CN107121890A - A kind of nano-imprint stamp and preparation method thereof - Google Patents
A kind of nano-imprint stamp and preparation method thereof Download PDFInfo
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- CN107121890A CN107121890A CN201710537845.8A CN201710537845A CN107121890A CN 107121890 A CN107121890 A CN 107121890A CN 201710537845 A CN201710537845 A CN 201710537845A CN 107121890 A CN107121890 A CN 107121890A
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- nano
- imprint stamp
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The preparation method and nano-imprint stamp of a kind of nano-imprint stamp, this method include：Substrate is provided, shading strip is formed on the substrate, the substrate is divided into multiple regions, one nano-imprint stamp unit to be spliced of each region correspondence by the shading strip；The coating impressing glue on the substrate and the shading strip；The nano-imprint stamp unit is stamped on the impressing glue in its corresponding region；From side irradiating ultraviolet light of the substrate away from the impressing glue so that the impressing adhesive curing；The nano-imprint stamp unit is stripped from the impressing glue；Impressing glue uncured on the shading strip is removed, to form the nano-imprint stamp.
Description
Technical field
The present invention relates to nanometer embossing, espespecially a kind of nano-imprint stamp and preparation method thereof.
Background technology
To pursue smaller characteristic size, it is to avoid optical lithography bottleneck, nano-imprint process is big by Minnesota ,USA at first
Learn and propose, belong to Next Generation Lithography, be a kind of inexpensive, efficient nano-scale patterns transfer techniques.Research shows pressure
The minimum feature size of print can reach 10nm.
Nano impression formboard used in impressing is generally made of technologies such as electron beam lithographies at present, it is impossible to make big
The nano impression formboard of size.And for large-sized display product, if pressed using the nano-imprint stamp of small size
Printing is made, and technology difficulty is big, and efficiency is low, and the large scale that making is obtained shows that the quality of product is difficult to ensure that.
The content of the invention
In order to solve the above-mentioned technical problem, an at least embodiment of the invention provides a kind of nano-imprint stamp and its preparation
Method, realizes the making of large-area nano impression block.
In order to reach the object of the invention, an at least embodiment of the invention provides a kind of preparation side of nano-imprint stamp
Method, including：
Substrate is provided, shading strip is formed on the substrate, the substrate is divided into multiple regions by the shading strip, often
One nano-imprint stamp unit to be spliced of individual region correspondence；
The coating impressing glue on the substrate and the shading strip；
The nano-imprint stamp unit is stamped on the impressing glue in its corresponding region；
From side irradiating ultraviolet light of the substrate away from the impressing glue so that the impressing adhesive curing；
The nano-imprint stamp unit is stripped from the impressing glue；
Impressing glue uncured on the shading strip is removed, to form the nano-imprint stamp.
In an alternate embodiment of the present invention, methods described also includes, and removes the screening on the nano-imprint stamp
Striation.
In an alternate embodiment of the present invention, the shading strip is made up of metal or black resin.
In an alternate embodiment of the present invention, the metal is the one or more in chromium, molybdenum, aluminium.
In an alternate embodiment of the present invention, multiple first alignment marks, the nano impression mould are included on the substrate
Include the second alignment mark corresponding with first alignment mark on Slab element；
The described nano-imprint stamp unit is stamped on the impressing glue in its corresponding region includes：
According to first alignment mark and the second alignment mark by the nano-imprint stamp unit and the substrate pair
Behind position, the nano-imprint stamp unit is stamped on the impressing glue in its corresponding region.
In an alternate embodiment of the present invention, each region and the nano-imprint stamp unit are rectangle；
The cross mark that first alignment mark is made up of for four apexes in each region shading strip, it is described
Second is labeled as being arranged on the square frame mark of four apexes of the nano-imprint stamp unit；
Or,
First alignment mark is the square frame mark for four apexes for being arranged on each region, second mark
It is designated as being arranged on the cross mark of four apexes of the nano-imprint stamp unit.
In an alternate embodiment of the present invention, using the nano-imprint stamp as mother matrix, replicate obtaining by flexibility
The nano-imprint stamp that material is made.
In an alternate embodiment of the present invention, the nano-imprint stamp list is formed by electron beam lithography and dry carving technology
Member；
Or,
After electron beam lithography and dry carving technology formation nano-imprint stamp unit mother matrix, replicate obtaining flexible material
Expect the nano-imprint stamp unit being made.
