TW200937135A - Pattern drawing apparatus and pattern drawing method - Google Patents

Abstract

The purpose of the present invention lies in the following: even when the substrate containing a plurality of drawing object regions is used as the object, the times of exposure scanning also can be decreased. Further, the purpose of the present invention lies in the following: a plural sorts of regular patterns or bandwidths are easily drawn on the photosensitive material. When the exposure heads 30a~30d carry out the exposure scanning respectively from the first scanning area As1 to the fourth scanning area As4, the unit pattern group SLG having respective widths in contrast to the width of scanning object region within the respective scanning region is formed in advance on the photo mask, which results in the fact that even when a part of a drawing object region At is included in a scanning region As, and it is not necessary to use the miscellaneous mechanisms to carry out the adjustment as done previously. Furthermore, even when each part of the two adjacent drawing object regions is included in a scanning region (i. e. the whole gap region is included in a scanning area), it is also not necessary to carry out two times of exposure scanning towards the same scanning region.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for respectively depicting a regular pattern in a plurality of drawing object regions of a substrate on which a photosensitive material is formed. [Prior Art] A glass substrate, a semiconductor substrate, and a flat panel display (FPD) for a color filter substrate, a liquid crystal display device, or a plasma display device, which are provided in a liquid crystal display device. In the manufacturing step of a substrate such as a substrate, a pattern drawing device that irradiates light onto a substrate on which a photosensitive material is formed to draw a regular pattern on the surface of the substrate is used. As such a pattern description device, for example, those disclosed in Patent Document i are known. The pattern drawing device of Patent Document 1 includes an exposure head that exposes light emitted from a light source that has passed through the opening of the mask to expose the substrate. Further, in the pattern drawing device of Patent Document 1, the exposure head is relatively moved in the main scanning direction with respect to the substrate by irradiating light from the exposure head, thereby drawing a regular pattern on the substrate. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-347846 [Draft of the Invention] [Problems to be Solved by the Invention] In the pattern drawing device as described above, a proposal has been made that the drawing of the substrate is not performed by Performing an exposure scan in the main scanning direction is performed by using a plurality of exposure scans in the main scanning direction with a relatively compact exposure head. In this case, the area of 136304.doc -6- 200937135 on the substrate is in the sub-scanning direction (divided with the fixed width. The direction in which the exposure is perpendicular to the direction of the ^ direction) is in the direction of each of the plurality of scanning areas/乂 乂 复 》 》 》 》 》 》 》 》 》 》 》 》 》 》 》 》 》 》 曝光 曝光 曝光 曝光 曝光 J 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光Scanning from the main pattern: setting a plurality of (10) as described above, a plurality of scanning exposure scans are set, and in the gold "anvil" scanning area, the adjacent two drawing pairs are included. In this case, it is impossible to borrow the two sides of the two stroke target areas, and the pattern is drawn by one exposure scan. Therefore, regarding the scanning area, two exposure scans are performed. Specifically, it is necessary to perform an exception process in which the pattern of the stroke target area on the green side is scanned in the first exposure scan, and the circle of the other stroke target area is drawn in the second exposure scan. Thus, two exposure scans for the same scan area result in a decrease in throughput (processing per unit time). In recent years, the liquid crystal panel or the PDP (plasma display panel) liquid crystal panel has been developed with a large screen. Therefore, in order to improve productivity, the mother glass substrate used has also been expanded. It has entered the planning and investment of the 8th generation production line (2160 mmx2400 mm). There has been a problem in the production cost of a large reticle or the operation cost of replacement, etc., which are required for each pattern when the large area is divided and exposed. On the other hand, 'generally', in the exposure mode using the above-described photomask, the photomask must be replaced each time the type of the pattern to be drawn is changed, so that the operation of the exposure step becomes complicated. Therefore, the present invention has been made in view of the above problems, and an object thereof is to reduce the number of exposure scans even when a substrate having a plurality of drawing target regions is targeted, and an object of the present invention is to easily draw on a photosensitive material. A regular pattern or width of a plurality of types. - [Technical means for solving the problem] In order to solve the above problem, the invention of claim 1 is a pattern drawing device that draws a regular pattern on each of a plurality of drawing target regions 9 on which a substrate of a photosensitive material is formed, and includes a light source; a mask mechanism for passing light from the light source, wherein a unit pattern group is formed on the substrate, the unit image is formed as a part of the specific image, and the plurality of openings are regularly arranged in the sub-scan In the direction, a plurality of exposure mechanisms intermittently illuminate the photosensitive material on the substrate through the light of the opening of the mask mechanism, thereby exposing the pattern; and the main scanning mechanism is configured to The exposure mechanism moves relative to each other in the main scanning direction; the sub-scanning mechanism moves the substrate relative to the exposure mechanism in the sub-scanning direction; and the reticle moving mechanism causes the reticle mechanism to perform the main scanning Moving in the direction and/or the sub-scanning direction so that the opening of the mask mechanism is disposed at a specific position; The unit pattern group is formed in at least two types of the mask mechanism, and the substrate is moved in response to the main scanning mechanism and/or the sub-scanning mechanism, and the mask mechanism is moved by the mask moving mechanism to select One of the unit pattern groups formed on the mask mechanism is exposed to 0 136304.doc 200937135. The invention of claim 2 is the image drawing device of the request item, wherein the plurality of exposure mechanisms are relatively moved Forming a plurality of scanning regions defined by respective specific widths in a sub-scanning direction in a main scanning direction from a starting position on the substrate to a main scanning direction and a drawing direction orthogonal to the substrates; The plurality of units of the above-mentioned light military agencies are arranged in a regular arrangement in the main scanning direction.

The invention of claim 3 is the pattern drawing device of claim J or claim 2, wherein the scanning direction width of the plurality of unit rounds of the mask mechanism is compared with each of the exposure scanning of the exposure mechanism The sub-scanning direction width of the above-mentioned (4) target region included in the scanning area is set. Further, the invention of claim 4 is the request item i or the request item in the pattern drawing device, wherein the plurality of unit pattern groups have at least two light passage openings formed by the arrangement of the openings, and are formed in the light passage port The invention of the unit image edge device in which the material length light shielding portions are arranged in the sub-scanning direction is the pattern description of the request item 1 or the request item 2, and the plurality of unit map groups of the photomask mechanism. The main unit of the pattern is the same as the scale of the old sub-scanning direction. In the pattern drawing device of Fig. 5, the openings are arranged at equal intervals. The invention of claim 6 is such that, in the request, a plurality of the unit pattern groups are arranged in the sub-scanning direction. Further, in the invention of claim 7, the request item i or the request item is a pattern drawing device, wherein the mask mechanism further has a reference pattern as a reference point of an image formed on the substrate. Further, the invention of claim 8 is the pattern drawing device of claim 1 or claim 2, wherein the mask mechanism further has an identification pattern for identifying a specific message. Further, the invention of claim 9 is characterized in that: the pattern drawing device is provided on each of a plurality of drawing target regions of the substrate on which the photosensitive material is formed (four) regular pattern, the pattern The finder device includes a light source and a reticle mechanism, and the reticle mechanism passes light from the light source, and a unit pattern group is formed on the substrate, and the unit image is formed as a unit image of a specific image-part, and a plurality of The opening portion is regularly arranged in the sub-scanning direction; and includes a scanning step of intermittently illuminating the