JP2013054315A - Exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device in which the size of a mask is smaller as compared to an exposure object area on a substrate in which a whole area of the substrate can be uniformly exposed and occurence of seaming unevenness between adjacent exposure areas can be prevented.SOLUTION: As an optical system for guiding exposure light emitted from a light source 4 to a mask 2, provided are: a condenser lens 6 that causes the light emitted from the light source 4 to be parallel light; and an Offner optical system 8 that forms an image of the exposure light transmitted through the condenser lens 6 on a mask surface at the same magnification as incident light. At an imaging surface from the condenser lens 6, a variable blind 7 is disposed, and the variable blind 7 includes shutters 72 and 73 intervening in the exposure light at the imaging surface. Shaping is performed by the shutters 72 and 73 such that at least one edge in a direction orthogonal to a scan direction in a mask surface exposure area is inclined in the scan direction. Shaping of the exposure light is controlled by two times of scan exposure so that edges inclined in the mask surface exposure area coincide with each other.

Description

  The present invention is capable of uniformly exposing the entire surface of a substrate in an exposure apparatus with a reduced mask size in order to reduce the manufacturing cost of the substrate and realize high-precision exposure, and to generate joint unevenness between adjacent exposure regions. The present invention relates to an exposure apparatus that can be prevented.

  Unlike large liquid crystal display devices such as televisions, liquid crystal display devices mounted on devices such as mobile phones and portable information terminals are required to have smaller panels and higher definition panels. .

  As an exposure apparatus used when manufacturing a liquid crystal display panel of such a portable device, a stepper used for exposure of a semiconductor device is conventionally used for high-definition exposure.

  Conventionally, when a small liquid crystal display panel for a portable device is exposed by a stepper, light transmitted through a mask pattern is transmitted through a reduction optical system and then irradiated onto a substrate. At this time, the substrate to be exposed is, for example, a large 1.5 m square substrate, and the exposure is performed a plurality of times for each region to be one or a plurality of individual substrates. And the board | substrate with which all the area | regions used as an individual board | substrate by multiple times of exposure was divided | segmented, and a several glass substrate is manufactured.

  However, in this stepper, since the size of the area exposed by one objective lens is determined, when producing a plurality of panels on one glass substrate, the boundary of the exposure area of the objective lens May be located inside the panel. Then, in the panel, the areas on both sides of the boundary of the exposure area are exposed with different shots, and there is a problem that the position of the wiring or the like is shifted at the boundary. Therefore, at this boundary, it is necessary to perform a so-called “next” process such as thickening the wiring pattern, forming the inclined end portion, and overlapping the inclined portion. In addition, even if this “next” process is performed, the portions subjected to this “next” may continue on a straight line, resulting in stripes. It must be discarded. Further, even when the exposure pattern is a pattern that is difficult to process next, it is necessary to discard the panel at the boundary of the exposure area without making it a product.

  Thus, a scanning exposure apparatus using a microlens array has also been proposed (Patent Documents 1 and 2). The microlens array is a two-dimensional arrangement of a plurality of microlenses, and is arranged between a mask and a substrate. Since this microlens array is adjusted so that the focal position of each microlens is the position of the mask and the substrate, an erecting equal-magnification image of the pattern formed on the mask can be formed on the substrate, By scanning the exposure light and the microlens array in one direction relative to the mask and the substrate, the pattern formed on the mask can be transferred to the substrate in a band shape. However, a conventional exposure apparatus using a microlens array exposes a panel for a large-sized liquid crystal display device such as a television, and when applied as it is to a liquid crystal display device for a portable device, In the case of this liquid crystal display panel, since the panel is small and has various sizes, there is a problem that the manufacturing efficiency is poor.

  In the exposure apparatus of Patent Document 3, an Offner optical system including a concave mirror and a convex mirror is disposed between the mask and the substrate, and the mask pattern is transferred onto the substrate at the same magnification by the Offner optical system. It is like that.

  Patent Document 4 discloses an exposure apparatus that divides an area to be exposed on a substrate into a plurality of times and performs exposure with different masks each time, and discloses that adjacent exposure areas are subjected to overlapping exposure. In order to make the amount of exposure light radiated to the area to be overlaid exposure equal to other areas, the exposure apparatus of Patent Document 4 provides a stop on the optical path of the optical system that guides the exposure light to the mask. The aperture adjusts the amount of exposure light applied to the substrate.

JP 2010-102149 A JP 2008-197226 A JP 2008-263092 A JP 2000-321784 A

  As described above, high-definition is required as in liquid crystal display panels for portable devices, and in the case of a small panel, the use of a conventional stepper requires a “next” exposure pattern, and a microlens array However, there is a problem that the production efficiency is poor.

