CN1704797A - Projection optical system and pattern drawing device - Google Patents
Projection optical system and pattern drawing device Download PDFInfo
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- CN1704797A CN1704797A CNA200510065570XA CN200510065570A CN1704797A CN 1704797 A CN1704797 A CN 1704797A CN A200510065570X A CNA200510065570X A CN A200510065570XA CN 200510065570 A CN200510065570 A CN 200510065570A CN 1704797 A CN1704797 A CN 1704797A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The projection optical system 6 comprises a first mirror member 61 as a meniscus lens 612, on which a concave mirror 611 centered with respect to a reference point P1 is formed as a back mirror and a second mirror member 62 as a meniscus lens 622, on which a convex mirror 621 approximately centered with respect to the reference point P1 is formed as a back mirror between the reference point P1 and the first mirror member 61. The light from the object side made incident to the first mirror member 61, in parallel with the center axis J1, is reflected on the concave mirror 611, the convex mirror 621 and the concave mirror 611 and is guided out in parallel to the center axis J1, and an image is formed. Thereby, in the projection optical system 6 of reflecting the light from the object side three times between the concave mirror and the convex mirror, aberration is suppressed by the meniscus lenses 612, 622.
Description
Technical field
The present invention relates to make projection optical system and the graphic describing device that utilizes this optical system from light triple reflection between concave mirror and convex mirror of object.
Background technology
In the past, as by rayed is partly led substrate, tellite or plasma display system, liquid crystal indicator mask and drawn graphical method on the photosensitive material on the glass substrate (hereinafter referred to as " substrate ") being formed on, be known with the mask graph transcription to the method on the photosensitive material with proximity or multiple step format Exposure mode etc.The mode of drawing of such transcription mask graph often exists and the pitch of the figure of drawing and the corresponding neatly difficulty of change of width.
The spy opens clear 57-51083 communique (document 1) and proposes a kind of optical projection system, this optical projection system has convex mirror and concave mirror opposite one another, make from the light of object side incident through the concave mirror reflection after the convex mirror reflection again through the concave mirror reflection and direct into assigned position and form the picture of object.
Yet rayed is passed through to form on the photosensitive material of projection optical system one side at substrate the picture (rayed zone) of mask in back on the mask, the picture of mask is relatively moved facing to substrate, expeditiously with the graphic describing of linear on photosensitive material, when adopting such method, in order to realize graphic describing at a high speed, and the big projection optical system of object side numerical aperture (NA) that must employing can be taken into the light by mask as much as possible.Generally speaking, because aberration also becomes resolution is descended (least unit of drawing control of figure becomes greatly) when NA becomes big, also often be difficult to construct the projection optical system of the precision that meets the demands even the lens intricately combined.As described in document 1,, be difficult to suppress other various aberrations though can suppress chromatic dispersion by the projection optical system of utilizing concave mirror and convex mirror.And, make concavo-convex corresponding difficulty with substrate because of not being adjusted to the image position again because of the projection optical system of document 1 can not change the size that projection magnification ratio can not change the mask picture.
Summary of the invention
The present invention is as the projection optical system that makes from light 3 secondary reflections between concave mirror and convex mirror of object side, changing projection magnification ratio as fundamental purpose.In addition also suppressing aberration, also being adjusted to the image position as purpose as purpose.
According to a kind of mode of the present invention, projection optical system, comprise: be configured on the central shaft of regulation and be the concave mirror at center with the reference point on the above-mentioned central shaft, between said reference point and above-mentioned concave mirror, be configured on the above-mentioned central shaft and roughly be the convex mirror at center with above-mentioned reference point, be configured in light from object side, first lens on the light path that is directed to above-mentioned concave mirror with departing from above-mentioned central shaft and above-mentioned central axes, to be incident on the above-mentioned concave mirror also in turn by above-mentioned concave mirror, above-mentioned convex mirror, after the above-mentioned concave mirror reflection, be directed to the 2nd lens of picture side and the lens moving mechanism that above-mentioned the 1st lens and above-mentioned the 2nd lens are moved along optical axis while the light that is guided out with departing from above-mentioned central shaft and above-mentioned central axes.
Can change projection magnification ratio in that light from object side is reflected in 3 times the projection optical system by the present invention between concave mirror and convex mirror.
According to another embodiment of the present invention, projection optical system, comprise: comprising: first reflector elements, this first reflector elements is the concave-convex lens that the concave mirror that is the center is formed as back side mirror on the central shaft that is configured in regulation and with the reference point on the above-mentioned central shaft, second reflector elements, this second reflector elements is between said reference point and above-mentioned first reflector elements, be configured on the above-mentioned central shaft and be the concave-convex lens that the convex mirror at center forms as back side mirror roughly with above-mentioned reference point, from the light of object side while inciding above-mentioned first reflector elements with departing from above-mentioned central shaft and above-mentioned central axes, and in turn by above-mentioned concave mirror, above-mentioned convex mirror, above-mentioned concave mirror reflection is derived with above-mentioned central axes ground while depart from above-mentioned central shaft.
Can utilize 2 back side mirrors while suppressing the picture that aberration forms object by the present invention.
Preferably, the concave-convex lens of first reflector elements has negative magnification, and the concave-convex lens of the 2nd reflector elements has positive magnification.In addition, preferably, the thickness on the central shaft of the concave-convex lens of the 1st reflector elements approximately is half of difference of the radius-of-curvature of 2 lens faces.
According to another alternate manner of the present invention, projection optical system comprises:
Be configured on the central shaft of regulation and be the concave mirror at center with the reference point on the above-mentioned central shaft, between said reference point and above-mentioned concave mirror, be configured on the above-mentioned central shaft and roughly be the convex mirror at center with above-mentioned reference point, from object side towards the light of above-mentioned central shaft after the next door reflection of above-mentioned central shaft, while first retroreflector that is directed to above-mentioned concave mirror with departing from above-mentioned central shaft and above-mentioned central axes, to be incident on the above-mentioned concave mirror also in turn by above-mentioned concave mirror, above-mentioned convex mirror, after the above-mentioned concave mirror reflection, after the light reflection that is guided out with departing from above-mentioned central shaft and above-mentioned central axes, to the 2nd retroreflector that departs from above-mentioned central axis direction guiding, and the mirror travel mechanism that changes distance between above-mentioned central shaft and the image space by mobile above-mentioned the 1st retroreflector or above-mentioned the 2nd retroreflector.
