JP5034632B2 - Pattern generator, pattern forming apparatus, and pattern generation method - Google Patents

Description

  The present invention relates to a pattern generator, a pattern forming apparatus, and a pattern generation method. More specifically, the present invention relates to a pattern generator that partially transmits illumination light and generates a pattern to be formed on a predetermined surface. The present invention relates to a pattern forming apparatus and a pattern generation method for generating a pattern to be formed.

  Conventionally, in a lithography process for manufacturing an electronic device such as a semiconductor element or a liquid crystal display element, a pattern formed on a mask (reticle, photomask, etc.) is coated with a sensitive agent such as a resist via a projection optical system. Projection exposure apparatuses that transfer onto (glass plates, wafers, etc.) are used.

  By the way, in recent years, regardless of the size of the device pattern, a so-called maskless type scanning type using a variable shaping mask (also called an active mask) instead of an expensive mask (a mask that is a fixed pattern master). Various exposure apparatuses have been proposed. As one type of the maskless scanning exposure apparatus, a scanning exposure apparatus that uses a DMD (Digital Micro-mirror Device), which is a kind of reflective spatial light modulator, as a variable shaping mask. Has been proposed (see, for example, Patent Document 1).

  However, when a DMD is used in a projection exposure apparatus instead of a transmissive mask, the cost of the apparatus can be reduced and the size can be reduced. However, since the DMD is a reflection type device, it is necessary to change the configuration of the optical system. There is. Therefore, development of a pattern generator (also referred to as a spatial light modulator) that can be used as an active mask instead of a mask of a projection exposure apparatus without changing the configuration of the optical system and the like has been expected.

JP 2004-327660 A

The present invention has been made under the circumstances described above. From a first viewpoint, the present invention is a pattern generator that partially transmits illumination light and generates a pattern to be formed on a predetermined surface. A plurality of opening pattern groups each including a plurality of opening patterns arranged at predetermined intervals in a first direction on a first surface different from the predetermined surface is a second orthogonal to the first direction in the first surface. An opening pattern portion disposed at a predetermined interval with respect to the direction and shifted by a predetermined distance with respect to the first direction; and disposed on the incident light incident side of the opening pattern portion, and each of the plurality of opening patterns A first condensing part for condensing illumination light; and an opening / closing mechanism capable of individually opening and closing the plurality of opening patterns. illumination Of a one side of the exit side of the illumination light arranged transparent substrate on the optical path, the other surface of the incident side of the illumination light of the transparent substrate, the light collection unit is formed 1 pattern generator.

According to this, the opening pattern portion has a second direction on the first surface different from the predetermined surface , that is, on one surface on the emission light emission side of the transparent substrate disposed on the optical path of the illumination light. And a plurality of opening pattern groups arranged at predetermined intervals with respect to the first direction orthogonal to the second direction. Each opening pattern group includes a plurality of opening patterns arranged at predetermined intervals in the first direction. Therefore, when viewed as a whole, the opening pattern portion has a plurality of opening patterns at a constant interval (interval smaller than the predetermined interval) in the first direction. A condensing part for condensing the illumination light is arranged on each of the plurality of opening patterns on the other surface of the transparent substrate on the incident light incident side of the opening pattern part. Therefore, for example, the illumination pattern is irradiated with illumination light through the condensing unit, and the plurality of opening patterns are individually opened and closed by the opening and closing mechanism, or the plurality of opening patterns are individually opened and closed by the opening and closing mechanism. By scanning the object to be generated relative to the opening pattern portion in the second direction, various patterns can be generated on the object with high accuracy. In addition, the first pattern generator can be used as an active mask that replaces the mask of the projection exposure apparatus without changing the configuration of the optical system.

According to a second aspect of the present invention, there is provided a pattern forming apparatus for forming a pattern on a predetermined surface, the first pattern generator; and based on pattern information to be formed on the predetermined surface, And a control device that controls the opening / closing mechanism of the pattern generator.

  According to this, the opening / closing mechanism of the first pattern generator is controlled by the control device based on the pattern information to be formed on the predetermined surface. For this reason, even if the pattern information to be formed is variously changed, it is possible to easily form a pattern on a predetermined surface.

The present invention is, to a third aspect, there is provided a pattern generation method for generating a pattern to be formed on a predetermined surface, the first surface different from the predetermined surface, at predetermined intervals in a first direction A plurality of opening pattern groups each including a plurality of arranged opening patterns are arranged at predetermined intervals in the second direction perpendicular to the first direction within the first surface and at predetermined intervals with respect to the first direction. A first step; irradiating illumination light to each of the plurality of opening patterns via a condensing part while individually opening and closing the plurality of opening patterns based on pattern information to be formed on the predetermined surface the second step and that; only contains, in the first step, the plurality of opening patterns groups on one side of the exit side of the illumination light is formed, the current on the other surface of the incident side of the illumination light A transparent member with a light part formed, Serial is a pattern generation method of one surface is disposed on an optical path of the illumination light as the first surface.

According to this, in the first step, the first surface different from the predetermined surface, namely on one surface of the exit side of the illumination light transparent member disposed in an optical path of the illumination light, in a first direction A plurality of opening pattern groups each including a plurality of opening patterns arranged at a predetermined interval are shifted by a predetermined distance with respect to a second direction orthogonal to the first direction within the first surface by a predetermined distance with respect to the first direction. Deploy. Accordingly, when viewed as a whole, the opening patterns are arranged at regular intervals (intervals smaller than a predetermined interval) in the first direction. Then, in the second step, based on the pattern information to be formed on the predetermined surface, the plurality of opening patterns are individually opened and closed, and the other of the plurality of opening patterns on the incident light incident side of the transparent member Illumination light is irradiated through a condensing part formed on the surface . Thereby, even if the pattern information to be formed is variously changed, it is possible to easily form a pattern according to the pattern information on the predetermined surface.

The present invention is, to a fourth aspect, the partially transmitting illumination light to a pattern generator for generating a pattern to be formed on a predetermined surface, on a different one of the surfaces and the predetermined surface A plurality of light transmission unit groups having a plurality of light transmission units arranged at predetermined intervals in the first direction, and the light source on the other surface of the plurality of light transmission unit groups located on the illumination light incident side A transparent member having a condensing part that condenses the illumination light from each of the plurality of light transmissive parts, and the light transmissive part groups are located at different positions with respect to a second direction orthogonal to the first direction. The light transmissive part included in one of the plurality of light transmissive part groups is other than the one of the plurality of light transmissive part groups with respect to the first direction. Arranged at a position different from any of the light transmission parts included in the light transmission part group A second pattern generator being.