  FIG. 5 is a diagram showing a process of performing multiple exposures in a conventional exposure apparatus in which the size of the mask is smaller than the exposure target area on the substrate. In the conventional exposure apparatus, a microlens array (not shown) corresponding to the size of the mask 2 is used, and the exposure light and the microlens array are used as the mask 2 and the substrate 1 as shown in FIG. The pattern of the mask 2 is transferred to the substrate by scanning in one direction (scanning direction 21 in FIG. 5) relative to the substrate. Then, when scanning of the exposure light in the scanning direction 21 with respect to the substrate 1 is completed, the mask 2 is shifted in the shift direction 22 or the mask 2 is replaced with one provided with another pattern, as shown in FIG. As shown, exposure of an area adjacent to the exposure area 1a formed by the first scan is performed.

  In such an exposure apparatus, joint unevenness in which an unexposed region 1c or an overexposed region as shown in FIG. 5B is generated due to an attachment accuracy failure of the mask 2 or a mask position accuracy after the movement, etc. There is a problem that is likely to occur.

  In Patent Document 4, an exposure target area is divided into four, each divided area is exposed in one step, and the four exposure areas are joined together to form an exposure pattern over the entire predetermined exposure target area. . And, the boundary part between the division target areas is designed to be overexposed, and in each exposure process, by adjusting the exposure light quantity with the aperture while performing exposure, the exposure light quantity at the boundary part is reduced, The amount of light between the boundary and the inside is made uniform. For this reason, in patent document 4, there exists a problem that the mechanism which controls the light quantity of exposure light becomes complicated. In the exposure apparatus disclosed in Patent Document 3, an Offner optical system is used instead of the microlens array. However, in Patent Document 3, the exposure target area is divided between adjacent exposure areas. It is not possible to prevent the occurrence of unevenness of joints.

  The present invention has been made in view of such problems, and in an exposure apparatus in which the size of the mask is smaller than the exposure target area on the substrate, the entire surface of the substrate can be uniformly exposed, and between adjacent exposure areas. An object of the present invention is to provide an exposure apparatus that can prevent the occurrence of splice unevenness.

An exposure apparatus according to the present invention includes a light source that emits exposure light, a mask on which a pattern to be exposed is formed on a substrate, an optical system that guides exposure light emitted from the light source to the mask, the mask, and the mask. A microlens array that is arranged between the substrate and receives the transmitted light of the mask to form an erecting equal-magnification image of the pattern on the substrate; and the optical system and the microlens array that are the mask And a first drive device that moves in a first direction that is relatively horizontal to the substrate and a second direction that is orthogonal thereto, and the optical system and the microlens array are mounted on the mask and the substrate. In the exposure apparatus for transferring the pattern onto the substrate along the first direction by relatively moving in the first direction,
The optical system includes: a first optical system that collimates exposure light emitted from the light source; and the exposure light from the first optical system is guided onto the mask and is combined at the same magnification as incident light on the mask surface. A second optical system for imaging,
Furthermore,
The shutter is disposed on the imaging surface of the exposure light from the first optical system and is interposed in the exposure light on the imaging surface, and the second direction in the mask surface exposure region of the mask surface by the shutter. A shaping member that shapes at least one of the edges so that at least a part thereof is inclined with respect to the first direction;
A second driving device that moves the shutter to change the inclination of the edge in the mask surface exposure area;
A control device for controlling the first drive device and the second drive device;
Have
The controller is
After arranging the shaping member at a predetermined position, the optical system and the microlens array are moved relative to the mask and the substrate in the first direction by the first driving device, and the mask pattern is First scan exposure is performed on the substrate, the shutter is moved by the second driving device to change the inclination of the edge in the mask surface exposure region, and the optical system and the micro lens are changed by the first driving device. After the array is relatively moved in the second direction, the optical system and the microlens array are relatively moved in the first direction or the opposite direction by the first driving device, and the mask pattern is moved to the second direction. Perform a second scan exposure on the substrate,
The shaping of the exposure light by the shaping member is controlled so that the exposure of the inclined edge portion in the mask surface exposure region overlaps in the first scan exposure and the second scan exposure. And In the present invention, the imaging plane is the focal position of the first optical system. Then, the image at the position of the shaping member is re-imaged on the mask surface exposure region of the mask surface by the second optical system.

  In the present invention, for example, the shutter of the shaping member is rotatable around an axis parallel to the optical axis of the exposure light, and the second driving device rotates the shutter to cause the mask by the shutter to rotate. The inclination of the edge of the surface exposure region can be changed. Further, for example, two sets of the shutters are provided on the imaging surface in order to shape both end edges in the second direction in the mask surface exposure region, and the second driving device includes the two sets of shutters. Can be moved to change its position.

  In the present invention, for example, after the second scan exposure, the control device further moves the shutter by the second driving device to change the inclination of the edge in the mask surface exposure region, and thereby performs the first driving. After the optical system and the microlens array are relatively moved in the second direction by the device, the optical system and the microlens array are relatively moved in the first direction or the opposite direction by the first driving device. And the mask pattern is subjected to a third scan exposure on the substrate, the scan exposure is repeated three times or more, and the exposure area on the substrate is divided into three or more areas, The areas are individually scanned and exposed, and the exposure pattern is joined at the inclined edge portions.

