JP3409785B2 - Pattern forming method and plasma display device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for patterning a thick film or the like on a substrate, and a plasma display display device used as an image display device such as a computer monitor or a television.

[0002]

2. Description of the Related Art At present, there are many display panels using a thick film represented by a plasma display, a field emission display, an electroluminescence display and the like, some of which are commercially available and some of which are under development. Among them, an AC type plasma display panel (hereinafter, referred to as “PDP”) is expected as a large-sized display that can realize a size of 40 inches or more.

This PDP has a front panel 116 and a rear panel 106 as shown in FIG.
The display electrode 103 and the black stripe 114 are formed on the front glass substrate 102, and the display electrode 103 and the black stripe 114 are further covered with the dielectric glass layer 104 and the dielectric protective layer 105 made of magnesium oxide (MgO). .

The rear panel 106 is formed by providing an address electrode 108, a partition 110, and a phosphor layer 111 on a rear glass substrate 107. And, such front panel 116 and rear panel 106
Are pasted together with a peripheral sealing material (not shown),
A discharge space 112 is formed by filling a discharge gas in a space partitioned by the partition wall 110 through an exhaust pipe 113.
For color display, the phosphor layer is usually red, green,
The three colors of blue are arranged in order.

In the discharge space 112, a discharge gas formed by mixing, for example, neon and xenon is usually 66500.
It is sealed at a pressure of about Pa (500 Torr).

[0006] The discharge gas is irradiated with ultraviolet rays by discharge with a periodic voltage which is usually applied to address electrodes, display electrodes, etc., and the fluorescent material is converted into visible light for image display.

Among these manufacturing processes, patterning by a photo process using a thick film material containing a photosensitive material is often used.

As a display electrode of a front panel, a thick film material made of a metal such as silver containing an inorganic substance such as glass is usually used. This is a thick film material containing a photosensitive material and an electrode material. A desired electrode pattern is obtained by forming it on the surface, partially curing the photosensitive material by an exposure process, and removing an unnecessary portion by a development process.

However, the patterning of the electrodes may be performed a plurality of times. For example, when patterning is performed using a metal material as a main component, the reflectivity is often high, which deteriorates display quality such as bright place contrast when viewed from the display surface. In order to prevent this, it is general to form a metal antireflection layer made of a black filler such as ruthenium oxide between the metal material and the substrate (Japanese Patent Laid-Open No. 10-255670).

Further, it is known to dispose black stripes made of a black filler or the like between pixels in order to shield unnecessary discharge light.

The plural kinds of thick film materials are aligned with each other by an alignment marker. That is, when the first pattern is exposed, an alignment marker is provided together with the pattern, and development and baking are performed, and the alignment marker can be referred to in the second and subsequent exposures to perform alignment. (JP-A-11-300484).

[0012]

In order to shorten the process for the purpose of cost reduction, etc., only the material forming process and the exposing process are repeated without passing through the developing process in a plurality of photo processes, and finally the batch process is performed. It is conceivable to carry out the development process by
In this case, however, the step of developing the first pattern is eliminated, so that the alignment marker created at the same time as the first pattern cannot be referred to when the second pattern is exposed. Therefore, it is difficult to align the relative positions of the first pattern and the second pattern, and there is a problem that a shift occurs between the plurality of patterns.

A first object of the present invention is to perform the step of forming an alignment marker on the first pattern and performing the step of aligning the relative positions of the first pattern and the second pattern with high accuracy without passing through the developing step. It is to provide a pattern forming method.

A second object of the present invention is to provide a plasma display device having an electrode formed by the above method.

[0015]

To achieve the above first object, the present invention is directed to forming a first thick film containing at least a first inorganic component and a photosensitive resin on a substrate and passing a first photomask through it. And a second thick film containing at least a second inorganic component and a photosensitive resin is formed in the first step.
A pattern forming method comprising a second step of forming a pattern on a thick film and performing pattern exposure through a second photomask, comprising a step of forming an alignment marker on the first thick film in the first thick film forming step. In the first thick film exposure step and the second thick film exposure step, there is provided a pattern forming method, which comprises performing pattern exposure by aligning a photomask with reference to the alignment marker.

