CN111752109A - Substrate exposure device and method for roll-to-roll double-sided digital photoetching - Google Patents
Substrate exposure device and method for roll-to-roll double-sided digital photoetching Download PDFInfo
- Publication number
- CN111752109A CN111752109A CN202010703181.XA CN202010703181A CN111752109A CN 111752109 A CN111752109 A CN 111752109A CN 202010703181 A CN202010703181 A CN 202010703181A CN 111752109 A CN111752109 A CN 111752109A
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- exposure
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- substrate
- lenses
- wheel
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- 239000000758 substrate Substances 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 32
- 238000001259 photo etching Methods 0.000 title claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 86
- 230000001360 synchronised effect Effects 0.000 claims description 42
- 238000007599 discharging Methods 0.000 claims description 24
- 239000011521 glass Substances 0.000 claims description 17
- 238000001459 lithography Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
Abstract
A substrate exposure device for roll-to-roll double-sided digital photoetching comprises a substrate leveling mechanism, an upper exposure lens assembly and a lower exposure lens assembly, wherein the substrate leveling mechanism comprises a substrate supporting mechanism and a substrate tensioning mechanism, the substrate supporting mechanism comprises a supporting frame base and a supporting surface, and the supporting surface is fixedly arranged on the supporting frame base; the invention also provides a base material exposure method for roll-to-roll double-sided digital photoetching. Compared with the prior art, the invention has the advantages that in the using process, the base material is tensioned in the horizontal direction and supported in the vertical direction, so that the flatness of the surface of the base material is improved, and the consistency of the exposure surface of the base material and the focal plane of an exposure lens is effectively ensured; the device has the advantages of greatly improving the core indexes such as the resolution, the alignment precision and the like of the exposure pattern, along with simple structure, easy processing, low cost and simple operation, and greatly reduces the workload and the material loss while improving the productivity and the product processing range.
Description
Technical Field
The invention relates to the technical field of digital photoetching, in particular to a substrate exposure device and a substrate exposure method for roll-to-roll double-sided digital photoetching.
Background
In a digital lithography and exposure system, ensuring the flatness of a substrate (an exposure or lithography object) is crucial to ensuring the quality of an exposed image. The decrease in flatness causes the substrate to be out of the focal plane of the exposure lens, thereby deteriorating various indexes such as resolution and alignment accuracy of the exposure pattern.
Double-sided roll-to-roll substrates, which require simultaneous exposure of both sides, are commonly used in organic film substrates by tensioning both ends of the roll substrate (as shown in fig. 1) in order not to obstruct the optical path. However, for a copper strip with a certain thickness and length, because the copper strip is not a rigid structure, the gravity action can cause the tensioned substrate to sink in the middle, and the magnitude of the sinking depends on the weight of the copper strip and the tension tensioned at two ends. The thicker and longer the copper strip, the greater the gravity, and the tension required to keep the substrate within the effective range of the focal plane tends to exceed the limits of the equipment.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a substrate exposure device for roll-to-roll double-sided digital photoetching, which comprises the following steps:
the technical scheme of the invention is realized as follows:
the utility model provides a substrate exposure device for two-sided digital photoetching of volume to volume, includes substrate levelling mechanism and goes up exposure lens subassembly, lower exposure lens subassembly, it includes a plurality of last exposure lens that set up in rows to go up the exposure lens subassembly, and adjacent go up that horizontal distance is the same between the exposure lens, down the exposure lens subassembly includes a plurality of lower exposure lens that set up in rows, and adjacent down horizontal distance is the same between the exposure lens, substrate levelling mechanism includes:
the substrate supporting mechanism comprises a supporting frame base and a supporting surface, and the supporting surface is fixedly arranged on the supporting frame base;
a base material tensioning mechanism, which comprises a material discharging end and a material receiving end arranged at the two ends of the supporting surface,
the upper exposure lens and the lower exposure lens are respectively arranged on the upper surface and the bottom surface of the supporting surface in a corresponding and non-contact manner, and the lenses of the upper exposure lens and the lower exposure lens are opposite to the supporting surface.
