WO2012157409A1

WO2012157409A1 - Exposure device and light-shielding plate

Info

Publication number: WO2012157409A1
Application number: PCT/JP2012/060940
Authority: WO
Inventors: 敏成新井; 和重橋本
Original assignee: 株式会社ブイ・テクノロジー
Priority date: 2011-05-16
Filing date: 2012-04-24
Publication date: 2012-11-22
Also published as: JP2012242454A; TW201248337A; JP5825470B2

Abstract

An exposure mask is provided with a plurality of pattern regions that correspond to display panels. A micro-lens array has first and second micro-lens array chips in the direction perpendicular to the scanning direction so that the chips partially overlap with each other in the direction perpendicular to the scanning direction. A light-shielding plate shields a part of these micro-lens array chips (22a) from light. An opening in the light-shielding plate restricts transmission of light through the micro-lens array chips such that the first micro-lens array chip exposes only two pattern regions and the second micro-lens array chip exposes only three other pattern regions. This makes it possible to expose a panel efficiently and inexpensively when substrates of different cell layouts are exposed.

Description

Exposure apparatus and shading plate

The present invention relates to an exposure apparatus using a microlens array and a light shielding plate used in the exposure apparatus, and more particularly, to an exposure apparatus capable of highly efficiently exposing substrates having different cell layouts and a light shielding plate used in the exposure apparatus. .

Unlike large liquid crystal display devices such as televisions, liquid crystal display devices mounted on devices such as mobile phones and portable information terminals are required to have smaller panels and higher definition panels. .

An exposure apparatus used when manufacturing a liquid crystal display panel of such a portable device conventionally uses a stepper used for exposure of a semiconductor device for high-definition exposure.

Conventionally, when a small liquid crystal display panel for a portable device is exposed by a stepper, light transmitted through a mask pattern is transmitted through a reduction optical system and then irradiated onto a substrate. At this time, the substrate to be exposed is, for example, a large 1.5 m square substrate, and the exposure is performed a plurality of times for each region to be one or a plurality of individual substrates. And the board | substrate with which all the area | regions used as an individual board | substrate by multiple times of exposure was divided | segmented, and a several glass substrate is manufactured.

However, in this stepper, since the size of the area exposed by one objective lens is determined, when producing a plurality of panels on one glass substrate, the boundary of the exposure area of the objective lens May be located inside the panel. Then, in the panel, the areas on both sides of the boundary of the exposure area are exposed with different shots, and there is a problem that the position of the wiring or the like is shifted at the boundary. Therefore, at this boundary, it is necessary to perform a so-called “next” process such as thickening the wiring pattern, forming the inclined end portion, and overlapping the inclined portion. In addition, even if this “next” process is performed, the portions subjected to this “next” may be connected on a straight line, resulting in stripes. It must be discarded. Further, even when the exposure pattern is a pattern that is difficult to process next, it is necessary to discard the panel at the boundary of the exposure area without making it a product.

Thus, an exposure apparatus using a microlens array has also been proposed (Patent Documents 1 and 2). However, a conventional exposure apparatus using a microlens array exposes a panel for a large-sized liquid crystal display device such as a television, and when applied as it is to a liquid crystal display device for a portable device, In the case of this liquid crystal display panel, since the panel is small and has various sizes, there is a problem that the manufacturing efficiency is poor.

FIG. 10 is a schematic view showing an exposure apparatus using a conventional microlens array. In the conventional exposure apparatus shown in FIG. 10, a substrate 40 to be exposed is arranged below a mask 20 held at a fixed position. The mask 20 is provided with a plurality of pattern regions 20a in which patterns to be exposed are formed in the respective cells 40a corresponding to the layout of the regions (cells 40a in FIG. 10) to be the panels of the substrate 40. Yes. The microlens array 22 supported by the microlens array holder 21 is inserted between the mask 20 and the substrate 40, and the microlens array 22 and the light source are emitted in one direction (first direction) while emitting the exposure light 15 from the light source. The pattern area 20a of the mask 20 is scanned with the exposure light 15 by moving in one direction 1). Then, the exposure light transmitted through each pattern region 20a of the mask 20 is transmitted to each microlens array chip 22a of the microlens array 22, and an erecting equal-magnification image of each pattern is formed on the substrate 40 by the microlens array chip 22a. The images are sequentially formed.