According to this, it has a plurality of light transmission part groups having a plurality of light transmission parts arranged at predetermined intervals in the first direction on one surface different from the predetermined surface, and the plurality of light transmission part groups A transparent member having a condensing part for condensing the illumination light from the light source on each of the plurality of light transmitting parts is provided on the other surface located on the incident light incident side . The plurality of light transmission portion groups are arranged at different positions with respect to a second direction orthogonal to the first direction, and the light transmission portion included in one of the plurality of light transmission portion groups is a first direction . With respect to the direction, the light transmissive portions are arranged at positions different from any of the light transmissive portions included in other light transmissive portion groups excluding the one of the plurality of light transmissive portion groups. Therefore, with respect to the first direction, there are a plurality of light transmission parts at intervals smaller than the predetermined interval. Therefore, for example, in parallel with the case where light is not emitted from each light transmitting portion, the object whose pattern is to be generated is relatively scanned in the second direction with respect to the plurality of light transmitting portion groups. Various patterns can be accurately generated on the object.

  According to a fifth aspect of the present invention, there is provided a pattern forming apparatus for forming a pattern on a predetermined surface, provided corresponding to each of a plurality of light transmitting portions included in a plurality of light transmitting portion groups. A second pattern generator further comprising a switching mechanism for individually switching between a first state in which the illumination light is emitted from the light transmitting portion and a second state in which the illumination light is not emitted; and formed on the predetermined surface And a control device that controls the switching mechanism of the pattern generator based on power pattern information.

  According to this, since the control device controls the switching mechanism based on the pattern information to be formed on the predetermined surface, the pattern can be accurately formed on the object arranged on the predetermined surface. It becomes.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS. FIG. 1 shows a schematic configuration of an exposure apparatus 10 according to an embodiment. The exposure apparatus 10 is an exposure apparatus for manufacturing a liquid crystal display element.

  The exposure apparatus 10 includes an illumination system 12, an active mask 14 disposed along the horizontal plane (XY plane) below (−Z side) in FIG. 1 of the illumination system 12, and a plurality of units disposed below the active mask 14. Projection optical system module PLM (here, five projection optical units 16A are not shown in FIG. 1, refer to FIG. 2) including the projection optical units 16A, 16B, 16C, 16D, and 16E (here, five), and the projection optical system modules A plate stage 18 and the like arranged below the PLM in FIG. 1 are provided.

  The illumination system 12 includes a light source and an optical system that uniformizes the illuminance of light emitted from the light source, and exposes substantially the entire surface of the active mask 14 (at least an area including a pattern generator portion described later) as exposure illumination light ( Hereinafter, illumination is performed with a uniform illuminance with IL. As an example of the light source, an ultra-high pressure mercury lamp that emits a bright line in the ultraviolet region (for example, an i-line having a wavelength of 365 nm, a g-line having a wavelength of 436 nm, or the like) is used. As the light source, for example, a solid-state laser light source that emits laser light having a wavelength of 365 nm (for example, a third harmonic light source of an Nd-YAG laser) may be used.

  The active mask 14 is disposed below the illumination system 12 in FIG. 1 and is held by a holding device (not shown). The active mask 14 includes a transparent substrate 15 that is rectangular in plan view (as viewed from the + Z direction), and five pattern generators 22A, 22B, 22C, 22D, and 22E formed on a part of the transparent substrate 15. Yes. The specific configuration of the active mask 14 will be described in detail later.

  On the plate stage 18, a rectangular plate-shaped large glass substrate (hereinafter referred to as “plate”) P is placed. This plate P is a substrate for a display device. The plate stage 18 is freely driven in the XY plane (including rotation around the Z axis (θz rotation)) by a plate stage drive system 19 (not shown in FIG. 1, see FIG. 7) including a linear motor and the like. . Further, the plate stage 18 can be driven minutely in the Z-axis direction and tilted with respect to the XY plane (rotation around the X axis (θx rotation) and rotation around the Y axis (θy rotation)) by the plate stage drive system 19. It is.

  Position information of the plate stage 18 (including rotation information (θz rotation, θx rotation, and θy rotation) in addition to position information in the X-axis direction and Y-axis direction) is formed on (or provided on) the plate stage 18. ) The position information measured by the interferometer system 20 (not shown in FIG. 1; see FIG. 7) including a plurality of interferometers each irradiating the measurement surface with the measurement beam is the main controller 30 (not shown in FIG. 1). (See FIG. 7). Further, the position information of the plate stage 18 in the Z-axis direction is indirectly measured by a measurement system 21 (not shown in FIG. 1, refer to FIG. 7) that measures surface position information on the surface of the plate P. As the measurement system 21, for example, one disclosed in Japanese Patent Laid-Open No. 2001-215718 (corresponding to US Pat. No. 6,552,775) can be used. It should be noted that an encoder may be used instead of at least a part of the interferometer constituting the interferometer system 20, or an encoder system is provided in addition to the interferometer system 20, and a hybrid of the interferometer system 20 and the encoder system. The position information of the plate stage 18 may be measured by the system.

  As the five projection optical units 16A, 16B, 16C, 16D, and 16E of the projection optical system module PLM, for example, a refractive optical system in which a plurality of optical components are arranged along the optical axis can be used. A Dyson type optical system that has an optical system in part and forms an equal-magnification erect image is used. Among these, the projection optical units 16A, 16B, and 16C are arranged at predetermined intervals along the Y-axis direction, as shown in FIG. 2, and the remaining projection optical units 16D and 16E are on the + X side (FIG. 1 and FIG. 1). They are arranged at a predetermined interval along the Y-axis direction with a slight shift to the right side in FIG. That is, in this embodiment, the five projection optical units 16A, 16B, 16C, 16D, and 16E are arranged in a so-called zigzag pattern to form an array of projection optical units, and the plate stage 18 is scanned in the X-axis direction. The image fields (projection areas) of the five projection optical units 16A, 16B, 16C, 16D, and 16E can cover the entire rectangular area (shot area) to be exposed on the plate P. ing. A configuration similar to that of the projection optical system module PLM of the present embodiment is disclosed in detail in, for example, Japanese Patent Application Laid-Open No. 2001-215718 (corresponding US Pat. No. 6,552,775).

  Note that the projection optical units 16A, 16B, 16C, 16D, and 16E are not limited to the equal magnification system, but can use not only the reduction system but also the enlargement system, and the projection image may be an inverted image.

  Further, the exposure apparatus 10 is provided with an off-axis alignment system ALG (not shown in FIG. 1, see FIG. 7). The alignment system ALG includes a plurality of alignment sensors. As each alignment sensor, for example, the target mark is irradiated with a broadband detection light beam that does not expose the resist on the plate P, and an image is formed on the light receiving surface by reflected light from the target mark. An image processing method FIA (Field Image Alignment) type sensor that picks up an image of the target mark and an image of an index (not shown) using an image pickup device (CCD) or the like and outputs the image pickup signal is used. It has been.