Another exposure apparatus according to the present invention includes a light source that emits exposure light, a mask on which a pattern to be exposed is formed on a substrate, an optical system that guides the exposure light emitted from the light source to the mask, and the mask A microlens array that is disposed between the substrate and the substrate and receives the transmitted light of the mask to form an erecting equal-magnification image of the pattern on the substrate, and the optical system and the microlens array. A first driving device that moves in a first horizontal direction relative to the mask and the substrate and in a second direction orthogonal thereto, the optical system and the microlens array being the mask and the In an exposure apparatus that transfers the pattern onto the substrate along the first direction by moving the substrate in the first direction relative to the substrate.
The optical system includes: a first optical system that collimates exposure light emitted from the light source; and the exposure light from the first optical system is guided onto the mask and is combined at the same magnification as incident light on the mask surface. A second optical system for imaging,
Furthermore,
The shutter is disposed on the imaging surface of the exposure light from the first optical system and is interposed in the exposure light on the imaging surface, and the second direction in the mask surface exposure region of the mask surface by the shutter. A shaping member that shapes at least a part of both end edges of the first and second edges so as to be inclined with respect to the first direction;
A control device for controlling the first drive device;
Have
The controller is
After arranging the shaping member at a predetermined position, the optical system and the microlens array are moved relative to the mask and the substrate in the first direction by the first driving device, and the mask pattern is First scanning exposure is performed on the substrate, the optical system and the microlens array are relatively moved in the second direction by the first driving device, and then the optical system and the microsystem array are moved by the first driving device. Performing a second scan exposure of the mask pattern on the substrate by relatively moving the microlens array in the first direction or the opposite direction;
The shaping of the exposure light by the shaping member is controlled so that the exposure of the inclined edge portion in the mask surface exposure region overlaps in the first scan exposure and the second scan exposure. And

  In this case, for example, after the second scanning exposure, the control device further moves the optical system and the microlens array relative to each other in the second direction by the first driving device, and then The optical system and the microlens array are moved relative to each other in the first direction or the opposite direction by the first driving device to perform the third scan exposure on the substrate, and so on. The scan exposure is repeated three or more times, the exposure area on the substrate is divided into three or more areas, each area is individually scanned and exposed, and the exposure pattern is joined at the inclined edge portions.

  In the exposure apparatus according to the present invention, for example, the first optical system transmits a fly-eye lens that makes exposure light emitted from the light source uniform in a plane perpendicular to the optical axis, and the fly-eye lens. It is composed of a condenser lens that makes exposure light parallel light. Further, for example, the second optical system constitutes an Offner optical system composed of two concave mirrors and one convex mirror, and the exposure light shaped by the shaping member is at the same magnification on the mask. Form an image.

  In the exposure apparatus of the present invention, an optical system that guides the exposure light emitted from the light source to the mask includes a first optical system that collimates the exposure light, and guides the exposure light from the first optical system onto the mask. And a second optical system that forms an image at the same magnification as the incident light. The exposure apparatus further includes a shutter interposed in the exposure light on the imaging surface of the exposure light from the first optical system, and at least one end in the second direction in the mask surface exposure area of the mask surface by the shutter. A shaping member that shapes the edge so that at least a part thereof is inclined with respect to the first direction of the scanning direction, a second driving device that changes the inclination of the edge in the mask surface exposure region by moving the shutter; have. Then, the control device arranges the shaping member at a predetermined position, and then moves the optical system and the microlens array in the first direction relative to the mask and the substrate by the first driving device, so that the mask pattern is transferred to the substrate. The first scan exposure is performed above, the shutter is moved by the second driving device to change the inclination of the edge in the mask surface exposure region, and the optical system and the micro lens array are moved in the second direction by the first driving device. After the relative movement, the optical system and the microlens array are moved relative to each other in the first direction or the opposite direction by the first driving device to perform the second scan exposure on the substrate. The shaping of the exposure light by the shaping member is controlled so that the exposure of the inclined edge portion in the mask surface exposure region overlaps in the first scan exposure and the second scan exposure. That is, in the present invention, the portion corresponding to the edge inclined with respect to the first direction of the mask surface exposure region on the substrate is exposed twice by the first scan exposure and the second scan exposure, and the mask is exposed. By exposing so that the exposure of the inclined portion in the surface exposure area overlaps, the total amount of exposure light irradiated to this overlap exposure area is an area corresponding to the other areas of the mask surface exposure area Is equal to the amount of exposure light applied to the substrate, and the entire surface of the substrate can be exposed uniformly. The mask surface exposure area is controlled by the shaping member so that the edge portions inclined by the shutter overlap with each other. Therefore, the exposure area adjacent to the substrate is scanned and exposed in the first direction. It is possible to prevent joint unevenness from occurring.

