201248337 六、發明說明： 【發明所屬之技術領域】 【0001】 、本發明係關於使用微透鏡卩車列之曝絲置及該曝光裝置所用 遮光板’尤其關於可對於不同單元布局(cell layout)的基板進行 南效率曝光之曝絲置及該曝光裝置所使用的遮光板。 【先前技術】 【0002】 & /ΐ1話及攜帶型f訊終料設備所搭載驗晶表示裝置， 二電，大型m示裝置不同，面板小型，並且要求面板更高 精細度。 【0003】 造5種攜帶型設備之液晶顯示面板時所制的曝光裝置， 了高精細度曝光’係使用半導體裝置曝光所採用的步進機。 =往’藉*步進機對於攜帶設備用的，】、型液晶顯示面板進行 將透Ϊ過光罩圖案的光線，透射過縮小光學系統之後， B真忠土& Ϊ時，曝光對象基板’例如係i.5111見方的大型基板， :0 對！!每1片或多片成為個別基板的區域進行多次曝光。 =’ ㈣使得所有成為個別基板的 行分割而製造出多片玻璃基板。 士，但是，在此步進機中，係藉纟1個對物透鏡來決定曝光區域 以在1片玻璃基板上製作多片面板時，有些情況下。 t透=曝光區域的邊界會位於面板的内部。如此則有:= 、丄在。，板中’包夾曝統域邊 域 =在邊界處’配線等位置將會偏離。因此，必須進;^ 1f使端部傾斜縣而以該傾斜部來重疊 寻所明的延接」處理。又，即使施以該「延接」處理，有^ ⑧ 201248337 情況在施以此「延接」的部分將會相連成直線上而產生條紋，如 此’產生該條紋的面板無法作為產品，必須報廢。再者，曝光圖 案係難以進行此種「延接」處理的圖案時，曝光區域邊界的面板 也無法作為製品而必須報廢。 【0006】 然而，現已有人提案使用微透鏡陣列的曝光裝置(專利文獻i 及j)。但是，習知使用微透鏡陣列的曝光裝置，其係對於曝光電 =等大型液晶表示裝置用之面板進行曝光，將其直接應用於攜帶 叹備用的液晶表示裝置時，攜帶設備用的液晶顯示面板，其面板 小，且有各種大小，所以有製造效率不佳之問題。 【0007】 _圖10係顯示習知使用微透鏡陣列的曝光裝置之示意圖。圖10 所不的習知曝光裝置中，固持於固定位置的光罩20下方配置有曝 光對象，即α基板40。光罩20對應於基板40成為各面板之區域(圖 10之中的單元4〇a)布局，設有多數個圖案區域2〇a，其形成有分 別待Ϊ光至各單元4〇a的圖案。在此光罩20與基板40之間，插 ^有叉微透鏡陣列架座21支持的微透鏡陣列22,使來自光源的曝 光光線15出射，並且將微透鏡陣列22與光源一起往i方向(第j f向1)移動’以曝光光線15去掃描光罩20的圖案區域2〇a<}如此， ，射過光罩20之各圖案區域2〇a的曝光光線，透射過微透鏡陣列 =各微透鏡p車列片(micro lens array chip)22a，並藉由微透鏡陣列 片2¾ ’將各圖案的正立等大像依序成像於基板4 【0008】 的微=1()Λ示的f知曝光裝置中，對應於單元布力 t圖11所示，在f知曝光裝置中，_ f f基板40之早兀布局的光罩20、200，微透鏡陣列220、22 右' 3對應於單元布局者。亦即，微透鏡陣列22Q、22ι，分別^ B、说或微透鏡陣列片娜，各微透 應於圖案區域2=!向1垂直相交的第2方向2,藉而分· 201248337 【0009】 各你i:透鏡陣列片配置成：其端部位於排列在與光罩2〇、200 之掃描方向(第1方向1)垂直相交的方向（第2方向2)上的多個圖案 區域20a、20b之間的區域。亦即，習知曝光裝置中，將微透鏡陣 列片22b、22c、22d彼此的延接口配置成各微透鏡陣列片彼此在 第1方向1重叠時，基板40由於2片微透鏡陣列片而形成有過曝 光之區域，以外之情況將留有未曝光之區域，所以該區域無法用 於面板。所以’單元的寬度較小(圖u⑻)與單元的寬度較大時 11(b))，無法共用微透鏡陣列220、221，依據單元的布局，不僅 光罩’連微透鏡陣列也要區別使用。 【先前技術文獻】 【專利文獻】 【0010】 專利文獻1 :曰本特開2010—102149號公報 專利文獻2 :日本特開2008—197226號公報 【發明内容】 (發明所欲解決之問題） 【0011】 如上所述，在例如攜帶設備用的液晶顯示面板， 二亚且小型的面板時’若使用習知步進機，則曝光圖延 ΐ〇」ο，ι^使用微透鏡陣列，則有製造效率不佳的問題點。、 又，在使用微透鏡陣列的曝光裝置中，光罩必 二土板各單元之布局的圖案，再者，微透鏡 須心携二 輩元的第2方向2上的多個單元之間的區域，所以必須依據 =^布局而_使用微透鏡_。所以，在對於 元 造效率更加降低之問題。再者，因為各個微】鏡;=常： 201248337 所以也有面板製造成本增加之問題點。 【0013】 本發明有鑒於此種問題，目的名 光裝置所使用的遮光板，.即使在對於不單置及該曝 光時，也能以高效率且低成本對於面板局的基板進行曝 (解決問題之方式） *尤。 【0014】 本發明之曝光裝置，其包含：光源，發射 受到來自該光源的曝光光線入射，呈有對/先、在，先罩， 形成待曝光圖案之多數個圖案區域了微透“工數=:== 罩的，光规所^射，使得該光料圖案之政等大像成^ 上，架座，支龍微透鏡卩車列；遮光板，用^ =微透鏡_之透光區域；_裝置，在固; 鏡陣列之位置關係的狀態下，使該光罩及該基板相對忿 该微^鏡_而相_移動，將該曝絲線在前記基板上朝向第】 方向掃描；以及控制裝置，控制該驅動裝置及該光源； f微透鏡陣列，係以多數個微透鏡陣列片在與該第i方向垂 直相父的第2方向上以其一部分彼此於該第丄方向上 配置構成， 里且的万式 於該微透鏡陣列片分配成各該微透鏡陣列片對應於〗或多數 個該圖案區域，且各該圖案區域僅對應於〗個微透鏡陣列片時， 該遮光板將微透鏡陣列片之中不要透光的區域予以遮光，而於 須透光的區域具有開口部。 ‘、 ^就曝光光線而言，係使用汞燈光線等。另，本發明之中的面 板係指液晶顯示面板的像素區域及其周邊區域，光罩上形成的曝 光用圖案’係包含像素區域之圖案及其周邊區域的電路圖案。 【0015】 〃 本發明之曝光裝置中，例如對於該微透鏡陣列準備有該開口 部之該第2方向之長度不同的多數個遮光板，因應於該圖案區域 之大小，選擇該多數個遮光板的其中之一來使用。 201248337 【0016】 遇光ίΪίίΪ光^係受到透射過具有多數個_區域之光罩的 ^美杯卜’對於排财將該光罩的圖案之正立等大像成像 二，上的讀個微透鏡_片之微透鏡_，安肢 於W觸木座’用以限制該微透鏡陣列之透光區域，、其特^ 趣峨糊 該遮光板， 繼Γί微透鏡陣列片分配成各該微透鏡_片對應於1或多數 區域’且各該圖案區域僅對應於1個微透鏡陣列片時， 之巾不要透光的區域抑遮光，而於必須透光 的(22域具有開口部。 (發明之效果） 【0017】 依據本發明之曝光裝置，加大設置微透鏡陣列的多數個微透 =陣列片使得其-部分彼此重疊，並設定使微透鏡陣架座所 安^的遮光板之開口部的形狀及位置符合圖案區域，藉此，即使 改變光罩上形成的圖案區域，亦即待曝光的顯示面板大小，也只 要將此遮光板更換成他者，微透鏡陣列本身則繼續使用，即能因 應於圖案區域而使微透鏡陣列片之曝光光線的透射區域之端部位 於該圖案區域之間的間隙區域。所以，能防止微透鏡陣列片端部 的過曝光及未曝光，並且無須更換微透鏡陣列，所以能降低製造 成本。 【貫施方式】 (實施發明之最佳形態） 【0019] _以下參照附加圖式具體說明本發明之實施形態。圖1(a)係顯 不本發明實施形態之微透鏡陣列及遮光板的俯視圖，圖1作)係顯 ⑧ 201248337 不，置有遮光板的微透鏡陣列與光罩的圖案 =顯示本發明第i實施形態之使用微透鏡 1上移動的基板平台12。於此ϋ1尤二有工可在第1方向 設置有架台13，就-例而言，於此力^ 1及^;台12的上方 =等光源14，例 至340nm的紫外線之瞌氺止括1C τ初J r乃，、?'射波長280 圖4所示，係矩形复。先、、泉15。此曝光光線15的照射區域如 【0020】 此曝光光線15的井;原ι4πΓ+ , π . 台18。架台π縣吊tit λ 圖所示，配置有光罩平 第！導軌16懸吊2延伸的第1導軌.此 導執i6係固砂f延伸的第2導執17。第1 的第1導執上七;成可往係在往第2方向2延伸 台18彼此仍舊保持其位置 :並且，4個光罩平 17上支持成可往、古a f係’在彺弟1方向1延伸的第2導軌 口，此開口支持光罩2〇°移動。此光罩平台18形成有矩形的開 導軌17可對於第丨μ; ^以，光罩20藉由第1導執16及第2 移。滑於弟i方向！進行掃描，並可對於第2方向2進行平 【0021】 口部透鏡陣_21，此架座21的開 片22a構成:車列片22a’構成由多數個微透鏡陣列 微透鏡，藉由各微^鏡將透鏡陣列片22a分別形成有多數 _ 22 圖案之正立等大像成像至配置 幵〜中’曝光農置設有驅動裝置，使得支持在光罩平 201248337 台18的光罩20與基板平台12上的基板如 透鏡陣列22，相對地同時—體在第〗方向】H於^ Η及微 台12上的基板40，藉由基板平台12在第2方=叙基板平 =於^^4、光罩20及微透鏡陣列22而在 夕相 另，基板平台12往第2方向2的移動可藉由手動進^ =裝板40平移用’並藉由此驅動裝 : 悲中，多數個微透鏡陣列片22a支持在排 7 ^只轭形 座以，架座2!狀於架台13上。所以，^^ 2方向上的架 ，線藉由微透鏡陣列22集光至基板4〇上的狀^原4的= 巧板40在第i方向!上移動，藉以錄板4〇受^曝】=〇 罩之圖案區域2如上形成的圖案曝光轉印至基板上。 第1驅動裝置使光源14及微透鏡陣列22對 叫目對地往第i方向！之掃描，係由未圖示的;空=罩置板 藉由㈣裝置控伽練置及光源 g 進订掃描之後，使基板40在第2方向2平移，再产 == 置及光源將曝光光線進行掃描 使基板的圖案形成用區域依順逐次曝光。 進仃 【0024] 就光罩平台18所固持的光罩20之大小而言，例如在 寬度係4〇〇麵。並且’光罩2〇設有圖案區域施，1且有 ifif圖^’係對應於多數個岐來形成。本實施形態 嶽、遍’此圖案列於第2方向2以既定間上 列Λ並且配置各圖案區域2Ga分別對應於基板上所形成= 多數個圖案區域2〇a對應於基板40上的單元40a之布局 本實施形態中，、如圖1⑻所示，微透鏡陣列22係由2個 ’見車列片22a所構成，各微透鏡陣列片22a彼此以其一部分於第1 201248337 ^向1上重疊的方式配置。