CN1292312C

CN1292312C - Patten drawing device

Info

Publication number: CN1292312C
Application number: CNB2004100313106A
Authority: CN
Inventors: 小八木康幸
Original assignee: Dainippon Screen Manufacturing Co Ltd
Current assignee: Skilling Group; Dainippon Screen Manufacturing Co Ltd
Priority date: 2003-05-22
Filing date: 2004-03-26
Publication date: 2006-12-27
Anticipated expiration: 2024-03-26
Also published as: JP2004347846A; JP4323863B2; TWI252379B; CN1573555A; TW200500814A; KR20040100908A; KR100695335B1

Abstract

The pattern plotting apparatus 1 is equipped with a stage 32 holding a substrate 9, a stage moving mechanism 2 to move the stage 32, a light emitting part 5 to emit light to the substrate 9, a mask part 52 having a first mask 53 and a second mask 54 formed with a plurality of apertures, and an optical unit 58 to enlarge or reduce the irradiation region on the substrate 9 to be irradiated with the light passing through the mask part 52. In the pattern plotting apparatus 1, the overlapped part of the apertures in the first mask 53 and the second mask 54, and the magnification of the optical unit 58 are varied. Thereby, the width and the pitch of the pattern to be plotted can be easily varied, and a stripe pattern can be plotted at high speed with high resolution on the photosensitive material on the substrate 9.

Description

The Patten drawing device

Technical field

The present invention relates to a kind of technology by the photosensitive material irradiates light on the substrate is drawn a design.

Background technology

In the past, as the method by the photosensitive material irradiates light that is formed at (being called " substrate " below) such as glass substrates that semiconductor substrate, tellite or plasma display system, liquid crystal indicator, photomask use is drawn a design, known have such mode of transfer mask pattern on photosensitive material such as close induction type Exposure mode, stepping Exposure mode.

In the close induction type Exposure mode, make the corresponding opening of pattern that is formed with and drawn, with the mask of the identical size of substrate near substrate irradiates light, pattern all is transferred on the photosensitive material on the substrate.In the stepping Exposure mode, carry out moving of the projection of mask pattern and mask pattern and on whole base plate, carry out the drafting of pattern by alternate repetition ground.

On the other hand, as the method for drafting that does not adopt mask, disclosed as the flat 5-150175 communique of TOHKEMY, people also propose following mode, promptly, make the light beam of being modulated in the enterprising line scanning of photosensitive material, shine simultaneously, and directly draw a design (being called " directly painting mode " below).

In recent years, on the market of the manufacturing installation of the panel of panel display apparatus or color filter etc., people require to tackle the high precision int that is drawn on the pattern on the substrate and the maximization of substrate consumingly.In the close induction type Exposure mode that mask pattern is needed on fully on the photosensitive material, owing to make the approaching and irradiates light of mask and substrate, so for the high precision int of tackling pattern and the maximization of substrate, the price of mask is higher.In addition, close induction type Exposure mode and stepping Exposure mode have following shortcoming,, can not tackle the spacing of the pattern of being drawn, the variation of width neatly that is.

Directly painting in the mode, it generally is raster fashion, the set of pattern as small point (dot) (pixel) showed, draw a design according to point (dot) unit, but for corresponding with the high precision int of pattern, the resolution of necessary raising drawing apparatus (promptly, reduce the area of 1 point), increased in large-scale substrate needed time that draws a design on the whole.

As the mode that shortens the drafting time, people consider to increase the quantity of the light beam that is scanned, increase the measure of the number of spots of being drawn simultaneously, still, are accompanied by the increase of light beam, and the size of light irradiating means increases, and the cost of manufacturing installation rises.Particularly, from the physics aspect, be difficult to be accompanied by the size granular of pattern and high precision int and the head of necessary amount is set.

Summary of the invention

The object of the present invention is to provide the Patten drawing device that draws a design on a kind of photosensitive material on substrate, draw a design at high speed with high resolving power.

Patten drawing device of the present invention comprises: light source; Maintaining part keeps importing the substrate from the light of above-mentioned light source; The 1st mask is arranged on the light path from the light of above-mentioned light source, arranges to be formed with a plurality of the 1st light that above-mentioned light passes through by the zone on the prescribed direction on the 1st mask; The 2nd mask overlaps with above-mentioned the 1st mask optically, is formed with on the 2nd mask respectively to pass through the zone with above-mentioned a plurality of the 1st light by corresponding a plurality of the 2nd light in zone; Mask travel mechanism along the afore mentioned rules direction, makes above-mentioned the 1st mask relatively move with respect to above-mentioned the 2nd mask; Optical system is arranged between above-mentioned the 2nd mask and the above-mentioned maintaining part, makes above-mentioned the 2nd mask and above-mentioned photosensitive material realize conjugation optically; Irradiation area travel mechanism, make irradiation in order by above-mentioned a plurality of the 1st light by zone and above-mentioned a plurality of the 2nd light by a plurality of rayed zone regional light, on the above-mentioned photosensitive material, along with the perpendicular direction of scanning of orientation in above-mentioned a plurality of rayed zone, relatively move with respect to above-mentioned photosensitive material.

According to the present invention, adopt the 1st and the 2nd mask, simultaneously the 1st mask is relatively moved with respect to the 2nd mask, thus, can on photosensitive material, draw the pattern of various rules at high speed.

In preferred embodiment of the present invention, the width of the above-mentioned orientation in above-mentioned a plurality of rayed zone is identical, and the spacing in above-mentioned a plurality of rayed zone is certain, the Patten drawing device also can comprise test section, detects the width of the above-mentioned orientation separately in above-mentioned a plurality of rayed zone; Drive division drives aforementioned mask travel mechanism; The mask mobile control division according to the testing result of above-mentioned test section, is controlled above-mentioned drive division.Can automatically change the width of pattern by width by the test section check pattern.

