1252379 玖、發明說明： 【發明所屬之技術領域】 本發明係關於使光照射在基板上之感光材料，藉以 圖案之技術。 【先前技術】 先前技術之描繪圖案之方法是以光照射在形成於半 基板或印刷電路基板，或電漿顯示裝置，液晶顯示裝 光罩用之玻璃基板等（以下稱為「基板」）之感光材料 以接近曝光方式或步進曝光方式等，將遮罩圖案轉印 光材料。 在接近曝光方式中，形成與被描繪之圖案對應之開 使與基板同等大小之遮罩接近基板，以光照射用來將 一起轉印到基板上之感光材料。步進曝光方式中，交 重複進行遮罩圖案之投影和遮罩圖案之移動，用來在 全體進行圖案之描繪。 另外一方面，未使用遮罩之描繪方法提案有直接描 案之方式（以下稱為「直描方式」），如曰本專利特 5 - 1 5 0 1 7 5號公報所示，使調變之光射束在感光材料上 同時進行照射。 近年來在扁平面板顯示裝置之面板或彩色過濾器等 造裝置之市場中，強烈要求因應被描繪在基板之圖案 精確化，和基板之大型化。在將遮罩圖案一起轉印在 材料之接近曝光方式中，因為使遮罩和基板接近，以 射，所以要因應圖案之高精確化或基板之大型化時， 312/發明說明書(補件)/93-05/93105519 描繪 導體 置， 上， 在感 口 ， 圖案 替的 基板 緣圖 開平 掃描 之製 之高 感光 光照 遮罩 5 1252379 會變為高價格。另外，在接近曝光方式和步進曝光方式中， 所具有之缺點是不能彈性的因應描繪之圖案之間距或幅度 之變更。 在直描方式中，一般是光柵方式，集合微小之點（圖素） 用來表示圖案，以點為單元描繪圖案，但是要因應圖案之 高精確化時需要提高描繪裝置之分解能力（亦即使 1個點 之面積變小），在大型之基板全體描繪圖案所需之時間會增 長。 縮短描繪時間之方法可以考慮之對策是使掃描之光射束 之數目增加，同時使描繪之點數增加，但是隨著光射束之 增加會使光照射機構大型化，會造成製造裝置之成本之上 升。特別是隨著圖案之微細化和高精確度化，要配置必要 數目之光頭部在實體上變為困難。 【發明内容】 本發明之目的是提供在基板上之感光材料之描繪圖案之 圖案描繪裝置，可以以高分解能高速描繪圖案。 本發明之圖案描繪裝置具備有：光源；保持部，用來保持 引導來自光源之光的基板；第1遮罩，被配置在來自光源 之光之光路上，用來使光通過之多個第1光通過區域，被 排列和形成在指定之方向；第2遮罩，對第1遮罩光學式 的重疊，形成有多個第2光通過區域，分別對應到多個第 1光通過區域；遮罩移動機構，依指定方向使第1遮罩對 第2遮罩進行相對移動；和照射區域移動機構，用來使順 序通過多個第1光通過區域和多個第2光通過區域之光， 6 312/發明說明書(補件)/93-05/93105519 1252379 照射在感光材料上之多個光照射區域，在與多個光照射區 域之排列方向正交之掃描方向，對感光材料進行相對移動。 在本發明中，經由使用第1和第2遮罩，和使第1遮罩 對第2遮罩進行相對移動，可以將各種規則之圖案高速的 描繪在感光材料上。 在本發明之較佳實施形態中，使多個光照射區域之上述 指定方向之幅度成為相同，而且該多個光照射區域之間隔 成為一定，圖案描繪裝置更具備有：檢測部，用來檢測多個 光照射區域之各個之上述指定方向之幅度；驅動部，用來 驅動遮罩移動機構；和遮罩移動控制部，根據檢測部之檢 測結果用來控制驅動部。經由以檢測部檢測圖案之幅度， 可以自動的變更圖案之幅度。 另外，在較佳實施形態中，在圖案描繪裝置更具備有光 學系，被配置在第2遮罩和保持部之間，使第2遮罩和感 光材料光學式的配對。 另外，最好使該光學系具備有倍率變更機構，用來使多 個光照射區域擴大或縮小，圖案描繪裝置更具備有：檢測 部，用來檢測多個光照射區域之間隔；驅動部，用來驅動 倍率變更機構；和倍率控制部，根據檢測部之檢測結果用 來控制驅動部。經由以檢測部檢測圖案之間距，可以自動 的檢測圖案之間距。 圖案描繪裝置亦可以更具備有交換機構，用來使第1遮 罩和第2遮罩之至少任一方，與另外一方之遮罩交換。利 用此種構成，可以使可描繪之圖案之幅度和間距之範圍更 7 312/發明說明書(補件)/93-05/93105519 1252379 進一步的擴大。另外，在圖案描繪裝置亦可以更具備 照射控制部，與多個光照射區域之移動同步來控制對 材料之光之照射之Ο N / 0 F F，或更具備有變更機構，以 持在保持部之基板上之面之垂直軸作為中心，使保持 轉，用來相對的變更對感光材料之掃描方向。 上述之目的和其他目的、特徵、態樣和優點，經由 參照圖式所進行之本發明之詳細說明，當可更加明白 【實施方式】 圖1表示本發明之第1實施形態之圖案描繪裝置1 造。圖案描繪裝置1經由使光照射在液晶顯示裝置用 璃基板9 (以下簡稱為「基板9」），用來在基板9上之 材料（在本實施形態中為彩色抗蝕劑）描繪多個條帶狀 案。描繪有圖案之基板9經由後續之其他步驟最後成 晶顯示裝置之組建零件之彩色過濾器。 在該圖案描繪裝置1中，在基台1 1上設有載物台移 構2，利用該載物台移動機構2使保持基板9之載物 元3，沿著基板9之主面可以依圖1中之X方向移動 基台11以跨越載物台單元3之方式固定有框架12， 架1 2安裝有光頭部5和遮罩變換器6。 載物台移動機構2之構造是使螺桿2 2連接到馬達 和將被固定在載物台單元3之螺母2 3安裝在螺桿2 2 螺桿2 2之上方固定有引導軌2 4，當馬達21進行旋轉 螺母23和載物台單元3沿著引導執24依X方向順利 動。 312/發明說明書(補件)/93-05/93105519 有光 感光 被保 部旋 以下 〇 之構 之玻 感光 之圖 為液 動機 台單 。在 在框 21， 。在 時， 的移 8 1252379 載物台單70 3具有：載物台32，用來直接保持基板9 ;载物台 方疋轉機構33 ’以垂直基板9之主面之軸作為中心，用來使載物台 32進仃旋轉；支持板34，用來支持载物台32使其成為可以旋轉； 載物台升降機冑35,用來使支持板34依圖"之z方向進行移 牙基座板3 6 ’用來保持該載物台升降機構3 5 ;在該基座板 36直接固定有上述 碟 累母23。另外，在支持板34上設有照相機 4 ’利用2次元排列之夸氺斤政 子之攝影裝置’用來接受從光頭部 5 S?、射之光。另外，預| 、 預先凋“相㉘4之攝影面q吏其與基板 上之感光材料之表面相同。 部 移動機構5 0 1，用來使光頭部 光頭部5具有：光頭支持部5〇,用來支持頭部5;光頭 中之Y方向（亦即， 依圖 光頭部5對载物台單元3 变 <相對移動方向之正交方向）移 動；光射出部5 1，用來朝向其α 用木朝句基板9射出光；遮罩部5 2，具 有排列多個開口所形成之2如 、 叮办成之2個遮罩（以下從接近光射出呷 51側起，稱為第1遮罩53，第2遮罩54);光學單元58° ’ 用來使通過遮罩部52照射在基板9之光之照射區域擴大或 縮小；和光學單元驅動# 581 1來驅動光學單％ 58所罝 備之倍率變更機構5 8 2。光頭部移動機構5()1利用馬達… 之驅動螺桿機構’用來使光頭部5沿著引導軌5〇3依γ方 向移動。利用光學單元58,使第2遮罩54(或遮罩部52) 與感光材料光學式的配對’ |本實施形態中，以包含等倍 之指定範圍進行變更光學單元58之倍率。 ° 光射出部5丨經由光纖511和快門512(用來進行對感光 材料照射光之ΟΝ/OFF)連接到水銀燈513。來自水銀燈5 312/發明說明書(補件)/93·05/93105519 1252379 之光順序通過被配置在從光射出部5 1射出之光路上之第1 遮罩53和第2遮罩54(以下，在第1遮罩和第2遮罩2個 成為 1 組之情況稱為「遮罩組」）之開口 ，經由光學單元 58被引導到基板9。 遮罩變換器 6具有：遮罩收納部 6 1，用來收納多個 遮罩；收納部升降機構 6 2，用來使遮罩收納部 6 1依 Z方向移動；和 2個之插脫機構 6 3，用來將遮罩收納 部 6 1所收納之遮罩裝著到遮罩部 5 2，或拆下被裝著 在遮罩部 52之遮罩。 載物台移動機構2，載物台單元3，照相機4，快門5， 光頭部移動機構5 0 1，遮罩部5 2，光學單元5 8和遮罩變換 器6均連接到控制部7，該等之構成被控制部7控制，利 用圖案描繪裝置1在基板9上進行圖案之描繪。另外，在 控制部7連接有輸入部8，使基板9上之多個光照射區域 之各個之Y方向之幅度（亦即，第1遮罩5 3之開口之排列 方向之幅度，以下簡稱為「幅度」），和多個光照射區域之 間隔（亦即，從各個光照射區域之中心到鄰接之光照射區域 之中心之距離，以下稱為「間距」）之設定值，由操作者經 由輸入部8輸入到控制部7。 圖2表示第1遮罩5 3，圖3表示第2遮罩54。在第1 遮罩53，使光通過之多個光通過區域之第1開口 531依圖 2之Y方向排列和形成。在第2遮罩54排列和形成有分別 與該多個第1開口 5 3 1對應之多個光通過區域之第2開口 5 4 1。第1開口 5 3 1和第2開口 5 41之形狀為矩形，開口之 10 312/發明說明書(補件)/93-05/93105519 1252379 長度（亦即，第1開口 5 3 1和第2開口 5 4 1之排歹】J方向之正 交方向之尺寸）和幅度（亦即，第1開口 5 3 1和第2開口 5 4 1 之排列方向之幅度），在第1開口 5 3 1比第2開口 5 41大。 另夕卜，第1開口 5 3 1之幅度相同，而且間距（亦即，從各個 第1開口 5 3 1之中心到鄰接之第1開口 5 3 1之中心之距離） 亦為一定。同樣的，各個第2開口 5 4 1亦是幅度和間距均 為相等，第2開口 5 4 1之間距與第1開口 5 3 1之間距相等。 圖4表示遮罩部52之構造。遮罩部52具有：第1遮罩保 持部5 5，用來保持第1遮罩5 3 ;第2遮罩保持部5 6，用 來保持第2遮罩5 4 ;和遮罩滑動機構5 7，用來使第1遮罩 5 3依圖4中之Y方向（亦即，第1開口 5 3 1和第2開口 5 41 之排列方向）移動。另外，在圖4中，第1遮罩保持部5 5 和第1開口 5 3 1以粗線表示。 第1遮罩5 3和第2遮罩5 4經由插脫機構6 3 (參照圖1 )， 從圖4中所示（+ X )侧朝向（-X )方向，分別被裝著到第1保 持部5 5和第2保持部5 6。 第2遮罩54接合在第1遮罩53使各個第2開口 541重 疊在對應之第1開口 5 3 1。利用此種構成，第1開口 5 3 1 和第2開口 5 4 1之重疊區域（在圖4中以附加平行斜線表 示）5 2 0成為相同之幅度，第1開口 531和第2開口 541以 相等之一定間距排列。來自光射出部5 1 (參照圖1 )之光順 序的通過第1開口 5 3 1和第2開口 5 41，被引導到基板9 上之感光材料，照射在具有與區域5 2 0對應之形狀和間距 之多個光照射區域。在以下之說明中，將實際之光之通過 11 312/發明說明書(補件)/93-05/93105519 1252379 區域之區域5 2 0稱為「遮罩組開口」。 另外，第2遮罩54對第1遮罩53並不一定要實體上的 抵接，亦可以只有光學式的重疊。例如，第1遮罩5 3，第 2遮罩5 4亦可以離開考慮到焦點深度之部份（例如，數// m 程度），個別的配置在光學式配對之位置。 遮罩滑動機構5 7具有用以保持第1遮罩保持部5 5之滑 動框架 5 7 1，滑動用馬達 5 7 2，和連接到滑動用馬達 5 7 2 之螺桿機構5 7 3，利用控制部 7之控制使滑動用馬達5 7 2 驅動螺桿機構5 7 3時，第1遮罩保持部5 5沿著滑動框架 5 7 1依Y方向移動。其結果是第1遮罩保持部5 5所保持之 第1遮罩5 3亦依Y方向移動，第1開口 5 31和第2開口 5 4 1之重疊狀態進行變化，使遮罩組開口 5 2 0之幅度進行 變化，基板9上之光照射區域之幅度亦進行變化。這時， 因為遮罩組開口 5 2 0之間距不變，所以只有遮罩組開口 5 2 0 之幅度對遮罩組開口 5 2 0之間之（光未通過之區域之）幅度 之比進行變化。 圖中未顯示者，在第1遮罩保持部5 5和第2遮罩保持部 5 6之間設有離合機構，在第1遮罩保持部5 5進行移動之 期間，第2遮罩保持部5 6稍微下降，使第1遮罩5 3和第 遮罩5 4互相離開。利用此種構成用來防止第1遮罩5 3和 第2遮罩5 4之間之損傷或發生灰塵。 圖5表示形成在基板9之感光材料上之多個光照射區域 9 0之一部分。該多個光照射區域9 0分別對應到遮罩組開 口 5 2 0 (參照圖4 )，該多個光照射區域9 0之幅度成為相同， 12 312/發明說明書(補件)/93-05/93105519 1252379 而且間距亦成為一定。 如上所示，光照射區域9 0之幅度和間距利用具備有倍率 變更機構5 8 2之光學單元5 8進行擴大或縮小，該光學單元 58被配置在圖1中所示之第2遮罩54和載物台單元3之 間。例如，控制部7控制光學單元驅動部5 81，當使光學 單元5 8之倍率增加時，光照射區域9 0被從圖5中之實線 所示之狀態變化成為2點鏈線所示之狀態。 圖6是方塊圖，用來表示控制部7之構造和與控制有關 之資訊之流程。控制部7中之各種構成之功能，實際上其 實現是利用依照程式進行演算處理之 C P U，記憶器，專用 之演算電路，和介面等。控制部7之主要構成具有：照射區 域控制部 7 1，用來控制光照射區域9 0之幅度和間距；和 掃描控制部7 2，用來控制基板9上之感光材料之光照射區 域9 Q之掃描。 照射區域控制部7 1具有：幅度檢測部7 1 1，根據來自照 相機4之圖像信號，用來檢測多個光照射區域9 0之各個之 幅度；間距檢測部71 2，用來檢測間距；幅度控制部7 1 3， 用來控制光照射區域9 0之幅度；間距控制部7 1 4，用來控 制間距；和記憶部7 1 5，用來記憶光照射區域9 0之幅度和 間距之調整所需要之資訊。 在記憶部 7 1 5記憶預先製成之遮罩表7 1 6，用以表示被 裝著在遮罩部 5 2之遮罩組，和利用該遮罩組和光學單元 5 8可實現光照射區域9 0之幅度和間距之對應關係。另外， 在記憶部 7 1 5記憶有：焦距表 7 1 7，用以表示光學單元 5 8 312/發明說明書(補件)/93-05/93105519 13 1252379 之倍率和合焦位置之對應關係；從輸入部8輸入之光照射 區域9 0之幅度之設定值（以下稱為「設定幅度」）7 1 8 ;和 間距之設定值（以下稱為「設定間距」）7 1 9。 在照射區域控制部7 1連接有載物台移動機構2，載物台 升降機構3 5，照相機4，快門5 1 2，遮罩滑動機構5 7，光 學單元驅動部5 8 1，遮罩變換器6，和輸入部8，根據來自 照相機4和輸入部8之資訊，照射區域控制部7 1控制該等 之構成，用來調整光照射區域9 0之幅度和間距。 在掃描控制部7 2連接有載物台移動機構2，載物台旋轉 機構3 3，光頭部移動機構5 0 1和快門5 1 2，掃描控制部7 2 控制該等之構成，用來進行對感光材料之光之照射和光照 射區域9 0之掃描。 圖7表示利用圖案描繪裝置1對感光材料之圖案之掃描 動作之流程。首先，操作者從輸入部8輸入設定幅度7 1 8 和設定間距7 1 9，以照射區域控制部7 1接受，將其記憶在 記憶部7 1 5 (步驟S 1 1 )。然後，利用控制部7之控制調整光 照射區域9 0之幅度和間距使其成為與設定幅度7 1 8和設定 間距7 1 9相等（步驟S 1 2 )。 圖8和圖9詳細的表示調整光照射區域9 0之幅度和間距 之動作（步驟S 1 2 )之流程。當接受到設定幅度7 1 8和設定 間距7 1 9時，首先，照射區域控制部7 1根據遮罩表7 1 6， 判斷被裝著在遮罩部 5 2之遮罩組是否可以對應到設定幅 度7 1 8和設定間距7 1 9 (步驟S 1 2 0 )，在不能對應之情況時， 利用照射區域控制部71之控制，使第1遮罩5 3和第2遮 14 312/發明說明書(補件)/93-05/93105519 1252379 罩5 4之至少任一方，與另外一方交換（步驟S 1 2 Ο 1 )。 在交換遮罩時，首先在被裝著於圖1中所示之遮罩部52 之第1遮罩5 3，第2遮罩5 4，和被收納在遮罩變換器6 之遮罩收納部6 1之遮罩中，根據遮罩表7 1 6選擇可以對應 到設定幅度7 1 8和設定間距7 1 9之遮罩之組合。 該選擇之結果，例如，當只有第1遮罩5 3被交換成為另 外一方之遮罩之情況時，利用照射區域控制部7 1之控制， 使圖1中所示之收納部升降機構6 2被驅動，用來使遮罩收 納部61依Z方向移動，成為遮罩收納部61之空間與第1 遮罩保持部5 5相同高度。然後，利用插脫機構6 3從第1 遮罩保持部5 5中取出第1遮罩5 3，將其收納在遮罩收納 部6 1之空間。其次，控制收納部升降機構，使被選擇之遮 罩移動到與第1遮罩保持部5 5面對之高度，利用插脫機構 6 3將該遮罩裝著在第1遮罩保持部5 5。 在只進行第2遮罩5 4之交換之情況時，亦利用收納部升 降機構6 2和插脫機構6 3進行與第1遮罩5 3之情況同樣之 處理。在進行第1遮罩53和第2遮罩54雙方之交換之情 況時，順序的進行該等遮罩之交換。另外，只有第1遮罩 53或第2遮罩54之交換，在變更遮罩組開口 520之幅度 之調整範圍之情況進行，第1遮罩53和第2遮罩54之交 換，在變更遮罩組開口 5 2 0之間距之情況進行。 當遮罩組之準備完成時，利用照射區域控制部7 1控制載 物台移動機構2，使載物台單元3移動用來使被設在支持 板3 4上之照相機4位於光頭部5之正下方（移動後之照相 15 312/發明說明書(補件)/93-05/93105519 1252379 機4和載物台3 2如圖1中之2點鏈線所示）（步驟S 1 2 1 )， 打開快門5 1 2使光開始照射到照相機4 (步驟S 1 2 2 )。利用 此種構成，代替感光材料者，使光照射在照相機4之攝影 面上之光照射區域（與圖5同樣的稱為「光照射區域9 0」）。 其次，照相機4進行攝影，取得表示多個光照射區域9 0 之狀態之圖像（步驟S 1 2 3 )，將圖像資料從照相機4發訊到 照射區域控制部7 1，利用間距檢測部7 1 2之演算處理用來 檢測多個光照射區域9 0之間距（步驟S1 2 4 )。另外，在本 實施形態中，因為間距為一定，所以不需要利用照相機 4 檢測全部之光照射區域 9 0。使檢測結果之間距（以下稱為 「檢測間距」）與被記憶在記憶部7 1 5之設定間距7 1 9進行 比較（步驟S 1 2 5 )，在設定間距7 1 9與檢測間距不相等之情 況時，利用間距控制部7 1 4，根據設定間距7 1 9和檢測間 距，控制光學單元驅動部5 8 1，用來變更光學單元5 8之倍 率藉以變更光照射區域9 0之間距（步驟S 1 2 5 1 )。 當完成間距之調整時，根據光學單元5 8之倍率和焦點表 7 1 7，判斷光學單元5 8之合焦位置是否與照相機4之攝影 面一致（亦即，合焦位置是否與基板 9 上之感光材料一 致）（步驟S 1 2 6 )，在不一致之情況時，利用控制部 7控制 載物台升降機構3 5，使支持板3 4依Z方向移動，用來變 更載物台3 5和倍率變更機構5 8 2 (或光學單元5 8 )之間之距 離（步驟S 1 2 6 1 )。利用此種構成，變更光學單元5 8和感光 材料之間之距離，使光學單元5 8之合焦位置和感光材料之 表面成為一致。另外，即使變更倍率亦可以維持光學單元 16 312/發明說明書(補件)/93-05/93105519 1252379 5 8之照相機4側之離心性，利用載物台3 2之升降使光照 射區域9 0之間距不變。另夕卜，在不使用焦點表71 7時，經 由重複攝影和載物台3 2之升降亦可以進行焦點調整。 在完成間距調整和焦點調整之後，幅度檢測部7 1 1從光 照射區域9 0之圖像中檢測出多個光照射區域9 0之各個之 幅度（步驟S 1 2 7 )。另外，如本實施形態之方式，在各個光 照射區域9 0之幅度為一定之情況時，經由檢測1個之光照 射區域9 0之幅度就可以取得全部之光照射區域9 0之幅度。 然後，使被記憶在記憶部7 1 5之設定幅度7 1 8，和幅度 檢測部7 1 1之檢測結果之各個光照射區域9 0之幅度（以下 稱為「檢測幅度」）進行比較（步驟S 1 2 8 )。’在設定幅度7 1 8 和檢測幅度不相等之情況時，利用幅度控制部 7 1 3之控 制，根據設定幅度7 1 8和檢測幅度，驅動遮罩滑動機構5 7 使第1遮罩53移動，變更遮罩組開口 5 2 0之幅度，藉以調 整光照射區域9 0之幅度（步驟S 1 2 8 1 )。