FIG. 11 is a view showing the configuration of a microlens array corresponding to the cell layout in the conventional exposure apparatus shown in FIG. As shown in FIG. 11, in the conventional exposure apparatus,

masks

20 and 200 corresponding to the cell layout of the substrate 40 are used, and

microlens arrays

220 and 221 are also used corresponding to the cell layout. That is, the

microlens arrays

220 and 221 are each provided with a plurality of microlens array chips 22b and 22c or a microlens array chip 22d, and each microlens array chip is in a second direction orthogonal to the first direction 1. 2 correspond to the pattern areas 20a and 20b, respectively.

Each microlens array chip has an end located in a region between a plurality of pattern regions 20a and 20b arranged in a direction (second direction 2) orthogonal to the scanning direction (first direction 1) of the

masks

20 and 200. Are arranged to be. That is, in the conventional exposure apparatus, when the microlens array chips 22b, 22c, and 22d are arranged so that the microlens array chips are overlapped with each other in the first direction 1, two substrates are provided on the substrate 40. The microlens array chip forms an overexposed region. In other cases, an unexposed region remains, and this region cannot be used for a panel. Therefore, in the case where the cell width is small (FIG. 11A) and the case where the cell width is large (FIG. 11B), the

microlens arrays

220 and 221 cannot be shared. , Not only masks, but also microlens arrays.

JP 2010-102149 A JP 2008-197226 A

As described above, high-definition is required as in liquid crystal display panels for portable devices, and in the case of a small panel, the use of a conventional stepper requires a “next” exposure pattern, and a microlens array However, there is a problem that the production efficiency is poor.

Further, in an exposure apparatus using a microlens array, a pattern corresponding to the layout of each cell of the substrate is formed on the mask. Further, the microlens array has each microlens array chip in the second direction 2. It is necessary to arrange one or more cells arranged in a row, and the end portion thereof must be located in a region between a plurality of cells arranged in the second direction 2, so that different microlens arrays are used depending on the cell layout. There is a need. Therefore, when exposing substrates having different cell layouts, it is necessary to replace the microlens array at the same time as the mask, resulting in a further reduction in manufacturing efficiency. Furthermore, since each microlens array is very expensive, there is a problem that the manufacturing cost of the panel increases.

The present invention has been made in view of such a problem, and an exposure apparatus capable of exposing a panel with high efficiency and low cost even when exposing substrates having different cell layouts, and a light shielding plate used in the exposure apparatus. The purpose is to provide.

An exposure apparatus according to the present invention includes a light source for emitting exposure light, and a mask having a plurality of pattern regions in which exposure light from the light source is incident and a pattern to be exposed is formed corresponding to a plurality of panels. A microlens array that allows the exposure light transmitted through the mask to enter and forms an erecting equal-magnification image of the mask pattern on the substrate; a holder that supports the microlens array; The mask and the substrate are relatively positioned with respect to the light source and the microlens array in a state in which a light shielding plate for restricting a light transmission region of the microlens array and a positional relationship between the light source and the microlens array are fixed. A driving device that moves and scans the exposure light in a first direction on the substrate; a control device that controls the driving device and the light source;
Have
The microlens array is configured by arranging a plurality of microlens array chips in a second direction orthogonal to the first direction so that a part thereof overlaps the first direction.
The light shielding plate distributes the microlens array chips so that each microlens array chip corresponds to one or a plurality of the pattern areas, and each pattern area corresponds to only one microlens array chip. In this case, a region in the microlens array chip that does not require light transmission is shielded, and an opening is provided in the region that requires light transmission.
As the exposure light, mercury lamp light or the like is used. The panel in the present invention means a pixel region of a liquid crystal display panel and its peripheral region, and an exposure pattern formed on the mask includes a pixel region pattern and a peripheral region circuit pattern.

