignment) type color filter substrate which is an assembly part of a liquid crystal display device.

  In the pattern drawing apparatus 1, a color filter substrate is formed by irradiating light onto a color resist, which is a negative type photosensitive material formed on the substrate 9 (that is, a type in which an exposed portion is left on the substrate during development). A pixel pattern (that is, a set of sub-pixels) formed on the top is drawn. Further, in the pattern writing apparatus 1, a color filter substrate is formed by irradiating light onto a positive type photosensitive material formed on the substrate 9 (that is, a type in which only the non-exposed portion is left on the substrate during development). A projection pattern (that is, a set of projections) for controlling the alignment of liquid crystal formed thereon is also drawn. In the substrate 9, a plurality of drawing areas 91 are set on the photosensitive material in the same manner when drawing is performed on the negative photosensitive material and when drawing is performed on the positive photosensitive material.

  In the liquid crystal display device, the protrusion for controlling the liquid crystal alignment is a structure that is formed on a transparent electrode of a color filter substrate or a TFT (Thin Film Transistor) substrate and plays a role of distorting an electric field when a voltage is applied. In the liquid crystal display device, the electric field is distorted by the protrusions so that liquid crystal molecules that are vertically aligned when no voltage is applied are tilted and aligned when a voltage is applied. Thereby, a liquid crystal display device having a wide viewing angle is realized.

  As shown in FIGS. 1 and 2, the pattern drawing apparatus 1 includes a stage 3 that is a substrate holding unit that holds a substrate 9, a stage driving mechanism 2 that is provided on a base 11 and moves and rotates the stage 3, and a stage 3 and the frame 12 and the frame 13 fixed to the base 11 so as to straddle the stage driving mechanism 2, and light is applied to a plurality of drawing regions 91 (see FIG. 3) on the photosensitive material on the substrate 9. The first light irradiating unit 4 for irradiating, the second light irradiating unit 5 attached to the frame 13 and irradiating the non-drawing region 92 (see FIG. 3) on the photosensitive material on the substrate 9, and the stage 3 An imaging unit 6 that images the substrate 9 is provided. The stage 3 holds a substrate on which a positive photosensitive material is formed on the main surface, and can also hold a substrate on which a negative photosensitive material is formed instead of the substrate.

  The pattern drawing apparatus 1 also includes a control unit that controls these configurations. FIG. 4 is a block diagram showing functions realized by the control unit 7 together with other configurations. The control unit 7 has a configuration in which a CPU, a RAM, a ROM, a fixed disk, a display unit, and an input unit are connected as in a normal computer. As shown in FIG. The 1st control part 71 to control and the 2nd control part 72 which controls the 2nd light irradiation part 5 are provided. In the pattern drawing apparatus 1, the stage driving mechanism 2, the first light irradiation unit 4, the second light irradiation unit 5, and the imaging unit 6 are controlled by the control unit 7. Further, the output from the imaging unit 6 is sent to the control unit 7.

  As shown in FIGS. 1 and 2, the stage driving mechanism 2 includes a support plate 21 that rotatably supports the stage 3, and a stage 3 centering on a stage rotation axis 221 that is perpendicular to the main surface of the stage 3 on the support plate 21. 2, a stage rotating mechanism 22, a stage 3 together with a support plate 21, a sub-scanning mechanism 23 that moves in the X direction in FIG. 2 (hereinafter referred to as “sub-scanning direction”), and a support plate 21 via the sub-scanning mechanism 23. And a main scanning mechanism 25 that moves the stage 3 together with the support plate 21 and the base plate 24 in the Y direction in FIG. 2 (hereinafter referred to as “main scanning direction”).

  The stage rotation mechanism 22 includes a linear motor 222 provided on the (−Y) side of the stage 3, and the linear motor 222 includes a moving element fixed to the side surface on the (−Y) side of the stage 3, and a support plate. The stator provided on the upper surface of 21 is provided. In the stage rotation mechanism 22, the moving element of the linear motor 222 moves in the X direction along the groove of the stator, so that the stage 3 has a predetermined angle around the stage rotation axis 221 provided on the support plate 21. Rotate within the range of.

  The sub-scanning mechanism 23 has a linear motor 231 extending in the sub-scanning direction parallel to the main surface of the stage 3 and perpendicular to the main scanning direction on the lower side (that is, (−Z) side) of the support plate 21, and A pair of guide rails 232 extending in the sub-scanning direction are provided on the (+ Y) side and the (−Y) side of the linear motor 231. The linear motor 231 includes a mover fixed to the lower surface of the support plate 21 and a stator provided on the upper surface of the base plate 24. When the mover moves in the sub-scanning direction along the stator, The support plate 21 moves linearly with the stage 3 along the linear motor 231 and the guide rail 232 in the sub-scanning direction.

  The main scanning mechanism 25 has a linear motor 251 extending in a main scanning direction parallel to the main surface of the stage 3 below the base plate 24, and a main scanning direction on the (+ X) side and the (−X) side of the linear motor 251. A pair of guide rails 252 extending in the direction is provided. The linear motor 251 includes a mover fixed to the lower surface of the base plate 24 and a stator provided on the upper surface of the base 11, and when the mover moves in the main scanning direction along the stator, The base plate 24 linearly moves in the main scanning direction along with the support plate 21 and the stage 3 along the linear motor 251 and the guide rail 252 which are moving axes.

  As shown in FIG. 2, the first light irradiation unit 4 includes a plurality of optical heads 41 that are arranged at an equal pitch (200 mm pitch in this embodiment) along the sub-scanning direction and attached to the frame 12. . Further, as shown in FIG. 1, the first light irradiation unit 4 includes an illumination optical system 42 connected to each optical head 41, a laser oscillator 43 that is a light source, and a laser driving unit 44. In the first light irradiation unit 4, each laser driving unit 44 is driven to emit pulsed light (hereinafter simply referred to as “light”) from the laser oscillator 43, and each optical head via the illumination optical system 42. 41.

  Each optical head 41 emits light from the laser oscillator 43 downward, an aperture unit 46 that partially blocks the light from the output unit 45, and light that has passed through the aperture unit 46 on the substrate 9. An optical system 47 is provided for guiding the light-sensitive material provided above. In the pattern drawing apparatus 1, the aperture of the aperture unit 46 is changed in each optical head 41 when the pixel pattern of the color filter substrate is drawn and when the projection pattern for controlling the liquid crystal alignment is drawn. Hereinafter, the configuration of the optical head 41 when the pixel pattern is drawn will be described first, and then the configuration of the optical head 41 when the projection pattern is drawn will be described.

  FIG. 5 is a plan view showing a part of the aperture unit 46. As shown in FIG. 5, the aperture unit 46 includes a first aperture plate 461 having a plurality of rectangular light-transmitting portions and a pair of holdings that hold the first aperture plate 461 from the (+ X) side and the (−X) side. And a position adjusting mechanism 463 for adjusting the positions of the first aperture plate 461 in the main scanning direction and the sub-scanning direction. In the first aperture plate 461, a plurality of three types of translucent portions 4611, 4612, and 4613 having different sizes are arranged at equal pitches along the sub-scanning direction (that is, the X direction). In this embodiment mode, the pitch of the light transmitting portions 4611, the pitch of the light transmitting portions 4612, and the pitch of the light transmitting portions 4613 are different from each other. In FIG. 5, in order to facilitate understanding, parallel oblique lines are given to regions (that is, light shielding portions) excluding the light transmitting portions 4611 to 4613 of the first aperture plate 461.

