JP3348467B2 - Exposure apparatus and method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning type projection exposure apparatus that performs exposure while moving a first object and a second object.

[0002]

2. Description of the Related Art In recent years, liquid crystal display panels have been frequently used as display elements for word processors, personal computers, televisions, and the like. A liquid crystal display panel is manufactured by patterning a transparent thin-film electrode on a glass substrate into a desired shape by a photolithography technique. As an apparatus for the lithography, a mirror projection type aligner that exposes an original pattern formed on a mask to a photoresist layer on a glass substrate via a projection optical system is used. As such an aligner, for example, FIG.
The one shown in (b) is known. FIG. 14A is a perspective view showing a configuration of a conventional aligner, and FIG.
It is a lens sectional view of the projection optical system of an aligner.

In FIG. 14A, a mask 71c is illuminated by an illumination optical system (not shown) in an arcuate illumination field 72a. As shown in FIG. 14 (b), the light path of the image 72b of the illumination field 72a is deflected by 90 ° at the reflection surface 73a of the trapezoidal mirror 73, and is reflected again by the concave mirror 74 via the concave mirror 74 and the convex mirror 75. You. The light path from the concave mirror 74 is deflected by 90 ° at the reflection surface 73b of the trapezoidal mirror 73 to form an image of the mask 71c on the plate 76. And
In this aligner, a plate 76 and a mask 71
The circuit pattern on the mask 71c was transferred onto the plate 76 by performing scanning exposure on the substrate 71c, that is, performing exposure while moving the substrate 71 along the X direction in the figure.

Recently, it has been desired to increase the size of a liquid crystal display panel. Along with that, even in the aligner as described above,
It is desired to enlarge the exposure area.

[0005]

In the projection exposure apparatus as described above, in order to enlarge the exposure area, the exposure area is divided and exposed. More specifically, as shown in FIG. 14A, the regions 76a, 76b, 76
c and 76d. First, the mask 71a and the region 7
6a is exposed by scanning to transfer the circuit pattern of the mask 71a onto the area 76a. Next, the mask 71a is replaced with a mask 71b, and the plate 76 is moved stepwise in the XY plane in the figure so that the exposure area of the projection optical system and the area 76b overlap. Then, the mask 71b and the plate 76 are scanned and exposed, and the circuit pattern of the mask 71b is transferred onto the region 76b. Similarly, the circuit patterns of the masks 71c and 71d are respectively replaced with the regions 76c and
76d.

As described above, when the exposure is performed in a divided manner, since the exposure is performed many times, the throughput (the amount of the substrate that can be exposed per unit time) is reduced. Furthermore, in the case of divided exposure, it is necessary to increase the joining accuracy between adjacent exposure regions. For this reason, in the projection exposure apparatus, there is a problem that the magnification error of the projection optical system needs to be close to zero, and a great improvement in alignment accuracy is required, resulting in an increase in the cost of the apparatus.

In order to collectively transfer a large exposure area, it is conceivable to increase the size of the projection optical system.
However, in order to increase the size of the projection optical system, it is necessary to manufacture a large-sized optical element with extremely high precision, which causes a problem of increasing the manufacturing cost and increasing the size of the apparatus.
Also, there is a problem that the aberration increases due to the enlargement of the projection optical system.

Accordingly, an object of the present invention is to provide an exposure apparatus capable of transferring a circuit pattern with good imaging performance without lowering the throughput even when the exposure area is large.

[0009] To achieve the above object, according to the present invention
The exposure apparatus according to item 1 has the following configuration. For example, as shown in FIG. 1, an exposure apparatus for projecting and exposing an image of a first object onto a second object while moving a first object and a second object has a size equal to that of the first object. There are first and second projection optical systems for forming a standing image on the second object. And the first
And the second projection optical system is configured so that at least the image side is telecentric.