In the exposure apparatus according to the present invention, for example, a plurality of light-shielding plates having different lengths in the second direction of the openings are prepared for the microlens array, and depending on the size of the pattern region, One of the plurality of light shielding plates is selected and used.

The light shielding plate according to the present invention includes a plurality of microlens array chips that receive exposure light transmitted through a mask having a plurality of pattern regions and form an erecting equal-magnification image of the mask pattern on the substrate. A light-shielding plate that is attached to a holder that supports the microlens array with respect to the arranged microlens array and regulates a light transmission region of the microlens array,
The plurality of microlens array chips are arranged such that some of them overlap each other in a direction perpendicular to the arrangement direction of the microlens array chips,
The shading plate is
When the microlens array chips are allocated such that each microlens array chip corresponds to one or a plurality of the pattern areas, and each pattern area corresponds to only one microlens array chip, The lens array chip is characterized in that a region that does not require light transmission is shielded and an opening is provided in a region that requires light transmission.

According to the exposure apparatus of the present invention, the plurality of microlens array chips of the microlens array are provided large so that the portions thereof overlap each other, and the shape of the opening portion of the light shielding plate attached to the microlens array holder By setting the position and position according to the pattern area, even if the pattern area formed on the mask, that is, the size of the display panel to be exposed is changed, the light shielding plate is changed to another one. Even if the microlens array itself is used as it is, the end portion of the exposure light transmission region in the microlens array chip can be positioned in the gap region between the pattern regions according to the pattern region. . Therefore, overexposure and non-exposure of the end portion of the microlens array chip can be prevented, and the replacement of the microlens array is unnecessary, so that the manufacturing cost can be reduced.

(A) is a top view which shows the micro lens array and light-shielding plate which concern on embodiment of this invention, (b) is a figure which shows the positional relationship of the micro lens array which installed the light-shielding plate, and the pattern area | region of a mask. 1 is a perspective view showing an exposure apparatus using a microlens array according to a first embodiment of the present invention. It is a perspective view which shows a mask stage and a micro lens array. It is a perspective view which shows the whole mask stage. 5A and 5B are diagrams illustrating a microlens array provided with a light shielding plate, where FIG. 5A is a plan view and FIG. 5B is a cross-sectional view taken along line AA in FIG. It is a figure which shows the relationship between the exposure light and mask in a scanning exposure process. It is a figure which shows the relationship between the exposure light in a scanning exposure process, and a micro lens array. It is a figure which shows the next process of FIG. (A) And (b) is a figure which shows the microlens array and light shielding board in the case of exposing the board | substrate from which a cell layout differs. It is a schematic diagram which shows the exposure apparatus using the conventional microlens array. FIG. 11 is a diagram showing a configuration of a microlens array corresponding to a cell layout in the conventional exposure apparatus shown in FIG. 10.

Hereinafter, embodiments of the present invention will be specifically described with reference to the accompanying drawings. FIG. 1A is a plan view showing a microlens array and a light shielding plate according to an embodiment of the present invention, and FIG. 1B is a diagram showing a positional relationship between a microlens array provided with the light shielding plate and a pattern area of a mask. It is. 2 is a perspective view showing an exposure apparatus using the microlens array according to the first embodiment of the present invention, FIG. 3 is a perspective view showing the mask stage and the microlens array, and FIG. 4 is a perspective view showing the entire mask stage. It is. As shown in FIG. 2, the exposure apparatus according to the present embodiment can move the glass substrate 40 in a scanning direction (first direction) 1 and a direction orthogonal to the scanning direction 1 (second direction 2). A substrate stage 12 is installed on the XY stage 11 so as to be movable in the first direction 1. A gantry 13 is installed above the XY stage 11 and the substrate stage 12, and four light sources 14 are fixedly installed on the gantry 13 as an example. These light sources 14 are, for example, high-pressure mercury lamp light sources, and irradiate ultraviolet exposure light 15 having a wavelength of 280 to 340 nm downward. The irradiation area of the exposure light 15 is rectangular as shown in FIG.

