TW200819922A - Pattern writing apparatus, pattern writing system and pattern writing method - Google Patents

Abstract

In a Pattern Writing Apparatus 1, a pixel pattern of a liquid crystal display is written on a writing region by moving an irradiation region irradiated with light emitted from a first irradiation part 4 relatively to a substrate 9 on which a negative-type light-sensitive material is formed. On the other hand, a light from a first irradiation part 4 is irradiated onto the writing region except for a projection pattern for liquid crystal alignment control by exchanging apertures of the first irradiation part 4 and momentarily irradiating a light every time an irradiation region coincides with a divided area which is one of what divided the writing region equally with respect to a main scan direction while moving the irradiation region relatively to the substrate 9 on which a positive-type light-sensitive material is formed. A second irradiation part 5 irradiates only onto a non-writing region with light by changing an area where a light irradiation is blocked in an irradiation region while moving the irradiation region crossing over the writing region and the non-writing region relatively to the substrate. This makes it possible to easily irradiate a light onto the non-writing region.

Description

200819922 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a technique for utilizing a photosensitive material on a substrate. [Prior Art] It is known to irradiate light to a photosensitive material formed on a semiconductor substrate or a printed circuit board, or a plasma display device, a glass substrate for a liquid crystal display device (hereinafter referred to as "= plate"), To paint the pattern. For example, in Japanese Laid-Open Patent Publication No. 2002-98824, it is disclosed that: the technique is performed by irradiating light to a negative photosensitive resin layer through a photomask, and the non-exposed portion is recorded in the developing step, thereby forming A photosensitive spacer (photospacer) placed on the liquid crystal display. Further, in Japanese Laid-Open Patent Publication No. 2005-173037, the alignment control of the liquid crystal display device is: = formed by a photoresist. However, in the case of the transfer of light (4) in the manner described in the Japanese Patent Laid-Open Publication No., the material of the object to be painted is increased, and the county cover is also increased because: the cost will increase. The clothing is straightforward. Because it does not use the trace of a large reticle of the same size as the substrate, a relatively small reticle with several openings is formed = the upper sense _ the upper illuminating pulse light, and the substrate pulse light is moved. Thus, in the photosensitive material, Α, and Α Α 让 145 -145745, m 1 . In Japan, the special patent is used to capture the color of the device. 312XP/m^mmmm/96^l2/96131424 6 200819922 The black matrix pattern on the filter substrate. In recent years, when manufacturing a color filter for liquid crystals, etc., the right kf uses one glass substrate to make a disk #夕 (4), a plurality of color filter substrates (the domain is set to On the surface of the conference area, the area around the conference area is the unpainted green area. The area where the material is irradiated with light.) 曰太蜜~ "In the Japanese Patent Special Open 2006-145745 riding the eight-reporting device, avoiding the non-# ϋ ϋ Α t 闭 彳 彳 彳 绘 绘 绘 而In the drawing device of the Japanese Patent Laid-Open Publication No. 2006-145745, the positive photosensitive material is drawn in addition to the negative photosensitive material, and in this case, the transmission has a corresponding pattern to be described. The light-shielding mask irradiates light to a region other than the portion corresponding to the pattern of the drawing region. Here, in the case of patterning the alignment photosensitive material, it is necessary to irradiate the non-drawing region of the entire undrawn pattern, however, In the drawing device, • due to Since the light-sensitive material is also irradiated with light, the light-irradiated region is limited only in the drawing region, and it is difficult to display the non-drawing region located outside the drawing region. [Invention] The object of the present invention is to provide a light-using device. A pattern drawing device for drawing a pattern on a photosensitive material on a substrate to easily irradiate light on a non-drawing area on the substrate. The η pattern drawing device includes: the substrate holding portion 'maintained by being partially removed in a subsequent step The positive photosensitive material that becomes the periodic pattern is formed as a substrate of 312 ΧΡ / invention specification (supplement) / 96-12/96131424 7 200819922 =, the first light illuminating portion has a direction perpendicular to the first direction and the first = ° 疋 疋 • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形昭区昭射井· 1 ψ 'L Tian Qiao area around the non-曰 LL, shooting first, which 'the above... source; the first reticle part, according to the above ij brother 1 first 1. ^ ^ ^ 4 round Cyclical, will come from The light of the first light source is in the following area, t , , ^ v, and one of the plurality of divided regions in which the four fields are formed in the first direction and the first irradiation region having the same length. In the region of the temple, the first moving mechanism relatively moves the first "second=! field toward the first or the first mask portion with respect to the yf4 direction, and moves the above

The first /, ?, and the shooting range, and each time the seventeenth [Chu 1 Η 77 ό丄 L L L 母 上述 上述 上述 上述 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射For j,! The second light-irradiating portion has a light source, and the second light-shielding portion guides the light from the second light source to the second light-emitting region, that is, the light-receiving material extends in the second direction. The second moving mechanism 'the second moving mechanism' that moves the green region and the non-finished region relative to the photosensitive material in the i-th direction relatively moves the second irradiation region; and the second control portion is in the second When the area passes through the drawing area and the non-drawing area, the upper 2nd mask portion is controlled to change the area in which the light is irradiated in the second irradiation area, thereby illuminating only the non-drawing area. According to the present invention, it is possible to easily irradiate light to a non-drawing area on a substrate. 312XP/Invention Manual (Supplement)/96-12/96131424 8 200819922 In the preferred embodiment, since the second mask portion is provided with a liquid crystal shutter, the length in the second direction can be easily changed. According to another preferred embodiment of the present invention, the substrate holding portion is used instead of the substrate on which the positive photosensitive material is formed, and the error-preserving is removed by the middle portion of the subsequent step to become a negative cycle item. Type photosensitive: the material is formed into a layered substrate, and the ith light irradiation unit is changed

Controlling the first mask portion and/or the first control unit, the light is only known to be emitted, and the lower region, that is, the photosensitive material is set to have the first direction and the second direction. The portion of the rectangular drawing area i corresponding to the pattern described above. Therefore, the configuration of the pattern drawing device can be simplified, and the pattern can be drawn for the negative and positive photosensitive materials. More preferably, the substrate is a color filter substrate for a liquid crystal display device, and is formed on the color filter substrate by using the negative photosensitive material.