In an alternate embodiment of the present invention, the flexible material is dimethyl silicone polymer or fluoropolymer.
One embodiment of the invention also provides nano impression prepared by a kind of preparation method using above-mentioned nano-imprint stamp
Template.
Compared with correlation technique, in an at least embodiment of the invention, multiple nano-imprint stamp units are subjected to impressing spelling
The nano-imprint stamp for obtaining large area is connect, so as to realize that large-area nano is imprinted, formation efficiency is improved, reduction is produced into
This, can support large scale to show the making of product.
Other features and advantages of the present invention will be illustrated in the following description, also, partly becomes from specification
Obtain it is clear that or being understood by implementing the present invention.The purpose of the present invention and other advantages can be by specification, rights
Specifically noted structure is realized and obtained in claim and accompanying drawing.
Brief description of the drawings
Accompanying drawing is used for providing further understanding technical solution of the present invention, and constitutes a part for specification, with this
The embodiment of application is used to explain technical scheme together, does not constitute the limitation to technical solution of the present invention.
The preparation method flow chart for the nano-imprint stamp that Fig. 1 provides for one embodiment of the invention；
The preparation method schematic diagram for the nano-imprint stamp that Fig. 2 (a)~Fig. 2 (j) provides for one embodiment of the invention.
Embodiment
For the object, technical solutions and advantages of the present invention are more clearly understood, below in conjunction with accompanying drawing to the present invention
Embodiment be described in detail.It should be noted that in the case where not conflicting, in the embodiment and embodiment in the application
Feature can mutually be combined.
Can be in the computer system of such as one group computer executable instructions the step of the flow of accompanying drawing is illustrated
Perform.And, although logical order is shown in flow charts, but in some cases, can be with suitable different from herein
Sequence performs shown or described step.
Unless otherwise defined, the technical term or scientific terminology that the disclosure is used should be tool in art of the present invention
The ordinary meaning that the personage for having general technical ability is understood." first ", " second " that is used in the disclosure and similar word are simultaneously
Any order, quantity or importance are not indicated that, and is used only to distinguish different parts." comprising " or "comprising" etc.
The element or object that similar word means to occur before the word cover the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or machinery connection, but electrical connection can be included, it is either directly or indirect." on ", " under ",
"left", "right" etc. is only used for representing relative position relation, and after the absolute position for being described object changes, then the relative position is closed
System may also correspondingly change.
Nano-imprint stamp that the application is provided and preparation method thereof is further illustrated below by specific embodiment.
Embodiment one
In the present embodiment, the nano impression mould that splicing impressing obtains large area is carried out using multiple nano-imprint stamp units
Plate.As shown in figure 1, the present embodiment provides a kind of preparation method of nano-imprint stamp, including：
Step 101 forms shading strip on the substrate there is provided substrate, and the substrate is divided into many by the shading strip
Individual region, one nano-imprint stamp unit to be spliced of each region correspondence.
For example, the substrate is transparent material.The transparent material can be quartz, resin.Certainly, the application is not limited
In this, other transparent materials can be used.
For example, forming shading strip on the substrate includes：Pass through the formation shading of array patterning processes on the substrate
Bar.
In the present embodiment, patterning processes are, for example, lithography patterning process, its for example including：Needing patterned structure
Photoresist layer is coated on layer, photoresist layer is exposed using mask plate, the photoresist layer of exposure is developed to obtain
Photoetching agent pattern, is etched using photoetching agent pattern to structure sheaf, then alternatively removes photoetching agent pattern.As needed,
Patterning processes can also be silk-screen printing, inkjet printing methods etc..
For example, the shading strip can be metal or dark resin, such as black.The metal include chromium,
One or more among molybdenum, aluminium.Or other metal materials certainly,.
For example, the shading strip is including a plurality of.The multiple area size shape can be with identical, can also be different.
, can also will be different to carry out splicing the nano-imprint stamp for obtaining large area to multiple the same nano-imprint stamp units
Nano-imprint stamp unit carries out splicing to obtain the nano-imprint stamp of large area.
For example, the width of the shading strip can be according to the sensor of actual production or display product size, BM (black
Matrix, black matrix) position etc. arranged, and reduces influence as far as possible.