light passing through the opening portion of the mask mechanism onto the photosensitive material on the substrate to cause a plurality of patterns to be exposed The exposure mechanism relatively moves the main scanning orthogonal to the substrate by a main scanning mechanism that relatively moves the exposure mechanism in the main scanning direction with respect to the exposure mechanism and/or a sub-scanning mechanism that relatively intermittently moves in the sub-scanning direction. In the direction and the sub-scanning direction, and in the main scanning direction from the starting position on the substrate, each of the sub-scanning directions is specified And exposing each of the plurality of scanning areas defined by the width; and a mask selection step of moving the substrate corresponding to the main scanning mechanism and/or the sub-scanning mechanism before the scanning step, and moving by using the mask The mechanism moves the photomask mechanism and selects one of the unit pattern groups formed on the optical mechanism to expose the photomask. According to the invention of the first to eighth aspects, the unit pattern group is formed on the mask mechanism in at least two types, and corresponds to the main scanning mechanism and/or the above. The sub-scanning mechanism moves the substrate, moves the mask mechanism by the mask moving mechanism, and selects one of the unit pattern groups formed on the mask mechanism to expose the mask. According to such a configuration, in the pattern drawing device of the embodiment, the mask mechanism is provided at least

In the reticle moving mechanism that moves in the main scanning direction, the plurality of exposure mechanisms perform exposure scanning in a plurality of scanning areas defined by respective specific widths in the sub-scanning direction from the start position on the substrate in the main scanning direction. In order to make the color filter; 1 and 4 production time, @ grasp where the pattern is drawn on the substrate in advance, so when each exposure mechanism scans in each scanning area, it will form a comparison with each scanning area in the mask mechanism_L in advance. A plurality of unit pattern groups each having a width of a drawing target area included therein. Then, when each exposure mechanism performs exposure scanning on each scanning area, the mask mechanism is moved in the main scanning direction to appropriately select the unit pattern group to perform scanning scanning on each scanning area. Even in a scanning area. When the σρ' knife of the stroke target area is included, it is not necessary to adjust the width of the unit pattern group by using the shutter mechanism as before or by overlapping and sliding the two masks. Moreover, even if one of the two adjacent drawing target areas is included in one scanning area (that is, the entire scanning area is included in the one scanning area), it is not necessary to perform two (four) light scanning on the same scanning area, and the exposure can be reduced. The number of scans is 0. The width of the sub-scanning direction of the plurality of unit pattern groups is in accordance with the invention described in claim 3, in particular, according to the invention described in claim 3, in contrast to the scanning of the exposure mechanism. The width of the sub-scanning direction of the above-described binding target region included in the region is set. Therefore, it is not necessary to adjust the width of the sub-scanning direction of the single (four) case of the mask by comparing the width of the target area of the exposure scan in each scanning area as before, or to adjust each time, thus The exposure scan can be performed in a shorter time. The invention according to claim 4, wherein the plurality of unit maps have at least two light passage openings formed by the opening of the π portion and a specific length light blocking portion formed between the light passage openings The unit pattern group formed by arranging in the sub-scanning direction. Therefore, in the case of the previous patterning device, when the respective scanning regions include the respective portions of the two adjacent drawing target regions, the normal exposure scanning method is performed twice to perform the processing ( Exception processing) ' With respect to the pattern drawing device of the present embodiment, processing can be performed by one exposure scanning. According to the invention of claim 5, the plurality of unit pattern groups on the mask mechanism include a plurality of unit pattern groups in which the scales of the openings in the main scanning direction and/or the sub-scanning direction are different from each other. According to such a configuration, the 'one portion 1' of the width-uneven sentence corresponding to the allowable range is configured as follows: for the color light-resistant towel of a specific color, the opening portion and the unit pattern group can be appropriately selected. The opening is different in thickness and the unit pattern group is scanned for exposure. In particular, according to the invention described in the claim 7, the light military unit further has a reference pattern as a reference point of an image formed on the substrate. Therefore, for example, a black matrix or an alignment mark can be formed at a specific position. In particular, according to the invention described in claim 8, the mask mechanism further has an identification pattern for identifying specific information. Therefore, the ability of the operator to recognize the pattern or the ability to recognize the color grading sheet can be improved. Further, the invention according to claim 9 includes a scanning step of intermittently irradiating light passing through the opening of the mask mechanism onto the photosensitive material on the substrate to expose a plurality of exposure mechanisms for pattern exposure The main scanning mechanism for relatively moving the exposure mechanism in the main scanning direction and/or the sub-sliding mechanism for intermittently moving in the sub-scanning direction are relatively moved by the substrate to be orthogonal to each other for the substrate Direction and field J scanning direction 'i from the starting position on the substrate, in the main scanning direction, and a plurality of scanning areas defined by the specific widths in the sub-scanning direction, each of the plurality of scanning areas; and a mask selection step, And corresponding to the main scanning mechanism and/or the sub-scanning of the substrate 'moving the mask mechanism' by the mask moving mechanism and selecting the unit formed on the mask mechanism In the pattern group: the person makes it exposed. Therefore, even if the scanning area includes a portion of a 7-object area, it is not necessary to use the shutter mechanism as before, and the two masks are overlapped and slid to adjust the width of the unit pattern group. ^ 'When the two scanning areas contain two adjacent drawing object area knives (that is, the entire scanning area is included in one scanning area), 2 the same scanning area is required to perform two exposure scans, thereby dimming The number of scans. [Embodiment] Hereinafter, an embodiment of the present invention will be described with reference to a circular form. 136304.doc •13·200937135 00. </ RTI> Fig. 1 and Fig. 2 show a pattern drawing device according to an embodiment of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a side view. FIG. 2 is a plan view. The pattern drawing device 1 is used in a manufacturing process of a color light-passing sheet of a liquid crystal display device, and is used for a color light-emitting sheet formed with a photosensitive material (color resist in this embodiment). A device (hereinafter simply referred to as "substrate") 9 is described as a device having a specific pattern. As shown in Fig. 1 and Fig. 2, the pattern drawing device! The main assembly 11 includes a base 11, a stage 10 for holding the substrate 9, a driving unit 20 for oscillating the stage 10 with respect to the base 11, a plurality of exposure heads 30, and an imaging unit. Further, regarding the plurality of exposure heads 30, the exposure heads in the present embodiment have four '30a, 30b, 30c, and 30d, respectively, which are collectively referred to as 30. In the following description, when indicating the direction and orientation, the three-dimensional XYZ orthogonal coordinates shown in the figure are appropriately used. The XYZ axis is relatively fixed with respect to the base j i. Here, the X-axis and γ-axis directions are horizontal, and the 2-axis 方向 direction is vertical. The main scanning direction in the pattern drawing device 1 corresponds to the γ-axis direction, and the sub-scanning direction corresponds to the X-axis direction. The stage 10 has a flat outer shape and functions as a holding portion for holding the substrate 9 placed on the upper surface thereof in a substantially horizontal posture. On the upper surface of the stage 10, a plurality of suction holes (not shown) are formed. The substrate 9 placed on the stage 1 is fixedly held on the upper surface of the stage by the suction pressure of the suction holes. The driving unit 20 moves the stage 1 〇 relative to the base in the main scanning direction (γ-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (136304.doc 200937135 rotation direction around the ζ axis). Drive mechanism. The driving unit 2A includes a rotating mechanism 21 that rotates the stage 10, a sub-scanning mechanism 23 that supports the support plate 22 of the stage 1 from the lower surface side, and