In the first aspect of the present invention, the pattern is a pixel pattern. Further preferably, the substrate is a glass substrate for a liquid crystal display device, and the positive photosensitive material is used. The pattern formed on the glass substrate is a protrusion pattern for liquid crystal alignment control. In the H-step embodiment of the present invention, the above-mentioned drawing region and the same shape as the drawing region are included in the photosensitive material. a plurality of drawing regions of the region are arranged to be spaced apart from each other in the second direction and/or the second direction. The substrate is a predetermined substrate that is chamfered according to the plurality of edge regions, and the first light is irradiated. The portion irradiates light to a portion other than the portion corresponding to the pattern in the plurality of stroke regions, and the non-drawing region other than the above-mentioned 312XP/invention specification (supplement)/96-12/96131424 9 200819922 The financial area is controlled by a light source and/or the above, and the control unit moves the above-mentioned first picture by controlling the above-mentioned first drawing area==two numbers: the first number is described When the cover portion is aligned in the direction of the upper one, the second irradiation region emits light in the upper (four) two-side/^, the radiation region f, and the second irradiation region passes through the upper polishing material second control portion to the second portion. #先材(四), finely controlled by the above-mentioned non-snaking area first cover portion, and the light is irradiated only to the above-mentioned embodiment of the present invention in the use of light, the pattern of the pattern (four) system, by the subsequent steps == : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : In the rectangular & output region of the direction, the light is irradiated outside the portion corresponding to the above-mentioned image; the second light is placed on the lens, and the non-% region around the drawing region on the photosensitive material is irradiated with light; a mechanism for transporting a substrate between the first light irradiation device and the second light irradiation device; wherein the first light irradiation device includes: a first substrate holding portion for holding the substrate; a second light source; the first light The cover part, according to the periodicity of the above pattern, will come from The light of the first light source is directed to a region in which one of the plurality of divided regions in which the drawing region is equally divided in the first direction is equal to the first region and the first region + degrees 312XP/invention specification (supplement)/96-12/96131424 ι〇200819922 area other than the corresponding part of the pattern; the first moving mechanism 'relative to upper:=! moving the above first irradiation area; and the i-th control 二 2: The first source and/or the first mask portion move the first irradiation region ′, and each time the first irradiation region and the plurality of divided regions are aligned with respect to the second direction, Γ ! = = = 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域 区域That is, the photosensitive material extends in the second direction and forms a region between the region and the non-marking region, and the second moving mechanism relatively moves the second incident region toward the first direction. ;, and the second control department, above When the irradiation region passes through the upper (10) read region and the non-slip region, by controlling the second mask portion, the region of the second irradiation region that blocks the light irradiation is changed, and the light is irradiated only to the non-trace region. . It is also an object of the present invention to provide a method of patterning a pattern using a pattern of light on a substrate. The above and other objects, features, aspects and advantages of the invention will be apparent from the accompanying drawings. [Embodiment] Figs. 1 and 2 are a side view and a plan view showing a configuration of a pattern drawing device 1 according to a first embodiment of the present invention. The pattern drawing device is a device that draws a pattern on a photosensitive material on a glass substrate 9 (hereinafter simply referred to as "substrate 9") for a liquid crystal display device. 312ΧΡ/Invention Manual (Supplement)/96-12/96131424 200819922 FIG. 3 is a plan view showing the substrate 9. On the main surface of the substrate 9, the photosensitive material which is a periodic pattern is formed into a layer shape by being partially removed in a subsequent step, and the photosensitive material is set to have a direction perpendicular to each other in the X direction in FIG. The four trace areas 91 of the rectangle in the γ direction (indicated by parallel oblique lines in Fig. 3). The four drawing areas 9i have the same shape, and are arranged on the photosensitive material in the X direction and the γ direction. On the photosensitive material on the substrate 9, a lattice-like region around the drawing region 91 (i.e., a region other than the plurality of drawing regions 91) is formed as a non-drawing region 92 in which a periodic pattern is not drawn (formed). In the following description, a portion set in the non-green area 92 of the photosensitive material and covering the entire length of the substrate 9 is referred to as a "first! non-slip area 921", and the other portions ( That is, the portion adjacent to the green area 91 in the χ direction is the "second non-described (four) field 922". In Fig. 3, the non-stripe-domain 921 and the 帛2 non-described area 922 are respectively The two-point key line indicates 曰. The substrate 9 is pre-chamfered according to the four trace areas 91: - 'The four substrates obtained from one substrate 9 are formed into _ (_ti via the subsequent step) -d_in AHgnment = ^ Vertical alignment type liquid crystal display device assembly part, that is, a color light film based on the pattern trace device!, by being formed on the substrate 9 (ie, the type of exposed portion remaining on the substrate during development) The photosensitive material, that is, the illuminating light on the resister, can describe the case formed on the color filter substrate (ie, the 'sub-pixel set). Also, in the pattern striating device, the dream is formed on the substrate 9. Positive type (ie, only non-exposed part during development; 312XP / invention manual (supplement) / 96-12/961314 24 u 200819922 The type of light remaining on the substrate) is irradiated with light, and the protrusion pattern for liquid crystal alignment control formed on the color filter substrate (ie, the collection of protrusions) may be drawn. When drawing a negative-type photosensitive material, the drawing area 91 is similarly set on the photosensitive material. The so-called protrusion for liquid crystal alignment control is used. In a liquid crystal display device, it is formed on a transparent electrode of a color filter substrate or a TFT (Thin Film Transistor) substrate, and exhibits a structure for distorting an electric field when a voltage is applied. By using the protrusions, the electric field is distorted, whereby the liquid crystal molecules which are vertically aligned when no voltage is applied are obliquely aligned when a voltage is applied. Thereby, a liquid crystal display device having a wide viewing angle can be realized. FIG. 1 and FIG. As shown, the pattern drawing device 丨 includes a platform 3 serving as a substrate holding portion for holding the substrate 9 , and a platform driving mechanism 2 disposed on the susceptor 11 to be flat 3 moving and rotating; the frame 12 and the frame 13 are fixed to the base u by means of the platform 3 and the platform driving mechanism 2; the first light irradiation part 4 is mounted on the frame 12, and the photosensitive material on the substrate 9 is The plurality of drawing regions 91 (see FIG. 3) are irradiated with light, and the second light irradiating portion 5 is attached to the frame 13, and the non-drawing region 92 (see FIG. 3) is irradiated with light on the photosensitive material on the substrate 9; The imaging unit 6 is configured to capture the substrate 9 on the platform 3. On the platform 3, a substrate on which a positive photosensitive material is formed on the main surface is held, and a substrate on which the photosensitive material is formed may be held instead of the substrate. Further, the pattern drawing device i includes a control unit that controls these configurations. Fig. 4 312XP/invention specification (supplement)/96-12/96B1424 200819922 is a block diagram showing the functions that are not realized by the control unit 7 together with other components - /if main 堍ra 7. The control unit 7蛊诵赉ΡΑΜ η η + ^ hanging the tortoise brain is similarly formed to form a CPU, RAM, ROM, fixed zen, coarse one, and the input and the input unit, as shown in Figure 4. 'There is a control brother 1 apricot red. 〇. ^ First to shoot 4 brother 1 control unit 71, and control brother 2 light irradiation unit 5 ^ ^ ^ brother 2 control unit 72. In the pattern drawing device 1, the flat hall drive mechanism 2, the first day of the day

The imaging unit 6 is transmitted from the control unit 7: the second brother 2 light irradiation unit 5 to the control unit 7. Private system. Moreover, the output from the imaging unit 6 is as shown in FIGS. 1 and 2. The platform drive mechanism 2 includes a support plate 2i, a rotatable two support platform 3, and a platform rotation mechanism 22, which is above the support plate and the main body of the flat hall 3. The vertical axis of the platform rotation axis 221 is centered to rotate the platform 3; the sub-scanning mechanism 23, together with the support plate 21, and in the direction of FIG. 2 (hereinafter referred to as "sub-scanning direction"), moves the platform 3; The support plate 21 is supported via the sub-scanning mechanism 23; and the main scanning mechanism 25, together with the support plate 21 and the bottom plate 24, moves the platform 3 in the γ direction (hereinafter referred to as "main scanning direction") in FIG. . The platform rotating mechanism 22 includes a linear motor 222 provided on the (_γ) side of the platform 3, and the linear motor 222 includes a moving member fixed to the side of the (_γ) side of the platform 3, and a fixed surface provided on the upper surface of the support plate 21. In the flat chamber twisting mechanism 22, the moving member of the linear motor 222 moves in the X direction along the groove of the fixing member, whereby the platform 3 is centered on the platform rotating shaft 221 on the support plate 21. Rotate within a specified range of angles. The sub-scanning mechanism 23 is provided with a linear motor 231 on the side of the support plate 21 312 ΧΡ / invention specification (supplement) / 96-12/96131424 14 200819922 side (ie, '(9) side), parallel to the main surface of the platform 3 and The main direction extends in the sub-scanning direction of the vertical direction; and "the (+Y) side and the (_γ) side of the motor 231 extend in the sub-scanning direction. If there is a moving member fixed to the lower surface of the support plate 21: a fixing member disposed on the upper surface of the manifold 24, the moving member moves along the fixing member in the sub-scanning direction, whereby the support plate 21 Moving along with the platform 3 - along the linear motor 231 and the guide rail 232 in the sub-scan. Straight, violent

The main scanning mechanism 25 is provided with a linear motor 251 extending on the lower side of the bottom plate in a direction parallel to the main surface of the stage 3, and a pair of rails 252' on the (8) side and the (9) side of the linear motor 251. Extending in the main scanning direction. The linear motor 251 has a moving element fixed to the lower surface of the bottom plate 24, and a fixing element disposed on the upper surface of the base n, wherein the element moves along the fixing element in the main scanning direction, so that the bottom is as shown in FIG. The "u-th illuminating unit 4" is provided with a plurality of optical heads 41 arranged in the sub-scanning direction by a phase: a pitch (200 mm in the present embodiment) and mounted in the ^12. Further, as shown in Fig. 1, the ith illumination unit 4 includes an illumination optical system "connected to each optical head 41", and a laser oscillator 43 and a laser drive unit 44 for the light source. The ith illumination = ° In the crucible 4, pulse light (hereinafter simply referred to as "light") is emitted from the laser oscillator April 2 by driving each of the laser driving units 44, and is guided to the optical heads 41 through the illumination optical system 42. The =4 and the support plate 21 and the platform 3 move linearly in the main scanning direction along the linear motor 251 and the guide 252 which are the moving axes. 2XP/Invention_月书(补件)/96·12/96131424 15 200819922 Each optical head 41 is provided with an emitting unit 45 that emits light from the laser oscillator 43 downward, and the aperture unit 46 partially blocks the emission. The light of the portion 45; and the optical system 47 introduces light passing through the aperture unit 46 onto the photosensitive material disposed on the substrate 9. In the pattern drawing device 1, when the pixel pattern of the color filter substrate is drawn and the projection pattern for liquid crystal alignment control is drawn, the aperture of the aperture unit 46 is changed in each optical head 41. Hereinafter, the configuration of the optical head 41 when the pixel pattern is drawn will be described first, and then the configuration of the optical head 41 when the projection pattern is drawn will be described. FIG. 5 is a plan view showing a portion of the aperture unit 46. As shown in Fig. 5, the aperture unit 46 includes a first aperture plate 461 having a plurality of rectangular transmissive portions, and a pair of holding portions 462 for holding the first aperture plate 461 from the (+χ) side and the (_χ) side; And a position adjustment mechanism 463,