According to the present invention, can in the projection optical system that makes from light 3 secondary reflections between concave mirror and convex mirror of object side, be adjusted to the image position.In addition in order to change the distance between central shaft and the image space expeditiously, and mirror travel mechanism preferably makes the 1st retroreflector and the 2nd retroreflector move integratedly.
The present invention is also as having above-mentioned optical system and retouching the graphic describing device of drawing figure on the photosensitive material on the substrate.
Carry out following detailed description of the present invention by the reference accompanying drawing, can make above-mentioned purpose and other purpose, feature mode and advantage clearer.
Description of drawings
Fig. 1 is the figure that the presentation graphic describing device constitutes.
Fig. 2 is the figure of expression the 1st mask.
Fig. 3 is the figure of expression the 2nd mask.
Fig. 4 is the figure of the formation of expression mask portion.
Fig. 5 is the figure that is illustrated in the part in a plurality of rayed zone that forms on the substrate.
Fig. 6 is the formation of expression control part and about the process flow diagram of information flow of control.
Fig. 7 is the figure that is illustrated in the graphic describing stream of action on the photosensitive material.
Fig. 8 and Fig. 9 are the figure of expression projection optical system.
Figure 10 A and Figure 10 B are the figure of the lateral aberration when being illustrated in magnification 1.02.
Figure 11 is that magnification is the figure of distortion in 1.02 o'clock.
Embodiment
Fig. 1 is the figure of formation of the graphic describing device 1 of expression one embodiment of the present invention.Graphic describing device 1 be by with rayed liquid crystal indicator use glass substrate 9 (being designated hereinafter simply as " substrate 9 ") come up to draw the device of a plurality of linear figures on the photosensitive material on substrate 9 (being colored resist in the present embodiment).The substrate 9 of drawing figure is through the final color filter that forms as the assembling parts of liquid crystal indicator of other follow-up operation.
In graphic describing device 1, objective table travel mechanism 2 is arranged on the base station 11, and by objective table travel mechanism 2 the objective table unit 3 of maintenance substrate 9 can be moved along the Y direction of interarea in Fig. 1 of substrate 9.Frame 12 strides across objective table unit 3 and is fixed on the base station 11, and mask interchanger 4 and head 5 are installed on frame 12.
Objective table travel mechanism 2 and motor 2 constitute and ball screw 22 is connected the nut 23 that will be fixed on again on the motor on the objective table unit 3 is installed in structure on the ball screw 22.At the upper fixed guide rail 24 of ball screw 22, when motor rotated, objective table unit 3 moved to the Y direction along guide rail 24 slidably with nut 23.
Objective table unit 3 comprises: the objective table 31 that directly keeps substrate 9, axle with the interarea of vertical substrate is the objective table rotating mechanism 32 that the center makes objective table 31 rotations, can make objective table 31 support plate of supporting rotatably 33 and the base plate 34 that keeps support plate 33, on base plate 31, directly fix above-mentioned nut 23.On support plate 33, be provided with by picture pick-up device and receive the video camera 35 of the light of 5 irradiations from the head as the photo detector group of two-dimensional arrangements.In addition, the shooting face of video camera 35 can be adjusted in advance surperficial identical height with the photosensitive material of substrate 9.
Objective table travel mechanism 2, objective table unit 3, video camera 35, shutter 512 head moving mechanisms 501, mask portion 52, projection optical system 6 link to each other with control part 7 with mask interchanger 4, these constitute by control part control, the graphic describing that is undertaken on substrate 9 by graphic describing device 1.Input part 8 links to each other with control part 7, (is the width of the opening of 1st mask 53 direction of arranging by input part 8 with the width of each comfortable directions X in a plurality of rayed zone on the substrate 9 by the operator, be designated hereinafter simply as " width ") and the setting value of the interval in a plurality of rayed zone (being) to the distance at the center in the rayed zone of adjacency, hereinafter referred to as " pitch " from the center in each rayed zone input to control part 7.
Fig. 2 and Fig. 3 are respectively the figure of expression the 1st mask 53 and the 2nd mask 54.Directions X on the 1st mask 53 in Fig. 2 is arranged and is formed the 1st opening 531 that a plurality of light that pass through as light pass through the zone.On the 2nd mask 54, arrange to form as 2nd opening 541 of corresponding with a plurality of the 1st openings 531 respectively a plurality of light by the zone.With the shape of the 1st opening 531 and the 2nd opening 541 are rectangles, the length of opening (promptly with the size of the 1st opening 531 with the orientation orthogonal directions of the 2nd opening 541) and width (i.e. the width of the 1st opening 531 and the 2nd opening 541 direction of arranging) are compared with the 2nd opening 541, the 1st opening 531 all big.The width of other the 1st opening 531 is identical, and the distance from the center of each the 1st opening 531 to the center of the first adjacent opening 531 is that pitch also is certain.The width of same the 2nd opening 541 and pitch equate that also the pitch of the 2nd opening 541 equates with the pitch of the 1st opening 531.In addition, though the opening length of the 2nd mask 54 of the 1st mask 53 of Fig. 2 and Fig. 3 is longer than width, the length of opening also can than width is short.
Fig. 4 is the figure of the formation of expression mask portion 52.Mask portion 52 comprises: keep the 1st mask maintaining part 55 of the 1st mask portion 53, keep the 2nd mask maintaining part 56 of the 2nd mask portion and make directions X (i.e. the direction of 1st opening 531 and 2nd opening 541 arrangements) the mobile mask slide mechanism 57 of the 1st mask 53 in Fig. 4.In addition, in Fig. 4, represent the 1st mask maintaining part 55 and the 1st opening 531 with thick line.
The 2nd mask 54 and the 1st mask 53 be butt relatively, so that each the 2nd opening 541 is overlapping with the 1st corresponding opening 531.Therefore the 1st opening 531 (is represented by additional parallel oblique line in Fig. 4 with the zone of the mutual coincidence of the 2nd opening 541.) 520 become identical width, on the 1st opening 531 and the 2nd opening 541, arrange with a constant pitch that equates.Be directed on the photosensitive material on the substrate 9 by the 1st opening 531 and the 2nd opening 541 from the fairing of light emission part 51 (with reference to Fig. 1) time, irradiation has on a plurality of rayed zone with regional 520 corresponding shape and pitch then.In the following description, the zone that actual light is passed through promptly calls " mask set opening " in zone 520.