  The position adjustment mechanism 463 includes a first adjustment mechanism 464 that moves the first aperture plate 461 in the main scanning direction together with the pair of holding portions 462, a pair of guide rails 465 that extend in the sub-scanning direction below the first adjustment mechanism 464, In addition, a second adjustment mechanism 466 that moves the first aperture plate 461 along the guide rail 465 along with the holding portion 462 and the first adjustment mechanism 464 is provided. In the present embodiment, linear motors are used as the first adjustment mechanism 464 and the second adjustment mechanism 466.

  FIG. 6 is a plan view showing another part of the aperture unit 46 that optically overlaps the part shown in FIG. As shown in FIG. 6, the aperture unit 46 includes a pair of holdings that hold the second aperture plate 467 and the second aperture plate 467 having a plurality of rectangular light-transmitting portions from the (+ Y) side and the (−Y) side. And a third adjustment mechanism 469 for moving the second aperture plate 467 together with the pair of holding portions 468 in the sub-scanning direction. In the present embodiment, a linear motor is used as the third adjustment mechanism 469.

  The second aperture plate 467, the holding portion 468, and the third adjustment mechanism 469 are disposed above the first aperture plate 461, the holding portion 462 (see FIG. 3) and the position adjustment mechanism 463, and the first adjustment of the position adjustment mechanism 463 is performed. Fixed on mechanism 464. The first aperture plate 461 and the second aperture plate 467 are disposed at optically conjugate positions. In the second aperture plate 467, three types of translucent portions 4671, 4672, and 4673 having different sizes respectively corresponding to the plurality of translucent portions 4611 to 4613 of the first aperture plate 461 are respectively in the sub-scanning direction (that is, X Are arranged at equal pitches along the direction). In FIG. 6, the position adjustment mechanism 463 and the translucent portions 4611 to 4613 of the first aperture plate 461 are drawn with broken lines in order to facilitate understanding of the drawing. Further, the area of the second aperture plate 467 excluding the light transmitting portions 4671 to 4673 is shown with parallel oblique lines.

  As shown in FIG. 6, a second aperture is formed in an irradiation region 451 (indicated by a two-dot chain line in FIG. 6) of light emitted from the laser oscillator 43 via the emission unit 45 (see FIG. 1). When the light-transmitting portion 4673 of the plate 467 and the light-transmitting portion 4613 of the first aperture plate 461 that partially overlaps the light-transmitting portion 4673 are disposed, the light from the emitting unit 45 is transmitted to the light-transmitting portion 4673 and the light-transmitting portion. Only a region overlapping with the portion 4613 (hereinafter referred to as a “mask set light transmitting portion”) passes through the optical system 47 (see FIG. 1), and as shown in FIG. It is guided to the irradiation region 931 having a shape. In the following description, the plurality of irradiation regions 931 are collectively referred to as “irradiation regions 93”.

  In the pattern writing apparatus 1, by adjusting the relative position of the second aperture plate 467 in the sub-scanning direction with respect to the first aperture plate 461, the width of the light guided onto the substrate 9 in the sub-scanning direction (that is, a plurality of irradiation regions). Each width of 931) is changed. Further, the first aperture plate 461 and the second aperture plate 467 are moved in the main scanning direction, and the light transmitting portions 4611 and 4671 or the light transmitting portions 4612 and 4672 are disposed in the light irradiation region 451 from the emitting portion 45. As a result, the size, pitch, and the like of the irradiation region 931 on the substrate 9 are changed.

  In the pattern drawing apparatus 1 shown in FIG. 1, the stage drive mechanism 2 and the first light irradiation unit 4 are controlled by the first control unit 71 of the control unit 7 shown in FIG. ) And the light is irradiated to a plurality of drawing regions 91 (see FIG. 3) of the moving substrate 9. In other words, the irradiation region 93 is irradiated with light while moving the irradiation region 93 in the (−Y) direction relative to the photosensitive material on the substrate 9 on the plurality of drawing regions 91 of the substrate 9. Is called. As a result, a stripe pattern extending parallel to the main scanning direction is drawn on the photosensitive material in each drawing area 91.

  When the movement of the stage 3 in the main scanning direction is completed, the substrate 9 moves together with the stage 3 in the sub-scanning direction by a predetermined distance (50 mm in the present embodiment) while light irradiation is stopped. After that, the irradiation region 93 is irradiated with light while moving the substrate 9 in the direction opposite to the first main scanning (that is, the (−Y) direction). In the present embodiment, four main scans are performed with the sub scan interposed between the main scans, so that only the portion corresponding to the pixel pattern on the plurality of drawing regions 91 on the photosensitive material of the substrate 9 is applied. By irradiating light, a pixel pattern is drawn, and development processing is performed in a later process, whereby the non-exposed portion of the photosensitive material is removed from the substrate to form a plurality of sub-pixels of the color filter substrate.

  Next, the configuration of each optical head 41 when a projection pattern for liquid crystal alignment control is drawn will be described. When the projection pattern is drawn, the first aperture plate 461 and the second aperture plate 467 of the aperture unit 46 shown in FIGS. 5 and 6 are removed from each optical head 41 of the first light irradiation unit 4, and As shown in FIG. 8, the third aperture plate 461a is attached to the holding portion 462 to which the first aperture plate 461 is attached. In this case, no aperture is attached to the holding portion 468 (see FIG. 6).

  As shown in FIG. 8, the third aperture plate 461a has a plurality of circular light shielding portions 4614 corresponding to a part of the projection pattern, and the area other than the light shielding portions 4614 is a light transmitting portion that transmits light. Yes. In the third aperture plate 461a, the light shielding portions 4614 are arranged in two rows in the main scanning direction (ie, the Y direction), and in each row, a large number of light shielding portions 4614 are along the sub-scanning direction (ie, the X direction). Are arranged at equal pitches. In FIG. 8, in order to facilitate understanding of the drawing, the light shielding portion 4614 is shown with a parallel oblique line. In FIG. 8, for the convenience of illustration, the pitch of the light-shielding portions 4614 is increased and the number of the light-shielding portions 4614 is smaller than the actual number.

  In each optical head 41, the light emitted from the laser oscillator 43 via the emitting portion 45 (see FIG. 1) is irradiated to the third aperture plate 461a, and the light is partially blocked by the third aperture plate 461a. As a result, light from the emitting portion 45 is guided to a region on the drawing region 91 excluding a portion corresponding to the projection pattern from a rectangular irradiation region extending in the sub-scanning direction.

  FIG. 9 is a plan view showing a part of one drawing area 91. In the pattern drawing apparatus 1, a portion corresponding to the projection pattern among the plurality of irradiation regions 941 arranged at an equal pitch in the sub-scanning direction on the drawing region 91 by the plurality of optical heads 41 of the first light irradiation unit 4. Besides, light is irradiated. In the present embodiment, the pitch of the irradiation areas 941 in the sub-scanning direction is 200 mm, and the length of each irradiation area 941 in the sub-scanning direction is 50 mm. In the following description, the plurality of irradiation areas 941 are collectively referred to as “irradiation areas 94”. In FIG. 9, the non-exposure area in the irradiation area 94 is shown in black, and the portion 911 corresponding to the projection pattern in the drawing area 91 is indicated by a thin line circle. In FIG. 9, for the convenience of illustration, the number of circular portions 911 is smaller than the actual number.