The position of the main scanning direction and the sub-scanning direction. In the second aperture 2, three kinds of light transmitting portions 4611, 4612, and 4613 of different sizes are arranged at equal intervals in the sub-scanning direction (i.e., the X direction). In the present embodiment, the distance between the light transmitting portions 4611, the distance between the light transmitting portions 4612, and the distance between the two light transmitting portions 4613 are different from each other. In Fig. 5, for the sake of easy understanding, parallel oblique lines are added to the regions other than the light transmitting portions 4611 to 4613 of the first aperture plate 461 (i.e., the 'light shielding portions'). A position adjustment mechanism 463 is provided with: The mechanism is biased so that the first diameter plate 461 and the pair of holding portions 462 move together in the main scanning direction; a pair of guides 465, in the first! The lower side of the adjustment mechanism 464 extends in the sub-scanning direction; and the second adjustment mechanism makes the first! The aperture plate 461 and the holding 312XP/invention specification (supplement)/96-12/96131424 16 200819922 邛 462 and the first adjustment mechanism 464 move in the sub-scanning direction along the guide rail 465. In the present embodiment, the first adjustment mechanism 464 and the second adjustment mechanism 466 utilize a linear motor. The field diagram 6 shows a plan view of the portion shown in Fig. 5 of the aperture unit 46 which is optically heavy and/or σ. As shown in FIG. 6, the aperture unit 46 further includes a second aperture plate 467 having a plurality of rectangular light-transmissive portions, and a pair of holdings 4 468' from the (+γ) side and the (-γ) side to the second. Aperture plate 'π;

The third adjustment mechanism 469 moves the second aperture plate 467 together with the pair of holding portions in the sub-scanning direction. In the present embodiment, the third adjusting mechanism 469 uses a linear motor. The f 2 aperture plate 467, the holding portion 468, and the third adjustment mechanism 469 are disposed above the first aperture plate 46; 1, the holding portion 462 (see FIG. 3) and the position adjustment mechanism 463, and are fixed to the position adjustment mechanism Mg. 1 adjustment seems to be. silk! The position of the aperture plate and the second aperture tree configuration. In the second aperture plate tree, three kinds of light transmitting portions 4671, 4672, and 4673 having different sizes corresponding to the plurality of light transmitting portions 4611 to 4613 of the first hole plate 461 are respectively along the sub-scanning direction (ie, χ direction) and several are arranged at equal intervals. In Fig. 6 +, for the sake of easy understanding of the drawings, the position adjusting mechanism 463 and the light transmitting portion of the second aperture plate are deleted by a broken line. Further, in the second aperture plate, the areas other than the light transmitting portions 4671 to 4673 are indicated by parallel oblique lines. As shown in the figure, the second aperture plate is disposed in the irradiation region 451 (shown by the two-point key line) of the light emitted from the laser oscillator 43 through the emitting portion 45 (shown in FIG. 1). The light-transmitting portion 4673 of the 467 and the light-transmissive portion 4613 of the first aperture plate 461 partially overlapped by the portion 4673 and the light-transmitting portion 4613 of the first aperture plate 461 partially overlapped by the portion 4673, the light from the emitting portion 45 is only A region in which the light transmitting portion 4673 overlaps the light transmitting portion 4613 (hereinafter referred to as a "mask setting light transmitting portion") is transmitted through the optical system 47 (see FIG. 1), and is introduced into the substrate 9 as shown in FIG. A plurality of rectangular illumination areas 931 are provided. In the following description, a plurality of irradiation regions 9 31 are collectively referred to as "irradiation regions 9.3".

In the pattern drawing device 1, the width of the sub-scanning direction of the light introduced into the substrate 9 is changed by adjusting the relative position of the first aperture 467 with respect to the first aperture plate 461 in the sub-scanning direction (ie, The width of each of the plurality of irradiation areas is further shifted by the movement of the second aperture plate and the second aperture plate 467 in the main scanning direction, and the light transmission portion 46n is disposed in the illumination region 451 of the light from the emission portion 4671 or the light transmitting portion 4612, 2, to change the size or pitch of the irradiation region 931 of the substrate 9.

