RU2332419C2 - Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение - Google Patents
Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение Download PDFInfo
- Publication number
- RU2332419C2 RU2332419C2 RU2004115329/04A RU2004115329A RU2332419C2 RU 2332419 C2 RU2332419 C2 RU 2332419C2 RU 2004115329/04 A RU2004115329/04 A RU 2004115329/04A RU 2004115329 A RU2004115329 A RU 2004115329A RU 2332419 C2 RU2332419 C2 RU 2332419C2
- Authority
- RU
- Russia
- Prior art keywords
- formula
- radical
- alkyl
- substituted
- naphthyl
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title abstract 4
- 229910052757 nitrogen Inorganic materials 0.000 title abstract 2
- -1 5,6,7,8-tetrahydro-2-naphthyl,5,6,7,8-tetrahydro-1-naphthyl Chemical group 0.000 claims abstract 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract 8
- 150000001875 compounds Chemical class 0.000 claims abstract 7
- 125000005843 halogen group Chemical group 0.000 claims abstract 5
- 125000001624 naphthyl group Chemical group 0.000 claims abstract 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract 5
- 238000000576 coating method Methods 0.000 claims abstract 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims abstract 4
- 125000005561 phenanthryl group Chemical group 0.000 claims abstract 3
- 125000001644 phenoxazinyl group Chemical group C1(=CC=CC=2OC3=CC=CC=C3NC12)* 0.000 claims abstract 3
- 125000001544 thienyl group Chemical group 0.000 claims abstract 3
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 claims abstract 2
- 229920000058 polyacrylate Polymers 0.000 claims 7
- RQXFKBIKINJEBU-UHFFFAOYSA-N 1-benzyl-2,3,4,6,7,8,9,10,11,12,13,13a-dodecahydropyrimido[1,2-a]azecine Chemical compound C1CCN2CCCCCCCCC2N1CC1=CC=CC=C1 RQXFKBIKINJEBU-UHFFFAOYSA-N 0.000 claims 6
- BEZORAZYWWXCIP-UHFFFAOYSA-N 1-benzyl-12-methyl-3,4,6,7,8,9,10,11,12,12a-decahydro-2h-pyrimido[1,2-a]azonine Chemical compound C12C(C)CCCCCCN2CCCN1CC1=CC=CC=C1 BEZORAZYWWXCIP-UHFFFAOYSA-N 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 229920001228 polyisocyanate Polymers 0.000 claims 4
- 239000005056 polyisocyanate Substances 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 125000001931 aliphatic group Chemical group 0.000 claims 3
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 238000006555 catalytic reaction Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 229920000647 polyepoxide Polymers 0.000 claims 3
- ZIONUNFGMHFISV-UHFFFAOYSA-N 1-benzyl-2,3,4,6,7,8,9,10,11,11a-decahydropyrimido[1,2-a]azocine Chemical compound C1CCN2CCCCCCC2N1CC1=CC=CC=C1 ZIONUNFGMHFISV-UHFFFAOYSA-N 0.000 claims 2
- AMDNICFZCMZSPD-UHFFFAOYSA-N 1-benzyl-3,4,6,7,8,9,10,10a-octahydro-2h-pyrimido[1,2-a]azepine Chemical compound C1CCN2CCCCCC2N1CC1=CC=CC=C1 AMDNICFZCMZSPD-UHFFFAOYSA-N 0.000 claims 2
- 239000004925 Acrylic resin Substances 0.000 claims 2
- 229920000178 Acrylic resin Polymers 0.000 claims 2
- 102000051628 Interleukin-1 receptor antagonist Human genes 0.000 claims 2
- 108700021006 Interleukin-1 receptor antagonist Proteins 0.000 claims 2
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 2
- 150000008064 anhydrides Chemical group 0.000 claims 2
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims 2
- 125000003700 epoxy group Chemical group 0.000 claims 2
- 125000001188 haloalkyl group Chemical group 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 239000003407 interleukin 1 receptor blocking agent Substances 0.000 claims 2
- 150000004658 ketimines Chemical class 0.000 claims 2
- 125000004934 phenanthridinyl group Chemical group C1(=CC=CC2=NC=C3C=CC=CC3=C12)* 0.000 claims 2
- 229920000728 polyester Polymers 0.000 claims 2
- 229920000570 polyether Polymers 0.000 claims 2
- 125000001725 pyrenyl group Chemical group 0.000 claims 2
- 125000004627 thianthrenyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3SC12)* 0.000 claims 2
- 150000003573 thiols Chemical class 0.000 claims 2
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 claims 2
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims 1
- PNZNKBFIWFBSAU-UHFFFAOYSA-N 1-benzyl-10-methyl-3,4,6,7,8,9,10,10a-octahydro-2h-pyrimido[1,2-a]azepine Chemical compound C12C(C)CCCCN2CCCN1CC1=CC=CC=C1 PNZNKBFIWFBSAU-UHFFFAOYSA-N 0.000 claims 1
- XUICADQNDIQJLU-UHFFFAOYSA-N 1-benzyl-5-ethyl-3,5,6,7,8,8a-hexahydro-2h-imidazo[1,2-a]pyridine Chemical compound C1CN2C(CC)CCCC2N1CC1=CC=CC=C1 XUICADQNDIQJLU-UHFFFAOYSA-N 0.000 claims 1