所以，微透鏡陣列22相對於基板4〇(參 照圖8)而相對地在第！方向！上掃描時，配置於第】方向i上的 各圖案列20c、20d，係對應於2個微透鏡陣列片22a的雙方戋 其中任一方。 一 【0026】 如圖1⑻所示，本實施形態之微透鏡陣列22，係以微透鏡陣 j片22a彼此的一部分於第i方向重疊的方式配置，所以某一特 定圖案列20d的透射光的一部分，當未設有後述的遮光板3〇時， 入射至雙方的微透鏡陣列片22a。所以，由此圖案列2〇d所形成的 面板，有一部分經2次曝光而成為過曝光，剩餘部分為通常的i 次曝光。發生此種曝光不均的面板，即無法使用。所以，為了加 以避免，本貫施形態中，如圖丨作)所示設有遮光板3〇，對於微透 鏡陣列片22a之中不要透光的區域予以遮光。亦即，遮光板3〇設 有遮光部30a及開口部30b ’當微透鏡陣列22a分配成使得圖案區 域20a僅對應1個微透鏡陣列片22a時，藉由遮光部3加對於微透 鏡陣列片22a之中無須透光的區域予以遮光，並於微透鏡陣列片 22a之中必須透光的區域設置開口部3〇b使透射光透射。亦即，遮 光部30b對於各圖案列朝向未對應側的微透鏡陣列片22&之曝光 光線予以遮光，使得光罩各圖案區域的透射光不會入射至2個以 上的微透鏡陣列片22a。 【0027】 ^圖5係設置有遮光板的微透鏡陣列，圖5⑻係俯視圖，圖5(b) 係圖5⑻的A —A剖面圖。如圖5所示，微透鏡陣列22係於框架 狀的微透鏡陣列架座21之内側固定有2個微透鏡陣列片22a。各 微透鏡陣列片22a係由4片構件所構成，各構件係於玻璃基板^ 面及/或背面2維式配置凸透鏡之微透鏡而形成。藉由使平行光 透射過此微透鏡陣列片22a，而將光罩的圖案以正立等大像方式成 像於基板上。如圖5(b)所示，遮光板30之遮光部3〇a及開口部3〇b 以既定形狀設置而對應於光罩20的圖案2〇a大小，於微透鏡陣列 22的上方，其周緣部固定於微透鏡陣列架座21。藉此，在本實施 201248337 形恶中，文到遮光部30a所遮光並透射過開口部3〇b的曝光光線， 至微透鏡陣列22。另’在本實施形態中，微透鏡陣列片孤 片構件所構成，但本發明不受構成微透鏡陣列# 22a之構 斤限定。例如，微透鏡陣列片瓜亦可使用8片等構件。 ^板3〇例如係厚度10_左右的不鐵鋼，在本實施形態 二:藉由嵌合至微透鏡陣列架座21所設的溝槽而 於卢。mi猎提升對於微透鏡陣列片22a的遮光位置 架座二疋遮光板30時，例如亦可藉由黏接而貼附於微透鏡 【0029】 作。方式構成之使祕透鏡_的曝絲置之動 ^綠板4G，搬運至基板平台12上，設定 導幸九16、18所支持的光罩2〇正對的位置。並且，藉由 持固定的位置!^/平/ 12及Χ_Υ平台11，基板4G與光罩20保 位賴係，由轉裝朗時驅動。 光罩ί〇本圖::斤示’4個光罩平台18分別固持有 瞧朵# t 先源的4個曝光光線15入射至各光罩20， 的第2方向其寬度方向的長短對應於光罩20 1上相對於财二及基板4°同時—體地在第1方向 掃描方向(、^扣)上移動’曝絲線15在自色箭頭所示 【0031】 )對於光罩2〇進行掃描。 射過態之立體圖。如此圖7所示，透 於微透鏡陣列架座2;、之開口 15，其矩形照射區域位 ^中任-者的微透鏡形成區域2 =透鏡陣列片孤 陣列22，其位置關係 $ 光線15與微透鏡 疋在先罩2〇及基板40 —體地同時 ⑧ 12 201248337 • 移動期間，如圖8所示’曝光光線15於白色箭頭所示的掃p方向 二於光罩20及基板40進行相描透陣 ^ ^ 40 - -ίϊ J圖案41 基㈣上，於5列光阻上形成有帶狀的曝 【0032】 =施形態中，微透鏡陣列22設有2個 i 部分彼此於第1 *向上重疊二i配 ，/、中本貝鉍形悲中，微透鏡陣列架座21固定有 1此可分配微透鏡陣列22a，使得圖案2 、’個 ^予以遮光，並於微透鏡陣列片22a之中必須透光的區域設置 b使透射光透射’遮光部3〇b對於微透鏡陣列片t “ 未對應的各随賴之曝光光線予以遮 二 人射至2個以上的微透鏡陣列片m =於玻璃基板4G上之光阻膜進行的i次掃描動作，將 ，予以曝光，能使曝光動作高效率化。又，此時，各面板於^ 片，的延接點，所以曝光圖案中，'無須 【0033】 光罩，通常寬度係400mm左右，若製造此種長幅 列’則成本高昂。微透鏡陣列通常係15〇醜左 =，每單位長度_對製造成本較低。所以， 二Ϊ 座21設置例如長度為15。_的微透ί ;，對於曝光光線之透射予以斷。就後者而言，2 ^使舰域(無;㊣域)而㈣ ^ 透鏡陣列片排列於第2方向上，藉由分別對應於光 13 201248337 ===，陣列。此時，只要如本實施形態，將各 ΐ透其—部分於第1方向1上重疊的方式配 置，猎由遮光板30對於其透光區域 1 ^1 各圖案列’麻板_細案41内 數且 巧施形態中如圖9⑻所示，係使用2個微透鏡 22a， 措由遮光板30對於微透鏡陣㈣22a的—部奸以㈣，使透射 ，排列在第2方向2上的5個圖案區域2Ga之光線入射至任一個 微透鏡陣列片22a，當如圖9(b)使用對應於不同單元布局的基板 40的光罩200時’變更遮光板30即能令微透鏡陣列22丘用化。 亦即’圖9⑻所示的光罩於第2方向2形成有4個圖 2〇b，各圖案區域20b在第2方向2的大小，大於圖9(a)的光罩2〇 之中的各圖案區域2〇a。此日夺’曝光裝置可預先對應於醉區域大 小不同的光罩來準備開口部30b之第2方向2長度不同的多數個 遮光板，並因應於圖案區域大小，選擇多數個遮光板盆中之一來 使用。、亦即，在圖9(b)所示的光罩200之情況下，選g對應於圖 案區域20b之大小的遮光板31來使用。如此，即使在使用圖案區 域大小不同的光罩時’也能藉由使用開口部3〇b之第2方向2長 度不同的遮光板’而使微透鏡陣列片22a之中的曝光光線透射^ 域端部’位於圖案區域之間的間隙區域’能防止微透鏡陣列片22a 之端部的過曝光及未曝光。並且，即使在對於不同單元布局的面 板進行曝光時，也能不更換微透鏡陣列22而進行曝光，所二能以 高製造效率對於面板進行曝光。又，因為不須對應於單元布局來 設置不同的微透鏡，所以亦能防止面板的製造成本增加。^ 【0035】 曰 另，本實施形態中的遮光板30係對於從光罩2〇朝向微透鏡 陣列22的入射光予以遮光，但亦可使遮光板30係對於透^過微 透鏡陣列22的曝光光線予以遮光。又，本發明中，遮光板只^設 14 ⑧ 201248337 有遮光部30a及開口部30b，以使光罩2〇的圖案區域2〇a之透射 光不會透射$ 2個以上的微透鏡陣列片22a而照射至基板即可， 不限於上述態樣。例如，遮光板3〇亦可不固定於微透鏡陣列架座 21。 [0036】 又’本實施形態之微透鏡陣列22係藉由2個微透鏡陣列片22a 所構成，而在本發明中，微透鏡陣列22亦可配置成3個以上的多 數個微透鏡陣列片22a以其-部分彼此於第}方向上重疊，使得 ，射光罩20之各圖案區域2〇a的全部曝光光線，透射過配置成在 第1方向上重疊的微透鏡陣列片22a的任一個。 (產業上利用性） 【0037】 依^本發明，在對應於不同單元布局而更換光科僅變更遮 3 = Ϊ更換微透鏡陣列，對於不同單元布局的基板之曝光而 又，本發明有益於如攜帶設備用液晶顯示面板之要 求尚精細度且為小型面板之低成本製造。 【圖式簡單說明】 【0018】 置之顯示本發明第1實施形態之使驗透斜列的曝光裝 圖3係顯示光罩平台與微透鏡陣列之立體圖。 圖4係絲貝示光罩平台全體之立體圖。 圖設置有遮光板的微透鏡陣列，圖5⑻係俯視圖， 圖5(b)係圖5(句的A — a線段剖面圖。 口 步/之中的曝光光線與料之關係。 係如㈣曝光步驟之中的曝光鱗與微透鏡陣列之關 15 201248337 係。 圖8係顯示圖7的下一步驟。 板時的微透鏡陣列及 圖9(a)及(b)係在曝光不同單元布局的基 遮光板。 圖10係顯示習知使用微透鏡陣列的曝光 立 圖11⑻、（b)係顯示圖10所示的習知曝^ 元布局的微透鏡陣列之構成。 、置中，對應於專 【主要元件符號說明】 【0038】 I 第1方向(掃描方向） 2:第2方向(掃描方向的垂直相交方向) II : X-Y平台 12 ·基板平台 13 :架台 14 :光源 15 :曝光光線 16 :第1導軌 17 :第2導軌 18 :光罩平台 20、200 :光罩 20a、20b :圖案區域 20c、20d :圖案列 21 :微透鏡陣列架座 22、220、221 :微透鏡陣列 22a、22b、22c、22d :微透鏡陣列片 30、31 :遮光板 30a :遮光部 30b :開口部 40 :基板 201248337 40a :單元 41 :曝光圖案201248337 VI. Description of the Invention: [Technical Field of the Invention] [0001] The present invention relates to an exposure wire using a microlens brake train and a light shield used in the exposure apparatus, particularly regarding different cell layouts. The substrate is subjected to the exposure of the south efficiency exposure and the visor used in the exposure apparatus. [Prior Art] [0002] & / ΐ 1 words and portable type of F-terminal equipment are equipped with crystal inspection devices, two electric, large m display devices, small panels, and require higher precision of the