Preferably, the discharging end comprises a first pressing rubber wheel and a tension wheel, the first pressing rubber wheel is installed above the tension wheel, the receiving end comprises a second pressing rubber wheel and a conveying wheel, and the second pressing rubber wheel is installed above the conveying wheel.
Preferably, the first pressing rubber wheel and the second pressing rubber wheel are consistent in structure and size, the tension wheel and the conveying wheel are consistent in structure and size, and the discharging joint of the discharging end and the receiving joint of the receiving end are on the same horizontal plane.
Preferably, the tension wheel and the conveying wheel are driven to rotate by a servo motor.
Preferably, the two ends of the supporting surface are arranged between the discharging connector and the receiving connector, and the supporting surface, the discharging connector and the receiving connector are located on the same horizontal plane.
Preferably, the support surface is a glass surface.
Preferably, the supporting surface includes a moving guide rail arranged on the base of the supporting frame, a plurality of synchronous rollers capable of moving along the guide rail are arranged on the inner side of the moving guide rail, the distance between adjacent synchronous rollers is the same, the lower exposure lens includes a plurality of exposure lenses, and the distance between adjacent exposure lenses is the same as the distance between adjacent synchronous rollers.
The invention also provides a substrate exposure method for roll-to-roll double-sided digital photoetching, wherein the support surface adopted by the substrate is a glass support surface, and the method comprises the following steps:
1) in the process of conveying the coil base material, the exposure lens does not output laser, the material receiving end is tensioned, the servo motor controls the conveying wheel to rotate forwards, and the base material is supported by the glass supporting surface under the tensioning of the tension wheel at the material discharging end for conveying and unreeling;
2) after the base material is conveyed, the material receiving end is tensioned, the servo motor controls the conveying wheel to stop, and the base material is supported by the glass supporting surface under the tensioning of the tension wheel at the material discharging end and is ready for exposure of the section of the base material;
3) before exposure starts, the glass supporting surface is wiped clean, after exposure starts, an exposure area of the lower exposure lens is not shielded, after the exposure lens completes exposure of the current area, the exposure lens moves transversely, in the transverse movement, the exposure lens does not output light and does not perform exposure work, after the transverse movement is completed, exposure of the next area is performed, and the process is circulated until exposure of the whole image is completed.
Another substrate exposure method for roll-to-roll double-sided digital photoetching is provided, wherein a supporting surface adopted by a substrate is a synchronous guide rail arranged on the inner side of a moving guide rail, and the method comprises the following steps:
1) in the process of conveying the coil base material, the exposure lens does not output laser, the material receiving end is tensioned, the servo motor controls the conveying wheel to rotate forwards, and the base material is supported by the synchronous roller under the tensioning of the tension wheel at the material discharging end for conveying;
2) after the base material is conveyed, the material receiving end is tensioned, the servo motor controls the conveying wheel to stop, and the base material is supported by the synchronous roller under the tensioning of the tension wheel at the material discharging end to prepare for exposure of the section of the base material;
3) after exposure is started, each synchronous roller corresponds to two lower exposure lenses which are closest to the lower part of the synchronous roller, the synchronous roller and the two corresponding lower exposure lenses are not on the same vertical plane, the exposure area of the lower exposure lenses is not shielded, when the upper exposure lenses and the lower exposure lenses finish exposure of the current area, the upper exposure lenses and the lower exposure lenses perform transverse movement, the upper exposure lenses and the lower exposure lenses do not output light during the transverse movement and do not perform exposure, at the moment, the synchronous roller performs synchronous transverse movement, after the transverse movement is finished, exposure of the next area is performed, and the process is circulated until exposure of the whole image is finished.
Preferably, the horizontal distance between the adjacent lower exposure lenses is the same as the horizontal distance between the adjacent synchronous rollers, and during exposure, the synchronous rollers are located on the vertical middle line of the connecting line between the two corresponding lower exposure lenses.
Compared with the prior art, the invention has the following beneficial effects:
according to the substrate exposure device for roll-to-roll double-sided digital photoetching, in the using process, the substrate is tensioned in the horizontal direction and supported in the vertical direction, so that the flatness of the surface of the substrate is improved, and the consistency of the exposure surface of the substrate and the focal plane of an exposure lens is effectively guaranteed; the device greatly improves the core indexes such as the resolution and the alignment precision of the exposure pattern, has simple structure, easy processing, low cost and simple operation; the double-sided simultaneous exposure can be met, the continuous exposure of the coil stock is realized, the productivity and the product processing range are improved, and meanwhile, the workload and the material loss are greatly reduced.