  Next, the configuration and the like of the active mask 14 will be specifically described with reference to FIGS.

  As shown in FIG. 1, the active mask 14 includes a rectangular plate-like transparent substrate 15. The transparent substrate 15 is provided with pattern generators 22A to 22E at positions corresponding to the five projection optical units 16A to 16E described above. Therefore, the pattern generators 22A to 22E are also arranged in a staggered manner as schematically shown in the plan views of FIGS. On the upper surface of the transparent substrate 15, a light shielding film 17 is formed on almost the entire surface except for the pattern generators 22A to 22E.

  The pattern generator 22A is etched on the upper surface (the surface on the + Z side) of the transparent substrate 15 as shown in FIG. 3A which is a cross-sectional view taken along line AA in FIG. 2 (a cross-sectional view of the pattern generator 22A portion). And the element part 224 provided on the lower surface (the surface on the −Z side) of the transparent substrate 15 so as to face the light collecting part 31.

As shown in FIG. 3B, which is a bottom view of the pattern generator 22A, the element portions 224 are arranged on the lower surface of the transparent substrate 15 at a predetermined pitch in the Y-axis direction so that the center-to-center distance is constant. The display element groups 124 _{1 to} 124 _N (here, N = 16) each including a plurality of display elements 24 have a predetermined pitch in the X-axis direction and a Y-axis so that the interval in the center X-axis direction is constant. It is arranged by sequentially shifting by a predetermined distance with respect to the direction.

  As shown in FIG. 5A, each display element 24 includes a pattern region 32 in which a substantially square opening pattern 32a is formed at the center of a substantially square light shielding pattern, and a transparent region in which the pattern region 32 is formed. A shutter 27 provided on the lower surface (-Z side surface) of the substrate 15 via a pair of wire springs 28, a movable electrode 33 provided on the rear surface (+ Z side surface) of the shutter 27, and the surface of the pattern region 32 And a fixed electrode 29 fixed to the + Y side of the opening pattern 32a of (the lower surface of the transparent substrate 15). One end of each of the pair of wire springs 28 is connected to one end and the other end in the longitudinal direction (X-axis direction) of the shutter 27, and the other end is in the X-axis direction of the pattern region 32 on the lower surface of the transparent substrate 15. Are connected to the positions on the −Y side of the opening pattern 32a at the end portions on one side and the other side.

  The pattern region 32 (light-shielding pattern) has, for example, a square shape with one side La (La is, for example, 16 μm), and a square opening pattern 32a with one side Lb (Lb is, for example, 1 μm) at the center. Is formed. Accordingly, in the pattern region 32, light is not transmitted from portions other than the opening pattern 32a.

  In the present embodiment, almost the entire surface of each display element 24 portion on the lower surface (the surface on the −Z side) of the transparent substrate 15 is covered with a light-shielding film made of a metal such as chromium, and an opening is formed at the center by patterning or the like. Thus, the pattern region 32 is formed. However, the present invention is not limited thereto, and a transparent substrate, for example, a glass substrate may be attached to the lower surface of the transparent substrate 15, and the pattern region 32 similar to the above may be formed on the surface of the transparent substrate 15. For example, the pattern region 32 may be formed by attaching a silicon substrate to the lower surface and forming a through hole (opening) in the silicon substrate.

  In the display element 24 configured as described above, when a voltage from a voltage source (power source) (not shown) is applied between the movable electrode 33 and the fixed electrode 29, the electrode 29 is interposed between the electrodes 29 and 33. An electrostatic force (electrostatic attractive force) is generated, and the shutter 27 moves in the + Y direction as shown in FIG. Thereby, the shutter 27 closes the opening pattern 32a. Hereinafter, the state in which the opening pattern 32 a is closed by the shutter 27 is referred to as an off state of the display element 24.

  On the other hand, when the voltage application between the movable electrode 33 and the fixed electrode 29 is stopped, the shutter 27 moves in the −Y direction by the original position return force of the wire spring 28, and the state shown in FIG. Returns to the state in which the opening pattern 32a is not blocked. Hereinafter, a state in which the opening pattern 32 a is not blocked by the shutter 27 is referred to as an on state of the display element 24.

  In the present embodiment, a driving mechanism 26 (see FIG. 7) for the shutter 27 including the movable electrode 33 and the fixed electrode 29 is provided for each display element 24.

  Here, the display element 24 employs a configuration in which the shutter 27 closes the opening pattern 32a when a voltage is applied between the movable electrode 33 and the fixed electrode 29. However, the present invention is not limited to this. A configuration in which the shutter 27 closes the opening pattern 32a when no voltage is applied between the electrode 33 and the fixed electrode 29 may be employed.

In the present embodiment, the number of display elements 24 configured as described above is M, for example 10,000, on the lower surface of the transparent substrate 15 at a predetermined pitch (center distance) La in the Y-axis direction (no gap in the Y-axis direction). Each display element group 124 _i (i = 1 to N (= 16)) is configured by arranging them individually. In addition, the display element groups 124 _{1 to} 124 ₁₆ are sequentially shifted by the same distance Lb (for example, 1 μm) from one side of the opening pattern 32a with respect to the Y axis direction with no gap on the lower surface of the transparent substrate 15 in the X axis direction. Thus, the (La / Lb) columns (16 columns in the present embodiment) are arranged to form the element portion 224.

  Therefore, the entire element portion 224 has a pair of opposing sides parallel to the Y-axis direction of 10000 × La (16 cm when La is 16 μm), and the dimension in the X-axis direction is 16 × La (La Is 16 μm, it has a substantially parallelogram shape that is extremely long in the Y-axis direction. However, in FIG. 1 and the like, for the convenience of illustration, the dimension of the element portion 224 in the X-axis direction is shown larger than the actual size.

  Further, as is apparent from the above description, in this embodiment, the opening pattern 32a is arranged in an M number (for example, 10,000) with a predetermined interval La (for example, 16 μm) in the Y-axis direction, thereby opening pattern groups. (La / Lb) columns (for example, with the opening pattern group sequentially shifted by a predetermined distance La (for example, 16 μm) in the X-axis direction and a predetermined distance Lb (for example, 1 μm) in the Y-axis direction. , 16 columns). As a result of adopting such an arrangement method, as shown in FIG. 4 showing an opening pattern group (group of pattern regions 32) corresponding to two columns, the opening pattern 32a can be viewed in the Y-axis direction as follows. Arranged without gaps and without overlap. In other words, the two opening patterns 32a indicated by reference numeral 32a in FIG. 4 are in contact with the same straight line parallel to the X axis.