In addition, not necessarily relative the 1st mask 53 of the 2nd mask 54 is butt physically, can only overlap mutually optically.For example the 1st mask 53 and the 2nd mask 54 also can only leave the size of considering behind the depth of focus (for example counting the degree of μ), also can be configured in respectively on the position of optical conjugate.
Illustrate though omit among the figure, between the 1st mask maintaining part 55 and the 2nd mask maintaining part 56, clutch to be set, the 1st mask maintaining part 55 move during 56 declines of the 2nd mask maintaining part a little, the 1st mask 53 separates with the 2nd mask 54.Thereby can prevent the damage between the 1st mask 53 and the 2nd mask 54 and produce dust.
Fig. 5 is the figure that expression is formed on the part in a plurality of rayed zone 90 on the photosensitive material of substrate 9.A plurality of rayed zone 90 is corresponding with mask set opening 520 (with reference to Fig. 4) respectively, and the width in a plurality of rayed zone 90 becomes identical, and pitch also becomes necessarily.As describing, the width in rayed zone 90 and pitch can be come a little expansion and dwindle by the projection optical system shown in Fig. 1.
Fig. 6 is the formation of expression control part 7 and about the block scheme of information flow of control, shows the function of the various formations in the control part 7, in fact carries out the realizations such as CPU, storer, special-purpose computing circuit, interface of calculation process by trace routine.The scan control section 72 in the rayed zone 90 of the photosensitive material on the irradiation area control part 71 that control part 7 has the width in control rayed zone 90 and a pitch and the relative substrate 9 is as main formation.
Irradiation area control part 71 comprises: the storage part 715 that detects the necessary information of adjustment of the width in the pitch control part 714 of width control part 713, control pitch of the width detection portion 711 of the width separately in a plurality of rayed zone 90, the test section 712 that detects the pitch of pitch, control rayed zone 90 width and storage rayed zone 90 and pitch according to the picture signal from video camera 35.
Expression is contained in the mask table 716 of the corresponding relation of the width in mask set and the rayed zone 90 that can realize by this mask set and projection optical system 6 in the mask portion 52 and pitch and makes in advance and be stored in the storage part 715.In storage part 715, also be stored in the focusing table 717 used when image space in the projection optical system 6 is adjusted, from width setup value (to call " setting width " in the following text) 718 and the pitch setting value (to call " setting pitch " in the following text) 719 in the rayed zone 90 of input part 8 inputs.
Objective table travel mechanism 2, video camera 35, shutter 512, mask slide mechanism 57, projection optical system 6, mask interchanger 4 and input part 8 are connected can be by constituting width and the pitch of adjusting rayed zone 90 according to the information from video camera 35 and input part 8 by controlling these by irradiation area control part 71 on the irradiation area control part 71.
Objective table travel mechanism 2, objective table rotating mechanism 32, head moving mechanism 501 and shutter 512 are connected on the scan control section 72, can be by these constitute photosensitive material is carried out the irradiation of light and the scanning in rayed zone 90 by scan control section 72 control.
Fig. 7 is the process flow diagram of drawing stream of action of drawing figure on photosensitive material of presentation graphic describing device 1.At first will set width 718 and set and be stored in (step S11) the storage part 715 after pitch 719 receives from input part 8 inputs and by irradiation area control part 71 by the operator.Then adjust the width and the pitch in rayed zone 90, make to set width 718 and set pitch 719 to become equal (step S12) respectively by the control of control part 7.
Specifically, by making a video recording, detect the pitch in rayed zone 90 by the calculation process in pitch test section 712 by 3 pairs of a plurality of rayed of video camera zone 90 of irradiation area control part 71 controls.Then, according to the magnification of testing result, the pitch in rayed zone 90 is set at and sets pitch 719 and equate by pitch control part 71 change projection optical systems 6.At this moment according to focusing on projection optical system 6 such as control such as table 717 grade, make the image space of projection optical system 6 consistent with the shooting face of video camera 35 (surface of the photosensitive material on the substrate 9).In addition also can focusing table 71 and by repeating to make a video recording and the control of projection optical system 6 is carried out to the adjustment of image position.
When the adjustment of pitch adjustment and image space finishes,, by width control part 713 control mask slide mechanisms 57, change the width of mask open 520 according to testing result by each width of a plurality of irradiation areas 90 of test section 711 detections.The result adjusts the width in rayed zone 90, and this width is equated with the setting width.In addition, only be judged as the occasion that to adjust the adjustment of the width in rayed zone 90 or pitch by the magnification change of projection optical system 6 according to mask table 716, by the mask of mask interchanger 4 exchange mask portions 52.
Though at this is to describe with regard to the occasion that graphic describing device 1 has 1 head 5, graphic describing device 1 also can have a plurality of heads, at this moment can carry out the width in rayed zone and the adjustment of pitch to each head.That is, video camera 35 is in turn respectively to relative the moving in the below of a plurality of heads, and adjusts the width and the pitch in the rayed zone in each head.At this moment also can obtain distance between head by the relative amount of movement that detects video camera 35 relative each head, further adjust independently of one another can position (occasion that mask all moves to directions X in each head, the position of this mask portion) from mobile a plurality of heads to directions X.
When the width in rayed zone 90 and pitch adjustment finish, by scan control section 32 control objective table travel mechanisms 2 and head moving mechanism 501 make head 5 relatively objective table 31 move (step S13) to the starting position of drawing of stipulating.Specifically, objective table 31 is to (+Y) side shifting, head 5 is to (X) side shifting.Light is the emission (step S14) of 5 beginning light from the head, and rayed is on the rayed zone 90 on the photosensitive material of substrate 9.
Begin to make (Y) mobile (the step S15) of direction of objective table 31 in Fig. 1 then, by to rayed zone 90 in Fig. 1 (+Y) the relative photosensitive material of direction scans with certain relative velocity, a plurality of graphic describings that will have the linear of setting width and setting pitch are on the photosensitive material on the substrate 9.When the scanning in rayed zone 90 arrived the end position of regulation, moving of objective table 31 just stopped (step S16), and rayed stops (step S17).
When to the 1st end of scan of photosensitive material, whether confirm substrate 9 is repeated to the drawing of the figure of the linear of equidirectional extension (i.e. next having or not of drawing) (step S18), occasion in the scanning that arranged next time just turns back to step S13, objective table 31 is moved to draw next time the starting position, (step S13～S17) only repeats the number of times that needs for the moving of the irradiation of light and objective table 31.Moving alternately of objective table 31 during the scanning in rayed zone 90 to (+Y) direction and (Y) direction is carried out, in the 2nd later step S13, as long as head moving mechanism 501 make head 5 to (+X) direction only moves the distance of regulation, head 5 just moves to draws the starting position.
