CN104460239A - Manufacturing method of photomask sub-plate with code - Google Patents
Manufacturing method of photomask sub-plate with code Download PDFInfo
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- CN104460239A CN104460239A CN201410648593.2A CN201410648593A CN104460239A CN 104460239 A CN104460239 A CN 104460239A CN 201410648593 A CN201410648593 A CN 201410648593A CN 104460239 A CN104460239 A CN 104460239A
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Abstract
The invention relates to a manufacturing method of a photomask sub-mask with a code. The method comprises the following steps: providing a photomask master mask, and forming photomask patterns on the master mask; producing a bar code on a transmission sheet, arranging the transmission sheet on the non-pattern edge of the photomask master mask, and enabling the bar code to face the photomask master mask; selecting a sub-mask material with a photoresist layer, arranging the photomask master mask onto the sub-mask material, and enabling the photomask pattern to face the photoresist layer; exposing, developing and etching the well-arranged transmission sheet, the photomask master mask and the sub-mask material, and forming a needed code on the sub-mask material to obtain the photomask sub-mask. According to the method, by virtue of the transmission sheet, the bar code on the transmission sheet is transferred to the photomask sub-mask, and the photomask sub-mask is coded, so that convenience in distinguishing and management can be realized, and the product safety and operability can be greatly improved.
Description
Technical field
The present invention relates to masking techniques field, be specifically related to a kind of band encoded light cover version manufacture method.
Background technology
Along with the high speed development of nowadays electronic industry, light shield application also expands thereupon, and current light shield is widely used in the manufacturings such as TP, LED, IC, is also one of requisite important mould of every profession and trade.Traditional light shield manufacture process is as follows: with soda glass or quartz glass for base material, plate one deck chromium (Cr) layer in its surface and form light shield layer, then on layers of chrome, plate one deck chromium oxide layer, finally at chromium oxide layer surface coating one deck photoresists; Software control exposure device is used to carry out electron beam exposure or laser explosure to it; Again by chemical reaction, namely by chemical liquid photoresists and part layers of chrome removed thus form the pictorial pattern needed for deviser, pictorial pattern chromium being imprinted in glass-based version and namely becoming light shield.
Light shield is divided into again photolithography plate and sub-version, and photolithography plate refers to that its advantage is that pictorial pattern arbitrarily can be changed by deviser by light shield out made by beamwriter lithography or laser lithography, but the time made is longer.Sub-version refers to and the pictorial pattern of photolithography plate is copied to by light source the light shield that an other version is formed.Its advantage is that Production Time is very short, but pictorial pattern is more single, can only be the same with the pictorial pattern on the photolithography plate provided, and effect is contrary.
On general light shield, the pictorial pattern size of institute's chromium print is micron or Nano grade, when light shield is more, when particularly pictorial pattern is all the same, it is needed for oneself that the naked eyes general very first time is difficult to accurately differentiate and find out that light shield, in order to differentiate light shield fast, we can when making light shield, by beamwriter lithography or laser lithography mode, some filenames be made up of Chinese character and English alphabet are added at light shield edge, or add some bar codes at light shield edge, English is Bar code, the information such as the field that record light shield uses and Production Time, so that differentiation light shield.But when sub-version makes, a reticle (being referred to as mother matrix below) can copy at most 100 multiple sub-versions, the pictorial pattern of factor version and filename are all living, and user is difficult to effectively distinguish, and product line also will serve trouble by band more or less.Because the restriction of technical elements, when making sub-version, traditional method has: 1, do not add bar code, and the method can not distinguish sub-version effectively; 2, by hand-written mode, after sub-version photoetching, coding is write, to distinguish with sharp-pointed iron pin at sub-version edge before development.Handwriting sckeme can realize the object distinguishing sub-version, but comes with some shortcomings, and as development cause can not distinguish graph area and non-graphic district effectively, is easy to coding to write in graph area, causes scrapping during hand-written coding.