Here, in the present invention, the erect image is an upper image.
Refers to an image where the lower left and right lateral magnifications are positive.The present invention
In the invention according to claim 2, in the structure of claim 1,
The first and second projection optical systems have concave surfaces facing the light incident side.
Reflection with a concave lens facing the light incident side
A Dyson-type optical system having a surface
You. In the invention according to claim 3 of the present invention, claim 1 or
In the configuration of 2, the first and second projection optical systems
Has a first partial optical system and a second partial optical system,
The two-part optical system is a part of the object formed by the first partial optical system.
Forming a secondary image by light from the primary image;
I do. In the invention according to claim 4 of the present invention,
In the configuration, the first and second partial optical systems each include:
First and second reflecting surfaces with concave surfaces facing the light incident side.
The first and second reflecting surfaces are concave in the same direction.
It is characterized by being arranged so that. Claims of the invention
According to a fifth aspect of the present invention, in the configuration of the third or fourth aspect,
Thus, the primary image is formed by the first partial optical system.
A field stop is arranged at the position. Book
In the invention according to claim 6 of the present invention,
The field stop has a substantially trapezoidal opening.
The length of the exposure area in the direction of movement determined by the mouth
The sum is always equal in the direction orthogonal to the moving direction.
It is characterized by being defined as follows. Claims of the invention
In the invention according to claim 7, the configuration according to any one of claims 1 to 6
In the first and second projection optical systems, a lens
And a concave reflecting surface. Of the present invention
According to an eighth aspect of the present invention, in the configuration of the seventh aspect,
It is a space between the lens and the concave reflecting surface.
Features. According to the ninth aspect of the present invention,
Item 1. In the configuration of Item 1, the first and second projection optical systems are
It has a concave reflecting surface. Claims of the invention
According to a tenth aspect of the present invention, in the configuration of the ninth aspect,
First The projection optical system has a first concave reflecting surface, and the second
The projection optical system has a second concave reflecting surface, and the first and second
Concave reflective surfaces are arranged so that the concave surfaces face each other
It is characterized by the following. The invention according to claim 11 of the present invention
The first projection optical system according to claim 10, wherein
Has a third concave reflecting surface, and the second projection optical system has a fourth
A concave reflecting surface, wherein the first and third concave reflecting surfaces are
Are arranged so as to face the concave surface in the same direction;
The fourth reflecting surface is arranged so as to face the concave surface in the same direction.
It is characterized by the following. According to the twelfth aspect of the present invention,
Is the first and second projections in the configuration of claim 9
The optical system deflects light from the first object to generate the concave light.
A first deflecting member directed to the surface reflecting surface,
Having a second deflecting member for deflecting the emitted light.
Features. According to the invention of claim 13 of the present invention,
The structure of claim 12, wherein the first and second projection optics
The system comprises another concave reflecting surface different from said concave reflecting surface,
The light from the second deflecting member is deflected to reflect the another concave surface.
Reflection on the third deflecting member directed to the surface and the another concave reflection surface
And a fourth deflecting member for deflecting the reflected light.
Sign. According to the fourteenth aspect of the present invention,
Item 13. In the configuration of Item 13, the first and second projection optical systems
Is between the second deflecting member and the third deflecting member.
An intermediate image of the first object is formed. The present invention
In the invention according to claim 15, the structure of claim 14
And wherein the first and second projection optical systems are provided with the second deflection optical system.
A field stop disposed between the member and the third deflecting member.
It is characterized by having. According to claim 16 of the present invention.
According to the invention, in the configuration according to any one of claims 13 to 15,
The concave reflecting surface and the another concave reflecting surface are in the same direction.
Are arranged so as to face the concave surface to the. Book
According to the seventeenth aspect of the present invention,
The same-size erect image of the first object is referred to as the second object.
A third projection optical system formed on a body;
3. The projection optical system is telecentric at least on the image side.
Composed of It is characterized by the following. Claim 18 of the present invention
According to this invention, in the configuration of claim 17, the third
Of the projection optical system of the first, the first partial optical system and the second partial optical system
Wherein the second partial optical system has the shape of the first partial optical system.
Forming a secondary image by light from the primary image of the object to be formed
It is characterized by the following. The invention according to claim 19 of the present invention
The configuration according to claim 18, wherein the first and second parts are
The optical system has first and second concave surfaces facing the light incident side, respectively.
A second reflecting surface, wherein the first and second reflecting surfaces are the same
Characterized by being arranged so that the concave surface faces in the direction
You. In the invention according to claim 20 of the present invention, claim 18
Or in the 19th serpentine voice, by the first partial optical system
A field stop is arranged at a position where the primary image is formed.
It is characterized by that. Claim 21 of the present invention
Then, in the configuration of claim 17, the first, second, and
The third projection optical system has a concave reflecting surface.
You. In the invention according to claim 22 of the present invention, claim 21
Wherein the first projection optical system has a first concave reflection
And the second projection optical system has a second concave reflecting surface.
The third projection optical system has a third concave reflecting surface;
The first and second concave reflecting surfaces have concave surfaces facing each other.
And the first and third concave reflecting surfaces are in the same direction.
Are arranged so as to face the concave surface to the. Book
According to the twenty-third aspect of the present invention, the configuration of the twenty-second aspect is provided.
, The first projection optical system has a fourth concave reflecting surface.
The second projection optical system has a fifth concave reflecting surface;
The third projection optical system has a sixth concave reflecting surface, and
And the fourth concave reflecting surface faces the concave surface in the same direction.
And the second and fifth reflecting surfaces are concave in the same direction.
And the third and sixth reflecting surfaces are the same.
Characterized in that they are arranged so that the concave surface faces in one direction.
You. In the invention according to claim 24 of the present invention, claim 21
, The first, second and third projection optical systems
Deflects light from the first object to reflect the concave surface
A first deflecting member facing the surface, and reflected by the concave reflecting surface
And a second deflecting member for deflecting the reflected light.
I do. In the invention according to claim 25 of the present invention, claim 2
In the configuration of 4, the first, second and third projection optics
The system comprises another concave reflecting surface different from said concave reflecting surface,
The light from the second deflecting member is deflected to reflect the another concave surface.
Reflection on the third deflecting member directed to the surface and the another concave reflection surface
And a fourth deflecting member for deflecting the reflected light.
Sign. In the invention according to claim 26 of the present invention,
Item 25. In the configuration according to Item 25, the first, second, and third projections
An optical system is provided between the second deflecting member and the third deflecting member.
Forming an intermediate image of the first object.
In the invention according to claim 27 of the present invention, the structure according to claim 26 is provided.
Wherein the first, second, and third projection optical systems include:
And disposed between the second deflecting member and the third deflecting member.
Characterized by having a visual field stop. Claims of the invention
In the invention according to Item 28, any one of Claims 25 to 27
In the configuration, the concave reflecting surface and the another concave reflecting surface
Is characterized by being arranged so that the concave surface faces in the same direction.
Sign. In the invention according to claim 29 of the present invention,
Item 28. The configuration according to Item 28, wherein the first projection optical system includes:
A concave reflecting surface and the concave reflecting surface in the second projection optical system
Are arranged such that the concave surfaces face each other, and the first
The concave reflecting surface in the projection optical system and the third projection optical system
The concave surface should be directed in the same direction as the concave reflecting surface in the system.
It is characterized by being arranged in. Claim 30 of the present invention
According to this invention, the first object and the second object are moved in the scanning direction.
Moving the image of the first object on the second object
An exposure apparatus for projecting and exposing the light from the first object.
Forming a first exposure area on the second object based on the light
A first projection optical system, which is based on light from the first object
A second exposure area different from the first exposure area on the second object.
A second projection optical system for forming the second exposure area;
The first and second projection optical systems have a telescope at least on the image side.
It is composed of tricks. According to claim 31 of the present invention
According to the invention, in the configuration of claim 30, the first and the second
2 that the exposure areas are arranged side by side in the non-scanning direction.
Features. According to the invention of claim 32 of the present invention,
The structure of claim 30, wherein the first And the second exposure area
Must be placed at different positions in the non-scanning direction.
Features. In the invention according to claim 33 of the present invention,
32. The configuration according to claim 32, wherein the light source based on the light from the first object is
And the first and second exposure areas on the second object.
Forms a different third exposure area, and at least the image side
A third projection optical system composed of
And wherein the third exposure area is in front of the first exposure area.
Characteristically located at different positions in the scanning direction
And In the invention according to claim 34 of the present invention,
33, the first exposure area and the second exposure area
The exposure area is located at a distance in the non-scanning direction.
It is characterized by that. The invention according to claim 35 of the present invention.
In the configuration according to claim 34, the third exposure area
Scans between the intervals between the first and second exposure areas
It is characterized in that it is positioned so that it can be moved. Of the present invention
According to the invention of claim 36, in the constitution of claim 30,
The first and second exposure areas are located in the scanning direction.
And are arranged at different positions. The present invention
In the invention according to claim 37, the structure of claim 36
And based on the light from the first object, the second object
A third exposure different from the first and second exposure areas
A region is formed and at least the image side is telecentric.
A third projection optical system, wherein the third
The light area is different from the second exposure area in the scanning direction.
It is characterized by being arranged at different positions. The present invention
In the invention according to claim 38, the invention according to claim 37 has the structure
The first, second and third exposure areas are trapezoidal in shape.
The short side of the trapezoid of the second exposure area is the third side of the third exposure area.
Facing the exposure area side and in front of the third exposure area
The short side of the trapezoid is directed to the second exposure area side
It is characterized by the following. The invention according to claim 39 of the present invention
Is the configuration of claim 36, wherein the first, second and
The exposure area 3 has a trapezoidal shape, and the exposure area 3
The short side of the trapezoid is directed toward the second exposure area.
The short side of the trapezoid of the second exposure area is
It is characterized by being directed to the exposure area side. The present invention
In the invention according to claim 40, what is claimed in claims 30 to 37 is
In the configuration of any one of the above, the first, second, and third dew
Light area is trapezoidal or hexagonal shaped
And The invention according to claim 41 of the present invention is the first object
Moving the body and the second object along the scanning direction,
Exposure apparatus for projecting and exposing an image of a first object onto a second object
Wherein, based on light from the first object, the second
First projection for forming a trapezoidal first exposure area on an object
An optical system; and the second system based on light from the first object.
Trapezoidal shape at a position on the object different from the first exposure area
A second projection optical system for forming a second exposure area of
You. In the invention according to claim 42 of the present invention, claim 41
In the configuration, the first and second exposure regions are
It is characterized by being arranged side by side in the inspection direction. Of the present invention
According to the invention of claim 43, in the structure of claim 41,
The first and second exposure areas are located in the non-scanning direction.
In different positions. Of the present invention
According to the invention of claim 44, in the constitution of claim 43,
And based on the light from the first object, on the second object
Trapezoid at a position different from the first and second exposure areas
A third projection optical system for forming a third exposure region in a shape of a circle.
And the third exposure area is different from the first exposure area.
It is characterized that they are arranged at different positions in the scanning direction.
Sign. In the invention according to claim 45 of the present invention,
Item 44. The configuration according to Item 44, wherein the first exposure area and the second exposure area
Are spaced from each other in the non-scanning direction.
It is characterized by being performed. The invention according to claim 46 of the present invention.
47. The structure according to claim 45, wherein the third exposure area is
Area scans between said intervals of said first and second exposure areas
It is characterized in that it is positioned so as to be able to. The present invention
In the invention according to claim 47, the structure of claim 41
And the first and second exposure areas are arranged in the scanning direction.
In different positions. Departure
In the invention according to claim 48, the structure of claim 47
In the first The second object based on light from the object
The first and second exposure areas on the body at a position different from the first and second exposure areas.
A third projection optical system for forming the third exposure area.
The third exposure area is different from the second exposure area
It is characterized by being arranged at different positions in the scanning direction
I do. The invention according to claim 49 of the present invention is directed to a first object
While moving the second object and the second object in the scanning direction.
An exposure apparatus that projects and exposes an image of one object onto a second object
And a first projection light having a trapezoidal first viewing area.
And second projection light having a trapezoidal second viewing area
And the short side of the trapezoid of the first viewing area is:
Toward the arc side of the maximum viewing area of the first projection optical system
And the short side of the trapezoid of the second field of view is
To the arc side of the maximum field of view of the second projection optical system
Have been. In the invention according to claim 50 of the present invention,
50. The exposure apparatus according to claim 49, wherein the first and second projection lights
The maximum field of view of the academic system is semicircular.
50. The exposure apparatus according to claim 49, wherein: Claim 5 of the present invention