  In another exposure apparatus according to the present invention, the shaping member shapes the both end edges of the mask surface exposure area of the mask surface with a shutter so that at least a part thereof is inclined with respect to the first direction of the scan direction, The second drive device is not provided. In this exposure apparatus, the control device arranges the shaping member at a predetermined position, and then moves the optical system and the microlens array in the first direction relative to the mask and the substrate by the first driving device. The pattern is subjected to the first scan exposure on the substrate, the optical system and the microlens array are relatively moved in the second direction by the first driving device, and then the optical system and the microlens array are moved by the first driving device. The mask pattern is subjected to the second scan exposure on the substrate by relatively moving in the first direction or the opposite direction, and the mask surface exposure area is inclined in the first scan exposure and the second scan exposure. The shaping of the exposure light by the shaping member is controlled so that the exposure at the edge portions overlap. Therefore, in the same manner as described above, the portion corresponding to the edge inclined with respect to the first direction of the mask surface exposure region on the substrate is exposed twice by the first scan exposure and the second scan exposure, and the mask is exposed. By exposing so that the exposure of the inclined portion in the surface exposure area overlaps, the total amount of exposure light irradiated to this overlap exposure area is an area corresponding to the other areas of the mask surface exposure area Is equal to the amount of exposure light applied to the substrate, and the entire surface of the substrate can be exposed uniformly. The mask surface exposure area is controlled by the shaping member so that the edge portions inclined by the shutter overlap with each other. Therefore, the exposure area adjacent to the substrate is scanned and exposed in the first direction. It is possible to prevent joint unevenness from occurring.

(A) is a figure which shows the exposure apparatus which concerns on embodiment of this invention, (b) is a perspective view which shows the structure of the variable blind concerning 1st Embodiment. (A), (b) is a figure which shows the exposure which uses the variable blind which concerns on 1st Embodiment in the order of the process. (A) thru | or (c) is a figure which shows the exposure in case the magnitude | size of a board | substrate is large compared with FIG. 2 in the order of the process. (A) is a top view which shows the variable blind which concerns on 2nd Embodiment, (b), (c) is a figure which shows the exposure which uses the variable blind which concerns on 2nd Embodiment in the order of the process. It is a figure which shows the process of performing multiple times of exposure in the conventional exposure apparatus with the magnitude | size of a mask small compared with the exposure object area | region on a board | substrate. It is a perspective view which shows the modification of the variable blind which concerns on 1st Embodiment of this invention. It is a top view which shows the modification of the variable blind which concerns on 2nd Embodiment of this invention. (A), (b) is sectional drawing which shows the shape of a shutter member in the exposure apparatus which concerns on embodiment of this invention.

  Hereinafter, embodiments of the present invention will be specifically described with reference to the accompanying drawings. FIG. 1A is a view showing an exposure apparatus according to an embodiment of the present invention, FIG. 1B is a perspective view showing the configuration of a variable blind according to the first embodiment, FIG. 2A and FIG. FIG. 4B is a diagram illustrating exposure using the variable blind according to the first embodiment in the order of steps. As shown in FIG. 1A, the exposure apparatus according to the present embodiment guides exposure light emitted from the light source 4 to the mask 2 by the optical system and is formed on the mask 2 as in the conventional exposure apparatus. Then, the substrate 1 is irradiated with the light transmitted through the mask 2 through the microlens array 3, thereby forming an erecting equal-magnification image of the pattern formed on the mask 2 on the substrate 1.

  The microlens array 3 is a two-dimensional arrangement of a plurality of microlenses, and is arranged between the mask 2 and the substrate 1. Since the microlens array 3 is adjusted so that the focal position of each microlens is the position of the mask 2 and the substrate 1, an erecting equal-magnification image of the pattern formed on the mask 2 is formed on the substrate 1. The pattern formed on the mask 2 can be transferred to the substrate 1 in a band shape by scanning the exposure light and the microlens array 3 in one direction relative to the mask 2 and the substrate 1. it can.

  The mask 2 in the present embodiment is small in size with respect to the substrate 1 and cannot expose the entire surface of the substrate 1 by one scan exposure. In the present embodiment, there is a first driving device (not shown) that moves the optical system and the microlens array relative to the mask and the substrate in the scanning direction (first direction) and a second direction perpendicular thereto. The second driving device 76, which will be described later, is controlled by a control device (not shown), and after one scan exposure is completed, the optical system and the microlens array 3 are connected to the mask 2 and the substrate by the first driving device. After being shifted relative to 1 in the (second) direction orthogonal to the scanning direction (first direction), scanning exposure in the first direction is performed again.

  In the present invention, the optical system that guides the exposure light to the mask 2 includes a first optical system that converts the exposure light emitted from the light source 4 into parallel light, and guides the exposure light from the first optical system onto the mask 2. And a second optical system that forms an image at the same magnification as the incident light on the mask surface. That is, as shown in FIG. 1A, the first optical system includes, for example, one fly-eye lens 5 and two condenser lenses 6, and is emitted from the light source 4 by the fly-eye lens 5. The exposure light is made uniform in a plane perpendicular to the optical axis, and the exposure light transmitted through the fly-eye lens 5 by the two condenser lenses 61 and 62 becomes parallel light. The second optical system constitutes an Offner optical system 8 including, for example, two concave mirrors 81 and 83 and one convex mirror 82.