  As shown in FIG. 9, the length (width) of the irradiation area 94 in the main scanning direction is divided into a plurality of divided areas 912 (in FIG. 9) obtained by equally dividing the drawing area 91 in the main scanning direction in accordance with the periodicity of the projection pattern. Is indicated by a two-dot chain line). In the first light irradiation unit 4, the light from the emission unit 45 is directed to a region other than the portion corresponding to the projection pattern in the irradiation region 94 by the third aperture plate 461 a (see FIG. 8) of the plurality of optical heads 41. Led.

  In the pattern drawing apparatus 1 shown in FIG. 1, the stage controller 2 and the laser oscillator 43 and the laser driver 44 that are light sources of the first light irradiation unit 4 are controlled by the first controller 71 of the controller 7. As a result, the substrate 9 moves in the (+ Y) direction together with the stage 3, and intermittent light irradiation is performed on the plurality of drawing regions 91 of the moving substrate 9. Specifically, on the photosensitive material of the substrate 9, the irradiation region 94 is continuously moved in the main scanning direction relative to the drawing region 91, and the irradiation region 94 is divided into a plurality of divided regions 912 in the main scanning direction. Each time (that is, every time the (−Y) side edge of the plurality of irradiation regions 941 overlaps the (−Y) side edge of one divided region 912), the third of the aperture unit 46 Instantaneous light irradiation is performed on the irradiation region 94 through the aperture plate 461a. Thereby, in each drawing area | region 91, the area | region except the some circular part 911 on a photosensitive material is exposed. In the pattern drawing apparatus 1, the movement of the substrate 9 may be stopped and light may be irradiated to the stopped substrate 9 every time the irradiation region 94 coincides with the divided region 912 in the main scanning direction.

  In the pattern drawing apparatus 1, as in the pixel pattern drawing, four main scans are performed with the sub scans sandwiched between the main scans, so that the plurality of drawing regions 91 on the photosensitive material of the substrate 9 are formed. The projection pattern is drawn by irradiating light only to the portion other than the projection pattern, and is subjected to development processing in a subsequent process, whereby the exposed portion of the photosensitive material is removed from the substrate to form a substantially cylindrical shape (for example, a cone) Projections for controlling the alignment of the liquid crystal are formed.

  Next, the 2nd light irradiation part 5 is demonstrated. As shown in FIGS. 1 and 2, the second light irradiation unit 5 includes a high pressure mercury lamp (hereinafter simply referred to as “mercury lamp”) 51 as a light source, and an aperture unit 52 that partially blocks light from the mercury lamp 51. In addition, as shown in FIG. 1, an optical system 53 that guides light that has passed through the aperture unit 52 onto a photosensitive material provided on the substrate 9 is provided. In the pattern writing apparatus 1, light is irradiated from the second light irradiation unit 5 to the positive photosensitive material formed on the substrate when the above-described projection pattern is drawn.

  FIG. A is a plan view showing the aperture unit 52. FIG. FIG. As shown in A, the aperture unit 52 is a pair that holds the fourth aperture plate 521 and the fourth aperture plate 521 having a thin rectangular opening 5211 extending in the sub-scanning direction from the (+ X) side and the (−X) side. Holding portion 522, position adjusting mechanism 523 for adjusting the position of the fourth aperture plate 521 in the main scanning direction and the sub-scanning direction, the light shielding plate 524 disposed above the fourth aperture plate 521, and the light shielding plate 524 are (+ X). And a light shielding plate moving mechanism 526 that moves the light shielding plate 524 together with the pair of holding portions 525 in the main scanning direction.

  The position adjustment mechanism 523 is similar in structure to the position adjustment mechanism 463 shown in FIG. 5 but has a similar structure. The fourth adjustment mechanism 527 moves the fourth aperture plate 521 together with the pair of holding portions 522 in the main scanning direction. A pair of guide rails 528 extending in the sub-scanning direction below the fourth adjustment mechanism 527 and the fourth aperture plate 521 are moved in the sub-scanning direction along the guide rail 528 together with the holding portion 522 and the fourth adjustment mechanism 527. A fifth adjustment mechanism 529 is provided. In the present embodiment, linear motors are used as the fourth adjustment mechanism 527, the fifth adjustment mechanism 529, and the light shielding plate moving mechanism 526. The light shielding plate moving mechanism 526 is fixed on the fourth adjustment mechanism 527 of the position adjustment mechanism 523. FIG. In A, in order to facilitate understanding of the drawing, the region (that is, the light shielding portion) excluding the opening 5211 of the fourth aperture plate 521 and the light shielding plate 524 are shown with parallel oblique lines.

  The light shielding plate 524 includes a main body portion 5241 whose edges on both sides are held by the holding portion 525 and two protruding portions 5242 that protrude from the main body portion 5241 to the (−Y) side. The two protrusions 5242 are rectangular plates and are arranged in the sub-scanning direction. In the aperture unit 52, the light shielding plate 524 is moved to the (−Y) side by the light shielding plate moving mechanism 526, so that FIG. As shown in B, the protruding portion 5242 of the light shielding plate 524 partially overlaps the opening 5211 of the fourth aperture plate 521.

  FIG. As shown in A, in a state where the protruding portion 5242 of the light shielding plate 524 does not overlap the opening 5211 of the fourth aperture plate 521, the light emitted from the mercury lamp 51 (see FIG. 1) passes through the opening 5211 and 11. As shown to A, it is guide | induced to the one rectangular irradiation area | region 95 extended on the board | substrate 9 in a subscanning direction. The length of the irradiation region 95 in the sub-scanning direction is equal to the length of the substrate 9 in the sub-scanning direction (that is, the length of the first non-drawing region 921 in the sub-scanning direction). The two drawing areas 91 and the non-drawing area 92 on the photosensitive material are traversed.

  FIG. As shown in B, in a state where the protruding portion 5242 of the light shielding plate 524 overlaps the opening 5211 of the fourth aperture plate 521, the light emitted from the mercury lamp 51 is a portion of the opening 5211 that does not overlap the protruding portion 5242. And pass through FIG. As shown in B, the light is guided to three rectangular irradiation areas 95 a arranged in the sub-scanning direction on the substrate 9. The lengths of the three irradiation regions 95a in the sub-scanning direction are made equal to the lengths of the corresponding second non-drawing regions 922 in the sub-scanning direction, respectively.

  In the pattern drawing apparatus 1 shown in FIG. 1, the stage control mechanism 2 and the second light irradiation unit 5 are controlled by the second control unit 72 of the control unit 7 shown in FIG. ), And the non-drawing area 92 of the moving substrate 9 is irradiated with light. Specifically, the first non-drawing region 921 on the substrate 9 (that is, the portion of the non-drawing region 92 that is set over the entire length of the substrate 9 in the sub-scanning direction) is the second light irradiation unit 5. When passing below, see FIG. As shown to A, the protrusion part 5242 of the light-shielding plate 524 is made into the state which does not overlap with the opening 5211 of the 4th aperture plate 521, FIG. As shown to A, light is irradiated to the irradiation area | region 95 covering the full length of the subscanning direction of the board | substrate 9. As shown to FIG.