當設定幅度7 1 8和 檢測幅度相等時，使快門 5 1 2閉合，停止光之照射（步驟 S1 29) ° 當完成光照射區域9 0之幅度和間距之調整時，利用掃描 控制部7 2控制載物台移動機構2和光頭部移動機構5 01， 對於載物台3 2，使光頭部5移動到指定之描繪開始位置（圖 7 :步驟S 1 3 )。實質上，載物台3 2移動向（+ X )側，光頭部5 移動向卜Y )側。開始從光頭部5射出光（步驟S 1 4 )，使光 照射在基板9之感光材料上之光照射區域9 0。 然後，載物台 3 2開始移動向圖 1中之（-X )方向（步驟 17 3 12/發明說明書(補件)/93-05/93105519 1252379 S 1 5 )，光照射區域9 0在圖1中之（+ X )方向，以對感光材料 之相對速度為一定速度之方式被掃描，用來使具有設定幅 度和設定間距之條帶狀之多個圖案，被描繪在基板9上之 感光材料。當光照射區域 90 之掃描到達指定之結束位置 時，就停止載物台3 2之移動（步驟S 1 6 )，和停止光之照射 (步驟S 1 7 )。 另外，光之照射之開始（步驟S 1 5 )和載物台3 2之移動之 開始（步驟 S 1 6 )同時進行時，在圖案之開始點近傍之部 位，當曝光量不足，圖案之邊緣之精確度降低之情況，在 步驟S 1 5和步驟S 1 6之間設置適當之間隔，在停止掃描之 狀態進行光之照射。另外，在圖案之結束點近傍亦同樣的， 在載物台3 2之停止移動（步驟S 1 7 )和光之停止照射（步驟 S 1 8 )之間，設置適當之間隔，可以用來提高結束點近傍之 邊緣之精確度。 當完成對感光材料之第1次之掃描時，確認是否要重複 對基板 9 之依相同方向延伸之條帶狀之圖案之掃描（亦 即，有無下一個掃描），在有下一個掃描之情況時，回到步 驟S 1 3，使載物台3 2移動到下一個開始描繪位置，使光之 照射和載物台3 2之移動（步驟S 1 3〜S 1 7 )重複所需要之次 數。光照射區域9 0之掃描時之載物台3 2之移動在（+ X )方 向和（-X )方向交替的進行，在第2次以後之步驟S 1 3，光 頭部移動機構 5 Ο 1使光頭部 5向（+ Y )方向移動指定之距 離，用來使光頭部5移動到開始描繪位置。 當在基板9上之感光材料全體描繪有條帶狀之圖案時， 18 3 12/發明說明書(補件)/93-05/93105519 1252379 就結 料為 描 殘留> 況，J (亦即 布，丨 G (綠： 驟，j 圖 行。 底之 在 個方 交之 動載 基板 S1 91 射區 在 調整 物台 重複 圖案 束利用圖案描繪裝置！之描緣動作 彩色抗钱劑之情況時， ，感光材 B ^ ^ κ 丁圖7中之步驟S19。 、，、曰有圖案之基板9從 q水钿繪裝置1搬出， 美妬q L 、 阳和另外被顯像， 土 上之感光材料成為势备、、愈口口 4 π色過濾為之副圖f。在此鍤哞 或光材料一如 口 I在此種情 奴使用負型之彩色抗蝕劑 ，祜# 077 6, ”、、貝^時使曝光部份 被“射之部份）殘留。然後，重複進… 圓案描繪裝置！…4 是進仃彩色抗姓劑之塗 攻置1之描繪，和顯像，在基 >、轳Γ R、+ 上形成R (紅）、 五（β)之3色之副圖素。另外，經由來 吏美柘Q Λ、 ^成透明電極等之步 更丞扳9成為被使用在液晶顯示裝置之 /已過遽器。 7中之步驟S1 9是在基板9上描繪袼…° 其具體例是當圖案描繪裝置i使 〜《圖案時Α 描繪時實行。 在-色過渡器之黑 描繪格子狀圖案之情況，當利用步 死bll〜S18完成工 向之條帶狀之圖案之描繪時，確認在 &與插繪過圖案正 方向’有無圖案之描繪（步驟s 1 9 )，糾 〜用控制部7驅 物台旋轉機構3 3，以垂直於被保持 于在載物台單元3之 9之主面之軸作為中心，使載物台 以$疋轉g 〇。（步驟 )。利用此種構成，對於基板9上之4止& 、 4先材料，使光照 域9 0之掃描方向相對的變更9 0。。 掃描方向變更後，使載物台單元3 光照射區域9 0之幅度和間距（步驟 3 2移動到開始掃描位置，使描繪條 移動到攝影位置， S 1 2 )，然後，使载 帶狀之圖案之動作 所需要之次數（步驟S 1 3〜S 1 8 )。依昭 …、上述之方式，在 描繪裝置1，經由使载物台3 2旋轉，开 了以用來在基板 312/發明說明書(補件)/93-05/93105519 19 1252379 9上之感光材料描繪格子狀之圖案。 以上所說明者是第1實施形態之圖案描繪裝置1，在該 圖案描繪裝置1中，當與先前技術之光栅方式比較，因為 使光照射在大面積之多個光照射區域9 0，所以可以以高速 進行描繪。另外，經由變更利用第1遮罩5 3和第2遮罩 5 4形成之遮罩組開口 5 2 0之幅度，利用光學單元5 8使光 照射區域9 0擴大或縮小，可以很容易變更被描繪之圖案之 幅度和間距。利用此種構成，可以以高分解能力，高速的（亦 即，以短時間）描繪條帶狀（或格子狀）之圖案。 例如，當以1 // m之分解能力在1邊為1 m之正方形之基 板上，描繪幅度為2 0至3 0 // m，間距為3 0 0至1 5 0 0 // m之 條帶狀之圖案時，在光栅方式只掃描1個之光射束，由於 光射束之調變速度之限制，描繪需要長時間，即使排列多 個光頭，亦不能確保充分之空間。在本實施形態之圖型描 繪裝置 1中，例如，將多個光照射區域 9 0排列在 1 0 0 m m 幅度之範圍内，可以以數十秒描繪上述條帶之圖案。 另外，在圖案描繪裝置1根據對光照射區域9 0攝影所獲得之資 料，和預先輸入之設定幅度71 8和設定間距7 1 9，可以自動的調 整光照射區域9 0之幅度和間距（亦即，被描繪之圖案之幅度和間 距）。另外，利用遮罩變換器6交換遮罩，可以使可描繪之圖案之 幅度和間距之範圍擴大，可以提高描繪之自由度。 圖1 0表示第2實施形態之圖案描繪裝置之遮罩部5 2， 圖案描繪裝置之遮罩部5 2 a以外之構造與圖1相同。另外， 在圖1 0中，以下所說明之第1遮罩保持部5 5 a和第1開口 20 312/發明說明書(補件)/93-05/93105519 1252379 5 3 1 a以粗線表示。 遮罩部52 a具有2個遮罩，在圖10中之Y方向（亦即， 光照射區域之掃描方向之正交方向），以一定間距排列和形 成具有相同幅度和長度之矩形之開口群（以下稱為「開口 行」），該開口行在X方向（亦即，光照射區域之掃描方向） 排列有多個。在以下之說明中，從接近光射出部5 1者起， 順序的稱為「第1遮罩5 3 a」，「第2遮罩5 4 a」。另夕卜，遮 罩部 5 2 a具有：第1遮罩保持部 5 5 a，用來保持第1遮罩 53a;第2遮罩保持部56a，用來保持第2遮罩54a;遮罩 滑動機構5 7 a，用來使第1遮罩5 3 a對第2遮罩5 4 a在Y 方向進行相對移動；和遮罩位置變更機構5 9，用來使第1 遮罩53a和第2遮罩54a依X方向移動。 如圖1 0所示，第1遮罩5 3 a和第2遮罩5 4 a分別具有3 行（亦可以為2行或4行）之開口行，當使2個遮罩之對應 之開口行間進行比較時，與圖4之遮罩組同樣的，開口之 長度和幅度在第1遮罩5 3 a較大，開口間距則相等。另外， 當使1個遮罩中之開口行間進行比較時，構成開口行之開 口之幅度和/或間距互不相同。 第2遮罩54 a接合在第1遮罩53a，使其開口（以下稱為 「第2開口」）5 4 1 a重疊在對應之第1遮罩5 3 a之開口（以 下稱為「第1開口」）5 3 1 a。在遮罩部5 2 a，第1開口 5 3 1 a 和第2開口 541a之重疊區域成為實際之光通過區域之遮罩 組開口 5 2 0 a (在圖1 0中附加有平行斜線）。另外，與第1實 施形態同樣的，第2遮罩5 4 a對第1遮罩5 3 a不一定有實 21 31W發明說明書(補件)/93-05/93105519 1252379 體上之抵接，亦要光學式的重疊即可。 遮罩滑動機構5 7 a具有：滑動框架 5 7 1 a，用來保持第1 遮罩保持部5 5 a和第2遮罩保持部5 6 a ;滑動用馬達5 7 2 a， 作為驅動源；和螺桿機構5 7 3 a，連接到滑動用馬達5 7 2 a ; 當利用控制部7之控制，以滑動用馬達5 7 2 a驅動螺桿機構 5 7 3 a，用來使第1遮罩保持部5 5 a沿著滑動框架5 7 1 a依Y 方向移動。利用此種構成，被保持在第1遮罩保持部5 5 a 之第1遮罩53a依Y方向移動，用來變化第1開口 531a 和第 2 ,開口 5 4 1 a之重疊狀態，藉以變化各個遮罩組開口 5 2 0 a之幅度。另外，利用圖中未顯示之機構，在第1遮罩 保持部5 5 a之移動期間，使第1遮罩5 3 a和第2遮罩5 4 a 互相離開。 遮罩位置變更機構5 9具有：滑動框架保持部5 9 1，用來 保持滑動框架5 7 1 a ;遮罩位置變更用馬達5 9 2 ;螺桿5 9 3， 連接到遮罩位置變更用馬達5 9 2 ;螺母5 9 4，被固定在滑動 框架5 7 1 a ;和引導軌5 9 5 ;當利用控制部7使被遮罩位置 變更用馬達 5 9 2驅動之螺桿 5 9 3 進行旋轉時，滑動框架 5 7 1 a就與螺母5 9 4 —起沿著引導軌5 9 5依X方向進行移動。 在第2實施形態之圖案描繪裝置，在描繪圖案時，只使 用 1 個之開口行。所使用之開口行被配置在光射出部 51 之鉛直下方，利用遮罩位置變更機構5 9使第1遮罩 5 3 a 和第2遮罩5 4沿著X方向進行移動。在即使使用任何一個 之開口列，亦未實現設定幅度和設定間距之情況時，與第 1實施形態同樣的，進行第1遮罩5 3 a和/或第2遮罩5 4 a 22 312/發明說明書(補件)/93-05/93105519 1252379 之交換。 第2實施形態之圖案描繪裝置之動作，除了追加所使用 之開口行之決定和定位外，其他部份與第 1實施形態相 同。亦即，利用光學單位5 8，載物台升降機構3 5 (參照圖 1 )和遮罩滑動機構 5 7 a，以所使用之開口行之遮罩組開口 5 2 0 a調整光照射區域之幅度和間距，然後，使條帶狀之多 個圖案之描繪重複進行所需要之次數。 在第2實施形態之圖案描繪裝置中，因為利用第1遮罩 5 3 a和第 2遮罩 5 4 a準備具有不同幅度和間距之多個開口 行，進行所使用之開口行之選擇，所以可以減少使第1遮 罩5 3 a和/或第2遮罩5 4 a，與其他遮罩之交換次數。其結 果是可以迅速的因應多種之圖案之描繪。 其次說明第3實施形態之圖案描繪裝置。第3實施形態 之圖案描繪裝置是使用脈波雷射用以代替圖1所示之圖案 描繪裝置1中之水銀燈5 1 3和快門5 1 2，其中之載物台旋 轉機構3 3被省略。其他之基本構造與圖1相同，在以下之 說明中附加相同之元件符號。在第3實施形態中，在載物 台單位3設有雷射測定長度等之高精確度之載物台位置測 定機構，控制部7接受來自載物台位置測定機構之信號， 用來控制脈波雷射藉以使載物台 32 之移動和光照射之 ΟΝ/OFF 同步。 利用脈波雷射作為光源，脈波描繪裝置可以以短時間（1 奈秒至數十奈秒）之光照射在感光材料。在基板9上之欲描 繪圖案之位置通過光照射區域時，來自控制部7之信號被 23 312/發明說明書(補件)/93-05/93105519 1252379 發訊到脈波雷射之驅動電路，利用此種構成可以實現圖11 所示之實例之配合光照射區域之形狀之多個矩形之圖案 9 1之描繪。另夕卜，與第1實施形態同樣的，當描繪條帶狀 之圖案時，使載物台3 2移動用來連續重複進行來自脈波雷 射之脈波光之射出。 另外，代替第1遮罩53和第2遮罩54者，在掃描方向 之垂直方向準備長縫隙狀之遮罩，與載物台3 2之移動同步 的，使脈波雷射瞬間進行 Ο N，可以用來在基板 9上之感 光材料描繪依掃描方向之垂直方向延伸之條帶狀之圖案。 其結果是經由重複進行使依掃描方向（X方向）延伸之條帶 狀之多個圖案之描繪，矩形圖案描繪，和依掃描方向之垂 直方向（Y 方向）延伸之條帶狀之多個圖案之描繪，朝向載 物台3 2之X方向移動（和依光頭部5之Y方向移動），可 以在感光材料上描繪多樣之圖案。例如，可以進行圖 12 所示之複雜形狀之黑底92之描繪。 依照此種方式，在第3實施形態之圖案描繪裝置中，因 為設有使光之照射高速進行〇N / 0 F F之光源，控制成光源 與載物台3 2之移動同步，所以可以高速的描繪各種規則之 圖案。另外，與第1實施形態同樣的，因為利用2個之遮 罩可以很容易以高精確度變更多個之光照射區域之幅度或 間距，所以在欲描繪之圖案之幅度或間距有變更之情況 時，亦可以很容易因應。 在第1至第3實施形態中，所示之實例是在彩色過濾器 之製造時所進行之圖案描繪，但是本發明之圖案描繪裝置 24 312/發明說明書(補件)/93-05/93105519 1252379 因為可以以高速描繪條帶狀或規則之各種圖案，所以本發 明亦可以適用在求得此種圖案之描繪之各種扁平面板顯示 裝置之製造之其他各種步驟。 以上已說明本發明之實施形態，但是本發明並不只限於 上述之實施形態，而是可以有各種變更。 例如，第1遮罩和第2遮罩之第1開口和第2開口之幅 度和長度並不只限於圖4和圖1 0所示之實例，亦可以使第 2開口變大，亦可以使第1開口和第2開口相等。另夕卜， 各個遮罩之開口形狀並不只限於矩形，只要是沿著光照射 區域之掃描方向之邊緣互相平行之開口 ，就可以適當的描 繪條帶狀之圖案。另外，亦可以配合被描繪之圖案，使遮 罩組開口之幅度或間距成為一定。 圖1 3表示被使用在圖案描繪裝置1之遮罩之另一較佳實 例。第1遮罩5 3 b和第2遮罩5 4 b成為梳齒狀，經由使相 當於排列和形成在圖1 3中之Y方向（掃描方向之垂直方向） 之梳齒之間隙之光通過區域重疊，亦可以形成附加平行斜 線所示之遮罩組開口 5 2 0b。 另夕卜，如圖1 4所示，第1遮罩5 3 c (圖中以粗線表示）和 第2遮罩54c亦可以設置成為光通過區域之間隙，排列依 Y方向排列之多個矩形之板。另外，當第1遮罩53c之間 隙和第2遮罩 5 4 c之間隙重疊，遮罩組開口 5 2 c (在圖1 4 中附加平行斜線）於X方向較長之情況時，從光射出部5 1 射出之光成為光束剖面在Y方向較長之線狀光。 亦可以使第1遮罩對第2遮罩相對的移動，代替第1遮 25 31万發明說明書(補件)/93-05/93105519 1252379 罩者亦可以使第 2 遮罩移動，亦可以使該兩個遮罩 動。另夕卜，第1遮罩和第2遮罩之相對移動亦可以由 者以手動進行，使照相機4所取得之圖像映出在監視 照相機4不一定要設在支持板3 4上，亦可以使被固 載物台單位3之外部之光頭部5移動到照相機4之上 另外，光照射區域之攝影亦可以不是使光直接照射在 等之攝影裝置，而是對指定之照射範圍間接的進行攝 另外，光照射區域之幅度或間距之檢測亦可以利用排 掃描方向之垂直方向之1次元之受光元件陣列進行檢 被輸入到輸入部8之設定值，假如可以實質上表示 射區域之幅度和間距時，例如，亦可以輸入幅度或間 和幅度對間距之比。或是經由輸入基板9之型式亦可 用控制部指定幅度和間距。 在第1實施形態中是經由使載物台3 2旋轉9 0 °可 來描繪格子狀之圖案，但是亦可以在互相正交之方向 2組光頭部 5用來進行條帶狀之圖案之描繪。在此種 成為不需要載物台旋轉機構3 3。 在上述實施形態中所述者是使用負型之感光材料， 亦可以使用正型之感光材料，在顯像時除去曝光部份 外，感光材料亦可以使用與顯像步驟無關之其他種類 另外，如上所述，本發明之圖案描繪裝置特別適於 在扁平面板顯示裝置（液晶顯示裝置，電漿顯示裝置， E L顯示裝置等）之各種面板之製造，但是亦可以適用 導體基板或印刷布線基板，或光罩用之玻璃基板等之 312/發明說明書(補件)/93-05/93 ] 05519 均移 作業 器。 定在 方。 CCD 影。 列在 測。 光照 距， 以利 以用 設置 情況 但是 。另 者。 使用 有機 在半 規則 26 1252379 性微細圖案之描繪。 上面已經詳細的描述和說明本發明，但是上述之說明只 作舉例之用，而非限制者。因此，在不脫離本發明之範圍 内，可以有多種變化或態樣當可理解。 【圖式簡單說明】 圖1為顯示第1實施形態之圖案描繪裝置之構造圖。 圖2為顯示第1遮罩之圖。 圖3為顯示第2遮罩之圖。 圖4為顯示遮罩部之構造圖。 圖5為顯示光照射區域之一部份之圖。 圖6為顯示控制部之構造和控制資訊之流程之概念圖。 圖7為顯示圖案之描繪動作之流程圖。 圖8和圖9為顯示調整光照射區域之幅度和間距之動作 之流程圖。 圖1 0為顯示第2實施形態之圖案描繪裝置之遮罩部之示 意圖。 圖1 1和圖1 2為顯示被描繪之圖案之實例圖。 圖1 3為顯示遮罩之另一實例圖。 圖1 4為顯示遮罩之更另一實例圖。 (元件符號說明） 1 圖案描繪裝置 2 載物台移動機構 3 載物台單元 4 照相機 5 光頭部 27 312/發明說明書(補件)/93-05/93105519 1252379 6 遮 罩 變 換 器 7 控 制 部 8 m 入 部 9 基 板 11 基 台 12 框 架 21 馬 達 22 螺 桿 23 螺 母 24 引 導 軌 32 載 物 台 33 載 物 台 旋 轉 機 構 34 支 持 板 35 載 物 台 升 降 機 構 36 基 座 板 50 光 頭 支 持 部 5 1 光 射 出 部 52 遮 罩 部 52a 遮 罩 部 5 2c 遮 罩 組 開 π 53 第 1 遮 罩 53a 第 1 遮 罩 53b 第 1 遮 罩 53c 第 1 遮 罩 54 第 2 遮 罩 54a 第 2 遮 罩 54b 第 2 遮 罩 54c 第 2 遮 罩 55 第 1 遮 罩 保 持 部1252379 发明Invention Description: TECHNICAL FIELD The present invention relates to a technique for patterning a photosensitive material that illuminates light on a substrate. [Prior Art] The method of drawing a pattern in the prior art is to irradiate light on a half substrate or a printed circuit board, or a plasma display device, a glass substrate for a liquid crystal display photomask, or the like (hereinafter referred to as "substrate"). The photosensitive material is transferred to the light material by a proximity exposure method, a stepwise exposure method, or the like. In the proximity exposure mode, a mask corresponding to the pattern to be drawn is opened to the substrate of the same size as the substrate, and the photosensitive material for collective transfer onto the substrate is irradiated with light. In the stepwise exposure mode, the projection of the mask pattern and the movement of the mask pattern are repeated for drawing the pattern in the entirety. On the other hand, the method of drawing without using a mask proposes a method of direct description (hereinafter referred to as "straight-drawing method"), as shown in the Japanese Patent Laid-Open Publication