In the pattern riding apparatus i shown in FIG. 1, the first driving unit 7 of the control unit 7 shown in FIG. 4 controls the stage driving mechanism 2 and the i-th light emitting unit 4, so that the substrate 9 and the stage 3 are together with (9). Moving in the direction, and drawing a plurality of drawing areas 91 on the moving substrate 9 (refer to the figure _lighting. In other words, on the plurality of drawing areas 91 of the substrate 9, the side is opposite to the photosensitive material on the board 9 at (-γ) Too & soil pq • The direction of the illumination area is relatively moved by the illumination area 93. 1^ ^ Case. When the stripe-shaped map movement in which the main direction of the drawing is parallel is completed, the stop light 3 is also in the sub-scanning direction. When the platform 3 is irradiated toward one of the main scanning directions, the substrate 9 is separated from the platform 312 ΧΡ / invention manual (supplement) / 96-12/96131424 18 200819922 (in the present embodiment, 4 50 positions), Then, the substrate is moved in the opposite direction (ie, the '(Υ) direction) in the opposite direction (ie, the '(Υ) direction). The shame area 93 illuminates the light. In the present embodiment, the main scanning layer is scanned by the sub-scan. The method performs 4 main scans, thereby using a plurality of traces (four) domains on the photosensitive material 91, only the portion corresponding to the pixel pattern is irradiated with light and the pixel pattern is drawn, and in the subsequent step, development processing is performed, thereby removing the non-exposed portion of the photosensitive material from the substrate to form a color filter substrate. Next, a description will be given of the configuration of each of the optical masters 41 in the case of the projection of the liquid crystal alignment control. When the projection pattern is drawn, the optical irradiation portion of the optical illumination unit 41 is removed. As shown in FIG. 8, the aperture unit, the 孔径21 aperture plate 461, and the second aperture plate 467 are attached to the holding portion 462 to which the first aperture plate 461 is attached, and the third aperture plate 461a is attached. In this case, the holding portion 468 (see the mounting aperture). As shown in FIG. 8, the third aperture plate 461a has a plurality of circular light shielding portions 4614 corresponding to the partial projection patterns, and regions other than the light shielding portion 4614. In the third aperture plate 461a, the light shielding portions 4614 are arranged in two rows in the main scanning direction (ie, the Y direction), and in each row, the plurality of light shielding portions 4614 are scanned along the sub-scan. The directions (ie, the χ direction) are arranged at equal intervals. In Fig. 8, 'the figure is easy to understand, and the light shielding portion 4614 is indicated by parallel oblique lines. In addition, in FIG. 8, for convenience of illustration, the distance between the light shielding portions 4614 is increased and the number of depictions is less than The actual number 0 312 ΧΡ / invention manual (supplement) / 96-12/96131424 19 200819922 from the laser oscillator 43 through the injection portion 45 (the light emitted by the reference T is irradiated to the third aperture plate her aperture plate 461a The light partially blocking the three portions 45 of the light is self-exposed from the fringe region 91, and is guided to a region other than the portion corresponding to the pattern of the protrusions::, two fields Top view of the 91-part. In the drawing device 1 , a plurality of optical heads 41 of 邛 1M o ^ first a 邛 4 are used in the sub-scanning direction in the sub-scanning direction. The length of the sub-scanning direction is set to 5 〇. In Fig. 9, the non-exposed areas in the illumination area 94 are painted and not shown, and the rr portion 911 is represented by a thin line circle. Furthermore, in Fig. 9, the number of circular portions 911 for the convenience of Fig. =, 曰 is less than the actual number. As shown in Fig. 9, the main scanning side of the irradiation area 94 = the periodicity of the coffee pattern and the drawing area 91 =), the dividing area object 9 uses the two-point key: the last table "no" is the main part of the divided area The length of the scanning direction is equal. In the first day portion 4, 'the third aperture plate 461a (refer to j 8)' of the plurality of optical heads 41 is used, and the light guide from the emitting portion 45 is a region other than the portion corresponding to the projection pattern. In addition to the πχρ/invention specification (supplement)/96_12/96131424 20 200819922, in the pattern drawing device 1 shown in Fig. 1, the i-th control unit 71 of the control unit 7 controls the stage driving mechanism 2 and as the first light illuminating The laser vibrator 43 and the laser driving unit 44 of the light source of the portion 4, whereby the base Γ = the same as the base in the (+ γ) direction and the "shift" group: Specifically, the light is irradiated on the photosensitive material of the substrate 9 in a relatively continuous manner with respect to the green area 91 in the main scanning direction, and each time the irradiation area % is associated with the plurality of divided areas 912, respectively. When the main scanning directions are the same (that is, the (-Υ) side of each of the irradiation areas 941 When the edge overlaps with the (Tianyi γ) side edge of one of the divided regions 912, the third aperture plate 4 of the aperture unit 46 is used to instantaneously illuminate the illumination region 94. Thereby, in each of the drawing regions 91, The photosensitive material is exposed in areas other than the plurality of circular portions 911. Further, in the pattern drawing device 1, the movement of the substrate 9 may be stopped each time the irradiation region 94 and the branching region 912 coincide with respect to the main scanning direction. The substrate 9 is irradiated with light during the stop process. In the same manner as in the case of the money pixel pattern, the main scanning is performed four times by inserting the sub-scan between the main scanning lines, thereby performing the main scanning on the substrate 9. On the plurality of drawing areas 91 on the photosensitive material, only the portion other than the protrusion pattern is irradiated with light to draw the protrusion pattern', and by performing development processing in the subsequent step, the exposed portion of the photosensitive material is removed from the substrate. The liquid crystal alignment control is formed in a substantially columnar shape (for example, a truncated cone shape). Next, the second light irradiation unit 5 will be described. As shown in Fig. 2 and Fig. 2, the second light irradiation unit 5 is provided as a light source. High M mercury lamp (Hereinafter, it is simply referred to as "water 312XP/invention specification (supplement)/96-12/96131424 21 200819922 silver lamp") 51, and an aperture unit 52 partially blocking the light from the mercury lamp 51, and, as shown in Fig. 1, The optical system 53 is provided with a light guide that passes through the aperture unit 52 toward the photosensitive material disposed on the substrate 9. In the drawing device 1 of the drawing, when the projection pattern is drawn, the positive photosensitive material formed on the substrate is irradiated with light from the second light irradiation portion 5. FIG. 10A is a plan view showing the aperture unit 52. As shown in FIG. 1A, the aperture unit 52 has a fourth aperture plate 521 having a thin rectangular opening 5211 extending in the sub-scanning direction; a pair of holding portions 522 from the (+χ) side and (- The fourth aperture plate 521 is held by the side, and the position adjustment mechanism 523 adjusts the positions of the fourth aperture plate 521 in the main scanning direction and the sub-scanning direction; the light shielding plate 524 is disposed above the fourth aperture plate 521; and a pair of holding portions 525, the light shielding plate 524 is held from the (+Χ) side and the (-Χ) side, and the light shielding plate moving mechanism 526 moves the light shielding plate 524 together with the pair of holding portions 525 in the main scanning direction. The position adjustment mechanism 523 is different in size from the position adjustment mechanism 463 shown in FIG. 5, but has the same structure. The fourth adjustment mechanism 527 is provided to move the fourth aperture plate 521 together with the pair of holding portions 522 in the main scanning direction. The pair of guides 528' extend in the sub-scanning direction on the lower side of the fourth adjustment mechanism 527; and the fifth adjustment mechanism 529 causes the fourth aperture plate 521 to be along with the holding portion 522 and the fourth adjustment mechanism 527. The guide rail 528 moves in the sub-scanning direction. In the present embodiment, a linear motor is used as the fourth adjustment mechanism 527 and the fifth adjustment mechanism 529 and the light shielding plate moving mechanism 526. The visor moving mechanism 526 is fixed to the fourth adjusting mechanism 527 of the position adjusting mechanism 523. In FIG. 10A, for the sake of easy understanding of the drawings, 312 ΧΡ / invention specification (supplement) / 96-12/96131424 22 200819922 for the fourth aperture plate 521 except the opening 5211 (ie, the cover and the visor 524 are added in parallel) It is indicated by oblique lines. The visor 524 is provided with: a body portion ... which can hold the edges of both sides by holding the milk; and two protrusions 52 = two protrusions - a rectangular plate: == aperture unit 52, 'The visor 524 is moved by the visor moving mechanism 526 on the (-Υ) side, and as shown in Fig. 10, the embossing section of the 部 部 与 与 与 与 与 与 。 。 。 。 。 。 1 1 1 1 1 1 1 1 1 1 1 1 1 In a state where the opening 52U of the protruding portion 5242 of the light shielding plate 524 is not overlapped, the light emitted by the mercury lamp = FIG. 1) passes through the opening 52U, and as shown in FIG. 11A, is guided to the substrate 9 to extend in the sub-scanning direction. One of the rectangular areas of illumination: 95. The length of the sub-scanning direction of the irradiation region 95 is equal to the length of the substrate & the "direction" (that is, the length of the sub-scanning direction of the first non-drawing region 921), and the irradiation region 95 is cross-sectioned on the photosensitive material in the sub-scanning direction. The two drawing areas 91 and the non-drawing area 92. As shown in FIG. 10A, the light emitted from the mercury lamp 51 and the light emitted from the protruding portion 5242 of the light shielding plate 524 and the opening 5211 of the fourth aperture plate 521 are overlapped. Through the portion of the opening 5211 that is not overlapped with the protruding portion 5242, as shown in FIG. 11A, three rectangular irradiation regions 95a arranged in the sub-scanning direction on the substrate 9 are guided to the third irradiation region 95a. The length of the direction is equal to the length of the sub-scan 2 direction of the corresponding second non-drawing area 922. Field 312XP/Invention Manual (Supplement)/96-12/96131424 23 200819922 Part 2 of the second file description device In the first embodiment, the control unit 2 and the second light irradiation servo are controlled by the control unit 5 and the second light irradiation unit shown in Fig. 4, and the substrate 9 and the table (4) (8) are moved in the direction, and the base of the movement is 9 The non-striking region 92 illuminates the light. Specifically, when the earth board 9 is on the first! The non-drawing area 921 (that is, the portion where the sub-scanning direction of the non-drawing substrate 9 is set in the sub-scanning direction) passes; when it is below, 'the protrusion of the visor 524 is formed as shown in FIG. 10 (= 242) and the fourth hole is not pressed. The opening 5211 of the 521 is superimposed, and the irradiation/amplitude field 9 of the entire length of the sub-scanning direction of the cover substrate 9 is irradiated with light. In the second ': the second non-drawing area 922 on the second board 9 (that is, the non-drawing area = the part other than the non-drawing area 921) and the drawing area 2 below the light irradiation part 5, as shown in the figure As shown in Fig. 10B, the projections _ and the openings 5211 of the fourth aperture plate 521 are formed in the same manner as shown in Fig. 1B, and the light is irradiated to the second illumination region 95a. In other words, when the irradiation region 95 passes through: the 'region two 91 and the _ region 92, the second control unit 72 controls the two holes to only change the area of the irradiation region 95 to illuminate the light, and the light is hunted. Only the non-striking region 92 on the photosensitive material is known. In the case where the aperture unit 46 of the first light irradiation unit 4 is set to the first and second, the aperture unit 52 of the light irradiation unit 5 is set to be the second light, and the scanning mechanism 25 doubles as the first movement. In the mechanism and the second moving machine, the first moving mechanism is scanned toward the main scanning zone with respect to the stroke area 91. The irradiation area 312XP/invention specification (repair) of the i-th irradiation area of the first and second mask portions is relatively /96-12/96131424 24 200819922 94, the second moving mechanism relatively moves the first mask portion of the second mask portion to "the material is opposite to the main scanning direction, and the third light irradiation portion 4: 夂2 = σ The laser beam of the singer 41 is swayed and the illuminating drive unit 44 is the first light source that emits light toward the first (fourth) ray-43 and the field 2 illuminating unit 5, and the second light source. The second mask portion emits light, and the flow chart of the device (1) pattern is used to describe the pattern of the two-color pattern. When the pixel pattern is drawn, that is, 'several drawing regions 91 and grid-like non-drawing, "domain 92) The substrate 9 coated with the negative photosensitive material is placed on the platform 3, and is adsorbed and held on the main surface of the platform 3 (step 311) Γ :, , 'after ! 