Drawings
FIG. 1 is a schematic view of a substrate exposure apparatus according to the prior art;
FIG. 2 is a schematic structural diagram of a substrate exposure apparatus for roll-to-roll double-sided digital lithography according to the present invention (the support surface is a glass surface);
FIG. 3 is a schematic structural diagram of a substrate exposure apparatus for roll-to-roll double-sided digital lithography according to the present invention (the supporting surface is a roller);
FIG. 4 is a schematic view of a substrate support mechanism according to the present invention (the support surface is a roller).
In the figure: the upper exposure lens assembly 100, the upper exposure lens 110, the lower exposure lens assembly 200, the lower exposure lens 210, the substrate supporting mechanism 300, the supporting frame base 310, the supporting surface 320, the moving guide 330, the synchronous roller 340, the substrate tensioning mechanism 400, the material discharging end 410, the first pressing rubber wheel 411, the tension wheel 412, the material receiving end 420, the second pressing rubber wheel 421 and the carrying wheel 422.
Detailed Description
The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown.
As shown in fig. 2 and 3, a substrate exposure apparatus for roll-to-roll double-sided digital lithography includes a substrate leveling mechanism, an upper exposure lens assembly 100 and a lower exposure lens assembly 200, wherein the upper exposure lens assembly 100 includes a plurality of upper exposure lenses 110 arranged in a row, and the horizontal distance between adjacent upper exposure lenses 110 is the same, the lower exposure lens assembly 200 includes a plurality of lower exposure lenses 210 arranged in a row, and the horizontal distance between adjacent lower exposure lenses 210 is the same, the substrate leveling mechanism includes:
a substrate support mechanism 300, said substrate support mechanism 300 comprising a support base 310 and a support surface 320, said support surface 320 being fixedly mounted on said support base 310;
a substrate tensioning mechanism 400, the substrate tensioning mechanism 400 includes a discharge end 410 and a receiving end 420 disposed at two ends of the supporting surface 320,
the upper exposure lens 110 and the lower exposure lens 210 are respectively disposed on the upper surface and the bottom surface of the supporting surface 320 in a corresponding and non-contact manner, and the lenses of the upper exposure lens 110 and the lower exposure lens 210 are opposite to the supporting surface 320.
The discharge end 410 comprises a first pressing rubber wheel 411 and a tension wheel 412, the first pressing rubber wheel 411 is installed above the tension wheel 412, the receiving end 420 comprises a second pressing rubber wheel 421 and a conveying wheel 422, and the second pressing rubber wheel 421 is installed above the conveying wheel 422.
The first pressing rubber wheel 411 and the second pressing rubber wheel 421 have the same structure and size, the tension wheel 412 and the conveying wheel 422 have the same structure and size, and the discharging joint of the discharging end 410 and the receiving joint of the receiving end 420 are on the same horizontal plane.
The tension wheel 412 and the conveying wheel 422 are driven by a servo motor to rotate, and the tension wheel 412 and the conveying wheel 422 rotate in opposite directions, so that the substrate is tensioned on the supporting surface 320.
The two ends of the supporting surface 320 are arranged between the discharging joint and the receiving joint, and the supporting surface 320, the discharging joint and the receiving joint are located on the same horizontal plane. To ensure that the substrate better conforms to the support surface 320 when tensioned.
An example of a support surface 320 is: the supporting surface 320 is a glass surface, and during operation, the supporting surface 320 of the glass surface can be wiped as clean as possible to avoid the exposure effect of the lower exposure lens 210 on the lower surface of the substrate.
As shown in fig. 4, another example of the support surface 320 is: the supporting surface 320 comprises a moving guide rail 330 arranged on the supporting frame base 310, a plurality of synchronous rollers 340 capable of moving along the moving guide rail 330 are arranged on the inner side of the moving guide rail 330, the distance between the adjacent synchronous rollers 340 is the same, the lower exposure lens 210 comprises a plurality of synchronous rollers, the distance between the adjacent exposure lenses is the same as that between the adjacent synchronous rollers 340, the moving guide rail 330 is controlled by a servo motor to move transversely, and the synchronous rollers 340 move transversely along with the moving guide rail and keep synchronous with the transverse movement of the lower exposure lens 210.