  Further, when the second non-drawing region 922 (that is, the portion of the non-drawing region 92 other than the first non-drawing region 921) and the drawing region 91 on the substrate 9 pass below the second light irradiation unit 5. FIG. As shown in FIG. 11B, the protrusion 5242 of the light shielding plate 524 overlaps the opening 5211 of the fourth aperture plate 521, and FIG. As shown to B, light is irradiated to the three irradiation area | regions 95a arranged in a subscanning direction. In other words, when the irradiation region 95 passes through the drawing region 91 and the non-drawing region 92, the aperture unit 52 is controlled by the second control unit 72, and the region of the irradiation region 95 where light irradiation is blocked is changed. As a result, only the non-drawing region 92 on the photosensitive material is irradiated with light.

  Here, when the aperture unit 46 of the first light irradiation unit 4 is the first mask unit and the aperture unit 52 of the second light irradiation unit 5 is the second mask unit, the main scanning mechanism 25 is the first mask unit. A first moving mechanism that moves the irradiation region 94, which is the first irradiation region, by the relative movement relative to the drawing region 91 in the main scanning direction, and irradiation regions 95, 95a that are the second irradiation regions by the second mask unit. 2 also serves as a second moving mechanism that moves in the main scanning direction relative to the photosensitive material. Further, the laser oscillator 43 and the laser driving unit 44 of each optical head 41 of the first light irradiation unit 4 serve as a first light source that emits light toward the first mask unit, and the mercury lamp 51 of the second light irradiation unit 5 is The second light source emits light toward the second mask portion.

  Next, a flow of drawing a pixel pattern by the pattern drawing apparatus 1 will be described. FIG. 12 is a diagram illustrating a flow of drawing a pixel pattern. When a pixel pattern is drawn, first, the substrate 9 in which a negative photosensitive material is applied to the entire main surface (that is, the plurality of drawing areas 91 and the grid-like non-drawing areas 92) is placed on the stage 3. Placed on the main surface of the stage 3 and held (step S11).

  Subsequently, the control unit 7 controls the four alignment cameras 61 (see FIG. 1 and FIG. 2) of the imaging unit 6, and images the alignment marks (not shown) provided near the four corners on the substrate 9. Is done. Then, the stage drive mechanism 2 is controlled by the control unit 7 based on the output from the imaging unit 6, whereby the stage 3 moves in the main scanning direction and the sub-scanning direction and rotates about the stage rotation shaft 221. . Thereby, the board | substrate 9 is located in a drawing start position (step S12).

  When the alignment of the substrate 9 is completed, the first control unit 71 of the control unit 7 controls the first light irradiation unit 4 to start the light irradiation, and the aperture unit 46 partially blocks the light. On the photosensitive material on the substrate 9, light is guided to the irradiation region 93 corresponding to the mask set translucent portion (step S13).

  Next, the stage drive mechanism 2 is controlled by the controller 7 to start the movement of the stage 3 in the (+ Y) direction (step S14), and the irradiation region 93 is relative to the photosensitive material in the (−Y) direction. As a result of the main scanning, a stripe pattern is drawn on the photosensitive material on the substrate 9. When the main scanning of the irradiation area 93 reaches a predetermined movement end position (that is, the (−Y) side edge of the (−Y) side drawing area 91), the movement of the stage 3 and the substrate 9 is stopped ( In step S15), light irradiation is stopped (step S16). In the pattern drawing apparatus 1, when the second non-drawing region 922 between the (+ Y) side drawing region 91 and the (−Y) side drawing region 91 passes below the first light irradiation unit 4. First, the light irradiation from the first light irradiation unit 4 is temporarily stopped.

  When the first main scanning with respect to the photosensitive material on the substrate 9 is completed, it is confirmed whether or not pattern drawing on the substrate 9 is continued (that is, whether or not the next main scanning is performed) (step S17). If there is a next scan, the sub-scanning mechanism 23 moves the substrate 9 in the sub-scanning direction (step S171), returns to step S13, and irradiates the substrate 9 with light (-Y of the stage 3). ) Movement in the direction is started (steps S13 and S14). Then, the movement of the stage 3 and the light irradiation are stopped at the movement end position on the (−Y) side (steps S15 and S16).

  In the pattern drawing apparatus 1, the movement in the main scanning direction of the stage 3 performed while irradiating light onto the substrate 9 (that is, main scanning of the irradiation region 93 with respect to the photosensitive material on the substrate 9) is performed between the main scannings. 3 is repeated a predetermined number of times (four times in the present embodiment) across the movement in the sub-scanning direction (steps S13 to S17, S171). When the entire striped pixel pattern is drawn on the photosensitive material on the substrate 9 (step S17), the drawing operation by the pattern drawing apparatus 1 ends. In the substrate 9 on which the pixel pattern is drawn, a development process is performed in a subsequent process, whereby a non-exposed portion of the photosensitive material is removed from the substrate to form a plurality of subpixels. The above process is repeated for each color of the sub-pixels to form RGB color resist patterns.

  Next, the flow of drawing the projection pattern by the pattern drawing apparatus 1 will be described. FIG. A and FIG. B is a diagram illustrating a flow of drawing a projection pattern. In the pattern drawing apparatus 1, FIG. As shown in FIG. 13A, after the positive light-sensitive material on the substrate is irradiated with light from the first light irradiation unit 4, FIG. As shown to B, the light irradiation from the 2nd light irradiation part 5 is performed.

  When the projection pattern is drawn, first, the substrate 9 in which the positive photosensitive material is applied to the entire main surface (that is, the plurality of drawing areas 91 and the grid-like non-drawing areas 92) is held on the stage 3. After that, similarly to step S12, the stage drive mechanism 2 moves the drawing start position (steps S21 and S22). In the pattern drawing apparatus 1, in the aperture unit 46 of the first light irradiation unit 4, the first aperture plate 461 and the second aperture plate 467 are changed in advance to the third aperture plate 461a.

  When the alignment of the substrate 9 is completed, the main scanning mechanism 25 is controlled by the first control unit 71 of the control unit 7, and no light is irradiated from the laser oscillator 43 of the first light irradiation unit 4 (that is, the light is turned off). In the state), the movement of the substrate 9 in the (+ Y) direction is started, and the irradiation area 94 moves relative to the drawing area 91 in the (−Y) direction (step S23).

  When the irradiation region 94 coincides with the divided region 912 in the main scanning direction, the first control unit 71 controls the laser driving unit 44 of the first light irradiation unit 4 so that light is emitted from the laser oscillator 43 instantaneously. By partially blocking the light by the aperture unit 46, the irradiation region 94 on the divided region 912 located closest to the (+ Y) side in each of the two drawing regions 91 located on the (+ Y) side of the photosensitive material. Of the plurality of irradiation areas 941 that coincide with the divided area 912 in the main scanning direction, light is guided (ie, irradiated) to portions other than the portion corresponding to the projection pattern (step S24).

  Subsequently, the control unit 7 confirms whether or not there is an unirradiated divided region 912 on the (−Y) side of the light-irradiated divided region 912 (that is, the presence or absence of the next divided region 912) ( Step S25). When there is the next divided area 912, the process returns to step S24 with the movement of the substrate 9 continued by the main scanning mechanism 25, and every time the irradiation area 94 matches the next divided area 912 in the main scanning direction, Light is irradiated to portions other than the portion corresponding to the projection pattern in the irradiation region 94 through the third aperture plate 461a of the aperture unit 46 (step S24).