When the photosensitive material of graphic describing on substrate 9 of linear all on the time, graphic describing device draw release.In addition, be the occasion of colored resist at photosensitive material, the step S19 in the execution graph 7 not.
The substrate 9 of drawing figure is taken out of from graphic describing device 1, by being developed in the sub-pixel that photosensitive material remaining on the substrate 9 becomes color filter in addition.At this moment, the general colored resist that uses the residual minus of when developing exposed portion (part that rayed is crossed) of photosensitive material.Repeat the coating of colored resist then, utilize drawing and developing of graphic describing device 1, on substrate 9, form R (red), G (green), B (green grass or young crops) three sub-pixels.Operations such as formation through transparency electrode become substrate 9 color filter that is used on the liquid crystal indicator again.
At the step S19 in the execution graph 7 on substrate 9 time with cancellate graphic describing.As concrete example, when the drawing of the black matrix" that describing device 1 is used in color filter, carry out.
Occasion at cancellate graphic describing, when the drawing of the figure of the linear of having finished 1 direction by step S11～S18, the drawing of figure of the direction of the pattern, orthogonal of confirming and having drawn has or not (step S19), by control part 7 driving objective table rotating mechanisms 32, make objective table 31 with remain on objective table unit 3 on the vertical axle of the interarea of substrate 9 be center half-twist (step S19).Can make photosensitive material 90 ° of the changes relatively on the relative substrate in direction of scanning in rayed zone 90 whereby.
In the direction of scanning after changing, objective table unit 3 moved to camera position and adjust the width and the pitch (step S12) in rayed zone 90, then objective table 31 is moved to and draw the starting position, only repeat to draw the needed number of times of action (the step S13～S18) of the figure of linear.So, utilize graphic describing device 1, also can on the photosensitive material on the substrate 9, draw cancellate figure by making objective table 31 rotations.
As previously discussed, graphic describing device 1 with Fig. 1 makes the light source figure emission of light with regulation by light emission part 51, auxiliary optics 51a and mask portion 52, forms the picture (rayed zone 90) of the high-resolution mask of directions X portion 52 on substrate 9 by projection optical system 6 described later.Then can be by on the photosensitive material of substrate 9, correctly drawing the figure of linear (or clathrate) in the relative scanning of the picture that makes mask portion 52 on the substrate 9.
In addition, the picture of the mask portion 52 on substrate also can be realized by head 5 is moved relative to substrate 9 relative to the scanning of the Y of substrate direction.In addition, also can in mask portion 52, prepare to have arrange the same width that forms and length at directions X with a constant pitch rectangular aperture group (to call " opening row " in the following text) in the Y direction (promptly, the direction of scanning in rayed zone) 2 masks of Pai Lieing, and the selection that is listed as by the opening that uses realizes having the different width and the graphic describing of pitch.In addition, as the function of the radiative light source portion of light source figure, except the combination that makes light emission part 51 and mask portion 52, also can for example realize by a plurality of light sources of arranging with the pitch of regulation with regulation.
In addition, graphic describing device 1 is particularly suitable for the manufacturing with the such panel of tabular display apparatus (liquid crystal indicator, plasma display system, organic EL display etc.), also is suitable for the drawing of fine pattern of the rule on the glass substrate that semiconductor substrate and P.e.c. wiring substrate or photomask use.
The projection optical system that just is used in below in the graphic describing device 1 of Fig. 1 is described in detail.Fig. 8 and Fig. 9 are the figure that the inside of expression projection optical system 6 constitutes, Fig. 8 be expression from Fig. 1 (X) side direction (+X) direction is seen the figure of state of occasion of the inside of projection optical system 6.Fig. 9 is that expression is from (Y) side direction (the figure of+state when Y) direction is seen.In addition, except the 1st reflector elements the 61, the 2nd reflector elements the 62, the 1st lens the 63, the 2nd lens the 66, the 1st retroreflector 64 and the 2nd retroreflector 65, omission illustrates in Fig. 9.
Comprise in the projection optical system 6 shown in Fig. 8: the 1st reflector elements 61 and the 2nd reflector elements 62 with central shaft J1 of the regulation that is parallel to Y-direction; The 1st reflector elements 61 have be configured in central shaft J1 upper and by on the central shaft J1 projection optical system 6 (+Y) concave-convex lens 612, the 2 reflector elements 62 that form as back side mirror of the concave mirror 611 centered by the datum mark P1 of side imagination have between datum mark P1 and the 1st reflector elements 61 and the concave-convex lens 622 that is configured on the central shaft J1 and the convex mirror 621 of showing greatly centered by the datum mark P1 is formed as back side mirror. The concave-convex lens 622 of the 2nd reflector elements 62 forms the lens with positive amplification ratio.Thickness on central shaft J1 on the concave-convex lens 621 is substantially equal to half of radius-of-curvature difference of 2 lens faces.The concave-convex lens 612 of the 1st reflector elements 63 forms the lens with negative magnification, in addition as shown in Figure 9, and with the (+X) side and (X) cut away at the position of side, to seek to realize the miniaturization of projection optical system of the 1st reflector elements 61.
Projection optical system 6 also comprise be configured in the 2nd reflector elements 62 (+Z) side is (promptly, be mask portion 52 sides among Fig. 1, the object side of diacritic 91 in the projection optical system shown in Fig. 8 and Fig. 9 6) Pei Zhi the 1st lens 63 and the 1st retroreflector 64, and at (Z) the 2nd retroreflector 65 and the 2nd lens 66 of side (promptly being substrate 9 sides, the picture side of diacritic 92 in the projection optical system shown in Fig. 8 and Fig. 9 6) configuration of the 2nd reflector elements 62.91 sides begin to have in turn convex surface and have convex surface too to the negative concave-convex lens 661 of central shaft J1 and positive concavees lens 662 towards positive concave-convex lens 631 and negative concave-convex lens 632, the 2 lens 66 of central shaft J1 the 1st lens 63 along optical axis J2 from object.