Particularly best, above-mentioned optical system comprises that multiplying power changes mechanism, amplifies or dwindles above-mentioned a plurality of rayed zone, and the Patten drawing device also comprises test section, detects the spacing in above-mentioned a plurality of rayed zone; Drive division drives above-mentioned multiplying power and changes mechanism; The multiplying power control part according to the testing result of above-mentioned test section, is controlled above-mentioned drive division.Can be by the spacing by the test section check pattern, the automatically spacing of check pattern.

In addition, the Patten drawing device also can include the mechanism that changes the distance between above-mentioned maintaining part and the above-mentioned multiplying power change mechanism.In addition, the Patten drawing device also can include more converting mechanism, and above-mentioned the 1st mask and the 2nd mask are replaced by another one the 1st mask and another one the 2nd mask.The Patten drawing device also can comprise more converting mechanism, with at least 1 mask of being replaced by other in above-mentioned the 1st mask and above-mentioned the 2nd mask.Thus, can further increase the width of the pattern that can draw and the scope of spacing.In addition, in order to carry out various drawing, the Patten drawing device also comprises the rayed control part, with moving synchronously of above-mentioned a plurality of rayed zone, and the startup of the irradiation of the light that control is carried out photosensitive material/stop; Following such mechanism, promptly with remain in above-mentioned maintaining part on substrate on the vertical axle of face be the center, make the rotation of above-mentioned maintaining part, with respect to photosensitive material above-mentioned direction of scanning is changed relatively.

With reference to accompanying drawing, according to the specific descriptions of the present invention of carrying out below, above-mentioned purpose and other purpose, feature, form and advantage as can be known.

Description of drawings

Fig. 1 is the view of the structure of the Patten drawing device of expression the 1st embodiment;

Fig. 2 is the view of expression the 1st mask;

Fig. 3 is the view of expression the 2nd mask;

Fig. 4 is the view of the structure of expression mask portion;

Fig. 5 is the view of the part in expression rayed zone;

Fig. 6 is the synoptic diagram of the flow process of expression structure of control part and control information;

Fig. 7 is the view of the flow process of the drafting action of expression pattern;

Fig. 8 and Fig. 9 adjust the view of flow process of the action of the width in rayed zone and spacing for expression;

Figure 10 is the view of the mask portion of the Patten drawing device of expression the 2nd embodiment;

The view of the example of the pattern that Figure 11 and Figure 12 draw for expression;

Figure 13 is the view of another example of expression mask;

Figure 14 is the view of an example again of expression mask.

Embodiment

Fig. 1 is the view of the structure of the Patten drawing device 1 of expression the 1st embodiment of the present invention.Patten drawing device 1 is such device, i.e. glass substrate 9 (abbreviating " substrate 9 " below as) irradiates light by liquid crystal indicator is used, and the photosensitive material on substrate 9 (being " colored resist layer (colour resist) " in the present embodiment) is gone up and is drawn a plurality of banded patterns.Draw figuratum substrate 9 by another follow-up operation, finally become color filter as the assembling parts of liquid crystal indicator.

In Patten drawing device 1, base station 11 is provided with table transferring mechanism 2, and by this table transferring mechanism 2, the platform assembly 3 of maintenance substrate 9 can be along moving on the directions X of interarea in Fig. 1 of substrate 9.On base station 11, be fixed with support 12, on this support 12, head 5 and mask changer 6 be installed in mode across platform assembly 3.

Table transferring mechanism 2 adopts following structures, promptly is connected with ball-screw 22 on motor 21, and in addition, the nut 23 that is fixed on the platform assembly 3 is installed on the ball-screw 22.Upper fixed at ball-screw 22 has guide rail 24, and when motor 21 rotations, platform assembly 3 slides on directions X along guide rail 24 with nut 23.

Platform assembly 3 comprises: platform 32, and this 32 directly keeps substrate 9; Platform rotating mechanism 33, this rotating mechanism 33 with the perpendicular axle of the interarea of substrate 9 be center and universal stage 32; Support plate 34, this support plate 34 is rotatably supporting platform 32; Platform elevating mechanism 35, this elevating mechanism 35 moves support plate 34 along the Z direction among Fig. 1; Base plate 36, this base plate 36 keeps platform elevating mechanism 35, and above-mentioned nut 23 is directly fixed on the above-mentioned base plate 36.In addition, on support plate 34, be provided with camera 4, this camera 4 receives the light of 5 irradiations from the head by the shooting device as the photo-sensitive cell group of two-dimensional array.In addition, the shooting face of camera 4 be adjusted in advance with substrate 9 on the surperficial identical height of photosensitive material.

Head 5 comprises: a support 50, these support 50 supporting heads 5; Head moving mechanism 501, this head moving mechanism 501 is along the Y direction of Fig. 1 perpendicular direction of the direction that relatively moves of head 5 relative platform assemblies 3 (that is, with) moving-head 5; Light injection part 51, this light injection part 51 penetrates light to substrate 9; Mask portion 52, this mask portion 52 have 2 masks arranging a plurality of openings and form (below, according to from the order near a side of light injection part 51, being called the 1st mask the 53, the 2nd mask 54); Optical module 58, the irradiation area that 58 pairs of this optical modules shine the light on the substrate 9 by mask portion 52 amplifies or dwindles; Optical module drive division 581, this optical module drive division 581 drive the multiplying power change mechanism 582 that optical module 58 is had.Head moving mechanism 501 drives ball screw framework by motor 502, along guide rail 503 moving-head 5 on the Y direction.Says it is to realize conjugation by optical module 58, the 2 masks 54 (or mask portion 52) and photosensitive material from optics, in the present embodiment, the multiplying power of optical module 58 changes in the specialized range that has etc. times.