  Here, each display element 24 of the element part 224 can be manufactured by MEMS technology. In the present embodiment, the element portion 224 having a large number of display elements 24 is manufactured collectively on a single glass substrate.

  Returning to FIG. 3A, the light condensing unit 31 includes a plurality of spherical convex surfaces 25 formed by performing an etching process on the upper surface (the surface on the + Z side) of the transparent substrate 15. The plurality of convex surfaces 25 have a circular shape having the same diameter (La) as that of one side of the display element 24 and viewed in a plan view (as viewed from the + Z direction). It has a corresponding positional relationship. In the present embodiment, the illumination light IL irradiated from the illumination system 12 to the light collecting unit 31 is condensed by the plurality of convex surfaces 25 into the corresponding opening pattern 32a. That is, a microlens array is configured by a portion between the plurality of convex surfaces 25 and the lower surface of the transparent substrate 15, and the focal plane of each microlens coincides with the lower surface of the transparent substrate 15.

  Thereby, it is possible to increase the amount of illumination light IL that is incident on the light collecting unit 31 from above and passes through each opening pattern 32a. Hereinafter, the condensing unit 31 is also referred to as a microlens array 31, and the convex surface 25 is also referred to as a microlens 25. The numerical aperture (NA) of each microlens 25 is set larger than the numerical aperture of the projection optical unit 16A.

  The other pattern generators 22B to 22E are configured similarly to the pattern generator 22A. A large number of display elements 24 constituting these pattern generators 22B to 22E can also be manufactured by the MEMS technique in the same manner as described above. In the present embodiment, all the display elements constituting the pattern generators 22A to 22E are collectively formed on a single glass substrate.

  The pattern generators 22A to 22E are roughly arranged in a zigzag pattern as shown in FIG. 2, but precisely, as shown in FIG. 6 by picking up the pattern generators 22A and 22D, The position in the Y-axis direction (Y position) of the −Y end of the opening pattern 32a positioned closest to the −Y side of the pattern generator 22A, and the Y position of the + Y end of the opening pattern 32a positioned closest to the + Y side of the pattern generator 22D Match. Similarly, the Y position of the −Y end of the opening pattern 32a located closest to the −Y side of the pattern generator 22D matches the Y position of the + Y end of the opening pattern 32a located closest to the + Y side of the pattern generator 22B. Yes. Similarly, the Y position of the −Y end of the opening pattern 32a located closest to the −Y side of the pattern generator 22B matches the Y position of the + Y end of the opening pattern 32a located closest to the + Y side of the pattern generator 22E. Yes. Similarly, the Y position of the −Y end of the opening pattern 32a located closest to the −Y side of the pattern generator 22E matches the Y position of the + Y end of the opening pattern 32a located closest to the + Y side of the pattern generator 22C. Yes.

  In the present embodiment, the element units 224 of the pattern generators 22 </ b> B to 22 </ b> E also have a drive mechanism 26 for the shutter 27 including an electrode for each display element 24. Then, each of the pattern generators 22B to 22E includes MN (for example, 160000) drive mechanisms 26 and a total of 5MN (for example, 800,000) drive mechanisms 26 according to instructions from the main control device 30. It is individually controlled by the control device 40 (see FIG. 7). That is, including the shutter control device 40 and 5MN (for example, 800,000) drive mechanisms 26, driving the shutters 27 for opening and closing all the opening patterns 32a (setting the on / off states of the display elements 24). ) Is configured so as to be able to be performed individually (see FIG. 7).

  FIG. 7 is a block diagram showing the main configuration of the control system of the exposure apparatus 10.

Next, the principle of the exposure operation using the active mask 14 of the exposure apparatus 10 will be described based on FIG. 8 (A) to FIG. 8 (F). 8A to 8F schematically show the active mask 14 and the plate P in a simplified manner. Further, the active mask 14 of the present embodiment has five pattern generators, but in FIG. 8A to FIG. 8F, only two of them are denoted by “22 ₁ , 22 ₂ ”. Is shown. The pattern generators 22 ₁ and 22 ₂ actually have a large number (for example, 160000) of opening patterns 32a, but are shown as having only eight opening patterns. However, the arrangement method of the opening patterns (the arrangement method in which there is no gap and no overlap in the Y-axis direction) is the same as in the case of FIG.

  Further, it is assumed that a positive type photoresist is applied to the surface of the plate P, and a portion irradiated with the illumination light IL is dissolved by the developer. Hereinafter, irradiating the photoresist on the plate P with the illumination light IL is referred to as exposure or drawing.

During the exposure operation, as shown in FIGS. 8A to 8F, the plate P is scanned in the X-axis direction while the position of the active mask 14 is fixed. During this scanning, for example, as shown in FIG. 8B, the pattern to be drawn on the plate P (in FIGS. 8A to 8F, the pattern to be drawn is an alphabetic character). in the pattern having the "F" shape is assumed to be (opening pattern)) opening pattern located above (FIG. 8 (B), the opening pattern located closest -X side of the pattern generator 22 ₂ (this opening pattern In FIG. 8 (B), the illumination light is transmitted from a white square). That is, under the instruction of the main controller 30, the corresponding shutter is driven to close the opening patterns other than these opening patterns.

  Further, as shown in FIGS. 8C to 8F, while scanning the plate P, the opening pattern located above the pattern to be drawn is opened and the other opening patterns are closed by the shutter. To do. Thereby, a desired pattern (alphabet “F” -shaped pattern (formed in a portion where the resist is removed after development)) can be drawn on the plate P.

Here, in FIGS. 8A to 8F, the plate P is scanned in the X-axis direction, and the opening patterns provided in the pattern generators 22 ₁ and 22 ₂ overlap in the Y-axis direction. Since they are arranged without gaps, they are functionally regarded as equivalent to those in which the opening patterns are arranged along the Y-axis direction as shown in FIGS. 9 (A) to 9 (F). be able to. That is, as shown in FIG. 9A to FIG. 9F, it is considered that the openable / closable opening patterns are arranged in the active mask 14 without overlapping and without gaps along the Y-axis direction. I can do it. Therefore, various patterns can be easily drawn on the plate P simply by opening and closing the opening pattern according to the positional relationship between the active mask 14 and the plate P.