panel. [0003] An exposure apparatus manufactured by making a liquid crystal display panel of five types of portable devices has a high-precision exposure, which is a stepping machine used for exposure of a semiconductor device. = To the 'borrowing* stepper for carrying equipment,】, the type of liquid crystal display panel will transmit the light that has passed through the mask pattern, after passing through the reduction optical system, B true faith & ,, the substrate to be exposed 'For example, a large substrate of i.5111 square, :0 pairs! Multiple exposures are performed for every one or more of the areas that become individual substrates. =' (4) A plurality of glass substrates are manufactured by dividing all the rows which become individual substrates. However, in this stepper, the exposure area is determined by one pair of objective lenses to make a plurality of panels on one glass substrate, in some cases. t through = the boundary of the exposure area will be inside the panel. Then there are: =, 丄. In the board, the edge of the boarding area = at the boundary, and the position such as wiring will deviate. Therefore, it is necessary to advance; ^ 1f to tilt the end portion of the county and overlap the finding of the extension by the inclined portion. Moreover, even if the "extension" process is applied, there are cases in which the "extended" portion will be connected in a straight line to produce streaks, so that the panel that produces the stripe cannot be used as a product and must be scrapped. . Further, when the exposure pattern is difficult to perform the pattern of such "extension" processing, the panel at the boundary of the exposure region cannot be used as a product and must be scrapped. However, an exposure apparatus using a microlens array has been proposed (Patent Documents i and j). However, conventionally, an exposure apparatus using a microlens array is used for exposing a panel for a large liquid crystal display device such as an exposure electric power, and directly applying it to a liquid crystal display device for carrying a sigh, a liquid crystal display panel for a portable device The panel is small and has various sizes, so there is a problem of poor manufacturing efficiency. FIG. 10 is a schematic view showing a conventional exposure apparatus using a microlens array. In the conventional exposure apparatus of Fig. 10, an α-substrate 40, that is, an α-substrate 40, is disposed under the mask 20 held at a fixed position. The mask 20 corresponds to the layout of the substrate 40 as the area of each panel (unit 4A in FIG. 10), and is provided with a plurality of pattern areas 2a, which are formed with patterns to be calendered to the respective units 4A. . Between the reticle 20 and the substrate 40, the microlens array 22 supported by the fork microlens array holder 21 is inserted, the exposure light 15 from the light source is emitted, and the microlens array 22 and the light source are moved together in the i direction ( The jf is moved to the 1) to scan the pattern area 2 〇 a of the reticle 20 by the exposure ray 15 . Thus, the exposure light passing through the pattern areas 2 〇 a of the reticle 20 is transmitted through the microlens array = each a micro lens array chip 22a, and the erected isometric images of the respective patterns are sequentially imaged on the substrate 4 by the microlens array sheet 226'. In the exposure apparatus, corresponding to the unit cloth force t, as shown in FIG. 11, in the exposure apparatus, the masks 20 and 200 of the early layout of the substrate 40, the right lens array of the microlens arrays 220 and 22 correspond to Unit layout. That is, the microlens arrays 22Q, 22i, respectively, B, or microlens arrays, each micro-transmission in the pattern area 2 =! 