  In the present embodiment, the variable blind 7 is disposed on the image plane of the exposure light from the first optical system (the focal position of the first optical system). The focal position of the first optical system in which the variable blind 7 is disposed is a position where the intensity distribution of the exposure light in the plane perpendicular to the optical axis is most uniform. Therefore, the light transmitted through the variable blind 7 is imaged at the same magnification in the mask surface exposure region by the Offner optical system 8, so that the intensity distribution of the incident light on the mask becomes the most uniform.

  As shown in FIG. 1B, the variable blind 7 has a light transmission region 71 formed in the center of a frame body 70, and rotates around the axis parallel to the optical axis of the exposure light, for example. Possible shutters 72 and 73 are provided. The shutters 72 and 73 are driven to rotate by the second driving device 76, respectively, and by rotating the shutters 72 and 73, a part of the edge of the light transmission region 71 is shaped, and the edge of the mask surface exposure region is formed. The slope is changed.

  Therefore, as shown in FIG. 2A, by rotating the shutter 73 (and the shutter 72), the edge of the mask surface exposure region is inclined with respect to the scan direction 21, and the mask surface exposure region is obtained by the scan exposure. The amount of exposure light irradiated on the substrate in correspondence with the inclined edge of the linearly changes in a second direction orthogonal to the scanning direction 21. That is, the amount of exposure light that passes through the triangular portion at the end of the trapezoidal light transmission region 71 with respect to the scanning direction 21 decreases linearly from the adjacent rectangular portion to the tip of the triangular portion, while passing through the rectangular portion. The amount of exposure light is uniform.

  In the present embodiment, the control device rotates the shutters 72 and 73 by the second driving device 76 and moves the optical system and the microlens array 3 in the second direction 22 by the first driving device. The shaping of the exposure light by the variable blind 7 is controlled so that the exposure of the inclined edge portion in the mask surface exposure region overlaps in the multiple scan exposures.

  Next, the operation of the exposure apparatus configured as described above will be described. First, the substrate 1 to be exposed is placed at a predetermined exposure light irradiation scheduled position below the mask 2. Next, the control device rotates the shutter around the rotation axis by the second driving device 76 to change the inclination of the edge in the mask surface exposure region. In the present embodiment, the control device includes the second edge so that one edge of the mask surface exposure region is parallel to the scan direction 21 and the other edge of the mask surface exposure region is inclined with respect to the scan direction 21. By controlling the driving device 76, the shutter 72 and the shutter 73 are arranged at predetermined positions.

  In this state, exposure light is emitted from the light source 4. The exposure light emitted from the light source 4 first enters the fly-eye lens 5. The exposure light passes through a plurality of lenses of the fly-eye lens 5 arranged in a grid pattern, so that the intensity of the exposure light is made uniform in a plane perpendicular to the optical axis. The transmitted light of the fly-eye lens 5 enters the two condenser lenses 61 and 62, and the transmitted light becomes parallel light.

  Light transmitted through the condenser lenses 61 and 62 travels toward the variable blind 7 disposed at the focal position of the first optical system. Then, the exposure light that has not been shaped by the shutters 72 and 73 passes through the light transmission region 71. The focal position of the first optical system in which the variable blind 7 is disposed is a position where the intensity distribution of the exposure light in the plane perpendicular to the optical axis is most uniform. Therefore, the exposure light passing through the variable blind 7 has the most uniform intensity distribution.

  Thereafter, the exposure light transmitted through the variable blind 7 is reflected by the Offner optical system 8 including the two concave mirrors 81 and 83 and the single convex mirror 82, and is transmitted through the variable blind 7 to the mask surface exposure region on the mask 2. Light is imaged at the same magnification. Therefore, the intensity distribution of the imaged exposure light is also the most preferable state.

  In the present embodiment, one of the edges of the mask surface exposure region is inclined with respect to the scanning direction 21 by the shutters 72 and 73. That is, the mask surface is irradiated with exposure light in which an irradiation area (light transmission area 71) in a plane perpendicular to the optical axis is trapezoidally shaped by the shutters 72 and 73. Therefore, when the exposure light and the microlens array 3 are scanned in the scan direction 21 relative to the substrate 1 and the mask 2, the trapezoidal light transmission region 71 has a rectangular region and a triangle with respect to the direction perpendicular to the scan direction 21. When divided into regions, the light transmitted through the rectangular region has a uniform amount of exposure on the substrate 1, while the light transmitted through the triangular portion reaches the tip of the triangle of the light transmitting region 71 by scanning the exposure light. Although exposed, the amount of light decreases linearly from the rectangular portion to the tip of the triangular portion. In FIG. 2A, among the exposure areas on the substrate, the uniform exposure light quantity area is the uniform light quantity area 1a, and the exposure light quantity area is continuously changed in the direction perpendicular to the scan direction 21. 1b.