As shown in Figure 8, the 1st lens 63 be connected have motor 671, ball screw mechanism 672 and guide rail (for example be to intersect roller guide rail, not shown in Fig. 8) the 1st lens moving mechanism 67 on, can move along optical axis J2, other the 2nd lens 66 are connected on the 2nd lens moving mechanism 68 with motor 681, ball screw mechanism 682 and guide rail too, and move along optical axis J2.The 1st retroreflector 64 and the 2nd retroreflector 65 are supported integratedly by mirror support sector 691, by by having motor 692, the 69 moving lens support sectors 691 of mirror travel mechanism of ball screw mechanism 693 and guide rail make the 1st retroreflector 64 and the 2nd retroreflector 65 integratedly the Y direction in Fig. 8 move.
The light that incides projection optical system 6 from object 91 sides (mask portion 52 sides Fig. 1) via the 1st lens 63 towards central shaft J1 by the 1st turn back lens 64 in reflection back, the next door of central shaft J1 on one side off-center axle J1 be directed to abreast on the 1st reflector elements 61 with central shaft J1 on one side.Be directed on the 2nd reflector elements 62 by concave-convex lens 612 by concave mirror 611 reflection backs by the light that is incident on behind the concave-convex lens 612 on the concave mirror 611.The light that is reflected by convex mirror 621 is directed on the concave mirror 611 once more by concave-convex lens 622,612 then, is reflected by concave mirror 621.Like this, passed through concave-convex lens 612 off-center axle J1 on one side by the light of concave mirror 611, convex mirror 621, concave mirror 611 reflections in turn, with central shaft J1 abreast derive on one side.
At this moment, the aberration (aberration for example distorts) that can produce by concave mirror 611 and convex mirror 621 by the lens face compensation of concave-convex lens 612,622.Light from concave mirror 611 is reflexed to picture 92 sides (substrate 9 sides of Fig. 1) that are arranged in off-center axle J1 direction by the 2nd retroreflector 65, is directed to the picture 92 that forms mask portion 52 on the photosensitive material of substrate 9 by the 2nd lens 66 then.In addition, the 1st lens 63 and the 2nd lens 66 are moved along optical axis J2 by the 1st lens moving mechanism 67 and the 2nd lens moving mechanism 68, can be implemented in the mask portion 52 on the substrate 9 picture amplification or dwindle.
Dispose the 1st reflector elements 61 and the 2nd reflector elements 62, make projection optical system 6 can obtain low and the resolution that directions X is high of Y direction.Thereby in above-mentioned graphic describing device 1, can be by the picture that makes mask portion 52 relative substrate 9 relatively move to the Y direction and form the figure of the high linear of directions X precision.In addition, in the projection optical system 6 of graphic describing device 1, from the light of the 2nd reflector elements 62 by the occasion of the 2nd retroreflector 65 to the directions X reflection, the picture of mask portion 52 moves to the Z direction relative to the substrate of interarea normal towards directions X, and omitting the occasion of the 2nd retroreflector 65, move to the Z direction relative to the normal of interarea substrate 9 towards the Y direction.That is, the picture that makes mask portion 52 by objective table travel mechanism 2 on one side along the interarea of substrate 9 on one side to and the parallel plane direction that is included in the optical axis J2 between concave mirror 611 and the convex mirror 621 move.
In projection optical system 6, can be again make the 1st retroreflector 64 and the 2nd retroreflector 65 move the optical path length that changes from object 91 sides to picture 92 sides to the Y direction integratedly, and make the certain distance that changes expeditiously between central shaft J1 and the image space of distance between object 91 and the projection optical system 6 on one side by mirror travel mechanism 69.In other words, image space is moved at least to the Z direction, just can easily realize adjustable image space adjusting mechanism by mirror travel mechanism 69.In addition, though image space is along with adjustment is also moved to the Y direction, because the resolution of projection optical system Y direction is low, so the figure in graphic describing device 1 can not become problem in retouching.
As previously discussed, because the concave-convex lens 612 that concave mirror 611 is formed as back side mirror is set in projection optical system 6, i.e. the 1st reflector elements 61, with the concave-convex lens 622 that convex mirror 621 is formed as back side mirror, i.e. the 2nd reflector elements 62 is so while can realize utilizing the plane of refraction of 2 reflector elements 61,62 to suppress the picture that aberration forms object.Therefore can be while making object side numerical aperture (NA) keep the certain of directions X greatly in projection optical system 6.The result can be by using Fig. 8 the graphic describing device 1 of projection optical system 6 can not make resolution not be taken into more with descending and can on substrate 9, draw figure at high speed from the light quantity of mask portion 52, make the throughput rate raising.
Can be adjusted to the image position in that light from object side incident is alternately reflected from concave mirror 611 sides 3 times the projection optical system 6 by moving the 1st lens 64 and the 2nd lens 65 that turn back that turn back between concave mirror 611 and convex mirror 621.Therefore in graphic describing device 1, even the occasion that concavo-convex with crooked occasion is arranged on the interarea of substrate 9 or have the different substrate of thickness 9 to handle, also can be implemented in image space is aimed at, and can on substrate 9, draw figure accurately.In addition, in projection optical system 6, also can move the adjustment that is embodied as the image position by making directions X or Y direction in the 1st retroreflector 64 and the 2nd retroreflector 65.
Can also change projection magnification ratio by making the 1st lens 63 and the 2nd lens 66 move to be implemented in the projection optical system 6 along optical axis J2, the result can easily change the width and the pitch of the figure of drawing in graphic describing device 1, and can correctly draw figure on substrate.
Though projection optical system 6 is specially adapted to draw the describing device of the figure of linear, also can be used for other purposes.
In addition, also can be with the same parts that begin to remove the 1st lens 63 and the 2nd lens 66 from projection optical system 6 in the auxiliary optics 51a of the graphic describing device 1 of Fig. 1.At this moment also can save concave- convex lens 611 and 622.
The concrete example of projection optical system 6 describes with that.
The specifications parameter value of the projection optical system 6 of example 1 is as follows
Rayed area size (directions X): 47mm
Rayed area size (Y direction): 4mm
Magnification 0.98-1.02
Object side numerical aperture: 0.20
Resolution (directions X): 5 μ m
Resolution (Y direction): 50 μ m
Because optical system is amplified pro rata or is dwindled also and can obtain identical performance, so above-mentioned specifications parameter value is not absolute.
The design example of table 1 expression projection optical system 6, parameter A1, the B1 in the table 1 the when magnification of table 2 expression projection optical system 6 is 1.02 times, 1.00 times, 0.98 times, the value of C1, D1.Inf in table 1 is that the expression radius-of-curvature is infinitely great in addition, the refractive index of the light of the relative wavelength 365nm of the glass material that n (365) expression is used.