  When the main scanning of the irradiation area 94 reaches a predetermined movement end position and light irradiation is performed (that is, in each of the two drawing areas 91 located on the (−Y) side of the photosensitive material, (−Y The movement of the stage 3 and the substrate 9 is stopped (step S25, S26).

  When the first main scanning with respect to the photosensitive material on the substrate 9 is completed, it is confirmed whether or not pattern drawing on the substrate 9 is continued (that is, whether or not the next main scanning is performed) (step S27). If there is a next scan, the sub-scanning mechanism 23 moves the substrate 9 in the sub-scanning direction (step S271), returns to step S23, and starts moving in the (−Y) direction. Every time the irradiation area 94 coincides with the divided area 912 in the main scanning direction until the main scanning reaches the (+ Y) side movement end position and the movement of the stage 3 in the main scanning direction ends, Of these, light is irradiated to portions other than the portion corresponding to the projection pattern (steps S23 to S26).

  In the pattern writing apparatus 1, the stage 3 is moved in the main scanning direction while repeating intermittent and instantaneous light irradiation on the substrate 9 (that is, main scanning of the irradiation region 94 with respect to the photosensitive material on the substrate 9). Is repeated a predetermined number of times (four times in the present embodiment) with the movement of the stage 3 in the sub-scanning direction between each main scan (steps S23 to S27, S271). When the entire projection pattern is drawn on the photosensitive material on the substrate 9 (step S27), a series of drawing operations by the first light irradiation unit 4 is completed.

  When the drawing by the first light irradiation unit 4 is completed, the stage drive mechanism 2 is controlled by the second control unit 72 of the control unit 7, and the substrate 9 is moved to the drawing start position by the second light irradiation unit 5 (step). S31). At the drawing start position, the (+ Y) side edge of the non-drawing region 92 on the photosensitive material is positioned below the second light irradiation unit 5. At this time, the aperture unit 52 of the second light irradiation unit 5 is in a state where the projection 5242 of the light shielding plate 524 does not overlap the opening 5211 of the fourth aperture plate 521 (see FIG. 10A).

  Subsequently, the second control unit 72 controls the second light irradiation unit 5 to start the light irradiation, and the light is partially blocked by the fourth aperture plate 521 of the aperture unit 52, so that the light on the photosensitive material. In the first non-drawing area 921 located on the most (+ Y) side of the light, light is guided to one rectangular irradiation area 95 extending in the sub-scanning direction corresponding to the opening 5211 (step S32). The irradiation region 95 extends over the entire length in the sub-scanning direction of the first non-drawing region 921 on the substrate 9.

  Next, the main scanning mechanism 25 is controlled by the second control unit 72 to start the movement of the stage 3 in the (+ Y) direction (step S33), and the irradiation region 95 is directed to the photosensitive material in the (−Y) direction. The main scanning is performed relatively. An irradiation area 95 that relatively moves in the (−Y) direction on the most (+ Y) -side first non-drawing area 921 on the photosensitive material is the first non-drawing area 921 and the first non-drawing area 921 ( When the boundary between the second non-drawing region 922 adjacent to the −Y) side is reached (that is, the (−Y) side edge of the irradiation region 95 is the (−Y) side of the first non-drawing region 921) In the aperture unit 52 of the second light irradiating unit 5, the light shielding plate moving mechanism 526 is controlled by the second control unit 72 to move the light shielding plate 524 in the (−Y) direction. The protruding portion 5242 of 524 partially overlaps the opening 5211 of the fourth aperture plate 521 (see FIG. 10B). As a result, a region where light irradiation is blocked in the light irradiation region from the mercury lamp 51 is changed, and the shape of the irradiation region relatively moving in the (−Y) direction on the photosensitive material on the substrate 9 is changed to the first non-light-emitting region. The irradiation area 95 corresponding to the drawing area 921 is changed to three irradiation areas 95a (see FIG. 11B) corresponding to the second non-drawing area 922.

  The three irradiation regions 95a relatively move in the (−Y) direction on the second non-drawing region 922 on the (+ Y) side on the photosensitive material. When the irradiation region 95a reaches the boundary between the second non-drawing region 922 and the first non-drawing region 921 adjacent to the (−Y) side of the second non-drawing region 922 (that is, each irradiation region 95a). (−Y) side edge of the second non-drawing region 922 overlaps with the (−Y) side edge), the second control unit 72 moves the light shielding plate in the aperture unit 52 of the second light irradiation unit 5. The mechanism 526 is controlled to move the light shielding plate 524 in the (+ Y) direction, and the protruding portion 5242 of the light shielding plate 524 is retracted from the opening 5211 of the fourth aperture plate 521 (see FIG. 10A). As a result, a region where light irradiation is blocked out of the light irradiation region from the mercury lamp 51 is changed, and the shape of the irradiation region is one irradiation region 95 corresponding to the opening 5211 from the three irradiation regions 95a (FIG. 11. (See A).

  In the pattern drawing apparatus 1, main scanning of the irradiation area (that is, the irradiation area 95 or the irradiation area 95a) performed while irradiating the photosensitive material with light is continued until the stage 3 reaches a predetermined movement end position. Each time the region reaches the boundary between the first non-drawing region 921 and the second non-drawing region 922, the region of the irradiation region where light irradiation is blocked is changed, and the irradiation region 95 and the irradiation region 95a are changed. It is switched (step S34). Thereby, the light from the mercury lamp 51 is irradiated only on the non-drawing area 92 on the photosensitive material on the substrate 9.

  Then, when light is irradiated on the entire non-drawing region 92 by main scanning of the irradiation regions 95 and 95a and the substrate 9 reaches the movement end position, the movement of the stage 3 and the substrate 9 in the main scanning direction is stopped (step S1). S35), the light irradiation is stopped (step S36). As described above, in the substrate 9 on which light is irradiated on the entire portion other than the portion corresponding to the projection pattern on the photosensitive material, the exposed portion of the photosensitive material is removed from the substrate by performing development processing in a subsequent process. Thus, a plurality of protrusions for controlling the liquid crystal alignment is formed.

  As described above, in the pattern writing apparatus 1, when the first light irradiation unit 4 is controlled by the first control unit 71 when the projection pattern is drawn on the positive photosensitive material on the substrate 9, Each time the irradiation area 94 coincides with the divided area 912 while relatively moving in the main scanning direction an irradiation area 94 having the same length in the main scanning direction as one of the plurality of divided areas 912 of the drawing area 91, the irradiation area 94 is compared with the irradiation area 94. Instantaneous light irradiation is performed. Thereby, even when the projection pattern is drawn on the large substrate 9, the projection pattern can be easily drawn on the drawing region 91 without using a large mask having the same size as the substrate 9. it can.

  Further, the second light irradiation unit 5 is controlled by the second control unit 72, so that the irradiation region of the light from the mercury lamp 51 reaches the boundary between the first non-drawing region 921 and the second non-drawing region 922. Each time, the region of the irradiation region where light irradiation is blocked is changed, and the irradiation region 95 and the irradiation region 95a are switched. Thus, on the photosensitive material, the drawing area 91 is not irradiated with light (that is, without affecting the drawing area 91), and only the non-drawing area 92 whose shape changes depending on the position in the main scanning direction can be easily obtained. Light can be irradiated. For this reason, it can be said that the pattern drawing apparatus 1 is particularly suitable for drawing a pattern on a multi-sided substrate in which the entire substrate is necessarily enlarged and the shape of the non-drawing region is complicated.