No. 5 - 1 0 0 1 7 5 The light beam is simultaneously illuminated on the photosensitive material. In recent years, in the market for panels such as flat panel display devices or color filters, there has been a strong demand for an accurate pattern of the substrate to be drawn and an increase in the size of the substrate. In the proximity exposure mode in which the mask pattern is transferred together in the material, since the mask and the substrate are brought close to each other, it is necessary to respond to the high precision of the pattern or the enlargement of the substrate, 312/invention specification (supplement) /93-05/93105519 The high-sensitivity light mask 5 1252379, which is drawn on the conductor, and on the sensory edge of the pattern, is turned into a high price. Further, in the proximity exposure mode and the step exposure mode, there is a drawback in that the distance or the amplitude of the pattern to be drawn cannot be elastically changed. In the direct drawing mode, it is generally a raster method, and a small point (pixel) is used to represent a pattern, and a pattern is drawn in units of dots, but it is necessary to improve the decomposition ability of the drawing device in response to the high precision of the pattern (even if The area of one dot becomes small.) The time required to draw a pattern on a large substrate is increased. A countermeasure against shortening the drawing time is to increase the number of scanned light beams and increase the number of dots to be drawn. However, as the light beam increases, the light irradiation mechanism is enlarged, which causes the cost of the manufacturing apparatus. Rise. In particular, with the miniaturization and high precision of the pattern, it is physically difficult to configure the necessary number of optical heads. SUMMARY OF THE INVENTION An object of the present invention is to provide a pattern drawing device for drawing a photosensitive material on a substrate, which can draw a pattern at high speed with high decomposition energy. The pattern drawing device of the present invention includes: a light source; a holding portion for holding a substrate for guiding light from the light source; and a first mask disposed on the light path of the light from the light source for passing the plurality of light a light passing region is arranged and formed in a predetermined direction; the second mask is optically overlapped with the first mask, and a plurality of second light passing regions are formed, respectively corresponding to the plurality of first light passing regions; a mask moving mechanism that relatively moves the first mask to the second mask in a predetermined direction; and an irradiation area moving mechanism for sequentially passing the plurality of first light passing regions and the plurality of second light passing regions , 6 312 / invention specification (supplement) / 93-05/93105519 1252379 a plurality of light irradiation regions irradiated on the photosensitive material, the photosensitive material is relatively opposed in a scanning direction orthogonal to the arrangement direction of the plurality of light irradiation regions mobile. In the present invention, by using the first and second masks and moving the first mask relative to the second mask, various regular patterns can be drawn on the photosensitive material at a high speed. In a preferred embodiment of the present invention, the width of the plurality of light irradiation regions in the predetermined direction is the same, and the interval between the plurality of light irradiation regions is constant, and the pattern drawing device further includes: a detecting portion for detecting The amplitude of the predetermined direction of each of the plurality of light irradiation regions; the driving portion for driving the mask moving mechanism; and the mask movement control portion for controlling the driving portion based on the detection result of the detecting portion. The amplitude of the pattern can be automatically changed by detecting the amplitude of the pattern by the detecting portion. Further, in the preferred embodiment, the pattern drawing device further includes an optical system, and is disposed between the second mask and the holding portion to optically couple the second mask and the photosensitive material. Further, it is preferable that the optical system includes a magnification changing mechanism for expanding or reducing a plurality of light irradiation regions, and the pattern drawing device further includes: a detecting portion for detecting an interval between the plurality of light irradiation regions; and a driving portion; The driving rate changing mechanism is used to drive the magnification changing unit; and the magnification control unit is configured to control the driving unit based on the detection result of the detecting unit. The pattern pitch can be automatically detected by detecting the distance between the patterns by the detecting portion. The pattern drawing device may further include an exchange mechanism for exchanging at least one of the first mask and the second mask with the other mask. With this configuration, the range of the width and spacing of the drawable pattern can be further expanded by the invention specification (supplement)/93-05/93105519 1252379. Further, the pattern drawing device may further include an irradiation control unit that controls the irradiation of the light of the material in synchronization with the movement of the plurality of light irradiation regions, or has a changing mechanism to hold the holding portion. The vertical axis of the surface on the substrate is centered, and the rotation is maintained to relatively change the scanning direction of the photosensitive material. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows a pattern drawing device 1 according to a first embodiment of the present invention, which is described in detail with reference to the accompanying drawings. FIG. Made. The pattern drawing device 1 draws a plurality of strips on the material (on the present embodiment, a color resist) on the substrate 9 by irradiating light onto the glass substrate 9 for a liquid crystal display device (hereinafter simply referred to as "substrate 9"). Strip case. The substrate 9 on which the pattern is drawn is finally colored through the subsequent steps to form a color filter of the component of the display device. In the pattern drawing device 1, the stage 1 is provided on the base 1 and the substrate moving mechanism 2 is used to hold the substrate 3 of the holding substrate 9 along the main surface of the substrate 9. The X-direction moving base 11 in Fig. 1 is fixed with a frame 12 so as to straddle the stage unit 3, and the frame 1 2 is mounted with an optical head 5 and a mask converter 6. The stage moving mechanism 2 is constructed such that the screw 22 is connected to the motor and the nut 2 3 to be fixed to the stage unit 3 is mounted on the screw 2 2 . The guide rail 24 is fixed above the screw 2 2 when the motor 21 is The rotation nut 23 and the stage unit 3 are smoothly moved in the X direction along the guide holder 24. 312/Inventive Manual (Supplement)/93-05/93105519 The photoreceptor of the glass sensitized by the light-sensing part is the liquid engine. In box 21, . At the time, the shift 8 1252379 stage table 70 3 has a stage 32 for directly holding the substrate 9 and a stage rotating mechanism 33 'centered on the axis of the main surface of the vertical substrate 9 The stage 32 is rotated; the support plate 34 is configured to support the stage 32 to be rotatable; and the stage elevator 35 is used to move the support plate 34 in the z direction of the figure. The seat plate 3 6 ' is used to hold the stage lifting mechanism 35; the disk holder 23 is directly fixed to the base plate 36. Further, on the support plate 34, a camera 4' is used to receive the light from the optical head 5 S? by using a two-dimensional array of photographic apparatus. In addition, the front surface of the phase 284 is the same as the surface of the photosensitive material on the substrate. The portion moving mechanism 501 is used to make the head portion 5 have: the head support portion 5〇 , used to support the head 5; the Y direction in the optical head (that is, according to the light head 5 to the stage unit 3 < Moving in the direction orthogonal to the direction of movement); Light exit portion 5 1, For emitting light toward the alpha-based substrate 9 toward its alpha; Mask portion 5 2, Having a plurality of openings arranged to form 2, 遮Two masks (the following is from the side close to the light exiting 呷 51, It is called the first mask 53, Second mask 54); The optical unit 58°' is used to enlarge or reduce the irradiation area of the light irradiated onto the substrate 9 through the mask portion 52; And the optical unit drive # 581 1 to drive the magnification change mechanism 5 8 2 prepared by the optical unit. The optical head moving mechanism 5 () 1 is used to move the optical head 5 in the γ direction along the guide rail 5〇3 by the drive screw mechanism ' of the motor. Using the optical unit 58, The second mask 54 (or the mask portion 52) is optically paired with the photosensitive material ′ in the present embodiment. The magnification of the optical unit 58 is changed by a specified range including the equal magnification. The light emitting portion 5 is connected to the mercury lamp 513 via the optical fiber 511 and the shutter 512 (for performing ΟΝ/OFF of the light irradiated to the photosensitive material). The light from the mercury lamp 5 312 / invention manual (supplement) / 93·05/93105519 1252379 passes through the first mask 53 and the second mask 54 disposed on the optical path emitted from the light emitting portion 51 (hereinafter, In the case where two of the first mask and the second mask are in one group, it is called an "mask group". It is guided to the substrate 9 via the optical unit 58. The mask converter 6 has: Mask storage unit 6 1, Used to accommodate multiple masks; Storage unit lifting mechanism 6 2, Used to move the mask housing portion 6 1 in the Z direction; And 2 plug-in mechanisms 6 3, The mask accommodated in the mask housing portion 61 is attached to the mask portion 5 2, Or remove the mask that is attached to the mask portion 52. Stage moving mechanism 2, Stage unit 3, Camera 4, Shutter 5, Optical head moving mechanism 5 0 1, Mask portion 5 2, Both the optical unit 58 and the mask converter 6 are connected to the control unit 7, These components are controlled by the control unit 7, The pattern drawing device 1 performs drawing of the pattern on the substrate 9. In addition, An input unit 8 is connected to the control unit 7, The amplitude of the Y direction of each of the plurality of light irradiation regions on the substrate 9 (i.e., The arrangement of the openings of the first mask 5 3, the magnitude of the direction, Hereinafter referred to as "amplitude"), And the interval between the plurality of light irradiation regions (ie, The distance from the center of each light irradiation region to the center of the adjacent light irradiation region, The following is called the "pitch"). The operator inputs the control unit 7 via the input unit 8. Figure 2 shows the first mask 5 3, FIG. 3 shows the second mask 54. In the first mask 53, The first opening 531 of the plurality of light passage regions through which light passes is arranged and formed in the Y direction of Fig. 2 . The second opening 54 is arranged and formed with a second opening 5 4 1 of a plurality of light passing regions corresponding to the plurality of first openings 531. The first opening 5 3 1 and the second opening 5 41 are rectangular in shape. Opening 10 312 / invention specification (supplement) / 93-05 / 93105519 1252379 length (ie, The first opening 5 3 1 and the second opening 5 4 1 are arranged in the direction of the orthogonal direction of the J direction and the amplitude (that is, The amplitude of the arrangement direction of the first opening 5 3 1 and the second opening 5 4 1), The first opening 5 3 1 is larger than the second opening 5 41. In addition, The first opening 5 3 1 has the same magnitude, And spacing (ie, The distance from the center of each of the first openings 5 3 1 to the center of the adjacent first opening 5 3 1 is also constant. same, Each of the second openings 5 4 1 is also equal in amplitude and spacing. The distance between the second opening 5 4 1 and the first opening 5 3 1 are equal. FIG. 4 shows the configuration of the mask portion 52. The mask portion 52 has: The first mask holding portion 5 5, Used to hold the first mask 5 3 ; Second mask holding portion 5 6, Used to maintain the second mask 5 4 ; And mask sliding mechanism 5 7, Used to make the first mask 5 3 in the Y direction in FIG. 4 (ie, The arrangement of the first opening 5 3 1 and the second opening 5 41 is shifted. In addition, In Figure 4, The first mask holding portion 5 5 and the first opening 5 3 1 are indicated by thick lines. The first mask 5 3 and the second mask 5 4 are connected via the insertion and removal mechanism 6 3 (refer to FIG. 1 ). From the (+X) side shown in Figure 4 toward the (-X) direction, They are attached to the first holding unit 55 and the second holding unit 56, respectively. The second mask 54 is joined to the first mask 53 so that each of the second openings 541 is overlapped with the corresponding first opening 531. Using this composition, The overlapping area of the first opening 5 3 1 and the second opening 5 4 1 (indicated by an additional parallel oblique line in Fig. 4) becomes the same amplitude. The first opening 531 and the second opening 541 are arranged at equal intervals. The light from the light emitting portion 5 1 (see Fig. 1) passes through the first opening 5 3 1 and the second opening 5 41, a photosensitive material that is guided onto the substrate 9, A plurality of light irradiation regions having a shape and a pitch corresponding to the region 520 are irradiated. In the following description, The actual light passage 11 312 / invention specification (supplement) / 93-05 / 93105519 1252379 area 5 2 0 is called "mask group opening". In addition, The second mask 54 does not necessarily have to physically contact the first mask 53. It is also possible to have only optical overlap. E.g, 1st mask 5 3, The second mask 5 4 can also leave away from the portion of the depth of focus (for example, Number / / m degree), Individual configurations are in the optical pairing position. The mask sliding mechanism 57 has a sliding frame for holding the first mask holding portion 55. Sliding motor 5 7 2, And a screw mechanism 5 7 3 connected to the sliding motor 5 7 2, When the sliding motor 5 7 2 is driven by the screw mechanism 5 7 3 by the control of the control unit 7, The first mask holding portion 5 5 moves in the Y direction along the slide frame 517. As a result, the first mask 5 3 held by the first mask holding portion 55 also moves in the Y direction. The overlapping state of the first opening 5 31 and the second opening 5 4 1 is changed, Change the amplitude of the mask group opening 5 2 0, The amplitude of the light-irradiated area on the substrate 9 also changes. At this time, Because the distance between the mask group openings 5 2 0 is unchanged, Therefore, only the amplitude of the mask group opening 5 2 0 changes the ratio of the amplitude of the mask group opening 5 2 0 (the region where the light does not pass). Not shown in the figure, A clutch mechanism is provided between the first mask holding portion 55 and the second mask holding portion 56. While the first mask holding unit 55 is moving, The second mask holding portion 56 is slightly lowered. The first mask 5 3 and the first mask 5 4 are separated from each other. Such a configuration is used to prevent damage or dust from occurring between the first mask 5 3 and the second mask 54. Fig. 5 shows a portion of a plurality of light irradiation regions 90 formed on the photosensitive material of the substrate 9. The plurality of light irradiation regions 90 correspond to the mask group opening 5 2 0 (refer to FIG. 4 ), respectively. The amplitudes of the plurality of light irradiation regions 90 are the same. 12 312 / invention manual (supplement) / 93-05 / 93105519 1252379 and the spacing is also certain. As shown above, The amplitude and pitch of the light-irradiating area 90 are enlarged or reduced by the optical unit 58 having the magnification changing mechanism 582. The optical unit 58 is disposed between the second mask 54 and the stage unit 3 shown in Fig. 1. E.g, The control unit 7 controls the optical unit driving unit 581, When the magnification of the optical unit 58 is increased, The light irradiation region 90 is changed from the state shown by the solid line in Fig. 5 to the state shown by the two-dot chain line. Figure 6 is a block diagram, A flow for indicating the configuration of the control unit 7 and the information related to the control. Various functions of the control unit 7, In fact, its implementation is to use the C P U that is processed according to the program. Memory, Dedicated calculus