Light injection part 51 by optical fiber 511, with the shutter 512 of realizing startup/stop to the irradiation of the light of photosensitive material, and be connected with mercury vapor lamp 513.Light from mercury vapor lamp 513 penetrates from light injection part 51, successively by being arranged at the 1st mask 53 on the light path and the 2nd mask 54 (below, when censuring the 1st mask and the 2nd mask, be called " mask set " with 21 group) opening, by optical module 58 substrate 9 that leads.

Mask changer 6 comprises: the mask storage part 61 of storing a plurality of masks; Storage part elevating mechanism 62, this storage part elevating mechanism 62 moves mask storage part 61 along the Z direction; 2 slotting off line structures 63, its mask that will be stored in the mask storage part 61 is installed in the mask portion 52, and maybe the mask that will be installed in the mask portion 2 is pulled down.

Table transferring mechanism 2, platform assembly 3, camera 4, shutter 512, head moving mechanism 501, mask portion 52, optical module 58 and mask changer 6 are connected with control part 7, these parts are controlled by control part 7, and by the drafting of carrying out pattern on 1 pair of substrate 9 of Patten drawing device.In addition, input part 8 is connected with control part 7, the width on the Y direction respectively in a plurality of rayed zone on the substrate 9 (promptly, be arranged with the width of direction of the opening of the 1st mask 53, abbreviate " width " below as), with the interval in a plurality of rayed zone (promptly, to the distance at the center in adjacent rayed zone, be referred to as " spacing " from the center in each rayed zone below.) setting value be input in the control part 7 by input part 8 by the operator.

Fig. 2 is the view of expression the 1st mask 53, and Fig. 3 is the view of expression the 2nd mask 54.In the 1st mask 53, arrange on the Y direction of the 1st opening 531 in Fig. 2 of a plurality of conduct light by light and form by the zone.In the 2nd mask 54, be arranged with a plurality of as light by the zone the 2nd opening 541, these a plurality of the 2nd openings 541 are corresponding with a plurality of the 1st openings 531 respectively.The 1st opening 531 and the 2nd opening 541 be shaped as rectangle, and (promptly for the length of opening, size with the perpendicular direction of the orientation of the 1st opening 531 and the 2nd opening 541) and width (promptly, the width of the direction that the 1st opening 531 and the 2nd opening 541 are arranged), the 1st opening 531 is greater than the 2nd opening 541.In addition, the width of the 1st opening 531 is identical, and spacing (that is, from the center of each the 1st opening 531 to the distance at the center of the 1st adjacent opening 531) also is certain.Equally, width of each the 2nd opening 541 and spacing equate that also the spacing of the 2nd opening 541 equates with the spacing of the 1st opening 531.

Fig. 4 is the view of the structure of expression mask portion 52.This mask portion 52 comprises: the 1st mask maintaining part 55, the 1 mask maintaining parts 55 keep the 1st mask 53; The 2nd mask maintaining part 56, the 2 mask maintaining parts 56 keep the 2nd mask 54; Mask slide mechanism 57, this mask slide mechanism 57 make the 1st mask 53 move along the Y direction among Fig. 4 (that is, the 1st opening 531 and the 2nd opening 541 are arranged direction).In addition, in Fig. 4, represent the 1st mask maintaining part 55 and the 1st opening 531 with thick line.

The 1st mask 53 and the 2nd mask 54 be by inserting off line structure 63 (with reference to Fig. 1), respectively from shown in Figure 4 (+X) side direction (X) direction and being installed on respectively on the 1st mask maintaining part 55 and the 2nd mask maintaining part 56.

The 2nd mask 54 contacts with the 1st mask 53 with the mode that pairing the 1st opening 531 overlaps according to each the 2nd opening 541.Thus, the coincidence zone (representing with parallel oblique line in Fig. 4) 520 of the 1st opening 531 and the 2nd opening 541 is a same widths, arranges with the certain spacing that equates with the 1st opening 531 and the 2nd opening 541.Be directed to photosensitive material on the substrate 9 by the 1st opening 531 and the 2nd opening 541 successively from the light of light injection part 51 (with reference to Fig. 1), shine having with a plurality of rayed zone of zone 520 corresponding shapes and spacing.In the following description, will be called " mask set opening " as the zone of passing through the zone 520 of the light of reality.

In addition, the 2nd mask 54 needn't be and the contacting of the 1st mask 53 physical properties, can only optical coincidence.Such as, the 1st mask 53 and the 2nd mask 54 can according to the amount of having considered the depth of focus (such as, about number μ m) separate, also can be arranged at respectively on the position of optical realization conjugation.

Mask slide mechanism 57 comprises: travelling carriage 571, and this travelling carriage 571 keeps the 1st mask maintaining part 55; Slide with motor 572; Ball screw framework 573, this ball screw framework 573 is connected with motor 572 with slip, and when sliding with motor 572 driving ball screw frameworks 573 by the control of control part 7, the 1st mask maintaining part 55 moves along the Y direction along travelling carriage 571.Consequently, the 1st mask 53 that remains on the 1st mask maintaining part 55 also moves along the Y direction, and the coincidence status of the 1st opening 531 and the 2nd opening 541 changes, the wide variety of mask set opening 520, and the width in the rayed zone on the substrate 9 also changes.At this moment, because the spacing of mask set opening 520 does not change, only the width of mask set opening 520 changes with respect to the ratio of (the unsanctioned zone of the light) width between the mask set opening 520.

Though not shown, between the 1st mask maintaining part 55 and the 2nd mask maintaining part 56, be provided with clutch, during the 1st mask maintaining part 55 moved, the 2nd mask maintaining part 56 descended slightly, and the 1st mask 53 and the 2nd mask 54 are separated.Thus, prevent the damage between the 1st mask 53 and the 2nd mask 54 or produce dust.

