JP2008020844A - Proximity exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a compact proximity exposure apparatus in which a lower shutter can be arranged close to a mask in a boundary between an exposure region and a light shielding region without inducing interference with other units, and it is unnecessary to ensure large space to house an upper shutter when the upper shutter is retreated from the mask. <P>SOLUTION: A mask aperture mechanism 19 restricting an exposure region in the proximity exposure apparatus PE is disposed close to a mask M and includes lower shutters 70, 71 shielding a first region S1 including the boundary of the exposure region and with upper shutters 80, 81 disposed above the lower shutter 70, 71 and shielding a second region S2 continuous from the first region S1, wherein the area of the upper shutters 80, 81 in a top view is variable. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  In particular, the present invention relates to a proximity exposure apparatus that performs divided sequential proximity exposure (proximity exposure) of an exposure pattern of a mask on a substrate of a large flat panel display such as a liquid crystal display or a plasma display.

  In the proximity exposure, a translucent substrate (material to be exposed) coated with a photosensitive agent on the surface is held on a substrate stage, and the substrate is brought close to a mask held on a mask holding frame of a mask stage so that both are predetermined. In the state where the gap is set to, for example, several tens of μm to several hundreds of μm, both are made stationary, and then light for pattern exposure is irradiated toward the mask by the irradiation means from the side away from the substrate of the mask. The exposed exposure pattern is transferred onto the substrate.

  In particular, when a mask pattern is exposed and transferred onto a large substrate, a mask smaller than the substrate is used, and the substrate stage is moved stepwise relative to the mask in a state where the mask is placed close to and opposed to the substrate. In some cases, a stepwise proximity exposure method is used in which pattern exposure light is irradiated onto the substrate, thereby exposing and transferring a plurality of patterns drawn on the mask onto the substrate.

  In a proximity exposure apparatus that performs such exposure, a mask aperture having a shutter that limits an exposure area by shielding exposure light in an arbitrary range on a mask held by a mask holding frame of a mask stage as necessary. One with a mechanism is known. This shutter is installed at a position as close to the mask as possible in order to make the boundary between the range of exposure and light shielding clear.

  Even in the case of a proximity exposure method that does not allow stepping, for example, such a mask aperture mechanism may be used to allow exposure of substrates of various sizes with a single proximity exposure apparatus.

  In the conventional proximity exposure apparatus described above, in order to expand the light shielding range by the mask aperture mechanism and cope with substrates of various sizes, it is necessary to enlarge the shutter, but the shutter arranged as close to the mask as possible Above the other side, there are an alignment camera for detecting a deviation between the alignment mark on the substrate (or substrate stage) side and the alignment mark on the mask side, and other sensors such as a gap sensor for measuring a gap dimension between the substrate and the mask. Since the units are arranged close to the mask, if the light-shielding shutter is enlarged, the light-shielding shutter interferes with (covers) the detection areas of these units, thereby hindering the function. There was a limit to the size of the shutter, and there was a limit to the light shielding range.

For this reason, a mask aperture mechanism is proposed that limits the exposure range by dividing the light-shielding shutter into two parts, a belt-like lower shutter arranged close to the mask and a flat upper shutter arranged away from the mask. (For example, see Patent Documents 1 and 2).
JP 2004-62079 A JP 2005-140936 A

  By the way, in the mask aperture mechanism described in Patent Documents 1 and 2, since the upper shutter disposed away from the mask is constituted by a single large flat plate, the mask stage is used when the upper shutter is retracted from the mask. It requires a lot of space on the base, and the device can become large or interfere with other units.

  Further, when driving the flat light-shielding shutter, a large stroke is required because the flat plate is large. If positioning is attempted by the ball screw mechanism, it takes time to drive the shutter.

  The present invention has been made in view of the above circumstances, and its purpose is to allow the lower shutter to be disposed close to the mask at the boundary between exposure and light shielding without interfering with other units, and Another object of the present invention is to provide a compact proximity exposure apparatus that does not require a large space for storing when the upper shutter is retracted from the mask.