  When one exposure in the scan direction 21 is completed, the second driving device 76 changes the inclination of the edge in the mask surface exposure region by rotating the shutters 72 and 73 in the direction of the arrow in FIG. . That is, the second driving device 76 makes the tilt angle of the shutter 72 the same as the tilt angle of the shutter 73 in the first scan exposure, and makes the edge of the mask surface exposure area corresponding to the shutter 73 parallel to the scan direction 21. .

  Thereafter, the control device moves the optical system and the microlens array 3 relative to the substrate 1 and the mask 2 in the second direction by the first driving device. At this time, the first driving device moves the optical system and the microlens array 3 in the shift direction 22 so that the exposure of the inclined edge portion (triangular portion) in the mask surface exposure region overlaps. Then, the second drive exposure is performed on the substrate 1 by moving the optical system and the microlens array 3 relative to each other in the scan direction 21 or in the opposite direction by the first driving device again. Thereby, in the light quantity change region 1b in which the degree of exposure is linearly distributed in the second direction in the first scan exposure, the change in the light quantity of the exposure light irradiated by the second scan exposure is the first. Exposure light is superimposed and irradiated as a light quantity change region that is opposite to that in the scan exposure. Therefore, as shown in FIG. 2B, the light amount is uniform in the light amount change region 1b as well as the light amount uniform region 1a, and the entire surface of the substrate 1 is uniformly exposed.

  As described above, in the present embodiment, exposure is performed so that the inclined portions in the mask surface exposure area are overlapped, so that the exposure is shaped by the shutters 72 and 73 and tilted with respect to the scanning direction 21 in the mask surface exposure area. The light quantity changing region 1b on the substrate 1 corresponding to the edge portion (triangular portion) thus exposed is exposed twice by the first scan exposure and the second scan exposure, and is irradiated to the region subjected to the overlay exposure. The total amount of exposure light is equal to the amount of exposure light applied to the uniform light amount region 1a on the substrate 1 corresponding to the rectangular portion of the mask surface exposure region that is not shaped by the shutters 72 and 73. Can be uniformly exposed. In addition, the exposure of the mask surface exposure area is controlled by the shaping member so that the edge portions inclined by the shutter are overlapped. Unevenness can be prevented from occurring.

  In the present embodiment, the shutters 72 and 73 are configured to be rotatable around an axis parallel to the optical axis of the exposure light. However, the variable blind 7 is configured to perform mask surface exposure by moving the shutter. It suffices that at least one edge of the region in the second direction is shaped so that at least a part thereof is inclined with respect to the scanning direction. For example, as indicated by black arrows in FIG. 6, the shutters 72 and 73 are configured to be slidable in a plane perpendicular to the optical axis of the exposure light by an actuator or the like. That is, the shutters 72 and 73 are slid in the vertical direction and / or the horizontal direction in FIG. 6 by an actuator or the like, and the positions of the shutters 72 and 73 at the end of the light transmission region 71 are adjusted. The shape of the region 71 is formed into a rectangle, pentagon, hexagon, or the like, and a mask surface exposure region corresponding to the shape of the light transmission region is formed on the mask surface. Further, for example, in this embodiment, the edge of the mask surface exposure region is inclined with respect to the first direction by the two shutters 72 and 73, but the entire surface of the substrate is exposed by two scan exposures. If possible, only one shutter may be provided and moved to shape the edge of the mask surface exposure area so as to be inclined with respect to the scanning direction.

  When the size of the substrate is large, as shown in FIGS. 3A to 3C, the entire surface of the substrate 1 can be exposed by repeating the exposure three or more times. That is, as shown in FIG. 3A, when the scanning exposure in the scanning direction 21 is completed, the second driving device 76 rotates the shutter 72 in the direction of the arrow in FIG. The light source and the microlens array 3 are moved relative to the substrate 1 and the mask 2 in the second direction, and the mask 2 is replaced as necessary. As shown in FIG. Perform scan exposure. That is, at the time of the second scan exposure, the shape of the mask surface exposure region is a parallelogram, and the parallelogram-shaped light transmission region 71 is formed in the central rectangular region and the opposite end portions thereof in the direction perpendicular to the scan direction 21. When divided into triangular regions, the first drive unit moves the optical system and the microlens array 3 relative to the substrate 1 and the mask 2 in the shift direction 22 during the first scan exposure. The optical system and the microlens array 3 are moved in the shift direction 22 so that the exposure by the triangular portion of the mask surface exposure region and the exposure by one triangular portion of the mask surface exposure region at the time of the second scan exposure overlap. When the second scanning exposure is completed, similarly, the second driving device 76 rotates the shutter 73 in the direction of the arrow in FIG. 3B or the opposite side, and the first driving device also uses the light source and the microlens array. 3 is moved relative to the substrate 1 and the mask 2 in the second direction, and the mask 2 is replaced as necessary, and a third scan exposure is performed as shown in FIG. If the substrate is even larger, the same process is repeated.