circuit, And interface, etc. The main components of the control unit 7 have: Irradiation area control unit 7 1, Used to control the amplitude and spacing of the light irradiation region 90; And a scan control unit 7 2, It is used to control the scanning of the light-irradiating area 9 Q of the photosensitive material on the substrate 9. The irradiation area control unit 7 1 has: Amplitude detecting unit 7 1 1, According to the image signal from the camera 4, For detecting the amplitude of each of the plurality of light irradiation regions 90; Spacing detection unit 71 2, Used to detect the spacing; Amplitude control unit 7 1 3, Used to control the amplitude of the light irradiation area 90; Pitch control unit 7 1 4, Used to control the spacing; And the memory department 7 1 5, It is used to store the information needed to adjust the amplitude and spacing of the light-irradiated area 90. In the memory section 7 1 5 memory pre-made mask table 7 1 6, Used to indicate the mask group that is mounted in the mask portion 5 2 , The correspondence between the amplitude and the pitch of the light irradiation region 90 can be achieved by using the mask group and the optical unit 58. In addition, In the memory department 7 1 5 memory has: Focal length table 7 1 7, Used to indicate the correspondence between the magnification and the focus position of the optical unit 5 8 312 / invention specification (supplement) / 93-05 / 93105519 13 1252379; The set value of the amplitude of the light irradiation region 90 input from the input unit 8 (hereinafter referred to as "set amplitude") 7 1 8 ; And the setting value of the pitch (hereinafter referred to as "set pitch") 7 1 9 . The stage moving mechanism 2 is connected to the irradiation area control unit 7 1 . Stage lifting mechanism 3 5, Camera 4, Shutter 5 1 2, Mask sliding mechanism 5 7, Optical unit drive unit 5 8 1, Mask converter 6, And the input unit 8, Based on information from the camera 4 and the input unit 8, The irradiation area control unit 71 controls the constitution of the elements, It is used to adjust the amplitude and spacing of the light irradiation area 90. A stage moving mechanism 2 is connected to the scan control unit 72, Stage rotation mechanism 3 3, The optical head moving mechanism 5 0 1 and the shutter 5 1 2, The scan control unit 7 2 controls the composition of the components, It is used to perform illumination of the light of the photosensitive material and scanning of the illumination area 90. Fig. 7 shows the flow of the scanning operation of the pattern of the photosensitive material by the pattern drawing device 1. First of all, The operator inputs the set amplitude 7 1 8 and the set pitch 7 1 9 from the input unit 8. Accepted by the irradiation area control unit 71, It is memorized in the memory unit 7 15 (step S 1 1 ). then, The amplitude and pitch of the light irradiation region 90 are adjusted by the control of the control unit 7 so as to be equal to the set width 7 1 8 and the set pitch 7 1 9 (step S 1 2 ). Fig. 8 and Fig. 9 show in detail the flow of the operation of adjusting the amplitude and the pitch of the light irradiation region 90 (step S1 2 ). When the set amplitude 7 1 8 and the set pitch 7 1 9 are accepted, First of all, The irradiation area control unit 7 1 according to the mask table 7 1 6 It is judged whether or not the mask group mounted in the mask portion 5 2 can correspond to the set width 7 1 8 and the set pitch 7 1 9 (step S 1 2 0 ), In the case that it cannot be matched, By the control of the irradiation area control unit 71, At least one of the first mask 5 3 and the second mask 14 312 / invention manual (supplement) / 93-05 / 93105519 1252379 cover 5 4, Exchange with the other party (step S 1 2 Ο 1 ). When exchanging masks, First, in the first mask 53 attached to the mask portion 52 shown in Fig. 1, 2nd mask 5 4, And being housed in the mask of the mask housing portion 61 of the mask converter 6, A combination of masks that can correspond to the set amplitude 7 1 8 and the set pitch 7 1 9 are selected according to the mask table 7 1 6 . The result of this choice, E.g, When only the first mask 5 3 is exchanged for the other side of the mask, By the control of the irradiation area control unit 71, The accommodating portion elevating mechanism 6 2 shown in Fig. 1 is driven, Used to move the mask receiving portion 61 in the Z direction. The space that becomes the mask housing portion 61 is the same height as the first mask holding portion 55. then, The first mask 5 3 is taken out from the first mask holding portion 55 by the insertion and removal mechanism 63, This is stored in the space of the mask housing portion 61. Secondly, Control the lifting mechanism of the storage unit, Moving the selected mask to a height facing the first mask holding portion 55, The mask is attached to the first mask holding portion 55 by the insertion and removal mechanism 6.3. When only the exchange of the second mask 5 4 is performed, The same processing as in the case of the first mask 5 is performed by the accommodating portion lifting mechanism 6 2 and the detaching mechanism 6 3 . When the exchange between the first mask 53 and the second mask 54 is performed, The exchange of such masks is performed sequentially. In addition, Only the exchange of the first mask 53 or the second mask 54 is When the adjustment range of the amplitude of the mask group opening 520 is changed, The first mask 53 and the second mask 54 are exchanged, In the case of changing the distance between the opening of the mask group 5 2 0. When the preparation of the mask group is completed, The stage moving mechanism 2 is controlled by the irradiation area control unit 71, The stage unit 3 is moved to position the camera 4 provided on the support plate 34 directly below the optical head 5 (moving camera 15 312 / invention manual (supplement) / 93-05/93105519 1252379 The machine 4 and the stage 3 2 are as shown by the 2-point chain line in Fig. 1 (step S 1 2 1 ), Opening the shutter 5 1 2 causes the light to start to be irradiated to the camera 4 (step S 1 2 2 ). Using this composition, In place of photographic materials, The light irradiation region (the same as that of Fig. 5 is referred to as "light irradiation region 90") is irradiated with light on the imaging surface of the camera 4. Secondly, The camera 4 performs photography, Obtaining an image indicating the state of the plurality of light irradiation regions 90 (step S 1 2 3 ), The image data is sent from the camera 4 to the illumination area control unit 7 1. The calculation processing by the pitch detecting unit 7 1 2 is for detecting the distance between the plurality of light irradiation regions 90 (step S1 2 4 ). In addition, In this embodiment, Because the spacing is certain, Therefore, it is not necessary to use the camera 4 to detect the entire light irradiation area 90. The distance between the detection results (hereinafter referred to as "detection pitch") is compared with the set pitch 7 1 9 stored in the memory portion 7 1 5 (step S 1 2 5 ), When the set pitch 7 1 9 is not equal to the detection pitch, Using the pitch control unit 7 1 4, According to the set spacing 7 1 9 and the detection interval, Control optical unit drive unit 5 8 1, The magnification for changing the optical unit 58 is used to change the distance between the light irradiation regions 90 (step S 1 2 5 1 ). When the pitch adjustment is completed, According to the magnification and focus of the optical unit 5 8 7 7 It is judged whether or not the focus position of the optical unit 58 is coincident with the photographing surface of the camera 4 (i.e., Whether the focus position coincides with the photosensitive material on the substrate 9) (step S 1 2 6 ), In case of inconsistency, The stage lifting mechanism 3 5 is controlled by the control unit 7, Moving the support plate 3 4 in the Z direction, It is used to change the distance between the stage 35 and the magnification changing mechanism 5 8 2 (or the optical unit 58) (step S 1 2 6 1 ). Using this composition, Changing the distance between the optical unit 58 and the photosensitive material, The focus position of the optical unit 58 is made coincident with the surface of the photosensitive material. In addition, Even if the magnification is changed, the eccentricity of the camera 4 side of the optical unit 16 312 / invention specification (supplement) / 93-05/93105519 1252379 5 8 can be maintained. With the lifting of the stage 3 2, the distance between the illumination areas 90 is constant. In addition, When the focus table 71 7 is not used, Focus