The above object of the present invention is achieved by the following configurations.
(1) A substrate holding unit that holds a substrate as an exposed material, a mask holding unit that holds a mask having an exposure pattern, and an irradiation unit that irradiates the substrate with light for pattern exposure through the mask; A mask aperture mechanism that partially blocks the light for pattern exposure applied to the mask from the irradiation means and limits an exposure area, and the mask and the substrate are mutually connected with a predetermined gap. A proximity exposure apparatus that exposes and transfers the exposure pattern of the mask to the substrate by the irradiating means in a state of being closely arranged,
The mask aperture mechanism is disposed in proximity to the mask and shields a first region including a boundary portion of the exposure region, and is disposed above the lower shutter, and the first region An upper shutter that shields the second continuous region;
The proximity exposure apparatus, wherein the upper shutter has a variable area in a top view.
(2) The proximity exposure apparatus according to (1), wherein the upper shutter includes first and second flat plate-like shutters that are arranged so as to overlap each other and are movable independently of each other. .
(3) The mask holding part is supported movably on the mask stage base,
The first flat shutter is attached to a first movable part arranged to be movable with respect to the mask stage base, and is driven through the first movable part by a first drive mechanism.
The second flat shutter is attached to a second movable part movably disposed with respect to the first movable part, and is driven by the second drive mechanism via the second movable part. The proximity exposure apparatus according to (2).
(4) The proximity exposure apparatus according to (3), wherein the first drive mechanism is configured by a motor and a ball screw mechanism, and the second drive mechanism is configured by an air cylinder.

  According to the proximity exposure apparatus of the present invention, the mask aperture mechanism that limits the exposure area includes a lower shutter that is disposed close to the mask and shields the first area including the boundary of the exposure area, and a lower shutter. The upper shutter is arranged on the upper side and shields the second region continuous with the first region, and the upper shutter has a variable area in top view, so that the lower shutter does not interfere with other units, When the upper shutter is retracted from the mask at a boundary portion of the exposure area, the compact configuration does not require a large space for storing.

  Hereinafter, a proximity exposure apparatus according to an embodiment of the present invention will be described in detail with reference to the drawings.

(First embodiment)
FIG. 1 shows a stepwise proximity exposure apparatus PE that divides a mask exposure pattern on a large substrate and performs proximity exposure, and holds a mask M having an exposure pattern movably in the x, y, and θ directions. A mask stage 10, a substrate stage 20 that holds a glass substrate W as a material to be exposed so as to be movable in the x, y, and z directions, and an irradiation unit that irradiates the substrate W with light for pattern exposure through the mask M It is mainly comprised from the illumination optical system 40 which is.

  Note that a glass substrate W (hereinafter simply referred to as “substrate W”) is disposed so as to face the mask M, and a surface (on the side facing the mask M) to expose and transfer the exposure pattern drawn on the mask M. ) Is coated with a photosensitive agent. The dimension of the mask M of this embodiment is assumed to be 1400 mm × 1220 mm.

  For convenience of explanation, the illumination optical system 40 will be described. The illumination optical system 40 includes, for example, a high-pressure mercury lamp 41 that is a light source for ultraviolet irradiation, a concave mirror 42 that collects light emitted from the high-pressure mercury lamp 41, and Between the two types of optical integrators 43 that are switchably arranged near the focal point of the concave mirror 42, plane mirrors 45 and 46 and a spherical mirror 47 for changing the direction of the optical path, and between the plane mirror 45 and the optical integrator 43 And an exposure control shutter 44 that controls the opening and closing of the irradiation light path.

  When the exposure control shutter 44 is controlled to be opened at the time of exposure, the light emitted from the lamp 41 is held on the mask M held on the mask stage 10 via the optical path L shown in FIG. The surface of the substrate W is irradiated as light for pattern exposure, and the exposure pattern of the mask M is exposed and transferred onto the substrate W.

  The substrate stage 20 includes a substrate holding unit 21 that holds the substrate W, and a substrate moving mechanism 22 that moves the substrate holding unit 21 in the x, y, and z directions with respect to the apparatus base 50.

  The substrate holding part 21 has a plurality of suction nozzles (not shown) for sucking the substrate W on the upper surface, and detachably holds the substrate W by a vacuum suction mechanism (not shown).

  The substrate moving mechanism 22 includes a y-axis table 23, a y-axis feed mechanism 24, an x-axis table 25, an x-axis feed mechanism 26, and a z-tilt adjustment mechanism 27 below the substrate holding unit 21.

  As shown in FIG. 2, the y-axis feed mechanism 24 includes a linear guide 28 and a feed drive mechanism 29, and a slider 30 attached to the back surface of the y-axis table 23 is a rolling element (not shown). The y-axis table 23 is driven along the guide rail 31 by the motor 32 and the ball screw device 33.