For the above-mentioned second purpose, a first step of forming a first thick film containing at least a first inorganic component and a photosensitive resin on a substrate and performing pattern exposure through a first photomask, A pattern forming method including a second step of forming a second thick film containing at least a second inorganic component and a photosensitive resin on the first thick film, and performing pattern exposure through a second photomask, 1 Thick film forming process
A step of forming an alignment marker on the first thick film, wherein in the first thick film exposure step and the second thick film exposure step, pattern alignment is performed by aligning a photomask with reference to the alignment marker. The present invention provides a plasma display display device comprising an electrode manufactured by a pattern forming method characterized by performing the above.

[0017]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

(Embodiment 1) FIG. 1 is a process chart for explaining one embodiment of a pattern forming method of the present invention.

(First Step) At least a non-reflective black powder material and an electrode anti-reflection layer paste material containing a photosensitive material are applied on the substrate 1 by a screen printing method and dried to form a rectangular electrode anti-reflection layer solid. Obtain the membrane 3. The electrode antireflection layer photomask 4 is used to expose the electrode antireflection layer solid film 3 (FIG. 1A).

By this step, the color of the portion irradiated with the ultraviolet rays is different from that of the portion not irradiated with the ultraviolet rays, and the alignment marker 12 is formed (FIG. 1 (b)). More preferably, the alignment marker 1 is prepared by previously containing a dye such as a cyanine dye that fades with ultraviolet rays in the electrode reflection layer paste.
The detection of 2 can be performed more significantly, and is more preferable.

(Second Step) A rectangular electrode solid layer 21 is applied by a screen printing method with an electrode material containing at least an inorganic powder material and a photosensitive material, and dried (FIG. 1C).

(Third Step) The electrode solid layer 21 is exposed using the photomask 23 for electrodes. At this time,
Mask alignment is performed with reference to the mask marker 22 on the electrode photomask 23 and the alignment marker 12 on the substrate (FIG. 1D).

(Embodiment 2) FIG. 2 is a process chart for explaining another embodiment of the pattern forming method of the present invention.

(First Step) At least a non-reflective black powder material and an electrode anti-reflection layer paste material containing a photosensitive material are applied onto the substrate 1 by a screen printing method and dried to form a rectangular electrode anti-reflection layer solid. Obtain the membrane 3. The electrode antireflection layer photomask 4 is used to expose the electrode antireflection layer solid film 3 (FIG. 2A).

(Second Step) With the photomask 4 left as it is, a black light shielding plate 25 is inserted between the substrate and the light source, and exposure is performed again (FIG. 2B). As a result, the formed alignment marker 12 is formed (see FIG. 2).
(C)).

The present embodiment is more effective when it is difficult to detect the alignment marker 12 by only the first step for exposing the pattern portion. That is, in the second step of exposing the whole by shielding the light by the light shield 25, the progress of the exposure of the pattern portion is stopped and only the marker portion 12 is irradiated with the intense light. Can be easily detected.

(Third Step) A rectangular second electrode solid layer 21 is applied by a screen printing method with a second electrode material containing at least an inorganic powder material and a photosensitive material, and dried (FIG. 2 (d)). .

(Fourth Step) As in the fourth step of the first embodiment, the second electrode solid layer is exposed using the photomask for the second electrode. At this time, mask alignment is performed by referring to the mask marker on the second electrode photomask and the alignment marker on the substrate (not shown).

Although an embodiment has been described in which light is shielded by the black light shielding plate in the second step, it is not necessary that the light is black as long as light can be shielded. Also, it may be in the form of a film.

Further, the same effect can be obtained by irradiating only the marker portion with the spot light.

In the above-mentioned embodiments, all examples of different kinds of electrode materials are shown. However, even when the same material is used and different patterns are formed by the first electrode and the second electrode, for example. Needless to say, it can be used.

Further, as long as it is a step of aligning the relative positions of a plurality of thick film patterns without performing development, it can be applied to steps other than the electrode and steps other than the PDP.