1 with tied system. (5 7 control four imaging cameras (a igmnent camera) 61 (see FIG. 2 and FIG. 2), and aligning marks (not shown) near the four corners of the image capturing unit 1 for shooting 1 and ' The control unit 7' rotates the stage 3 in the main scanning direction and the sub-scanning side in the main scanning direction and the sub-scanning side by the control unit 7'. The substrate 9 is rotated around the platform rotation axis 221. The edge start position (step S12). When the alignment of the substrate 9 is completed, the first light irradiation unit 4 is controlled by the first control 71 of the control unit 7, and the light is irradiated, and the aperture is partially blocked by the aperture unit 46. Light, thereby guiding the light to the illumination area 93 corresponding to the light-shielding setting light-transmitting portion on the substrate 9 ((4)), and controlling the platform driving mechanism 2 by the control unit 7 to start the platform 3 (+ Y) direction movement (step S14), the irradiation area 93 is relatively scanned with respect to the photosensitive material at (_〇方=312XP/invention specification (supplement)/96-12/96131424 25 200819922 t, thereby streaking The pattern is drawn on the photosensitive material on the substrate 9. Moreover, when the area (10) is irradiated. When the scanning reaches the predetermined movement end position (that is, the (_γ) side drawing area 91 * (-Υ) side edge), the movement of the stage 3 and the substrate 9 is stopped (step S15) and the irradiation of the light is stopped (step S16). Further, in the pattern drawing device 1, the second non-green area g 922 located between the (+γ) side drawing area 91 and the (_¥) side drawing area 通过 passes through the first light irradiation unit 4 When the first main scanning of the photosensitive material on the substrate 9 is completed, whether or not the substrate 9 is finally drawn is displayed (that is, whether there is a next or not). Main scanning) (Step: S17). When there is a next scan, the sub-scanning mechanism 23 is used to move the substrate 9 in the sub-scanning direction (step S171), and the process returns to step S13 to start the irradiation of the light toward the substrate 9, and to make the platform 3 moves in the (_γ) direction (steps gig, S14). Then, at the movement end position on the (-γ) side, the movement of the stage 3 and the irradiation of light are stopped (steps S15, S16). The movement of the platform 3 in the main scanning direction while irradiating the substrate 9 with light (ie, for The main scanning of the light-emitting region 93 of the photosensitive material on the substrate 9 is repeated only a predetermined number of times (in this case, four times in the present embodiment) so that the inter-sliding platform 3 moves in the sub-scanning direction. Steps S13 to S17 and S171) Then, when the entire stripe-shaped pixel pattern is drawn on the photosensitive material on the substrate 9 (step S17), the drawing operation of the pattern drawing device 1 is ended. In the substrate 9 on which the pixel pattern is drawn By performing development processing in a subsequent step, a plurality of sub-pixels are formed from the non-exposed portions of the photosensitive material. The above processing is repeated for each color of the sub-pixel of 312 ΧΡ / invention specification (supplement) / 96-12/96131424 26 200819922, and a color resist pattern of three colors of RGB (Red Green Blue, red green blue) is formed. • Next, the process of drawing the pattern of the protrusions by the pattern drawing device 1 is given. 13A and 13B are flow charts depicting a pattern of protrusions. In the pattern drawing device 1, as shown in FIG. 13A, the positive-type photosensitive material on the substrate is made to illuminate the light from the first light-irradiating portion 4, and then the light from the second light-irradiating portion 5 is irradiated as shown in FIG. 13B. . When the 10 pattern T is used to describe the protrusion pattern, first, after the substrate 9 coated with the positive photosensitive material on the entire main surface (that is, the plurality of drawing areas 91 and the grid-shaped non-drawing area 92) is held on the stage 3, Step S12 is also moved to the stroke start position by the platform drive mechanism 2 (steps S21, S22). In the pattern drawing device i, the first aperture plate 461 and the second aperture plate are previously changed to the third aperture control plate 4 61 a in the aperture unit 46 of the first light irradiation unit 4. When the alignment of the substrate 9 is completed, the main control unit 25 is controlled by the first control unit γ of the control unit 7, and the laser is not irradiated from the laser oscillator 43 of the i-th light irradiation unit 4 (that is, the light is extinguished). In the state), the substrate=starts moving in the (8) direction. The irradiation region 94 is relatively moved in the direction with respect to the drawing region 91 (step S23). Then, when the irradiation region 94 and the divided region 912 are aligned with respect to the main scanning direction, the first light irradiation unit 4 is controlled to emit light from the laser oscillator 43 by the first light irradiation unit 44 by the first control unit 71. The 兀46 partially covers the light, thereby entering (ie, illuminating) the 312XP/invention specification (supplement)/96·] 2/96! 3 in each of the two drawing areas 91 of the photosensitive material work. 】 424 27 200819922 The area of the illumination area on the side of the segmentation area 912 (that is, if the area of the blood area 912 is consistent with the main scanning direction, the number of the irradiation areas is different from the part corresponding to the pattern (step. 7' Confirmation of the divided area of the end of light irradiation 912 = (-Y) side 疋 No un-irradiated divided area 91 = area: 9_called when there is a next divided area 9;; when: Next: Continue with = mechanism 25 In the state of moving the substrate 9, returning to the step irradiation_with respect to the next divided region 912 with respect to the main scan ==- 1 through the third aperture plate of the aperture unit 46, such as the = field 94, the illumination light is emitted except for the portion corresponding to the protrusion pattern ( Step when the main sweep (four) of the illumination area 94 reaches the prescribed moving dihthron (ie, When the first shots on the (9) side of the photosensitive material are on the (9) side, and the first irradiation is performed toward the divided area on the most (9) side, the movement of the stage 3 and the substrate 9 is stopped (step milk, 2 pairs) When the first main scan of the photosensitive material on the substrate 9 is completed, it is confirmed whether or not (4) the substrate 9 is drawn (that is, whether or not there is a —-Γ). When there is a case of the lower-woman, the sub-scanner = soil is used. The plate 9 moves in the direction of the sub-learning (step S271), and returns to step 3: the substrate 9 starts moving in the (_Y) direction until the "arrival (+Y) side movement end position of the irradiation region 94 ends the platform 3 toward In the main scanning direction=moving, each time the irradiation area 94 and the divided area 912 are aligned with respect to the main scanning direction, the portion corresponding to the protrusion pattern in the irradiation area 94 is 312XP/stomach specification (supplement)/96·12/ 96131424 28 200819922 Partially irradiated light (steps S23 to S26). In the patterning device j, a stupid, instantaneous light-edge is repeated for intermittent irradiation of the substrate 9 and the sense of the substrate 9 First two:: the movement of the two scanning directions (ie, the main scanning is evenly spaced, so that Each of the predetermined number of times (==2 in the present embodiment 4 = only 7 weight S271). Then, on the substrate 9 on the basis of the picture (four) (step (four) feed the complete protrusion # column description edge action. ^束仙弟1 When the light irradiation unit 4 ends the stroke of the first light irradiation unit 4, the second control Deng 72 of the control unit 7 controls the display of the platform driving machine unit 5 to move the movement: two = baby ^ ^ , 籾% S3D. The edge of the (+γ) side of the non-greening area 92 at the beginning of the drawing is located at H. At this time, the protrusion 5242 of the light shielding plate 524 is formed at the aperture of the second light irradiation portion 5. A state in which the opening 5211 of the fourth aperture plate φ 52 未 does not overlap (see FIG. 1A). Then, the second control unit 72 controls the second light irradiation unit 5 to turn on the light, and partially shields the light by the fourth aperture plate 52 of the aperture unit 52, thereby being on the most (10) side of the photosensitive material. On the i-th non-descriptive area 921, light is guided to a rectangular one of the irradiation areas 95 corresponding to the opening 5211 and extending on the sub-scanning side (step S32). The area 95 is overlaid on the substrate 9 over the entire length of the sub-scanning side of the first non-drawing area 921. Next, the second control unit 72 controls the main scanning mechanism 25 to cause the platform 312χΡ/invention specification (supplement)/96-12/96131424 29 200819922 3 to start moving in the (+Y) direction (stepwise, the irradiation area 95 is relatively The main scanning is performed relatively in the sense=material, (-Y) direction, and then on the first non-drawing area 921 on the most (+Y) side of the photosensitive material in the (_γ) direction. When the ground moving region 95 reaches the boundary between the second non-slip region 921 and the second non-green region 2 adjacent to the (_γ) side of the first non-green region 921 (ie, if The edge of the (_γ) side of the region 95 overlaps the edge on the (-Υ) side of the f 1 non-green area 921, and the 控制2 control unit 72 is used in the aperture unit 52 of the second light-irradiating portion 5. The shutter moving mechanism 526 is controlled to move the shutter 524 in the (-Y) direction, and the projection 5242 of the shutter 524 and the opening of the fourth aperture plate 521 are partially overlapped with each other (see FIG. 10B). , changing the area irradiated by the light from the illumination area of the mercury lamp, on the photosensitive material on the substrate 9 in the (-Y) direction In the irradiation region to be moved, the irradiation region 95 corresponding to the first non-striking region 921 is changed to three irradiation regions 95a having a shape corresponding to the second non-drawing region 922 (see FIG. 11B). Three irradiation regions 95a The second non-drawing region 922 on the (+γ) side of the photosensitive material moves relatively in the (-γ) direction. Further, when the irradiation region 95a reaches the second non-drawing region 922 and is adjacent to the second non- The boundary between the second non-drawing area 921 on the (_Y) side of the drawing area 922 (that is, if the edge of the (-Υ) side of each of the irradiation areas 95a and the second non-drawing area are 2 (-Y) side In the aperture unit .52 of the second light irradiation unit 5, the second control unit 72 controls the shutter movement mechanism 526 to move the shutter 524 in the (+Y) direction to form the shutter. The protruding portion 5242 of the 524 is retracted from the opening 5211 of the fourth aperture plate 521 (refer to FIG. 1A). 312XP/Invention Manual (Repair)/96-12/96131424 200819922 This is to change the light irradiation area from the mercury lamp 51. The area of the occlusion light illumination changes the shape of the illumination area from three illumination areas 对 to Should be: one of the openings 5211 of the irradiation area 95 (refer to FIG. 1 a). In the pattern i, the apparatus i continues to irradiate the light-emitting material while irradiating the light-emitting area (ie, the irradiation area 95 or the irradiation area core). The main sweep of the seven fields until the platform 3 reaches the predetermined movement end position, and when the irradiation area reaches the lu-border between the second non-drawing green area 921 and the second non-drawing area (four), the light irradiation is changed in the irradiation area. In the area, the irradiation area 95 and the irradiation area 95a are switched (step S34). Thereby, the light from the mercury lamp 51 is irradiated only to the non-drawing area 92 on the light-sensing material on the substrate 9. ',, and by the main scanning of the shot areas 95, 95a, the entire non-drawing area 92 is irradiated with light 'When the substrate 9 reaches the movement end position, the movement of the flat to 3 and the substrate 9 in the main scanning direction is stopped (steps) S35), and stopping the irradiation of light (step S36). In this way, in the substrate 9 which is irradiated with light other than the portion corresponding to the protrusion pattern on the photosensitive material, the developing portion is removed in the subsequent step, and the exposed portion of the photosensitive material is removed from the substrate to form a liquid crystal. Several protrusions of the alignment control. As described above, in the pattern drawing device, the protrusion pattern (4) is drawn on the positive-type f-light material on the substrate 9, by using the first! The control unit 71 (4) the first light irradiation unit 4, and the irradiation area in which the divided areas of the plurality of divided areas 912 of the stroke area 91 are equal to the length of the main scanning direction are relatively moved in the main scanning direction, and each time When the irradiation area 94 coincides with the divided area 912, the irradiation area 94 is irradiated with instantaneous light. By drawing a pattern of protrusions on the large substrate 9, it is also possible to easily draw the area without using a large reticle of the same size as the substrate 312Xp/invention specification (supplement)/96-12/96131424 31 200819922. 91 depicts a pattern of protrusions. In addition, when the second light irradiation unit 5 is controlled by the second control unit 72, the irradiation area of the light from the mercury lamp 51 reaches the boundary between the first non-drawing area 921 and the second non-drawing area 922. The area in which the light is irradiated is changed in the irradiation area, and the irradiation area 95 and the irradiation area 95a are switched. Thereby, it is possible to illuminate the non-drawing area 92 whose shape changes with the position of the main scanning direction, without illuminating the drawing area 9 ( on the photosensitive material (that is, without affecting the drawing area 91). Light. Therefore, it can be said that the pattern drawing device 1 is particularly suitable for pattern drawing of a multi-chamfered substrate which is inevitably enlarged in size as a whole substrate and which has a complicated shape of a non-shank region. In recent years, the size of the liquid crystal display device has increased in size, so that the pattern drawing device 容易 can be easily drawn without using a large reticle, and is particularly suitable for drawing a pattern on a glass substrate for a liquid crystal display device. Further, since the non-drawing area 92 can be easily irradiated with light, it is particularly suitable for the drawing of the projection pattern for liquid crystal alignment control formed by the positive-type photosensitive material. In the pattern drawing device 1, when the pixel pattern is drawn on the negative photosensitive material on the substrate 9, the first light irradiation portion 4 for drawing the projection pattern irradiates only the portion corresponding to the pixel pattern in the drawing region 91. By this, it is possible to draw a pattern on the negative and positive photosensitive materials while simplifying the structure of the pattern drawing device 1. • Generally, in a color filter substrate for a liquid crystal display device, a pixel pattern or a black matrix (black 312xp/invention) is formed using a negative photosensitive material before forming a protrusion pattern for liquid crystal alignment control using a positive photosensitive material. Instruction Manual (Supplement)/96-12/96131424 32 200819922 ^ The drawing of the 贞-type and positive-type photographic materials can be performed by the simple 2, so it is especially suitable for depicting the pixel pattern of the color-transparent substrate of the liquid crystal display device. .