moves the support plate 22 in the sub-scanning direction; The bottom plate 24 that supports the support plate 22 by the scanning mechanism 23 and the main scanning mechanism 25 that moves the bottom plate 24 in the main scanning direction. The rotary mechanism 21 has a linear motor 2U composed of a mover mounted on the Y-side end of the stage 10 and a stator attached to the upper surface of the support plate 22. Further, the rotation mechanism 21 has a rotation shaft 211 between the lower surface side of the central portion of the stage 10 and the support plate 22. Therefore, when the linear motor 21a is operated, the mover is along the stator in the X-axis direction. Moving 'and the stage 10 will rotate within a certain angle range centering on the rotating shaft 21b on the support plate 22. The sub-scanning mechanism 23 has a linear motor 23a composed of a mover mounted on the lower surface of the support plate 22 and a stator attached to the upper surface of the bottom plate 24. Further, the sub-scanning mechanism 23 has a pair of guide portions 23b extending in the sub-scanning direction between the support plate 22 and the bottom plate 24. Therefore, when the linear motor 23a is operated, the support plate 22 moves in the sub-scanning direction along the guide portion 23b on the bottom plate 24. Since the stage 1 is supported by the support plate 22, the sub-scanning mechanism 23 moves the stage 10 with respect to the base 11 in the sub-scanning direction. The main scanning mechanism 25 has a linear motor 25a composed of a mover that is shocked to the lower surface of the bottom plate 24 and a stator that is placed on the base. Further, the main scanning mechanism 25 has a pair of guiding portions 25b extending in the main scanning direction between the bottom plate 24 and the base cymbal. Therefore, when the linear motor 136304.doc -15· 200937135 25a is operated, the bottom plate 24 moves in the main scanning direction along the guide portion 25b on the base η. Since the stage 1 is supported by the support plate 22 and the bottom plate 24, the main scanning mechanism 25 moves the stage 10 in the main scanning direction with respect to the base u. ❹ ❹ A plurality of exposure heads 30 are configured such that the surface of the substrate 9 placed on the stage 1 is irradiated with pulsed light and the substrate 9 is exposed to draw a regular pattern. a frame 31 having a bridging structure is fixed on the base π, and the frame 31 of the bridging structure is mounted on the base Π2_χ side and the +X side end along the sub-scanning direction, and spans the stage 10 and Drive unit 20. A plurality of exposure heads 3 are mounted on the frame 3 i in the same pitch in the sub-scanning direction. Therefore, the positions of the plurality of exposure heads 30 are fixed with respect to the base 1丨. As described above, the main scanning mechanism 25 and the sub-scanning mechanism 23 of the drive unit 20 move the stage 10 with respect to the base 11. Therefore, when the main scanning mechanism 25 is driven, the plurality of exposure heads 30 are relatively moved in the main scanning direction with respect to the substrate 9 placed on the stage. Further, when the sub-scanning mechanism 23 is driven, the plurality of exposure heads 30 are relatively moved with respect to the substrate 9 placed on the stage 10 in the sub-scanning direction. Each of the exposure heads 30 is connected to a laser oscillator 33 as a light source of pulsed light via an illumination optical system 32, and further, a laser drive unit 34 is connected to the laser oscillator. When the radiation driving unit 34 operates, the pulse light is oscillated from the laser oscillator 33, and the oscillated pulse light is guided to each of the exposure heads 3 via the illumination optical system 32. The emission unit 35 is used for The reticle unit 36 is disposed inside each of the exposure heads 30. The pulse light guided by the optical system 32 is directed to 136304.doc -16-200937135, which is used to partially block the pulsed light to form a specific shape. a light beam; and a projection optical system 37 for illuminating the light beam onto the upper surface of the substrate 9. The pulsed light emitted from the exit portion 35 is partially shielded from light passing through the reticle unit 36 as a light beam of a specific pattern. To the projection optical system 37. Then, the pulsed light that has passed through the projection optical system 37 is irradiated onto the upper surface of the substrate 9, whereby the photosensitive material (color resist) coated on the upper surface of the substrate 9 is applied. A specific pattern is drawn. The four alignment cameras 41 to 44 are respectively disposed on the substrate 9 that is placed above the stage 1 to image the substrate 9 placed on the stage 1 to obtain an image. Further, an imaging device such as an optical system and a CCD (charge coupled device) is used. The imaging unit is configured to image an alignment mark κ (see FIG. 5) formed on the upper surface of the substrate 9 in advance. Each of the alignment cameras 41 to 44 is disposed substantially above the alignment mark AM formed on the four corners of the substrate 9 when the substrate 9 is placed at the alignment position (the position of FIGS. 1 and 2). The collimators 41 to 44 are fixed to the base 11 via the holding portion (not shown) while the optical axis of the optical pickup system is directed downward (-Z side). The alignment cameras 41 to 44 The image obtained is used for positioning the substrate 9 placed on the stage 10 at a desired position of the feature. That is, the pattern drawing device 1 can be configured by arranging the substrate 9. In the aligned position and the alignment cameras 41 to 44 are actuated The alignment marks AM on the four corners of the substrate 9 are photographed to obtain the coordinates thereof. Further, the pattern drawing device can be moved by moving the substrate 9 in the main scanning direction and causing the alignment cameras 41, 43 to operate. A plurality of alignment marks am formed along the +X side and the -X side of the substrate 9 are taken 136304.doc • 17· 200937135 to obtain coordinates thereof. FIG. 3 shows the configuration of the reticle unit 36. The reticle unit 36 has a reticle moving mechanism that holds a reticle 361 composed of a glass plate or a metal plate or the like in which a specific light-shielding pattern is formed, and is ''' and is opposite to the reticle 361. The position in the horizontal plane is adjusted. In the mask 361, the following coloring pattern mask 36U, black matrix pattern mask 361b, alignment mark pattern mask 361e, i-th mask portion "n" and second mask are used. The portion 361e is collectively referred to as 361. The end portions of the +X side and the -X side of the mask Μ in the mask unit % are held by the pair of holding portions 36a. The other pair of holding portions 36a are connected to be laid in the main scanning direction. Therefore, when the first driving unit 36b is operated, the pair of holding portions 36a and the photomask 361 are integrally moved in the main scanning direction. Further, the first driving unit 36b can be borrowed, for example. Further, the lower portion of the first driving portion 36b is provided with a pair of guide rails 36c extending in the sub-scanning direction and a second driving portion _36d composed of a linear motor or the like. When the driving unit 36d is operated, the first driving unit 36b, the holding unit 36a, and the mask 361 are integrally moved in the sub-scanning direction. Thus, the mask unit 36 can be driven by the first driving unit 36b and the second driving unit 36d. The portion 36d operates to move the mask 361 to adjust the main scanning direction and the sub-scanning side of the mask 361. The mask 361 is formed with a unit pattern group SLG formed by regularly arranging a plurality of openings SL.SL.SL... at equal intervals in the sub-scanning direction. The mask 361 is configured to pass through the mask 361. The unit pattern group SLG passes the pulsed light from the laser oscillator 33, thereby forming a unit image on the substrate 9 as a part of the image of 136304.doc •18-200937135. The details will be described below. a plurality of exposure heads 3〇3, 301), 3 (^, 30 (1) relative to the substrate and relative to each other in the main scanning direction and the sub-scanning direction, and from the starting position on the substrate along the main scanning In the direction, the plurality of scanning areas As defined for each specific width in the sub-scanning direction are respectively subjected to exposure scanning. Further, regarding the plurality of scanning areas As, in the present embodiment, there are four 'respective' for each of the exposure heads 30. Asl, As2, AS3, and As4 are collectively referred to as As (refer to Fig. 7). A plurality of unit pattern groups SLG1, SLG2, SLG3, and SLG4 (collectively referred to as SLG) formed on the mask 361 correspond to Multiple scanning areas Asl, A S2, As3, and As4 are regularly arranged in the main scanning direction from the _γ side. The reticle unit 36 can apply a plurality of unit pattern groups SLG by adjusting the position in the main scanning direction of the reticle 361. Several of them are disposed in the irradiation area of the pulsed light. Further, the mask unit 36 can adjust the projection position of the pattern on the substrate 9 by precisely shifting the positions in the main scanning direction and the sub-scanning direction of the mask 361. Further, the pattern drawing device 1 includes a control unit 50 that