  By using the active mask 14 of this embodiment, it is possible to perform an exposure operation in the same manner as described with reference to FIGS. 8A to 8F and FIGS. 9A to 9F. It is. In other words, in the present embodiment, one pattern generator (for example, the pattern generator 22A) has MN (for example, 160000) square opening patterns 32a having a side Lb (for example, 1 μm) that can be opened and closed in the Y-axis direction. In addition, the active mask 14 as a whole can be regarded as having 5 MN opening patterns 32a in the Y-axis direction (for example, 800,000 (= 800,000 ==) by the five pattern generators 22A to 22E. 160000 × 5) pieces) can be regarded as arranged. Accordingly, the main controller 30 draws out of 5MN (for example, 80000) opening patterns 32a via the opening / closing mechanism 50 (shutter controller 40) in synchronization with the scanning of the plate stage 18 in the X-axis direction. By appropriately setting the OFF state and the ON state of each display element 24 so that the opening pattern 32a corresponding to the desired pattern to be closed is closed by the shutter 27 and the remaining opening pattern 32a is left open. It is possible to draw a desired pattern on the plate P.

  Although description will be omitted, in this embodiment, prior to the exposure operation, loading (or replacement) of the plate P with respect to the plate stage 18 and the position information of the target mark on the plate P using the alignment system ALG are described. A detection operation (alignment operation) or the like is performed by the main controller 30.

As described above in detail, according to the present embodiment, the pattern generators 22A to 22E are provided in the staggered arrangement on the active mask 14 arranged on the plane parallel to the surface of the plate P. On the lower surface (surface on the −Z side) of the transparent substrate 15 of each of the pattern generators 22A to 22E, M (M is, for example, 10,000) opening patterns 32a arranged at a predetermined interval (La) in the Y-axis direction. Including N (N is 16 for example) opening pattern groups (opening pattern groups included in the display element group 124 _i ) at a predetermined interval (La) in the X-axis direction and a predetermined distance (Lb ) Are sequentially shifted. That is, an element portion 224 (opening pattern portion) including N opening pattern groups (including MN opening patterns 32a) is provided on the lower surface of the transparent substrate 15. When viewed as a whole, the element portion 224 has the opening patterns 32a at a constant interval (interval Lb smaller than the predetermined interval La) in the Y-axis direction. In the present embodiment, Lb matches the length of one side of the square opening pattern 32a, and N matches La / Lb (La / Lb = 16, where La = 16 μm and Lb = 1 μm). Therefore, the opening pattern 32a is arranged in the element portion 224 without a gap and without overlapping in the Y-axis direction.

  Further, on the incident side of the illumination light IL of the element unit 224, a condensing unit 31 (that is, a microlens array 31) that condenses the illumination light IL on each of the MN opening patterns 32a is disposed.

  Each of the pattern generators 22A to 22E of the active mask 14 includes MN shutters 27 that can individually open and close MN opening patterns 32a and MN drive mechanisms 26 that drive the shutters 27, respectively. . Each drive mechanism 26 is controlled by the shutter control device 40 in accordance with an instruction from the main control device 30.

  Further, in the present embodiment, the positional relationship between the pattern generators 22A to 22E is the above-described positional relationship, and there are 5 × MN (800000 (= 16000 × 5)) opening patterns 32a in the Y-axis direction. It can be regarded as an array.

  Therefore, the main controller 30 irradiates the element unit 224 with the illumination light IL from the illumination system 12 via the light collecting unit 31, and the drive mechanism 26 individually opens and closes the MN opening patterns 32a while opening and closing the plate. By scanning the stage 18 relative to the active mask 14 in the X-axis direction, the illumination light IL that has passed through the aperture pattern 32a of the display element 24 that is in the on state passes through the projection optical system units 16A to 16E. Can be generated and various patterns can be accurately generated on the plate P held by the plate stage 18.

  Further, according to the exposure apparatus 10 of the present embodiment, the pattern of the active mask 14 is synchronized with the scanning of the plate stage 18 in the X-axis direction based on the pattern information to be formed on the plate P by the main controller 30. A shutter control device 40 that individually controls the drive mechanisms 26 of the generators 22A to 22E is controlled. For this reason, even if the pattern information to be formed is variously changed, it is possible to easily form a pattern on the plate P.

  In addition, the dimensions, the number, the arrangement, and the like of each part of the element part 224 in the above embodiment are examples, and the present invention is not limited to these. For example, in each of the pattern generators 22A to 22E, the MN opening patterns 32a do not necessarily have to be arranged without a gap in the Y-axis direction. For example, when the MN opening patterns 32a are arranged with a predetermined gap with respect to the Y-axis direction, the plate P is scanned in the X-axis direction and moved by a predetermined distance in the Y-axis direction. By repeating the operation alternately, various patterns can be generated on the plate P with high accuracy as in the above embodiment.

In the above embodiment, N (N is, for example, 16) opening pattern groups (an opening pattern group included in the display element group 124 _i ) each including M (M is, for example, 10,000) opening patterns 32a. However, the present invention is not limited to this, but is limited to a predetermined interval (La) in the X axis direction and a predetermined distance (Lb) in the Y axis direction. ) May be shifted by a predetermined distance Lb in no particular order. In short, it is sufficient that the amount of deviation between the N opening pattern groups does not exceed La at the maximum, and the positions in the Y-axis direction do not coincide with each other in each of the N opening pattern groups. Further, the opening pattern 32a is not limited to a square in a plan view (viewed from the Z-axis direction), but may be other shapes such as a rectangle or an ellipse as well as a circle. When the opening pattern is rectangular or elliptical in plan view, it is desirable that the opening pattern groups are shifted by a distance that is a natural number times the size of the opening pattern in the Y-axis direction.

  When a square or circular opening pattern is used as the opening pattern, the length or diameter of one side of the opening pattern is not limited to 1 μm, but is determined according to the required resolution (minimum line width). Just do it.

  In the above-described embodiment, the case where the light transmission part is formed by the opening pattern 32a has been described. However, the present invention is not limited to this, and the light transmission part is disposed at a different position on the surface different from the surface of the plate P. May be any member (or part thereof) through which is transmitted.

  In the above embodiment, the direction of the tangent line that contacts the two opening patterns 32a is parallel to the X axis, and the pattern is formed on the plate P without any gap by scanning the plate P in the X axis direction. Explained the case. However, the present invention is not limited to this, and by scanning the plate P in the tangential direction in contact with two arbitrarily arranged light transmission parts (opening patterns, etc.), the size of at least two light transmission parts in the direction intersecting the tangential direction. Can be formed on the plate P.

  In the above embodiment, the case where the active mask 14 has the five pattern generators 22A to 22E has been described. However, the present invention is not limited to this, and the active mask 14 is one, two, three, four, or You may have six or more pattern generators. In the above embodiment, five patterns are arranged in a staggered pattern as shown in FIGS. 1 and 2 on the active mask 14 according to the arrangement of the projection optical units 16A to 16E constituting the projection optical system module PLM. Generators 22A to 22E are provided. However, it is not necessary to provide five projection optical units and pattern generators, and the arrangement is not limited to the above arrangement. For example, a plurality of pattern generators and projection optical units may be arranged at predetermined intervals in the Y-axis direction, or a plurality of pattern generators and projection optical units may be arranged at predetermined intervals in the X-axis direction. In these cases, it is conceivable that the entire surface of the plate P cannot be exposed by one scanning operation (movement of the plate P along the X-axis direction). The entire surface of the plate P may be exposed by performing a scanning operation. In particular, in the latter case, the scan length of the plate P in the X-axis direction can be shortened.