A two-person pattern greening device according to a second embodiment of the present invention. The second beak pattern pattern drawing device is provided with the aperture unit 52 of the first two light irradiation unit 5 of the first embodiment instead of the aperture unit 52 of the first two light irradiation unit 5 of Fig. 14A. The other configurations are the same as those of the pattern drawing device shown in Fig. i, and the same reference numerals are attached to the following description.

In the second embodiment, the pattern is similar to the first embodiment, and is also positively sensitized on the substrate 9 (see Table 1) which is a color filter substrate for a liquid crystal display device. The material is drawn to the projection pattern of the liquid crystal alignment control, and the second light irradiation unit 5 irradiates only the non-drawing area 92 (see FIG. 3) on the photosensitive material with light. The irradiation of the light in the non-drawing region 92 by the second light-irradiating portion 5 of the pattern drawing device according to the second embodiment is different from the method of switching the irradiation region 95 and the irradiation region 95a (see FIGS. 11A and 11B). As in the i-th embodiment, as shown in FIG. 14A, the aperture unit 52a is provided with a multi-channel liquid shutter 5 21 a instead of the fourth aperture plate 521 and the light shielding plate 524 of the aperture unit 52 shown in FIG. 'Hunting by applying or removing an electric field to liquid crystal molecules causes a change in the arrangement of liquid crystal molecules, thereby transmitting or blocking light. Further, similarly to the aperture unit 52 shown in FIG. 10A, the aperture unit 52a includes a pair of holding portions 522 that hold the liquid crystal shutters 521a from the (+X) side and the (-X) side; and 312XP/invention manual (supplements) /96-12/96131424 33 200819922 The position adjustment mechanism 523 adjusts the positions of the main scanning direction and the sub-scanning direction of the liquid crystal shutter 521a. The liquid crystal shutter 52h has a light-transmissive portion 5212 which is elongated in the sub-scanning direction*, and transmits light from the mercury lamp 51 (refer to FIG. 1) through the light-transmitting portion 5212 via the optical system 53 (refer to FIG. The photosensitive material on the substrate 9 is irradiated to one of the illuminating regions 95 on the i-th non-drawing region 921 (see FIG. 11A). In Fig. 14A, for the sake of easy understanding of the drawing, the area other than the light transmitting portion 5212 (i.e., the light shielding portion) of the liquid crystal shutter 521a is indicated by parallel oblique lines (the same applies to Fig. 14B). In the second light irradiation unit 5, the liquid crystal shutter 521a is controlled by the second control unit 72 (see FIG. 4) of the control unit 7, and the arrangement direction of the liquid crystal molecules of the light transmitting portion 5212 is changed. A part of the light transmitting portion 5212 or the entire light transmitting portion 5212 blocks light. In the pattern drawing device of the second embodiment, when the second non-drawing region 922 (see FIG. 3) is irradiated with light, the second control unit 72 controls the liquid crystal shutter 52ia, and as shown in FIG. 14B, φ pairs Light transmission.卩5212 part of the shading. Thereby, the area in which the light is irradiated from the irradiation light of the mercury lamp 51 is changed, and only the irradiation area 95a (see Fig. 11B) on the second non-drawing area 922 is irradiated with light. Further, when the irradiation of the light of the photosensitive material is stopped, the entire light transmitting portion 5 212 is shielded from light. In the pattern drawing device, similarly to the second embodiment, the projection pattern can be easily drawn to the drawing region 91 without using a large photomask. Moreover, it is possible to easily illuminate only the non-striking region 92 without affecting the drawing region 91. In the pattern drawing device of the second embodiment, the (fourth) portion of the light transmitting portion 5212 is changed by controlling the liquid crystal 312XP/invention specification (supplement)/96-12/96131424 34 200819922 = Bfla, and can be easily changed. :: The length of the sub-scanning direction of the shot area 95a. The sub-scanning direction of the second non-drawing area 922 of the non-drawing (four) field 92 = the number of different substrates (for example, the size of the drawing (four) field 91 or the number of the drawing areas 91 on one substrate ^ the non-reading area 92 illumination light (10) may be used from time to time. The pattern description (fourth) of the third embodiment of the present invention can be easily described. Fig. 15 is a view showing the configuration of the pattern drawing system 1 of the third embodiment. The pattern drawing (4) is provided with the first light irradiation device m, and only the tracing area 91 (refer to FIG. 3) on the photosensitive material on the substrate 9 is irradiated with light; the second light..., the shot i 102' is only sensitive to light. The non-drawing area 92 (see FIG. 3) on the material is used to illuminate the light, and the transfer arm 1 as a transport mechanism transports the substrate 9 between the first illumination f device 101 and the second light irradiation device 102. The first light illuminating device 1 〇1 is a configuration of the second light illuminating unit 5 and the second control unit 72, and the 光2 light illuminating device 102$ is omitted from the pattern drawing device i. The i-th light irradiation unit 4 and the first! The configuration of the control unit 71. In the pattern drawing (four) system, the same processing as the light irradiation of the first light irradiation unit 4 by the drawing device i is performed by the ith light irradiation device, and the 帛2 light irradiation device 102 is used. The substrate 9 is subjected to the same processing as the light irradiation by the second light irradiation 邛 5 of the pattern drawing device 1. The 光j light irradiation device 〇1 and the second light illuminating device 1 are respectively the first substrate holding portion and the second substrate holding portion of the pattern drawing system 1 . In the first light irradiation device 101, the substrate 312XP/invention specification (supplement)/96-12/96131424 35 200819922 plate 9' provided with the negative photosensitive material passes through the first aperture plate 461 and the second aperture plate 467 ( The pixel pattern of the color filter substrate for a liquid crystal display device is drawn by irradiating light with reference to FIGS. 5 and 6). Further, in the first light irradiation device 1 〇1, the substrate 9' provided with the positive photosensitive material is irradiated with light through the third aperture plate 461a (see FIG. 8), thereby dividing the edge region 91. The portion corresponding to the protrusion pattern for the liquid crystal alignment control is irradiated with light. The substrate 9 is carried out from the first light-emitting device 101 by the transfer arm 1〇3, and is carried into the second light-irradiating device 1〇2. After the alignment of the substrate 9 is performed in the second light irradiation device 102, the fourth aperture plate 521 (see FIG. 10A) is irradiated with light, and the light shielding plate 524 (see FIG. The area where the light is irradiated, whereby only the non-drawing area 92 is irradiated with light. Further, in the pattern drawing system, another transfer mechanism may be provided instead of the transfer arm 103. In the pattern drawing system 100, as in the first embodiment, the projection pattern can be easily drawn on the drawing region 91 without using a large reticle. It is also possible to illuminate only the non-striking region 92 without affecting the strut region 91. In the second light irradiation device 1A2 of the pattern drawing system 1A, the multi-channel liquid crystal shutter 521a can be provided instead of the fourth aperture plate 521 and the light shielding plate 524 as in the second embodiment. Thereby, the length of the sub-scanning direction of the irradiation area can be easily changed, and the light can be more easily irradiated to the non-drawing area. Although the fourth embodiment of the present invention has been described above, the present invention is not limited to the above embodiment, and various modifications can be made. 312XP/Invention Manual (Supplement)/96-12/96131424 36 200819922 For example, in the pattern drawing device of the above embodiment, the stage 3 in which the material is stopped is moved by the i-th light irradiation unit 4 and == ', ,,邛5', the light irradiation region from the first light irradiation and the light irradiation region of the incoming material=1 is printed with respect to the photosensitive material on the substrate 9: "the picture" is centered, and the second light irradiation portion 5 is used. The light irradiation of the positive-type photosensitive material meeting area 92 is not necessarily required to be performed after the light irradiation of the riding area 91 on the sensing (four) material by the first light ray '/ 4' The person in the irradiation area 94: the two main scanning simultaneously irradiates the non-drawing area 92 with light, or # ', W; the field % area 91 illuminates the non-drawing area 92 before the light is irradiated: the second drawing area 92 illuminates the light Using the first light irradiation