controls the entire device and performs various types of arithmetic processing. Fig. 4 is a block diagram conceptually showing the configuration of the pattern drawing device 1 including the control unit 50. The control unit 5 is composed of a computer including a CPU (central processing unit) and a memory, and the CPU performs arithmetic processing based on a program stored in advance in the memory, thereby realizing control functions of each part of the device. And various computing functions. As shown in FIG. 4, the linear motors 21a, 23a, and 25a, the laser drive unit 34, the first drive unit 36b, the second drive unit 36d, and the alignment cameras 41 to 44 136304.doc • 19-200937135 are electrically connected. The control unit 5 is operated under the control of the control unit 5A. Further, the pattern drawing device 1 further includes an operation unit 51 that accepts various operations of the user, and a data input unit 52 that inputs drawing materials required for pattern drawing. The data input unit 52 is configured, for example, as a reading device for reading a recording medium or a communication device for performing material communication with an external device. The operation unit 51 and the data input unit 52 are also electrically connected to the control unit 50, and the operation contents of the operation unit 51 are input to the control unit 50 as signals. Further, the drawing data input to the material input unit 52 is stored in the memory of the control unit 50. In the drawing material, position information indicating the position of the drawing target area in the substrate 9 to be processed, that is, the position of the drawing target area, and the like are displayed. Fig. 5(a) is a view showing an example of the position of the sub-pixel region formed on the substrate 9 which is the processing target of the pattern drawing device 1, and Fig. 5(b) is a schematic view thereof. The area indicated by the symbol Ac in Fig. 5(a) is the sub-pixel area of R (red), G (green), and B (blue) which are formed in the subsequent steps (pattern drawing and development). The area indicated by the symbol At in Fig. 5(b) is a region in which a plurality of sub-pixel regions Ac. Ac· Ac... are regularly arranged, and a drawing target region in which a colored pattern can be drawn is shown. The drawing target area At is determined based on the drawing material stored in the memory of the control unit 50 in advance. These imaged object areas At have been subjected to various manufacturing steps, respectively, and finally become a color light film (final product). It is needless to say that a drawing target area At is set on one substrate 9, even if it is two-dimensionally arranged on one substrate 9 as shown in FIG. 5(b), 136304.doc -20-200937135 is provided with a plurality of depictions. In the case of the target area At, the pattern drawing device 1 may draw a coloring pattern for each of the drawing target areas At. Further, on the upper surface of the substrate 9, a black matrix BM in which the sub-pixel region Ac is formed in a region in the frame is formed, and on the four corners of the substrate 9, an alignment mark AM is formed, and the alignment mark AM is formed. The formation position is not limited thereto, and may be, for example, a configuration formed on the peripheral portion of each of the drawing target regions At. &lt;2. Pattern drawing operation&gt; <2·1. Before exposure: substrate arrangement on the stage (step S1)> Next, the basic operation of the pattern drawing device 1 will be described.圊6 is a flowchart showing the flow of the basic operation of the pattern drawing device 1. First, a substrate 9' to which a photosensitive material (color resist) is applied in advance is carried by a transfer robot or the like, and the substrate 9 is placed on the upper surface of the stage 1A. The substrate 9 is attracted by the suction port formed on the upper surface of the stage 1 and held on the upper surface of the stage 10 in a substantially horizontal posture (step Si). &lt;2-2. Before exposure: Regarding the specific width w&gt;. Next, a regular pattern is drawn on the substrate 9. 7 to 12 are views showing the state of the substrate 9 in the process of drawing the pattern, and the mask 361a corresponding to each of the exposure heads 30 is shown below the figure. Further, in the graph, the range of the rectangle indicated by the symbol 60 indicates the extent to which the exposure head 30 can draw the pattern by the irradiation of one pulse of light (i.e., the range of exposure) is hereinafter referred to as "depictable". range"). Further, regarding the drawable range 60, in the present embodiment, there are four exposure heads, and the corresponding drawable ranges are 60a, 60b, 60c, and 60d, and are collectively referred to as 60. The width of the drawable range 60 is set to a specific width w (for example, 5〇136304.doc 21 - 200937135 mm in the present embodiment). Here, the "width" of the "width of the drawable range 60" is Unless otherwise stated, it refers to the width in the sub-scanning direction. Further, in the figure, the illustration of the alignment mark AM is omitted. &lt;2-3. Before exposure: With respect to the pitch H1&gt; As described above, the plurality of exposure heads 30a, 30b, 30c, and 30d are arranged at the same pitch HI (for example, 200 mm in the present embodiment) in the sub-scanning direction. Therefore, the plurality of drawable ranges 60a, 6〇b, 60c, 60d respectively corresponding to the plurality of exposure heads 30 are also arranged in the sub-scanning direction by the same distance H1 (for example, 200 mm). The width of the pitch H1 is equivalent to four times the width w of the drawable range 60. &lt;2-4. Before Exposure: Exposure Head at Start Position (Step S2)&gt; Each exposure head 30 is divided into four regions for the width H1 on the substrate 9 up to the exposure head 3A adjacent to the +x side. Scan. Specifically, first, as shown in FIG. 7, a plurality of exposure heads 3a, 3〇b, 3〇c, 30d (i.e., 'descriptable ranges 60a, 6〇b, 6〇c, 60d) are respectively moved. The start position ps of the substrate 9 determined by the trace edge data (step S2). Next, as shown in Fig. 10, the exposure head 30 (i.e., the drawable range 6 〇) is moved relative to the substrate 9 at a fixed speed on the +γ side in the main scanning direction. At this time, the pulsed light is irradiated from the exposure head 3〇 for a specific period of time. Thereby, for each of the exposure heads 3, an exposure scan for the region As extending toward the main scanning direction on the substrate 9 is performed. The area of the area on the substrate 9 to be subjected to the exposure scanning in the main scanning direction in this manner is referred to as a "scanning area". In the present embodiment, each of the scanning areas 136304.doc • 22- 200937135 in which the exposure heads 30a, 30b, 30c, and 30d are subjected to exposure scanning are sequentially referred to as the first scanning area Asl and the first from the -X side. 2 scanning area As2, third scanning area AS3, and fourth scanning area As4. &lt;2-5. Photomask: First Embodiment&gt; Here, the photomask of the first embodiment will be described below. Here, the photomask 361a is illustrated as an example of a coloring pattern. Further, regarding the coloring pattern mask 361a, there are four masks for the color pattern corresponding to the exposure heads 30a, 30b, 30c, and 30d, respectively 361aa, 361ab, 361 ac, and 36lad', which are collectively referred to as 361a. . &lt;2-5-1. Photomask: Symbol of the unit pattern group&gt; In the mask for coloring pattern 361a, a plurality of unit pattern groups SLG are regularly arranged in the main scanning direction, and the first embodiment is used. The symbol of the unit pattern group is denoted as SLGxy (x and y are variables, x is a letter, y is an integer value) β χ contains the letters of the exposure heads 30a, 30b, 30c, and 3d, and the exposure head of the above-mentioned mother and child is contained in y. The number of the scan areas as1, as2, As3, and As4 of the 30 exposure scans. For example, the unit pattern group of the mask 361aa used for the exposure scanning of the second scanning area by the exposure head 3〇a is SLGal, and the unit pattern of the mask 361ac used when the exposure head 30c performs the exposure scanning of the second scanning area. The group is SLGc2. Further, a plurality of unit pattern groups SLG regularly arranged in the main scanning direction are arranged at the same pitch p. When the exposure head 30 performs exposure scanning on the scanning area As, 'move the mask unit 36 to the -Y side or the +γ side by a distance corresponding to the pitch p, thereby selecting the desired unit pattern group SLG and performing exposure. scanning. When the exposure heads 30a, 30b, 30c, 30d (i.e., the drawable range 60a, 136304.doc -23-200937135 60b, 60c, 60d) simultaneously perform exposure scanning g on each of the first scanning areas As1, so that the unit pattern group SLGxl The first driving unit 36b of the mask unit 36 is moved in the main scanning direction to be selectively disposed so as to be positioned below each exposure head. Similarly, when the second scanning area As2 is subjected to the exposure scanning, 'the corresponding unit pattern group SLGx2 is selected and selected, and when the third scanning area As3 is subjected to the exposure scanning, the unit pattern group SLGx3 is selected and corresponding to the 4th scanning. When the area As4 performs the exposure scanning, the unit pattern group SLGx4 is selected and corresponding.