Fig. 5 is formed at the view of the part in a plurality of rayed zone 90 on the photosensitive material of substrate 9 for expression.A plurality of rayed zone 90 is corresponding with mask set opening 520 (with reference to Fig. 4) respectively, and the width in a plurality of rayed zone 90 is identical, and spacing also is certain.

As described in resembling, the width in rayed zone 90 and spacing are arranged between the 2nd mask 54 and platform assembly 3 shown in Figure 1, can amplify by the optical module 58 with multiplying power change mechanism 582 and dwindle.Such as, when 7 pairs of optical module drive divisions 581 of control part are controlled and when the multiplying power of optical module 58 was increased, rayed zone 90 state shown in the solid line from Fig. 5 became the state shown in the double dot dash line.

Fig. 6 for the structure of expression control part 7 and with the block diagram of the flow process of the relevant information of control.Various formations in the control part 7 show its function, in fact the CPU by carrying out calculation process according to program, storer, special-purpose computing circuit, interface etc. and solid line.Control part 7 is mainly formed as it, comprising: the width in control rayed zone 90 and the irradiation area control part 71 of spacing; And control is to the scan control section 72 of the scanning in the rayed zone 90 of the photosensitive material on the substrate 9.

Irradiation area control part 71 comprises: width detection portion 711, and the width separately in a plurality of rayed zone 90 detects according to the picture intelligence from camera 4 in this width detection portion 711; Spacing test section 712, this spacing test section 712 detects spacing; Width control part 713, the width in these 713 pairs of rayed zones 90 of width control part is controlled; Spacing control part 714,714 pairs of spacings of this spacing control part are controlled; Storage part 715, the width in these storage part 715 storage rayed zones 90 and the adjustment information necessary of spacing.

In storage part 715, to make in advance and store mask table 716, this mask table 716 is expressed the mask set that is installed in the mask portion 52 and the width in the rayed zone 90 that can realize by aforementioned mask group and optical module 58 and the corresponding relation of spacing.In addition, in storage part 715, store: focusing table 717, the multiplying power of this focusing table 717 expression light assembly 58 and the corresponding relation of focusing position; Setting value (being called " setting width " below) 718 from the width in the rayed zone 90 of input part 8 input; And the setting value of spacing (being called " setting spacing " below) 719.

On irradiation area control part 71; be connected with table transferring mechanism 2, platform elevating mechanism 35, camera 4, shutter 512, mask slide mechanism 57, optical module drive division 581, mask changer 6 and input part 8; according to information from camera 4 and input part 8; irradiation area control part 71 is controlled these ingredients; thus, adjust the width and the spacing in rayed zone 90.

On scan control section 72, be connected with table transferring mechanism 2, platform rotating mechanism 33, head moving mechanism 501 and shutter 512, scan control section 72 is controlled these ingredients, thus, realizes the irradiation of light that photosensitive material is carried out and to the scanning of irradiation area 90.

The view that Fig. 7 carries out for expression pattern drawing apparatus 1 to the flow process of the drafting action of the pattern of photosensitive material.At first, setting width 718 and setting spacing 719 are stored in by 71 receptions of irradiation area control part (step S11) in the storage part 715 by the operator and from input part 8 inputs.Then, by the control of control part 7, the width in rayed zone 90 and spacing are adjusted to setting width 718 and set spacing 719 and equate (step S12).

Fig. 8 and Fig. 9 adjust the view of idiographic flow of the action (step S12) of the width in rayed zone 90 and spacing for expression.When receiving setting width 718 and setting spacing 719, at first, irradiation area control part 71 is according to mask table 716, judge whether the mask set that is installed in the mask portion 52 can and set spacing 719 corresponding (step S120) with setting width 718, under situation that can not be corresponding, by the control of irradiation area control part 71, in the 1st mask 53 and the 2nd mask 54 at least one is replaced by other mask (step S1201).

When carrying out the mask replacing, at first, according to mask table 716, the 1st mask the 53, the 2nd mask 54 on being installed on the mask portion 52 shown in Fig. 1 and being stored in the mask the mask storage part 61 of mask changer 6, selection can with set width 718 and set the combination of spacing 719 corresponding masks.

Result as this selection, such as, only the 1st mask 53 is being replaced by under the situation of another mask, control by irradiation area control part 71, drive storage part elevating mechanism 62 shown in Figure 1, mask storage part 61 is moved along the Z direction, make the space of sky of mask storage part 61 be the height identical with the 1st mask maintaining part 55.Then,, the 1st mask 53 is taken off from the 1st mask maintaining part 55, it is stored in the space of sky of mask storage part 61 by inserting off line structure 63.Then, storage elevating mechanism 62 is controlled, made selected mask move to height with the 1st mask maintaining part 55 subtends,, this mask is installed on the 1st mask maintaining part 55 by inserting off line structure 63.

Under situation about only the 2nd mask 54 being changed,, carry out in the same manner with the situation of the 1st mask 53 by storage part elevating mechanism 62 and slotting off line structure 63.Under to the 1st mask 53 and the 2nd mask 54 the two situations about all changing, successively these masks are changed.In addition, being to carry out under the situation of the setting range of the width that changes mask set opening 520 to the replacing of the 1st mask 53 or the 2nd mask 54 only, is to carry out under the situation of the spacing that changes mask set opening 520 to the replacing of the 1st mask 53 and the 2nd mask 54.

Behind mask set ready, by irradiation area control part 71, table transferring mechanism 2 is controlled, platform assembly 3 is moved, until be arranged at camera 4 on the support plate 34 be arranged in head 5 under (camera 4 and platform 32 after moving are shown by the double dot dash line of Fig. 1.) (step S121), open shutter 512, begin camera 4 is carried out the irradiation (step S122) of light.Thus, replace photosensitive material, to the rayed zone on the shooting face of camera 4 (identical with Fig. 5, as to be called " rayed zone 90 ") irradiates light.