Si =::_ is carried out by the movement of the substrate 9 over 1 D. For the pattern drawing device, the i-th aperture plate 461 of the unit 46 and the second: can also replace the aperture ^ crystal shutter. In this case, the slab 467, for example, uses the liquid control as the hole of the second reticle portion: :: 7 of the first control illuminating region 94 and the liquid crystal light of the drawing 9=46 is turned on every time 曰When each of the divided regions 912 of # pm is identical, the liquid: first (four) opens and closes, and the irradiation region 94 is irradiated with light. Further, as the first, 43 and laser driving sections 44, the liquid crystal shutters are controlled by the same, whereby the irradiation region 94 can be irradiated with the instantaneous light. In the similar figure, if the green color on the negative and positive photosensitive materials is %, the aperture of the first light irradiation unit 4 may not be changed, and the 312 汾/__ book (supplement)/96·12/96 (3) is changed. Like 37 200819922 The first control unit 71 controls the light source or the platform driving mechanism 2 to draw a green pattern on the two photosensitive materials. In the patterning device of the above-described embodiment and the first light irradiation device 1〇1 of the pattern drawing system 1 according to the third embodiment, the first light irradiation unit 4 (and the second light irradiation unit 5) may be separated from each other. Instead of the first light irradiation unit 4, a light irradiation unit that irradiates light to the substrate 9 is separately provided, and the negative light-sensitive material is drawn with a pattern by the light irradiation unit. The substrate on which the pattern is drawn by the pattern drawing device and the pattern drawing system 1 is not limited to the substrate on which the four drawing regions 91 are set on the photosensitive material, and may be a substrate in which only one drawing region is set on the photosensitive material. Further, a plurality of drawing regions (that is, one drawing region and one or more drawing regions having the same shape as the drawing region) may be disposed on the photosensitive material with the main scanning direction and/or the sub-scanning direction spaced apart from each other. The substrate of several drawing areas is drawn. In the pattern drawing device of the above-described embodiment, the third light irradiation unit 4 may be used, and the color filter substrate for the crystal display device may be drawn with a pattern other than the pixel pattern (for example, with a black matrix or a photosensitive spacer). Corresponding pattern). Also, you can use the first! The light-irradiating portion 4 and the second light-irradiating portion 5 are used for a TFT for a liquid crystal display device (Thin Film substrate is used to draw a projection pattern for liquid crystal alignment control or a photoresist pattern for etching of a tft wiring (pattern drawing system i 〇 The pattern drawing device and the pattern drawing system 1 can also be used for a substrate drawing pattern for a flat display device such as an electric display device or an organic EL display device. A 'pattern drawing device and a pattern drawing system In addition to the flat glass display 312XP/invention manual (supplement)/96-12/96131424 38 200819922 In addition to the glass substrate for the device, it can also be used to draw a pattern on a semiconductor substrate, a printed wiring board, or a glass substrate for a photomask. The present invention has been described and illustrated in detail hereinabove, but the description is intended to be illustrative and not restrictive. Fig. 1 is a side view of the pattern drawing device of the first embodiment.

Figure 2 is a plan view of the patterning device. Fig. 3 is a plan view showing a substrate.

Fig. 4 is a block diagram showing the work realized by the control unit together with other components. Figure 5 is a plan view showing a portion of the aperture unit. Figure 6 is a plan view showing another portion of the aperture unit. Fig. 7 is a plan view showing an irradiation area on a substrate. Figure 8 is a plan view showing a portion of the aperture unit. Figure 9 is a plan view showing a portion of the tracing area. Fig. 10A is a plan view showing an aperture unit. Fig. 10B is a plan view of the aperture unit. Fig. 11A is a plan view showing an irradiation region on a substrate. Fig. 11B is a plan view showing an irradiation area on a substrate. Figure 12 is a flow chart showing the depiction of a pixel pattern. Fig. 13A is a flow chart showing the pattern of protrusions. Fig. 13B is a flow chart showing the pattern of protrusions. Figure 14A is a plan view of the aperture unit. 312XP/Invention Manual (Supplement)/96-12/96131424 39 200819922 Figure 14B is a plan view of the aperture unit. Fig. 15 is a view showing the configuration of a pattern drawing system.

[Description of main component symbols] 1 Pattern drawing device 2 Flat drive mechanism 3 Platform 4 First light irradiation unit 5 Second light irradiation unit 6 Imaging unit 7 Control unit 9 Substrate 11 Base 12, 13 Frame 21 Support plate 22 Platform rotation Mechanism 23 Sub-scanning mechanism 24 Base plate 25 Main scanning mechanism 41 Optical head 42 Illumination optical system 43 Laser oscillator 44 Laser drive unit 45 Injection unit 46, 52, 52a Aperture unit 312XP / Invention manual (supplement) / 96-12 /96131424 40 200819922 47, 53 Optical system 51 High-pressure mercury lamp 61 Alignment camera 71 First control unit 72 Second control unit 91 Drawing area 92 Non-draw area 93, 94, 95, 95a, 451, 93 Bu 941 Area 100 pattern drawing system 101 First light irradiation device 102 Second light irradiation device 103 Transfer arm 221 Platform rotation shaft 222, 23 251 Linear motor

Rail first aperture plate third aperture plate holding portion position adjustment mechanism first adjustment mechanism 2 adjustment mechanism second aperture plate third adjustment mechanism fourth aperture plates 232, 252, 465, 528 • 461 461a 462 , 468 , 522 , 525 463 , 523 464 466 467 469 521 312XP / invention manual (supplement) /96-12/96131424 41 200819922

521a 524 526 527 529 911 912 921 922 4611 , 4612 , 4613 , 4671 4614 5211 5241 5242 LCD shutter visor moving mechanism 4th adjustment mechanism brother 5 adjustment mechanism circular part division area 1st non-drawing area 2nd non Drawing area 4672, 4673, 5212 light transmitting portion light shielding portion opening body portion protruding portion

312XP/Invention Manual (supplement)/96-12/96131424 42

Claims (1)