  Further, at least one of the projection optical unit and the pattern generator may be provided. If the length of the image field of the projection optical unit in the non-scanning direction is several times the length of the pattern generator in the non-scanning direction, only one projection unit may be provided. Conversely, if the length of the pattern generator in the non-scanning direction is several times the length of the image field of the projection optical unit in the non-scanning direction, only one pattern generator may be provided.

  In the above embodiment, for example, a display element 24 ′ shown in FIG. 10A may be adopted as the display element of the element portion 224 instead of the display element 24. The display element 24 ′ is also provided with a fixed electrode 39 at a position on the −Y side (−Y side of the original position of the shutter 27) of the opening pattern 32 a of the pattern region 32 in the display element 24. Thus, the fixed electrode 29 and the fixed electrode 39 are provided, and the fixed electrode 29, 39 and the movable electrode 33 are included to constitute the drive mechanism 26 of the shutter 27, so that the opening pattern 32a is opened and closed by the shutter 27. Can be performed at high speed. Further, by adjusting the voltage value applied between the fixed electrodes 29 and 39 and the movable electrode 33, the opening degree of the opening pattern 32a can be adjusted.

  In the above embodiment, a display element 24 ″ as shown in FIG. 10B can be adopted as the display element of the element portion 224. The display element 24 ″ is formed by the pattern region 32. A sheet-like shutter 27 ′, a part of which is fixed to the lower surface of the transparent substrate through a fixing member 41, two movable electrodes 33A, 33B fixed to the shutter 27 ′, and the movable electrodes 33A, Corresponding to 33B, fixed electrodes 49A and 49B fixed to the lower surface of the transparent substrate (pattern region 32) are provided. The shutter 27 'is made of, for example, a shape memory alloy or the like. When no voltage is applied between any of the electrodes, the shutter 27' is in a rounded state and is emitted from the opening pattern 32a as shown in FIG. The illumination light IL is not obstructed.

  According to the display element 24 ″, when a voltage is applied between the fixed electrode 49A and the movable electrode 33A, the movable electrode 33A is attracted to the fixed electrode 49A as shown in FIG. 10C, when a voltage is applied between the fixed electrode 49B and the movable electrode 33B, the movable electrode 33B is attracted to the fixed electrode 49B as shown in FIG. 10D. The opening pattern 32a is closed by the shutter 27 '.

  In the above embodiment, a display element 124A as shown in FIG. 11A can be adopted as the display element of the element portion 224. In the display element 124A, the shutter 27 is fixed to the lower surface (the surface on the −Z side) of the transparent substrate (pattern region 32) via the hinge 51 and a torsion spring (not shown). The movable electrodes 133A and 133B are respectively fixed to one surface and the other surface of the shutter 27, and the corresponding fixed electrodes 149A and 149B are fixed to the pattern region 32 (transparent substrate). The shutter 27 is set to be parallel to the XZ plane as shown in FIG. 11A when no voltage is applied between any of the electrodes.

  For example, when a voltage is applied between the fixed electrode 149A and the movable electrode 133A, the shutter 27 closes the opening pattern 32a as shown by a solid line in FIG. 11B, and the display element 124A is turned off. It becomes a state. On the other hand, when a voltage is applied between the fixed electrode 149B and the movable electrode 133B, the shutter 27 rotates counterclockwise around the hinge 51, and the state shown by the broken line in FIG. The opening pattern 32a is opened (the display element 124A is turned on). Note that the fixed electrode 149 </ b> B and the movable electrode 133 </ b> B are not necessarily provided when the original position return force of a torsion spring (not shown) is strong.

  In the above embodiment, a display element 124B as shown in FIG. 11C can be adopted as the display element of the element portion 224. In the display element 124B, a block 52 having a right isosceles triangle shape as viewed from the −X side in the display element 124A is provided on the transparent substrate (pattern region 32), and the fixed electrode 149B is fixed to the inclined surface 52a of the block. It corresponds to what is. By adopting such a configuration, the movement range (movement angle) of the shutter 27 can be made smaller than that of the display element 124A of FIG. It becomes possible.

  In addition, as a display element of the element unit 224, for example, two shutters, a shutter for adjusting the size (opening) of the opening pattern and a shutter for opening and closing the adjusted opening pattern, are provided. It is also possible to employ a configuration provided.

  In the above embodiment and each of the above modifications, the case where the pattern generators 22A to 22E are integrally formed on the transparent substrate 15 of the active mask 14 has been described. However, the present invention is not limited to this. The active mask 14 may include a light-shielding plate member in which one or more openings are formed, and one or more pattern generators mounted in the openings of the plate member.

  In the above embodiment, the microlens array 31 is formed on the upper surface of the transparent substrate 15 and the element portion 224 is directly formed on the lower surface of the transparent substrate 15. However, the present invention is not limited to this. That is, the element unit 224 is formed on a substrate different from the microlens array, for example, a substrate such as a glass plate or a wafer, and the substrate and the microlens array are held by a holding member while maintaining a predetermined positional relationship. It is also good. In this case, a through hole is formed in the substrate portion corresponding to each opening pattern of the element portion 224.

  In the above-described embodiment, the pattern generators 22A to 22E (more precisely, the opening patterns 32a) are described as being arranged so as not to overlap in the Y-axis direction as shown in FIG. Of course, the present invention is not limited to this. For example, the pattern generators 22A to 22E may be arranged so that the opening patterns 32a overlap with each other in the Y-axis direction, as shown in FIG. In this case, in the portion that overlaps in the Y-axis direction (the portion that is hatched in FIG. 12A), the illumination light that passes through the overlapping opening patterns 32a (opening patterns 32a whose positions in the Y-axis direction coincide with each other). What is necessary is just to make it the total of the light quantity I of IL correspond with the light quantity I of the illumination light IL which passes the other opening pattern 32a.