  In recent years, since the size of liquid crystal display devices has been increased, the pattern drawing device 1 that can easily draw a pattern without using a large mask is particularly suitable for drawing a pattern on a glass substrate for a liquid crystal display device. Is suitable. Further, since light can be easily irradiated only to the non-drawing region 92, it is particularly suitable for drawing a projection pattern for liquid crystal alignment control formed of a positive photosensitive material.

  In the pattern drawing apparatus 1, when the pixel pattern is drawn on the negative photosensitive material on the substrate 9, the first light irradiation unit 4 used for drawing the projection pattern is used to form the pixel pattern in the drawing area 91. Only the corresponding part is irradiated with light. Thereby, it is possible to perform pattern drawing on the negative and positive photosensitive materials while simplifying the structure of the pattern writing apparatus 1.

  In general, in a color filter substrate for a liquid crystal display device, a pixel pattern, a black matrix, a photo spacer, or the like is made of a negative type photosensitive material before the formation of a projection pattern for controlling liquid crystal alignment using a positive type photosensitive material. It is formed. As described above, the pattern drawing apparatus 1 enables drawing on negative and positive photosensitive materials with a simple structure, and is thus particularly suitable for drawing pixel patterns and the like on a color filter substrate for a liquid crystal display device. ing.

  Next, a pattern drawing apparatus according to a second embodiment of the present invention will be described. The pattern drawing apparatus according to the second embodiment is replaced with the aperture unit 52 of the second light irradiation unit 5 of the pattern drawing apparatus 1 shown in FIG. A includes an aperture unit 52a shown in a plan view. Other configurations are the same as those of the pattern drawing apparatus 1 shown in FIG. 1, and the same reference numerals are given in the following description.

  Also in the pattern writing apparatus according to the second embodiment, as in the first embodiment, a positive photosensitive material provided on a substrate 9 (see FIG. 1) serving as a color filter substrate for a liquid crystal display device. On the other hand, the projection pattern for controlling the liquid crystal alignment is drawn, and the second light irradiation unit 5 irradiates only the non-drawing region 92 (see FIG. 3) on the photosensitive material. Irradiation of light to the non-drawing region 92 by the second light irradiation unit 5 of the pattern writing apparatus according to the second embodiment includes an irradiation region 95 and an irradiation region 95a (see FIGS. 11A and 11B). The method is the same as that of the first embodiment except that the method of switching is different.

  FIG. As shown in FIG. 10A, the aperture unit 52a is shown in FIG. Instead of the fourth aperture plate 521 and the light-shielding plate 524 of the aperture unit 52 shown in A, a multi-channel that transmits and blocks light by causing an alignment change of the liquid crystal molecules by applying or removing an electric field to the liquid crystal molecules. A liquid crystal shutter 521a is provided. The aperture unit 52a is also shown in FIG. Similarly to the aperture unit 52 shown in A, the pair of holding portions 522 for holding the liquid crystal shutter 521a from the (+ X) side and the (−X) side, and the positions of the liquid crystal shutter 521a in the main scanning direction and the sub scanning direction are adjusted. A position adjusting mechanism 523 is provided.

  The liquid crystal shutter 521a has a thin rectangular light-transmitting portion 5212 extending in the sub-scanning direction, and light from the mercury lamp 51 (see FIG. 1) is transmitted through the light-transmitting portion 5212 and the optical system 53 (see FIG. 1). ) To the photosensitive material on the substrate 9 and irradiated to one irradiation region 95 (see FIG. 11A) on the first non-drawing region 921. FIG. In A, in order to facilitate understanding of the drawing, a region excluding the light transmitting portion 5212 (that is, the light shielding portion) of the liquid crystal shutter 521a is shown with parallel oblique lines (the same applies to FIG. 14B).

  In the second light irradiation unit 5, the liquid crystal shutter 521 a is controlled by the second control unit 72 (see FIG. 4) of the control unit 7, thereby changing the alignment direction of the liquid crystal molecules in the light transmission unit 5212. Light is blocked in part of 5212 or in the entire light transmitting part 5212. In the pattern drawing apparatus according to the second embodiment, when the second non-drawing region 922 (see FIG. 3) is irradiated with light, the liquid crystal shutter 521a is controlled by the second control unit 72. FIG. As shown in B, the translucent part 5212 is partially shielded. As a result, a region where light irradiation is blocked in the light irradiation region from the mercury lamp 51 is changed, and light is irradiated only to the irradiation region 95a (see FIG. 11B) on the second non-drawing region 922. Further, when the irradiation of light to the photosensitive material is stopped, the entire light transmitting portion 5212 is shielded.

  In the pattern drawing apparatus, similarly to the first embodiment, a projection pattern can be easily drawn in the drawing area 91 without using a large mask. Further, it is possible to easily irradiate only the non-drawing region 92 without affecting the drawing region 91.

  In the pattern writing apparatus according to the second embodiment, in particular, the length of each irradiation region 95a in the sub-scanning direction is easily changed by controlling the liquid crystal shutter 521a to change the light shielding portion in the light transmitting portion 5212. can do. As a result, a plurality of types of substrates having different lengths in the sub-scanning direction of the second non-drawing region 922 of the non-drawing region 92 (for example, different sizes of the drawing region 91 or the number of drawing regions 91 on one substrate) Can be easily irradiated with light only to the non-drawing region 92.

  Next, a pattern drawing system according to a third embodiment of the present invention will be described. FIG. 15 is a diagram illustrating a configuration of a pattern drawing system 100 according to the third embodiment. The pattern drawing system 100 includes a first light irradiation device 101 that irradiates light only on a drawing region 91 (see FIG. 3) on the photosensitive material on the substrate 9, and only a non-drawing region 92 (see FIG. 3) on the photosensitive material. A second light irradiation device 102 that irradiates light and a transfer arm 103 that is a transfer mechanism that transfers the substrate 9 between the first light irradiation device 101 and the second light irradiation device 102 are provided.

  The first light irradiation device 101 has a configuration in which the second light irradiation unit 5 and the second control unit 72 are omitted from the pattern drawing device 1 illustrated in FIG. 1, and the second light irradiation device 102 is different from the pattern drawing device 1. The first light irradiation unit 4 and the first control unit 71 are omitted. In the pattern drawing system 100, the first light irradiation device 101 performs the same processing as the light irradiation by the first light irradiation unit 4 of the pattern drawing device 1 on the substrate 9, and the second light irradiation device 102 The same process as the light irradiation by the second light irradiation unit 5 of the pattern drawing apparatus 1 is performed on the substrate 9. The stages 3 of the first light irradiation apparatus 101 and the second light irradiation apparatus 102 are respectively a first substrate holding unit and a second substrate holding unit of the pattern drawing system 100.

  In the first light irradiation apparatus 101, light is irradiated to the substrate 9 provided with the negative photosensitive material through the first aperture plate 461 and the second aperture plate 467 (see FIGS. 5 and 6). Thus, the pixel pattern of the color filter substrate for the liquid crystal display device is drawn.