  The x-axis feed mechanism 26 has the same configuration as the y-axis feed mechanism 24 and drives the x-axis table 25 in the x direction with respect to the y-axis table 23. Further, the z-tilt adjusting mechanism 27 has one movable wedge mechanism formed by combining the wedge-shaped moving bodies 34 and 35 and the feed driving mechanism 36 at one end side in the x direction and two at the other end side. Consists of. The feed drive mechanisms 29 and 36 may be a combination of a motor and a ball screw device, or may be a linear motor having a stator and a mover. Further, the number of z-tilt adjustment mechanisms 27 installed is arbitrary.

  Thereby, the substrate moving mechanism 22 feeds and drives the substrate holding unit 21 in the x direction and the y direction, and moves the substrate holding unit 21 in the z-axis direction so as to finely adjust the gap between the mask M and the substrate W. Fine adjustment and tilt adjustment.

  Bar mirrors 61 and 62 are respectively attached to the x-direction side and the y-direction side of the substrate holding unit 21, and three laser interferometers are installed at the y-direction end and the x-direction end of the apparatus base 50. 63, 64, 65 are provided. As a result, the laser light is irradiated from the laser interferometers 63, 64, 65 to the bar mirrors 61, 62, the laser light reflected by the bar mirror 62 is received, and the laser light and the laser light reflected by the bar mirrors 61, 62 are received. And the position of the substrate stage 20 is detected.

  The mask stage 10 has a mask base 11 having a rectangular opening 11a formed at the center, and is mounted on the opening 11a of the mask stage base 11 so as to be movable in the x-axis, y-axis, and θ directions, and holds the mask M. A mask holding frame 12 that is a mask holding unit and a mask position adjusting mechanism 13 that is provided on the upper surface of the mask stage base 11 and moves the mask holding frame 12 in the x-axis, y-axis, and θ directions.

  The mask stage base 11 is supported by a plurality of columns 51 erected on the apparatus base 50 on the substrate stage side, and a z-axis coarse movement mechanism 52 (between the mask stage base 11 and the columns 51). 2), the mask stage base 11 can be moved up and down with respect to the apparatus base 50.

  Below the mask holding frame 12, a chuck portion 53 having a plurality of suction nozzles 53a formed on the lower surface is attached, and the mask M is detachably held by a vacuum suction mechanism (not shown) (see FIG. 5).

  The mask position adjusting mechanism 13 includes actuators such as various cylinders 13x, 13x, and 13y that drive the mask holding frame 12, and a guide mechanism 54 provided between the mask stage base 11 and the mask holding frame 12 (see FIG. 5). Thus, the mask holding frame 12 is moved in the x-axis, y-axis, and θ directions.

  The mask holding frame 12 includes a plurality of gap sensors 17 (eight in the present embodiment) that measure gaps between the opposing surfaces of the mask M and the substrate W along the sides thereof, and the mask M side. A plurality of alignment cameras 18 (four in the present embodiment) that image the alignment marks (not shown) and the alignment marks (not shown) on the substrate W (or substrate stage 20) side are arranged. The gap sensor 17 and the alignment camera 18 may be arranged so as to be driven along the side portion of the mask holding frame 12.

  Further, the mask stage 10 is provided with a mask aperture mechanism 19 that partially blocks the light for pattern exposure irradiated to the mask M from the irradiation optical system 30 to limit the exposure area.

  Here, a specific configuration of the mask aperture mechanism 19 will be described with reference to FIGS. The mask aperture mechanism 19 is disposed close to the mask M, and is disposed above the lower shutters 70 and 71 that shield the first region S1 including the boundary portion of the exposure region, and the lower shutters 70 and 71. Upper shutters 80 and 81 for shielding the second area S2 continuous with the first area S1 are provided.

  As shown in FIGS. 3, 5, and 6, the lower shutters 70 and 71 are arranged in pairs in the x direction and the y direction, and are each formed in a strip shape. The x-axis lower shutter 70 that can move in the x direction is supported at both ends by guides 72 arranged on the mask holding frame 12 and is bent so that an intermediate portion thereof is close to the mask M. Yes. Further, ball screw nuts 73 are provided at both ends of the x-axis lower shutter 70, and the screw shaft 75 is driven to rotate by the motor 74, so that the x-axis lower shutter 70 is moved via the ball screw nut 73. Move in the x direction.