adjustment can also be performed by repeated photography and lifting of the stage 32. After completing the pitch adjustment and focus adjustment, The amplitude detecting unit 7 1 1 detects the amplitude of each of the plurality of light irradiation regions 90 from the image of the light irradiation region 90 (step S 1 27). In addition, As in the embodiment, When the amplitude of each of the light irradiation regions 90 is constant, The amplitude of all the light-irradiated areas 90 can be obtained by detecting the amplitude of one of the illumination areas 90. then, Make the memory set in the memory unit 7 1 5 set amplitude 7 1 8 The amplitude of each of the light irradiation regions 90 (hereinafter referred to as "detection width") of the detection result of the amplitude detecting portion 7 1 1 is compared (step S 1 2 8 ). ‘When the set amplitude is 7 1 8 and the detection amplitude is not equal, Using the control of the amplitude control unit 7 1 3, According to the set amplitude 7 1 8 and the detection range, Driving the mask sliding mechanism 5 7 to move the first mask 53 Change the width of the mask group opening 5 2 0, Thereby, the amplitude of the light irradiation region 90 is adjusted (step S 1 2 8 1 ). When the set amplitude is 7 1 8 and the detection amplitude is equal, Close the shutter 5 1 2, Stopping the illumination of light (step S1 29) ° When the adjustment of the amplitude and spacing of the light irradiation area 90 is completed, The stage moving mechanism 2 and the head moving mechanism 5 01 are controlled by the scanning control unit 72, For the stage 3 2, Move the light head 5 to the specified drawing start position (Fig. 7: Step S 1 3 ). essentially, The stage 3 2 moves to the (+X) side, The light head 5 moves to the side of the Y). Starting to emit light from the optical head 5 (step S1 4), Light is irradiated onto the light-irradiating region 90 on the photosensitive material of the substrate 9. then, The stage 3 2 starts moving to the (-X) direction in Fig. 1 (step 17 3 12 / invention manual (supplement) / 93-05/93105519 1252379 S 1 5 ), The light irradiation region 90 is in the (+X) direction in Fig. 1, Scanned at a relative speed to the relative speed of the photosensitive material, a plurality of patterns for strips having a set width and a set pitch, A photosensitive material that is drawn on the substrate 9. When the scan of the light-irradiated area 90 reaches the designated end position, Stopping the movement of the stage 3 2 (step S 16 6), And stopping the illumination of the light (step S17). In addition, When the start of the irradiation of light (step S15) and the start of the movement of the stage 32 (step S16) are simultaneously performed, At the beginning of the pattern, near the top, When the exposure is insufficient, The accuracy of the edge of the pattern is reduced, Setting an appropriate interval between step S15 and step S16, The light is irradiated while the scanning is stopped. In addition, At the end of the pattern, the same is true. Between the stop movement of the stage 32 (step S17) and the stop irradiation of light (step S18), Set the appropriate interval, Can be used to improve the accuracy of the edge of the end point. When the first scan of the photosensitive material is completed, It is confirmed whether or not the scanning of the strip-like pattern extending in the same direction of the substrate 9 is repeated (i.e., Whether there is a next scan), In the case of the next scan, Going back to step S 1 3, Moving the stage 3 2 to the next starting drawing position, The number of times required to illuminate the light and move the stage 3 2 (steps S 1 3 to S 1 7 ). The movement of the stage 3 2 at the time of scanning of the light-irradiated area 90 is alternately performed in the (+X) direction and the (-X) direction. In the second and subsequent steps S 1 3, The light head moving mechanism 5 Ο 1 moves the optical head 5 in the (+Y) direction by a specified distance, Used to move the optical head 5 to the starting drawing position. When the photosensitive material on the substrate 9 is drawn with a strip pattern, 18 3 12/Invention Manual (supplement)/93-05/93105519 1252379 For the description of the residue > condition, J (also known as cloth, 丨 G (green: Suddenly j diagram line. The bottom of the moving substrate S1 91 The area is adjusted in the adjustment stage Repeat pattern beam using the pattern drawing device! When the color anti-money agent is used, , Photosensitive material B ^ ^ κ D Step S19 in Fig. 7. , , , The patterned substrate 9 is carried out from the q water drawing device 1 Beautiful q L , Yang and another are shown, The photosensitive material on the soil becomes a potential , The more the mouth, the 4 π color filter is the sub-figure f. Here, 锸哞 or light material, like mouth I, uses a negative color resist in this kind of slave. 祜# 077 6, ", , When the shell is pressed, the exposed portion is left to be "shot". then, Repeat in... Round case drawing device! ...4 is the painting of the color anti-surname agent. And imaging, In base > , 轳Γ R, + Form R (red), The sub-pixel of the three colors of five (β). In addition, By 吏美柘Q Λ, ^Steps of becoming a transparent electrode, etc. The switch 9 is used in the liquid crystal display device / has passed the filter. Step S1 9 of 7 is to draw 袼...° on the substrate 9. This specific example is performed when the pattern drawing device i makes the pattern Α. In the case where the black of the color transition device draws a lattice pattern, When using step bll~S18 to complete the depiction of the strip pattern of the working direction, Confirmed in & With or without the pattern of the positive direction of the pattern (step s 1 9 ), Correction control unit 7 drive table rotation mechanism 3 3, Centered on the axis that is held on the main surface of the stage unit 3, Turn the stage to $疋. (step). Using this composition, For the 4 on the substrate 9 & , 4 first materials, The scanning direction of the illumination field 90 is changed by 90. . After the scanning direction is changed, The amplitude and the pitch of the light irradiation region 90 of the stage unit 3 are moved (step 3 2 is moved to the start scanning position, Move the strip to the shooting position, S 1 2 ), then, The number of times required to operate the tape-like pattern (steps S 1 3 to S 1 8 ). According to Zhao ..., The above way, In the depiction device 1, By rotating the stage 3 2 , A pattern of a grid pattern is shown for the photosensitive material on the substrate 312 / invention specification (supplement) / 93-05 / 93105519 19 1252379 9. The above description is the pattern drawing device 1 of the first embodiment. In the pattern drawing device 1, When compared to the prior art grating method, Because the light is irradiated on a plurality of light irradiation regions 90 of a large area, So you can paint at high speed. In addition, By changing the amplitude of the mask group opening 5 2 0 formed by the first mask 5 3 and the second mask 5 4 , The light irradiation region 90 is enlarged or contracted by the optical unit 58. The amplitude and spacing of the depicted pattern can be easily changed. Using this composition, Can be highly decomposed, High speed (ie, Stripe (or grid) patterns are drawn in a short time. E.g, When using a resolution of 1 // m on a square with 1 m square on one side, Depicted from 20 to 3 0 // m, When the pitch is from 3 0 0 to 1 5 0 0 // m, when the strip pattern is Scanning only one beam of light in the raster mode, Due to the limitation of the modulation speed of the light beam, Drawing takes a long time, Even if you arrange more than one bald head, Nor can it ensure adequate space. In the drawing device 1 of the present embodiment, E.g, Arranging a plurality of light irradiation regions 90 in a range of 1 0 0 m m, The pattern of the above strips can be drawn in tens of seconds. In addition, The material obtained by the pattern drawing device 1 based on the photographing of the light irradiation region 90, And the preset input amplitude of 71 8 and the set pitch of 7 1 9, The amplitude and spacing of the light-irradiating area 90 can be automatically adjusted (i.e., The magnitude and spacing of the depicted pattern). In addition, The mask is exchanged by the mask converter 6, The range of the amplitude and spacing of the paintable pattern can be expanded, Can increase the freedom of drawing. Fig. 10 shows a mask portion 52 of the pattern drawing device of the second embodiment, The structure other than the mask portion 5 2 a of the pattern drawing device is the same as that of FIG. 