1 to the vertical direction of the second direction 2, by the point · 201248337 [0009] Each of the i: lens array sheets is arranged such that its end portions are located in a plurality of pattern regions 20a arranged in a direction (second direction 2) perpendicular to the scanning direction (first direction 1) of the masks 2, 200, The area between 20b. That is, in the conventional exposure apparatus, when the extension interfaces of the microlens array sheets 22b, 22c, and 22d are arranged such that the microlens array sheets overlap each other in the first direction 1, the substrate 40 is formed by two microlens array sheets. In areas that have been overexposed, there will be unexposed areas outside of the area, so this area cannot be used for panels. Therefore, when the width of the cell is small (Fig. u(8)) and the width of the cell is large (11), the microlens arrays 220 and 221 cannot be shared. According to the layout of the cell, not only the mask but also the microlens array should be used differently. . [Prior Art] [Patent Document] [Patent Document 1] Patent Document 1: JP-A-2010-102149 (Patent Document 2) Japanese Laid-Open Patent Publication No. 2008-197226 (Summary of the Invention) 0011] As described above, in the case of, for example, a liquid crystal display panel for a portable device, a second-sized and small-sized panel, if a conventional stepping machine is used, the exposure map is delayed. ο^ Using a microlens array, there is The problem of poor manufacturing efficiency. Moreover, in an exposure apparatus using a microlens array, the mask has a pattern of layout of each unit of the earth plate, and further, the microlens is required to carry between the plurality of units in the second direction 2 of the second generation element. Area, so you must use the microlens _ according to the =^ layout. Therefore, the problem of lowering the efficiency of the yuan is even lower. Furthermore, because of the micro-mirror; = often: 201248337, there is also a problem of increasing the manufacturing cost of the panel. In view of the above problems, the present invention is directed to a light shielding plate used for a name light device, which can expose a substrate of a panel office with high efficiency and low cost even when the exposure is not performed. Way) * Especially. [0014] The exposure apparatus of the present invention comprises: a light source, the emission is incident on the exposure light from the light source, and the plurality of pattern regions of the pattern to be exposed are formed by the pair of first, first, and first masks. =:== The hood, the light gauge, so that the light pattern of the political image of the big image into ^, the pedestal, the dragon microlens 卩 car column; visor, with ^ = micro lens _ light transmission a region; in the state of the positional relationship of the mirror array, the photomask and the substrate are moved relative to the micro mirror, and the exposed wire is scanned on the pre-recorded substrate toward the 】 direction; And a control device for controlling the driving device and the light source; the microlens array is configured such that a plurality of microlens array sheets are arranged in the second direction in a second direction perpendicular to the i-th direction The visor is configured such that the microlens array sheet is allocated to each of the microlens array sheets corresponding to or a plurality of the pattern regions, and each of the pattern regions corresponds to only one microlens array sheet, the mask a region of the microlens array that does not transmit light It is shielded from light and has an opening in the area to be light-transmitted. ', ^ In terms of exposure light, a mercury light line or the like is used. In addition, the panel in the present invention refers to a pixel area of the liquid crystal display panel and its peripheral area. The exposure pattern formed on the photomask is a circuit pattern including a pattern of a pixel region and a peripheral region thereof. [0015] In the exposure apparatus of the present invention, for example, the second portion of the opening portion is prepared for the microlens array A plurality of visors having different lengths of directions are selected according to the size of the pattern area, and one of the plurality of visors is selected for use. 201248337 [0016] The light ίΪίί ^ ^ is transmitted through a plurality of _ regions The mask of the mask is used to image the erect image of the mask, and the microlens _, the microlens _ a light-transmitting region of the microlens array, which is particularly interesting for the light-shielding plate, and then the microlens array sheet is allocated such that each of the microlens-sheets corresponds to 1 or a plurality of regions' and each