  The y-axis lower shutter 71 that can move in the y direction has the same configuration as the x-axis lower shutter 70 and moves in the y direction by a ball screw mechanism. The intermediate portion is bent so as to have a different height from the intermediate portion of the x-axis lower shutter 70 in order to avoid interference with the x-axis lower shutter 70.

  On the other hand, the upper shutters 80 and 81 are also arranged in pairs in the x and y directions (FIG. 3 shows one side at a time). The upper shutters 80 and 81 are arranged so as to be overlapped with each other, and include first flat plate-like shutters 82 and 84 and second flat plate-like shutters 83 and 85 that are movable independently of each other. The area is variable.

  First and second flat shutters 82 and 83 of the x-axis upper shutter 80 movable in the x direction, and first and second flat shutters 84 and 85 of the y-axis upper shutter 81 movable in the y direction. Are arranged at different heights so as not to interfere with each other when moved, and an x-axis aperture driving unit 86 for driving the x-axis upper shutter 80 and a y-axis aperture driving unit for driving the y-axis upper shutter 81 87 are also arranged at different heights so that they do not interfere with each other.

  Specifically, in the x-axis aperture driving unit 86, as shown in FIGS. 4 and 5, a fixed table 89 is arranged on the upper stage of the stepped support base 88 fixed on the mask stage base 11. A first movable table (first movable portion) 91 that is movably guided by a pair of guides 90 is disposed on the fixed table 89, and by rotating a screw shaft 93 connected to a motor 92. The first movable table 91 is driven through a joint nut 94 that moves in the axis.

  A second movable table 96 that is movably guided by a guide 95 is disposed on the first movable table 91, and the tip of the piston rod 98 of the air cylinder 97 that is disposed on the first movable table 91 and a joint. By being connected via 99, the first movable table 91 is driven. Furthermore, a third movable table (second movable portion) 100 guided by the same guide 95 as the second movable table 96 is provided on the first movable table 91, and is disposed on the second movable table 96. The second movable table 96 is connected via a joint 103 attached to the tip of the piston rod 102 of the air cylinder 101.

  The screw shaft 93 and the joint nut 94 constituting the motor 92 and the ball screw mechanism constitute the first drive mechanism of the present invention, and the air cylinders 97 and 101 constitute the second drive mechanism of the present invention.

  The first flat shutter 82 is attached to the lower surface of the first movable table 91, and is moved by moving the first movable table 91 by the first drive mechanism. The second flat shutter 83 is mounted on the third movable table 100, and the second movable table 96 is moved relative to the first movable table 91 by the second drive mechanism, and the third movable table 100. Is moved by moving with respect to the second movable table 96.

  On the other hand, as shown in FIGS. 4 and 6, the y-axis aperture driving unit 87 is disposed between the middle stage of the support base 88 and the fixed table 89, and the fixed table 110 is disposed in the middle stage of the support base 88. The On the fixed table 110, a first movable table (first movable portion) 112 that is movably guided by a pair of guides 111 is arranged. By rotating a screw shaft 114 connected to a motor 113, the first movable table 112 is moved. The first movable table 112 is driven through a joint nut 115 that moves in the axis.

  Further, on the first movable table 112, a second movable table 117 that is movably guided by the guide 116 is disposed, and the tip of the piston rod 119 of the air cylinder 118 disposed on the first movable table 112 and the joint. By being connected via 120, the first movable table 112 is driven. Further, on the first movable table 112, a third movable table (second movable portion) 122 that is movably guided by a guide 121 arranged side by side with the guide 116 is disposed, and on the second movable table 117. The tip of the piston rod 124 of the arranged air cylinder 123 is connected via a joint 125.

  The screw shaft 114 and the joint nut 115 constituting the motor 113 and the ball screw mechanism constitute the first drive mechanism of the present invention, and the air cylinders 118 and 123 constitute the second drive mechanism of the present invention.

  The first flat shutter 84 is attached to be higher than the second flat shutter 83 of the x-axis upper shutter 80 via a height adjusting member 126 disposed on the first movable table 112. The first movable mechanism 112 is moved by moving the first movable table 112. The second flat shutter 85 is also mounted so as to be higher than the first flat shutter 84 via a height adjusting member 127 disposed on the third movable table 122, by the second drive mechanism. The second movable table 117 is moved by moving with respect to the first movable table 112, and the third movable table 122 is moved by moving with respect to the second movable table 117.