1 . In addition, In Figure 10, The first mask holding portion 5 5 a and the first opening 20 312 described below/invention specification (supplement)/93-05/93105519 1252379 5 3 1 a are indicated by thick lines. The mask portion 52a has two masks. In the Y direction in Figure 10 (i.e., The direction orthogonal to the scanning direction of the light-irradiated area), Arranging and forming a rectangular opening group (hereinafter referred to as "opening line") having the same width and length at a certain pitch, The opening is in the X direction (ie, There are a plurality of scanning directions in the light irradiation region. In the following description, From the point of approaching the light emitting portion 5 1 The order is called "1st mask 5 3 a", "2nd mask 5 4 a". In addition, The cover portion 5 2 a has: First mask holding portion 5 5 a, Used to hold the first mask 53a; Second mask holding portion 56a, Used to hold the second mask 54a; Mask sliding mechanism 5 7 a, For moving the first mask 5 3 a relative to the second mask 5 4 a in the Y direction; And mask position changing mechanism 5 9, It is used to move the first mask 53a and the second mask 54a in the X direction. As shown in Figure 10, The first mask 5 3 a and the second mask 5 4 a respectively have an opening row of 3 rows (which may also be 2 rows or 4 rows). When comparing the corresponding opening rows of the two masks, Same as the mask set of Figure 4, The length and amplitude of the opening are larger in the first mask 5 3 a, The opening spacing is equal. In addition, When comparing the opening rows in one mask, The width and/or spacing of the openings constituting the opening row are different from each other. The second mask 54a is joined to the first mask 53a, The opening (hereinafter referred to as "second opening") 5 4 1 a is superposed on the opening of the corresponding first mask 5 3 a (hereinafter referred to as "first opening") 5 3 1 a. In the mask portion 5 2 a, The overlapping area of the first opening 5 3 1 a and the second opening 541a becomes the mask group opening 5 2 0 a of the actual light passing region (parallel oblique lines are added to Fig. 10). In addition, The same as the first embodiment, The second mask 5 4 a is not necessarily true to the first mask 5 3 a 21 31W invention specification (supplement) /93-05/93105519 1252379 physical contact, It is also necessary to optically overlap. The mask sliding mechanism 5 7 a has: Sliding frame 5 7 1 a, For holding the first mask holding portion 55 a and the second mask holding portion 5 6 a ; Sliding motor 5 7 2 a, As a driving source; And screw mechanism 5 7 3 a, Connected to the sliding motor 5 7 2 a ; When using the control of the control unit 7, Driving the screw mechanism 5 7 3 a with the sliding motor 5 7 2 a, It is used to move the first mask holding portion 55 5 a in the Y direction along the slide frame 5 7 1 a. Using this composition, The first mask 53a held by the first mask holding portion 5 5 a moves in the Y direction. Used to change the first opening 531a and the second, The overlap state of the opening 5 4 1 a, In order to change the amplitude of each mask group opening 5 2 0 a. In addition, Using a mechanism not shown in the figure, During the movement of the first mask holding portion 55 5 a, The first mask 5 3 a and the second mask 5 4 a are separated from each other. The mask position changing mechanism 5 9 has: Sliding frame holding portion 5 9 1, Used to hold the sliding frame 5 7 1 a ; Mask position changing motor 5 9 2 ; Screw 5 9 3, Connected to the mask position change motor 5 9 2 ; Nut 5 9 4, Is fixed to the sliding frame 5 7 1 a ; And guide rails 5 9 5 ; When the screw 5 5 3 driven by the mask position changing motor 5 9 2 is rotated by the control unit 7, The sliding frame 5 7 1 a moves along the guide rail 5 9 5 in the X direction together with the nut 5 9 4 . In the pattern drawing device of the second embodiment, When drawing a pattern, Use only one opening line. The opening row used is disposed vertically below the light emitting portion 51, The first mask 5 3 a and the second mask 5 4 are moved in the X direction by the mask position changing mechanism 59. Even if you use any of the open columns, When the set amplitude and the set pitch are not achieved, Similar to the first embodiment, The exchange of the first mask 5 3 a and/or the second mask 5 4 a 22 312 / invention specification (supplement) / 93-05/93105519 1252379 is performed. The operation of the pattern drawing device of the second embodiment, In addition to the decision and positioning of the additional opening line used, The other parts are the same as in the first embodiment. that is, Using optical units 5 8, The stage lifting mechanism 3 5 (refer to FIG. 1 ) and the mask sliding mechanism 5 7 a, Adjusting the amplitude and spacing of the light-irradiated area by using the opening of the mask group opening 5 2 0 a then, The number of times the strip pattern is drawn is repeated as many times as needed. In the pattern drawing device of the second embodiment, Since the first mask 5 3 a and the second mask 5 4 a are used to prepare a plurality of opening rows having different amplitudes and pitches, Make the choice of the opening line used, Therefore, it is possible to reduce the first mask 5 3 a and/or the second mask 5 4 a, The number of exchanges with other masks. The result is a quick response to a variety of patterns. Next, the pattern drawing device of the third embodiment will be described. The pattern drawing device of the third embodiment uses a pulse laser to replace the mercury lamp 5 1 3 and the shutter 5 1 2 in the pattern drawing device 1 shown in Fig. 1, The stage rotation mechanism 33 is omitted. The other basic structure is the same as Figure 1. The same component symbols are attached to the following description. In the third embodiment, The stage unit 3 is provided with a high-precision stage position measuring mechanism such as a laser measuring length, The control unit 7 receives a signal from the stage position measuring mechanism. It is used to control the pulse laser to synchronize the movement of the stage 32 with the ΟΝ/OFF of the light. Using a pulse laser as a light source, The pulse wave drawing device can illuminate the photosensitive material in a short time (1 nanosecond to several tens of nanoseconds). When the position on the substrate 9 where the pattern is to be drawn passes through the light irradiation area, The signal from the control unit 7 is sent to the pulse laser driving circuit by 23 312/invention specification (supplement)/93-05/93105519 1252379. With such a configuration, the drawing of the plurality of rectangular patterns 9 1 matching the shape of the light irradiation region of the example shown in Fig. 11 can be realized. In addition, Similar to the first embodiment, When drawing a strip-like pattern, The stage 32 is moved to continuously repeat the emission of the pulse wave light from the pulse wave. In addition, In place of the first mask 53 and the second mask 54, Prepare a long slit-like mask in the vertical direction of the scanning direction. Synchronized with the movement of the stage 3 2 Let the pulse laser strike instantaneously Ο N, The photosensitive material that can be used on the substrate 9 depicts a strip-like pattern that extends in the vertical direction of the scanning direction. As a result, the depiction of a plurality of patterns in a strip shape extending in the scanning direction (X direction) is repeated. Rectangular pattern depiction, And a depiction of a plurality of strips extending in a direction perpendicular to the scanning direction (Y direction), Moving toward the X direction of the stage 3 2 (and moving in the Y direction of the light head 5), A variety of patterns can be drawn on the photosensitive material. E.g, A depiction of the complex shape of the black matrix 92 shown in Fig. 12 can be performed. In this way, In the pattern drawing device of the third embodiment, Since there is a light source that illuminates the light at a high speed of 〇N / 0 F F, Controlling the light source to synchronize with the movement of the stage 32, Therefore, it is possible to draw patterns of various rules at high speed. In addition, Similar to the first embodiment, Because of the use of two masks, it is easy to change the amplitude or spacing of multiple light-irradiated areas with high precision. So when there is a change in the magnitude or spacing of the pattern to be depicted, It can also be easily adapted. In the first to third embodiments, The illustrated example is a pattern