As shown in FIG. 3, a mask stage 18 is arranged below the light source 14 of the exposure light 15. A first guide 16 extending in the second direction 2 is suspended from the gantry 13, and a second guide 17 extending in the first direction 1 is suspended from the first guide 16. The first guide 16 is fixed on the gantry 13, and the second guide 17 is supported on the first guide 16 extending in the second direction 2 so as to be movable in the second direction 2. The four mask stages 18 are supported so as to be movable in the first direction 1 on the second guide 17 extending in the first direction 1 while maintaining the positional relationship with each other. The mask stage 18 is formed with a rectangular opening, and the mask 20 is supported in the opening. Accordingly, the mask 20 can be scanned with respect to the first direction 1 and can be shifted with respect to the second direction 2 by the first guide 16 and the second guide 17.

Below the mask 20, a microlens array holder 21 is installed, and a plurality of microlens array chips 22a are supported in the opening of the holder 21, and are composed of a plurality of microlens array chips 22a. A microlens array 22 is configured. The microlens array chip 22a is formed with a large number of microlenses, and an erecting equal-magnification image of the pattern of the mask 20 is formed on the substrate 40 disposed below the microlens array 22 by each microlens. An image is formed.

In the present embodiment, the exposure apparatus includes the mask 20 supported by the mask stage 18 and the substrate 40 on the substrate stage 12 relatively simultaneously and integrally with the light source 14 and the microlens array 22. A driving device for scanning in the first direction 1 is provided. The substrate 40 on the substrate stage 12 is configured to be shiftable in the second direction 2 with respect to the light source 14, the mask 20, and the microlens array 22 by moving the substrate stage 12 in the second direction 2. Yes. Note that the movement of the substrate stage 12 in the second direction 2 may be performed manually or may be performed by providing a driving device for shifting the substrate 40 and using this driving device. In the present embodiment, the plurality of microlens array chips 22 a are arranged in the second direction 2 and supported by the holder 21, and the holder 21 is fixed on the gantry 13. Accordingly, the exposure light 15 from the light source 14 is held on the substrate 40 by the microlens array 22, and the mask 40 and the substrate 40 move in the first direction 1 so that the substrate 40 is exposed. A pattern scanned in the light 15 and formed in the pattern area 20 a of the mask is exposed and transferred onto the substrate 40.

The scanning of the light source 14 and the microlens array 22 relative to the mask 20 and the substrate 40 by the first driving device in the first direction 1 is controlled by a control device (not shown). Then, after the exposure device scans the exposure light by controlling the drive device and the light source by the control device, when the substrate 40 is shifted in the second direction 2, the control device again controls the drive device and the light source. Repeat scanning the exposure light. Thereby, the scanning of the exposure light in the first direction 1 and the shift of the substrate 40 in the second direction 2 are sequentially performed, and the pattern forming region of the substrate is sequentially exposed.

The size of the mask 20 held on the mask stage 18 is, for example, a width in the second direction 2 of 400 mm. The mask 20 is provided with a pattern region 20a in which a pattern to be exposed is formed corresponding to a plurality of panels. In the present embodiment, a plurality of pattern regions 20 a are arranged in the first direction 1 continuously or at a predetermined pitch (illustrated example) to form pattern rows 20 c and 20 d, and this pattern row is in the second direction 2. A plurality of rows are arranged at a predetermined pitch. Each pattern region 20 a corresponds to each panel formed on the substrate, and a plurality of pattern regions 20 a are arranged corresponding to the layout of the cells 40 a on the substrate 40.

In the present embodiment, as shown in FIG. 1A, the microlens array 22 is configured by two microlens array chips 22a, and each microlens array chip 22a is mutually a part thereof. Are arranged so as to overlap in the first direction 1. Accordingly, when the microlens array 22 is scanned in the first direction 1 relative to the substrate 40 (see FIG. 8), each pattern row 20c, 20d arranged in the first direction 1 has two pieces. It corresponds to both or one of the microlens array chips 22a.