The invention according to 1 is a method for scanning a first object and a second object.
Moving the image of the first object along with the second object
An exposure apparatus for projecting and exposing on a body, wherein the first object is
Based on these lights, a first exposure area is formed on the second object.
A first projection optical system to be formed; based on light from the first object
Therefore, a different area from the first exposure area is provided on the second object.
A second projection optical system for forming a second exposure area;
The first object is placed on the second object based on light from one object.
And forming a third exposure region different from the second exposure region.
A third projection optical system, the first, second and third
The projection optical system is telecentric at least on the image side.
Is done. In the invention according to claim 52 of the present invention,
Item 51. In the configuration according to Item 51, the first and second exposure regions
Must be placed at different positions in the non-scanning direction.
Features. According to the invention of claim 53 of the present invention,
53. The configuration of claim 52, wherein the third exposure area is
Different from the first and second exposure areas in the scanning direction
It is characterized by being arranged at a position. Claim 5 of the present invention
In the invention according to the fourth aspect, the configuration according to claim 52 or 53 is provided.
And the first exposure region and the second exposure region are not
The third exposure device is arranged at intervals in the scanning direction.
The light area is between the distance between the first and second exposure areas.
It is characterized by being positioned so that it can be scanned. Book
The invention according to claim 55 of the invention is characterized in that the first object and the second object
The first object while moving the object along the scanning direction.
Exposure apparatus for projecting and exposing the image of
Based on light from the first object, a second
A first projection optical system for forming one exposure area; and the first object
The first dew on the second object based on light from the body;
A second projection light forming a second exposure area different from the light area
And the first and second projection optical systems are few.
Both are configured on the image side telecentric, and the first and second
The sum of the widths of the exposure areas 2 in the scanning direction is determined by the scanning
It is constant in the scanning orthogonal direction orthogonal to the inspection direction. Book
The invention according to claim 56 of the invention is characterized in that the first object and the second object
The first object while moving the object along the scanning direction.
Exposure apparatus for projecting and exposing the image of
Based on light from the first object, a second
A first projection optical system for forming one exposure area; and the first object
The first dew on the second object based on light from the body;
A second projection light forming a second exposure area different from the light area
And an optical axis of the first and second projection optical systems.
Is parallel to the in-plane direction of the first object. Of the present invention
According to the invention of claim 57, in the structure of claim 56,
Wherein the first and second projection optics are on the first object.
First and second projection light having first and second viewing areas
Perpendicular to the scanning direction of the largest possible field of view
Φ _F And the first and second projection optical systems
When the distance between optical axes is K, 2φ _F > K Is satisfied. Claim 58 of the present invention
According to the invention, in the structure of claim 56 or 57,
The first and second projection optics include a first projection optical system on the first object.
And the first and second projection optical systems.
Direction perpendicular to the scanning direction of the largest field of view that can be taken
Direction width φ _F Outer diameters of the first and second projection optical systems
Maximum value of φ _D When and when, φ _F > Φ _D / 2 Is satisfied. According to claim 59 of the present invention
According to the invention, the first object and the second object are arranged along the scanning direction.
Moving the image of the first object onto the second object
An exposure apparatus for performing projection exposure, wherein light from the first object is provided.
Forming a first exposure area on the second object based on
A first projection optical system, based on light from the first object
A second exposure area different from the first exposure area on the second object.
A second projection optical system for forming the second exposure area;
The first and second projection optical systems include first and second projection optical systems on the first object.
And a second field of view, wherein the first and second projection optical systems
Direction perpendicular to the scanning direction of the largest possible viewing area
The width of φ _F And the outer diameter of the first and second projection optical systems
Maximum value φ _D When φ _F > Φ _D / 2 To be satisfied. The invention according to claim 60 of the present invention is directed to the first aspect.
While moving the object and the second object along the scanning direction
Exposure for projecting and exposing an image of the first object onto a second object
The apparatus, based on light from the first object,
A first projection optical system for forming a first exposure area on a second object
And on the second object based on light from the first object
Forming a second exposure area different from the first exposure area
A second projection optical system for performing the first and second projections.
The optical system has first and second viewing areas on the first object.
And the maximum possible field of view of the first and second projection optical systems
The width of the region in the direction orthogonal to the scanning direction is φ _F And before
If the distance between the optical axes of the first and second projection optical systems is K,
Come 2φ _F > K To be satisfied. According to the invention of claim 61 of the present invention,
The structure of claim 59 or 60, wherein the first and second
The projection optics is at least image-side telecentric
It is characterized by being performed. The invention according to claim 62 of the present invention
Akira moves the first object and the second object in the scanning direction. Move along
Projecting an image of the first object onto a second object while moving
An exposure apparatus that emits light, based on light from the first object.
And forming a first exposure area on the second object.
A projection optical system; based on light from the first object,
A second exposure different from said first exposure area on a second object
A second projection optical system for forming an area;
And the second projection optical system is at least image-side telecentric.
It has a roof surface. Claim 63 of the present invention
According to the invention, the mask and the photosensitive substrate are arranged along the scanning direction.
The image of the mask onto the photosensitive substrate while moving
An exposure apparatus for performing shadow exposure, wherein a first field of view on the mask is provided.
A first exposure on the photosensitive substrate based on light from the area;
A first projection optical system for forming a light area;
On the photosensitive substrate based on light from the second viewing area
Forming a second exposure area different from the first exposure area;
A second projection optical system, wherein the first field of view is
Has a side that matches the edge of the circuit pattern area on the mask
You. The invention according to claim 64 of the present invention provides an image of a first object
An exposure method for projecting an image onto a second object by exposure.
An erect image of the first object based on a centric beam
Forming a first exposure area on a first exposure area; and
Different image-side telecentricity that is different from the centric beam
An erect image of the first object based on the
A second exposure region formed on a second exposure region different from the second exposure region
Step; moving the first object and the second object along a scanning direction.
And a third step of moving. Claims of the invention
In the invention according to Claim 65, in the structure of Claim 64,
The first and second steps are complementary to reflecting light with a concave reflecting mirror.
It is characterized by having an auxiliary process. Claim 66 of the present invention
In the invention according to the sixth aspect, in the configuration of the thirty-fourth aspect, the second aspect,
The first and second steps respectively form an intermediate image of the first object.
It is characterized by having an auxiliary step to perform. The present invention
In the invention according to claim 67, the structure according to claim 66 is provided.
The first and second steps are respectively performed from the intermediate image.
It is characterized by having an auxiliary step of forming a secondary image.
In the invention according to claim 68 of the present invention, the structure of claim 67
In the above, the first and second steps each include a concave surface
An auxiliary step of reflecting light with a mirror to guide the light to the intermediate image;
An auxiliary process of reflecting light with a surface reflecting mirror to guide the light to the secondary image;
It is characterized by having. According to claim 69 of the present invention
According to another aspect of the present invention, there is provided a configuration according to any one of claims 67 to 68.
In the first and second steps, light is applied to the field stop, respectively.
It is characterized by having an auxiliary step of passing through. The present invention
In the invention according to claim 70, the structure according to claim 65 is provided.
The light is reflected by the concave reflecting mirror in the first step.
Auxiliary step and light reflected by the concave reflecting mirror in the second step.
In the auxiliary process, the light is reflected to the opposite sides
It is characterized by that. The invention according to claim 71 of the present invention.
In the configuration of claim 65, the first and second steps are performed.
Each has an auxiliary step of passing light through the lens
It is characterized by the following. With the invention according to claim 72 of the present invention,
The method according to claim 65, wherein the first and second steps are performed.
Comprises: a first auxiliary step of reflecting light with a first concave reflecting mirror;
Forming an intermediate image of the first object after the first assisting step;
After the second auxiliary step and the second auxiliary step, light is
And a third auxiliary step of reflecting light.
Sign. In the invention according to claim 73 of the present invention,
Item 72, in the first and second steps, wherein
The light from the first object is deflected toward the first concave reflecting mirror.
A fourth auxiliary step of causing the light from the first concave reflecting mirror to
A fifth auxiliary step of deflecting toward the intermediate image;
A second light source for deflecting light from an image toward said second concave reflecting mirror;
(6) an auxiliary process, and light from the second concave reflecting mirror is transferred to the second
And a seventh auxiliary process for deflecting toward the object.
It is characterized by that. The invention according to claim 74 of the present invention.
Then, in the configuration of claim 73, the first and second steps
In the step, the light deflected in the fourth auxiliary step is transmitted to the first lens.
Eighth auxiliary step of leading to the first concave reflecting mirror after being guided to
And the light reflected by the first concave reflecting mirror.
In the ninth auxiliary step leading to the lens and the sixth auxiliary step
Light After the light is guided to the second lens, the second concave reflecting mirror
10th auxiliary process to guide the light to the second concave reflecting mirror
And a tenth auxiliary step of guiding the emitted light to the second lens.
It is characterized by having. Claim 75 of the present invention
According to the invention, in the constitution of claim 73 or 74,
A method of deflecting light in the fourth auxiliary step in the first step
Direction and light deflection in the fourth auxiliary step in the second step
It is characterized in that the direction of the movement is opposite. The present invention
In the invention according to claim 76, any one of claims 73 to 75 is provided.
In one configuration, the sixth assistant during the first step
The direction of light deflection during the second step and the sixth direction during the second step.
Make sure that the direction of light deflection in the auxiliary process is
Features. In the invention according to claim 77 of the present invention,
65. The structure of claim 65, wherein the first and second steps are performed in a
(1) a first auxiliary step of reflecting light with a concave reflecting mirror;
Having a second auxiliary step of reflecting light with a surface reflecting mirror
It is characterized by. In the invention according to claim 78 of the present invention,
78. The configuration according to claim 77, wherein light in the first auxiliary step is
The reflection direction is the same as the light reflection direction in the second auxiliary step.
Direction. According to claim 79 of the present invention
According to the present invention, in the configuration of claim 78, the first process
The direction of light reflection in the first auxiliary process during
Opposite to the light reflection direction in the first auxiliary step during the process
It is characterized by being. According to claim 80 of the present invention
According to the invention, in the structure of claim 65, the first and the second
In the two steps, light from the first object is polarized to the concave reflecting mirror.
Further comprising a deflection assisting step of directing,
The direction of light deflection in the deflection assisting step and the deflection in the second step
The direction is opposite to the light deflection direction in the direction assisting process.
Sign. In the invention according to claim 81 of the present invention,
Item 64. In the configuration of Item 64, the first and second exposure regions
Must partially overlap in the direction perpendicular to the scanning direction.
It is characterized by. In the invention according to claim 82 of the present invention,
66. The image-side telecentric light of claim 64.
Erect images of the first object based on the first and second bundles
A fourth exposure region formed on a third exposure region different from the first exposure region
It is characterized by having further steps And Claims of the invention
In the invention according to Item 83, in the structure of Item 64,
The first and second exposure areas are arranged along the non-scanning direction.
It is characterized by being arranged in. Claim 84 of the present invention
According to this invention, in the configuration of claim 64, the first
And the second exposure area has different positions in the non-scanning direction.
It is characterized by being arranged in. Claim 85 of the present invention
According to this invention, in the configuration of claim 84, the image-side
An erect image of the first object based on the centric flux
A third exposure area different from the first and second exposure areas
The method further comprises a fourth step of forming thereon.
You. In the invention according to claim 86 of the present invention, claim 85
In the configuration, the third exposure area is located in the scanning direction.
At a position different from the first exposure area.
It is characterized by that. The invention according to claim 87 of the present invention.
In the configuration of claim 86, the first and third components
The exposure areas are arranged so as to have an interval in the non-scanning direction.
It is characterized by being performed. The invention according to claim 88 of the present invention.
For clarity, in the configuration of claim 64, the first and the second
Are located at different positions in the scanning direction.
It is characterized by being performed. According to claim 89 of the present invention
According to the invention, in the constitution of claim 88, the image-side telecent
An erect image of the first object based on the
Form on a third exposure area different from the first and second exposure areas
The method further comprises a fourth step of forming. Departure
In the invention according to claim 90, the constitution of claim 89 is
In the above, the third exposure area is located in the scanning direction.
That the second exposure area is arranged at a different position from the second exposure area.
Features. In the invention according to claim 91 of the present invention,
90. In the configuration of any one of claims 64 to 90,
And the second exposure area is trapezoidal or hexagonal in shape.
Ruko And features. Claim 92 of the present invention
Is an exposure method for projecting and exposing an image of a first object onto a second object
An exposure apparatus according to any one of claims 1 to 63.
Forming an image of the first object on the second object using
And moving the first and second objects. Claims of the invention
In the invention according to Item 93, any one of Claims 64 to 92 is provided.
Moving the first object and the second object
The image of the first object onto the second object in a single exposure
It is characterized by transferring.