Step 102, the coating impressing glue on the substrate and the shading strip；
For example, the impressing glue can be coated on the substrate and the shading strip by spin coating technique.
For example, the impressing glue is ultraviolet photocureable material, preferably siliceous ratio is higher, and ratio of viscosities is relatively low, ultra-violet curing
Required dosage is small, the strong material of etch resistance.
Step 103, the nano-imprint stamp unit is stamped on the impressing glue in its corresponding region.
For example, nano-imprint stamp cell size of each area size respectively with impressing over the region is consistent.
Wherein, the nano-imprint stamp unit is directed at into the substrate to press by gas or solid, by the nanometer
The nano-pattern unit of impression block unit is stamped on the impressing glue of the substrate.
Step 104, from side irradiating ultraviolet light of the substrate away from the impressing glue so that the impressing adhesive curing；
Step 105, the nano-imprint stamp unit is stripped from the impressing glue；
Step 106, impressing glue uncured on the shading strip is removed, to form the nano-imprint stamp.
For example, impressing glue uncured on the shading strip can be removed by way of development.
In an alternative embodiment, multiple first alignment marks, the nano-imprint stamp unit are included on the substrate
Including the second alignment mark corresponding with first alignment mark.
The impressing glue that the nano-imprint stamp unit is stamped in into its corresponding region in the step 103 includes：Root
, will be described after aligning the nano-imprint stamp unit and the substrate according to first alignment mark and the second alignment mark
Nano-imprint stamp unit is stamped on the impressing glue in its corresponding region.
Wherein, the pattern of the first alignment mark and the second alignment mark can be the same or different.Such as, it can use
Cross pattern, square frame pattern, triangle pattern etc..
First alignment mark can simultaneously be generated when the shading strip is generated, it is of course also possible to individually use one
Procedure is generated.Second alignment mark can be used in the nano-pattern on generating nano-imprint stamp unit to expose with along with
Etching technics is generated, and individually can also generate the second alignment mark using a procedure.
For example, when each region and the nano-imprint stamp unit are rectangle：
First alignment mark can be the cross mark that is made up of the shading strip of four apexes in each region,
Described second is labeled as being arranged on the square frame mark of four apexes of the nano-imprint stamp unit；
Or, first alignment mark is the square frame mark for four apexes for being arranged on each region, described
Second is labeled as being arranged on the cross mark of four apexes of the nano-imprint stamp unit.
It should be noted that it is merely illustrative using alignment mark progress contraposition, other contraposition sides can be used as needed
Formula.
It should be noted that the cross mark that can constitute the shading strip of four apexes is as alignment mark,
Which part only can be used as alignment mark.
Certainly, in other embodiments, other can not also be set using shading strip as alignment mark on the substrate
Alignment mark, as long as enabling the nano-imprint stamp unit to be impressed into its corresponding region.
The preparation method for the nano-imprint stamp that the present embodiment is provided, by setting shading strip on substrate, receives described
Multiple regions that rice impression block unit impressing is separated to form by the shading strip on the substrate, ultimately generate and are received by multiple
The nano-imprint stamp of rice impression block unit spliced.Impressing glue quilt above herein described scheme, the shading strip
The shading strip is blocked, and will not be cured in UV curing process, is removed in follow-up developing process, therefore, most throughout one's life
Into nano-imprint stamp splicing seams size it is controllable (being determined by the shading strip).
In an alternative embodiment, in addition to, step 107, remove the shading strip on the nano-imprint stamp.
For example, when the shading strip is metal, metal etch liquid can be used to perform etching the removal shading strip.Need
Illustrate, the application not limited to this, the shading strip can be removed using other modes.
Wherein it is possible to directly carry out nano impression using the nano-imprint stamp obtained by step 106 and step 107, also may be used
As mother matrix, replicate and obtain more large-area nano impression blocks.In an alternative embodiment, in addition to, step 108,
Using the nano-imprint stamp as mother matrix, carry out replicating the nano-imprint stamp for obtaining and being fabricated from a flexible material.
For example, the flexible material is dimethyl silicone polymer (PDMS) or fluoropolymer.The fluoropolymer
Including at least one of：PFPE, ethylene-tetrafluoroethylene copolymer, mercaptan-alkene (per) fluoropolymer.PDMS is to impressing glue
Compatibility preferably, and price is relatively low.