A ^ &lt; 2-5-2. Width of the unit pattern group&gt; Next, the width in the sub-scanning direction of each of the plurality of unit pattern groups SLG on the mask 361a will be described with reference to Figs. 8 and 9 . In the present embodiment, the width in the sub-scanning direction of the plurality of unit pattern groups SLG on the mask 361a is plotted against the scanning area As which is subjected to exposure scanning by the exposure head 30 (that is, the usable range 60). The width of the object area At in the sub-scanning direction is set. In the present embodiment, three drawing target areas Atl, At2, and At3 are sequentially arranged on the drawing target area ❹ ❹ from the side of the drawing, and are collectively referred to as At. In the following description, the width of the unit pattern SLG in the sub-scanning direction is WSLG, and the width of the sub-scanning side of the scanning area AS is set to wAs (the width is substantially the same as the specific width %) 'The width in the sub-scanning direction of the drawing target area included in one scanning area is set to wAt. &lt;2-5-24. Case where the width wM of the drawing target area is equal to the width wAs of the scanning area&gt; a * The entire width of the scanning area As in the sub-scanning direction includes _ 136304.doc •24- 200937135 When the target area At is drawn, that is, when the width wAt of the drawing target area At included in one scanning area As is equal to the width wAs of the scanning area As, the exposure head 30 is subjected to exposure scanning under the exposure head 30. The width of the unit pattern group 81^0 on the reticle 361& arranging 81^0 is set to be the width corresponding to the width wAs of the scanning area As, that is, the specific width w. &lt;2-5-2-2·When the width wAt of the drawing target region is narrower than the width wAs of the scanning region> Further, when one scanning region As contains one portion of the drawing target region At, that is, 'one When the width wAt of the drawing target area At included in the scanning area As is narrower than the width wAs of the scanning area As, the unit pattern on the mask 361a disposed below the exposure head 30 for performing the exposure scanning on the scanning area As is performed. The width wSLG of the group SLG is set to a width corresponding to the width wAt of the drawing target region At included in the scanning area As. By setting in this way, pulse light having the same width wAt as the width of the drawing target area At included in one scanning area As can be irradiated onto the substrate 9 via the mask 3 61 a. In the present embodiment, as shown in FIG. 8, the width wSLG of the unit pattern group is set as a mask disposed below the exposure head 30a for performing exposure scanning on the drawing target area At1 included in the first scanning area As1. The unit pattern group SLGal of 361aa, the unit pattern group SLGbl of the mask 36lab disposed below the exposure head 30b for performing exposure scanning on the drawing target area At1 included in the first scanning area As1, and the second pattern area As2 The unit pattern group SLGb2 of the mask 361ab disposed below the exposure head 30b for performing the exposure scanning in the drawing target area At2 is exposed to the drawing target area At3 included in the 136304.doc • 25-200937135 2 scanning area As2 The unit pattern group SLGd2 of the mask 36lac disposed under the exposure head 30d is scanned. &lt;2-5-2-3·When the width wAt of the drawing target region is narrower than the width wAs of the scanning region: Exception processing> Next, the adjacent two drawing target regions At include one scanning region As · A description of the situation of each of the respective parts. In the second embodiment, the second scanning area As2 in which the exposure head 30c performs the exposure scanning includes one of the adjacent two drawing target areas At2 and At3. That is, the entire gap region Αν is included in one scan area. Here, the widths of the drawing target regions At2 and At3 in the second scanning area As2 are respectively wAt2 and wAt3, and the width of the gap area Αν is set to wAv. Further, the total value obtained by adding the width wAt2, the width wAv, and the width wAt3 corresponds to the width of the second scanning area As2, that is, the specific width w. Further, as shown in FIG. 9, the unit pattern group SLGc2 of the mask 361ac disposed under the exposure head 30c is configured by arranging the light passage openings LP1, LP2 and the light shielding portion SH in the sub-scanning direction. The light passing through the mouth portions LP1 and LP2 is formed by arranging a plurality of openings SL.SL··., and the light blocking portions SH are formed between the light passing openings LP1 and LP2. Here, the widths of the light passing through the mouth portions LP1, LP2 are set to wLP1 and wLP2, respectively, and the width of the light shielding portion SH is set to wSH. Here, the width wLP1 of the light passing through the mouth portion LP1 is set to be the width corresponding to the width wAt2 of the drawing target region At2 in the second scanning region As2. Similarly, the width wLP2 of the light passing through the mouth portion LP2 is set to a width corresponding to the width wAt3 of the drawing target region At3 in the scanning area As2 of the second 136304.doc -26-200937135, and the width WSH of the light shielding portion SH is set. It is set to a width corresponding to the width wAv of the gap region Αν. According to such a setting, pulse light of the same width as the width wAt2 of the drawing target area At2 and the width wAt3 of the drawing target area At3 included in one scanning area As2 can be respectively irradiated to the substrate 9 via the mask 3 61 ac . on. Therefore, for the previous pattern drawing device, 'when one of the two adjacent drawing object regions is included in one scanning region, 'the processing is performed by two normal exposure scanning methods (exception processing), On the other hand, the pattern drawing device 1 of the present embodiment can perform processing by one-time exposure scanning. &lt;2-6. Before exposure: arrangement of mask (step S3)&gt; Return to the above case. After the operation of step S2 is performed, the first driving unit 36b of the mask unit 36 is moved in the main scanning direction, and the unit pattern group SLGal of the mask 361aa is placed in the exposure head for performing exposure scanning on the first scanning area As1. Below 30a. Similarly, the unit pattern group SLGbl of the mask 361ab is disposed below the exposure head 30b for performing exposure scanning on the first scanning area As1, and the unit pattern group SLGcl of the mask 361ac is disposed so as to be located in the first scanning area As1. Below the exposure head 30c of the exposure scan, the unit pattern group SLGdl of the mask 361ad is disposed below the exposure head 30d for performing exposure scanning on the first scanning area As1 (step S3). &lt;2-7. Exposure start: scanning of the first scanning area As1 toward the +Y side (step S4)&gt; Next, as shown in Fig. 10, on the one hand, the exposure heads 30a, 30b, 30c, 30d are time-cycled To illuminate the pulsed light, on the one hand, the exposure heads 30a, 136304.doc • 27· 200937135 30b, 30c, 30d (ie, the 'depictable range 6〇a, 6〇b, 60c, 60d) are scanned with respect to the substrate 9 The +Y side of the direction moves relative to each other at a fixed speed. Thereby, the exposure scanning on the substrate 9 for one scanning area As 1 extending in the main scanning direction is performed by each of the exposure heads 3 . By the exposure scanning, the range that can be drawn in the drawable range 6〇a, 60b, 60c, 60d! A regularity scheme is depicted in the scan area Asl. In the figure, the area in which the pattern is drawn is indicated by oblique hatching (step S4). &lt;2-8. End of exposure scanning of the first scanning area As1: moving the exposure head to the +χ side (step S6)&gt; When the one-shot scanning in the main scanning direction ends, the exposure heads 30a, 30b, 3 are made 0c, 30d (that is, the drawable ranges 60a, 60b, 60c, 60d) are relatively moved with respect to the substrate 9 at a + χ side in the sub-scanning direction by a specific width (step S6). &lt;2-9. Before the exposure of the second scanning area As2: movement of the mask (step S3)&gt; Next, the first driving unit of the mask unit 36 is made before the exposure scanning of the second scanning area As2 is performed. 36b moves the distance corresponding to the pitch p on the -Y side. The unit pattern group SLGa2 of the mask 361aa is disposed below the exposure head 3A for performing exposure scanning on the second scanning area As2. Similarly, the unit pattern group SLGb2 of the mask 361ab is disposed below the exposure head 3〇b for performing the exposure scanning on the second scanning area As2, and the unit pattern group SLGc2 of the mask 361ac is disposed to be located in the second scanning area. As2 is under the exposure head 30c for performing exposure scanning, and the unit pattern group SLGd2 of the mask 361ad is disposed below the exposure head 3?ci for performing exposure scanning on the second scanning area As2. 