  In the mask aperture mechanism 19 configured as described above, for example, when the exposure region in the x direction is limited, as shown in FIG. 7, the first region S1 including the boundary portion of the exposure region by the x-axis lower shutter 70 is used. The light is shielded, and the second region S2 continuous to the first region is shielded by the x-axis upper shutter 80. At this time, the second flat shutter 83 of the x-axis upper shutter 80 is arranged so as to slightly overlap the x-axis lower shutter 70 in the x-axis direction, and pattern exposure irradiated from the optical irradiation system 40 is performed. The mask M is prevented from being irradiated even when the light for use spreads at the boundary position between the first region S1 and the second region S2 due to the collimation angle.

  Here, the x-axis lower shutter 70 is disposed close to the mask M in the first region S1 including the boundary portion of the exposure region, but is formed in a band shape, and therefore the gap sensor 17 and the alignment camera 18 are arranged. Thus, interference with other units can be prevented.

  Further, since the x-axis upper shutter 80 is composed of the first and second flat shutters 82 and 83, when the shutters 82 and 83 are retracted from the exposure area, they are stored in an overlapping manner. The area occupied by the shutters 82 and 83 can be made smaller than the second area S2, and the space for storing these shutters 82 and 83 on the mask stage base 11 can be reduced.

  Further, the first flat shutter 82 of the x-axis upper shutter 80 is driven by a motor 92 and a ball screw mechanism, so that precise positioning is possible and the exposure area in the x-axis direction can be arbitrarily limited. it can. In addition, since the second flat shutter 83 is driven by the two air cylinders 97 and 101 on the first movable table 91, the second flat shutter 83 can be driven to advancing or retracting at a high speed. A stroke operation longer than that of the flat shutter 82 can be performed at high speed.

  Particularly, since the second flat shutter 83 is driven by the two air cylinders 97 and 101, the stroke of the second flat shutter 83 can be increased. In the x-axis aperture drive unit 86, the third movable table 100 is guided by the guide 95 on the first movable table 91 in the same manner as the second movable table 96. The dimension in the vertical direction can be suppressed.

The first and second flat shutters 82 and 83 are appropriately driven according to the size of the exposure area to be shielded from light.
Also, when the exposure area in the y-axis direction is limited, the first area S1 including the boundary of the exposure area is shielded by the y-axis lower shutter 71, and the first area S1 is blocked by the y-axis upper shutter 81. The continuous second region S2 is shielded from light, and the same effect is obtained. However, in the y-axis aperture driving unit 87, the third movable table 122 is guided by a guide 121 arranged side by side with the guide 116 of the second movable table 117, and the third movable table 122 is connected to the second movable table 117. Similarly, since it is arranged on the first movable table 110, the dimension in the height direction of the y-axis aperture driving unit 87 is suppressed.

  As described above, according to the proximity exposure apparatus of the present embodiment, the mask aperture mechanism 19 that restricts the exposure area is arranged close to the mask M and shields the first area S1 including the boundary portion of the exposure area. Lower shutters 70 and 71, and upper shutters 80 and 81 that are arranged above the lower shutters 70 and 71 and shield the second region S2 that is continuous with the first region S1. Since the area in the top view is variable, the lower shutters 70 and 71 can be arranged close to the mask M at the boundary of the exposure region without interfering with other units such as the gap sensor 17 and the alignment camera 18. In addition, when the upper shutters 80 and 81 are retracted from the exposure area, a compact configuration that does not require a large space for storage is obtained. .

  Further, the upper shutters 80 and 81 are arranged so as to be overlapped with each other, and are provided with first and second flat shutters 82, 83, 84, and 85 that can move independently from each other. Since 82, 83, 84, and 85 can be stored repeatedly when they are retracted from the exposure area, a large space for storage is not required.

  Further, the mask holding unit 12 is movably supported by the mask stage base 11, and the first flat shutters 82 and 84 are fixed to fixed tables 89 and 110 fixed to the mask stage base 11 via a support base 88. The second flat shutters 83 and 85 are attached to the first movable tables 91 and 112 that are movably disposed on the first movable tables 91 and 112 through the first movable tables 91 and 112 by the first drive mechanism. Since it is attached to the third movable tables 100 and 122 arranged so as to be movable with respect to the movable tables 91 and 112 and is driven through the third movable tables 100 and 122 by the second drive mechanism, The configuration of the x-axis and y-axis aperture drive units 86 and 87 provided in the can be arranged in a compact manner.