[0011]

In the exposure apparatus according to the present invention as described above,
Since the configuration is such that a plurality of projection optical systems are combined, a large exposure area can be obtained without increasing the exposure area of each projection optical system. Therefore, the size of the projection optical system is reduced, so that a highly accurate projection optical system can be easily manufactured. Further, since each optical member constituting the projection optical system is small, the occurrence of an absolute amount of aberration is reduced.
Therefore, scanning exposure can be realized with good optical performance.

In the exposure apparatus according to the present invention, a large exposure area can be obtained by one exposure, so that there is an advantage that the throughput is high.

[0013]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of an exposure apparatus according to the present invention. In FIG. 1, the direction (scanning direction) in which the mask 8 provided with the predetermined circuit pattern and the plate 9 coated with the resist on the glass substrate are X-axis, and the X-axis is within the plane of the mask 8. A coordinate system is used in which the direction orthogonal to the axis is the Y axis and the normal direction of the mask 8 is the Z axis.

In FIG. 1, exposure light from an illumination optical system 10 uniformly illuminates a mask 8 in an XY plane in the figure. The illumination optical system 10 preferably has, for example, a configuration as shown in FIG. FIG. 2 shows the illumination optical system 1 shown in FIG.
FIG. 3 is a diagram illustrating an example of a specific configuration of 0. In FIG. 2, a light source such as a mercury lamp that supplies g-line (435 nm) or i-line (365 nm) exposure light is provided inside the elliptical mirror 102, and the exposure light from this light source is: The light is condensed by the elliptical mirror 102 and forms a light source image at the incident end of the light guide 103. The light guide 103 forms a secondary light source surface having a uniform light intensity distribution at its emission ends 103a and 103b. Note that the light guide 103 is desirably composed of randomly bundled optical fibers.

The light beam emitted from the light guide 103 is
The light reaches the fly-eye lens 105b via the relay lenses 104a and 104b, respectively. A plurality of secondary light sources are formed on the exit surface side of these fly-eye lenses 105a and 105b. Light from a plurality of secondary light sources passes through field lenses 107 having rectangular openings 107a and 107b through condenser lenses 106a and 106b provided such that a front focal point is located at a secondary light source forming position. Light up. Exposure light passing through the field stop 107 passes through lenses 108a and 108b,
a, 109b deflects the optical path by 90 °, and the lens 1
10a and 110b are reached. Here, the lens 108a,
110a and lenses 108b and 110b are connected to the field stop 1
08 and the mask 8 are conjugated, and the exposure light passing through the lenses 110a and 110b
Illumination area 1 which is an image of apertures 108a and 108b at 08
11a and 111b are formed.

The apertures 108a, 1 of the field stop 108
The shape of 08b is not limited to a rectangular shape. It is desirable that the shape of the illumination area be as similar as possible to the shape of the field of view of the projection optical system. In FIG. 2,
For simplicity, the illumination areas 111c to 111g
Are shown only on the optical axis.
Although not shown in FIG. 2, the light guide 1
The exit end of 03 is provided corresponding to the number of illumination regions, and exposure light from the exit end of the light guide 103 (not shown) is supplied to these illumination regions 111c to 111g.

Further, as shown in FIG. 2, when one light source is insufficient in light quantity, a configuration as shown in FIG. 3 may be applied. FIG. 3 is a diagram schematically illustrating a main part of a modification of the illumination optical system, and includes light sources 201a to 201 such as mercury lamps.
Exposure light from c is converged by the elliptical mirrors 202a to 202c to form a light source image. The light guide 203 is provided so that the incident end is located at the light source image forming position. Exposure light passing through the light guide 203 is transmitted to the plurality of exit ends 203a to 203e with a uniform light intensity distribution.
The next light source surface is formed. It is desirable that the light guide 203 be configured by randomly bundling optical fibers similarly to the light guide 103 of FIG. Injection ends 203a-2
Since the optical path from 03e to the mask 8 is the same as that of the illumination optical system shown in FIG. 2, the description is omitted here.

The plurality of illumination areas 111a as described above
Instead of a plurality of illumination optical systems forming ~ 111g, an illumination optical system that illuminates the mask 8 with one rectangular area extending in a direction (Y direction) orthogonal to the scanning direction (X direction) is applied. Is also good. As such an optical system, a system using a rod-shaped light source extending in the Y direction is conceivable. Now, below the mask 8, a plurality of projection optical systems 2a to 2g are arranged. Hereinafter, referring to FIG. 4, the projection optical systems 2a to 2g will be described.
Will be described. Since the projection optical systems 2a to 2g have the same configuration, only the projection optical system 2a will be described for the sake of simplicity.

FIG. 4 is a diagram showing the lens configuration of the projection optical system 2a. This projection optical system 2a has a configuration in which two sets of Dyson optical systems are combined. 4, a projection optical system 2a includes first partial optical systems 21 to 24 and a field stop 25.
And second partial optical systems 26 to 29.
These first and second partial optical systems are respectively modifications of the Dyson optical system.

The first partial optical system is provided with 4
Right angle prism 21 having a reflection surface arranged at an inclination of 5 °
And a plano-convex lens component 22 having an optical axis along the in-plane direction of the mask 8 and having a convex surface facing the opposite side of the right-angle prism 21
And a lens component 23 having a reflective surface with a meniscus shape as a whole and a concave surface facing the plano-convex lens component 22 side.
And a right-angle prism 24 having a reflection surface orthogonal to the reflection surface of the right-angle prism 21 and arranged at an angle of 45 ° with respect to the mask 8 surface.

The light from the illumination optical system through the mask 8 is deflected by 90 ° in the optical path by the right-angle prism 21, and the plano-convex lens component 22 joined to the right-angle prism 21
Incident on. A lens component 23 made of a glass material different from the plano-convex lens component 22 is joined to the lens component 22. Light from the right-angle prism 21 is refracted at a joining surface 22 a of the lens components 22 and 23. Reaches the reflection surface 23a on which the reflection film is deposited. The light reflected by the reflection surface 23a is refracted by the joint surface 22a and reaches the right-angle prism 24 joined to the lens component 22. The light from the lens component 22 is deflected in the optical path by 90 ° by the right-angle prism 24 to form a primary image of the mask 8 on the exit surface side of the right-angle prism 24. Here, the first partial optical systems 21 to 24
The primary image formed by the mask 8 is a 1 × image having a positive lateral magnification in the X direction (optical axis direction) and a negative lateral magnification in the Y direction.

Light from the primary image passes through the second partial optical system 26 to
Via 29, a secondary image of the mask 8 is formed on the plate 9. Note that the configuration of the second partial optical system is the same as that of the first partial optical system, and a description thereof will be omitted. Like the first partial optical system, the second partial optical systems 26 to 29 form the same magnification image having a lateral magnification in which the X direction is positive and the Y direction is negative. Therefore, the secondary image formed on the plate 9 is an equal-size erect image of the mask 8 (an image having a positive horizontal magnification in the vertical and horizontal directions). Here, the projection optical system 2a (first and second partial optical systems) is a double-sided telecentric optical system.

The first and second partial optical systems described above are:
The reflecting surfaces 23a and 28a are configured to be in the same direction. This makes it possible to reduce the size of the entire projection optical system. The first and second partial optical systems according to the present embodiment include plano-convex lens components 22 and 27 and reflection surfaces 23a and 2a.
8a is filled with a glass material in the optical path.
Thereby, the plano-convex lens components 22 and 27 and the reflecting surface 23
There is an advantage that eccentricity with the a and 28a does not occur.

As shown in FIG. 5, the first and second partial optical systems include plano-convex lens components 22, 27 and a reflecting surface 23.
The so-called Dyson-type optical system itself may be configured by using air between the a and 28a. For such a Dyson-type optical system, refer to JOSA vol. 49 (1959)
P713 to P716. In the present embodiment, the field stop 25 is arranged at the position of the primary image formed by the first partial optical system. The field stop 25 is, for example, as shown in FIG.
It has a trapezoidal opening as shown in FIG. The field stop 25 defines an exposure area on the plate 9 in a trapezoidal shape. Here, as shown by a broken line in FIG. 6B, in the Dyson-type optical system of the present embodiment, the lens component 22
Since the cross-sectional shape (YZ plane) of 23, 27, and 28 is circular, the maximum field of view that can be taken is substantially semicircular. At this time, the trapezoidal viewing region 8a defined by the field stop 25 preferably has a short side of the pair of parallel sides facing the arc side of a semicircular region (region of the largest field of view). Thus, the width of the visual field in the scanning direction (X direction) can be maximized with respect to the maximum visual field that the Dyson optical system can take, and the scanning speed can be improved.

As shown in FIG. 6C, the field stop 25 may have a hexagonal opening. At this time, as shown in FIG. 6 (d), the size of the hexagonal opening is within the range of the maximum visual field area indicated by the broken line in the figure. 6 (b) and FIG. 6 (d), the maximum visual field region indicated by the broken line indicates that the outermost light beam among the off-axis light beams passing through the first and second partial optical systems without vignetting. This is an area surrounding a point passing on the mask 8.

Returning to FIG. 1, the arrangement of the projection optical systems 2a to 2g will be described. In FIG. 1, the projection optical system 2a
2g have field regions 8a to 8g defined by a field stop in the projection optical system. These viewing areas 8
The images a to 8g are formed as the same-size erect images on the exposure areas 9a to 9g on the plate 9. Here, the projection optical systems 2a to 2d are provided such that the field regions 8a to 8d are arranged along the Y direction in the drawing. Further, the projection optical systems 2e to 2g are provided at positions different from the viewing regions 8a to 8d in the X direction in the figure so that the viewing regions 8e to 8g are arranged along the Y direction. At this time, the projection optical system 2
a to 2d and the projection optical systems 2e to 2g are provided such that their right-angle prisms are located extremely close to each other. Note that, in the X direction, the projection optical system 2 is configured to widen the interval between the visual field regions 8a to 8d and the visual field regions 8e to 8g.
Although a to 2 g may be arranged, at this time, a scanning amount (moving amount of the mask 8 and the plate 9) for performing the scanning exposure increases, which is not preferable because the throughput is reduced.

On the plate 9, projection optical systems 2a to 2d
The exposure regions 9a arranged along the Y direction in the drawing
To 9d are formed, and the projection optical systems 2e to 2g form exposure regions 9e to 9g arranged along the Y direction at positions different from the exposure regions 9a to 9d. These exposure regions 9a to 9g are erect images of the same size as the viewing regions 8a to 8d.