of the pattern regions corresponds to only 1 Micro In the case of the lens array sheet, the area where the cloth is not to be light-transmitted is shielded from light, and the light-transmitting area is required to be transmitted (the 22-domain has an opening portion. (Effect of the Invention) [0017] According to the exposure apparatus of the present invention, the microlens array is enlarged A plurality of micro-transparent = array sheets are arranged such that their portions overlap each other, and the shape and position of the opening portion of the light shielding plate to which the microlens frame holder is mounted are set to conform to the pattern region, thereby changing the pattern formed on the mask The area, that is, the size of the display panel to be exposed, is also replaced by the visor, and the microlens array itself continues to be used, that is, the end of the transmission area of the exposure light of the microlens array sheet can be adapted to the pattern area. The portion is located in the gap region between the pattern regions. Therefore, overexposure and non-exposure of the end portions of the microlens array sheet can be prevented, and the microlens array is not required to be replaced, so that the manufacturing cost can be reduced. [Bottom Mode] (Best Mode for Carrying Out the Invention) [0019] Hereinafter, embodiments of the present invention will be specifically described with reference to additional drawings. Fig. 1(a) is a plan view showing a microlens array and a light shielding plate according to an embodiment of the present invention, and Fig. 1 is a drawing 8 201248337 No, a pattern of a microlens array and a mask provided with a light shielding plate = display of the present invention In the embodiment, the substrate stage 12 that moves on the microlens 1 is used. In this case, the gantry 1 can be provided with a gantry 13 in the first direction. For example, the force ^1 and ^; the upper portion of the table 12 = the equal light source 14, for example, the 340 nm ultraviolet light is included 1C τ initial J r is,,?' emission wavelength 280 shown in Figure 4, is a rectangular complex. First, spring 15. The illumination area of the exposure light 15 is as follows: [0020] the well of the exposure light 15; the original ι4πΓ+, π. The pi tai hang tat λ figure shows that the mask is flat! The guide rail 16 suspends the first guide rail that extends 2. This guide i6 is the second guide 17 that extends the fixing sand f. The first guide of the 1st is the seventh; the extension can be extended to the second direction 2 and the stand 18 still maintains its position with each other: and, the four masks are supported on the 17th, and the ancient af system is in the younger brother. The second rail opening extending in the 1 direction 1 supports the movement of the mask 2〇. The reticle stage 18 is formed with a rectangular open rail 17 for the first ;μ; ^, the reticle 20 is moved by the first guide 16 and the second. Slip in the direction of the younger brother! Scanning is performed, and the second lens 2 can be flatned [0021]. The opening lens 22a of the shelf 21 is composed of a plurality of microlens array microlenses, each of which is composed of a plurality of microlens array microlenses. The micro-mirror forms the erecting unit image of the lens array sheet 22a with a plurality of _22 patterns respectively, and is configured to be mounted on the 幵~中' exposure farm, so as to support the reticle 20 of the reticle flat 201248337 18 The substrate on the substrate platform 12, such as the lens array 22, is relatively simultaneously in the first direction, the substrate 40 on the substrate 12, and the substrate platform 12 in the second side = the substrate is flat = ^ ^4, the reticle 20 and the microlens array 22, in the evening, the movement of the substrate platform 12 in the second direction 2 can be translated by the manual loading plate 40 and driven by the device: A plurality of microlens array sheets 22a are supported on the yoke 7 in the row, and the pedestal 2 is formed on the gantry 13. Therefore, in the frame of the ^^ 2 direction, the line is collected by the microlens array 22 onto the substrate 4, and the board 40 is moved in the ith direction!, whereby the board 4 is exposed. 