- PHFLGFSYPGKEDT-UHFFFAOYSA-N 1-benzyl-5-methyl-3,5,6,7,8,8a-hexahydro-2h-imidazo[1,2-a]pyridine Chemical compound C1CN2C(C)CCCC2N1CC1=CC=CC=C1 PHFLGFSYPGKEDT-UHFFFAOYSA-N 0.000 claims 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- 206010073306 Exposure to radiation Diseases 0.000 claims 1
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 claims 1
- 229920001744 Polyaldehyde Polymers 0.000 claims 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 claims 1
- 150000004729 acetoacetic acid derivatives Chemical class 0.000 claims 1
- 229920006243 acrylic copolymer Polymers 0.000 claims 1
- 238000007259 addition reaction Methods 0.000 claims 1
- 150000001728 carbonyl compounds Chemical class 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical class OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 claims 1
- 239000003822 epoxy resin Substances 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000012948 isocyanate Substances 0.000 claims 1
- 150000002513 isocyanates Chemical class 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 150000002917 oxazolidines Chemical class 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 claims 1
- 239000003054 catalyst Substances 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- GZSUIHUAFPHZSU-UHFFFAOYSA-N 9-ethyl-2,3-dihydro-1h-carbazol-4-one Chemical compound C12=CC=CC=C2N(CC)C2=C1C(=O)CCC2 GZSUIHUAFPHZSU-UHFFFAOYSA-N 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 0 CC(N(*)C(C)(*)*)N(*)I Chemical compound CC(N(*)C(C)(*)*)N(*)I 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Epoxy Resins (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Polyurethanes Or Polyureas (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 | ||
| CH20011911/01 | 2001-10-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2004115329A RU2004115329A (ru) | 2005-10-27 |
| RU2332419C2 true RU2332419C2 (ru) | 2008-08-27 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2004115329/04A RU2332419C2 (ru) | 2001-10-17 | 2002-10-08 | Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (enExample) |
| EP (1) | EP1436297B1 (enExample) |
| JP (1) | JP4454309B2 (enExample) |
| KR (1) | KR100938769B1 (enExample) |
| CN (1) | CN1571788B (enExample) |
| AT (1) | ATE360629T1 (enExample) |
| AU (1) | AU2002346968B2 (enExample) |
| BR (1) | BR0213354A (enExample) |
| CA (1) | CA2459374C (enExample) |
| DE (1) | DE60219812T8 (enExample) |
| MX (1) | MXPA04003564A (enExample) |
| RU (1) | RU2332419C2 (enExample) |
| WO (1) | WO2003033500A1 (enExample) |
| ZA (1) | ZA200401523B (enExample) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| BRPI0513709A (pt) * | 2004-07-21 | 2008-05-13 | Ciba Sc Holding Ag | processo para a fotoativação e uso de um catalisador por um procedimento de dois estágios invertido |
| DE602006020839D1 (de) * | 2005-02-02 | 2011-05-05 | Basf Se | Langwellige verschobene benzotriazol-uv-absorber und deren verwendung |
| US20090298962A1 (en) * | 2006-09-29 | 2009-12-03 | Katia Studer | Photolatent bases for systems based on blocked isocyanates |
| JP5606308B2 (ja) * | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| WO2008152956A1 (ja) * | 2007-06-14 | 2008-12-18 | Sekisui Chemical Co., Ltd. | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
| US8329771B2 (en) | 2008-03-31 | 2012-12-11 | San-Apro Limited | Photobase generator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP6151639B2 (ja) | 2010-06-30 | 2017-06-21 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサンコーティング組成物 |
| WO2012003160A1 (en) | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable composition comprising dual reactive silane functionality |
| WO2012003153A1 (en) * | 2010-06-30 | 2012-01-05 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| KR101958343B1 (ko) | 2011-12-16 | 2019-03-15 | 쓰리본드 화인 케미칼 가부시키가이샤 | 경화성 수지조성물 |
| WO2013101535A1 (en) * | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable polysiloxane compositions and pressure sensitive adhesives made therefrom |
| EP2797985B1 (en) | 2011-12-29 | 2015-09-23 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| CN105164184A (zh) | 2011-12-29 | 2015-12-16 | 3M创新有限公司 | 可固化聚硅氧烷涂料组合物 |
| US9006357B2 (en) | 2011-12-29 | 2015-04-14 | 3M Innovative Properties Company | Curable polysiloxane composition |