Then, camera 4 is taken, thus, obtain the image (step S123) of the state in a plurality of rayed of expression zone 90, send pictorial data from camera 4 to irradiation area control part 71, by the calculation process of spacing test section 712, detect the spacing (step S124) in a plurality of rayed zone 90.In addition, in the present embodiment,, needn't detect whole rayed zones 90 by camera 4 because spacing is certain.Spacing (being called " detection spacing " below) as testing result compares (step S125) with the setting spacing 719 that is stored in the storage part 715, set under spacing 719 and the unequal situation of detection spacing, by spacing control part 714, according to setting spacing 719 and detecting spacing, optical module drive division 581 is controlled, change the multiplying power of optical module 58, change the spacing (step S1251) in rayed zone 90.

After the adjustment of spacing finishes, multiplying power and focusing table 717 according to optical module 58, whether the focusing position of judging optical module 58 and the shooting face of camera 4 be consistent (promptly, whether focusing position is consistent with the photosensitive material on the substrate 9) (step S126), under inconsistent situation, control by 7 pairs of platform elevating mechanisms 35 of control part, support plate 34 moves along the Z direction, changes the distance (step S1261) between platform 32 and the multiplying power change mechanism 582 (or optical module 58).Thus, change the distance between optical module 58 and the photosensitive material, the focusing position that makes optical module 58 is surperficial consistent with photosensitive material.In addition, even under the situation that changes multiplying power, still keep the disposition far away of camera 4 sides of optical module 58, be accompanied by the lifting of platform 32, the spacing in rayed zone 90 does not change.In addition, also can not adopt focusing table 717, and take the lifting with platform 32 repeatedly, carry out the focal length adjustment.

After spacing adjustment and focal length adjustment end, width detection portion 711 detects the width separately (step S127) in a plurality of rayed zone 90 according to the image in rayed zone 90.In addition, as present embodiment, the width in each rayed zone 90 is under certain situation, can just obtain the width in whole rayed zones 90 by detecting the width in 1 rayed zone 90.

Then, to being stored in the setting width 718 in the storage part 715 and comparing (step S128) as the width (being referred to as " detection width " below) in each rayed zone 90 of the testing result of width detection portion 711.Setting under width 718 and the unequal situation of detection width; control by width control part 713; according to setting width 718 and detection width; drive mask slide mechanism 57; the 1st mask 53 is moved; change the width of mask set opening 520, adjust the width (step S1281) in rayed zone 90.When setting width 718 is equal with detection width, close shutter 512, the irradiation of light stops (step S129).

After the adjustment of the width in rayed zone 90 and spacing finishes, by scan control section 72, table transferring mechanism 2 and head moving mechanism 501 are controlled, platform 32 relatively, head 5 moves (Fig. 7: step S13) towards the drawing starting position of regulation.Specifically, platform 32 is towards (+X) side shifting, head 5 is towards (Y) side shifting.The ejaculation (step S14) of 5 beginning light from the head is to the zone of the rayed on the photosensitive material of substrate 9 90 irradiates lights.

Then, make platform 32 beginning in Fig. 1 (X) direction moves (step S15), rayed zone 90 along among Fig. 1 (+X) direction is to photosensitive material, relatively scan with certain speed, thus, will have banded a plurality of Patten drawings of setting width and setting spacing on the photosensitive material on the substrate 9.After the scanning in rayed zone 90 arrives the end position of regulation, mobile the stopping (step S16) of platform 32, the irradiation of light stops (step S17).

In addition, when the beginning (step S16) of moving of the beginning (step S15) of carrying out the irradiation of light simultaneously and platform 32, in near the starting point of pattern the position, under the situation that the precision at the edge of exposure deficiency, pattern reduces, between step S15 and step S16, suitable interval is set, under the state that stops to scan, carries out the irradiation of light.In addition, same near the terminal point of pattern, by the irradiation that stops (step S17) and light of moving of platform 32 stop between (step S18) proper spacing is set, thus, can improve near the precision at the edge of terminal point.

Behind the 1st time the end of scan to photosensitive material, the drafting of whether confirming substrate 9 is carried out the banded pattern that extends along equidirectional repeatedly (promptly, having or not of scanning next time), having under the next scan condition, turn back to step S13, platform 32 is drawn starting position towards next and is moved, and according to the number of times of necessity, irradiation and the platform 32 that carries out light repeatedly moves (step S13～S17).The mobile edge of the platform 32 the during scanning in rayed zone 90 (+X) direction and (X) direction is alternately carried out, in the 2nd later step S13, head moving mechanism 501 make head 5 only with predetermined distance to (+Y) direction moves, thereby head 5 moves towards drawing the starting position.

After having drawn banded pattern on the whole at the photosensitive material on the substrate 9, the drafting release of Patten drawing device 1.In addition, be under the situation of colored resist layer at photosensitive material, do not carry out the step S19 of Fig. 7.

Send the substrate 9 of having drawn pattern from Patten drawing device 1, it is developed in addition, residue in the sub-element of picture of the photosensitive material formation colored resist layer on the substrate 9.In the case, photosensitive material is general adopts the residual colored resist layer that negative film (ネガ) type of exposed portion (, the part of having shone light) is arranged when developing.Then, the drafting of the coating of colored resist layer, Patten drawing device 1 and development are carried out repeatedly, form R (red) on substrate 9, G (green), the sub-element of picture of 3 looks of blue (B).In addition, the operation of the formation of process transparency electrode etc., substrate 9 forms the color filter that is used for LCD.