】 = pattern area 2 of the mask is exposed and transferred onto the substrate. The first driving device causes the light source 14 and the microlens array 22 to face each other in the ith direction! Scanning is performed by unillustrated; empty = cover plate by (4) device control gamma setting and light source g after finishing scanning, the substrate 40 is translated in the second direction 2, then the output == and the light source will be exposed The light is scanned to sequentially expose the pattern forming region of the substrate. [0024] The size of the reticle 20 held by the reticle stage 18 is, for example, in the width of the reticle. And the mask 2 is provided with a pattern region, and an ifif pattern is formed corresponding to a plurality of turns. In the present embodiment, the pattern is arranged in the second direction 2 in a predetermined interval, and each of the pattern regions 2Ga is arranged corresponding to the substrate. The plurality of pattern regions 2〇a correspond to the cells 40a on the substrate 40. Layout In the present embodiment, as shown in Fig. 1 (8), the microlens array 22 is composed of two 'seeing carriage pieces 22a, and each of the microlens array sheets 22a overlaps with each other on the first 201248337. Way of configuration. Therefore, the microlens array 22 is relatively opposite to the substrate 4 (refer to Fig. 8)! direction! In the case of the upper scanning, each of the pattern rows 20c and 20d arranged in the ith direction i corresponds to either one of the two microlens array sheets 22a. As shown in Fig. 1 (8), the microlens array 22 of the present embodiment is arranged such that a part of the microlens array j sheets 22a overlaps in the i-th direction, so that the light of a certain pattern line 20d is transmitted. In some cases, when the light shielding plate 3 后 which will be described later is not provided, it is incident on both of the microlens array sheets 22a. Therefore, a part of the panel formed by the pattern row 2〇d is overexposed by two exposures, and the remaining portion is a normal i exposure. A panel with such uneven exposure cannot be used. Therefore, in order to avoid this, in the present embodiment, as shown in Fig. 3, a light shielding plate 3 is provided to shield the region of the microlens array sheet 22a from light transmission. That is, the light shielding plate 3 is provided with the light shielding portion 30a and the opening portion 30b. When the microlens array 22a is allocated such that the pattern region 20a corresponds to only one microlens array sheet 22a, the light shielding portion 3 is applied to the microlens array sheet. The area of the 22a which does not need to be light-transmitted is shielded from light, and the opening 3b is provided in a region where the microlens array sheet 22a has to be transparent to transmit the transmitted light. In other words, the light-shielding portion 30b shields the exposure light rays of the microlens array sheets 22& which are not directed to the respective pattern rows, so that the transmitted light of the pattern regions of the mask is not incident on the two or more microlens array sheets 22a. [0027] Fig. 5 is a microlens array provided with a light shielding plate, Fig. 5(8) is a plan view, and Fig. 5(b) is a cross-sectional view taken along line A-A of Fig. 5(8). As shown in Fig. 5, the microlens array 22 is fixed to the inside of the frame-shaped microlens array holder 21 with two microlens array sheets 22a. Each of the microlens array sheets 22a is composed of four members, and each member is formed by arranging a microlens of a convex lens two-dimensionally on a glass substrate surface and/or a back surface. The pattern of the reticle is imaged on the substrate in an erect and other large image by transmitting the parallel light through the lenticular lens sheet 22a. As shown in FIG. 5(b), the light shielding portion 3a and the opening portion 3b of the light shielding plate 30 are disposed in a predetermined shape and correspond to the pattern 2A of the photomask 20, above the microlens array 22, The peripheral portion is fixed to the microlens array holder 21. As a result, in the present embodiment, the exposure light that is blocked by the light shielding portion 30a and transmitted through the