JP2005519347A - 最大開口型の投影対物レンズ - Google Patents

最大開口型の投影対物レンズ Download PDF

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Publication number
JP2005519347A
JP2005519347A JP2003575189A JP2003575189A JP2005519347A JP 2005519347 A JP2005519347 A JP 2005519347A JP 2003575189 A JP2003575189 A JP 2003575189A JP 2003575189 A JP2003575189 A JP 2003575189A JP 2005519347 A JP2005519347 A JP 2005519347A
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JP
Japan
Prior art keywords
projection objective
lens
meniscus
image
group
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Pending
Application number
JP2003575189A
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English (en)
Japanese (ja)
Inventor
シュースター カール・ハインツ
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2005519347A publication Critical patent/JP2005519347A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/60—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having five components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
JP2003575189A 2002-03-08 2002-05-03 最大開口型の投影対物レンズ Pending JP2005519347A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10210899A DE10210899A1 (de) 2002-03-08 2002-03-08 Refraktives Projektionsobjektiv für Immersions-Lithographie
PCT/EP2002/004846 WO2003077036A1 (de) 2002-03-08 2002-05-03 Projektionsobjektiv höchster apertur

Publications (1)

Publication Number Publication Date
JP2005519347A true JP2005519347A (ja) 2005-06-30

Family

ID=27762884

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003575189A Pending JP2005519347A (ja) 2002-03-08 2002-05-03 最大開口型の投影対物レンズ
JP2003575190A Pending JP2005519348A (ja) 2002-03-08 2003-02-26 液浸リソグラフィ用の屈折投影対物レンズ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2003575190A Pending JP2005519348A (ja) 2002-03-08 2003-02-26 液浸リソグラフィ用の屈折投影対物レンズ

Country Status (8)

Country Link
US (4) US6891596B2 (enExample)
EP (2) EP1483625A1 (enExample)
JP (2) JP2005519347A (enExample)
KR (1) KR100991590B1 (enExample)
CN (1) CN100573222C (enExample)
AU (2) AU2002312872A1 (enExample)
DE (1) DE10210899A1 (enExample)
WO (2) WO2003077036A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010527160A (ja) * 2007-05-14 2010-08-05 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ用投影対物器械及び投影露光装置

Families Citing this family (262)

* Cited by examiner, † Cited by third party
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AU2003221490A1 (en) 2003-09-22
KR20040099307A (ko) 2004-11-26
US7203008B2 (en) 2007-04-10
DE10210899A1 (de) 2003-09-18
EP1483625A1 (de) 2004-12-08
WO2003077037A1 (en) 2003-09-18
CN1639644A (zh) 2005-07-13
US20050141098A1 (en) 2005-06-30
AU2002312872A1 (en) 2003-09-22
WO2003077036A1 (de) 2003-09-18
US20030174408A1 (en) 2003-09-18
US20050231814A1 (en) 2005-10-20
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US6891596B2 (en) 2005-05-10
EP1485760A1 (en) 2004-12-15
KR100991590B1 (ko) 2010-11-04
US20070188880A1 (en) 2007-08-16
CN100573222C (zh) 2009-12-23
US7312847B2 (en) 2007-12-25

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