CN100573222C - 用于浸液式光刻的折射投影物镜 - Google Patents

用于浸液式光刻的折射投影物镜 Download PDF

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Publication number
CN100573222C
CN100573222C CNB038055759A CN03805575A CN100573222C CN 100573222 C CN100573222 C CN 100573222C CN B038055759 A CNB038055759 A CN B038055759A CN 03805575 A CN03805575 A CN 03805575A CN 100573222 C CN100573222 C CN 100573222C
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CN
China
Prior art keywords
projection objective
lens
lens combination
refractive power
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB038055759A
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English (en)
Chinese (zh)
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CN1639644A (zh
Inventor
H·-J·罗斯塔尔斯基
W·乌尔里希
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication date
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Publication of CN1639644A publication Critical patent/CN1639644A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/60—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having five components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
CNB038055759A 2002-03-08 2003-02-26 用于浸液式光刻的折射投影物镜 Expired - Fee Related CN100573222C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10210899A DE10210899A1 (de) 2002-03-08 2002-03-08 Refraktives Projektionsobjektiv für Immersions-Lithographie
DE10210899.4 2002-03-08

Publications (2)

Publication Number Publication Date
CN1639644A CN1639644A (zh) 2005-07-13
CN100573222C true CN100573222C (zh) 2009-12-23

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ID=27762884

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038055759A Expired - Fee Related CN100573222C (zh) 2002-03-08 2003-02-26 用于浸液式光刻的折射投影物镜

Country Status (8)

Country Link
US (4) US6891596B2 (enExample)
EP (2) EP1483625A1 (enExample)
JP (2) JP2005519347A (enExample)
KR (1) KR100991590B1 (enExample)
CN (1) CN100573222C (enExample)
AU (2) AU2002312872A1 (enExample)
DE (1) DE10210899A1 (enExample)
WO (2) WO2003077036A1 (enExample)

Families Citing this family (263)

* Cited by examiner, † Cited by third party
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US7495840B2 (en) 2009-02-24
CN1639644A (zh) 2005-07-13
WO2003077036A1 (de) 2003-09-18
AU2003221490A1 (en) 2003-09-22
US20050141098A1 (en) 2005-06-30
US20070188880A1 (en) 2007-08-16
US7312847B2 (en) 2007-12-25
KR100991590B1 (ko) 2010-11-04
DE10210899A1 (de) 2003-09-18
EP1485760A1 (en) 2004-12-15
EP1483625A1 (de) 2004-12-08
JP2005519348A (ja) 2005-06-30
KR20040099307A (ko) 2004-11-26
US20030174408A1 (en) 2003-09-18
WO2003077037A1 (en) 2003-09-18
JP2005519347A (ja) 2005-06-30
AU2002312872A1 (en) 2003-09-22
US20050231814A1 (en) 2005-10-20
US7203008B2 (en) 2007-04-10
US6891596B2 (en) 2005-05-10

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