When on substrate 9, drawing cancellate pattern, carry out the step S19 of Fig. 7.As instantiation, when Patten drawing device 1 being used for the drafting of color filter black matrix (black matrix), carry out.

Under the situation of drawing cancellate pattern, after the drafting of the banded pattern of finishing 1 direction by step S11～S18, confirm have or not (step S19) with the drafting of the pattern of the perpendicular direction of the pattern of having drawn, by control part 7, drive platform rotating mechanism 33, with with the interarea that remains in the substrate 9 on the platform assembly 3 perpendicular the axle be the center, with platform 32 half-twists (step S191).Thus, the photosensitive material on the relative substrate in the direction of scanning in rayed zone 90 has changed 90 °.

According to necessary number of times, carry out following action repeatedly, promptly, after the direction of scanning changes, platform assembly 3 is moved towards the camera site, adjust the width and the spacing (step S12) in rayed zone 90, platform 32 is moved towards the scanning starting position, draw banded pattern.As above-mentioned, in Patten drawing device 1, also can pass through universal stage 32, on the photosensitive material on the substrate 9, draw cancellate pattern.

More than the Patten drawing device 1 of the 1st embodiment is described, in Patten drawing device 1, owing to compare with the raster fashion in past, a plurality of rayed zone 90 irradiates lights bigger to area are so can draw at high speed.In addition, by changing the width of the mask set opening 520 that forms by the 1st mask 53 and the 2nd mask 54, by optical module 58 amplifications or dwindle rayed zone 90, thereby can change the width and the spacing of the pattern of being drawn easily.Thus, resolution that can be higher, the pattern of (that is within a short period of time) drafting ribbon (or clathrate) at high speed.

Such as, in resolution with 1 μ m, in the length on 1 limit be draw on the foursquare substrate of 1m width in the scope of 20～30 μ m, spacing is under the situation of the banded pattern of 300～1500 μ m, only carry out under the scan condition by raster fashion with 1 light beam, because the restriction of the modulating speed of light beam, drawing needs the long period, even can arrange under the situation of a plurality of heads, still can't guarantee enough spaces.In the Patten drawing device 1 of present embodiment, such as, by in the scope of 100mm width, arranging a plurality of rayed zone 90, can tens of seconds, draw the pattern of above-mentioned condition.

In addition, in Patten drawing device 1, according to rayed zone 90 being taken the data that obtain and the setting width of importing in advance 718 and setting spacing 719, can automatically adjust the width and the spacing (that is, the width of the pattern of being drawn and spacing) in rayed zone 90.In addition, also can with the width of drawable pattern and the expanded range of spacing, improve the degree of freedom of drawing by changing mask by mask changer 6.

Figure 10 is the view of the 52a of mask portion of the Patten drawing device of expression the 2nd embodiment, and the composition beyond the 52a of mask portion of Patten drawing device is identical with Fig. 1.In addition, in Figure 10, be illustrated in the 1st mask maintaining part 55a and the 1st opening 531a that describes below by thick line.

The 52a of mask portion has 2 masks, wherein, along directions X (promptly, the direction of scanning in rayed zone) is arranged with a plurality of opening groups (being called " opening row " below) with rectangle of same width and length, this opening group arranges along the Y direction among Figure 10 (that is, with the perpendicular direction in the direction of scanning in rayed zone) according to a determining deviation and forms.In the following description, according to from order, be called " the 1st 53a of mask portion ", " the 2nd 54a of mask portion " near the mask portion of light injection part 51.In addition, the 52a of mask portion comprises: the 1st mask maintaining part 55a that keeps the 1st mask 53a; The 2nd mask maintaining part 56a that keeps the 2nd mask 54a; The mask slide mechanism 57a that the 1st mask 53a is relatively moved towards the Y direction relative to the 2nd mask 54a; Mask position changes mechanism 59, and this mask position changes mechanism 59 makes the 1st mask 53a and the 2nd mask 54a move towards directions X.

As shown in Figure 10, the 1st mask 53a and the 2nd mask 54a comprise that respectively 3 row of openings row (also can be 2 rows, perhaps more than 4 rows), if between the pairing opening row of 2 masks, compare, then the mask set with Fig. 4 is identical, the length and the width of the 1st opening 53a one side's opening are bigger, and the width of opening is identical.In addition, if compare between the opening in 1 mask row, the width and/or the spacing of opening that then constitutes opening row is different mutually.

The 2nd mask 54a contacts with the 1st mask 53a in the following manner, and this mode is: its opening (being called " the 2nd opening " below) 541a overlaps with opening (being called " the 1st opening " below) 531a of corresponding the 1st mask 53a.In the 52a of mask portion, the zone of the coincidence among the 1st opening 531a and the 2nd opening 541a forms as actual light by regional mask set opening 520a (being represented by parallel oblique line in the drawings).In addition, identical with the 1st embodiment, the 2nd mask 54a needn't be necessarily with the 1st mask 53a physical property contact also coincidence that can be optical.

Mask slide mechanism 57a comprises: travelling carriage 571a, this travelling carriage 571a keep the 1st mask maintaining part 55a and the 2nd mask maintaining part 56a; As the slip of drive source motor 572a; With the ball screw framework 573a that slides and be connected with motor 572a, when the control by control part 7, when sliding with motor 572a driving ball screw framework 573a, the 1st mask maintaining part 55a moves along the Y direction along travelling carriage 571a.Thus, the 1st mask 53a that remains on the 1st mask maintaining part 55a also moves along the Y direction, and the coincidence status of the 1st opening 531a and the 2nd opening 541a changes, the wide variety of each mask set opening 520a.In addition, by diagram abridged mechanism, the 1st mask maintaining part 55a move during, the 1st mask 53a and the 2nd mask 54a leave.