opening portion 3〇b is applied to the microlens array 22. Further, in the present embodiment, the microlens array sheet member is constituted, but the present invention is not limited by the configuration of the microlens array #22a. For example, the microlens array sheet can also use 8 pieces or the like. The plate 3 is, for example, a non-ferrous steel having a thickness of about 10 mm. In the second embodiment, it is fitted to the groove provided in the microlens array holder 21. The mi-hunt is raised to the light-shielding position of the microlens array sheet 22a. When the second light-shielding plate 30 is mounted, for example, it can be attached to the microlens by bonding [0029]. In the configuration, the green plate 4G is transported to the substrate platform 12, and the position of the mask 2 that is supported by the ninth and the sixth is supported. Further, by holding the fixed position!^/flat/12 and the Χ_Υ platform 11, the substrate 4G and the photomask 20 are held in place, and are driven by the rewinding. Photomask 〇 〇 : : : : : 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 Moving on the reticle 20 1 relative to the second and the substrate at the same time in the first direction scanning direction (, button), the 'expanding wire 15 is shown in the self-coloring arrow [0031]) for the reticle 2 Scan. A perspective view of the passing state. As shown in FIG. 7, through the microlens array holder 2; the opening 15, the microlens forming region 2 of the rectangular illumination region is the lens array sheet orphan array 22, and its positional relationship $ray 15 Simultaneously with the microlens 疋 prior cover 2 〇 and the substrate 40 8 12 201248337 • During the movement, as shown in FIG. 8 'exposure light 15 is scanned in the p direction indicated by the white arrow 2 on the mask 20 and the substrate 40 Phase contrast array ^ ^ 40 - - ϊ ϊ J pattern 41 base (four), formed with strip-shaped exposure on the five columns of photoresist [0032] = in the form, the microlens array 22 is provided with two i-parts 1 *Upward overlapping two i-distributed, /, in the middle of the shell shape, the microlens array holder 21 is fixed with one of the assignable microlens arrays 22a, so that the pattern 2, 'a ^ is shielded from light, and in the microlens array A region b must be transmitted through the sheet 22a to transmit transmitted light. The light-shielding portion 3〇b is opaque to the microlens array sheet t “uncorresponding exposure light to two or more microlens arrays. Sheet m = i-scan operation performed on the photoresist film on the glass substrate 4G, which is exposed In addition, at this time, each panel is at the extension point of the film, so in the exposure pattern, 'there is no need to [0033] the mask, usually the width is about 400mm, if such a long column is manufactured 'The cost is high. The microlens array is usually 15 〇 ugly left =, per unit length _ is relatively low in manufacturing cost. Therefore, the yoke 21 is set, for example, to a length of 15. _ micro-transparent; for transmission of exposure light In the latter case, 2 ^ makes the ship domain (none; positive domain) and (4) ^ the lens array pieces are arranged in the second direction, by respectively corresponding to the light 13 201248337 ===, the array. In the present embodiment, the respective portions are arranged so as to overlap each other in the first direction 1, and the louvers 30 are arranged in the light-transmitting region 1 ^1 for each pattern column. In the embodiment, as shown in Fig. 9 (8), two microlenses 22a are used, and the five mask regions 2Ga in the second direction 2 are transmitted by the visor 30 for the microlens array (4) 22a. The light is incident on any of the microlens array sheets 22a, as shown in Fig. 9(b) corresponding to different sheets When the mask 200 of the substrate 40 is laid out, the microlens array 22 can be formed by changing the mask 30. That is, the mask shown in Fig. 9 (8) is formed in the second direction 2 by four Fig. 2B, each of which is formed. The size of the pattern region 20b in the second direction 2 is larger than each of the pattern regions 2〇a in the mask 2〇 of Fig. 9(a). The exposure device can correspond to the mask of different sizes in the drunk area in advance. A