  In the first light irradiation device 101, the substrate 9 provided with the positive photosensitive material is irradiated with light via the third aperture plate 461a (see FIG. 8), thereby liquid crystal in the drawing region 91. Light is irradiated to portions other than the portion corresponding to the protrusion pattern for controlling the orientation. The substrate 9 is unloaded from the first light irradiation device 101 by the carrying arm 103 and carried into the second light irradiation device 102. In the second light irradiation device 102, after the alignment of the substrate 9, the light is irradiated through the fourth aperture plate 521 (see FIG. 10A), and the light is irradiated by the light shielding plate 524 (see FIG. 10B). By changing the region of the region where light irradiation is blocked, only the non-drawing region 92 is irradiated with light. In the pattern drawing system 100, another transport mechanism may be provided instead of the transport arm 103.

  In the pattern drawing system 100, as in the first embodiment, it is possible to easily draw a projection pattern in the drawing area 91 without using a large mask. Further, it is possible to easily irradiate only the non-drawing region 92 without affecting the drawing region 91.

  In the second light irradiation device 102 of the pattern drawing system 100, a multi-channel liquid crystal shutter 521a may be provided instead of the fourth aperture plate 521 and the light shielding plate 524, as in the second embodiment. Thereby, the length of the irradiation region in the sub-scanning direction can be easily changed, and light irradiation to the non-drawing region 92 can be made easier.

  As mentioned above, although embodiment of this invention has been described, this invention is not limited to the said embodiment, A various change is possible.

  For example, in the pattern drawing apparatus according to the above-described embodiment, the first light irradiation unit 4 and the second light irradiation unit 5 move from the first light irradiation unit 4 with respect to the stage 3 in a stopped state. The light irradiation region and the light irradiation region from the second light irradiation unit 5 may be moved relative to the photosensitive material on the substrate 9.

  In the pattern drawing apparatus, the light irradiation by the second light irradiation unit 5 on the non-drawing region 92 on the positive photosensitive material is not necessarily the light irradiation by the first light irradiation unit 4 on the drawing region 91 on the photosensitive material. It does not need to be done after completion. For example, the non-drawing area 92 may be irradiated with light in parallel with the main scanning of the irradiation area 94 performed on the drawing area 91, or the drawing area 91 may be irradiated with light. Irradiation of light to the non-drawing region 92 may be performed prior to being performed. Further, the light irradiation to the non-drawing area 92 may be performed by repeating the instantaneous light irradiation during the movement of the substrate 9 in the same manner as the light irradiation by the first light irradiation unit 4 to the drawing area 91. Good.

  In the first light irradiation unit 4 of the pattern drawing apparatus, for example, a liquid crystal shutter may be used instead of the first aperture plate 461 and the second aperture plate 467 of the aperture unit 46. In this case, the first control unit 71 of the control unit 7 controls the liquid crystal shutter of the aperture unit 46 that is the first mask unit, and the liquid crystal shutter every time the irradiation region 94 coincides with each divided region 912 of the drawing region 91. Is opened and closed at a high speed, and the irradiation region 94 is irradiated with light. Further, the laser oscillator 43 and the laser driving unit 44 that are light sources may be controlled by the first control unit 71 together with the liquid crystal shutter, so that the irradiation region 94 may be irradiated with instantaneous light.

  In the pattern drawing apparatus, when the patterns drawn on the negative and positive photosensitive materials are similar, the aperture of the first light irradiation unit 4 is not changed, and the light source and stage drive by the first control unit 71 are performed. Patterns may be drawn on both photosensitive materials by changing the control over the mechanism 2.

  In the pattern drawing apparatus according to the above embodiment and the first light irradiation apparatus 101 of the pattern drawing system 100 according to the third embodiment, the first light irradiation unit 4 (and the second light irradiation unit 5) Another light irradiation unit that irradiates light to the substrate 9 independently may be provided, and a pattern may be drawn on the negative photosensitive material by the light irradiation unit instead of the first light irradiation unit 4.

  The substrate on which the pattern is drawn by the pattern drawing apparatus and the pattern drawing system 100 is not necessarily limited to the substrate in which the four drawing regions 91 are set on the photosensitive material, and only one drawing region is set on the photosensitive material. It may be a substrate. In addition, a plurality of drawing areas (that is, one drawing area and one or more drawing areas having the same shape as the drawing area) arranged on the photosensitive material so as to be separated from each other in the main scanning direction and / or the sub-scanning direction are included. Drawing may be performed on a substrate on which a plurality of drawing areas) are set.

  In the pattern drawing apparatus according to the above embodiment, the first light irradiation unit 4 draws a pattern other than the pixel pattern (for example, a pattern corresponding to a black matrix or a photo spacer) on the color filter substrate for the liquid crystal display device. May be. Further, the first light irradiation unit 4 and the second light irradiation unit 5 draw a projection pattern for liquid crystal alignment control and a resist pattern for etching TFT wiring on a TFT (Thin Film Transistor) substrate for a liquid crystal display device. (The same applies to the pattern drawing system 100).

  The pattern drawing device and the pattern drawing system 100 may be used for drawing a pattern on a substrate for a flat display device such as a plasma display device or an organic EL display device. Moreover, the pattern drawing apparatus and the pattern drawing system 100 can be used for drawing a pattern on a semiconductor substrate, a printed wiring board, a glass substrate for a photomask, or the like in addition to a glass substrate for a flat display device.

It is a side view of the pattern drawing apparatus which concerns on 1st Embodiment. It is a top view of a pattern drawing apparatus. It is a top view which shows a board | substrate. It is a block diagram which shows the function implement | achieved by the control part with another structure. It is a top view which shows a part of aperture unit. It is a top view which shows the other part of an aperture unit. It is a top view which shows the irradiation area | region on a board | substrate. It is a top view which shows a part of aperture unit. It is a top view which shows a part of drawing area. It is a top view of an aperture unit. It is a top view of an aperture unit. It is a top view which shows the irradiation area | region on a board | substrate. It is a top view which shows the irradiation area | region on a board | substrate. It is a figure which shows the flow of drawing of a pixel pattern. It is a figure which shows the flow of drawing of a protrusion pattern. It is a figure which shows the flow of drawing of a protrusion pattern. It is a top view of an aperture unit. It is a top view of an aperture unit. It is a figure which shows the structure of a pattern drawing system.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Pattern drawing apparatus 3 Stage 4 1st light irradiation part 5 2nd light irradiation part 9 Substrate 25 Main scanning mechanism 43 Laser oscillator 44 Laser drive part 46 Aperture unit 51 Mercury lamp 52 Aperture unit 71 1st control part 72 2nd control part 91 Drawing area 92 Non-drawing area 94 Irradiation area 95 Irradiation area 100 Pattern drawing system 101 First light irradiation apparatus 102 Second light irradiation apparatus 103 Transport arm 521a Liquid crystal shutter 912 Divided areas S11-S17, S21-S27, S31-S36, S171 , S271 Step

Claims (11)