As shown in FIG. 1A, the microlens array 22 of the present embodiment is arranged so that a part of the microlens array chips 22a overlap in the first direction. A part of the transmitted light is incident on both microlens array chips 22a unless a light shielding plate 30 described later is provided. Therefore, a part of the panel formed by the pattern row 20d is overexposed by being exposed twice, and the remaining part is subjected to normal single exposure. A panel with such exposure unevenness cannot be used. Therefore, in order to avoid this, in the present embodiment, as shown in FIG. 1B, a light shielding plate 30 is provided to shield a region that does not require light transmission in the microlens array chip 22a. That is, the light shielding plate 30 is provided with a light shielding portion 30a and an opening 30b, and when the microlens array 22a is distributed so that the pattern region 20a corresponds to only one microlens array chip 22a, A region that does not require light transmission in the microlens array chip 22a is shielded by the light shielding portion 30a, and an opening 30b is provided in a region that requires light transmission in the microlens array chip 22a to transmit the transmitted light. That is, the light shielding unit 30b emits the exposure light to the micro lens array chip 22a on the side not corresponding to each pattern row so that the transmitted light of each pattern area of the mask is not incident on the two or more micro lens array chips 22a. Shield from light.

FIG. 5 is a view showing a microlens array provided with a light shielding plate, FIG. 5 (a) is a plan view, and FIG. 5 (b) is a cross-sectional view taken along line AA of FIG. 5 (a). As shown in FIG. 5, the microlens array 22 is configured by fixing two microlens array chips 22 a inside a frame-shaped microlens array holder 21. Each microlens array chip 22a is composed of four members, and each member is formed by two-dimensionally arranging convex microlenses on the front surface and / or back surface of the glass substrate. By transmitting parallel light through the microlens array chip 22a, a mask pattern is formed as an erecting equal-magnification image on the substrate. As shown in FIG. 5B, the light shielding plate 30 is provided with a light shielding portion 30a and an opening 30b in a predetermined shape so as to correspond to the size of the pattern 20a of the mask 20, and the microlens array 22 is provided. The peripheral edge is fixed to the microlens array holder 21 above. Thereby, in the present embodiment, the exposure light that is shielded by the light shielding portion 30 a and transmitted through the opening 30 b enters the microlens array 22. In the present embodiment, the microlens array chip 22a is constituted by four members, but the present invention is not limited by the number of members constituting the microlens array chip 22a. For example, the microlens array chip 22a can use eight members or the like.

The light shielding plate 30 is, for example, stainless steel having a thickness of about 100 μm. In the present embodiment, as shown in FIG. 5B, the light shielding plate 30 is fitted into a groove provided in the microlens array holder 21 to have a specific shape. It is configured to be fixed in position. Thereby, the accuracy of the light shielding position with respect to the microlens array chip 22a is improved. In addition, when fixing the light shielding plate 30, you may affix on the microlens array holder 21, for example by adhesion | attachment.

Next, the operation of the exposure apparatus using the microlens array configured as described above will be described. The glass substrate 40 on which the resist film is formed is transferred onto the substrate stage 12 and set at a position facing the mask 20 supported by the four mask stages 18. Then, the

guides

16 and 17 and the substrate stage 12 and the XY stage 11 hold the substrate 40 and the mask 20 in a fixed positional relationship and are driven simultaneously by a driving device.

In the present embodiment, as shown in FIG. 4, the masks 20 are respectively held on the four mask stages 18, and the four exposure lights 15 from the four light sources 14 are incident on the masks 20. The rectangular irradiation region of the exposure light 15 has a length in the width direction corresponding to the entire length of the mask 20 in the second direction 2 (direction orthogonal to the scanning direction). As shown in FIG. 6, the exposure light 15 is moved from the mask 20 and the substrate 40 simultaneously and relative to the exposure light 15 in the first direction 1. Is scanned in the scanning direction (first direction) indicated by the white arrow.

FIG. 7 is a perspective view showing a state in which the mask 20 is removed. As shown in FIG. 7, the exposure light 15 transmitted through each pattern region 20a of the mask 20 has two microlens array chips 22a whose rectangular irradiation regions are supported in the openings of the microlens array holder 21. Are in the microlens formation region. The positional relationship between the exposure light 15 and the microlens array 22 is fixed. As shown in FIG. 8, the exposure light 15 is generated while the mask 20 and the substrate 40 are moved together at the same time. The microlens array 22 is scanned relative to the mask 20 and the substrate 40 in the scanning direction indicated by the white arrow, and the exposure light 15 transmitted through the mask 20 is imaged on the substrate 40. As a result, the pattern of the mask 20 is transferred onto the substrate 40 as an erecting equal-magnification image, and a strip-shaped exposure pattern 41 is formed on the five-row resist.