The invention also provides a substrate exposure method for roll-to-roll double-sided digital photoetching, wherein the support surface adopted by the substrate is a glass support surface, and the method comprises the following steps:
1) in the process of conveying the coil base material, the exposure lens does not output laser, the material receiving end is tensioned, the servo motor controls the conveying wheel to rotate forwards, and the base material is supported by the glass supporting surface under the tensioning of the tension wheel at the material discharging end for conveying and unreeling;
2) after the base material is conveyed, the material receiving end is tensioned, the servo motor controls the conveying wheel to stop, and the base material is supported by the glass supporting surface under the tensioning of the tension wheel at the material discharging end and is ready for exposure of the section of the base material;
3) before exposure starts, the glass supporting surface is wiped clean, after exposure starts, an exposure area of the lower exposure lens is not shielded, after the exposure lens completes exposure of the current area, the exposure lens moves transversely, in the transverse movement, the exposure lens does not output light and does not perform exposure work, after the transverse movement is completed, exposure of the next area is performed, and the process is circulated until exposure of the whole image is completed.
The supporting surface adopted by the base material is a synchronous guide rail arranged on the inner side of the movable guide rail, and the method comprises the following steps:
1) in the process of conveying the coil base material, the exposure lens does not output laser, the material receiving end is tensioned, the servo motor controls the conveying wheel to rotate forwards, and the base material is supported by the synchronous roller under the tensioning of the tension wheel at the material discharging end for conveying;
2) after the base material is conveyed, the material receiving end is tensioned, the servo motor controls the conveying wheel to stop, and the base material is supported by the synchronous roller under the tensioning of the tension wheel at the material discharging end to prepare for exposure of the section of the base material;
3) after exposure is started, each synchronous roller corresponds to two lower exposure lenses which are closest to the lower part of the synchronous roller, the synchronous roller and the two corresponding lower exposure lenses are not on the same vertical plane, the exposure area of the lower exposure lenses is not shielded, when the upper exposure lenses and the lower exposure lenses finish exposure of the current area, the upper exposure lenses and the lower exposure lenses perform transverse movement, the upper exposure lenses and the lower exposure lenses do not output light during the transverse movement and do not perform exposure, at the moment, the synchronous roller performs synchronous transverse movement, after the transverse movement is finished, exposure of the next area is performed, and the process is circulated until exposure of the whole image is finished.
The supporting surface adopted by the base material is a synchronous guide rail arranged on the inner side of the movable guide rail, the horizontal distance between the adjacent lower exposure lenses is the same as the horizontal distance between the adjacent synchronous rollers, and during exposure, the synchronous rollers are positioned on the vertical middle line of the connecting line between the two corresponding lower exposure lenses, so that the synchronous rollers cannot shield the exposure area of the lower exposure lenses on the bottom surface of the base material.
According to the invention, the coiled material is unreeled through the base material tensioning mechanism 200, the unreeled base material can be flatly placed on the supporting surface 320, but for the base material exposure processing process, the distance difference of the focal planes of any two points on the base material cannot be larger than 100 micrometers, and the supporting surface 320 which seems to be flat is difficult to ensure the requirement of the exposure focal plane, so that the base material tensioning mechanism 200 tensions the base material after unreeling to ensure that the base material focal plane meets the exposure requirement, thus, the base material tensioning mechanism 200 not only has the unreeling function, but also tensions the base material to ensure that the difference of the base material exposure focal plane is smaller than 100 micrometers during exposure.
According to the invention, in the using process, the base material is tensioned in the horizontal direction and supported in the vertical direction, so that the flatness of the surface of the base material is improved, and the consistency of the exposure surface of the base material and the focal plane of an exposure lens is effectively ensured; the device greatly improves the core indexes such as the resolution and the alignment precision of the exposure pattern, has simple structure, easy processing, low cost and simple operation; the double-sided simultaneous exposure can be met, the continuous exposure of the coil stock is realized, the productivity and the product processing range are improved, and meanwhile, the workload and the material loss are greatly reduced.