Because imprint process is more serious to the loss ratio of large-area nano impression block, large area imprinting template is fabricated to
This is higher, therefore, and using the nano-imprint stamp of gained as mother matrix, the nano-imprint stamp that duplication obtains multiple flexible materials enters
The follow-up imprint process of row, then will not damage mother matrix.And because the cost of flexible material nano-imprint stamp is than relatively low, so as to
To reduce nano impression cost.
In other embodiments, can also be using the nano-imprint stamp as mother matrix, progress, which is replicated, obtains metal material
The nano-imprint stamp being made.A kind of copy mode is as follows：One layer of 10 nanometers of left side are first formed by sputtering technology in master mold version
Right metal seed layer, by electroplating technology, forms the 500um~1mm coat of metal, by stripping technology, by master mold version and
Metal matrix is separated.The metal material can be carbon steel, carborundum or metallic nickel.
In an alternative embodiment, in addition to：
Step 100, the nano-imprint stamp unit mother matrix is formed by electron beam lithography and dry carving technology；Nanometer is pressed
Stamp Slab element mother matrix, which replicate, obtains the nano-imprint stamp unit that flexible material is made.
For example, by electron beam lithography and the nano-imprint stamp unit mother matrix of dry carving technology formation can by silicon or
Person's quartz is made.
For example, the flexible material is PDMS or fluoropolymer.The fluoropolymer includes at least one of：
PFPE, ethylene-tetrafluoroethylene copolymer, mercaptan-alkene (per) fluoropolymer.
Due to flexible material nano-imprint stamp unit cost than relatively low, therefore, obtain multiple by replicate
The mode that splicing impressing obtains the nano-imprint stamp unit of large area is carried out after nano-imprint stamp unit again, system can be reduced
The cost of standby large-area nano impression block.
In other embodiments, can also be directly using electron beam lithography and the nano impression mould of dry carving technology formation
Slab element carries out splicing impressing.
It should be noted that what the preparation method of above-mentioned nano-imprint stamp can also be imprinted as a kind of large-area nano
Implementation method.
The preparation method for the nano-imprint stamp that the application is provided is further illustrated below by Fig. 2 (a) to Fig. 2 (j).
As shown in Fig. 2 (a), pass through electron beam lithography and dry carving technology formation nano-imprint stamp unit 1；The nano impression
Modular unit 1 can be made up of silicon or quartz.
As shown in Fig. 2 (b), the nano-imprint stamp unit 1 is replicated, multiple PDMS soft templates 2 are obtained.
As shown in Fig. 2 (c), shading strip 4 is formed on the substrate 3, wherein it is possible to pass through array patterning processes formation shading strip
4.Substrate 3 can be using transparent materials such as glass or resins.Shading strip 4 can use metal or black resin material.Hide
Substrate 3 is divided into multiple regions 5, one nano-imprint stamp unit of each region correspondence by striation 4.Wherein, each region summit
The shading strip at place constitutes alignment mark 6 (cruciform pattern in Fig. 2 (c) in square frame).The cross pattern is with being located at nanometer pressure
Square frame mark on stamp Slab element is corresponded.Certainly, alignment mark can also be the square frame pattern in Fig. 2 (c).Fig. 2 (c)
In in order to illustrate to show two kinds of marks, in practice only use a kind of alignment mark.
As shown in Fig. 2 (d), the coating impressing glue 7 on substrate 3 and shading strip 4.As shown in Fig. 2 (e), entered with alignment mark 6
Row contraposition, PDMS soft templates 2 are stamped on the impressing glue in its corresponding region.
As shown in Fig. 2 (f), from side (i.e. the back side of the substrate 3) irradiating ultraviolet light 8 of substrate 3 away from the impressing glue 7, make
Obtain the impressing glue 7 to solidify, the impressing glue 7-1 and uncured impressing glue 7-2 solidified.It should be noted that shading strip 4
On impressing glue 7-2 due to being blocked by the shading strip 4, it is therefore uncured.
As shown in Fig. 2 (g), by the PDMS soft templates 2 from separation on the impressing glue 7 so as to realize the demoulding.
As shown in Fig. 2 (h), the uncured impressing glue 7-2 in the top of shading strip 4 is removed by developing.Specific development is real
Existing mode refer to correlation technique, and here is omitted.