In the present embodiment, the microlens array 22 is provided with two microlens array chips 22a, and the microlens array chips 22a are arranged so that some of them overlap each other in the first direction. ing. However, in the present embodiment, the light shielding plate 30 is fixed to the microlens array holder 21, and thus the microlens array 22a is arranged so that the pattern region 20a corresponds to only one microlens array chip 22a. The area where light transmission is unnecessary in the microlens array chip 22a is shielded by the light shielding part 30a, and the opening 30b is provided in the area where light transmission is necessary in the microlens array chip 22a to transmit the transmitted light. Shields the exposure light to the microlens array chip 22a on the side not corresponding to each pattern row so that the transmitted light of each pattern region of the mask does not enter two or more microlens array chips 22a. Then, by performing a single scanning operation on the resist film on the glass substrate 40, five panels can be exposed at the same time, and the exposure operation can be made highly efficient. At this time, since there is no seam of the microlens array chip 22a in each panel, it is not necessary to perform the so-called “next” process in the exposure pattern, and there is no overexposed region. Therefore, exposure unevenness does not occur in the exposure pattern.

The mask is usually about 400 mm in width, but if such a long microlens array is to be manufactured, the cost increases. In general, a microlens array having a chip shape having a length (width) of about 150 mm has a low relative manufacturing cost per unit length. Therefore, a plurality of microlens array chips are connected to form a microlens array corresponding to the mask width, or the microlens array holder 21 is provided with a microlens array chip having a length of 150 mm, for example. It is necessary to form a Cr film on the mask portion in the area where the lens array chip does not exist to block transmission of exposure light. In the latter case, an area that is not used for the glass substrate 40 (an area that does not become a panel) is generated, which is useless. Therefore, it is preferable that a plurality of microlens array chips are arranged in the second direction, and the microlens array is constituted by a plurality of microlens array chips each corresponding to the mask width. At this time, as in the present embodiment, the microlens array chips 22a are arranged so that parts thereof overlap each other in the first direction 1, and a part of the light transmission region is shielded by the light shielding plate 30. Thus, if one of the microlens array chips 22a corresponds to each pattern row of the mask 20 formed by being arranged in the first direction 1, so-called "next" is in the exposure pattern 41 of the panel. In addition, since a large number of panels and other types of panels can be exposed at the same time, it is efficient.

In the present embodiment, as shown in FIG. 9A, two microlens array chips 22a are used, and a part of the microlens array chip 22a is shielded by the light shielding plate 30 in the second direction 2. The light transmitted through the five patterned regions 20a arranged is made incident on one of the microlens array chips 22a. As shown in FIG. 9B, a mask corresponding to the substrate 40 having a different cell layout. When 200 is used, the microlens array 22 can be shared only by changing the light shielding plate 30. That is, in the mask 200 shown in FIG. 9B, four pattern regions 20b are formed in the second direction 2, and each pattern region 20b corresponds to each pattern region 20a in the mask 20 in FIG. The size in the second direction 2 is larger than that. In such a case, in the exposure apparatus, a plurality of light shielding plates having different lengths in the second direction 2 of the openings 30b are prepared in advance in correspondence with masks having different pattern region sizes. Depending on the size of the pattern region, one of a plurality of light shielding plates can be selected and used. That is, in the case of the mask 200 shown in FIG. 9B, the light shielding plate 31 corresponding to the size of the pattern region 20b is selected and used. As described above, even when a mask having a different pattern area size is used, the exposure light is transmitted through the microlens array chip 22a by using a light shielding plate having a different length in the second direction 2 of the opening 30b. The edge part of an area | region can be located in the clearance gap area | region between pattern areas, and the overexposure and unexposure of the edge part of the micro lens array chip | tip 22a can be prevented. And when exposing the panel of a different cell layout, since it can expose without exchanging the micro lens array 22, a panel can be exposed with high manufacturing efficiency. Further, since it is not necessary to provide different microlenses corresponding to the cell layout, it is possible to prevent an increase in manufacturing cost of the panel.