| US9018322B2 (en) * | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| JP5927750B2 (ja) | 2013-07-18 | 2016-06-01 | セメダイン株式会社 | 光硬化性組成物 |
| KR102330121B1 (ko) | 2013-12-13 | 2021-11-23 | 세메다인 가부시키 가이샤 | 접착성을 갖는 광경화성 조성물 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328274B2 (en) * | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| WO2016066435A1 (de) * | 2014-10-29 | 2016-05-06 | Tesa Se | Klebemassen mit aktivierbaren gettermaterialien |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| WO2016176548A1 (en) | 2015-04-29 | 2016-11-03 | 3M Innovative Properties Company | Composition including a polythiol and a polyepoxide and methods relating to the composition |
| BR112017023170B1 (pt) | 2015-04-29 | 2022-08-16 | Bsn Medical Gmbh | Dispositivo de banho medicinal e seu uso |
| CN107809996A (zh) | 2015-04-29 | 2018-03-16 | Bsn医疗有限公司 | 一氧化氮产生的多步骤方法 |
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| CA3042861A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
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| CN111655749B (zh) * | 2018-02-02 | 2023-03-03 | 巴斯夫欧洲公司 | 低有机化合物释放的聚氨酯 |
| CN112004851A (zh) * | 2018-04-26 | 2020-11-27 | 汉高股份有限及两合公司 | 用作可固化组合物中的潜在催化剂的季氮化合物 |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| WO2020065588A1 (en) | 2018-09-27 | 2020-04-02 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476A (zh) * | 2022-08-30 | 2022-11-25 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2119920C1 (ru) * | 1991-03-28 | 1998-10-10 | Эйсай Ко., Лтд. | Гетероцикло-циклические производные аминов или их фармацевтически приемлемые соли, промежуточные соединения, фармацевтическая композиция, способ ингибирования холинэстеразы, способ получения соединений |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| JP2654339B2 (ja) * | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| CA2163875A1 (en) | 1993-05-26 | 1994-12-08 | Huig Klinkenberg | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| EP0882072B2 (en) | 1996-02-22 | 2005-10-26 | Ciba SC Holding AG | Anionic photocatalyst |
| KR100505529B1 (ko) * | 1997-01-22 | 2005-08-04 | 시바 스페셜티 케미칼스 홀딩 인크. | α-아미노 케톤을 기본으로 하는 광 활성화 질소 함유 염기 |
| DE69839020T2 (de) | 1997-02-26 | 2009-03-19 | Ciba Holding Inc. | Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| JP4308326B2 (ja) * | 1997-03-18 | 2009-08-05 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | α−アミノアルケン類に基づく光励起性の窒素含有塩基類 |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| DE59903270D1 (de) | 1998-08-21 | 2002-12-05 | Ciba Sc Holding Ag | Photoaktivierbare stickstoffhaltige basen |
| JP4906221B2 (ja) | 2000-05-26 | 2012-03-28 | アクゾ ノーベル ナムローゼ フェンノートシャップ | 光活性化可能なコーティング組成物 |
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- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
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- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
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| RU2119920C1 (ru) * | 1991-03-28 | 1998-10-10 | Эйсай Ко., Лтд. | Гетероцикло-циклические производные аминов или их фармацевтически приемлемые соли, промежуточные соединения, фармацевтическая композиция, способ ингибирования холинэстеразы, способ получения соединений |
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Also Published As
| Publication number | Publication date |
|---|---|
| CA2459374A1 (en) | 2003-04-24 |
| US20090076200A1 (en) | 2009-03-19 |
| ZA200401523B (en) | 2004-12-14 |
| KR20050034614A (ko) | 2005-04-14 |
| US8252784B2 (en) | 2012-08-28 |
| CN1571788A (zh) | 2005-01-26 |
| DE60219812D1 (de) | 2007-06-06 |
| MXPA04003564A (es) | 2004-07-23 |
| JP2005511536A (ja) | 2005-04-28 |
| EP1436297A1 (en) | 2004-07-14 |
| JP4454309B2 (ja) | 2010-04-21 |
| EP1436297B1 (en) | 2007-04-25 |
| ATE360629T1 (de) | 2007-05-15 |
| KR100938769B1 (ko) | 2010-01-27 |
| BR0213354A (pt) | 2004-10-26 |
| US20040242867A1 (en) | 2004-12-02 |
| WO2003033500A1 (en) | 2003-04-24 |
| CN1571788B (zh) | 2012-08-01 |
| DE60219812T2 (de) | 2008-01-24 |
| AU2002346968B2 (en) | 2008-04-10 |
| US7538104B2 (en) | 2009-05-26 |
| DE60219812T8 (de) | 2008-05-21 |
| RU2004115329A (ru) | 2005-10-27 |
| CA2459374C (en) | 2011-02-08 |
| WO2003033500B1 (en) | 2003-12-11 |
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