  Further, since the first drive mechanism is constituted by motors 92 and 113 and a ball screw mechanism, and the second drive mechanism is constituted by air cylinders 97, 101, 118 and 123, the upper shutters 80 and 81 are exposed regions. Can be arbitrarily and precisely limited, and can be driven at a high speed.

  In addition, this invention is not limited to this embodiment, In the range which does not deviate from the summary of this invention, it can change suitably.

  In the present embodiment, the second flat shutters 83 and 85 are driven using two air cylinders, but may be driven using one air cylinder.

  In the present embodiment, the step-type proximity exposure apparatus capable of performing two-dimensional step feed has been described. However, the present invention can be applied to a step-type proximity exposure apparatus that performs one-dimensional step feed and a proximity exposure apparatus that does not perform step feed. is there.

  In the present embodiment, the second flat shutters 83 and 85 are disposed above the first flat shutters 82 and 84, but may be configured to be disposed below, in this case, The distance between the second flat shutters 83 and 85 and the x-axis and y-axis lower shutters 70 and 71 can be reduced, and the shutters 70, 71, 83, and 85 overlap in consideration of the collimation angle. The length can be shortened.

It is a partial exploded perspective view for demonstrating the division | segmentation successive proximity exposure apparatus which concerns on one Embodiment of this invention. It is a front view of the division | segmentation successive proximity exposure apparatus shown in FIG. It is a top view which shows the mask aperture mechanism of the mask stage of the proximity exposure apparatus which concerns on this invention. FIG. 4 is an enlarged view of IV in FIG. 3. FIG. 4 is a cross-sectional view of the mask aperture mechanism of FIG. 3 as viewed from the V direction. FIG. 4 is a cross-sectional view of the mask aperture mechanism of FIG. 3 viewed from the VI direction. It is a schematic diagram for demonstrating operation | movement of the mask aperture mechanism of this invention.

Explanation of symbols

PE division sequential proximity exposure system (proximity exposure system)
W Glass substrate (material to be exposed)
M Mask 10 Mask stage 11 Mask stage base 12 Mask holding frame (mask holding part)
DESCRIPTION OF SYMBOLS 13 Mask position adjustment mechanism 17 Gap sensor 18 Alignment camera 19 Mask aperture mechanism 20 Substrate stage 21 Substrate holding part 22 Substrate movement mechanism 24 y-axis feed mechanism 26 x-axis feed mechanism 27 z-tilt adjustment mechanism 40 Illumination optical system 50 Device base 52 z-axis moving mechanism 70, 71 Lower shutter 80, 81 Upper shutter 82, 84 First flat shutter 83, 85 Second flat shutter 86 x-axis aperture drive 87 87 y-axis aperture drive 91, 112 1st Movable table (first movable part)
100, 122 Third movable table (second movable part)

Claims (4)

A substrate holding unit for holding a substrate as an exposed material; a mask holding unit for holding a mask having an exposure pattern; an irradiation unit for irradiating the substrate with light for pattern exposure through the mask; and the irradiation unit A mask aperture mechanism that partially blocks the light for pattern exposure applied to the mask to limit an exposure area, and the mask and the substrate are arranged close to each other with a predetermined gap. A proximity exposure apparatus that exposes and transfers the exposure pattern of the mask to the substrate by the irradiation means,
The mask aperture mechanism is disposed in proximity to the mask and shields a first region including a boundary portion of the exposure region, and is disposed above the lower shutter, and the first region An upper shutter that shields the second continuous region;
The proximity exposure apparatus, wherein the upper shutter has a variable area in a top view.   2. The proximity exposure apparatus according to claim 1, wherein the upper shutter includes first and second flat shutters that are arranged to overlap each other and are movable independently of each other. The mask holding part is movably supported on a mask stage base,
The first flat shutter is attached to a first movable part arranged to be movable with respect to the mask stage base, and is driven through the first movable part by a first drive mechanism.
The second flat shutter is attached to a second movable part movably disposed with respect to the first movable part, and is driven by the second drive mechanism via the second movable part. The proximity exposure apparatus according to claim 2.   4. The proximity exposure apparatus according to claim 3, wherein the first drive mechanism is configured by a motor and a ball screw mechanism, and the second drive mechanism is configured by an air cylinder.

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