Here, the mask 8 is mounted on a mask stage (not shown), and the plate 9 is mounted on a plate stage 60. Here, the mask stage and the plate stage move synchronously in the X direction in the figure. As a result, the image of the mask 8 illuminated by the illumination optical system 10 is sequentially transferred onto the plate 9, and so-called scanning exposure is performed. The movement of the mask 8 causes the viewing area 8
When the scanning of the entire surface of the mask 8 by a to 8g is completed, the image of the mask 8 is transferred over the entire surface of the plate 9.

On the plate stage 60, a reflecting member 61 having a reflecting surface along the Y axis and a reflecting member 62 having a reflecting surface along the X axis are provided. On the side of the exposure apparatus main body, for example, He-Ne (633
nm), and a beam splitter 6 that splits the laser light from the laser light source 63 into a laser beam for X-direction measurement and a laser beam for Y-direction measurement.
4. The laser beam from the beam splitter 64 is reflected by the reflecting member 6.
A prism 65 for projecting the laser beam to the first member 1 and prisms 66 and 67 for projecting the laser beam from the beam splitter 64 to two points on the reflecting member 62 are provided. Thus, the position of the stage in the X direction, the position in the Y direction, and the rotation in the XY plane can be detected. In FIG. 1, a detection system for detecting the laser light reflected by the reflection members 61 and 62 and the reference laser light after making the laser light interfere with each other is not shown.

Next, the arrangement of the visual field regions according to the present embodiment will be described with reference to FIG. FIG. 7 shows a projection optical system 2a.
FIG. 9 is a diagram showing a planar positional relationship between the visual field regions 8a to 8g and the mask 8 by 2g. In FIG. 7, the mask 8
A circuit pattern PA is formed thereon, and a light-shielding portion LSA is provided so as to surround a region of the circuit pattern PA. The illumination optical system shown in FIG. 2 uniformly illuminates the illumination regions 111a to 111g surrounded by broken lines in the drawing. The visual field regions 8a to 8g described above are arranged in the illumination regions 111a to 111g. These field regions 8a to 8g have a substantially trapezoidal shape due to the field stop in the projection optical systems 2a to 2g. Here, the viewing area 8
The upper sides a to 8d (short sides of a pair of parallel sides) and the upper sides of the viewing areas 8e to 8g (short sides of a pair of parallel sides) are arranged to face each other. Here, the shapes of the viewing areas 8a and 8d along the light-shielding portion LSA are defined such that the oblique sides (the sides other than the pair of parallel sides) on the light-shielding portion LSA side coincide with the edges of the area of the circuit pattern PA. . Note that the shape may be such that the visual field regions 8a and 8d overlap the light shielding portion LSA of the mask 8.

In this embodiment, the projection optical systems 2a to 2a
Since g is a double-sided telecentric optical system, the area occupied by the projection optical systems 2a to 2g in the XY plane is larger than the area occupied by the visual field areas 8a to 8g, respectively. Therefore, the arrangement of the visual field regions 8a to 8d has to be configured so as to have an interval between the respective regions 8a to 8d. In this case, if scanning exposure is performed using only the visual field areas 8a to 8d, the area on the mask 8 between the visual field areas 8a to 8d cannot be projected and transferred onto the plate 9. Therefore, in the present embodiment, the visual field regions 8a to 8d
In order to perform the scanning exposure for the region between, the projection optical systems 2e to 2g are provided to provide the viewing regions 8e to 8g.

At this time, it is desirable that the sum of the widths of the visual field regions 8a to 8g (or the exposure regions 9a to 9g) along the scanning direction (X direction) is always constant at any position in the Y direction. Hereinafter, description will be made with reference to FIG. FIG.
(a) and (b) show the distribution of the exposure amount on the plate 9 in the Y direction. The vertical axis shows the exposure amount E, and the horizontal axis shows the position of the plate 9 in the Y direction. In FIG. 8A, on the plate 9, exposure dose distributions 90a to 90g corresponding to trapezoidal exposure regions 9a to 9g are obtained. Here, in the scanning exposure, since the sum of the widths of the exposure regions 9a to 9g in the X direction is defined to be constant, the same exposure amount is always obtained for the overlapping region of the exposure regions 9a to 9g. For example, the exposure amount distribution 90a corresponding to the exposure region 9a and the exposure amount distribution 9 corresponding to the exposure region 9e
0e, since the sum of the width in the X direction of the exposure region 9a and the width in the X direction of the exposure region 9e is constant, the sum of the exposure amounts in the overlapping region is the exposure amount in the non-overlapping region. The same exposure amount is obtained. Therefore, a uniform exposure distribution 91 is obtained on the entire surface of the plate 9. In the above description, the case where the exposure region has a trapezoidal shape is described. However, the combination of the exposure regions for obtaining a uniform exposure amount distribution is not limited to the trapezoidal shape.
For example, when a plurality of hexagonal exposure regions are formed by the field stop 25 as shown in FIG. 6C, each exposure region is defined so that the width of each exposure region in the scanning direction is always constant. Thereby, a uniform exposure amount distribution can be obtained over the entire surface of the plate 9.

Next, with reference to FIG. 9, a desirable arrangement relationship of the projection optical system in this embodiment will be described. FIG.
Is a plan view for explaining the arrangement of the projection optical system,
This shows a state where the projection optical systems D ₁ , D ₂ and D ₃ are viewed from the mask 8 side (object side). In FIG. 9, the projection optical system D ₁ is composed of a plano-convex lens component L ₁ and a concave mirror M _1, and the projection optical system D ₂ is composed of a plano-convex lens component L ₂ and a concave mirror M _{2. 3} is composed of a plano-convex lens component L ₃ and the concave mirror M ₃ Prefecture. Here, each of the projection optical systems D ₁ , D ₂ ,
Configuration of the D ₃ are both the same. In FIG. 9, for the sake of simplicity, the optical paths of the projection optical systems D ₁ , D ₂ , and D ₃ include only the optical paths from the object to the concave mirrors (reflecting mirrors) M ₁ , M ₂ , and M ₃ . The right-angle prism for deflecting the optical path in the Z direction is not shown.

Now, the maximum width of the field of view of the projection optical system D ₁ in the Y direction, φ _F1 , the maximum width of the field of view of the projection optical system D ₂ in the Y direction, φ _F2 , the maximum Y directional width of the viewing area of possible D ₃ and phi _F3. The widths φ _{F1 to} φ _F3 of these visual field areas in the Y direction correspond to the radial lengths of the maximum visual field areas indicated by broken lines in FIGS. 6B and 6D, respectively.

At this time, if the distance between the optical axes of the projection optical systems D ₁ and D ₃ arranged adjacent to each other in the Y direction is K,

[0036]

It is desirable that the following formula is satisfied: φ _F1 / 2 + φ _F2 + φ _F3 / 2> K (1) Where φ _F1 = φ _F2 = φ _F3
= Φ _F (where φ _{F is the} maximum width of the projection optical system in the Y direction), the above equation (1) can be rewritten as follows.

[0037]

2φ _F > K (2) That is, Y of the maximum field of view that each projection optical system can take
The width in the direction is preferably at least half the distance between the optical axes in the Y direction of each projection optical system. Here, it is not preferable that the arrangement of the projection optical systems deviates from the range of the above formula (1) or (2), since the respective visual field regions may not overlap in the Y direction.

The diameters (length in the Y direction) of the plano-convex lens components L _{1 to} L ₃ are φ _L1 to φ _L3 , and the diameters (length in the Y direction) of the concave mirrors M _{1 to} M ₃ are φ _M1 to φ _M3. And the larger one of these diameters (that is, the projection optical systems D ₁ , D ₂ , D ₃
The maximum value of the outer diameter) and φ _D1 ~φ _D3. Here, since the configuration of each projection optical system D ₁ , D ₂ , D ₃ is the same,

[0039]

The following holds: φ _L1 = φ _L2 = φ _L3 , φ _M1 = φ _M2 = φ _M3 , φ _D1 = φ _D2 = φ _D3 = φ _D. At this time, when the width of the Y direction of maximum field area that can be taken for each projection optical system and phi _F,

[0040]

Equation 4] _{φ F> φ D / 2 ...} (4) is preferably satisfied. Here, each projection optical system D ₁
To D ₃ does not satisfy the equation (4), i.e., the width phi _F in the Y direction of maximum field area that can be taken for each projection optical system is not more than half of the maximum value phi _D of the outer diameter of the projection optical system in case of,
It is not preferable because the projection optical systems D ₁ and D ₃ arranged adjacent to each other in the Y direction may interfere with each other. Incidentally, when the maximum value of the outer diameter of the projection optical system is determined by the right-angle prism that 90 ° deflects the optical path may be the length of the Y direction of the rectangular prism maximum value phi _D of the outer diameter. Further, the relations of the expressions (1) to (4) are not limited to the Dyson-type optical system but can be applied to the Offner-type optical system.

In the above-described embodiment, two sets of optical systems are combined as a projection optical system.
The optical system shown in FIGS. 10 and 11 may be applied. FIG.
Reference numeral 0 denotes a case where a right-angle roof prism 34 having a roof surface is applied instead of the right-angle prism of the Dyson optical system. 10, a right-angle prism 31, a plano-convex lens component 32, and a lens component 33 having a reflection surface 33a are respectively a right-angle prism 21, a plano-convex lens component 22 shown in FIG.
Since it has the same function as the lens component 33, the description is omitted here. In a Dyson-type optical system having two sets of right-angle prisms, the lateral magnification in the direction along the optical axis is positive, and the direction orthogonal to the optical axis (the direction along the object plane and the image plane).
An image having a negative lateral magnification is formed. In the Dyson-type optical system having the right-angle roof prism 34 as shown in FIG. 10, since the image direction in the direction perpendicular to the optical axis (perpendicular to the paper plane) in the object plane and the image plane is reversed by the roof plane, the direction along the optical axis (X direction) and a direction orthogonal to the optical axis in the object plane and the image plane (Y
Direction) can be formed.