  Next, an exposure apparatus according to the second embodiment of the present invention will be described. FIG. 4A is a plan view showing a variable blind according to the second embodiment, and FIGS. 4B and 4C are views showing exposure using the variable blind according to the second embodiment in the order of steps. is there. As shown in FIG. 4A, in this embodiment, two shutters (shutters 72 and 74 and shutters 73 and 75, respectively) are provided at both ends of the variable blind 7A, respectively. The rotation angle is controlled by a control device connected to the second drive device 76. In the exposure apparatus using the variable blind 7A, the end of the mask surface exposure region in the second direction is maximum with respect to the first direction by the two shutters provided at the end of the variable blind 7A. It is configured to have a shape inclined in two directions. In the present embodiment, as shown in FIG. 4A, exposure light in which an irradiation area (light transmission area 71) in a plane perpendicular to the optical axis is shaped into a hexagon by shutters 72 and 73 is formed on the mask surface. Is irradiated. Therefore, when the exposure light and the microlens array 3 scan in the scanning direction 21 relative to the substrate 1 and the mask 2, the hexagonal light transmission region 71 is a rectangular region in the center with respect to the direction perpendicular to the scanning direction 21. When the light is transmitted through the rectangular region, the amount of exposure light is uniform on the substrate 1, while the light transmitted through the triangular portion is transmitted by scanning the exposure light. Although exposure is performed up to the tip of the triangle in the region 71, the amount of light linearly decreases from the rectangular portion to the tip of the triangle portion.

  Also in such an exposure apparatus, as shown in FIG. 4B and FIG. 4C, the inclined edge portion (triangular portion) in the mask surface exposure region in a plurality of scan exposures by the control device, as shown in FIGS. By controlling the shaping of the exposure light by the variable blind 7A and the shift in the shift direction 22 by the first driving device so that the exposures overlap, high-precision exposure similar to that of the first embodiment can be realized. That is, the light amount change region 1b on the substrate 1 corresponding to the edge portion (triangle portion) shaped by the shutters 72 and 74 and the shutters 73 and 75 and inclined with respect to the scanning direction 21 in the mask surface exposure region is The total amount of the exposure light that is exposed twice by the first scan exposure and the second scan exposure, and is irradiated onto the area to be superimposed and exposed is a rectangular portion of the mask surface exposure area that is not shaped by the shutters 72 and 73. Therefore, the entire amount of the substrate 1 can be uniformly exposed. In addition, the exposure of the mask surface exposure area is controlled by the shaping member so that the edge portions inclined by the shutter are overlapped. Unevenness can be prevented from occurring.

  In this embodiment, the same modifications as those in the first embodiment can be applied. For example, as indicated by black arrows in FIG. 7, the shutters 72, 73, 74, and 75 are configured to be slidable in a plane perpendicular to the optical axis of the exposure light by an actuator or the like. That is, the shutters 72, 73, etc. are slid in the vertical direction and / or the horizontal direction in FIG. 7 by an actuator or the like, and the positions of the shutters 72, 73, etc. at the end of the light transmission region 71 are adjusted. The light transmission region 71 is shaped into a rectangle, pentagon, hexagon, or the like, and a mask surface exposure region corresponding to the shape of the light transmission region is formed on the mask surface.

  In the exposure apparatus according to the embodiment described above, it is preferable that the variable blinds 7 and 7A, which are disposed on the optical path of the exposure light and shape the shape of the exposure light, have the shutter edge inclined in the optical axis direction. . Fig.8 (a) is AA sectional drawing which shows the variable blind 7 shown to Fig.2 (a). As shown by a portion B in FIG. 8A, the shutters 72 and 73 are provided so that the edge on the exposure light side is widest and the width of the shutter is gradually narrowed in the optical axis direction. It has been. By providing the shutter in such a shape, the exposure light that has entered the variable blind 7 as parallel light is easily transmitted as parallel light after it is shaped by the shutter without impairing straightness. Further, when two shutters are provided as in the second embodiment, the exposure light side shutters 74 and 75 are narrowest on the exposure light side, as indicated by a portion C in FIG. The exposure light incident on the variable blind 7 as parallel light is shaped by the shutter and then transmitted as parallel light without impairing straightness, by providing the shutter gradually wider in the optical axis direction. It becomes easy.

1: substrate, 2: mask, 3: microlens array, 4: light source, 5: fly-eye lens, 6: condenser lens, 7, 7A: variable blind, 8: Offner optical system

Claims (8)