Summary of the invention
In view of this, provide that a kind of security is high, the band encoded light cover version manufacture method of strong operability, distinguish and the sub-version of management light shield to facilitate.
A kind of band encoded light cover version manufacture method, it comprises the steps:
Light shield mother matrix is provided, mother matrix forms mask pattern;
A light transmission piece makes bar code, light transmission piece is placed in the edge of the non-pattern of light shield mother matrix, and make bar code in the face of light shield mother matrix;
Choose the sub-version plate with photoresist layer, light shield mother matrix is placed on sub-version plate, and makes mask pattern regard to photoresist layer;
The light transmission piece placed, light shield mother matrix and sub-version plate are exposed, development, etching, sub-version plate is formed required coding, the obtained required sub-version of light shield.
Compared with prior art, above-mentioned band encoded light cover version manufacture method at least has following benefit:
1. add coding by said method to daughter board, facilitate when daughter board pictorial pattern is identical with filename, more effectively to distinguish;
2. add coding by said method to daughter board, security is high, avoids scrapping of daughter board;
3. the coding added by said method is more clear, attractive in appearance, and carries out barcode scanning record by code reader, and more convenient user carries out unifying to distinguish and management;
4. the bar code of light transmission piece can be arranged arbitrarily as required, and the method by changing light transmission piece changes sub-version coding, thus makes the sub-version of light shield of different coding, greatly improve the operability of sub-version numeralization, avoid the loaded down with trivial details of traditional handicraft and complexity.
Accompanying drawing explanation
Fig. 1 is the band encoded light cover version manufacture method flowage structure schematic diagram that the embodiment of the present invention provides.
Embodiment
Below with reference to specific embodiments and the drawings, the present invention is described in detail.
Bar code in light transmission piece, by light transmission piece, is transferred to the sub-version of light shield, is encoded to the sub-version of light shield by the band encoded light cover version manufacture method of the embodiment of the present invention, is convenient to distinguish and management.Below in conjunction with Fig. 1, the method is described, specifically comprises the steps:
S01: provide light shield mother matrix 10, mother matrix 10 is formed mask pattern 11;
S02: make bar code in a light transmission piece 20, light transmission piece 20 is placed in the edge of the non-pattern of light shield mother matrix 10, and make bar code in the face of light shield mother matrix 10;
S03: choose the sub-version plate 30 with photoresist layer 33, is placed on sub-version plate 30 by light shield mother matrix 10;
S04: the light transmission piece 20 placed, light shield mother matrix 10 and sub-version plate 30 are exposed, development, etching, forms required coding 12 at sub-version plate 30, the obtained required sub-version 10a of light shield.
As shown in the figure, light shield mother matrix 10 can be prepared in advance or make.During concrete making, first use litho machine photoetching light shield, light mask image pattern is contrary with the pictorial pattern of required light shield mother matrix, and size and required light shield reticle size are too.。Exemplarily, in the present embodiment, light shield mother matrix 10 length and width are 127mm, and be a square light shield, thickness is 5 cun.The pictorial pattern 11 of light shield mother matrix 10 is for simple " ten " font.Certainly, be understandable that, above physical dimension and pattern are example, designing and making as required during practical application.
In step S02, light transmission piece is preferably silver salt photographic film, such as, can be made by PC, PP, PET or PVC etc.Light transmission piece 20 length is wider than light shield mother matrix 10 or sub-version plate 30 about 6-10 mm.In the present embodiment, light transmission piece 20 length is 137mm, and width is determined as required, writing bar code, can be placed in the non-pattern edge of light shield mother matrix 10 just passable.In the present embodiment, the width of light transmission piece 20 is for 10mm, light transmission piece 20 is placed in light shield mother matrix 10 non-membrane surface edge, namely do not have the edge of figuratum one side shown in figure, the edge of pattern one side can certainly be placed on, not affect the design transfer of light shield mother matrix 10 to sub-version as well.Bar code 22 is preferably numerical coding, alphabetic coding or numeral and monogram is encoded or bar code, and the present embodiment is preferably bar code, so that by machine recognition, and convenient management.The transmittance of light transmission piece 20 is more than 80%, and thickness is 0.1-0.8mm, is preferably film, and to be attached to bar code in light transmission piece 20 22 be not light-permeable.In addition, the bar code 22 in light transmission piece 20 also can back to light shield mother matrix 10.
