JP2005511536A5 - - Google Patents

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Publication number
JP2005511536A5
JP2005511536A5 JP2003536239A JP2003536239A JP2005511536A5 JP 2005511536 A5 JP2005511536 A5 JP 2005511536A5 JP 2003536239 A JP2003536239 A JP 2003536239A JP 2003536239 A JP2003536239 A JP 2003536239A JP 2005511536 A5 JP2005511536 A5 JP 2005511536A5
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JP
Japan
Prior art keywords
alkyl
diazabicyclo
benzyl
unsubstituted
substituted
Prior art date
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JP2003536239A
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English (en)
Japanese (ja)
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JP4454309B2 (ja
JP2005511536A (ja
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Publication date
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Priority claimed from PCT/EP2002/011238 external-priority patent/WO2003033500A1/en
Publication of JP2005511536A publication Critical patent/JP2005511536A/ja
Publication of JP2005511536A5 publication Critical patent/JP2005511536A5/ja
Application granted granted Critical
Publication of JP4454309B2 publication Critical patent/JP4454309B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003536239A 2001-10-17 2002-10-08 光活性化窒素塩基 Expired - Fee Related JP4454309B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
JP2005511536A JP2005511536A (ja) 2005-04-28
JP2005511536A5 true JP2005511536A5 (enExample) 2009-07-30
JP4454309B2 JP4454309B2 (ja) 2010-04-21

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003536239A Expired - Fee Related JP4454309B2 (ja) 2001-10-17 2002-10-08 光活性化窒素塩基

Country Status (14)

Country Link
US (2) US7538104B2 (enExample)
EP (1) EP1436297B1 (enExample)
JP (1) JP4454309B2 (enExample)
KR (1) KR100938769B1 (enExample)
CN (1) CN1571788B (enExample)
AT (1) ATE360629T1 (enExample)
AU (1) AU2002346968B2 (enExample)
BR (1) BR0213354A (enExample)
CA (1) CA2459374C (enExample)
DE (1) DE60219812T8 (enExample)
MX (1) MXPA04003564A (enExample)
RU (1) RU2332419C2 (enExample)
WO (1) WO2003033500A1 (enExample)
ZA (1) ZA200401523B (enExample)

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JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
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CN102971381A (zh) * 2010-06-30 2013-03-13 3M创新有限公司 可按需固化的聚硅氧烷涂层组合物
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CN104470983A (zh) 2011-12-29 2015-03-25 3M创新有限公司 可固化聚硅氧烷组合物
US9006336B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane coating composition
US9018322B2 (en) * 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
WO2015088021A1 (ja) 2013-12-13 2015-06-18 セメダイン株式会社 接着性を有する光硬化性組成物
DE102014202609B4 (de) * 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
US9328275B2 (en) 2014-03-07 2016-05-03 Prc Desoto International, Inc. Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions
US9328274B2 (en) 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
US20170327717A1 (en) 2014-10-29 2017-11-16 Tesa Se Adhesive compounds containing getter materials that can be activated
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
BR112017023446A2 (pt) 2015-04-29 2018-07-31 3M Innovative Properties Co método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido
JP6942058B2 (ja) 2015-04-29 2021-09-29 ビーエスエヌ メディカル ゲーエムベーハー No生成のための多段階プロセス
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
EP3535332A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Method of applying a sealant to an aircraft component
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
US20190369494A1 (en) 2016-12-05 2019-12-05 Arkemea Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
EP3746494B1 (de) * 2018-02-02 2024-05-29 Basf Se Polyurethane mit geringen emissionen organischer verbindungen
KR20210003869A (ko) * 2018-04-26 2021-01-12 헨켈 아게 운트 코. 카게아아 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
EP3856849A1 (en) 2018-09-27 2021-08-04 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
EP3848179A1 (de) 2020-01-10 2021-07-14 Carl Zeiss Vision International GmbH Inkjet-verfahren zur herstellung eines brillenglases
CN111795960B (zh) * 2020-08-10 2022-08-09 齐齐哈尔大学 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用
CN115389476B (zh) * 2022-08-30 2026-01-02 广西大学 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法
WO2026077954A1 (en) * 2024-10-08 2026-04-16 Chemetall Gmbh Photo-latent bases

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