Claims (10)
1. The utility model provides a substrate exposure device for two-sided digital photoetching of volume to volume, its characterized in that includes substrate levelling mechanism and goes up exposure lens subassembly, lower exposure lens subassembly, it includes a plurality of last exposure lens that set up in a row to go up the exposure lens subassembly, and adjacent go up between the exposure lens horizontal distance the same, down the exposure lens subassembly includes a plurality of lower exposure lens that set up in a row, and adjacent down between the exposure lens horizontal distance the same, substrate levelling mechanism includes:
the substrate supporting mechanism comprises a supporting frame base and a supporting surface, and the supporting surface is fixedly arranged on the supporting frame base;
a base material tensioning mechanism, which comprises a material discharging end and a material receiving end arranged at the two ends of the supporting surface,
the upper exposure lens and the lower exposure lens are respectively arranged on the upper surface and the bottom surface of the supporting surface in a corresponding and non-contact manner, and the lenses of the upper exposure lens and the lower exposure lens are opposite to the supporting surface.
2. The apparatus of claim 1, wherein the discharge end comprises a first rubber-pressing wheel and a tension wheel, the first rubber-pressing wheel is mounted above the tension wheel, the take-up end comprises a second rubber-pressing wheel and a carrying wheel, and the second rubber-pressing wheel is mounted above the carrying wheel.
3. The apparatus of claim 2, wherein the first and second rubber-pressing wheels have the same structure and size, the tension wheel has the same structure and size as the conveying wheel, and the discharge joint of the discharge end and the receiving joint of the receiving end are on the same horizontal plane.
4. The apparatus according to claim 3, wherein the tension wheel and the conveying wheel are driven by a servo motor to rotate.
5. The apparatus of claim 3, wherein the support surface is disposed between the feeding connector and the receiving connector at both ends, and the support surface is located at the same horizontal plane as the feeding connector and the receiving connector.
6. The apparatus of claim 1, wherein the support surface is a glass surface.
7. The apparatus of claim 1, wherein the support surface comprises a moving rail disposed on a base of the support frame, a plurality of synchronizing rollers are mounted inside the moving rail and can move along the rail, the distance between adjacent synchronizing rollers is the same, the lower exposure lens comprises a plurality of lower exposure lenses, and the distance between adjacent exposure lenses is the same as the distance between adjacent synchronizing rollers.
8. A substrate exposure method for roll-to-roll double-sided digital photoetching is characterized in that a supporting surface adopted by a substrate is a glass supporting surface, and the method comprises the following steps:
1) in the process of conveying the coil base material, the exposure lens does not output laser, the material receiving end is tensioned, the servo motor controls the conveying wheel to rotate forwards, and the base material is supported by the glass supporting surface under the tensioning of the tension wheel at the material discharging end for conveying and unreeling;
2) after the base material is conveyed, the material receiving end is tensioned, the servo motor controls the conveying wheel to stop, and the base material is supported by the glass supporting surface under the tensioning of the tension wheel at the material discharging end and is ready for exposure of the section of the base material;
3) before exposure starts, the glass supporting surface is wiped clean, after exposure starts, an exposure area of the lower exposure lens is not shielded, after the exposure lens completes exposure of the current area, the exposure lens moves transversely, in the transverse movement, the exposure lens does not output light and does not perform exposure work, after the transverse movement is completed, exposure of the next area is performed, and the process is circulated until exposure of the whole image is completed.