  FIG. 12B shows the light amount distribution of the illumination light IL transmitted through the pattern generators 22A and 22D when the entire surface of the plate P is evenly exposed (the light amount of the illumination light IL within the range F in FIG. 12A). Distribution). As can be seen from FIG. 12B, in the vicinity of the −Y side end (in the range d) of the pattern generator 22A, the light amount I of the illumination light IL that passes through the opening pattern 32a as it approaches the −Y side end. In the vicinity of the + Y side end of the pattern generator 22D (within the range d), the light amount I of the illumination light IL that passes through the opening pattern 32a is reduced as it approaches the + Y side end, and thus within the range d. The total amount of the light quantity I can be made to coincide with the light quantity I of other portions. As the light amount adjustment method, for example, a configuration in which the opening degree of the shutter 27 (opening pattern 32a) can be flexibly adjusted may be adopted, and the size of the opening located in the range d is gradually increased in advance. It is good also as setting so that it may become small. In order to be able to adjust the opening degree flexibly, a plurality of fixed electrodes may be prepared, and the fixed electrode to which a voltage is applied may be selected according to the opening degree.

  Instead of gradually decreasing (or increasing) the light amount I of the illumination light IL that passes through the opening pattern 32a within the range d of the pattern generators 22A and 22D as shown in FIG. 12B, it is shown in FIG. As described above, the light amount I of the illumination light IL transmitted through the opening pattern 32a within the range d of the pattern generators 22A and 22D may be set to ½ of the light amount I in the other portions. On the other hand, the pattern generators 22A and 22D have the light quantity I of the illumination light IL that passes through the opening pattern 32a in the range d as 1 / n of the light quantity I in other portions (n is a number larger than 2). On the other side of the generators 22A and 22D, the light amount I of the illumination light IL that passes through the opening pattern 32a in the range d may be set to (n-1) / n of the light amount I in the other part.

  In any case, when the opening degree of the opening pattern is adjusted by driving the shutter in a part of the pattern generators 22A, 22D, the shutter is driven according to an instruction from the main controller 30. 40.

  In the above-described embodiment and each modified example, the shutter 27 is driven using an electrostatic force. However, the present invention is not limited to this. For example, a driving mechanism that uses electromagnetic force (Lorentz force) to open and close the shutter 27, It is also possible to employ a drive mechanism using a piezoelectric element.

  Further, the present invention is not limited to application to an exposure apparatus for manufacturing a liquid crystal display element. For example, an exposure apparatus for a display apparatus such as a plasma display, an exposure apparatus for manufacturing a semiconductor device, and an imaging element The present invention can be widely applied to exposure apparatuses for manufacturing various devices such as (CCD, etc.), micromachines, thin film magnetic heads, and DNA chips. Furthermore, the present invention can also be applied to an exposure apparatus that manufactures a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a lithography process. As described above, the object to be exposed to which the illumination light IL is irradiated in the above embodiment is not limited to the glass plate, but may be another object such as a wafer, a ceramic substrate, or a mask blank.

  Heretofore, the case where the present invention is applied to a scanning exposure apparatus that involves a plate (substrate) scanning operation has been described. However, the present invention is not limited to this, and a step-and-repeat type exposure apparatus (so-called stepper) is used. ) Or an exposure apparatus that performs still exposure, such as a step-and-stitch method. When the present invention is applied to these exposure apparatuses, a plurality of pattern generators of the present invention are provided with active masks arranged on the same member in a positional relationship that does not overlap with each other, and the substrate is exposed using this active mask. It is only necessary to alternately and repeatedly perform the operation of performing the step and the operation of moving the substrate stepwise. The present invention can also be applied to a proximity type exposure apparatus that does not use a projection optical system.

  In addition to this, immersion exposure in which liquid is filled between the projection optical system and the wafer as disclosed in, for example, WO 2004/053955 (corresponding to US Patent Application Publication No. 2005/0259234). The present invention may be applied to an apparatus or the like.

  As is apparent from the above description, the pattern generator of the present invention can be used as an active mask that replaces the mask of the projection exposure apparatus without changing the configuration of the optical system.

  As described above, the pattern generator of the present invention is suitable for generating a pattern to be formed on a predetermined surface by partially transmitting illumination light. The pattern generation method and pattern generation apparatus of the present invention are suitable for generating a pattern to be formed on a predetermined surface.

It is the schematic which shows the exposure apparatus which concerns on one Embodiment. It is a figure which shows the positional relationship in the XY plane of an active mask 14, a projection optical unit, and a plate. 3A is a cross-sectional view taken along the line AA in FIG. 2, and FIG. 3B is a diagram illustrating an arrangement of display elements. It is a figure which takes out and shows 2 columns of the display elements (pattern area | region) of FIG. 3 (B). FIG. 5A is a diagram showing the configuration of the display element, and FIG. 5B is a diagram for explaining the opening / closing operation of the opening pattern by the shutter 27 constituting the display element. It is a figure which shows the positional relationship of pattern generator 22A and 22D. It is a block diagram which shows the main structures of the control system of the exposure apparatus of one Embodiment. FIGS. 8A to 8F are views (No. 1) for explaining the exposure principle of the embodiment. FIGS. 9A to 9F are views (No. 2) for explaining the exposure principle of the embodiment. FIG. 10A is a diagram illustrating a first modification of the display element, and FIGS. 10B to 10D are diagrams illustrating a second modification of the display element. FIG. 11A and FIG. 11B are diagrams showing a third modification of the display element, and FIG. 11C is a diagram showing a fourth modification of the display element. FIG. 12A to FIG. 12C are diagrams for describing modified examples of the active mask.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... Exposure apparatus, 14 ... Active mask, 15 ... Transparent substrate, 16A-16E ... Projection optical unit, 18 ... Plate stage, 25 ... Micro lens, 26 ... Drive mechanism, 27 ... Shutter, 31 ... Micro lens array, 32a ... Opening pattern, 30 ... main controller, 50 ... opening / closing mechanism, P ... plate.

Claims (31)