Table 1
| The face sequence number | Radius-of-curvature | At interval | ?n(365) | Bore |
| ?0 | ?A1 | |||
| ?1 | -173.507 | ?9.000 | ?1.58013 | ?68 |
| ?2 | -64.138 | ?1.200 | ?68 | |
| ?3 | -64.270 | ?7.000 | ?1.62741 | ?68 |
| ?4 | -187.513 | ?B1 | ?73 | |
| ?5 | inf | ?0.000 | ||
| ?6 | inf | ?0.000 | Catoptron | ?90×70 |
| ?7 | inf | ?-166.736 | ||
| ?8 | 264.146 | ?-17.000 | ?1.47454 | ?160× ??260 |
| ?9 | 295.873 | ?17.000 | Catoptron | ?160× ??260 |
| ?10 | 264.146 | ?131.736 | ?160× ??260 | |
| ?11 | 140.288 | ?8.000 | ?1.47454 | ?74 |
| ?12 | 164.837 | ?-8.000 | Catoptron | ?66 |
| ?13 | 140.288 | ?-131.736 | ?74 | |
| ?14 | 264.146 | ?-17.000 | ?1.47454 | ?160× ??260 |
| ?15 | 295.873 | ?17.000 | Catoptron | ?160× ??260 |
| ?16 | 264.146 | ?166.736 | ?160× ??260 | |
| ?17 | inf | ?0.000 | ||
| ?18 | inf | ?0.000 | Catoptron | ?90×70 |
| ?19 | inf | ?C1 | ||
| ?20 | -187.513 | ?-7.000 | ?1.62741 | ?73 |
| ?21 | -64.270 | -1.200 | ?68 | |
| ?22 | -64.138 | -9.000 | ?1.58013 | ?68 |
| ?23 | -173.507 | D1 | ?68 | |
| ?24 | inf |
Table 2
| Magnification | 1.02 | ?1.00 | 0.98 |
| ?A1 | 12.000 | ?19.746 | 47.345 |
| ?B1 | 65.350 | ?57.604 | 30.005 |
| ?C1 | -30.000 | ?-57.604 | -65.351 |
| ?D1 | -47.350 | ?-19.746 | -11.999 |
Represent that with Figure 10 A and Figure 10 B apart from magnification be lateral aberration on the image planes of object height 0mm on 1.02 optical axises and 23.5mm, the right side is corresponding with the sagittal plane, and the left side is corresponding with tangential plane.Figure 11 is illustrated in the distortion under 1.02 times, and the unit of transverse axis is a percent, and the longitudinal axis is the height with the object of maximum height normalization, and maximum scale is 1.
The specifications parameter of the projection optical system 6 of example 2 is as follows
Rayed area size (directions X): 40mm
Rayed area size (Y direction): 1mm
Magnification 0.99-1.01
Object side numerical aperture: 0.20
In addition,, optical system can obtain identical performance, so above-mentioned specification numerical value is not absolute because amplifying pro rata or dwindle.
The design example of table 3 expression projection optical system 6, table 4 are parameter A2, the B2 in the table 3 of the magnification of expression projection optical system 6 when being 1.01 times, 1.00 times, 0.99 times, the value of C2, D2, and the inf in the table 3 represents that radius-of-curvature is infinitely great in addition.The refractive index of the light of the relative wavelength 365nm of the glass material that n (365) expression is used.
Table 3
| The face sequence number | Radius-of-curvature | At interval | ?n(365) | Bore |
| ?0 | ?A2 | |||
| ?1 | -110.000 | ?5.000 | ?1.61262 | ?62 |
| ?2 | -81.000 | ?4.340 | ?62 | |
| ?3 | -80.600 | ?4.000 | ?1.53575 | ?64 |
| ?4 | -127.000 | ?B2 | ?66 | |
| ?5 | inf | ?0.000 | ||
| ?6 | inf | ?0.000 | Catoptron | ?78×54 |
| ?7 | inf | ?-159.970 | ||
| ?8 | 245.000 | ?-14.000 | ?1.47454 | ?143× ??222 |
| ?9 | 274.000 | ?14.000 | Catoptron | ?143× ??222 |
| ?10 | 245.000 | ?124.270 | ?143× ??222 | |
| ?11 | 124.600 | ?6.000 | ?1.47454 | ?62 |
| ?12 | 146.500 | ?-6.000 | Catoptron | ?56 |
| ?13 | 124.600 | ?-124.270 | ?62 | |
| ?14 | 245.000 | ?-14.000 | ?1.47454 | ?143× ??222 |
| ?15 | 274.000 | ?14.000 | Catoptron | ?143× ??222 |
| ?16 | 245.000 | ?159.970 | ?143× ??222 | |
| ?17 | inf | ?0.000 | ||
| ?18 | inf | ?0.000 | Catoptron | ?78×54 |
| ?19 | inf | ?C2 | ||
| ?20 | -127.000 | ?-4.000 | ?1.53575 | ?66 |
| ?21 | -80.600 | -4.340 | ?64 | |
| ?22 | -81.000 | -5.000 | ?1.61262 | ?62 |
| ?23 | -110.000 | D2 | ?62 | |
| ?24 | inf |
Table 4
| Magnification | 1.01 | 1.00 | 0.99 |
| ?A2 | 12.000 | 25.489 | 49.571 |
| ?B2 | 62.571 | 49.082 | 25.000 |
| ?C2 | -25.000 | -49.082 | -62.571 |
| ?D2 | -49.571 | -25.489 | -12.000 |
Though more than by at length describing the present invention has been described, the explanation of having described is exemplary, rather than determinate.Obviously, in not departing from scope of the present invention, have multiple modification and mode.
Claims (12)
1. a projection optical system is characterized in that, comprising:
Be configured on the central shaft of regulation and be the concave mirror at center with the reference point on the above-mentioned central shaft,
Between said reference point and above-mentioned concave mirror, be configured on the above-mentioned central shaft and roughly be the convex mirror at center with above-mentioned reference point,
Be configured in from the light of object side, while be directed to first lens on the light path of above-mentioned concave mirror with departing from above-mentioned central shaft and above-mentioned central axes,
To be incident on the above-mentioned concave mirror and in turn by after above-mentioned concave mirror, above-mentioned convex mirror, the reflection of above-mentioned concave mirror, the light that is guided out is directed to the 2nd lens that look like side with departing from above-mentioned central shaft and above-mentioned central axes on one side, and
The lens moving mechanism that above-mentioned the 1st lens and above-mentioned the 2nd lens are moved along optical axis.