Although the photo-bleaching dye is contained to detect the color change of the alignment marker 21 after the exposure, if the material characteristics are changed by the light at the time of the pattern exposure, the present invention is not limited to the above. For example, an electrode antireflection layer solid film containing polyvinylcarbazole,
The pattern formation was also possible by a method of detecting the alignment marker portion by changing the film thickness by light irradiation, a method of containing a liquid crystal material and changing the refractive index of the alignment marker portion by light irradiation, and the like.

[0034]

As described in detail above, according to the present invention,
It is possible to align a plurality of types of photosensitive thick film patterning without going through a developing process, and the effect is great.

[Brief description of drawings]

FIG. 1 is a process drawing for explaining a pattern forming method according to a first embodiment of the present invention.

FIG. 2 is a process diagram for explaining a pattern forming method according to a second embodiment of the present invention.

FIG. 3 is a perspective view showing a configuration of a plasma display.

[Explanation of symbols]

1 substrate 2 Alignment marker Photomask for 4-electrode antireflection layer Photomask for 7 electrodes 25 light shield

─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hideki Ashida 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Mitsuhiro Otani 1006 Kadoma, Kadoma City, Osaka Matsushita Electric Industrial Co., Ltd. (72) Inventor Shinya Fujiwara 1006 Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Inventor Hideyo Tono 1006 Kadoma, Kadoma City, Osaka Matsushita Electric Industrial Co., Ltd. (72) Inventor Sei Nakagawa 1006 Kadoma, Kadoma, Osaka Prefecture, Matsushita Electric Industrial Co., Ltd. (72) Inventor Noriyuki Kirihara 1006 Kadoma, Kadoma, Osaka Prefecture Matsuda Electric Industrial Co., Ltd. (72) Mitsuo Asabe Kadoma, Osaka Prefecture 1006 Kadoma, Shizuoka, Matsushita Electric Industrial Co., Ltd. (56) Reference JP-A-3-163727 (JP, A) JP-A-3-59560 (JP, ) Patent Akira 60-238836 (JP, A) JP 2001-308001 (JP, A) JP flat 11-300484 (JP, A) (58 ) investigated the field (Int.Cl. ^7, DB name) G03F 1/00-1/16 G03F 7/20-7/24 H01J 11/00-17/64

Claims (6)

(57) [Claims] 1. A first step of forming a first thick film containing at least a first inorganic component and a photosensitive resin on a substrate and performing pattern exposure through a first photomask; and a second inorganic component and photosensitivity. forming a second thick containing a resin at least on the first thick film, a pattern forming method comprising a second step of patterning exposure through a second photomask, the extent of the first factory, in the first step Pattern exposure
Using the first photomask at the time of
Only the liment marker part is stronger than when the pattern is exposed.
By irradiating with strong light , the first
And a step of forming an alignment marker on a thick film, before Symbol extent second factory, performing the <br/> pattern exposure of the second thick film by performing the alignment of the photomask with reference to the alignment markers And a pattern forming method. 2. The pattern forming method according to claim 1 , wherein the method of irradiating only the alignment marker portion with light is whole exposure with the pattern portion shielded by a light shield. 3. A method of irradiating light only to the alignment marker portion, a pattern forming method according to any one of claims 1 to 2, characterized in that a spot light irradiation to the alignment marker portions only. 4. The first thick film contains a material that is discolored by light, and formation of an alignment marker on the first film comprises:
The pattern forming method according to any one of claims 1 to 3 , wherein the first thick film is changed in color. 5. The first thick film contains a material whose refractive index changes by light, and the alignment marker is formed on the first film by changing the refractive index of the first thick film. the pattern forming method according to any one of claims 1 to 4. 6. A first step of forming a first thick film containing at least a first inorganic component and a photosensitive resin on a substrate and performing pattern exposure through a first photomask; a second inorganic component and photosensitivity. Second containing at least resin
Forming a thick film on the first thick film, a pattern forming method comprising a second step of patterning exposure through a second photomask, the extent of the first factory, pattern exposure in the first step
Using the first photomask at the time of
Only the liment marker part is stronger than when the pattern is exposed.
By irradiating with strong light, the first
Have a step of forming an alignment marker on a thick film, before Symbol extent second Engineering, and performs a reference pattern exposure of the second thick of performing an alignment of the photomask said alignment markers method of manufacturing a plasma display device according to claim manufacture to Rukoto the electrode by the patterning method.