136304.doc •28- 200937135 &lt;2-10. Exposure start: scanning the second scanning area As2 toward the _γ side> Then 'as shown in Fig. 11', the exposure heads 30a, 3〇b, 3〇c, 3〇d (that is, the drawable range 60a, 00b, 00c, 60d) is relatively moved at a fixed speed on the -Y side of the main scanning direction with respect to the substrate 9, thereby the first exposure scan with the previous one. The second scanning area As2 adjacent to the +χ side of the scanning area AS1 performs exposure scanning. - &lt;2-11·Scanning the third scanning area As3 and the fourth scanning area As4&gt; ❿ Similarly, as shown in Fig. 12, the exposure heads 30a, 30b, 30c, and 30d are opposed to the substrate 9 on the one hand. In the sub-scanning direction, the +χ side is relatively moved in units of a specific width w, and on the other hand, the masks 361, 361, 361, 361, and 4 are on the -¥ side and the pitch? The corresponding distance is moved in units of arrangement, and the third scanning area As3 and the fourth scanning area As4 are subjected to exposure scanning in the main scanning direction. Thereby, each of the exposure heads 3 进行 performs exposure scanning on the four scanning areas As1, As2, As3, and As4 which divide the area of the width Η adjacent to the exposure head 30 adjacent to the +γ side, and draws a drawing pattern. . The substrate 9 on which the pattern is drawn is carried out from the upper surface of the stage 10 by a transfer robot or the like (step S7). Each pattern drawn on the substrate 9 is developed in a subsequent step to become a sub-pixel region Ac having any of R (red), G (green), and B (blue). Then, the formation of such a sub-pixel region (pattern drawing and development) is repeated three times in a manner corresponding to R (red), G (green), and B (blue), whereby the drawing target region At is on the substrate 9 1. At2 and At3 become a color filter. &lt;2 -12. Summary&gt; 136304.doc -29- 200937135 As described above, in the pattern drawing device i of the present embodiment, a mask moving mechanism (first driving unit 36b) is provided, and the mask is moved. The mechanism moves the colored pattern mask 36 la at least in the main scanning direction. Further, the exposure heads 30a, 30b, 30c, and 30d are subjected to exposure scanning toward the fourth scanning area As4 from the first scanning area As1 defined by the specific width w in the sub-scanning direction from the -X side. When the color filter is to be mass-produced, it is necessary to grasp the coloring pattern on the substrate 9 in advance, so that when each of the scanning heads 30 is to scan each of the scanning areas As, it will be on the reticle 361a. The main scanning directions are arranged to form a plurality of unit pattern groups SLG corresponding to the widths wAt of the respective object regions At in the respective scanning regions As. Then, when each of the exposure heads 30 is to perform exposure scanning for each of the scanning areas As, the mask 361a is moved in the main scanning direction to appropriately select the unit pattern group SLG to perform exposure scanning for each of the scanning areas As. As a result, even if one scanning area As contains a part of the drawing target area At, it is not necessary to use the shutter mechanism as before or to overlap and slide the two masks to adjust the width of the unit pattern group SLG. Further, even if one scanning region As includes one of the adjacent two drawing target regions At and At (that is, one scanning region At contains the entire gap region Αν), it is not necessary to perform the same-swapping region As. Double exposure scan' thus reduces the number of exposure scans. &lt;3. Other Embodiments&gt; The embodiments of the present invention have been described above, but the present invention is not limited to the above-described embodiments, and various modifications can be made. Hereinafter, other embodiments will be described. Of course, the modes described below can be combined as appropriate. 136304.doc • 30-200937135 &lt;3-1. Second Embodiment&gt; In the above-described embodiment, the colored pattern mask 361a formed by a plurality of unit pattern groups SLG having a plurality of various shapes is formed. The substrate 9 having the black matrix BM, the alignment mark AM, and the photosensitive material (color resist) is subjected to exposure scanning to depict a specific color pattern. Similarly, the black matrix BM or the alignment mark AMb may be formed on the substrate 9 before the formation of the photosensitive material (color resist) by the photomask formed of a plurality of unit pattern groups of various shapes. Fig. 13 to Fig. 15 are views showing the state of the substrate 9 during the operation of drawing the black matrix BM and the alignment mark AM pattern on the substrate 9 on which the photosensitive material is not coated, and the lower side of the figure shows Photomasks 361b and 361c corresponding to the respective exposure heads 3〇. The purpose of forming the black matrix BMi is that the right incident light leaks from the gap between the layers of the sub-pixel regions R (red), G (green), and B (blue) formed on the substrate 9 in the subsequent step, and the liquid crystal is not displayed. Since the contrast of the device or the like is lowered, Φ" and the color matrix BM are formed in order to block light therebetween. The method of forming the black matrix BM includes a chrome bm method, a resin BM method, or a heavy method, but is applied to the substrate 9 as long as it is attached. The method of applying a light-shielding material such as metal chrome and patterning by photolithography to form a black matrix bm is not particularly limited. Further, it is formed on the outer side of the drawing target area At and at the four corners of the substrate. A mark AM for detecting an offset between the actual position of the substrate and the ideal position. The alignment mark is formed by exposing, developing, and patterning the same light-shielding material as the black matrix BM at the same forming step. The black matrix pattern mask 3611) and the alignment mark pattern mask 136304.doc -31· 200937135 361c and the pattern of the black matrix BM and the alignment mark AM on the substrate 9 are substantially the same as the above The flow chart shown in the flowchart of Fig. 6 in which the exposure pattern is scanned by the color pattern mask 361a is the same as in the embodiment. The black matrix pattern mask 361b is a black matrix pattern mask 361 ba. 361 bb, 361 be, and 361 bd are collectively referred to as 361b. In addition, the alignment mark pattern mask 361c is collectively referred to as aligning mark pattern masks 361ca and 361cb as 361c. Thus, the black matrix is omitted. A detailed description of the formation of the BM and the alignment mark AM. Further, in the figure, the unexposed area (the area where the light shielding material is peeled off in the subsequent step) is indicated by pure white in the exposure scanning. The members other than the closed portion BL of the black matrix pattern mask 361b and the unit pattern group BLG are also the same. Therefore, the same reference numerals are used to illustrate the same. The colored pattern mask 361a and the black matrix pattern mask 361b are used. The difference is the following configuration (see FIG. 17): a portion of the plurality of openings SL in the mask 361a for coloring, and a single-bit pattern group SLG including a plurality of openings s1, SL... In the black matrix pattern mask 36115 which is covered by the light-shielding material, the portion corresponding to the opening of the mask 361a for the coloring pattern is covered with the light-shielding material (hereinafter, the σ is used as the σ The closed portion bl has a unit pattern group including a plurality of closed portions as BLG), and the other portions are light-transmitting. However, the black matrix pattern mask 36lb has a closed portion BL and a unit pattern group BLG. The shape, the size, and the position are basically the same as the opening portion SL and the unit pattern group SLG of the mask pattern h of the color pattern. Further, in the mask 361b for the black matrix pattern, the main scanning direction is 136304.doc •32· In 200937135, a plurality of unit pattern groups BLG are arranged in a regular manner, and the symbol of the unit pattern group in the first embodiment is referred to as BLGxy (x and y are variables, X is a letter, and y is an integer value). The letter X contains the letters of the exposure heads 30a, 30b, 30c, and 30d, and the number of the scanning areas As1, As2, As3, and As4 which are exposed and scanned by the exposure head 30 containing the letter in y. For example, the unit pattern group of the mask 361ba used for the exposure scanning by the exposure head 30a for the first scanning area is BLGal, and the exposure head 30. The unit pattern group of the mask 361bc used for performing the exposure scanning on the second scanning area is B L G c 2 . Further, in the alignment mark pattern masks 361ca and 361cb, the light-shielding portion BLm' having a flat cross shape is formed, and the Y-side 'alignment mark pattern mask 361ca of the black matrix pattern mask 361ba is disposed in the same On the plane, on the +Y side of the mask 361 bd of the black matrix pattern, the alignment mark pattern mask 361 cb is disposed on the same plane. Therefore, the black matrix pattern mask 361b and the alignment mark pattern mask 361c are used, so that the black matrix BM in which the sub-pixel region ❹ Ac is formed in the region in the frame can be formed on the upper surface of the substrate 9, and Alignment marks AM are formed on the four corners of the substrate 9. Further, in the present invention, the coloring pattern mask 361&amp;, the black color matrix pattern mask 361b, and the alignment mark pattern mask 361c may be arranged on one mask 361, and may be formed. The formation of the alignment mark AM and the black matrix BM and the formation of the colored pattern are performed in one mask 361. For example, in Fig. 17, a mask for coloring the mask 36u and a mask for the black matrix pattern 361b are arranged on a single mask 361. In the above embodiment, four alignment cameras Μ~44 are arranged, and 136304.doc •33-200937135; the four corners are formed with a flat cross-shaped alignment camera position. It has been am, but the number and the number u s or the number, and the shape and number of the alignment mark AM are not only in the pg but can be variously changed. For example, as shown in FIG. 16T, it may be a polygonal BLt, a circular shape (not shown, such as a shape BLb. Then, put) a bar code mark, and the bar code mark may be a two-dimensional information _BLb2, or a helmet. Recognition &&lt; 1D Code Information Jin B b But, in order to be able to record more helmets, it is ideal to use the dot matrix ❻ &'&gt;' configured to form a two-dimensional grid to express information Record. The so-called two-dimensional code: 'the display mode in which the main scanning direction and the sub-scanning direction, that is, the bar code in the two-dimensional direction, is called a two-dimensional code, and the two-dimensional code BLb2 is roughly divided into a stacked type and a matrix type. . The so-called stacked type refers to a vertical stacking-dimensional bar code and displays the bar code of the information in a vertical and horizontal manner. The so-called matrix type refers to a bar code that displays the information in a grid of black and white alternating squares. Further, the alignment mark AM of * is an example *, and the shape thereof is not particularly limited as long as it has the function of the alignment mark. Further, in the above embodiment, the alignment mark Z AM is formed on the outer side of the drawing target area At as a private measure for detecting the offset between the actual position and the ideal position of the substrate 9, but may be formed to identify specific information. Identification area (identification pattern). For example, 'having a reticle identification bar code mark and a reticle identifier, etc. (not shown) 'where the reticle identification bar code mark is for mechanically taking the name of the reticle, steps, origins, etc. and performing a mask or exposure The δ is set again, and the