Making effect and the sub-version of required light shield 30 of the bar code 22 of light transmission piece 20 are encoded, and to make effect contrary, and such as, when the making effect of required light shield version 30 coding is that face word is just black, bar code 22 effect of light transmission piece 20 is that face word is cracked down upon evil forces; The making effect of encoding when the sub-version 30 of required light shield is that face word highlights, and bar code 22 effect of light transmission piece 20 is that face word is just white.Encoding position depending on the sub-version 30 of required light shield in bar code 22 position, is generally edge placed in the middle.As shown in the figure, during placement, light transmission piece 20 long side direction two ends protrude from light shield mother matrix 10 or sub-version plate 30 about 3-8 mm respectively, and the present embodiment is for each outstanding 5mm in both sides.
As shown in the figure, sub-version plate 30 is pre-formed with photoresist layer 33, and sub-version plate 30 has the film plating layer 32 in substrate 31 and substrate 31.Sub-version plate 30 is preferably chromium plate, and namely film plating layer 32 is layers of chrome 32.Substrate 31 is preferably glass substrate, as soda glass or quartz glass.Sub-version plate 30 size is identical with required light shield version size, can be positioned over orlop, and light shield mother matrix 10 is placed on sub-version plate 30, and makes mask pattern 11 regard to photoresist layer 33.Light shield mother matrix 10 and sub-version plate 30 measure-alike.
Wherein, between step S02 and S03, operation can be carry out simultaneously, or carries out in no particular order.And, the bar code 22 of light transmission piece 20 and sub-version plate 30 can well in advances separately, and then stack with light shield mother matrix 10, stack order and are preferably sub-version plate 30 at orlop, then put mask pattern 11, then light transmission piece 20 is stacked in below mask pattern 11 edge.That is, light transmission piece 20 and sub-version plate 30 are located at light shield mother matrix 10 along the both sides on exposure light direction with overlapped way respectively.
After placing sub-version plate 30, light shield mother matrix 10 and light transmission piece 20, expose with mercury lamp, then develop, the process such as etching, namely obtain the sub-version 10a of required light shield, as shown in the figure, the sub-version 10a of light shield has the pattern 11 corresponding with light shield mother matrix 10 and designed coding 22.
It should be noted that; the present invention is not limited to above-mentioned embodiment, and according to creative spirit of the present invention, those skilled in the art can also make other changes; these changes done according to creative spirit of the present invention, all should be included within the present invention's scope required for protection.
Claims (10)
1. be with an encoded light cover version manufacture method, it comprises the steps:
Light shield mother matrix is provided, mother matrix forms mask pattern;
A light transmission piece makes bar code, light transmission piece is placed in the edge of the non-pattern of light shield mother matrix;
Choose the sub-version plate with photoresist layer, light shield mother matrix is placed on sub-version plate, and makes mask pattern regard to photoresist layer;
The light transmission piece placed, light shield mother matrix and sub-version plate are exposed, development, etching, sub-version plate is formed required coding, the obtained required sub-version of light shield.
2. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, described light transmission piece length is wider than light shield mother matrix or sub-version plate 6-10mm.
3. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, described light transmission piece long side direction two ends protrude from light shield mother matrix or sub-version plate 3-8mm respectively.
4. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, make bar code in the face of light shield mother matrix when described light transmission piece is placed, the bar pattern that described light transmission piece makes is contrary with the coding pattern of the sub-version of required light shield.
5. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, the transmittance of described light transmission piece is more than 80%, and the thickness of described light transmission piece is 0.1-0.8mm.
6. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, described sub-version plate comprises substrate, suprabasil layers of chrome, and described photoresist layer is formed in described layers of chrome.
7. band encoded light cover version manufacture method as claimed in claim 1, is characterized in that, described bar code is numerical coding, alphabetic coding or numeral and monogram encode or bar code.
8. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, the step that described light transmission piece makes bar code and is positioned over light shield mother matrix with choose the sub-version plate with photoresist layer and the step being positioned over light shield mother matrix is carried out simultaneously or carries out in no particular order.
9. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, described exposure light source is mercury lamp, and described light transmission piece is film.
10. band encoded light cover version manufacture method as claimed in claim 1, it is characterized in that, described light transmission piece and sub-version plate are located at light shield mother matrix along the both sides on exposure light direction with overlapped way respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410648593.2A CN104460239A (en) | 2014-11-14 | 2014-11-14 | Manufacturing method of photomask sub-plate with code |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410648593.2A CN104460239A (en) | 2014-11-14 | 2014-11-14 | Manufacturing method of photomask sub-plate with code |
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| CN104460239A true CN104460239A (en) | 2015-03-25 |
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| CN201410648593.2A Pending CN104460239A (en) | 2014-11-14 | 2014-11-14 | Manufacturing method of photomask sub-plate with code |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106125516A (en) * | 2016-08-19 | 2016-11-16 | 京东方科技集团股份有限公司 | A kind of exposure method, substrate and exposure device |
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| CN1770016A (en) * | 2004-11-03 | 2006-05-10 | 力晶半导体股份有限公司 | Optical mask management method and bar code identification apparatus |
| CN101329505A (en) * | 2007-06-18 | 2008-12-24 | 中芯国际集成电路制造(上海)有限公司 | Layout for reducing aberration sensitiveness, light shield manufacture and graphic method |
| US20090162758A1 (en) * | 2007-12-20 | 2009-06-25 | Osamu Ikenaga | Photomask having code pattern formed by coding data conversion process information, photomask formation method, and semiconductor device fabrication method |
| CN101520610A (en) * | 2008-02-28 | 2009-09-02 | 大日本网屏制造株式会社 | Pattern describing apparatus and pattern describing method |
| TW201113631A (en) * | 2009-10-14 | 2011-04-16 | Evervision Electronics Co Ltd | Improved light mask manufacturing process |
| US20130337370A1 (en) * | 2012-06-13 | 2013-12-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photomask and method for forming the same |
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2014
- 2014-11-14 CN CN201410648593.2A patent/CN104460239A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1770016A (en) * | 2004-11-03 | 2006-05-10 | 力晶半导体股份有限公司 | Optical mask management method and bar code identification apparatus |
| CN101329505A (en) * | 2007-06-18 | 2008-12-24 | 中芯国际集成电路制造(上海)有限公司 | Layout for reducing aberration sensitiveness, light shield manufacture and graphic method |
| US20090162758A1 (en) * | 2007-12-20 | 2009-06-25 | Osamu Ikenaga | Photomask having code pattern formed by coding data conversion process information, photomask formation method, and semiconductor device fabrication method |
| CN101520610A (en) * | 2008-02-28 | 2009-09-02 | 大日本网屏制造株式会社 | Pattern describing apparatus and pattern describing method |
| TW201113631A (en) * | 2009-10-14 | 2011-04-16 | Evervision Electronics Co Ltd | Improved light mask manufacturing process |
| US20130337370A1 (en) * | 2012-06-13 | 2013-12-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photomask and method for forming the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106125516A (en) * | 2016-08-19 | 2016-11-16 | 京东方科技集团股份有限公司 | A kind of exposure method, substrate and exposure device |
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Application publication date: 20150325 |
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