A light source that emits exposure light; a mask on which a pattern to be exposed is formed on a substrate; an optical system that guides the exposure light emitted from the light source to the mask; and the mask disposed between the mask and the substrate. A microlens array for forming an erecting equal-magnification image of the pattern on the substrate by the incident light of the mask, and the optical system and the microlens array relative to the mask and the substrate. A first driving device for moving the first optical system and the micro lens array relative to the mask and the substrate. In the exposure apparatus for transferring the pattern onto the substrate along the first direction by moving in the direction,
The optical system includes: a first optical system that collimates exposure light emitted from the light source; and the exposure light from the first optical system is guided onto the mask and is combined at the same magnification as incident light on the mask surface. A second optical system for imaging,
Furthermore,
The shutter is disposed on the imaging surface of the exposure light from the first optical system and is interposed in the exposure light on the imaging surface, and the second direction in the mask surface exposure region of the mask surface by the shutter. A shaping member that shapes at least one of the edges so that at least a part thereof is inclined with respect to the first direction;
A second driving device that moves the shutter to change the inclination of the edge in the mask surface exposure area;
A control device for controlling the first drive device and the second drive device;
Have
The controller is
After arranging the shaping member at a predetermined position, the optical system and the microlens array are moved relative to the mask and the substrate in the first direction by the first driving device, and the mask pattern is First scan exposure is performed on the substrate, the shutter is moved by the second driving device to change the inclination of the edge in the mask surface exposure region, and the optical system and the micro lens are changed by the first driving device. After the array is relatively moved in the second direction, the optical system and the microlens array are relatively moved in the first direction or the opposite direction by the first driving device, and the mask pattern is moved to the second direction. Perform a second scan exposure on the substrate,
The shaping of the exposure light by the shaping member is controlled so that the exposure of the inclined edge portion in the mask surface exposure region overlaps in the first scan exposure and the second scan exposure. An exposure apparatus. The shutter of the shaping member is rotatable about an axis parallel to the optical axis of the exposure light, and the second driving device rotates the shutter to end the mask surface exposure region by the shutter. 2. The exposure apparatus according to claim 1, wherein the inclination of the edge is changed. Two sets of the shutters are provided on the imaging surface in order to shape both end edges in the second direction in the mask surface exposure region, and the second driving device moves the two sets of shutters. The exposure apparatus according to claim 1, wherein the position of the exposure apparatus is changed. The controller further changes the inclination of the edge in the mask surface exposure area by moving the shutter by the second driving device after the second scan exposure, and the optical system by the first driving device. And relatively moving the microlens array in the second direction, and then relatively moving the optical system and the microlens array in the first direction or the opposite direction by the first driving device. Repeat the scan exposure three or more times, such as performing a third scan exposure on the substrate, and divide the exposure area on the substrate into three or more areas, and scan each area individually. 4. The exposure apparatus according to claim 1, wherein exposure is performed and the exposure patterns are joined at the inclined edge portions. A light source that emits exposure light; a mask on which a pattern to be exposed is formed on a substrate; an optical system that guides the exposure light emitted from the light source to the mask; and the mask disposed between the mask and the substrate. A microlens array for forming an erecting equal-magnification image of the pattern on the substrate by the incident light of the mask, and the optical system and the microlens array relative to the mask and the substrate. A first driving device for moving the first optical system and the micro lens array relative to the mask and the substrate. In the exposure apparatus for transferring the pattern onto the substrate along the first direction by moving in the direction,
The optical system includes: a first optical system that collimates exposure light emitted from the light source; and the exposure light from the first optical system is guided onto the mask and is combined at the same magnification as incident light on the mask surface. A second optical system for imaging,
Furthermore,
The shutter is disposed on the imaging surface of the exposure light from the first optical system and is interposed in the exposure light on the imaging surface, and the second direction in the mask surface exposure region of the mask surface by the shutter. A shaping member that shapes at least a part of both end edges of the first and second edges so as to be inclined with respect to the first direction;
A control device for controlling the first drive device;
Have
The controller is
After arranging the shaping member at a predetermined position, the optical system and the microlens array are moved relative to the mask and the substrate in the first direction by the first driving device, and the mask pattern is First scanning exposure is performed on the substrate, the optical system and the microlens array are relatively moved in the second direction by the first driving device, and then the optical system and the microsystem array are moved by the first driving device. Performing a second scan exposure of the mask pattern on the substrate by relatively moving the microlens array in the first direction or the opposite direction;
The shaping of the exposure light by the shaping member is controlled so that the exposure of the inclined edge portion in the mask surface exposure region overlaps in the first scan exposure and the second scan exposure. An exposure apparatus. The controller further moves the optical system and the microlens array relative to each other in the second direction by the first driving device after the second scan exposure, and then moves the optical system and the microlens array by the first driving device. The optical system and the microlens array are moved relative to each other in the first direction or the opposite direction, and the mask pattern is subjected to a third scan exposure on the substrate, so that the scan exposure is performed three times. 6. The process according to claim 5, wherein the exposure region on the substrate is divided into three or more regions, each region is individually scanned and exposed, and the exposure pattern is joined at the inclined edge portion. The exposure apparatus described in 1. The first optical system includes a fly-eye lens that uniformizes exposure light emitted from the light source in a plane perpendicular to the optical axis, and a condenser lens that converts the exposure light transmitted through the fly-eye lens into parallel light. The exposure apparatus according to claim 1, wherein the exposure apparatus is configured. The second optical system constitutes an Offner optical system composed of two concave mirrors and one convex mirror, and the exposure light shaped by the shaping member forms an image at the same magnification on the mask. An exposure apparatus according to claim 1, wherein:

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