Mask position changes mechanism 59 and comprises: the travelling carriage maintaining part 591 that keeps travelling carriage 571a; Mask position changes with motor 592; Change the ball-screw 593 that is connected with motor 592 with mask position; Be fixed in the nut 594 on the travelling carriage 571a; Guide rail 595 changes with motor 592 when driving mask position by control part 7, and during ball-screw 593 rotations, with nut 594, travelling carriage 571a moves towards directions X along ball-screw 595.

In the Patten drawing device of the 2nd embodiment, when drawing a design, only adopt 1 row of openings row.Change 59, the 1 mask 53a of mechanism and the 2nd mask 54 moves along directions X by mask position, the opening row who is adopted be arranged at light injection part 51 under.Adopt any row of openings row no matter, still can't realize setting under the situation of width and setting spacing, identical with the 1st embodiment, change the 1st mask 53a and/or the 2nd mask 54a.

For the action of the Patten drawing device of the 2nd embodiment, except add the opening row that adopted determine and the aspect of location, other aspect is identical with the 1st embodiment.Promptly; by optical module 58, platform elevating mechanism 35 (with reference to Fig. 1) and mask slide mechanism 57a, the width and the spacing in the rayed zone of the opening that adopted row's mask set opening 520a are adjusted, then; only, carry out the drafting of banded a plurality of patterns repeatedly according to the number of times of necessity.

In the Patten drawing device of the 2nd embodiment, because prepare to have because the 1st mask 53a with the 2nd mask 54a and a plurality of openings rows of different width and spacing, and the opening that adopted row is selected, so can reduce the number of times of the 1st mask 53a and/or the 2nd mask 54a being replaced by other mask.Consequently, can tackle the drafting of multiple pattern apace.

Patten drawing device to the 3rd embodiment is described below.In the Patten drawing device of the 3rd embodiment, adopt pulsed laser, to replace the mercury vapor lamp 513 and the shutter 512 of the Patten drawing device 1 shown in Fig. 1, omitted platform rotating mechanism 33.Other basic composition is identical with Fig. 1, in the following description, adopts identical label.In the 3rd embodiment, on platform assembly 3, be provided with high-precision the position finding mechanism of laser length measurement etc., the signal that control part 7 receives from platform position finding mechanism, the paired pulses laser instrument is controlled, and thus, makes moving and light-struck startup/stop synchronously of platform 32.

Since with pulsed laser as light source, so can be in the Patten drawing device, only with the short period (1 nanosecond～tens of nanoseconds) to the photosensitive material irradiates light.In the rayed zone during by the position that should draw a design on the substrate 9, signal is sent to the driving circuit of pulsed laser from control part 7, thus, as shown in Figure 11, realize drafting with the pattern 91 of the corresponding a plurality of rectangles of shape in rayed zone.In addition, identical with the 1st embodiment, when drawing banded pattern, on one side transfer table 32, carry out the ejaculation of the pulsed light of pulsed laser on one side continuously repeatedly.

In addition, also can prepare edge and the perpendicular long banded mask of direction in direction of scanning, and replace the 1st mask 53 and the 2nd mask 54, with moving synchronously of platform 32, pulsed laser was started in moment, thus, on the photosensitive material on the substrate 9, can draw the banded pattern that extends with the perpendicular direction in direction of scanning.Consequently, at platform 32 repeatedly in the moving of directions X (and the Y direction of head 5 move), drafting, the rectangular patterns of carrying out banded a plurality of patterns that along the direction of scanning (directions X) extend drawn and along the drafting of the banded a plurality of patterns that extend with the perpendicular direction (Y direction) in direction of scanning, thus, can on photosensitive material, draw multiple pattern.Such as, can draw the black matrix" 92 of the shape of complexity shown in Figure 12.

As above-mentioned, in the Patten drawing device of the 3rd embodiment,, with moving synchronously of platform 32 light source is controlled, so can draw the pattern of various rules at high speed because the light source of the irradiation that starts/stop light at high speed is set.In addition, identical with the 1st embodiment, owing to can adopt 2 masks, easily and accurately change the width and the spacing in a plurality of rayed zone, so even under the situation of width that change should draw a design and spacing, still can tackle easily.

In the 1st～the 3rd embodiment, the example of the Patten drawing that carries out when being given in the manufacturing of color filter, but, in Patten drawing device of the present invention, owing to can draw the various patterns of band or rule at high speed, so also be suitable for other the various operations of manufacturing of various panel display apparatus of the drafting of the such pattern of requirement.

More than embodiments of the invention are described, still, the invention is not restricted to the foregoing description, can realize various changes.

Such as, the 1st opening of the 1st mask and the 2nd mask and the width of the 2nd opening and length are not limited to the example that provides among Fig. 4 and Figure 10, and is can the 2nd opening bigger, also can equate by the 1st and the 2nd opening.In addition, the opening shape of each mask is not limited to rectangle, so long as the opening that is parallel to each other along the edge of the direction of scanning in rayed zone then can suitably be drawn banded pattern.In addition, corresponding to the pattern of being drawn, the width of mask set opening and spacing are not certain yet.

Figure 13 is the view of another preferred embodiment of the mask that adopted in the expression pattern drawing apparatus 1.The 1st mask 53b and the 2nd mask 54b are pectination, make the rayed area coincidence that is equivalent to go up the spacing of arranging the broach that forms in Y direction shown in Figure 13 (with the perpendicular direction in direction of scanning), thus, also can form the mask set opening 520b that represents by parallel oblique line.

In addition, as shown in Figure 14, the 1st mask 53c (being illustrated by thick line in the drawings) and the 2nd mask 54c also are arranged with the plate of a plurality of rectangles, and the plate of these a plurality of rectangles is provided with the spacing that becomes the rayed zone, arranges along the Y direction.In addition, under the mask set opening 520c (being represented by the parallel oblique line among Figure 14) that the spacing of the spacing of the 1st mask 53c and the 2nd mask 54c the overlaps situation long along directions X, the light that penetrates from light injection part 51 is that beam cross section is along the long Line of light of Y direction.