A pattern drawing apparatus for drawing a pattern on a photosensitive material on a substrate using light,
A substrate holding unit for holding a substrate in which a positive photosensitive material that becomes a periodic pattern by being partially removed in a later step is formed in a layer;
A first light irradiation unit configured to irradiate light other than a portion corresponding to the pattern in a drawing region set as a rectangle having sides facing the first direction and the second direction perpendicular to each other on the photosensitive material; ,
A second light irradiation unit for irradiating light to a non-drawing area around the drawing area on the photosensitive material;
With
The first light irradiation unit is
A first light source;
Corresponding to the pattern among the first irradiation areas having the same length in the first direction as one of the plurality of divided areas obtained by equally dividing the drawing area in the first direction according to the periodicity of the pattern. A first mask portion for guiding light from the first light source to a region other than the portion;
A first movement mechanism that moves the first irradiation region relative to the drawing region in the first direction;
By controlling the first light source and / or the first mask portion, the first irradiation area coincides with each of the plurality of divided areas with respect to the first direction while moving the first irradiation area. A first control unit for irradiating the first irradiation region with light through the first mask unit;
With
The second light irradiation unit is
A second light source;
A second mask portion that extends in the second direction on the photosensitive material and guides light from the second light source to a second irradiation region that crosses the drawing region and the non-drawing region;
A second movement mechanism for moving the second irradiation region relative to the photosensitive material in the first direction;
When the second irradiation region passes through the drawing region and the non-drawing region, the second mask unit is controlled to change a region of the second irradiation region where light irradiation is blocked, A second control unit that irradiates light only to the non-drawing region;
A pattern drawing apparatus comprising: The pattern drawing apparatus according to claim 1,
The pattern drawing apparatus, wherein the second mask unit includes a liquid crystal shutter. The pattern drawing apparatus according to claim 1, wherein:
In the substrate holding portion, instead of the substrate on which the positive photosensitive material is formed, a negative photosensitive material that becomes a periodic pattern by being partially removed in a later process is formed in layers. The board can be held,
The first light irradiation unit has sides facing the first direction and the second direction on the photosensitive material by changing control by the first mask unit and / or the first control unit. A pattern drawing apparatus that irradiates light only to a portion corresponding to the pattern in a drawing area set as a rectangle. The pattern drawing apparatus according to claim 1, wherein:
On the photosensitive material, a plurality of drawing regions including the drawing region and a drawing region having the same shape as the drawing region are arranged apart from each other in the first direction and / or the second direction,
The substrate is a substrate that is to be multi-faced according to the plurality of drawing regions;
The first light irradiation unit irradiates light other than a portion corresponding to the pattern in the plurality of drawing regions, and the second light irradiation unit performs non-drawing other than the plurality of drawing regions on the photosensitive material. Irradiate the area with light,
The first control unit controls the first light source and / or the first mask unit so that the first irradiation region moves while moving the first irradiation region with respect to each of the plurality of drawing regions. Irradiating light to the first irradiation area through the first mask portion every time the plurality of divided areas coincide with each other with respect to the first direction,
When the second irradiation region extends in the second direction and crosses the photosensitive material, and the second irradiation region passes through the photosensitive material, the second control unit controls the second mask unit. A pattern writing apparatus, wherein only the non-drawing region is irradiated with light. The pattern drawing apparatus according to claim 4,
In the substrate holding portion, instead of the substrate on which the positive photosensitive material is formed, a negative photosensitive material that becomes a periodic pattern by being partially removed in a later process is formed in layers. The board can be held,
The first light irradiation unit changes the control by the mask unit and / or the first control unit, so that the pattern among the plurality of drawing regions set in the same manner as the positive type photosensitive material. A pattern drawing apparatus that irradiates light only to a portion corresponding to the above. The pattern drawing apparatus according to claim 3 or 5,
The substrate is a color filter substrate for a liquid crystal display device,
The pattern drawing apparatus, wherein the pattern formed on the color filter substrate by the negative photosensitive material is a pixel pattern. The pattern drawing apparatus according to any one of claims 1 to 6,
The substrate is a glass substrate for a liquid crystal display device;
The pattern drawing apparatus, wherein the pattern formed on the glass substrate by the positive photosensitive material is a projection pattern for controlling liquid crystal alignment. A pattern drawing system for drawing a pattern on a photosensitive material on a substrate using light,
First and second directions perpendicular to each other on the photosensitive material in a substrate on which a positive type photosensitive material having a periodic pattern is formed in a layer form by being partially removed in a later step A first light irradiation device that emits light to a portion other than a portion corresponding to the pattern in a drawing region set as a rectangle having a side facing
A second light irradiation device for irradiating light to a non-drawing area around the drawing area on the photosensitive material;
A transport mechanism for transporting a substrate between the first light irradiation device and the second light irradiation device;
With
The first light irradiation device is
A first substrate holding unit for holding a substrate;
A first light source;
Corresponding to the pattern among the first irradiation areas having the same length in the first direction as one of the plurality of divided areas obtained by equally dividing the drawing area in the first direction according to the periodicity of the pattern. A first mask portion for guiding light from the first light source to a region other than the portion;
A first movement mechanism that moves the first irradiation region relative to the drawing region in the first direction;
By controlling the first light source and / or the first mask portion, the first irradiation area coincides with each of the plurality of divided areas in the first direction while moving the first irradiation area. A first control unit for irradiating the first irradiation region with light through the first mask unit;
With
The second light irradiation device is
A second substrate holding unit for holding the substrate;
A second light source;
A second mask portion that extends in the second direction on the photosensitive material and guides light from the second light source to a second irradiation region that crosses the drawing region and the non-drawing region;
A second movement mechanism for moving the second irradiation region relative to the photosensitive material in the first direction;
When the second irradiation region passes through the drawing region and the non-drawing region, by controlling the second mask unit and changing a region of the second irradiation region where light irradiation is blocked, A second control unit that irradiates light only to the non-drawing region;
A pattern drawing system comprising: The pattern drawing system according to claim 8,
The pattern drawing system, wherein the second mask unit includes a liquid crystal shutter. The pattern drawing system according to claim 8 or 9, wherein
In the first substrate holding part of the first light irradiation device, a negative pattern that becomes a periodic pattern by being partially removed in a subsequent process instead of the substrate on which the positive photosensitive material is formed. The substrate on which the photosensitive material of the mold is formed in layers can be held,
The first light irradiation device changes the control by the first mask unit or the first control unit to form a rectangle having sides facing the first direction and the second direction on the photosensitive material. A pattern drawing system that irradiates only a portion corresponding to the pattern in a set drawing region. A pattern drawing method for drawing a pattern on a photosensitive material on a substrate by using light, wherein the positive photosensitive material becomes a periodic pattern by being partially removed in a subsequent process on the substrate Are formed in layers, and the drawing area is set as a rectangle having sides facing the first direction and the second direction perpendicular to each other on the photosensitive material, and a non-printing area is formed around the drawing area on the photosensitive material. The drawing area is set,
The pattern drawing method comprises:
a) In the first irradiation area having the same length in the first direction as one of a plurality of divided areas obtained by equally dividing the drawing area in the first direction according to the periodicity of the pattern, Guiding light to an area other than the corresponding part and moving the first irradiation area relative to the drawing area in the first direction;
b) irradiating the first irradiation region with light each time the first irradiation region coincides with each of the plurality of divided regions with respect to the first direction in the step a);
c) On the photosensitive material, the light is guided to the second irradiation region extending in the second direction and crossing the drawing region and the non-drawing region, and the second irradiation region is moved to the first direction. Moving relative to the photosensitive material;
d) When the second irradiation region passes through the drawing region and the non-drawing region in the step c), the non-drawing is performed by changing a region of the second irradiation region where light irradiation is blocked. Irradiating only the area with light;
A pattern drawing method comprising:

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