FIG. 11 is a lens configuration diagram of an example of a Dyson-type optical system provided with a reflecting surface for turning an optical path.
In FIG. 11, the light from the mask 8 is applied to a semi-reflective surface 41 inclined at 45 ° to the light incident direction (Z-axis direction).
By a, the optical path is deflected by 90 ° and enters the plano-convex lens component. The plano-convex lens component 4 shown in FIG.
2 and a lens component 43 joined to the plano-convex lens component 42
Have the same functions as the plano-convex lens component 22 and the lens component 23 of FIG. 4, respectively.

The light incident on the plano-convex lens component 42 is reflected by the reflecting surface 43a, and is again reflected by the plano-convex lens component 4.
2, a primary image of the mask 8 is formed on the exit side of the plano-convex lens component 42. The reflection surface 4 is located at the primary image forming position.
1b is provided. Here, the semi-reflective surface 41a and the reflective surface 41b are provided on the reflective member 41. The light from the primary image on the reflection surface 41b travels in the original optical path backward, passes through the plano-convex lens component 42 and the lens component 43, and then passes through the semi-reflection surface 41a. The transmission direction of the semi-reflective surface 41a is 1 to the incident direction (transmission direction) of the light beam.
The reflecting surface 44a inclined at 12.5 ° and the reflecting surface 4
A reflection member 44 having a reflection surface 44b inclined at 45 ° to 4a is provided. Here, the reflection surface 44
Since the light beams a and 44b have the function of a pentaprism, the light path of the light incident on the reflection member 44 is deflected by 90 ° by the reflection on the reflection surfaces 44a and 44b.

The light reflected by the reflecting surfaces 44a and 44b is
A secondary image of the mask 8 is formed on the exit side of the reflection member 44.
Here, this secondary image is an erect image of the same magnification. In FIG. 11, the optical path length from the mask 8 to the reflecting surface 41b is equal to the optical path length from the reflecting surface 41b to the plate 9. Here, in the projection optical system shown in FIG. 11, the shape of the reflecting surface 41b becomes the shape of the field stop. For example, when the short side is the trapezoidal reflection surface 41b whose upper side is the upper side of the paper in the YZ plane, the viewing area and the exposure area are trapezoidal areas where the shorter side is located on the right side of the paper on the XY plane. In the projection optical system of FIG.
The light flux passing near the optical axis of the plano-convex lens component 42 and the lens component 43 does not reach the reflecting surface 41b and does not contribute to image formation. However, from the semi-reflective surface 41a to the reflective surface 43
In order to avoid mixing of the optical path going to the reflecting surface 41b and the optical path going from the reflecting surface 41b to the reflecting surface 43a, the plano-convex lens component 4
It is rare to use a light beam passing on and near the optical axis of the lens component 2 and the lens component 43. Therefore, as shown in FIG.
Even if the light beam passing near the optical axis of the plano-convex lens component 42 and the lens component 43 is shielded, there is no problem in practice.

In the projection optical system shown in FIGS. 10 and 11, it goes without saying that the configuration may be such that the object side and the image side are reversed. In the projection optical system shown in FIG. 11 as described above, two reflecting surfaces 44a and 44b having the same function as the pentaprism are applied. Instead, as shown in FIG. 12, a reflecting surface for turning back the optical path is used. May be composed of two reflecting surfaces. 12, a different point from the projection optical system of FIG. 11 is that two reflection surfaces 51 forming a roof surface having a ridge line along the Y direction (perpendicular to the paper surface) are provided.
b and 51c are provided instead of the reflection surface 41b for turning back the optical path, and a reflection surface 54a inclined at 45 with respect to the surface of the plate 9 is provided instead of the two reflection surfaces 44a and 44b. In FIG. 12, the plano-convex lens component 52
The lens component 53 having the reflection surface 53a has the same function as the plano-convex lens component 42 and the lens component 43 of FIG. 11, respectively.

In FIG. 12, the light path from the mask 8 is deflected by 90 ° at the semi-reflective surface 51a, and the light is reflected by the reflective surfaces 51b and 51 via the plano-convex lens component 52 and the lens component 53.
c and a primary image of the mask 8 is formed. This primary image is turned upside down by the reflecting surfaces 51b and 51c,
Again through the plano-convex lens component 52 and the lens component 53,
The light passes through the semi-reflective surface 51a. The light transmitted through the semi-reflective surface 51a is deflected by 90 ° in the optical path at the reflective surface 54a, exits from the reflective member 54, and forms a secondary image of the mask 8. Here, this secondary image is an erect image of the same magnification.

In the above embodiment, a Dyson-type optical system having a plano-convex lens component and a concave mirror is applied as a projection optical system for obtaining an erect image of the same magnification. It is not limited to. For example, as shown in FIG. 13, an Offner-type optical system in which a concave mirror, a convex mirror, and a concave mirror are sequentially arranged can be applied. FIG. 13 shows an application of the Offner type optical system shown in FIG. 14 (b) as the first and second partial optical systems. For simplicity, the same members as those shown in FIG. 14 (b) are used. Members having functions are given the same reference numerals. In FIG. 13, a field stop 25 having an arc-shaped opening is provided at a primary image forming position of the mask 8 formed by the first partial optical system. Even with such two sets of Offner-type optical systems, it is possible to obtain a projection optical system that is telecentric on both sides (object side and image side) and forms an erect image of the same size as an object.

From the above, it can be seen that the projection optical system for obtaining an erect image of the same magnification can have various configurations. In addition,
In a projection optical system that does not form an intermediate image (primary image) as shown in FIG. 10 or an optical system in which a field stop cannot be arranged at an intermediate image forming position as shown in FIG. 12, the shape of the illumination area by the illumination optical system is desired. May be made similar to the shape of the visual field region. For example, the field stop 10 of the illumination optical system shown in FIG.
If the shapes of the openings 107a and 107b are trapezoidal, a trapezoidal illumination area can be obtained.

As described above, according to the exposure apparatus of this embodiment, since a plurality of projection optical systems form an exposure area having a wide width orthogonal to the scanning direction, each projection optical system is enlarged. This makes it possible to cope with an increase in the screen size of the exposure area without any problem. In this embodiment, since the projection optical system does not increase in size, there is an advantage that an increase in aberration due to proportional enlargement can be prevented.

Further, in this embodiment, since exposure of a large screen can be executed by one exposure without repeating the screen, there is an advantage that the throughput can be improved and there is an advantage that there is no seam of the screen.

[0051]

As described above, according to the present invention, it is possible to provide an exposure apparatus capable of transferring a circuit pattern without reducing the throughput even when the exposure area is large.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an example of an embodiment of the present invention.

FIG. 2 is a perspective view showing an example of an illumination optical system applied to the exposure apparatus according to the present invention.

FIG. 3 is a diagram schematically showing a modification of the illumination optical system.

FIG. 4 is a lens configuration diagram of a projection optical system applied to the exposure apparatus according to the present invention.

FIG. 5 is a lens configuration diagram showing a modification of the projection optical system.

FIG. 6 is a plan view for explaining the shape of a field stop.

FIG. 7 is a diagram showing a planar positional relationship between a field of view and a mask by a projection optical system.

FIG. 8 is a diagram showing an exposure amount distribution on a plate.

FIG. 9 is a plan view for explaining an arrangement relationship of a plurality of projection optical systems.

FIG. 10 is a lens configuration diagram showing a modification of the projection optical system.

FIG. 11 is a lens configuration diagram showing a modification of the projection optical system.

FIG. 12 is a lens configuration diagram showing a modification of the projection optical system.

FIG. 13 is a lens configuration diagram when an Offner-type optical system is applied as a projection optical system.

FIG. 14 is a perspective view showing an example of a conventional exposure apparatus.

[Explanation of symbols]

2a to 2g: projection optical system, 8: mask, 9: plate, 10: illumination optical system,

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-52-15266 (JP, A) JP-A-4-251812 (JP, A) JP-A-1-161243 (JP, A) JP-A-4- 277612 (JP, A) JP-A-1-201666 (JP, A) JP-A-63-299330 (JP, A) JP-A-3-69129 (JP, U) JP-A-5-81841 (JP, U) U.S. Pat. No. 4,696,889 (US, A) U.S. Pat. No. 4,769,880 (US, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01L 21/027 G03F 7/20 INSPEC (DIALOG)

Claims (93)