Although the light shielding plate 30 in the present embodiment is configured to shield the incident light from the mask 20 to the microlens array 22, the light shielding plate 30 shields the exposure light transmitted through the microlens array 22. It may be configured. In the present invention, the light shielding plate is provided with the light shielding portion 30a and the opening 30b so that the transmitted light of the pattern region 20a of the mask 20 does not pass through the two or more microlens array chips 22a and irradiate the substrate. As long as it is, it is not limited to the said aspect. For example, the light shielding plate 30 may not be fixed to the microlens array holder 21.

In addition, the microlens array 22 of the present embodiment is configured by two microlens array chips 22a. However, in the present invention, the microlens array 22 includes three or more microlens array chips 22a. Are arranged so that a part thereof overlaps with each other in the first direction, and a microlens array chip in which all of the exposure light transmitted through each pattern region 20a of the mask 20 overlaps with each other in the first direction. It may be configured to be transmitted through any of 22a.

According to the present invention, when exchanging a mask corresponding to a different cell layout, it is only necessary to change the light shielding plate, and it is not necessary to replace the microlens array, which is extremely useful for exposure of substrates having different cell layouts. . In addition, the present invention is required for high-definition and liquid crystal display panels for portable devices, and is useful for low-cost manufacturing of small panels.

1: first direction (scan direction), 2: second direction (direction orthogonal to the scan direction), 11: XY stage, 12: substrate stage, 13: mount, 14: light source, 15: exposure light, 16 : First guide, 17: Second guide, 18: Mask stage, 20: Mask, 20a, 20b: Pattern region, 20c, 20d: Pattern row, 21: Micro lens array holder, 22: Micro lens array, 22a: Micro Lens array chip, 30, 31: light shielding plate, 30a: light shielding portion, 30b: opening, 40: substrate, 41: exposure pattern

Claims

A light source that emits exposure light, a mask having a plurality of pattern areas in which exposure light from the light source is incident and a pattern to be exposed is formed corresponding to a plurality of panels, and exposure through the mask A microlens array that allows light to enter and forms an erecting equal-magnification image of the mask pattern on the substrate, a holder that supports the microlens array, and a light transmission region of the microlens array that is attached to the holder. The exposure light is moved by moving the mask and the substrate relative to the light source and the microlens array in a state where the positional relationship between the light shielding plate to be regulated, the light source and the microlens array is fixed. A driving device that scans in a first direction on the substrate; a control device that controls the driving device and the light source;
Have
The microlens array is configured by arranging a plurality of microlens array chips in a second direction orthogonal to the first direction so that a part thereof overlaps the first direction.
The light shielding plate distributes the microlens array chips so that each microlens array chip corresponds to one or a plurality of the pattern areas, and each pattern area corresponds to only one microlens array chip. An exposure apparatus characterized in that, in the microlens array chip, an area that does not require light transmission is shielded and an opening is provided in the area that requires light transmission.
A plurality of light shielding plates having different lengths in the second direction of the openings are prepared for the microlens array, and one of the plurality of light shielding plates is provided according to the size of the pattern region. 2. The exposure apparatus according to claim 1, wherein the exposure apparatus is selected and used.
With respect to a microlens array in which a plurality of microlens array chips are arranged so that exposure light transmitted through a mask having a plurality of pattern areas is incident and an erecting equal-magnification image of the mask pattern is formed on a substrate A light-shielding plate that is attached to a holder that supports the microlens array and regulates a light transmission region of the microlens array
The plurality of microlens array chips are arranged such that some of them overlap each other in a direction perpendicular to the arrangement direction of the microlens array chips,
The shading plate is
When the microlens array chips are allocated such that each microlens array chip corresponds to one or a plurality of the pattern areas, and each pattern area corresponds to only one microlens array chip, A light-shielding plate characterized by shielding an area that does not require light transmission in a lens array chip and having an opening in an area that requires light transmission.