As shown in Fig. 2 (i), the shading strip 4 is removed by metal etch liquid, so as to obtain nano-imprint stamp 9.
As shown in Fig. 2 (j), the nano-imprint stamp 9 pour and replicates the nano impression for obtaining being made up of PDMS
Template 10.
One embodiment of the invention also provides nano impression prepared by a kind of preparation method using above-mentioned nano-imprint stamp
Template.
Have it is following some need explanation：
(1) accompanying drawing of the embodiment of the present invention relate only to the present embodiments relate to structure, other structures refer to
It is commonly designed.
(2) for clarity, in the accompanying drawing for describing embodiments of the invention, the thickness in layer or region is exaggerated
Or reduce, i.e., these accompanying drawings are not drawn according to actual ratio.It is appreciated that ought such as layer, film, region or substrate etc
When element is referred to as being located at "above" or "below" another element, the element " direct " can be located at "above" or "below" another element, or
Person may have intermediary element.
(3) in the case where not conflicting, the feature in embodiments of the invention and embodiment can be mutually combined to obtain
New embodiment.
Although disclosed herein embodiment as above, described content be only readily appreciate the present invention and use
Embodiment, is not limited to the present invention.Technical staff in any art of the present invention, is taken off not departing from the present invention
On the premise of the spirit and scope of dew, any modification and change, but the present invention can be carried out in the form and details of implementation
Scope of patent protection, still should be subject to the scope of the claims as defined in the appended claims.
Claims (10)
1. a kind of preparation method of nano-imprint stamp, it is characterised in that including：
Substrate is provided, shading strip is formed on the substrate, the substrate is divided into multiple regions, Mei Gequ by the shading strip
Domain one nano-imprint stamp unit to be spliced of correspondence；
The coating impressing glue on the substrate and the shading strip；
The nano-imprint stamp unit is stamped on the impressing glue in its corresponding region；
From side irradiating ultraviolet light of the substrate away from the impressing glue so that the impressing adhesive curing；
The nano-imprint stamp unit is stripped from the impressing glue；
Impressing glue uncured on the shading strip is removed, to form the nano-imprint stamp.
2. preparation method as claimed in claim 1, it is characterised in that methods described also includes, removes the nano impression mould
The shading strip on plate.
3. preparation method as claimed in claim 1, it is characterised in that the shading strip is made up of metal or black resin.
4. preparation method as claimed in claim 3, it is characterised in that the metal is the one or more in chromium, molybdenum, aluminium.
5. preparation method as claimed in claim 1, it is characterised in that
Include including and first register guide on multiple first alignment marks, the nano-imprint stamp unit on the substrate
Remember corresponding second alignment mark；
The described nano-imprint stamp unit is stamped on the impressing glue in its corresponding region includes：
After the nano-imprint stamp unit and the substrate are aligned according to first alignment mark and the second alignment mark,
The nano-imprint stamp unit is stamped on the impressing glue in its corresponding region.
6. preparation method as claimed in claim 5, it is characterised in that
Each region and the nano-imprint stamp unit are rectangle；
The cross mark that first alignment mark is made up of for four apexes in each region shading strip, described second
Labeled as the square frame mark for four apexes for being arranged on the nano-imprint stamp unit；
Or,
First alignment mark is the square frame mark for four apexes for being arranged on each region, and described second is labeled as
It is arranged on the cross mark of four apexes of the nano-imprint stamp unit.
7. preparation method as claimed in claim 1, it is characterised in that methods described also includes：By the nano-imprint stamp
As mother matrix, carry out replicating the nano-imprint stamp for obtaining and being fabricated from a flexible material.
8. preparation method as claimed in claim 1, it is characterised in that methods described also includes：
The nano-imprint stamp unit is formed by electron beam lithography and dry carving technology；
Or,
After electron beam lithography and dry carving technology formation nano-imprint stamp unit mother matrix, carry out replicating the flexible material system of acquisition
Into the nano-imprint stamp unit.
9. preparation method as claimed in claim 7 or 8, it is characterised in that the flexible material be dimethyl silicone polymer or
Person's fluoropolymer.