depiction made at the time of manufacture of a color filter, However, the pattern drawing device of the present invention 24 312 / invention specification (supplement) / 93-05/93105519 1252379 because various patterns of strips or rules can be drawn at high speed, Therefore, the present invention is also applicable to various other steps in the manufacture of various flat panel display devices for obtaining such patterns. The embodiments of the present invention have been described above. However, the present invention is not limited to the above embodiments. Instead, there can be various changes. E.g, The amplitude and length of the first opening and the second opening of the first mask and the second mask are not limited to the examples shown in Figs. 4 and 10. It is also possible to make the second opening larger. It is also possible to make the first opening and the second opening equal. In addition, The shape of the opening of each mask is not limited to a rectangle. As long as they are parallel to each other along the edge of the scanning direction of the light-irradiating area, A strip-like pattern can be appropriately drawn. In addition, Can also match the pattern being painted, Make the amplitude or spacing of the opening of the mask set constant. Fig. 13 shows another preferred embodiment of the mask used in the pattern drawing device 1. The first mask 5 3 b and the second mask 5 4 b are comb-shaped, By overlapping the light passage regions which are arranged in the gaps of the comb teeth which are arranged in the Y direction (the vertical direction of the scanning direction) in Fig. 13, It is also possible to form a mask group opening 5 2 0b as shown by an additional parallel oblique line. In addition, As shown in Figure 14. The first mask 5 3 c (indicated by thick lines in the drawing) and the second mask 54c may also be provided as gaps in the light passage region. Arrange a plurality of rectangular plates arranged in the Y direction. In addition, When the gap between the first mask 53c and the gap of the second mask 5 4 c overlap, When the mask group opening 5 2 c (adding a parallel oblique line in Fig. 14) is longer in the X direction, The light emitted from the light emitting portion 5 1 is linear light having a long beam cross section in the Y direction. It is also possible to move the first mask relative to the second mask, Instead of the first cover, the second cover is also moved by the cover, and the cover can also move the second cover. It is also possible to make the two masks move. In addition, The relative movement of the first mask and the second mask can also be performed manually. The image obtained by the camera 4 is reflected on the monitor camera 4 and does not have to be provided on the support board 34. It is also possible to move the optical head 5 outside the fixed stage unit 3 to the camera 4. The photographing of the light-irradiated area may not be a photographing device that directly illuminates the light, etc. But indirectly taking pictures of the specified range of illumination, The detection of the amplitude or the pitch of the light-irradiated area can also be performed by detecting the input value input to the input unit 8 by the one-dimensional light-receiving element array in the vertical direction of the scanning direction. If the amplitude and spacing of the shot area can be expressed substantially, E.g, You can also enter the ratio of amplitude or interval and amplitude to spacing. Alternatively, the amplitude and spacing may be specified by the control unit via the type of the input substrate 9. In the first embodiment, the lattice pattern can be drawn by rotating the stage 3 2 by 90°. However, it is also possible to use two sets of optical heads 5 in the direction orthogonal to each other for drawing a strip-like pattern. In this case, the stage rotation mechanism 33 is not required. In the above embodiment, the negative photosensitive material is used. Positive photosensitive materials can also be used. Except for the exposed portion during development, The photosensitive material can also be used in other types not related to the developing step. As mentioned above, The pattern drawing device of the present invention is particularly suitable for a flat panel display device (liquid crystal display device, Plasma display device, Manufacture of various panels such as E L display devices, etc. However, it is also applicable to a conductor substrate or a printed wiring board. Or a glass substrate for a photomask, etc. 312/Invention manual (supplement)/93-05/93] 05519 Moving the machine. Set in the party. CCD shadow. Listed in the test. Light distance, Eli to use the settings, but. The other one. Use organic in the semi-rule 26 1252379 to depict the fine patterns. The invention has been described and illustrated in detail above, However, the above description is for illustrative purposes only. Not a limiter. therefore, Without departing from the scope of the invention, There can be many variations or aspects as can be understood. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a structural view showing a pattern drawing device according to a first embodiment. Fig. 2 is a view showing the first mask. Fig. 3 is a view showing a second mask. Fig. 4 is a structural view showing a mask portion. Fig. 5 is a view showing a part of a light irradiation region. Fig. 6 is a conceptual diagram showing the flow of the construction and control information of the control unit. Fig. 7 is a flow chart showing the drawing operation of the pattern. 8 and 9 are flowcharts showing an operation of adjusting the amplitude and pitch of the light irradiation region. Fig. 10 is a view showing a mask portion of the pattern drawing device of the second embodiment. Figures 11 and 12 are exemplary diagrams showing the depicted pattern. Figure 13 is a diagram showing another example of a mask. Figure 14 is a diagram showing another example of a mask. (Description of component symbols) 1 Pattern drawing device 2 Stage moving mechanism 3 Stage unit 4 Camera 5 Light head 27 312 / Invention manual (supplement) / 93-05/93105519 1252379 6 Mask converter 7 Control unit 8 m Inlet 9 Substrate 11 Base 12 Frame 21 Motor 22 Screw 23 Nut 24 Guide rail 32 Stage 33 Stage rotation mechanism 34 Support plate 35 Stage lifting mechanism 36 Base plate 50 Head support 5 1 Light exit Portion 52 mask portion 52a mask portion 5 2c mask group opening π 53 first mask 53a first mask 53b first mask 53c first mask 54 second mask 54a second mask 54b second mask Cover 54c 2nd mask 55 1st mask holder
312/發明說明書(補件)/93-05/93105519 28 1252379 5 5a 第 1 遮 罩 保 持 部 56 第 2 遮 罩 保 持 部 56a 第 2 遮 罩 保 持 部 57 遮 罩 滑 動 機 構 57a 遮 罩 滑 動 機 構 58 光 學 單 元 59 遮 罩 位 置 變 更 機構 6 1 遮 罩 收 納 部 62 收 納 部 升 降 機 構 63 插 脫 機 構 71 日召 射 域 控 制 部 72 掃 描 控 制 部 90 光 昭 射 區 域 91 圖 案 92 里 φ 底 50 1 光 頭 部 移 動 機 構 502 馬 達 503 引 導 執 51 1 光 纖 5 12 快 門 5 13 水 銀 燈 520 重 疊 區 域 5 2 0 a 遮 罩 組 開 口 53 1 第 1 開 口 53 1a 第 1 開 〇 541 第 2 開 V 54 1a 第 2 開 口 571 滑 動 框 架 57 1a 滑 動 框 架 312/發明說明書(補件)/93-05/93105519 1252379 572 滑 動 用 馬 達 5 7 2 a 滑 動 用 馬 達 573 螺 桿 機 構 5 7 3 a 螺 桿 機 構 58 1 光 學 單 元 驅 動 部 582 倍 率 變 更 機 構 591 滑 動 框 架 保 持 部 592 遮 罩 位 置 變 更 用馬達 593 螺 桿 594 螺 母 595 引 導 執 71 1 幅 度 檢 測 部 7 12 間 距 檢 測 部 7 13 幅 度 控 制 部 714 間 距 控 制 部 715 1己 憶 部 71 6 遮 罩 表 71 7 焦 距 表 718 設 定 幅 度 7 19 設 定 間 距312/Invention Manual (Supplement)/93-05/93105519 28 1252379 5 5a 1st mask holding portion 56 2nd mask holding portion 56a 2nd mask holding portion 57 Mask sliding mechanism 57a Mask sliding mechanism 58 Optical Unit 59 Mask position changing mechanism 6 1 Mask storage unit 62 Storage unit lifting mechanism 63 Plug-in mechanism 71 Calling area control unit 72 Scanning control unit 90 Light-emitting area 91 Pattern 92 φ Bottom 50 1 Optical head moving mechanism 502 motor 503 guide 51 1 fiber 5 12 shutter 5 13 mercury lamp 520 overlap area 5 2 0 a mask group opening 53 1 first opening 53 1a first opening 541 second opening V 54 1a second opening 571 sliding frame 57 1a Sliding frame 312/Invention manual (supplement)/93-05/93105519 1252379 572 Sliding motor 5 7 2 a Sliding motor 573 Screw mechanism 5 7 3 a Screw mechanism 58 1 Optical unit driving unit 582 Magnification Further mechanism 591 Sliding frame holding portion 592 Mask position changing motor 593 Screw 594 Nut 595 Guide 71 1 Amplitude detecting portion 7 12 Pitch detecting portion 7 13 Amplitude controlling portion 714 Pitch control portion 715 1 Recalling portion 71 6 Mask table 71 7 Focal length table 718 Setting amplitude 7 19 Setting spacing
312/發明說明書(補件)/93-05/93105519 30312/Invention Manual (supplement)/93-05/93105519 30