A pattern generator that partially transmits illumination light and generates a pattern to be formed on a predetermined surface,
A plurality of opening pattern groups each including a plurality of opening patterns arranged at predetermined intervals in a first direction on a first surface different from the predetermined surface is a second orthogonal to the first direction in the first surface. Opening pattern portions arranged at predetermined intervals with respect to the direction and shifted by a predetermined distance with respect to the first direction;
A condensing part that is arranged on the incident light incident side of the opening pattern part and condenses the illumination light on each of the plurality of opening patterns;
Wherein a plurality of opening patterns individually openable closing mechanism; equipped with,
The first surface on which the plurality of opening pattern groups of the opening pattern portion is formed is one surface on the emission light emission side of the transparent substrate disposed on the optical path of the illumination light, and wherein the other surface of the incident side of the illumination light, the focusing pattern generator light portions that have been formed. The pattern generator according to claim 1 , wherein the plurality of opening pattern groups are formed in a light shielding film formed on one surface of the transparent substrate. The condensing section, the pattern generator according to claim 1 or 2 having a plurality of condensing elements of the configuration corresponding to the plurality of opening patterns. The pattern generator according to claim 3 , wherein the condensing unit is a microlens array having a microlens as each condensing element unit. Wherein the predetermined distance is a displacement amount between the plurality of openings pattern groups are all the distance der Ru請 Motomeko 1-4 in accordance with the first direction of the size of each opening patterns included in each aperture pattern group A pattern generator according to claim 1. Wherein the opening pattern portion, the claim 1-5 in which the arrangement pitch of the plurality of opening patterns included in each aperture pattern group includes a number of openings pattern group divided by the first direction of the size of each opening pattern The pattern generator according to any one of the above. Wherein a plurality of opening patterns group of the opening pattern portion, wherein the opening and closing mechanism, the pattern generator according to any one of claims 1 to 6 formed on the same substrate. The opening and closing mechanism includes a plurality of shutter members individually corresponding to the plurality of opening patterns, the pattern generator according to any one of claims 1 to 7 including a drive mechanism for driving individually the shutter member of said plurality of . The pattern generator according to claim 8 , wherein the driving mechanism drives the shutter member by electrostatic force. On the one surface of the transparent substrate , a plurality of the opening pattern portions are arranged at a predetermined distance in the first direction,
A plurality of corresponding light condensing parts are arranged on the illumination light incident side of each opening pattern part,
The opening and closing mechanism, the pattern generator according to any one of the plurality of opening patterns portions more claims aperture pattern can be individually opened and closed respectively included in 1-9. On the one surface of the transparent substrate , a plurality of the opening pattern portions are arranged apart in the second direction,
A plurality of corresponding light condensing parts are arranged on the illumination light incident side of each opening pattern part,
The opening and closing mechanism, the pattern generator according to any one of claims 1 to 10 plural opening patterns are individually openable and closable respectively included in the plurality of opening patterns unit. A pattern forming apparatus for forming a pattern on a predetermined surface,
A pattern generator according to any one of claims 1 to 11 ;
And a control device that controls the opening / closing mechanism of the pattern generator based on pattern information to be formed on the predetermined surface. The pattern forming apparatus according to claim 12 , further comprising an optical system that forms a pattern generated by the pattern generator on the predetermined surface. A moving body that holds an object on the predetermined surface;
A relative movement device for relatively moving the movable body and the pattern generator in the second direction;
Further comprising
Wherein the control device, on the basis of the pattern information, the pattern forming apparatus according to claim 12 or 13, in synchronization with control and the opening and closing mechanism and the relative movement device. The pattern forming device according to claim 14 , wherein the control device controls the opening / closing mechanism and the relative movement device in synchronization with each other based on the pattern information, and adjusts the opening degree of the plurality of specific opening patterns. A pattern generation method for generating a pattern to be formed on a predetermined surface,
On the first surface different from the predetermined plane, the orthogonal multiple opening patterns arranged at predetermined intervals in a first direction a plurality of openings pattern groups each comprising, in a first direction in the first plane A first step of disposing at a predetermined interval with respect to two directions and a predetermined distance with respect to the first direction;
A second step of irradiating each of the plurality of opening patterns with illumination light via a condensing part while individually opening and closing the plurality of opening patterns based on pattern information to be formed on the predetermined surface; ; only including,
In the first step, a transparent member in which the plurality of aperture pattern groups are formed on one surface on the illumination light emission side and the light condensing part is formed on the other surface on the illumination light incident side, The pattern generation method which arrange | positions the said one surface on the optical path of the said illumination light as said 1st surface . The pattern generation method according to claim 16 , wherein the transparent member has a plurality of condensing element portions arranged corresponding to the plurality of opening patterns. Wherein the predetermined distance is a displacement amount between the plurality of opening patterns groups, according to the distance der Ru請 Motomeko 16 or 17 in accordance with the first direction of the size of each opening patterns included in each aperture pattern group Pattern generation method. The plurality of aperture pattern groups, the arrangement pitch of the plurality of opening patterns included in each aperture pattern group, claims 16 to which contains the number of the opening pattern group divided by the first direction of the size of each opening pattern The pattern generation method according to claim 18 . Results of the second step, the illumination light transmitted through the part of the plurality of opening patterns, any one of claims 16-19, further comprising a third step of projecting onto the predetermined surface through the optical system The pattern generation method according to item. In the second step, in synchronism with individually opening and closing the plurality of opening patterns, any one of claims 16-20 for relatively moving the plurality of openings pattern groups and the object in the second direction The pattern generation method described in 1. The pattern generation according to any one of claims 16 to 21 , wherein, in the second step, the plurality of opening patterns are individually opened and closed so that the opening degree is adjusted in a part of the plurality of opening patterns. Method. When the plurality of patterns are connected and formed on the predetermined surface, the opening degree is adjusted in a part of the plurality of opening patterns corresponding to the connecting portions of the plurality of patterns, so that the opening degree is adjusted. The pattern generation method according to claim 22 , wherein the plurality of opening patterns are individually opened and closed. A pattern generator that partially transmits illumination light and generates a pattern to be formed on a predetermined surface,
Wherein the plurality has a light transmitting portion group having the plurality of light transmitting portions arranged at predetermined intervals in a first direction on a different one of the surfaces and the predetermined surface, the light transmitting part groups of the plurality of the illumination light A transparent member having a condensing part that condenses the illumination light from the light source on each of the plurality of light transmission parts on the other surface located on the incident side ,
The light transmissive portion group is disposed at a position different from each other with respect to a second direction orthogonal to the first direction, and the light transmissive portion included in one of the plurality of light transmissive portion groups includes the first direction. A pattern generator arranged in a position different from any of the light transmission parts included in another light transmission part group except the one of the plurality of light transmission part groups in one direction. 25. The pattern generator according to claim 24 , wherein in the light transmitting portion group, the intervals between the light transmitting portions are equal. Pattern generator according to claim 24 or 25 further comprising a light source for generating the illumination light emitted from the light transmitting unit. The pattern generator according to any one of claims 24 to 26 , wherein each of the light transmission portions is an opening pattern. Between a first state in which the illumination light is emitted from the corresponding light transmission part and a second state in which the illumination light is not emitted from the corresponding light transmission part. The pattern generator according to any one of claims 24 to 27 , further comprising a switching mechanism for individually switching. A pattern forming apparatus for forming a pattern on a predetermined surface,
A pattern generator according to claim 28 ;
And a control device that controls the switching mechanism of the pattern generator based on pattern information to be formed on the predetermined surface. 30. The pattern forming apparatus according to claim 29 , further comprising an optical system that forms a pattern generated by the pattern generator on the predetermined surface. A moving body that holds an object on the predetermined surface;
A relative movement device for relatively moving the movable body and the pattern generator in the second direction;
Further comprising
Wherein the control device, on the basis of the pattern information, the pattern forming apparatus according to claim 29 or 30 in synchronization with control and the switching mechanism and the relative movement device.

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