10. nano impression mould prepared by a kind of preparation method of any described nano-imprint stamp of usage right requirement 1 to 9
Plate.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710537845.8A CN107121890A (en) | 2017-07-04 | 2017-07-04 | A kind of nano-imprint stamp and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710537845.8A CN107121890A (en) | 2017-07-04 | 2017-07-04 | A kind of nano-imprint stamp and preparation method thereof |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108008598A (en) * | 2017-11-30 | 2018-05-08 | 深圳市华星光电技术有限公司 | The manufacture method of impression block |
| CN109116680A (en) * | 2018-09-27 | 2019-01-01 | 京东方科技集团股份有限公司 | Impression block and preparation method thereof |
| CN110244510A (en) * | 2019-07-31 | 2019-09-17 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN110361930A (en) * | 2019-07-16 | 2019-10-22 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN110824835A (en) * | 2019-11-26 | 2020-02-21 | 京东方科技集团股份有限公司 | Spliced nano-imprint template, repair method of spliced seam of template and manufacturing method of template |
| CN112731763A (en) * | 2020-12-31 | 2021-04-30 | 嘉兴驭光光电科技有限公司 | Method for manufacturing micro-nano optical device |
| WO2022023040A1 (en) | 2020-07-31 | 2022-02-03 | Morphotonics Holding B.V. | Welding method for creating an upscaled master |
| WO2022067613A1 (en) * | 2020-09-30 | 2022-04-07 | 镭亚电子(苏州)有限公司 | Printing template and manufacturing method therefor |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080299467A1 (en) * | 2007-05-31 | 2008-12-04 | Samsung Electronics Co., Ltd. | Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold |
| CN202373292U (en) * | 2011-12-28 | 2012-08-08 | 无锡光群雷射科技有限公司 | Splice stamping master mask with grain patterns |
| JP2014013902A (en) * | 2013-07-30 | 2014-01-23 | Dainippon Printing Co Ltd | Mold for optical imprint and method of manufacturing the same |
| CN105911815A (en) * | 2016-05-24 | 2016-08-31 | 京东方科技集团股份有限公司 | Manufacturing system and method of nano-imprinting template |
-
2017
- 2017-07-04 CN CN201710537845.8A patent/CN107121890A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080299467A1 (en) * | 2007-05-31 | 2008-12-04 | Samsung Electronics Co., Ltd. | Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold |
| TW200848921A (en) * | 2007-05-31 | 2008-12-16 | Samsung Electronics Co Ltd | Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold |
| CN202373292U (en) * | 2011-12-28 | 2012-08-08 | 无锡光群雷射科技有限公司 | Splice stamping master mask with grain patterns |
| JP2014013902A (en) * | 2013-07-30 | 2014-01-23 | Dainippon Printing Co Ltd | Mold for optical imprint and method of manufacturing the same |
| CN105911815A (en) * | 2016-05-24 | 2016-08-31 | 京东方科技集团股份有限公司 | Manufacturing system and method of nano-imprinting template |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108008598A (en) * | 2017-11-30 | 2018-05-08 | 深圳市华星光电技术有限公司 | The manufacture method of impression block |
| CN108008598B (en) * | 2017-11-30 | 2021-07-02 | Tcl华星光电技术有限公司 | Method for manufacturing imprint template |
| CN109116680A (en) * | 2018-09-27 | 2019-01-01 | 京东方科技集团股份有限公司 | Impression block and preparation method thereof |
| CN110361930A (en) * | 2019-07-16 | 2019-10-22 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN110244510A (en) * | 2019-07-31 | 2019-09-17 | 京东方科技集团股份有限公司 | A kind of nano-imprint stamp and preparation method thereof |
| CN110824835A (en) * | 2019-11-26 | 2020-02-21 | 京东方科技集团股份有限公司 | Spliced nano-imprint template, repair method of spliced seam of template and manufacturing method of template |
| CN110824835B (en) * | 2019-11-26 | 2023-05-12 | 京东方科技集团股份有限公司 | Spliced nano-imprint template, repair method of spliced seam of spliced nano-imprint template and manufacturing method of spliced nano-imprint template |
| WO2022023040A1 (en) | 2020-07-31 | 2022-02-03 | Morphotonics Holding B.V. | Welding method for creating an upscaled master |
| WO2022067613A1 (en) * | 2020-09-30 | 2022-04-07 | 镭亚电子(苏州)有限公司 | Printing template and manufacturing method therefor |
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