9. A substrate exposure method for roll-to-roll double-sided digital photoetching is characterized in that a supporting surface adopted by a substrate is a synchronous guide rail arranged on the inner side of a movable guide rail, and the method comprises the following steps:
1) in the process of conveying the coil base material, the exposure lens does not output laser, the material receiving end is tensioned, the servo motor controls the conveying wheel to rotate forwards, and the base material is supported by the synchronous roller under the tensioning of the tension wheel at the material discharging end for conveying;
2) after the base material is conveyed, the material receiving end is tensioned, the servo motor controls the conveying wheel to stop, and the base material is supported by the synchronous roller under the tensioning of the tension wheel at the material discharging end to prepare for exposure of the section of the base material;
3) after exposure is started, each synchronous roller corresponds to two lower exposure lenses which are closest to the lower part of the synchronous roller, the synchronous roller and the two corresponding lower exposure lenses are not on the same vertical plane, the exposure area of the lower exposure lenses is not shielded, when the upper exposure lenses and the lower exposure lenses finish exposure of the current area, the upper exposure lenses and the lower exposure lenses perform transverse movement, the upper exposure lenses and the lower exposure lenses do not output light during the transverse movement and do not perform exposure, at the moment, the synchronous roller performs synchronous transverse movement, after the transverse movement is finished, exposure of the next area is performed, and the process is circulated until exposure of the whole image is finished.
10. The method according to claim 9, wherein the horizontal distance between two adjacent lower exposure lenses is the same as the horizontal distance between two adjacent synchronous rollers, and the synchronous rollers are located on a vertical centerline corresponding to a connecting line between two lower exposure lenses during exposure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010703181.XA CN111752109A (en) | 2020-07-21 | 2020-07-21 | Substrate exposure device and method for roll-to-roll double-sided digital photoetching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010703181.XA CN111752109A (en) | 2020-07-21 | 2020-07-21 | Substrate exposure device and method for roll-to-roll double-sided digital photoetching |
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| CN111752109A true CN111752109A (en) | 2020-10-09 |
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| CN202010703181.XA Pending CN111752109A (en) | 2020-07-21 | 2020-07-21 | Substrate exposure device and method for roll-to-roll double-sided digital photoetching |
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|---|---|---|---|---|
| JP2004347964A (en) * | 2003-05-23 | 2004-12-09 | Ushio Inc | Double-sided projection exposure apparatus for belt-like work |
| JP2006106505A (en) * | 2004-10-07 | 2006-04-20 | Fuji Photo Film Co Ltd | Device and method for image recording |
| CN102944978A (en) * | 2011-08-15 | 2013-02-27 | 中山新诺科技有限公司 | Exposure system, calibration system, optical engines, exposure method, and production method |
| CN108073044A (en) * | 2016-11-07 | 2018-05-25 | 俞庆平 | The double-faced exposure method and device of a kind of flexible material |
| CN108762009A (en) * | 2018-07-18 | 2018-11-06 | 苏州源卓光电科技有限公司 | A kind of double-station direct putting type litho machine and its exposure method |
| CN109709775A (en) * | 2019-03-13 | 2019-05-03 | 苏州微影激光技术有限公司 | A kind of exposure sources and exposure method |
| CN209297103U (en) * | 2019-01-25 | 2019-08-23 | 中山新诺科技股份有限公司 | Digitize dual surface lithography or exposure system |
| CN111025852A (en) * | 2019-10-04 | 2020-04-17 | 苏州源卓光电科技有限公司 | Exposure machine and alignment method thereof |
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2020
- 2020-07-21 CN CN202010703181.XA patent/CN111752109A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004347964A (en) * | 2003-05-23 | 2004-12-09 | Ushio Inc | Double-sided projection exposure apparatus for belt-like work |
| JP2006106505A (en) * | 2004-10-07 | 2006-04-20 | Fuji Photo Film Co Ltd | Device and method for image recording |
| CN102944978A (en) * | 2011-08-15 | 2013-02-27 | 中山新诺科技有限公司 | Exposure system, calibration system, optical engines, exposure method, and production method |
| CN108073044A (en) * | 2016-11-07 | 2018-05-25 | 俞庆平 | The double-faced exposure method and device of a kind of flexible material |
| CN108762009A (en) * | 2018-07-18 | 2018-11-06 | 苏州源卓光电科技有限公司 | A kind of double-station direct putting type litho machine and its exposure method |
| CN209297103U (en) * | 2019-01-25 | 2019-08-23 | 中山新诺科技股份有限公司 | Digitize dual surface lithography or exposure system |
| CN109709775A (en) * | 2019-03-13 | 2019-05-03 | 苏州微影激光技术有限公司 | A kind of exposure sources and exposure method |
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Application publication date: 20201009 |
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