The 1st mask can move relative to the 2nd mask, also can replace the 1st mask, and the 2nd mask moves, and can also be that two masks all move.In addition, relatively moving of the 1st mask and the 2nd mask also can be reflected to the image that camera 4 obtains in the monitor, and carried out with manual mode by the operator.

Camera 4 needn't necessarily be arranged on the support plate 34, and it also can be fixed on the outside of platform assembly 3, and head 5 moves to the top of camera 4.In addition, the shooting in rayed zone also can not shine directly into light on the shooting device of CCD etc., and is undertaken by the mode of indirectly range of exposures of regulation being taken.In addition, the detection of the width in rayed zone, spacing also can by along and the sensor devices of the perpendicular direction in direction of scanning 1 dimension of arranging arrange and carry out.

Be input to setting value in the input part 8 as long as show the width and the spacing in rayed zone in fact, also can import ratio such as width or spacing, width relative spacing.Perhaps, also can pass through the form of input substrate 9, by control part 7, specified width, which width and spacing.

In the 1st embodiment, by with platform 32 half-twists, can draw cancellate pattern, still, 2 groups of heads 5 can be set also, along orthogonal direction, draw banded pattern.In the case, need not platform rotating mechanism 33.

In the above-described embodiments, mention the photosensitive material of negative-type, still, also can adopt when development treatment, remove the photosensitive material of positive (Port ジ) type of exposed portion.In addition, photosensitive material also can be other the kind of not carrying out developing procedure.

In addition, as described in resembling, Patten drawing device of the present invention is particularly suitable for the manufacturing of the various panels of panel display apparatus (liquid crystal indicator, plasma display system, OLED display etc.), but the drafting of the trickle pattern of the rule of the glass substrate that its also suitable semiconductor substrate, tellite or photomask are used etc.

Above the present invention is specifically described, still, that has carried out is described as exemplary, and it is not determinate.Therefore only otherwise depart from the scope of the present invention, can realize various deformation and form.

Claims

1. Patten drawing device, this Patten drawing device is to draw a design on the photosensitive material on the substrate, it is characterized in that, comprising:

Light source;

Maintaining part keeps importing the substrate from the light of above-mentioned light source;

The 1st mask is arranged on the light path from the light of above-mentioned light source, arranges to be formed with a plurality of the 1st light that above-mentioned light passes through by the zone on the prescribed direction on the 1st mask;

The 2nd mask overlaps with above-mentioned the 1st mask optically, is formed with on the 2nd mask respectively to pass through the zone with above-mentioned a plurality of the 1st light by corresponding a plurality of the 2nd light in zone;

Mask travel mechanism along the afore mentioned rules direction, makes above-mentioned the 1st mask relatively move with respect to above-mentioned the 2nd mask;

Optical system is arranged between above-mentioned the 2nd mask and the above-mentioned maintaining part, makes above-mentioned the 2nd mask and above-mentioned photosensitive material realize conjugation optically;

Irradiation area travel mechanism, make the order by above-mentioned a plurality of the 1st light by the zone and above-mentioned a plurality of the 2nd light by a plurality of rayed zone on the above-mentioned photosensitive material that light shone in zone, along with the perpendicular direction of scanning of orientation in above-mentioned a plurality of rayed zone, relatively move with respect to above-mentioned photosensitive material.

2. Patten drawing device according to claim 1 is characterized in that, the width of the above-mentioned orientation in above-mentioned a plurality of rayed zone is identical, and the spacing in above-mentioned a plurality of rayed zone is certain.

3. Patten drawing device according to claim 2 is characterized in that, also includes test section, detects the width of the above-mentioned orientation separately in above-mentioned a plurality of rayed zone.

4. Patten drawing device according to claim 3 is characterized in that, also comprises:

Drive division drives aforementioned mask travel mechanism;

The mask mobile control division according to the testing result of above-mentioned test section, is controlled above-mentioned drive division.

5. Patten drawing device according to claim 1 is characterized in that, above-mentioned optical system comprises that multiplying power changes mechanism, amplifies or dwindles above-mentioned a plurality of rayed zone.

6. Patten drawing device according to claim 5 is characterized in that, also comprises test section, detects the spacing in above-mentioned a plurality of rayed zone.

7. Patten drawing device according to claim 6 is characterized in that, also comprises: drive division drives above-mentioned multiplying power and changes mechanism;

The multiplying power control part according to the testing result of above-mentioned test section, is controlled above-mentioned drive division.

8. Patten drawing device according to claim 5 is characterized in that, also includes the mechanism that changes the distance between above-mentioned maintaining part and the above-mentioned multiplying power change mechanism.

9. Patten drawing device according to claim 1 is characterized in that, also includes more converting mechanism, with at least 1 mask of being replaced by other in above-mentioned the 1st mask and above-mentioned the 2nd mask.

10. Patten drawing device according to claim 1 is characterized in that, also includes more converting mechanism, and above-mentioned the 1st mask and the 2nd mask are replaced by another one the 1st mask and another one the 2nd mask.

11. Patten drawing device according to claim 1 is characterized in that, also includes the rayed control part, with moving synchronously of above-mentioned a plurality of rayed zone, and the startup of the irradiation of the light that control is carried out photosensitive material/stop.

12. Patten drawing device according to claim 1, it is characterized in that, also include following such mechanism, promptly with remain in above-mentioned maintaining part on substrate on face vertical the axle be the center, make above-mentioned maintaining part rotation, above-mentioned direction of scanning is changed relatively with respect to photosensitive material.