2. projection optical system as claimed in claim 1 is characterized in that: above-mentioned concave mirror is formed in the back side mirror on the concave-convex lens, and above-mentioned convex mirror is formed in the back side mirror on the another one concave-convex lens.
3. projection optical system as claimed in claim 1 is characterized in that, also comprises:
To after the light of above-mentioned central shaft is via above-mentioned the 1st lens, after the reflection of the next door of above-mentioned central shaft, be directed to first retroreflector of above-mentioned concave mirror from object side,
To be reflected from the light that is parallel to above-mentioned central shaft and derives of above-mentioned concave mirror, and be directed to second retroreflector that is positioned at above-mentioned the 2nd lens that depart from above-mentioned central axis direction, and
Change the mirror travel mechanism of distance between above-mentioned central shaft and the image space by mobile above-mentioned the 1st retroreflector or above-mentioned the 2nd retroreflector.
4. a projection optical system is characterized in that, comprising:
First reflector elements, this first reflector elements are the concave-convex lens that the concave mirror that is the center is formed as back side mirror on the central shaft that is configured in regulation and with the reference point on the above-mentioned central shaft,
Second reflector elements, this second reflector elements are between said reference point and above-mentioned first reflector elements, be configured on the above-mentioned central shaft and be the concave-convex lens that the convex mirror at center forms as back side mirror roughly with above-mentioned reference point,
From the light of object side while inciding above-mentioned first reflector elements with departing from above-mentioned central shaft and above-mentioned central axes, and, derive with above-mentioned central axes ground while depart from above-mentioned central shaft in turn by above-mentioned concave mirror, above-mentioned convex mirror, the reflection of above-mentioned concave mirror.
5. projection optical system as claimed in claim 4 is characterized in that: the concave-convex lens of above-mentioned first reflector elements has negative magnification, and the concave-convex lens of above-mentioned second reflector elements has positive magnification.
6. projection optical system as claimed in claim 4 is characterized in that: the thickness on the above-mentioned central shaft of the concave-convex lens of above-mentioned first reflector elements approximately is half of difference of the radius-of-curvature of two lens faces.
7. a projection optical system is characterized in that, comprising:
Be configured on the central shaft of regulation and be the concave mirror at center with the reference point on the above-mentioned central shaft,
Between said reference point and above-mentioned concave mirror, be configured on the above-mentioned central shaft and roughly be the convex mirror at center with above-mentioned reference point,
From object side towards the light of above-mentioned central shaft after the next door reflection of above-mentioned central shaft, while be directed to first retroreflector of above-mentioned concave mirror with departing from above-mentioned central shaft and above-mentioned central axes,
To be incident on the above-mentioned concave mirror also in turn by after above-mentioned concave mirror, above-mentioned convex mirror, the reflection of above-mentioned concave mirror, after the light reflection that is guided out with departing from above-mentioned central shaft and above-mentioned central axes, to the 2nd retroreflector that departs from above-mentioned central axis direction guiding, and
Change the mirror travel mechanism of distance between above-mentioned central shaft and the image space by mobile above-mentioned the 1st retroreflector or above-mentioned the 2nd retroreflector.
8. projection optical system as claimed in claim 7 is characterized in that: above-mentioned mirror travel mechanism moves above-mentioned the 1st retroreflector and the 2nd retroreflector integratedly.
9. projection optical system as claimed in claim 7 is characterized in that: above-mentioned concave mirror is formed in the back side mirror on the concave-convex lens, and above-mentioned convex mirror is formed in the back side mirror on another concave-convex lens.
10. a graphic describing device of drawing figure on the photosensitive material on the substrate is characterized in that, comprising:
With the radiative light source portion of light source figure of regulation,
The maintaining part that keeps substrate,
On aforesaid substrate, form the projection optical system of the picture of above-mentioned light source portion, and
The image drift actuation mechanism that the relative aforesaid substrate of picture of above-mentioned light source portion is relatively moved;
Above-mentioned projection optical system comprises:
Be configured on the central shaft of regulation and be the concave mirror at center with the reference point on the above-mentioned central shaft,
Between said reference point and above-mentioned concave mirror, be configured on the above-mentioned central shaft and roughly be the convex mirror at center with above-mentioned reference point,
Be configured in from the light of object side first lens on the light path that is directed to above-mentioned concave mirror with departing from above-mentioned central shaft and above-mentioned central axes,
To be incident on the above-mentioned concave mirror and in turn by after above-mentioned concave mirror, above-mentioned convex mirror, the reflection of above-mentioned concave mirror, the light that is guided out is directed to the 2nd lens that look like side with departing from above-mentioned central shaft and above-mentioned central axes on one side, and
The lens moving mechanism that above-mentioned the 1st lens and above-mentioned the 2nd lens are moved along optical axis,
Above-mentioned image drift actuation mechanism makes above-mentioned picture on one side along the principal plane of aforesaid substrate, on one side towards the direction that is parallel to the plane that comprises the optical axis between above-mentioned concave mirror and the above-mentioned convex mirror also relative aforesaid substrate relatively move.
11. a graphic describing device of drawing figure on the photosensitive material on the substrate is characterized in that, comprising:
With the radiative light source portion of light source figure of regulation,
The maintaining part that keeps substrate,
On aforesaid substrate, form the projection optical system of the picture of above-mentioned light source portion, and
The image drift actuation mechanism that the relative aforesaid substrate of picture of above-mentioned light source portion is relatively moved;
Above-mentioned projection optical system comprises:
First reflector elements, this first reflector elements are the concave-convex lens that the concave mirror that is the center is formed as back side mirror on the central shaft that is configured in regulation and with the reference point on the above-mentioned central shaft,
Second reflector elements, this second reflector elements are between said reference point and above-mentioned first reflector elements, be configured on the above-mentioned central shaft and be the concave-convex lens that the convex mirror at center forms as back side mirror roughly with above-mentioned reference point,
From the light of object side while inciding above-mentioned first reflector elements with departing from above-mentioned central shaft and above-mentioned central axes, and in turn by after above-mentioned concave mirror, above-mentioned convex mirror, the reflection of above-mentioned concave mirror, derive with above-mentioned central axes ground while departing from above-mentioned central shaft
Above-mentioned image drift actuation mechanism makes above-mentioned picture on one side along the principal plane of aforesaid substrate, on one side towards the direction that is parallel to the plane that comprises the optical axis between above-mentioned concave mirror and the above-mentioned convex mirror also relative aforesaid substrate relatively move.