name of the reticle, the batch management number, and the reticle manufacturer are recorded in the reticle identifier, and are usually described by characters in order to allow the operator to read. Further, it is also possible to pattern a short-size measurement pattern which is a pattern for short-length management 136304.doc •34-200937135 on a mask or a long-size measurement pattern for long-length management. The identification patterns can be formed by patterning the same shading material as the black matrix BM in the same forming step. Thereby, the ability of the operator to recognize the pattern or the ability to recognize the color filter can be improved. &lt;3-2. Third Embodiment&gt; Next, according to Figs. 18 to 21, the main scanning direction and/or sub-scan of the opening portion SL is included in the plurality of units 光 (four) group SLG on the mask. The case of a plurality of unit pattern groups SLG in which the scales of the directions are different from each other will be described below. In the prior art, the width management of the opening portion of the mask in the pattern drawing device does not use a mask specially designed to match the color resist used, but the width is adjusted using the original mask. For example, the two masks are combined and slid to adjust the width of the pattern, or the reticle with a slightly narrower width than the expected width is used to adjust the exposure amount (to increase the width ❹, the exposure is increased) ) 'Use this to control the width. Further, when the sub-pixel is formed by exposure to the photomask on the substrate to be coated with the color resist, the temperature or humidity of the exposure apparatus body depends on the temperature or humidity m in the clean room, and the development process is performed. The width of the pixel will be generated. Not uniform. Therefore, in order to solve the above problems, the present invention is a pattern drawing device of the present embodiment! In the reticle 361, a plurality of openings 邛SL SL.′· which are enlarged and/or reduced are arranged on the reticle 361 in a direction of the main scanning direction, thereby providing a tolerance corresponding to the above-mentioned allowable The opening portion SL of the width unevenness of the range. For example, in order to use the opening SL and the unit pattern group SLG for the color opaque of the specific 136304.doc • 35· 200937135 color, the opening SL and the unit pattern group SLG can be appropriately selected and subjected to exposure scanning. Further, the general color resistance is composed of a color pigment, a binder resin as an energy ray-curable resin such as an ultraviolet-ray hardening resin, and other additives. As the red pigment, a red pigment used in a color filter can be generally used, and examples thereof include Pigment Red 77, Pigment Red, and Pigment Red 209. Among them, Pigment Red 209 is preferably used. Further, as the green pigment, a green pigment used in a color filter can be used, and examples thereof include Pigment Green 36, Pigment Green 37, and Pigment Green 7, and a pigment green tray is preferably used. Further, as the blue pigment, a blue pigment used in a color filter can be generally used, and examples thereof include Pigment Blue 15:3, Pigment Blue 16, Pigment Blue 17, Pigment Blue 15, and the like, in which Pigment Blue 15: 3 is used. Preferably. Since each of the red color resist, the blue color resist, and the green color resist has characteristics, even if an opening having a width corresponding to each of them or a pigment having the same color as described above is formed, there are several types, and therefore, even The use of color photoresists of the same color in the same phase will also have subtle differences in the characteristics of the color photoresist due to the different types of pigments. Therefore, on one of the masks 361, the opening portion SL and the unit pattern group SLG corresponding to the characteristics of the color resist including the respective pigments can be formed. Finally, the opening 胄SL of the mask 361 and the unit K group SLG are appropriately selected and exposed so that any of the colored patterns exposed on the substrate 9 are the same size. &lt;3-2-丨·The width of either the main scanning direction or the sub-scanning direction of the opening is equal to the width> FIG. 18 is the ith photomask portion 361d and the second mask portion 3 - The main scanning side 136304.doc -36· 200937135 forms a picture of the reticle 361 upward. The first mask portion 361d and the second mask portion 361e have a configuration in which seven opening portions SL.SL&quot; that are equally arranged in the sub-scanning direction constitute a unit pattern group SLG, and the unit pattern group SLG has two Arranged in a row in the main scanning direction. Further, in the third embodiment, the openings SLal, SLa2, SLa3, SLb1, SLb2, SLb3, SLcl, SLc2, and SLc3 are collectively referred to as .SL. The unit pattern group is set as the unit pattern groups SLG5, SLG6, and SLG7 from the _γ side in the second mask portion 361d, and is set as the bit pattern groups SLG8 and SLG9 from the -γ side in the second mask portion 361e. SLG 10. First, the first mask portion 361d will be described. The openings of each unit pattern group SLG5, SLG6, and SLG7 are formed separately! Any one of the widths in the sub-scanning direction of SLa2 and SLa3 is the same width R1, and one of the opening portions SLa and the opening portion SLa adjacent to the sub-scanning direction are arranged at the same pitch h2. On the other hand, the widths Ryl 'Ry2 and Ry3 of the openings SLal, SLa2, and SLa3 arranged in the main scanning direction are enlarged from the γ-side to the opening on the ❹ + Υ side. That is, the width Ryl of the opening portion SLal in the main scanning direction is the narrowest, and the width Ry3 of the opening portion SLa3 in the main scanning direction is the widest. Next, the second mask portion 3616 will be described. Each of the widths of the opening portions SLbi, SLb2, and SLb3 of the respective unit pattern groups SLG8 SLG9 and SLG10 in the main scanning direction is the same-width. On the other hand, the widths Rx1, Rx2, and RX3 of the openings SLM, SLb2, and SLb3 arranged in the sub-scanning direction are enlarged from the γ-side to the +γ-side opening. That is, the width Rxl of the opening portion SLbl in the main scanning direction is the most 136304.doc - 37. 200937135, and the width Rx3 of the opening portion _ is the widest. Further, the one opening portion and the portions adjacent to the sub-scanning direction are arranged at the same pitch H3. &lt;3-2-2. The scale of the width in the main scanning direction and the sub-scanning direction of the opening is different&gt;

Further, in addition to the above-described embodiment, the width in the main scanning direction and the sub-scanning direction of the opening portion SL from the _γ side toward the +Υ side opening portion may be increased, that is, the plurality of opening portions SL may be the same. The pitch is arranged in a row in the sub-scanning direction, and as the opening portion SL is changed from the -Y side to the +γ side, the width in the main scanning direction and the width in the sub-scanning direction are expanded by the magnification. As an example, it demonstrates based on FIG. The unit pattern group SLG is formed by four opening portions SLc arranged in a line in the main scanning direction, and the unit pattern group is sequentially set to the unit pattern groups SLG11, SLG12, and SLG13 from the _¥ side. Further, the certain opening portion SLc and the opening portion SLc adjacent to the sub-scanning direction are arranged at the same pitch H4. On the other hand, the widths Ry4, Ry5, and Ry6 in the main scanning direction of the openings SLcl, SLc2, and SLC3 arranged in the main scanning direction and the widths Rx4, Rx5, and Rx6 in the sub-scanning direction change from the -Y side. The opening on the +γ side is enlarged. That is, the opening SLcl is the smallest and the opening SLc3 is the largest. Further, it has been described that the width in the main scanning direction and the sub-scanning direction of the opening SL is increased from the -Y side toward the +γ side, and the expansion may be a solid magnification (equal magnification) or may be Magnification other than the fixed magnification. In the above embodiment, the case where the opening portion has a rectangular stripe shape is described. However, the shape of the opening portion is not limited thereto. For example, an opening portion of 136304.doc -38 - 200937135 shown in Fig. 20 or a substantially "<" shape opening portion shown in Fig. 21 may be formed on one of the masks 361. As described above, a plurality of openings are arranged on the surface of the sheet mask 361 in the direction of the brush to form a unit pattern group, and a unit pattern group having a different shape or the like is arranged in the main scanning direction. The first _36b of the mask unit 36 moves to move the mask in the main scanning direction, so that the irradiation target of the pulsed light from the exposure head can be switched between a certain unit pattern group and another unit pattern group. Further, the stage moving mechanism uses the irradiation position of the light on the photosensitive material to move relatively and continuously in the scanning direction with respect to the photosensitive material, and on the other hand, the pattern is drawn by the pulsed light. Thereby, in the pattern drawing device, it is possible to easily draw a plurality of kinds of regular patterns on the photosensitive material without replacing the mask. Further, any of the above-described third embodiment and the third embodiment in which the colored pattern is formed, and the photomask 361 used in the second embodiment in which the pattern of the black matrix BM and the alignment mark Am are formed, A plurality of Φ openings corresponding to those having a negative photoresist on the upper surface of the substrate 9 are formed. In the case of a negative photoresist, the exposed portion remains as a pattern, and in the case of a positive photoresist, the unexposed portion (light-shielding portion) remains as a pattern, so that when a positive photoresist is applied, it is used. a light-shielding portion and a light-shielding portion of the light shielding cover opposite to the above. &lt;4. Modifications&gt; Although an embodiment of the present invention has been described above, the present invention is not limited to the above embodiment. In the above embodiment, for example, as shown in FIG. 9, a plurality of opening portions SL are regularly arranged on the mask 361ac in the direction of the sub-sweep 136304.doc - 39 - 200937135 to form a plurality of unit pattern groups SLG1, SLG2. SLG; 3, SLG4, and the self-γ side are regularly arranged in the main scanning direction. In the above embodiment, the opening position of the opening portion SL in one unit pattern group and the opening position of the opening portion SL in the other unit pattern group are arranged on the same straight line in the main scanning direction, but Can not be placed on the same line. For example, in the conventional pattern drawing device, if the width of the range in which the image can be drawn by one exposure head 30 is set to, for example, 50 mm by one pulse light, R (red), g (green), B (blue) The distance between the sub-pixel regions is about 3 pm for each color. Therefore, it is necessary to use the reticle unit 36 to position the reticle 361 in the sub-scanning direction, for example, in the first scan and the second scan. Precision shifting in the sub-scanning direction. In this case, for example, as shown in Fig. 22, a plurality of types of unit pattern groups SLG corresponding to the shift in the sub-scanning direction can be formed in advance on the mask 361 (in the figure, the mask 361ac). According to this configuration, the mask 361 can be moved only in the main scanning direction without moving in the sub-scanning direction to draw a pattern corresponding to each scanning area As. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side view showing the configuration of a pattern drawing device. Fig. 2 is a plan view showing the configuration of the pattern drawing device. Fig. 3 is a plan view showing the configuration of a reticle unit. Fig. 4 is a block diagram showing the connection between the respective portions of the pattern drawing device and the control portion. Fig. 5(a) is a view showing an example of the position of the sub-pixel region formed on the substrate 9 to be processed by the pattern drawing device 1, and Fig. 5(b) is 136304.doc • 40-200937135 Figure. ', a flow chart of the flow of the drawing process in the pattern drawing device. Fig. 7 is a view showing an example of a substrate to be processed. The figure shows a diagram showing an example of the positional relationship between the gap area of the target area and the scanning area. Fig. 9 is a view showing a reticle used when each of the scanning regions includes a portion of the adjacent drawing target region. Fig. 1A is a view showing the transition of the substrate state during the operation of drawing the colored pattern. Fig. 11 is a view showing the transition of the state of the substrate during the operation of drawing the colored pattern. Fig. 12 is a view showing the transition of the state of the substrate during the operation of drawing the colored pattern. Fig. 13 is a view showing the transition of the state of the substrate during the operation of drawing the black matrix pattern and the alignment mark pattern. Fig. 14 is a view showing the transition of the state of the substrate during the operation of drawing the black matrix pattern and the alignment mark pattern. Fig. 15 is a view showing the transition of the state of the substrate during the operation of drawing the black matrix pattern and the alignment mark pattern. Figure 16 is a diagram showing other alignment mark patterns. Fig. 17 is a view showing a mask for a colored pattern and a mask for a black matrix pattern arranged on a single mask. Fig. 18 is a view showing a configuration in which the width in the main scanning direction 136304.doc - 41 - 200937135 or the sub-scanning direction is enlarged as the opening portion is changed from the -Υ side to the +Υ side. Fig. 19 is a view showing a configuration in which the width in the main scanning direction and the width in the sub-scanning direction are enlarged at equal magnifications as the opening portion is changed from the _γ side to the +γ side. Fig. 20 is a view showing another embodiment of Fig. 19; Figure 21 is a view showing another embodiment of Figure 19. Fig. 22 is a view showing a reticle when the openings are not arranged on the same straight line in the main scanning direction. [Description of main component symbols] _ 1 Pattern drawing device 9 Substrate 30 ' 30a to 30d Exposure head 36 Photomask unit 36a Holding portion 36b First medium moving portion 36c Rail 36d Second driving portion 361 Photoreceptor 361a Colored pattern mask 361b Black matrix pattern 361c alignment mark pattern 361d first mask portion 361e second mask portion 40 imaging portion 136304.doc -42- 200937135

❹ 41 , 42 , 43 , 44 Alignment camera 50 Control unit 60 , 60a to 60d Traceable range At Drawing target area As Scan area Α ν Clearance area AM Alignment mark BM Black matrix HI, H2, H3, H4 Sub-scanning direction The pitch LP light passes through the mouth P. The distance of the unit pattern group in the main scanning direction is the distance Rs. The starting position R1, R2 The width of the opening Rx1 to Rx6 The width of the opening in the sub-scanning direction Ry 1 to Ry6 The main scanning direction of the opening Width SH Shading portion SL Opening portion SLG Unit pattern group w Specific width (width of one scanning area) wSLG Width of unit pattern group wAs Width of scanning area wAt Width of drawing object area in one scanning area wAv Width of gap area 136304. Doc -43- 200937135 wLP Light through the width of the mouth wSH The width of the shade

136304.doc -44-

Claims (1)

200937135 X. Patent Application Range: 1. A pattern drawing device for drawing a regular pattern on each of a plurality of stroke object regions of a substrate on which a photosensitive material is formed, and comprising: a light source; a mask mechanism a unit pattern group is formed on the substrate by passing light from the light source, and the unit pattern group forms a unit image as a part of the specific image, and a plurality of openings are regularly arranged in the sub-scanning direction; a plurality of exposure mechanisms for intermittently illuminating the photosensitive material on the substrate through the light of the opening of the mask mechanism to expose the pattern; and a main scanning mechanism for causing the substrate to be exposed to the exposure The mechanism moves relative to each other in the main scanning direction; the sub-scanning mechanism moves the substrate relative to the exposure mechanism in the sub-scanning direction; and the reticle moving mechanism causes the reticle mechanism to be in the main scanning direction and/or Or moving in the sub-scanning direction to arrange the opening of the mask mechanism to a specific position; The unit pattern group is formed on the mask mechanism such that at least two types of movements of the substrate corresponding to the main scanning mechanism and/or the sub-scanning mechanism are moved by the mask moving mechanism. The mask mechanism 'selects one of the unit pattern groups formed on the mask mechanism and exposes it. The pattern drawing device of claim 1, wherein the plurality of exposure mechanisms relatively move the substrate in a main scanning direction and a sub-scanning direction orthogonal to each other, and start from the substrate The plurality of scanning areas specified for each specific width in the sub-scanning direction are respectively subjected to exposure scanning in the main scanning direction; • % is formed by a plurality of the above-mentioned single (four) case groups of the above-mentioned mask mechanism. The scanning area is regularly arranged in the main scanning direction. The pattern drawing device of claim 1 or 2, wherein a width of a sub-scanning direction of the plurality of unit pattern groups of the mask mechanism is compared with the above-described green color included in each of the domain scanning regions of the exposure mechanism of the exposure mechanism The width of the target area is set in the sub-scanning direction. 4. The pattern drawing device according to claim 1 or 2, wherein the plurality of unit pattern groups have a unit pattern group in which at least two light passage openings and a light shielding portion are arranged in the sub-scanning direction, wherein the at least two The light passing through the mouth portion is formed by arranging the openings, and the light blocking portion is formed to have a specific length between the light passing openings. 5. The pattern drawing device of claim 1 or 2, wherein the plurality of unit pattern groups of the reticle mechanism include a plurality of unit pattern groups in which a scale of a main scanning direction and/or a sub-scanning direction of the opening 相互 are different from each other . The pattern drawing device of claim 5, wherein any one of the plurality of openings constituting the unit pattern group is arranged in the sub-scanning direction at a pitch of 136304.doc 200937135. The pattern drawing device of claim 1 or 2, wherein the mask mechanism further has a reference pattern as a reference point of an image formed on the substrate. 8. The pattern drawing device of claim 1 or 2, wherein said mask mechanism further has a right pattern for identifying an identification pattern. 9. A pattern depicting 'method' characterized by: a patterning device for each of a plurality of drawing object regions of the substrate on which the photosensitive material is formed, the patterning device comprising a light source and a mask In the mask mechanism, a unit pattern group is formed on the substrate by passing light from the light source, and the unit pattern group forms a unit image as a part of the specific image, and has a plurality of opening regularities. Arranged in the sub-scanning direction; and includes: a scanning step of intermittently irradiating light passing through the opening portion of the mask mechanism onto the photosensitive material on the substrate, and exposing the plurality of exposure mechanisms to expose the substrate to the exposure mechanism by performing the main scanning a main scanning mechanism that relatively moves in the direction and/or a sub-scanning mechanism that moves relatively intermittently in the sub-scanning direction, and the substrate is relatively moved in a main scanning direction orthogonal to the sub-scanning direction and from the substrate Starting from the starting position, performing exposure scanning in the main scanning direction for a plurality of scanning areas defined by each specific width in the sub-scanning direction; and 136304.doc 200937135 a mask selection step of moving the mask mechanism by the mask moving mechanism in response to movement of the substrate by the main scanning mechanism and/or the sub-scanning mechanism before the scanning step, and selecting the mask One of the above-described unit pattern groups formed on the mask mechanism is exposed. 136304.doc