200819922 X. Patenting for the Fan Park············································································ , jr ¥ and ^^ are partially removed to form a light-emitting portion of the younger brother, and the first direction and the second material of the fourth-shaped substrate are set to have mutually perpendicular 丨J and the second direction. The surface of the rectangle is immersed in the pattern of the rectangle 靡 心 心 心 的 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形 长方形· The first light source; the first mask portion 'based on the light guide of the light source of the pattern to the following area ρ green; from the above-mentioned brother 1 is the upper 聱8, Ρ, the above-mentioned drawing area is in the first number The first control unit ′ is moved by controlling the first light source and/or the ith reticle portion other than the portion corresponding to the pattern in the shot &region; The above lm area, and each time the above u area is divided When the plurality of divided regions are aligned with respect to the first direction, the first illuminating portion is irradiated with light through the first reticle portion; and the second illuminating portion is provided with: 312XP/invention specification (supplement)/96- 12/96131424 43 200819922 second light source; the second mask portion, from the second optical field, that is, the region of the photosensitive material extending in the second direction and the fringe region and the non-striking region. And arranging the second illuminating region relative to the first photosensitive material in the first direction; and controlling the second illuminating region to pass through the drawing region and the upper non-drawing region by control In the second irradiation region, the light is blocked early and the light is irradiated in the above-mentioned region. First, ‘,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Figure 2 The second mask portion has a liquid crystal light. In the case of the patterning device of the second item, in the bowl, the substrate holding portion may be formed by replacing the positive photosensitive material with the above-mentioned positive photosensitive material by partial removal in the subsequent step. -. The negative photosensitive material of '®, is formed into a layered substrate, and the first light: the emitting portion is set only on the photosensitive material by changing the first mask portion and/or the right side. The portion corresponding to the pattern is irradiated with light in the drawing & field of the rectangle in the first direction and the second direction. 4. The pattern drawing device according to claim 3, wherein the substrate is a color filter substrate for a liquid crystal display device, and η is formed on the color filter substrate by using the negative photosensitive material. The above pattern is a pixel pattern. 312ΧΡ/发明发明(补件)/96-12/96131424 44 200819922 5. The pattern drawing device of claim 2, wherein the above-mentioned (four) region and the above-mentioned striking region are included in the above-mentioned sensible material The plurality of drawing regions of the drawing area having the same shape are arranged at intervals in the first side and/or the second direction, and the substrate is a pre-plate which is chamfered according to the plurality of drawing regions, and the toast The illuminating unit 1 emits light to a portion other than the portion corresponding to the pattern in the plurality of financial regions, and the second light illuminating, the gamma, the gamma, the gamma, the gamma, the gamma, the gamma The second guard, the cover portion' moves the above-mentioned work area with respect to the above-mentioned several kinds of the tracing area, and each time the above-mentioned first! Each of the irradiation regions and the plurality of points is:; two: in the first direction, the first mask portion is irradiated with light to the area of the younger 1 irradiation, and the second irradiation region is in the first The photosensitive material 'extends in the two directions' is controlled by the second control unit by the second control unit. The first cover and the above-mentioned non-6. The pattern of the fifth aspect of the patent application, wherein the substrate holding portion may be replaced by the positive type of the substrate, but by the subsequent step The negative photosensitive material having a periodic pattern is formed in a medium shape: the floor is removed, and the first light irradiation unit is changed to the control of the light control unit, and only the first feeling is set.弟 1 1 312 ΧΡ / invention manual (supplement) / 96·12 Gu 31424 45 200819922 The same number of illuminating light in the 'fe condition. The part of the drawing area corresponding to the above pattern 7. The pattern drawing device according to claim 6, wherein the substrate is a color filter substrate for a liquid crystal display device, and the light film is formed of the negative photosensitive material to form the color filter or the film. The above pattern on the substrate is a pixel pattern. 8. The pattern greening device of claim 1, wherein the substrate holding portion is formed instead of the positive photosensitive material, and is maintained as a periodic pattern by being partially removed in a subsequent step. The negative photosensitive material is formed into a layered substrate, and the illuminating portion of the illuminating portion is set to be controlled only on the photosensitive material by changing the control of the reticle portion and the control unit. With = to the above! The portion corresponding to the pattern in the direction of the rectangle and the edge of the second direction is irradiated with light. 9. The pattern drawing device of claim 8, wherein the substrate is a color filter substrate for a liquid crystal display device, and is formed on the color filter substrate by using the negative photosensitive material. The above pattern is a pixel pattern. 10. The pattern drawing device according to claim 2, wherein the photosensitive light m includes the drawing light region and the drawing regions of the drawing region having the same shape as the drawing region in the first direction and/or Or the second direction is arranged at a distance from each other, and the substrate is a predetermined color plate which is chamfered according to the plurality of drawing regions, and the soil 312XP/invention specification (supplement)/96-12/96131424 46 200819922 The light irradiation unit irradiates light to the upper two portions of the plurality of drawing regions, and the second light irradiation unit irradiates light to the non-drawing regions other than the plurality of drawing regions on the photosensitive material, and the first The control unit controls the first light source and/or the i-th portion, and moves the ith irradiation region with respect to the plurality of drawing regions, and divides each of the first 077 μ μ with the plurality of segments; J] when the first direction is the same, the first reticle portion is irradiated with light toward the first illuminating region, and the second illuminating region is extended in the second direction and crosses the sensible material. When the photosensitive material through said exit region, the region irradiated by light. The pattern holding device of the first aspect of the invention, wherein the substrate holding portion 'can be replaced with the substrate constituting the positive photosensitive material, a substrate in which a negative photosensitive material which is a periodic pattern is formed in a layer shape by partial removal in a subsequent step, and the first light irradiation unit changes the control of the mask portion and/or the second control unit. The light is emitted from the above-described pattern only in the plurality of drawing regions which are set to be the same as those of the positive-type photosensitive material described above. A pattern drawing device according to the invention of claim 5, wherein the substrate is a color filter substrate for a liquid crystal display device, and the color filter is formed by using the photosensitive material of the negative substrate The above pattern on the sheet substrate is a pixel pattern. ΧΡ ΧΡ 发明 发明 y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案The pattern formed on the glass substrate by the photosensitive material is a protrusion pattern for liquid crystal alignment control. 14· A pattern drawing system is a photosensitive material pattern on a substrate by using light, and includes: The first light irradiation device is formed on the substrate which is formed into a layered positive photosensitive material by partial removal in a subsequent step, and is set to have a mutually perpendicular orientation on the photosensitive material. The second light irradiation device irradiates light to the non-drawing region around the drawing region on the photosensitive material in the rectangular drawing region of the direction and the second direction; and the conveying mechanism And transporting the substrate between the first light irradiation device and the second light irradiation device; ^ and the first light irradiation device a first substrate holding portion for holding a substrate; a first light source; and a first mask portion for guiding light from the first light source to a region according to a periodicity of the pattern, that is, One of the plurality of divided regions in which the material region is divided into the first direction and the first irradiation region having the same length as the first direction, and a region other than the portion corresponding to the pattern; 312XP/Invention Manual ())/96-12/96131424 48 200819922::: the multi-motion mechanism 'moves the first irradiation area toward the ground relative to the above-described striking area; and the first phase control unit, by controlling the first light source and / or the above-mentioned =, and moving the above-mentioned illuminating region, and each of the ith illuminating regions is aligned with the plurality of divided regions with respect to the ninth direction The second illumination device is configured to: illuminate the substrate; the second substrate holding portion holds the substrate; the second light source; and the second mask portion guides the light from the second light source to the second illumination Area a region extending in the second direction on the photosensitive material and intersecting the drawing region and the non-drawing region; and the second moving mechanism relatively moving the second irradiation region toward the first direction with respect to the photosensitive material; In the second irradiation region, when the second irradiation region passes through the drawing region and the non-striking region, the region in which the light is irradiated in the second irradiation region is changed by controlling the second mask portion. A. The pattern drawing system of claim 14, wherein the second mask portion is provided with a liquid crystal shutter. The pattern drawing system of the item is 16 or as claimed in claim 14 or In the second substrate holding portion of the first light irradiation device, instead of the substrate on which the positive photosensitive material is formed, the substrate may be held by the rear 312/turn instruction (supplement)/96·12 /9613ΐ424 49 200819922 2=Negative type light-receiving which is partially removed to form a periodic pattern (4) A substrate which is layered to be small, * The first-speed first light irradiation device # changes the first mask portion or In the control of the portion, the portion corresponding to the pattern is irradiated with light only on a portion of the rectangular region in which the t-direction and the second direction are provided on the photosensitive material. Π — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — The positive-type photosensitive material having a periodic pattern is formed into a layer shape, and the drawing region is set to have a rectangular shape perpendicular to the i-th direction and the second direction on the photosensitive material, and is formed on the photosensitive material. The non-drawing area is set around the drawing area, and the pattern drawing method includes: a) directing light to the following area according to the periodicity of the pattern, that is, the number of the upper part and the ith direction are equally divided in the i-th direction a step of moving the J-illumination region relatively in the first direction with respect to the region of the second illumination region of the divided region having the same length as the length of the first direction, and a region other than the portion of the pattern; b) in the above step a), 'When the plurality of divided regions of the first irradiation region are respectively aligned with respect to the ith direction, the upper illuminating region is irradiated with light And / or directing the light to the second irradiation region 'i', that is, the region of the photosensitive material extending in the second direction and crossing the drawing region and the non-descriptive region while simultaneously facing the photosensitive material toward the photosensitive material The first! Direction_312XP/Invention Manual (Supplement)/96-12/96131424 50 200819922 The step of moving the second irradiation region; and d) in the step c), the second irradiation region passes through the drawing region and the non-drawing In the case of the region, the step of irradiating the non-drawing region with light is performed by changing the region in which the occlusion light is irradiated in the second irradiation region. 312XP/Invention Manual (supplement)/96-12/96131424 51