(57) [Claims] 1. An exposure apparatus for projecting and exposing an image of the first object onto the second object while moving a first object and a second object, wherein: It has first and second projection optical systems for forming an erect image on the second object, and the first and second projection optical systems are configured such that at least the image side is telecentric. Exposure equipment. 2. The first and second projection optical systems are Dyson type optical systems having a lens surface having a concave surface facing the light incident side and a reflecting surface having a concave surface facing the light incident side. 2. The exposure apparatus according to claim 1, wherein: 3. The first and second projection optical systems include a first projection optical system,
It has a partial optical system and a second partial optical system, wherein the second partial optical system forms a secondary image by light from a primary image of an object formed by the first partial optical system. 3. The exposure apparatus according to claim 1, wherein 4. The first and second partial optical systems have first and second reflecting surfaces each having a concave surface facing the light incident side, and the first and second reflecting surfaces are the same. 4. The exposure apparatus according to claim 3, wherein the exposure apparatus is arranged so that the concave surface faces in the direction. 5. The exposure apparatus according to claim 3, wherein a field stop is arranged at a position where the primary image is formed by the first partial optical system. 6. The field stop has a substantially trapezoidal opening, and the sum of the lengths in the moving direction of the exposure region defined by the opening is defined to be always equal in a direction orthogonal to the moving direction. 6. The method according to claim 5, wherein
Exposure apparatus according to the above. 7. The system according to claim 1, wherein the first and second projection optical systems have a lens and a concave reflecting surface.
The exposure apparatus according to any one of claims 1 to 6. 8. The exposure apparatus according to claim 7, wherein a space is provided between the lens and the concave reflecting surface. 9. An exposure apparatus according to claim 1, wherein said first and second projection optical systems have a concave reflecting surface. 10. The first projection optical system has a first concave reflecting surface, the second projection optical system has a second concave reflecting surface, and the first and second concave reflecting surfaces are concave. 10. The exposure apparatus according to claim 9, wherein the exposure apparatuses are arranged so as to face each other. 11. The first projection optical system has a third concave reflecting surface, the second projection optical system has a fourth concave reflecting surface, and the first and third concave reflecting surfaces are 11. The exposure apparatus according to claim 10, wherein the second and fourth reflecting surfaces are arranged so as to face the concave surface in the same direction. 12. The first and second projection optical systems deflect light from the first object and direct the light to the concave reflecting surface, and light reflected by the concave reflecting surface. 10. The exposure apparatus according to claim 9, further comprising a second deflecting member for deflecting light. 13. The first and second projection optical systems further include: a different concave reflecting surface different from the concave reflecting surface; and a second reflecting member that deflects light from the second deflecting member to the different concave reflecting surface. 13. The exposure apparatus according to claim 12, further comprising a third deflecting member for directing the light, and a fourth deflecting member for deflecting the light reflected by the another concave reflecting surface. 14. The system according to claim 13, wherein the first and second projection optical systems form an intermediate image of the first object between the second deflecting member and the third deflecting member. Exposure apparatus according to the above. 15. The exposure according to claim 14, wherein the first and second projection optical systems have a field stop disposed between the second deflecting member and the third deflecting member. apparatus. 16. The exposure apparatus according to claim 13, wherein the concave reflecting surface and the another concave reflecting surface are arranged so that the concave surfaces face in the same direction. 17. A third projection optical system for forming an equal-size erect image of the first object on the second object, wherein at least an image side of the third projection optical system is telecentric. 2. The exposure apparatus according to claim 1, wherein the exposure apparatus comprises: 18. The third projection optical system has a first partial optical system and a second partial optical system, and the second partial optical system is a part of the object formed by the first partial optical system. 2. A secondary image is formed by light from the secondary image.
8. The exposure apparatus according to 7. 19. The first and second partial optical systems have first and second reflection surfaces each having a concave surface facing the light incident side, and the first and second reflection surfaces are the same. 19. The exposure apparatus according to claim 18, wherein the exposure apparatus is arranged so as to face the concave surface in the direction. 20. The exposure apparatus according to claim 18, wherein a field stop is disposed at a position where the primary image is formed by the first partial optical system. 21. An exposure apparatus according to claim 17, wherein said first, second and third projection optical systems have a concave reflecting surface. 22. The first projection optical system has a first concave reflecting surface, the second projection optical system has a second concave reflecting surface, and the third projection optical system has a third concave surface. A reflecting surface, wherein the first and second concave reflecting surfaces are disposed such that the concave surfaces face each other, and the first and third concave reflecting surfaces are disposed such that the concave surfaces face in the same direction. The exposure apparatus according to claim 21, wherein 23. The first projection optical system has a fourth concave reflecting surface, the second projection optical system has a fifth concave reflecting surface, and the third projection optical system has a sixth concave surface. A reflecting surface, wherein the first and fourth concave reflecting surfaces are arranged so as to face the concave surface in the same direction, and the second and fifth reflecting surfaces are arranged so as to face the concave surface in the same direction; 23. The exposure apparatus according to claim 22, wherein the third and sixth reflection surfaces are arranged so that the concave surfaces face in the same direction. 24. The first, second, and third projection optical systems deflect light from the first object to direct the light toward the concave reflecting surface, and reflect the light from the concave reflecting surface. 22. The exposure apparatus according to claim 21, further comprising a second deflecting member that deflects the emitted light. 25. The first, second, and third projection optical systems each further include a different concave reflecting surface different from the concave reflecting surface, and a different concave surface formed by deflecting light from the second deflecting member. 25. The exposure apparatus according to claim 24, further comprising a third deflecting member for directing the light to the reflecting surface, and a fourth deflecting member for deflecting the light reflected by the another concave reflecting surface. 26. The projection optical system according to claim 1, wherein the first, second, and third projection optical systems form an intermediate image of the first object between the second deflection member and the third deflection member. Claim 2
6. The exposure apparatus according to 5. 27. The projection optical system according to claim 26, wherein the first, second, and third projection optical systems include a field stop disposed between the second deflection member and the third deflection member. Exposure apparatus according to the above. 28. The exposure apparatus according to claim 25, wherein the concave reflecting surface and the another concave reflecting surface are arranged so as to face the concave surface in the same direction. 29. The first projection optical system, wherein the concave reflection surface in the first projection optical system and the concave reflection surface in the second projection optical system are arranged so that concave surfaces face each other. 29. The exposure apparatus according to claim 28, wherein the concave reflecting surface in the inside and the concave reflecting surface in the third projection optical system are arranged so that the concave surfaces face in the same direction. 30. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving a first object and a second object along a scanning direction, wherein: A first projection optical system that forms a first exposure area on the second object based on the light of the above; and a first exposure area on the second object based on the light from the first object. And a second projection optical system that forms a second exposure region different from the first and second projection optical systems, wherein the first and second projection optical systems are configured so that at least the image side is telecentric. 31. The apparatus according to claim 30, wherein the first and second exposure areas are arranged side by side in a non-scanning direction.
Exposure apparatus according to the above. 32. The exposure apparatus according to claim 30, wherein the first and second exposure areas are arranged at different positions in a non-scanning direction. 33. A third exposure area different from the first and second exposure areas is formed on the second object based on light from the first object, and at least an image side is configured to be telecentric. 33. The exposure apparatus according to claim 32, further comprising a third projection optical system, wherein the third exposure region is arranged at a position different from the first exposure region in the scanning direction. 34. The exposure apparatus according to claim 33, wherein the first exposure area and the second exposure area are arranged at an interval in a non-scanning direction. 35. The exposure apparatus according to claim 34, wherein the third exposure area is positioned so as to scan between the intervals between the first and second exposure areas. 36. The exposure apparatus according to claim 30, wherein the first and second exposure areas are arranged at different positions in the scanning direction. 37. A third exposure area different from the first and second exposure areas is formed on the second object based on light from the first object, and at least an image side is configured to be telecentric. 37. The exposure apparatus according to claim 36, further comprising a third projection optical system, wherein the third exposure area is arranged at a position different from the second exposure area in the scanning direction. 38. The first, second and third exposure areas are trapezoidal, and the short side of the trapezoid of the second exposure area is directed toward the third exposure area, 39. The exposure apparatus according to claim 37, wherein a short side of the trapezoid of the third exposure area is directed toward the second exposure area. 39. The first, second, and third exposure areas are trapezoidal, and a short side of the trapezoid of the first exposure area is directed toward the second exposure area. 37. The exposure apparatus according to claim 36, wherein a short side of the trapezoid of the second exposure area is directed toward the first exposure area. 40. The exposure apparatus according to claim 30, wherein the first, second, and third exposure areas have a trapezoidal shape or a hexagonal shape. 41. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving a first object and a second object along a scanning direction, comprising: A first projection optical system that forms a trapezoidal first exposure area on the second object based on the light of the first object; and the first projection optical system on the second object based on the light from the first object. of the second projection optical system to form a second exposed regions of the trapezoidal position different from the exposure area; have a, the first and second projection optical system, at least the image side Te
An exposure apparatus characterized by being centric . 42. The apparatus according to claim 41, wherein the first and second exposure areas are arranged side by side in a non-scanning direction.