12. a graphic describing device of drawing figure on the photosensitive material on the substrate is characterized in that, comprising:
With the radiative light source portion of light source figure of regulation,
The maintaining part that keeps substrate,
On aforesaid substrate, form the projection optical system of the picture of above-mentioned light source portion, and
The image drift actuation mechanism that the relative aforesaid substrate of picture of above-mentioned light source portion is relatively moved;
Above-mentioned projection optical system comprises:
Be configured on the central shaft of regulation and be the concave mirror at center with the reference point on the above-mentioned central shaft,
Between said reference point and above-mentioned concave mirror, be configured on the above-mentioned central shaft and roughly be the convex mirror at center with above-mentioned reference point,
From object side towards the light of above-mentioned central shaft after the next door reflection of above-mentioned central shaft, while be directed to first retroreflector of above-mentioned concave mirror with departing from above-mentioned central shaft and above-mentioned central axes,
To be incident on the above-mentioned concave mirror also in turn by after above-mentioned concave mirror, above-mentioned convex mirror, the reflection of above-mentioned concave mirror, after the light reflection that is guided out with departing from above-mentioned central shaft and above-mentioned central axes, to the 2nd retroreflector that departs from above-mentioned central axis direction guiding, and
Change the mirror travel mechanism of the distance between above-mentioned central shaft and the image space by moving above-mentioned the 1st retroreflector or above-mentioned the 2nd retroreflector,
Above-mentioned image drift actuation mechanism makes above-mentioned picture on one side along the principal plane of aforesaid substrate, on one side towards the direction that is parallel to the plane that comprises the optical axis between above-mentioned concave mirror and the above-mentioned convex mirror also relative aforesaid substrate relatively move.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004162716A JP2005345582A (en) | 2004-06-01 | 2004-06-01 | Projection optical system and pattern-plotting device |
| JP2004162716 | 2004-06-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1704797A true CN1704797A (en) | 2005-12-07 |
| CN100395582C CN100395582C (en) | 2008-06-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200510065570XA Expired - Fee Related CN100395582C (en) | 2004-06-01 | 2005-04-18 | Projection optical system and pattern drawing device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2005345582A (en) |
| KR (1) | KR100718194B1 (en) |
| CN (1) | CN100395582C (en) |
| TW (1) | TWI275822B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102354045A (en) * | 2007-10-26 | 2012-02-15 | 卡尔蔡司Smt有限责任公司 | Imaging optical system, projection exposure device and microstructure component production method |
| CN101517488B (en) * | 2006-08-16 | 2012-09-05 | 卡尔蔡司Smt有限责任公司 | Optical system for semiconductor lithography |
| CN107003615A (en) * | 2014-12-02 | 2017-08-01 | 佳能株式会社 | Projection optical system, exposure device and device making method |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4985308B2 (en) * | 2007-08-31 | 2012-07-25 | 大日本印刷株式会社 | Exposure apparatus, photomask and exposure method |
| JP5398185B2 (en) * | 2008-07-09 | 2014-01-29 | キヤノン株式会社 | Projection optical system, exposure apparatus, and device manufacturing method |
| JP5116726B2 (en) * | 2009-06-01 | 2013-01-09 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
| TWI636292B (en) * | 2017-06-08 | 2018-09-21 | 昭朗精密工業有限公司 | Projector and its projection lens |
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| JPH088169A (en) * | 1994-06-23 | 1996-01-12 | Nikon Corp | Exposure system |
| CN1114942A (en) * | 1994-07-11 | 1996-01-17 | 代心淑 | Wide-angle mirror with immersion type convex mirror for motor vehicle |
| JPH0845824A (en) * | 1994-08-03 | 1996-02-16 | Toshiba Corp | Exposure device |
| US5739964A (en) * | 1995-03-22 | 1998-04-14 | Etec Systems, Inc. | Magnification correction for small field scanning |
| JPH09180985A (en) * | 1995-12-25 | 1997-07-11 | Nikon Corp | Projection exposure system |
| JP4655332B2 (en) * | 2000-05-26 | 2011-03-23 | 株式会社ニコン | Exposure apparatus, exposure apparatus adjustment method, and microdevice manufacturing method |
| DE10115875A1 (en) * | 2001-03-30 | 2002-10-10 | Heidelberger Druckmasch Ag | Imaging device for a printing form with macro optics of the opener type |
| JP4122476B2 (en) | 2002-06-04 | 2008-07-23 | 株式会社オーク製作所 | Projection exposure optical system and projection exposure apparatus |
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- 2004-06-01 JP JP2004162716A patent/JP2005345582A/en not_active Abandoned
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2005
- 2005-03-31 KR KR1020050026895A patent/KR100718194B1/en not_active IP Right Cessation
- 2005-04-15 TW TW094112013A patent/TWI275822B/en not_active IP Right Cessation
- 2005-04-18 CN CNB200510065570XA patent/CN100395582C/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101517488B (en) * | 2006-08-16 | 2012-09-05 | 卡尔蔡司Smt有限责任公司 | Optical system for semiconductor lithography |
| CN102354045A (en) * | 2007-10-26 | 2012-02-15 | 卡尔蔡司Smt有限责任公司 | Imaging optical system, projection exposure device and microstructure component production method |
| CN102354045B (en) * | 2007-10-26 | 2014-09-24 | 卡尔蔡司Smt有限责任公司 | Imaging optical system, projection exposure device and microstructure component production method |
| CN107003615A (en) * | 2014-12-02 | 2017-08-01 | 佳能株式会社 | Projection optical system, exposure device and device making method |
| CN107003615B (en) * | 2014-12-02 | 2019-01-25 | 佳能株式会社 | Projection optical system, exposure device and device making method |
| US10495978B2 (en) | 2014-12-02 | 2019-12-03 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus, and device manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200604720A (en) | 2006-02-01 |
| JP2005345582A (en) | 2005-12-15 |
| CN100395582C (en) | 2008-06-18 |
| KR20060045059A (en) | 2006-05-16 |
| TWI275822B (en) | 2007-03-11 |
| KR100718194B1 (en) | 2007-05-15 |
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