plurality of light-shielding plates having different lengths in the second direction 2 of the opening portion 30b are prepared, and one of a plurality of light-shielding plate basins is selected for use in accordance with the size of the pattern region. That is, in the case of the reticle 200 shown in Fig. 9 (b), the visor 31 corresponding to the size of the pattern area 20b is selected and used. In this manner, even when a mask having a different pattern area size is used, the exposure light in the microlens array sheet 22a can be transmitted by using the light shielding plate having a different length in the second direction 2 of the opening 3b. The end portion 'the gap region between the pattern regions' prevents overexposure and non-exposure of the end portions of the microlens array sheet 22a. Further, even when exposure is performed on panels of different cell layouts, exposure can be performed without replacing the microlens array 22, and the panel can be exposed with high manufacturing efficiency. Further, since it is not necessary to provide different microlenses corresponding to the cell layout, it is possible to prevent the manufacturing cost of the panel from increasing. [0035] In addition, the light shielding plate 30 of the present embodiment shields the incident light from the mask 2 〇 toward the microlens array 22, but the visor 30 may be permeable to the microlens array 22. Exposure light is blocked. Further, in the present invention, the light shielding plate is provided with only the light shielding portion 30a and the opening portion 30b so that the transmitted light of the pattern region 2a of the mask 2〇 does not transmit more than two or more microlens array sheets. 22a may be irradiated to the substrate, and is not limited to the above. For example, the light shielding plate 3〇 may not be fixed to the microlens array holder 21. [0036] Further, the microlens array 22 of the present embodiment is constituted by two microlens array sheets 22a, and in the present invention, the microlens array 22 may be arranged in a plurality of three or more microlens array sheets. The portions 22a overlap each other in the ith direction such that all of the exposure light rays of the pattern regions 2a of the illuminating cover 20 are transmitted through any one of the microlens array sheets 22a arranged to overlap in the first direction. (Industrial Applicability) According to the present invention, the present invention is advantageous in that the light source is changed in accordance with the different cell layouts, and only the mask is replaced by the mask 3, and the microlens array is replaced. For example, the requirements for liquid crystal display panels for portable devices are fine and low-cost for small panels. BRIEF DESCRIPTION OF THE DRAWINGS [0018] An exposure apparatus for inspecting an oblique column according to a first embodiment of the present invention is shown. Fig. 3 is a perspective view showing a mask stage and a microlens array. Figure 4 is a perspective view of the entire reticle platform. Figure 5 (8) is a top view, Figure 5 (b) is a Figure 5 (Section A - a line segment cross-section of the sentence. The exposure scale and the microlens array are closed in the step 15 201248337. Fig. 8 shows the next step of Fig. 7. The microlens array at the time of the plate and Figs. 9(a) and (b) are exposed in different cell layouts. Fig. 10 is a view showing a configuration of a microlens array of a conventional exposure layout shown in Fig. 10, which is a conventional display using a microlens array, and (b) showing a configuration of a microlens array of the conventional exposure layout shown in Fig. 10. [Description of main component symbols] [0038] I First direction (scanning direction) 2: Second direction (vertical intersecting direction of scanning direction) II: XY stage 12 · Substrate platform 13: Rack 14 : Light source 15 : Exposure light 16 : First guide rail 17: Second guide rail 18: Mask base 20, 200: Photomasks 20a, 20b: Pattern areas 20c, 20d: Pattern line 21: Microlens array mounts 22, 220, 221: Microlens arrays 22a, 22b 22c, 22d: microlens array sheets 30, 31: light shielding plate 30a: light shielding portion 30b: opening portion 40: substrate 201248337 40a : Unit 41 : Exposure pattern