Exposure apparatus according to the above. 43. The exposure apparatus according to claim 41, wherein the first and second exposure areas are arranged at different positions in a non-scanning direction. 44. A third trapezoidal third exposure area formed at a position different from the first and second exposure areas on the second object based on light from the first object. 44. The exposure apparatus according to claim 43, further comprising a projection optical system, wherein the third exposure area is arranged at a position different from the first exposure area in the scanning direction. 45. The exposure apparatus according to claim 44, wherein the first exposure area and the second exposure area are arranged at an interval in a non-scanning direction. 46. The exposure apparatus according to claim 45, wherein the third exposure area is positioned so as to scan the space between the first and second exposure areas. 47. The exposure apparatus according to claim 41, wherein the first and second exposure areas are arranged at different positions in the scanning direction. 48. A third projection optical system that forms a third exposure area on the second object at a position different from the first and second exposure areas based on light from the first object. 48. The exposure apparatus according to claim 47, further comprising: wherein the third exposure region is arranged at a position different from the second exposure region in the scanning direction. 49. An exposure apparatus for projecting and exposing an image of the first object on a second object while moving the first object and the second object along a scanning direction, wherein the first object has a trapezoidal shape. A second projection optical system having a trapezoidal second field of view; and a trapezoidal short side of the first field of view is the first projection. That the short side of the trapezoid of the second field of view is directed to the arc side of the maximum field of view of the second projection optical system. An exposure apparatus characterized by the following. 50. The exposure apparatus according to claim 49, wherein the maximum viewing area of each of the first and second projection optical systems has a semicircular shape. 51. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving a first object and a second object along a scanning direction, wherein: A first projection optical system that forms a first exposure area on the second object based on the light of the first object; and a first exposure area on the second object based on the light from the first object. A second projection optical system forming a second exposure region different from the first exposure region; and a third different from the first and second exposure regions on the second object based on light from the first object. An exposure apparatus, comprising: a third projection optical system that forms an exposure area; and wherein the first, second, and third projection optical systems are configured so that at least the image side is telecentric. 52. The exposure apparatus according to claim 51, wherein the first and second exposure areas are arranged at different positions in a non-scanning direction. 53. The exposure apparatus according to claim 52, wherein the third exposure area is arranged at a position different from the first and second exposure areas in the scanning direction. 54. The first exposure area and the second exposure area are arranged at intervals in a non-scanning direction, and the third exposure area is located between the first and second exposure areas. The exposure apparatus according to claim 52 or 53, wherein the exposure apparatus is positioned so as to scan the image. 55. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving a first object and a second object along a scanning direction, wherein: A first projection optical system that forms a first exposure area on the second object based on the light of the first object; and a first exposure area on the second object based on the light from the first object. A second projection optical system that forms a second exposure region different from the first and second projection optical systems, wherein the first and second projection optical systems are configured to be at least image-side telecentric, An exposure apparatus, wherein a sum of widths in the scanning direction is constant in a scanning orthogonal direction orthogonal to the scanning direction. 56. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving the first object and the second object along a scanning direction, comprising: A first projection optical system that forms a first exposure area on the second object based on the light of the first object; and a first exposure area on the second object based on the light from the first object. And a second projection optical system that forms a second exposure region different from the first object. The optical axes of the first and second projection optical systems are parallel to an in-plane direction of the first object. Exposure apparatus characterized by the above-mentioned. 57. The first and second projection optical systems have first and second viewing areas on the first object, and the first and second projection optical systems have the largest possible viewing area. wherein the scanning direction orthogonal to the direction of the width phi _F, when the first and distance between the optical axes of the second projection optical system is K, claim 56, characterized by satisfying the 2 [phi _F> K Exposure equipment. 58. The first and second projection optical systems have first and second viewing areas on the first object, and the first and second projection optical systems have the largest possible viewing area. when the direction of the width perpendicular to the scanning direction and phi _F, the maximum value of the outer diameter of the first and second projection optical system and phi _D, and satisfies the φ _F> φ _D / 2 The exposure apparatus according to Claim 56 or 57. 59. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving the first object and the second object along a scanning direction, wherein: A first projection optical system that forms a first exposure area on the second object based on the light of the above; and a first exposure area on the second object based on the light from the first object. And a second projection optical system for forming a second exposure area different from the first and second projection optical systems, wherein the first and second projection optical systems are arranged on a first object on the first object.
And a second viewing region, the first and the width in the direction perpendicular to the scanning direction of possible maximum viewing area of the second projection optical system and phi _F, of the first and second projection optical system when the maximum value of the outer diameter phi _D, satisfy φ _F> φ _D / 2, the first and second projection optical system, at least the image side Te
An exposure apparatus characterized by being centric . 60. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving the first object and the second object along a scanning direction, comprising: A first projection optical system that forms a first exposure area on the second object based on the light of the first object; and a first exposure area on the second object based on the light from the first object. And a second projection optical system that forms a second exposure area different from the first projection optical system.
And a second viewing region, the first and the width in the direction perpendicular to the scanning direction of possible maximum viewing area of the second projection optical system and phi _F, of the first and second projection optical system when the distance between the optical axes is K, satisfy 2 [phi _F> K, the first and second projection optical system, at least the image side Te
An exposure apparatus characterized by being centric . 61. The illumination optical system includes the first projection optical system.
Forming a first illumination area in a first viewing area of the system and
Forming a second illumination area in a second viewing area of the second projection optical system;
And Width of the first and second illumination areas in the scanning direction
The sum is one in a scanning orthogonal direction orthogonal to the scanning direction.
56. The exposure apparatus according to claim 55, wherein the constant is constant. 62. An exposure apparatus for projecting and exposing an image of the first object onto a second object while moving the first object and the second object along a scanning direction, wherein: A first projection optical system that forms a first exposure area on the second object based on the light of the first object; and a first exposure area on the second object based on the light from the first object. And a second projection optical system for forming a second exposure region different from the first and second projection optical systems, wherein the first and second projection optical systems are at least image-side telecentric and have a roof surface. Exposure equipment. 63. An exposure apparatus for projecting and exposing an image of the mask onto the photosensitive substrate while moving the mask and the photosensitive substrate along a scanning direction, comprising: A first projection optical system that forms a first exposure area on the photosensitive substrate based on the light; and a first projection optical system on the photosensitive substrate based on light from a second viewing area on the mask. A second projection optical system that forms a second exposure region different from the exposure region; and wherein the first viewing region has a side coincident with an edge of a circuit pattern region on the mask. Exposure equipment. 64. An exposure method for projecting and exposing an image of a first object onto a second object, wherein an erect image of the first object is formed on a first exposure area based on an image-side telecentric light beam. Forming an erect image of the first object on a second exposure area different from the first exposure area based on another image-side telecentric light flux different from the image-side telecentric light flux. And a third step of moving the first object and the second object along a scanning direction. 65. The exposure method according to claim 64, wherein the first and second steps include an auxiliary step of reflecting light with a concave reflecting mirror. 66. The exposure method according to claim 64, wherein each of the first and second steps includes an auxiliary step of forming an intermediate image of the first object. 67. The exposure method according to claim 66, wherein said first and second steps each include an auxiliary step of forming a secondary image from said intermediate image. 68. The first and second steps are an auxiliary step of reflecting light by a concave reflecting mirror to guide the light to the intermediate image, and an auxiliary step of reflecting light by a concave reflecting mirror to guide the light to the secondary image. 70. The exposure method according to claim 67, comprising: 69. The exposure method according to claim 67, wherein each of the first and second steps has an auxiliary step of passing light through a field stop. 70. The assisting step of reflecting light with the concave reflecting mirror in the first step and the assisting step of reflecting light with the concave reflecting mirror in the second step The exposure method according to claim 65, wherein the light is reflected. 71. The exposure method according to claim 65, wherein each of the first and second steps has an auxiliary step of passing light through a lens. 72. The first and second steps include a first auxiliary step of reflecting light with a first concave reflecting mirror, and a second auxiliary step of forming an intermediate image of the first object after the first auxiliary step. When,
The exposure method according to claim 65, further comprising a third auxiliary step of reflecting light with the second concave reflecting mirror after the second auxiliary step. 73. The first and second steps are: a fourth auxiliary step of deflecting light from the first object toward the first concave reflecting mirror; and converting the light from the first concave reflecting mirror to light. A fifth auxiliary step of deflecting the light toward the intermediate image, a sixth auxiliary step of deflecting the light from the intermediate image toward the second concave reflecting mirror, and the light from the second concave reflecting mirror to the second 73. The exposure method according to claim 72, further comprising a seventh auxiliary step of deflecting the light toward an object. 74. The first and second steps include: an eighth auxiliary step of guiding the light deflected in the fourth auxiliary step to the first lens and then to the first concave reflecting mirror; A ninth auxiliary step of guiding the light reflected by the concave reflecting mirror to the first lens, and a ninth auxiliary step of guiding the light deflected in the sixth auxiliary step to the second lens and then to the second concave reflecting mirror. (10) an auxiliary process, and the light reflected by the second concave reflecting mirror
The exposure method according to claim 73, further comprising: a tenth auxiliary step of leading to a lens. 75. A light deflecting direction in the fourth auxiliary step in the first step and a light deflecting direction in the fourth auxiliary step in the second step are opposite to each other. The exposure method according to claim 73 or 74, wherein: 76. A direction in which light is deflected in the sixth auxiliary step in the first step is opposite to a direction in which light is deflected in the sixth auxiliary step in the second step. The exposure method according to any one of claims 73 to 75, wherein: 77. The first and second steps include a first auxiliary step of reflecting light with a first concave reflecting mirror and a second auxiliary step of reflecting light with a second concave reflecting mirror. The exposure method according to claim 65, wherein 78. The exposure method according to claim 77, wherein the light reflection direction in said first auxiliary step and the light reflection direction in said second auxiliary step are the same. 79. A light reflection direction in the first auxiliary step in the first step and a light reflection direction in the first auxiliary step in the second step are opposite to each other. The exposure method according to claim 78, wherein 80. The first and second steps further include a deflection assisting step of deflecting light from the first object to the concave reflecting mirror, and the light assisting in the deflection assisting step in the first step. 66. The exposure method according to claim 65, wherein the direction of deflection is opposite to the direction of light deflection in the deflection assisting step of the second step. 81. The exposure method according to claim 64, wherein the first and second exposure areas partially overlap in a direction orthogonal to a scanning direction. 82. The method according to claim 82, further comprising: forming an erect image of the first object on a third exposure area different from the first and second exposure areas based on an image-side telecentric light beam. 65. The exposure method according to claim 64, wherein: 83. The exposure method according to claim 64, wherein the first and second exposure areas are arranged side by side in a non-scanning direction. 84. The exposure method according to claim 64, wherein said first and second exposure areas are arranged at different positions in a non-scanning direction. 85. A fourth step of forming an erect image of the first object on a third exposure area different from the first and second exposure areas based on an image-side telecentric light beam. 85. The exposure method according to claim 84, wherein: 86. The exposure method according to claim 85, wherein the third exposure area is arranged at a position different from the first exposure area in the scanning direction. 87. The exposure method according to claim 86, wherein the first and third exposure areas are arranged so as to have an interval in the non-scanning direction. 88. The exposure method according to claim 64, wherein the first and second exposure areas are arranged at different positions in the scanning direction. 89. A fourth step of forming an erect image of the first object on a third exposure area different from the first and second exposure areas based on an image-side telecentric light beam. The exposure method according to claim 88, wherein the exposure method is characterized in that: 90. The exposure method according to claim 89, wherein the third exposure area is arranged at a position different from the second exposure area in the scanning direction. 91. The exposure apparatus according to claim 6, wherein the first and second exposure areas are trapezoidal or hexagonal.
The exposure method according to any one of Items 4 to 90. 92. An exposure method for projecting and exposing an image of a first object onto a second object, wherein the first object is placed on the second object using the exposure apparatus according to claim 1. Forming the image of the first
And moving the second object. 93. The method according to claim 64, wherein the image of the first object is transferred onto the second object by one exposure while moving the first object and the second object. The exposure method according to claim 1.